TWI450034B - Alkali soluble binder resin and photosensitive resin composition including the same - Google Patents
Alkali soluble binder resin and photosensitive resin composition including the same Download PDFInfo
- Publication number
- TWI450034B TWI450034B TW100112777A TW100112777A TWI450034B TW I450034 B TWI450034 B TW I450034B TW 100112777 A TW100112777 A TW 100112777A TW 100112777 A TW100112777 A TW 100112777A TW I450034 B TWI450034 B TW I450034B
- Authority
- TW
- Taiwan
- Prior art keywords
- alkali
- resin
- group
- soluble binder
- chemical formula
- Prior art date
Links
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Optical Filters (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Description
本申請案係主張2010年04月13日向韓國智慧財產局提出之韓國專利申請案第10-2010-0033743號之優先權,其中揭露合併於此以供參酌。The present application claims priority to Korean Patent Application No. 10-2010-0033743, filed on Apr. 13, 2010, to the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference.
本發明係關於一種鹼溶性黏結劑用樹脂,其能具備絕佳可溶解性(resolubility)以作為一種清洗溶劑,可降低狹縫噴嘴(slit nozzle)之污染情形,並且降低基板中異物(alien substance)的產生,此外,本發明亦關於一種製作該鹼溶性黏結劑用樹脂之方法、及一種包含鹼溶性黏結劑用樹脂之光敏樹脂組合物。The present invention relates to a resin for an alkali-soluble binder which can have excellent resolubility as a cleaning solvent, can reduce the contamination of a slit nozzle, and reduce foreign matter in the substrate (alien substance) Further, the present invention relates to a method for producing the resin for an alkali-soluble binder, and a photosensitive resin composition comprising a resin for an alkali-soluble binder.
隨著基板尺寸的增加,一般使用光敏樹脂組合物製備濾色片的方法,漸漸由現有的旋轉塗佈法(spin coating method)轉變為狹縫旋轉法(slit and spin method)或非旋轉法(spinless method)。然而,在狹縫旋轉法或非旋轉法中,係使用狹縫噴嘴進行塗佈製程。因此,狹縫噴嘴中很可能因為光敏樹脂組合物而發生污染,因而需要發展一種清潔狹縫噴嘴之方法。As the size of the substrate increases, a method of preparing a color filter generally using a photosensitive resin composition is gradually changed from a conventional spin coating method to a slit and spin method or a non-rotation method ( Spinless method). However, in the slit rotation method or the non-rotation method, a slit nozzle is used for the coating process. Therefore, it is likely that the slit nozzle is contaminated by the photosensitive resin composition, and thus it is required to develop a method of cleaning the slit nozzle.
該清潔方法係使用光敏樹脂組合物中的主溶劑清洗狹縫的噴嘴部分。於此,當樹脂組合物對主溶劑的溶解度(通常稱之為可溶解性)較低時,在噴嘴部分乾燥的光敏樹脂組合物將以凸出物的形式繼續存在,使基板中產生異物,進而使產率降低。This cleaning method cleans the nozzle portion of the slit using the main solvent in the photosensitive resin composition. Here, when the solubility of the resin composition to the main solvent (generally referred to as solubility) is low, the photosensitive resin composition dried at the nozzle portion will continue to exist in the form of a projection to cause foreign matter in the substrate, This in turn reduces the yield.
因此,為了解決上述之問題,溶劑於光敏樹脂組合物乾燥後的可溶解性就變得越來越重要。Therefore, in order to solve the above problems, the solubility of the solvent after drying of the photosensitive resin composition becomes more and more important.
因此,本發明之目的係在提供一種具備絕佳可溶解性之鹼溶性黏結劑用樹脂之合成方法及包含該鹼溶性黏結劑用樹脂之光敏樹脂組合物,於製作濾色片的步驟中降低狹縫噴嘴之污染情形及基板中異物的產生。Accordingly, an object of the present invention is to provide a method for synthesizing a resin for an alkali-soluble binder having excellent solubility and a photosensitive resin composition comprising the resin for an alkali-soluble binder, which are reduced in the step of producing a color filter. The contamination of the slit nozzle and the generation of foreign matter in the substrate.
本發明之另一目的係在提供一種鹼溶性黏結劑用樹脂,其係包含於光敏樹脂組合物之中,並且該鹼溶性黏結劑用樹脂係製作為具有提升可溶解性之結構。Another object of the present invention is to provide a resin for an alkali-soluble binder which is contained in a photosensitive resin composition, and which is made of a resin having a structure which enhances solubility.
本發明之又一個目的係在提供一種具備絕佳可溶解性之鹼溶性黏結劑用樹脂的製備方法。Still another object of the present invention is to provide a process for producing a resin for an alkali-soluble binder having excellent solubility.
本發明之再一目的係在提供一種具備絕佳可溶解性之光敏樹脂組合物,當使用包含鹼溶性黏結劑用樹脂的光敏樹脂組合物形成圖案時,具備絕佳可溶解性之光敏樹脂組合物不會於狹縫的噴嘴部分中產生污染或缺陷。Still another object of the present invention is to provide a photosensitive resin composition having excellent solubility which is excellent in solubility when a pattern is formed using a photosensitive resin composition containing a resin for an alkali-soluble binder. The material does not cause contamination or defects in the nozzle portion of the slit.
本發明之更一目的係在提供一種使用本發明之光敏樹脂組合物所製備之濾色片,由於可溶解性之改善,使其能製作出具備絕佳感光性、顯影特性及耐化學性之濾色片。A further object of the present invention is to provide a color filter prepared by using the photosensitive resin composition of the present invention, which is capable of producing excellent photosensitivity, developing properties and chemical resistance due to improvement in solubility. Color filter.
於本發明中製作用於光敏樹脂組合物的鹼溶性黏結劑用樹脂時,透過將一具長烷基鏈之羧酸化合物加入至一中間反應步驟中,使鹼溶性黏結劑用樹脂之結構中烷基鏈較長者取代鹼溶性黏結劑用樹脂之側鏈。When the resin for an alkali-soluble binder for a photosensitive resin composition is produced in the present invention, a carboxylic acid compound having a long alkyl chain is added to an intermediate reaction step to form a resin in an alkali-soluble binder. The longer alkyl chain replaces the side chain of the resin for the alkali-soluble binder.
在使用含有上述鹼溶性黏結劑用樹脂結構之光敏樹脂組合物形成想要的圖案之後,使用清洗方法清洗狹縫的噴嘴部分時,由於取代側鏈的長烷鏈提升該鹼溶性黏結劑用樹脂的柔軟性(flexibility),因此,作為主溶劑之樹脂組合物的可溶解性得以改善,並且可使該樹脂組合物不會再留在狹縫的噴嘴部分。After the desired pattern is formed using the photosensitive resin composition containing the resin structure of the above-described alkali-soluble binder, when the nozzle portion of the slit is cleaned by a cleaning method, the resin for the alkali-soluble binder is lifted by the long alkyl chain replacing the side chain. The flexibility of the resin composition as a main solvent is improved, and the resin composition can be left in the nozzle portion of the slit.
本發明的鹼溶性黏結劑用樹脂,由於在維持光敏樹脂組合物所要求的基本特性如感光度、顯影特性和耐化學性等的同時,具有出色的清洗溶劑溶解度,因此可用於製造可溶解性出色的光敏樹脂組合物。The resin for an alkali-soluble binder of the present invention can be used for the production of solubility because it has excellent cleaning solvent solubility while maintaining basic properties such as sensitivity, development characteristics, and chemical resistance required for the photosensitive resin composition. Excellent photosensitive resin composition.
此外,當使用具有改善可溶解性的光敏樹脂組合物時,最終產品的不合格可最小化,並且因為不需要反覆實施清洗方法,因此具有提升工序性的效果。Further, when a photosensitive resin composition having improved solubility is used, the failure of the final product can be minimized, and since the cleaning method is not required to be repeatedly performed, the effect of improving the processability is obtained.
以下,將配合附圖更加詳盡地描述本發明中實施例之內容,使熟習此技術領域者可易於實行本發明之實施例。In the following, the embodiments of the present invention will be described in more detail with reference to the accompanying drawings, and the embodiments of the present invention can be easily implemented by those skilled in the art.
較佳為,將羧酸化合物加入中間反應步驟中,使本發明之鹼溶性黏結劑用樹脂具有長側鏈之結構。因此,具有至少一個碳數之烷基鏈將取代於該結構之側鏈上。Preferably, the carboxylic acid compound is added to the intermediate reaction step so that the resin for the alkali-soluble binder of the present invention has a long side chain structure. Thus, an alkyl chain having at least one carbon number will be substituted on the side chain of the structure.
尤其,本發明之鹼溶性黏結劑用樹脂係包含如下列化學式1至化學式3所示之重複單元:In particular, the resin for an alkali-soluble binder of the present invention contains a repeating unit represented by the following Chemical Formula 1 to Chemical Formula 3:
於化學式1至化學式3中,X1 和X2 係為互相相同或不同之基團,且每一基團係選自氫、一具有1至3之一碳數之烷基、及一烷氧基;A係為一種或以上選自下列之基團:一苄基氧基羰基基團(benzyl oxy carbonyl group)、苯基(phenyl group)、一異冰片基(isobornyl group)、一環己基(cyclohexyl group)、及一N-苯基馬來醯亞胺基(N-phenyl maleimide group);Y係選自由下列所組成之群組:一具有1至5之一碳數之亞烷基(alkylene)、環氧乙烷、及環氧丙烷;Z係選自一具有1至5個碳數之亞烷基、一環己烯、一環己烷、及一苯基團;且n係為1至10。In Chemical Formula 1 to Chemical Formula 3, X 1 and X 2 are groups which are the same or different from each other, and each group is selected from hydrogen, an alkyl group having a carbon number of 1 to 3, and an alkoxy group. A group is one or more groups selected from the group consisting of a benzyl oxy carbonyl group, a phenyl group, an isobornyl group, and a cyclohexyl group. Group), and an N-phenyl maleimide group; Y is selected from the group consisting of: an alkylene having a carbon number of 1 to 5 And ethylene oxide, and propylene oxide; Z is selected from the group consisting of an alkylene group having 1 to 5 carbon atoms, monocyclohexene, monocyclohexane, and a monophenyl group; and n is 1 to 10.
此外,本發明中製備鹼溶性黏結劑用樹脂的方法包括下列步驟:a)聚合一化學式1所示之單體及一含有環氧基之單體;b)聚合步驟a)中形成之聚合物及一羧酸化合物;以及c)加入環酐,以加入一酸基至該步驟b)中形成之聚合物。Further, the method for preparing a resin for an alkali-soluble binder in the present invention comprises the steps of: a) polymerizing a monomer represented by Chemical Formula 1 and an epoxy group-containing monomer; b) polymer formed in the polymerization step a) And a monocarboxylic acid compound; and c) adding a cyclic anhydride to add an acid group to the polymer formed in the step b).
此外,本發明之光敏樹脂組合物包含一含有如化學式1至化學式3所示之重複單元的鹼溶性黏結劑用樹脂。Further, the photosensitive resin composition of the present invention comprises a resin for an alkali-soluble binder containing a repeating unit represented by Chemical Formula 1 to Chemical Formula 3.
此外,本發明係關於一種利用光敏樹脂組合物製成具有圖案之濾色片。Further, the present invention relates to a color filter having a pattern formed using a photosensitive resin composition.
以下,將更詳細地描述本發明之內容。Hereinafter, the contents of the present invention will be described in more detail.
本發明之鹼溶性黏結劑用樹脂係包括如化學式1至化學式3所示之重複單元。The resin for an alkali-soluble binder of the present invention includes a repeating unit represented by Chemical Formula 1 to Chemical Formula 3.
於化學式1中,X1
係選自氫、一具有1至3之一碳數之烷基、及一烷氧基;且A係為一種或以上選自下列之基團:一苄基氧基羰基基團(benzyl oxy carbonyl group)、苯基(phenyl group)、一異冰片基(isobornyl group)、一環己基(cyclohexyl group)、及一N-苯基馬來醯亞胺基(N-phenyl maleimide group);
於化學式2中,X1
及X2
係為互相相同或不同之基團,且每一基團係選自氫、一具有1至3之一碳數之烷基、及一烷
氧基;Y係選自由下列所組成之群組:一具有1至5之一碳數之亞烷基(alkylene)、環氧乙烷、及環氧丙烷;且n係為1至10;
於化學式3中,X1 及X2 係為互相相同或不同之基團,且每一基團係選自氫、一具有1至3個碳數之烷基、及一烷氧基;Y係選自由下列所組成之群組:一具有1至5個碳數之亞烷基(alkylene)、環氧乙烷、及環氧丙烷;Z係選自一具有1至5個碳數之亞烷基、一環己烯、一環己烷、及一苯基團;且n係為1至10。In Chemical Formula 3, X 1 and X 2 are groups which are the same or different from each other, and each group is selected from hydrogen, an alkyl group having 1 to 3 carbon atoms, and a alkoxy group; Y system Selected from the group consisting of: an alkylene having from 1 to 5 carbon atoms, ethylene oxide, and propylene oxide; and Z being selected from an alkylene having from 1 to 5 carbon atoms. a group, a cyclohexene, a cyclohexane, and a monophenyl group; and n is from 1 to 10.
包含如化學式1至化學式3所示之重複單元的鹼溶性黏結劑用樹脂亦可由下列化學式4表示。The resin for an alkali-soluble binder containing a repeating unit represented by Chemical Formula 1 to Chemical Formula 3 can also be represented by the following Chemical Formula 4.
於化學式4中,a、b和c係為各自重複單元之莫耳比,每一莫耳比係為10至90,且該些莫耳比之總合係為100莫耳比;X1 及X2 係為互相相同或不同之基團,且每一基團係選自氫、一具有1至3之一碳數之烷基、及一烷氧基;A係選自一苄基氧基羰基基團、一苯基、一異冰片基、一環己基、及一N-苯基馬來醯亞胺基;Y係選自具下列所組成之群組:一具有1至5之一碳數之亞烷基、環氧乙烷、及環氧丙烷;且Z係選自一具有1至5之一碳數之亞烷基、環己烯、環己烷、及苯基;且n係為1至10。In Chemical Formula 4, a, b, and c are the molar ratios of the respective repeating units, each molar ratio is 10 to 90, and the total molar ratio of the molar ratios is 100 mole ratio; X 1 and X 2 is a group which is the same or different from each other, and each group is selected from hydrogen, an alkyl group having a carbon number of 1 to 3, and a alkoxy group; and A is selected from a benzyloxy group. a carbonyl group, a phenyl group, an isobornyl group, a cyclohexyl group, and an N-phenylmaleimido group; the Y group is selected from the group consisting of: one having a carbon number of 1 to 5 An alkylene group, an ethylene oxide, and a propylene oxide; and the Z system is selected from the group consisting of an alkylene group having 1 to 5 carbon atoms, cyclohexene, cyclohexane, and phenyl; 1 to 10.
於本發明之鹼溶性黏結劑用樹脂的組成成分中如化學式4所示之重複單元a可包含一種或以上如化學式1所示之重複單元。The repeating unit a as shown in Chemical Formula 4 in the composition of the resin for an alkali-soluble binder of the present invention may contain one or more repeating units as shown in Chemical Formula 1.
例如,具有一定比例的苄基氧基羰基基團、N-苯基馬來醯亞胺基和苯基可作為化學式4中A所示之化合物。當X1 皆為氫,Y為亞甲基,Z為環己烯,且n為2.5時,可獲得下列化學式5之化合物。For example, a certain proportion of a benzyloxycarbonyl group, an N-phenylmaleimido group, and a phenyl group can be used as the compound represented by A in Chemical Formula 4. When X 1 is hydrogen, Y is a methylene group, Z is cyclohexene, and n is 2.5, a compound of the following chemical formula 5 can be obtained.
於化學式5中,a1 至a3 、b及c為各自重複單元之莫耳比,a1 +a2 +a3 =10至90莫耳比,b=10至90莫耳比,c=10至90莫耳比,並且其總和為100莫耳比。In Chemical Formula 5, a 1 to a 3 , b and c are the molar ratios of the respective repeating units, a 1 + a 2 + a 3 = 10 to 90 mol ratio, b = 10 to 90 mol ratio, c = 10 to 90 mole ratios, and the sum is 100 mole ratio.
具有如化學式1所示之重複單元的化合物之具體實例可包括一種或以上選自下列之化合物:苯乙烯(styrene)、甲基丙烯酸苄酯(benzyl(meth)acrylate)、甲基丙烯酸甲酯(methyl(meth)acrylate)、甲基丙烯酸乙酯(ethyl(meth)acrylate)、甲基丙烯酸異丁酯(isobutyl(meth)acrylate)、甲基丙烯酸丁酯(t-butyl(meth)acrylate)、甲基丙烯酸環己酯(cyclohexyl(meth)acrylate)、及甲基丙烯酸異冰片酯(isobornyl group(meth)acrylate)。Specific examples of the compound having a repeating unit represented by Chemical Formula 1 may include one or more compounds selected from the group consisting of styrene, benzyl (meth)acrylate, and methyl methacrylate ( Methyl(meth)acrylate), ethyl(meth)acrylate,isobutyl(meth)acrylate,t-butyl(meth)acrylate,A Cyclohexyl (meth) acrylate, and isobornyl group (meth) acrylate.
如化學式1所示之重複單元可改善與鹼溶性樹脂中其他的組成成分之相容性,並且具有提升塗佈特性和耐化學性之功效。因此,將依據其特性選擇適當的莫耳比,較佳為100莫耳比的鹼溶性黏結劑用樹脂中,每一重複單元之莫耳比係介於10至90莫耳比之範圍內。The repeating unit as shown in Chemical Formula 1 can improve the compatibility with other constituents in the alkali-soluble resin, and has an effect of improving coating properties and chemical resistance. Therefore, it is preferable to select an appropriate molar ratio according to the characteristics thereof, preferably a resin having an alkali-soluble binder of 100 mol ratio, and the molar ratio of each repeating unit is in the range of 10 to 90 mol ratio.
此外,透過下列化學式7所示之羧酸化合物與一聚合物進行聚合反應,可製備具有化學式2所示之重複單元的化合物,其中該聚合物係由化學式1所示之化合物及化學式6所示之含環氧基化合物之反應所形成。亦即,具有如化學式2所示之重複單元的化合物,係透過化學式7所示之化合物與化學式6所示之一種透過聚合物反應所形成之含環氧基化合物,進行反應所製得之化合物。Further, a compound having a repeating unit represented by Chemical Formula 2, wherein the polymer is represented by the compound of Chemical Formula 1 and Chemical Formula 6, can be produced by a polymerization reaction of a carboxylic acid compound represented by the following Chemical Formula 7 with a polymer. The reaction of the epoxy group-containing compound is formed. That is, the compound having a repeating unit represented by Chemical Formula 2 is a compound obtained by reacting an epoxy group-containing compound formed by reacting a compound represented by Chemical Formula 7 with a permeating polymer represented by Chemical Formula 6 to carry out a reaction. .
[化學式6][Chemical Formula 6]
於化學式6中,X1 係選自氫、一具有1至3之一碳數之烷基、及一烷氧基;Y係選自由下列所組成之群組:一具有1至5個碳數之亞烷基(alkylene)、環氧乙烷、及環氧丙烷;In Chemical Formula 6, X 1 is selected from the group consisting of hydrogen, an alkyl group having a carbon number of 1 to 3, and a monooxy group; Y is selected from the group consisting of: 1 to 5 carbon atoms An alkylene, an ethylene oxide, and a propylene oxide;
於化學式7中,X2 係選自氫、一具有1至3之一碳數之烷基、及一烷氧基;且n係為1至10。In Chemical Formula 7, X 2 is selected from the group consisting of hydrogen, an alkyl group having a carbon number of 1 to 3, and a monooxy group; and n is 1 to 10.
如化學式6所示之含環氧基之化合物是用以將具有長烷鏈的羧酸化合物引入鹼溶性黏結劑用樹脂。於此,最佳可使用甲基丙烯酸環氧丙酯(Glycidyl(meth)acrylate)。然而,任何一種包含可與羧酸化合物反應之環氧基的單體(如化學式7所示),以及引入本發明中製備鹼溶性樹脂的第二合成步驟中的單體,均可作為含有環氧基基團之化合物。The epoxy group-containing compound represented by Chemical Formula 6 is a resin for introducing a carboxylic acid compound having a long alkyl chain into an alkali-soluble binder. Here, Glycidyl (meth) acrylate can be preferably used. However, any monomer containing an epoxy group reactive with a carboxylic acid compound (as shown in Chemical Formula 7), and a monomer introduced in the second synthesis step of preparing an alkali-soluble resin in the present invention may be used as a ring-containing ring. A compound of an oxy group.
尤其,由構成如化學式2所示之重複單元的組成成分中,本發明的鹼溶性黏結劑用樹脂包括具有長烷鏈的羧酸化合物,其係如化學式7所示之化合物。其目的在於透過引入羧酸化合物中的長烷鏈改善黏結劑樹脂的柔韌性,進而改善溶劑之溶解性。In particular, among the constituent components constituting the repeating unit represented by Chemical Formula 2, the resin for an alkali-soluble binder of the present invention includes a carboxylic acid compound having a long alkyl chain which is a compound represented by Chemical Formula 7. The purpose is to improve the flexibility of the binder resin by introducing a long alkyl chain in the carboxylic acid compound, thereby improving the solubility of the solvent.
亦即,如化學式7所示之化合物中,重複單元n係為1至10,較佳為1至5。即使n為1,當反應結束後從最終聚合物的整個結構來看時,該烷鏈仍具有極長的結構。因此,可以說相較於一般丙烯酸而言,該烷基鏈係相對較長並且具有較為顯著之功效。當烷鏈不包含於化學式7所示之化合物之例子中,於先前技術中使用丙烯酸時,難以改善鹼溶性黏結劑用樹脂的柔韌性。然而,如果該化合物的重複單元n超過10且太長時,雖然具有改善可溶解性之功效,但將導致感光度和圖案平直度等特性劣化之問題產生。That is, in the compound of Chemical Formula 7, the repeating unit n is from 1 to 10, preferably from 1 to 5. Even if n is 1, the alkyl chain still has an extremely long structure when viewed from the entire structure of the final polymer after completion of the reaction. Therefore, it can be said that the alkyl chain system is relatively long and has a remarkable effect as compared with general acrylic acid. When the alkyl chain is not contained in the example of the compound represented by Chemical Formula 7, when acrylic acid is used in the prior art, it is difficult to improve the flexibility of the resin for the alkali-soluble binder. However, if the repeating unit n of the compound exceeds 10 and is too long, although it has an effect of improving solubility, it causes problems such as deterioration in characteristics such as sensitivity and pattern flatness.
滿足上述特性之化合物,係如化學式7所示之羧酸化合物,其係包括一種或以上之化合物選自下列所組成之群組:琥珀酸2-丙烯醯基氧基乙酯(2-acryloyloxy ethyl succinate)、琥珀酸2-甲基丙烯醯基氧基乙酯(2-methacryloyloxy ethyl succinate)、六氫鄰苯二甲酸2-丙烯醯基氧基乙酯(2-acryloyloxy ethyl hexahydrophthalate)、鄰苯二甲酸2-丙烯醯基氧基乙酯(2-acryloyloxyethyl phthalate)、及ε-羧基聚己內酯單丙烯酸酯(ε-carboxy polycaprolactone monoacrylate)。其中,較佳為琥珀酸2-丙烯醯基氧基乙酯或ε-羧基聚己內酯單丙烯酸酯。A compound satisfying the above characteristics is a carboxylic acid compound represented by Chemical Formula 7, which comprises one or more compounds selected from the group consisting of 2-acryloyloxyethyl succinate Succinate), 2-methacryloyloxy ethyl succinate, 2-acryloyloxy ethyl hexahydrophthalate, phthalic acid 2-acryloyloxyethyl phthalate and ε-carboxy polycaprolactone monoacrylate. Among them, 2-propenyloxyethyl succinate or ε-carboxypolycaprolactone monoacrylate is preferred.
此外,透過控制加入如如化學式7所示之化合物的具有長烷基鏈的羧酸化合物的時間點,可調控本發明中最終黏結劑樹脂的結構和特性。於現有技術中由於具有較長烷基鏈的羧酸化合物在初始聚合物製備步驟的反應早期階段加入,所以透過追加反應獲得的黏結劑樹脂將具有不同的結構。Further, the structure and characteristics of the final binder resin in the present invention can be regulated by controlling the timing of the addition of the carboxylic acid compound having a long alkyl chain as the compound of Chemical Formula 7. In the prior art, since the carboxylic acid compound having a longer alkyl chain is added in the early stage of the reaction of the initial polymer preparation step, the binder resin obtained by the additional reaction will have a different structure.
本發明中具有長烷基鏈的羧酸化合物係不包含於初始聚合物製備步驟中,但會加入中間步驟中使聚合反應之後的聚合物鏈可有較長地延伸,進而提升該聚合物鏈的柔韌性。由於賦予柔韌性至聚合物鏈中,使其具有改善可溶解性之效果,於此,係透過控制加入具有長烷基鏈的羧酸化合物的時間點,使聚合物樹脂能夠具有不同之0結構,以達到上述之功效。The carboxylic acid compound having a long alkyl chain in the present invention is not included in the initial polymer preparation step, but is added to the intermediate step so that the polymer chain after the polymerization reaction can be extended for a long time, thereby lifting the polymer chain. Flexibility. Since it imparts flexibility to the polymer chain to have an effect of improving solubility, the polymer resin can have a different structure by controlling the time point of adding the carboxylic acid compound having a long alkyl chain. To achieve the above effects.
此外,具有如化學式2所示之重複單元的化合物,由於鏈中包含不飽和雙鍵,可使鹼溶性樹脂具備光致交聯性和耐化學性等優點。Further, the compound having a repeating unit represented by Chemical Formula 2 has an advantage that the alkali-soluble resin has photocrosslinkability and chemical resistance due to the inclusion of an unsaturated double bond in the chain.
此外,具有如化學式3所示之重複單元的化合物構成本發明的鹼溶性黏結劑用樹脂,係透過環酐與具有如化學式2所示之重複單元的化合物進行反應所製得。Further, the compound having a repeating unit represented by Chemical Formula 3 constitutes a resin for an alkali-soluble binder of the present invention, which is obtained by reacting a cyclic anhydride with a compound having a repeating unit represented by Chemical Formula 2.
亦即,將環酐加入至如化學式2所示之化合物中的羥基基團,以加入酸基團。其環酐係為一種或以上選自下列之化合物:琥珀酐、己二酸酐、鄰苯二甲酸酐、六氫鄰苯二甲酸酐、3,4,5,6-四氫鄰苯二甲酸酐、偏苯三酸酐和順式-5-降冰片烯-內-2,3-二羧酸酐。其中,較佳為使用琥珀酐或3,4,5,6-四氫鄰苯二甲酸酐。於此,由化學式3所示之重複單元所形成之酸基團,可使鹼溶性樹脂具備顯影之特性。That is, a cyclic anhydride is added to a hydroxyl group in the compound represented by Chemical Formula 2 to add an acid group. The cyclic anhydride is one or more compounds selected from the group consisting of succinic anhydride, adipic anhydride, phthalic anhydride, hexahydrophthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride And trimellitic anhydride and cis-5-norbornene-endo-2,3-dicarboxylic anhydride. Among them, succinic anhydride or 3,4,5,6-tetrahydrophthalic anhydride is preferably used. Here, the acid group formed by the repeating unit represented by Chemical Formula 3 can provide the alkali-soluble resin with the property of development.
於下,將具體描述本發明製備鹼溶性黏結劑用樹脂之方法。Hereinafter, a method of preparing a resin for an alkali-soluble binder of the present invention will be specifically described.
此方法包括下列步驟:a)聚合一含有環氧基之單體及一包含化學式1所示之重複單元之一化合物,以獲得一聚合物;b)聚合一羧酸化合物及該步驟a)中形成之聚合物;以及c)加入環酐,以加入一酸基至該步驟b)中形成之聚合物。The method comprises the steps of: a) polymerizing an epoxy group-containing monomer and a compound comprising a repeating unit of the formula 1 to obtain a polymer; b) polymerizing the monocarboxylic acid compound and the step a) Forming the polymer; and c) adding a cyclic anhydride to add an acid group to the polymer formed in step b).
步驟a)中化學式1所示之單體可為一種或以上選自下列的化合物:苯乙烯、甲基丙烯酸苄酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸異丁酯、甲基丙烯酸丁酯、甲基丙烯酸環己酯、及甲基丙烯酸異冰片酯。The monomer represented by the chemical formula 1 in the step a) may be one or more compounds selected from the group consisting of styrene, benzyl methacrylate, methyl methacrylate, ethyl methacrylate, isobutyl methacrylate, Butyl methacrylate, cyclohexyl methacrylate, and isobornyl methacrylate.
此外,步驟a)中含有環氧基基團的單體可為任何含有能與羧酸化合物反應的環氧基之單體,且該單體可如下列化學式6所示之單體。Further, the monomer having an epoxy group in the step a) may be any monomer having an epoxy group reactive with a carboxylic acid compound, and the monomer may be a monomer represented by the following Chemical Formula 6.
於化學式6中,X1 係選自氫、一具有1至3之一碳數之烷基、及一烷氧基;Y係選自由下列所組成之群組:一具有1至5個碳數之亞烷基(alkylene)、環氧乙烷、及環氧丙烷。In Chemical Formula 6, X 1 is selected from the group consisting of hydrogen, an alkyl group having a carbon number of 1 to 3, and a monooxy group; Y is selected from the group consisting of: 1 to 5 carbon atoms An alkylene, ethylene oxide, and propylene oxide.
如化學式6所示之含有環氧基基團的化合物是為了將具有長烷基鏈的羧酸化合物引入鹼溶性黏結劑用樹脂。最佳可使用甲基丙烯酸環氧丙酯。此外,亦可使用任何一種包含能與羧酸化合物反應的環氧基基團之單體(如化學式7所示),以及引入本發明中製備鹼溶性樹脂的第二合成步驟中的單體,均可作為含有環氧基基團之化合物。The epoxy group-containing compound represented by Chemical Formula 6 is for introducing a carboxylic acid compound having a long alkyl chain into a resin for an alkali-soluble binder. The best use of glycidyl methacrylate. Further, any monomer containing an epoxy group reactive with a carboxylic acid compound (as shown in Chemical Formula 7), and a monomer introduced in the second synthesis step of preparing an alkali-soluble resin in the present invention may be used. Both can be used as compounds containing an epoxy group.
此外,具有長烷基鏈之羧酸化合物可如下列化學式7表示。Further, the carboxylic acid compound having a long alkyl chain can be represented by the following Chemical Formula 7.
於化學式7中,X2 係選自氫、一具有1至3之一碳數之烷基、及一烷氧基;且n係為1至10。In Chemical Formula 7, X 2 is selected from the group consisting of hydrogen, an alkyl group having a carbon number of 1 to 3, and a monooxy group; and n is 1 to 10.
如化學式7所示之羧酸化合物可包含一種或以上選自下列所組成之群組:琥珀酸2-丙烯醯基氧基乙酯(2-acryloyloxy ethyl succinate)、琥珀酸2-甲基丙烯醯基氧基乙酯(2-methacryloyloxy ethyl succinate)、六氫鄰苯二甲酸2-丙烯醯基氧基乙酯(2-acryloyloxy ethyl hexahydrophthalate)、鄰苯二甲酸2-丙烯醯基氧基乙酯(2-acryloyloxyethyl phthalate)、及ε-羧基聚己內酯單丙烯酸酯(ε-carboxy polycaprolactone monoacrylate)。其中,較佳為琥珀酸2-丙烯醯基氧基乙酯或ε-羧基聚己內酯單丙烯酸酯。The carboxylic acid compound represented by Chemical Formula 7 may comprise one or more groups selected from the group consisting of 2-acryloyloxy ethyl succinate, 2-methyl propylene sulfonate succinate. 2-methacryloyloxy ethyl succinate, 2-acryloyloxy ethyl hexahydrophthalate, 2-propenyl methoxyethyl phthalate 2-acryloyloxyethyl phthalate) and ε-carboxy polycaprolactone monoacrylate. Among them, 2-propenyloxyethyl succinate or ε-carboxypolycaprolactone monoacrylate is preferred.
因此,化學式2所示之單體,可透過化學式7所示之羧酸化合物與化學式6所示之環氧化合物之反應獲得。該鹼溶性樹脂透過單體中的不飽和雙鍵,使其具備光致交聯性(photo-crosslinkability)和耐化學性特性。Therefore, the monomer represented by Chemical Formula 2 can be obtained by a reaction of a carboxylic acid compound represented by Chemical Formula 7 with an epoxy compound represented by Chemical Formula 6. The alkali-soluble resin transmits unsaturated double bonds in the monomer to impart photo-crosslinkability and chemical resistance.
此外,化學式3所示之單體可透過環酐與化學式2所示之單體以適當的比例進行反應而獲得,其中,該環酐較佳為琥珀酐或四氫鄰苯二甲酸酐。此時,鹼溶性樹脂透過所形成的酸基團而具有顯影特性。Further, the monomer represented by Chemical Formula 3 is obtained by reacting a cyclic anhydride with a monomer represented by Chemical Formula 2 in an appropriate ratio, and the cyclic anhydride is preferably succinic anhydride or tetrahydrophthalic anhydride. At this time, the alkali-soluble resin has a developing property by permeating the formed acid group.
本發明的鹼溶性樹脂可透過下列任何一種方法製備:自由基聚合反應、陽離子聚合反應、陰離子聚合反應及縮合聚合反應。然而,考慮到製備的容易程度和經濟性,較佳係使用自由基聚合反應製備。The alkali-soluble resin of the present invention can be produced by any of the following methods: radical polymerization, cationic polymerization, anionic polymerization, and condensation polymerization. However, in view of ease of preparation and economy, it is preferred to use a radical polymerization reaction.
當本發明的鹼溶性樹脂使用自由基聚合法製備時,可使用2,2’偶氮二異丁腈(AIBN)、2,2’-偶氮二-(2,4-二甲基戊腈)(2,2'-azobis-(2,4-dimethylvaleronitrile))或過氧化苯甲酰(2,2'-azobis-(2,4-dimethylvaleronitrile))等作為自由基聚合反應起始劑。When the alkali-soluble resin of the present invention is prepared by a radical polymerization method, 2,2' azobisisobutyronitrile (AIBN), 2,2'-azobis-(2,4-dimethylvaleronitrile) can be used. (2,2'-azobis-(2,4-dimethylvaleronitrile)) or benzoyl peroxide (2,2'-azobis-(2,4-dimethylvaleronitrile) or the like as a radical polymerization initiator.
此外,聚合小時數較佳為為1至48小時,聚合溫度較佳為50至150℃。Further, the polymerization hour is preferably from 1 to 48 hours, and the polymerization temperature is preferably from 50 to 150 °C.
使用上述模式製備鹼溶性樹脂較佳之酸值為30-200 KOH mg/g。當酸值小於30 KOH mg/g時,幾乎不產生顯影。當酸值大於200 KOH mg/g時,將會有顯影過度之問題產生。本發明中鹼溶性樹脂之重量平均分子量較佳為1,000-200,000 g/mol。當重量平均分子量小於1,000 g/mol時,幾乎不發生反應;當重量平均分子量大於200,000 g/mol時,則不能形成良好的細緻圖案。The alkali-soluble resin is preferably used in the above mode to have an acid value of from 30 to 200 KOH mg/g. When the acid value is less than 30 KOH mg/g, development hardly occurs. When the acid value is more than 200 KOH mg/g, there is a problem of overdevelopment. The weight average molecular weight of the alkali-soluble resin in the present invention is preferably from 1,000 to 200,000 g/mol. When the weight average molecular weight is less than 1,000 g/mol, almost no reaction occurs; when the weight average molecular weight is more than 200,000 g/mol, a good fine pattern cannot be formed.
本發明之光敏樹脂組合物可包括一種鹼溶性樹脂、一種具有乙烯型不飽和鍵的聚合型化合物、一種光起始劑、以及一種溶劑。The photosensitive resin composition of the present invention may comprise an alkali-soluble resin, a polymeric compound having an ethylenically unsaturated bond, a photoinitiator, and a solvent.
該具有乙烯型不飽和鍵的聚合型化合物之具體實例可包括下列之化合物:季戊四醇三(甲基)丙烯酸酯(pentaerythritol tri(meth)acrylate)、季戊四醇四(甲基)丙烯酸酯(pentaerythritol tetra(meth)acrylate)、二季戊四醇五(甲基)丙烯酸酯(dipentaerythritol penta(meth) acrylate)、二季戊四醇六(甲基)丙烯酸酯(dipentaerythritol hexa(meth)acrylate)、聚乙二醇單(甲基)丙烯酸酯(polyethyleneglycol mono(meth)acrylate)和聚丙二醇單(甲基)丙烯酸酯(polypropyleneglycol mono(meth)acrylate),但並非僅限於此。Specific examples of the polymerizable compound having an ethylenically unsaturated bond may include the following compounds: pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate (pentaerythritol tetra(meth) Acetate), dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, polyethylene glycol mono(meth)acrylate (polyethyleneglycol mono(meth)acrylate) and polypropylene glycol mono(meth)acrylate, but not limited thereto.
光起始劑可包含一種或以上選自下列之化合物:如2,4-三氯甲基-(4’-甲氧基苯基)-6-三嗪(2,4-trichloromethyl-(4'-methoxyphenyl)-6-triazine)、2,4-三氯甲基-(4’-甲氧基苯乙烯基)-6-三嗪(2,4-trichloromethyl-(4'-methoxystyryl)-6-triazine)、及2,4-三氯甲基-(芬普尼)-6-三嗪(2,4-trichloromethyl-(fipronil)-6-triazine)之三嗪化合物(triazine compound);苯乙酮基化合物,包括:1-羥基環己基苯基酮(1-hydroxycyclohexyl phenyl ketone)、及4-(2-羥基乙氧基)-苯基(2-羥基)丙基酮(4-(2-hydroxyethoxy)-phenyl(2-hydroxy)propyl ketone);以及苯甲醯苯基化合物(benzophenone-based compound),包括:苯甲醯苯(benzophenone)、及2,4,6-三甲基氨基二苯甲酮(2,4,6-trimethylaminobenzophenone),但並非僅限於此。The photoinitiator may comprise one or more compounds selected from the group consisting of 2,4-trichloromethyl-(4'-methoxyphenyl)-6-triazine (2,4-trichloromethyl-(4') -methoxyphenyl)-6-triazine), 2,4-trichloromethyl-(4'-methoxystyryl)-6-triazine (2,4-trichloromethyl-(4'-methoxystyryl)-6- Triazine), and 2,4-trichloromethyl-(fipronil-6-triazine) triazine compound; acetophenone Base compounds, including: 1-hydroxycyclohexyl phenyl ketone, and 4-(2-hydroxyethoxy)-phenyl(2-hydroxy)propyl ketone (4-(2-hydroxyethoxy) )-phenyl(2-hydroxy)propyl ketone); and benzophenone-based compounds, including: benzophenone, and 2,4,6-trimethylaminobiphenyl Ketone (2,4,6-trimethylaminobenzophenone), but not limited to this.
此外,該溶劑可包含一種或以上選自下列之化合物:甲基乙酮(methyl ethyl ketone)、丙二醇二乙醚(propylene glycol diethyl ether)、丙二醇單甲基醚乙酸酯(propylene glycol monomethyl ether acetate)、環己酮(cyclohexanone)、2-庚酮(2-heptanone)、乙酸異丁酯(isobutyl acetate)、丁酸異丙酯(isopropylbutyrate)、及乙酸3-甲氧基丁酯(3-methoxybutyl acetate),但並非僅限於此。Further, the solvent may comprise one or more compounds selected from the group consisting of methyl ethyl ketone, propylene glycol diethyl ether, propylene glycol monomethyl ether acetate. , cyclohexanone, 2-heptanone, isobutyl acetate, isopropylbutyrate, and 3-methoxybutyl acetate ), but not limited to this.
以光敏樹脂組合物之總重中,鹼溶性樹脂之含量可為1至20 wt%,具有乙烯型不飽和鍵的聚合型化合物之含量可為1至10 wt%,光起始劑之含量可為0.1至5 wt%,且該溶劑之含量可為65至95 wt%。The content of the alkali-soluble resin may be 1 to 20% by weight based on the total weight of the photosensitive resin composition, the content of the polymerizable compound having an ethylenically unsaturated bond may be 1 to 10% by weight, and the content of the photoinitiator may be It is 0.1 to 5 wt%, and the content of the solvent may be 65 to 95 wt%.
當光敏劑用於負型濾色片及黑色基體(black matrix)之實例中,更可包含一著色劑(colorant)。於此,作為著色劑之顏料可為一種或以上選自下列之種類:黑色顏料、紅色顏料、黃色顏料、藍色顏料、紫色顏料。黑色顏料包括炭黑和鈦黑。彩色颜料包括酞花青綠(phthalocyanine green)、酞花青藍(phthalocyanine blue)、苝藍(perylene blue)、雷奧諾黃(linol yellow)、及维多利亞纯藍(Victoria pure blue)。此外,於總體樹脂組合物中,著色劑之含量可包含1至20 wt%。When the photosensitizer is used in the example of a negative color filter and a black matrix, a colorant may be further included. Here, the pigment as the colorant may be one or more selected from the group consisting of black pigment, red pigment, yellow pigment, blue pigment, and violet pigment. Black pigments include carbon black and titanium black. Color pigments include phthalocyanine green, phthalocyanine blue, perylene blue, linol yellow, and Victoria pure blue. Further, the content of the colorant may be from 1 to 20% by weight in the total resin composition.
此後,將結合本發明之實施例更詳細地描述本發明之內容。然而,下列實施例僅用以示範說明本發明而已,並非意指本發明僅限於下列之實施例中。於本領域之技術人員可輕易地明白使用該實施例中所用具體物質以及其等同物質之情況下,均可達到與本發明相同之效果。Hereinafter, the contents of the present invention will be described in more detail in conjunction with the embodiments of the present invention. However, the following examples are merely illustrative of the invention and are not intended to limit the invention to the following examples. It will be readily apparent to those skilled in the art that the same effects as the present invention can be attained by using the specific materials used in the examples and equivalents thereof.
將32 g的甲基丙烯酸苄酯、5 g的N-苯基馬來醯亞胺、4 g的苯乙烯、36 g的甲基丙烯酸環氧丙酯、及2.5 g的十二烷硫醇與300 g的丙二醇單甲醚乙酸酯混合,並於氮氣氣氛下將反應器的溫度升到65℃。當該混合物的溫度達到65℃時,投入4 g的AIBN(即,熱聚合反應起始劑),並且持續攪拌12小時。待12小時後,即獲得一聚合產率為98%、分子量為10,000 g/mol、固體佔20%之聚合物樹脂黏結劑溶液。32 g of benzyl methacrylate, 5 g of N-phenyl maleimide, 4 g of styrene, 36 g of glycidyl methacrylate, and 2.5 g of dodecanethiol 300 g of propylene glycol monomethyl ether acetate was mixed, and the temperature of the reactor was raised to 65 ° C under a nitrogen atmosphere. When the temperature of the mixture reached 65 ° C, 4 g of AIBN (i.e., thermal polymerization initiator) was charged, and stirring was continued for 12 hours. After 12 hours, a polymer resin binder solution having a polymerization yield of 98%, a molecular weight of 10,000 g/mol, and a solid content of 20% was obtained.
將0.5 g的溴化四丁銨和0.1 g的MEHQ(即,熱聚合抑制劑)投入聚合物溶液中,並且持續於80℃下攪拌30分鐘。接著,投入40 g的琥珀酸2-丙烯醯氧基乙酯並且於120℃下持續攪拌24小時。待24小時後,即獲得一分子量為17,000 g/mol且固體佔30%之聚合物樹脂黏結劑溶液。0.5 g of tetrabutylammonium bromide and 0.1 g of MEHQ (i.e., thermal polymerization inhibitor) were charged into the polymer solution, and stirring was continued at 80 ° C for 30 minutes. Next, 40 g of 2-propenyloxyethyl succinate was charged and stirring was continued at 120 ° C for 24 hours. After 24 hours, a polymer resin binder solution having a molecular weight of 17,000 g/mol and a solid content of 30% was obtained.
於最終的合成步驟中,將20 g的四氫鄰苯二甲酸酐投入聚合物溶液中,並且於90℃下持續攪拌15小時。據此,即獲得一預期之鹼溶性樹脂溶液(1),其分子量為25,000 g/mol、酸值為100、且固體係佔35%。In the final synthesis step, 20 g of tetrahydrophthalic anhydride was charged into the polymer solution and stirring was continued at 90 ° C for 15 hours. According to this, a desired alkali-soluble resin solution (1) having a molecular weight of 25,000 g/mol, an acid value of 100, and a solid system of 35% was obtained.
將32 g的甲基丙烯酸苄酯、5 g的N-苯基馬來醯亞胺、4 g的苯乙烯、36 g的甲基丙烯酸環氧丙酯、及2.5 g的十二烷硫醇與300 g的丙二醇單甲醚乙酸酯混合,並於氮氣氣氛下將反應器的溫度升到65℃。當該混合物的溫度達到65℃時,投入4 g的AIBN(即,熱聚合反應起始劑),並且持續攪拌12小時。待12小時後,即獲得一聚合產率為98%、分子量為10,000 g/mol、固體佔20%之聚合物樹脂黏結劑溶液。32 g of benzyl methacrylate, 5 g of N-phenyl maleimide, 4 g of styrene, 36 g of glycidyl methacrylate, and 2.5 g of dodecanethiol 300 g of propylene glycol monomethyl ether acetate was mixed, and the temperature of the reactor was raised to 65 ° C under a nitrogen atmosphere. When the temperature of the mixture reached 65 ° C, 4 g of AIBN (i.e., thermal polymerization initiator) was charged, and stirring was continued for 12 hours. After 12 hours, a polymer resin binder solution having a polymerization yield of 98%, a molecular weight of 10,000 g/mol, and a solid content of 20% was obtained.
將0.5 g的溴化四丁銨和0.1 g的MEHQ(即,熱聚合抑制劑)投入該聚合物溶液中,並且持續於80℃下攪拌30分鐘。接著,投入65 g的ε-羧基聚己內酯單丙烯酸酯,並且於120℃下持續攪拌24小時。待24小時後,即獲得一分子量為19,000 g/mol且固體佔32%之聚合物樹脂黏結劑溶液。0.5 g of tetrabutylammonium bromide and 0.1 g of MEHQ (i.e., a thermal polymerization inhibitor) were charged into the polymer solution, and stirring was continued at 80 ° C for 30 minutes. Next, 65 g of ε-carboxypolycaprolactone monoacrylate was charged, and stirring was continued at 120 ° C for 24 hours. After 24 hours, a polymer resin binder solution having a molecular weight of 19,000 g/mol and a solid content of 32% was obtained.
於最終的合成步驟中,將28 g的四氫鄰苯二甲酸酐投入該聚合物溶液中,並且於90℃下持續攪拌15小時。據此,即獲得一預期之鹼溶性樹脂溶液(2),其分子量為27,000 g/mol、酸值為100、且固體係佔37%。In the final synthesis step, 28 g of tetrahydrophthalic anhydride was charged into the polymer solution and stirring was continued at 90 ° C for 15 hours. According to this, a desired alkali-soluble resin solution (2) having a molecular weight of 27,000 g/mol, an acid value of 100, and a solid system of 37% was obtained.
將32 g的甲基丙烯酸苄酯、5 g的N-苯基馬來醯亞胺、4 g的苯乙烯、36 g的甲基丙烯酸環氧丙酯、及2.5 g的十二烷硫醇與300 g的丙二醇單甲醚乙酸酯混合,並於氮氣氣氛下將反應器的溫度升到65℃。當該混合物的溫度達到65℃時,投入4 g的AIBN(即,熱聚合反應起始劑),並且持續攪拌12小時。待12小時後,即獲得一聚合產率為98%、分子量為10,000 g/mol、固體佔20%之聚合物樹脂黏結劑溶液。32 g of benzyl methacrylate, 5 g of N-phenyl maleimide, 4 g of styrene, 36 g of glycidyl methacrylate, and 2.5 g of dodecanethiol 300 g of propylene glycol monomethyl ether acetate was mixed, and the temperature of the reactor was raised to 65 ° C under a nitrogen atmosphere. When the temperature of the mixture reached 65 ° C, 4 g of AIBN (i.e., thermal polymerization initiator) was charged, and stirring was continued for 12 hours. After 12 hours, a polymer resin binder solution having a polymerization yield of 98%, a molecular weight of 10,000 g/mol, and a solid content of 20% was obtained.
將0.5 g的溴化四丁錠和0.1 g的MEHQ(即,熱聚合抑制劑)投入聚合物溶液中,並且於80℃下持續攪拌30分鐘。接著,投入20 g的丙烯酸並且於120℃下持續攪拌24小時。待24小時後,即獲得一種聚合物樹脂黏結劑溶液,其分子量為15,000 g/mol,且固體係佔28%。0.5 g of tetrabutylammonium bromide and 0.1 g of MEHQ (i.e., thermal polymerization inhibitor) were placed in the polymer solution, and stirring was continued at 80 ° C for 30 minutes. Next, 20 g of acrylic acid was charged and stirring was continued at 120 ° C for 24 hours. After 24 hours, a polymer resin binder solution having a molecular weight of 15,000 g/mol and a solid system of 28% was obtained.
於最終的合成步驟中,係將15 g的四氫鄰苯二甲酸酐投入該聚合物溶液中,並且於90℃下持續攪拌15小時。據此,即獲得一預期之鹼溶性樹脂溶液(3),其分子量為23,000 g/mol、酸值為100、且固體係佔33%。In the final synthesis step, 15 g of tetrahydrophthalic anhydride was charged into the polymer solution and stirring was continued at 90 ° C for 15 hours. According to this, a desired alkali-soluble resin solution (3) having a molecular weight of 23,000 g/mol, an acid value of 100, and a solid system of 33% was obtained.
將5 g的合成實施例1中所形成的鹼溶性樹脂(1)與30 g的綠色顏料分散體、1.5 g的光起始劑I-369、0.5 g的光起始劑CGI-242、3.5 g的二季戊四醇六丙烯酸酯、40 g的丙二醇單甲醚乙酸酯和0.1 g的2-甲基丙烯酸酯氧丙基三甲氧基矽烷(2-methacrylate oxypropyl trimethoxysilane)(即,添加劑)混合攪拌約1小時,以製得一種光敏樹脂組合物。5 g of the alkali-soluble resin (1) formed in Synthesis Example 1 and 30 g of a green pigment dispersion, 1.5 g of a photoinitiator I-369, 0.5 g of a photoinitiator CGI-242, 3.5 G of dipentaerythritol hexaacrylate, 40 g of propylene glycol monomethyl ether acetate and 0.1 g of 2-methacrylate oxypropyl trimethoxysilane (ie, an additive) are mixed and stirred. One hour was made to prepare a photosensitive resin composition.
除了使用5 g的合成實施例2中所形成的鹼溶性樹脂(2)取代實施例1中的鹼溶性樹脂(1)外,係使用如實施例1相同之組成進行混合,並且攪拌約1小時以製得一種光敏樹脂組合物。The mixture was mixed using the same composition as in Example 1 except that 5 g of the alkali-soluble resin (2) formed in Synthesis Example 2 was used instead of the alkali-soluble resin (1) in Example 1, and stirred for about 1 hour. To prepare a photosensitive resin composition.
除了使用5 g的合成比較例1中所形成的鹼溶性樹脂(3)取代實施例1中的鹼溶性樹脂(1之外,係使用如實施例1相同之組成來進行混合,並且攪拌約1小時以製得一種光敏樹脂組合物。The mixture was mixed using the same composition as in Example 1 except that the alkali-soluble resin (3) formed in Synthesis Comparative Example 1 was replaced with 5 g of the alkali-soluble resin (3) of Example 1, and stirred for about 1 An hour was made to prepare a photosensitive resin composition.
將實施例1、實施例2和比較例1中所製備之各個光敏樹脂組合物溶液旋轉塗佈於玻璃基板上,然後於90℃下預烘處理100秒,以製備具有1.5 μm厚的導電薄膜。將該薄膜置於200 μm之曝光間隙的光罩下,以60 mJ/cm2 的能量之高壓汞燈進行曝光後,在25℃下使用0.04%的KOH水溶液顯影基板60秒。接著,於顯影步驟後,進行清洗和乾燥步驟,並於230℃的對流傳熱爐中後烘25分鐘。之後,監測圖案之型態(pattern state)。Each photosensitive resin composition solution prepared in Example 1, Example 2, and Comparative Example 1 was spin-coated on a glass substrate, and then pre-baked at 90 ° C for 100 seconds to prepare a conductive film having a thickness of 1.5 μm. . The film was placed under a mask of an exposure gap of 200 μm, exposed to a high-pressure mercury lamp of 60 mJ/cm 2 , and the substrate was developed using a 0.04% KOH aqueous solution at 25 ° C for 60 seconds. Next, after the development step, the washing and drying steps were carried out and post-baked in a convection heat transfer furnace at 230 ° C for 25 minutes. Thereafter, the pattern state of the pattern is monitored.
使用光學顯微鏡對上述各種圖案型態進行監測。對圖案的顯影特性、感光度和耐NMP溶液化學性進行評估,其評估與比較結果係如下表1所示。The various pattern patterns described above were monitored using an optical microscope. The development characteristics, sensitivity, and chemical resistance of the NMP solution of the pattern were evaluated, and the evaluation and comparison results are shown in Table 1 below.
顯影特性係透過監測曝光的基板經60秒在0.04%的KOH水溶液顯影的過程而進行測量。顯影特性係於顯影以多快的速度到達該基板邊緣部分來判斷。當顯影步驟可明顯進行時,判定為合格。The development characteristics were measured by monitoring the progress of the exposed substrate through development of 0.04% KOH aqueous solution for 60 seconds. The development characteristics are judged by how fast the development reaches the edge portion of the substrate. When the development step can be made apparent, it is judged to be acceptable.
感光度係透過用光學顯微鏡監測各個最終圖案型態來測量殘存的最小圖案尺寸所獲得。殘存的最小圖案尺寸越小,其感光度越好。Sensitivity is obtained by measuring each final pattern pattern with an optical microscope to measure the remaining minimum pattern size. The smaller the remaining minimum pattern size, the better the sensitivity.
此外,透過將實施例和比較例中獲得的各基板在45℃下浸漬於一種NMP溶液30分鐘後,監測塗膜的外觀變化以測量其耐化學性質。當外觀沒有變化時,標記為良好(○)。當觀察到外觀有稍微變化時,標記為一般(△)。當外觀剝落或溶劑顏色劣化時,標記為不合格(X)。Further, after immersing each of the substrates obtained in the examples and the comparative examples in an NMP solution at 45 ° C for 30 minutes, the change in appearance of the coating film was monitored to measure the chemical resistance thereof. Marked as good (○) when there is no change in appearance. When a slight change in appearance is observed, the mark is normal (Δ). When the appearance is peeled off or the solvent color is deteriorated, it is marked as unacceptable (X).
將實施例1、實施例2和比較例1中所製備之各個光敏樹脂組合物溶液分別旋轉塗佈於玻璃基板上,然後在80℃下預烘處理300秒。接著,將該基板在25℃下於PGMEA溶液中浸漬5分鐘,然後從PGMEA溶液中取出。之後,透過監測溶液狀態而測得可溶解性。可溶解性的評價結果係列於表1中。當經預烘處理的導電薄膜明顯熔化於PGMEA溶液中時,標記為良好(○)。當經預烘處理的導電薄膜僅部分熔化於PGMEA溶液中並且出現一些沈澱時,標記為一般(△)。當經預烘處理的導電薄膜沒有熔化於PGMEA溶液中或出現許多沈澱時,標記為不合格(X)。此外,溶液狀態係如圖1至圖3中所示。Each of the photosensitive resin composition solutions prepared in Example 1, Example 2, and Comparative Example 1 was spin-coated on a glass substrate, respectively, and then prebaked at 80 ° C for 300 seconds. Next, the substrate was immersed in a PGMEA solution at 25 ° C for 5 minutes and then taken out from the PGMEA solution. Thereafter, the solubility was measured by monitoring the state of the solution. The evaluation results of the solubility are shown in Table 1. When the prebaked conductive film was apparently melted in the PGMEA solution, it was marked as good (○). When the prebaked conductive film is only partially melted in the PGMEA solution and some precipitation occurs, it is marked as normal (?). When the prebaked conductive film was not melted in the PGMEA solution or many precipitates appeared, it was marked as unacceptable (X). Further, the solution state is as shown in FIGS. 1 to 3.
由上表1可知,本發明的鹼溶性樹脂聚合物具有與現有的鹼溶性樹脂相同水準的顯影特性、耐化學性和感光度,但因其具備絕佳的溶劑溶解度,使其能有效地提升光敏樹脂組合物的可溶解性。As apparent from the above Table 1, the alkali-soluble resin polymer of the present invention has the same development characteristics, chemical resistance and sensitivity as the conventional alkali-soluble resin, but it has an excellent solvent solubility, so that it can be effectively improved. The solubility of the photosensitive resin composition.
尤其,於圖1至圖3中,合成比較例1(圖3)係為一種包含的羧酸的烷基鏈不長之結構的鹼溶性黏結劑用樹脂,與本發明中含具有長烷鏈的羧酸之鹼溶性黏結劑用樹脂(圖1及圖2)相比,該樹脂不能具備良好的柔韌性。因此,顯示出樹脂的溶解性很低。In particular, in FIGS. 1 to 3, Synthesis Comparative Example 1 (FIG. 3) is a resin for an alkali-soluble binder containing a structure in which an alkyl chain of a carboxylic acid is not long, and a long alkyl chain is contained in the present invention. The resin of the carboxylic acid-based alkali-soluble binder cannot have good flexibility compared with the resin (Figs. 1 and 2). Therefore, it is shown that the solubility of the resin is low.
圖1至圖3係為實施例1、實施例2和比較例1中組合物的可溶解性評量結果。1 to 3 are the results of the solubility evaluation of the compositions of Example 1, Example 2 and Comparative Example 1.
Claims (8)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020100033743A KR101048328B1 (en) | 2010-04-13 | 2010-04-13 | Alkali soluble binder resin having good resolubility and photoresist resin composition comprising the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201135364A TW201135364A (en) | 2011-10-16 |
TWI450034B true TWI450034B (en) | 2014-08-21 |
Family
ID=44743724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100112777A TWI450034B (en) | 2010-04-13 | 2011-04-13 | Alkali soluble binder resin and photosensitive resin composition including the same |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5510933B2 (en) |
KR (1) | KR101048328B1 (en) |
CN (1) | CN102212165B (en) |
TW (1) | TWI450034B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW202112842A (en) * | 2019-07-30 | 2021-04-01 | 日商富士軟片股份有限公司 | Colored resin composition, film, color filter, solid-state image pickup element, and image display device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008088394A (en) * | 2006-09-07 | 2008-04-17 | Showa Highpolymer Co Ltd | Alkali-developable photosensitive resin and photosensitive resin composition comprising the same |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3006253B2 (en) * | 1992-01-29 | 2000-02-07 | 日立化成工業株式会社 | Photosensitive resin composition, photosensitive element using the same, and method for producing plating resist |
JPH09185166A (en) * | 1995-12-28 | 1997-07-15 | Taiyo Ink Mfg Ltd | Photosensitive prepolymer and photosetting and thermosetting soldering resist ink composition using the same |
JP3634141B2 (en) * | 1998-03-02 | 2005-03-30 | 太陽インキ製造株式会社 | Photosensitive composition and fired product pattern obtained using the same |
CN1151192C (en) * | 1999-12-01 | 2004-05-26 | 大东树脂化学股份有限公司 | Polycarboxylic acid resin containing unsaturated double bond and its preparation and use |
KR100996591B1 (en) * | 2006-12-26 | 2010-11-25 | 주식회사 엘지화학 | Black matrix high sensitive photoresist composition for liquid crystal display and black matrix prepared by using the same |
KR101086951B1 (en) * | 2007-01-15 | 2011-11-24 | 주식회사 엘지화학 | New polymer resin compounds and photoresist composition including new polymer resin compounds |
JP2008189792A (en) | 2007-02-05 | 2008-08-21 | Fujifilm Corp | Pigment dispersion composition, curable composition, color filter and its manufacturing method |
US8084545B2 (en) * | 2007-05-11 | 2011-12-27 | Daicel Chemical Industries, Ltd. | Photo- and/or thermo-curable copolymer, curable resin compositions, and cured articles |
JP2009256572A (en) | 2008-03-17 | 2009-11-05 | Fujifilm Corp | Pigment dispersion composition, colored photosensitive composition, color filter, liquid crystal display element, and solid imaging device |
JP5241283B2 (en) | 2008-03-24 | 2013-07-17 | 富士フイルム株式会社 | Pigment dispersion composition, photocurable composition, color filter, liquid crystal display device, and solid-state imaging device |
-
2010
- 2010-04-13 KR KR1020100033743A patent/KR101048328B1/en active IP Right Grant
-
2011
- 2011-04-12 JP JP2011088322A patent/JP5510933B2/en active Active
- 2011-04-13 TW TW100112777A patent/TWI450034B/en active
- 2011-04-13 CN CN201110092982.8A patent/CN102212165B/en active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008088394A (en) * | 2006-09-07 | 2008-04-17 | Showa Highpolymer Co Ltd | Alkali-developable photosensitive resin and photosensitive resin composition comprising the same |
Also Published As
Publication number | Publication date |
---|---|
JP5510933B2 (en) | 2014-06-04 |
TW201135364A (en) | 2011-10-16 |
CN102212165A (en) | 2011-10-12 |
CN102212165B (en) | 2015-04-15 |
KR101048328B1 (en) | 2011-07-14 |
JP2011219759A (en) | 2011-11-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI376571B (en) | Photo-sensitive resin composition for black matrix, black matrix produced by the composition and liquid crystal display including the black matrix | |
US8252879B2 (en) | Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition | |
JP2013114184A (en) | Colored resin composition, color filter, and liquid crystal display device | |
CN105319849A (en) | Photosensitive composition for forming shading board, shading board and display device | |
JPWO2009047949A1 (en) | Photosensitive graft polymer and photosensitive resin composition containing the same | |
JP5384914B2 (en) | Photosensitive resin, method for producing the same, and photosensitive resin composition | |
KR101279614B1 (en) | Alkali soluble resin polymer with fluorene group, method of manufacturing the polymer and negative photosensitive resin composition including the polymer | |
WO2008056750A1 (en) | Photosensitive resin composition | |
TW200902564A (en) | Crosslinking polymeric compound and photosensitive resin composition containg such crosslinking polymeric compound | |
WO2013018987A1 (en) | Polymer compound comprising dye and curable resin composition comprising same | |
JP6634313B2 (en) | Photosensitive resin composition, photocurable pattern formed therefrom, and image display device having the same | |
KR101756507B1 (en) | Method for producing photosensitive resin, and color filter | |
KR101279613B1 (en) | Alkali developable resins and photosensitive composition comprising the same | |
TWI452427B (en) | A photosensitive resin and a photosensitive resin composition using the same | |
CN103019031A (en) | A photosensitive resin composition, and a coating film and color filter using the composition | |
KR101115057B1 (en) | Alkali developable resins and photosensitive composition comprising the same | |
TWI450034B (en) | Alkali soluble binder resin and photosensitive resin composition including the same | |
JPWO2016203905A1 (en) | Coloring composition for color filter, color filter and image display element | |
JPWO2019142415A1 (en) | Manufacturing method of photosensitive resin composition for color filter, color filter, image display element and color filter | |
TW202235514A (en) | Pigment dispersion composition and photosensitive coloring composition | |
KR101373990B1 (en) | Alkali soluble resin polymer comprising fluorene group, method for preparing the same and photo-sensitive resin composition comprising the polymer | |
JP2018173474A (en) | Photosensitive resin composition, and method for producing copolymer | |
US7090962B2 (en) | Alkali-soluble resin with polyaromatic group and photosensitive composition comprising the resin | |
KR101506752B1 (en) | Alkali soluble binder resin having enhanced resolubility and photoresist resin composition comprising the same | |
CN118131566A (en) | Colored photosensitive resin composition and preparation method and application thereof |