TWI414881B - - Google Patents
Info
- Publication number
- TWI414881B TWI414881B TW98134753A TW98134753A TWI414881B TW I414881 B TWI414881 B TW I414881B TW 98134753 A TW98134753 A TW 98134753A TW 98134753 A TW98134753 A TW 98134753A TW I414881 B TWI414881 B TW I414881B
- Authority
- TW
- Taiwan
- Prior art keywords
- light mask
- bar code
- layer
- etching
- light
- Prior art date
Links
Landscapes
- Surface Treatment Of Glass (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
This invention is an improved light mask manufacturing process. The process comprises of obtaining such light mask materials as a glass layer, a chrome layer, an oxide layer, and a photo resistance layer. Apply processing step to the light mask materials in the following order: light exposure, layout of graphics, bar code printing, etching, and stripping process. The bar code printing process is the most significant characteristic amongst the aforementioned processes, because it utilizes a machine to spray paint the bar code at an appropriate location on the chrome layer. Hence, the bar code can be formed on the light mask at the same time after etching and stripping processes are completed. Therefore, this manufacturing process is fast, simple, and offer stable quality while provides convenience to user management over the light mask.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW98134753A TW201113631A (en) | 2009-10-14 | 2009-10-14 | Improved light mask manufacturing process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW98134753A TW201113631A (en) | 2009-10-14 | 2009-10-14 | Improved light mask manufacturing process |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201113631A TW201113631A (en) | 2011-04-16 |
TWI414881B true TWI414881B (en) | 2013-11-11 |
Family
ID=44909702
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW98134753A TW201113631A (en) | 2009-10-14 | 2009-10-14 | Improved light mask manufacturing process |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW201113631A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104460239A (en) * | 2014-11-14 | 2015-03-25 | 深圳市路维光电股份有限公司 | Manufacturing method of photomask sub-plate with code |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6586158B2 (en) * | 2001-05-25 | 2003-07-01 | The United States Of America As Represented By The Secretary Of The Navy | Anti-charging layer for beam lithography and mask fabrication |
TW200611158A (en) * | 2004-06-25 | 2006-04-01 | Photronics Inc | Rule based system and method for automatically generating photomask orders |
TW200722929A (en) * | 2005-12-14 | 2007-06-16 | Fujitsu Ltd | Fabrication method for photomask, fabrication method for device and monitoring method for photomask |
JP2009058950A (en) * | 2007-08-07 | 2009-03-19 | Hoya Corp | Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate |
-
2009
- 2009-10-14 TW TW98134753A patent/TW201113631A/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6586158B2 (en) * | 2001-05-25 | 2003-07-01 | The United States Of America As Represented By The Secretary Of The Navy | Anti-charging layer for beam lithography and mask fabrication |
TW200611158A (en) * | 2004-06-25 | 2006-04-01 | Photronics Inc | Rule based system and method for automatically generating photomask orders |
TW200722929A (en) * | 2005-12-14 | 2007-06-16 | Fujitsu Ltd | Fabrication method for photomask, fabrication method for device and monitoring method for photomask |
JP2009058950A (en) * | 2007-08-07 | 2009-03-19 | Hoya Corp | Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate |
Also Published As
Publication number | Publication date |
---|---|
TW201113631A (en) | 2011-04-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |