TWI463237B - A mems display with touch control function - Google Patents
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本發明是有關於一種微機電顯示器,且特別是有關於一種具有觸控功能之微機電顯示器。The present invention relates to a microelectromechanical display, and more particularly to a microelectromechanical display having a touch function.
平面顯示器由於具有體積小、重量輕的特性,在可攜式顯示設備,以及小空間應用的顯示器市場中極具優勢。目前市場主流的平面顯示裝置是液晶顯示器(Liquid Crystal Display,LCD)。然而,傳統之液晶顯示器需使用背光源,不僅耗能,且整體顯示模組之厚度將因背光源之關係無法降低,當使用於要求輕、薄、短、小之手持式裝置中,將成為瓶頸所在。因此,一種新的以微機電(Micro-Electro-Mechanical Systems,MEMS)系統製造之顯示器被發展出來。微機電是將微電子技術與機械工程融合到一起的一種工業技術,它的操作範圍在微米範圍內。而微機電顯示器是結合微機電系統(MEMS)技術,製作成中小尺寸的顯示器,裝置體積可以非常小,由於可以不需要背光源,所以非常省電,並可具有反射式功能,可在戶外下使用,適合應用在手持式行動裝置,常見之微機電顯示器,例如:頭戴型(Hand Mounted Display,HMD),光干涉顯示器用於手持式裝置、平板、手機等等,或是搭配光機引擎投影裝置,以數位微鏡陣列(:Micro-Mirror Array),來做成數位微鏡投影裝置等。Flat panel displays are advantageous in portable display devices and display markets for small space applications due to their small size and light weight. The mainstream flat display device currently on the market is a liquid crystal display (LCD). However, the conventional liquid crystal display needs to use a backlight, which not only consumes energy, but also the thickness of the overall display module cannot be reduced due to the relationship of the backlight. When used in a handheld device that requires light, thin, short, and small, it will become The bottleneck is there. Therefore, a new display manufactured by Micro-Electro-Mechanical Systems (MEMS) system has been developed. Microelectromechanics is an industrial technology that combines microelectronics and mechanical engineering with a range of operations in the micrometer range. The micro-electromechanical display is combined with micro-electromechanical system (MEMS) technology to produce a small and medium-sized display. The device can be very small in size. Since it can be used without a backlight, it is very power-saving and can have a reflective function. Suitable for use in handheld mobile devices, common MEMS displays such as Hand Mounted Display (HMD), optical interference displays for handheld devices, tablets, mobile phones, etc., or with a optomechanical engine The projection device is a digital micromirror array device (Micro-Mirror Array).
其中,光干涉顯示器的每一個畫素均為微機電系統(MEMS)製程技術所製作的元件,在每個畫素的基板上方製作位置固定的薄膜與可以上下振動的反射、干涉共振薄膜,經由控制該薄膜的電場,使其相互吸引或排斥成一特定間距,利用不同光波之間的干涉共振現象來控制特定波長波段的反射亮暗、或穿透亮暗,或是讓自然光經過反射不同波段的光,呈現各種不同的顏色,來達到顯示不同顏色的目的。Wherein, each pixel of the optical interference display is a component manufactured by a microelectromechanical system (MEMS) process technology, and a fixed film and a reflection and interference resonance film capable of vibrating up and down are formed on the substrate of each pixel. Controlling the electric field of the film to attract or repel each other to a specific spacing, using interference resonance between different light waves to control the reflection of light in a specific wavelength band, or to penetrate light and dark, or to allow natural light to pass through different wavelength bands. Light, in a variety of different colors, to achieve the purpose of displaying different colors.
而微鏡陣列裝置主要是用在投影系統上,微鏡陣列裝置主要是利用微機電系統的製程技術,在矽晶片表面製作上百萬個微小的反射鏡,每個反射鏡的尺寸只有數十微米或更小,數位微鏡的下方是可以利用電壓控制而左右或前後翻轉的轉軸,每個數位微鏡都可以單獨控制往左或往右、或前或後的翻轉,甚或轉動不同或特定轉角角度,因此可以將投影系統之光線反射到不同或特定的位置。每一個反射鏡對應到顯示器的一個畫素(Pixel),當把這些畫素整合起來的時就組成了一個完整的畫面,換句話說,顯示器的解析度有多少畫素,就有多少個數位微鏡陣列。The micromirror array device is mainly used in the projection system. The micromirror array device mainly uses the micro-electromechanical system process technology to make millions of tiny mirrors on the surface of the germanium wafer, each of which is only tens in size. Micron or smaller, below the digital micromirror is a rotating shaft that can be rotated left and right or back and forth by voltage control. Each digital micromirror can individually control the left or right, or the front or back flip, or even rotate differently or specificly. The corner angle allows the light from the projection system to be reflected to different or specific locations. Each mirror corresponds to a pixel (Pixel) of the display. When these pixels are integrated, they form a complete picture. In other words, how many pixels are there in the resolution of the display, and how many digits there are. Micromirror array.
因此,如何讓微機電顯示元結合觸控功能的應用,即成為追求之目標。Therefore, how to make the application of MEMS display elements combined with touch functions become the goal of pursuit.
本發明之一目的即是在提供一種具觸控功能之微機電(MEMS)系統顯示器。It is an object of the present invention to provide a microelectromechanical (MEMS) system display with touch functionality.
本發明之一態樣在提供一種微機電顯示器,至少包含:一第一基板,其中該第一基板具有一控制陣列;一觸控單元;以及複數個微機電顯示單元配置於該第一基板上,其中該控制陣列控制該些個微機電顯示單元。在一實施例中每一該些微機電顯示單元有動作、相對位移、轉動、形變、振動。An aspect of the present invention provides a MEMS display including at least: a first substrate, wherein the first substrate has a control array; a touch unit; and a plurality of MEMS display units are disposed on the first substrate Wherein the control array controls the plurality of microelectromechanical display units. In one embodiment, each of the MEMS display units has motion, relative displacement, rotation, deformation, and vibration.
在一實施例中,每一該些微機電顯示單元為一光干涉式顯示單元,其中該光干涉式顯示單元具有一單一腔室,或是具有複數腔室。In one embodiment, each of the MEMS display units is an optical interferometric display unit, wherein the optical interferometric display unit has a single chamber or has a plurality of chambers.
在一實施例中,該光干涉式顯示單元更包括:一第一電極形成於該第一基板上;一第二電極配置於該第一電極上;以及一支撐物配置於該第一電極和該第二電極間,用以支撐該第二電極以於該第一電極和該第二電極間形成一腔室(Cavity)。In an embodiment, the optical interferometric display unit further includes: a first electrode formed on the first substrate; a second electrode disposed on the first electrode; and a support disposed on the first electrode and The second electrode is configured to support the second electrode to form a cavity between the first electrode and the second electrode.
在一實施例中,其中該光干涉式顯示單元之該複數腔室(Cavity)可以是具有不同的特定間距。In an embodiment, the plurality of chambers of the optical interferometric display unit may have different specific spacings.
在一實施例中,該光干涉式顯示單元之該複數腔室具有三種特定的間距,可以反射出紅光、綠光、藍光的波段之色光。In one embodiment, the plurality of chambers of the optical interferometric display unit have three specific spacings that reflect the color of the red, green, and blue light bands.
在一實施例中,其中數個光干涉式顯示單元相互組合成一光干涉式顯示器,可以反射出青光、紫紅光、黃光等的不同波段之色光。In one embodiment, a plurality of optical interferometric display units are combined with each other to form an optical interferometric display, which can reflect colored light of different wavelengths of cyan, magenta, yellow, and the like.
在一實施例中,其中該光干涉式顯示單元之該複數腔室具有不同的特定間距,數個該複數腔室相互組合成一光干涉式顯示器,可以反射出青光、紫紅光、黃光等的不同波段之色光。In an embodiment, the plurality of chambers of the optical interferometric display unit have different specific spacings, and the plurality of the plurality of chambers are combined with each other to form an optical interferometric display, which can reflect cyan, magenta, yellow, etc. The color of the different bands.
在一實施例中,該觸控單元包含該控制陣列的至少一組複數導線或改良設計自該組複數導線。In one embodiment, the touch unit includes at least one set of multiple wires of the control array or a modified design from the set of plurality of wires.
在一實施例中,觸控單元包括:一感測器;一第一選擇單元耦接該感測器;一第二選擇單元耦接該感測器;複數條第一導線平行排列於一第一方向上,其中每一該些第一導線之一端耦接該第一選擇單元;以及複數條第二導線平行排列於一第二方向上,其中每一該些第二導線之一端耦接該第二選擇單元。In one embodiment, the touch unit includes: a sensor; a first selection unit coupled to the sensor; a second selection unit coupled to the sensor; the plurality of first wires are arranged in parallel In one direction, one of the first wires is coupled to the first selection unit; and the plurality of second wires are parallel arranged in a second direction, wherein one of the second wires is coupled to the second terminal Second selection unit.
在一實施例中,當該觸控單元進行一電容式、光學感應式、超音波、電阻式、壓力感應式觸控應用時,以一第二操作方法來檢測、感應觸控之電荷量、電容感應、或電壓、電流訊號之信號,以數值運算判斷發生感應變化之位置、距離、觸碰高度以及觸碰點。In an embodiment, when the touch unit performs a capacitive, optical, ultrasonic, resistive, or pressure-sensitive touch application, the second operation method detects and senses the amount of charge of the touch. The capacitance sensing, or the signal of the voltage and current signals, is used to determine the position, distance, touch height and touch point of the induced change.
在一實施例中,觸控單元包括:一感測器;一第一選擇單元耦接該感測器;一第二選擇單元耦接該感測器;一第一控制單元耦接該感測器;一第二控制單元耦接該感測器;複數條第一導線平行排列於一第一方向上,其中每一該些第一導線之一端耦接該第一控制單元另一端耦接該第一選擇單元;以及複數條第二導線平行排列於一第二方向上,並與該些第一導線交叉,其中每一該些第二導線之一端耦接該第二控制單元另一端耦接該第二選擇單元。In one embodiment, the touch unit includes: a sensor; a first selection unit coupled to the sensor; a second selection unit coupled to the sensor; a first control unit coupled to the sensing a second control unit is coupled to the sensor; the plurality of first wires are arranged in parallel in a first direction, wherein one end of each of the first wires is coupled to the other end of the first control unit a first selection unit; and a plurality of second wires are arranged in parallel in a second direction and intersect with the first wires, wherein one end of each of the second wires is coupled to the other end of the second control unit The second selection unit.
在一實施例中,該些條第一導線或第二導線至少包括一導線改良設計或搭配設計自微機電顯示器陣列之掃瞄線、資料線、輔助線、偏壓線或電源線、共電極線、信號線、讀取線、偏壓線、控制線、或補償電路等線路。In an embodiment, the first wire or the second wire comprises at least one wire improvement design or a scan line, a data line, an auxiliary line, a bias line or a power line, and a common electrode designed from the MEMS display array. Lines, signal lines, read lines, bias lines, control lines, or compensation circuits.
在一實施例中,該些第一導線和該些第二導線是由金屬、合金線路、透明導電材、ITO、IZO或奈米碳管CNT所形成。In one embodiment, the first wires and the second wires are formed of a metal, an alloy wire, a transparent conductive material, ITO, IZO, or a carbon nanotube CNT.
在一實施例中,當該觸控單元進行一電磁式觸控應用時,該第一控制單元將該些第一導線之一端共同連接至一第一導通線,該第一選擇單元根據一順序,以一定間距,依序串接該些條第一導線之另一端以在該第一方向上形成複數個迴路,以及該第二控制單元將該些第二導線之一端共同連接至一第二導通線,該第二選擇單根據一順序,以一定間距,依序串接該些條第二導線之另一端以在該第二方向上形成複數個迴路,並以一第一操作方法來檢測、感應到磁通量、電磁感應、或電壓、電流、頻率之觸控迴路信號,以數值運算判斷發生感應迴路變化之位置、距離、觸碰高度和觸碰點。In an embodiment, when the touch control unit performs an electromagnetic touch application, the first control unit commonly connects one of the first wires to a first conductive line, and the first selection unit is in accordance with an order. And connecting, at a certain interval, the other ends of the plurality of first wires to form a plurality of loops in the first direction, and the second control unit commonly connecting one of the second wires to a second a second control unit, according to a sequence, sequentially connecting the other ends of the second wires at a certain interval to form a plurality of loops in the second direction, and detecting by a first operation method The magnetic flux, electromagnetic induction, or voltage, current, and frequency touch loop signals are sensed, and the position, distance, touch height, and touch point of the induced loop change are determined by numerical operations.
在一實施例中,更包括:將該些條第一導線、第二導線分成複數群,其中每一群包括至少兩第一導線、或至少兩第二導線;該第一選擇單元根據一順序,依照一定間距,依序串接該些複數群的第一導線之另一端,以在該第一方向上形成複數個複數群迴路;該第二選擇單元根據一順序,依照一定間距,依序串接該些複數群的第二導線之另一端,以在該第二方向上形成複數個複數群迴路;依序傳送一檢測信號給該些複數群迴路,其中每一複數群迴路中之第一導線、第二導線接收或發射相同之檢測迴路信號、感應迴路訊號;以及以該第一操作方法來檢測、感應觸控之迴路信號,並以數值運算判斷發生感應迴路變化之位置、距離、觸碰高度和觸碰點。In an embodiment, the method further includes: dividing the plurality of first wires and the second wires into a plurality of groups, wherein each group includes at least two first wires, or at least two second wires; the first selecting unit is in accordance with an order Aligning the other ends of the first plurality of the plurality of groups in sequence according to a certain interval to form a plurality of complex group loops in the first direction; the second selecting unit sequentially according to a sequence according to a certain interval Connecting the other ends of the second wires of the plurality of groups to form a plurality of complex group circuits in the second direction; sequentially transmitting a detection signal to the plurality of group circuits, wherein the first of each complex group circuit The wire and the second wire receive or transmit the same detection loop signal and the inductive loop signal; and the first operation method is used to detect and sense the touch loop signal, and the position, distance, and touch of the inductive loop change are determined by numerical operations. Touch height and touch point.
在一實施例中,該第一操作方法,可以是分別對該第一、第二方向上,所依序形成之迴路傳送一特定頻率之檢測信號,來檢測該第一、第二方向上迴路所發生之磁通量、電磁感應或電壓、電流、頻率之變化,其中是由該感測器傳送該檢測信號至該第一、第二方向迴路,以檢測該各迴路的磁通量、電磁感應、或電壓、電流、頻率之觸控感應迴路信號。In an embodiment, the first operation method may be configured to respectively transmit a detection signal of a specific frequency to the sequentially formed loops in the first and second directions to detect the first and second direction loops. a change in magnetic flux, electromagnetic induction, or voltage, current, or frequency, wherein the sensor transmits the detection signal to the first and second direction loops to detect magnetic flux, electromagnetic induction, or voltage of the respective circuits. , current, frequency touch sensing loop signal.
在一實施例中,當該觸控單元進行一電磁感應方式和光學感應方式、超音波感應方式、電容感應方式、電阻感應方式、壓力感應方式之雙模式、多模式的感應觸控應用時,該第一控制單元中斷該些第一導線與一第一導通線間之耦接,以及該第二控制單元中斷該些第二導線與一第二導通線間之耦接,並以一第二操作方法來檢測、感應觸控之電荷量、電容感應、或電壓、電流訊號之信號,以數值運算判斷發生感應變化之位置、距離、觸碰高度以及觸碰點。In an embodiment, when the touch unit performs an electromagnetic induction method, an optical induction method, an ultrasonic induction method, a capacitance sensing method, a resistance sensing method, a pressure sensing mode dual mode, and a multi-mode sensing touch application, The first control unit interrupts the coupling between the first wires and a first conductive line, and the second control unit interrupts the coupling between the second wires and a second conductive line, and is a second The operation method detects and senses the amount of charge of the touch, the capacitance sensing, or the signals of the voltage and current signals, and determines the position, distance, touch height, and touch point of the induced change by numerical operation.
在一實施例中,更包括:將該些條第一導線、第二導線分成複數群,其中每一群包括至少兩第一導線、或至少兩第二導線;以及依序傳送一檢測信號給該些群,其中每一群中之第一導線、第二導線接收或發射相同之檢測信號、感應訊號;以及以該第二操作方法來檢測、感應觸控之信號,以數值運算判斷發生感應變化之位置、距離、觸碰高度和觸碰點。In an embodiment, the method further includes: dividing the plurality of first wires and the second wires into a plurality of groups, wherein each group includes at least two first wires, or at least two second wires; and sequentially transmitting a detection signal to the a group, wherein the first wire and the second wire of each group receive or transmit the same detection signal and the sensing signal; and the second operation method detects and senses the signal of the touch, and determines the induced change by numerical operation. Position, distance, touch height, and touch point.
在一實施例中,該第二操作方法,可以是感測器透過分別對該第一選擇單元發送一檢測信號至該第一方向上的第一導線;透過該第二選擇單元發送一檢測信號至該第二方向上的第二導線,以進行檢測每一導線所發生之電荷量、電容感應、或電壓、電流訊號之變化。In an embodiment, the second operation method may be: the sensor transmits a detection signal to the first selection unit to the first wire in the first direction; and the detection signal is sent through the second selection unit. And a second wire in the second direction to detect a change in the amount of charge, capacitance sensing, or voltage and current signals generated by each wire.
在一實施例中,該第二操作方法,可以是該感測器透過該第一選擇單元發送一刺激信號至該第一方向上的第一導線;再依序透過該第二選擇單元來檢測該第二導線上,每一導線所感應發生訊號變化,以進檢測每一導線所發生之電荷量、電容感應、或電壓、電流訊號之變化。In an embodiment, the second operation method may be that the sensor sends a stimulation signal to the first wire in the first direction through the first selection unit, and then sequentially detects the second selection unit. On the second wire, each wire induces a signal change to detect the amount of charge generated by each wire, capacitance sensing, or voltage and current signal changes.
在一實施例中,該第一控制單元包括至少一控制線以及複數個切換開關或複數個串接的切換開關分別耦接該些條第一導線。In an embodiment, the first control unit includes at least one control line and a plurality of switch switches or a plurality of serially connected switch switches respectively coupled to the plurality of first wires.
在一實施例中,該感測器可控制該控制線導通該些切換開關使該部分些第一導線之一端共同連接至該第一導通線,以及控制該控制線關閉該些切換開關,中斷部分該些第一導線與該第一導通線間之連接。In an embodiment, the sensor can control the control line to turn on the switch switches to connect one of the first wires to the first conductive line, and control the control line to close the switch, interrupting And connecting a portion of the first wires to the first conductive lines.
在一實施例中,該第二控制單元包括至少一控制線以及複數個切換開關或複數個串接的切換開關分別耦接該些條第二導線。In an embodiment, the second control unit includes at least one control line and a plurality of switch switches or a plurality of serially connected switch switches respectively coupled to the second wires.
在一實施例中,該感測器可控制該控制線導通部分該些切換開關使該些第二導線之一端共同連接至該第二導通線,或控制該控制線關閉該些切換開關,中斷部分該些第二導線與該第二導通線間之連接。In an embodiment, the sensor can control the control line conducting portion of the switch to connect one of the second wires to the second conductive line, or control the control line to close the switch, interrupting A portion of the connection between the second wires and the second conductive lines.
在一實施例中,該感測器執行一電容式、電阻式、壓感式、或光學式之觸控感應檢測。In one embodiment, the sensor performs a capacitive, resistive, pressure sensitive, or optical touch sensing detection.
在一實施例中,微機電顯示器,更包括一上蓋保護單元配置於該複數個光干涉式顯示單元上方,其中該觸控單元可位於該上蓋保護單元內側或外側或在其內部、或位於該上蓋保護單元和該複數個光干涉式顯示單元之間。In an embodiment, the MEMS display further includes an upper cover protection unit disposed above the plurality of optical interferometric display units, wherein the touch unit can be located inside or outside the inside of the upper cover protection unit or inside or at the Between the upper cover protection unit and the plurality of optical interference display units.
在一實施例中,該上蓋保護單元更包含一造型單元,其中該觸控單元可位於該造型單元內側或外側或在其內部。In an embodiment, the upper cover protection unit further includes a modeling unit, wherein the touch unit can be located inside or outside the interior of the modeling unit or inside.
在一實施例中,該微機電顯示器更包括一彩色濾光片配置於該複數個光干涉式顯示單元上方,以及一上蓋保護單元配置於該彩色濾光片上,其中該觸控單元可位於該上蓋保護單元內側或外側或在其內部、或位於該上蓋保護單元和該彩色濾光片之間、或位於該彩色濾光片和該光干涉式顯示單元之間。In an embodiment, the MEMS display further includes a color filter disposed on the plurality of optical interferometric display units, and an upper cover protection unit disposed on the color filter, wherein the touch unit is located The upper cover protection unit is located inside or outside or inside thereof, between the upper cover protection unit and the color filter, or between the color filter and the optical interference display unit.
在一實施例中,該微機電顯示器更包括一光學擴散膜配置於該複數個光干涉式顯示單元上方。In one embodiment, the MEMS display further includes an optical diffusion film disposed over the plurality of optical interferometric display units.
在一實施例中,該微機電顯示器更包括一前光源配置於該複數個顯示單元之前方。In an embodiment, the MEMS display further includes a front light source disposed in front of the plurality of display units.
在一實施例中,前光源更包括:一光源,其中該光源可為白光光源、或單色光光源、或數種色光光源。In an embodiment, the front light source further comprises: a light source, wherein the light source can be a white light source, or a monochromatic light source, or a plurality of color light sources.
在一實施例中,前光源更包括:一光源;以及一導光板,其中該光源設置在該導光板的側邊,該光源從導光板側邊射入光線,從該導光板面向該複數個顯示單元的一面射出,經由顯示單元反射後,穿透前光源之該導光板。In an embodiment, the front light source further includes: a light source; and a light guide plate, wherein the light source is disposed at a side of the light guide plate, the light source is incident on the side of the light guide plate, and the light guide plate faces the plurality of light guide plates One side of the display unit is emitted, and after being reflected by the display unit, the light guide plate of the front light source is penetrated.
在一實施例中,在利用該前光源關閉或點暗之時間,在該時段來進行觸控感測。In one embodiment, touch sensing is performed during the time period when the front light source is turned off or darkened.
在一實施例中,該觸控單元配置於該前光源上方、或內側。In an embodiment, the touch unit is disposed above or inside the front light source.
在一實施例中,觸控單元係使用電磁感應方式、光學感應方式、超音波感應方式、電容感應方式、電阻感應方式或以上之雙模式、多模式的感應方式。In one embodiment, the touch unit uses an electromagnetic induction method, an optical sensing method, an ultrasonic sensing method, a capacitive sensing method, a resistance sensing method, or a dual mode or multi-mode sensing method.
在一實施例中,第一基板為一半導體基板,每一該些微機電顯示單元為微鏡陣列裝置。In one embodiment, the first substrate is a semiconductor substrate, and each of the MEMS display units is a micro mirror array device.
在一實施例中,該微鏡陣列裝置包括複數個微鏡以矩陣排列之方式配置在該半導體基板的表面上,其中每一該些微鏡包含一鏡面以及對應之兩控制電極或多組控制電極。In one embodiment, the micromirror array device includes a plurality of micromirrors arranged in a matrix arrangement on a surface of the semiconductor substrate, wherein each of the micromirrors comprises a mirror surface and corresponding two control electrodes or groups of control electrodes .
在一實施例中,控制陣列控制該複數個微鏡之鏡面傾斜轉角角度、傾斜方向。In an embodiment, the control array controls the mirror tilt angle and the tilt direction of the plurality of micromirrors.
在一實施例中,該傾斜轉角角度範圍為-25度至+25度。In an embodiment, the angle of inclination angle ranges from -25 degrees to +25 degrees.
在一實施例中,當微鏡陣列裝置顯示器具一外界光源或光機時,在利用該外界光源或光機關閉或點暗之時間,在該時段來進行觸控感測。In one embodiment, when the micromirror array device displays an external light source or a light machine, the touch sensing is performed during the time period when the external light source or the light machine is turned off or darkened.
在一實施例中,觸控單元配置在在第一基板下方。In an embodiment, the touch unit is disposed under the first substrate.
在一實施例中,微機電顯示器,更包括一上蓋保護單元配置於該複數個微鏡陣列單元上方,其中該觸控單元可位於該上蓋保護單元內側或外側或在其內部、或位於該上蓋保護單元和該複數個微鏡陣列單元之間。In an embodiment, the MEMS display further includes an upper cover protection unit disposed above the plurality of micro mirror array units, wherein the touch unit can be located inside or outside the inner cover protection unit or inside thereof, or on the upper cover Between the protection unit and the plurality of micromirror array units.
在一實施例中,觸控單元係使用電磁感應方式、光學感應方式、超音波感應方式、電容感應方式、電阻感應方式或以上之雙模式、多模式的感應方式。In one embodiment, the touch unit uses an electromagnetic induction method, an optical sensing method, an ultrasonic sensing method, a capacitive sensing method, a resistance sensing method, or a dual mode or multi-mode sensing method.
綜上所述,本發明將觸控元件加入微機電顯示器中,使得微機電顯示器具觸控功能,在使用上將更為直接與方便。且觸控面板之觸控感應導線更可與微機電顯示器之控制單元共構或改良自該控制單元之導線結構,而減少製程程序。In summary, the present invention adds a touch element to a MEMS display, so that the touch function of the MEMS display device is more direct and convenient in use. Moreover, the touch sensing wire of the touch panel can be co-constructed with the control unit of the MEMS display or improved from the wire structure of the control unit, thereby reducing the process procedure.
為了達到操作更人性化的目的,許多電子產品已由傳統之鍵盤或滑鼠等輸入裝置,轉變為使用觸控面板作為輸入裝置。而本發明主要技術特徵之一即是將觸控功能整合至光干涉顯示系統中或整合至微鏡面陣列顯示系統中,成為具有觸控功能之微機電顯示之裝置中。In order to achieve a more user-friendly operation, many electronic products have been converted from input devices such as a conventional keyboard or mouse to using a touch panel as an input device. One of the main technical features of the present invention is that the touch function is integrated into the optical interference display system or integrated into the micro-mirror array display system, and becomes a device with a touch-enabled MEMS display.
依檢測的方法,觸控面板有電磁感應方式、光學感應方式、超音波感應方式、電容感應方式、電阻感應方式、壓力感應方式或以上多模式感應組合方式等。其中電阻感應式,用手指或其他觸頭輕按就會產生電壓變化,藉由檢測電壓之改變來分辨其觸碰位置。超音波感應方式,則是用聲波或紅外線覆蓋整個表面,而手指或觸頭會阻斷這些駐波圖樣,藉由檢測駐波圖樣之改變來分辨其觸碰位置。表面電容式觸控面板是利用電極與人體之間的靜電結合所產生之電容變化,從觸控位置所產生之誘導電流或電壓變化來檢測其座標。其感應原理是以電壓作用在螢幕感應區的四個角落並形成一固定電場,當手指碰觸螢幕時,可令電場引發電流,藉由控制器測定,依電流距四個角落比例的不同,即可計算出接觸位置。投射式電容技術其面板結構類似於電阻式觸控面板,都有X軸和Y軸方向的兩層導電板,但其使用與表面電容式觸控技術一樣原理,經由量測流經電極的電流變化來計算觸控點位置,因有兩層結構,可分別對X軸和Y軸的觸控為置偵測,故可達成多點觸控的功能,當手指接近螢幕時,因人類手指是良好導體,會和面板的電場形成電容感應,手指上的靜電會流入螢幕面板內,經X軸和Y軸面板的電極傳至感測器,感測器量測電容變化量,控制器根據電容變化量計算觸控點座標。而電磁式觸控面板其主要包含三大項元件,(1)數位天線板(sensor board)(2)含ASIC之電路控制板(controller board)(3)壓感電磁筆,技術上是利用特定電磁筆上的線圈,對感應數位天線版上的天線感應產生磁場、磁通量的變化,利用其所產生的微弱電流來計算出接觸座標。According to the detection method, the touch panel has electromagnetic induction mode, optical sensing mode, ultrasonic sensing mode, capacitive sensing mode, resistance sensing mode, pressure sensing mode or the above multi-mode sensing combination mode. Among them, the resistance-inductive type, when pressed with a finger or other contact, generates a voltage change, and the touch position is distinguished by detecting a change in voltage. In the ultrasonic sensing mode, the entire surface is covered with sound waves or infrared rays, and the fingers or contacts block the standing wave patterns, and the touch position is distinguished by detecting the change of the standing wave pattern. The surface capacitive touch panel detects the coordinates of the induced current or voltage generated by the touch position by utilizing the capacitance change generated by the electrostatic combination between the electrode and the human body. The principle of induction is that voltage acts on the four corners of the screen sensing area and forms a fixed electric field. When the finger touches the screen, the electric field can induce current, which is determined by the controller, according to the ratio of the current to the four corners. The contact position can be calculated. The projected capacitor technology has a panel structure similar to a resistive touch panel. It has two layers of conductive plates in the X-axis and Y-axis directions, but it uses the same principle as the surface capacitive touch technology to measure the current flowing through the electrodes. The change is used to calculate the position of the touch point. Because of the two-layer structure, the touch of the X-axis and the Y-axis can be detected separately, so that the multi-touch function can be achieved. When the finger approaches the screen, the human finger is A good conductor will form a capacitive induction with the electric field of the panel. The static electricity on the finger will flow into the screen panel and pass through the electrodes of the X-axis and Y-axis panels to the sensor. The sensor measures the amount of capacitance change. The controller is based on the capacitance. The amount of change calculates the touch point coordinates. The electromagnetic touch panel mainly includes three major components, (1) digital sensor board (2) ASIC-containing circuit controller board (3) pressure sensitive electromagnetic pen, technically utilizing specific The coil on the electromagnetic pen senses a change in the magnetic field and magnetic flux of the antenna on the inductive digital antenna plate, and uses the weak current generated by the electromagnetic pen to calculate the contact coordinate.
本發明之光干涉顯示系統或微機電顯示系統,可搭配上述任一種感應方式而具有觸控功能。The optical interference display system or the microelectromechanical display system of the present invention can be combined with any of the above sensing modes to have a touch function.
微機電(Micro-Electro-Mechanical Systems,MEMS)顯示系統,係指以微機電方式形成之平面顯示器,包括光干涉式的平面顯示模式以及微鏡陣列(Micro-Mirror Array)系統裝置等。其中不論是以光干涉式的顯示模式或是以微鏡陣列裝置均可使用於本發明中,而以本發明之方式加入觸控功能。Micro-Electro-Mechanical Systems (MEMS) display system refers to a micro-electromechanical planar display, including an optical interferometric planar display mode and a Micro-Mirror Array system device. In either the optical interferometric display mode or the micromirror array device can be used in the present invention, the touch function is added in the manner of the present invention.
第1圖係繪示一單色光干涉顯示系統中一顯示單元的剖面示意圖。每一個單色光干涉式顯示單元100包括一基材110,其上形成有第一電極102及第二電極104,第一電極102和第二電極104間係由支撐物106所支撐而形成一腔室(Cavity)108。第一電極102和第二電極104間的距離,也就是腔室108的間隙為D。第二電極104係為一光入射方向之電極,利用電場驅動可以使其產生形變。第一電極102則係為一光干涉共振之電極。通常利用外界光或太陽光、白光作為光干涉式顯示單元100的入射光源,白光係包含可見光頻譜範圍中各種不同波長(Wave Length,以λ表示)的光線所混成。當入射光穿過第二電極104而進入腔室108中時,僅有符合公式1.1的波長(λ)可以在腔室108中產生建設性干涉而被反射輸出。其中N為自然數。換句話說,1 is a cross-sectional view showing a display unit in a monochromatic optical interference display system. Each of the monochromatic optical interferometric display units 100 includes a substrate 110 having a first electrode 102 and a second electrode 104 formed thereon. The first electrode 102 and the second electrode 104 are supported by the support 106 to form a substrate. Cavity 108. The distance between the first electrode 102 and the second electrode 104, that is, the gap of the chamber 108 is D. The second electrode 104 is an electrode in the direction of light incidence, and can be deformed by driving with an electric field. The first electrode 102 is an electrode of optical interference resonance. Generally, external light, sunlight, or white light is used as an incident light source of the optical interferometric display unit 100, and the white light system is mixed with light of various wavelengths (Wave Length, represented by λ) in the visible light spectrum range. When incident light passes through the second electrode 104 into the chamber 108, only the wavelength (λ) in accordance with Equation 1.1 can be constructively interfered in the chamber 108 to be reflected out. Where N is a natural number. in other words,
2D=Nλ (1.1)2D=Nλ (1.1)
即可使此入射光波長λ在此腔室108中產生建設性干涉,而輸出該波長λ之反射光。此時,觀察者112的眼睛順著入射光的方向觀察,可以看到波長為λ的反射光,因此,對可變色畫素單元100而言係處於“開”的狀態,即為一亮態狀態。The incident light wavelength λ is caused to cause constructive interference in the chamber 108, and the reflected light of the wavelength λ is output. At this time, the eyes of the observer 112 are observed along the direction of the incident light, and the reflected light having the wavelength λ can be seen. Therefore, the color-changing pixel unit 100 is in an "on" state, that is, a bright state. status.
第2圖係繪示習知顯示單元加上電壓後的剖面示意圖。請參照第2圖,在電壓的驅動下,第二電極104因為靜電吸引力而產生型變,向第一電極102的方向塌下。此時,第一電極102與第二電極104間的距離,也就是腔室108的間隙並不為零,而是為d,d可以等於零。此時,公式1.1中的D將以d置換,入射光所有的可見光頻譜的波長λ中,僅有符合公式1.1的可見光波長可以產生建設性干涉,設計d使得在可見光波長範圍內,入射光所有的可見光頻譜均被相消性干涉,對順著入射光的方向觀察的觀察者112而言,將會看到可見光頻譜內的反射光很微弱,是為暗狀態、或關狀態,因此,對光干涉顯示單元100而言係處於“關”的狀態。觀察者112看到一個黑色的顯示單元。而當光干涉顯示單元100要由“關”的狀態切換為“開”的狀態時,則必須先移除用以驅動第二電極104形變的電壓,接著,施以另一相反電壓,或依靠自己本身的形變恢復力,失去靜電吸引力作用的第二電極104會恢復成如第1圖之原始的狀態,使此光干涉顯示單元100呈現一“開”的狀態。其中,形成基材110的材質可以為玻璃材質。形成電極102,104的材質可以為氧化銦錫玻璃(ITO)或是氧化銦鋅玻璃(IZO)。光干涉電極(第一電極102)為一薄膜層(Membrane)。由於光線在不同的間隙中會受到不同程度的干涉(interference),進而呈現不同色光,因此可以藉由設計腔室108之間距大小來達到反射之色光和其亮暗的控制。經由控制”開”、”關”時間比例,呈現灰階、亮暗程度。Figure 2 is a schematic cross-sectional view showing a conventional display unit with a voltage applied thereto. Referring to FIG. 2, under the driving of the voltage, the second electrode 104 is deformed by the electrostatic attraction force and collapses in the direction of the first electrode 102. At this time, the distance between the first electrode 102 and the second electrode 104, that is, the gap of the chamber 108 is not zero, but d, d may be equal to zero. At this time, D in Equation 1.1 will be replaced by d. Among the wavelengths λ of all visible light spectrums of incident light, only visible wavelengths conforming to Equation 1.1 can produce constructive interference, and design d makes all incident light in the visible wavelength range. The visible light spectrum is destructively interfered. For the observer 112 looking in the direction of the incident light, it will be seen that the reflected light in the visible light spectrum is very weak, and is in a dark state or an off state. Therefore, The light interference display unit 100 is in an "off" state. The viewer 112 sees a black display unit. When the light interference display unit 100 is to be switched from the "off" state to the "on" state, the voltage for driving the deformation of the second electrode 104 must be removed first, and then another opposite voltage is applied, or The self-recovering force of the deformation itself, the second electrode 104 that loses the electrostatic attraction effect returns to the original state as in Fig. 1, so that the light interference display unit 100 assumes an "on" state. The material forming the substrate 110 may be made of glass. The material forming the electrodes 102, 104 may be indium tin oxide glass (ITO) or indium zinc oxide glass (IZO). The light interference electrode (first electrode 102) is a thin film layer (Membrane). Since the light is subjected to different degrees of interference in different gaps, and thus different colors of light, the color of the reflected light and the control of its brightness can be achieved by designing the distance between the chambers 108. By controlling the ratio of "on" and "off" time, gray scale and brightness are displayed.
在一實施例中,為了保護顯示單元100如第3圖所示,一平板保護結構120利用黏著材料122與基板110黏合,而形成一「ㄇ」字形保護結構。此外,亦可形成一第二基板124作為上蓋保護單元來與第一基板110封固,並以抽真空或灌氮氣等惰性氣體,使得光干涉顯示單元100與外界環境隔絕以避免空氣中的水分子、灰塵或氧氣侵入而損壞光干涉顯示單元100。而上蓋保護單元(第二基板124)更可以包括一造型單元(圖中未繪出),來多樣化顯示系統之外觀。在另一實施例中,為了實現全彩色顯示,可形成不同之腔室間距大小,藉由光線在平行板之不同的間隙中會受到不同程度的干涉(interference),來呈現不同色光以實現全彩顯示。第4圖繪示為根據本發明一實施例,彩色光干涉顯示系統中一顯示單元的剖面示意圖。一光干涉式彩色顯示單元200係由三個單色之光干涉顯示單元100所組成,每一個單色光干涉顯示單元100包括一基板110、一支撐層106、多個第一電極102以及多個第二電極104所構成。其中,基板110通常是玻璃基板或其他材質之基板;支撐層106係配置於基板110上用以支撐住第二電極104的邊緣;第一電極102配置於基板110上,此第一電極102可為透明電極;通常可在第一電極下方,或第一基板外側(下方),放置一吸收層或吸收材質。In one embodiment, in order to protect the display unit 100, as shown in FIG. 3, a flat protection structure 120 is bonded to the substrate 110 by the adhesive material 122 to form a U-shaped protection structure. In addition, a second substrate 124 may be formed as an upper cover protection unit to be sealed with the first substrate 110, and an inert gas such as vacuum or nitrogen is applied to isolate the light interference display unit 100 from the external environment to avoid water in the air. Molecules, dust or oxygen invade and damage the light interference display unit 100. The upper cover protection unit (second substrate 124) may further include a modeling unit (not shown) to diversify the appearance of the system. In another embodiment, in order to realize full-color display, different chamber spacings can be formed, and the light is subjected to different degrees of interference in different gaps of the parallel plates to present different color lights to achieve full Color display. 4 is a cross-sectional view showing a display unit in a color light interference display system according to an embodiment of the invention. An optical interferometric color display unit 200 is composed of three monochromatic optical interference display units 100. Each monochromatic optical interference display unit 100 includes a substrate 110, a support layer 106, a plurality of first electrodes 102, and a plurality of The second electrodes 104 are formed. The substrate 110 is usually a glass substrate or a substrate of other materials; the support layer 106 is disposed on the substrate 110 for supporting the edge of the second electrode 104; the first electrode 102 is disposed on the substrate 110, and the first electrode 102 can be It is a transparent electrode; usually, an absorbing layer or an absorbing material may be placed under the first electrode or outside (below) the first substrate.
而第二電極104則配置於第一電極102的上方,並藉由支撐層106支撐住,此第二電極104可為透明電極,其材質例如是銦錫氧化物質(Indium Tin Oxide,ITO)或是IZO、或奈米碳管材質,在一實施中,第二電極104可以設置在一透明的基材上。由第4圖中可知,為了達成彩色顯示的目的,每一光干涉式彩色顯示單元200中,其三個單色之光干涉顯示單元100之腔室均具不同長度之間隙,其間隙分別為d1、d2、d3,藉以對不同波長之光產生建設性干涉而顯示不同之顏色。其中,間隙為d1的腔室例如能夠顯示藍光;間隙為d2的腔室例如能夠顯示綠光;而間隙為d3的腔室例如能夠顯示紅光。換言之,當光線由外界穿透第二電極104之後,會經過不同的間隙d1、d2、d3入射至第一電極102上,接著再藉由共振腔共振後反射出部分波段的色光,此過程中光線會受到不同程度的共振干涉而讓觀察者112看到紅光、綠光以及藍光。而另一方面亦可藉由電壓驅動讓第二電極104因為電場吸引力而產生形變,向第一電極102的方向位移靠近,讓第二電極104和第一電極102間之間隙d1、d2、d3改變,並對入射光形成破壞性干涉將可見光頻譜相消性干涉,而讓觀察者112看不到任何可見光。此外,為了避免空氣中的水分子進入光干涉顯示單元200之腔室中而影響間隙,亦可如第3圖所示形成一上蓋保護單元124,而觸控面板之導線結構可形成於此上蓋保護單元結構124上。The second electrode 104 is disposed above the first electrode 102 and supported by the support layer 106. The second electrode 104 can be a transparent electrode, and the material thereof is, for example, Indium Tin Oxide (ITO) or It is an IZO, or a carbon nanotube material. In one implementation, the second electrode 104 can be disposed on a transparent substrate. As can be seen from FIG. 4, in order to achieve the purpose of color display, in each of the optical interferometric color display units 200, the chambers of the three monochromatic light interference display units 100 have gaps of different lengths, and the gaps thereof are respectively D1, d2, and d3, by which constructive interference is generated for light of different wavelengths to display different colors. Among them, the chamber having the gap d1 can display blue light, for example, the chamber having the gap d2 can display green light, for example, and the chamber having the gap d3 can display red light, for example. In other words, after the light penetrates the second electrode 104 from the outside, it enters the first electrode 102 through different gaps d1, d2, and d3, and then reflects the color of the partial band by resonance of the resonant cavity. The light is subject to varying degrees of resonance interference allowing the viewer 112 to see red, green, and blue light. On the other hand, the second electrode 104 can be deformed by the voltage attraction to be displaced in the direction of the first electrode 102 by the voltage driving, and the gap d1 and d2 between the second electrode 104 and the first electrode 102 can be made close. The d3 changes and destructively interferes with the incident light to destructively interfere with the visible light spectrum, leaving the viewer 112 with no visible light. In addition, in order to prevent water molecules in the air from entering the cavity of the light interference display unit 200 to affect the gap, an upper cover protection unit 124 may be formed as shown in FIG. 3, and the wire structure of the touch panel may be formed on the upper cover. The unit structure 124 is protected.
為了控制每一光干涉顯示單元100腔室之“開”和“關”狀態,在基板110和上會形成一由多個控制單元形成之主動陣列,每一光干涉顯示單元100由至少一控制單元對應控制而形成一畫素。每一控制單元例如包括一薄膜電晶體、CMOS、開關元件,耦接光干涉顯示單元100以控制光干涉顯示單元100之“開”和“關”狀態。當一控制單元控制對應之光干涉顯示單元100形成“關”狀態時,控制單元施加電壓給對應之光干涉顯示單元100,使得第二電極104趨近於第一電極102時,此時,入射光所有的可見光頻譜均為相消性干涉,對順著入射光入射第一電極102的方向觀察的觀察者112而言,將不會看到任何可見光頻譜內的反射光,因此,看到一個黑色的顯示單元。反之,當一控制單元控制對應之光干涉顯示單元100形成“開”狀態時,控制單元不施加電壓給對應之光干涉顯示單元100,入射光經第一電極102反射而出。對順著入射光方向觀察的觀察者112而言,將可看到一個亮的顯示單元。依此,當一彩色光干涉顯示單元200三腔室,分別由不同之控制單元控制時,藉由分別改變三腔室之間隙d1、d2、d3,可混合出不同之光顏色而達到全彩之目的。換言之,對順著入射光入射第一電極110的方向觀察的觀察者112而言,將可看到此三腔室共同反射出混合後之色彩。其中該光干涉式顯示器可由數個光干涉式顯示單元相互組合,可以反射出青光、紫紅光、黃光等的不同波段之色光。In order to control the "on" and "off" states of each of the light interference display unit 100 chambers, an active array formed by a plurality of control units is formed on the substrate 110 and thereon, and each of the optical interference display units 100 is controlled by at least one. The unit is controlled to form a pixel. Each control unit includes, for example, a thin film transistor, a CMOS, and a switching element coupled to the light interference display unit 100 to control the "on" and "off" states of the light interference display unit 100. When a control unit controls the corresponding light interference display unit 100 to form an "off" state, the control unit applies a voltage to the corresponding light interference display unit 100 such that the second electrode 104 approaches the first electrode 102, at this time, the incident All of the visible light spectrum of the light is destructive interference, and the observer 112 looking in the direction in which the incident light is incident on the first electrode 102 will not see any reflected light in the visible light spectrum, so that one is seen Black display unit. On the contrary, when a control unit controls the corresponding light interference display unit 100 to form an "on" state, the control unit does not apply a voltage to the corresponding light interference display unit 100, and the incident light is reflected by the first electrode 102. For the viewer 112 looking along the direction of the incident light, a bright display unit will be visible. Accordingly, when a color light interferes with the three chambers of the display unit 200 and is controlled by different control units, by changing the gaps d1, d2, and d3 of the three chambers respectively, different light colors can be mixed to achieve full color. The purpose. In other words, for the observer 112 looking in the direction in which the incident light is incident on the first electrode 110, it can be seen that the three chambers collectively reflect the mixed color. The optical interferometric display can be combined with a plurality of optical interferometric display units to reflect different colors of cyan, magenta, yellow, and the like.
在一實施例中,一觸控導線結構可與微機電顯示器之傳導線路共構,其中該觸控導線結構可使用一顯示器陣列之掃瞄線、資料線、輔助線、偏壓線或電源線、共電極線或信號線、或讀取線、或偏壓線、或控制線,或補償電路等線路。下述是以使用一光干涉顯示系統之掃瞄線、資料線作為觸控元件之導線電極結構為例進行說明。然值得注意的是,本發明並不限定僅可用於光干涉顯示系統中,亦可應用在其他之微機電顯示系統,例如一微鏡陣列(Micro-Mirror Array)裝置中,當應用在微鏡陣列裝置上時,是利用微鏡陣列裝置之主動陣列電極結構來形成一觸控元件之導線電極結構。In one embodiment, a touch wire structure can be co-constructed with a conductive line of a MEMS display, wherein the touch wire structure can use a scan line, a data line, an auxiliary line, a bias line or a power line of a display array. , common electrode lines or signal lines, or read lines, or bias lines, or control lines, or lines such as compensation circuits. The following is an example of a wire electrode structure using a scanning line and a data line of an optical interference display system as a touch element. It should be noted that the present invention is not limited to use only in an optical interference display system, and can also be applied to other MEMS display systems, such as a Micro-Mirror Array device, when applied to a micromirror. When the array device is mounted, the active electrode structure of the micromirror array device is used to form a wire electrode structure of a touch element.
參閱第5A圖所示為一光干涉顯示單元與其控制單元電極間之耦接關係概略圖示。在本實施例中,控制單元電極係使用主動陣列並設置於第一基板110上,由交叉之資料線D1~Dm和掃瞄線G1~Gn所組成,每一對資料線和掃瞄線可控制一畫素區域,例如,資料線D1和掃瞄線G1可用以控制一畫素。每一畫素,例如畫素402,具有相同之結構,包括一控制用之薄膜電晶體403耦接對應之光干涉顯示單元100,用以控制每一光干涉顯示單元100腔室之“開”和“關”狀態。在一實施例中,第一電極102耦接於一共同電極,而第二電極104則耦接於薄膜電晶體403,當掃描線G1被掃描訊號掃描到後,薄膜電晶體403會被導通,資料線D1透過薄膜電晶體403控制第二電極104在間隙d間之位移情況,控制每一光干涉顯示單元100腔室之“開”和“關”狀態。其中,對應之感測器亦設置於第一基板110上。在上述實施例中,也可以是該第一電極102耦接於一薄膜電晶體403,而第二電極104則耦接於共同電極。對於微鏡面陣列顯示單元也可是如此架構的。Referring to FIG. 5A, a schematic diagram of the coupling relationship between an optical interference display unit and its control unit electrodes is shown. In this embodiment, the control unit electrodes are disposed on the first substrate 110 by using the active array, and are composed of the intersecting data lines D1 D Dm and the scan lines G1 G Gn , and each pair of data lines and scan lines can be Controlling a pixel area, for example, the data line D1 and the scan line G1 can be used to control one pixel. Each pixel, such as pixel 402, has the same structure, and includes a control film transistor 403 coupled to the corresponding light interference display unit 100 for controlling the "on" of each light interference display unit 100 chamber. And "off" status. In one embodiment, the first electrode 102 is coupled to a common electrode, and the second electrode 104 is coupled to the thin film transistor 403. When the scan line G1 is scanned by the scan signal, the thin film transistor 403 is turned on. The data line D1 controls the displacement of the second electrode 104 between the gaps d through the thin film transistor 403, and controls the "on" and "off" states of each of the light interference display unit 100 chambers. The corresponding sensor is also disposed on the first substrate 110. In the above embodiment, the first electrode 102 is coupled to a thin film transistor 403, and the second electrode 104 is coupled to the common electrode. The micromirror array display unit can also be constructed in such a way.
第5B圖所示為根據本發明一實施例光干涉顯示系統觸控元件之電極結構之概略圖示。觸控元件之電極結構是利用原本之資料線D1~Dm和掃瞄線G1~Gn均為原本陣列基板上標準製程,故可以不改變基板110上之主動陣列的製程步驟或良率。依此,一組資料線,例如資料線D1和D2,以及一組掃瞄線,例如掃瞄線G1和G2,相交出一感應區。為避免光干涉顯示系統在顯示圖場時之掃描訊號與資料信號,和進行觸控檢測時之檢測信號發生衝突,在一實施例中,可使用選擇單元103和107控制資料線D1~Dm間以及掃瞄線G1~Gn間之耦接,且亦利用分時之方法,在兩連續圖場顯示時間中插入觸控位置檢測時段,避免影像單一圖場之顯示。依此,當資料線D1~Dm和掃瞄線G1~Gn在傳送資料或掃描信號時,選擇單元103和107中斷資料線D1~Dm彼此間以及掃瞄線G1~Gn彼此間之耦接。反之當感測器105於觸控檢測時段中進行感測時,選擇單元103和107耦接所選擇之資料線D1~Dm以及掃瞄線G1~Gn藉以形成感應線路,讓感測器105可傳送一電容式、電阻式、壓感式、或光學式之觸控感應檢測信號至該些耦接之之資料線D1~Dm以及掃瞄線G1~Gn。其中,感測器105可進行電容式、電阻式、壓感式、或光學式之觸控感應之觸控數值、位置、高度距離之計算。其中感測器105用以刺激、偵測或感應選擇單元103選擇之部分資料線D1~Dm,以及刺激、偵測或感應,選擇單元107選擇之部分掃瞄線G1~Gn中之訊號。FIG. 5B is a schematic diagram showing the electrode structure of the touch element of the optical interference display system according to an embodiment of the invention. The electrode structure of the touch component utilizes the original data lines D1 DDm and the scan lines G1 G Gn as standard processes on the original array substrate, so that the process steps or yield of the active array on the substrate 110 can be omitted. Accordingly, a set of data lines, such as data lines D1 and D2, and a set of scan lines, such as scan lines G1 and G2, intersect a sensing area. In order to avoid the interference between the scanning signal and the data signal of the optical interference display system when displaying the field, and the detection signal when performing the touch detection, in an embodiment, the selection units 103 and 107 can be used to control the data line between D1 and Dm. And the connection between the scan lines G1~Gn, and also uses the time-sharing method to insert the touch position detection period in the display time of the two consecutive fields to avoid the display of the single image field of the image. Accordingly, when the data lines D1 to Dm and the scan lines G1 to Gn are transmitting data or scanning signals, the selection units 103 and 107 interrupt the coupling between the data lines D1 to Dm and the scanning lines G1 to Gn. On the other hand, when the sensor 105 senses in the touch detection period, the selection units 103 and 107 are coupled to the selected data lines D1 D Dm and the scan lines G1 G Gn to form an inductive line, so that the sensor 105 can be Transmitting a capacitive, resistive, pressure sensitive, or optical touch sensing detection signal to the coupled data lines D1 to Dm and the scanning lines G1 to Gn. The sensor 105 can perform calculation of touch values, positions, and height distances of capacitive, resistive, pressure sensitive, or optical touch sensing. The sensor 105 is used to stimulate, detect or sense part of the data lines D1 D Dm selected by the selection unit 103, and to stimulate, detect or sense, and select the signals in the partial scanning lines G1 G Gn selected by the unit 107.
例如,以電容式觸控感應為例,在進行自容式感測檢測時,感測器105會控制選擇單元103和107,以進行資料線D1~Dm以及掃瞄線G1~Gn之選擇。接著感測器105發出之檢測信號傳送至選擇之資料線D1~Dm以及掃瞄線G1~Gn上,並根據觸摸前後電容的變化,分別確定橫向座標和縱向座標,然後組合成平面的觸摸座標。另一方面,在進行互容式感測檢測時,可從資料線D1~Dm依次發出刺激信號,而由掃瞄線G1~Gn依序同時接收信號,亦即感測器105發出之檢測信號經由選擇單元103依序傳輸給資料線D1~Dm,並將掃瞄線G1~Gn上之檢測信號由選擇單元107傳回至感測器105。或由掃瞄線G1~Gn依次發出刺激信號,而由資料線D1~Dm同時接收信號,亦即感測器105發出之檢測信號經由選擇單元107依序傳輸給掃瞄線G1~Gn,並將資料線D1~Dm上之檢測信號經由選擇單元103傳回至感測器105。這樣可以得到所有橫向和縱向電極交叉點的電容值大小,即整個觸控螢幕的二維平面的電容大小。根據觸控螢幕二維電容變化量資料,計算出感觸、觸控點的座標。值得注意得是,上述之選擇資料線D1~Dm,和掃瞄線G1~Gn方式亦可應用於電阻式、壓感式、感壓式或光學式。For example, in the case of capacitive touch sensing, when performing self-capacitance sensing detection, the sensor 105 controls the selecting units 103 and 107 to select the data lines D1 to Dm and the scanning lines G1 to Gn. Then, the detection signal sent by the sensor 105 is transmitted to the selected data lines D1~Dm and the scan lines G1~Gn, and the lateral coordinates and the longitudinal coordinates are respectively determined according to the change of the capacitance before and after the touch, and then combined into a planar touch coordinate. . On the other hand, in the mutual capacitance sensing detection, the stimulation signals can be sequentially sent from the data lines D1 to Dm, and the signals are simultaneously received by the scanning lines G1 to Gn, that is, the detection signals sent by the sensor 105. The data lines D1 to Dm are sequentially transmitted to the data lines D1 to Dm via the selection unit 103, and the detection signals on the scan lines G1 to Gn are transmitted back to the sensor 105 by the selection unit 107. Or the stimulation signals are sequentially sent from the scan lines G1 to Gn, and the signals are simultaneously received by the data lines D1 to Dm, that is, the detection signals from the sensor 105 are sequentially transmitted to the scan lines G1 to Gn via the selection unit 107, and The detection signals on the data lines D1 to Dm are transmitted back to the sensor 105 via the selection unit 103. This gives the capacitance of all horizontal and vertical electrode intersections, ie the capacitance of the two-dimensional plane of the entire touch screen. According to the two-dimensional capacitance change data of the touch screen, the coordinates of the touch and touch points are calculated. It is worth noting that the above selected data lines D1~Dm and the scanning lines G1~Gn can also be applied to resistive, pressure sensitive, pressure sensitive or optical.
當進行電磁感應觸控感測時,感測器105會控制選擇單元103來於資料線D1~Dm間形成迴路,並透過選擇單元103發射信號到迴路中,來判斷迴路是否為觸控位置。相似的,感測器105亦會控制選擇單元107於掃瞄線G1~Gn間形成迴路,並透過選擇單元107發射信號到迴路中,來判斷迴路是否為觸控位置。在一實施例中是以檢測此感測信號是否發生變化來確認迴路中之磁通量、電磁感應、或電壓、電流、頻率之觸控感應迴路信號等是否發生變化。其中,發出之感測信號可以是方波、三角波、類三角波或複數個方波的線性疊加組合,而感測訊號的改變量可為波形失真程度、訊號均值或峰值的改變、電壓或電流的改變量或上述物理參數的相對值、積分值、累加或累計數值等。When the electromagnetic induction touch sensing is performed, the sensor 105 controls the selection unit 103 to form a loop between the data lines D1 to Dm, and transmits a signal to the loop through the selection unit 103 to determine whether the loop is a touch position. Similarly, the sensor 105 also controls the selection unit 107 to form a loop between the scan lines G1 G Gn, and transmits a signal to the loop through the selection unit 107 to determine whether the loop is a touch position. In one embodiment, it is determined whether the magnetic flux, electromagnetic induction, or voltage, current, frequency, touch sensing loop signal, etc. in the loop change, whether the sensing signal changes. The sensed signal may be a linear superposition combination of a square wave, a triangular wave, a triangular wave or a plurality of square waves, and the amount of change of the sensing signal may be a waveform distortion degree, a signal mean value or a peak value change, a voltage or a current. The amount of change or the relative value of the above physical parameters, the integral value, the accumulated or accumulated value, and the like.
第5C圖所示為為根據本發明另一實施例光干涉顯示系統觸控元件之電極結構之概略圖示。其中該觸控元件可進行雙模式觸控。光干涉顯示系統之主動陣列是由交叉之資料線D1~Dm和掃瞄線G1~Gn所組成,每一相對之資料線和掃瞄線可控制一畫素區域,例如,資料線D1和掃瞄線G1可用以控制一畫素402。每一畫素,例如畫素402,具有相同之結構,包括一控制用之薄膜電晶體403耦接對應之光干涉顯示單元100,用以控制每一光干涉顯示單元100腔室之“開”和“關”狀態。其中閘極驅動電路401會依序送出掃描訊號至掃描線G1~Gn上,當其中一掃描線被掃描訊號掃描到後,連接於此掃描線之薄膜電晶體會被導通,而未被掃描到之薄膜電晶體會被關閉,當此列之薄膜電晶體被導通後,源極驅動電路400會送出影像訊號到資料線D1~Dn上,過薄膜電晶體403可控制對應一光干涉顯示單元100腔室之“開”和“關”狀態來顯示影像。當閘極驅動電路401完成所有掃描線之掃描後,一單一影像之圖場(frame)之顯示即告完成,其中掃描線之掃描會重複進行,因此後續之影像圖場會連續顯示。而交叉之資料線D1~Dm和掃瞄線G1~Gn,於本實施例中是成90度夾角,然而,此夾角角度並不限制必需為90度,例如,在其他實施例中,此夾角角度亦可為60度、45度、36度或30度等。其中資料線D1~Dm和掃瞄線G1~Gn係指電性導通線,可以是金屬、合金線路、導電材如ITO、IZO奈米碳管等。FIG. 5C is a schematic diagram showing an electrode structure of a touch element of an optical interference display system according to another embodiment of the present invention. The touch component can perform dual mode touch. The active array of the optical interference display system is composed of the intersecting data lines D1~Dm and the scanning lines G1~Gn, and each of the opposite data lines and the scanning lines can control a pixel area, for example, the data line D1 and the scan. The aim line G1 can be used to control a pixel 402. Each pixel, such as pixel 402, has the same structure, and includes a control film transistor 403 coupled to the corresponding light interference display unit 100 for controlling the "on" of each light interference display unit 100 chamber. And "off" status. The gate driving circuit 401 sequentially sends the scanning signals to the scanning lines G1 G Gn. When one of the scanning lines is scanned by the scanning signals, the thin film transistor connected to the scanning lines is turned on, but not scanned. The thin film transistor is turned off. When the thin film transistor of the column is turned on, the source driving circuit 400 sends the image signal to the data lines D1~Dn, and the thin film transistor 403 can control the corresponding optical interference display unit 100. The "on" and "off" states of the chamber are used to display images. When the gate driving circuit 401 completes scanning of all the scanning lines, the display of a single image frame is completed, wherein the scanning of the scanning lines is repeated, so that the subsequent image fields are continuously displayed. The intersecting data lines D1~Dm and the scanning lines G1~Gn are at an angle of 90 degrees in this embodiment. However, the angle of the angle is not limited to 90 degrees. For example, in other embodiments, the angle is The angle can also be 60 degrees, 45 degrees, 36 degrees or 30 degrees. The data lines D1~Dm and the scanning lines G1~Gn refer to electrical conduction lines, which may be metal, alloy lines, conductive materials such as ITO, IZO carbon nanotubes, and the like.
由於觸控元件之導線結構是利用原本之資料線D1~Dm和掃瞄線G1~Gn均為原本陣列基板上標準製程,故可以不改變基板110上之主動陣列的製程步驟或良率。依此,以電磁感應觸控為例,可由兩組相對之資料線,例如資料線D1和D20,圍出一感應區。例如掃瞄線G1和G20,圍出一感應區。Since the wire structure of the touch component utilizes the original data lines D1 DDm and the scan lines G1 G Gn as standard processes on the original array substrate, the process steps or yield of the active array on the substrate 110 may not be changed. Accordingly, taking the electromagnetic induction touch as an example, a sensing area can be enclosed by two sets of opposite data lines, such as data lines D1 and D20. For example, the scanning lines G1 and G20 enclose a sensing area.
另外以電容感應觸控為例,可由一組資料線,例如資料線D1...D10,以及一組掃瞄線G1...G10,對應出一重疊的感應區。為避免光干涉顯示系統在顯示圖場時之掃描訊號與資料信號,和進行觸控檢測時之檢測信號發生衝突,在一實施例中,可使用選擇單元103和107以及控制單元123和124控制資料線D1~Dm間以及掃瞄線G1~Gn間之耦接,且亦利用分時之方法,在兩連續圖場顯示時間中插入觸控位置檢測時段,避免影響單一圖場之顯示。依此,當資料線D1~Dm和掃瞄線G1~Gn在傳送資料或掃描信號時,選擇單元103和107中斷資料線D1~Dm彼此間以及掃瞄線G1~Gn彼此間之耦接。反之當感測器105於觸控檢測時段中進行感測時,選擇單元103和107耦接所選擇之資料線D1~Dm以及掃瞄線G1~Gn藉以形成迴路,讓感測器105可傳送一電容式、電阻式、壓感式、或光學式之觸控感應檢測信號至該些耦接之之資料線D1~Dm以及掃瞄線G1~Gn。In addition, taking capacitive sensing touch as an example, a set of data lines, such as data lines D1...D10, and a set of scanning lines G1...G10, may correspond to an overlapping sensing area. In order to avoid the interference between the scanning signal and the data signal of the optical interference display system when displaying the field, and the detection signal when performing the touch detection, in an embodiment, the selection units 103 and 107 and the control units 123 and 124 can be used to control. The data line D1~Dm and the scan line G1~Gn are coupled, and the time-sharing method is also used to insert the touch position detection period in the display time of the two consecutive fields to avoid affecting the display of the single field. Accordingly, when the data lines D1 to Dm and the scan lines G1 to Gn are transmitting data or scanning signals, the selection units 103 and 107 interrupt the coupling between the data lines D1 to Dm and the scanning lines G1 to Gn. On the other hand, when the sensor 105 senses in the touch detection period, the selection units 103 and 107 are coupled to the selected data lines D1 D Dm and the scan lines G1 G Gn to form a loop, so that the sensor 105 can transmit A capacitive, resistive, pressure sensitive, or optical touch sensing detection signal is coupled to the coupled data lines D1 to Dm and the scanning lines G1 to Gn.
換言之,其顯像與檢測之流程可分成三個時段,在第一時段中,顯示器顯示掃描畫面區域,而選擇單元103和107、感測器105均不作用。在第二時段中,進行電磁式觸控檢測,此時選擇單元103,例如,在資料線D1~Dm間形成迴路,並由感測器105進行磁通量變化之檢測。接著選擇單元107,例如,會在掃瞄線G1~Gn間形成迴路,並由感測器105進行磁通量變化之檢測。最後到第三時段後再進行電容式觸控檢測,此時,感測器105,例如會依序掃描資料線D1~Dm和掃瞄線G1~Gn,來檢測資料線D1~Dm和掃瞄線G1~Gn間哪一跨接處之電容值發生變化而依此判定觸控處。其中,感測器105可進行電容式、電阻式、壓感式、或光學式之觸控感應之觸控數值、位置、高度距離之計算。其中感測器105用以刺激、偵測或感應選擇單元103選擇之部分資料線D1~Dm,以及刺激、偵測或感應,選擇單元107選擇之部分掃瞄線G1~Gn中之訊號。In other words, the process of development and detection can be divided into three time periods in which the display displays the scanned picture area, and the selection units 103 and 107 and the sensor 105 do not function. In the second time period, the electromagnetic touch detection is performed. At this time, the selection unit 103 forms a loop between the data lines D1 to Dm, for example, and the sensor 105 performs the detection of the magnetic flux change. Next, the selection unit 107, for example, forms a loop between the scan lines G1 to Gn, and the sensor 105 detects the change in the magnetic flux. Finally, the capacitive touch detection is performed after the third time period. At this time, the sensor 105, for example, sequentially scans the data lines D1 D Dm and the scan lines G1 G Gn to detect the data lines D1 D Dm and scan. The capacitance value of the jump between the lines G1 to Gn changes to determine the touch position. The sensor 105 can perform calculation of touch values, positions, and height distances of capacitive, resistive, pressure sensitive, or optical touch sensing. The sensor 105 is used to stimulate, detect or sense part of the data lines D1 D Dm selected by the selection unit 103, and to stimulate, detect or sense, and select the signals in the partial scanning lines G1 G Gn selected by the unit 107.
在一實施例中,如第5D圖所示,選擇單元103和107,例如包括至少一選擇線和至少一傳輸線,其中對應之薄膜電晶體(切換開關)形成於選擇線和傳輸線之跨接處,透過該些薄膜電晶體,資料線D1~Dm和掃瞄線G1~Gn可耦接於傳輸線。而在另一實施例中,選擇單元103和107,例如包括複數個切換開關,藉由直接切換該些切換開關來連接部分資料線D1~Dm,以及部分掃瞄線G1~Gn以進行一電容式、電阻式、壓感式、或光學式之觸控感應檢測。此外,為避免液晶顯示器在顯示圖場時之掃描訊號與資料信號,和進行觸控檢測時之檢測信號發生衝突,因此一控制單元223形成在資料線D1~Dm與導通線221間,用以控制資料線D1~Dm與導通線221之耦接,且亦利用分時之方法,在兩連續圖場顯示時間中插入觸控位置檢測時段,避免影像單一圖場之顯示。其中控制單元223具有一控制線220、複數個切換開關2231~223m以及導通線221,控制線220可控制切換開關2231~223m之開啟與關閉,而資料線D1~Dm透過該些個切換開關2231~223m與導通線221耦接。其中切換開關2231~223m,例如為薄膜電晶體。依此,當資料線D1~Dm在傳送資料信號時,亦即進行顯示時,控制線220控制該些切換開關2231~223m關閉時,中斷資料線D1~Dm與導通線221之耦接。反之當感測器105於電磁檢測時段中進行感測時,控制線220控制該些切換開關2231~223m開啟,讓資料線D1~Dm耦接至導通線221藉以形成迴路以進行位置之感測。In an embodiment, as shown in FIG. 5D, the selection units 103 and 107 include, for example, at least one selection line and at least one transmission line, wherein a corresponding thin film transistor (switching switch) is formed at the junction of the selection line and the transmission line. Through the thin film transistors, the data lines D1~Dm and the scan lines G1~Gn can be coupled to the transmission line. In another embodiment, the selecting units 103 and 107 include, for example, a plurality of switching switches, and the partial data lines D1 D Dm and the partial scanning lines G1 G Gn are connected to perform a capacitor by directly switching the switching switches. Type, resistive, pressure sensitive, or optical touch sensing. In addition, a control unit 223 is formed between the data lines D1 D Dm and the conduction line 221 to prevent the scanning signal and the data signal of the liquid crystal display from colliding with the detection signal when the field is displayed. The control data lines D1~Dm are coupled to the conduction line 221, and the touch position detection period is inserted in the display time of the two consecutive fields by using the time division method to avoid the display of the single image field of the image. The control unit 223 has a control line 220, a plurality of switch switches 2231 to 223m, and a conduction line 221. The control line 220 can control the opening and closing of the switch 2231~223m, and the data lines D1~Dm pass through the switch 2231. ~223m is coupled to the conduction line 221. The changeover switches 2231 to 223m are, for example, thin film transistors. Accordingly, when the data lines D1 to Dm are displayed when the data signals are transmitted, the control line 220 controls the switching of the data lines D1 to Dm and the conduction lines 221 when the switching switches 2231 to 223m are turned off. On the other hand, when the sensor 105 senses in the electromagnetic detection period, the control line 220 controls the switch switches 2231 to 223m to be turned on, and the data lines D1 to Dm are coupled to the conduction line 221 to form a loop for position sensing. .
另一方面,一控制單元224形成在掃瞄線G1~Gn與導通線222間,用以控制掃瞄線G1~Gn與導通線222之耦接。其中控制單元224具有一控制線226、複數個切換開關2241~224n以及導通線222,控制線226可控制切換開關2241~224n之開啟與關閉,而掃瞄線G1~Gn透過該些個切換開關2241~224n與導通線222耦接。其中切換開關2241~224n,例如為薄膜電晶體。依此,當掃瞄線G1~Gn在傳送資料信號時以進行顯示時,控制線226控制該些切換開關2241~224n關閉時,中斷掃瞄線G1~Gn與導通線222之耦接。反之當感測器於檢測時段中進行電磁感應感測時,控制線226控制該些切換開關2241~224n開啟,讓掃瞄線G1~Gn耦接至導通線222藉以形成迴路來進行位置之感測。On the other hand, a control unit 224 is formed between the scan lines G1 G Gn and the conduction line 222 for controlling the coupling of the scan lines G1 G Gn and the conduction line 222 . The control unit 224 has a control line 226, a plurality of switch switches 2241~224n and a conduction line 222. The control line 226 can control the opening and closing of the switch 2241~224n, and the scan lines G1~Gn pass through the switch. 2241~224n are coupled to the conduction line 222. The switching switches 2241 to 224n are, for example, thin film transistors. Accordingly, when the scan lines G1 to Gn are displayed for transmitting the data signal, the control line 226 controls the coupling of the scan lines 24-1 to 224n to be closed, and the connection of the scan lines G1 to Gn and the conduction line 222 is interrupted. On the other hand, when the sensor performs electromagnetic induction sensing in the detection period, the control line 226 controls the switching switches 2241 to 224n to be turned on, and the scanning lines G1 G Gn are coupled to the conduction line 222 to form a loop for position sensing. Measurement.
當感測器於檢測時段中進行電容觸控感測時,感測器105會控制控制單元223中斷該些資料線D1~Dm間之連接,以及控制控制單元224中斷該些掃瞄線G1~Gn間連接。接著,根據採用之電容式感測方式,自容式感測方式或互容式感測方式,來進行掃描。例如,,當採用自容式感測方式時,資料線D1~Dm以及掃瞄線G1~Gn間分別與地構成電容,亦即自電容,也就是電極對地的電容。當手指接近或觸摸到觸控螢幕時,手指的電容將會感應疊加到資料線D1~Dm或掃瞄線G1~Gn分別與地構成之電容上,造成電荷、電容量改變,而藉以偵測觸控位置。依此,在進行自容式感測檢測時,感測器105會控制選擇單元103和107,以進行資料線D1~Dm以及掃瞄線G1~Gn之選擇。接著感測器105發出之檢測信號傳送至選擇之資料線D1~Dm以及掃瞄線G1~Gn上,並根據觸摸前後電容的變化,分別確定橫向座標和縱向座標,然後組合成平面的觸摸座標。When the sensor performs capacitive touch sensing in the detecting period, the sensor 105 controls the control unit 223 to interrupt the connection between the data lines D1 D Dm, and the control control unit 224 interrupts the scanning lines G1~ Gn connection. Then, according to the capacitive sensing method adopted, the self-capacitive sensing method or the mutual capacitive sensing method is used for scanning. For example, when the self-capacitance sensing method is adopted, the data lines D1 to Dm and the scanning lines G1 to Gn respectively form a capacitance with the ground, that is, a self-capacitance, that is, a capacitance of the electrode to the ground. When the finger approaches or touches the touch screen, the capacitance of the finger will be superimposed on the capacitance formed by the data line D1~Dm or the scan line G1~Gn and the ground respectively, causing the charge and capacitance to change, thereby detecting Touch location. Accordingly, when self-capacitive sensing detection is performed, the sensor 105 controls the selection units 103 and 107 to select the data lines D1 to Dm and the scanning lines G1 to Gn. Then, the detection signal sent by the sensor 105 is transmitted to the selected data lines D1~Dm and the scan lines G1~Gn, and the lateral coordinates and the longitudinal coordinates are respectively determined according to the change of the capacitance before and after the touch, and then combined into a planar touch coordinate. .
另一方面,若採用互容式感測方式,它與自容式感測檢測的差異在於,資料線D1~Dm以及掃瞄線G1~Gn上交叉的地方將會形成感應電容,亦即資料線D1~Dm以及掃瞄線G1~Gn上分別構成了感應電容的兩極。當手指觸摸到觸控螢幕時,影響了觸控點附近兩個電極之間的耦合,從而改變了這兩個電極之間的電荷、電容量分布,而檢測出觸控位置。因此,在進行互容式感測檢測時,可從資料線D1~Dm依次發出刺激信號,而由掃瞄線G1~Gn依序同時接收信號,亦即感測器105發出之檢測信號經由選擇單元103依序傳輸給資料線D1~Dm,並將掃瞄線G1~Gn上之檢測信號由選擇單元107傳回至感測器105。或由掃瞄線G1~Gn依次發出刺激信號,而由資料線D1~Dm同時接收信號,亦即感測器105發出之檢測信號經由選擇單元107依序傳輸給掃瞄線G1~Gn,並將資料線D1~Dm上之檢測信號經由選擇單元103傳回至感測器105。這樣可以得到所有橫向和縱向電極交叉點的電容值大小,即整個觸控螢幕的二維平面的電容大小。根據觸控螢幕二維電容變化量資料,計算出感觸、觸控點的座標。值得注意得是,上述之選擇資料線D1~Dm,和掃瞄線G1~Gn方式亦可應用於電阻式、壓感式、感壓式或光學式。On the other hand, if the mutual capacitance sensing method is adopted, the difference between it and the self-capacitance sensing detection is that the sensing capacitors, that is, the data, are formed at the intersections of the data lines D1 to Dm and the scanning lines G1 to Gn. The lines D1 to Dm and the scanning lines G1 to Gn respectively constitute the two poles of the sensing capacitor. When the finger touches the touch screen, the coupling between the two electrodes near the touch point is affected, thereby changing the charge and capacitance distribution between the two electrodes, and detecting the touch position. Therefore, in the mutual capacitance sensing detection, the stimulation signals can be sequentially sent from the data lines D1 to Dm, and the signals are simultaneously received by the scanning lines G1 G Gn, that is, the detection signals sent by the sensor 105 are selected. The unit 103 is sequentially transmitted to the data lines D1 to Dm, and the detection signals on the scan lines G1 to Gn are transmitted back to the sensor 105 by the selection unit 107. Or the stimulation signals are sequentially sent from the scan lines G1 to Gn, and the signals are simultaneously received by the data lines D1 to Dm, that is, the detection signals from the sensor 105 are sequentially transmitted to the scan lines G1 to Gn via the selection unit 107, and The detection signals on the data lines D1 to Dm are transmitted back to the sensor 105 via the selection unit 103. This gives the capacitance of all horizontal and vertical electrode intersections, ie the capacitance of the two-dimensional plane of the entire touch screen. According to the two-dimensional capacitance change data of the touch screen, the coordinates of the touch and touch points are calculated. It is worth noting that the above selected data lines D1~Dm and the scanning lines G1~Gn can also be applied to resistive, pressure sensitive, pressure sensitive or optical.
當進行電磁感應觸控感測時,感測器105會控制控制單元223和224,分別連接該些資料線D1~Dm,和掃瞄線G1~Gn,同時感測器105亦控制選擇單元103來於兩組的資料線D1~Dm間形成迴路,並透過選擇單元103發射信號到迴路中,來判斷迴路是否為觸控位置。When performing electromagnetic induction touch sensing, the sensor 105 controls the control units 223 and 224 to connect the data lines D1 D Dm and the scan lines G1 G Gn respectively, and the sensor 105 also controls the selection unit 103. A loop is formed between the data lines D1 to Dm of the two groups, and a signal is sent to the loop through the selection unit 103 to determine whether the loop is a touch position.
相似的,感測器105亦會控制選擇單元107於兩組的掃瞄線G1~Gn間形成迴路,並透過選擇單元107發射信號到迴路中,來判斷迴路是否為觸控位置。在一實施例中是以檢測此感測信號是否發生變化來確認迴路中之磁通量、電磁感應、或電壓、電流、頻率之觸控感應迴路信號等是否發生變化。其中,發出之感測信號可以是方波、三角波、類三角波或複數個方波的線性疊加組合,而感測訊號的改變量可為波形失真程度、訊號均值或峰值的改變、電壓或電流的改變量或上述物理參數的相對值、積分值、累加或累計數值等。Similarly, the sensor 105 also controls the selection unit 107 to form a loop between the two sets of scan lines G1 to Gn, and transmits a signal to the loop through the selection unit 107 to determine whether the loop is a touch position. In one embodiment, it is determined whether the magnetic flux, electromagnetic induction, or voltage, current, frequency, touch sensing loop signal, etc. in the loop change, whether the sensing signal changes. The sensed signal may be a linear superposition combination of a square wave, a triangular wave, a triangular wave or a plurality of square waves, and the amount of change of the sensing signal may be a waveform distortion degree, a signal mean value or a peak value change, a voltage or a current. The amount of change or the relative value of the above physical parameters, the integral value, the accumulated or accumulated value, and the like.
此外,由於資料線D1~Dm和掃瞄線G1~Gn佈線相當密集,如用以當作觸控面板電極,當一使用者觸碰面板時,會同時造成複數資料線D1~Dm和掃瞄線G1~Gn間之跨接觸電容值改變,且信號改變數值太低,不易檢測。因此為解決上述之問題,可以相鄰之數條資料線為一組和一定間距的數條資料線為另一組,透過切換開關來導通兩組感應導線以形成感應迴路。以相鄰之數條掃瞄線為一組和一定間距的數條掃描線為另一組,透過切換開關來導通兩組感應導線以形成感應迴路。In addition, since the data lines D1~Dm and the scanning lines G1~Gn are densely arranged, if used as a touch panel electrode, when a user touches the panel, multiple data lines D1~Dm and scanning are simultaneously generated. The value of the cross-contact capacitance between the lines G1 to Gn changes, and the signal change value is too low to be easily detected. Therefore, in order to solve the above problem, a plurality of data lines adjacent to each other and a plurality of data lines with a certain interval may be used as another group, and two sets of induction wires are turned on through the switch to form an inductive loop. The adjacent scanning lines are grouped and the plurality of scanning lines are separated into another group, and the two sets of sensing wires are turned on through the switch to form an inductive loop.
如第5A圖所示,以電容式感應為例,以相鄰之九十條資料線作為同一組,例如:D1~D90為一組、D91~D180為一組,依此類推,同時以相鄰之三十條掃瞄線作為同一組,例如:G1~G30為一組、G31~G60為一組,依此類推。將相同組別之資料線和掃瞄線視為同一條,並輸入相同感測信號以進行檢測。在一實施例中,上述分組之方式,亦可以對應一般手指寬度1/2~1/3,約2~5mm大小為基礎進行分組。As shown in Figure 5A, taking capacitive sensing as an example, the ninety adjacent data lines are used as the same group, for example, D1~D90 are a group, D91~D180 are a group, and so on. The neighboring 30 scan lines are the same group, for example, G1~G30 is a group, G31~G60 is a group, and so on. The data lines and scan lines of the same group are treated as the same line, and the same sensing signal is input for detection. In an embodiment, the grouping manner may be grouped according to a general finger width of 1/2 to 1/3 and a size of about 2 to 5 mm.
再者,為了於進行電磁感應式觸控檢測時分別於資料線D1~Dm間和掃瞄線G1~Gn間形成迴路,選擇單元103和107亦會被形成於液晶顯示器面板上。其中選擇單元103串接部分資料線D1~Dm形成一迴路。而選擇單元107亦串接部分掃瞄線G1~Gn形成一迴路。同樣的,資料線D1~Dm間和掃瞄線G1~Gn間形成之迴路可由相鄰一定間距之兩組資料線或相鄰一定間距之兩組掃瞄線構成,或以一定間距跳組之方式形成。如感測器105透過選擇單元103將資料線D1~D30所形成之組與資料線D61~D90所形成之組耦接一起而形成一大區域之迴路。當進行電磁感應觸控時,感測器105即可透過選擇單元103發射感測信號到迴路進行檢測。且所形成之迴路間可互相交疊,來避免偵測"死角"。例如:依序形成之兩迴路,A迴路和B迴路,其中A迴路是由資料線D1~D10為一支線,間隔100條線,再以資料線D111~D220為另一支線形成之一迴路。而B迴路是由資料線D100~D110為一支線,間隔100條線,再以資料線D211~D220為另一支線所形成。依此,A迴路和B迴路間具有D100~D220之交疊區域,來避免偵測"死角"。Furthermore, in order to form a loop between the data lines D1 to Dm and the scan lines G1 to Gn for the electromagnetic inductive touch detection, the selection units 103 and 107 are also formed on the liquid crystal display panel. The selection unit 103 is connected in series to the partial data lines D1 to Dm to form a loop. The selection unit 107 also connects a part of the scanning lines G1 to Gn in series to form a loop. Similarly, the loop formed between the data lines D1~Dm and the scan lines G1~Gn may be composed of two sets of data lines adjacent to a certain distance or two sets of scan lines adjacent to each other, or may be hopped at a certain interval. The way is formed. For example, the sensor 105 couples the group formed by the data lines D1 to D30 and the group formed by the data lines D61 to D90 through the selection unit 103 to form a loop of a large area. When the electromagnetic induction touch is performed, the sensor 105 can transmit the sensing signal to the loop through the selection unit 103 for detection. And the loops formed can overlap each other to avoid detecting "dead angles". For example, the two loops formed in sequence, the A loop and the B loop, wherein the A loop is a line from the data lines D1~D10, separated by 100 lines, and then one of the data lines D111~D220 is formed as one loop. The B loop is formed by the data line D100~D110 as a line, separated by 100 lines, and then formed by the data line D211~D220 as another branch line. Accordingly, the overlap between the A loop and the B loop has D100~D220 to avoid detecting the "dead angle".
其中資料線D1~Dm間和掃瞄線G1~Gn間之耦接可由薄膜電晶體(or TFD,NMOS,PMOS,CMOS,....等開關元件)完成或其他具相同功能之元件,而若由薄膜電晶體來形成,則該些薄膜電晶體可形成於光干涉顯示系統主動陣列之周邊上,且與光干涉顯示系統主動陣列中之薄膜電晶體一起形成。此外,在另一實施例中,選擇單元103可直接建置在源極驅動電路400中,而選擇單元107亦可直接建置在閘極驅動電路401中。The coupling between the data lines D1 to Dm and the scanning lines G1 to Gn may be performed by a thin film transistor (or TFD, NMOS, PMOS, CMOS, ..., etc.) or other components having the same function. If formed of thin film transistors, the thin film transistors can be formed on the periphery of the active array of the optical interference display system and formed together with the thin film transistors in the active array of the optical interference display system. In addition, in another embodiment, the selection unit 103 can be directly built in the source driving circuit 400, and the selection unit 107 can also be directly built in the gate driving circuit 401.
如第5E圖所示為根本發明另一較佳實施例光干涉顯示系統觸控元件之電極結構概略圖示,本實施例與前一實施例最大之不同處在於在本實施例中,控制單元243具有一控制線240、複數個切換開關2431~243m以及複數條導通線2411~241k。感測器105連接該些導通線2411~241k。資料線D1~Dm透過切換開關與對應之導通線2411~241k耦接,並透過對應之導通線2411~241k連接感測器105。在本實施例中,資料線D1,D2透過切換開關2431和2432與導通線2411耦接,並透過導通線2411連接感測器105。資料線D3和D4透過切換開關2433和2434與對應之導通線2422耦接,並透過對應之導通線2422連接感測器105。值得注意的是,耦接每一導通線之第一導線數目或順序並不受本實施例所限。FIG. 5E is a schematic diagram showing the electrode structure of the touch component of the optical interference display system according to another preferred embodiment of the present invention. The biggest difference between this embodiment and the previous embodiment is that in the embodiment, the control unit The 243 has a control line 240, a plurality of switching switches 2431 to 243m, and a plurality of conduction lines 2411 to 241k. The sensor 105 connects the conduction lines 2411 to 241k. The data lines D1~Dm are coupled to the corresponding conductive lines 2411~241k through the switch, and connected to the sensor 105 through the corresponding conductive lines 2411~241k. In the present embodiment, the data lines D1 and D2 are coupled to the conduction line 2411 through the changeover switches 2431 and 2432, and are connected to the sensor 105 through the conduction line 2411. The data lines D3 and D4 are coupled to the corresponding conductive lines 2422 through the changeover switches 2433 and 2434, and connected to the sensor 105 through the corresponding conductive lines 2422. It should be noted that the number or order of the first wires coupling each of the conduction lines is not limited by this embodiment.
感測器105控制控制線240來控制切換開關2431~243m之開啟與關閉,使得第資料線D1~Dm透過該些個切換開關2431~243m與對應導通線耦接。其中切換開關2431~243m,例如為薄膜電晶體,該些薄膜電晶體之閘極耦接該控制線240,當控制線240控制該些薄膜電晶體關閉時,則中斷資料線D1~Dm與導通線2411~241k間之耦接。反之當控制線220控制該些薄膜電晶體開啟時,感測器105亦會控制選擇單元103選擇導通對應之資料線D1~Dm來形成一迴路。The sensor 105 controls the control line 240 to control the opening and closing of the changeover switches 2431 to 243m, so that the data lines D1 to Dm are coupled to the corresponding conduction lines through the plurality of switch switches 2431 to 243m. The switch 2431~243m is, for example, a thin film transistor, and the gates of the thin film transistors are coupled to the control line 240. When the control line 240 controls the thin film transistors to be turned off, the data lines D1 to Dm and the conductive lines are interrupted. Coupling between lines 2411~241k. Conversely, when the control line 220 controls the thin film transistors to be turned on, the sensor 105 also controls the selection unit 103 to select and turn on the corresponding data lines D1 to Dm to form a loop.
另一方面,控制單元244具有一控制線246、複數個切換開關2441~244n以及複數條導通線2421~242k。感測器106連接該些導通線2421~242k。掃瞄線G1~Gn透過切換開關與對應之導通線2421~242k耦接,並透過對應之導通線2421~242k連接感測器106。在本實施例中,掃瞄線G1和G2透過切換開關2441和2442與導通線2421耦接,並透過導通線2421連接感測器105。掃瞄線G3和G4透過切換開關2443和2444與對應之導通線2422耦接,並透過對應之導通線2422連接感測器105。值得注意的是,耦接每一導通線之第一導線數目或順序並不受本實施例所限。On the other hand, the control unit 244 has a control line 246, a plurality of switching switches 2441 to 244n, and a plurality of conduction lines 2421 to 242k. The sensor 106 connects the conduction lines 2421 to 242k. The scan lines G1~Gn are coupled to the corresponding conductive lines 2421~242k through the switch, and connected to the sensor 106 through the corresponding conductive lines 2421~242k. In the present embodiment, the scan lines G1 and G2 are coupled to the conduction line 2421 through the changeover switches 2441 and 2442, and are connected to the sensor 105 through the conduction line 2421. The scan lines G3 and G4 are coupled to the corresponding conductive lines 2422 through the switch 2443 and 2444, and connected to the sensor 105 through the corresponding conductive lines 2422. It should be noted that the number or order of the first wires coupling each of the conduction lines is not limited by this embodiment.
感測器105控制控制線246來控制切換開關2441~244n之開啟與關閉,使得掃瞄線G1~Gn透過該些個切換開關2441~244n與對應導通線耦接。其中切換開關2441~244n,例如為薄膜電晶體,該些薄膜電晶體之閘極耦接該控制線246,當控制線246控制該些薄膜電晶體關閉時,則中斷掃瞄線G1~Gn與導通線2421~242k間之耦接。反之當控制線246控制該些薄膜電晶體開啟時,感測器105亦會控制選擇單元107選擇導通對應之掃瞄線來形成一迴路,以進行電磁感應檢測。The sensor 105 controls the control line 246 to control the opening and closing of the changeover switches 2441 to 244n, so that the scan lines G1 to Gn are coupled to the corresponding conduction lines through the plurality of switch switches 2441 to 244n. The switching switches 2441~244n are, for example, thin film transistors, and the gates of the thin film transistors are coupled to the control line 246. When the control line 246 controls the thin film transistors to be turned off, the scanning lines G1 to Gn are interrupted. The coupling between the conduction lines 2421~242k. Conversely, when the control line 246 controls the thin film transistors to be turned on, the sensor 105 also controls the selection unit 107 to select and turn on the corresponding scan lines to form a loop for electromagnetic induction detection.
而當感測器進行電容觸控感測時,感測器105會控制控制單元243中斷該些資料線D1~Dm間之連接,以及控制控制單元244中斷該些掃瞄線G1~Gn間連接。接著,根據採用之電容式感測方式,自容式感測方式或互容式感測方式,來進行掃描。When the sensor performs capacitive touch sensing, the sensor 105 controls the control unit 243 to interrupt the connection between the data lines D1 to Dm, and the control unit 244 interrupts the connection between the scan lines G1 to Gn. . Then, according to the capacitive sensing method adopted, the self-capacitive sensing method or the mutual capacitive sensing method is used for scanning.
根據本發明,觸控感應元件除了可與光干涉顯示系統主動陣列之電極結構共構外,更可形成在一光干涉顯示單元的不同位置上。參閱第6圖所示為光干涉顯示系統之剖視概略圖示,其中僅畫出一光干涉顯示單元100。此光干涉顯示系統的剖面結構至少包含:一第一基板110、一第二基板131、以及一光干涉顯示單元100位於該第一基板110和該第二基板131間。該第二基板可為一上蓋保護玻璃,在另一實施例中,更可於第二基板131上另行形成一上蓋造型單元。其中,上蓋造型單元可為一透明保護玻璃。According to the present invention, in addition to being co-constructed with the electrode structure of the active array of the optical interference display system, the touch sensing elements can be formed at different positions of an optical interference display unit. Referring to Fig. 6, there is shown a schematic cross-sectional view of an optical interference display system in which only one optical interference display unit 100 is shown. The cross-sectional structure of the optical interference display system includes at least a first substrate 110, a second substrate 131, and an optical interference display unit 100 between the first substrate 110 and the second substrate 131. The second substrate may be an upper cover protection glass. In another embodiment, an upper cover molding unit may be separately formed on the second substrate 131. The upper cover modeling unit can be a transparent protective glass.
在此實施例中,一觸控感應面板150可貼附在第二基板131之上方,或是貼附在第二基板131之下方,或第二基板和光干涉顯示單元100之間,或是貼附在第一基板110之下方,亦即貼附在第一基板110未具主動陣列之另一面上。此外為了要將反射出之點光源分佈成均勻的面光,因此在另一實施例中,可於第二基板131上形成一擴散膜132,達到光線均勻擴散的效果,依此,一觸控感應面板150亦可貼附在擴散膜132之上方。此外,若於第二基板131上另行形成有一上蓋造型單元時,在此實施例中,一觸控感應面板150可貼附在上蓋造型單元131之上方,或是貼附在上蓋造型單元之下方。In this embodiment, a touch sensing panel 150 can be attached to the second substrate 131, or attached under the second substrate 131, or between the second substrate and the optical interference display unit 100, or Attached to the first substrate 110, that is, attached to the other surface of the first substrate 110 without the active array. In addition, in order to distribute the reflected point source into a uniform surface light, in another embodiment, a diffusion film 132 may be formed on the second substrate 131 to achieve uniform light diffusion. The sensing panel 150 can also be attached over the diffusion film 132. In addition, if an upper cover molding unit is separately formed on the second substrate 131, in this embodiment, a touch sensing panel 150 may be attached to the upper cover molding unit 131 or attached to the upper cover molding unit. .
在另一實施例中,若欲形成一彩色之光干涉顯示系統之,可於光干涉顯示單元100上再形成一彩色濾光片130於第二基板131上,參閱第7圖所示為一光干涉彩色顯示系統之剖視概略圖示,其中僅畫出一光干涉顯示單元100。此光干涉彩色顯示系統的剖面結構至少包含:一第一基板110、一第二基版131、一彩色濾光片130以及一光干涉顯示單元100位於該第一基板110和該彩色濾光片130間,該彩色濾光片130位在第二基板131。在另一實施例中,更可於第二基板131上另行形成一上蓋造型單元。其中,上蓋造型單元為一透明保護玻璃。In another embodiment, if a color light interference display system is to be formed, a color filter 130 may be further formed on the second substrate 131 on the optical interference display unit 100, as shown in FIG. A schematic cross-sectional view of an optical interference color display system in which only one optical interference display unit 100 is shown. The cross-sectional structure of the optical interference color display system includes at least a first substrate 110, a second substrate 131, a color filter 130, and an optical interference display unit 100 on the first substrate 110 and the color filter. 130, the color filter 130 is located on the second substrate 131. In another embodiment, an upper cover molding unit may be separately formed on the second substrate 131. The upper cover molding unit is a transparent protective glass.
在此實施例中,一觸控感應面板150可貼附在第二基板131之上方,或是貼附在第二基板131之下方,亦即貼附在第二基板131和彩色濾光片130之間,或是貼附在彩色濾光片130之下方,亦即貼附在彩色濾光片130和光干涉顯示單元100之間,亦或是貼附在第一基板110之下方,亦即貼附在第一基板110未具主動陣列之另一面上。此外為了要將反射出之點光源分佈成均勻的面光,因此在另一實施例中,可於第二基板131上形成一擴散膜132,達到光線均勻擴散的效果,依此,一觸控感應面板150亦可貼附在擴散膜132之上方。該第二基板131更可以是一上蓋保護單元、或上蓋造型單元。此外,若於第二基板131上另行形成有一上蓋造型單元時,在此實施例中,一觸控感應面板150可貼附在上蓋造型單元之上方,或是貼附在上蓋造型單元之下方。In this embodiment, a touch sensing panel 150 can be attached to the second substrate 131 or attached under the second substrate 131, that is, attached to the second substrate 131 and the color filter 130. Between the color filter 130 and the optical interference display unit 100, or attached to the lower side of the first substrate 110, that is, attached Attached to the first substrate 110 does not have the other side of the active array. In addition, in order to distribute the reflected point source into a uniform surface light, in another embodiment, a diffusion film 132 may be formed on the second substrate 131 to achieve uniform light diffusion. The sensing panel 150 can also be attached over the diffusion film 132. The second substrate 131 can be an upper cover protection unit or an upper cover molding unit. In addition, if an upper cover molding unit is separately formed on the second substrate 131, in this embodiment, a touch sensing panel 150 may be attached to the upper cover molding unit or attached under the upper cover molding unit.
參閱第8圖所示為光干涉彩色顯示系統之剖視概略圖示,其中僅畫出一光干涉式彩色顯示單元200。此光干涉彩色顯示系統的剖面結構至少包含:一第一基板110、一第二基板131以及一光干涉式彩色顯示單元200位於該第一基板110和該第二基板131間。在另一實施例中,更可於第二基板131上另行形成一上蓋造型單元。其中,上蓋造型單元為一透明保護玻璃。Referring to Fig. 8, there is shown a schematic cross-sectional view of an optical interference color display system in which only one optical interference type color display unit 200 is shown. The cross-sectional structure of the optical interference color display system includes at least a first substrate 110, a second substrate 131, and an optical interferometric color display unit 200 between the first substrate 110 and the second substrate 131. In another embodiment, an upper cover molding unit may be separately formed on the second substrate 131. The upper cover molding unit is a transparent protective glass.
在此實施例中,一觸控感應面板150可貼附在第二基板131之上方,或是貼附在第二基板130之下方,亦即貼附在第二基板131和光干涉式彩色顯示單元200之間,或是貼附在第一基板110之下方,亦即貼附在第一基板110未具主動陣列之另一面上。此外為了要將反射出之點光源分佈成均勻的面光,因此在另一實施例中,可於第二基板131上形成一擴散膜132,達到光線均勻擴散的效果,依此,一觸控感應面板150亦可貼附在擴散膜132之上方。此外,若於第二基板131上另行形成有一上蓋造型單元時,在此實施例中,一觸控感應面板150可貼附在上蓋造型單元之上方,或是貼附在上蓋造型單元之下方。In this embodiment, a touch sensing panel 150 can be attached to the second substrate 131 or attached under the second substrate 130, that is, attached to the second substrate 131 and the optical interference color display unit. Between 200, or attached under the first substrate 110, that is, attached to the other surface of the first substrate 110 without the active array. In addition, in order to distribute the reflected point source into a uniform surface light, in another embodiment, a diffusion film 132 may be formed on the second substrate 131 to achieve uniform light diffusion. The sensing panel 150 can also be attached over the diffusion film 132. In addition, if an upper cover molding unit is separately formed on the second substrate 131, in this embodiment, a touch sensing panel 150 may be attached to the upper cover molding unit or attached under the upper cover molding unit.
此外,由於不論是彩色光干涉顯示系統或單色光干涉顯示系統均不能自行發光,致使在黑暗之環境中,將無法產生反射光來顯示影像。因此本發明為解決此問題,於光干涉顯示系統中架設一前光源,作為反射光之來源,其結構如第9圖所示。第9圖所示為一具光源之光干涉顯示系統之剖視概略圖示,其中包括一光干涉顯示元件141,一前光源140設置於光干涉顯示元件141之上方,以及/或一上蓋造型單元或保護單元131設置於前光源140之上。上蓋造型單元或保護單元131可為一透明保護玻璃。前光源140,用以提供光干涉顯示元件141所需的前方照明或夜視閱讀照明,包括一光源140a和導光板140b,導光板140b用以導引光線方向,控制亮度均勻。光源140a設置在導光板140b的側邊,光源140a從導光板140b側邊射入光線,而進入導光板140b的光線會從導光板面向光干涉顯示元件141的一面射出,用以提供光干涉顯示元件141均勻、高效的前光源。在此實施例中,一觸控感應面板150可貼附在上蓋造型單元或保護單元131之上方,或是貼附在上蓋造型單元或保護單元131之下方,亦即貼附在上蓋造型單元131和前光源141之間,或是貼附在第一基板110之下方,亦即貼附在第一基板110未具主動陣列之另一面上。該光源可以是白光光源,或是分時序呈現的數種色光光源。而一觸控感應面板150之感測器可設置在前光源141下方,或是設置在保護單元131下方,而外部的切換開關,和感測器,都是共用,可設置在周邊。In addition, since neither the color light interference display system nor the monochromatic light interference display system can emit light by itself, in a dark environment, reflected light cannot be generated to display an image. Therefore, in order to solve this problem, the present invention provides a front light source in the optical interference display system as a source of reflected light, and its structure is as shown in FIG. Figure 9 is a schematic cross-sectional view of a light interference display system with a light source, including an optical interference display element 141, a front light source 140 disposed above the light interference display element 141, and/or a top cover The unit or protection unit 131 is disposed above the front light source 140. The upper cover molding unit or the protection unit 131 may be a transparent cover glass. The front light source 140 is configured to provide front illumination or night vision reading illumination required by the light interference display element 141, and includes a light source 140a and a light guide plate 140b for guiding the light direction to control the brightness uniform. The light source 140a is disposed on the side of the light guide plate 140b. The light source 140a emits light from the side of the light guide plate 140b, and the light entering the light guide plate 140b is emitted from one side of the light guide plate facing the light interference display element 141 to provide optical interference display. Element 141 is a uniform, efficient front light source. In this embodiment, a touch sensing panel 150 can be attached to the upper cover molding unit or the protection unit 131 or attached under the upper cover molding unit or the protection unit 131, that is, attached to the upper cover molding unit 131. Between the front substrate 141 and the front substrate 110, or attached to the first substrate 110, that is, attached to the other surface of the first substrate 110 without the active array. The light source can be a white light source or a plurality of color light sources that are presented in time series. The sensor of the touch sensing panel 150 can be disposed under the front light source 141 or under the protection unit 131, and the external switch and the sensor are shared and can be disposed at the periphery.
第10圖係繪示一微鏡陣列裝置的剖面示意圖。一微鏡陣列裝置300包括複數個微鏡301以矩陣排列之方式配置在半導體基材302的表面上。每一微鏡301包含一鏡面303以及對應之兩控制電極305和306。每一鏡面303通常是正方形的,且具有範圍大約在5至30微米之長度。鏡面303包含一(鋁板)反射面307、一支承平台308以及一彈性可撓柄309。鏡面303能夠在高達大約±15度(通常為小於±7至±15度)的角度下依著該傾斜軸而傾斜,亦即在+-X,+-Y方向進行轉動。彈性可撓柄309應與將堅固的柄以鉸鏈安裝在微鏡陣列裝置的基部。其中,該(鋁板)反射面307界定了鏡面303的一上反射表面。彈性可撓柄309可帶動鋁板307移動。而兩控制電極305和306分別位於可撓柄309之兩側邊上,可經由基材302內之電子電路而個別地定址到控制電極305和306,藉由一靜電力可使該鏡朝向該控制電極305或控制電極306傾斜。柄309的形式可以是被連接到鏡面303之一支承柱。或者,柄309可至少部分地沿著該傾斜軸而延伸。柄309之形式通常為沿著該傾斜軸延伸且與鏡面303共延伸之一支承壁。其中其控制電路單元是是利用CMOS SRAM記憶晶胞所製成,換言之,當製程時,首先會從一CMOS記憶體電路304配置在半導體基材302的表面上開始,再製造控制電極305和306。Figure 10 is a cross-sectional view showing a micromirror array device. A micromirror array device 300 includes a plurality of micromirrors 301 arranged in a matrix arrangement on the surface of the semiconductor substrate 302. Each micro mirror 301 includes a mirror surface 303 and corresponding two control electrodes 305 and 306. Each mirror 303 is generally square in shape and has a length ranging from about 5 to 30 microns. The mirror surface 303 includes an (aluminum plate) reflecting surface 307, a support platform 308, and an elastic flexible handle 309. The mirror 303 can be tilted according to the tilt axis at an angle of up to about ±15 degrees (typically less than ±7 to ±15 degrees), i.e., in the +-X, +-Y directions. The resiliently flexible handle 309 should be hingedly mounted to the base of the micromirror array device with a hinged handle. Wherein, the (aluminum plate) reflecting surface 307 defines an upper reflecting surface of the mirror surface 303. The elastic flexible handle 309 can drive the aluminum plate 307 to move. The two control electrodes 305 and 306 are respectively located on the two sides of the flexible handle 309, and can be individually addressed to the control electrodes 305 and 306 via electronic circuits in the substrate 302, and the mirror can be oriented toward the mirror by an electrostatic force. The control electrode 305 or the control electrode 306 is tilted. The shank 309 may be in the form of a support post that is coupled to the mirror 303. Alternatively, the handle 309 can extend at least partially along the tilt axis. The shank 309 is typically in the form of a support wall extending along the axis of inclination and coextensive with the mirror 303. The control circuit unit is made by using a CMOS SRAM memory cell. In other words, when the process is started, the CMOS memory circuit 304 is first disposed on the surface of the semiconductor substrate 302, and the control electrodes 305 and 306 are remanufactured. .
在此架構下,觸控感應元件可與CMOS記憶體電路之電極結構共構,值得注意的是,本案上述針對光干涉顯示單元使用之驅動方法,均可應用在微鏡陣列裝置,且其中感測器、驅動IC等,更可做在MEMS的基材,Wafer上,面積,體積可以更小化。更可形成在以微鏡陣列裝置300所形成之顯示系統的不同位置上。參閱第11圖所示為一微鏡陣列顯示系統之剖面結構,至少包含:一微鏡陣列裝置300以及一第二基版310作為一上蓋保護單元。在另一實施例中,上蓋保護單元為一透明保護玻璃,該上蓋保護單元可以更包含一上蓋造型單元。在此實施例中,一觸控感應面板150可貼附在第二基板131之上方,或是貼附在第二基板1310之下方,亦即貼附在第二基板131和微鏡陣列裝置300之間,或是貼附在微鏡陣列裝置300之下方。In this architecture, the touch sensing component can be co-constructed with the electrode structure of the CMOS memory circuit. It is worth noting that the driving method for the optical interference display unit described above can be applied to the micromirror array device. Detectors, driver ICs, etc., can be used in MEMS substrates, Wafer, area, volume can be smaller. It can be formed at different positions of the display system formed by the micromirror array device 300. Referring to FIG. 11, a cross-sectional structure of a micromirror array display system includes at least a micromirror array device 300 and a second substrate 310 as an upper cover protection unit. In another embodiment, the upper cover protection unit is a transparent cover glass, and the upper cover protection unit may further include an upper cover molding unit. In this embodiment, a touch sensing panel 150 can be attached to the second substrate 131 or attached under the second substrate 1310, that is, attached to the second substrate 131 and the micro mirror array device 300. Between or attached to the micromirror array device 300.
微鏡陣列裝置也可以搭配一前光源如圖22所示。第22圖所示為一具光源之微鏡陣列裝置之剖視概略圖示,其中包括一微鏡陣列裝置300,一前光源340設置於微鏡陣列裝置300之上方,以及/或一上蓋造型單元或保護單元310設置於前光源340之上。上蓋造型單元或保護單元310可為一透明保護玻璃。前光源340,用以提供微鏡陣列裝置300所需的前方照明或夜視閱讀照明,包括一光源340a和導光板340b,導光板340b用以導引光線方向,控制亮度均勻。光源340a設置在導光板340b的側邊,光源340a從導光板340b側邊射入光線,而進入導光板340b的光線會從導光板面向微鏡陣列裝置300的一面射出,用以提供微鏡陣列裝置300均勻、高效的前光源。在此實施例中,一觸控感應面板150可貼附在上蓋造型單元或保護單元310之上方,或是貼附在上蓋造型單元或保護單元310之下方,亦即貼附在上蓋造型單元310和前光源340之間。該光源可以是白光光源,或是分時序呈現的數種色光光源。The micromirror array device can also be combined with a front light source as shown in FIG. Figure 22 is a schematic cross-sectional view of a micromirror array device having a light source, including a micromirror array device 300, a front light source 340 disposed above the micromirror array device 300, and/or a top cover The unit or protection unit 310 is disposed above the front light source 340. The upper cover molding unit or the protection unit 310 may be a transparent protective glass. The front light source 340 is configured to provide front illumination or night vision reading illumination required by the micromirror array device 300, and includes a light source 340a and a light guide plate 340b for guiding the light direction and controlling the brightness to be uniform. The light source 340a is disposed on a side of the light guide plate 340b. The light source 340a emits light from a side of the light guide plate 340b, and the light entering the light guide plate 340b is emitted from a side of the light guide plate facing the micromirror array device 300 to provide a micro mirror array. The device 300 has a uniform, efficient front light source. In this embodiment, a touch sensing panel 150 can be attached to the upper cover molding unit or the protection unit 310 or attached under the upper cover molding unit or the protection unit 310, that is, attached to the upper cover molding unit 310. Between and the front light source 340. The light source can be a white light source or a plurality of color light sources that are presented in time series.
在用在投影時或HMD或微投影pico-Display時,可以有光機系統,有外界光源與之搭配。當該微機電顯示器具一外界光源或光機時,在利用該前光源,外界光源或光機關閉或點暗之時間,在該時段來進行觸控感測。When used in projection or HMD or micro-projection pico-Display, there may be a light machine system with an external light source to match it. When the MEMS display device is an external light source or a light machine, the touch sensing is performed during the period when the external light source or the external light source or the light machine is turned off or darkened by the front light source.
綜合上述所言,本發明將一觸控面板加入微機電顯示器中,使得微機電顯示器具觸控功能,在使用上將更為直接與方便。且觸控面板之導線結構更可與微機電顯示器之控制電極共構,而減少製程程序。In summary, the present invention adds a touch panel to a MEMS display, so that the touch function of the MEMS display device is more direct and convenient in use. Moreover, the wire structure of the touch panel can be co-constructed with the control electrode of the MEMS display, and the process procedure is reduced.
雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.
100、200...光干涉式顯示單元100, 200. . . Optical interferometric display unit
102...第一電極102. . . First electrode
103、107...選擇單元103, 107. . . Selection unit
104...第二電極104. . . Second electrode
105...感測器105. . . Sensor
106...支撐物106. . . Support
108...腔室108. . . Chamber
110...基材110. . . Substrate
112...觀察者112. . . Observer
120...平板保護結構120. . . Flat protection structure
122...黏著材料122. . . Adhesive material
130...濾光片基板130. . . Filter substrate
131和310...第二基板131 and 310. . . Second substrate
132...擴散膜132. . . Diffusion film
140和340...前光源140 and 340. . . Front light source
140a和340a...光源140a and 340a. . . light source
140b和340b...導光板140b and 340b. . . Light guide
141...光干涉顯示元件141. . . Optical interference display element
220...控制線220. . . Control line
221...導通線221. . . Conduction line
222...導通線222. . . Conduction line
223...控制單元223. . . control unit
224...控制單元224. . . control unit
226...控制線226. . . Control line
2231~223m...切換開關2231~223m. . . Toggle switch
2241~224n...切換開關2241~224n. . . Toggle switch
240...控制線240. . . Control line
2411~241k...導通線2411~241k. . . Conduction line
2421~242k...導通線2421~242k. . . Conduction line
243...控制單元243. . . control unit
244...控制單元244. . . control unit
246...控制線246. . . Control line
2431~243m...切換開關2431~243m. . . Toggle switch
2441~244n...切換開關2441~244n. . . Toggle switch
150...觸控單元150. . . Touch unit
300...微鏡陣列裝置300. . . Micromirror array device
301...微鏡301. . . Micromirror
302...半導體基材302. . . Semiconductor substrate
303...鏡面303. . . Mirror
304...CMOS記憶體電路304. . . CMOS memory circuit
305和306305 and 306
307...鋁板307. . . Aluminum plate
308...支承平台308. . . Support platform
309...彈性可撓柄309. . . Elastic flexible handle
400...源極電路400. . . Source circuit
401...閘極電路401. . . Gate circuit
402...畫素402. . . Pixel
403...薄膜電晶體403. . . Thin film transistor
D、d、d1、d2、d3...間隙D, d, d1, d2, d3. . . gap
為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下:The above and other objects, features, advantages and embodiments of the present invention will become more apparent and understood.
第1圖係繪示光干涉顯示系統中一顯示單元的剖面示意圖。Figure 1 is a schematic cross-sectional view showing a display unit in an optical interference display system.
第2圖係繪示光干涉顯示單元加上電壓後的剖面示意圖。Figure 2 is a schematic cross-sectional view showing the light interference display unit after voltage is applied.
第3圖係繪示光干涉顯示單元加入一保護蓋的剖面示意圖。Figure 3 is a schematic cross-sectional view showing the addition of a protective cover to the optical interference display unit.
第4圖係繪示光干涉顯示系統加入一彩色濾光基板的剖面示意圖。Figure 4 is a schematic cross-sectional view showing the addition of a color interference display system to a color filter substrate.
第5A圖所示為一光干涉顯示單元與其控制單元電極間之耦接關係概略圖示。Fig. 5A is a schematic diagram showing the coupling relationship between an optical interference display unit and its control unit electrodes.
第5B圖所示為一光干涉顯示系統觸控元件之電極結構放大概略圖示。FIG. 5B is an enlarged schematic diagram showing the electrode structure of the touch element of an optical interference display system.
第5C圖所示為根據本發明一實施例一光干涉顯示系統觸控元件之概略結構圖。FIG. 5C is a schematic block diagram showing a touch element of an optical interference display system according to an embodiment of the invention.
第5D圖所示為根據本發明一實施例一光干涉顯示系統觸控元件之電極結構放大圖示。FIG. 5D is an enlarged view showing an electrode structure of a touch element of an optical interference display system according to an embodiment of the invention.
第5E圖所示為根據本發明另一實施例一光干涉顯示系統觸控元件之電極結構放大圖示。FIG. 5E is an enlarged view showing an electrode structure of a touch element of an optical interference display system according to another embodiment of the present invention.
第6圖所示為光干涉顯示系統之剖視概略圖示,其中僅畫出一光干涉顯示單元。Figure 6 is a schematic cross-sectional view of an optical interference display system in which only one optical interference display unit is shown.
第7圖所示為一光干涉彩色顯示系統之剖視概略圖示,其中僅畫出一光干涉顯示單元。Figure 7 is a schematic cross-sectional view of an optical interference color display system in which only one optical interference display unit is shown.
第8圖所示為光干涉彩色顯示系統之剖視概略圖示,其中僅畫出一光干涉式彩色顯示單元。Figure 8 is a schematic cross-sectional view of an optical interference color display system in which only one optical interferometric color display unit is shown.
第9圖所示為一具光源之光干涉顯示系統之剖視概略圖示。Figure 9 is a schematic cross-sectional view of a light interference display system with a light source.
第10圖係繪示一微鏡陣列裝置的剖面示意圖。Figure 10 is a cross-sectional view showing a micromirror array device.
第11圖所示為一微鏡陣列顯示系統之剖面結構。Figure 11 shows the cross-sectional structure of a micromirror array display system.
第12圖所示為一具光源之微鏡陣列顯示系統之剖視概略圖示。Figure 12 is a schematic cross-sectional view of a micromirror array display system with a light source.
100...光干涉式顯示單元100. . . Optical interferometric display unit
102...第一電極102. . . First electrode
104...第二電極104. . . Second electrode
106...支撐物106. . . Support
110...基材110. . . Substrate
131...上蓋造型單元131. . . Upper cover molding unit
132...擴散膜132. . . Diffusion film
150...觸控單元150. . . Touch unit
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CN103870089B (en) * | 2012-12-10 | 2017-08-01 | 航天信息股份有限公司 | One kind input shows system and method |
TWI622837B (en) | 2013-10-24 | 2018-05-01 | 元太科技工業股份有限公司 | Display apparatus |
CN103927044B (en) * | 2013-12-30 | 2017-05-03 | 上海天马微电子有限公司 | Touch display panel and touch display device |
CN104883521B (en) * | 2014-02-28 | 2018-01-02 | 光宝科技股份有限公司 | Projection arrangement and projecting method |
TWI574028B (en) * | 2015-06-22 | 2017-03-11 | 李美燕 | Integrated oscillating wave emitting and sensing member, sensing array and electronic apparatus using such member and method of manufacturing such member |
TWI601045B (en) * | 2015-08-07 | 2017-10-01 | 瑞鼎科技股份有限公司 | Panel display driving circuit and touch time arranging method |
JP6605292B2 (en) * | 2015-10-16 | 2019-11-13 | 株式会社ジャパンディスプレイ | Display device |
CN106066732B (en) * | 2016-05-30 | 2019-01-25 | 京东方科技集团股份有限公司 | Touch screen and touch display unit |
TWI712935B (en) * | 2016-06-27 | 2020-12-11 | 仟融科技股份有限公司 | Capacitive sensing device and driving method thereof |
TWI677820B (en) * | 2018-12-11 | 2019-11-21 | 友達光電股份有限公司 | Display device |
CN109734047B (en) * | 2019-02-27 | 2021-03-23 | 京东方科技集团股份有限公司 | MEMS device, manufacturing method thereof and display substrate |
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CN102798973B (en) | 2016-05-04 |
TW201248289A (en) | 2012-12-01 |
CN102798973A (en) | 2012-11-28 |
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