TWI417169B - Cutting tools with the top of the complex cutting - Google Patents

Cutting tools with the top of the complex cutting Download PDF

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TWI417169B
TWI417169B TW98119596A TW98119596A TWI417169B TW I417169 B TWI417169 B TW I417169B TW 98119596 A TW98119596 A TW 98119596A TW 98119596 A TW98119596 A TW 98119596A TW I417169 B TWI417169 B TW I417169B
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cutting
abrasive grains
cutting tool
workpiece
tips
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TW98119596A
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TW201043395A (en
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Wei En Chen
Chien Min Sung
Ying Tung Chen
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Wei En Chen
Chien Min Sung
Ying Tung Chen
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具有複數切削頂部的切削工具Cutting tool with multiple cutting tops

本發明係有關一種的鑽石切削工具,尤其是有關具有複數切削頂部的切削工具。The present invention relates to a diamond cutting tool, and more particularly to a cutting tool having a plurality of cutting tips.

一般鑽石砂輪或是鑽石修整器的磨粒需具備有切削的加工頂部,例如刃角、切削稜線、切削邊緣等,以利刺入材料內部,才能有移除工件材料的能力;尖點朝向工件或稜線朝向工件的鑽石磨粒具有銳利的切削刃角、切削稜線,其切削材料的效率佳;平面朝向工件的鑽石磨粒,利用平面周圍的切削邊緣也可從工件上切割、刨平材料,但其切削材料的效率較差。Generally, the grinding wheel of a diamond wheel or a diamond dresser needs to have a machining top with a cutting edge, such as a cutting edge, a cutting ridge line, a cutting edge, etc., in order to penetrate into the material to have the ability to remove the workpiece material; Or the diamond abrasive grain with the ridge line facing the workpiece has sharp cutting edge angle and cutting ridge line, and the cutting material has good efficiency; the diamond abrasive grain with the plane facing the workpiece can also cut and plan the material from the workpiece by using the cutting edge around the plane. However, the cutting material is inefficient.

台灣公開專利200707531揭示的一種修整晶圓研磨墊的修整器,包含:一基板,在該基板之上表面具有複數個凹槽;固著材料,充填在該複數個凹槽中;以及複數個磨粒,該複數個磨粒被該固著材料固著在該複數個凹槽中。其中該複數個凹槽係依規則性排列,該複數個凹槽之每一個凹槽尺寸僅能容納一顆磨粒。A trimmer for conditioning a wafer polishing pad disclosed in Taiwan Patent Publication No. 200707531, comprising: a substrate having a plurality of grooves on an upper surface thereof; a fixing material filled in the plurality of grooves; and a plurality of grinding The plurality of abrasive particles are fixed in the plurality of grooves by the fixing material. Wherein the plurality of grooves are arranged in a regular manner, and each of the plurality of grooves is sized to accommodate only one abrasive grain.

申請人於2008年3月14日申請的申請號097109052揭示一種具有規則磨料轉向方法及產品,是一使平板設置多數個多邊柱形或錐形的定位單元,藉由機械力或振動方法或移動平板使多數個多面體的磨料的一部分分別自動落入多數個定位單元內,並自動轉向使磨料的其中一尖端突出平板的第一表面,或者可進一步使磨料的另一尖端穿過定位單元突出平板的第二表面,因此可方便將磨料依照所設定的排列圖案、間距結合平板,並利用定位單元的槽孔的大小及形狀控制磨料的尖端突出平板的露出高度,且利用定位單元本身的形狀來限制磨料,使磨料被定位後即難以轉動。Applicant No. 097109052, filed on March 14, 2008, the disclosure of which is incorporated herein by reference in its entire entire entire entire entire entire entire entire entire entire entire The plate causes a portion of the plurality of polyhedral abrasives to automatically fall into the plurality of positioning units, respectively, and automatically turns to cause one of the tips of the abrasive to protrude from the first surface of the plate, or to further extend the other end of the abrasive through the positioning unit to protrude the plate The second surface is therefore convenient for the abrasive to be combined with the flat plate according to the set arrangement pattern and the spacing, and the size and shape of the slot of the positioning unit are used to control the exposed height of the tip end of the abrasive protruding plate, and the shape of the positioning unit itself is utilized. The abrasive is limited so that the abrasive is difficult to rotate after it is positioned.

台灣公開專利200714416揭示一種具有燒結體研磨部位之工具及其製造方法,包括具有由超砥粒燒結體所構成的研磨部位之研磨工具,其中研磨部包含具有頂部之複數個研磨單位,各頂部相互地大約位於同一平面上。將多組平行溝群適當的形成於分割研磨部的境界部,使研磨單位盡可能地均等排列配置於研磨部整體。Taiwan Patent Publication No. 200714416 discloses a tool having a sintered body polishing portion and a method of manufacturing the same, comprising an abrasive tool having a polishing portion composed of a super-sintered sintered body, wherein the polishing portion includes a plurality of polishing units having a top portion, and each of the top portions is mutually The ground is on the same plane. A plurality of sets of parallel groove groups are appropriately formed in the boundary portion of the divided polishing portion, and the polishing units are arranged as uniformly as possible on the entire polishing portion.

美國專利US 7150677揭示的一種CMP修整器(CMP conditioner),其修整面黏結多個鑽石磨粒,且鑽石磨粒的(111)晶面平行修整面朝向接觸CMP研磨墊的方向。但以平面接觸CMP研磨墊的切削效率較差。A CMP conditioner disclosed in U.S. Patent No. 7,150,677, the entire surface of which is bonded to a plurality of diamond abrasive grains, and the (111) crystal face parallel polishing surface of the diamond abrasive grains faces the direction of contacting the CMP polishing pad. However, the cutting efficiency of the planar contact CMP polishing pad is poor.

為了提升鑽石切削工具的耐磨性及切削效率,而提出本發明。The present invention has been proposed in order to improve the wear resistance and cutting efficiency of a diamond cutting tool.

本發明的主要目的,在提供一種具有複數切削頂部的切削工具,使複數個別的磨粒被排列在一基座的工作面上,該等磨粒是分別被加工成形而具有一頂部,頂部分別與該等磨粒外邊的晶面上端相連接,利用磨粒的較耐磨耗的晶面接觸一工件的被加工面,以提升切削工具的耐磨性,提升切削效率及延長使用壽命。SUMMARY OF THE INVENTION A primary object of the present invention is to provide a cutting tool having a plurality of cutting tips, wherein a plurality of individual abrasive grains are arranged on a working surface of a base, the abrasive grains being separately formed to have a top portion and a top portion respectively It is connected with the crystal face end of the abrasive grains, and the wear-resistant crystal face of the abrasive grain contacts the processed surface of the workpiece to improve the wear resistance of the cutting tool, improve the cutting efficiency and prolong the service life.

本發明的另一目的,在提供一種具有複數切削頂部的切削工具,使該等磨粒的頂部突出該工作面的高度彼此差異低於百分之20以內,以提升切削效率及品質。Another object of the present invention is to provide a cutting tool having a plurality of cutting tips such that the tops of the abrasive grains protrude from the working surface by a difference of less than 20% from each other to improve cutting efficiency and quality.

本發明的其他目的、功效,請參閱圖式及實施例,詳細說明如下。For other purposes and functions of the present invention, please refer to the drawings and the embodiments, which are described in detail below.

在本發明的敘述與申請專利範圍中,以下術語會依照以下所提出的定義而被使用。In the context of the description and patent application of the present invention, the following terms are used in accordance with the definitions set forth below.

「工作面」指的是工具在一個刨平或加工程序中接觸或被配置來接觸工件之材料的一面,在一些情形中,工作面可能只是面對工件而被操作,但可能不是真的接觸到工件。"Working surface" means the side of the material that the tool contacts or is configured to contact the workpiece in a planing or machining program. In some cases, the working surface may only be operated facing the workpiece, but may not be in actual contact. To the workpiece.

「一般平面」指的是外觀,包括平面的或輪廓外觀,係設置在基座表面上方,其具有磨粒之切削頂部、切削邊緣或切削稜線對齊於該一般平面,這種外觀的例子如同包括,但並不限制在波浪外觀、凸面外觀、凹面外觀以及複數階梯外觀等。"General plane" refers to the appearance, including a planar or contoured appearance, disposed above the surface of the pedestal with the cutting tips, cutting edges or cutting ridges of the abrasive particles aligned with the general plane. Examples of such appearances include , but not limited to the appearance of the wave, the appearance of the convex surface, the appearance of the concave surface, and the appearance of a plurality of steps.

「頂部」是指磨粒相對於自切削工具的基座延伸出最大距離的部分。因此,當為了接觸工件時,磨粒的頂部可比切削工具的其他部分先接觸到工件的表面。頂部刺入工件的刺入深度與磨粒之間的間隔成正比,而其比率與研磨參數(如相對線速度較大則刺入較淺)及工件材質(如刺塑膠工件比金屬工作較深)有關。提高頂部的尖銳度可降低刺入阻力及刺入工作深度。因此多顆磨粒的形狀,其頂部的尖銳度及間距可決定這些磨粒刺入工件的深度分佈。頂部可為尖點狀、稜線狀、弧面狀或多邊形等形狀。"Top" refers to the portion of the abrasive particles that extends a maximum distance relative to the base of the cutting tool. Thus, when in order to contact the workpiece, the top of the abrasive particles may first contact the surface of the workpiece than other portions of the cutting tool. The penetration depth of the top piercing workpiece is proportional to the spacing between the abrasive grains, and the ratio is related to the grinding parameters (such as the shallower penetration of the relative linear velocity) and the material of the workpiece (such as the piercing of the plastic workpiece is deeper than the metal work) )related. Increasing the sharpness of the top reduces the penetration resistance and penetration depth. Therefore, the shape of the plurality of abrasive grains, the sharpness and spacing of the top portions of the abrasive grains determine the depth distribution of the abrasive grains into the workpiece. The top may be in the shape of a pointed point, a ridge line, a curved surface, or a polygon.

當一剛性的磨粒(Grit)在工件的表面加工時,工件的材料被移除的體積與材料的硬度、施於加工材料的正向力及材料的磨擦係數有關。When a rigid abrasive grain (Grit) is machined on the surface of the workpiece, the volume of material removed is related to the hardness of the material, the positive force applied to the material, and the coefficient of friction of the material.

磨粒加工時依被加工的工件的材料特性可分為:The abrasive material processing depends on the material properties of the workpiece being processed:

1.延性材料加工(Ductile materials mold):如圖8所示,當磨粒61刺入延性材料的工件62時,工件62會產生塑性變型(Plastic deformation),被加工的工件62表面620會有隆起的突出物621,這種現象在多顆磨粒61加工時,會在工件62的表面620產生許多的溝槽(Groove),例如加工塑膠等材料。故當加工延性材料的工件62時,需要適當控制磨粒61間的距離,以利涵養(Chip pocket)材料產生塑性變型區域。1. Ductile materials mold: As shown in Fig. 8, when the abrasive particles 61 penetrate the workpiece 62 of the ductile material, the workpiece 62 will have a plastic deformation, and the surface 620 of the workpiece 62 to be processed will be The raised protrusions 621, when processed by the plurality of abrasive particles 61, produce a plurality of grooves (Groove) on the surface 620 of the workpiece 62, such as materials such as plastic. Therefore, when processing the workpiece 62 of the ductile material, it is necessary to appropriately control the distance between the abrasive grains 61 to produce a plastic deformation region of the Chip pocket material.

2.脆性材料加工(Brittle materials mold):如圖9所示,當工件63的硬度較硬時,工件63在磨粒61的兩端會產生側向的微裂紋631,甚至會將工件63成微塊狀(Micro cracking)的方式移除。例如加工矽晶圓或是玻璃等硬脆材料。2. Brittle materials mold: As shown in FIG. 9, when the hardness of the workpiece 63 is hard, the workpiece 63 will produce lateral micro-cracks 631 at both ends of the abrasive particles 61, and even the workpiece 63 will be formed. Micro cracking is removed. For example, processing hard and brittle materials such as silicon wafers or glass.

如圖9、10、11所示,如適當的設計磨粒61的頂部611的楔角角度(Wedge angle,θ)、磨粒61的間距(d)及加工的斜角(α),如圖11所示,便可控制磨粒61的刺入工件64的深度(Dp )及切屑641的側向裂紋寬度(L),如圖9所示,使工件64的表面642產生連續的微塊狀的切屑641,除了可以有效移除材料外,也可控制工件64的表面粗糙度。As shown in FIGS. 9, 10 and 11, the Wedge angle (θ) of the top 611 of the abrasive grain 61, the pitch (d) of the abrasive particles 61, and the bevel angle (α) of the processing are appropriately designed as shown in FIG. As shown in Fig. 11, the depth (D p ) of the abrasive particles 61 pierced into the workpiece 64 and the lateral crack width (L) of the chips 641 can be controlled, as shown in Fig. 9, to cause the surface 642 of the workpiece 64 to produce continuous micro-blocks. The shaped chips 641 can control the surface roughness of the workpiece 64 in addition to the effective removal of the material.

由於磨粒61的形狀不一致時與工件64(被加工物)相互作用,因產生干涉而有深淺不同的加工痕跡。故有些磨粒61會切割(Cutting)工件64的材料,有些磨粒61會犁起(Plowing)工件64的材料,有些磨粒61僅在工件64的表面642滑過(Sliding)。這些複雜的磨削動作,使工件64的表面642的磨痕微細(視磨粒大小而定)、不規則,而磨粒61產生滑動情形越多,切削能力越差。When the shapes of the abrasive grains 61 do not match each other, they interact with the workpiece 64 (the workpiece), and there are different processing marks due to interference. Therefore, some of the abrasive particles 61 will cut the material of the workpiece 64, and some of the abrasive particles 61 will plow the material of the workpiece 64, and some of the abrasive particles 61 will only slide over the surface 642 of the workpiece 64. These complicated grinding operations cause the wear scar on the surface 642 of the workpiece 64 to be fine (depending on the size of the abrasive grains) and irregular, and the more the abrasive grains 61 are slipped, the worse the cutting ability is.

磨粒61與工件64之間,包括下列三種相互作用模式:Between the abrasive particles 61 and the workpiece 64, the following three interaction modes are included:

1.切削作用(Cutting):在切削的過程中工件64有切屑641的產生,如圖11、12所示。1. Cutting: The workpiece 64 has the generation of chips 641 during the cutting process, as shown in Figs.

2.犁切作用(Plowing):在犁切的過程中,工件62產生塑性變形,並沒有切屑的產生,而是在磨粒61的兩側產生脊形的突出物621,如圖8所示。2. Plowing: During the plowing process, the workpiece 62 is plastically deformed without the generation of chips, but a ridge-shaped projection 621 is produced on both sides of the abrasive grain 61, as shown in FIG. .

3.摩擦作用(Rubbing):磨粒61沿著工件64的表面642磨擦,工件64的表面642產生彈性變型部(Elastic deformation)644,如圖13所示。3. Rubbing: The abrasive particles 61 rub along the surface 642 of the workpiece 64, and the surface 642 of the workpiece 64 produces an Elastic deformation 644, as shown in FIG.

在實際的加工狀態,這三種模式都會發生,但是哪一種模式的發生機率較大,依據磨粒的刺入深度及頂部的形貌設計而定,如磨粒頂部的的楔角小時,磨粒較為尖銳,刺入工件的深度(Dp)相對較容易,但是其強度也相對較弱;相反的,當楔角的角度較大時,較不易刺入材料,但有較高的耐磨性。如圖11所示,當磨粒61以正斜角(Rank angle,+α)加工時,切屑641較易沿著磨粒61面滑移,順著剪切面產生變形,而將切屑641移除,有利於加工效率;如圖12所示,當磨粒61以負斜角(-α)加工時,工件64容易被磨粒擠壓,工件64會因會犁切作用產生塑性變形,尤其是軟材料時更容易發生。In the actual processing state, all three modes will occur, but which mode has a higher probability of occurrence, depending on the penetration depth of the abrasive grain and the top shape design, such as the wedge angle at the top of the abrasive grain, the abrasive grain It is sharper and the depth (Dp) penetrated into the workpiece is relatively easy, but its strength is relatively weak. Conversely, when the angle of the wedge angle is larger, it is less likely to penetrate the material, but has higher wear resistance. As shown in Fig. 11, when the abrasive grains 61 are processed at a positive angle (Rank angle, +α), the chips 641 are more likely to slide along the surface of the abrasive particles 61, deforming along the shearing surface, and moving the chips 641. In addition, it is advantageous for processing efficiency; as shown in Fig. 12, when the abrasive grains 61 are processed at a negative oblique angle (-α), the workpiece 64 is easily pressed by the abrasive grains, and the workpiece 64 is plastically deformed by the plowing action, especially It is more likely to occur when it is a soft material.

如圖10、11、14、15所示,當考慮到刺入深度(Dp)與接觸角(Attack angle,β)的關係時,當磨粒61的楔角(θ)愈小時,磨粒61與加工材料的接觸角(β)就愈大,如圖11所示,更容易移除被加工的材料中;接觸角(β)除了與磨粒61的楔角有關外,與加工的斜角(Rake angle,α)也有很大的關係,當負斜角的角度愈大時,接觸角(β)愈小,如圖15所示,材料愈容易被擠壓,材料的移除率愈低。如圖14所示,磨粒61與加工材料的接觸角(β)介於如圖11、15所示的接觸角(β)之間。As shown in FIGS. 10, 11, 14, and 15, when the relationship between the penetration depth (Dp) and the contact angle (β) is considered, when the wedge angle (θ) of the abrasive grain 61 is smaller, the abrasive grain 61 is used. The larger the contact angle (β) with the processed material, as shown in Fig. 11, is easier to remove the material to be processed; the contact angle (β) is in addition to the wedge angle of the abrasive grain 61, and the bevel angle of the processing (Rake angle, α) also has a great relationship. When the angle of the negative bevel is larger, the contact angle (β) is smaller. As shown in Fig. 15, the material is more easily squeezed, and the material removal rate is lower. . As shown in Fig. 14, the contact angle (β) of the abrasive grains 61 with the processed material is between the contact angles (β) as shown in Figs.

磨粒的形貌、楔角角度、銳角尖度(Nose radius,r)以及磨粒的間距都會影響磨粒刺入材料的深度及材料的移除率,因此有效控制這些變因,可使加工模式達最佳化。The morphology of the abrasive particles, the angle of the wedge angle, the nose angle (r) and the spacing of the abrasive particles all affect the depth of the abrasive material and the removal rate of the material. Therefore, the effective control of these causes can be processed. The pattern is optimized.

鑽石的結晶有其方向性,如八面體的鑽石其每一晶面皆是(111)晶面,是碳原子排列最緊密的面,所以硬度較大,也就是較耐磨耗;如六面體的鑽石其每一晶面皆是(100)晶面,是碳原子密度較低的面,所以硬度較軟。因此鑽石在進行切磨拋光時,研磨至鑽石的(111)晶面時即難以繼續加工,而可獲得如圖1、2A、2B、3所示各種不同形狀的鑽石磨粒11、12、12’、13。鑽石磨粒11、12、12’、13的外邊具有複數個(111)晶面111、121、121’、131。鑽石磨粒11、12、12’、13分別具有頂部110、120、120’、130;頂部110、120、120’、130分別呈尖銳狀、稜線狀、弧面狀及平台狀;頂部110、120、120’、130分別與複數個(111)晶面111、121、121’、131的上端相連接。The crystal of a diamond has its directionality. For example, an octahedral diamond has a (111) crystal plane on each crystal plane, which is the surface with the most closely arranged carbon atoms, so the hardness is relatively large, that is, it is more wear-resistant; The faceted diamond has a (100) crystal plane on each crystal face and is a surface with a low carbon atom density, so the hardness is soft. Therefore, when the diamond is ground and polished, it is difficult to continue processing when it is ground to the (111) crystal plane of the diamond, and diamond abrasive grains 11, 12, 12 of various shapes as shown in Figs. 1, 2A, 2B, and 3 can be obtained. ', 13. The outer edges of the diamond abrasive grains 11, 12, 12', 13 have a plurality of (111) crystal faces 111, 121, 121', 131. The diamond abrasive grains 11, 12, 12', 13 respectively have a top portion 110, 120, 120', 130; the top portions 110, 120, 120', 130 are respectively sharp, ridged, curved, and platform-shaped; 120, 120', 130 are respectively connected to upper ends of a plurality of (111) crystal faces 111, 121, 121', 131.

利用機械研磨加工、能量束切割等多種加工方法,可加工鑽石形成具有頂部的特定形狀,除了上述圖1、2A、2B、3所示鑽石磨粒11、12、12’、13所示的形狀外,也可形成圓錐形、三邊錐形、四邊錐形或是其他多邊錐形的形狀、或是稜鏡形、四邊體、多邊體的形狀,除加工面的形狀改變外,其他鑽石原生面的形狀仍可保留,且頂部與鑽石磨粒外邊的被加工晶面的上端相連接,例如較耐磨耗的(111)晶面,利用(111)晶面對工件進行切削、研磨,可使工具的研磨壽命延長。The diamond can be formed into a specific shape having a top portion by various processing methods such as mechanical grinding processing and energy beam cutting, in addition to the shapes shown by the diamond abrasive grains 11, 12, 12', and 13 shown in Figs. 1, 2A, 2B, and 3 above. In addition, it can also form a conical shape, a triangular pyramid shape, a quadrangular pyramid shape or other polygonal conical shapes, or a shape of a dome shape, a quadrilateral body or a polygonal body. In addition to the shape change of the processing surface, other diamonds are native. The shape of the face can still be retained, and the top is connected with the upper end of the processed crystal face outside the diamond abrasive grain, for example, the wear-resistant (111) crystal face, and the (111) crystal is used for cutting and grinding the workpiece. Extend the grinding life of the tool.

本發明係提供一種具有複數切削頂部的切削工具,可被用來切割或做其他作用於一工件以從工件中移除材料,並可提供工件有一完整、均勻和/或平坦的表面。本發明之切削工具可有效地被應用,例如一從工件刨除材料的刨平裝置、用於加工不同工件的加工裝置以及一研磨各種不同工件的研磨裝置。SUMMARY OF THE INVENTION The present invention provides a cutting tool having a plurality of cutting tips that can be used to cut or otherwise act on a workpiece to remove material from the workpiece and provide a complete, uniform and/or flat surface to the workpiece. The cutting tool of the present invention can be effectively applied, such as a planing device for removing material from a workpiece, a processing device for processing different workpieces, and a grinding device for grinding various different workpieces.

如圖4、5所示,本發明之第一實施例的切削工具20,包括一基座21,該基座21包括一工作面211,工作面211朝向如圖6所示的工件30,以執行切割或刨平的工作;複數個別的磨粒22、23、24、25等可被排列在基座21的工作面211上,而磨粒22、23、24、25分別被加工成形而具有一頂部221、231、241、251;頂部221、231、241、251的楔角的角度為30~150度;磨粒22、23、24、25分別與工件30的接觸角為30~150度。頂部221、231、241、251分別為磨粒22、23、24、25最突出的部分,也可為具有尖銳形狀部分,且尖銳形狀部分的尖點其半徑小於100微米(Micron)。磨粒22、23、24、25的直徑大於0.5毫米。該基座21是一圓盤狀。磨粒22、23、24、25是以特定圖案排列在工作面211的表面,例如圖4所示複數直線排列的特定圖案200。工作面211的表面結合超過一百顆的磨粒22、23、24、25。磨粒22、23、24、25可為工業鑽石磨粒。本實施例的切削工具20也可包括如圖1、2A、2B、3所示各種不同形狀的鑽石磨粒11、12、12’、13。As shown in FIGS. 4 and 5, the cutting tool 20 of the first embodiment of the present invention includes a base 21 including a working surface 211 facing the workpiece 30 as shown in FIG. Performing a cutting or planing operation; a plurality of individual abrasive grains 22, 23, 24, 25, etc. may be arranged on the working surface 211 of the base 21, and the abrasive grains 22, 23, 24, 25 are respectively formed and formed a top portion 221, 231, 241, 251; the angle of the wedge angle of the top portions 221, 231, 241, 251 is 30 to 150 degrees; the contact angle of the abrasive grains 22, 23, 24, 25 with the workpiece 30 is 30 to 150 degrees, respectively. . The top portions 221, 231, 241, 251 are the most prominent portions of the abrasive grains 22, 23, 24, 25, respectively, and may also have sharp-shaped portions, and the sharp points of the sharp-shaped portions have a radius of less than 100 micrometers (Micron). The diameter of the abrasive particles 22, 23, 24, 25 is greater than 0.5 mm. The base 21 is in the shape of a disk. The abrasive grains 22, 23, 24, 25 are arranged on a surface of the work surface 211 in a specific pattern, for example, a specific pattern 200 arranged in a plurality of lines as shown in FIG. The surface of the working surface 211 incorporates more than one hundred abrasive grains 22, 23, 24, 25. The abrasive particles 22, 23, 24, 25 can be industrial diamond abrasive particles. The cutting tool 20 of the present embodiment may also include diamond abrasive grains 11, 12, 12', 13 of various shapes as shown in Figs. 1, 2A, 2B, and 3.

如圖4、5所示,該等頂部221、231、241、251與一般平面40的高度差在10微米(Micron)以內。該等頂部221、231、241、251之間的間距為該磨粒22、23、24、25的直徑的3~10倍。如圖4、5、6所示,每一個頂部221、231、241、251突出工作面211的高度彼此差異低於百分之20以內,使大部分的頂部221、231、241、251均能同時刺入工件30,在工件30的表面形成較多的溝槽,以提升切削效率及品質。As shown in Figures 4 and 5, the height difference between the top portions 221, 231, 241, 251 and the general plane 40 is within 10 micrometers (Micron). The pitch between the top portions 221, 231, 241, and 251 is 3 to 10 times the diameter of the abrasive grains 22, 23, 24, and 25. As shown in Figures 4, 5, and 6, the heights of the protrusions 211 of each of the top portions 221, 231, 241, and 251 are less than 20% of each other, so that most of the top portions 221, 231, 241, and 251 can At the same time, the workpiece 30 is pierced, and more grooves are formed on the surface of the workpiece 30 to improve cutting efficiency and quality.

如圖6所示該磨粒22切削頂部221可抵靠工件30,且磨粒22與該工件30可相對的移動,如圖6中的箭號所示,以割、切、刨或其他從工件30移除小片體或切屑31,使得該工件30的表面非常平坦且具有特定溝紋形狀。As shown in Fig. 6, the cutting tip 221 of the abrasive grain 22 can abut against the workpiece 30, and the abrasive grain 22 can move relative to the workpiece 30, as indicated by the arrow in Fig. 6, to cut, cut, plan or otherwise The workpiece 30 removes the small pieces or chips 31 such that the surface of the workpiece 30 is very flat and has a particular groove shape.

磨粒22、23、24、25分別為圓錐形、四邊錐形、五邊錐形、三邊錐形或是其他多邊錐形的特定形狀、或是稜鏡形、四邊體、多邊體的形狀。磨粒22、23、24、25可分別為鑽石磨粒,其頂部221、231、241、251分別與鑽石磨粒外邊被加工的晶面上端相連接,例如(111)晶面,利用此晶面接觸被研磨工件,對工件進行切削、研磨,而較為耐磨耗。The abrasive grains 22, 23, 24, 25 are respectively a conical shape, a quadrangular pyramid shape, a pentagonal cone shape, a triangular pyramid shape or a specific shape of other polygonal cones, or a shape of a dome shape, a quadrangular body, or a polygonal body. . The abrasive grains 22, 23, 24, 25 may be diamond abrasive grains, respectively, and the top portions 221, 231, 241, and 251 are respectively connected to the crystal face end which is processed outside the diamond abrasive grain, for example, a (111) crystal face, and the crystal is used. The surface is contacted with the workpiece to be ground, and the workpiece is cut and ground, which is more wear-resistant.

如圖7所示,本發明第二實施例的切削工具50,包括一基座51,該基座51包括一工作面511,工作面511朝向如圖6所示的工件30,以執行切割或刨平的工作;複數個別的磨粒22、23、24、25等可被排列在基座51的工作面511上;磨粒22、23、24、25分別與工件的接觸角為30~150度。基座51是輪狀。本實施例的切削工具50也可包括如圖1、2A、2B、3所示各種不同形狀的鑽石磨粒11、12、12’、13。As shown in FIG. 7, a cutting tool 50 according to a second embodiment of the present invention includes a base 51 including a working surface 511 facing the workpiece 30 as shown in FIG. 6 to perform cutting or Planing work; a plurality of individual abrasive grains 22, 23, 24, 25, etc. may be arranged on the working surface 511 of the base 51; the contact angles of the abrasive grains 22, 23, 24, 25 with the workpiece are respectively 30 to 150 degree. The base 51 is in the shape of a wheel. The cutting tool 50 of the present embodiment may also include diamond abrasive grains 11, 12, 12', 13 of various shapes as shown in Figs. 1, 2A, 2B, and 3.

本發明的磨粒可為立方晶氮化硼(cBN)磨粒、鑽石磨粒等超硬材料磨粒。The abrasive grains of the present invention may be abrasive grains of superhard materials such as cubic boron nitride (cBN) abrasive grains and diamond abrasive grains.

本發明可利用電鍍材料、燒結材料、樹脂材料(Polymer materials)、焊接材料等材料作為結合劑固定結合磨粒和基座,例如利用金屬材料作為結合劑以硬銲(Brazing)或燒結(Sintering)等結合作業,將磨粒固定在基座上。The present invention can use a plating material, a sintered material, a resin material, a solder material or the like as a bonding agent to fix the bonded abrasive particles and the susceptor, for example, using a metal material as a bonding agent for brazing or sintering (Sintering). The bonding particles are fixed on the pedestal by a combination operation.

本發明的基座可為金屬、金屬合金、塑膠、陶瓷、複合材料等任何材料之基座。The susceptor of the present invention may be a susceptor of any material such as metal, metal alloy, plastic, ceramic, composite material or the like.

本發明之切削工具可被使用在不同的應用中,其中一實施例是特別適用於刨平實質上是易碎的工件,例如矽晶圓、玻璃片、金屬、經平坦化回收的使用過矽晶圓、LCD玻璃、LED基材、碳化矽晶圓、石英晶圓、氮化矽、氧化鋯等。在習用的矽晶圓處理科技中,被研磨的晶圓一般可被載具乘載並定位在一設置在旋轉平台上之研磨墊上,當施與研磨劑於研磨墊並施與壓力在載具上時,該晶圓可藉著平台與載具相對的移動而被磨光,因此,該矽晶圓實際上是藉由細小的研磨料作用而被磨平或磨光,以得到一相對光滑的表面。The cutting tool of the present invention can be used in a variety of applications, one of which is particularly useful for planing workpieces that are substantially fragile, such as tantalum wafers, glass sheets, metals, flattened recycled used Wafer, LCD glass, LED substrate, tantalum carbide wafer, quartz wafer, tantalum nitride, zirconia, etc. In conventional silicon wafer processing technology, the wafer to be polished can generally be carried by the carrier and positioned on a polishing pad disposed on the rotating platform, when the abrasive is applied to the polishing pad and the pressure is applied to the carrier. In the upper case, the wafer can be polished by the relative movement of the platform and the carrier. Therefore, the germanium wafer is actually smoothed or polished by the action of fine abrasive to obtain a relatively smooth s surface.

本發明之切削工具也可被使用在化學機械研磨法(Chemical Mechanical Polishing,CMP)中,作為一拋光墊修整器(Pad Dresser),即如圖6所示該工件30可為一CMP拋光墊,本發明之切削工具可在CMP拋光墊形成特定大小、形狀的粗糙區域32。粗糙區域32的粗糙度(Ra)小於50微米,且粗糙區域32形成的纖維(Asperities)頂部並未突出超過CMP拋光墊表面的平均高度大於20微米。The cutting tool of the present invention can also be used in a Chemical Mechanical Polishing (CMP) as a pad dresser, that is, the workpiece 30 can be a CMP pad as shown in FIG. The cutting tool of the present invention can form a roughened region 32 of a particular size and shape in the CMP pad. The roughness (Ra) of the rough regions 32 is less than 50 microns, and the tops of the fibers formed by the rough regions 32 do not protrude beyond the average height of the CMP pad surface by more than 20 microns.

本發明具有複數切削頂部的切削工具,是使複數個別的磨粒被排列在一基座的工作面上,該等磨粒是分別被加工成形而具有一頂部,該等頂部的楔角的角度為30~150度,該等磨粒分別與工件的接觸角為30~150度,該頂部的方向可垂直於磨粒的晶格的被加工面,以提升切削工具的耐磨性,提升切削效率及延長使用壽命;進一步使該等磨粒的頂部突出該工作面的高度彼此差異低於百分之20以內,以提升切削品質。The cutting tool having a plurality of cutting tops of the present invention is such that a plurality of individual abrasive grains are arranged on a working surface of a base, the abrasive grains are separately formed to have a top, and the angle of the wedge angle of the tops For 30~150 degrees, the contact angle of the abrasive grains with the workpiece is 30~150 degrees, and the direction of the top can be perpendicular to the processed surface of the crystal lattice of the abrasive grain to improve the wear resistance of the cutting tool and improve the cutting. Efficiency and prolonging the service life; further making the tops of the abrasive grains protrude from the working surface to a difference of less than 20% from each other to improve the cutting quality.

以上所記載,僅為利用本發明技術內容之實施例,任何熟悉本項技藝者運用本發明所為之修飾、變化,皆屬本發明主張之專利範圍,而不限於實施例所揭示者。The above description is only for the embodiments of the present invention, and any modifications and variations made by those skilled in the art using the present invention are the scope of the invention claimed, and are not limited to the embodiments disclosed.

11、12、12’、13...鑽石磨粒11, 12, 12', 13. . . Diamond abrasive

110、120、120’、130...頂部110, 120, 120', 130. . . top

111、121、121’、131(111)...晶面111, 121, 121', 131 (111). . . Planes

20、50...切削工具20, 50. . . Cutting tool

200...特定圖案200. . . Specific pattern

21、51...基座21, 51. . . Pedestal

211、511...工作面211, 511. . . Working face

22、23、24、25、61...磨粒22, 23, 24, 25, 61. . . Abrasive grain

221、231、241、251、611...頂部221, 231, 241, 251, 611. . . top

30、62、63、64...工件30, 62, 63, 64. . . Workpiece

31、641...切屑31, 641. . . Chip

32...粗糙區域32. . . Rough area

40...一般平面40. . . General plane

620、642...表面620, 642. . . surface

621...突出物621. . . obstructive

631...微裂紋631. . . Microcrack

644...彈性變型部644. . . Elastic deformation department

圖1為頂部呈尖銳狀的鑽石磨粒的示意圖。Figure 1 is a schematic illustration of a diamond abrasive grain having a sharp top.

圖2A為頂部呈稜線狀的鑽石磨粒的示意圖。Figure 2A is a schematic illustration of a diamond granule with a ridgeline at the top.

圖2B為頂部呈弧面狀的鑽石磨粒的示意圖。Figure 2B is a schematic illustration of a diamond abrasive grain having a curved top portion.

圖3為頂部呈平台狀的鑽石磨粒的示意圖。Figure 3 is a schematic illustration of a diamond abrasive grain having a top as a platform.

圖4為本發明第一實施例的切削工具的示意圖。Figure 4 is a schematic view of a cutting tool in accordance with a first embodiment of the present invention.

圖5為圖4中的AA剖面示意圖。FIG. 5 is a schematic cross-sectional view taken along line AA of FIG. 4. FIG.

圖6為本發明切削工具切削工件的示意圖。Figure 6 is a schematic view of a cutting tool for cutting a workpiece according to the present invention.

圖7為本發明第二實施例的切削工具的示意圖。Figure 7 is a schematic view of a cutting tool in accordance with a second embodiment of the present invention.

圖8為磨粒刺入工件產生塑性變形的示意圖。Fig. 8 is a schematic view showing plastic deformation of abrasive grains pierced into a workpiece.

圖9為磨粒刺入工件產生側向的微裂紋的示意圖。Figure 9 is a schematic illustration of the lateral microcracking of the abrasive particles piercing the workpiece.

圖10為複數磨粒切削工件的示意圖。Figure 10 is a schematic illustration of a plurality of abrasive particles cutting a workpiece.

圖11為磨粒以正斜角加工時的示意圖。Figure 11 is a schematic view of the abrasive grains processed at a positive oblique angle.

圖12為磨粒以負斜角加工時的示意圖。Figure 12 is a schematic view of the abrasive grains processed at a negative oblique angle.

圖13為磨粒沿著工件的表面磨擦產生彈性變型部的示意圖。Fig. 13 is a schematic view showing that the abrasive grains are rubbed along the surface of the workpiece to produce an elastic deformation portion.

圖14為磨粒以較小的接觸角加工時的示意圖。Figure 14 is a schematic illustration of abrasive grains processed at a small contact angle.

圖15為磨粒以更小的接觸角加工時的示意圖。Figure 15 is a schematic illustration of abrasive grains processed at a smaller contact angle.

20...切削工具20. . . Cutting tool

200...特定圖案200. . . Specific pattern

21...基座twenty one. . . Pedestal

211...工作面211. . . Working face

22、23、24、25...磨粒22, 23, 24, 25. . . Abrasive grain

221、231、241、251...頂部221, 231, 241, 251. . . top

Claims (26)

一種具有複數切削頂部的切削工具,包括:一基座,其具有一工作面,該工作面朝向並面向一工件;複數個別的磨粒,是依不同的加工特性需要組合排列在該基座的工作面上;其特徵在於:該等磨粒是分別被加工成形而分別具有一頂部的特定形狀,該等頂部分別突出該工作面,該等頂部分別突出該工作面的高度彼此差異低於百分之20以內;該等頂部與一般平面的高度差在10微米以內;其中該等磨粒之間具有空隙,以調節該等磨粒刺入該工件的深度,以在該工件上刻劃出特定分佈的溝紋,且該特定分佈的溝紋決定該工件的表面的粗糙度。 A cutting tool having a plurality of cutting tops, comprising: a base having a working surface facing and facing a workpiece; a plurality of individual abrasive grains are arranged in combination on the base according to different processing characteristics The working surface is characterized in that the abrasive grains are respectively formed into a specific shape having a top portion, and the top portions respectively protrude the working surface, and the top portions respectively protrude from the working surface with a height difference of less than one hundred Within 20 minutes; the difference between the top and the general plane is within 10 microns; wherein there is a gap between the abrasive grains to adjust the depth of the abrasive particles into the workpiece to be scored on the workpiece A particular distribution of grooves, and the grooves of the particular distribution determine the roughness of the surface of the workpiece. 如申請專利範圍第1項所述之具有複數切削頂部的切削工具,其中該等磨粒為立方晶氮化硼磨粒或鑽石磨粒其中之一者。 A cutting tool having a plurality of cutting tips as described in claim 1, wherein the abrasive particles are one of cubic boron nitride abrasive grains or diamond abrasive grains. 如申請專利範圍第2項所述之具有複數切削頂部的切削工具,其中該等磨粒的形狀是圓錐形、多邊錐形、稜鏡形、四邊體或多邊體其中之一者。 A cutting tool having a plurality of cutting tips as described in claim 2, wherein the abrasive grains are in the shape of a conical shape, a polygonal cone shape, a dome shape, a quadrilateral body or a polygonal body. 如申請專利範圍第3項所述之具有複數切削頂部的切削工具,其中該等磨粒的直徑大於0.5毫米。 A cutting tool having a plurality of cutting tips as described in claim 3, wherein the abrasive grains have a diameter greater than 0.5 mm. 如申請專利範圍第4項所述之具有複數切削頂部的切削工具,其中該等頂部之間的間距為該等磨粒的直徑的3~10倍。 A cutting tool having a plurality of cutting tips as described in claim 4, wherein the spacing between the tops is 3 to 10 times the diameter of the abrasive grains. 如申請專利範圍第5項所述之具有複數切削頂部的切削工具,其中該等磨粒是分別被機械研磨加工或能量束切割加工其中之一的加工成形的。 A cutting tool having a plurality of cutting tips as described in claim 5, wherein the abrasive grains are formed by machining one of mechanical grinding or energy beam cutting, respectively. 如申請專利範圍第6項所述之具有複數切削頂部的切削工具, 其中該等磨粒是以特定圖案排列在該工作面的表面。 A cutting tool having a plurality of cutting tops as described in claim 6 of the patent application, Wherein the abrasive particles are arranged in a specific pattern on the surface of the work surface. 如申請專利範圍第7項所述之具有複數切削頂部的切削工具,其中該工作面的表面結合超過一百顆的該等磨粒。 A cutting tool having a plurality of cutting tips as described in claim 7 wherein the surface of the working surface incorporates more than one hundred of the abrasive particles. 如申請專利範圍第8項所述之具有複數切削頂部的切削工具,其中該等磨粒的形狀是圓錐形或多邊錐形其中之一者;該等頂部分別為該等磨粒具有尖銳形狀部分的尖點且其半徑小於100微米。 The cutting tool having a plurality of cutting tops according to claim 8, wherein the shape of the abrasive grains is one of a conical shape or a polygonal cone; the top portions respectively have sharp portions of the abrasive grains The sharp point and its radius is less than 100 microns. 如申請專利範圍第9項所述之具有複數切削頂部的切削工具,其中該基座為金屬、金屬合金、塑膠、陶瓷或複合材料之基座其中之一者。 A cutting tool having a plurality of cutting tips as described in claim 9 wherein the susceptor is one of a base of metal, metal alloy, plastic, ceramic or composite material. 如申請專利範圍第10項所述之具有複數切削頂部的切削工具,其中該等磨粒和該基座之間是以電鍍、燒結、焊接固定結合,或以樹脂材料作為結合劑固定結合。 The cutting tool having a plurality of cutting tops according to claim 10, wherein the abrasive grains and the susceptor are fixedly bonded by electroplating, sintering, welding, or fixedly bonded with a resin material as a bonding agent. 如申請專利範圍第11項所述之具有複數切削頂部的切削工具,其中該等磨粒和該基座之間是以金屬材料作為結合劑,以硬銲作業或燒結作業其中之一的作業將該等磨粒固定在該基座上。 The cutting tool having a plurality of cutting tops according to claim 11, wherein a work of one of a brazing operation or a sintering operation is performed between the abrasive grains and the base with a metal material as a bonding agent. The abrasive particles are fixed to the base. 如申請專利範圍第1至12項中任一項所述之具有複數切削頂部的切削工具,其中該基座是圓盤狀。 A cutting tool having a plurality of cutting tips according to any one of claims 1 to 12, wherein the base is disc-shaped. 如申請專利範圍第13項所述之具有複數切削頂部的切削工具,其中該切削工具是一拋光墊修整器;該工件是一拋光墊。 A cutting tool having a plurality of cutting tips as described in claim 13 wherein the cutting tool is a polishing pad dresser; the workpiece is a polishing pad. 如申請專利範圍第14項所述之具有複數切削頂部的切削工具,其中該拋光墊是一CMP拋光墊。 A cutting tool having a plurality of cutting tips as described in claim 14 wherein the polishing pad is a CMP polishing pad. 如申請專利範圍第15項所述之具有複數切削頂部的切削工具,其中該切削工具在該CMP拋光墊形成特定大小、形狀的粗 糙區域;該粗糙區域的粗糙度小於50微米。 A cutting tool having a plurality of cutting tips as described in claim 15 wherein the cutting tool forms a specific size and shape in the CMP polishing pad. Rough area; the roughness of the rough area is less than 50 microns. 如申請專利範圍第16項所述之具有複數切削頂部的切削工具,其中該粗糙區域形成的纖維頂部並未突出超過該CMP拋光墊表面的平均高度大於20微米。 A cutting tool having a plurality of cutting tips as described in claim 16 wherein the roughened regions form a fiber top that does not protrude beyond the average height of the CMP pad surface by more than 20 microns. 如申請專利範圍第17項所述之具有複數切削頂部的切削工具,其中該等磨粒為鑽石磨粒;且該等鑽石磨粒的頂部分別與該等鑽石磨粒外邊的晶面的上端相連接。 The cutting tool having a plurality of cutting tips according to claim 17, wherein the abrasive grains are diamond abrasive grains; and the tops of the diamond abrasive grains are respectively opposite to the upper ends of the crystal faces of the diamond abrasive grains. connection. 如申請專利範圍第18項所述之具有複數切削頂部的切削工具,其中該等鑽石磨粒外邊的晶面是(111)晶面。 A cutting tool having a plurality of cutting tips as described in claim 18, wherein the crystal faces outside the diamond abrasive grains are (111) crystal faces. 如申請專利範圍第19項所述之具有複數切削頂部的切削工具,其中該等磨粒為工業鑽石磨粒。 A cutting tool having a plurality of cutting tips as described in claim 19, wherein the abrasive grains are industrial diamond abrasive grains. 如申請專利範圍第20項所述之具有複數切削頂部的切削工具,其中該等磨粒的頂部分別呈尖銳狀、稜線狀、弧面狀及平台狀其中之一者。 The cutting tool having a plurality of cutting tops according to claim 20, wherein the tops of the abrasive grains are respectively one of a sharp shape, a ridge line shape, a curved surface shape and a platform shape. 如申請專利範圍第1至12項中任一項所述之具有複數切削頂部的切削工具,其中該基座是輪狀。 A cutting tool having a plurality of cutting tips according to any one of claims 1 to 12, wherein the base is a wheel. 如申請專利範圍第22項所述之具有複數切削頂部的切削工具,其中該等磨粒為鑽石磨粒;且該等鑽石磨粒的頂部分別與該等鑽石磨粒外邊的晶面的上端相連接。 The cutting tool having a plurality of cutting tops according to claim 22, wherein the abrasive grains are diamond abrasive grains; and the tops of the diamond abrasive grains are respectively opposite to the upper ends of the crystal faces of the diamond abrasive grains. connection. 如申請專利範圍第23項所述之具有複數切削頂部的切削工具,其中該等鑽石磨粒外邊的晶面是(111)晶面。 A cutting tool having a plurality of cutting tips as described in claim 23, wherein the crystal faces outside the diamond abrasive grains are (111) crystal faces. 如申請專利範圍第24項所述之具有複數切削頂部的切削工具,其中該等磨粒為工業鑽石磨粒。 A cutting tool having a plurality of cutting tips as described in claim 24, wherein the abrasive particles are industrial diamond abrasive particles. 如申請專利範圍第25項所述之具有複數切削頂部的切削工具,其中該等磨粒的頂部分別呈尖銳狀、弧面狀、稜線狀及平 台狀其中之一者。 The cutting tool having a plurality of cutting tops according to claim 25, wherein the tops of the abrasive grains are sharp, curved, ribbed and flat, respectively. One of the tables.
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