TWI410298B - Abrasive cloth for high-precision processing - Google Patents
Abrasive cloth for high-precision processing Download PDFInfo
- Publication number
- TWI410298B TWI410298B TW096120037A TW96120037A TWI410298B TW I410298 B TWI410298 B TW I410298B TW 096120037 A TW096120037 A TW 096120037A TW 96120037 A TW96120037 A TW 96120037A TW I410298 B TWI410298 B TW I410298B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- nonwoven fabric
- polishing
- polishing cloth
- melt
- Prior art date
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- 239000004744 fabric Substances 0.000 title claims abstract description 162
- 238000012545 processing Methods 0.000 title abstract description 90
- 238000005498 polishing Methods 0.000 claims abstract description 176
- 239000000835 fiber Substances 0.000 claims abstract description 108
- 239000004745 nonwoven fabric Substances 0.000 claims abstract description 73
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 230000006835 compression Effects 0.000 claims abstract description 21
- 238000007906 compression Methods 0.000 claims abstract description 21
- 238000010521 absorption reaction Methods 0.000 claims abstract description 12
- 239000010410 layer Substances 0.000 claims description 113
- 239000004750 melt-blown nonwoven Substances 0.000 claims description 47
- 238000003754 machining Methods 0.000 claims description 33
- 238000002835 absorbance Methods 0.000 claims description 22
- 229920002635 polyurethane Polymers 0.000 claims description 19
- 239000004814 polyurethane Substances 0.000 claims description 19
- 239000006185 dispersion Substances 0.000 claims description 16
- 229920000728 polyester Polymers 0.000 claims description 13
- 229920001410 Microfiber Polymers 0.000 claims description 11
- 238000002425 crystallisation Methods 0.000 claims description 8
- 230000008025 crystallization Effects 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 7
- 239000002131 composite material Substances 0.000 claims description 5
- 238000009987 spinning Methods 0.000 claims description 5
- 239000002344 surface layer Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 description 35
- 239000006061 abrasive grain Substances 0.000 description 29
- 239000000758 substrate Substances 0.000 description 25
- 229920001971 elastomer Polymers 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 20
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- 239000000806 elastomer Substances 0.000 description 18
- 238000005259 measurement Methods 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 16
- -1 polyethylene terephthalate Polymers 0.000 description 14
- 229920000139 polyethylene terephthalate Polymers 0.000 description 12
- 239000005020 polyethylene terephthalate Substances 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000839 emulsion Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 230000003746 surface roughness Effects 0.000 description 7
- 238000000227 grinding Methods 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000004721 Polyphenylene oxide Substances 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229920000570 polyether Polymers 0.000 description 4
- 239000011800 void material Substances 0.000 description 4
- 239000002759 woven fabric Substances 0.000 description 4
- 229920002292 Nylon 6 Polymers 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 229920003232 aliphatic polyester Polymers 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- SENMPMXZMGNQAG-UHFFFAOYSA-N 3,4-dihydro-2,5-benzodioxocine-1,6-dione Chemical compound O=C1OCCOC(=O)C2=CC=CC=C12 SENMPMXZMGNQAG-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- 239000004970 Chain extender Substances 0.000 description 1
- 229920001634 Copolyester Polymers 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 241000692870 Inachis io Species 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N Lactic Acid Natural products CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920000954 Polyglycolide Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000004520 agglutination Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000004643 cyanate ester Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010036 direct spinning Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920000747 poly(lactic acid) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004633 polyglycolic acid Substances 0.000 description 1
- 239000004626 polylactic acid Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002215 polytrimethylene terephthalate Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006277 sulfonation reaction Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/02—Composition of the impregnated, bonded or embedded layer
- B32B2260/021—Fibrous or filamentary layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/04—Impregnation, embedding, or binder material
- B32B2260/046—Synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2262/00—Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
- B32B2262/02—Synthetic macromolecular fibres
- B32B2262/0276—Polyester fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/51—Elastic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/54—Yield strength; Tensile strength
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/726—Permeability to liquids, absorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2429/00—Carriers for sound or information
- B32B2429/02—Records or discs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2432/00—Cleaning articles, e.g. mops or wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
- B32B5/022—Non-woven fabric
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
- B32B5/06—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer characterised by a fibrous or filamentary layer mechanically connected, e.g. by needling to another layer, e.g. of fibres, of paper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/22—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
- B32B5/24—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
- B32B5/26—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer another layer next to it also being fibrous or filamentary
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Reinforced Plastic Materials (AREA)
- Nonwoven Fabrics (AREA)
Abstract
Description
本發明係關於一種磁碟之精密加工用研磨布,尤其係關於一種用於硬碟之紋理加工之研磨布(以下,稱為紋理加工用研磨布)。 The present invention relates to a polishing cloth for precision machining of a magnetic disk, and more particularly to a polishing cloth for texture processing of a hard disk (hereinafter referred to as a polishing cloth for texture processing).
近年來,電腦及數位攝影機、行動電話、影像音樂記錄再生設備等之高性能化.小型化.記錄之大容量化正在發展。可實現該等之主要因素之一係資訊的高密度記錄化,硬碟係資料之寫入及讀出等之存取速度較快且容量單價便宜的磁記錄媒體之一,因此,搭載於較多電子設備中,亦於一般家庭中廣泛普及。 In recent years, high performance of computer and digital cameras, mobile phones, video music recording and reproducing equipment. miniaturization. The large capacity of records is developing. One of the main factors that can achieve such a high-density recording of information, one of the magnetic recording media with fast access speed and low unit price, such as writing and reading of hard disk data, is therefore Among many electronic devices, it is also widely used in general households.
硬碟之一般的製造方法中,於包覆磁性薄膜前,於硬碟基板上加工形成預期的細微的凹凸圖案、亦即紋理。藉由加工形成該紋理,可以獲得抑制與磁頭接觸時之損傷、防止磁頭吸附於磁碟、提高磁力異向性且提高資訊記錄密度等效果。 In a general manufacturing method of a hard disk, a desired fine concavo-convex pattern, that is, a texture is formed on a hard disk substrate before the magnetic film is coated. By forming the texture by processing, it is possible to obtain an effect of suppressing damage at the time of contact with the magnetic head, preventing the magnetic head from being attracted to the magnetic disk, improving magnetic anisotropy, and improving the information recording density.
近年來,為了提高開發加速前進之硬碟之資訊記錄密度,必須降低以(1)磁頭之低懸浮化、以及(2)抑制CSS(contact start and stop,接觸起動及停止)動作時之磁頭損壞與磁頭吸附為目的之紋理的進一步細微化,亦即,降低以碟片表面之凹凸之平均深度為代表的表面平均粗糙度(Ra),因此,研磨精度之提高極為重要。 In recent years, in order to improve the information recording density of development-advanced hard disks, it is necessary to reduce head damage when (1) low head suspension is suspended, and (2) CSS (contact start and stop) is suppressed. The further miniaturization of the texture for the purpose of magnetic head adsorption, that is, the reduction of the surface average roughness (Ra) represented by the average depth of the unevenness on the surface of the disc, is therefore extremely important.
作為該等硬碟基板之紋理加工用研磨布,先前以來,多 次提出藉由使構成研磨布之纖維之直徑變細,來提高研磨性能。 As a polishing cloth for texture processing of such hard disk substrates, many previous It has been proposed to improve the polishing performance by making the diameter of the fibers constituting the polishing cloth thin.
例如,作為先前之紋理加工方法,使用植毛布或編織物作為加工用研磨布(日本專利特開平6-295432號公報)。根據該方法可知,使纖維變細時,研磨粒均勻地附著於研磨布之表面,於將研磨布按壓於碟片上時,研磨粒均等地按壓於碟片表面上,從而可降低碟片之表面粗糙度。然而,研磨布之纖維直徑為3~15 μm,因此,使加工精度提高存在界限,從而無法充分對應最近之硬碟之高容量化。 For example, as a prior art texture processing method, a flocked fabric or a woven fabric is used as a polishing cloth for processing (Japanese Patent Laid-Open No. Hei 6-295432). According to this method, when the fibers are made fine, the abrasive grains are uniformly adhered to the surface of the polishing cloth, and when the polishing cloth is pressed against the disk, the abrasive grains are uniformly pressed against the surface of the disk, so that the disk can be lowered. Surface roughness. However, since the fiber diameter of the polishing cloth is 3 to 15 μm, there is a limit to improvement in processing accuracy, and it is not possible to sufficiently match the capacity of the recent hard disk.
最近,提出了各種建議,即,於包含藉由複合紡絲法而製作之海島絲之不織布中,使高分子彈性體含浸於不織布中後,利用適當的溶劑去除海成分(polyethylene terephthalate,聚對苯二甲酸乙二酯),藉此形成極細纖維,進而,使其中一面或兩面起毛,藉此獲得紋理加工用研磨布(日本專利特開2002-79472號公報、日本專利特開2003-170348號公報、日本專利特開2004-130395號公報等),且紋理加工用研磨布成為主流。此種加工用研磨布藉由使用海島絲,而成為單紗之纖維直徑為1.9 μm以下之極細纖維,遠細於先前之編織物之纖維直徑(約5 μm),因此,可使紋理加工精度提高。 Recently, various proposals have been made to remove a sea terephthalate (polyethylene terephthalate) by a suitable solvent after impregnating a non-woven fabric with a polymer elastomer in a non-woven fabric including a sea-island yarn produced by a composite spinning method. Ethylene phthalate), thereby forming ultrafine fibers, and further, one or both of them are raised, thereby obtaining a polishing cloth for texture processing (Japanese Patent Laid-Open Publication No. 2002-79472, Japanese Patent Laid-Open No. 2003-170348) In the publication, Japanese Laid-Open Patent Publication No. 2004-130395, and the like, and the polishing cloth for texture processing has become the mainstream. Such a polishing cloth for processing uses ultra-fine fibers having a fiber diameter of 1.9 μm or less in a single yarn by using a sea-islanding wire, which is much finer than the fiber diameter (about 5 μm) of the prior knitted fabric, thereby enabling texture processing accuracy. improve.
然而,利用適當的溶劑,自包含含浸有高分子彈性體之海島絲之不織布中去除海成分後保留島成分(polypropylene,聚丙烯),藉此獲得極細纖維的上述方法,於1根海島絲中有包含數十根至數百根島成分之單 紗,因此,存在很多粗度係島成分之單紗之纖維直徑的數十倍至數百倍的纖維束(單紗不均衡地存在且形成為束狀之狀態)。 However, the above method for obtaining ultrafine fibers is obtained by removing the sea component from the non-woven fabric containing the sea-island yarn impregnated with the polymeric elastomer by a suitable solvent, thereby obtaining the ultrafine fiber in one island silk. There are singles containing dozens to hundreds of island components Yarn, therefore, there are many fiber bundles in which the fiber diameter of the single yarn of the coarse island component is several tens to hundreds of times (the single yarn is unevenly present and formed into a bundle shape).
若存在如此之纖維束,則難以於用作紋理加工用研磨布時,使研磨層之表面粗糙度變小。亦即,難以利用均等的表面壓力將研磨面按壓於碟片上,從而使碟片之表面粗糙度降低存在界限。進而,存在如下問題:容易於纖維束之周邊產生較大的凹部,因此,於纖維束周邊,研磨粒易於凝聚,該凝聚後之研磨粒對碟片表面局部地進行研磨,使碟片產生較深的損傷。 When such a fiber bundle is present, it is difficult to use the polishing cloth for texture processing to reduce the surface roughness of the polishing layer. That is, it is difficult to press the polishing surface against the disc with an equal surface pressure, so that there is a limit to lowering the surface roughness of the disc. Further, there is a problem that it is easy to produce a large concave portion around the fiber bundle, and therefore, the abrasive grains are easily aggregated around the fiber bundle, and the agglomerated abrasive grains locally polish the surface of the disk to make the disk more Deep damage.
另一方面,作為未存在纖維束之紋理加工用研磨布,日本專利特開平9-262775號公報中提出使用了割纖絲或熔噴不織布之極細絲之研磨布。根據該提案,構成研磨面之熔噴不織布藉由構成不織布之纖維彼此之熔接來保持形態,而並未利用樹脂來固定,因此,不會產生樹脂脫落之問題。並且,纖維未延伸且纖維本身較柔軟,因此,不會將研磨粒子過度按壓於碟片表面,因此,很少對碟片表面造成較大損傷。 On the other hand, as a polishing cloth for texture processing which does not have a fiber bundle, a polishing cloth using a very fine filament of a cut yarn or a melt blown nonwoven fabric is proposed in Japanese Laid-Open Patent Publication No. Hei 9-262775. According to this proposal, the melt-blown nonwoven fabric constituting the polishing surface is held in a state in which the fibers constituting the nonwoven fabric are welded to each other, and is not fixed by the resin. Therefore, there is no problem that the resin is detached. Further, since the fibers are not stretched and the fibers themselves are soft, the abrasive particles are not excessively pressed against the surface of the disc, and therefore, the surface of the disc is rarely damaged to a large extent.
又,構成熔噴不織布層之纖維主要係纖維直徑為10 μm以下之纖維,因細微的研磨粒子之保持性優良,故可均勻地對碟片表面進行研磨,形成細微的紋理。又,因單紗並未由高分子彈性體等樹脂而固定,故纖維具有自由度,因此,可防止於表面研磨時對碟片表面造成較深的損傷。 Further, the fibers constituting the melt-blown nonwoven fabric layer are mainly fibers having a fiber diameter of 10 μm or less, and the fine abrasive particles are excellent in retainability, so that the surface of the disc can be uniformly polished to form a fine texture. Further, since the single yarn is not fixed by a resin such as a polymer elastomer, the fiber has a degree of freedom, and therefore, it is possible to prevent the surface of the disc from being deeply damaged when the surface is polished.
然而,於紋理加工中,利用橡膠滾筒按壓研磨布之背 面,將研磨面按壓於碟片表面上,因此,除了纖維本身之柔軟以外,研磨布整體之柔軟亦較為重要。又,纖維直徑較細之熔噴不織布之比表面積較大,因此,與研磨粒接觸之面積較大,對研磨性能之提高較為有效。然而,當包含聚丙烯或聚酯等疏水性熱可塑性樹脂之熔噴不織布之情形,存在如下問題:即使包含研磨粒之漿液滴下,漿液亦不會均勻地擴散,紋理加工精度變得不充分。亦即,就日本專利特開平9-262775號公報中所揭示之研磨布而言,使紋理之加工精度提高方面存在界限。 However, in the texturing process, the back of the polishing cloth is pressed by a rubber roller The surface is pressed against the surface of the disc. Therefore, in addition to the softness of the fiber itself, the overall softness of the polishing cloth is also important. Further, since the melt-blown nonwoven fabric having a fine fiber diameter has a large specific surface area, the area in contact with the abrasive grains is large, and the polishing performance is improved. However, in the case of a melt-blown nonwoven fabric containing a hydrophobic thermoplastic resin such as polypropylene or polyester, there is a problem that even if the slurry containing the abrasive grains is dropped, the slurry does not uniformly diffuse, and the texture processing accuracy becomes insufficient. In the polishing cloth disclosed in Japanese Laid-Open Patent Publication No. Hei 9-262775, there is a limit in improving the processing accuracy of the texture.
如上所述,先前技術中,難以獲得最近所要求之可與硬碟之資訊記錄密度的提高充分對應的紋理加工用研磨布,殷切期望獲得可進一步提高加工精度之紋理加工用研磨布。 As described above, in the prior art, it is difficult to obtain a polishing cloth for texture processing which can sufficiently satisfy the improvement of the information recording density of a hard disk, and it is eager to obtain a polishing cloth for texture processing which can further improve the processing precision.
本發明之目的在於提供一種磁碟之精密加工用研磨布,尤其提供一種硬碟之紋理加工中研磨精度優良之紋理加工用研磨布。 It is an object of the present invention to provide a polishing cloth for precision machining of magnetic disks, and more particularly to a polishing cloth for texture processing which is excellent in polishing precision in texture processing of hard disks.
本發明者們就為了提高硬碟之資訊記錄密度而對用於精密加工硬碟之研磨布開展銳意研究之結果發現,除了使研磨布之研磨層之單紗變細以外,亦使研磨布具有如下特定的三維構造,即,於水平方向上單紗分散,於垂直方向上研磨層之最大高度粗糙度為70 μm以下,進而,具有特定 吸水性與壓縮特性之研磨布可劃時代地使硬碟表面之表面平均粗糙度降低,從而開發出本發明。 The present inventors have conducted intensive studies on polishing cloths for precision machining of hard disks in order to increase the information recording density of hard disks, and found that in addition to making the single yarn of the polishing layer of the polishing cloth thin, the polishing cloth has a specific three-dimensional structure in which a single yarn is dispersed in a horizontal direction, and a maximum height roughness of the polishing layer in the vertical direction is 70 μm or less, and further, has a specific The abrasive cloth having water absorbability and compression characteristics can diachronically reduce the surface average roughness of the surface of the hard disk, thereby developing the present invention.
亦即,本發明如下所述。 That is, the present invention is as follows.
(1)一種精密加工用研磨布,其特徵在於:其係包含積層了單紗分散不織布與支持體之2層以上之多層構造層的研磨布,且將單紗分散不織布設為研磨側之表層之第一層,構成單紗分散不織布之單紗之數量平均纖維直徑為0.1~1.7 μm,第一層之表面起毛,第一層表面之最大高度粗糙度為70 μm以下,吸水速度為100~240 mm,壓縮能量為0.10~0.30 gf.cm/cm2。 (1) A polishing cloth for precision machining, which comprises a polishing cloth in which two or more layers of a single yarn dispersion nonwoven fabric and a support are laminated, and a single yarn dispersion nonwoven fabric is used as a surface of the polishing side. The first layer, the single yarn constituting the single yarn dispersed non-woven fabric, has an average fiber diameter of 0.1 to 1.7 μm, and the surface of the first layer is raised, and the maximum height roughness of the first layer surface is 70 μm or less, and the water absorption speed is 100~ 240 mm, compression energy is 0.10~0.30 gf. Cm/cm 2 .
(2)如上述1之精密加工用研磨布,其中單紗分散不織布係熔噴不織布。 (2) The polishing cloth for precision machining according to the above 1, wherein the single yarn dispersion nonwoven fabric is a melt blown nonwoven fabric.
(3)如上述1或2之精密加工用研磨布,其中第一層之單紗分散不織布之厚度為100 μm以上。 (3) The polishing cloth for precision machining according to the above 1 or 2, wherein the single-layered nonwoven fabric of the first layer has a thickness of 100 μm or more.
(4)如上述1至3中任一項之精密加工用研磨布,其中第一層所使用之單紗分散不織布具有標準偏差為0.050以下之吸光度。 (4) The polishing cloth for precision machining according to any one of the above 1 to 3, wherein the single yarn dispersion nonwoven fabric used in the first layer has an absorbance with a standard deviation of 0.050 or less.
(5)如上述1至4中任一項之精密加工用研磨布,其中第一層之單紗分散不織布包含聚酯纖維,該聚酯纖維之結晶化度為35%以上。 (5) The polishing cloth for precision machining according to any one of the above 1 to 4, wherein the single-layered nonwoven fabric of the first layer comprises a polyester fiber, and the degree of crystallinity of the polyester fiber is 35% or more.
(6)如上述1至5中任一項之精密加工用研磨布,其中於多層構造層中含浸有高分子彈性體。 (6) The polishing cloth for precision machining according to any one of the above 1 to 5, wherein the multilayer structural layer is impregnated with a polymeric elastomer.
(7)如上述1至6中任一項之精密加工用研磨布,其中對多層構造層賦予30 wt%以下之高分子彈性體。 (7) The polishing cloth for precision machining according to any one of the above 1 to 6, wherein the multilayer structural layer is provided with a polymer elastomer of 30 wt% or less.
(8)如上述1至7中任一項之精密加工用研磨布,其中高分子彈性體係聚胺基甲酸酯。 (8) The polishing cloth for precision machining according to any one of the above 1 to 7, wherein the polymer elastic system polyurethane is used.
(9)如上述1至8中任一項之精密加工用研磨布,其中於承重1.0 kgf/cm時之長度方向之伸長百分率為4%以下,寬度方向之伸長百分率為12%以下。 (9) The polishing cloth for precision machining according to any one of the above 1 to 8, wherein the elongation percentage in the longitudinal direction at a load-bearing weight of 1.0 kgf/cm is 4% or less, and the elongation percentage in the width direction is 12% or less.
(10)如上述1至9中任一項之精密加工用研磨布,其中支持體係不織布。 (10) The polishing cloth for precision machining according to any one of the above 1 to 9, wherein the support system is non-woven.
(11)如上述1至10中任一項之精密加工用研磨布,其中支持體係使纖維直徑為10 μm以下之極細纖維層積層於織物兩面之積層體。 (11) The polishing cloth for precision machining according to any one of the above 1 to 10, wherein the support system laminates the ultrafine fibers having a fiber diameter of 10 μm or less on the both sides of the fabric.
以下,就本發明加以詳細說明。 Hereinafter, the present invention will be described in detail.
本發明之精密加工用研磨布藉由如下過程而獲得,即,對積層了單紗分散之不織布與支持體之多層構造層實施親水加工以變為下述吸水速度後,使單紗分散不織布起毛。 The polishing cloth for precision machining according to the present invention is obtained by subjecting a multilayer structure layer in which a single yarn is dispersed and a support structure to a water-repellent speed to become a water-absorbent speed, and the single-yarn dispersion non-woven fabric is raised. .
本發明中,所謂單紗分散,係指於整體觀察時,單紗並未不均衡地存在,且未形成為束狀(纖維束),較好的是,單紗未黏著4根以上而呈分散之狀態。單紗分散不織布不具有纖維束,因此,研磨面之第一層之纖維分散性及平滑性極為優良,其結果為,進行紋理加工時,研磨粒不會凝聚而是均勻地分散,進而,易於利用均等的表面壓力將研磨面按壓於碟片,因此,作為紋理加工等之精密加工用研磨布較佳。 In the present invention, the single yarn dispersion means that the single yarn is not unevenly distributed during the entire observation, and is not formed into a bundle (fiber bundle). Preferably, the single yarn is not adhered to four or more. Dispersed state. Since the single-yarn dispersed non-woven fabric does not have a fiber bundle, the first layer of the polished surface is extremely excellent in fiber dispersibility and smoothness, and as a result, the abrasive grains are uniformly aggregated without being aggregated during the texture processing, and further, it is easy Since the polishing surface is pressed against the disk by the uniform surface pressure, it is preferable as a polishing cloth for precision machining such as texturing.
又,亦可於與支持體進行積層前,對單紗分散不織布進行親水加工。再者,當單紗分散不織布包含親水性樹脂, 且具有下述吸水速度之情形時,無須實施親水加工。 Further, the single-yarn dispersed nonwoven fabric may be subjected to hydrophilic processing before being laminated with the support. Furthermore, when the single yarn dispersion nonwoven fabric contains a hydrophilic resin, When the water absorption speed is as follows, it is not necessary to carry out hydrophilic processing.
本發明中,研磨側之表層之第一層所使用的單紗分散不織布之單紗的數量平均纖維直徑為0.1~1.7 μm,較好的是0.4~1.5 μm,更好的是0.4~1.3 μm。當單紗之數量平均纖維直徑未達0.1 μm時,單紗強度降低,因此無法承受於紋理加工時所施加之力,導致單紗斷裂。因此,研磨粒難以固定,從而於紋理加工時,研磨力不足或成為不均勻研磨。另一方面,當數量平均纖維直徑超過1.7 μm時,表層之起毛纖維之緻密性降低,又,起毛纖維之粗密不均變大,因此,研磨粒難以均勻地分散,其結果為,難以進行高精度之研磨。 In the present invention, the single yarn of the first layer of the surface layer of the polishing side has a single fiber having a number average fiber diameter of 0.1 to 1.7 μm, preferably 0.4 to 1.5 μm, more preferably 0.4 to 1.3 μm. . When the average fiber diameter of the single yarn is less than 0.1 μm, the strength of the single yarn is lowered, so that the force applied during the texture processing cannot be withstood, resulting in breakage of the single yarn. Therefore, it is difficult to fix the abrasive grains, so that the polishing force is insufficient or uneven polishing during the texture processing. On the other hand, when the number average fiber diameter exceeds 1.7 μm, the denseness of the raised fibers of the surface layer is lowered, and the coarse unevenness of the raised fibers becomes large. Therefore, it is difficult to uniformly disperse the abrasive grains, and as a result, it is difficult to carry out high. Precision grinding.
紋理加工用研磨布中所要求的是,如上所述,減低以碟片表面之凹凸之平均深度為代表的表面平均粗糙度(Ra)。因此,重要的是於紋理加工時之研磨粒之凝聚之抑制、以及均勻分散。 What is required in the polishing cloth for texture processing is to reduce the surface average roughness (Ra) represented by the average depth of the unevenness on the surface of the disc as described above. Therefore, it is important to suppress the aggregation of the abrasive grains during the texture processing and to uniformly disperse.
上述構成必要條件,即,包含研磨側之表面之第一層未包含纖維束的單紗分散不織布、且構成單紗分散不織布之單紗之數量平均纖維直徑為0.1~1.7 μm,係用以向精密加工用研磨布之水平方向均勻地分散研磨粒之必要條件。 The above-mentioned constitution is a condition that the first layer including the surface of the polishing side does not contain the fiber bundle, and the single yarn of the single yarn dispersion nonwoven fabric has an average fiber diameter of 0.1 to 1.7 μm. The necessary conditions for uniformly dispersing the abrasive grains in the horizontal direction of the polishing cloth for precision machining.
然而,僅就上述必要條件而言,還不能說係充分與目前所要求之加工精度對應之精密加工用研磨布。原因在於,研磨側之表面之第一層所使用的單紗分散不織布於垂直方向上具有很多凹凸,由於該凹凸之大小,於利用施加固定壓力進行加工之紋理加工步驟中,產生該第一層之表面未 均勻地與碟片表面接觸之部分,因此,引起研磨粒之凝聚或不均衡(不均勻分散),難以進行高精度之研磨。 However, it is not possible to say that the above-mentioned necessary conditions are abrasive cloths for precision machining that correspond to the processing precision required at present. The reason is that the single yarn dispersion non-woven fabric used for the first layer of the surface on the polishing side has many irregularities in the vertical direction, and the first layer is produced in the texture processing step by applying the fixed pressure due to the size of the unevenness. Surface not The portion that is uniformly in contact with the surface of the disc causes agglomeration or unevenness (non-uniform dispersion) of the abrasive grains, making it difficult to perform high-precision polishing.
因此,重要的是,符合使向垂直方向之凹凸減少、進而使研磨粒均勻地分散於精密加工用研磨布之水平方向之必要條件,對三維的研磨粒分散性進行控制。 Therefore, it is important to control the dispersibility of the three-dimensional abrasive grains in accordance with the necessity of reducing the unevenness in the vertical direction and further uniformly dispersing the abrasive grains in the horizontal direction of the polishing cloth for precision machining.
根據如此之考慮,重要的是,本發明之精密加工用研磨布之第一層表面之最大高度粗糙度為70 μm以下,較好的是50 μm以下,更好的是40 μm以下。當超過70 μm時,於利用施加固定壓力進行加工之紋理加工步驟中,產生研磨布之第一層之表面未均勻地與碟片表面接觸之部分,因此,引起研磨粒之凝聚或不均衡,難以進行高精度之研磨。再者,研磨布之第一層表面之最大高度粗糙度可藉由下述方法而進行測量。 In view of such considerations, it is important that the surface of the first layer of the polishing cloth for precision machining of the present invention has a maximum height roughness of 70 μm or less, preferably 50 μm or less, more preferably 40 μm or less. When it exceeds 70 μm, in the texture processing step of processing by applying a fixed pressure, a portion where the surface of the first layer of the polishing cloth is not uniformly contacted with the surface of the disk is generated, thereby causing aggregation or unevenness of the abrasive grains. It is difficult to perform high precision grinding. Further, the maximum height roughness of the surface of the first layer of the abrasive cloth can be measured by the following method.
又,關於精密加工用研磨布之構成及製造方法、以及研磨層之最大高度粗糙度,具有如下(1)~(3)之關係。 Further, the configuration and manufacturing method of the polishing cloth for precision machining and the maximum height roughness of the polishing layer have the following relationships (1) to (3).
(1)於包含藉由複合紡絲法而製作之海島絲之不織布中,使高分子彈性體含浸於不織布中後,利用適當的溶劑去除海成分,藉此形成極細纖維之製造方法,殘留有很多纖維束,由於該纖維束之影響,難以使研磨層之最大高度粗糙度為70 μm以下。 (1) In a nonwoven fabric comprising a sea-island yarn produced by a composite spinning method, after the polymer elastomer is impregnated into the nonwoven fabric, the sea component is removed by a suitable solvent to form a method for producing the ultrafine fiber, and the residual method is formed. Many fiber bundles are difficult to make the maximum height roughness of the polishing layer to be 70 μm or less due to the influence of the fiber bundle.
(2)作為藉由拋光等進行表面潤飾加工後之研磨側第一層之單紗分散不織布之厚度,較好的是100 μm以上,更好的是120~500 μm。當厚度比上述厚度小時,支持體對研磨側第一層造成影響,且最大高度粗糙度變大。 (2) The thickness of the single-yarn dispersed nonwoven fabric as the first layer on the polishing side after surface finishing by polishing or the like is preferably 100 μm or more, more preferably 120 to 500 μm. When the thickness is smaller than the above thickness, the support affects the first layer on the polishing side, and the maximum height roughness becomes large.
(3)當使用不織布作為積層於單紗分散不織布之支持體之情形時,構成不織布之纖維之單紗直徑較好的是未達8.0 μm,更好的是未達4.0 μm,進而好的是未達3.3 μm。纖維之單紗直徑越大,作為支持體之不織布之凹凸變得越大,藉此,研磨側第一層之單紗分散不織布之最大高度粗糙度亦變大。 (3) When a non-woven fabric is used as a support for laminating a single yarn-dispersed non-woven fabric, the diameter of the single yarn constituting the non-woven fabric is preferably less than 8.0 μm, more preferably less than 4.0 μm, and further preferably Less than 3.3 μm. The larger the single yarn diameter of the fiber, the larger the unevenness of the non-woven fabric as the support, whereby the maximum height roughness of the single-yarn dispersed nonwoven fabric of the first layer on the polishing side also becomes large.
本發明之精密加工用研磨布之吸水速度為100~240 mm,較好的是110~200 mm,更好的是120~180 mm。當吸水速度未達100 mm時,於加工過程中,包含研磨粒之漿液未被研磨布之表面充分吸收,因此,難以充分把持研磨粒,其結果為,難以獲得充分的研磨量。另一方面,當吸水速度超過240 mm時,漿液於向研磨布之水平方向充分擴散前,於垂直方向吸收,因此難以使研磨粒均勻地擴散。其結果為,研磨粒分布產生不均,由於該不均,而難以實施加工精度較高之紋理加工。 The water-absorbent speed of the polishing cloth for precision machining of the present invention is 100 to 240 mm, preferably 110 to 200 mm, more preferably 120 to 180 mm. When the water absorption speed is less than 100 mm, the slurry containing the abrasive grains is not sufficiently absorbed by the surface of the polishing cloth during the processing. Therefore, it is difficult to sufficiently hold the abrasive grains, and as a result, it is difficult to obtain a sufficient polishing amount. On the other hand, when the water absorption speed exceeds 240 mm, the slurry is absorbed in the vertical direction before being sufficiently diffused in the horizontal direction of the polishing cloth, so that it is difficult to uniformly spread the abrasive grains. As a result, unevenness in the distribution of the abrasive grains occurs, and it is difficult to carry out texture processing with high processing accuracy due to the unevenness.
具備如上所述之吸水性之方法並未特別限定,可列舉:接枝聚合處理、電漿處理等物理性表面處理法;利用離子交換樹脂或氧化物包覆表面後賦予親水性之表面塗層處理法;藉由濃硫酸處理,而使表面磺化等化學性表面處理法等。又,亦可列舉使用界面活性劑等親水性成分之溶液實施親水加工之方法,作為具備吸水性之方法。 The method of providing water absorption as described above is not particularly limited, and examples thereof include physical surface treatment methods such as graft polymerization treatment and plasma treatment; and surface coatings which impart hydrophilicity after coating the surface with an ion exchange resin or oxide. Treatment method; chemical surface treatment such as surface sulfonation by treatment with concentrated sulfuric acid. Further, a method of performing hydrophilic processing using a solution of a hydrophilic component such as a surfactant may be mentioned as a method of providing water absorption.
再者,作為界面活性劑,具有離子系與非離子系,但考慮用作磁碟之精密加工用研磨布時,較好的是不含有金屬離子之非離子系界面活性劑。進而,亦可使用聚對苯二甲 酸乙二酯與聚乙二醇之共聚酯等具有親水性之樹脂,而使之具備吸水性,故而較佳。再者,吸水速度可藉由下述方法而進行測量。 Further, although the surfactant is an ion-based or non-ionic surfactant, it is preferably a non-ionic surfactant which does not contain a metal ion when it is used as a polishing cloth for precision processing of a magnetic disk. Further, polyparaphenylene phthalate can also be used. A hydrophilic resin such as a copolyester of ethylene glycol and polyethylene glycol has a water-repellent property, which is preferable. Further, the water absorption speed can be measured by the following method.
又,本發明之精密加工用研磨布之壓縮能量為0.10~0.30 gf.cm/cm2,較好的是0.10~0.25 gf.cm/cm2。壓縮能量係表示被評估物之硬度之指標,壓縮能量值越大,表示越柔軟。當壓縮能量未達0.10 gf.cm/cm2時,亦即,研磨布過硬時,研磨量較大,容易對碟片基板之表面造成損傷。另一方面,當壓縮能量超過0.30 gf.cm/cm2時,亦即,研磨布過軟時,難以對基板表面造成損傷,但產生研磨量較小、加工性較差之問題。 Moreover, the compression energy of the polishing cloth for precision machining of the present invention is 0.10 to 0.30 gf. Cm / cm 2 , preferably 0.10 ~ 0.25 gf. Cm/cm 2 . The compression energy is an indicator of the hardness of the object to be evaluated, and the larger the compression energy value, the softer the value. When the compression energy is less than 0.10 gf. In the case of cm/cm 2 , that is, when the polishing cloth is too hard, the amount of polishing is large, and it is easy to cause damage to the surface of the disk substrate. On the other hand, when the compression energy exceeds 0.30 gf. In the case of cm/cm 2 , that is, when the polishing cloth is too soft, it is difficult to cause damage to the surface of the substrate, but there is a problem that the amount of polishing is small and the workability is poor.
為了滿足研磨量與紋理加工精度兩者,必須使壓縮能量為0.10~0.30 gf.cm/cm2。再者,壓縮能量可藉由下述方法而進行測量。 In order to satisfy both the grinding amount and the texture processing accuracy, the compression energy must be made 0.10~0.30 gf. Cm/cm 2 . Furthermore, the compression energy can be measured by the following method.
為了提高加工精度,必須使單紗分散不織布之數量平均纖維直徑為0.1~1.7 μm。然而,就僅由上述數量平均纖維直徑之單紗分散不織布構成之研磨布而言,難以滿足上述壓縮能量範圍。原因在於,因纖維直徑較細,故空隙率變小,緩衝性不良。 In order to improve the processing accuracy, it is necessary to make the number average fiber diameter of the single-yarn dispersed nonwoven fabric 0.1 to 1.7 μm. However, it is difficult to satisfy the above-described range of the compression energy in the case of the polishing cloth composed of the single-fiber-dispersed non-woven fabric of the above-mentioned number-average fiber diameter. The reason is that since the fiber diameter is fine, the void ratio is small and the cushioning property is poor.
因此,本發明中,藉由將單紗分散不織布與支持體進行積層後形成多層構造層,可使壓縮能量處於適當的範圍內。亦即,藉由將支持體之原材料、克重、厚度、空隙率設為調整因素,可對壓縮能量進行調整。又,如下所述,亦可將高分子彈性體用作壓縮能量之調整因素。如此,藉 由對支持體之原材料或空隙率等進行調整,使研磨層具備僅以單紗分散不織布而難以達成之適當的緩衝性,藉此,可以高精度進行穩定的研磨。 Therefore, in the present invention, by laminating a single-yarn dispersion nonwoven fabric and a support to form a multilayer structure layer, the compression energy can be made to be in an appropriate range. That is, the compression energy can be adjusted by setting the raw material, the grammage, the thickness, and the void ratio of the support as adjustment factors. Further, as described below, the polymeric elastomer can also be used as an adjustment factor for the compression energy. So, borrow By adjusting the material, the void ratio, and the like of the support, the polishing layer is provided with an appropriate cushioning property which is difficult to achieve by merely dispersing the nonwoven fabric with a single yarn, whereby stable polishing can be performed with high precision.
必須使本發明之精密加工用研磨布之研磨側第一層起毛。使其起毛具有如下三個效果。 It is necessary to fluff the first layer on the polishing side of the polishing cloth for precision machining of the present invention. Making it fluff has the following three effects.
(1)與研磨粒接觸之表面面積變大,其結果為,研磨粒之把持能力提高,研磨量增大。 (1) The surface area in contact with the abrasive grains is increased, and as a result, the holding ability of the abrasive grains is improved, and the amount of polishing is increased.
(2)研磨側第一層之纖維之定向性提高,於紋理加工時,於圓周方向上纖維接觸。其結果為,可進行高精度的研磨。 (2) The orientation of the fibers of the first layer on the polishing side is improved, and the fibers are in contact with each other in the circumferential direction during the texture processing. As a result, high-precision polishing can be performed.
(3)研磨布之表面之接觸阻力變小,因此難以對碟片基板表面造成較深的損傷。 (3) The contact resistance of the surface of the polishing cloth becomes small, so that it is difficult to cause deep damage to the surface of the disc substrate.
一般而言,起毛利用如下被稱為拋光法之方法而進行,即,使用砂紙等拋光紙,高速擦過表面使其起毛,但較好的是於拋光前將界面活性劑塗敷於表面。藉由塗敷界面活性劑,可使拋光紙與研磨側第一層之摩擦力減小,防止切斷單紗,實現纖維定向性之提高。 In general, the raising is carried out by a method called a polishing method in which a polishing paper such as sandpaper is used to rub the surface at a high speed to cause fuzzing, but it is preferred to apply the surfactant to the surface before polishing. By applying the surfactant, the friction between the polishing paper and the first layer on the polishing side can be reduced, and the single yarn can be prevented from being cut, thereby improving the fiber orientation.
研磨側第一層之起毛長度較好的是50~3000 μm,更好的是50~2000 μm,進而好的是50~1000 μm。當起毛長度為50 μm以上時,因研磨粒之把持能力充分,故可獲得充分的研磨量,且因表面之觸感亦較柔軟,故幾乎不會對碟片基板之表面造成損傷。又,當起毛長度為3000 μm以下時,纖維之自由度不會過大而是較適當,因此,研磨側第一層之極細纖維容易於加工時垂直地與碟片基板之半徑方向接 觸,且可均勻地形成沿圓周方向之槽。又,為了使研磨粒之把持能力不會過大,可使碟片基板之表面粗糙度變小。 The length of the first layer on the polishing side is preferably from 50 to 3000 μm, more preferably from 50 to 2000 μm, and even more preferably from 50 to 1000 μm. When the raising length is 50 μm or more, since the holding ability of the abrasive grains is sufficient, a sufficient polishing amount can be obtained, and since the touch of the surface is soft, the surface of the disk substrate is hardly damaged. Moreover, when the length of the fluffing is 3000 μm or less, the degree of freedom of the fiber is not excessively large, but it is appropriate. Therefore, the ultrafine fibers of the first layer on the polishing side are easily perpendicular to the radial direction of the disc substrate during processing. Touch, and the grooves in the circumferential direction can be uniformly formed. Further, in order to prevent the abrasive grains from being excessively held, the surface roughness of the disc substrate can be made small.
本發明中,較好的是,使用纖維之粗密不均極小之不織布作為研磨側第一層之單紗分散不織布。作為其指標,較好的是第一層所使用之單紗分散不織布之吸光度的標準偏差為0.050以下。當吸光度之標準偏差為0.050以下時,纖維分散性良好,單紗分散不織布均勻且部分粗密不均較小,因此,研磨粒易於均勻地分散,且可進行高精度的加工。再者,吸光度之標準偏差可藉由下述方法而進行測量。 In the present invention, it is preferred to use a nonwoven fabric in which the coarseness of the fibers is extremely small and uneven as the single yarn-dispersed nonwoven fabric of the first layer on the polishing side. As an index thereof, it is preferred that the standard deviation of the absorbance of the single-yarn dispersed nonwoven fabric used in the first layer is 0.050 or less. When the standard deviation of the absorbance is 0.050 or less, the fiber dispersibility is good, the single yarn dispersion non-woven fabric is uniform, and the partial coarseness unevenness is small. Therefore, the abrasive grains are easily dispersed uniformly, and high-precision processing can be performed. Furthermore, the standard deviation of the absorbance can be measured by the following method.
本發明中,作為單紗分散不織布之製造方法,可列舉例如,熔噴法、濕式水針法等。其中,熔噴法與其他製造方法相比,易於使單紗之數量平均纖維直徑變細,因此,作為第一層所使用之單紗分散不織布之製造方法較佳(以下,將藉由熔噴法而製造之不織布稱為熔噴不織布)。 In the present invention, examples of the method for producing the single-yarn dispersed nonwoven fabric include a melt blow method and a wet water needle method. Among them, the melt-blown method tends to make the average fiber diameter of the single yarn thinner than other manufacturing methods, and therefore, the manufacturing method of the single-yarn dispersed nonwoven fabric used as the first layer is preferable (hereinafter, by melt-blown The non-woven fabric manufactured by the law is called melt blown nonwoven fabric).
又,作為本發明中所使用之單紗分散不織布之一較佳的熔噴不織布,藉由熔噴法而製造,上述熔噴法係對單紗之凝集條件進行研究,且對高速氣流與伴隨流之流動進行控制,以使上述吸光度之標準偏差為0.050以下。作為聚酯熔噴不織布之製造方法,例如,使用將噴嘴直徑配置為0.2~0.4 mm、將噴嘴間距配置為0.3~1.0 mm之紡口,對固有黏度為0.40~0.75之聚酯聚合物進行加熱熔融後,送入已加熱至250~350℃之模具中。 Further, as a melt blown nonwoven fabric which is preferably one of the single yarn-dispersed nonwoven fabrics used in the present invention, the melt-blown method is used to study the agglutination conditions of the single yarn, and the high-speed airflow and accompanying The flow of the flow is controlled so that the standard deviation of the above absorbance is 0.050 or less. As a manufacturing method of the polyester melt-blown nonwoven fabric, for example, a polyester polymer having an intrinsic viscosity of 0.40 to 0.75 is heated by using a nozzle having a nozzle diameter of 0.2 to 0.4 mm and a nozzle pitch of 0.3 to 1.0 mm. After melting, it is fed into a mold that has been heated to 250 to 350 °C.
其次,可列舉如下方法:自該紡口之開口端附近,以 0.18~0.40 MPa之壓力,噴射每個噴嘴之吐出量為0.05~0.50 g/分鐘且自噴嘴吐出、已加熱至280~380℃之氣體,進而,為了防止單紗之飛散、凝聚,例如,使用日本專利特公昭62-12345號公報中所揭示之整流器,對高速氣流與伴隨流之流動進行控制,且進行凝集、壓製,以成為預期之克重、厚度、容積密度。 Secondly, the following method can be cited: from the vicinity of the open end of the spun, a pressure of 0.18 to 0.40 MPa, which ejects a gas per nozzle of 0.05 to 0.50 g/min and is ejected from a nozzle and heated to 280 to 380 ° C. Further, in order to prevent scattering and agglomeration of a single yarn, for example, use The rectifier disclosed in Japanese Patent Publication No. Sho 62-12345 controls the flow of the high-speed air stream and the accompanying flow, and agglomerates and presses to obtain the desired basis weight, thickness, and bulk density.
本發明中,較好的是使用具有纖維形成能力之熱可塑性樹脂作為構成單紗分散不織布之樹脂。例如可列舉:聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚對苯二甲酸丙二酯、聚對苯二甲酸乙二酯系共聚物等聚酯類;尼龍6、尼龍66、尼龍12、聚醯胺系共聚物等聚醯胺類;聚乙烯、聚丙烯、聚甲基戊烯等聚烯烴類;聚丙烯腈類;聚苯乙烯、聚氯乙烯等乙烯系聚合物類:聚乳酸、乳酸共聚物、聚乙醇酸等脂肪族聚酯系聚合物類;脂肪族聚酯醯胺共聚物等。 In the present invention, it is preferred to use a thermoplastic resin having a fiber forming ability as a resin constituting a single yarn-dispersed nonwoven fabric. For example, polyesters such as polyethylene terephthalate, polybutylene terephthalate, polytrimethylene terephthalate, and polyethylene terephthalate copolymer; nylon 6, Polyamides such as nylon 66, nylon 12, and polyamidamide copolymers; polyolefins such as polyethylene, polypropylene, and polymethylpentene; polyacrylonitriles; and ethylene polymerization such as polystyrene and polyvinyl chloride. Examples: aliphatic polyester polymers such as polylactic acid, lactic acid copolymer, and polyglycolic acid; aliphatic polyester guanamine copolymers.
作為不織布之處理方法,可列舉針紮處理或噴水處理等三維交絡、熱接著、接著劑等,但其中就纖維之高密度化、以及研磨布表面之平滑化觀點而言,較佳的是噴水處理之三維交絡。 Examples of the treatment method of the nonwoven fabric include a three-dimensional entanglement such as a needle-drawing treatment or a water-jet treatment, a thermal adhesive, an adhesive, and the like. However, in terms of high density of the fibers and smoothing of the surface of the polishing cloth, water spray is preferred. Handling the three-dimensional symmetry.
本發明中,當構成單紗分散不織布之纖維係聚酯時,較好的是聚酯纖維之結晶化度為35%以上。當結晶化度為35%以上時,單紗強度較高,因此,可承受紋理加工時所施加之力,且單紗不會斷裂。因此,研磨粒易於固定,可於紋理加工中獲得充分的研磨力,且可進行均勻的研磨。 進而,藉由拋光紙之研磨粒或負荷等條件,於拋光加工過程中不會產生單紗之切斷,且易於進行研磨布之製作。 In the present invention, when the fiber-based polyester constituting the single yarn-dispersed nonwoven fabric is used, it is preferred that the degree of crystallization of the polyester fiber is 35% or more. When the degree of crystallization is 35% or more, the strength of the single yarn is high, and therefore, the force applied during the texture processing can be withstood, and the single yarn does not break. Therefore, the abrasive grains are easily fixed, a sufficient grinding force can be obtained in the texturing process, and uniform polishing can be performed. Further, by the conditions such as the abrasive grains or the load of the polishing paper, the single yarn is not cut during the polishing process, and the polishing cloth can be easily produced.
又,當紡絲條件相同時,伴隨固有黏度變小,而聚酯纖維之結晶化度有降低之傾向,但當結晶化度為35%以上時,即使於為了使第一層之單紗分散不織布之數量平均纖維直徑變小,而選擇固有黏度較小的聚酯之情形時,亦可獲得良好的結果。 Further, when the spinning conditions are the same, the degree of crystallization of the polyester fiber tends to decrease as the inherent viscosity decreases, but when the degree of crystallization is 35% or more, even in order to disperse the single yarn of the first layer Good results can be obtained when the average fiber diameter of the non-woven fabric becomes small, and the polyester having a small inherent viscosity is selected.
就對研磨布之壓縮能量進行控制、以及使第一層之表面平滑化之觀點而言,較好的是含浸高分子彈性體。又,產生由樹脂之纖維之固定不足而引起的纖維不均衡等時,根據紋理加工條件,加工之均勻性可能會惡化,但上述情形時,為了防止纖維之不均衡而含浸高分子彈性體較為有效。 From the viewpoint of controlling the compression energy of the polishing cloth and smoothing the surface of the first layer, it is preferred to impregnate the polymeric elastomer. Further, when fiber unevenness due to insufficient fixation of the fibers of the resin occurs, the uniformity of the processing may be deteriorated depending on the texture processing conditions, but in the above case, the polymer elastomer is impregnated to prevent the fiber from being unbalanced. effective.
作為高分子彈性體,並未特別限定,但就易於進行含浸加工、以及作為研磨布之緩衝性良好之觀點而言,較好的是聚胺基甲酸酯。作為聚胺基甲酸酯,可使用溶劑系聚胺基甲酸酯、水系聚胺基甲酸酯等,就對環境造成之負荷較小、以及製造成本較低之觀點而言,較好的是水系聚胺基甲酸酯。 The polymer elastomer is not particularly limited, but a polyurethane is preferred because it is easy to be impregnated and has good cushioning properties as a polishing cloth. As the polyurethane, a solvent-based polyurethane, an aqueous polyurethane, or the like can be used, and it is preferable from the viewpoint of less environmental load and lower production cost. It is an aqueous polyurethane.
水系聚胺基甲酸酯較好的是用於乳化液,作為聚胺基甲酸酯成分,可示例以下者。作為多元醇成分,可列舉:聚己二酸乙二酯乙二醇、聚己二酸丁二醇酯二醇等聚酯多元醇類;聚乙二醇、聚丁二醇等聚醚醇類;聚碳酸酯多元醇類等。作為異氰酸酯成分,可列舉:4,4'-二苯基甲烷二異 氰酸酯等芳香族二異氰酸酯;4,4'-二環己基甲烷二異氰酸酯等脂環族二異氰酸酯;六亞甲二異氰酸酯等脂肪族二異氰酸酯等。又,作為增鏈劑,可列舉:乙二醇等乙二醇類;乙二胺、己二胺、4,4'-二環己基甲烷二胺等二胺類等。又,亦可使用將上述各種成分適當組合後之聚胺基甲酸酯。 The aqueous polyurethane is preferably used for an emulsion, and as the polyurethane component, the following may be exemplified. Examples of the polyol component include polyester polyols such as polyethylene adipate ethylene glycol and polybutylene adipate glycol; and polyether alcohols such as polyethylene glycol and polybutylene glycol. Polycarbonate polyols, etc. As the isocyanate component, 4,4'-diphenylmethane diiso is mentioned An aromatic diisocyanate such as a cyanate ester; an alicyclic diisocyanate such as 4,4'-dicyclohexylmethane diisocyanate; or an aliphatic diisocyanate such as hexamethylene diisocyanate. Further, examples of the chain extender include ethylene glycols such as ethylene glycol; diamines such as ethylenediamine, hexamethylenediamine, and 4,4'-dicyclohexylmethanediamine. Further, a polyurethane having an appropriate combination of the above various components may be used.
高分子彈性體之含量相對於研磨布,較好的是30 wt%以下,更好的是0.5~20 wt%,進而好的是1~10 wt%,可根據高分子彈性體之含量,對研磨布之表面狀態、緩衝性、硬度、研磨性能進行調整。當高分子彈性體之含量為30 wt%以下時,可充分獲得含有高分子彈性體之效果,且可對充分的研磨量與研磨進行精密的控制,獲得良好的紋理加工性以及生產性。 The content of the polymeric elastomer is preferably 30% by weight or less, more preferably 0.5% to 20% by weight, and further preferably 1% to 10% by weight, based on the content of the polymeric elastomer, relative to the polishing cloth. The surface condition, cushioning properties, hardness, and polishing properties of the polishing cloth were adjusted. When the content of the polymeric elastomer is 30% by weight or less, the effect of containing the polymeric elastomer can be sufficiently obtained, and sufficient polishing amount and polishing can be precisely controlled to obtain good texture processability and productivity.
本發明中,構成精密加工用研磨布之單紗分散不織布之厚度較好的是100 μm以上,更好的是120~500 μm。於紋理加工中,利用橡膠滾筒等將研磨布自與研磨層相反側按壓於碟片上。此時,有如下之懸念,即,當單紗分散不織布之厚度未達100 μm時,支持體對研磨層側造成影響,難以進行高精度的加工。尤其,較好的是,於使用包含織物或較大直徑之纖維之不織布作為支持體時,單紗分散不織布之厚度為100 μm以上。 In the present invention, the thickness of the single-yarn dispersed nonwoven fabric constituting the polishing cloth for precision processing is preferably 100 μm or more, more preferably 120 to 500 μm. In the texturing process, the polishing cloth is pressed against the disc from the side opposite to the polishing layer by a rubber roller or the like. At this time, there is a suspense that when the thickness of the single-yarn dispersed nonwoven fabric is less than 100 μm, the support affects the side of the polishing layer, and it is difficult to perform high-precision processing. In particular, it is preferred that when a non-woven fabric comprising a woven fabric or a fiber having a larger diameter is used as the support, the thickness of the single-yarn dispersed nonwoven fabric is 100 μm or more.
本發明之研磨布較好的是於承重1.0 kgf/cm時之長度方向(MD方向)之伸長百分率為4%以下,更好的是3%,又,較好的是於承重1.0 kgf/cm時之長度方向(CD方向)之伸長 百分率為12%以下,更好的是9%以下。當MD方向之伸長百分率及CD方向之伸長百分率處於上述範圍時,可均勻且穩定地將研磨布按壓於碟片基板之表面,因此,可對細微且均勻的凹凸圖案進行加工。 The polishing cloth of the present invention preferably has an elongation percentage of 4% or less in the longitudinal direction (MD direction) at a load-bearing weight of 1.0 kgf/cm, more preferably 3%, and more preferably, a load-bearing weight of 1.0 kgf/cm. Elongation of the length direction (CD direction) The percentage is 12% or less, more preferably 9% or less. When the elongation percentage in the MD direction and the elongation percentage in the CD direction are in the above range, the polishing cloth can be uniformly and stably pressed against the surface of the disc substrate, so that a fine and uniform concavo-convex pattern can be processed.
本發明之研磨布中,較好的是對研磨側第1層進行拋光處理。作為拋光材料,例如可使用#100~#1000之拋光紙,處理速度、次數可適當選擇較佳的範圍。 In the polishing cloth of the present invention, it is preferred to polish the first layer on the polishing side. As the polishing material, for example, a polishing paper of #100 to #1000 can be used, and the processing speed and the number of times can be appropriately selected.
本發明中,當含浸有高分子彈性體時,研磨側第1層之纖維之固定化充分,可使用紋路較粗之#150~#300之拋光紙。又,當未含浸高分子彈性體時,使用紋路較密之#400~#600之拋光紙,進行數次處理,藉此,可提高研磨側第1層之平滑性,且改善最大高度粗糙度性能。 In the present invention, when the polymer elastomer is impregnated, the fibers of the first layer on the polishing side are sufficiently fixed, and a #150 to #300 polishing paper having a coarse grain can be used. Further, when the polymer elastomer is not impregnated, the polishing paper of #400 to #600 having a dense texture is used for several times, whereby the smoothness of the first layer on the polishing side can be improved, and the maximum height roughness can be improved. performance.
本發明中,作為支持體,可列舉:例如,短纖維不織布、長纖維不織布等不織布,多孔體,薄膜等。其中,就富於空隙率較高之緩衝性及加工性優良之觀點而言,較理想的是不織布。 In the present invention, examples of the support include non-woven fabrics such as short-fiber nonwoven fabrics and long-fiber nonwoven fabrics, porous bodies, and films. Among them, in view of being excellent in cushioning property and processability which are high in void ratio, it is preferable to be non-woven fabric.
作為用作支持體之不織布之製造方法,例如,可列舉:經梳理後,利用跨層、氣層等進行分層化,藉由針布而交絡之針紮法;藉由柱狀水流而交絡之乾式水針法;使纖維水性分散後,利用造紙法進行分層化後,利用柱狀水流而交絡之濕式水針法;以及通常之紡黏法等。其中,就所獲得之不織布之克重不均及厚度不均較小、物性之各向同性優良的觀點而言,較好的是使用濕式水針法。 Examples of the method for producing the nonwoven fabric used as the support include a method of stratification by cross-layering, a gas layer, or the like, and a needle-tie method of entanglement by card clothing; and entanglement by columnar water flow. The dry water needle method; a wet water needle method in which a fiber is dispersed in an aqueous solution after being layered by a papermaking method, and a cylindrical water flow is used for entanglement; and a usual spunbond method. Among them, it is preferable to use a wet water needle method from the viewpoint that the obtained non-woven fabric has uneven weight unevenness, small thickness unevenness, and excellent isotropy of physical properties.
為了進一步提高研磨布之尺寸穩定性,亦列舉有使織物 存在於內部之方法。此時,作為支持體,較好的是使用使纖維直徑10 μm以下之極細纖維層積層於織物之兩面之積層體。 In order to further improve the dimensional stability of the polishing cloth, it is also mentioned that the fabric is made The method that exists internally. In this case, as the support, it is preferred to use a laminate in which ultrafine fibers having a fiber diameter of 10 μm or less are laminated on both surfaces of the fabric.
織物之表面粗糙度較大,因此,當使研磨側第1層之單紗分散不織布直接積層於織物上時,表面受織物之表面粗糙度之影響較大。其結果為,有時研磨側第1層之表面粗糙度變大,難以進行精密的紋理加工。又,構成織物之纖維與研磨側第1層之單紗分散不織布之纖維的直徑有較大差異,因此,有時難以使兩者直接交絡來形成不織布。根據以上理由,較好的是,將使極細纖維層積層於織物之兩面之積層體用作支持體。 The surface roughness of the fabric is large. Therefore, when the single-yarn dispersed non-woven fabric of the first layer on the polishing side is directly laminated on the fabric, the surface is greatly affected by the surface roughness of the fabric. As a result, the surface roughness of the first layer on the polishing side may become large, and it is difficult to perform precise texture processing. Further, the fibers constituting the woven fabric and the fibers of the single-yarn-dispersed nonwoven fabric of the first layer on the polishing side have a large difference in diameter. Therefore, it may be difficult to directly entangle the two to form a nonwoven fabric. For the above reasons, it is preferred to use a laminate in which the ultrafine fibers are laminated on both sides of the woven fabric as a support.
本發明之精密加工用研磨布使用三維構造之單紗分散不織布,即,於水平方向為單紗分散,於垂直方向,研磨側之第一層表面之最大高度粗糙度為70 μm以下,且具有特定的吸水速度與壓縮特性,藉此,可於硬碟用紋理加工中進行高精度的研磨。 The polishing cloth for precision machining of the present invention uses a three-dimensional structure of a single yarn dispersion nonwoven fabric, that is, a single yarn dispersion in a horizontal direction, and a vertical height direction, a maximum height roughness of a surface of the first layer on the polishing side is 70 μm or less, and has Specific water absorption speed and compression characteristics, thereby enabling high-precision polishing in texture processing of hard disks.
以下列舉實施例,進一步對本發明加以說明,但本發明並非僅限定於實施例者。再者,測量方法、評估方法等如下所述。 The invention will be further illustrated by the following examples, but the invention is not limited to the examples. Furthermore, the measurement method, the evaluation method, and the like are as follows.
利用掃描型電子顯微鏡(JSM-5510:日本電子股份有限公司製造),觀察研磨側第一層之單紗分散不織布表面之 任意10處,以加速電壓20 kV,拍攝倍率為3500倍之圖像。1張圖像測量任意10根單紗之直徑,對10張照片進行上述測量。求出總計100根之單紗直徑之測量值,將該等算術平均值作為數量平均纖維直徑。 Using a scanning electron microscope (JSM-5510: manufactured by JEOL Ltd.), the surface of the single yarn of the first layer on the polishing side was observed to be dispersed. Any 10 places, with an acceleration voltage of 20 kV, an image with a magnification of 3500 times. One image measures the diameter of any 10 single yarns, and the above measurement is performed on 10 photographs. The measured values of the total single yarn diameters of 100 were obtained, and the arithmetic mean values were taken as the number average fiber diameter.
使用超薄切片機(ULTRACUT-N:REICHERT製造),於剖面方向切割研磨布樣品,利用掃描型電子顯微鏡(JSM-5510:日本電子股份有限公司),對其進行觀察,以加速電壓20 kV,拍攝倍率為50倍之圖像。對任意10點之單紗分散不織布之厚度進行測量,將該等之算術平均值作為單紗分散不織布之厚度。 The abrasive cloth sample was cut in the cross-sectional direction using an ultra-thin microtome (manufactured by ULTRACUT-N: manufactured by REICHERT), and observed by a scanning electron microscope (JSM-5510: JEOL Co., Ltd.) to accelerate the voltage by 20 kV. The image with a magnification of 50 times. The thickness of the single-yarn dispersed non-woven fabric of any 10 points was measured, and the arithmetic mean of these was regarded as the thickness of the single-yarn dispersed nonwoven fabric.
克重(g/m2)以JIS L 1096-1999為標準進行測量,厚度(mm)使用針盤式厚度規(peacock:(股份有限)尾崎公司製造),對樣品之20點進行測量,使用其平均值。 The weight (g/m 2 ) is measured in accordance with JIS L 1096-1999, and the thickness (mm) is measured using a dial gauge (peacock: manufactured by Ozaki Co., Ltd.) to measure 20 points of the sample. The average value.
將25 cm×18 cm之樣品放置於溫度20℃、濕度60%之氣體環境中12小時以上後,放置於交織度測試儀(formation tester-FMT-MIII:野村商事社製造),測量各像素之透過率。根據所獲得之透過率,使用已定義之吸光度換算式,算出吸光度之標準偏差。 The sample of 25 cm × 18 cm was placed in a gas atmosphere at a temperature of 20 ° C and a humidity of 60% for 12 hours or more, and placed in a blending tester (formation tester-FMT-MIII: manufactured by Nomura Corporation) to measure each pixel. Transmittance. Based on the obtained transmittance, the standard deviation of the absorbance was calculated using the defined absorbance conversion formula.
將4 cm×10 cm之研磨布樣品放置於溫度20℃、濕度60%之氣體環境中12小時以上後,利用三維真實表面視圖 (Three-dimension real surface view)顯微鏡(VE-9800:股份有限公司基恩士(KEYENCE)公司製造)觀察單紗分散不織布之表面,拍攝倍率為50倍之圖像。藉由對所獲得之圖像之剖面輪廓進行解析,1次之測量中對2 mm長度之研磨布樣品之最大高度粗糙度(粗糙度曲線之山頂部與谷底部之高度差異)進行測量,進行10次該測量。以所獲得之10次測量值之平均值進行評估。 After placing a 4 cm × 10 cm abrasive cloth sample in a gas environment with a temperature of 20 ° C and a humidity of 60% for more than 12 hours, use a three-dimensional real surface view. (Three-dimension real surface view) Microscope (VE-9800: manufactured by KEYENCE Co., Ltd.) Observed the surface of a single yarn-dispersed non-woven fabric, and the image was taken at a magnification of 50 times. By analyzing the profile of the obtained image, the maximum height roughness (the difference in height between the top of the mountain and the bottom of the valley of the roughness curve) of the 2 mm length of the cloth sample is measured in one measurement. 10 measurements. The evaluation was performed on the average of the 10 measurements obtained.
以JIS B 0601-1994為標準進行。 It is carried out in accordance with JIS B 0601-1994.
使用原子力顯微鏡(Nano Scope IV D3100:Digital Instruments公司製造),對10處碟片基板樣品之任意直線狀表面測量算術平均粗糙度,對10處之測量值進行平均計算,藉此求出表面平均粗糙度(Ra)。 The atomic force microscope (Nano Scope IV D3100: manufactured by Digital Instruments) was used to measure the arithmetic mean roughness of any linear surface of 10 disc substrate samples, and the measured values at 10 points were averaged to obtain the surface average roughness. Degree (Ra).
使用超薄切片機(ULTRACUT-N:REICHERT製造),於剖面方向對研磨布樣品進行切割,利用掃描型電子顯微鏡(JSM-5510:日本電子股份有限公司製造)對其進行觀察,以加速電壓20 kV,拍攝倍率為500倍之圖像。對任意10張圖像進行觀察,單紗不均衡地存在,確認有無形成為束狀之纖維束。 The abrasive cloth sample was cut in the cross-sectional direction using an ultra-thin microtome (manufactured by ULTRACUT-N: manufactured by REICHERT), and observed by a scanning electron microscope (JSM-5510: manufactured by JEOL Ltd.) to accelerate the voltage 20 kV, an image with a magnification of 500 times. When any 10 images were observed, the single yarns were unevenly distributed, and it was confirmed whether or not the bundles were formed into bundles.
將研磨側第一層之單紗分散不織布自研磨層剝離,利用示差掃描型熱卡計(DSC-60:島津製作所股份有限公司製造)對融解熱量進行測量(升溫速度為20℃/分鐘、樣品重量 約5 mg)。若將已測量之每個單位質量之融解熱量設為△Hm,則結晶化度(Xc)可根據下式而計算。此處,△Ho係結晶之每個單位質量之融解熱量。 The single yarn dispersion non-woven fabric of the first layer on the polishing side was peeled off from the polishing layer, and the heat of fusion was measured by a differential scanning type calorimeter (DSC-60: manufactured by Shimadzu Corporation) (temperature up rate was 20 ° C / min, sample The weight is about 5 mg). If the measured heat of fusion per unit mass is ΔH m , the degree of crystallization (Xc) can be calculated according to the following formula. Here, ΔH o is the heat of fusion per unit mass of the crystal.
Xc(%)=[△Hm/△Ho]×100 Xc(%)=[△H m /△H o ]×100
根據JISL1907-2003,將垂直吊掛之測試片之下端浸於水中,放置固定時間(10分鐘)後,測量已上升之水之高度。 According to JIS L1907-2003, the lower end of the vertically suspended test piece was immersed in water and placed for a fixed time (10 minutes), and the height of the rising water was measured.
測量設備使用KES-G5(KATO TECH股份有限公司製造)。測試條件如下所示。 The measuring device used KES-G5 (manufactured by KATO TECH Co., Ltd.). The test conditions are as follows.
.SENS(記錄靈敏度):2 . SENS (recording sensitivity): 2
.測力計種類:1 kg . Dynamometer type: 1 kg
.速率範圍:0.02 mm/秒 . Rate range: 0.02 mm/sec
.加壓面積:2 cm2 . Pressurized area: 2 cm 2
.衝程設置:5.0 . Stroke setting: 5.0
.進入間隔:0.5 . Entry interval: 0.5
.承重上限:50 gf/cm2 . Load limit: 50 gf/cm 2
於上述測試條件下進行壓縮,根據壓力與變形量之相互關係圖,獲得壓縮能量。壓縮能量越大,越容易壓縮,亦即,意味著越柔軟。壓縮能量越小,意味著越硬。 The compression is performed under the above test conditions, and the compression energy is obtained according to the correlation diagram between the pressure and the deformation amount. The greater the compression energy, the easier it is to compress, that is, the softer it means. The smaller the compression energy, the harder it is.
根據JIS L 1096-2003,使用定速伸張型拉伸試驗機(TENSILON RTC-1210A:(股份有限)大東方數位科技 (Orientec)公司製造)進行測量。測試條件如下所示。 According to JIS L 1096-2003, using a constant-speed stretch tensile tester (TENSILON RTC-1210A: (share limited) Great Eastern Digital Technology (Manufactured by Orientec) to make measurements. The test conditions are as follows.
.測試片之尺寸:寬度2.5 cm、長度20 cm . Test piece size: width 2.5 cm, length 20 cm
.夾位間隔:10 cm . Clamping interval: 10 cm
.拉伸速度:10 cm/分鐘 . Stretching speed: 10 cm/min
利用擠製機對固有黏度為0.51之聚對苯二甲酸乙二酯(以下,簡稱為PET)丸進行加熱熔融後,送入已加熱至310℃之模具。自直徑為0.3 mm之噴嘴以1.0 mm間距排列為一行之紡口,以0.20 g/分鐘之每個噴嘴之吐出量,吐出熔融PET,自該紡口之開口端附近以0.24 MPa之壓力,噴射已加熱至365℃之空氣,將所生成之單紗群連續積體於位於紡口下方60 cm之移動的凝集面上,作為熔噴不織布而捲起。 The polyethylene terephthalate (hereinafter abbreviated as PET) pellet having an intrinsic viscosity of 0.51 was heated and melted by an extruder, and then fed to a mold which had been heated to 310 °C. The nozzles having a diameter of 0.3 mm are arranged in a row at a pitch of 1.0 mm, and the molten PET is discharged at a discharge amount of 0.20 g/min of each nozzle, and is sprayed at a pressure of 0.24 MPa from the vicinity of the open end of the spun. The air was heated to 365 ° C, and the resulting single yarn group was continuously accumulated on a moving surface of 60 cm below the spinning opening, and rolled up as a melt blown nonwoven fabric.
所獲得之熔噴不織布之克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為1.0 μm、吸光度之標準偏差為0.032。 The obtained melt-blown nonwoven fabric had a basis weight of 60 g/m 2 , a thickness of 280 μm, a single yarn number average fiber diameter of 1.0 μm, and a standard deviation of absorbance of 0.032.
另一方面,藉由直接紡絲法製造單紗直徑為3.2 μm之PET纖維,將長度切斷為5.0 mm之短纖維分散於水中,作為造紙用研磨漿。將該研磨漿造紙,製造出克重為42 g/m2之造紙層(A)、以及克重為17 g/m2之造紙層(B)。 On the other hand, a PET fiber having a single yarn diameter of 3.2 μm was produced by a direct spinning method, and short fibers having a length of 5.0 mm were dispersed in water to prepare a pulp for papermaking. The slurry was subjected to papermaking to produce a papermaking layer (A) having a basis weight of 42 g/m 2 and a papermaking layer (B) having a basis weight of 17 g/m 2 .
於包含100丹尼/48長絲之PET纖維假撚加工絲之克重為41 g/m2的平織物(經絲密度為46根/2.54 cm、緯絲密度為54根/2.54 cm、無撚)的兩面,積層造紙層(A)及(B),製造出造紙層(C)。 A plain fabric with a weight of 41 g/m 2 for a PET fiber false twisted silk containing 100 denier/48 filaments (filament density of 46/2.54 cm, weft density of 54/2.54 cm, no On both sides of the crucible, the papermaking layers (A) and (B) are laminated to produce a papermaking layer (C).
將上述所獲得之熔噴不織布積層於造紙層(C)之層(A)側後,一面自下方進行吸引以使靜壓變為20 kPa,一面噴射高速水流,進行三維交絡,製造出多層構造層。高速水流自以3.0 mm間距排列成一行之直徑為0.2 mm之噴嘴,以3.0 MPa之壓力進行連續噴射,於距噴嘴30 mm之位置,使高壓水流與層衝突。 The melt-blown nonwoven fabric obtained as described above was laminated on the layer (A) side of the papermaking layer (C), and then suctioned from below to make a static pressure of 20 kPa, and a high-speed water jet was sprayed to perform three-dimensional entanglement to produce a multilayer structure. Floor. The high-speed water flow was continuously sprayed at a pressure of 3.0 MPa from a nozzle having a diameter of 3.0 mm arranged at a pitch of 3.0 mm, and the high-pressure water flow collided with the layer at a position 30 mm from the nozzle.
其次,使水系之聚醚系聚胺基甲酸酯乳化液(AP-18:日華化學股份有限公司製造)含浸於該多層構造層中,以使其相對於多層構造層為12 wt%,利用熱風乾燥機進行乾燥(130℃×3分鐘)後使聚胺基甲酸酯凝固。 Next, a water-based polyether-based polyurethane emulsion (AP-18: manufactured by Rihua Chemical Co., Ltd.) was impregnated into the multilayer structural layer so as to be 12 wt% with respect to the multilayer structural layer. The polyurethane was solidified by drying (130 ° C × 3 minutes) using a hot air dryer.
其次,使界面活性劑(emulgen 120:花王股份有限公司製造)含浸於該多層構造層中,以使其相對於多層構造層為0.5 wt%,利用熱風乾燥機進行乾燥(130℃×2分鐘)。藉由該加工,可提高吸水性。 Next, a surfactant (emulgen 120: manufactured by Kao Co., Ltd.) was impregnated into the multilayer structural layer so as to be 0.5 wt% with respect to the multilayer structural layer, and dried by a hot air dryer (130 ° C × 2 minutes) . By this processing, water absorption can be improved.
進而,使用#240之拋光紙(W54P240:理研化學公司製造),以1000 m/分鐘之紙張速度,對作為研磨側第一層之熔噴不織布面進行拋光,獲得紋理加工用研磨布。 Further, using a #240 polishing paper (W54P240: manufactured by Riken Chemical Co., Ltd.), the melt-blown nonwoven fabric surface as the first layer on the polishing side was polished at a paper speed of 1000 m/min to obtain a polishing cloth for texture processing.
作為所獲得之紋理加工用研磨布之研磨側第一層的單紗分散不織布,其數量平均纖維直徑為1.0 μm,厚度為160 μm,最大高度粗糙度為42 μm,觀察不到纖維束。 The single-yarn dispersed nonwoven fabric as the first layer on the polishing side of the obtained abrasive cloth for texturing had a number average fiber diameter of 1.0 μm, a thickness of 160 μm, and a maximum height roughness of 42 μm, and no fiber bundle was observed.
將所獲得之研磨布以38 mm寬度切開後使用,於以下條件下,對鋁板鍍Ni-P後,對實施了擦光加工之碟片基板進行紋理加工。 The obtained polishing cloth was cut at a width of 38 mm and used, and after the Ni-P was plated on the aluminum plate under the following conditions, the disc substrate subjected to the buffing process was subjected to texturing.
研磨粒:金剛石游離研磨粒 Abrasive grain: diamond free abrasive grain
研磨粒平均粒徑:0.3 μm Average particle size of abrasive particles: 0.3 μm
基板旋轉數:500 rpm Number of substrate rotations: 500 rpm
研磨布供給速度:10 cm/分鐘 Grinding cloth supply speed: 10 cm / min
橫動程條件:振幅1 mm、600次/分鐘(10 Hz) Transverse range conditions: amplitude 1 mm, 600 times / minute (10 Hz)
對加工後之碟片基板之表面平均粗糙度(Ra)進行測量的結果為0.31 nm。 The surface average roughness (Ra) of the processed disc substrate was measured and found to be 0.31 nm.
於熔噴不織布之製造中,除了將單孔吐出量設為0.10 g/分鐘以外,與實施例1相同,獲得克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為0.6 μm、吸光度之標準偏差為0.028之熔噴不織布。其次,使用所獲得之熔噴不織布,與實施例1相同,實施紋理加工用研磨布之製作、以及紋理加工.Ra測量。 In the production of the melt-blown nonwoven fabric, the same as in Example 1, except that the single-hole discharge amount was set to 0.10 g/min, a gram weight of 60 g/m 2 , a thickness of 280 μm, and a number average fiber diameter of a single yarn were obtained. A meltblown non-woven fabric of 0.6 μm with a standard deviation of absorbance of 0.028. Next, using the obtained melt-blown nonwoven fabric, the same as in the first embodiment, the production of the polishing cloth for texture processing, and the texture processing. Ra measurement.
藉由使單孔吐出量降低至實施例1之一半,可使構成熔噴不織布之單紗之數量平均纖維直徑小至0.6 μm,藉由單紗之細徑化,可使所獲得之紋理加工用研磨布之研磨側第1層表面的最大高度粗糙度小至34 μm,又,觀察不到纖維束。對紋理加工後之碟片基板之表面平均粗糙度(Ra)進行測量之結果為0.26 nm。 By reducing the single-hole discharge amount to one half of the first embodiment, the number of individual yarns constituting the melt-blown nonwoven fabric can be as small as 0.6 μm, and the obtained texture can be processed by the diameter reduction of the single yarn. The maximum height roughness of the surface of the first layer on the side of the polishing side of the polishing cloth was as small as 34 μm, and no fiber bundle was observed. The surface average roughness (Ra) of the textured substrate after the texture processing was measured to be 0.26 nm.
於熔噴不織布之製造中,除了於聚合物中使用尼龍6(UBE尼龍1011FB:宇部與產股份有限公司製造)以外,與實施例1相同,獲得克重為60 g/m2、厚度為280 μm、單 紗之數量平均纖維直徑為1.4 μm、吸光度之標準偏差為0.038之熔噴不織布。其次,使用所獲得之熔噴不織布,與實施例1相同,實施紋理加工用研磨布之製作、以及紋理加工.Ra測量。 In the production of the melt-blown nonwoven fabric, in the same manner as in Example 1, except that nylon 6 (UBE nylon 1011FB: manufactured by Ube Industries Co., Ltd.) was used for the polymer, a basis weight of 60 g/m 2 and a thickness of 280 were obtained. A melt-blown non-woven fabric of μm, single yarn having an average fiber diameter of 1.4 μm and a standard deviation of absorbance of 0.038. Next, using the obtained melt-blown nonwoven fabric, the same as in the first embodiment, the production of the polishing cloth for texture processing, and the texture processing. Ra measurement.
作為所獲得之紋理加工用研磨布之研磨側第一層的單紗分散不織布,其數量平均纖維直徑為1.4 μm、厚度為120 μm、最大高度粗糙度為48 μm,觀察不到纖維束。對紋理加工後之碟片基板之表面平均粗糙度(Ra)進行測量之結果為0.39 nm。 As the single-yarn dispersed nonwoven fabric of the first layer on the polishing side of the obtained abrasive cloth for texture processing, the number average fiber diameter was 1.4 μm, the thickness was 120 μm, and the maximum height roughness was 48 μm, and no fiber bundle was observed. The surface average roughness (Ra) of the textured substrate after the texture processing was measured to be 0.39 nm.
使用與實施例1相同而獲得之克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為1.0 μm、吸光度之標準偏差為0.032之熔噴不織布,不使聚醚系水系聚胺基甲酸酯乳化液含浸於多層構造層中,使用#500之拋光紙(C54P500:理研化學公司製造),以1000 m/分鐘之紙張速度對作為研磨側第一層之單紗分散不織布面進行4次拋光,除此以外,與實施例1相同,實施紋理加工用研磨布之製作、以及紋理加工.Ra測量。 A melt-blown nonwoven fabric having a basis weight of 60 g/m 2 , a thickness of 280 μm, a number average fiber diameter of a single yarn of 1.0 μm, and a standard deviation of absorbance of 0.032 obtained in the same manner as in Example 1 was used. The aqueous polyurethane emulsion was impregnated into the multilayer structure layer, and the single yarn of the first layer as the polishing side was dispersed at a paper speed of 1000 m/min using a #500 polishing paper (C54P500: manufactured by Riken Chemical Co., Ltd.). In the same manner as in Example 1, except that the non-woven fabric surface was polished four times, the production of the polishing cloth for texture processing and the texture processing were carried out. Ra measurement.
作為所獲得之紋理加工用研磨布之研磨側第一層的單紗分散不織布,其數量平均纖維直徑為1.0 μm、厚度為110 μm、最大高度粗糙度為56 μm,觀察不到纖維束。對紋理加工後之碟片基板之表面平均粗糙度(Ra)進行測量之結果為0.42 nm。 The single-yarn dispersed nonwoven fabric as the first layer on the polishing side of the obtained polishing cloth for texture processing had a number average fiber diameter of 1.0 μm, a thickness of 110 μm, and a maximum height roughness of 56 μm, and no fiber bundle was observed. The surface average roughness (Ra) of the textured substrate after the texture processing was measured to be 0.42 nm.
使用與實施例1相同而獲得之克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為1.0 μm、吸光度之標準偏差為0.032之熔噴不織布,不使聚醚系水系聚胺基甲酸酯乳化液含浸於多層構造層中,除此以外,與實施例1相同,實施紋理加工用研磨布之製作、以及紋理加工.Ra測量。 A melt-blown nonwoven fabric having a basis weight of 60 g/m 2 , a thickness of 280 μm, a number average fiber diameter of a single yarn of 1.0 μm, and a standard deviation of absorbance of 0.032 obtained in the same manner as in Example 1 was used. In the same manner as in Example 1, except that the aqueous polyurethane emulsion was impregnated into the multilayer structural layer, the production of the polishing cloth for texture processing and the texture processing were carried out. Ra measurement.
不含浸高分子彈性體,而使用紋路較粗之拋光紙進行拋光,因此,研磨層之平滑性較差,且作為研磨側第一層之單紗分散不織布之表面的最大高度粗糙度為98 μm,與含浸有高分子彈性體之實施例1相比,為約2倍之最大高度粗糙度。對紋理加工後之碟片基板之表面平均粗糙度(Ra)進行測量之結果為0.68 nm。 It does not contain a dip polymer elastomer and is polished using a coarse-grained polishing paper. Therefore, the smoothness of the polishing layer is poor, and the maximum height roughness of the surface of the single-yarn non-woven fabric as the first layer on the polishing side is 98 μm. Compared with Example 1 impregnated with a polymeric elastomer, it was about 2 times the maximum height roughness. The surface average roughness (Ra) of the textured substrate after the texture processing was measured to be 0.68 nm.
使用與實施例1相同而獲得之克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為1.0 μm、吸光度之標準偏差為0.032之熔噴不織布,將構成造紙層(A)與(B)之短纖維之單紗直徑設為10.1 μm,除此以外,與實施例1相同,實施紋理加工用研磨布之製作、以及紋理加工.Ra測量。 Using a melt-blown nonwoven fabric having a basis weight of 60 g/m 2 , a thickness of 280 μm, a single yarn number average fiber diameter of 1.0 μm, and a standard deviation of absorbance of 0.032, which is obtained in the same manner as in Example 1, will constitute a papermaking layer ( The production of the polishing cloth for texture processing and the texture processing were carried out in the same manner as in Example 1 except that the single yarn diameter of the short fibers of A) and (B) was 10.1 μm. Ra measurement.
對紋理加工後之碟片基板之表面平均粗糙度(Ra)進行測量之結果為0.61 nm。 The surface average roughness (Ra) of the textured substrate after the texture processing was measured to be 0.61 nm.
將易於進行鹼減量之聚酯共聚物聚合物(對分子量4000之聚乙二醇進行10 wt%共聚合後之PET)用於海成分,將正則型PET(固有黏度為0.65)用於島成分。分別利用齒輪泵 對該兩種聚合物進行計量,以海成分35 wt%、島成分65 wt%之比例,使用島根數100根/孔之紡口,於290℃進行熔融紡絲,來獲得未延伸絲。 A polyester copolymer polymer which is easy to carry out alkali reduction (PET which is copolymerized by 10 wt% of polyethylene glycol having a molecular weight of 4000) is used for the sea component, and a regular type PET (intrinsic viscosity of 0.65) is used for the island component. . Gear pump The two polymers were weighed and melt-spun at 290 ° C at a ratio of 35 wt% of the sea component to 65 wt% of the island component, and the unstretched yarn was obtained at 290 ° C.
於溫度75℃,以延伸倍率2.8倍,使所獲得之未延伸絲熱延伸,於130℃進行熱設定,獲得島成分之纖維直徑為1.2 μm之海島型複合纖維(纖維直徑14.8 μm)。 The obtained unstretched yarn was thermally extended at a temperature of 75 ° C at a stretching ratio of 2.8 times, and heat set at 130 ° C to obtain an island-in-the-sea type composite fiber (fiber diameter of 14.8 μm) having an island component fiber diameter of 1.2 μm.
將所獲得之海島型複合纖維切斷為5.0 mm,分散於水中,作為造紙用研磨漿。將該研磨漿造紙,製造出克重為17 g/m2之造紙層(B)及克重為150 g/m2之造紙層(D)。 The obtained sea-island type composite fiber was cut into 5.0 mm and dispersed in water to prepare a pulp for papermaking. The slurry was subjected to papermaking to produce a papermaking layer (B) having a basis weight of 17 g/m 2 and a papermaking layer (D) having a basis weight of 150 g/m 2 .
其次,與實施例1相同,於包含100丹尼/48長絲之PET纖維之克重為41 g/m2的平織物的兩面,積層造紙層(D)與造紙層(B)後,一面自下方進行吸引以使靜壓變為15 kPa,一面噴射高速水流進行三維交絡,製造出多層構造層(E)。高速水流自以3.0 mm間距排列為一行之直徑為0.2 mm之噴嘴,以3.0 MPa之壓力,進行連續噴射,於距噴嘴30 mm之位置,使高壓水流與該層衝突。 Next, in the same manner as in Example 1, after coating the papermaking layer (D) and the papermaking layer (B) on both sides of the flat fabric having a gram weight of 41 g/m 2 containing 100 denier/48 filaments of PET fibers, one side of the papermaking layer (D) and the papermaking layer (B) The multi-layer structure layer (E) was produced by suctioning from below to make the static pressure 15 kPa, and jetting a high-speed water stream to perform three-dimensional entanglement. The high-speed water flow is continuously sprayed at a pressure of 3.0 MPa from a nozzle having a diameter of 3.0 mm arranged at a pitch of 3.0 mm, and the high-pressure water flow collides with the layer at a position 30 mm from the nozzle.
使溶劑系之聚醚系聚胺基甲酸酯乳化液之二甲基甲醯胺(dimethylformamide,DMF)溶液含浸於所獲得之多層構造層(E)中,以使其相對於多層構造層為26 wt%,藉由浸漬於水槽中而使聚胺基甲酸酯凝固(濕式凝固)後,利用熱風乾燥機進行乾燥(130℃×3分鐘)。進而,利用80℃之5 wt% NaOH水溶液,溶析海成分,形成作為數量平均纖維直徑為1.2 μm之極細纖維。再者,利用掃描型電子顯微鏡(JSM-5510:日本電子股份有限公司製造)進行觀察時,確 認存在纖維束。 The solvent-based polyether-based polyurethane emulsion dimethylformamide (DMF) solution is impregnated into the obtained multilayer structural layer (E) so as to be opposite to the multilayer structural layer. After 26 wt%, the polyurethane was coagulated (wet-solidified) by immersing in a water tank, and then dried by a hot air dryer (130 ° C × 3 minutes). Further, the sea component was eluted by using a 5 wt% aqueous NaOH solution at 80 ° C to form an ultrafine fiber having a number average fiber diameter of 1.2 μm. Furthermore, when using a scanning electron microscope (JSM-5510: manufactured by JEOL Ltd.), it is true. Identify the fiber bundle.
其次,使用#240之拋光紙(理研化學公司製造,W54P240),以1000 m/分鐘之紙張速度對第一層表面進行拋光而起毛,獲得紋理加工用研磨布。構成作為研磨層第一層之不織布之單紗的數量平均纖維直徑為1.2 μm,又,與含浸有高分子彈性體無關,存在纖維束,因此,紋理加工用研磨布之研磨側第一層之最大高度粗糙度為120 μm,極大。 Next, using the #240 polishing paper (manufactured by Riken Chemical Co., Ltd., W54P240), the first layer surface was polished and raised at a paper speed of 1000 m/min to obtain a polishing cloth for texture processing. The number average fiber diameter of the single yarn constituting the nonwoven fabric as the first layer of the polishing layer is 1.2 μm, and the fiber bundle is present regardless of the impregnation of the polymer elastic body. Therefore, the first layer of the polishing side of the polishing cloth for texture processing is The maximum height roughness is 120 μm, which is extremely large.
與實施例1相同,實施紋理加工.Ra測量之結果為,紋理加工後之碟片基板之表面平均粗糙度(Ra)為0.84 nm。 Texture processing is carried out in the same manner as in Embodiment 1. As a result of Ra measurement, the surface average roughness (Ra) of the textured substrate after the texture processing was 0.84 nm.
除了將加熱空氣溫度設為340℃以外,以與實施例1相同之方式製造出熔噴不織布。所獲得之熔噴不織布之克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為1.8 μm、吸光度之標準偏差為0.046。 A melt blown nonwoven fabric was produced in the same manner as in Example 1 except that the heating air temperature was set to 340 °C. The obtained melt-blown nonwoven fabric had a basis weight of 60 g/m 2 , a thickness of 280 μm, a single yarn number average fiber diameter of 1.8 μm, and a standard deviation of absorbance of 0.046.
使用該熔噴不織布,與實施例1相同,實施紋理加工用研磨布之製作、以及紋理加工.Ra測定之結果為,紋理加工後之碟片基板之表面平均粗糙度(Ra)為0.52 nm。 Using this melt-blown nonwoven fabric, in the same manner as in the first embodiment, the production of the polishing cloth for texture processing and the texture processing were carried out. As a result of the Ra measurement, the surface average roughness (Ra) of the textured substrate after the texturing was 0.52 nm.
作為研磨側第一層之單紗分散不織布之表面的最大高度粗糙度為70 μm以下,但製造熔噴不織布時之加熱空氣溫度較低(實施例1中於365℃實施),因此,熔噴不織布之數量平均纖維直徑增大,研磨粒向水平方向之分散性變差,其結果為,紋理加工後之碟片基板之表面平均粗糙度(Ra)變大。 The maximum height roughness of the surface of the single-yarn non-woven fabric as the first layer on the polishing side is 70 μm or less, but the temperature of the heated air when the melt-blown nonwoven fabric is produced is low (implemented at 365 ° C in Example 1), therefore, melt-blown The number average fiber diameter of the non-woven fabric is increased, and the dispersibility of the abrasive grains in the horizontal direction is deteriorated. As a result, the surface average roughness (Ra) of the disc substrate after the texture processing becomes large.
將加熱空氣溫度設為315℃,不使用整流器,除此以外,與實施例1相同,製造熔噴不織布。所獲得之熔噴不織布之克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為2.5 μm、吸光度之標準偏差為0.068。 A melt blown nonwoven fabric was produced in the same manner as in Example 1 except that the temperature of the heated air was 315 ° C without using a rectifier. The obtained melt-blown nonwoven fabric had a basis weight of 60 g/m 2 , a thickness of 280 μm, a single yarn number average fiber diameter of 2.5 μm, and a standard deviation of absorbance of 0.068.
使用該熔噴不織布,與實施例1相同,實施紋理加工用研磨布之製作、以及紋理加工.Ra測量之結果為,紋理加工後之碟片基板之表面平均粗糙度(Ra)為0.65 nm。 Using this melt-blown nonwoven fabric, in the same manner as in the first embodiment, the production of the polishing cloth for texture processing and the texture processing were carried out. As a result of Ra measurement, the surface average roughness (Ra) of the textured substrate after the texture processing was 0.65 nm.
於製造熔噴不織布時,於聚合物中使用尼龍6(UBE尼龍1011FB:宇部與產股份有限公司製),除此以外,與實施例1相同,獲得克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為1.0 μm、吸光度之標準偏差為0.032之熔噴不織布。 In the same manner as in Example 1, except that Nylon 6 (UBE Nylon 1011FB: manufactured by Ube Industries Co., Ltd.) was used for the melt-blown nonwoven fabric, a basis weight of 60 g/m 2 and a thickness of Melt-blown non-woven fabric of 280 μm, single yarn with an average fiber diameter of 1.0 μm and a standard deviation of absorbance of 0.032.
使用所獲得之熔噴不織布,與實施例1相同,製作多層構造層,其次,不含浸界面活性劑,含浸溶劑系之聚醚系聚胺基甲酸酯乳化液之二甲基甲醯胺(DMF)溶液,以使其相對於多層構造層為11 wt%,除此以外,與實施例3相同,實施紋理加工用研磨布之製作、以及紋理加工.Ra測量。 Using the obtained melt-blown nonwoven fabric, a multilayer structure layer was produced in the same manner as in Example 1, and secondly, a solvent-free polyether-based polyurethane emulsion of dimethylformamide was used. The DMF) solution was prepared in the same manner as in Example 3 except that the solution was 11 wt% with respect to the multilayer structural layer. Ra measurement.
對紋理加工後之碟片基板之表面平均粗糙度(Ra)進行測量的結果為0.58 nm。 The surface average roughness (Ra) of the textured substrate after the texture processing was measured to be 0.58 nm.
使用與實施例1相同而獲得之克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為1.0 μm、吸光度之標準偏差為0.032之熔噴不織布,與實施例1相同,製作出多層構造層。 A melt-blown nonwoven fabric having a basis weight of 60 g/m 2 , a thickness of 280 μm, a number average fiber diameter of a single yarn of 1.0 μm, and a standard deviation of absorbance of 0.032 was obtained in the same manner as in Example 1. , making a multi-layer structure layer.
其次,使溶劑系之聚碳酸酯系聚胺基甲酸酯乳化液之二甲基甲醯胺(DMF)溶液含浸於多層構造層中,以使其相對於多層構造層為34 wt%,藉由浸漬於水槽中而使聚胺酯凝固(濕式凝固)後,利用熱風乾燥機進行乾燥(130℃×3分鐘),除此以外,與實施例1相同,實施紋理加工用研磨布之製作、以及紋理加工.Ra測量。 Next, a solution of a solvent-based polycarbonate-based polyurethane emulsion of dimethylformamide (DMF) was impregnated into the multilayer structural layer so as to be 34 wt% with respect to the multilayer structural layer. The production of the polishing cloth for texture processing was carried out in the same manner as in Example 1 except that the polyurethane was coagulated (wet-solidified) by immersion in a water tank, and then dried by a hot air dryer (130 ° C × 3 minutes). Texture processing. Ra measurement.
對紋理加工後之碟片基板之表面平均粗糙度(Ra)進行測量的結果為0.59 nm。 The surface average roughness (Ra) of the textured substrate after the texture processing was measured to be 0.59 nm.
除了使用固有黏度為0.39之PET丸以外,與實施例1相同而獲得之克重為60 g/m2、厚度為280 μm、單紗之數量平均纖維直徑為0.9 μm、吸光度之標準偏差為0.045之熔噴不織布,與實施例1相同,製作出多層構造層。 The grammage was 60 g/m 2 , the thickness was 280 μm, the number average fiber diameter of the single yarn was 0.9 μm, and the standard deviation of the absorbance was 0.045, except that the PET pellet having an intrinsic viscosity of 0.39 was used. A melt-blown nonwoven fabric was produced in the same manner as in Example 1 to produce a multilayer structure layer.
使用所獲得之熔噴不織布,與實施例1相同,試著進行紋理加工用研磨布之製作。對作為研磨側第一層之熔噴不織布面進行拋光之結果為,導致較多單紗切斷,無法製作值得評估之紋理加工用研磨布。對作為研磨側第一層之單紗分散不織布之結晶化度進行測量之結果為27.2%。 Using the obtained melt-blown nonwoven fabric, in the same manner as in Example 1, the production of a polishing cloth for texture processing was attempted. As a result of polishing the melt-blown nonwoven fabric surface as the first layer on the polishing side, a large number of single yarns were cut, and it was impossible to produce a polishing cloth for texture processing which is worthy of evaluation. The result of measuring the degree of crystallization of the single-yarn dispersed nonwoven fabric as the first layer on the polishing side was 27.2%.
使用與實施例1相同而獲得之克重為30 g/m2、厚度為140 μm、單紗之數量平均纖維直徑為1.0 μm、吸光度之標準偏 差為0.032之熔噴不織布,與實施例1相同,製作出多層構造層。 A melt-blown nonwoven fabric having a basis weight of 30 g/m 2 , a thickness of 140 μm, a number average fiber diameter of a single yarn of 1.0 μm, and a standard deviation of absorbance of 0.032 was obtained in the same manner as in Example 1. , making a multi-layer structure layer.
使用包含該多層構造層之紋理加工用研磨布,實施紋理加工.Ra測量。對紋理加工後之碟片基板之表面平均粗糙度(Ra)進行測量之結果為0.63 nm。 Texture processing is performed using a polishing cloth for texture processing including the multilayer structural layer. Ra measurement. The surface average roughness (Ra) of the textured substrate after the texture processing was measured to be 0.63 nm.
表1、2表示以上實施例、比較例中所製作出之研磨布之構造以及物性。 Tables 1 and 2 show the structures and physical properties of the polishing cloth produced in the above Examples and Comparative Examples.
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