Claims (10)
一種偵測晶片影像瑕疵方法,包含下列步驟:第一步驟,拍攝一晶片影像;第二步驟,將該晶片影像進行水平方向影像校正;第三步驟,利用一二值化模組提取該晶片影像中高強度的一候選瑕疵;第四步驟,再使用二相異型態學模組移除一細小瑕疵;第五步驟,利用一機器學習模組以一支援向量機藉由一瑕疵特徵分類出該晶片影像中至少一光點及至少一高強度瑕疵;第六步驟,利用一霍夫轉換模組轉換找出晶片邊界,將該晶片影像以該晶片影像強度平均值區分為晶片部分和背景部分用以計算一能量圖;第七步驟,以該些型態學方法填補該晶片影像的輪廓不完整,並移除該晶片影像中該細小瑕疵用以得到一完整晶片邊界輪廓;以及第八步驟,利用該霍夫轉換模組轉換找出代表晶片邊界的一直線,計算該直線與該完整晶片邊界輪廓之間的差異用以檢測一低強度瑕疵。A method for detecting a wafer image includes the following steps: a first step of capturing a wafer image; a second step of correcting the wafer image in a horizontal direction; and a third step of extracting the wafer image by using a binarization module a candidate for medium-high intensity; in the fourth step, the two-phase heteromorphic module is used to remove a small flaw; in the fifth step, a machine learning module is used to classify the support vector machine by a feature. At least one spot and at least one high-intensity flaw in the wafer image; in the sixth step, the wafer boundary is converted by using a Hough transform module, and the wafer image is divided into a wafer portion and a background portion by using the average image intensity of the wafer To calculate an energy map; in a seventh step, the contour of the wafer image is filled incompletely by the patterning method, and the fine flaw in the wafer image is removed to obtain a complete wafer boundary contour; and an eighth step is Using the Hough transform module to find a straight line representing the boundary of the wafer, and calculating the difference between the straight line and the boundary contour of the complete wafer for detecting Low intensity flaws.
如請求項1所述之偵測晶片影像瑕疵方法,其中,該第二步驟以一肯尼邊緣偵測器模組偵測影像邊緣,並利用該霍夫轉換模組轉換找出晶片影像中最長的一條直線並求得其角度,再利用一二維旋轉公式將該晶片影像作旋轉校
正。The method for detecting a wafer image according to claim 1, wherein the second step detects the edge of the image by a Kenny edge detector module, and uses the Hough transform module to find the longest image in the wafer. a straight line and find its angle, and then use a two-dimensional rotation formula to rotate the wafer image
positive.
如請求項1所述之偵測晶片影像瑕疵方法,其中,該些型態學模組包含斷開運算和閉合運算。The method for detecting a wafer image according to claim 1, wherein the pattern modules comprise a disconnect operation and a close operation.
如請求項1所述之偵測晶片影像瑕疵方法,其中,該瑕疵特徵包含瑕疵強度平滑度、瑕疵紋理複雜度及瑕疵紋理結構。The method for detecting a wafer image according to claim 1, wherein the 瑕疵 feature comprises 瑕疵 intensity smoothness, 瑕疵 texture complexity, and 瑕疵 texture structure.
如請求項1所述之偵測晶片影像瑕疵方法,其中,更包含一調整步驟在該第五步驟和該第六步驟之間進行,先移除該晶片影像中像素強度值大於該晶片影像強度平均值的像素,用於該能量圖能有效分離晶片部分和背景部分。The method for detecting a wafer image according to claim 1, further comprising an adjusting step performed between the fifth step and the sixth step, wherein removing the pixel intensity value in the wafer image is greater than the image intensity of the wafer A pixel of the average for the energy map to effectively separate the wafer portion from the background portion.
如請求項1所述之偵測晶片影像瑕疵方法,其中,該能量圖以該晶片影像強度平均值分為較大和較小兩部分,強度較大的部分以第一顏色表示,強度較小的部分以第二顏色表示。The method for detecting a wafer image according to claim 1, wherein the energy map is divided into two parts of a larger and a smaller part by an average value of the image intensity of the wafer, and the portion with a higher intensity is represented by a first color, and the intensity is smaller. The part is represented by the second color.
如請求項1所述之偵測晶片影像瑕疵方法,其中,該第八步驟中該直線與該晶片邊界輪廓之間差距大的一影像像素個數小於門檻值時判斷為不存在瑕疵,該直線與該晶片邊界輪廓之間差距大的該影像像素個數大於門檻值時判斷為一瑕疵影像。The method for detecting a wafer image according to claim 1, wherein in the eighth step, the number of image pixels having a large gap between the line and the boundary contour of the wafer is less than a threshold value, and the line is determined to be absent. When the number of the image pixels having a large difference from the boundary contour of the wafer is greater than the threshold value, it is determined as a single image.
一種偵測晶片影像瑕疵系統,用於如請求項1之方法,該晶片影像瑕疵偵測系統包含:一承載平台,用以放置一晶片;一攝像機構,用以擷取一晶片影像;以及一電腦裝置,包含:一影像顯示模組;複數個運算模組用以分析判斷該晶片影像;一資料庫,用以儲存一分析結果並建立機器學習資料以加快往後比對速度;以及一輸出裝置用以顯示該分析結果。A method for detecting a wafer image, the method of claim 1, wherein the wafer image detection system comprises: a carrier platform for placing a wafer; a camera mechanism for capturing a wafer image; and a The computer device comprises: an image display module; a plurality of computing modules for analyzing and determining the image of the wafer; a database for storing an analysis result and establishing machine learning data to speed up the backward comparison speed; and an output The device is used to display the analysis result.
如請求項8所述之偵測晶片影像瑕疵系統,其中,該些運算模組包含一肯尼邊緣偵測器模組、一霍夫轉換模組、一二值化模組、一型態學模組及一機器學習模組。The method for detecting a wafer image defect according to claim 8, wherein the computing module comprises a Kenny edge detector module, a Hough transform module, a binarization module, and a type Module and a machine learning module.
內儲用以偵測晶片影像瑕疵之一電腦程式產品,當電腦載入一肯尼邊緣偵測器模組、一霍夫轉換模組、一二值化模組、一型態學模組及一機器學習模組並執行後,可完成請求項1所述之方法。a computer program product for detecting wafer images, when the computer is loaded with a Kenny edge detector module, a Hough conversion module, a binary module, a type module and After a machine learning module is executed, the method described in claim 1 can be completed.