TWI467941B - 用以監控射頻功率的量測系統與監控射頻功率之方法 - Google Patents

用以監控射頻功率的量測系統與監控射頻功率之方法 Download PDF

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Publication number
TWI467941B
TWI467941B TW96134945A TW96134945A TWI467941B TW I467941 B TWI467941 B TW I467941B TW 96134945 A TW96134945 A TW 96134945A TW 96134945 A TW96134945 A TW 96134945A TW I467941 B TWI467941 B TW I467941B
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TW
Taiwan
Prior art keywords
signal
radio frequency
signals
measurement system
power
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TW96134945A
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English (en)
Chinese (zh)
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TW200838181A (en
Inventor
雷喬艾瑞
陶德賀客曼
大衛寇姆
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萬機科技股份有限公司
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Application filed by 萬機科技股份有限公司 filed Critical 萬機科技股份有限公司
Publication of TW200838181A publication Critical patent/TW200838181A/zh
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Publication of TWI467941B publication Critical patent/TWI467941B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Transmitters (AREA)
  • Drying Of Semiconductors (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Arrangements For Transmission Of Measured Signals (AREA)
TW96134945A 2007-03-14 2007-09-19 用以監控射頻功率的量測系統與監控射頻功率之方法 TWI467941B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US89473807P 2007-03-14 2007-03-14
US11/763,298 US8055203B2 (en) 2007-03-14 2007-06-14 Multipoint voltage and current probe system

Publications (2)

Publication Number Publication Date
TW200838181A TW200838181A (en) 2008-09-16
TWI467941B true TWI467941B (zh) 2015-01-01

Family

ID=64051265

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96134945A TWI467941B (zh) 2007-03-14 2007-09-19 用以監控射頻功率的量測系統與監控射頻功率之方法

Country Status (5)

Country Link
US (2) US8055203B2 (https=)
EP (2) EP1995759B8 (https=)
JP (2) JP5378678B2 (https=)
CN (1) CN101267707B (https=)
TW (1) TWI467941B (https=)

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Also Published As

Publication number Publication date
US20120013352A1 (en) 2012-01-19
EP1995759B8 (en) 2019-02-27
EP1995759B1 (en) 2018-12-12
CN101267707A (zh) 2008-09-17
US8190380B2 (en) 2012-05-29
US20080227420A1 (en) 2008-09-18
EP1995759A2 (en) 2008-11-26
TW200838181A (en) 2008-09-16
EP3483917A1 (en) 2019-05-15
EP1995759A3 (en) 2010-07-07
JP2013084606A (ja) 2013-05-09
JP5378678B2 (ja) 2013-12-25
CN101267707B (zh) 2012-10-10
JP2008226820A (ja) 2008-09-25
US8055203B2 (en) 2011-11-08
EP3483917B1 (en) 2021-03-17
JP5635059B2 (ja) 2014-12-03

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