TWI427176B - Apparatus and method for detecting coated substrate - Google Patents

Apparatus and method for detecting coated substrate Download PDF

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Publication number
TWI427176B
TWI427176B TW97119052A TW97119052A TWI427176B TW I427176 B TWI427176 B TW I427176B TW 97119052 A TW97119052 A TW 97119052A TW 97119052 A TW97119052 A TW 97119052A TW I427176 B TWI427176 B TW I427176B
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Taiwan
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coated substrate
detecting device
dark box
transmittance
coated
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TW97119052A
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Chinese (zh)
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TW200949001A (en
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Chung Pei Wang
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Hon Hai Prec Ind Co Ltd
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鍍膜基片檢測裝置及鍍膜基片檢測方法 Coating substrate detecting device and coating substrate detecting method

本發明涉及一種鍍膜技術,特別涉及一種鍍膜基片檢測裝置及一種鍍膜基片檢測方法。 The invention relates to a coating technology, in particular to a coating substrate detecting device and a coating substrate detecting method.

當前,鍍膜工藝於光電產品中,應用極其普遍。較常見之光學鍍膜方法包括真空蒸鍍法。真空蒸鍍法將基片密封於無污染物(如粉塵)之真空蒸鍍室內進行蒸鍍,以於基片上形成膜層。然而,由於技術上之極限,真空蒸鍍室不可能達到完全真空狀態,鍍膜基片通常存於麻點(粒徑為5-10微米)或白點(粒徑為50-100微米)等不良。因此,需對鍍膜基片進行相關檢測,以確定鍍膜基片之品質是否符合要求。目前,常用之檢測方法包括目檢(visual inspection,可能借助放大鏡偵測麻點)。然而,目檢效率差,標準不一,檢測效果不理想。 At present, the coating process is widely used in optoelectronic products. More common optical coating methods include vacuum evaporation. The substrate is sealed by vacuum evaporation in a vacuum evaporation chamber free of contaminants such as dust to form a film layer on the substrate. However, due to technical limitations, it is impossible for the vacuum evaporation chamber to reach a complete vacuum state. The coated substrate is usually stored in pitting (particle size 5-10 microns) or white spots (particle size 50-100 microns). . Therefore, it is necessary to perform a related test on the coated substrate to determine whether the quality of the coated substrate meets the requirements. At present, commonly used detection methods include visual inspection (which may be detected by means of a magnifying glass). However, the visual inspection efficiency is poor, the standards are different, and the detection effect is not satisfactory.

有鑒於此,有必要提供一種檢測效率高且檢測標準統一之鍍膜基片檢測裝置及鍍膜基片檢測方法。 In view of the above, it is necessary to provide a coated substrate detecting device and a coated substrate detecting method which have high detection efficiency and uniform detection standards.

一種鍍膜基片檢測裝置,其包括一個具有相對兩個端面之暗箱、一個設置於該暗箱一個端面之光源、一個設置於該暗箱另外一個 端面之光強度感測器及與一個該光強度感測器電連接之透過率顯示裝置,該暗箱於該兩個端面之間形成有一個暗箱門及一個與該暗箱門對應之鍍膜基片收容部,該鍍膜基片收容部用於收容多片由該暗箱門進出之鍍膜基片。 A coated substrate detecting device comprising a dark box having opposite end faces, a light source disposed on one end face of the dark box, and another one disposed in the dark box a light intensity sensor of the end face and a transmittance display device electrically connected to the light intensity sensor, the dark box forming a black box door between the two end faces and a coated substrate corresponding to the black box door The coated substrate receiving portion is configured to receive a plurality of coated substrates that are accessed by the black box door.

一種鍍膜基片檢測方法,其包括:提供一個鍍膜基片檢測裝置,該鍍膜基片檢測裝置包括一個具有相對兩個端面之暗箱、一個設置於該暗箱一個端面之光源、一個設置於該暗箱另外一個端面之光強度感測器及一個與該光強度感測器電連接之透過率顯示裝置,該暗箱於該兩個端面之間形成有一個暗箱門及一個與該暗箱門對應之鍍膜基片收容部,該鍍膜基片收容部用於收容多片由該暗箱門進出之鍍膜基片;打開該暗箱門;將多片標準鍍膜基片放置於該鍍膜基片收容部;合上該暗箱門;開啟該鍍膜基片檢測裝置;從該透過率顯示裝置讀取透過率作為一個預定透過率;關閉該鍍膜基片檢測裝置,打開該暗箱門,取出該多片標準鍍膜基片;將多片鍍膜基片放置於該鍍膜基片收容部;合上該暗箱門; 開啟該鍍膜基片檢測裝置;及從該透過率顯示裝置讀取透過率以判斷該透過率是否高於一個預定透過率;若是,該多片鍍膜基片合格。 A coated substrate detecting method comprising: providing a coated substrate detecting device, the coated substrate detecting device comprising a dark box having opposite end faces, a light source disposed on one end face of the dark box, and one disposed in the dark box a light intensity sensor of an end face and a transmittance display device electrically connected to the light intensity sensor, the dark box forming a black box door and a coated substrate corresponding to the black box door between the two end faces a accommodating portion for accommodating a plurality of coated substrates that are fed in and out of the black box door; opening the black box door; placing a plurality of standard coated substrates on the coated substrate receiving portion; closing the black box door Opening the coated substrate detecting device; reading the transmittance from the transmittance display device as a predetermined transmittance; closing the coated substrate detecting device, opening the black box door, and taking out the plurality of standard coated substrates; Depositing a substrate on the coated substrate receiving portion; closing the black box door; Turning on the coated substrate detecting device; and reading the transmittance from the transmittance display device to determine whether the transmittance is higher than a predetermined transmittance; if so, the plurality of coated substrates are qualified.

利用該鍍膜基片檢測裝置執行該鍍膜基片檢測方法,可同時檢測多片鍍膜基片,檢測效率高,且檢測標準統一,檢測效果好。 The coating substrate detecting method is used to perform the coating substrate detecting method, and the plurality of coated substrates can be simultaneously detected, the detection efficiency is high, the detection standard is uniform, and the detection effect is good.

10‧‧‧鍍膜基片檢測裝置 10‧‧‧coated substrate inspection device

110‧‧‧暗箱 110‧‧‧black box

120‧‧‧光源 120‧‧‧Light source

130‧‧‧光強度感測器 130‧‧‧Light intensity sensor

140‧‧‧透過率顯示裝置 140‧‧‧Transmission rate display device

112、114‧‧‧端面 112, 114‧‧‧ end face

116‧‧‧暗箱門 116‧‧‧black box door

118‧‧‧鍍膜基片收容部 118‧‧‧coated substrate accommodating department

20‧‧‧鍍膜基片 20‧‧‧coated substrate

11a‧‧‧夾持凹槽 11a‧‧‧Clamping groove

310、320、322、324、326、328、330、332、334、336、338‧‧‧步驟 310, 320, 322, 324, 326, 328, 330, 332, 334, 336, 338 ‧ ‧ steps

圖1為本發明較佳實施方式之鍍膜基片檢測裝置之立體示意圖。 1 is a schematic perspective view of a coated substrate detecting device according to a preferred embodiment of the present invention.

圖2為圖1之鍍膜基片檢測裝置截面示意圖。 2 is a schematic cross-sectional view of the coated substrate detecting device of FIG. 1.

圖3為發明較佳實施方式之鍍膜基片檢測方法之流程圖。 3 is a flow chart of a method for detecting a coated substrate according to a preferred embodiment of the present invention.

請一併參閱圖1及圖2,本發明較佳實施方式之鍍膜基片檢測裝置10包括一個暗箱110、一個光源120、一個光強度感測器130及一個透過率顯示裝置140。暗箱110包括兩個相對之端面112、114。光源120及光強度感測器130分別設置於端面112、114上。透過率顯示裝置140與光強度感測器130電連接。暗箱110於兩個端面112、114之間形成有一個暗箱門116及一個與暗箱門116對應之鍍膜基片收容部118。鍍膜基片收容部118用於收容多片由暗箱門116進出之鍍膜基片20(如鍍膜玻璃片)。 Referring to FIG. 1 and FIG. 2 together, the coated substrate detecting apparatus 10 of the preferred embodiment of the present invention includes a black box 110, a light source 120, a light intensity sensor 130, and a transmittance display device 140. The dark box 110 includes two opposing end faces 112, 114. The light source 120 and the light intensity sensor 130 are respectively disposed on the end faces 112 and 114. The transmittance display device 140 is electrically connected to the light intensity sensor 130. The dark box 110 is formed with a black box door 116 and a coated substrate receiving portion 118 corresponding to the black box door 116 between the two end faces 112, 114. The coated substrate receiving portion 118 is for accommodating a plurality of coated substrates 20 (such as coated glass sheets) that are accessed by the black box door 116.

暗箱110為一個由不透明材料製成之矩形中空箱。端面112、114為暗箱110與其長度方向垂直之兩個內表面。暗箱門116形成於矩形中空箱之一個長側面(如頂側面)上。鍍膜基片收容部118為形成於矩形中空箱與暗箱門116相對之內表面(如底內表面)上之複 數夾持凹槽11a。 The dark box 110 is a rectangular hollow box made of an opaque material. The end faces 112, 114 are the two inner surfaces of the dark box 110 that are perpendicular to its length. The black box door 116 is formed on one long side (such as the top side) of the rectangular hollow box. The coated substrate receiving portion 118 is formed on the inner surface (such as the inner surface of the bottom) of the rectangular hollow box and the dark box door 116. The number of the grooves 11a is clamped.

當然,暗箱110並不限於本實施方式,可視檢測需求製成其他形狀,如圓筒狀(用於測試圓形鍍膜基片)。 Of course, the dark box 110 is not limited to the present embodiment, and other shapes such as a cylindrical shape (for testing a circular coated substrate) can be made for visual inspection.

優選地,光源120為可見光面光源。更加優選地,光源120面積與端面112形狀相配合,以降低光源120之邊緣現象。 Preferably, the light source 120 is a visible light source. More preferably, the area of the light source 120 matches the shape of the end face 112 to reduce edge phenomena of the light source 120.

光強度感測器130為光度計(Photometer),用於感測光源120發出之可見光經過多片鍍膜基片20後之強度,並換算為透過率。 The light intensity sensor 130 is a photometer for sensing the intensity of the visible light emitted by the light source 120 after passing through the plurality of coated substrates 20, and converting the transmittance into transmittance.

透過率顯示裝置140可採用液晶顯示器,其固定於暗箱110上,當然,也可分離設置。透過率顯示裝置140用於讀取光強度感測器130輸出之透過率(光源120發出之光經過多片鍍膜基片20之透過率),並顯示出來。 The transmittance display device 140 may employ a liquid crystal display that is fixed to the dark box 110, and of course, may be separately disposed. The transmittance display device 140 is configured to read the transmittance of the output of the light intensity sensor 130 (the transmittance of the light emitted from the light source 120 through the plurality of coated substrates 20) and display it.

請一併參閱圖3,本發明較佳實施方式之鍍膜基片檢測方法包括以下步驟:步驟310:提供鍍膜基片檢測裝置10;步驟320:打開暗箱門116;步驟322:將多片標準鍍膜基片(圖未示)放置於鍍膜基片收容部118;步驟324:合上暗箱門116;步驟326:開啟鍍膜基片檢測裝置10;步驟328:從透過率顯示裝置140讀取透過率作為一個預定透過率 (如90%);步驟330:關閉鍍膜基片檢測裝置10,打開暗箱門116,取出該多片標準鍍膜基片;步驟332:將多片鍍膜基片20放置於鍍膜基片收容部118;步驟334:合上暗箱門116;步驟336:開啟鍍膜基片檢測裝置10;及步驟338:從透過率顯示裝置140讀取透過率(光源120發出之光經過多片鍍膜基片20之透過率)以判斷該透過率是否高於該預定透過率(如90%);若是,則多片鍍膜基片20合格;若否,多片鍍膜基片20中存於不合格之鍍膜基片20(此情況下,可將多片鍍膜基片20與其他鍍膜基片配合重新檢測,或進行目檢)。 Referring to FIG. 3 together, the method for detecting a coated substrate according to a preferred embodiment of the present invention includes the following steps: Step 310: providing a coated substrate detecting device 10; Step 320: opening the black box door 116; Step 322: applying a plurality of standard coatings a substrate (not shown) is placed in the coated substrate receiving portion 118; step 324: closing the black box door 116; step 326: opening the coated substrate detecting device 10; step 328: reading the transmittance from the transmittance display device 140 as a predetermined transmittance (step 90%); step 330: closing the coated substrate detecting device 10, opening the black box door 116, taking out the plurality of standard coated substrate; step 332: placing a plurality of coated substrate 20 in the coated substrate receiving portion 118; Step 334: closing the black box door 116; step 336: turning on the coated substrate detecting device 10; and step 338: reading the transmittance from the transmittance display device 140 (the transmittance of the light emitted by the light source 120 through the plurality of coated substrates 20) To determine whether the transmittance is higher than the predetermined transmittance (e.g., 90%); if so, the plurality of coated substrates 20 are qualified; if not, the plurality of coated substrates 20 are present in the failed coated substrate 20 ( In this case, the plurality of coated substrates 20 can be re-detected in conjunction with other coated substrates, or visually inspected).

可理解,多片鍍膜基片20通常經由同批次之蒸鍍工序得到,其鍍膜品質差異較小。利用鍍膜基片檢測裝置10及鍍膜基片檢測方法進行檢測,可提高檢測效率,且檢測標準統一,檢測效果好。 It can be understood that the plurality of coated substrates 20 are usually obtained through the same batch of vapor deposition processes, and the difference in coating quality is small. The detection by the coated substrate detecting device 10 and the coated substrate detecting method can improve the detection efficiency, and the detection standard is uniform, and the detection effect is good.

綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

10‧‧‧鍍膜基片檢測裝置 10‧‧‧coated substrate inspection device

120‧‧‧光源 120‧‧‧Light source

130‧‧‧光強度感測器 130‧‧‧Light intensity sensor

112、114‧‧‧端面 112, 114‧‧‧ end face

116‧‧‧暗箱門 116‧‧‧black box door

118‧‧‧鍍膜基片收容部 118‧‧‧coated substrate accommodating department

11a‧‧‧夾持凹槽 11a‧‧‧Clamping groove

Claims (9)

一種鍍膜基片檢測裝置,其改進在於包括一個具有相對兩個端面之暗箱、一個設置於該暗箱一個端面之光源、一個設置於該暗箱另外一個端面之光強度感測器及一個與該光強度感測器電連接之透過率顯示裝置,該暗箱於該兩個端面之間形成有一個暗箱門及一個與該暗箱門對應之鍍膜基片收容部,該鍍膜基片收容部用於收容多片由該暗箱門進出之鍍膜基片以使該光源發出的光線依次經過該多片鍍膜基片後進入該光強度感測器。 A coated substrate detecting device is improved in that it comprises a dark box having opposite end faces, a light source disposed on one end face of the dark box, a light intensity sensor disposed on the other end face of the dark box, and a light intensity a transmittance display device electrically connected to the sensor, wherein the dark box is formed with a dark box door and a coated substrate receiving portion corresponding to the dark box door, the coated substrate receiving portion is configured to receive a plurality of pieces The coated substrate that enters and exits the black box door causes the light emitted by the light source to sequentially pass through the plurality of coated substrates to enter the light intensity sensor. 如申請專利範圍第1項所述之鍍膜基片檢測裝置,其中,該暗箱為一個由不透明材料製成之矩形中空箱,該兩個端面為該暗箱與其長度方向垂直之兩個內表面,該暗箱門形成於該暗箱之一個長側面上,該鍍膜基片收容部為形成於該暗箱與該暗箱門相對之內表面上之複數夾持凹槽。 The coated substrate detecting device according to claim 1, wherein the dark box is a rectangular hollow box made of an opaque material, and the two end faces are two inner surfaces of the dark box perpendicular to the longitudinal direction thereof, A dark box door is formed on one long side of the dark box, and the coated substrate receiving portion is a plurality of clamping grooves formed on an inner surface of the dark box opposite to the black box door. 如申請專利範圍第1項所述之鍍膜基片檢測裝置,其中,該光源為面光源。 The coated substrate detecting device according to claim 1, wherein the light source is a surface light source. 如申請專利範圍第1項所述之鍍膜基片檢測裝置,其中,該光源面積與其對應之端面面積相配合。 The coated substrate detecting device of claim 1, wherein the light source area matches the corresponding end face area. 如申請專利範圍第1項所述之鍍膜基片檢測裝置,其中,該光源為可見光光源。 The coated substrate detecting device of claim 1, wherein the light source is a visible light source. 如申請專利範圍第1項所述之鍍膜基片檢測裝置,其中,該光強度感測器包括光度計。 The coated substrate detecting device of claim 1, wherein the light intensity sensor comprises a photometer. 如申請專利範圍第1項所述之鍍膜基片檢測裝置,其中,該透過 率顯示裝置包括液晶顯示器。 The coated substrate detecting device according to claim 1, wherein the transmitting The rate display device includes a liquid crystal display. 如申請專利範圍第1項所述之鍍膜基片檢測裝置,其中,該透過率顯示裝置固定於該暗箱上。 The coated substrate detecting device according to claim 1, wherein the transmittance display device is fixed to the dark box. 一種鍍膜基片檢測方法,其包括:提供一個鍍膜基片檢測裝置,項所述之鍍膜基片檢測裝置包括一個具有相對兩個端面之暗箱、一個設置於該暗箱一個端面之光源、一個設置於該暗箱另外一個端面之光強度感測器及一個與該光強度感測器電連接之透過率顯示裝置,該暗箱於該兩個端面之間形成有一個暗箱門及一個與該暗箱門對應之鍍膜基片收容部,該鍍膜基片收容部用於收容多片由該暗箱門進出之鍍膜基片以使該光源發出的光線依次經過該多片鍍膜基片後進入該光強度感測器;打開項所述之暗箱門;將多片標準鍍膜基片放置於項所述之鍍膜基片收容部;合上項所述之暗箱門;開啟項所述之鍍膜基片檢測裝置;從項所述之透過率顯示裝置讀取透過率作為一個預定透過率;關閉項所述之鍍膜基片檢測裝置,打開該暗箱門,取出該多片標準鍍膜基片;將多片鍍膜基片放置於項所述之鍍膜基片收容部;合上項所述之暗箱門;開啟項所述之鍍膜基片檢測裝置;及從所述透過率顯示裝置讀取透過率以判斷該透過率是否高於一個預定透過率;若是,該多片鍍膜基片合格。 A coated substrate detecting method comprising: providing a coated substrate detecting device, wherein the coated substrate detecting device comprises a dark box having opposite end faces, a light source disposed on one end face of the dark box, and a setting a light intensity sensor of the other end face of the black box and a transmittance display device electrically connected to the light intensity sensor, the dark box forming a black box door between the two end faces and a corresponding one of the black box doors a coated substrate receiving portion, wherein the coated substrate receiving portion is configured to receive a plurality of coated substrates that are fed in and out of the black box door such that light emitted by the light source sequentially passes through the plurality of coated substrates and enters the light intensity sensor; Opening the black box door according to the item; placing a plurality of standard coated substrates on the coated substrate receiving portion of the item; closing the dark box door according to the above item; and coating the substrate detecting device according to the opening item; The transmittance display device reads the transmittance as a predetermined transmittance; the coated substrate detecting device described in the closing item opens the black box door and takes out the plurality of standard coated substrates; The sheet-coated substrate is placed in the coated substrate receiving portion of the item; the dark box door according to the above item; the coated substrate detecting device according to the opening item; and the transmittance read from the transmittance display device to determine Whether the transmittance is higher than a predetermined transmittance; if so, the plurality of coated substrates are acceptable.
TW97119052A 2008-05-23 2008-05-23 Apparatus and method for detecting coated substrate TWI427176B (en)

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI286578B (en) * 2005-07-21 2007-09-11 Hsiuping Inst Technology On-line automatic inspection system for continuous sputtering device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI286578B (en) * 2005-07-21 2007-09-11 Hsiuping Inst Technology On-line automatic inspection system for continuous sputtering device

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