TWI425012B - Preparation of Block Copolymer and Copolymer Precursor - Google Patents

Preparation of Block Copolymer and Copolymer Precursor Download PDF

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TWI425012B
TWI425012B TW100112691A TW100112691A TWI425012B TW I425012 B TWI425012 B TW I425012B TW 100112691 A TW100112691 A TW 100112691A TW 100112691 A TW100112691 A TW 100112691A TW I425012 B TWI425012 B TW I425012B
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group
alkyl group
repeating unit
alkyl
independently represent
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TW201204754A (en
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Takeshi Niitani
Yuichi Tateishi
Toshiaki Okado
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Nippon Soda Co
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04Acids; Metal salts or ammonium salts thereof
    • C08F220/06Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells

Description

嵌段共聚物之製造方法及共聚物前驅體 Method for producing block copolymer and copolymer precursor

本發明係關於一種用作顏料分散劑之新穎嵌段共聚物之製造方法、及新穎共聚物前驅體。本申請案係對2010年4月14日提出申請之日本國專利申請第2010-092952號主張優先權,將其內容引用至本文中。 This invention relates to a process for the manufacture of novel block copolymers useful as pigment dispersants, and novel copolymer precursors. The present application claims priority to Japanese Patent Application No. 2010-092952, filed on Apr. 14, 2010, the content of which is incorporated herein.

現已知有含有選自由具有三級胺基之重複單元及具有四級銨鹽基之重複單元所組成之群中之至少一種重複單元、具有聚氧伸烷基鏈之重複單元、及具有酸性基之重複單元的無規共聚物。 It is known to have at least one repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt group, a repeating unit having a polyoxyalkylene chain, and having an acidity a random copolymer of repeating units.

該等聚合物由於具有基於此特異結構之各種特性,故而於各領域獲得研究開發。 These polymers have been researched and developed in various fields because of their various properties based on this specific structure.

於專利文獻1中,該無規共聚物係應用於光微影領域。於專利文獻1中,具體而言,記載有由甲基丙烯酸、甲基丙烯酸二甲胺基乙酯、丙烯酸乙酯、及分子量為350之聚乙二醇單甲醚與甲基丙烯酸之酯化合物而獲得之共聚物等。該等係藉由使用偶氮雙異丁腈(AIBN)作為自由基起始劑,於甲基乙基酮溶劑中將各單體之混合溶液進行自由基聚合,製成無規共聚物而獲得。 In Patent Document 1, the random copolymer is applied to the field of photolithography. Patent Document 1 specifically describes an ester compound of methacrylic acid, dimethylaminoethyl methacrylate, ethyl acrylate, and polyethylene glycol monomethyl ether having a molecular weight of 350 and methacrylic acid. And the obtained copolymer and the like. These are obtained by radically polymerizing a mixed solution of each monomer in a methyl ethyl ketone solvent by using azobisisobutyronitrile (AIBN) as a radical initiator. .

又,於專利文獻2中,該無規共聚物係應用作塗料、油墨、建材等各領域之顏料分散劑。於專利文獻2中,具體而言,記載有苯乙烯10份、甲基丙烯酸甲酯15份、甲基丙烯酸乙酯15份、甲基丙烯酸20份、甲基丙烯酸十三烷基酯 10份、甲基丙烯酸聚乙二醇單甲醚(數量平均分子量400)20份、甲基丙烯酸二甲胺基乙酯10份之無規共聚物等。該等係藉由使用2,2'-偶氮雙(2,4-二甲基戊腈)作為自由基起始劑,於乙醇/甲醇=95/5之混合醇溶劑中將各單體之混合溶液進行自由基聚合,製成無規共聚物而獲得。 Further, in Patent Document 2, the random copolymer is used as a pigment dispersant in various fields such as paints, inks, and building materials. Patent Document 2 specifically describes 10 parts of styrene, 15 parts of methyl methacrylate, 15 parts of ethyl methacrylate, 20 parts of methacrylic acid, and tridecyl methacrylate. 10 parts, 20 parts of polyethylene glycol monomethyl ether methacrylate (number average molecular weight of 400), 10 parts of random copolymer of dimethylaminoethyl methacrylate, and the like. These are obtained by using 2,2'-azobis(2,4-dimethylvaleronitrile) as a radical initiator in a mixed alcohol solvent of ethanol/methanol=95/5. The mixed solution was subjected to radical polymerization to obtain a random copolymer.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利特開平6-128336 Patent Document 1: Japanese Patent Laid-Open No. 6-128336

專利文獻2:日本專利特開2009-24165 Patent Document 2: Japanese Patent Special Open 2009-24165

近年來,共聚物之用途多樣化,要求具有各種特性之共聚物。 In recent years, the use of copolymers has been diversified, and copolymers having various properties have been demanded.

例如於彩色液晶顯示裝置領域,由於可見光之高穿透率化與高對比度化之要求增強,顏料粒子被微粒子化至至少可見光之波長以下。此種微粒子中,顏料粒子之比表面積變得大於通常,故而於先前使用至今之顏料分散劑用之共聚物中,初始之顏料分散性及隨時間經過之分散穩定性不充分。又,最近對分散性能以外亦要求高性能,但先前之共聚物無法獲得充分之性能。 For example, in the field of color liquid crystal display devices, since the requirements for high transmittance and high contrast of visible light are enhanced, the pigment particles are micronized to at least the wavelength of visible light. In such fine particles, the specific surface area of the pigment particles becomes larger than usual, and thus the copolymer for the pigment dispersant which has been used up to now, the initial pigment dispersibility and the dispersion stability over time are insufficient. Moreover, high performance has recently been demanded in addition to dispersion properties, but previous copolymers have not been able to obtain sufficient performance.

為了獲得滿足上述性能之共聚物,發明者等人需製造含有下述嵌段鏈(A)、(B1)之嵌段共聚物:包含含有選自由具有三級胺基之重複單元及具有四級銨鹽基之重複單元所組成之群中之至少一種重複單元之聚合物的嵌段鏈(A)、 包含含有具有聚氧伸烷基鏈之重複單元及式(II)所表示之具有酸性基之重複單元之共聚物的嵌段鏈(B1)。 In order to obtain a copolymer satisfying the above properties, the inventors of the present invention need to produce a block copolymer comprising the following block chains (A) and (B1) comprising containing a repeating unit selected from the group consisting of a tertiary amino group and having four stages. a block chain (A) of a polymer of at least one repeating unit of a group consisting of repeating units of an ammonium salt group, A block chain (B1) comprising a copolymer having a repeating unit having a polyoxyalkylene chain and a repeating unit having an acidic group represented by the formula (II).

但是,製造含有此種結構之嵌段共聚物之方法尚屬未知。 However, a method of producing a block copolymer containing such a structure is not known.

本發明者等人發現了含有下述嵌段鏈(A)、(B)之共聚物前驅體可成為嵌段共聚物之有用之中間產物:包含含有選自由具有三級胺基之重複單元及具有四級銨鹽基之重複單元所組成之群中之至少一種重複單元之聚合物的嵌段鏈(A)、包含含有具有聚氧伸烷基鏈之重複單元及式(I)所表示之重複單元之共聚物的嵌段鏈(B)。 The present inventors have found that a copolymer precursor containing the following block chains (A) and (B) can be a useful intermediate product of a block copolymer comprising containing a repeating unit selected from the group consisting of a tertiary amine group and a block chain (A) of a polymer having at least one repeating unit of a group consisting of repeating units of a quaternary ammonium salt group, comprising a repeating unit having a polyoxyalkylene chain and a formula (I) The block chain (B) of the copolymer of the repeating unit.

發現藉由加熱該共聚物前驅體,將式(I)所表示之重複單元轉化為式(II)所表示之具有酸性基之重複單元,藉此可製造目標之嵌段共聚物,從而完成本發明。 It is found that by heating the copolymer precursor, the repeating unit represented by the formula (I) is converted into a repeating unit having an acidic group represented by the formula (II), whereby the target block copolymer can be produced, thereby completing the present invention. invention.

即,本發明係關於如下者:(1)一種嵌段共聚物之製造方法,該嵌段共聚物係含有嵌段鏈(A)及包含含有具有聚氧伸烷基鏈之重複單元及式(II)所表示之具有酸性基之重複單元之共聚物的嵌段鏈(B1)者,該方法之特徵在於加熱下述含有嵌段鏈(A)與嵌段鏈(B)之共聚物前驅體:包含含有選自由具有三級胺基之重複單元及具有四級銨鹽基之重複單元所組成之群中之至少一種重複單元之聚合物的嵌段鏈(A)、包含含有具有聚氧伸烷基鏈之重複單元及式(I)所表示之具有經保護之酸性基之重複單元之共聚物的嵌段鏈(B), (式中,R1、R2、R3分別獨立表示氫原子或C1~C3烷基;X表示單鍵或選自由C1~C10伸烷基、-C(=O)OR1a-、-C(=O)NHR1a-、-OC(=O)R1a-及-R2a-OC(=O)R1a-所組成之群中之基(R1a、R2a分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*),R4表示氫原子、C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基,R5表示C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基;*表示鍵結位置) That is, the present invention relates to (1) a method for producing a block copolymer comprising a block chain (A) and comprising a repeating unit having a polyoxyalkylene chain and a formula ( II) The block chain (B1) of the copolymer of the repeating unit having an acidic group represented by the method, characterized in that the following copolymer precursor containing the block chain (A) and the block chain (B) is heated a block chain (A) comprising a polymer comprising at least one repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt group, comprising a polyoxyl extension a repeating unit of an alkyl chain and a block chain (B) of a copolymer of a repeating unit having a protected acidic group represented by the formula (I), Wherein R 1 , R 2 and R 3 each independently represent a hydrogen atom or a C1 to C3 alkyl group; X represents a single bond or is selected from a C1 to C10 alkyl group, -C(=O)OR 1a -, -C (=O) NHR 1a -, -OC(=O)R 1a - and -R 2a -OC(=O)R 1a - the group in the group (R 1a , R 2a independently represent C1~C10 extension Alkyl or *C1~C10 alkylene-O-C1~C10 alkylene group *), R 4 represents a hydrogen atom, C1~C6 alkyl group, C6~C10 aryl C1~C6 alkyl group*, or C6~C10 Aryl group, R 5 represents a C1~C6 alkyl group, a C6~C10 aryl C1~C6 alkyl group*, or a C6~C10 aryl group; * represents a bonding position)

(式中,R1、R2、R3、X表示與式(I)相同之含義);(2)如(1)之嵌段共聚物之製造方法,其中上述嵌段鏈(B)及(B1)更含有式(III)所表示之重複單元, (式中,R6、R7、R8分別獨立表示氫原子或C1~C3烷基,R9表示C1~C10烷基或C6~C10芳基C1~C6烷基*;*表示鍵結位置);(3)如(1)或(2)之嵌段共聚物之製造方法,其中上述具有三級胺基之重複單元為下述式(IV)所表示之重複單元, (式中,R10、R11、R12分別獨立表示氫原子或C1~C3烷基;Y表示選自由C1~C10伸烷基、-C(=O)OR1b-、-C(=O)NHR1b-、-OC(=O)R1b-及-R2b-OC(=O)R1b-所組成之群中之基(R1b、R2b分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*),R13、R14分別獨立表示C1~C6烷基或C6~C10芳基C1~C6烷基*;*表示鍵結位置);(4)如(1)或(2)之嵌段共聚物之製造方法,其中上述具有四級銨鹽基之重複單元為下述式(V)所表示之重複單元, (式中,R15、R16、R17分別獨立表示氫原子或C1~C3烷基;Y1表示選自由C1~C10伸烷基、-C(=O)OR1c-、-C(=O)NHR1c- 、-OC(=O)R1c-及-R2c-OC(=O)R1c-所組成之群中之基(R1c、R2c分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*),R18、R19、R20分別獨立表示C1~C6之烷基或C6~C10芳基C1~C6烷基*;Z-表示抗衡離子;*表示鍵結位置);(5)如(1)至(4)中任一項之嵌段共聚物之製造方法,其中上述具有聚氧伸烷基鏈之重複單元係以下述式(VI)表示, (式中,R21、R22、R23分別獨立表示氫原子或C1~C3烷基;Z1表示選自由-C(=O)O-、-C(=O)NH-、-OC(=O)-及-R1d-OC(=O)-所組成之群中之基(R1d表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*;*表示鍵結位置),R24表示C2~C4伸烷基,R25表示氫原子或C1~C6烷基,m表示2~150中之任一整數,R24O彼此可相同,亦可不同);及(6)如(1)至(5)中任一項之嵌段共聚物之製造方法,其係於二醇醚酯系溶劑與醇系溶劑之混合溶劑、或二醇醚酯系溶劑與水之混合溶劑中進行。 (wherein R 1 , R 2 , R 3 and X represent the same meanings as in the formula (I)); (2) a method for producing a block copolymer according to (1), wherein the block chain (B) and (B1) further contains a repeating unit represented by formula (III), (wherein R 6 , R 7 and R 8 each independently represent a hydrogen atom or a C1 to C3 alkyl group, R 9 represents a C1 to C10 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group*; * represents a bonding position (3) The method for producing a block copolymer according to (1) or (2), wherein the repeating unit having a tertiary amino group is a repeating unit represented by the following formula (IV), (wherein R 10 , R 11 and R 12 each independently represent a hydrogen atom or a C1 to C3 alkyl group; Y represents an alkyl group selected from C1 to C10, -C(=O)OR 1b -, -C(=O) NHR 1b -, -OC(=O)R 1b - and -R 2b -OC(=O)R 1b - a group of groups (R 1b , R 2b independently represent a C1 to C10 alkyl group or *C1~C10 alkylene-O-C1~C10 alkylene group *), R 13 and R 14 each independently represent C1~C6 alkyl group or C6~C10 aryl C1~C6 alkyl group*; * indicates bonding position (4) The method for producing a block copolymer according to (1) or (2), wherein the repeating unit having a quaternary ammonium salt group is a repeating unit represented by the following formula (V), Wherein R 15 , R 16 and R 17 each independently represent a hydrogen atom or a C1 to C3 alkyl group; Y 1 represents an alkyl group selected from C1 to C10, -C(=O)OR 1c -, -C(= O) NHR 1c - , -OC(=O)R 1c - and -R 2c -OC(=O)R 1c - the group in the group (R 1c , R 2c independently represent C1~C10 alkyl) Or *C1~C10 alkyl-O-C1~C10 alkyl]*, R 18 , R 19 and R 20 each independently represent a C1~C6 alkyl group or a C6~C10 aryl C1~C6 alkyl group*; Z - represents a counter ion; * represents a bonding position); (5) (1) through (4) a method for producing a block copolymer of any one of, wherein said polyoxyalkylene-based repeating unit having alkylene chains Expressed by the following formula (VI), Wherein R 21 , R 22 and R 23 each independently represent a hydrogen atom or a C1 to C3 alkyl group; and Z 1 represents a group selected from -C(=O)O-, -C(=O)NH-, -OC( =O)- and -R 1d -OC(=O)- groups in the group (R 1d represents C1~C10 alkyl or *C1~C10 alkyl-O-C1~C10 alkyl) ; * represents a bonding position), R 24 represents a C2 ~ C4 alkylene, R 25 represents a hydrogen atom or a C1 ~ C6 alkyl group, m represents any integer of 2 to 150, R 24 O may be identical to each other, may (6) The method for producing a block copolymer according to any one of (1) to (5), which is a mixed solvent of a glycol ether ester solvent and an alcohol solvent, or a glycol ether ester It is carried out in a mixed solvent of a solvent and water.

又,本發明係關於如下者:(7)一種共聚物前驅體,其特徵在於含有:包含含有選自由具有三級胺基之重複單元及具有四級銨鹽基之重複單元所組成之群中之至少一種重複單元之聚合物的嵌段鏈(A)、 包含含有具有聚氧伸烷基鏈之重複單元及式(I)所表示之具有經保護之酸性基之重複單元之共聚物的嵌段鏈(B), (式中,R1、R2、R3分別獨立表示氫原子或C1~C3烷基;X表示單鍵或選自由C1~C10伸烷基、-C(=O)OR1a-、-C(=O)NHR1a-、-OC(=O)R1a-及-R2a-OC(=O)R1a-所組成之群中之基(R1a、R2a分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*),R4表示氫原子、C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基,R5表示C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基;*表示鍵結位置);(8)如(7)之共聚物前驅體,其中上述嵌段鏈(B)更含有下述式(III)所表示之重複單元, (式中,R6、R7、R8分別獨立表示氫原子或C1~C3烷基,R9表示C1~C10烷基或C6~C10芳基C1~C6烷基*;*表示鍵結位置); (9)如(7)或(8)之共聚物前驅體,其中上述具有三級胺基之重複單元為下述式(IV)所表示之重複單元, (式中,R10、R11、R12分別獨立表示氫原子或C1~C3烷基;Y表示選自由C1~C10伸烷基、-C(=O)OR1b-、-C(=O)NHR1b-、-OC(=O)R1b-及-R2b-OC(=O)R1b-所組成之群中之基(R1b、R2b分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*),R13、R14分別獨立表示C1~C6烷基、或C6~C10芳基C1~C6烷基*;*表示鍵結位置);(10)如(7)或(8)之共聚物前驅體,其中上述具有四級銨鹽基之重複單元為下述式(V)所表示之重複單元, (式中,R15、R16、R17分別獨立表示氫原子或C1~C3烷基;Y1表示選自由C1~C10伸烷基、-C(=O)OR1c-、-C(=O)NHR1c-、-OC(=O)R1c-及-R2c-OC(=O)R1c-所組成之群中之基(R1c、R2c分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O- C1~C10伸烷基*),R18、R19、R20分別獨立表示C1~C6之烷基、或C6~C10芳基C1~C6烷基*;Z-表示抗衡離子;*表示鍵結位置);(11)如(7)至(10)中任一項之共聚物前驅體,其中上述具有聚氧伸烷基鏈之重複單元係以下述式(VI)表示, (式中,R21、R22、R23分別獨立表示氫原子或C1~C3烷基;Z1表示選自由-C(=O)O-、-C(=O)NH-、-OC(=O)-及-R1d-OC(=O)-所組成之群中之基(R1d表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*;*表示鍵結位置),R24表示C2~C4伸烷基,R25表示氫原子或C1~C6烷基,m表示2~150中之任一整數,R24O彼此可相同,亦可不同)。 Further, the present invention relates to the following: (7) A copolymer precursor comprising: a group comprising a repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a quaternary ammonium salt group; a block chain (A) of a polymer of at least one repeating unit, a copolymer comprising a copolymer comprising a repeating unit having a polyoxyalkylene chain and a repeating unit having a protected acidic group represented by the formula (I) Segment chain (B), Wherein R 1 , R 2 and R 3 each independently represent a hydrogen atom or a C1 to C3 alkyl group; X represents a single bond or is selected from a C1 to C10 alkyl group, -C(=O)OR 1a -, -C (=O) NHR 1a -, -OC(=O)R 1a - and -R 2a -OC(=O)R 1a - the group in the group (R 1a , R 2a independently represent C1~C10 extension Alkyl or *C1~C10 alkylene-O-C1~C10 alkylene group *), R 4 represents a hydrogen atom, C1~C6 alkyl group, C6~C10 aryl C1~C6 alkyl group*, or C6~C10 An aryl group, R 5 represents a C1 to C6 alkyl group, a C6-C10 aryl C1 to C6 alkyl group*, or a C6-C10 aryl group; * represents a bonding position); (8) a copolymer precursor such as (7) Wherein the above block chain (B) further contains a repeating unit represented by the following formula (III), (wherein R 6 , R 7 and R 8 each independently represent a hydrogen atom or a C1 to C3 alkyl group, R 9 represents a C1 to C10 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group*; * represents a bonding position (9) The copolymer precursor according to (7) or (8), wherein the above repeating unit having a tertiary amino group is a repeating unit represented by the following formula (IV), (wherein R 10 , R 11 and R 12 each independently represent a hydrogen atom or a C1 to C3 alkyl group; Y represents an alkyl group selected from C1 to C10, -C(=O)OR 1b -, -C(=O) NHR 1b -, -OC(=O)R 1b - and -R 2b -OC(=O)R 1b - a group of groups (R 1b , R 2b independently represent a C1 to C10 alkyl group or *C1~C10 alkylene-O-C1~C10 alkylene group*), R 13 and R 14 each independently represent C1~C6 alkyl group or C6~C10 aryl C1~C6 alkyl group*; * indicates bonding (10) The copolymer precursor of (7) or (8), wherein the above repeating unit having a quaternary ammonium salt group is a repeating unit represented by the following formula (V), Wherein R 15 , R 16 and R 17 each independently represent a hydrogen atom or a C1 to C3 alkyl group; Y 1 represents an alkyl group selected from C1 to C10, -C(=O)OR 1c -, -C(= O) NHR 1c -, -OC(=O)R 1c - and -R 2c -OC(=O)R 1c - groups in the group (R 1c , R 2c independently represent C1 to C10 alkylene groups) Or *C1~C10 alkyl-O-C1~C10 alkyl]*, R 18 , R 19 and R 20 each independently represent a C1~C6 alkyl group or a C6~C10 aryl C1~C6 alkyl group* ; Z - represents a counter ion; * represents a bonding position); (11) (7) to (10) according to any one of the precursor copolymer, wherein said repeating units having a polyoxyethylene-based alkyl chain extending of the following Formula (VI), Wherein R 21 , R 22 and R 23 each independently represent a hydrogen atom or a C1 to C3 alkyl group; and Z 1 represents a group selected from -C(=O)O-, -C(=O)NH-, -OC( =O)- and -R 1d -OC(=O)- groups in the group (R 1d represents C1~C10 alkyl or *C1~C10 alkyl-O-C1~C10 alkyl) ; * represents a bonding position), R 24 represents a C2 ~ C4 alkylene, R 25 represents a hydrogen atom or a C1 ~ C6 alkyl group, m represents any integer of 2 to 150, R 24 O may be identical to each other, may different).

(1)共聚物前驅體 (1) Copolymer precursor

本發明之共聚物前驅體分別含有至少一種之以下嵌段鏈(A)及嵌段鏈(B)。 The copolymer precursors of the present invention each contain at least one of the following block chain (A) and block chain (B).

嵌段鏈(A):含有選自由具有三級胺基之重複單元及具有四級銨鹽基之重複單元所組成之群中之至少一種重複單元的聚合物 Block chain (A): a polymer containing at least one repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt group

嵌段鏈(B):含有具有聚氧伸烷基鏈之重複單元與具有經保護之酸性基之重複單元的共聚物 Block chain (B): a copolymer containing a repeating unit having a polyoxyalkylene chain and a repeating unit having a protected acidic group

又,本發明之共聚物前驅體除上述嵌段鏈(A)及嵌段鏈(B)以外亦可含有其他嵌段鏈。 Further, the copolymer precursor of the present invention may contain other block chains in addition to the block chain (A) and the block chain (B).

1)嵌段鏈(A) 1) Block chain (A)

於嵌段鏈(A)中,所謂具有三級胺基之重複單元及具有四級銨鹽基之重複單元,只要為於重複單元之側鏈具有上述陽離子性官能基者,則並無特別限制。 In the block chain (A), the repeating unit having a tertiary amino group and the repeating unit having a quaternary ammonium salt group are not particularly limited as long as they have the above cationic functional group in the side chain of the repeating unit. .

具體而言,嵌段鏈(A)之聚合物包含:僅包含一種具有三級胺基之重複單元或具有四級銨鹽基之重複單元的均聚物、包含兩種以上具有三級胺基之重複單元或具有四級銨鹽基之重複單元的共聚物、包含至少一種具有三級胺基之重複單元及至少一種具有四級銨鹽基之重複單元的共聚物、及該等與源自其他可共聚合之單體之重複單元的共聚物。共聚物包括無規、交替、嵌段等之共聚物。 Specifically, the polymer of the block chain (A) comprises: a homopolymer comprising only one repeating unit having a tertiary amino group or a repeating unit having a quaternary ammonium salt group, and containing two or more kinds of tertiary amino groups. a repeating unit or a copolymer having a repeating unit of a quaternary ammonium salt group, a copolymer comprising at least one repeating unit having a tertiary amino group, and at least one repeating unit having a quaternary ammonium salt group, and the Copolymers of repeating units of other copolymerizable monomers. Copolymers include copolymers of random, alternating, block, and the like.

(具有三級胺基之重複單元) (repeating unit having a tertiary amino group)

作為上述具有三級胺基之重複單元,只要具有三級胺基,則並無特別限制,例如可例示下述通式(IV)所表示之重複單元。 The repeating unit having a tertiary amino group is not particularly limited as long as it has a tertiary amino group, and examples thereof include a repeating unit represented by the following formula (IV).

式(IV)中,R10、R11、R12分別獨立為氫原子或C1~C3烷基。Y表示選自由C1~C10伸烷基、-C(=O)OR1b-、-C(=O)NHR1b- 、-OC(=O)R1b-及-R2b-OC(=O)R1b-所組成之群中之基(R1b、R2b分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*)。R13、R14分別獨立為C1~C6烷基、或C6~C10芳基C1~C6烷基*;*表示鍵結位置。 In the formula (IV), R 10 , R 11 and R 12 each independently represent a hydrogen atom or a C1 to C3 alkyl group. Y represents a group selected from C1 to C10 alkyl, -C(=O)OR 1b -, -C(=O)NHR 1b - , -OC(=O)R 1b - and -R 2b -OC(=O) R 1b - a group in the group consisting of R 1b and R 2b independently represent a C1~C10 alkyl group or a *C1~C10 alkyl group-O-C1~C10 alkyl group*). R 13 and R 14 are each independently a C1 to C6 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group*; * represents a bonding position.

此處,作為C1~C3烷基及C1~C6烷基,可例示:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、正己基等。 Here, as the C1 to C3 alkyl group and the C1 to C6 alkyl group, methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, isobutyl, and t-butyl groups are exemplified. , n-pentyl, n-hexyl and so on.

作為C1~C10伸烷基,可例示:亞甲基鏈、伸乙基鏈、伸丙基鏈、甲基伸乙基鏈、伸丁基鏈、1,2-二甲基伸乙基鏈、伸戊基鏈、1-甲基伸丁基鏈、2-甲基伸丁基鏈或伸己基鏈等。 As the C1 to C10 alkylene group, a methylene chain, an ethylidene chain, a propyl group, a methyl group, an ethyl group, a butyl group, a 1,2-dimethyl group, and a methyl group can be exemplified. Base chain, 1-methyl butyl butyl chain, 2-methyl butyl butyl chain or hexyl chain.

作為C6~C10芳基C1~C6烷基*,可例示:苄基、苯乙基、3-苯基正丙基、1-苯基正己基、萘-1-基甲基、萘-2-基乙基、1-萘-2-基正丙基、茚-1-基甲基等。 As the C6-C10 aryl C1~C6 alkyl group*, benzyl, phenethyl, 3-phenyl-n-propyl, 1-phenyl-n-hexyl, naphthalen-1-ylmethyl, naphthalene-2- can be exemplified. Ethyl ethyl, 1-naphthalen-2-yl-n-propyl, dec-1-ylmethyl and the like.

作為成為式(IV)所表示之重複單元之原料的單體,可例示:(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸二甲基胺基丙酯、(甲基)丙烯酸二甲基胺基丁酯、(甲基)丙烯酸二乙基胺基乙酯、(甲基)丙烯酸二乙基胺基丙酯、(甲基)丙烯酸二乙基胺基丁酯等。 Examples of the monomer which is a raw material of the repeating unit represented by the formula (IV) include dimethylaminoethyl (meth)acrylate, dimethylaminopropyl (meth)acrylate, and (methyl). Dimethylaminobutyl acrylate, diethylaminoethyl (meth)acrylate, diethylaminopropyl (meth)acrylate, diethylaminobutyl (meth)acrylate, and the like.

(具有四級銨鹽基之重複單元) (repeating unit having a quaternary ammonium salt group)

作為上述具有四級銨鹽基之重複單元,只要具有四級銨鹽基,則並無特別限制,例如可例示下述通式(V)所表示之重複單元。 The repeating unit having a quaternary ammonium salt group is not particularly limited as long as it has a quaternary ammonium salt group, and examples thereof include a repeating unit represented by the following formula (V).

[化13] [Chemistry 13]

式(V)中,R15、R16、R17分別獨立為氫原子或C1~C3烷基。Y1為選自由C1~C10伸烷基、-C(=O)OR1c-、-C(=O)NHR1c-、-OC(=O)R1c-及-R2c-OC(=O)R1c-所組成之群中之基(R1c、R2c分別獨立為C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*)。R18、R19、R20分別獨立為C1~C6之烷基、或C6~C10芳基C1~C6烷基*;*表示鍵結位置。Z-表示鹵化物離子、鹵化烷離子、烷基羧酸根離子、氮氧化物離子、烷基硫酸根離子、磺酸根離子、磷酸根離子或烷基磷酸根離子等抗衡離子。 In the formula (V), R 15 , R 16 and R 17 each independently represent a hydrogen atom or a C1 to C3 alkyl group. Y 1 is selected from C1 to C10 alkyl, -C(=O)OR 1c -, -C(=O)NHR 1c -, -OC(=O)R 1c - and -R 2c -OC(=O R 1c - a group in the group (R 1c and R 2c are each independently a C1 to C10 alkyl group or a *C1 to C10 alkyl group - O-C1 to C10 alkyl group *). R 18 , R 19 and R 20 are each independently a C1 to C6 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group*; * represents a bonding position. Z - represents a counter ion such as a halide ion, a halogenated alkane ion, an alkylcarboxylate ion, an oxynitride ion, an alkylsulfate ion, a sulfonate ion, a phosphate ion or an alkyl phosphate ion.

此處,C1~C3烷基、C1~C6之烷基、C1~C10伸烷基、及C6~C10芳基C1~C6烷基*可例示與上述具有三級胺基之重複單元之式(IV)相同者。 Here, the C1 to C3 alkyl group, the C1 to C6 alkyl group, the C1 to C10 alkylene group, and the C6 to C10 aryl C1 to C6 alkyl group * can be exemplified by the above-mentioned repeating unit having a tertiary amino group ( IV) the same.

作為成為式(V)所表示之重複單元之原料的單體,可例示:(甲基)丙烯醯氧基乙基三甲基氟化銨、(甲基)丙烯醯氧基乙基三甲基氯化銨、(甲基)丙烯醯氧基乙基三甲基溴化銨、(甲基)丙烯醯氧基乙基三甲基碘化銨、(甲基)丙烯醯氧基丙基三甲基氟化銨、(甲基)丙烯醯氧基丙基三甲基氯化銨、(甲基)丙烯醯氧基丙基三甲基溴化銨、(甲基)丙烯醯氧基丙基三甲基碘化銨、(甲基)丙烯醯氧基丁基三甲基氟化銨、(甲基)丙烯醯氧基丁基三甲基氯化銨、(甲基) 丙烯醯氧基丁基三甲基溴化銨、(甲基)丙烯醯氧基丁基三甲基碘化銨等。 The monomer which is a raw material of the repeating unit represented by the formula (V) is exemplified by (meth)acryloxyethyltrimethylammonium fluoride and (meth)acryloxyethyltrimethylmethyl group. Ammonium chloride, (meth) propylene oxiranyl ethyl trimethyl ammonium bromide, (meth) propylene oxiranyl ethyl trimethyl ammonium iodide, (meth) propylene methoxy propyl trimethyl Ammonium fluoride, (meth) propylene methoxy propyl trimethyl ammonium chloride, (meth) propylene methoxy propyl trimethyl ammonium bromide, (meth) propylene methoxy propyl three Ammonium methyl iodide, (meth) propylene oxy butyl trimethyl ammonium fluoride, (meth) propylene methoxy butyl trimethyl ammonium chloride, (methyl) Propylene methoxy butyl trimethyl ammonium bromide, (meth) propylene methoxy butyl trimethyl ammonium iodide, and the like.

(其他可含有之重複單元) (other repeatable units that can be included)

作為嵌段鏈(A)中之其他可含有之重複單元,可例示源自(甲基)丙烯酸系單體、芳香族乙烯基系單體、共軛二烯系單體等之重複單元。 The repeating unit which may be contained in the block chain (A) is a repeating unit derived from a (meth)acrylic monomer, an aromatic vinyl monomer, a conjugated diene monomer, or the like.

作為成為上述重複單元之原料的(甲基)丙烯酸系單體、芳香族乙烯基系單體、共軛二烯系單體,可例示如下者。 The (meth)acrylic monomer, the aromatic vinyl monomer, and the conjugated diene monomer which are the raw materials of the above-mentioned repeating unit can be exemplified as follows.

作為(甲基)丙烯酸系單體,可例示:(甲基)丙烯酸;(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸1-乙基環己酯、(甲基)丙烯酸苄酯等(甲基)丙烯酸酯化合物;(甲基)丙烯酸2-甲氧基乙酯、甲氧基聚乙二醇(乙二醇之單元數為2~100)(甲基)丙烯酸酯、乙氧基聚乙二醇(甲基)丙烯酸酯、苯氧基聚乙二醇(甲基)丙烯酸酯等,該等可單獨使用一種,或混合使用兩種以上。 Examples of the (meth)acrylic monomer include (meth)acrylic acid; methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, and (meth)acrylic acid. Propyl ester, n-butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate, hexyl (meth)acrylate, Glycidyl methacrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 1-ethylcyclohexyl (meth) acrylate, benzyl (meth) acrylate, etc. (Meth) acrylate compound; 2-methoxyethyl (meth) acrylate, methoxy polyethylene glycol (ethylene glycol unit number is 2 to 100) (meth) acrylate, ethoxylate Polyethylene glycol (meth) acrylate, phenoxy polyethylene glycol (meth) acrylate, etc. may be used alone or in combination of two or more.

作為芳香族乙烯基系單體,可舉出:苯乙烯、鄰甲基苯乙烯、對甲基苯乙烯、對第三丁基苯乙烯、α-甲基苯乙烯、對第三丁氧基苯乙烯、間第三丁氧基苯乙烯、對(1-乙氧基乙氧基)苯乙烯、2,4-二甲基苯乙烯、乙烯基苯胺、乙烯基苯甲酸、乙烯基萘、乙烯基蒽、2-乙烯基吡啶、4-乙 烯基吡啶、2-乙烯基喹啉、4-乙烯基喹啉、2-乙烯基噻吩、4-乙烯基噻吩等雜芳基化合物等,該等可單獨使用一種,或混合使用兩種以上。 Examples of the aromatic vinyl monomer include styrene, o-methyl styrene, p-methyl styrene, p-tert-butyl styrene, α-methyl styrene, and p-t-butoxybenzene. Ethylene, m-butoxystyrene, p-(1-ethoxyethoxy)styrene, 2,4-dimethylstyrene, vinylaniline, vinylbenzoic acid, vinylnaphthalene, vinyl Bismuth, 2-vinylpyridine, 4-B A heteroaryl compound such as an alkenylpyridine, a 2-vinylquinoline, a 4-vinylquinoline, a 2-vinylthiophene or a 4-vinylthiophene, which may be used alone or in combination of two or more.

作為共軛二烯系單體,可舉出:1,3-丁二烯、異戊二烯、2-乙基-1,3-丁二烯、2-第三丁基-1,3-丁二烯、2-苯基-1,3-丁二烯、2,3-二甲基-1,3-丁二烯、1,3-戊二烯、2-甲基-1,3-戊二烯、3-甲基-1,3-戊二烯、1,3-己二烯、2-甲基-1,3-辛二烯、4,5-二乙基-1,3-辛二烯、3-丁基-1,3-辛二烯、1,3-環戊二烯、1,3-環己二烯、1,3-環辛二烯、1,3-三環癸二烯、月桂烯、氯丁二烯等,該等可單獨使用一種,或混合使用兩種以上。 Examples of the conjugated diene monomer include 1,3-butadiene, isoprene, 2-ethyl-1,3-butadiene, and 2-tert-butyl-1,3- Butadiene, 2-phenyl-1,3-butadiene, 2,3-dimethyl-1,3-butadiene, 1,3-pentadiene, 2-methyl-1,3- Pentadiene, 3-methyl-1,3-pentadiene, 1,3-hexadiene, 2-methyl-1,3-octadiene, 4,5-diethyl-1,3- Octadiene, 3-butyl-1,3-octadiene, 1,3-cyclopentadiene, 1,3-cyclohexadiene, 1,3-cyclooctadiene, 1,3-tricyclo The decadiene, the myrcene, the chloroprene, etc. may be used alone or in combination of two or more.

2)嵌段鏈(B) 2) Block chain (B)

嵌段鏈(B)係含有至少一種具有聚氧伸烷基鏈之重複單元與至少一種具有酸性基之重複單元的共聚物。 The block chain (B) is a copolymer containing at least one repeating unit having a polyoxyalkylene chain and at least one repeating unit having an acidic group.

共聚物包括無規、交替、嵌段等之共聚物。 Copolymers include copolymers of random, alternating, block, and the like.

(含有聚氧伸烷基鏈之重複單元) (repeating unit containing a polyoxyalkylene chain)

作為嵌段鏈(B)中之具有聚氧伸烷基鏈之重複單元,只要具有聚氧伸烷基鏈,則並無特別限制,例如可例示式(VI)所表示之重複單元。 The repeating unit having a polyoxyalkylene chain in the block chain (B) is not particularly limited as long as it has a polyoxyalkylene chain, and for example, a repeating unit represented by the formula (VI) can be exemplified.

式(VI)中,R21、R22、R23分別獨立為氫原子或C1~C3烷 基。Z1為選自由-C(=O)O-、-C(=O)NH-、-OC(=O)-及-R1d-OC(=O)-所組成之群中之基(R1d為C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*;*表示鍵結位置)。R24表示C2~C4伸烷基,R25表示氫原子或C1~C6烷基。m表示2~150中之任一整數,R24O彼此可相同,亦可不同。 In the formula (VI), R 21 , R 22 and R 23 each independently represent a hydrogen atom or a C1 to C3 alkyl group. Z 1 is a group selected from the group consisting of -C(=O)O-, -C(=O)NH-, -OC(=O)-, and -R 1d -OC(=O)- (R 1d is C1 ~ C10 alkylene group or a C1 ~ C10 alkylene * -O-C1 ~ C10 alkylene group *; * represents a bonding position). R 24 represents a C2 to C4 alkylene group, and R 25 represents a hydrogen atom or a C1 to C6 alkyl group. m represents an integer of 2 to 150, and R 24 O may be the same or different.

此處,作為C1~C3烷基及C1~C6烷基,可例示:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、正己基等。 Here, as the C1 to C3 alkyl group and the C1 to C6 alkyl group, methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, isobutyl, and t-butyl groups are exemplified. , n-pentyl, n-hexyl and so on.

作為C2~C4伸烷基及C1~C10伸烷基,可例示:亞甲基鏈、伸乙基鏈、伸丙基鏈、甲基伸乙基鏈、伸丁基鏈、1,2-二甲基伸乙基鏈、伸戊基鏈、1-甲基伸丁基鏈、2-甲基伸丁基鏈、伸己基鏈等。 Examples of the C2~C4 alkylene group and the C1~C10 alkylene group include a methylene chain, an extended ethyl chain, a propyl chain, a methyl extended ethyl chain, a butyl chain, and a 1,2-dimethyl group. An ethyl chain, a pentyl chain, a 1-methyl butyl chain, a 2-methyl butyl chain, a hexyl chain, and the like are extended.

於上述式(VI)中,m較佳為2~10。 In the above formula (VI), m is preferably from 2 to 10.

作為成為式(VI)所表示重複單元之原料的單體,可舉出:聚乙二醇(2~150:表示式(VI)中之m之值,以下相同)(甲基)丙烯酸酯、聚(乙二醇(1~75)-丙二醇(1~75))(甲基)丙烯酸酯、聚丙二醇(2~150)(甲基)丙烯酸酯等,該等可分別單獨或混合使用兩種以上。 Examples of the monomer which is a raw material of the repeating unit represented by the formula (VI) include polyethylene glycol (2 to 150: a value of m in the formula (VI), the same applies hereinafter) (meth) acrylate, Poly(ethylene glycol (1~75)-propylene glycol (1~75)) (meth) acrylate, polypropylene glycol (2~150) (meth) acrylate, etc., which can be used alone or in combination. the above.

(具有經保護之酸性基之重複單元) (repeating unit with protected acidic group)

嵌段鏈(B)中之具有經保護之酸性基之重複單元係式(I)所表示之重複單元。 The repeating unit represented by the formula (I) having a protected acidic group in the block chain (B).

[化15] [化15]

式(I)中,R1、R2、R3分別獨立為氫原子或C1~C3烷基。X為單鍵或選自由C1~C10伸烷基、-C(=O)OR1a-、-C(=O)NHR1a-、-OC(=O)R1a-及-R2a-OC(=O)R1a-所組成之群中之基(R1a、R2a分別獨立為C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*),R4為氫原子、C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基,R5為C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基;*表示鍵結位置。 In the formula (I), R 1 , R 2 and R 3 each independently represent a hydrogen atom or a C1 to C3 alkyl group. X is a single bond or is selected from C1 to C10 alkyl, -C(=O)OR 1a -, -C(=O)NHR 1a -, -OC(=O)R 1a - and -R 2a -OC ( =O) R 1a - the group in the group (R 1a , R 2a are independently C1~C10 alkyl or *C1~C10 alkyl-O-C1~C10 alkyl)*, R 4 Is a hydrogen atom, a C1~C6 alkyl group, a C6~C10 aryl C1~C6 alkyl group*, or a C6~C10 aryl group, R 5 is a C1~C6 alkyl group, a C6~C10 aryl C1~C6 alkyl group*, Or C6~C10 aryl; * indicates the bonding position.

作為成為式(I)所表示之重複單元之原料的單體,可舉出:丙烯酸甲氧基甲酯、丙烯酸乙氧基甲酯、丙烯酸1-乙氧基乙酯、丙烯酸1-甲氧基乙酯、丙烯酸1-乙氧基丙酯、丙烯酸1-丙氧基乙酯、丙烯酸1-異丙氧基乙酯、丙烯酸1-苄氧基乙酯、2-甲基丙烯酸1-乙氧基乙酯、2-甲基丙烯酸1-甲氧基乙酯、2-甲基丙烯酸1-乙氧基丙酯、2-甲基丙烯酸1-丙氧基乙酯、2-甲基丙烯酸1-異丙氧基乙酯、2-甲基丙烯酸1-苄氧基乙酯等。該等中,較佳為丙烯酸1-乙氧基乙酯、2-甲基丙烯酸1-乙氧基乙酯。該等可單獨使用,或混合使用兩種以上。 Examples of the monomer which is a raw material of the repeating unit represented by the formula (I) include methoxymethyl acrylate, ethoxymethyl acrylate, 1-ethoxyethyl acrylate, and 1-methoxy acrylate. Ethyl ester, 1-ethoxypropyl acrylate, 1-propoxyethyl acrylate, 1-isopropoxyethyl acrylate, 1-benzyloxyethyl acrylate, 1-ethoxy methacrylate Ethyl ester, 2-methoxyethyl 2-methacrylate, 1-ethoxypropyl 2-methacrylate, 1-propoxyethyl 2-methacrylate, 1-iso- 2-methacrylate Propyloxyethyl ester, 2-benzyloxyethyl 2-methacrylate, and the like. Among these, 1-ethoxyethyl acrylate and 1-ethoxyethyl 2-methacrylate are preferred. These may be used singly or in combination of two or more.

具有經保護之酸性基之重複單元藉由本發明之製造方法將保護基脫保護,可轉化為以下所說明之具有酸性基之重複單元。 The repeating unit having a protected acidic group is deprotected by the production method of the present invention, and can be converted into a repeating unit having an acidic group as described below.

(其他可含有之重複單元) (other repeatable units that can be included)

作為嵌段鏈(B)中之其他可含有之重複單元,可例示源自(甲基)丙烯酸系單體、芳香族乙烯基系單體、共軛二烯系單體等之重複單元。 The repeating unit which may be contained in the block chain (B), a repeating unit derived from a (meth)acrylic monomer, an aromatic vinyl monomer, a conjugated diene monomer, etc. can be illustrated.

該等中,較佳為式(III)所表示之重複單元。 Among these, a repeating unit represented by the formula (III) is preferred.

式(III)中,R6、R7、R8分別獨立為氫原子或C1~C3烷基。R9為C1~C10烷基或C6~C10芳基C1~C6烷基*。 In the formula (III), R 6 , R 7 and R 8 each independently represent a hydrogen atom or a C1 to C3 alkyl group. R 9 is a C1 to C10 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group*.

此處,作為C1~C3烷基及C1~C6烷基,可例示:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、正己基等。 Here, as the C1 to C3 alkyl group and the C1 to C6 alkyl group, methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, isobutyl, and t-butyl groups are exemplified. , n-pentyl, n-hexyl and so on.

作為C6~C10芳基C1~C6烷基*,可例示:苄基、苯乙基、3-苯基正丙基、1-苯基正己基、萘-1-基甲基、萘-2-基乙基、1-(萘-2-基)正丙基、茚-1-基甲基等。 As the C6-C10 aryl C1~C6 alkyl group*, benzyl, phenethyl, 3-phenyl-n-propyl, 1-phenyl-n-hexyl, naphthalen-1-ylmethyl, naphthalene-2- can be exemplified. Ethyl ethyl, 1-(naphthalen-2-yl)-n-propyl, indol-1-ylmethyl and the like.

作為成為上述重複單元之原料的(甲基)丙烯酸系單體、芳香族乙烯基系單體、共軛二烯系單體,可例示如下者。 The (meth)acrylic monomer, the aromatic vinyl monomer, and the conjugated diene monomer which are the raw materials of the above-mentioned repeating unit can be exemplified as follows.

作為(甲基)丙烯酸系單體,可例示:(甲基)丙烯酸;(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯 酸1-乙基環己酯、(甲基)丙烯酸苄酯等(甲基)丙烯酸酯化合物;(甲基)丙烯酸2-甲氧基乙酯、甲氧基聚乙二醇(乙二醇之單元數為2~100)(甲基)丙烯酸酯、乙氧基聚乙二醇(甲基)丙烯酸酯、苯氧基聚乙二醇(甲基)丙烯酸酯等,該等可單獨使用一種,或混合使用兩種以上。 Examples of the (meth)acrylic monomer include (meth)acrylic acid; methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, and (meth)acrylic acid. Propyl ester, n-butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate, hexyl (meth)acrylate, Glycidyl methacrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, (meth) propylene a (meth) acrylate compound such as 1-ethylcyclohexyl acid or benzyl (meth) acrylate; 2-methoxyethyl (meth) acrylate or methoxy polyethylene glycol (ethylene glycol) The number of units is 2 to 100) (meth) acrylate, ethoxypolyethylene glycol (meth) acrylate, phenoxy polyethylene glycol (meth) acrylate, etc., and these may be used alone. Or use two or more kinds in combination.

作為芳香族乙烯基系單體,可舉出:苯乙烯、鄰甲基苯乙烯、對甲基苯乙烯、對第三丁基苯乙烯、α-甲基苯乙烯、對第三丁氧基苯乙烯、間第三丁氧基苯乙烯、對(1-乙氧基乙氧基)苯乙烯、2,4-二甲基苯乙烯、乙烯基苯胺、乙烯基苯甲酸、乙烯基萘、乙烯基蒽、2-乙烯基吡啶、4-乙烯基吡啶、2-乙烯基喹啉、4-乙烯基喹啉、2-乙烯基噻吩、4-乙烯基噻吩等雜芳基化合物等,該等可單獨使用一種,或混合使用兩種以上。 Examples of the aromatic vinyl monomer include styrene, o-methyl styrene, p-methyl styrene, p-tert-butyl styrene, α-methyl styrene, and p-t-butoxybenzene. Ethylene, m-butoxystyrene, p-(1-ethoxyethoxy)styrene, 2,4-dimethylstyrene, vinylaniline, vinylbenzoic acid, vinylnaphthalene, vinyl a heteroaryl compound such as hydrazine, 2-vinylpyridine, 4-vinylpyridine, 2-vinylquinoline, 4-vinylquinoline, 2-vinylthiophene or 4-vinylthiophene, etc. Use one type or a mixture of two or more types.

作為共軛二烯系單體,可舉出:1,3-丁二烯、異戊二烯、2-乙基-1,3-丁二烯、2-第三丁基-1,3-丁二烯、2-苯基-1,3-丁二烯、2,3-二甲基-1,3-丁二烯、1,3-戊二烯、2-甲基-1,3-戊二烯、3-甲基-1,3-戊二烯、1,3-己二烯、2-甲基-1,3-辛二烯、4,5-二乙基-1,3-辛二烯、3-丁基-1,3-辛二烯、1,3-環戊二烯、1,3-環己二烯、1,3-環辛二烯、1,3-三環癸二烯、月桂烯、氯丁二烯等,該等可單獨使用一種,或混合使用兩種以上。 Examples of the conjugated diene monomer include 1,3-butadiene, isoprene, 2-ethyl-1,3-butadiene, and 2-tert-butyl-1,3- Butadiene, 2-phenyl-1,3-butadiene, 2,3-dimethyl-1,3-butadiene, 1,3-pentadiene, 2-methyl-1,3- Pentadiene, 3-methyl-1,3-pentadiene, 1,3-hexadiene, 2-methyl-1,3-octadiene, 4,5-diethyl-1,3- Octadiene, 3-butyl-1,3-octadiene, 1,3-cyclopentadiene, 1,3-cyclohexadiene, 1,3-cyclooctadiene, 1,3-tricyclo The decadiene, the myrcene, the chloroprene, etc. may be used alone or in combination of two or more.

(共聚物中之嵌段鏈(A)、(B)以外之可含有之嵌段鏈) (block chains other than the block chain (A) and (B) in the copolymer)

本發明之共聚物除嵌段鏈(A)及(B)以外,亦可具有包含其他聚合物之嵌段鏈。 The copolymer of the present invention may have a block chain containing other polymers in addition to the block chains (A) and (B).

作為此種聚合物,可例示含有源自(甲基)丙烯酸系單體、芳香族乙烯基系單體、共軛二烯系單體等之重複單元的均聚物、無規共聚物、交替共聚物、嵌段共聚物等。 The polymer may, for example, be a homopolymer or a random copolymer containing a repeating unit derived from a (meth)acrylic monomer, an aromatic vinyl monomer, or a conjugated diene monomer. Copolymers, block copolymers, and the like.

關於(甲基)丙烯酸系單體、芳香族乙烯基系單體、共軛二烯系單體等,可例示與上述相同者。 The (meth)acrylic monomer, the aromatic vinyl monomer, the conjugated diene monomer, and the like can be exemplified as described above.

(共聚物中之嵌段鏈(A)與嵌段鏈(B)之比及分子量等物性) (The ratio of block chain (A) to block chain (B) in the copolymer and physical properties such as molecular weight)

本發明之共聚物中之嵌段鏈(A)與嵌段鏈(B)之比並無特別限制,以重量%比計,為10~40:90~60,較佳為15~35:85~65。 The ratio of the block chain (A) to the block chain (B) in the copolymer of the present invention is not particularly limited, and is 10 to 40: 90 to 60, preferably 15 to 35: 85 by weight%. ~65.

又,使用GPC(Gel Permeation Chromatography,凝膠滲透層析法)測得之重量平均分子量較佳為2,000~50,0000,更佳為2,000~20,000。作為共聚物前驅體尤佳為4,000~30,000,更佳為4,000~15,000。使用GPC測得之重量平約分子量與數量平均分子量之比為1.0~2.0,較佳為1.0~1.5。 Further, the weight average molecular weight measured by GPC (Gel Permeation Chromatography) is preferably 2,000 to 50,000, more preferably 2,000 to 20,000. The copolymer precursor is preferably from 4,000 to 30,000, more preferably from 4,000 to 15,000. The ratio of the weight-to-weight molecular weight to the number average molecular weight measured by GPC is 1.0 to 2.0, preferably 1.0 to 1.5.

(2)共聚物前驅體之製造方法 (2) Method for producing copolymer precursor

本發明之共聚物前驅體之製造方法並無特別限制,可藉由公知之方法製造,例如可藉由活性聚合使單體聚合而製成嵌段共聚物。作為活性聚合可舉出活性自由基聚合、活性陰離子聚合,其中更佳為活性陰離子聚合。 The method for producing the copolymer precursor of the present invention is not particularly limited, and it can be produced by a known method. For example, a monomer can be polymerized by living polymerization to form a block copolymer. The living polymerization may be carried out by living radical polymerization or living anionic polymerization, and more preferably, it is living anionic polymerization.

為了製成嵌段共聚物,可於聚合嵌段鏈(A)或(B)之單體後,連續地聚合另一嵌段之單體而嵌段共聚物化,亦可於使嵌段鏈(A)與嵌段鏈(B)之各單體分別反應而製作嵌段後,鍵結各嵌段。活性陰離子聚合於可嚴格地控制組成或 分子量方面較佳。 In order to form a block copolymer, after polymerizing the monomer of the block chain (A) or (B), the monomer of the other block may be continuously polymerized to block copolymerize, or the block chain may be A) After reacting each monomer of the block chain (B) to form a block, each block is bonded. Living anionic polymerization can be strictly controlled composition or The molecular weight is preferred.

於藉由活性自由基聚合進行製造之情形時,可與活性陰離子聚合同樣地進行反應,亦可於聚合某一嵌段之單體後,於聚合下一單體之前,暫時純化聚合物,去除先前之反應之剩餘單體後,聚合下一單體。於較佳為各嵌段之單體彼此不相互混入之情形時,較佳為進行聚合物之純化。 In the case of production by living radical polymerization, the reaction may be carried out in the same manner as the living anionic polymerization, or after the monomer of a certain block is polymerized, the polymer may be temporarily purified before the polymerization of the next monomer. After the remaining monomers of the previous reaction, the next monomer was polymerized. In the case where it is preferred that the monomers of the respective blocks are not mixed with each other, it is preferred to carry out purification of the polymer.

於藉由活性陰離子聚合而製造嵌段共聚物之情形時,例如可於添加有添加劑及聚合起始劑之溶劑中,滴加所期望之單體進行聚合。此時,為了製成所期望之排列之嵌段聚合物,將各嵌段之單體以成為所期望之排列之方式依序滴加,並使之反應。 In the case of producing a block copolymer by living anionic polymerization, for example, a desired monomer may be added dropwise to a solvent to which an additive and a polymerization initiator are added to carry out polymerization. At this time, in order to form a block polymer of a desired arrangement, the monomers of the respective blocks are sequentially added dropwise in such a manner as to be in a desired arrangement, and are allowed to react.

為了於聚合某一嵌段之單體後,聚合下一嵌段之單體,而於前一嵌段之聚合反應結束後,開始滴加下一嵌段之單體。聚合反應之進行可藉由利用氣相層析法或液相層析法檢測單體之剩餘量而確認。又,前一嵌段之單體滴加結束後,亦可攪拌1分鐘至1小時後,開始滴加下一嵌段之單體,根據單體或溶劑之種類而有所不同。 In order to polymerize a monomer of a block, the monomer of the next block is polymerized, and after the polymerization of the previous block is completed, the monomer of the next block is started to be dropped. The progress of the polymerization can be confirmed by detecting the remaining amount of the monomer by gas chromatography or liquid chromatography. Further, after the completion of the dropwise addition of the monomer of the former block, the monomer of the next block may be added dropwise after stirring for 1 minute to 1 hour, depending on the type of the monomer or the solvent.

於各嵌段中含有複數種單體之情形時,可分別滴加該等,亦可同時滴加。 In the case where a plurality of monomers are contained in each block, these may be added dropwise or may be added dropwise at the same time.

作為用於單體之聚合之陰離子聚合起始劑,只要為親核劑,且具有開始陰離子聚合性單體之聚合之作用者,則並無特別限制,例如可使用鹼金屬、有機鹼金屬化合物等。 The anionic polymerization initiator used for the polymerization of the monomer is not particularly limited as long as it is a nucleophilic agent and has a function of starting polymerization of the anion polymerizable monomer, and for example, an alkali metal or an organic alkali metal compound can be used. Wait.

作為鹼金屬,可舉出:鋰、鈉、鉀、銫等。 Examples of the alkali metal include lithium, sodium, potassium, rubidium, and the like.

作為有機鹼金屬化合物,可舉出上述鹼金屬之烷化物、 烯丙基化物、芳基化物,尤佳為烷基鋰。具體而言,可使用:乙基鋰、正丁基鋰、第二丁基鋰、第三丁基鋰、乙基鈉、聯苯鋰、萘基鋰、三苯基鋰、萘基鈉、萘基鉀、α-甲基苯乙烯鈉二價陰離子、1,1-二苯基己基鋰、1,1-二苯基-3-甲基戊基鋰、1,4-二鋰-2-丁烯、1,6-二鋰己烷、聚苯乙烯基鋰、異丙苯基鉀、異丙苯基銫等。該等陰離子聚合起始劑可單獨使用一種,或組合使用兩種以上。 The organic alkali metal compound may, for example, be an alkylate of the above alkali metal. An allyl compound, an aryl compound, and more preferably an alkyl lithium. Specifically, ethyl lithium, n-butyl lithium, second butyl lithium, tert-butyl lithium, ethyl sodium, biphenyl lithium, naphthyl lithium, triphenyl lithium, naphthyl sodium, naphthalene can be used. Potassium, α-methylstyrene sodium dianion, 1,1-diphenylhexyllithium, 1,1-diphenyl-3-methylpentyllithium, 1,4-dilithium-2-butene Alkene, 1,6-dilithium hexane, polystyryllithium, cumyl potassium, cumene hydrazine, and the like. These anionic polymerization initiators may be used alone or in combination of two or more.

陰離子聚合起始之使用量相對於所使用之全部陰離子聚合性單體,通常為0.0001~0.2當量,較佳為0.0005~0.1當量。藉由使用該範圍之陰離子聚合起始劑,可產率良好地製造目標之聚合物。 The starting amount of the anionic polymerization is usually from 0.0001 to 0.2 equivalents, preferably from 0.0005 to 0.1 equivalents, based on the total of the anionic polymerizable monomers used. By using an anionic polymerization initiator of this range, the target polymer can be produced in a good yield.

聚合溫度只要為不發生轉移反應或停止反應等副反應,而消耗單體,完成聚合之溫度範圍,則並無特別限制,較佳為於-100℃以上、溶劑沸點以下之溫度範圍進行。又,單體於聚合溶劑中之濃度並無特別限制,通常為1~40重量%,較佳為2~15重量%。 The polymerization temperature is not particularly limited as long as it is a side reaction such as no shift reaction or a reaction such as stopping the reaction, and the polymerization is carried out, and is preferably carried out in a temperature range of -100 ° C or higher and a solvent boiling point or lower. Further, the concentration of the monomer in the polymerization solvent is not particularly limited, but is usually 1 to 40% by weight, preferably 2 to 15% by weight.

本發明之製造方法中所使用之聚合溶劑只要為不參與聚合反應,且與聚合物具有相溶性之某種溶劑,則並無特別限制,具體可例示二乙醚、四氫呋喃(THF)、二烷、三烷等醚系化合物,四甲基乙二胺、六甲基磷醯三胺等三級胺等極性溶劑,或己烷或甲苯等脂肪族、芳香族或脂環式烴化合物等非極性溶劑或低極性溶劑。該等溶劑可單獨使用一種,或製成兩種以上之混合溶劑而使用。於本發明之製造方法中,即便於將非極性溶劑或低極性溶劑與極性 溶劑併用之情形時,亦可精度良好地控制聚合,例如非極性溶劑或低極性溶劑相對於全部溶劑,可使用5vol%以上,亦可使用20vol%以上,亦可使用50vol%以上。 The polymerization solvent to be used in the production method of the present invention is not particularly limited as long as it is a solvent which does not participate in the polymerization reaction and is compatible with the polymer, and specifically, diethyl ether, tetrahydrofuran (THF), and the like are exemplified. Alkane, three An ether compound such as an alkane; a polar solvent such as a tertiary amine such as tetramethylethylenediamine or hexamethylphosphonium triamine; or a nonpolar solvent such as an aliphatic, aromatic or alicyclic hydrocarbon compound such as hexane or toluene or Low polar solvent. These solvents may be used singly or in combination of two or more. In the production method of the present invention, even when a nonpolar solvent or a low polar solvent is used in combination with a polar solvent, the polymerization can be controlled with high precision, for example, a nonpolar solvent or a low polar solvent can be used with respect to all solvents. More than or equal to 20% by volume, and 50% by volume or more may be used.

於本發明中,亦可視需要將二乙基鋅等二烷基鋅、二丁基鎂等二烷基鎂、三乙基鋁等有機金屬用作聚合穩定劑、單體或溶劑之純化劑。 In the present invention, an organic metal such as dialkylzinc such as diethyl zinc or dialkylmagnesium such as dibutylmagnesium or triethylaluminum may be used as a purification agent for a polymerization stabilizer, a monomer or a solvent.

於本發明中,可視需要於聚合開始時或聚合中添加鹼金屬鹽、或鹼土金屬鹽等添加劑。作為此種添加劑,具體可例示鈉、鉀、鋇、鎂之硫酸鹽、硝酸鹽、硼酸鹽等礦酸鹽或鹵化物,更具體可舉出:鋰或鋇之氯化物、溴化物、碘化物、或硼酸鋰、硝酸鎂、氯化鈉、氯化鉀等。該等中,亦較佳為鋰之鹵化物,例如氯化鋰、溴化鋰、碘化鋰、氟化鋰,尤佳為氯化鋰。 In the present invention, an additive such as an alkali metal salt or an alkaline earth metal salt may be added at the start of polymerization or during polymerization as needed. Specific examples of such an additive include a mineral acid salt or a halide such as a sulfate, a nitrate or a borate of sodium, potassium, barium or magnesium, and more specifically, a chloride, a bromide or an iodide of lithium or barium. Or lithium borate, magnesium nitrate, sodium chloride, potassium chloride, and the like. Among these, lithium halides such as lithium chloride, lithium bromide, lithium iodide, lithium fluoride, and particularly preferably lithium chloride are also preferred.

藉由活性陰離子聚合來聚合具有四級銨鹽基之單體一般較為困難。因此,於藉由活性陰離子聚合來製造含有具有四級銨鹽基之重複單元的聚合物之情形時,可於聚合成為具有三級胺基之重複單元之原料的單體後,將該三級胺基藉由公知之方法進行四級化。作為四級化劑,可舉出:氯甲苯、溴甲苯、碘甲苯等,或氯甲烷、氯乙烷、溴甲烷、碘甲烷等鹵化烷,或硫酸二甲酯、硫酸二乙酯、硫酸二正丙酯等硫酸烷基酯等一般烷化劑。 It is generally difficult to polymerize a monomer having a quaternary ammonium salt group by living anionic polymerization. Therefore, when a polymer containing a repeating unit having a quaternary ammonium salt group is produced by living anionic polymerization, the monomer can be polymerized after being polymerized into a raw material of a repeating unit having a tertiary amino group. The amine group is quaternized by a known method. Examples of the quaternization agent include chlorotoluene, bromotoluene, iodine toluene, and the like, or a halogenated alkane such as methyl chloride, ethyl chloride, methyl bromide or methyl iodide, or dimethyl sulfate, diethyl sulfate or sulfuric acid. A general alkylating agent such as an alkyl sulfate such as propyl ester.

(3)嵌段共聚物 (3) block copolymer

本發明之嵌段共聚物可分別至少含有一種之以下嵌段鏈(A)及嵌段鏈(B1)。 The block copolymer of the present invention may contain at least one of the following block chain (A) and block chain (B1), respectively.

嵌段鏈(A):含有選自由具有三級胺基之重複單元及含有四級銨鹽基之重複單元所組成之群中之至少一種重複單元的聚合物 Block chain (A): a polymer containing at least one repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt group

嵌段鏈(B1):含有具有聚氧伸烷基鏈之重複單元與具有酸性基之重複單元的共聚物 Block chain (B1): a copolymer containing a repeating unit having a polyoxyalkylene chain and a repeating unit having an acidic group

又,本發明之共聚物前驅體除上述嵌段鏈(A)及嵌段鏈(B1)以外,亦可含有其他嵌段鏈。 Further, the copolymer precursor of the present invention may contain other block chains in addition to the block chain (A) and the block chain (B1).

1)嵌段鏈(A) 1) Block chain (A)

嵌段共聚物中之嵌段鏈(A)與上述共聚物前驅體中之嵌段鏈(A)相同。 The block chain (A) in the block copolymer is the same as the block chain (A) in the above copolymer precursor.

2)嵌段鏈(B1) 2) Block chain (B1)

嵌段鏈(B1)係含有至少一種具有聚氧伸烷基鏈之重複單元與至少一種具有酸性基之重複單元的共聚物。 The block chain (B1) is a copolymer containing at least one repeating unit having a polyoxyalkylene chain and at least one repeating unit having an acidic group.

共聚物包括無規、交替、嵌段等之共聚物。 Copolymers include copolymers of random, alternating, block, and the like.

(具有聚氧伸烷基鏈之重複單元) (repeating unit having a polyoxyalkylene chain)

嵌段鏈(B1)中之具有聚氧伸烷基鏈之重複單元與上述共聚物前驅體中之具有聚氧伸烷基鏈之重複單元相同。 The repeating unit having a polyoxyalkylene chain in the block chain (B1) is the same as the repeating unit having a polyoxyalkylene chain in the above copolymer precursor.

(具有酸性基之重複單元) (repeating unit with acidic group)

嵌段鏈(B1)中之具有酸性基之重複單元為式(II)所表示之重複單元。 The repeating unit having an acidic group in the block chain (B1) is a repeating unit represented by the formula (II).

[化17] [化17]

式(II)中,R1、R2、R3、X之含義與式(I)所表示之具有經保護之酸性基之重複單元相同。 In the formula (II), R 1 , R 2 , R 3 and X have the same meanings as the repeating unit having a protected acidic group represented by the formula (I).

式(II)所表示之重複單元可藉由將式(I)所表示之經保護之酸性基之保護基藉由本發明之製造方法脫保護而獲得。 The repeating unit represented by the formula (II) can be obtained by deprotecting the protective group of the protected acidic group represented by the formula (I) by the production method of the present invention.

(其他可含有之重複單元) (other repeatable units that can be included)

嵌段鏈(B1)中之其他可含有之重複單元與上述共聚物前驅體中之嵌段鏈(B)中之其他可含有之重複單元相同。 The other repeating unit which may be contained in the block chain (B1) is the same as the other repeating unit which may be contained in the block chain (B) in the above copolymer precursor.

(嵌段共聚物中之嵌段鏈(A)、(B1)以外之可含有之嵌段鏈) (blockchains other than the block chain (A) and (B1) in the block copolymer)

本發明之共聚物除嵌段鏈(A)及(B1)以外,亦可具有包含其他聚合物之嵌段鏈。 The copolymer of the present invention may have a block chain containing other polymers in addition to the block chains (A) and (B1).

此種嵌段鏈與共聚物前驅體中嵌段鏈(A)、(B)以外之可含有之嵌段鏈相同。 Such a block chain is the same as the block chain which may be contained in the copolymer precursor other than the block chain (A) and (B).

(共聚物中之嵌段鏈(A)與嵌段鏈(B1)之比及分子量等物性) (The ratio of block chain (A) to block chain (B1) in the copolymer and physical properties such as molecular weight)

本發明之共聚物中之嵌段鏈(A)與嵌段鏈(B1)之比並無特別限制,以重量%比計,為10~40:90~60,較佳為15~35:85~65。又,共聚物中之具有酸性基之重複單元之含有比例率0.5~20重量%,較佳為1~15重量%。 The ratio of the block chain (A) to the block chain (B1) in the copolymer of the present invention is not particularly limited, and is 10 to 40: 90 to 60, preferably 15 to 35: 85 by weight%. ~65. Further, the ratio of the repeating unit having an acidic group in the copolymer is from 0.5 to 20% by weight, preferably from 1 to 15% by weight.

又,使用GPC測得之重量平均分子量較佳為2,000~50,000,更佳為2,000~20,000。作為分散劑,尤佳為4,000~30,000,更佳為4,000~15,000。使用GPC測得之重量平均分子量與數量平均分子量之比為1.0~2.0,分散劑尤 佳為1.0~1.5。 Further, the weight average molecular weight measured by GPC is preferably from 2,000 to 50,000, more preferably from 2,000 to 20,000. As the dispersing agent, it is preferably from 4,000 to 30,000, more preferably from 4,000 to 15,000. The ratio of the weight average molecular weight to the number average molecular weight measured by GPC is 1.0 to 2.0, especially the dispersant. Good is 1.0~1.5.

(4)嵌段共聚物之製造方法 (4) Method for producing block copolymer

本發明之嵌段共聚物可藉由加熱上述共聚物前驅體而獲得。藉由加熱共聚物前驅體,而使保護共聚物前驅體中之酸性基的保護基脫保護。 The block copolymer of the present invention can be obtained by heating the above copolymer precursor. The protective group protecting the acidic group in the copolymer precursor is deprotected by heating the copolymer precursor.

脫保護反應可直接加熱共聚物前驅體,或可於將共聚物前驅體溶解於溶劑中之狀態下加熱。作為此種溶劑,可舉出:水;乙基溶纖劑乙酸酯、甲基溶纖劑乙酸酯、丙二醇單甲醚乙酸酯(PGMEA)及丙二醇單乙醚乙酸酯等二醇醚酯系溶劑;乙基溶纖劑、甲基溶纖劑、丙二醇單甲醚、丙二醇單乙醚及二乙二醇二甲醚等二醇單或二醚系溶劑;甲苯、單氯苯等芳香族烴系溶劑;乙醇、異丙醇、正丁醇、1-甲氧基-2-丙醇(PGME)等醇系溶劑;乳酸乙酯、乙酸丁酯及丙酮酸乙酯等酯系溶劑;及包含該等之兩種以上之混合溶劑;等。該等中,較佳為二醇醚酯系溶劑、二醇醚酯系溶劑與醇系溶劑之混合溶劑、二醇醚酯系溶劑與水之混合溶劑。就可降低反應溫度之觀點而言,較佳為二醇醚酯系溶劑與醇系溶劑之混合溶劑、二醇醚酯系溶劑與水之混合溶劑,尤佳為二醇醚酯系溶劑與水之混合溶劑。 The deprotection reaction may directly heat the copolymer precursor or may be heated in a state where the copolymer precursor is dissolved in a solvent. Examples of such a solvent include water; glycol ethers such as ethyl cellosolve acetate, methyl cellosolve acetate, propylene glycol monomethyl ether acetate (PGMEA), and propylene glycol monoethyl ether acetate. Ester solvent; ethyl cellosolve, methyl cellosolve, propylene glycol monomethyl ether, propylene glycol monoethyl ether and diethylene glycol dimethyl ether diol mono or diether solvent; toluene, monochlorobenzene and other aromatic a hydrocarbon solvent; an alcohol solvent such as ethanol, isopropanol, n-butanol or 1-methoxy-2-propanol (PGME); an ester solvent such as ethyl lactate, butyl acetate or ethyl pyruvate; Containing two or more kinds of mixed solvents; and the like. Among these, a glycol ether ester solvent, a mixed solvent of a glycol ether ester solvent and an alcohol solvent, and a mixed solvent of a glycol ether ester solvent and water are preferable. From the viewpoint of lowering the reaction temperature, a mixed solvent of a glycol ether ester solvent and an alcohol solvent, a mixed solvent of a glycol ether ester solvent and water, and a glycol ether ester solvent and water are preferred. a mixed solvent.

就易去除藉由脫保護反應而產生之副產物之觀點而言,較佳為二醇醚酯系溶劑與水之混合溶劑,尤佳為PGMEA與水之混合溶劑。 From the viewpoint of easily removing by-products generated by the deprotection reaction, a mixed solvent of a glycol ether ester-based solvent and water is preferred, and a mixed solvent of PGMEA and water is preferred.

於二醇醚酯系溶劑與醇系溶劑之混合溶劑中,其混合比率只要可溶解共聚物前驅體,則並無特別限制,通常較佳 為95/5重量%~0.1/99.9重量%,更佳為50/50~0.1/99.9重量%。 In the mixed solvent of the glycol ether ester-based solvent and the alcohol-based solvent, the mixing ratio is not particularly limited as long as the copolymer precursor is soluble, and it is usually preferred. It is 95/5 wt% to 0.1/99.9% by weight, more preferably 50/50 to 0.1/99.9% by weight.

於二醇醚酯系溶劑與水之混合溶劑中,其混合比率只要可溶解共聚物前驅體,則並無特別限制,通常較佳為95/5~50/50重量%,更佳為90/10~60/40重量%,尤佳為90/10~75/25重量%。 In the mixed solvent of the glycol ether ester-based solvent and water, the mixing ratio is not particularly limited as long as it can dissolve the copolymer precursor, and is usually preferably 95/5 to 50/50% by weight, more preferably 90/. 10~60/40% by weight, especially preferably 90/10~75/25% by weight.

加熱溫度根據保護酸性基之保護基之結構、反應溶劑而有所不同,但只要為脫保護反應迅速進行之溫度,則並無特別限制。 The heating temperature varies depending on the structure of the protecting group protecting the acidic group and the reaction solvent, but it is not particularly limited as long as it is a temperature at which the deprotection reaction proceeds rapidly.

於為二醇醚酯系溶劑之情形時,通常較佳為於80℃~200℃下進行,更佳為於100℃~160℃下進行。於為二醇醚酯系溶劑與醇系溶劑之混合溶劑之情形時,較佳為於100℃~140℃下進行,更佳為於110℃~140℃下進行。於為二醇醚酯系溶劑與水之混合溶劑之情形時,較佳為於70℃~100℃下進行,更佳為於90℃~100℃下進行。就降低藉由脫保護反應而生成之聚合物溶液之著色的觀點而言,較佳為加熱溫度更低。 In the case of a glycol ether ester-based solvent, it is usually preferably carried out at 80 ° C to 200 ° C, more preferably at 100 ° C to 160 ° C. In the case of a mixed solvent of a glycol ether ester-based solvent and an alcohol-based solvent, it is preferably carried out at 100 ° C to 140 ° C, more preferably at 110 ° C to 140 ° C. In the case of a mixed solvent of a glycol ether ester solvent and water, it is preferably carried out at 70 ° C to 100 ° C, more preferably at 90 ° C to 100 ° C. From the viewpoint of lowering the color of the polymer solution formed by the deprotection reaction, the heating temperature is preferably lower.

[實施例] [Examples]

以下,使用實施例詳細地說明本發明,但本發明之技術範圍並不限定於該等例示。 Hereinafter, the present invention will be described in detail using examples, but the technical scope of the present invention is not limited to the examples.

[實施例1-1] [Example 1-1] (聚合步驟) (aggregation step)

於1000mL燒瓶中添加四氫呋喃(以下有時簡稱為THF)594.35g、氯化鋰(3.63重量%濃度之THF溶液)10.98 g,冷卻至-60℃。其後,添加正丁基鋰7.89g(15.36重量%濃度之己烷溶液),熟化10分鐘。 4,000.35 g of tetrahydrofuran (hereinafter sometimes abbreviated as THF) and lithium chloride (3.63 wt% concentration of THF solution) were added to a 1000 mL flask. g, cooled to -60 °C. Thereafter, 7.89 g (15.36% by weight of a hexane solution) of n-butyllithium was added, and the mixture was aged for 10 minutes.

其次,以30分鐘滴加甲基丙烯酸1-乙氧基乙酯(以下有時簡稱為EEMA)4.04g、甲基丙烯酸正丁酯(以下有時簡稱為nBMA)61.33g,甲氧基聚乙二醇單甲基丙烯酸酯(PME-200,日油股份有限公司製造)(以下有時簡稱為PEGMA)26.19g之混合液,滴加後繼續反應30分鐘。繼而,藉由氣相層析法(以下簡稱為GC)、凝膠滲透層析法(以下簡稱為GPC)(流動相THF、DMF(dimethylformamide,二甲基甲醯胺))進行測定,確認單體消失。 Next, 4.04 g of 1-ethoxyethyl methacrylate (hereinafter sometimes abbreviated as EEMA) and 61.33 g of n-butyl methacrylate (hereinafter sometimes abbreviated as nBMA) were added dropwise over 30 minutes, and methoxypolyethyl b. A mixed liquid of diol monomethacrylate (PME-200, manufactured by Nippon Oil Co., Ltd.) (hereinafter sometimes abbreviated as PEGMA) of 26.19 g was added, and the reaction was continued for 30 minutes after the dropwise addition. Then, by gas chromatography (hereinafter abbreviated as GC), gel permeation chromatography (hereinafter abbreviated as GPC) (mobile phase THF, DMF (dimethylformamide, dimethylformamide)), the confirmation sheet is confirmed. The body disappears.

其次,滴加甲基丙烯酸2-(二甲基胺基)乙酯(以下有時簡稱為DMMA)39.71g,滴加後繼續反應30分鐘。繼而,藉由GC、GPC(流動相DMF)進行測定,確認單體消失後,添加甲醇3.21g,停止反應。 Next, 39.71 g of 2-(dimethylamino)ethyl methacrylate (hereinafter sometimes abbreviated as DMMA) was added dropwise, and the reaction was continued for 30 minutes after the dropwise addition. Then, after measuring by GC and GPC (mobile phase DMF), it was confirmed that the monomer disappeared, and 3.21 g of methanol was added to stop the reaction.

藉由GPC(流動相DMF)分析所獲得之共聚物,確認為分子量(Mw)為5260、分子量分佈為1.09、組成比為DMMA-[nBMA/PEGMA/EEMA]=30-[47/20/3]重量%之共聚物。 The copolymer obtained by GPC (mobile phase DMF) analysis was confirmed to have a molecular weight (Mw) of 5,260, a molecular weight distribution of 1.09, and a composition ratio of DMMA-[nBMA/PEGMA/EEMA]=30-[47/20/3. ] % by weight of copolymer.

(脫保護步驟) (deprotection step)

將所獲得之前驅體聚合物之50重量%濃度之丙二醇單甲醚乙酸酯(以下有時簡稱為PGMEA)溶液200g加熱至160℃,反應3小時。 200 g of a 50% by weight concentration of propylene glycol monomethyl ether acetate (hereinafter sometimes abbreviated as PGMEA) solution of the obtained precursor polymer was heated to 160 ° C for 3 hours.

藉由GPC(流動相DMF)分析所獲得之共聚物,確認為分子量(Mw)為5140、分子量分佈為1.08、組成比為DMMA-[nBMA/PEGMA/MA]=31-[47/20/2]重量%之共聚物(MA表示 甲基丙烯酸)。 The copolymer obtained by GPC (mobile phase DMF) analysis confirmed that the molecular weight (Mw) was 5,140, the molecular weight distribution was 1.08, and the composition ratio was DMMA-[nBMA/PEGMA/MA]=31-[47/20/2 ]% by weight of copolymer (MA) Methacrylate).

所獲得之聚合物溶液為淡褐色。 The polymer solution obtained was pale brown.

[實施例1-2] [Example 1-2] (脫保護步驟) (deprotection step)

將實施例1-1之聚合步驟中所獲得之前驅體聚合物之25重量%濃度之PGMEA/正丁醇溶液(30/70重量%)10.0g加熱至115℃,反應8小時。餾去正丁醇,製備為40重量%濃度之PGMEA溶液。 10.0 g of a PGMEA/n-butanol solution (30/70 wt%) having a concentration of 25% by weight of the precursor polymer obtained in the polymerization step of Example 1-1 was heated to 115 ° C for 8 hours. The n-butanol was distilled off to prepare a PGFEA solution having a concentration of 40% by weight.

所獲得之聚合物溶液為無色透明。 The polymer solution obtained was colorless and transparent.

[實施例1-3] [Example 1-3] (脫保護步驟) (deprotection step)

分別製備12.80g之實施例1-1之聚合步驟中所獲得之前驅體聚合物之20重量%濃度之PGMEA/水容液(62.5/37.5重量%)、20重量%濃度之PGMEA/水溶液(65/35重量%)、20重量%濃度之PGMEA/水溶液(75/25重量%)、20重量%濃度之PGMEA/水溶液(87.5/12.5重量%)、20重量%濃度之PGMEA/水溶液(93.75/6.25重量%)。將所製備之溶液分別加熱至100℃,反應8小時。餾去水,製備為40重量%濃度之PGMEA溶液。於PGMEA/水(93.75/6.25重量%)溶液中,前驅體聚合物部分殘留,而於其他溶液中,脫保護反應結束。其中,於PGMEA/水(93.75/6.25重量%)溶液中,藉由將反應時間設為24小時,脫保護反應會結束。 A PPGEA/water solution (62.5/37.5 wt%) having a concentration of 20% by weight of the precursor polymer obtained in the polymerization step of Example 1-1 obtained in the polymerization step of Example 1-1, and a PGMEA/water solution having a concentration of 20 wt% (65%) were respectively prepared. /35 wt%), 20 wt% concentration of PGMEA/water solution (75/25 wt%), 20 wt% concentration of PGMEA/water solution (87.5/12.5 wt%), 20 wt% concentration of PGMEA/water solution (93.75/6.25) weight%). The prepared solution was separately heated to 100 ° C and reacted for 8 hours. Water was distilled off to prepare a 40 wt% concentration of PGMEA solution. In the PGMEA/water (93.75/6.25 wt%) solution, the precursor polymer partially remained, while in other solutions, the deprotection reaction ended. Among them, in the PGMEA/water (93.75/6.25 wt%) solution, the deprotection reaction was completed by setting the reaction time to 24 hours.

所獲得之各自聚合物溶液為無色透明。 The respective polymer solutions obtained were colorless and transparent.

由實施例1-1~實施例1-3之結果得知,藉由將前驅體聚 合物之PGMEA溶液置於加熱條件下,可將保護基脫保護。又,得知藉由製成PGMEA與醇之混合溶液,可使反應溫度進一步降低,進而藉由製成PGMEA與水之混合溶液,可使反應溫度進而降低。 From the results of Examples 1-1 to 1-3, it is known that the precursor is aggregated. The PGMEA solution of the compound is placed under heating to deprotect the protecting group. Further, it has been found that by making a mixed solution of PGMEA and an alcohol, the reaction temperature can be further lowered, and by further preparing a mixed solution of PGMEA and water, the reaction temperature can be further lowered.

[實施例2] [Embodiment 2] (聚合步驟) (aggregation step)

於1000mL燒瓶中添加THF 695.92g、氯化鋰(3.63重量%濃度THF溶液)13.83g,冷卻至-60℃。其後,添加正丁基鋰(15.36重量%濃度之己烷溶液)9.29g,熟化10分鐘。 695.92 g of THF and 13.83 g of lithium chloride (3.63 wt% concentration of THF solution) were added to a 1000 mL flask, and the mixture was cooled to -60 °C. Thereafter, 9.29 g of n-butyllithium (15.36 wt% concentration of a hexane solution) was added, and the mixture was aged for 10 minutes.

其次,以30分鐘滴加EEMA 8.47g、nBMA 71.15g、PEGMA 31.16g之混合液,滴加後繼續反應30分鐘。繼而,藉由GC、GPC(流動相THF、DMF)進行測定,確認單體消失。 Next, a mixed liquid of EEMA 8.47 g, nBMA 71.15 g, and PEGMA 31.16 g was added dropwise over 30 minutes, and the reaction was continued for 30 minutes after the dropwise addition. Then, the measurement was confirmed by GC or GPC (mobile phase THF, DMF) to confirm the disappearance of the monomer.

其次,滴加DMMA 45.39g,滴加後繼續反應30分鐘。繼而,藉由GC、GPC(流動相DMF)進行測定,確認單體消失後,添加甲醇3.21g,停止反應。 Next, 45.39 g of DMMA was added dropwise, and the reaction was continued for 30 minutes after the dropwise addition. Then, after measuring by GC and GPC (mobile phase DMF), it was confirmed that the monomer disappeared, and 3.21 g of methanol was added to stop the reaction.

藉由GPC(流動相DMF)分析所獲得之共聚物,確認為分子量(Mw)為5610、分子量分佈為1.10、組成比為DMMA-[nBMA/PEGMA/EEMA]=29-[46/20/5]重量%之共聚物。 The copolymer obtained by GPC (mobile phase DMF) analysis was confirmed to have a molecular weight (Mw) of 5610, a molecular weight distribution of 1.10, and a composition ratio of DMMA-[nBMA/PEGMA/EEMA]=29-[46/20/5 ] % by weight of copolymer.

(脫保護步驟) (deprotection step)

將所獲得之共聚物之50重量%濃度之PGMEA溶液213g加熱至160℃,熟化3.5小時。 213 g of a PPGEA solution having a concentration of 50% by weight of the obtained copolymer was heated to 160 ° C and aged for 3.5 hours.

藉由GPC(流動相DMF)分析所獲得之共聚物,確認為分子量(Mw)為4800、分子量分佈為1.12、組成比為DMMA- [nBMA/PEGMA/MA]=30-[47/20/3]重量%之共聚物。 The copolymer obtained by GPC (mobile phase DMF) analysis confirmed that the molecular weight (Mw) was 4,800, the molecular weight distribution was 1.12, and the composition ratio was DMMA- [nBMA/PEGMA/MA]=30-[47/20/3]% by weight of the copolymer.

[實施例3] [Example 3] (聚合步驟) (aggregation step)

於1000mL燒瓶中添加THF 578.66g、氯化鋰(3.63重量%濃度之THF溶液)11.20g,冷卻至-60℃。其後,添加正丁基鋰(15.36重量%濃度之己烷溶液)7.34g,熟化10分鐘。 To a 1000 mL flask, 57.66 g of THF and 11.20 g of lithium chloride (3.63 wt% concentration of THF solution) were added, and the mixture was cooled to -60 °C. Thereafter, 7.34 g of n-butyllithium (15.36 wt% concentration of a hexane solution) was added, and the mixture was aged for 10 minutes.

繼而,添加甲基丙烯酸甲酯(以下有時簡稱為MMA)4.30g,繼續反應5分鐘。繼而,藉由GC測定確認單體消失後,對部分取樣並進行GPC測定,結果生成分子量為293(2.92聚物)之聚合物。 Then, 4.30 g of methyl methacrylate (hereinafter sometimes abbreviated as MMA) was added, and the reaction was continued for 5 minutes. Then, after confirming the disappearance of the monomer by GC measurement, a part of the sample was sampled and subjected to GPC measurement to obtain a polymer having a molecular weight of 293 (2.92 polymer).

其次,以30分鐘滴加EEMA 4.52g、甲基丙烯酸2-乙基己酯(以下有時簡稱為EHMA)19.80g、nBMA 19.50g、MMA 36.48g、甲基丙烯酸苄酯(以下有時簡稱為BzMA)15.03g、PEGMA 11.99g之混合液,滴加後繼續反應30分鐘。繼而,藉由GC、GPC(流動相THF、DMF)進行測定,確認單體消失。 Next, 4.53 g of EEMA, 19.80 g of methacrylic acid methacrylate (hereinafter sometimes abbreviated as EHMA), 19.50 g of nBMA, 36.48 g of MMA, and benzyl methacrylate were added dropwise over 30 minutes (hereinafter sometimes referred to simply as A mixture of 15.03 g of BzMA) and 11.99 g of PEGMA was added and the reaction was continued for 30 minutes after the dropwise addition. Then, the measurement was confirmed by GC or GPC (mobile phase THF, DMF) to confirm the disappearance of the monomer.

其次,滴加DMMA 36.98g,滴加後繼續反應30分鐘。繼而,藉由GC、GPC(流動相DMF)進行測定,確認單體消失後,添加甲醇3.21g,停止反應。 Next, 36.98 g of DMMA was added dropwise, and the reaction was continued for 30 minutes after the dropwise addition. Then, after measuring by GC and GPC (mobile phase DMF), it was confirmed that the monomer disappeared, and 3.21 g of methanol was added to stop the reaction.

藉由GPC(流動相DMF)分析所獲得之共聚物,確認為分子量(Mw)為6780、分子量分佈為1.08、組成比為DMMA-[MMA/nBMA/EHMA/PEGMA/BzMA/EEMA]=25-[28/13/13/8/10/3]重量%之共聚物。 The copolymer obtained by GPC (mobile phase DMF) analysis was confirmed to have a molecular weight (Mw) of 6780, a molecular weight distribution of 1.08, and a composition ratio of DMMA-[MMA/nBMA/EHMA/PEGMA/BzMA/EEMA]=25- [28/13/13/8/10/3] wt% copolymer.

(脫保護步驟) (deprotection step)

將所獲得之共聚物之50重量%濃度之PGMEA溶液200g加熱至160℃,反應3小時。 200 g of a PPGEA solution having a concentration of 50% by weight of the obtained copolymer was heated to 160 ° C and reacted for 3 hours.

藉由GPC(流動相DMF)分析所獲得之共聚物,確認為分子量(Mw)為6120、分子量分佈為1.10、組成比為DMMA-[MMA/nBMA/EHMA/PEGMA/BzMA/MA]=25-[28/13/14/8/10/2]重量%之共聚物。 The copolymer obtained by GPC (mobile phase DMF) analysis confirmed that the molecular weight (Mw) was 6,120, the molecular weight distribution was 1.10, and the composition ratio was DMMA-[MMA/nBMA/EHMA/PEGMA/BzMA/MA]=25- [28/13/14/8/10/2] wt% copolymer.

[實施例4-1] [Example 4-1] (聚合步驟) (aggregation step)

於1000mL燒瓶中添加THF 683.03g、氯化鋰(3.63重量%濃度之THF溶液)11.92g,冷卻至-60℃。其後,添加正丁基鋰(15.36重量%濃度之己烷溶液)8.32g,熟化10分鐘。 To a 1000 mL flask, 683.03 g of THF and 11.92 g of lithium chloride (3.63 wt% concentration of THF solution) were added, and the mixture was cooled to -60 °C. Thereafter, 8.32 g of n-butyllithium (15.36 wt% concentration of a hexane solution) was added, and the mixture was aged for 10 minutes.

繼而,添加MMA 5.06g,繼續反應5分鐘。繼而,藉由GC測定確認單體消失後,對部分取樣並進行GPC測定,結果生成分子量為311(3.10聚物)之聚合物。 Then, MMA 5.06g was added and the reaction was continued for 5 minutes. Then, after confirming the disappearance of the monomer by GC measurement, the sample was partially sampled and subjected to GPC measurement to obtain a polymer having a molecular weight of 311 (3.10 polymer).

繼而,以30分鐘滴加EEMA 9.68g、EHMA 22.0g、nBMA 22.09g、MMA 41.60g、BzMA 16.83g、PEGMA 13.75g之混合液,滴加後繼續反應30分鐘。繼而,藉由GC、GPC(流動相THF、DMF)進行測定,確認單體消失。 Then, a mixed liquid of EEMA 9.68 g, EHMA 22.0 g, nBMA 22.09 g, MMA 41.60 g, BzMA 16.83 g, and PEGMA 13.75 g was added dropwise over 30 minutes, and the reaction was continued for 30 minutes after the dropwise addition. Then, the measurement was confirmed by GC or GPC (mobile phase THF, DMF) to confirm the disappearance of the monomer.

其次,滴加DMMA 42.06g,滴加後繼續反應30分鐘。繼而,藉由GC、GPC(流動相DMF)進行測定,確認單體消失後,添加甲醇4.48g,停止反應。 Next, 42.06 g of DMMA was added dropwise, and the reaction was continued for 30 minutes after the dropwise addition. Then, after measuring by GC and GPC (mobile phase DMF), it was confirmed that the monomer disappeared, and 4.48 g of methanol was added to stop the reaction.

藉由GPC(流動相DMF)分析所獲得之共聚物,確認為分 子量(Mw)為6980、分子量分佈為1.10、組成比為DMMA-[MMA/nBMA/EHMA/PEGMA/BzMA/EEMA]=24-[27/13/13/8/10/5]重量%之共聚物。 The copolymer obtained by GPC (mobile phase DMF) analysis was confirmed as a fraction The sub-quantity (Mw) is 6980, the molecular weight distribution is 1.10, and the composition ratio is DMMA-[MMA/nBMA/EHMA/PEGMA/BzMA/EEMA]=24-[27/13/13/8/10/5]% by weight. Copolymer.

(脫保護步驟) (deprotection step)

將所獲得之前驅體聚合物之50重量%濃度之PGMEA溶液212.32g加熱至160℃,反應4小時。 212.32 g of a PPGEA solution having a concentration of 50% by weight of the obtained precursor polymer was heated to 160 ° C for 4 hours.

藉由GPC(流動相DMF)分析所獲得之共聚物,確認為分子量(Mw)為5300、分子量分佈為1.13、組成比為DMMA-[MMA/nBMA/EHMA/PEGMA/BzMA/MA]=25-[28/13/13/8/10/3]重量%之共聚物。 The copolymer obtained by GPC (mobile phase DMF) analysis was confirmed to have a molecular weight (Mw) of 5,300, a molecular weight distribution of 1.13, and a composition ratio of DMMA-[MMA/nBMA/EHMA/PEGMA/BzMA/MA]=25- [28/13/13/8/10/3] wt% copolymer.

所獲得之聚合物溶液為淡褐色。 The polymer solution obtained was pale brown.

[實施例4-2] [Example 4-2] (脫保護步驟) (deprotection step)

將實施例4-之聚合步驟中所獲得之前驅體聚合物之50重量%PGMEA溶液212.32g加熱至130℃,反應17小時。所獲得之聚合物溶液為黃色透明。 212.32 g of a 50 wt% PGMEA solution of the precursor polymer obtained in the polymerization step of Example 4 was heated to 130 ° C for 17 hours. The polymer solution obtained was yellow and transparent.

[實施例4-3] [Example 4-3] (脫保護步驟) (deprotection step)

將實施例4-1之聚合步驟中所獲得之前驅體聚合物之50重量%PGMEA/1-甲氧基-2-丙醇溶液(20/80重量%)4.64g加熱至130℃,反應9小時。餾去PGME,製備為40重量%濃度之PGMEA溶液。所獲得之聚合物溶液為無色透明。 The solution of 50% by weight of PGMEA/1-methoxy-2-propanol (20/80% by weight) of 4.64 g of the precursor polymer obtained in the polymerization step of Example 4-1 was heated to 130 ° C, and the reaction was carried out. hour. The PGME was distilled off to prepare a 40% by weight solution of PGMEA. The polymer solution obtained was colorless and transparent.

由實施例4-1~實施例4-3之結果得知,藉由將前驅體聚合物之PGMEA溶液置於加熱條件下,可將保護基脫保 護。進而得知,藉由製成PGMEA與醇之混合溶液,可進一步降低反應溫度。藉由降低反應溫度,可降低所獲得之聚合物溶液之著色。 From the results of Examples 4-1 to 4-3, it was found that the protective group could be deprotected by placing the PPGEA solution of the precursor polymer under heating. Protection. Further, it was found that the reaction temperature can be further lowered by preparing a mixed solution of PGMEA and an alcohol. By lowering the reaction temperature, the coloration of the obtained polymer solution can be lowered.

[產業上之可利用性] [Industrial availability]

根據本發明,可製造含有下述嵌段鏈(A)、(B1)之嵌段共聚物:包含含有選自由具有三級胺基之重複單元及具有四級銨鹽基之重複單元所組成之群中之至少一種重複單元之聚合物的嵌段鏈(A)、及包含含有具有聚氧伸烷基鏈之重複單元及式(II)所表示之具有酸性基之重複單元的嵌段鏈(B1)。該等嵌段共聚物尤其可用作彩色液晶用顏料分散劑。 According to the present invention, a block copolymer comprising the following block chains (A), (B1) comprising: a repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a quaternary ammonium salt group can be produced. a block chain (A) of a polymer of at least one repeating unit in the group, and a block chain comprising a repeating unit having a polyoxyalkylene chain and a repeating unit having an acidic group represented by the formula (II) B1). These block copolymers are especially useful as pigment dispersants for color liquid crystals.

Claims (11)

一種嵌段共聚物之製造方法,該嵌段共聚物係含有嵌段鏈(A)、及包含含有具有聚氧伸烷基鏈之重複單元及式(II)所表示之具有酸性基之重複單元之共聚物的嵌段鏈(B1)者,該方法之特徵在於加熱下述含有嵌段鏈(A)與嵌段鏈(B)之共聚物前驅體;其中該嵌段鏈(A)包含含有選自由具有三級胺基之重複單元及具有四級銨鹽基之重複單元所組成之群中之至少一種重複單元之聚合物,該嵌段鏈(B)包含含有具有聚氧伸烷基鏈之重複單元及式(I)所表示之具有經保護之酸性基之重複單元之共聚物, (式中,R1、R2、R3分別獨立表示氫原子或C1~C3烷基;X表示單鍵或選自由C1~C10伸烷基、-C(=O)OR1a-、-C(=O)NHR1a-、-OC(=O)R1a-及-R2a-OC(=O)R1a-所組成之群中之基(R1a、R2a分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*),R4表示氫原子、C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基,R5表示C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基;*表示鍵結位置)[化2] (式中,R1、R2、R3、X表示與式(I)相同之含義)。 A method for producing a block copolymer comprising a block chain (A), and a repeating unit comprising a repeating unit having a polyoxyalkylene chain and an acidic group represented by formula (II) The block chain (B1) of the copolymer, characterized in that the copolymer precursor comprising the block chain (A) and the block chain (B) is heated; wherein the block chain (A) comprises a polymer selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt group, the block chain (B) comprising a polyoxyalkylene chain a repeating unit and a copolymer of a repeating unit having a protected acidic group represented by the formula (I), Wherein R 1 , R 2 and R 3 each independently represent a hydrogen atom or a C1 to C3 alkyl group; X represents a single bond or is selected from a C1 to C10 alkyl group, -C(=O)OR 1a -, -C (=O) NHR 1a -, -OC(=O)R 1a - and -R 2a -OC(=O)R 1a - the group in the group (R 1a , R 2a independently represent C1~C10 extension Alkyl or *C1~C10 alkylene-O-C1~C10 alkylene group *), R 4 represents a hydrogen atom, C1~C6 alkyl group, C6~C10 aryl C1~C6 alkyl group*, or C6~C10 Aryl group, R 5 represents a C1~C6 alkyl group, a C6~C10 aryl C1~C6 alkyl group*, or a C6~C10 aryl group; * represents a bonding position) [Chemical 2] (wherein R 1 , R 2 , R 3 and X represent the same meanings as in the formula (I)). 如請求項1之嵌段共聚物之製造方法,其中上述嵌段鏈(B)及(B1)更含有下述式(III)所表示之重複單元, (式中,R6、R7、R8分別獨立表示氫原子或C1~C3烷基,R9表示C1~C10烷基或C6~C10芳基C1~C6烷基*;*表示鍵結位置)。 The method for producing a block copolymer according to claim 1, wherein the block chain (B) and (B1) further comprise a repeating unit represented by the following formula (III). (wherein R 6 , R 7 and R 8 each independently represent a hydrogen atom or a C1 to C3 alkyl group, R 9 represents a C1 to C10 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group*; * represents a bonding position ). 如請求項1或2之嵌段共聚物之製造方法,其中上述具有三級胺基之重複單元為下述式(IV)所表示之重複單元, (式中,R10、R11、R12分別獨立表示氫原子或C1~C3烷基;Y表示選自由C1~C10伸烷基、-C(=O)OR1b-、-C(=O)NHR1b-、-OC(=O)R1b-及-R2b-OC(=O)R1b-所組成之群中之基(R1b、R2b分別獨立表示C1~C10伸烷基或 *C1~C10伸烷基-O-C1~C10伸烷基*),R13、R14分別獨立表示C1~C6烷基、或C6~C10芳基C1~C6烷基*;*表示鍵結位置)。 The method for producing a block copolymer according to claim 1 or 2, wherein the repeating unit having a tertiary amino group is a repeating unit represented by the following formula (IV), (wherein R 10 , R 11 and R 12 each independently represent a hydrogen atom or a C1 to C3 alkyl group; Y represents an alkyl group selected from C1 to C10, -C(=O)OR 1b -, -C(=O) NHR 1b -, -OC(=O)R 1b - and -R 2b -OC(=O)R 1b - a group of groups (R 1b , R 2b independently represent a C1 to C10 alkyl group or *C1~C10 alkylene-O-C1~C10 alkylene group*), R 13 and R 14 each independently represent C1~C6 alkyl group or C6~C10 aryl C1~C6 alkyl group*; * indicates bonding position). 如請求項1或2之嵌段共聚物之製造方法,其中上述具有四級銨鹽基之重複單元為下述式(V)所表示之重複單元, (式中,R15、R16、R17分別獨立表示氫原子或C1~C3烷基;Y1表示選自由C1~C10伸烷基、-C(=O)OR1c-、-C(=O)NHR1c-、-OC(=O)R1c-及-R2c-OC(=O)R1c-所組成之群中之基(R1c、R2c分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*),R18、R19、R20分別獨立表示C1~C6之烷基、或C6~C10芳基C1~C6烷基*;Z-表示抗衡離子;*表示鍵結位置)。 The method for producing a block copolymer according to claim 1 or 2, wherein the repeating unit having a quaternary ammonium salt group is a repeating unit represented by the following formula (V), Wherein R 15 , R 16 and R 17 each independently represent a hydrogen atom or a C1 to C3 alkyl group; Y 1 represents an alkyl group selected from C1 to C10, -C(=O)OR 1c -, -C(= O) NHR 1c -, -OC(=O)R 1c - and -R 2c -OC(=O)R 1c - groups in the group (R 1c , R 2c independently represent C1 to C10 alkylene groups) Or *C1~C10 alkyl-O-C1~C10 alkyl]*, R 18 , R 19 and R 20 each independently represent a C1~C6 alkyl group or a C6~C10 aryl C1~C6 alkyl group* ;Z - indicates a counter ion; * indicates a bonding position). 如請求項1或2之嵌段共聚物之製造方法,其中上述具有聚氧伸烷基鏈之重複單元係以下述式(VI)表示, (式中,R21、R22、R23分別獨立表示氫原子或C1~C3烷 基;Z1表示選自由-C(=O)O-、-C(=O)NH-、-OC(=O)-及-R1d-OC(=O)-所組成之群中之基(R1d表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*;*表示鍵結位置),R24表示C2~C4伸烷基,R25表示氫原子或C1~C6烷基,m表示2~150中之任一整數,R24O彼此可相同,亦可不同)。 The method for producing a block copolymer according to claim 1 or 2, wherein the above repeating unit having a polyoxyalkylene chain is represented by the following formula (VI): Wherein R 21 , R 22 and R 23 each independently represent a hydrogen atom or a C1 to C3 alkyl group; and Z 1 represents a group selected from -C(=O)O-, -C(=O)NH-, -OC( =O)- and -R 1d -OC(=O)- groups in the group (R 1d represents C1~C10 alkyl or *C1~C10 alkyl-O-C1~C10 alkyl) ; * represents a bonding position), R 24 represents a C2 ~ C4 alkylene, R 25 represents a hydrogen atom or a C1 ~ C6 alkyl group, m represents any integer of 2 to 150, R 24 O may be identical to each other, may different). 如請求項1或2之嵌段共聚物之製造方法,其係利用二醇醚酯系溶劑與醇系溶劑之混合溶劑或二醇醚酯系溶劑與水之混合溶劑而進行。 The method for producing a block copolymer according to claim 1 or 2, which is carried out by using a mixed solvent of a glycol ether ester-based solvent and an alcohol-based solvent or a mixed solvent of a glycol ether ester-based solvent and water. 一種共聚物前驅體,其特徵在於含有:包含含有選自由具有三級胺基之重複單元及具有四級銨鹽基之重複單元所組成之群中之至少一種重複單元之聚合物的嵌段鏈(A)、與包含含有具有聚氧伸烷基鏈之重複單元及式(I)所表示之具有經保護之酸性基之重複單元之共聚物的嵌段鏈(B), (式中,R1、R2、R3分別獨立表示氫原子或C1~C3烷基;X表示單鍵或選自由C1~C10伸烷基、-C(=O)OR1a-、-C(=O)NHR1a-、-OC(=O)R1a-及-R2a-OC(=O)R1a-所組成之群中之基(R1a、R2a分別獨立表示C1~C10伸烷基或 *C1~C10伸烷基-O-C1~C10伸烷基*),R4表示氫原子、C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基,R5表示C1~C6烷基、C6~C10芳基C1~C6烷基*、或C6~C10芳基;*表示鍵結位置)。 A copolymer precursor characterized by comprising: a block chain comprising a polymer comprising at least one repeating unit selected from the group consisting of a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium salt group; (A), a block chain (B) comprising a copolymer comprising a repeating unit having a polyoxyalkylene chain and a repeating unit having a protected acidic group represented by the formula (I), Wherein R 1 , R 2 and R 3 each independently represent a hydrogen atom or a C1 to C3 alkyl group; X represents a single bond or is selected from a C1 to C10 alkyl group, -C(=O)OR 1a -, -C (=O) NHR 1a -, -OC(=O)R 1a - and -R 2a -OC(=O)R 1a - the group in the group (R 1a , R 2a independently represent C1~C10 extension Alkyl or *C1~C10 alkylene-O-C1~C10 alkylene group *), R 4 represents a hydrogen atom, C1~C6 alkyl group, C6~C10 aryl C1~C6 alkyl group*, or C6~C10 An aryl group, R 5 represents a C1 to C6 alkyl group, a C6-C10 aryl C1 to C6 alkyl group*, or a C6-C10 aryl group; * represents a bonding position). 如請求項7之共聚物前驅體,其中上述嵌段鏈(B)更含有下述式(III)所表示之重複單元, (式中,R6、R7、R8分別獨立表示氫原子或C1~C3烷基,R9表示C1~C10烷基或C6~C10芳基C1~C6烷基*;*表示鍵結位置)。 The copolymer precursor of claim 7, wherein the block chain (B) further comprises a repeating unit represented by the following formula (III), (wherein R 6 , R 7 and R 8 each independently represent a hydrogen atom or a C1 to C3 alkyl group, R 9 represents a C1 to C10 alkyl group or a C6 to C10 aryl C1 to C6 alkyl group*; * represents a bonding position ). 如請求項7或8之共聚物前驅體,其中上述具有三級胺基之重複單元為下述式(IV)所表示之重複單元, (式中,R10、R11、R12分別獨立表示氫原子或C1~C3烷基;Y表示選自由C1~C10伸烷基、-C(=O)OR1b-、-C(=O)NHR1b-、-OC(=O)R1b-及-R2b-OC(=O)R1b-所組成之群中之基(R1b、R2b分別獨立表示C1~C10伸烷基或 *C1~C10伸烷基-O-C1~C10伸烷基*),R13、R14分別獨立表示C1~C6烷基或C6~C10芳基C1~C6烷基*;*表示鍵結位置)。 The copolymer precursor of claim 7 or 8, wherein the above repeating unit having a tertiary amino group is a repeating unit represented by the following formula (IV), (wherein R 10 , R 11 and R 12 each independently represent a hydrogen atom or a C1 to C3 alkyl group; Y represents an alkyl group selected from C1 to C10, -C(=O)OR 1b -, -C(=O) NHR 1b -, -OC(=O)R 1b - and -R 2b -OC(=O)R 1b - a group of groups (R 1b , R 2b independently represent a C1 to C10 alkyl group or *C1~C10 alkylene-O-C1~C10 alkylene group *), R 13 and R 14 each independently represent C1~C6 alkyl group or C6~C10 aryl C1~C6 alkyl group*; * indicates bonding position ). 如請求項7或8之共聚物前驅體,其中上述具有四級銨鹽基之重複單元為下述式(V)所表示之重複單元, (式中,R15、R16、R17分別獨立表示氫原子或C1~C3烷基;Y1表示選自由C1~C10伸烷基、-C(=O)OR1c-、-C(=O)NHR1c-、-OC(=O)R1c-及-R2c-OC(=O)R1c-所組成之群中之基(R1c、R2c分別獨立表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*),R18、R19、R20分別獨立表示C1~C6之烷基、或C6~C10芳基C1~C6烷基*;Z-表示抗衡離子;*表示鍵結位置)。 The copolymer precursor of claim 7 or 8, wherein the above repeating unit having a quaternary ammonium salt group is a repeating unit represented by the following formula (V), Wherein R 15 , R 16 and R 17 each independently represent a hydrogen atom or a C1 to C3 alkyl group; Y 1 represents an alkyl group selected from C1 to C10, -C(=O)OR 1c -, -C(= O) NHR 1c -, -OC(=O)R 1c - and -R 2c -OC(=O)R 1c - groups in the group (R 1c , R 2c independently represent C1 to C10 alkylene groups) Or *C1~C10 alkyl-O-C1~C10 alkyl]*, R 18 , R 19 and R 20 each independently represent a C1~C6 alkyl group or a C6~C10 aryl C1~C6 alkyl group* ;Z - indicates a counter ion; * indicates a bonding position). 如請求項7或8之共聚物前驅體,其中上述具有聚氧伸烷基鏈之重複單元係以式(VI)表示, (式中,R21、R22、R23分別獨立表示氫原子或C1~C3烷 基;Z1表示選自由-C(=O)O-、-C(=O)NH-、-OC(=O)-及-R1d-OC(=O)-所組成之群中之基(R1d表示C1~C10伸烷基或*C1~C10伸烷基-O-C1~C10伸烷基*;*表示鍵結位置),R24表示C2~C4伸烷基,R25表示氫原子或C1~C6烷基,m表示2~150中之任一整數,R24O彼此可相同,亦可不同)。 The copolymer precursor of claim 7 or 8, wherein the above repeating unit having a polyoxyalkylene chain is represented by formula (VI), Wherein R 21 , R 22 and R 23 each independently represent a hydrogen atom or a C1 to C3 alkyl group; and Z 1 represents a group selected from -C(=O)O-, -C(=O)NH-, -OC( =O)- and -R 1d -OC(=O)- groups in the group (R 1d represents C1~C10 alkyl or *C1~C10 alkyl-O-C1~C10 alkyl) ; * represents a bonding position), R 24 represents a C2 ~ C4 alkylene, R 25 represents a hydrogen atom or a C1 ~ C6 alkyl group, m represents any integer of 2 to 150, R 24 O may be identical to each other, may different).
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06128336A (en) * 1990-07-21 1994-05-10 Hoechst Ag Hydrophilic copolymers and their use in reprography
US20060052514A1 (en) * 2000-10-13 2006-03-09 Yoshio Nakajima Pigment dispersing resin
US20080190843A1 (en) * 2004-08-13 2008-08-14 Hitoshi Mizomoto Polymers Useful as Medical Materials

Family Cites Families (6)

* Cited by examiner, † Cited by third party
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US5272201A (en) * 1990-04-11 1993-12-21 E. I. Du Pont De Nemours And Company Amine-containing block polymers for pigmented ink jet inks
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JP2010039060A (en) * 2008-08-01 2010-02-18 Mitsubishi Chemicals Corp Colored curable resin composition for color filter by ink-jet method, color filter, liquid crystal display and organic el display

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06128336A (en) * 1990-07-21 1994-05-10 Hoechst Ag Hydrophilic copolymers and their use in reprography
US20060052514A1 (en) * 2000-10-13 2006-03-09 Yoshio Nakajima Pigment dispersing resin
US20080190843A1 (en) * 2004-08-13 2008-08-14 Hitoshi Mizomoto Polymers Useful as Medical Materials

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