TWI426149B - Coated articles and method for making the same - Google Patents
Coated articles and method for making the same Download PDFInfo
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- TWI426149B TWI426149B TW99128149A TW99128149A TWI426149B TW I426149 B TWI426149 B TW I426149B TW 99128149 A TW99128149 A TW 99128149A TW 99128149 A TW99128149 A TW 99128149A TW I426149 B TWI426149 B TW I426149B
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Description
本發明涉及一種鍍膜件及其製作方法。The invention relates to a coated part and a manufacturing method thereof.
金屬材料在空氣中較容易腐蝕。為了提高金屬材料的耐腐蝕能力,可在金屬材料的表面覆蓋一耐腐蝕能力較強的膜層。習知的在金屬材料的表面製作耐腐蝕膜層的方法有電鍍、化學鍍、烤漆及真空鍍膜(PVD)等。然而,電鍍、化學鍍及烤漆等對環境的污染非常大,必將逐漸被淘汰。而真空鍍膜製作的膜層存在微孔,對耐腐蝕能力的提高存在不良的影響。Metal materials are more susceptible to corrosion in air. In order to improve the corrosion resistance of the metal material, a surface of the metal material may be covered with a film having a high corrosion resistance. Conventional methods for forming a corrosion-resistant film layer on the surface of a metal material include electroplating, electroless plating, baking varnish, and vacuum coating (PVD). However, the environmental pollution caused by electroplating, electroless plating and baking varnish is very large and will gradually be eliminated. However, the film layer formed by vacuum coating has micropores, which has an adverse effect on the improvement of corrosion resistance.
目前常用的提高PVD膜層的耐腐蝕性能的方法係製備多層膜,通過膜層的反復疊加,從而將膜層之間的微孔遮蔽,避免形成貫穿基體與膜層表面的微孔,來消除膜層的微孔對耐腐蝕性能的不良影響。但,這種方法的工藝非常複雜,對設備要求高,成本高且難以在產業上應用。At present, a commonly used method for improving the corrosion resistance of a PVD film layer is to prepare a multilayer film by repeatedly stacking the film layers to shield the micropores between the film layers, thereby avoiding the formation of micropores penetrating the surface of the substrate and the film layer, thereby eliminating The micropores of the film layer have an adverse effect on corrosion resistance. However, the process of this method is very complicated, requires high equipment, is costly, and is difficult to apply in industry.
有鑒於此,有必要提供一種耐腐蝕性強的鍍膜件。In view of this, it is necessary to provide a corrosion-resistant coating member.
另外,還有必要提供一種工藝簡單、成本較低的製作上述鍍膜件的方法。In addition, it is also necessary to provide a method for producing the above-mentioned coated member which is simple in process and low in cost.
一種鍍膜件,其包括一基體及形成於基體上的一膜層,該膜層為一磁控濺射膜層,該膜層形成有複數微孔,該微孔中填充有封孔粒子。A coating member comprising a substrate and a film layer formed on the substrate, the film layer being a magnetron sputtering film layer, the film layer being formed with a plurality of micropores filled with sealing particles.
一種鍍膜件的製作方法,其包括如下步驟:提供一基體,通過磁控濺射在基體表面形成一膜層,使用一封孔液對所述膜層浸漬封孔液中進行封孔處理,所述封孔液中含有40-60g/L的NaCOOCH3 ,10-20g/L的HCOOCH3 ,1-2g/L的NH3 ‧H2 O,2-8g/L的NaSO4 ,1-5g/L的HNO3 ,以及2-6g/L的NaTiF4 。A method for fabricating a coating member, comprising the steps of: providing a substrate, forming a film layer on the surface of the substrate by magnetron sputtering, sealing the film layer with a hole liquid, and sealing the hole The sealing liquid contains 40-60 g/L of NaCOOCH 3 , 10-20 g/L of HCOOCH 3 , 1-2 g/L of NH 3 ‧H 2 O, 2-8 g/L of NaSO 4 , 1-5 g/ HNO 3 of L, and 2-6 g/L of NaTiF 4 .
通過上述方法製作的鍍膜件能很好地減少膜層表面所產生的微孔對鍍膜件的基體耐腐蝕能力的影響,使鍍膜件的基體與外界隔離,從而提高了鍍膜件的耐腐蝕能力。The coated member produced by the above method can well reduce the influence of the micropores generated on the surface of the film on the corrosion resistance of the substrate of the coated member, and isolate the substrate of the coated member from the outside, thereby improving the corrosion resistance of the coated member.
請參閱圖1,本發明一較佳實施方式的鍍膜件100包括一基體10及形成於基體10表面的一膜層20。Referring to FIG. 1, a coated article 100 according to a preferred embodiment of the present invention includes a substrate 10 and a film layer 20 formed on the surface of the substrate 10.
該基體10可以由鋁合金、鎂合金等金屬材料製成,也可由陶瓷、玻璃等非金屬材料製成。The base 10 may be made of a metal material such as an aluminum alloy or a magnesium alloy, or may be made of a non-metal material such as ceramic or glass.
該膜層20為一Al-Ti-N層,其以磁控濺射的方式形成。該膜層20的厚度為0.5-8微米。The film layer 20 is an Al-Ti-N layer which is formed by magnetron sputtering. The film layer 20 has a thickness of 0.5 to 8 μm.
該膜層20形成有複數微孔201。該複數微孔201中填充有封孔粒子30。該封孔粒子30由將所述膜層20浸漬於一封孔液中一定時間,而後乾燥的方式而形成。所述封孔液中含有40-60g/L的NaCOOCH3 ,10-20g/L的HCOOCH3 ,1-2g/L的NH3 ‧H2 O,2-8g/L的NaSO4 ,1-5g/L的HNO3 ,以及2-6g/L的NaTiF4 。The film layer 20 is formed with a plurality of micropores 201. The plurality of micropores 201 are filled with the sealing particles 30. The plugged particles 30 are formed by immersing the film layer 20 in a liquid for a certain period of time and then drying it. The plugging liquid contains 40-60 g/L of NaCOOCH 3 , 10-20 g/L of HCOOCH 3 , 1-2 g/L of NH 3 ‧H 2 O, 2-8 g/L of NaSO 4 , 1-5 g /L of HNO 3 , and 2-6 g/L of NaTiF 4 .
請參見圖1和圖2,本發明一較佳實施方式的鍍膜件100的製作方法包括以下步驟:Referring to FIG. 1 and FIG. 2, a method for fabricating a coated member 100 according to a preferred embodiment of the present invention includes the following steps:
提供一基體10。所述基體10的材質可為鋁合金、鎂合金等金屬材料,也可為陶瓷、玻璃等非金屬材料。A substrate 10 is provided. The material of the base 10 may be a metal material such as an aluminum alloy or a magnesium alloy, or may be a non-metal material such as ceramic or glass.
對該基體10進行表面預處理。該表面預處理可包括常規的對基體10進行化學除油、除蠟、酸洗、超聲波清洗及烘乾等。The substrate 10 is subjected to surface pretreatment. The surface pretreatment may include conventional chemical degreasing, wax removal, pickling, ultrasonic cleaning, and drying of the substrate 10.
對經上述處理後的基體10的表面進行氬氣等電漿清洗,進一步去除基體10表面的油污,以改善基體10表面與後續塗層的結合力。該電漿清洗的具體操作及工藝參數可為:將基體10放入一磁控濺射鍍膜機(圖未示)的真空室內,將該真空室抽真空至8.0×10-3 Pa,通入流量為50-400sccm(標準狀態毫升/分鐘)的氬氣(純度為99.999%),對基體10施加-300~-600V的偏壓,對基體10表面進行電漿清洗,清洗時間為5-10min。The surface of the substrate 10 subjected to the above treatment is subjected to plasma cleaning such as argon gas to further remove oil stain on the surface of the substrate 10 to improve the bonding force between the surface of the substrate 10 and the subsequent coating layer. The specific operation and process parameters of the plasma cleaning may be: placing the substrate 10 in a vacuum chamber of a magnetron sputtering coating machine (not shown), and vacuuming the vacuum chamber to 8.0×10 -3 Pa, Argon gas (purity: 99.999%) with a flow rate of 50-400 sccm (standard state ML/min), a bias of -300 to -600 V is applied to the substrate 10, and the surface of the substrate 10 is plasma-cleaned for 5-10 min. .
完成等離子清洗後,開啟一鋁-鈦合金靶(該鋁-鈦合金靶中鋁的質量百分含量為20~60%)的電源,該電源的功率可設置為4-14kw。調節氬氣流量至50-300sccm,優選為150sccm;並通入氮氣,其流量為10-150sccm;對鋁-鈦合金靶施加-100~-350V的偏壓,沉積膜層20。沉積該膜層20的時間為20-30min。沉積完成後,關閉鋁-鈦合金靶的電源及負偏壓,停止通入氬氣,氮氣。所述膜層20為一Al-Ti-N層,其厚度為0.5~8微米。該膜層20形成有複數微孔201。After the plasma cleaning is completed, a power source of an aluminum-titanium alloy target (the mass percentage of aluminum in the aluminum-titanium alloy target is 20 to 60%) is turned on, and the power of the power source can be set to 4-14 kW. The argon flow rate is adjusted to 50-300 sccm, preferably 150 sccm; and nitrogen gas is passed through at a flow rate of 10-150 sccm; and a bias of -100 to -350 V is applied to the aluminum-titanium alloy target to deposit the film layer 20. The time for depositing the film layer 20 is 20-30 min. After the deposition is completed, the power supply and the negative bias of the aluminum-titanium alloy target are turned off, and the introduction of argon gas and nitrogen gas is stopped. The film layer 20 is an Al-Ti-N layer having a thickness of 0.5 to 8 μm. The film layer 20 is formed with a plurality of micropores 201.
使用一封孔液對形成於基體10表面的膜層20的微孔201進行浸漬封孔處理。所述封孔液中含有40-60g/L的NaCOOCH3 ,10-20g/L的HCOOCH3 ,1-2g/L的NH3 ‧H2 O,2-8g/L的NaSO4 ,1-5g/L的HNO3 ,以及2-6g/L的NaTiF4 。該封孔液的pH值為3-7。封孔時保持封孔液的溫度為20~30℃。浸漬封孔的時間為5~15s。封孔過程中,所述封孔液填充至膜層20的微孔201內;待封孔完成後對所述膜層20進行去離子水沖洗及乾燥,乾燥後該填充至微孔201中的封孔液即形成固化的封孔粒子30。該封孔粒子30可將膜層20的複數微孔201堵塞,從而可避免基體10通過所述複數微孔201與外界接觸而發生腐蝕的情況,進而提高了鍍膜件100的耐腐蝕性能。The micropores 201 of the film layer 20 formed on the surface of the substrate 10 are subjected to immersion sealing treatment using a hole solution. The plugging liquid contains 40-60 g/L of NaCOOCH 3 , 10-20 g/L of HCOOCH 3 , 1-2 g/L of NH 3 ‧H 2 O, 2-8 g/L of NaSO 4 , 1-5 g /L of HNO 3 , and 2-6 g/L of NaTiF 4 . The plugging solution has a pH of 3-7. The temperature of the sealing liquid is kept at 20 to 30 ° C when sealing. The time for immersion sealing is 5~15s. During the sealing process, the sealing liquid is filled into the micropores 201 of the film layer 20; after the sealing is completed, the film layer 20 is rinsed and dried by deionized water, and after being dried, the filling into the micropores 201 is performed. The plugging liquid forms solidified plugging particles 30. The plugging particles 30 can block the plurality of micropores 201 of the film layer 20, thereby avoiding corrosion of the substrate 10 by contacting the plurality of micropores 201 with the outside, thereby improving the corrosion resistance of the coated member 100.
將通過上述方法製備的鍍膜件100放入鹽霧(3.5%NaCl,25℃)試驗箱進行測試,同時放入未做過封孔處理的鍍膜件做對比。沒有進行封孔處理的鍍膜件經8小時被腐蝕,經過上述封孔處理的鍍膜件100經60小時被腐蝕。The coated member 100 prepared by the above method was placed in a salt spray (3.5% NaCl, 25 ° C) test chamber for testing, and placed in a non-sealed coated coating for comparison. The coated member which was not subjected to the sealing treatment was etched for 8 hours, and the coated member 100 subjected to the above sealing treatment was etched for 60 hours.
100‧‧‧鍍膜件100‧‧‧coated parts
10‧‧‧基體10‧‧‧ base
20‧‧‧膜層20‧‧‧ film layer
201‧‧‧微孔201‧‧‧Micropores
30‧‧‧封孔粒子30‧‧‧Seal particle
圖1係本發明較佳實施例鍍膜件的結構示意圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing the structure of a coated member according to a preferred embodiment of the present invention.
圖2係本發明較佳實施例鍍膜件的製作方法的流程圖。2 is a flow chart showing a method of fabricating a coated member according to a preferred embodiment of the present invention.
100‧‧‧鍍膜件 100‧‧‧coated parts
10‧‧‧基體 10‧‧‧ base
20‧‧‧膜層 20‧‧‧ film layer
201‧‧‧微孔 201‧‧‧Micropores
30‧‧‧封孔粒子 30‧‧‧Seal particle
Claims (9)
提供一基體;
通過磁控濺射在基體表面形成一膜層;
使用一封孔液對所述膜層進行浸漬封孔處理。A method of fabricating a coated article according to any one of claims 1-3, comprising the steps of:
Providing a substrate;
Forming a film layer on the surface of the substrate by magnetron sputtering;
The film layer was subjected to an immersion sealing treatment using a hole solution.
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TWI426149B true TWI426149B (en) | 2014-02-11 |
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Citations (1)
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CN1986887A (en) * | 2006-12-21 | 2007-06-27 | 上海交通大学 | Preparing process of anticorrosive coating on surface of aluminium base composite material |
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CN1986887A (en) * | 2006-12-21 | 2007-06-27 | 上海交通大学 | Preparing process of anticorrosive coating on surface of aluminium base composite material |
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