TWI414881B - - Google Patents

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Publication number
TWI414881B
TWI414881B TW98134753A TW98134753A TWI414881B TW I414881 B TWI414881 B TW I414881B TW 98134753 A TW98134753 A TW 98134753A TW 98134753 A TW98134753 A TW 98134753A TW I414881 B TWI414881 B TW I414881B
Authority
TW
Taiwan
Prior art keywords
light mask
bar code
layer
etching
light
Prior art date
Application number
TW98134753A
Other languages
Chinese (zh)
Other versions
TW201113631A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW98134753A priority Critical patent/TW201113631A/en
Publication of TW201113631A publication Critical patent/TW201113631A/en
Application granted granted Critical
Publication of TWI414881B publication Critical patent/TWI414881B/zh

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  • Surface Treatment Of Glass (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

This invention is an improved light mask manufacturing process. The process comprises of obtaining such light mask materials as a glass layer, a chrome layer, an oxide layer, and a photo resistance layer. Apply processing step to the light mask materials in the following order: light exposure, layout of graphics, bar code printing, etching, and stripping process. The bar code printing process is the most significant characteristic amongst the aforementioned processes, because it utilizes a machine to spray paint the bar code at an appropriate location on the chrome layer. Hence, the bar code can be formed on the light mask at the same time after etching and stripping processes are completed. Therefore, this manufacturing process is fast, simple, and offer stable quality while provides convenience to user management over the light mask.
TW98134753A 2009-10-14 2009-10-14 Improved light mask manufacturing process TW201113631A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW98134753A TW201113631A (en) 2009-10-14 2009-10-14 Improved light mask manufacturing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW98134753A TW201113631A (en) 2009-10-14 2009-10-14 Improved light mask manufacturing process

Publications (2)

Publication Number Publication Date
TW201113631A TW201113631A (en) 2011-04-16
TWI414881B true TWI414881B (en) 2013-11-11

Family

ID=44909702

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98134753A TW201113631A (en) 2009-10-14 2009-10-14 Improved light mask manufacturing process

Country Status (1)

Country Link
TW (1) TW201113631A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104460239A (en) * 2014-11-14 2015-03-25 深圳市路维光电股份有限公司 Manufacturing method of photomask sub-plate with code

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6586158B2 (en) * 2001-05-25 2003-07-01 The United States Of America As Represented By The Secretary Of The Navy Anti-charging layer for beam lithography and mask fabrication
TW200611158A (en) * 2004-06-25 2006-04-01 Photronics Inc Rule based system and method for automatically generating photomask orders
TW200722929A (en) * 2005-12-14 2007-06-16 Fujitsu Ltd Fabrication method for photomask, fabrication method for device and monitoring method for photomask
JP2009058950A (en) * 2007-08-07 2009-03-19 Hoya Corp Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6586158B2 (en) * 2001-05-25 2003-07-01 The United States Of America As Represented By The Secretary Of The Navy Anti-charging layer for beam lithography and mask fabrication
TW200611158A (en) * 2004-06-25 2006-04-01 Photronics Inc Rule based system and method for automatically generating photomask orders
TW200722929A (en) * 2005-12-14 2007-06-16 Fujitsu Ltd Fabrication method for photomask, fabrication method for device and monitoring method for photomask
JP2009058950A (en) * 2007-08-07 2009-03-19 Hoya Corp Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate

Also Published As

Publication number Publication date
TW201113631A (en) 2011-04-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees