TWI467645B - Chemical mechanical polishing method and system - Google Patents

Chemical mechanical polishing method and system Download PDF

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Publication number
TWI467645B
TWI467645B TW99128538A TW99128538A TWI467645B TW I467645 B TWI467645 B TW I467645B TW 99128538 A TW99128538 A TW 99128538A TW 99128538 A TW99128538 A TW 99128538A TW I467645 B TWI467645 B TW I467645B
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TW
Taiwan
Prior art keywords
system
mechanical polishing
chemical mechanical
polishing method
method
Prior art date
Application number
TW99128538A
Other versions
TW201209901A (en
Inventor
Meng Yi Shen
Liang Yu Hu
Tsung Hsuan Ho
Sheng I Tseng
Original Assignee
Macronix Int Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Macronix Int Co Ltd filed Critical Macronix Int Co Ltd
Priority to TW99128538A priority Critical patent/TWI467645B/en
Publication of TW201209901A publication Critical patent/TW201209901A/en
Application granted granted Critical
Publication of TWI467645B publication Critical patent/TWI467645B/en

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TW99128538A 2010-08-25 2010-08-25 Chemical mechanical polishing method and system TWI467645B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW99128538A TWI467645B (en) 2010-08-25 2010-08-25 Chemical mechanical polishing method and system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW99128538A TWI467645B (en) 2010-08-25 2010-08-25 Chemical mechanical polishing method and system

Publications (2)

Publication Number Publication Date
TW201209901A TW201209901A (en) 2012-03-01
TWI467645B true TWI467645B (en) 2015-01-01

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ID=46763803

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TW99128538A TWI467645B (en) 2010-08-25 2010-08-25 Chemical mechanical polishing method and system

Country Status (1)

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TW (1) TWI467645B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW552656B (en) * 2001-06-27 2003-09-11 Advanced Micro Devices Inc Using scatterometry to develop real time etch image
TW555615B (en) * 2000-04-07 2003-10-01 Cabot Microelectronics Corp Integrated chemical-mechanical polishing
CN100399525C (en) * 2001-06-19 2008-07-02 应用材料有限公司 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW555615B (en) * 2000-04-07 2003-10-01 Cabot Microelectronics Corp Integrated chemical-mechanical polishing
CN100399525C (en) * 2001-06-19 2008-07-02 应用材料有限公司 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
TW552656B (en) * 2001-06-27 2003-09-11 Advanced Micro Devices Inc Using scatterometry to develop real time etch image

Also Published As

Publication number Publication date
TW201209901A (en) 2012-03-01

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