TWI465616B - Casting device for directional solidification, manufacturing method of ingot, platy seeding structure - Google Patents
Casting device for directional solidification, manufacturing method of ingot, platy seeding structure Download PDFInfo
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Description
本發明是有關一種凝固裝置、引晶結構、及矽鑄錠製造方法,且特別是有關於一種定向凝固裝置、模板式引晶結構、及使用引晶結構的矽鑄錠製造方法。The present invention relates to a solidifying apparatus, a seeding structure, and a method for producing a tantalum ingot, and more particularly to a method of manufacturing a tantalum ingot, a templated seeding structure, and a tantalum ingot using a seeding structure.
由於電子時代之來臨,電子性產品大量受到重視,故晶圓材料即成為半導體產業與光電產業大量需求之產品。而晶圓之生長方式有很多種,例如浮融帶長晶法(Floating Zone Method)、雷射加熱提拉長晶法(Laser Heated Pedestal Growth)、及柴式長晶法(Czochralski Method)等,而更因每種長晶方式不同而所使用之設備亦不盡相同。Due to the advent of the electronic age, electronic products have received a lot of attention, so wafer materials have become a product of the semiconductor industry and the optoelectronic industry. There are many ways to grow wafers, such as the Floating Zone Method, the Laser Heated Pedestal Growth, and the Czochralski Method. The equipment used is different for each crystal growth method.
太陽能電池屬半導體之一種,故又稱為太陽能晶片,矽(silicon)為目前通用的太陽能電池之原料代表,其發電原理為利用太陽光能轉換成電能。太陽能光電基板(Solar PV Cell)的晶片材質有很多種,大致上可分為單晶矽、多晶矽、非晶矽,以及其它非矽材料,其中以單晶矽及多晶矽兩類最為常見。Solar cells are a kind of semiconductors, so they are also called solar wafers. Silicon is the representative of the raw materials of solar cells. The principle of power generation is to convert solar energy into electricity. Solar PV Cell has a wide variety of wafer materials, which can be roughly divided into single crystal germanium, polycrystalline germanium, amorphous germanium, and other non-antimony materials. Among them, single crystal germanium and polycrystalline germanium are the most common.
然而,於形成太陽能晶片前,須先以坩鍋凝固其內的矽熔湯,以長晶形成矽鑄錠,進而供切割形成晶片。但於凝固矽熔湯時,位於坩鍋底部的矽熔湯之晶粒往往較大,此將使最後形成的矽鑄錠內部具有較多的缺陷,進而影響到切割後之晶片轉換效率。However, before the formation of the solar wafer, the crucible must be solidified in a crucible to form a crucible ingot, which is then cut to form a wafer. However, when the soup is solidified, the crystal grains of the crucible soup located at the bottom of the crucible are often large, which will cause more defects inside the finally formed crucible ingot, thereby affecting the wafer conversion efficiency after cutting.
於是,本發明人有感上述缺失之可改善,乃特潛心研究並配合學理之運用,終於提出一種設計合理且有效改善 上述缺失之本發明。Therefore, the inventor felt that the above-mentioned deficiency could be improved, and he devoted himself to research and cooperated with the application of theory, and finally proposed a reasonable and effective design. The invention described above is missing.
本發明實施例在於提供一種定向凝固裝置、矽鑄錠製造方法、及模板式引晶結構,其用以使形成的矽鑄錠內部具有較少的缺陷。An embodiment of the present invention provides a directional solidification apparatus, a bismuth ingot manufacturing method, and a template crystal seeding structure for making the inside of the formed bismuth ingot less defective.
本發明實施例提供一種定向凝固裝置,用以凝固一矽熔湯,該定向凝固裝置包括:一坩鍋,其包含一內底面及連接於該內底面的一環側面;以及一引晶結構,其設置於該坩鍋內底面上,且該環側面頂緣離該內底面的距離為該引晶結構頂緣離該內底面的距離之至少五倍,該引晶結構包含數個層狀地排列於該坩鍋內底面的引晶顆粒,且該些引晶顆粒與該內底面包圍界定出一成核空間,用以於凝固該矽熔湯時,能抑制位於該成核空間內的矽熔湯之晶粒生長的尺寸。The embodiment of the present invention provides a directional solidification device for solidifying a smelting soup, the directional solidification device comprising: a crucible comprising an inner bottom surface and a ring side surface connected to the inner bottom surface; and a seeding structure, The bottom edge of the ring is disposed on the bottom surface of the crucible, and the distance from the top edge of the ring is at least five times the distance from the inner bottom surface of the seed crystal structure, and the seed crystal structure comprises a plurality of layers. a seeding particle on the bottom surface of the crucible, and the seeding particles and the inner bottom surface define a nucleation space for suppressing the melting in the nucleation space when solidifying the crucible The size of the grain growth of the soup.
較佳地,該些引晶顆粒為碳化物顆粒、石墨顆粒以及氮化物顆粒的至少其中之一。Preferably, the seeding particles are at least one of carbide particles, graphite particles and nitride particles.
較佳地,該些引晶顆粒分別為圓球狀,且該些引晶顆粒彼此緊鄰地排列。Preferably, the seeding particles are respectively spherical, and the seeding particles are arranged next to each other.
較佳地,該些引晶顆粒的直徑實質相同,且每一引晶顆粒的直徑大致為0.5公釐至40公釐。Preferably, the seed crystal particles have substantially the same diameter, and each of the seed crystal particles has a diameter of approximately 0.5 mm to 40 mm.
較佳地,該些引晶顆粒排列成至少兩層。Preferably, the seed crystal particles are arranged in at least two layers.
較佳地,該些引晶顆粒分別為柱狀,且該些引晶顆粒彼此間隔地呈矩陣式排列。Preferably, the seed crystal particles are respectively columnar, and the seed crystal particles are arranged in a matrix at intervals.
較佳地,該些引晶顆粒為外型實質相同的方柱,且每一引晶顆粒的橫截面邊長大致為0.5公釐至40公釐。Preferably, the seed crystal particles are substantially identical square pillars, and each of the seed crystal particles has a cross-sectional side length of approximately 0.5 mm to 40 mm.
本發明實施例另提供一種使用上述引晶顆粒的矽鑄錠製造方法,其步驟包括:提供一坩鍋,且依該坩鍋內底面的面積取用一特定數量的引晶顆粒;將該些引晶顆粒層狀地排列設置於該坩鍋內底面上,並使該些引晶顆粒與該坩鍋內底面包圍界定出一成核空間;將一矽熔料置入該坩鍋內,並加熱使該矽熔料熔融形成一矽熔湯;自該坩鍋內底面朝上凝固該矽熔湯,而位於該成核空間內的矽熔湯透過該成核空間的限制,使其於凝固時,晶粒成長的尺寸受抑制;將該矽熔湯凝固形成一半成品,其中,該半成品界定有一大致平行於該坩鍋內底面的切割面,且該半成品位於該切割面與該坩鍋內底面之間的部位被定義為一模板式引晶結構,該模板式引晶結構包含該些引晶顆粒及連結該些引晶顆粒的一固態矽,而該半成品的其他部位被定義為一矽鑄錠;以及取出該半成品並沿其切割面切割以形成該矽鑄錠以及該模板式引晶結構。An embodiment of the present invention further provides a method for manufacturing a bismuth ingot using the above seeding particles, the method comprising: providing a crucible, and taking a specific amount of seed crystal particles according to an area of a bottom surface of the crucible; The seeding particles are arranged in a layered manner on the bottom surface of the crucible, and the seeding particles are surrounded by the bottom surface of the crucible to define a nucleation space; a crucible is placed in the crucible, and Heating to melt the crucible melt to form a crucible; solidifying the crucible soup from the bottom surface of the crucible, and the crucible soup located in the nucleation space passes through the restriction of the nucleation space to solidify The size of the grain growth is inhibited; the enamel melt is solidified to form a half finished product, wherein the semi-finished product defines a cutting surface substantially parallel to the inner bottom surface of the crucible, and the semi-finished product is located in the cutting surface and the crucible The portion between the bottom surfaces is defined as a template-type seeding structure, the template-type seeding structure comprising the seeding particles and a solid crucible connecting the seeding particles, and the other portion of the semi-finished product is defined as a Ingot; and take out the half Product and cut along the cut surface of the silicon ingot to form the template type and seeding structure.
較佳地,該矽鑄錠製造方法步驟進一步包括:提供與該坩鍋實質相同的另一坩鍋;將該模板式引晶結構置於該另一坩鍋內底面上;以及將與該矽熔料實質相同的另一矽熔料置入該另一坩鍋內,並加熱使該另一矽熔料及該模板式引晶結構的固態矽熔融形成另一矽熔湯。Preferably, the step of manufacturing the bismuth ingot further comprises: providing another crucible substantially the same as the crucible; placing the template-type seeding structure on the bottom surface of the other crucible; and Another crucible of substantially the same melt is placed in the other crucible and heated to melt the further crucible and the solid crucible of the template-type seeding structure to form another crucible.
本發明實施例又提供一種於上述矽鑄錠製造方法中所形成的模板式引晶結構。The embodiment of the invention further provides a template-type seeding structure formed in the above-described method for manufacturing a tantalum ingot.
綜上所述,本發明實施例所提供的定向凝固裝置、矽鑄錠製造方法、及模板式引晶結構,其利於使位於坩鍋底部的矽熔湯所凝固之晶粒具有較小的粒徑,進而降低矽熔湯所凝固形成的矽鑄錠內部缺陷。In summary, the directional solidification device, the bismuth ingot manufacturing method, and the template-type seeding structure provided by the embodiments of the present invention facilitate the solidification of the grains in the crucible at the bottom of the crucible having smaller grains. The diameter, in turn, reduces the internal defects of the bismuth ingot formed by the solidification of the smelting soup.
為使能更進一步瞭解本發明之特徵及技術內容,請參閱以下有關本發明之詳細說明與附圖,但是此等說明與所附圖式僅係用來說明本發明,而非對本發明的權利範圍作任何的限制。The detailed description of the present invention and the accompanying drawings are to be understood by the claims The scope is subject to any restrictions.
請參閱圖1至圖6,其為本發明的第一實施例,其中,圖1、圖4、及圖5為本實施例的剖視示意圖,圖2、圖3、及圖6為本實施例的俯視示意圖。1 to FIG. 6, which is a first embodiment of the present invention, wherein FIG. 1, FIG. 4, and FIG. 5 are schematic cross-sectional views of the embodiment, and FIG. 2, FIG. 3, and FIG. A schematic top view of an example.
復參照圖1和圖2所示,本實施例為一種定向凝固裝置100,其包括一坩鍋110以及一引晶結構120。Referring to Figures 1 and 2, this embodiment is a directional solidification apparatus 100 that includes a crucible 110 and a seeding structure 120.
其中,上述坩鍋110呈中空方柱狀且包含一內底面111以及連接於上述內底面111的一環側面112。藉此,透過坩鍋110的內底面111與環側面112包圍形成的空間,以盛裝一矽熔湯200(如圖9)。The crucible 110 has a hollow square column shape and includes an inner bottom surface 111 and a ring side surface 112 connected to the inner bottom surface 111. Thereby, the formed space is surrounded by the inner bottom surface 111 of the crucible 110 and the ring side surface 112 to accommodate a molten soup 200 (see FIG. 9).
所述引晶結構120包含數個引晶顆粒121,該些引晶顆粒121就材質上來說,可以為碳化物顆粒、石墨顆粒與氮化物顆粒的至少其中之一。The seeding structure 120 includes a plurality of seeding particles 121, which may be at least one of carbide particles, graphite particles and nitride particles.
其中,碳化物顆粒的較佳選擇為碳化矽顆粒,而氮化物顆粒的較佳選擇為氮化矽顆粒,但於實際應用時,只要引晶顆粒121的材質可在高溫環境(如:矽熔料熔融成矽熔湯時的溫度)下不與矽反應且不分解即可,並不受限於上述的較佳實施材質。Among them, the preferred choice of carbide particles is tantalum carbide particles, and the preferred choice of nitride particles is tantalum nitride particles, but in practical applications, as long as the material of the seed crystal particles 121 can be in a high temperature environment (such as: melting The material does not react with hydrazine and does not decompose under the temperature at which the material is melted into a bismuth melt, and is not limited to the preferred material described above.
再者,所述引晶顆粒121係層狀地排列於坩鍋110內底面111,且該些引晶顆粒121與內底面111包圍界定出一 成核空間122。Furthermore, the seeding particles 121 are arranged in a layered manner on the bottom surface 111 of the crucible 110, and the seeding particles 121 are surrounded by the inner bottom surface 111 to define a Nucleation space 122.
須說明的是,於本實施例中,該些引晶顆粒121可分別為圓球狀,且彼此緊鄰地排列。而引晶顆粒121的排列方式可如同圖2所示的錯位排列,或者如同圖3所示的矩陣式排列。It should be noted that, in this embodiment, the seed crystal particles 121 may be spherical and arranged in close proximity to each other. The seed crystal particles 121 can be arranged in the same manner as the misalignment shown in FIG. 2 or in a matrix arrangement as shown in FIG.
其中,該些引晶顆粒121的直徑實質相同,且每一引晶顆粒121的直徑大致為0.5公釐至40公釐。而上述引晶顆粒121與坩鍋110內底面111所界定之成核空間122,其密度在此不加以限制,較佳為30%至90%。The diameters of the seed crystal particles 121 are substantially the same, and each of the seed crystal particles 121 has a diameter of approximately 0.5 mm to 40 mm. The density of the nucleation space 122 defined by the above-mentioned seed crystal particles 121 and the bottom surface 111 of the crucible 110 is not limited thereto, and is preferably 30% to 90%.
再者,所述引晶結構120(即上述引晶顆粒121)設置於坩鍋110內底面111上時,坩鍋110環側面112頂緣離內底面111的距離D1為引晶結構120頂緣離內底面111的距離D2之至少五倍。更詳細地說,引晶結構120的高度D2較佳為坩鍋110環側面112高度D1的15%以下。Moreover, when the seed crystal structure 120 (ie, the seeding particles 121) is disposed on the bottom surface 111 of the crucible 110, the distance D1 of the top edge of the ring side surface 112 of the crucible 110 from the inner bottom surface 111 is the top edge of the seed crystal structure 120. At least five times the distance D2 from the inner bottom surface 111. In more detail, the height D2 of the seed crystal structure 120 is preferably 15% or less of the height D1 of the ring side surface 112 of the crucible 110.
換言之,在達到上述條件的情況下,該些引晶顆粒121可不局限於排列為一層,該些引晶顆粒121亦可排列成兩層以上(如圖4)。舉例來說,若引晶顆粒121排列為一層,則引晶顆粒121的直徑較佳為坩鍋110環側面112高度D1的15%以下。In other words, in the case where the above conditions are met, the seeding particles 121 are not limited to being arranged in one layer, and the seeding particles 121 may be arranged in two or more layers (as shown in FIG. 4). For example, if the seed crystal particles 121 are arranged in a layer, the diameter of the seed crystal particles 121 is preferably 15% or less of the height D1 of the ring side surface 112 of the crucible 110.
此外,該些引晶顆粒121’亦可分別為柱狀(如圖5和圖6),且彼此間隔地呈矩陣式排列,以形成使用者所需之成核空間122’。於實際應用時,較佳的排列方式為矩陣狀,但不受限於此。In addition, the seed crystal particles 121' may also be columnar (as in Figures 5 and 6) and arranged in a matrix at intervals to form a nucleation space 122' desired by the user. In practical applications, the preferred arrangement is matrix, but is not limited thereto.
更詳細地說,該些引晶顆粒121’為外型實質相同的方柱,且每一引晶顆粒121’的橫截面(大致平行於內底面111)邊長L大致為0.5公釐至40公釐。並且,上述引晶顆粒121’ 與內底面111’所界定之成核空間122’,其密度較佳亦為30%至90%。In more detail, the seed crystal particles 121' are substantially identical square pillars, and the cross section of each seed crystal particle 121' (substantially parallel to the inner bottom surface 111) has a side length L of approximately 0.5 mm to 40. PCT. And, the above seeding particles 121' The nucleation space 122' defined by the inner bottom surface 111' preferably has a density of 30% to 90%.
綜上所述,定向凝固裝置100可用以凝固矽熔湯200(如圖9),且引晶結構120、120’用以於凝固矽熔湯200時,能抑制位於成核空間122、122’內的矽熔湯200之晶粒生長尺寸。藉此,使得利用本實施例定向凝固裝置100所形成的矽鑄錠213,可降低其內部之缺陷。In summary, the directional solidification device 100 can be used to solidify the sputum melt soup 200 (as shown in FIG. 9), and the seed crystal structure 120, 120 ′ can be used to inhibit the nucleation space 122, 122 ′ when the sputum melting soup 200 is solidified. The grain growth size of the inner melting soup 200. Thereby, the defect of the inside can be reduced by using the tantalum ingot 213 formed by the directional solidification apparatus 100 of the present embodiment.
請參閱圖7至14所示,其為本發明的第二實施例,本實施例與第一實施例不同之處主要在於,本實施例主要是使用第一實施例之引晶顆粒121的矽鑄錠製造方法。Referring to FIG. 7 to FIG. 14 , which is a second embodiment of the present invention, the difference between this embodiment and the first embodiment is mainly that the present embodiment mainly uses the seeding particles 121 of the first embodiment. Ingot manufacturing method.
由於本實施例所述及之構造大致成對稱狀,且經由第一實施例即可輕易推知其構造。因此,為便於說明,下述將以剖視圖進行描述。本實施例的矽鑄錠製造方法之步驟,大致如下所述。Since the configuration described in the embodiment is substantially symmetrical, the configuration can be easily inferred from the first embodiment. Therefore, for convenience of explanation, the following description will be made in a sectional view. The steps of the method for producing a niobium ingot of the present embodiment are roughly as follows.
步驟S101:如圖7所示,提供一坩鍋110,且依坩鍋110內底面111的面積取用一特定數量的引晶顆粒121。其中,上述引晶顆粒121的特定數量較佳為,足夠使引晶顆粒121排列為層狀之數量,但不以此為限。Step S101: As shown in FIG. 7, a crucible 110 is provided, and a specific number of seeding particles 121 are taken according to the area of the bottom surface 111 of the crucible 110. The specific number of the seed crystal particles 121 is preferably a number sufficient to arrange the seed crystal particles 121 in a layer shape, but is not limited thereto.
步驟S102:如圖8所示,將該些引晶顆粒121層狀地排列設置於坩鍋110內底面111上,並使該些引晶顆粒121與坩鍋110內底面111包圍界定出一成核空間122。Step S102: As shown in FIG. 8, the seeding particles 121 are arranged in a layered manner on the bottom surface 111 of the crucible 110, and the seeding particles 121 are surrounded by the bottom surface 111 of the crucible 110 to define a Nuclear space 122.
其中,圖8所示之引晶顆粒121的排列方式,可參酌圖2和圖3所示,但不以此為限。The arrangement of the seed crystal particles 121 shown in FIG. 8 can be as shown in FIG. 2 and FIG. 3, but is not limited thereto.
步驟S103:如圖9所示,將一矽熔料(圖未示)置入上 述坩鍋110內,並進行加熱以使所述矽熔料熔融形成一矽熔湯200。Step S103: As shown in FIG. 9, a crucible (not shown) is placed thereon. The crucible 110 is heated and heated to melt the crucible to form a crucible 200.
步驟S104:如圖10所示,自坩鍋110內底面111朝上凝固上述矽熔湯200。其中,位於上述成核空間122內的矽熔湯200,因成核空間122的限制,使其於凝固時,晶粒成長的尺寸受抑制(即抑制初期大晶粒之生長)。Step S104: As shown in FIG. 10, the crucible soup 200 is solidified upward from the bottom surface 111 of the crucible 110. Among them, the crucible soup 200 located in the nucleation space 122 is restricted by the nucleation space 122, so that the size of grain growth is suppressed during solidification (that is, the growth of the initial large crystal grains is suppressed).
步驟S105:如圖11所示,將矽熔湯200凝固形成一半成品210。其中,所述半成品210成柱狀並界定有一大致平行於坩鍋110內底面111的切割面211,且半成品210位於切割面211與坩鍋110內底面111之間的部位被定義為一模板式引晶結構212,而半成品210的其他部位被定義為一矽鑄錠213。Step S105: As shown in FIG. 11, the crucible soup 200 is solidified to form a half finished product 210. The semi-finished product 210 is columnar and defines a cutting surface 211 substantially parallel to the bottom surface 111 of the crucible 110, and a portion of the semi-finished product 210 between the cutting surface 211 and the bottom surface 111 of the crucible 110 is defined as a template. The seeding structure 212, while the other portion of the semi-finished product 210 is defined as a tantalum ingot 213.
更詳細地說,上述模板式引晶結構212包含該些引晶顆粒121及連結該些引晶顆粒121的一固態矽214。In more detail, the template seeding structure 212 includes the seeding particles 121 and a solid crucible 214 connecting the seeding particles 121.
步驟S106:如圖12所示,取出所述半成品210並沿其切割面211切割以形成矽鑄錠213以及模板式引晶結構212。藉此,即可取得所需之矽鑄錠213,而模板式引晶結構212則可用以取代步驟S101中的引晶顆粒121,進而續行後續步驟以取得另一矽鑄錠(圖未示)。Step S106: As shown in FIG. 12, the semi-finished product 210 is taken out and cut along its cutting surface 211 to form a tantalum ingot 213 and a template-type seeding structure 212. Thereby, the desired tantalum ingot 213 can be obtained, and the template seeding structure 212 can be used to replace the seeding particles 121 in the step S101, and then continue the subsequent steps to obtain another tantalum ingot (not shown) ).
步驟S107:如圖13所示,提供與上述坩鍋110實質相同的另一坩鍋110’,並將模板式引晶結構212置於另一坩鍋110’內底面111’上。Step S107: As shown in Fig. 13, another crucible 110' substantially the same as the crucible 110 described above is provided, and the template seeding structure 212 is placed on the bottom surface 111' of the other crucible 110'.
步驟S108:如圖14所示,將與上述矽熔料實質相同的另一矽熔料(圖未示)置入另一坩鍋110’內,並進行加熱以使另一矽熔料及模板式引晶結構212的固態矽214熔融形成另一矽熔湯200’。Step S108: As shown in FIG. 14, another crucible (not shown) substantially the same as the crucible is placed in another crucible 110', and heated to make another crucible and template The solid crucible 214 of the seeding structure 212 melts to form another crucible 200'.
其後,重複步驟S104至步驟S106,即可取得另一矽鑄錠及另一模板式引晶結構。而此另一模板式引晶結構則可續而被使用以重複上述步驟S106至步驟S108,再接續步驟S104至步驟S106。Thereafter, by repeating steps S104 to S106, another tantalum ingot and another template seeding structure can be obtained. The other template-type seeding structure can be used continuously to repeat steps S106 to S108 described above, and then to step S104 to step S106.
藉此,利用本實施例矽鑄錠製造方法所形成的矽鑄錠213,可降低其內部之缺陷。Thereby, the ruthenium ingot 213 formed by the ruthenium ingot production method of the present embodiment can reduce the defects therein.
再者,如圖15所示,其為本實施例於引晶顆粒121直徑為1mm時所形成的矽鑄錠213相較於習知未使用引晶結構時所形成之矽鑄錠的兩者缺陷面積密度比較示意圖。Further, as shown in FIG. 15, it is the case that the tantalum ingot 213 formed when the seed crystal grain 121 has a diameter of 1 mm is the same as the conventional tantalum ingot formed when the seed crystal structure is not used. A schematic diagram of the comparison of defect area density.
其中,A1代表本實施例的矽鑄錠213經切割後位於中央區域的晶碇,A2代表本實施例的矽鑄錠213經切割後位於側邊與角落區域的晶碇。而B1代表習知的矽鑄錠經切割後位於中央區域的晶碇,B2代表習知的矽鑄錠經切割後位於側邊與角落區域的晶碇。Here, A1 represents the wafer in the central region after the tantalum ingot 213 of the present embodiment is cut, and A2 represents the wafer in the side and corner regions after the tantalum ingot 213 of the present embodiment is cut. B1 represents a conventional crucible ingot in the central region after being cut, and B2 represents a conventional crucible ingot which is cut in the side and corner regions.
由圖15即可清楚得知,本實施例所形成的矽鑄錠213相較於習知而言,其缺陷面積密度顯然得到大幅地改善,具有習知技術無法預期之效果。As is clear from Fig. 15, the defect ingot density of the tantalum ingot 213 formed in the present embodiment is remarkably improved as compared with the conventional one, and has an effect unpredictable by the conventional technique.
此外,本實施例的矽鑄錠213經切割後的晶碇,於其底部的晶粒經測試後得知直徑約為0.7cm。然而,習知的矽鑄錠經切割後的晶碇之底部晶粒直徑約為1.3至1.8cm。也就是說,本實施例所述定向凝固裝置100的碳化物結構120用以於凝固矽熔湯200時,確實能抑制位於成核空間122內的矽熔湯200之晶粒生長的尺寸。In addition, the ruthenium ingot 213 of this embodiment was subjected to dicing, and the crystal grains at the bottom thereof were tested to have a diameter of about 0.7 cm. However, the crystal grain size of the wafer of the conventional tantalum ingot after cutting is about 1.3 to 1.8 cm. That is to say, the carbide structure 120 of the directional solidification apparatus 100 of the present embodiment is used to suppress the size of grain growth of the crucible soup 200 located in the nucleation space 122 when the crucible soup 200 is solidified.
再者,於本實施例中所形成的模板式引晶結構212,其可使引晶顆粒121被有效地重複利用,進而簡化上述步驟S101與步驟S102之過程,達到提升矽鑄錠213之生產效率 的功效。Furthermore, the template-type seeding structure 212 formed in the embodiment can effectively use the seeding particles 121 to be reused, thereby simplifying the processes of the above steps S101 and S102, thereby improving the production of the bismuth ingot 213. effectiveness The effect.
此外,須說明的是,本實施例中係以圓球狀的引晶顆粒121進行說明,但於實際使用時,引晶顆粒121並不受限於圓球狀。換言之,引晶顆粒121亦可為柱狀或不規則狀之顆粒。In addition, in the present embodiment, the spherical seeding particles 121 are described as being spherical, but in actual use, the seeding particles 121 are not limited to a spherical shape. In other words, the seed crystal particles 121 may also be columnar or irregular particles.
再者,本發明所述之矽鑄錠213所使用的矽熔料可為多晶矽或單晶矽,亦即,矽鑄錠213可為多晶矽長晶所形成或單晶矽長晶所形成。換個角度來說,矽鑄錠213可以為太陽能晶棒單元、半導體晶棒單元、或藍寶石晶棒單元,在此不加以限制。Furthermore, the tantalum melt used in the tantalum ingot 213 of the present invention may be polycrystalline germanium or single crystal germanium, that is, the tantalum ingot 213 may be formed of polycrystalline germanium grown or single crystal germanium grown. In other words, the crucible ingot 213 may be a solar ingot unit, a semiconductor ingot unit, or a sapphire ingot unit, which is not limited herein.
根據本發明實施例,具有上述引晶顆粒的定向凝固裝置及使用上述引晶顆粒的矽鑄錠製造方法,其皆可透過成核空間,以促進位於成核空間內的矽熔湯形成較小之晶粒,藉以降低矽鑄錠內的缺陷。According to an embodiment of the present invention, a directional solidification device having the above-mentioned seed crystal particles and a method for manufacturing a ruthenium ingot using the above-mentioned seed crystal particles can all pass through a nucleation space to promote formation of a bismuth melt soup located in the nucleation space. The grain is used to reduce defects in the ingot casting.
再者,使用者可透過選用引晶顆粒之型態或以不同排列方式設置引晶顆粒,以使成核空間形成使用者所需之空間型態。Furthermore, the user can set the seeding particles by using the type of seed crystal particles or in different arrangement manners, so that the nucleation space forms a spatial pattern desired by the user.
另,引晶顆粒於第一次使用後,可與固態矽連結形成模板狀引晶結構,藉以使引晶顆粒被有效地重複利用,並簡化使用引晶顆粒的前置步驟,進而達到提升矽鑄錠之生產效率的功效。In addition, after the first use, the seed crystal particles can be joined with the solid ruthenium to form a template-like seed crystal structure, so that the seed crystal particles can be effectively reused, and the pre-step of using the seed crystal particles is simplified, thereby achieving the lifting. The efficiency of the production efficiency of ingots.
以上所述僅為本發明之實施例,其並非用以侷限本發明之專利範圍。The above description is only an embodiment of the present invention, and is not intended to limit the scope of the invention.
100‧‧‧定向凝固裝置100‧‧‧Directional coagulation device
110、110’‧‧‧坩鍋110, 110’‧‧‧ Shabu Shabu
111、111’‧‧‧內底面111, 111'‧‧‧ inside bottom
112‧‧‧環側面112‧‧‧ ring side
120、120’‧‧‧引晶結構120, 120'‧‧‧ seeding structure
121、121’‧‧‧引晶顆粒121, 121'‧‧‧ seeding particles
122、122’‧‧‧成核空間122, 122’ ‧ ‧ nucleation space
200、200’‧‧‧矽熔湯200,200’‧‧‧矽 矽 molten soup
210‧‧‧半成品210‧‧‧Semi-finished products
211‧‧‧切割面211‧‧‧cut face
212‧‧‧模板式引晶結構212‧‧‧Template-type seeding structure
213‧‧‧矽鑄錠213‧‧‧矽Ingots
214‧‧‧固態矽214‧‧‧ Solid state
L‧‧‧引晶顆粒的橫截面邊長L‧‧‧ cross-section side length of seeding particles
D1‧‧‧坩鍋環側面頂緣離內底面的距離D1‧‧‧Distance from the top edge of the side of the crucible ring from the inner bottom surface
D2‧‧‧引晶結構頂緣離內底面的距離D2‧‧‧Distance of the top edge of the seeding structure from the inner bottom surface
圖1為本發明第一實施例所述定向凝固裝置的剖視示意圖;圖2為圖1的俯視示意圖;圖3為圖1另一排列形式的俯視示意圖;圖4為本發明第一實施例所述定向凝固裝置之引晶顆粒排列為兩層的剖視示意圖;圖5為本發明第一實施例所述定向凝固裝置之引晶顆粒為另一態樣的剖視示意圖;圖6為圖5的俯視示意圖;圖7為本發明第二實施例矽鑄錠製造方法之步驟S101的流程示意圖;圖8為本發明第二實施例矽鑄錠製造方法之步驟S102的流程示意圖;圖9為本發明第二實施例矽鑄錠製造方法之步驟S103的流程示意圖;圖10為本發明第二實施例矽鑄錠製造方法之步驟S104的流程示意圖;圖11為本發明第二實施例矽鑄錠製造方法之步驟S105的流程示意圖;圖12為本發明第二實施例矽鑄錠製造方法之步驟S106的流程示意圖;圖13為本發明第二實施例矽鑄錠製造方法之步驟S107的流程示意圖;圖14為本發明第二實施例矽鑄錠製造方法之步驟S108的 流程示意圖;及圖15為本發明所形成之矽鑄錠相較於習知矽鑄錠兩者的缺陷面積密度示意圖。1 is a schematic cross-sectional view of a directional solidification apparatus according to a first embodiment of the present invention; FIG. 2 is a top plan view of FIG. 1; FIG. 3 is a top plan view of another arrangement of FIG. The seeding particles of the directional solidification device are arranged in a two-layer schematic view; FIG. 5 is a cross-sectional view showing another aspect of the seeding particles of the directional solidification device according to the first embodiment of the present invention; FIG. 5 is a schematic plan view of a step S101 of a method for manufacturing a bismuth ingot according to a second embodiment of the present invention; FIG. 8 is a schematic flow chart of a step S102 of a method for manufacturing a bismuth ingot according to a second embodiment of the present invention; FIG. 10 is a schematic flow chart of step S104 of the method for manufacturing the ingot casting ingot according to the second embodiment of the present invention; FIG. 11 is a schematic view showing the step S104 of the method for manufacturing the ingot casting ingot according to the second embodiment of the present invention; FIG. 12 is a schematic flow chart of step S106 of the method for manufacturing the ingot casting ingot according to the second embodiment of the present invention; and FIG. 13 is a flow chart of the step S107 of the method for manufacturing the ingot casting ingot according to the second embodiment of the present invention. Show FIG.; FIG. 14 A method of manufacturing a silicon ingot step S108 a second embodiment of the present invention. Schematic diagram of the process; and Figure 15 is a schematic view showing the defect area density of the tantalum ingot formed by the present invention compared to the conventional tantalum ingot.
100‧‧‧定向凝固裝置100‧‧‧Directional coagulation device
110‧‧‧坩鍋110‧‧‧坩锅
111‧‧‧內底面111‧‧‧ inside bottom
112‧‧‧環側面112‧‧‧ ring side
120‧‧‧引晶結構120‧‧‧ seeding structure
121‧‧‧引晶顆粒121‧‧‧ seeding particles
122‧‧‧成核空間122‧‧‧Nuclear space
D1‧‧‧坩鍋環側面頂緣離內底面的距離D1‧‧‧Distance from the top edge of the side of the crucible ring from the inner bottom surface
D2‧‧‧引晶結構頂緣離內底面的距離D2‧‧‧Distance of the top edge of the seeding structure from the inner bottom surface
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