TWI433871B - Process for assembly of poss monomers - Google Patents

Process for assembly of poss monomers Download PDF

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TWI433871B
TWI433871B TW095107564A TW95107564A TWI433871B TW I433871 B TWI433871 B TW I433871B TW 095107564 A TW095107564 A TW 095107564A TW 95107564 A TW95107564 A TW 95107564A TW I433871 B TWI433871 B TW I433871B
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TW200702361A (en
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Joseph J Schwab
Yi-Zhong An
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Hybrid Plastics Inc
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/045Polysiloxanes containing less than 25 silicon atoms

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Description

用於組裝多面體矽氧烷寡聚物(POSS)單體之方法Method for assembling a polyhedral siloxane oligomer (POSS) monomer 相關申請案與專利之交互參照Cross-references between related applications and patents

本申請案以2005年3月7日提申之美國臨時專利申請案第60/659,722號,主張優先權。Priority is claimed on U.S. Provisional Patent Application Serial No. 60/659,722, which is incorporated herein by reference.

發明領域Field of invention

本發明一般係關於一種用於提升官能基化(functionalized)多面體矽氧烷寡聚物(POSS)單體之特性的製程,該等單體係用以合併成聚合性及生物性產物。The present invention generally relates to a process for enhancing the properties of functionalized polyhedral siloxane oligomers (POSS) monomers which are combined to form polymerizable and biological products.

發明背景Background of the invention

奈米結構化學物質之最佳範例係為那些墊基於低成本多面體矽氧烷寡聚物(Polyhedral Oligomeric Silsesquioxanes,POSS)及多面體矽酸鹽寡聚物(Polyhedral Oligomeric Silicates,POS)者。POSS系統含有混成(即,有機-無機)組成物,其中內部籠狀之骨架主要係由無機的矽-氧鍵構成。奈米結構外部係由反應性與非反應性的有機官能基團(functionalities)(R)兩者所遮蓋,其確保該奈米結構與有機單體及聚合體間的相容性與易裁性(tailorability)。這些及其他奈米結構化學物質的特性與特徵係詳細討論於美國專利第5,412,053號及美國專利第5,484,867號中,該兩專利係以其整體明確地併入於此以作為參考。The best examples of nanostructured chemicals are those based on Polyhedral Oligomeric Silsesquioxanes (POSS) and Polyhedral Oligomeric Silicates (POS). The POSS system contains a mixed (i.e., organic-inorganic) composition in which the inner cage-like skeleton is mainly composed of inorganic helium-oxygen bonds. The outer structure of the nanostructure is covered by both reactive and non-reactive organic functionalities (R), which ensure compatibility and susceptibility between the nanostructure and the organic monomer and polymer. (tailorability). The characteristics and characteristics of these and other nanostructured chemistries are discussed in detail in U.S. Patent No. 5,412,053, issued to U.S. Pat.

現行工程實務生產高產量之官能基化POSS分子,但某些微電子、醫學與生物學應用需要較高之純度,或需要一些使用習知技術無法容易或經濟地生產的化學官能基團。習知技術之方法包含使用氫氧鹼、陰離子鹽及質子酸催化劑於POSS籠之組裝及其官能基化作用(functionalization)(見美國專利申請案第09/631,892與10/186,318號及美國專利第6,770,724、6,660,823、6,596,821與3,390,163號)。雖然這些手段據悉一般係為有效的,其限制在於質子酸與氫氧鹼兩者亦能催化POSS個別籠之自身縮合成為含有樹脂的寡聚POSS籠(第1圖)。這類樹脂因其分子結構不精確,在微電子、生物學或醫學應用上係非所欲的。再者,POSS分子的分散及其與聚合物的相容性係熱力學性地由混合方程式(△G=△H-T△S)之自由能支配。R基團的本質及POSS籠上的反應性基團與聚合物及表面進行反應或交互作用的能力大大地促成有利的焓(△H)項,同時,當籠之大小為單像(monoscopic)且寡聚物的對應分佈為1.0時,POSS的熵(△S)項係高度地有利。Current engineering practices produce high yielding functionalized POSS molecules, but some microelectronic, medical, and biological applications require higher purity or require chemical functional groups that cannot be readily or economically produced using conventional techniques. The prior art method comprises the use of a hydroxide base, an anion salt and a protonic acid catalyst for the assembly of a POSS cage and its functionalization (see U.S. Patent Application Serial Nos. 09/631,892 and 10/186,318, and U.S. Patent No. 6,770,724, 6,660,823, 6,596,821 and 3,390,163). While these means are generally known to be effective, the limitation is that both protonic acid and oxyhydrogen base can catalyze the self-condensation of POSS individual cages into resin-containing oligomeric POSS cages (Fig. 1). Such resins are undesirably in microelectronic, biological or medical applications due to their inaccurate molecular structure. Furthermore, the dispersion of the POSS molecules and their compatibility with the polymer are thermodynamically governed by the free energy of the mixing equation (ΔG = ΔH - T ΔS). The nature of the R group and the ability of the reactive groups on the POSS cage to react or interact with the polymer and surface greatly contribute to the favorable enthalpy (ΔH) term, while the size of the cage is monoscopic and When the corresponding distribution of oligomers is 1.0, the entropy (ΔS) term of POSS is highly advantageous.

因此,在POSS籠組裝與官能基化單體之習知技術方法上,存在有改良的需要。一種產出較高純度且分子精確之POSS系統的改良製程係被描述。Therefore, there is a need for improvement in the prior art methods of assembling and functionalizing monomers in POSS cages. An improved process for producing a higher purity and molecularly accurate POSS system is described.

發明概要Summary of invention

本發明提供一種用於多面體矽氧烷寡聚物的改良合成製程,其快速地生產高產量、低樹脂含量及無溶劑的單體產物,該單體產物適合使用於聚合、接枝(grafting)及摻合(alloying)應用。該合成製程使用磷氮基超鹼與化學式為R1 SiX3 之矽烷偶合劑反應以形成POSS籠,該等POSS籠係被化學式類型為[(R1 SiO1 . 5 )7 (HOSiO1 . 5 )1 ]Σ 8 、[(R1 SiO1 . 5 )6 (R1 HOSiO1 )2 ]Σ 8 、[(R1 SiO1 . 5 )2 (R1 HOSiO1 )4 ]Σ 6 、[(R1 SiO1 . 5 )4 (R1 HOSiO1 )3 ]Σ 7 之矽醇所官能基化。該合成製程亦能涉及磷氮基超鹼與R2 SiX3 類型之矽烷偶合劑反應以形成多官能基的POSS籠的反應,該等POSS籠係被化學式類型為[(R2 SiO1 . 5 )6 ]Σ 6 、[(R2 SiO1 . 5 )8 ]Σ 8 、[(R2 SiO1 . 5 )1 0 ]Σ 1 0 、[(R2 SiO1 5 )1 2 ]Σ 1 2 之R2 基團所官能基化且籠之大小較大。The present invention provides an improved synthesis process for polyhedral siloxane oligomers which rapidly produces high yield, low resin content and solvent free monomeric products which are suitable for use in polymerization, grafting And alloying applications. The synthesis process using phosphorus-nitrogen-based ultra base with the formula R Silane coupling agent 1 SiX 3 reacted to form POSS cages, such POSS cage train is of the formula types [(R 1 SiO 1. 5 ) 7 (HOSiO 1. 5 ) 1 ] Σ 8 , [(R 1 SiO 1 . 5 ) 6 (R 1 HOSiO 1 ) 2 ] Σ 8 , [(R 1 SiO 1 . 5 ) 2 (R 1 HOSiO 1 ) 4 ] Σ 6 , [( The sterol of R 1 SiO 1 . 5 ) 4 (R 1 HOSiO 1 ) 3 ] Σ 7 is functionalized. The synthesis process can also involve phosphazene base superalloy base and R 2 SiX 3 types of silane-coupling agent to form a reaction POSS cage polyfunctional groups, such POSS cage train is of the formula types [(R 2 SiO 1. 5 6 ] Σ 6 , [(R 2 SiO 1 . 5 ) 8 ] Σ 8 , [(R 2 SiO 1 . 5 ) 1 0 ] Σ 1 0 , [(R 2 SiO 1 5 ) 1 2 ] Σ 1 2 The R 2 group is functionalized and the cage is large in size.

相互地,該等磷氮基超鹼在化學式為R2 R3 R4 SiX、R2 R3 SiX2 或R2 SiX3 之矽烷偶合劑的存在下可以與化學式為[(R1 SiO1 5 )7 (HOSiO1 . 5 )1 ]Σ 8 、[(R1 SiO1 . 5 )6 (R1 HOSiO1 )2 ]Σ 8 、[(R1 SiO1 . 5 )4 (R1 HOSiO1 )3 ]Σ 7 之POSS矽醇反應達充分時間,在溶劑及超鹼的存在下,HX之消去作用會發生,而分別地造成化學式為[(R1 SiO1 . 5 )8 (R2 R3 R4 SiO1 )]Σ 9 、[((R1 SiO1 . 5 )8 )2 (R2 R3 SiO2 )]Σ 1 7 、[((R1 SiO1 . 5 )8 )3 (R2 SiO3 )]Σ 2 5 、[(R1 SiO1 . 5 )6 (R1 SiO1 )2 (R2 R3 R4 SiO)2 ]Σ 1 0 、[(R1 SiO1 . 5 )6 (R1 SiO1 )2 (R2 R3 SiO2 )]Σ 9 、[(R1 SiO1 . 5 )6 (R1 HOSiO1 )1 (R2 R3 SiO)]Σ 8 、[(R1 SiO1 . 5 )6 (R1 (R2 R3 R4 SiO)SiO1 )(R2 R3 SiO)]Σ 9 、[(R1 SiO1 . 5 )4 (R1 (R2 R3 R4 SiO)SiO1 )3 ]Σ 1 0 、[(R1 SiO1 . 5 )7 (R2 SiO1 . 5 )1 ]Σ 8 之單官能基POSS單體。該產生的單體實質上係無不純物,且藉由組成物、R基團及奈米結構大小之選擇,具有可控制的特性及拓樸學。高度純化的奈米結構POSS單體係所欲的,因其相較於不純系統展現有改良的過濾能力、降低的污染及黏度、更確實的聚合作用、較低的成本及減少的廢棄物。Mutually, the phosphorus-nitrogen superbase can be combined with the chemical formula [(R 1 SiO 1 5) in the presence of a decane coupling agent of the formula R 2 R 3 R 4 SiX, R 2 R 3 SiX 2 or R 2 SiX 3 . 7 (HOSiO 1 . 5 ) 1 ] Σ 8 , [(R 1 SiO 1 . 5 ) 6 (R 1 HOSiO 1 ) 2 ] Σ 8 , [(R 1 SiO 1 . 5 ) 4 (R 1 HOSiO 1 ) 3 ] POS 7 POSS sterol reaction for a sufficient time, in the presence of solvent and superbase, the elimination of HX will occur, and the chemical formula is [(R 1 SiO 1 . 5 ) 8 (R 2 R 3 ) R 4 SiO 1 )] Σ 9 , [((R 1 SiO 1 . 5 ) 8 ) 2 (R 2 R 3 SiO 2 )] Σ 1 7 , [((R 1 SiO 1 . 5 ) 8 ) 3 (R 2 SiO 3)] Σ 2 5 , [(R 1 SiO 1. 5) 6 (R 1 SiO 1) 2 (R 2 R 3 R 4 SiO) 2] Σ 1 0, [(R 1 SiO 1. 5) 6 (R 1 SiO 1 ) 2 (R 2 R 3 SiO 2 )] Σ 9 , [(R 1 SiO 1 . 5 ) 6 (R 1 HOSiO 1 ) 1 (R 2 R 3 SiO)] Σ 8 , [( R 1 SiO 1 . 5 ) 6 (R 1 (R 2 R 3 R 4 SiO)SiO 1 )(R 2 R 3 SiO)] Σ 9 , [(R 1 SiO 1 . 5 ) 4 (R 1 (R 2 R 3 R 4 SiO) SiO 1 ) 3] Σ 1 0, [(R 1 SiO 1. 5) 7 (R 2 SiO 1. 5) 1] Σ 8 of monofunctional POSS monomer. The resulting monomer is substantially free of impurities and has controllable properties and topology by choice of composition, R groups, and nanostructure size. The highly purified nanostructure POSS single system is desirable because it exhibits improved filtration capacity, reduced contamination and viscosity, more reliable polymerization, lower cost, and reduced waste than impure systems.

一種較佳的製程涉及,在溶劑與超鹼的存在下,化學式為[(R1 SiO1 . 5 )7 (HOSiO1 . 5 )1 ]Σ 8 、[(R1 SiO1 . 5 )6 (R1 HOSiO1 )2 ]Σ 8 、[(R1 SiO1 . 5 )4 (R1 HOSiO1 )3 ]Σ 7 之POSS矽醇與化學式為R2 R3 R4 SiX,R2 R3 SiX2 ,R2 SiX3 之矽烷偶合劑的反應。A preferred process involves, in the presence of a solvent and Super base, the formula [(R 1 SiO 1. 5 ) 7 (HOSiO 1. 5) 1] Σ 8, [(R 1 SiO 1. 5) 6 ( R 1 HOSiO 1 ) 2 ] Σ 8 , [(R 1 SiO 1 . 5 ) 4 (R 1 HOSiO 1 ) 3 ] POS 7 POSS sterol and the chemical formula is R 2 R 3 R 4 SiX, R 2 R 3 SiX 2 , the reaction of R 2 SiX 3 decane coupling agent.

圖式簡單說明Simple illustration

第1圖顯示習知技術與改良的矽化製程的比較。Figure 1 shows a comparison of conventional techniques with an improved deuteration process.

第2圖顯示各種較佳的磷氮基超鹼;及第3圖顯示於實施例5中所合成之化合物的結構。Figure 2 shows various preferred phosphorus-nitrogen superbases; and Figure 3 shows the structure of the compounds synthesized in Example 5.

用於奈米結構之化學式表示的定義Definition of the chemical formula used for the nanostructure

為達成瞭解本發明之化學組成物的目的,多面體矽氧烷寡聚物(POSS)及多面體矽酸鹽寡聚物(POS)奈米結構之化學式表示的定義係制定如下。For the purpose of understanding the chemical composition of the present invention, the definitions of the chemical formulas of polyhedral siloxane oligomers (POSS) and polyhedral silicate oligomer (POS) nanostructures are formulated as follows.

聚矽氧烷係以化學式[RSiO1 . 5 ] 表示之物質,其中∞表示聚合之莫耳度(molar degree),R=表示有機取代基(H、矽烷氧基、環狀或線形脂族或芳香族基團,該等基團可能額外含有反應性官能基團,諸如,醇、酯、胺、酮、烯烴、醚或鹵化物或該等基團可能含有氟化的基團。聚矽氧烷可以是同取代基(homoleptic)或異取代基(heteroleptic)兩者任一。同取代基系統只含有一種類型的R基團,而異取代基系統含有多於一種類型的R基團。Silicon-based poly siloxane chemical formula [RSiO 1. 5] represents the substance, where ∞ represents molar degree of polymerization (molar degree), R = represents organic substituent (H, Si-alkoxy, cyclic or linear aliphatic Or an aromatic group, which may additionally contain reactive functional groups such as alcohols, esters, amines, ketones, olefins, ethers or halides or such groups may contain fluorinated groups. The oxane may be either a homoleptic or a heteroleptic. The same substituent system contains only one type of R group, while the hetero substituent system contains more than one type of R group.

POSS及POS奈米結構組成物係以化學式表示如下:[(RSiO1 . 5 )n ]Σ # 用於同取代基組成物;[(RSiO1 . 5 )n (R'SiO1 . 5 )m ]Σ # 用於異取代基組成物(其中R≠R');[(RSiO1 . 5 )n (RXSiO1 . 0 )m ]Σ # 用於官能基化的異取代基組成物(其中R基團可以是相等的或不相等的)。The POSS and POS nanostructures are represented by the chemical formula: [(RSiO 1 . 5 ) n ] Σ # for the same substituent composition; [(RSiO 1 . 5 ) n (R'SiO 1 . 5 ) m ] Σ # for hetero-substituent composition (where R ≠ R'); [(RSiO 1 . 5 ) n (RXSiO 1 . 0 ) m ] Σ # hetero-substituent composition for functionalization (where R The groups can be equal or unequal).

上文所有R係相同於上文所定義者,而X包括,但不限於,OH、Cl、Br、I、烷氧根(OR)、甲酸根(OCH)、醋酸根(OCOR)、酸根(OCOH)、酯根(OCOR)、過氧根(OOR)、胺根(NR2 )、異氰酸根(NCO)及R。符號m與n意指該組成物之化學計量。符號Σ指示出該組成物形成一奈米結構,而符號#意指該奈米結構中所含矽原子的數目。#值通常為m+n之總合,其中n典型地從1分佈到24,而m典型地從1分佈到12。要注意的是,Σ#不要混淆為用於決定化學計量的倍數,因其僅僅描述該系統之總奈米結構特徵(亦稱為籠之大小)。All R systems above are the same as defined above, and X includes, but is not limited to, OH, Cl, Br, I, alkoxy (OR), formate (OCH), acetate (OCOR), acid ( OCOH), ester root (OCOR), peroxygen (OOR), amine root (NR 2 ), isocyanate (NCO) and R. The symbols m and n mean the stoichiometry of the composition. The symbol Σ indicates that the composition forms a nanostructure, and the symbol # means the number of germanium atoms contained in the nanostructure. The # value is typically the sum of m + n, where n is typically distributed from 1 to 24, while m is typically distributed from 1 to 12. It should be noted that Σ# is not to be confused as a multiple for determining stoichiometry, as it merely describes the total nanostructure characteristics of the system (also known as the size of the cage).

較佳實施例之詳細說明Detailed description of the preferred embodiment

本發明教示一種用於POSS奈米結構化學物質的改良合成方法,其產出,較先前所描述者,純度較高、成本較低的產物。The present invention teaches an improved synthesis process for POSS nanostructured chemistry that produces a higher purity, lower cost product than previously described.

本發明之主要特徵係為使用磷氮基超鹼以催化POSS籠之組裝。可應用的磷氮基範圍包括在分子量與組成物上變化之磷氮基。磷氮基寡聚物與分子特別在P1類型P(NtBu)(NH2 )3 、P2類型(H2 N)3 P=N-P(NH2 )4 、P3類型(H2 N)3 P=N-P(NH2 )-N=P(NH2 )3 、P4類型(H2 N)3 P=N-P(NH2 )3 =N-P(NH2 )3 -N=P(NH2 )3 係較佳利用的。磷氮基超鹼之鹼度隨著磷原子數目之增加而增加,而這提供此試劑在利用上一有價值的工具。超鹼相對於三矽醇之較佳濃度係為2mol%,但有效範圍包括0.1mol%至10mol%。The main feature of the invention is the use of a phosphorus-nitrogen superbase to catalyze the assembly of POSS cages. Applicable phosphorus-nitrogen groups include phosphorus-nitrogen groups which vary in molecular weight and composition. Phosphorus-nitrogen oligomers and molecules, especially in P1 type P(NtBu)(NH 2 ) 3 , P2 type (H 2 N) 3 P=N-P(NH 2 ) 4 , P3 type (H 2 N) 3 P =N-P(NH 2 )-N=P(NH 2 ) 3 , P4 type (H 2 N) 3 P=N-P(NH 2 ) 3 =N-P(NH 2 ) 3 -N=P( NH 2 ) 3 is preferably used. The basicity of the phosphorus-nitrogen superbase increases with the number of phosphorus atoms, and this provides a valuable tool for the use of this reagent. The preferred concentration of the superbase relative to the triterpene alcohol is 2 mol%, but the effective range includes 0.1 mol% to 10 mol%.

可應用於所有製程的一般製程變數General process variables that can be applied to all processes

如典型的化學製程,有一些變數可以用來控制任何製程之純度、選擇性、速率及機制。影響製程之變數包括奈米結構化學物質之大小、多分散性(polydispersity)與組成物;分離與單離的方法;以及催化劑或共催化劑、溶劑與共溶劑之使用。另外,控制合成機制、速率及產物分佈之動力學及熱力學方式,亦為已知的商議(trade)工具,其能衝擊產物之品質與經濟性。As with typical chemical processes, there are variables that can be used to control the purity, selectivity, rate, and mechanism of any process. Variables affecting the process include the size, polydispersity and composition of the nanostructured chemical; separation and isolation; and the use of catalysts or cocatalysts, solvents and cosolvents. In addition, the dynamics and thermodynamics of controlling the synthesis mechanism, rate and product distribution are also known as trade tools that can impact the quality and economy of the product.

實施例1.Example 1.

合成[(異丁基SiO1 . 5 )7 (甲基丙烯基丙基SiO1 . 0 )1 ]Σ 8 :將[(異丁基SiO1 . 5 )4 (異丁基(OH)SiO1 . 0 )3 ]Σ 7 (688g,0.87莫耳)溶於四氫呋喃(THF),之後加入甲基丙烯基丙基三甲氧基矽烷(methacrylpropyltrimethoxysilane)(204g,0.87莫耳),然後冷卻該溶液至5℃。接著加入磷氮基超鹼(FW 234.32,15.72mmol),然後在室溫下攪拌該混合物三天。接著以醋酸(1.5g)淬滅(quenched)該溶液。接著加入1公升的甲醇,然後將該混合物攪拌及過濾。將固體乾燥使成為產率75%之純白產物。Synthesis [(isobutyl SiO 1 . 5 ) 7 (methacryl propyl SiO 1 . 0 ) 1 ] Σ 8 : [(isobutyl SiO 1 . 5 ) 4 (isobutyl (OH) SiO 1 . 0) 3] Σ 7 ( 688g, 0.87 mole) was dissolved in tetrahydrofuran (THF), after addition of methacryl trimethoxy Silane (methacrylpropyltrimethoxysilane) (204g, 0.87 mole), and then the solution was cooled to 5 °C. Then, a phosphorus-nitrogen superbase (FW 234.32, 15.72 mmol) was added, and the mixture was stirred at room temperature for three days. The solution was then quenched with acetic acid (1.5 g). Next, 1 liter of methanol was added, and the mixture was stirred and filtered. The solid was dried to give a pure white product of 75% yield.

實施例2.Example 2.

合成[(EtSiO1 . 5 )7 (縮水甘油SiO1 . 0 )1 ]Σ 8 ([(EtSiO1 . 5 )7 (glycidalSiO1 . 0 )1 ]Σ 8 ):將[(EtSiO1 . 5 )4 (Et(OH)SiO1 . 0 )3 ]Σ 7 (50g,84毫莫耳)溶於甲醇,之後加入3-縮水甘油醚基丙基三甲氧基矽烷(3-glycidoxypropyltrimethoxysilane)(19.86g,84毫莫耳),然後冷卻該溶液至5℃。接著加入磷氮基超鹼(FW 234.32,15.72毫莫耳),然後在5℃下攪拌該混合物三天。接著以醋酸(87mg)淬滅該溶液,經過濾並移除揮發物質(volatiles)後,溶液係被乾燥使成為固體。以甲醇(1400 ml)洗滌該固體並乾燥該固體使成為415g、產率87%之純白產物。Synthesis of [(. EtSiO 1 5) 7 (. Glycidol SiO 1 0) 1] Σ 8 ([. (EtSiO 1 5) 7 (glycidalSiO 1 0) 1.] Σ 8): The [(. EtSiO 1 5) 4 (Et(OH)SiO 1 . 0 ) 3 ] Σ 7 (50 g, 84 mmol) dissolved in methanol, followed by 3-glycidoxypropyltrimethoxysilane (19.86 g, 84 millimoles), then the solution was cooled to 5 °C. Next, a phosphorus-nitrogen superbase (FW 234.32, 15.72 mmol) was added, and then the mixture was stirred at 5 ° C for three days. The solution was then quenched with acetic acid (87 mg). After filtration and removal of volatiles, the solution was dried to a solid. The solid was washed with methanol (1400 ml) and the solid was dried to afford 415 g,yiel.

實施例3.Example 3.

合成[(EtSiO1 . 5 )7 (乙基降冰片烯SiO1 . 0 )1 ]Σ 8 :將[(EtSiO1 . 5 )4 (Et(OH)SiO1 . 0 )3 ]Σ 7 (12 g,20毫莫耳)溶於甲醇,之後加入外-降冰片烯基乙基三甲氧基矽烷(exo-norbornenylethyltrimethoxysilane)(4.84g,20毫莫耳),然後冷卻該溶液至5℃。接著加入磷氮基超鹼,然後在5℃下攪拌該混合物兩天。接著以醋酸(87mg)淬滅該溶液,經過濾並移除揮發物質後,以額外的甲醇洗滌,然後乾燥使成為白色產物。Synthesis [(EtSiO 1 . 5 ) 7 (ethylnorbornene SiO 1 . 0 ) 1 ] Σ 8 : [(EtSiO 1 . 5 ) 4 (Et(OH)SiO 1 . 0 ) 3 ] Σ 7 (12 g, 20 mmoles was dissolved in methanol, then exo-norbornenylethyltrimethoxysilane (4.84 g, 20 mmol) was added and the solution was then cooled to 5 °C. Next, a phosphorus-nitrogen superbase was added, and then the mixture was stirred at 5 ° C for two days. The solution was then quenched with acetic acid (87 mg), filtered and evaporated to dryness eluting with EtOAc.

實施例4.Example 4.

合成[(環己基SiO1 . 5 )7 (胺基乙基胺基丙基SiO1 . 0 )1 ]Σ 8 :將[(環己基SiO1 . 5 )4 (環己基(OH)SiO1 . 0 )3 ]Σ 7 (10g,10.3毫莫耳)溶於THF,之後加入3-(N-胺基乙基)胺基丙基三甲氧基矽烷(3-(N-aminoethyl)aminopropyltrimethoxysilane)(2.32g,10.27毫莫耳),接著加入磷氮基超鹼(FW 234.32,15.72毫莫耳),並於室溫下攪拌該混合物。接者以醋酸淬滅該溶液,並加入甲醇。經移除揮發物質後,產物係乾燥使成為產率62%之純白固體。Synthesis of [(cyclohexyl SiO 1 5.) 7 (aminoethyl aminopropyl SiO 1 0.) 1] Σ 8: The [(. Cyclohexyl SiO 1 5) 4 (cyclohexyl (OH) SiO 1. 0 ) 3 ] Σ 7 (10 g, 10.3 mmol) dissolved in THF, followed by 3-(N-aminoethyl)aminopropyltrimethoxysilane (2.32) g, 10.27 mmol, followed by the addition of a phosphorus-nitrogen superbase (FW 234.32, 15.72 mmol) and the mixture was stirred at room temperature. The solution was quenched with acetic acid and methanol was added. After removal of the volatile material, the product was dried to afford a pure white solid with a yield of 62%.

實施例5.Example 5.

合成[(苯基SiO1 . 5 )7 (胺基丙基SiO1 . 0 )1 ]Σ 8 :將[(苯基SiO1 . 5 )4 (苯基(OH)SiO1 . 0 )3 ]Σ 7 (5.9g,6.3莫耳)溶於甲苯,之後加入3-胺基丙基三甲氧基矽烷(3-aminopropyltrimethoxysilane)(2.0g,11毫莫耳),接著於室溫下攪拌12小時。加入乙腈並過濾該溶液,將產物乾燥使成為產率40%之純白固體。Synthesis of [(phenyl SiO 1 . 5 ) 7 (aminopropyl SiO 1 . 0 ) 1 ] Σ 8 : [(phenyl SiO 1 . 5 ) 4 (phenyl(OH)SiO 1 . 0 ) 3 ] Σ 7 (5.9 g, 6.3 mol) was dissolved in toluene, then 3-aminopropyltrimethoxysilane (2.0 g, 11 mmol) was added, followed by stirring at room temperature for 12 hours. Acetonitrile was added and the solution was filtered and the product was dried to give a white solid, 40% yield.

雖然某些代表性具體例及細節已經顯示以達例示本發明之目的,對熟習該項技術者而言,顯而易見的是,在此揭露的方法與設備可以做各種改變而不悖離本發明於所附的申請專利範圍中界定的範圍。Although certain representative specific embodiments and details have been shown to exemplify the invention, it will be apparent to those skilled in the art that the methods and apparatus disclosed herein can be variously modified without departing from the invention. The scope defined in the scope of the appended patent application.

第1圖顯示習知技術與改良的矽化製程的比較。Figure 1 shows a comparison of conventional techniques with an improved deuteration process.

第2圖顯示各種較佳的磷氮基超鹼;及第3圖顯示於實施例5中所合成之化合物的結構。Figure 2 shows various preferred phosphorus-nitrogen superbases; and Figure 3 shows the structure of the compounds synthesized in Example 5.

Claims (12)

一種製備官能基化多面體矽氧烷寡聚物(POSS)單體的方法,其包含在溶劑及磷氮基超鹼(phosphazene superbase)的存在下,反應具有化學式RSiX3 之矽烷偶合劑的步驟,其中:R係選自於由下列所組成之群組:氫、矽烷氧基(siloxy)及脂族、芳香族和烯烴基團,其中該等基團可含有選自於由醇、酯、胺、酮、烯烴、醚及鹵化物所組成之群組的反應性官能基團,且可含有氟化的取代基;X係選自於由下列所組成之群組:OH、Cl、Br、I、烷氧根(OR)、甲酸根、醋酸根、酸根(OCOH)、酯根、過氧根(OOR)、胺根(NR2 )、異氰酸根(NCO)及R;且每個R及每個X可為相同或相異。A process for preparing a functionalized polyhedral oxyalkylene oligomer (POSS) monomer comprising the step of reacting a decane coupling agent of the formula RSiX 3 in the presence of a solvent and a phosphazene superbase, Wherein R is selected from the group consisting of hydrogen, siloxy and aliphatic, aromatic and olefinic groups, wherein the groups may be selected from the group consisting of alcohols, esters, amines a reactive functional group of a group consisting of a ketone, an olefin, an ether, and a halide, and may contain a fluorinated substituent; the X system is selected from the group consisting of OH, Cl, Br, I. , alkoxide (OR), formate, acetate, acid (OCOH), ester, peroxygen (OOR), amine (NR 2 ), isocyanate (NCO) and R; and each R and Each X can be the same or different. 如申請專利範圍第1項之方法,其中該超鹼係選自於由P1、P2、P3及P4類型磷氮基所組成之群組。 The method of claim 1, wherein the superbase is selected from the group consisting of P1, P2, P3 and P4 type phosphorus nitrogen groups. 如申請專利範圍第1項之方法,其中具有不同矽烷偶合劑的一混合物係被反應以利用來製備官能基化的POSS單體。 The method of claim 1, wherein a mixture having different decane coupling agents is reacted to utilize the functionalized POSS monomer. 如申請專利範圍第1項之方法,其中具有不同超鹼的一混合物係被用作為均相(homogeneous)催化劑或共試劑。 The method of claim 1, wherein a mixture having different superbases is used as a homogeneous catalyst or co-reagent. 如申請專利範圍第1項之方法,其中具有不同溶劑或反應媒質的一混合物係被利用。 The method of claim 1, wherein a mixture having a different solvent or a reaction medium is utilized. 如申請專利範圍第1項之方法,其中一造成官能基化POSS單體的連續製程係被利用,該製程使用該超鹼作 為異相(heterogeneous)催化劑或共試劑。 For example, in the method of claim 1, a continuous process system for causing a functionalized POSS monomer is utilized, and the process uses the superalkaly It is a heterogeneous catalyst or a co-reagent. 一種製備官能基化POSS單體之方法,其包含在溶劑及磷氮基超鹼的存在下,以具有化學式選自於由RSiX3 、R2 SiX2 及R3 SiX所組成之群組的矽烷偶合劑來矽化POSS矽醇的步驟,其中:R係選自於由下列所組成之群組:氫、矽烷氧基(siloxy)及脂族、芳香族和烯烴基團,其中該等基團可含有選自於由醇、酯、胺、酮、烯烴、醚及鹵化物所組成之群組的反應性官能基團,且可含有氟化的取代基;X係選自於由下列所組成之群組:OH、Cl、Br、I、烷氧根(OR)、甲酸根、醋酸根、酸根(OCOH)、酯根、過氧根(OOR)、胺根(NR2 )、異氰酸根(NCO)及R;且每個R及每個X可為相同或相異。A method for preparing a functionalized POSS monomer comprising decane having a chemical formula selected from the group consisting of RSiX 3 , R 2 SiX 2 and R 3 SiX in the presence of a solvent and a phosphorus-nitrogen superbase a coupling agent for deuterating POSS sterol, wherein: R is selected from the group consisting of hydrogen, siloxy, and aliphatic, aromatic, and olefinic groups, wherein the groups are a reactive functional group selected from the group consisting of alcohols, esters, amines, ketones, olefins, ethers, and halides, and may contain a fluorinated substituent; X is selected from the group consisting of Group: OH, Cl, Br, I, alkoxide (OR), formate, acetate, acidate (OCOH), ester root, peroxygen (OOR), amine root (NR 2 ), isocyanate ( NCO) and R; and each R and each X may be the same or different. 如申請專利範圍第7項之方法,其中該超鹼係選自於由P1、P2、P3及P4類型磷氮基所組成之群組。 The method of claim 7, wherein the superbase is selected from the group consisting of P1, P2, P3 and P4 type phosphorus nitrogen groups. 如申請專利範圍第7項之方法,其中具有不同POSS矽醇及矽烷偶合劑的一混合物係被矽化。 The method of claim 7, wherein a mixture having different POSS sterols and decane coupling agents is deuterated. 如申請專利範圍第7項之方法,其中具有不同超鹼的一混合物係被用作為均相催化劑或共試劑。 The method of claim 7, wherein a mixture having different superbases is used as a homogeneous catalyst or a co-reagent. 如申請專利範圍第7項之方法,其中具有不同溶劑或反應媒質的一混合物係被利用。 The method of claim 7, wherein a mixture having a different solvent or a reaction medium is utilized. 如申請專利範圍第7項之方法,其中一連續矽化製程係被利用,其使用該超鹼作為異相催化劑或共試劑。 A method of claim 7, wherein a continuous deuteration process is utilized which uses the superbase as a heterogeneous catalyst or a co-reagent.
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