CN101267707B - 多点电压和电流探针系统 - Google Patents

多点电压和电流探针系统 Download PDF

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Publication number
CN101267707B
CN101267707B CN2007101638024A CN200710163802A CN101267707B CN 101267707 B CN101267707 B CN 101267707B CN 2007101638024 A CN2007101638024 A CN 2007101638024A CN 200710163802 A CN200710163802 A CN 200710163802A CN 101267707 B CN101267707 B CN 101267707B
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China
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signal
signals
power
frequency
output
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Expired - Fee Related
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CN2007101638024A
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Chinese (zh)
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CN101267707A (zh
Inventor
雷·切尔瑞
托德·海克尔曼
戴维·J·库莫
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MKS Instruments Inc
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MKS Instruments Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Transmitters (AREA)
  • Drying Of Semiconductors (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Arrangements For Transmission Of Measured Signals (AREA)
CN2007101638024A 2007-03-14 2007-09-30 多点电压和电流探针系统 Expired - Fee Related CN101267707B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US89473807P 2007-03-14 2007-03-14
US60/894,738 2007-03-14
US11/763,298 2007-06-14
US11/763,298 US8055203B2 (en) 2007-03-14 2007-06-14 Multipoint voltage and current probe system

Publications (2)

Publication Number Publication Date
CN101267707A CN101267707A (zh) 2008-09-17
CN101267707B true CN101267707B (zh) 2012-10-10

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CN2007101638024A Expired - Fee Related CN101267707B (zh) 2007-03-14 2007-09-30 多点电压和电流探针系统

Country Status (5)

Country Link
US (2) US8055203B2 (https=)
EP (2) EP3483917B1 (https=)
JP (2) JP5378678B2 (https=)
CN (1) CN101267707B (https=)
TW (1) TWI467941B (https=)

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8055203B2 (en) * 2007-03-14 2011-11-08 Mks Instruments, Inc. Multipoint voltage and current probe system
US7970562B2 (en) 2008-05-07 2011-06-28 Advanced Energy Industries, Inc. System, method, and apparatus for monitoring power
GB0823565D0 (en) * 2008-12-24 2009-01-28 Oxford Instr Plasma Technology Signal generating system
US8040068B2 (en) * 2009-02-05 2011-10-18 Mks Instruments, Inc. Radio frequency power control system
CN102473590B (zh) * 2009-06-30 2014-11-26 朗姆研究公司 用于识别处理模块级失控事件的装置及其方法
US8314561B2 (en) 2010-04-02 2012-11-20 Mks Instruments, Inc. Multi-channel radio frequency generator
US8570103B2 (en) * 2011-06-16 2013-10-29 Donald C. D. Chang Flexible multi-channel amplifiers via wavefront muxing techniques
US8491759B2 (en) * 2010-10-20 2013-07-23 COMET Technologies USA, Inc. RF impedance matching network with secondary frequency and sub-harmonic variant
US9043525B2 (en) * 2012-12-14 2015-05-26 Lam Research Corporation Optimizing a rate of transfer of data between an RF generator and a host system within a plasma tool
US10821542B2 (en) 2013-03-15 2020-11-03 Mks Instruments, Inc. Pulse synchronization by monitoring power in another frequency band
US9041480B2 (en) * 2013-03-15 2015-05-26 Mks Instruments, Inc. Virtual RF sensor
DE102015212242A1 (de) * 2015-06-30 2017-01-05 TRUMPF Hüttinger GmbH + Co. KG Verfahren zum Abtasten eines mit einem Plasmaprozess in Beziehung stehenden Signalgemischs
JP7108623B2 (ja) * 2017-02-16 2022-07-28 アプライド マテリアルズ インコーポレイテッド 高温環境において高周波電力を測定するための電圧－電流プローブ、及び電圧－電流プローブを較正する方法
US10510575B2 (en) 2017-09-20 2019-12-17 Applied Materials, Inc. Substrate support with multiple embedded electrodes
KR102527384B1 (ko) 2018-03-09 2023-04-28 삼성전자주식회사 발광 소자 패키지 및 그 제조 방법
US10555412B2 (en) 2018-05-10 2020-02-04 Applied Materials, Inc. Method of controlling ion energy distribution using a pulse generator with a current-return output stage
US10304663B1 (en) * 2018-07-19 2019-05-28 Lam Research Corporation RF generator for generating a modulated frequency or an inter-modulated frequency
US11476145B2 (en) 2018-11-20 2022-10-18 Applied Materials, Inc. Automatic ESC bias compensation when using pulsed DC bias
CN118315254A (zh) 2019-01-22 2024-07-09 应用材料公司 用于控制脉冲电压波形的反馈回路
US11508554B2 (en) 2019-01-24 2022-11-22 Applied Materials, Inc. High voltage filter assembly
KR102791775B1 (ko) 2019-05-07 2025-04-03 램 리써치 코포레이션 폐루프 다중 출력 rf 매칭
CN118866641A (zh) 2019-07-31 2024-10-29 朗姆研究公司 具有多个输出端口的射频功率产生器
EP3792955B1 (en) * 2019-09-10 2021-10-27 Comet AG Rf power generator with analogue and digital detectors
WO2021113387A1 (en) 2019-12-02 2021-06-10 Lam Research Corporation Impedance transformation in radio-frequency-assisted plasma generation
US11994542B2 (en) * 2020-03-27 2024-05-28 Lam Research Corporation RF signal parameter measurement in an integrated circuit fabrication chamber
KR20230021739A (ko) 2020-06-12 2023-02-14 램 리써치 코포레이션 Rf 커플링 구조체들에 의한 플라즈마 형성의 제어
US11848176B2 (en) 2020-07-31 2023-12-19 Applied Materials, Inc. Plasma processing using pulsed-voltage and radio-frequency power
US11901157B2 (en) 2020-11-16 2024-02-13 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11798790B2 (en) 2020-11-16 2023-10-24 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11495470B1 (en) 2021-04-16 2022-11-08 Applied Materials, Inc. Method of enhancing etching selectivity using a pulsed plasma
US11948780B2 (en) 2021-05-12 2024-04-02 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11967483B2 (en) 2021-06-02 2024-04-23 Applied Materials, Inc. Plasma excitation with ion energy control
US12525441B2 (en) 2021-06-09 2026-01-13 Applied Materials, Inc. Plasma chamber and chamber component cleaning methods
US20220399186A1 (en) 2021-06-09 2022-12-15 Applied Materials, Inc. Method and apparatus to reduce feature charging in plasma processing chamber
US12148595B2 (en) 2021-06-09 2024-11-19 Applied Materials, Inc. Plasma uniformity control in pulsed DC plasma chamber
US11810760B2 (en) 2021-06-16 2023-11-07 Applied Materials, Inc. Apparatus and method of ion current compensation
US11569066B2 (en) 2021-06-23 2023-01-31 Applied Materials, Inc. Pulsed voltage source for plasma processing applications
US11476090B1 (en) 2021-08-24 2022-10-18 Applied Materials, Inc. Voltage pulse time-domain multiplexing
US12106938B2 (en) 2021-09-14 2024-10-01 Applied Materials, Inc. Distortion current mitigation in a radio frequency plasma processing chamber
US11694876B2 (en) 2021-12-08 2023-07-04 Applied Materials, Inc. Apparatus and method for delivering a plurality of waveform signals during plasma processing
US12183548B2 (en) * 2022-05-05 2024-12-31 Applied Materials, Inc. High bandwidth architecture for centralized coherent control at the edge of processing tool
US11972924B2 (en) 2022-06-08 2024-04-30 Applied Materials, Inc. Pulsed voltage source for plasma processing applications
US12315732B2 (en) 2022-06-10 2025-05-27 Applied Materials, Inc. Method and apparatus for etching a semiconductor substrate in a plasma etch chamber
US12586768B2 (en) 2022-08-10 2026-03-24 Applied Materials, Inc. Pulsed voltage compensation for plasma processing applications
US12272524B2 (en) 2022-09-19 2025-04-08 Applied Materials, Inc. Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics
US12111341B2 (en) 2022-10-05 2024-10-08 Applied Materials, Inc. In-situ electric field detection method and apparatus
US20250285840A1 (en) * 2024-03-05 2025-09-11 Applied Materials, Inc. Rf power splitting and control

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1196936C (zh) * 2001-03-20 2005-04-13 Eni技术公司 探测分析系统
CN1647237A (zh) * 2002-07-10 2005-07-27 Eni技术公司 用于等离子体rf源的度量的多速率处理

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4951009A (en) 1989-08-11 1990-08-21 Applied Materials, Inc. Tuning method and control system for automatic matching network
US7421321B2 (en) * 1995-06-07 2008-09-02 Automotive Technologies International, Inc. System for obtaining vehicular information
US5486832A (en) * 1994-07-01 1996-01-23 Hughes Missile Systems Company RF sensor and radar for automotive speed and collision avoidance applications
US5576629A (en) * 1994-10-24 1996-11-19 Fourth State Technology, Inc. Plasma monitoring and control method and system
US5940780A (en) * 1995-09-29 1999-08-17 Advanced Thermal Solutions, Inc. Universal transceiver
US5981961A (en) 1996-03-15 1999-11-09 Applied Materials, Inc. Apparatus and method for improved scanning efficiency in an ion implanter
US5770922A (en) * 1996-07-22 1998-06-23 Eni Technologies, Inc. Baseband V-I probe
CN1072939C (zh) * 1997-04-18 2001-10-17 王春儒 治疗原发性肾小球疾病的药物
US6449568B1 (en) * 1998-02-27 2002-09-10 Eni Technology, Inc. Voltage-current sensor with high matching directivity
US6222718B1 (en) 1998-11-12 2001-04-24 Lam Research Corporation Integrated power modules for plasma processing systems
US6720866B1 (en) * 1999-03-30 2004-04-13 Microchip Technology Incorporated Radio frequency identification tag device with sensor input
US6265831B1 (en) * 1999-03-31 2001-07-24 Lam Research Corporation Plasma processing method and apparatus with control of rf bias
US6447636B1 (en) * 2000-02-16 2002-09-10 Applied Materials, Inc. Plasma reactor with dynamic RF inductive and capacitive coupling control
US7960670B2 (en) * 2005-05-03 2011-06-14 Kla-Tencor Corporation Methods of and apparatuses for measuring electrical parameters of a plasma process
US6677711B2 (en) * 2001-06-07 2004-01-13 Lam Research Corporation Plasma processor method and apparatus
US6608446B1 (en) * 2002-02-25 2003-08-19 Eni Technology, Inc. Method and apparatus for radio frequency (RF) metrology
US6830650B2 (en) * 2002-07-12 2004-12-14 Advanced Energy Industries, Inc. Wafer probe for measuring plasma and surface characteristics in plasma processing environments
JP3806734B2 (ja) * 2002-07-26 2006-08-09 独立行政法人農業・食品産業技術総合研究機構 プログラマブル計測汎用モジュール並びにそれらを用いた計測システム
US7084369B2 (en) * 2002-08-20 2006-08-01 Tokyo Electron Limited Harmonic multiplexer
US20040049428A1 (en) * 2002-09-05 2004-03-11 Soehnlen John Pius Wireless environmental sensing in packaging applications
JP2004205328A (ja) 2002-12-25 2004-07-22 Daihen Corp 高周波電源装置
US6902646B2 (en) * 2003-08-14 2005-06-07 Advanced Energy Industries, Inc. Sensor array for measuring plasma characteristics in plasma processing environments
US7015414B2 (en) * 2003-09-30 2006-03-21 Tokyo Electron Limited Method and apparatus for determining plasma impedance
US20050080576A1 (en) 2003-10-10 2005-04-14 Dickerson Robert T. Method and system for frequency domain time correlation
US7460837B2 (en) * 2004-03-25 2008-12-02 Cisco Technology, Inc. User interface and time-shifted presentation of data in a system that monitors activity in a shared radio frequency band
US7292045B2 (en) 2004-09-04 2007-11-06 Applied Materials, Inc. Detection and suppression of electrical arcing
DE102004052518A1 (de) * 2004-10-29 2006-05-04 Robert Bosch Gmbh Vorrichtung und Verfahren zur winkelaufgelösten Entfernungs- und Geschwindigkeitsbetimmung eines Objekts
US20060128311A1 (en) * 2004-12-13 2006-06-15 Yohannes Tesfai Matching receive signal strenth data associated with radio emission sources for positioning applications
US7602127B2 (en) 2005-04-18 2009-10-13 Mks Instruments, Inc. Phase and frequency control of a radio frequency generator from an external source
US8102954B2 (en) * 2005-04-26 2012-01-24 Mks Instruments, Inc. Frequency interference detection and correction
US7477711B2 (en) * 2005-05-19 2009-01-13 Mks Instruments, Inc. Synchronous undersampling for high-frequency voltage and current measurements
US9214909B2 (en) * 2005-07-29 2015-12-15 Mks Instruments, Inc. High reliability RF generator architecture
US7831406B2 (en) * 2006-04-13 2010-11-09 Radatec, Inc. Method of sensor multiplexing for rotating machinery
CN101188047A (zh) * 2006-11-17 2008-05-28 鸿富锦精密工业（深圳）有限公司 多通道差动信号监测电路
US8055203B2 (en) * 2007-03-14 2011-11-08 Mks Instruments, Inc. Multipoint voltage and current probe system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1196936C (zh) * 2001-03-20 2005-04-13 Eni技术公司 探测分析系统
CN1647237A (zh) * 2002-07-10 2005-07-27 Eni技术公司 用于等离子体rf源的度量的多速率处理

Also Published As

Publication number Publication date
TW200838181A (en) 2008-09-16
US20120013352A1 (en) 2012-01-19
EP1995759A2 (en) 2008-11-26
CN101267707A (zh) 2008-09-17
US20080227420A1 (en) 2008-09-18
EP1995759B8 (en) 2019-02-27
JP2013084606A (ja) 2013-05-09
EP1995759A3 (en) 2010-07-07
JP2008226820A (ja) 2008-09-25
EP3483917A1 (en) 2019-05-15
EP3483917B1 (en) 2021-03-17
US8190380B2 (en) 2012-05-29
JP5635059B2 (ja) 2014-12-03
TWI467941B (zh) 2015-01-01
US8055203B2 (en) 2011-11-08
EP1995759B1 (en) 2018-12-12
JP5378678B2 (ja) 2013-12-25

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Granted publication date: 20121010