TWI459021B - Method for forming optical film - Google Patents

Method for forming optical film Download PDF

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TWI459021B
TWI459021B TW099130755A TW99130755A TWI459021B TW I459021 B TWI459021 B TW I459021B TW 099130755 A TW099130755 A TW 099130755A TW 99130755 A TW99130755 A TW 99130755A TW I459021 B TWI459021 B TW I459021B
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layer
optical film
photocurable
photoinitiating
forming
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TW099130755A
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TW201211576A (en
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Hung Chun Hsieh
Tai Chi Chen
Hsin Hsing Lee
Chun Chieh Yi
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Benq Materials Corp
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光學膜的形成方法Method for forming optical film

本發明是有關於一種具有硬化層之膜材及其形成方法,且特別有關於具有表層硬度大於內部硬度之硬化層之光學膜的形成方法。The present invention relates to a film material having a hardened layer and a method of forming the same, and more particularly to a method of forming an optical film having a hardened layer having a skin hardness greater than an internal hardness.

光固化性組成在經過光照後會發生硬化反應。為了提升光固化性組成的硬化速率及硬化程度,一般會在光固化性組成中同時添加光敏劑與光起始劑。由於光敏劑與光起始劑係均勻地混合在光固化性組成中,因此依傳統製法所得到的硬化材料或硬化層其整體硬度係均勻一致的。The photocurable composition undergoes a hardening reaction upon exposure to light. In order to increase the hardening rate and degree of hardening of the photocurable composition, a photosensitizer and a photoinitiator are generally added to the photocurable composition. Since the photosensitizer and the photoinitiator are uniformly mixed in the photocurable composition, the hardness of the hardened material or the hardened layer obtained by the conventional method is uniform.

為了將膜材,例如是偏光板,貼附於其他的光學元件,例如也是具有多層結構的相位延遲膜或是液晶胞,會在偏光板的表面上形成感壓性黏著層再貼覆於離形膜上。當整個感壓性黏著層的硬度大時,雖然感壓性黏著層能為偏光板提供支撐作用、具備較高穩定性以及表面抗壓點能力,但感壓性黏著層不能隨著偏光板在變化的溫度環境下所產生收縮或膨脹的形狀改變而對應改變,偏光板之尺寸改變所產生的應力無法被硬度大的感壓性黏著層吸收,也就是對高溫高濕的應力緩和能力不足,因此難以應用在可能會發生變形的裝置中。此外,偏光板內的殘留應力不均勻,容易在液晶胞中造成"漏光"或"顏色不均"的問題。而當整個感壓性黏著層的硬度小時,雖然能緩和偏光板之尺寸改變所產生的應力,但此感壓性黏著層的穩定性及表面抗壓點能力便會降低。In order to attach a film material, for example, a polarizing plate, to another optical element, for example, a phase retardation film having a multilayer structure or a liquid crystal cell, a pressure-sensitive adhesive layer is formed on the surface of the polarizing plate and then attached to the film. On the film. When the hardness of the entire pressure-sensitive adhesive layer is large, although the pressure-sensitive adhesive layer can provide support for the polarizing plate, has high stability and surface pressure resistance, the pressure-sensitive adhesive layer cannot be used with the polarizing plate. The shape of the shrinkage or expansion caused by the change in the temperature environment changes correspondingly, and the stress generated by the change of the size of the polarizing plate cannot be absorbed by the pressure-sensitive adhesive layer having a large hardness, that is, the stress relieving ability for high temperature and high humidity is insufficient. Therefore, it is difficult to apply to a device that may be deformed. Further, the residual stress in the polarizing plate is not uniform, which causes a problem of "light leakage" or "color unevenness" in the liquid crystal cell. When the hardness of the entire pressure-sensitive adhesive layer is small, although the stress generated by the change of the size of the polarizing plate can be alleviated, the stability of the pressure-sensitive adhesive layer and the ability of the surface pressure-resistant point are lowered.

根據本發明之一方面,提供一種具有硬化層之膜材的形成方法。方法包括以下步驟。提供基材。塗覆光引發層於基材上。塗覆光固化性膠體層於光引發層上。光固化性膠體層的表面接觸光引發層。光照光固化性膠體層與光引發層,以使光固化性膠體層與光引發層發生硬化反應形成該硬化層。硬化層之表層的硬度大於內部的硬度。According to an aspect of the invention, a method of forming a film having a hardened layer is provided. The method includes the following steps. A substrate is provided. A photoinitiating layer is applied to the substrate. A photocurable colloid layer is applied to the photoinitiating layer. The surface of the photocurable colloid layer contacts the photoinitiator layer. The light-curable colloid layer and the photo-initiating layer are caused to harden the photocurable colloid layer and the photo-initiating layer to form the hardened layer. The hardness of the surface layer of the hardened layer is greater than the hardness of the inner layer.

根據本發明之另一方面,提供一種光學膜的形成方法。方法包括以下步驟。提供離型膜。塗覆光引發層於離型膜上。塗覆光固化性膠體層於光引發層上。光固化性膠體層的表面接觸光引發層。設置偏光板於光固化性膠體層上。光照光固化性膠體層與光引發層,以使光固化性膠體層與光引發層發生固化反應形成黏著層。黏著層之表層的硬度大於內部的硬度。According to another aspect of the present invention, a method of forming an optical film is provided. The method includes the following steps. A release film is provided. A photoinitiating layer is applied to the release film. A photocurable colloid layer is applied to the photoinitiating layer. The surface of the photocurable colloid layer contacts the photoinitiator layer. A polarizing plate is disposed on the photocurable colloid layer. The light-curable colloid layer and the photo-initiating layer are caused to cure the photo-curable colloid layer and the photo-initiating layer to form an adhesive layer. The surface layer of the adhesive layer has a hardness greater than the internal hardness.

根據本發明之又另一方面,提供一種具有硬化層之膜材。硬化層係單一薄膜,且硬化層之表層的硬度係大於內部的硬度。According to still another aspect of the present invention, a film material having a hardened layer is provided. The hardened layer is a single film, and the hardness of the surface layer of the hardened layer is greater than the internal hardness.

本發明之實施例提供一種光學膜的形成方法,其中光學膜具有表層硬度大於內部硬度的硬化層。第1圖至第4圖顯示本發明一實施例之光學膜的製程。請參考第1圖,在基材1上塗覆光引發層2。於一具體實施例中,基材1為離型膜。光引發層2可包括光起始劑或光敏劑或該兩者。光敏劑可例如包括二苯甲酮、丁二酮、苯乙酮、蒽、菲或芴。光起始劑可例如包括三級胺丙烯酸酯(tertiary amine acrylate)、9-苯基吖啶(9-phenylacridine;9-PHA)、四乙基米氏酮(4,4-Bis(diethylamino)benzophenone;EAB)或三羥甲基丙烷三(3-巰基丙酸酯)(Trimethylolpropane tris(3-mercaptopropionate);TMPX)。請參考第2圖,在光引發層2上塗覆光固化性膠體層3。光固化性膠體層3的一表面,例如第2圖所示之表面,係與光引發層2接觸。光固化性膠體層3可例如包括光固化性單體、寡聚物或樹脂,以及光起始劑。光固化性膠體層3可更包括光敏劑。光敏劑能將吸收的能量轉移至其他的材料,例如光起始劑或光固化性膠體層3之光固化性單體、寡聚物或樹脂;而光起始劑在吸收能量後本身會發生化學變化,分解成自由基或陽離子,從而引發光固化性膠體層3中光固化性單體、寡聚物或樹脂的聚合反應。光固化性單體、寡聚物或樹脂可為紫外線固化性單體、寡聚物或樹脂。舉例來說,光固化性膠體層3可包括丙烯酸系單體,例如三羥甲基丙烷三丙烯酸酯(TMPTA),或壓克力樹脂,例如丙烯酸系共聚物(acrylic copolymer)、聚乙烯醇高分子或聚氨基甲酸樹脂。於一實施例中,光固化性膠體層3為一紫外線(UV)固化膠體層。光固化性膠體層3也可包括抗靜電物質,例如胺類化合物、磷酸酯類、脂肪酸乙二醚酯類(ethoxylated,glycol esters of fatty acid)、脂肪胺(fatty amine)衍生物及其他醇類衍生物等化學物質、金屬鹽。金屬鹽之陽離子包含有鋰離子、鈉離子、鉀離子、銣離子或上述之組合。金屬鹽之陰離子包括有過氯酸根離子、六氟砷酸根離子、六氟磷酸根離子、四氟硼酸根離子或上述之組合。Embodiments of the present invention provide a method of forming an optical film, wherein the optical film has a hardened layer having a skin hardness greater than an internal hardness. 1 to 4 show the process of an optical film according to an embodiment of the present invention. Referring to FIG. 1, the photoinitiator layer 2 is coated on the substrate 1. In one embodiment, the substrate 1 is a release film. The photoinitiating layer 2 may include a photoinitiator or a photosensitizer or both. The photosensitizer may, for example, include benzophenone, diacetyl, acetophenone, anthracene, phenanthrene or anthracene. The photoinitiator may, for example, comprise tertiary amine acrylate, 9-phenylacridine (9-PHA), tetraethyl benzophenone (4,4-Bis(diethylamino)benzophenone). ; EAB) or Trimethylolpropane tris (3-mercaptopropionate; TMPX). Referring to FIG. 2, the photocurable colloid layer 3 is coated on the photoinitiator layer 2. One surface of the photocurable colloid layer 3, for example, the surface shown in Fig. 2, is in contact with the photoinitiator layer 2. The photocurable colloid layer 3 may, for example, include a photocurable monomer, an oligomer or a resin, and a photoinitiator. The photocurable colloid layer 3 may further include a photosensitizer. The photosensitizer can transfer the absorbed energy to other materials, such as a photoinitiator or photocurable colloidal layer 3 photocurable monomer, oligomer or resin; and the photoinitiator itself will occur after absorbing energy. The chemical change is decomposed into radicals or cations to initiate polymerization of the photocurable monomer, oligomer or resin in the photocurable colloid layer 3. The photocurable monomer, oligomer or resin may be an ultraviolet curable monomer, oligomer or resin. For example, the photocurable colloid layer 3 may include an acrylic monomer such as trimethylolpropane triacrylate (TMPTA), or an acrylic resin such as an acrylic copolymer or a polyvinyl alcohol. Molecular or polyurethane resin. In one embodiment, the photocurable colloid layer 3 is an ultraviolet (UV) curable colloid layer. The photocurable colloid layer 3 may also include an antistatic substance such as an amine compound, a phosphate ester, an ethoxylated gum esters of fatty acid, a fatty amine derivative, and other alcohols. Chemical substances such as derivatives, metal salts. The cation of the metal salt contains lithium ions, sodium ions, potassium ions, cesium ions or a combination thereof. The anion of the metal salt includes a perchlorate ion, a hexafluoroarsenate ion, a hexafluorophosphate ion, a tetrafluoroborate ion, or a combination thereof.

請參考第3圖,在光固化性膠體層3上設置另一基材4。於一具體實施例中,基材4為偏光板。然後,對光固化性膠體層3與光引發層2進行照光步驟,以使光固化性膠體層3與光引發層2發生固化反應而變成硬化層5,如第4圖所示。於一實施例中,係使用波長範圍為200nm至400nm的紫外線進行照光步驟。Referring to FIG. 3, another substrate 4 is disposed on the photocurable colloid layer 3. In a specific embodiment, the substrate 4 is a polarizing plate. Then, the photocurable colloid layer 3 and the photoinitiator layer 2 are subjected to an illuminating step to cause the photocurable colloid layer 3 and the photoinitiating layer 2 to undergo a curing reaction to become the hardened layer 5, as shown in FIG. In one embodiment, the illuminating step is carried out using ultraviolet light having a wavelength in the range of 200 nm to 400 nm.

請參照第4圖,硬化層5(其包括表層5' )係單一薄膜,亦即為一完整不可分離的薄膜,且硬化層5之表層5' 的硬度係大於硬化層5之內部的硬度。這是因為光固化性膠體層3(第3圖)的一表面與光引發層2接觸而具有最高含量的光起始劑或光敏劑或該兩者,或更進一步地為具有最高濃度的光起始劑或光敏劑或該兩者,造成光固化性膠體層3與光引發層2接觸端的表層之光起始劑或光敏劑或該兩者的含量大於光固化性膠體層3之內部的光起始劑或光敏劑或該兩者的含量,因此在經過光照而固化的過程中,光固化性膠體層3之表面的硬化速率會快過內部的硬化速率,換言之,表面的硬化程度會大於內部的硬化程度,因此形成的硬化層5之表層5' (第4圖)的硬度大於內部的硬度。Referring to FIG. 4, the hardened layer 5 (which includes the surface layer 5 ' ) is a single film, that is, a completely inseparable film, and the hardness of the surface layer 5 ' of the hardened layer 5 is greater than the hardness of the inside of the hardened layer 5. This is because a surface of the photocurable colloid layer 3 (Fig. 3) is in contact with the photoinitiating layer 2 to have the highest content of the photoinitiator or photosensitizer or both, or even the light having the highest concentration. The initiator or the photosensitizer or both, the photoinitiator or photosensitizer of the surface layer at the contact end of the photocurable colloid layer 3 and the photoinitiating layer 2 or both are larger than the interior of the photocurable colloid layer 3 The content of the photoinitiator or photosensitizer or both, so that the surface of the photocurable colloid layer 3 hardens faster than the internal hardening rate during curing by light, in other words, the degree of hardening of the surface It is larger than the internal hardening degree, and thus the hardness of the surface layer 5 ' (Fig. 4) of the hardened layer 5 formed is larger than the internal hardness.

此外,為了促進光固化性膠體層3(第3圖)之表面的硬化程度高過內部的硬化程度,也可控制光照的方向係由下往上照射,亦即從光引發層2往光固化性膠體層3的方向照射,以使光引發層2或鄰接光引發層2之光固化性膠體層3的表面吸收到大量的光能。然而,本發明並不限光照的方向。在某些實施例中,適當地調控光引發層2與光固化性膠體層3的光起始劑或光敏劑或該兩者的含量即可得到表層5' (第4圖)之硬度大於內部之硬度的硬化層5。根據上述,本發明之實施例的硬化層的形成方法簡單且經濟。Further, in order to promote the degree of hardening of the surface of the photocurable colloid layer 3 (Fig. 3) to be higher than the degree of internal hardening, it is also possible to control the direction of the illumination from the bottom to the top, that is, from the photoinitiator layer 2 to the photocuring layer. The direction of the colloidal layer 3 is irradiated so that the surface of the photoinitiating layer 2 or the photocurable colloid layer 3 adjacent to the photoinitiating layer 2 absorbs a large amount of light energy. However, the invention is not limited to the direction of illumination. In some embodiments, the content of the photoinitiator or the photosensitizer or both of the photoinitiating layer 2 and the photocurable colloid layer 3 is appropriately adjusted to obtain a surface layer 5 ' (Fig. 4) having a hardness greater than that of the interior. Hardened layer 5 of hardness. According to the above, the method of forming the hardened layer of the embodiment of the present invention is simple and economical.

請參照第4圖,在基材1為離型膜且另一基材4為偏光板的應用例中,硬化層5可作為黏著層或感壓性黏著層。由於硬化層5之表層5' 的硬度大於內部的硬度,因此硬化層5之表層5' 能為基材(或偏光板)4提供保護作用,且同時硬化層5的內部能隨著基材(或偏光板)4的熱漲冷縮而改變,或者緩和基材(或偏光板)4由於形狀改變而產生的應力。Referring to Fig. 4, in the application example in which the substrate 1 is a release film and the other substrate 4 is a polarizing plate, the hardened layer 5 can serve as an adhesive layer or a pressure-sensitive adhesive layer. Since the hardened layer of the surface layer 55 'hardness greater than the hardness of the interior, thus the hardened layer of the surface layer 55' to provide protection for the substrate (or polarizer) 4 and 5 while the inner layer can be hardened with the substrate ( Or the thermal expansion and contraction of the polarizing plate 4 is changed, or the stress generated by the substrate (or the polarizing plate) 4 due to the shape change is alleviated.

為讓本發明之上述內容能更明顯易懂,下文特舉實施例作詳細說明如下:In order to make the above content of the present invention more apparent, the following specific embodiments are described in detail below:

<製備光學膜><Preparation of optical film>

實施例1之光學膜的製備步驟包括在離型膜上塗覆光引發層,在光引發層上塗覆光固化性膠體層(約25μm),並然後對光引發層與光固化性膠體層進行光照以形成黏著層(分子量約80萬~85萬)。比較例2至比較例4之光學膜的製備步驟包括在離型膜上塗覆光固化性膠體層(約25μm),並然後對光固化性膠體層進行光照以形成黏著層(分子量約80萬~85萬)。光照步驟係使用高壓水銀蒸氣燈(high pressure mercury-vapor lamps),光照強度(intensity)為30mW/cm,光照時間為20秒。The preparation step of the optical film of Example 1 comprises coating a photoinitiator layer on the release film, coating a photocurable colloid layer on the photoinitiator layer (about 25 μm), and then illuminating the photoinitiator layer and the photocurable colloid layer. To form an adhesive layer (molecular weight of about 800,000 to 850,000). The preparation steps of the optical films of Comparative Example 2 to Comparative Example 4 included coating a photocurable colloid layer (about 25 μm) on the release film, and then irradiating the photocurable colloid layer to form an adhesive layer (molecular weight of about 800,000~ 850,000). The illumination step was performed using a high pressure mercury-vapor lamp with an intensity of 30 mW/cm and an illumination time of 20 seconds.

表1顯示實施例1與比較例2至比較例4之光學膜的組成重量比例。實施例1與比較例2至比較例4之固化性膠體層包括丙烯酸丁酯(n-butyl acrylate;BA)與丙烯酸甲酯(n-methyl acrylate;MA)之丙烯酸系聚合物;三羥甲基丙烷三丙烯酸酯(trimethylol propane triacrylate;TMPTA)之單體;4,4'-二苯甲基二異氰酸鹽(4,4'-diphenylmethane diisocyanate;MDI)之聚異氰酸酯化合物;二苯甲酮(benzophenone)之光起始劑;以及氯酸鹽類(LiClO4 )之抗靜電劑。實施例1之光引發層包括三級胺丙烯酸酯(tertiary amine acrylate)(供應廠商:恆橋產業股份有限公司,產品名稱:Chemcure-NPG)之光敏劑。Table 1 shows the composition weight ratios of the optical films of Example 1 and Comparative Example 2 to Comparative Example 4. The curable colloid layer of Example 1 and Comparative Example 2 to Comparative Example 4 includes an acrylic polymer of n-butyl acrylate (BA) and n-methyl acrylate (MA); trimethylol a monomer of trimethylol propane triacrylate (TMPTA); a polyisocyanate compound of 4,4'-diphenylmethane diisocyanate (MDI); benzophenone ( A photoinitiator of benzophenone; and an antistatic agent of chlorate (LiClO 4 ). The photoinitiator layer of Example 1 includes a photosensitizer of tertiary amine acrylate (supplier: Hengqiao Industry Co., Ltd., product name: Chemcure-NPG).

<性質分析><Property Analysis>

表2顯示實施例1與比較例2至比較例4之光學膜與偏光板貼合之後進行分析所得到的結果。Table 2 shows the results obtained by analyzing the optical film of Example 1 and Comparative Example 2 to Comparative Example 4 after bonding with a polarizing plate.

1. 信賴性(Durability)1. Durability

將與光學膜貼合的偏光板裁切成10cm*10cm,使用貼合機以貼合壓力2.8kg/cm2 、過壓深度(樣品與玻璃的壓合深度)-0.7mm的條件貼在玻璃上,然後加壓脫泡(50℃、5kg、20分鐘)。接著將樣品放入信賴性測試儀進行分析,分析條件為60℃/90%RH 1000hr與80℃/1000hr。信賴性評估的方法如下所示:The polarizing plate bonded to the optical film was cut into 10 cm*10 cm, and attached to the glass using a laminating machine at a bonding pressure of 2.8 kg/cm 2 and an overpressure depth (pitting depth of the sample and the glass) of -0.7 mm. Above, then pressurization defoaming (50 ° C, 5 kg, 20 minutes). The sample was then placed in a reliability tester for analysis at 60 ° C / 90% RH 1000 hr and 80 ° C / 1000 hr. The method of reliability assessment is as follows:

○:沒有剝離和發泡○: no peeling and foaming

△:剝離<2mm(黏著層與玻璃分開的距離),10cm*10cm的單位內不超過5顆小氣泡△: peeling <2mm (distance between the adhesive layer and the glass), no more than 5 small bubbles in the unit of 10cm*10cm

X:剝離≧2mm,10cm*10cm的單位內超過5顆小氣泡X: Exfoliated ≧ 2mm, more than 5 small bubbles in a unit of 10cm*10cm

2. 裁切加工性(Cuttability)2. Cutability (Cuttability)

使用油壓裁切機裁切與光學膜貼合的偏光板。信賴性評估的方法如下所示:A polarizing plate that is bonded to the optical film is cut using a hydraulic cutter. The method of reliability assessment is as follows:

○:偏光板邊緣脫膠(裁切時黏著層被裁刀帶走的距離)<0.1mm○: Debonding of the edge of the polarizing plate (the distance the adhesive layer is taken away by the cutter when cutting) <0.1mm

△:偏光板邊緣脫膠0.1~0.5mm△: Debonding of the edge of the polarizing plate 0.1~0.5mm

X:偏光板邊緣脫膠>0.5mmX: Debonding of polarizing plate edge>0.5mm

3. 殘膠(Residual)3. Residual (Residual)

將與光學膜貼合的偏光板裁切成10cm*10cm,使用貼合機以貼合壓力2.8kg/cm2 、過壓深度-0.7mm的條件貼在玻璃上,然後加壓脫泡(50℃、5kg、20分鐘)。接著將樣品放入信賴性測試儀,條件為80℃、3hr。然後使用偏光板移除機台(Polarizer Remover)進行撕除。殘膠評估的方法如下所示:The polarizing plate bonded to the optical film was cut into 10 cm * 10 cm, and attached to the glass using a laminating machine at a bonding pressure of 2.8 kg/cm 2 and an overpressure depth of -0.7 mm, and then subjected to pressure defoaming (50). °C, 5kg, 20 minutes). The sample was then placed in a reliability tester at 80 ° C for 3 hr. Then use a Polarizer Remover to remove the tear. The method of evaluating the residual glue is as follows:

○:玻璃殘膠<1%(面積百分比)○: Glass residual rubber <1% (area percentage)

△:玻璃殘膠1%~5%△: glass residual glue 1% ~ 5%

X:玻璃殘膠>5%X: glass residual glue >5%

4. 壓點(Dent)4. Pressure point (Dent)

將粒徑300μm~500μm的粒子30顆~50顆平均分散在與偏光板貼合之光學膜的離型膜上,然後使用800g之玻璃進行重壓5分鐘,接著移除玻璃並觀察壓點的形成數量。壓點評估的方法如下所示:30 to 50 particles having a particle diameter of 300 μm to 500 μm were uniformly dispersed on a release film of an optical film bonded to a polarizing plate, and then pressed with 800 g of glass for 5 minutes, followed by removing the glass and observing the pressure point. Form the quantity. The method of pressure point evaluation is as follows:

○:壓點數量<3○: Number of pressure points <3

△:壓點數量3~7△: Number of pressure points 3~7

X:壓點數量>7X: number of pressure points >7

壓點數量愈少表示光學膜的硬度愈高。因此,根據表2所示的結果可知,實施例1之光學膜的硬度較比較例2至比較例4之光學膜的硬度高。The smaller the number of pressure points, the higher the hardness of the optical film. Therefore, according to the results shown in Table 2, the hardness of the optical film of Example 1 was higher than that of the optical films of Comparative Examples 2 to 4.

5. 漏光(Mura)5. Light leakage (Mura)

將與光學膜貼合的偏光板裁切成10cm*10cm,使用貼合機以貼合壓力2.8kg/cm2 、過壓深度-0.7mm的條件貼在150mm*150mm的玻璃上,貼合上下片使其直交,在暗室中使用背光模組進行漏光測試。漏光評估的方法如下所示:The polarizing plate bonded to the optical film was cut into 10 cm*10 cm, and attached to a glass of 150 mm*150 mm by a bonding machine at a bonding pressure of 2.8 kg/cm 2 and an overpressure depth of -0.7 mm. The film is made straight and the backlight module is used in the dark room for light leakage testing. The method of light leakage assessment is as follows:

○:無漏光現象○: no light leakage

△:輕微漏光現象△: slight light leakage

X:嚴重漏光現象X: Severe light leakage

6. 阻抗(Anti-Static Electirc)6. Impedance (Anti-Static Electirc)

量側標準片確認範圍為4.95~5.0x108 後,取A4大小之黏著層放置於玻璃底座上,使用阻抗計測試三次,紀錄數值並取其平均值。表2中的over表示阻抗值大於1015 ,因此無法測定。為了讓偏光板在重工(rework)時不會造成液晶被靜電驅動,一般黏著層的阻抗值係小於10E11。After confirming the range of the standard side sheet from 4.95 to 5.0×10 8 , the adhesive layer of A4 size was placed on the glass base, tested three times with an impedance meter, and the values were recorded and averaged. The over in Table 2 indicates that the impedance value is greater than 10 15 and therefore cannot be measured. In order to prevent the liquid crystal from being electrostatically driven when the polarizing plate is reworked, the impedance value of the adhesive layer is generally less than 10E11.

雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟悉此項技藝者,在不脫離本發明之精神和範圍內,當可做些許更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.

1...基材1. . . Substrate

2...光引發層2. . . Photoinitiating layer

3...光固化性膠體層3. . . Photocurable colloid layer

4...基材4. . . Substrate

5...硬化層5. . . Hardened layer

5' ...硬化層的表層5 ' . . . Surface layer of hardened layer

第1圖至第4圖顯示本發明一實施例之光學膜的製程。1 to 4 show the process of an optical film according to an embodiment of the present invention.

1...基材1. . . Substrate

4...基材4. . . Substrate

5...硬化層5. . . Hardened layer

5' ...硬化層的表層5 ' . . . Surface layer of hardened layer

Claims (7)

一種光學膜的形成方法,包括以下步驟:提供一離型膜;塗覆一光引發層於該離型膜上;塗覆一光固化性膠體層於該光引發層上,其中該光固化性膠體層的一表面接觸該光引發層;設置一偏光板於該光固化性膠體層上;以及光照該光固化性膠體層與該光引發層,以使該光固化性膠體層與該光引發層發生固化反應形成一黏著層,其中該黏著層之表層的硬度大於內部的硬度。 A method for forming an optical film, comprising the steps of: providing a release film; coating a photoinitiating layer on the release film; and coating a photocurable colloid layer on the photoinitiating layer, wherein the photocuring property a surface of the colloid layer contacts the photoinitiating layer; a polarizing plate is disposed on the photocurable colloid layer; and the photocurable colloid layer and the photoinitiating layer are illuminated to cause the photocurable colloid layer and the photoinitiator The layer undergoes a curing reaction to form an adhesive layer, wherein the surface layer of the adhesive layer has a hardness greater than the internal hardness. 如申請專利範圍第1項所述之光學膜的形成方法,其中該黏著層係單一薄膜。 The method of forming an optical film according to claim 1, wherein the adhesive layer is a single film. 如申請專利範圍第1項所述之光學膜的形成方法,其中該光引發層包括一第一光起始劑或一第一光敏劑。 The method of forming an optical film according to claim 1, wherein the photoinitiating layer comprises a first photoinitiator or a first photosensitizer. 如申請專利範圍第1項所述之光學膜的形成方法,其中該光固化性膠體層包括一第二光起始劑或一第二光敏劑。 The method for forming an optical film according to claim 1, wherein the photocurable colloid layer comprises a second photoinitiator or a second photosensitizer. 如申請專利範圍第1項所述之光學膜的形成方法,其中該光固化性膠體層包括一紫外線固化性單體、寡聚物或樹脂。 The method of forming an optical film according to claim 1, wherein the photocurable colloid layer comprises an ultraviolet curable monomer, an oligomer or a resin. 如申請專利範圍第1項所述之光學膜的形成方法,其中該光照步驟係利用一紫外線(UV)光照該光固化性膠體層與該光引發層。 The method of forming an optical film according to claim 1, wherein the illuminating step irradiates the photocurable colloid layer with the photoinitiating layer with an ultraviolet ray (UV). 如申請專利範圍第1項所述之光學膜的形成方法,其中該光固化性膠體層包括三羥甲基丙烷三丙烯酸酯(TMPTA)、丙烯酸系共聚物(acrylic copolymer)、聚乙烯醇高分子或聚氨基甲酸樹脂。 The method for forming an optical film according to claim 1, wherein the photocurable colloid layer comprises trimethylolpropane triacrylate (TMPTA), an acrylic copolymer, and a polyvinyl alcohol polymer. Or polyurethane resin.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008020891A (en) * 2006-06-15 2008-01-31 Nitto Denko Corp Polarizing plate, image display device, and method of manufacturing polarizing plate
TW200838700A (en) * 2006-12-18 2008-10-01 Nitto Denko Corp Method of manufacturing hard-coated film, hard-coated film, polarizing plate, and image display
TW200918618A (en) * 2007-08-10 2009-05-01 Dainippon Printing Co Ltd Hard coat film
JP2010007044A (en) * 2008-05-29 2010-01-14 Nitto Denko Corp Self-adhesive composition for optical member, self-adhesive type optical member, and image display device
TW201015127A (en) * 2008-09-10 2010-04-16 Sumitomo Chemical Co Polarizing plate and its production method
TW201022385A (en) * 2008-08-20 2010-06-16 Lg Chemical Ltd Pressure-sensitive adhesive, preparation method thereof, polarizer and liquid crystal display

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008020891A (en) * 2006-06-15 2008-01-31 Nitto Denko Corp Polarizing plate, image display device, and method of manufacturing polarizing plate
TW200838700A (en) * 2006-12-18 2008-10-01 Nitto Denko Corp Method of manufacturing hard-coated film, hard-coated film, polarizing plate, and image display
TW200918618A (en) * 2007-08-10 2009-05-01 Dainippon Printing Co Ltd Hard coat film
JP2010007044A (en) * 2008-05-29 2010-01-14 Nitto Denko Corp Self-adhesive composition for optical member, self-adhesive type optical member, and image display device
TW201022385A (en) * 2008-08-20 2010-06-16 Lg Chemical Ltd Pressure-sensitive adhesive, preparation method thereof, polarizer and liquid crystal display
TW201015127A (en) * 2008-09-10 2010-04-16 Sumitomo Chemical Co Polarizing plate and its production method

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