201211576 * TW6088PA* 六、發明說明： 【發明所屬之技術領域】 本發明疋有關於一種具有硬化層之膜材及其形成方 法’且特別有關於具有表層硬度大於内部硬度之硬化層之 光學膜的形成方法。 【先前技術】 光固化性組成在經過光照後會發生硬化反應。為了提 • 升光固化性組成的硬化速率及硬化程度，一般會在光固化 性組成中同時添加光敏劑與光起始劑。由於光敏劑與光起 始劑係均句地現合在光固化性組成中，因此依傳統製法所 付到的硬化材料或硬化層其整體硬度係均勻一致的。 為了將膜材’例如是偏光板，貼附於其他的光學元 件’例如也是具有多層結構的相位延遲膜或是液晶胞，會 在偏光板的表面上形成感壓性黏著層再貼覆於離形膜 上田個感壓性黏著層的硬度大時，雖然感壓性黏著層 •巧偏光板提供支樓作用、具備較高穩定性以及表面抗壓 力但感壓性黏著層不能隨著偏光板在變化的溫度環 i兄下所，生I&或膨脹的形狀改變而對應改變，偏光板之 尺寸改^所產生的應力無法被硬度大的感壓性黏著層吸 收也就疋對南溫兩濕的應力緩和能力$丨，因此難以應 :在：ί會Ϊ生變形的裝置中。此外，偏光板内的殘留應 a不。^各易在液晶胞中造成"漏光，，或"顏色不均，，的問 : 個感壓性黏著層的硬度小時’雖然能緩和偏光 板之尺寸改變所姦砵u 生的應力’但此感壓性黏著層的穩定性 201211576 及表面抗壓點能力便會降低。 【發明内容】 根據本發明之一方面，提供一種具有硬化層之膜材的 形成方法。方法包括以下步驟。提供基材。塗覆光引發層 於基材上。塗覆光固化性膠體層於光引發層上。光固化性 膠體層的表面接觸光引發層。光照光固化性膠體層與光弓丨 發層’以使光固化性膠體層與光引發層發生硬化反應形成 該硬化層。硬化層之表層的硬度大於内部的硬度。 根據本發明之另一方面’提供一種光學膜的形成方 法。方法包括以下步驟。提供離型膜。塗覆光引發層於離 型膜上。塗覆光固化性膠體層於光引發層上。光固化性膠 體層的表面接觸光引發層。設置偏光板於光固化性膠體層 上。光照光固化性膠體層與光引發層，以使光固化性膠體 層與光引發層發生固化反應形成黏著層。黏著層之表層的 硬度大於内部的硬度。 根據本發明之又另一方面，提供一種具有硬化層之膜 材。硬化層係單一薄膜，且硬化層之表層的硬度係大於内 部的硬度。 【實施方式】 本發明之實施例提供一種光學膜的形成方法’其中光 學膜具有表層硬度大於内部硬度的硬化層。第1圖至第4 圖顯示本發明一實施例之光學膜的製程。請參考第1圖， 在基材1上塗覆光引發層2。於—具體實施例中，基材1 201211576201211576 * TW6088PA* VI. Description of the Invention: [Technical Field] The present invention relates to a film having a hardened layer and a method of forming the same, and particularly to an optical film having a hardened layer having a surface hardness greater than an internal hardness Forming method. [Prior Art] The photocurable composition undergoes a hardening reaction after being exposed to light. In order to improve the hardening rate and degree of hardening of the photocurable composition, a photosensitizer and a photoinitiator are generally added to the photocurable composition. Since the photosensitizer and the photoinitiator are both present in the photocurable composition, the hardness of the hardened material or the hardened layer which is conventionally obtained is uniform. In order to attach a film material such as a polarizing plate to other optical elements, for example, a phase retardation film having a multilayer structure or a liquid crystal cell, a pressure-sensitive adhesive layer is formed on the surface of the polarizing plate and then attached. When the hardness of the pressure-sensitive adhesive layer on the film is large, although the pressure-sensitive adhesive layer and the polarizing plate provide a branching function, have high stability and surface pressure resistance, the pressure-sensitive adhesive layer cannot be used with the polarizing plate. The temperature of the changing temperature ring i, the growth of the I & or the shape of the expansion changes correspondingly, the stress caused by the size change of the polarizing plate can not be absorbed by the pressure sensitive adhesive layer with large hardness. The stress relieving ability is 丨, so it is difficult to: in: ί will deform the device. In addition, the residue in the polarizing plate should be a. ^Easy in the liquid crystal cell caused by "leakage,, or " color unevenness,, Q: The hardness of a pressure-sensitive adhesive layer is small, although it can alleviate the size of the polarizing plate and change the stress of the sputum. However, the stability of the pressure-sensitive adhesive layer 201211576 and the surface pressure resistance point will be reduced. SUMMARY OF THE INVENTION According to one aspect of the invention, a method of forming a film having a hardened layer is provided. The method includes the following steps. A substrate is provided. A photoinitiating layer is applied to the substrate. A photocurable colloid layer is applied to the photoinitiating layer. The surface of the photocurable colloid layer contacts the photoinitiator layer. The light-curable colloid layer and the light-curvature layer are formed to harden the photocurable colloid layer and the photoinitiator layer to form the hardened layer. The hardness of the surface layer of the hardened layer is greater than the hardness of the inner layer. According to another aspect of the present invention, a method of forming an optical film is provided. The method includes the following steps. A release film is provided. A photoinitiating layer is applied to the release film. A photocurable colloid layer is applied to the photoinitiating layer. The surface of the photocurable colloid layer contacts the photoinitiator layer. A polarizing plate is placed on the photocurable colloid layer. The light curable colloid layer and the photoinitiator layer are cured to cause the photocurable colloid layer to react with the photoinitiator layer to form an adhesive layer. The surface layer of the adhesive layer has a hardness greater than the internal hardness. According to still another aspect of the present invention, a film having a hardened layer is provided. The hardened layer is a single film, and the hardness of the surface layer of the hardened layer is greater than the hardness of the inner portion. [Embodiment] Embodiments of the present invention provide a method of forming an optical film, wherein the optical film has a hardened layer having a surface hardness greater than an internal hardness. 1 to 4 show the process of an optical film according to an embodiment of the present invention. Referring to FIG. 1, the photoinitiator layer 2 is coated on the substrate 1. In a specific embodiment, the substrate 1 201211576
• TW6088PA 為離型膜。光引發層2可包括光起始劑或光敏劑或該兩 者。光敏劑可例如包括二苯甲酮、丁二酮、苯乙酮、蒽、 菲或芴。光起始劑可例如包括三級胺丙烯酸酯（tertiary amine acrylate)、9-笨基。丫咬（9-phenylacridine; 9-PHA)、四 乙基米氏酮（4,4-Bis(diethylamino)benzophenone; EAB)或 三經曱基丙炫三（3-疏基丙酸醋）（Trimethylolpropane tris(3-mercaptopropionate); TMPX)。請參考第 2 圖，在光 引發層2上塗覆光固化性膠體層3。光固化性膠體層3的 參一表面’例如第2圖所示之表面，係與光引發層2接觸。 光固化性膠體層3可例如包括光固化性單體、寡聚物或樹 脂’以及光起始劑。光固化性膠體層3可更包括光敏劑。 光敏劑能將吸收的能量轉移至其他的材料，例如光起始劑 或光固化性膠體膚3之光固化性單體、寡聚物或樹脂；而 光起始劑在吸收能量後本身會發生化學變化，分解成自由 基或陽離子，從而引發光固化性膠體層3中光固化性單 體、寡聚物或樹脂的聚合反應。光固化性單體、寡聚物或 ❿樹脂可為紫外線固化性單體、寡聚物或樹脂。舉例來說， 光固化性勝體層3可包括丙烯酸系單體’例如三羥曱基丙 院三丙烯酸醋（TMPTA) ’或壓克力樹脂，例如丙烯酸系共 聚物（acrylic copolymer)、聚乙烯醇高分子或聚氨基曱酸樹 脂。於一貫施例中，光固化性膠體層3為一紫外線(uv) 固化膠體層。光固化性膠體層3也可包括抗靜電物質，例 如胺類化合物、磷酸酯類、脂肪酸乙二醚酯類（eth〇xylated， glycol esters of fatty acid)、脂肪胺（fatty amjne)衍生物及其 他醇類衍生物等化學物質、金屬鹽。金屬鹽之陽離子包含 201211576 有鋰離子、鈉離子、 ·' 鹽之陰離子包括：、：離/，離子或上述之組合。金屬 ，子、四氣Wx離子或上述=根離子、4 4。於^且^第實3圖’在光固化性膠體層3上設置另-基材 、』貫施例中，基材4為 化性膠體層3金光引郝9 ^ 、傻對先固 膠❹先引發層進厅照光步驟，以使光固化性 第4 “二、:„發生固化反應而變成硬化層5，如 400回°於一實施例中’係使用波長範圍為20011〇1至 4〇〇nm的紫外線進行照光步驟。 主 ^參^4圖’硬化層5(其包括表層y)係單一薄膜， 2為一元整不可分離的薄膜，且硬化層5之表層5,的硬 ί 5 ^ °這是因為光固化性膠體 曰（第3圖）的—表面與光引發層2接觸而具有最高含量 始劑或光_或該兩者，或更進—步地為具有最高 浪度的光起始劑或光敏劑或該兩者，造成光固化性膠體層 ^與光引發層2接觸端的表層之光起始劑或光敏劑或該兩 者的含量大於光固化性膠體層3之内部的光起始劑或光敏 劑或該兩者的含量’因此在經過光照而固化的過程中，光 固化性膠體層3之表面的硬化速率會快過内部的硬化速 率，換言之，表面的硬化程度會大於内部的硬化程度，因 此形成的硬化層5之表層5,（第4圖）的硬度大於内部的硬 度。 此外，為了促進光固化性膠體層3(第3圖）之表面的 硬化程度高過内部的硬化程度，也可控制光照的方向係由 下往上照射，亦即從光引發層2往光固化性膠體層3的方 201211576 ’ TW6088PA. 向照射，以使光引發層2或鄰接光引發層2之光固化性膠 體層3的表面吸收到大量的光能。然而，本發明並不限光 照的方向。在某些實施例中，適當地調控光引發層2與光 固化性膠體層3的光起始劑或光敏劑或該兩者的含量即可 得到表層5'(第4圖）之硬度大於内部之硬度的硬化層5。 根據上述，本發明之實施例的硬化層的形成方法簡單且經 濟。 請參照第4圖，在基材1為離型膜且另一基材4為偏 φ 光板的應用例中，硬化層5可作為黏著層或感壓性黏著 層。由於硬化層5之表層y的硬度大於内部的硬度，因此 硬化層5之表層y能為基材（或偏光板)4提供保護作用， 且同時硬化層5的内部能隨著基材（或偏光板)4的熱漲冷 縮而改變，或者緩和基材（或偏光板）4由於形狀改變而產 生的應力。 為讓本發明之上述内容能更明顯易懂，下文特舉實施 φ 例作詳細說明如下： <製備光學膜〉 實施例1之光學膜的製備步驟包括在離型膜上塗覆光 引發層，在光引發層上塗覆光固化性膠體層（約25μπι)，並 然後對光引發層與光固化性膠體層進行光照以形成黏著 層（分子量約80萬〜85萬）。比較例2至比較例4之光學膜 的製備步驟包括在離型膜上塗覆光固化性膠體層（約 25μιη)，並然後對光固化性膠體層進行光照以形成黏著層 201211576 .«* vwvr· < · «_ ·. (分子量約80萬〜85萬）。光照步驟係使用高壓水銀蒸氣燈 (high pressure mercury-vapor lamps)，光照強度（intensity) 為30mW/cm，光照時間為20秒。 表1顯示實施例1與比較例2至比較例4之光學膜的 組成重量比例。實施例1與比較例2至比較例4之固化性 膠體層包括丙烯酸丁醋（n-butyl acrylate; BA)與丙稀酸曱 酯（n-methyl acrylate; MA)之丙烯酸系聚合物；三羥曱基丙 烧三丙豨酸酯（trimethylol propane triacrylate; TMPTA)之 早體 ’ 4,4 - 一 本曱基二異氰酸鹽（4,4*-diphenylmethane diisocyanate; MDI)之聚異氰酸酯化合物；二苯甲酮 (benzophenone)之光起始劑；以及氣酸鹽類（Licl〇4)之抗靜 電劑。實施例1之光引發層包括三級胺丙烯酸酯（tertiary amineacrylate)(供應廠商：恆橋產業股份有限公司，產^名 稱:Chemcure-NPG)之光敏劑。• TW6088PA is a release film. The photoinitiating layer 2 may include a photoinitiator or a photosensitizer or both. The photosensitizer may, for example, include benzophenone, diacetyl, acetophenone, anthracene, phenanthrene or anthracene. The photoinitiator may, for example, comprise a tertiary amine acrylate, a 9-styl group. 9-phenylacridine (9-PHA), 4,4-Bis (diethylamino) benzophenone; EAB) or trimethylolpropane (Trimethylolpropane) Tris(3-mercaptopropionate); TMPX). Referring to Figure 2, a photocurable colloid layer 3 is applied to the photoinitiating layer 2. The surface of the photocurable colloid layer 3, for example, the surface shown in Fig. 2, is in contact with the photoinitiator layer 2. The photocurable colloid layer 3 may, for example, comprise a photocurable monomer, an oligomer or a resin' and a photoinitiator. The photocurable colloid layer 3 may further include a photosensitizer. The photosensitizer can transfer the absorbed energy to other materials, such as photoinitiator or photocurable colloidal skin photocurable monomer, oligomer or resin; and the photoinitiator itself will occur after absorbing energy. The chemical change is decomposed into radicals or cations to initiate polymerization of the photocurable monomer, oligomer or resin in the photocurable colloid layer 3. The photocurable monomer, oligomer or oxime resin may be an ultraviolet curable monomer, oligomer or resin. For example, the photocurable smectic layer 3 may include an acrylic monomer such as trishydroxypropyl propyl acrylate (TMPTA) or an acrylic resin such as an acrylic copolymer or polyvinyl alcohol. Polymer or polyaminophthalic acid resin. In a consistent embodiment, the photocurable colloid layer 3 is an ultraviolet (uv) cured colloid layer. The photocurable colloid layer 3 may also include an antistatic substance such as an amine compound, a phosphate ester, an eth〇xylated, glycol esters of fatty acid, a fatty amjne derivative, and the like. Chemical substances such as alcohol derivatives and metal salts. The cation of the metal salt contains 201211576. The anion having a lithium ion, a sodium ion, or a salt includes: , an ion, an ion, or a combination thereof. Metal, sub, four gas Wx ions or above = root ions, 4 4 . In the case of ^ and ^ 3, 'Setting another substrate on the photocurable colloid layer 3," the substrate 4 is a chemical colloid layer 3 Jinguang cited Hao 9 ^, silly to the first solid capsule First, the step of illuminating the layer into the chamber is performed to make the photocurable 4th "2:" a curing reaction to become the hardened layer 5, such as 400 times. In an embodiment, the wavelength range is 20011〇1 to 4〇. The ultraviolet light of 〇nm is subjected to an illumination step. The main layer ^ hardening layer 5 (which includes the surface layer y) is a single film, 2 is a monolithic inseparable film, and the surface layer 5 of the hardened layer 5, the hard ί 5 ^ ° is due to the photocurable colloid The surface of the crucible (Fig. 3) is in contact with the photoinitiating layer 2 to have the highest level of initiator or light or both, or more preferably the photoinitiator or photosensitizer having the highest degree of turbulence or Both of them, the photoinitiator or photosensitizer of the surface layer of the photocurable colloid layer and the photoinitiating layer 2, or the photoinitiator or photosensitizer of the photocurable colloid layer 3 or The content of the two is such that during the curing by light, the surface of the photocurable colloid layer 3 hardens faster than the internal hardening rate, in other words, the degree of hardening of the surface is greater than the degree of internal hardening, thus forming The surface layer 5 of the hardened layer 5, (Fig. 4) has a hardness greater than the internal hardness. Further, in order to promote the degree of hardening of the surface of the photocurable colloid layer 3 (Fig. 3) to be higher than the degree of internal hardening, it is also possible to control the direction of the illumination from the bottom to the top, that is, from the photoinitiator layer 2 to the photocuring layer. The side of the colloid layer 3 201211576 'TW6088PA. is irradiated so that the surface of the photoinitiating layer 2 or the photocurable colloid layer 3 adjacent to the photoinitiating layer 2 absorbs a large amount of light energy. However, the invention is not limited to the direction of illumination. In some embodiments, the content of the photoinitiator or the photosensitizer or both of the photoinitiating layer 2 and the photocurable colloid layer 3 is appropriately adjusted to obtain a hardness of the surface layer 5' (Fig. 4) greater than the internal portion. Hardened layer 5 of hardness. According to the above, the method of forming the hardened layer of the embodiment of the present invention is simple and economical. Referring to Fig. 4, in the application example in which the substrate 1 is a release film and the other substrate 4 is a φ plate, the hardened layer 5 can be used as an adhesive layer or a pressure-sensitive adhesive layer. Since the hardness of the surface layer y of the hardened layer 5 is greater than the hardness of the inner portion, the surface layer y of the hardened layer 5 can provide protection for the substrate (or polarizing plate) 4, and at the same time, the internal energy of the hardened layer 5 can follow the substrate (or polarized light). The heat rise and contraction of the plate 4 is changed, or the stress generated by the substrate (or the polarizing plate) 4 due to the shape change is alleviated. In order to make the above-mentioned contents of the present invention more comprehensible, the following detailed description of the φ example is as follows: <Preparation of optical film> The preparation process of the optical film of Example 1 includes coating a photoinitiator layer on the release film, A photocurable colloid layer (about 25 μm) was coated on the photoinitiator layer, and then the photoinitiator layer and the photocurable colloid layer were irradiated to form an adhesive layer (molecular weight of about 800,000 to 850,000). The preparation steps of the optical films of Comparative Example 2 to Comparative Example 4 included coating a photocurable colloid layer (about 25 μm) on the release film, and then irradiating the photocurable colloid layer to form an adhesive layer 201211576. «* vwvr· < · «_ ·. (Molecular weight is about 800,000 to 850,000). The illumination step was performed using a high pressure mercury-vapor lamp with an intensity of 30 mW/cm and an illumination time of 20 seconds. Table 1 shows the composition weight ratios of the optical films of Example 1 and Comparative Example 2 to Comparative Example 4. The curable colloid layer of Example 1 and Comparative Example 2 to Comparative Example 4 includes an acrylic polymer of n-butyl acrylate (BA) and n-methyl acrylate (MA); Trimethylol propane triacrylate (TMPTA) early body '4,4 - a polyisocyanate compound of 4,4*-diphenylmethane diisocyanate (MDI); a photoinitiator of benzophenone; and an antistatic agent of a gas salt (Licl® 4). The photoinitiator layer of Example 1 comprises a photosensitizer of tertiary amine acrylate (supplier: Hengqiao Industry Co., Ltd., name: Chemcure-NPG).
201211576201211576
• TW6G88PA 光起始劑 2 2 2 2 光引發 層 光敏劑 1 0 0 0 <性質分析> 表2顯示實施例1與比較例2至比較例4之光學膜與 偏光板貼合之後進行分析所得到的結果。• TW6G88PA photoinitiator 2 2 2 2 photoinitiator layer photosensitizer 1 0 0 0 <property analysis> Table 2 shows the analysis of the optical film of Example 1 and Comparative Example 2 to Comparative Example 4 after bonding with a polarizing plate The result obtained.
表2 分析項目 實施例1 比較例2 比較例3 比較例4 信賴性 〇 〇 X X 裁切加工性 〇 〇 〇 X 殘膠 〇 〇 〇 X 壓點 〇 Δ Δ X 漏光 〇 Δ Δ X 阻抗 1.23E+10 over 1.21E+10 1.24E+10 1.信賴性（Durability) 將與光學膜貼合的偏光板裁切成〗〇cm*10cm，使用貼 合機以貼合壓力2.8kg/cm2、過壓深度（樣品與玻璃的壓合 深度）-〇.7mm的條件貼在玻璃上，然後加壓脫泡（50°C、 5kg、20分鐘）。接著將樣品放入信賴性測試儀進行分析， 分析條件為 60°C/90%RH lOOOhr 與 80°C/ l〇〇〇hr。信賴性 評估的方法如下所示： 201211576 〇·沒有剝離和發泡 △:剝離< 2mm(黏著層與玻璃分開的距離）， 10cm* 10cm的單位内不超過5顆小氣泡 X :剝離2 2mm，10cm* 10cm的單位内超過5顆小氣 2. 裁切加工性（Cuttability) 使用油壓裁切機裁切與光學膜貼合的偏光板。信賴性 評估的方法如下所示： 〇：偏光板邊緣脫膠（裁切時黏著層被裁刀帶走的距離) < 0.1mm △:偏光板邊緣脫膠0.1〜0.5mm X :偏光板邊緣脫膠> 〇.5mm 3. 殘膠(Residual) 將與光學膜貼合的偏光板裁切成1 〇cm* 10cm，使用貼 合機以貼合壓力2.8kg/cm2、過壓深度-0.7mm的條件貼在 玻璃上，然後加壓脫泡（50°C、5kg、20分鐘）。接著將樣 品放入信賴性測試儀，條件為80°C、3hr。然後使用偏光 板移除機台（Polarizer Remover)進行撕除。殘膠評估的方法 如下所示： 〇：玻璃殘膠<1%(面積百分比） △:玻璃殘膠1%〜5% X :玻璃殘膠>5% 201211576Table 2 Analysis item Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Reliability 〇〇 XX Cutting processability X Residue 〇〇〇 X Pressure point 〇 Δ Δ X Light leakage 〇 Δ Δ X Impedance 1.23E+ 10 over 1.21E+10 1.24E+10 1. Durability The polarizing plate bonded to the optical film is cut into 〇cm*10cm, and the bonding machine is used to apply pressure 2.8kg/cm2. The depth (the depth of the sample and the glass was pressed) - 〇. 7 mm was applied to the glass, followed by pressure defoaming (50 ° C, 5 kg, 20 minutes). The sample was then placed in a reliability tester for analysis at 60 ° C / 90% RH lOOOOhr and 80 ° C / l hr. The method of reliability evaluation is as follows: 201211576 〇·No peeling and foaming △: Peeling < 2mm (distance between the adhesive layer and the glass), no more than 5 small bubbles in the unit of 10cm* 10cm X: Peeling 2 2mm , more than 5 small gas in a unit of 10cm* 10cm 2. Cutting power (Cuttability) Use a hydraulic cutter to cut a polarizing plate that is bonded to an optical film. The method of reliability evaluation is as follows: 〇: Debonding of the edge of the polarizing plate (the distance the adhesive layer is removed by the cutter when cutting) < 0.1 mm △: Debonding of the edge of the polarizing plate 0.1 to 0.5 mm X: Debonding of the edge of the polarizing plate > ; 〇.5mm 3. Residual The polarizing plate bonded to the optical film is cut into 1 〇cm* 10cm, and the bonding machine is used to apply a pressure of 2.8kg/cm2 and an overpressure depth of -0.7mm. It was applied to glass and then degassed under pressure (50 ° C, 5 kg, 20 minutes). The sample was then placed in a reliability tester at 80 ° C for 3 hr. Then use a Polarizer Remover to remove it. The method for evaluating the residual glue is as follows: 〇: glass residual glue < 1% (area percentage) △: glass residual glue 1% to 5% X: glass residual glue > 5% 201211576
TW6088PA 4.壓點（Dent) 將粒徑300μιη〜500μηι的粒子30顆〜50顆平均分散在 與偏光板貼合之光學膜的離型膜上，然後使用800g之玻 璃進行重壓5分鐘，接著移除玻璃並觀察壓點的形成數 量。壓點評估的方法如下所示： 〇：壓點數量< 3 △:壓點數量3〜7 X :壓點數量>7 φ 壓點數量愈少表示光學膜的硬度愈高。因此，根據表 2所示的結果可知，實施例1之光學膜的硬度較比較例2 至比較例4之光學膜的硬度高。 5. 漏光（Mura) 將與光學膜貼合的偏光板裁切成l〇cm* 10cm，使用貼 合機以貼合壓力2,8kg/cm2、過壓深度-0.7mm的條件貼在 150mm*150mm的玻璃上，貼合上下片使其直交，在暗室 • 中使用背光模組進行漏光測試。漏光評估的方法如T所 不 · 〇：無漏光現象 △:輕微漏光現象 X :嚴重漏光現象 201211576TW6088PA 4. Dent (Dent) Disperse 30 to 50 particles of particle size 300μιη to 500μηι on the release film of the optical film bonded to the polarizing plate, and then press it for 8 minutes using 800g glass. Remove the glass and observe the number of formations of the pressure points. The method of pressure point evaluation is as follows: 〇: number of pressure points < 3 △: number of pressure points 3 to 7 X: number of pressure points > 7 φ The smaller the number of pressure points, the higher the hardness of the optical film. Therefore, according to the results shown in Table 2, the hardness of the optical film of Example 1 was higher than that of Comparative Example 2 to Comparative Example 4. 5. Light leakage (Mura) Cut the polarizing plate attached to the optical film to l〇cm* 10cm, and stick it to 150mm* using a laminating machine with a bonding pressure of 2,8kg/cm2 and an overpressure depth of -0.7mm. On the 150mm glass, the upper and lower pieces are attached to make it straight, and the backlight module is used in the dark room to perform the light leakage test. The method of light leakage evaluation is as follows: T: 〇: no light leakage phenomenon △: slight light leakage phenomenon X: serious light leakage phenomenon 201211576
垦 WW· J & ( I 數值並取其平均值。表2中的over表示阻抗值大於1015， 因此無法測定。為了讓偏光板在重工（rework)時不會造成 液晶被靜電驅動，一般黏著層的阻抗值係小於10E11。 雖然本發明已以較佳實施例揭露如上，然其並非用以 限定本發明，任何熟悉此項技藝者，在不脫離本發明之精 神和範圍内，當可做些許更動與潤飾，因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 第1圖至第4圖顯示本發明一實施例之光學膜的製 程。 【主要元件符號說明】 1 :基材 2:光引發層 3:光固化性膠體層 4 :基材 5 :硬化層 5':硬化層的表層垦WW· J & ( I value and take the average value. Over in Table 2 indicates that the impedance value is greater than 1015, so it cannot be measured. In order to prevent the liquid crystal from being electrostatically driven when the polarizing plate is reworked, it is generally adhered. The impedance value of the layer is less than 10E11. Although the invention has been disclosed in the above preferred embodiments, it is not intended to limit the invention, and any one skilled in the art can do it without departing from the spirit and scope of the invention. There is a slight modification and refinement, and therefore the scope of the present invention is defined by the scope of the appended claims. [FIG. 1 to FIG. 4] The process of the optical film according to an embodiment of the present invention is shown. [Description of main component symbols] 1 : Substrate 2: Photoinitiated layer 3: Photocurable colloid layer 4: Substrate 5: Hardened layer 5': Surface layer of hardened layer