TWI457285B - Method for driving high purity chlorine - Google Patents

Method for driving high purity chlorine Download PDF

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TWI457285B
TWI457285B TW098131924A TW98131924A TWI457285B TW I457285 B TWI457285 B TW I457285B TW 098131924 A TW098131924 A TW 098131924A TW 98131924 A TW98131924 A TW 98131924A TW I457285 B TWI457285 B TW I457285B
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chlorine
zeolite
cylinder
liquid chlorine
oxygen
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TW201016607A (en
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Toshihiro Kawaguchi
Sei Imayoshi
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Toagosei Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/01Chlorine; Hydrogen chloride
    • C01B7/07Purification ; Separation
    • C01B7/075Purification ; Separation of liquid chlorine
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D15/00Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • B01D15/08Selective adsorption, e.g. chromatography
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/01Chlorine; Hydrogen chloride

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  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
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  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Description

高純度氯的製造方法Method for producing high purity chlorine

本發明係關於一種高純度氯的製造方法。更詳而言之,本發明係關於一種將液態氯填充於缸筒內之後,可抑制雜質之氧氣產生的高純度氯的製造方法。藉本製造方法所製造之高純度氯係可使用於VLSI等之半導體元件、光纖、液晶顯示器面板等的製造時進行之乾蝕刻及潔淨等。The present invention relates to a method for producing high purity chlorine. More specifically, the present invention relates to a method for producing high-purity chlorine which suppresses generation of oxygen of impurities after filling liquid chlorine into a cylinder. The high-purity chlorine produced by the above-described production method can be used for dry etching and cleaning of semiconductor elements, optical fibers, liquid crystal display panels, and the like which are used for VLSI.

一般係輸送液態氯時填充於高壓氣體用之缸筒,但,填充於缸筒後,有時於液態氯中產生氧氣等之雜質,因其所產生之液態氯的純度有降低之問題。Generally, when liquid chlorine is transported, it is filled in a cylinder for high-pressure gas. However, after being filled in a cylinder, impurities such as oxygen may be generated in liquid chlorine, and the purity of liquid chlorine generated may be lowered.

就除去液態氯中之雜質即氧或氮等的非凝縮性氣體之方法而言,已揭示以精餾進行之除去方法(例如,參照專利文獻1)。又,於沸石吸附雜質之精製方法亦已為人知。例如,於液態氦中接觸活性碳或合成沸石,而除去液態氦中之微量雜質的水分或二氧化碳之方法已為人知,特別在低溫以吸附進行之除去效果會增加已被揭示(例如參照專利文獻2)。進一步,從氯氣除去氧等之雜質的方法,於沸石或活性碳吸附氯氣之後,以與導入時相異的壓力使進行吸附之氯氣釋出而提高氯氣純度之方法已被揭示(例如參照專利文獻3及4)。A method of removing a non-condensable gas such as oxygen or nitrogen, which is an impurity in liquid chlorine, has been disclosed (for example, see Patent Document 1). Further, a method of purifying impurities adsorbed by zeolite is also known. For example, a method of contacting activated carbon or synthetic zeolite in liquid helium and removing moisture or carbon dioxide of a trace amount of impurities in liquid helium is known, and an increase in removal effect by adsorption at a low temperature has been revealed (for example, refer to the patent literature). 2). Further, a method of removing impurities such as oxygen from chlorine gas, after adsorbing chlorine gas by zeolite or activated carbon, and releasing the adsorbed chlorine gas at a pressure different from that at the time of introduction, thereby improving the purity of chlorine gas has been disclosed (for example, refer to the patent literature) 3 and 4).

但,以此等之方法除去雜質的氧等雖已被記載,但有關維持填充於缸筒的液態氯之純度係尚未被揭示。又,在專利文獻1中,有關除去液態氯中之氧雖已被記載,但有關除去之後產生氧係亦未被研究或暗示。However, although the oxygen or the like for removing impurities by such methods has been described, the purity of the liquid chlorine remaining in the cylinder is not disclosed. Further, in Patent Document 1, although the oxygen in the liquid chlorine is removed, it has not been studied or suggested that oxygen is generated after the removal.

進一步,在專利文獻2中,有關藉沸石除去水分等之雜質雖已被記載,但有關氧亦尚未被記載,而又,因其後之保存再度產生雜質亦未被研究或暗示。進一步,在專利文獻2中,雖有有關液態氮及液態氦之雜質除去的記載,但有關液態氯係尚未被記載。Further, in Patent Document 2, although impurities such as water and the like are removed by the zeolite, the related oxygen has not been described, and the impurities are not studied or implied by the subsequent storage. Further, in Patent Document 2, there is a description about the removal of impurities of liquid nitrogen and liquid helium, but liquid chlorine is not described.

[專利文獻][Patent Literature]

[專利文獻1]特開2002-316804號公報[Patent Document 1] JP-A-2002-316804

[專利文獻2]特開平03-59385號公報[Patent Document 2] Japanese Patent Publication No. 03-59385

[專利文獻3]特開平04-367504號公報[Patent Document 3] Japanese Patent Publication No. 04-367504

[專利文獻4]特開平05-155603號公報[Patent Document 4] Japanese Patent Publication No. 05-155603

本發明係解決上述習知之問題者,目的在於提供一種於缸筒內填充液態氯之後,可抑制雜質之氧氣產生的高純度氯的製造方法。The present invention has been made in view of the above problems, and an object of the invention is to provide a method for producing high-purity chlorine which can suppress generation of oxygen of impurities after filling liquid chlorine in a cylinder.

本發明係如以下般。The present invention is as follows.

1.一種高純度氯的製造方法,其特徵在於:使液態氯接觸於沸石,將此接觸所得到之精製液態氯填充於缸筒,抑制該缸筒內之氧氣的產生。A method for producing high-purity chlorine, characterized in that liquid chlorine is brought into contact with zeolite, and the purified liquid chlorine obtained by the contact is filled in a cylinder tube to suppress generation of oxygen in the cylinder.

2.如上述第1項之高純度氯的製造方法,其中接觸於上述沸石之前的上述液態氯係使電解食鹽水所得到之氯氣液化而得到;(1)其後被精餾而分離非凝縮性氣體,然後被精餾而分離高沸點成分之雜質,其後接觸於沸石,然後填充於上述缸筒;或,(2)其後,接觸於上述沸石而得到上述精製液態氯,然後該精製液態氯係被精餾而分離非凝縮性氣體,其後,被精餾而分離高沸點成分之雜質,然後,填充於上述缸筒。2. The method for producing high-purity chlorine according to the above item 1, wherein the liquid chlorine before the contact with the zeolite is obtained by liquefying chlorine gas obtained by the electrolytic brine; (1) thereafter being subjected to rectification to separate non-condensing. a gas, which is then rectified to separate impurities of a high-boiling component, and then contacted with the zeolite and then filled in the cylinder; or, (2) thereafter, contacted with the zeolite to obtain the purified liquid chlorine, and then refined The liquid chlorine is subjected to rectification to separate the non-condensable gas, and thereafter, the impurities of the high boiling component are separated by rectification, and then filled in the cylinder.

3.如上述第1或2項之高純度氯的製造方法,其中與上述沸石接觸後,在25日後之上述精製液態氯中所含有的上述氧氣濃度為0.01~1.5vol.ppm。3. The method for producing high-purity chlorine according to the above item 1, wherein the concentration of the oxygen contained in the purified liquid chlorine after the contact with the zeolite is from 0.01 to 1.5 vol. ppm.

4.如上述第1~3項中任一項之高純度氯的製造方法,其中上述沸石之細孔的有效直徑為0.3nm以上。4. The method for producing high-purity chlorine according to any one of the items 1 to 3, wherein the pore diameter of the zeolite is 0.3 nm or more.

5.如上述第1~4項中任一項之高純度氯的製造方法,其中與上述沸石接觸後,在25日後之上述精製液態氯中所含有的上述氧氣濃度為0.01~1.0vol.ppm。5. The method for producing high-purity chlorine according to any one of the items 1 to 4, wherein, after the contact with the zeolite, the concentration of the oxygen contained in the purified liquid chlorine after 25 days is 0.01 to 1.0 vol. ppm. .

6.如上述第1~5項中任一項之高純度氯的製造方法,其中上述沸石之細孔的有效直徑為0.4nm以上。The method for producing high-purity chlorine according to any one of the items 1 to 5, wherein the pore diameter of the zeolite is 0.4 nm or more.

7.如上述第3~6項中任一項之高純度氯的製造方法,其中不使上述液態氯接觸於上述沸石,填充於上述缸筒後,25日後與1日後之該液態氯中所含有之氧濃度的比(X1 )為2.3~6.0,使上述精製液態氯填充於上述缸筒後,25日後與1日後之該精製液態氯中所含有之氧濃度的比(X2 )為1.0~2.1,上述X2 /上述X1 為0.2~0.4。7. The method for producing high-purity chlorine according to any one of the items 3 to 6, wherein the liquid chlorine is not contacted with the zeolite, and after being filled in the cylinder, the liquid chlorine is removed after 25 days and one day later. The ratio (X 2 ) of the concentration of oxygen contained in the purified liquid chlorine after the purified liquid chlorine is filled in the cylinder, and the ratio (X 2 ) of the oxygen concentration contained in the purified liquid chlorine after one day is 1.0~2.1, the above X 2 / X 1 above is 0.2 to 0.4.

若依本發明之高純度氯的製造方法,藉由使液態氯接觸於沸石,將此接觸所得到之精製液態氯填充於缸筒,俾抑制缸筒內之氧氣的產生。藉由以如此之沸石的接觸進行之精製,即使於習知之缸筒填充高純度氯,亦可抑制氧氣等之雜質發生,可製造經長期保持純度之液態氯。又,因為以接觸所產生之精製,不須進行以吸附及釋出所產生之精製的間歇動作,可進行連續之製造。According to the method for producing high-purity chlorine according to the present invention, the liquid chlorine is brought into contact with the zeolite, and the purified liquid chlorine obtained by the contact is filled in the cylinder tube to suppress the generation of oxygen in the cylinder. By purifying by contact with such a zeolite, even if a conventional cylinder is filled with high-purity chlorine, impurities such as oxygen can be suppressed, and liquid chlorine which maintains purity over a long period of time can be produced. Further, since the refining by the contact does not require the intermittent operation of purification by adsorption and release, continuous production can be performed.

進一步,接觸於沸石之前的液態氯係使電解食鹽水所得到之氯氣液化而得到;(1)其後所得到之液態氯係被精餾而分離非凝縮性氣體,然後被精餾而分離高沸點成分之雜質,其後接觸於沸石,然後藉接觸所得到之精製液態氯被填充於缸筒;或,(2)其後,接觸於沸石而得到精製液態氯,然後精製液態氯係被精餾而分離非凝縮性氣體,其後,被精餾而分離高沸點成分之雜質,然後,填充於缸筒時係可得到在缸筒內之氧氣產生的抑制效果。又,在(1)中,可於與沸石之接觸步驟之前進行精餾,並可以精餾處理抑制接觸之沸石的粉末混入於缸筒。進一步,在(2)中,在與沸石之接觸步驟,與缸筒填充步驟之間進行精餾,容易交換所使用之沸石。Further, the liquid chlorine before the contact with the zeolite is obtained by liquefying the chlorine gas obtained by the electrolyzed brine; (1) the liquid chlorine obtained thereafter is rectified to separate the non-condensable gas, and then is separated by distillation. The impurity of the boiling point component is then contacted with the zeolite, and then the purified liquid chlorine obtained by the contact is filled in the cylinder; or, (2) thereafter, the refined liquid chlorine is obtained by contacting the zeolite, and then the refined liquid chlorine is refined. The non-condensable gas is separated by distillation, and then the impurities of the high-boiling component are separated by rectification, and when it is filled in the cylinder, the effect of suppressing the generation of oxygen in the cylinder can be obtained. Further, in (1), rectification may be carried out before the step of contacting with the zeolite, and the powder of the zeolite which inhibits contact may be rectified to be mixed in the cylinder. Further, in (2), rectification is carried out between the step of contacting with the zeolite and the step of filling the cylinder, and the zeolite to be used is easily exchanged.

又,限定於特定之期間經過後的液態氯中所含有之氧氣濃度的範圍時,係就25日間之一般的保管期間而言,可在充分的期間使高純度氯經長期而保持純度。Further, when the range of the oxygen concentration contained in the liquid chlorine after the passage of the specific period is limited, the purity of the high-purity chlorine can be maintained for a long period of time in a sufficient period of time during the general storage period of 25 days.

進一步,使沸石之細孔的有效直徑為特定範圍時,係可更提昇在缸筒內之氧氣產生的抑制效果,可使高純度氯經長期而保持純度。Further, when the effective diameter of the pores of the zeolite is within a specific range, the effect of suppressing the generation of oxygen in the cylinder can be further enhanced, and the purity of the high-purity chlorine can be maintained over a long period of time.

又,使液態氯及精製液態氯中所含有之氧氣濃度的比X1 、X2 、及X2 /X1 為特定範圍時,係藉X1 及X2 隨時間經過之沸石接觸產生的氧氣之抑制效果,以及,藉X2 /X1 可得到沸石接觸的有無產生的氧氣之抑制效果,故就25日間之一般的保管期間而言,可在充分的期間得到在缸筒內之氧氣產生的抑制效果,並可使高純度氯經長期而保持純度。Further, when the ratios X 1 , X 2 and X 2 /X 1 of the oxygen concentration contained in the liquid chlorine and the purified liquid chlorine are in a specific range, the oxygen generated by the contact of the zeolite with X 1 and X 2 over time is obtained. The inhibitory effect is obtained, and the effect of suppressing the presence or absence of oxygen by the contact of the zeolite can be obtained by X 2 /X 1 , so that oxygen generation in the cylinder can be obtained in a sufficient period for a general storage period of 25 days. The inhibitory effect and high purity chlorine can maintain purity over a long period of time.

[用以實施發明之形態][Formation for implementing the invention]

以下,詳細說明本發明之高純度氯的製造方法。Hereinafter, a method for producing high-purity chlorine of the present invention will be described in detail.

本發明之高純度氯的製造方法係缸筒填充後之氧氣產生的抑制方法,其特徵在於:使液態氯接觸於沸石,將此接觸所得到之接觸後氯填充於缸筒,抑制該缸筒內之氧氣的產生。The method for producing high-purity chlorine according to the present invention is a method for suppressing generation of oxygen after filling a cylinder, characterized in that liquid chlorine is brought into contact with zeolite, and chlorine after contact with the contact is filled in a cylinder, and the cylinder is restrained The production of oxygen inside.

上述「液態氯」係可藉由任意之製造方法來製作,例如,電解食鹽水而得到氯氣,其後使該氯氣以硫酸脫水,然後,壓縮而液化得到。The above-mentioned "liquid chlorine" can be produced by any production method, for example, by electrolyzing salt water to obtain chlorine gas, and then dehydrating the chlorine gas with sulfuric acid, followed by compression and liquefaction.

上述「沸石」係與液態氯接觸,而用以吸附認為產生液態氯中之氧氣的原因物質者,天然品、合成品之任一者均可使用。又,沸石之形狀係可任意地選擇,可舉例如片粒狀、珠粒狀、板狀、棒狀及管狀等。The above-mentioned "zeolite" is in contact with liquid chlorine, and any of natural or synthetic materials can be used for the purpose of adsorbing a substance which is considered to generate oxygen in liquid chlorine. Further, the shape of the zeolite can be arbitrarily selected, and examples thereof include a pellet form, a bead shape, a plate shape, a rod shape, and a tubular shape.

進一步,沸石係具備形成許多細孔之構造。可通過此細孔之分子的大小之上述「有效直徑」係可任意地選擇,宜為0.3nm以上,亦可為複數之有效直徑的混合物。例如0.3nm以上時,可舉例如分子篩3A、分子篩4A、分子篩5A及分子篩13X等之合成沸石及此等之混合物。又,0.4nm以上時係可舉例如分子篩4A、分子篩5A及分子篩13X及此等之混合物。進一步,0.5nm以上時係可舉例如分子篩5A及分子篩13X及此等之混合物。又,有效直徑之最大值宜為10nm以下。Further, the zeolite system has a structure in which a large number of pores are formed. The above "effective diameter" of the size of the molecules which can pass through the pores can be arbitrarily selected, and is preferably 0.3 nm or more, and may be a mixture of plural effective diameters. For example, when it is 0.3 nm or more, a synthetic zeolite such as molecular sieve 3A, molecular sieve 4A, molecular sieve 5A, and molecular sieve 13X, and the like may be mentioned. Further, in the case of 0.4 nm or more, for example, molecular sieve 4A, molecular sieve 5A, molecular sieve 13X, and the like may be mentioned. Further, when it is 0.5 nm or more, for example, molecular sieve 5A, molecular sieve 13X, and the like are mentioned. Further, the maximum value of the effective diameter is preferably 10 nm or less.

上述「缸筒」係藉由使液態氯接觸於沸石所精製之精製液態氯貯存的容器。精製液態氯係可以填充於缸筒之狀態出貨。又,缸筒之材質係可任意地選擇,可舉例如鋼鐵及不銹鋼等之鐵等的金屬製等。其中,鐵製缸筒係廉價,可廣泛使用之點,可為較佳之例。The above "cylinder" is a container in which liquid chlorine is stored in contact with purified liquid chlorine purified by zeolite. The refined liquid chlorine can be shipped in the state of being filled in a cylinder. Further, the material of the cylinder tube can be arbitrarily selected, and examples thereof include a metal such as iron or steel such as steel or stainless steel. Among them, the iron cylinder is inexpensive and can be widely used, and may be a preferred example.

以連續式除去雜質時,係可不更換收容有沸石之容器中之液體而進行作業,故作業效率較批式更高,較佳。以連續式進行時,沸石與液態氯之接觸條件係可藉精餾等之條件適當選擇。每單位時間之流量的空塔速度(以下,略記為「SV」)而定義時,宜為SV=0.1~50[1/小時](較佳係1~25[1/小時])。若SV太大,氧氣發生之抑制效果變少,若SV太小,必須使除去設備更大型化。When the impurities are continuously removed, the liquid can be handled without replacing the liquid in the container containing the zeolite, so that the work efficiency is higher than that of the batch type, and it is preferable. When it is carried out in a continuous manner, the contact conditions of the zeolite with the liquid chlorine can be appropriately selected by conditions such as distillation. When the superficial velocity per unit time (hereinafter, abbreviated as "SV") is defined, it is preferably SV = 0.1 to 50 [1/hour] (preferably 1 to 25 [1/hour]). If the SV is too large, the suppression effect of oxygen generation is small, and if the SV is too small, the removal equipment must be made larger.

液態氯係可藉精餾分離除去上述「非凝縮性氣體」。此非凝縮性氣體係例如較氧及氮等之液態氯更低沸點的雜質。又,可藉精餾分離除去上述「高沸點成分的雜質」。此高沸點成分的雜質係較溴及金屬等之液態氯更高沸點的雜質。The liquid chlorine system can be separated and removed by distillation to remove the above-mentioned "non-condensable gas". This non-condensable gas system is, for example, a lower boiling point impurity than liquid chlorine such as oxygen and nitrogen. Further, the above-mentioned "high-boiling component impurities" can be removed by distillation. The impurities of the high boiling component are impurities having a higher boiling point than the liquid chlorine such as bromine or metal.

上述各精餾係亦可於沸石與液態氯之接觸處理之前進行,亦可於其後進行。Each of the above rectification systems may be carried out before the contact treatment of the zeolite with the liquid chlorine, or may be carried out thereafter.

例如,如圖1所例示般,接觸於沸石之前的液態氯係使電解食鹽水所得到之氯氣液化,其後,精餾液化物而分離非凝縮性氣體,然後,進一步精餾精餾物而分離高沸點成分的雜質來得到。進一步,如圖2所示般,精製液態氯係接觸於沸石之後,且填充於缸筒之前,進行精餾而分離非凝縮性氣體,然後,進一步精餾精餾物而分離高沸點成分的雜質來得到。For example, as illustrated in Fig. 1, the liquid chlorine before the contact with the zeolite liquefies the chlorine gas obtained by the electrolyzed brine, and thereafter, the liquefied material is rectified to separate the non-condensable gas, and then the distillate is further rectified. It is obtained by separating impurities of high boiling components. Further, as shown in FIG. 2, the purified liquid chlorine is contacted with the zeolite, and before being filled in the cylinder, the distillation is carried out to separate the non-condensable gas, and then the distillation product is further rectified to separate the impurities of the high boiling component. Come and get.

使沸石與液態氯之接觸處理在精餾步驟之前及後的任一者進行,亦可得到在缸筒內之氧氣發生的抑制的效果。進一步,在精餾前進行時,係即使產生接觸之沸石的粉末流出時,就可以精餾處理抑制粉末混入於缸筒內之點,佳。又,精餾後在缸筒填充前進行時係容易交換所使用之沸石,故佳。The contact treatment between the zeolite and the liquid chlorine is carried out before or after the rectification step, and the effect of suppressing the occurrence of oxygen in the cylinder can also be obtained. Further, when it is carried out before the rectification, even if the powder of the contacted zeolite is discharged, it is preferable that the rectification treatment suppresses the mixing of the powder into the cylinder. Further, it is preferred that the zeolite to be used is easily exchanged after the rectification is carried out before the cylinder is filled.

與上述沸石接觸後在25日後之上述精製液態氯中所含有的上述氧氣濃度可為例如0.01~1.5vol.ppm(宜為0.01~1.4,更宜為0.01~1.3)。進一步,例如可為0.01~1.0vol.ppm(宜為0.01~0.9,更宜為0.01~0.8)。The oxygen concentration contained in the purified liquid chlorine after 25 days after contact with the zeolite may be, for example, 0.01 to 1.5 vol. ppm (preferably 0.01 to 1.4, more preferably 0.01 to 1.3). Further, for example, it may be 0.01 to 1.0 vol. ppm (preferably 0.01 to 0.9, more preferably 0.01 to 0.8).

對於氧濃度之變化較液相部易把握的氣相部,填充有與上述沸石接觸後在25日後之上述精製液態氯的缸筒之氣相部中所含有的上述氧氣濃度可為例如1~220vol.ppm(宜為1~180,更宜為1~100)。The oxygen gas concentration contained in the gas phase portion of the cylinder in which the purified liquid chlorine is filled after 25 days after the contact with the zeolite is higher than the liquid phase portion which is easy to grasp in the liquid phase portion, for example, 1~ 220 vol. ppm (preferably 1 to 180, more preferably 1 to 100).

不使液態氯接觸於沸石而填充於缸筒後,1日後之液態氯中所含有的氧氣濃度Y1(1) 、與25日後之液態氯中所含有的氧氣濃度Y1(25) 之比(X1 =Y1(25) /Y1(1) )例如為2.3~6.0,填充於缸筒後,1日後之精裝液態氯中所含有的氧氣濃度Y2(1) 、與25日後之精製液態氯中所含有的氧氣濃度Y2(25 )之比(X2 =Y2(25) /Y2(1) )為1.0~2.1。The ratio of the oxygen concentration Y 1 (1) contained in the liquid chlorine after one day to the cylinder, and the oxygen concentration Y 1 (25) contained in the liquid chlorine after 25 days after the liquid chlorine is not contacted with the zeolite. (X 1 =Y 1(25) /Y 1(1) ) For example, 2.3 to 6.0, after filling in the cylinder, the oxygen concentration Y 2 (1) contained in the hard liquid chlorine after 1 day, and 25 days later The ratio of the oxygen concentration Y 2 (25 ) contained in the purified liquid chlorine (X 2 = Y 2 (25) / Y 2 (1) ) is 1.0 to 2.1.

又,抑制與沸石接觸所產生之非接觸時相較的液態氯中之氧氣增加的比率之X2 /X1 ,在上述X1 及X2 之值的範圍內可取得之範圍的0.2~0.4,且X1 及X2 係可形成上述各別的範圍內滿足前述X2 /X1 的範圍之值。Further, X 2 /X 1 which is a ratio of the increase in oxygen in the liquid chlorine which is caused by the contact with the zeolite in contact with the zeolite, is 0.2 to 0.4 in the range of the values of X 1 and X 2 described above. Further, X 1 and X 2 may form values satisfying the above range of X 2 /X 1 in the above respective ranges.

若為此等之範圍內,可使在缸筒內之氧氣產生的抑制效果為一定以上,並可使高純度氯經長期而保持純度。If it is within this range, the effect of suppressing the generation of oxygen in the cylinder can be made constant or more, and the purity of the high-purity chlorine can be maintained over a long period of time.

又,於液態氯中所含有之氧氣濃度係以使液態氯於室溫形成全量氣體之狀態所測定的氧氣之濃度。Further, the concentration of oxygen contained in the liquid chlorine is a concentration of oxygen measured in a state in which liquid chlorine forms a full amount of gas at room temperature.

進一步不使液態氯接觸於沸石而填充於缸筒後,1日後之缸筒的氣相部之氧氣濃度Y3(1) 、與25日後之缸筒的氣相部之氧氣濃度Y3(25) 之比(X3 =Y3(25) /Y3(1) )例如為3.1~6.0,填充精製液態氯後,1日後之缸筒的氣相部之氧氣濃度Y4(1) 、與25日後之缸筒的氣相部之氧氣濃度Y4(25) 之比(X4 =Y4(25) /Y4(1) )為1.0~2.1。Further, after the liquid chlorine is not contacted with the zeolite and filled in the cylinder, the oxygen concentration Y 3 (1) in the gas phase portion of the cylinder after 1 day, and the oxygen concentration Y 3 in the gas phase portion of the cylinder after 25 days (25) ) ratio (X 3 = Y 3 (25 ) / Y 3 (1)) , for example, 3.1 to 6.0, after filling the purified liquid chlorine, the oxygen concentration in the gas phase after 1 of the cylinder portion of the Y 4 (1), and The ratio of the oxygen concentration Y 4 (25) in the gas phase portion of the cylinder after 25 days (X 4 = Y 4 (25) / Y 4 (1) ) is 1.0 to 2.1.

又,抑制與沸石接觸所產生之非接觸時相較的缸筒之氣相部氧氣增加的比率之X4 /X3 ,在上述X4 及X3 之值的範圍內可取得之範圍例如可為0.2~0.7。Further, X 4 /X 3 which is a ratio of the oxygen increase in the gas phase portion of the cylinder which is in contact with the zeolite in contact with the zeolite, and a range which can be obtained within the range of the values of X 4 and X 3 can be, for example, It is 0.2~0.7.

若為此等之範圍內,可使在缸筒內之氧氣產生的抑制效果為一定以上,並可使高純度氯經長期而保持純度。If it is within this range, the effect of suppressing the generation of oxygen in the cylinder can be made constant or more, and the purity of the high-purity chlorine can be maintained over a long period of time.

[實施例][Examples]

以下,依據圖1,具體地說明本發明之高純度氯的製造方法。Hereinafter, a method for producing high-purity chlorine of the present invention will be specifically described with reference to Fig. 1 .

(1)液態氯之製造(1) Manufacture of liquid chlorine

如圖1所示般,藉食鹽水之電解所產生的氯氣以硫酸脫水後,以0.7~0.8MPa壓縮而得到粗液態氯。藉此所得到之粗液態氯係液化率為80~95%,含有氯99.8%以上。又,粗液態氯係含有氧作為雜質,故其後,藉由進行精餾以除去低沸點的非凝縮性氣體之氧氣等。然後,為除去高沸點成分的雜質之溴及金屬成分等,再度進行精餾。藉此得到含有氧氣為0.6vol.ppm(從液相部所採取之液態氯在室溫形成全量氣體之體積濃度)的液態氯。As shown in Fig. 1, the chlorine gas generated by the electrolysis of salt water is dehydrated with sulfuric acid, and then compressed at 0.7 to 0.8 MPa to obtain crude liquid chlorine. The crude liquid chlorine obtained by this has a liquefaction rate of 80 to 95% and contains 99.8% or more of chlorine. Further, the crude liquid chlorine contains oxygen as an impurity, and thereafter, rectification is carried out to remove oxygen or the like of a low-boiling non-condensable gas. Then, the bromine and the metal component of the impurities of the high-boiling component are removed, and rectification is performed again. Thereby, liquid chlorine containing 0.6 vol. ppm of oxygen (volume concentration of liquid chlorine taken from the liquid phase portion to form a full amount of gas at room temperature) was obtained.

(2)與沸石之接觸及填充(2) Contact and filling with zeolite

其後,填充有效直徑為0.3nm的3A型合成沸石(分子篩3A、巴工業製)150ml之吸附塔以上述製造方法所製造的液態氯以SV=13[1/小時]接觸,得到可舉例如1之精製液態氯。其後,鋼鐵製缸筒(容量10升)填充成為容量6成之8.5kg。然後,在室溫下保管,而經過1日、13日及25日後,進行氧氣之定量分析。分析係藉由使用PID作為檢測器、使用2m之「Unibeads 1S」及3m之「分子篩13XS」作為管柱、使用氦氣作為載體氣體之氣體色層分析(製品名G3900,日立製作所製),在溫度60℃下進行。又,氧氣之定量分析係對於缸筒內之液態氯部(以下,作為液相部)、及缸筒內之氣相部,濃度分別表示於表1及表2中。Then, the adsorption column of the above-mentioned production method is contacted with liquid chlorine prepared by the above-described production method in an adsorption column of a type 3A synthetic zeolite (molecular sieve 3A, manufactured by Baline Industries, Ltd.) having an effective diameter of 0.3 nm, and is contacted at SV = 13 [1/hour], for example, 1 refined liquid chlorine. Thereafter, the steel cylinder (capacity 10 liters) was filled to a capacity of 8.5 kg of 60%. Then, it was stored at room temperature, and after 1 day, 13 days, and 25 days, quantitative analysis of oxygen was performed. The analysis was carried out by using a PID as a detector, a 2 m "Unibeads 1S" and a 3 m "molecular sieve 13XS" as a column, and a gas chromatographic analysis using a helium gas as a carrier gas (product name G3900, manufactured by Hitachi, Ltd.). The temperature was carried out at 60 °C. Further, the quantitative analysis of oxygen is shown in Tables 1 and 2 for the liquid chlorine portion (hereinafter referred to as the liquid phase portion) in the cylinder and the gas phase portion in the cylinder.

又,就實施例2而言,除使用細孔之有效直徑為1.0nm之13X型合成沸石(「分子篩13X」、巴工業公司製)之外,其餘係與實施例1相同之製造方法得到精製液態氯,而填充於鋼鐵製缸筒。其後,以與實施例1相同之方法進行氧氣之定量分析。Further, in the second embodiment, the same production method as in Example 1 was carried out except that a 13X-type synthetic zeolite having a pore diameter of 1.0 nm ("Molecular Sieve 13X", manufactured by Baiya Kogyo Co., Ltd.) was used. Liquid chlorine, which is filled in a steel cylinder. Thereafter, quantitative analysis of oxygen was carried out in the same manner as in Example 1.

進一步,就比較例1而言,於液態氯原料不接觸沸石而填充於鋼鐵製缸筒。又,就比較例2而言,使用平均細孔徑2.5nm之氧化矽凝膠(「Unibeads 1S」、JL Science公司製)取代沸石之外,其餘係與實施例1相同之製造方法得到精製液態氯,而填充於鋼鐵製缸筒。其後,以與實施例1相同之方法進行氧氣之定量分析。Further, in Comparative Example 1, the liquid chlorine raw material was filled in a steel cylinder without contacting the zeolite. In addition, in Comparative Example 2, a cerium oxide gel ("Unibeads 1S", manufactured by JL Science Co., Ltd.) having an average pore diameter of 2.5 nm was used in place of the zeolite, and the same production method as in Example 1 was carried out to obtain purified liquid chlorine. And filled in a steel cylinder. Thereafter, quantitative analysis of oxygen was carried out in the same manner as in Example 1.

(3)缸筒填充1日後之液相部的氧氣濃度(3) Oxygen concentration in the liquid phase after 1 day of cylinder filling

如表1所示般,可知填充於缸筒之後,在1日後之液相部的氧氣濃度未接觸沸石之比較例1中,係0.7vol.ppm,然而,與沸石接觸之實施例1及實施例2係任一者均為0.2vol.ppm,缸筒填充時點的氧氣之含量較比較例1還少。As shown in Table 1, it is understood that in the comparative example 1 in which the oxygen concentration in the liquid phase portion after the filling of the cylinder tube was not contacted with zeolite at 0.7 vol. ppm after 1 day, the example 1 and the method of contacting with the zeolite were carried out. In Example 2, any of them was 0.2 vol. ppm, and the oxygen content at the point of filling the cylinder was less than that of Comparative Example 1.

又,可知缸筒接觸液態氯之比較例2係液相部的氧氣濃度為0.6vol.ppm,與實施例1及2之0.2vol.ppm比較而缸筒填充時點的氧氣之含量的抑制效果小。Further, in Comparative Example 2 in which the cylinder tube was in contact with liquid chlorine, the oxygen concentration in the liquid phase portion was 0.6 vol. ppm, and the effect of suppressing the oxygen content at the time of cylinder filling at the time of comparison with 0.2 vol. ppm in Examples 1 and 2 was small. .

(4)缸筒填充25日後之液相部的氧氣濃度(4) Oxygen concentration in the liquid phase after 25 days of cylinder filling

如表1所示般,可知填充於缸筒之後,在25日後之液相部的氧氣濃度未接觸沸石之比較例1中,係2.1vol.ppm,然而,與沸石接觸之實施例1及實施例2係分別為1.3vol.ppm及0.2vol.ppm,氧氣之含量較比較例1還少。As shown in Table 1, it can be seen that in the comparative example 1 in which the oxygen concentration in the liquid phase portion after the filling of the cylinder tube was not contacted with the zeolite after 21 days, it was 2.1 vol. ppm. However, Example 1 and the method of contacting with the zeolite were carried out. Example 2 was 1.3 vol. ppm and 0.2 vol. ppm, respectively, and the oxygen content was less than that of Comparative Example 1.

進一步,在實施例2中係液相部之25日後與1日後之氧氣濃度比X2 為0.2/0.2=1.0,在24日間氧氣濃度略無變化。Further, in Example 2, the oxygen concentration ratio X 2 after the liquid phase portion and after 1 day was 0.2/0.2 = 1.0, and the oxygen concentration did not change slightly during the 24 days.

另外,可知未與沸石接觸之比較例1係增加氣相部之25日後與1日後之氧氣濃度比X1 為達2.1/0.7=3.0。亦即,實施例2係在氣相部之沸石接觸所產生的氧氣的增加抑制比率X2 /X1 中係1.0/3.0=0.3,與比較例1相較明顯更少。Further, it was found that Comparative Example 1 which was not in contact with the zeolite increased the oxygen concentration ratio X 1 after the gas phase portion by 25 days and after 1 day to 2.1/0.7 = 3.0. That is, Example 2 was 1.0/3.0 = 0.3 in the increase inhibition ratio X 2 /X 1 of oxygen generated by the contact of the zeolite in the gas phase portion, which was significantly less than that of Comparative Example 1.

(5)缸筒填充1日後之氣相部的氧氣濃度(5) Oxygen concentration in the gas phase after 1 day of cylinder filling

如表2所示般,可知填充於缸筒之後,在1日後之氣相部的氧氣濃度未接觸沸石之比較例1中,係92vol.ppm,然而,與沸石接觸之實施例1為28vol.ppm,及實施例2為26vol.ppm,缸筒填充時點的氧氣之含量與液相部同樣地較比較例1還少。As shown in Table 2, it was found that in the comparative example 1 in which the oxygen concentration in the gas phase portion after 1 day was not contacted with the zeolite, it was 92 vol. ppm, but the example 1 in contact with the zeolite was 28 vol. The ppm and Example 2 were 26 vol. ppm, and the oxygen content at the time of filling the cylinder was less than that of Comparative Example 1 as in the liquid phase.

又,可知缸筒接觸液態氯之比較例2係氣相部的氧氣濃度為81vol.ppm,與實施例1之28vol.ppm及實施例2為26vol.ppm相較,缸筒填充時點的氧氣之含量的抑制效果小。Further, in Comparative Example 2 in which the cylinder tube was in contact with liquid chlorine, the oxygen concentration in the gas phase portion was 81 vol. ppm, and compared with 28 vol. ppm in Example 1 and 26 vol. ppm in Example 2, the oxygen at the point of filling the cylinder tube was obtained. The inhibitory effect of the content is small.

(6)缸筒填充25日後之氣相部的氧氣濃度(6) Oxygen concentration in the gas phase after 25 days of cylinder filling

如表2所示般,可知填充於缸筒之後,在25日後之氣相部的氧氣濃度未接觸沸石之比較例1中,係330vol.ppm,然而,與沸石接觸之實施例1及實施例2分別為169vol.ppm及26vol.ppm,與液相部同樣地氧氣之含量較比較例1還少。As shown in Table 2, in Comparative Example 1 in which the oxygen concentration in the gas phase portion after 25 days was not filled with the zeolite, it was found to be 330 vol. ppm. However, Examples 1 and Examples in contact with the zeolite were found. 2 was 169 vol. ppm and 26 vol. ppm, respectively, and the oxygen content was less than that of Comparative Example 1 in the same manner as in the liquid phase portion.

進而,若實施例1及比較例2之填充後於1日後與25日後進行比較,在液相部中之氧氣濃度的增加量分別成為1.3-0.2=1.1vol.ppm、及1.6-0.6=1.0vol.ppm略相同之值。但,在可觀察更微細變化之氣相部中係實施例1之氧氣濃度的增加量為169-28=141vol.ppm,但在比較例2中,顯現245-81=161vol.ppm很大的差,實施例1係氧氣之含量的抑制效果大於比較例2。Further, after the filling of the first and second comparative examples, the amount of increase in the oxygen concentration in the liquid phase portion was 1.3-0.2 = 1.1 vol. ppm, and 1.6 - 0.6 = 1.0, respectively, after 1 day and 25 days later. Vol.ppm is slightly the same value. However, in the gas phase portion where the finer change was observed, the increase amount of the oxygen concentration in Example 1 was 169-28 = 141 vol. ppm, but in Comparative Example 2, it was found that 245-81 = 161 vol. ppm was large. The effect of suppressing the content of oxygen in Example 1 was larger than that of Comparative Example 2.

進一步,在實施例2中係液相部之25日後與1日後之氧氣濃度的比X4 為26/26=1.0,在24日間氧氣濃度略無變化。Further, in Example 2, the ratio X 4 of the oxygen concentration after the liquid phase portion and the day after the day was 26/26 = 1.0, and the oxygen concentration did not change slightly during the 24 days.

另外,可知未與沸石接觸之比較例1係增加液相部之25日後與1日後之氧氣濃度的比X3 為達330/92=3.6。亦即,實施例2係在液相部之沸石接觸所產生的氧氣的增加抑制比率X4 /X3 中係1.0/3.6=0.3,與液相部同樣地與比較例1相較明顯更少。Further, in Comparative Example 1 in which the zeolite was not in contact with the zeolite, the ratio X 3 of the oxygen concentration after the liquid phase portion was increased to 330/92 = 3.6. That is, in Example 2, the increase inhibition ratio X 4 /X 3 of oxygen generated by the contact of the zeolite in the liquid phase portion was 1.0/3.6 = 0.3, which was significantly less than that of Comparative Example 1 as in the liquid phase portion. .

又,認為氣相部之氧氣增加係因存在於液態氯之氧氣會被釋出。Further, it is considered that the increase in oxygen in the gas phase portion is released due to the oxygen present in the liquid chlorine.

在實施例2中係液相部及氣相部之任一者的氧氣濃度維持略一定,在所謂25日間之一般的保管期間而在充分的期間,可使在缸筒內之氧氣產生的抑制效果形成一定以上,且使高純度氯經長期間而保持純度。In the second embodiment, the oxygen concentration in the liquid phase portion and the gas phase portion is maintained to be slightly constant, and the oxygen generation in the cylinder can be suppressed in a sufficient period during the normal storage period of 25 days. The effect is formed to a certain extent or more, and the high purity chlorine is kept in purity for a long period of time.

又,可知實施例1及2係雖相對於比較例2而細孔之有效直徑小,但缸筒填充1日後之氧氣濃度少。尤其,可知有效直徑為1.0nm之實施例2係即使經過25日間之期間,亦抑制氧氣之增加的效果大。Further, it can be seen that in Examples 1 and 2, the effective diameter of the pores was small with respect to Comparative Example 2, but the oxygen concentration after one day of filling the cylinder was small. In particular, it is understood that the second embodiment having an effective diameter of 1.0 nm has a large effect of suppressing an increase in oxygen even after a period of 25 days.

認為此係如圖3所例示般,相對於比較例2為細孔徑之分布廣的二氧化矽凝膠,但實施例1及2係細孔徑的分布極窄的分子篩(沸石)。This is considered to be a cerium oxide gel having a large pore diameter distribution with respect to Comparative Example 2 as shown in Fig. 3, but Examples 1 and 2 are molecular sieves (zeolites) having a narrow pore diameter distribution.

又,在本發明中,不限於前述實施例所示者,而可依目的、用途而在本發明之範圍內形成各種變更之態樣。例如,在實施例1及2中係精餾之後,使液態氯接觸於沸石,但不限定於此,而如圖2所示般,使粗液態氯接觸於沸石之後,進行各精餾,可使所得到之液態氯填充於缸筒。即使以此順序製造高純度氯,亦可得到在缸筒內之氧氣產生的抑制效果,且使高純度氯經長期間而保持純度。Further, the present invention is not limited to the ones described in the above embodiments, and various modifications can be made within the scope of the invention depending on the purpose and application. For example, after the rectification in Examples 1 and 2, the liquid chlorine is brought into contact with the zeolite. However, the present invention is not limited thereto, and as shown in Fig. 2, after the crude liquid chlorine is brought into contact with the zeolite, each rectification is carried out. The obtained liquid chlorine is filled in the cylinder. Even if high-purity chlorine is produced in this order, the effect of suppressing the generation of oxygen in the cylinder can be obtained, and the purity of the high-purity chlorine can be maintained for a long period of time.

圖1係用以說明製造高純度氯之步驟的流程圖。Figure 1 is a flow chart for explaining the steps of producing high purity chlorine.

圖2係用以說明製造其他的高純度氯之步驟的流程圖。Figure 2 is a flow chart illustrating the steps of making other high purity chlorine.

圖3係用以說明分子篩與二氧化矽凝膠之細孔分布差異的圖表。Fig. 3 is a graph for explaining the difference in pore distribution between the molecular sieve and the cerium oxide gel.

Claims (6)

一種高純度氯的製造方法,其特徵為使液態氯接觸於沸石,將此接觸所得到之精製液態氯填充於缸筒,抑制該缸筒內之氧氣的產生之高純度氯的製造方法,其中接觸於上述沸石之前的上述液態氯係使電解食鹽水所得到之氯氣經液化而得到;(1)其後被精餾而分離非凝縮性氣體,然後被精餾而分離高沸點成分之雜質,其後接觸於沸石,然後填充於上述缸筒;或,(2)其後,接觸於上述沸石而得到上述精製液態氯,然後該精製液態氯係被精餾而分離非凝縮性氣體,其後,被精餾而分離高沸點成分之雜質,然後填充於上述缸筒;上述接觸於沸石之上述液態氯的空塔速度(SV)為0.1~25〔1/小時〕。 A method for producing high-purity chlorine, which is characterized in that liquid chlorine is brought into contact with zeolite, and the purified liquid chlorine obtained by the contact is filled in a cylinder tube to suppress the generation of oxygen in the cylinder, and a method for producing high-purity chlorine is produced. The liquid chlorine before the contact with the zeolite is obtained by liquefying the chlorine gas obtained by the electrolyzed brine; (1) thereafter, the non-condensable gas is separated by rectification, and then the impurities of the high boiling component are separated by rectification. Thereafter, the zeolite is contacted with the zeolite and then filled in the cylinder; or, (2) thereafter, the refined liquid chlorine is obtained by contacting the zeolite, and then the refined liquid chlorine is rectified to separate the non-condensable gas, and thereafter The impurities of the high-boiling component are separated by rectification, and then filled in the cylinder; the superficial velocity (SV) of the liquid chlorine contacting the zeolite is 0.1 to 25 [1/hour]. 如申請專利範圍第1項之高純度氯的製造方法,其中與上述沸石接觸後,在25日後之上述精製液態氯中所含有的上述氧氣濃度為0.01~1.5vol.ppm。 The method for producing high-purity chlorine according to the first aspect of the invention, wherein the concentration of the oxygen contained in the purified liquid chlorine after 25 days after contact with the zeolite is 0.01 to 1.5 vol. ppm. 如申請專利範圍第1或2項之高純度氯的製造方法,其中上述沸石之細孔的有效直徑為0.3nm以上。 A method for producing high-purity chlorine according to claim 1 or 2, wherein the pore diameter of the zeolite is 0.3 nm or more. 如申請專利範圍第1或2項之高純度氯的製造方法,其中與上述沸石接觸後,在25日後之上述精製液態氯中所含有的上述氧氣濃度為0.01~1.0vol.ppm。 The method for producing high-purity chlorine according to claim 1 or 2, wherein the concentration of the oxygen contained in the purified liquid chlorine after 25 days after contact with the zeolite is 0.01 to 1.0 vol. ppm. 如申請專利範圍第1或2項之高純度氯的製造方法,其中上述沸石之細孔的有效直徑為0.4nm以上。 A method for producing high-purity chlorine according to claim 1 or 2, wherein the pore diameter of the zeolite is 0.4 nm or more. 如申請專利範圍第1或2之高純度氯的製造方法,其中不使上述液態氯接觸於上述沸石,填充於上述缸筒後,25日後與1日後之該液態氯中所含有之氧濃度的比(X1 )為2.3~6.0,使上述精製液態氯填充於上述缸筒後,25日後與1日後之該精製液態氯中所含有之氧濃度的比(X2 )為1.0~2.1,上述X2 /上述X1 為0.2~0.4。The method for producing high-purity chlorine according to claim 1 or 2, wherein the liquid chlorine is not contacted with the zeolite, and after being filled in the cylinder, the oxygen concentration in the liquid chlorine after 25 days and one day later is When the ratio (X 1 ) is 2.3 to 6.0, and the purified liquid chlorine is filled in the cylinder, the ratio (X 2 ) of the oxygen concentration contained in the purified liquid chlorine after 25 days and 1 day later is 1.0 to 2.1, X 2 / X 1 above is 0.2 to 0.4.
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JPS5265194A (en) * 1975-11-25 1977-05-30 Tetsuo Takaishi Method of purifying chlorine or hydrogen chloride for semiconductors
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