TWI401271B - Pre-hardened, coarsened pre-hardened and laminated - Google Patents

Pre-hardened, coarsened pre-hardened and laminated Download PDF

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TWI401271B
TWI401271B TW100111671A TW100111671A TWI401271B TW I401271 B TWI401271 B TW I401271B TW 100111671 A TW100111671 A TW 100111671A TW 100111671 A TW100111671 A TW 100111671A TW I401271 B TWI401271 B TW I401271B
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cured
epoxy resin
roughened
cured material
cerium oxide
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TW201241031A (en
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Reona Yokota
Koichi Shibayama
Akihiro Uenishi
Hidenobu Deguchi
Tomoki Kunikawa
Tatsushi Hayashi
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Sekisui Chemical Co Ltd
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預硬化物、粗化預硬化物及積層體Pre-cured material, roughened pre-cured material and laminated body

本發明係關於一種藉由使用包含環氧樹脂、硬化劑及二氧化矽之環氧樹脂材料,並使該環氧樹脂材料硬化而獲得之預硬化物;以及使用該預硬化物之粗化預硬化物及積層體。The present invention relates to a pre-cured product obtained by using an epoxy resin material comprising an epoxy resin, a hardener and cerium oxide, and hardening the epoxy resin material; and a roughening pre-preparation using the pre-cured material Hardened material and laminated body.

先前,為獲得積層板及印刷配線板等電子零件而使用各種樹脂組合物。例如,於多層印刷配線板中,為形成用以使內部之層間絕緣之絕緣層或形成位於表層部分之絕緣層,而使用樹脂組合物。Conventionally, various resin compositions have been used to obtain electronic components such as laminates and printed wiring boards. For example, in the multilayer printed wiring board, a resin composition is used in order to form an insulating layer for insulating the inner layers or to form an insulating layer located in the surface layer portion.

作為上述樹脂組合物之一例,於下述專利文獻1中,揭示有包含環氧樹脂、硬化劑、苯氧基樹脂及平均粒徑為0.01~2 μm之無機填充劑的樹脂組合物。進而於專利文獻1中,亦揭示有包含環氧樹脂、硬化劑、平均粒徑為0.1~10 μm之無機填充劑的樹脂組合物。As an example of the above resin composition, Patent Document 1 listed below discloses a resin composition comprising an epoxy resin, a curing agent, a phenoxy resin, and an inorganic filler having an average particle diameter of 0.01 to 2 μm. Further, Patent Document 1 discloses a resin composition comprising an epoxy resin, a curing agent, and an inorganic filler having an average particle diameter of 0.1 to 10 μm.

於專利文獻1中,具有兩層積層結構之多層膜之各層係使用上述兩種不同樹脂組合物而形成。記載有該多層膜可良好地埋入於基板上所設置之間隙等中。In Patent Document 1, each layer of a multilayer film having a two-layer laminated structure is formed using the above two different resin compositions. It is described that the multilayer film can be satisfactorily embedded in a gap or the like provided on a substrate.

於下述專利文獻2中,揭示有包含環氧樹脂、硬化劑、苯氧基樹脂及聚乙烯縮醛樹脂中之至少一種、以及含磷之苯并化合物的樹脂組合物。於專利文獻2中,記載有若對使樹脂組合物硬化而成之硬化物進行粗化處理,則即便粗化面之粗糙度相對較小,亦可獲得該粗化面對鍍敷導體表現出較高之密接力,且阻燃性優異之絕緣層。Patent Document 2 listed below discloses at least one of an epoxy resin, a hardener, a phenoxy resin, and a polyvinyl acetal resin, and a phosphorus-containing benzoate. A resin composition of a compound. Patent Document 2 discloses that when the cured product obtained by curing the resin composition is subjected to a roughening treatment, even if the roughness of the roughened surface is relatively small, the roughened surface-plated conductor can be obtained. An insulating layer with high adhesion and excellent flame retardancy.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]日本專利特開2008-302677號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-302677

[專利文獻2] WO 2009/038166A1[Patent Document 2] WO 2009/038166A1

於專利文獻1中,由於準備兩種樹脂組合物而製作多層膜,故而存在多層膜之製作費時費力且成本偏高之問題。In Patent Document 1, since a multilayer film is prepared by preparing two kinds of resin compositions, there is a problem that the production of the multilayer film is time consuming and laborious, and the cost is high.

於專利文獻2中,雖記載有藉由使樹脂組合物具有上述組成而使粗糙度變小,但存在粗化面之粗糙度並未充分變小之情況。In Patent Document 2, although the resin composition has the above-described composition, the roughness is reduced, but the roughness of the roughened surface is not sufficiently reduced.

又,關於專利文獻1中所記載之多層膜及專利文獻2中所記載之樹脂組合物,當於使該等硬化而成之硬化物之表面藉由鍍敷處理形成金屬層時,存在難以充分提高硬化物與金屬層之接著強度之情況。Further, in the multilayer film described in Patent Document 1 and the resin composition described in Patent Document 2, when the surface of the cured product obtained by curing the hardened material is formed into a metal layer by a plating treatment, it is difficult to sufficiently form the metal layer. Improve the bonding strength between the hardened material and the metal layer.

本發明之目的在於提供一種可降低粗化預硬化物之經粗化處理之表面的表面粗糙度,且可提高使粗化預硬化物硬化而成之硬化物與金屬層之接著強度的預硬化物;以及使用該預硬化物之粗化預硬化物及積層體。An object of the present invention is to provide a surface roughness which can reduce the surface roughness of a roughened pre-cured material, and can improve pre-hardening of the adhesion strength between the cured product and the metal layer which is obtained by hardening the roughened pre-cured material. And a roughened pre-cured material and a laminate using the pre-cured material.

根據本發明之較廣之態樣,可提供一種預硬化物,其係藉由使環氧樹脂材料硬化而獲得者,且包含第1主面與第2主面,該第1主面為經粗化處理之面,上述環氧樹脂材料包含環氧樹脂、硬化劑及二氧化矽,上述二氧化矽包含粒徑為0.01 μm以上且未達0.5 μm之第1之小粒徑二氧化矽、及粒徑為0.5 μm以上、20 μm以下之第2之大粒徑二氧化矽,於預硬化物中,上述第1之小粒徑二氧化矽以大多存在於經粗化處理之面即上述第1主面側之方式偏向存在,且上述第2之大粒徑二氧化矽以大多存在於上述第2主面側之方式偏向存在。According to a broader aspect of the present invention, there is provided a pre-cured material obtained by curing an epoxy resin material, comprising: a first main surface and a second main surface, wherein the first main surface is a In the roughening treatment, the epoxy resin material comprises an epoxy resin, a curing agent and cerium oxide, and the cerium oxide comprises a first small particle size cerium oxide having a particle diameter of 0.01 μm or more and less than 0.5 μm. And a second largest particle size ceria having a particle diameter of 0.5 μm or more and 20 μm or less; in the pre-cured material, the first small-sized ceria is present in the roughened surface, that is, the above-mentioned The first main surface side is biased, and the second large particle size ceria is present in a manner that is mostly present on the second main surface side.

於本發明之預硬化物之某特定態樣中,經粗化處理之面即上述第1主面側之表面部分的厚度為0.3 μm之第1區域中所含之所有二氧化矽100體積%中,上述第2之大粒徑二氧化矽之含量為5體積%以下。In a specific aspect of the pre-cured material of the present invention, the roughened surface, that is, 100% by volume of all the cerium oxide contained in the first region having a thickness of 0.3 μm on the surface portion of the first main surface side The content of the second largest particle size ceria is 5% by volume or less.

於本發明之預硬化物之另一特定態樣中,60~120℃之溫度區域的預硬化前之環氧樹脂材料之最低熔融黏度為50 Pa‧s以上、150 Pa‧s以下。In another specific aspect of the pre-cured material of the present invention, the epoxy resin material before pre-hardening in a temperature range of 60 to 120 ° C has a minimum melt viscosity of 50 Pa‧s or more and 150 Pa‧s or less.

於本發明之預硬化物之其他特定態樣中,上述環氧樹脂材料更包含苯氧基樹脂。In other specific aspects of the pre-cured material of the present invention, the epoxy resin material further comprises a phenoxy resin.

本發明之粗化預硬化物係藉由對依據本發明所構成之預硬化物之上述第1主面進行粗化處理而獲得者。The roughened pre-cured material of the present invention is obtained by subjecting the first main surface of the pre-cured material according to the present invention to a roughening treatment.

於本發明之粗化預硬化物之某特定態樣中,於粗化處理前,對上述預硬化物進行膨潤處理。In a specific aspect of the roughened pre-cured material of the present invention, the pre-cured material is subjected to a swelling treatment before the roughening treatment.

本發明之積層體包含使藉由對依據本發明所構成之預硬化物之上述第1主面進行粗化處理而獲得的粗化預硬化物硬化而成之硬化物;與積層於該硬化物之經粗化處理之表面的金屬層。該硬化物與該金屬層之接著強度較佳為0.39 N/mm以上。The laminate of the present invention comprises a cured product obtained by curing a roughened pre-cured material obtained by subjecting the first main surface of the pre-cured material according to the present invention to a roughening treatment; and laminating the cured product The metal layer of the roughened surface. The adhesion strength between the cured product and the metal layer is preferably 0.39 N/mm or more.

本發明之預硬化物係藉由使包含環氧樹脂、硬化劑及二氧化矽之環氧樹脂材料硬化而獲得者,上述二氧化矽包含粒徑為0.01 μm以上且未達0.5 μm之第1之小粒徑二氧化矽、及粒徑為0.5 μm以上、20 μm以下之第2之大粒徑二氧化矽,於預硬化物中,上述第1之小粒徑二氧化矽以大多存在於經粗化處理之面即上述第1主面側之方式偏向存在,且上述第2之大粒徑二氧化矽以大多存在於上述第2主面側之方式偏向存在,因此於對預硬化物之第1主面進行粗化處理時,可降低粗化預硬化物之經粗化處理之表面的表面粗糙度。進而,於使粗化預硬化物硬化而成之硬化物之表面形成金屬層之情形時,可提高硬化物與金屬層之接著強度。The pre-cured material of the present invention is obtained by curing an epoxy resin material containing an epoxy resin, a hardener, and ceria, and the ceria contains the first particle having a particle diameter of 0.01 μm or more and less than 0.5 μm. The small-sized cerium oxide and the second large-sized cerium oxide having a particle diameter of 0.5 μm or more and 20 μm or less, and the first small-sized cerium oxide is present in the pre-cured material. The surface of the roughened surface, that is, the first main surface side, is biased, and the second large-sized cerium oxide is present in a manner that is mostly present on the second main surface side, so that the pre-cured material is present. When the first main surface is subjected to the roughening treatment, the surface roughness of the roughened surface of the roughened pre-cured material can be reduced. Further, in the case where a metal layer is formed on the surface of the cured product obtained by curing the roughened pre-cured material, the adhesion strength between the cured product and the metal layer can be improved.

以下,藉由一面參照圖式一面對本發明之具體之實施形態及實施例進行說明而使本發明明確。Hereinafter, the present invention will be described with reference to the specific embodiments and examples of the present invention.

本發明之預硬化物係藉由使環氧樹脂材料硬化而獲得者。於圖1中,以前視剖面圖模式性地表示本發明之一實施形態之預硬化物。The pre-cured material of the present invention is obtained by hardening an epoxy resin material. In Fig. 1, a front cross-sectional view schematically shows a pre-cured product according to an embodiment of the present invention.

圖1所示之預硬化物1係積層於積層對象構件6之上表面6a。預硬化物1包含第1主面1a與第2主面1b。第1主面1a為經粗化處理之面。第2主面1b與積層對象構件6之上表面6a接觸。用以獲得預硬化物1之上述環氧樹脂材料包含環氧樹脂、硬化劑及二氧化矽2。The pre-cured material 1 shown in Fig. 1 is laminated on the upper surface 6a of the laminated object member 6. The pre-cured material 1 includes a first main surface 1a and a second main surface 1b. The first main surface 1a is a roughened surface. The second main surface 1b is in contact with the upper surface 6a of the layered object member 6. The above epoxy resin material for obtaining the pre-cured material 1 contains an epoxy resin, a hardener, and ceria 2.

二氧化矽2包含粒徑為0.01 μm以上且未達0.5 μm之第1之小粒徑二氧化矽2A、與粒徑為0.5 μm以上、20 μm以下之第2之大粒徑二氧化矽2B。Cerium dioxide 2 includes a first small particle size ceria 2A having a particle diameter of 0.01 μm or more and less than 0.5 μm, and a second large particle size ceria 2B having a particle diameter of 0.5 μm or more and 20 μm or less. .

於預硬化物1中,第1之小粒徑二氧化矽2A以大多存在於經粗化處理之面即第1主面1a側之方式偏向存在。於預硬化物1中,第2之大粒徑二氧化矽2B以大多存在於第2主面1b側之方式偏向存在。In the pre-cured material 1, the first small-sized ceria 2A is present in a manner that is mostly present on the roughened surface, that is, on the side of the first main surface 1a. In the pre-cured material 1, the second largest particle size ceria 2B is present in a manner that is mostly present on the second main surface 1b side.

於預硬化物1中,藉由使第1之小粒徑二氧化矽2A與第2之大粒徑二氧化矽2B如上述般偏向存在,可於對第1主面1a進行粗化處理時,於第1主面1a形成第1之小粒徑二氧化矽2A脫離而成的微細之孔。其結果,可降低經粗化處理之表面之表面粗糙度。進而,於經粗化處理之使粗化預硬化物硬化而成之硬化物的表面形成金屬層之情形時,可提高硬化物與金屬層之接著強度。進而,藉由使第1之小粒徑二氧化矽2A與第2之大粒徑二氧化矽2B如上述般偏向存在,可進一步提高預硬化物1及對該預硬化物1之第1主面1a進行粗化處理而成之粗化預硬化物的強度。尤其是,藉由使用第2之大粒徑二氧化矽2B,可減少二氧化矽與樹脂之界面,降低熔融黏度,而提高埋入加工性,並且預硬化物1、粗化預硬化物及硬化物之電氣絕緣性、吸水性及耐化學品性得到提高。In the pre-cured material 1, when the first small-sized ceria 2A and the second-large-sized ceria 2B are biased as described above, the first main surface 1a can be roughened. On the first main surface 1a, fine pores in which the first small-sized ceria 2A is separated are formed. As a result, the surface roughness of the roughened surface can be lowered. Further, in the case where a metal layer is formed on the surface of the cured product obtained by curing the roughened pre-cured material by the roughening treatment, the adhesion strength between the cured product and the metal layer can be improved. Further, by making the first small particle size ceria 2A and the second large particle size ceria 2B bias as described above, the precured material 1 and the first main body of the precured material 1 can be further improved. The strength of the roughened pre-cured material obtained by roughening the surface 1a. In particular, by using the second largest particle size ceria 2B, the interface between the cerium oxide and the resin can be reduced, the melt viscosity can be lowered, and the embedding processability can be improved, and the pre-cured material 1 and the roughened pre-cured material and The electrical insulation, water absorption and chemical resistance of the cured product are improved.

就進一步降低粗化預硬化物之經粗化處理之表面的表面粗糙度,且進一步提高硬化物與金屬層之接著強度之觀點而言,進而就進一步提高預硬化物及粗化預硬化物之強度之觀點而言,經粗化處理之面即第1主面1a側之表面部分的厚度為0.3 μm之第1區域R1(較圖1中之虛線更上方之區域)中所含之所有二氧化矽100體積%中,上述第2之大粒徑二氧化矽之含量較佳為5體積%以下,更佳為4體積%以下,進而更佳為3體積%以下,尤佳為0體積%。亦可於第1區域R1完全不含第2之大粒徑二氧化矽。Further, in order to further reduce the surface roughness of the roughened surface of the roughened pre-cured material and further improve the adhesion strength between the cured product and the metal layer, the pre-cured material and the roughened pre-cured material are further improved. From the viewpoint of the strength, the surface of the roughened surface, that is, the first region R1 having a thickness of 0.3 μm on the surface of the first main surface 1a side (the region above the dotted line in FIG. 1) In 100% by volume of cerium oxide, the content of the second largest particle size ceria is preferably 5% by volume or less, more preferably 4% by volume or less, still more preferably 3% by volume or less, and particularly preferably 0% by volume. . It is also possible that the first region R1 is completely free of the second largest particle size ceria.

就進一步降低粗化預硬化物之經粗化處理之表面的表面粗糙度,且進一步提高硬化物與金屬層之接著強度之觀點而言,與第1區域R1相連的第2主面1b側之第2區域R2(較圖1中之虛線更下方之區域)中所含之所有二氧化矽100體積%中,上述第2之大粒徑二氧化矽2B之含量較佳為95體積%以上、100體積%以下,更佳為96體積%以上,進而更佳為97體積%以上。The second main surface 1b side connected to the first region R1 is further reduced from the viewpoint of further reducing the surface roughness of the roughened surface of the roughened pre-cured material and further improving the adhesion strength between the cured product and the metal layer. In the 100% by volume of all the cerium oxide contained in the second region R2 (the region lower than the broken line in FIG. 1), the content of the second large-sized cerium oxide 2B is preferably 95% by volume or more. It is 100% by volume or less, more preferably 96% by volume or more, and still more preferably 97% by volume or more.

再者,第2區域R2與第1區域R1相連。第1區域R1與第2區域R2相接觸。第2區域R2為第1區域R1除外之剩餘區域。Furthermore, the second region R2 is connected to the first region R1. The first region R1 is in contact with the second region R2. The second region R2 is the remaining region excluding the first region R1.

60~120℃之溫度區域的預硬化前之環氧樹脂材料之最低熔融黏度較佳為300 Pa‧s以下。該熔融黏度較佳為10 Pa‧s以上、更佳為50 MPa‧s以上、進而更佳為超過50 MPa‧s,更佳為150 MPa‧s以下、進而更佳為120 Pa‧s以下、尤佳為100 Pa‧s以下。若上述環氧樹脂材料之熔融黏度為上述下限以上及上述上限以下,則粗化預硬化物之經粗化處理之表面的表面粗糙度進一步降低,且硬化物與金屬層之接著強度進一步提高。The minimum melt viscosity of the epoxy resin material before pre-hardening in the temperature region of 60 to 120 ° C is preferably 300 Pa‧s or less. The melt viscosity is preferably 10 Pa ‧ or more, more preferably 50 MPa ‧ s or more, still more preferably 50 MPa ‧ s, more preferably 150 MPa ‧ s or less, and still more preferably 120 Pa ‧ s or less It is especially good for 100 Pa‧s or less. When the melt viscosity of the epoxy resin material is not less than the above lower limit and not more than the above upper limit, the surface roughness of the roughened surface of the roughened precured material is further lowered, and the adhesion strength between the cured product and the metal layer is further improved.

上述「熔融黏度」係利用流變儀,於將預硬化前之上述環氧樹脂材料自50℃加熱至150℃之條件下測定之值。作為上述流變儀,可列舉TA Instrument公司製造之「AR-2000」等。The above "melt viscosity" is a value measured by heating the epoxy resin material before pre-curing from 50 ° C to 150 ° C by a rheometer. Examples of the rheometer include "AR-2000" manufactured by TA Instrument Co., Ltd., and the like.

再者,若僅併用第1之小粒徑二氧化矽2A及第2之大粒徑二氧化矽2B,則存在第1之小粒徑二氧化矽2A及第2之大粒徑二氧化矽2B未如上述般偏向存在之情況。作為於預硬化體1中,使第1之小粒徑二氧化矽2A及第2之大粒徑二氧化矽2B如上述般偏向存在之方法,具體可列舉:根據層壓時之溫度、壓力而使樹脂偏向存在於表面之方法;於平坦化加壓時,使樹脂偏向存在於表面之方法;及於硬化時使樹脂偏向存在之方法等。於預硬化體1中,為使第1之小粒徑二氧化矽2A及第2之大粒徑二氧化矽2B如上述般偏向存在,較佳為使環氧樹脂及硬化劑各自之軟化點或熔點接近層壓溫度,較佳為以不同步驟進行層壓製程與平坦化製程。Further, when only the first small particle size ceria 2A and the second large particle size ceria 2B are used in combination, the first small particle size ceria 2A and the second large particle size ceria are present. 2B is not biased as described above. In the pre-cured body 1, the first small-sized ceria 2A and the second-large-sized ceria 2B are partially biased as described above, and specific examples thereof include temperature and pressure depending on the lamination. Further, a method of biasing the resin on the surface; a method of biasing the resin on the surface during flattening and pressurization; and a method of biasing the resin during hardening or the like. In the pre-hardened body 1, in order to make the first small-sized ceria 2A and the second-large-sized ceria 2B biased as described above, it is preferred to soften each of the epoxy resin and the hardener. Or the melting point is close to the lamination temperature, and it is preferred to carry out the lamination process and the planarization process in different steps.

以下,對上述環氧樹脂材料中所含之各成分之詳細情況進行說明。Hereinafter, the details of each component contained in the above epoxy resin material will be described.

(環氧樹脂材料)(epoxy resin material)

[環氧樹脂][Epoxy resin]

上述環氧樹脂材料中所含之環氧樹脂並無特別限定。作為該環氧樹脂,可使用先前公知之環氧樹脂。該環氧樹脂係指具有至少1個環氧基之有機化合物。環氧樹脂可僅使用一種,亦可併用兩種以上。The epoxy resin contained in the epoxy resin material is not particularly limited. As the epoxy resin, a previously known epoxy resin can be used. The epoxy resin refers to an organic compound having at least one epoxy group. Epoxy resins may be used alone or in combination of two or more.

作為上述環氧樹脂,可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、苯酚酚醛清漆型環氧樹脂、聯苯酚醛清漆型環氧樹脂、聯苯酚型環氧樹脂、萘型環氧樹脂、茀型環氧樹脂、苯酚芳烷基型環氧樹脂、萘酚芳烷基型環氧樹脂、二環戊二烯酚醛清漆型環氧樹脂、蒽型環氧樹脂、具有金剛烷骨架之環氧樹脂、具有三環癸烷骨架之環氧樹脂及骨架中具有三核之環氧樹脂等。Examples of the epoxy resin include a bisphenol A epoxy resin, a bisphenol F epoxy resin, a bisphenol S epoxy resin, a phenol novolak epoxy resin, and a biphenol novolak epoxy resin. Biphenol type epoxy resin, naphthalene type epoxy resin, fluorene type epoxy resin, phenol aralkyl type epoxy resin, naphthol aralkyl type epoxy resin, dicyclopentadiene novolac type epoxy resin, An epoxy resin having an adamantane skeleton, an epoxy resin having a tricyclodecane skeleton, and a skeleton having three Nuclear epoxy resin, etc.

就進一步降低粗化預硬化物之經粗化處理之表面的表面粗糙度,且進一步提高硬化物與金屬層之接著強度之觀點而言,上述環氧樹脂較佳為聯苯酚醛清漆型環氧樹脂或二環戊二烯型環氧樹脂。The epoxy resin is preferably a biphenyl aldehyde varnish type epoxy resin from the viewpoint of further reducing the surface roughness of the roughened surface of the roughened pre-cured material and further improving the adhesion strength between the cured product and the metal layer. Resin or dicyclopentadiene type epoxy resin.

上述環氧樹脂較佳為2官能以上之環氧樹脂,更佳為多官能之環氧樹脂。作為多官能之環氧樹脂,例如可列舉:3官能之脂環式環氧單體(Union Carbide公司製造之「Epolead GT301」)、骨架中具有三核之三價之環氧樹脂(長瀨化成公司(Nagase ChemteX Corporation)製造之「DENACOL EX-301」、日產化學工業公司製造之「TEPIC-S」)、作為多官能環氧樹脂之聯苯酚醛清漆型環氧樹脂(日本化藥公司製造之「NC3000H」)、二環戊二烯酚醛清漆型環氧樹脂(DIC公司製造之「HP-7200」)、雙酚A酚醛清漆型環氧樹脂(三菱化學「157-S70」)等。The epoxy resin is preferably a bifunctional or higher epoxy resin, more preferably a polyfunctional epoxy resin. Examples of the polyfunctional epoxy resin include a trifunctional alicyclic epoxy monomer ("Epolead GT301" manufactured by Union Carbide Co., Ltd.), and three in the skeleton. Nuclear trivalent epoxy resin (DENACOL EX-301 manufactured by Nagase ChemteX Corporation, "TEPIC-S" manufactured by Nissan Chemical Industries Co., Ltd.), biphenol aldehyde as a multifunctional epoxy resin Varnish type epoxy resin ("NC3000H" manufactured by Nippon Kayaku Co., Ltd.), dicyclopentadiene novolac type epoxy resin ("HP-7200" manufactured by DIC Corporation), bisphenol A novolak type epoxy resin ( Mitsubishi Chemical "157-S70" and so on.

上述環氧樹脂之熔點或軟化點較佳為50℃以上、更佳為65℃以上,較佳為90℃以下、更佳為85℃以下。藉由使環氧樹脂之熔點或軟化點為上述下限以上及上述上限以下,於使環氧樹脂材料在積層對象構件上預硬化而成之預硬化物中,可使第1之小粒徑二氧化矽及第2之大粒徑二氧化矽於上述較佳之偏向存在狀態下存在。因此,於對預硬化物之表面進行粗化處理時,粗化預硬化物之經粗化處理之表面的表面粗糙度進一步降低。進而,若環氧樹脂之熔點或軟化點為上述下限以上及上述上限以下,則使粗化預硬化物硬化而成之硬化物與金屬層之接著強度亦提高。The melting point or softening point of the epoxy resin is preferably 50 ° C or higher, more preferably 65 ° C or higher, and is preferably 90 ° C or lower, more preferably 85 ° C or lower. When the melting point or softening point of the epoxy resin is not less than the above lower limit and not more than the above upper limit, the first small particle size can be obtained in the pre-cured material obtained by pre-curing the epoxy resin material on the layered member. Cerium oxide and the second largest particle size ceria are present in the above preferred biased state. Therefore, when the surface of the pre-cured material is roughened, the surface roughness of the roughened surface of the roughened pre-cured material is further lowered. Further, when the melting point or softening point of the epoxy resin is not less than the above lower limit and not more than the above upper limit, the strength of the cured product obtained by curing the roughened precured material and the metal layer is also improved.

就進一步降低粗化預硬化物之經粗化處理之表面的表面粗糙度,且進一步提高硬化物與金屬層之接著強度之觀點而言,上述環氧樹脂之環氧當量較佳為90以上、更佳為100以上,較佳為1000以下,更佳為800以下。The epoxy equivalent of the epoxy resin is preferably 90 or more from the viewpoint of further reducing the surface roughness of the roughened surface of the roughened pre-cured material and further improving the adhesion strength between the cured product and the metal layer. More preferably, it is 100 or more, preferably 1000 or less, more preferably 800 or less.

上述環氧樹脂之重量平均分子量較佳為5000以下。於該情形時,可增加環氧樹脂材料中之二氧化矽之含量。進而,即便二氧化矽之含量較多,亦可獲得流動性較高之作為環氧樹脂材料之樹脂組合物。另一方面,藉由併用重量平均分子量為5000以下之環氧樹脂與苯氧基樹脂,可抑制作為環氧樹脂材料之B階段半固化膜(B-stage film)之熔融黏度下降。因此,於將B階段半固化膜層壓於基板上之情形時,可使二氧化矽之偏向存在狀態變得良好。The weight average molecular weight of the above epoxy resin is preferably 5,000 or less. In this case, the content of cerium oxide in the epoxy resin material can be increased. Further, even if the content of cerium oxide is large, a resin composition as an epoxy resin material having high fluidity can be obtained. On the other hand, by using an epoxy resin having a weight average molecular weight of 5,000 or less and a phenoxy resin in combination, it is possible to suppress a decrease in melt viscosity of a B-stage film which is an epoxy resin material. Therefore, in the case where the B-stage semi-cured film is laminated on the substrate, the biased state of the cerium oxide can be made good.

[硬化劑][hardener]

上述環氧樹脂材料中所含之硬化劑並無特別限定。作為該硬化劑,可使用先前公知之硬化劑。硬化劑可僅使用一種,亦可併用兩種以上。The curing agent contained in the epoxy resin material is not particularly limited. As the hardener, a previously known hardener can be used. The hardener may be used singly or in combination of two or more.

作為上述硬化劑,可列舉:氰酸酯樹脂(氰酸酯硬化劑)、酚化合物(酚硬化劑)、胺化合物(胺硬化劑)、硫醇化合物(硫醇硬化劑)、咪唑化合物、膦化合物、酸酐、活性酯化合物及雙氰胺等。其中,就獲得由熱引起之尺寸變化進一步減小之硬化物的觀點而言,上述硬化劑較佳為氰酸酯樹脂或酚化合物。上述硬化劑較佳為氰酸酯樹脂,酚化合物亦較佳。上述硬化劑較佳為具有可與上述環氧樹脂之環氧基進行反應之官能基。Examples of the curing agent include a cyanate resin (cyanate curing agent), a phenol compound (phenol curing agent), an amine compound (amine curing agent), a thiol compound (thiol curing agent), an imidazole compound, and a phosphine. Compounds, acid anhydrides, active ester compounds, dicyandiamide, and the like. Among them, the curing agent is preferably a cyanate resin or a phenol compound from the viewpoint of obtaining a cured product whose dimensional change is further reduced by heat. The above curing agent is preferably a cyanate resin, and a phenol compound is also preferred. The above curing agent preferably has a functional group reactive with the epoxy group of the above epoxy resin.

就進一步降低粗化預硬化物之經粗化處理之表面的表面粗糙度,且進一步提高硬化物與金屬層之接著強度之觀點而言,上述硬化劑較佳為氰酸酯樹脂、酚化合物或活性酯化合物。進而,就藉由硬化劑賦予良好之絕緣可靠性之觀點而言,上述硬化劑更佳為氰酸酯樹脂。The above hardener is preferably a cyanate resin, a phenol compound or the like in terms of further reducing the surface roughness of the roughened surface of the roughened pre-cured material and further improving the adhesion strength between the cured product and the metal layer. Active ester compound. Further, from the viewpoint of imparting good insulation reliability by the curing agent, the above-mentioned curing agent is more preferably a cyanate resin.

藉由使用上述氰酸酯樹脂,可使二氧化矽之含量較多之B階段半固化膜的操作性變得良好,可進一步提高硬化物之玻璃轉移溫度。上述氰酸酯樹脂並無特別限定。作為該氰酸酯樹脂,可使用先前公知之氰酸酯樹脂。上述氰酸酯樹脂可僅使用一種,亦可併用兩種以上。By using the above cyanate resin, the workability of the B-stage semi-cured film having a large content of cerium oxide can be improved, and the glass transition temperature of the cured product can be further improved. The cyanate resin is not particularly limited. As the cyanate resin, a previously known cyanate resin can be used. The cyanate resin may be used alone or in combination of two or more.

作為上述氰酸酯樹脂,可列舉酚醛清漆型氰酸酯樹脂及雙酚型氰酸酯樹脂等。作為上述雙酚型氰酸酯樹脂,可列舉雙酚A型氰酸酯樹脂、雙酚F型氰酸酯樹脂及四甲基雙酚F型氰酸酯樹脂等。Examples of the cyanate resin include a novolac type cyanate resin and a bisphenol type cyanate resin. Examples of the bisphenol-type cyanate resin include a bisphenol A type cyanate resin, a bisphenol F type cyanate resin, and a tetramethyl bisphenol F type cyanate resin.

作為上述氰酸酯樹脂之市售品,可列舉:苯酚酚醛清漆型氰酸酯樹脂(Lonza Japan公司製造之「PT-30」及「PT-60」)、以及使雙酚A二氰酸酯三化而形成為三聚物之預聚物(Lonza Japan公司製造之「BA230」、「BA200」及「BA3000」)等。The commercially available product of the cyanate resin may, for example, be a phenol novolac type cyanate resin ("PT-30" and "PT-60" manufactured by Lonza Japan Co., Ltd.), and a bisphenol A dicyanate. three A prepolymer of a terpolymer ("BA230", "BA200", and "BA3000" manufactured by Lonza Japan Co., Ltd.) was formed.

藉由使用上述酚化合物,可進一步提高硬化物與金屬層之接著強度。又,藉由使用上述酚化合物,例如可藉由對設置於硬化物表面上之銅之表面進行黑化處理或Cz處理,而進一步提高硬化物與銅之密接性。By using the above phenol compound, the adhesion strength between the cured product and the metal layer can be further improved. Further, by using the phenol compound, for example, the surface of the copper provided on the surface of the cured product can be further subjected to a blackening treatment or a Cz treatment to further improve the adhesion between the cured product and the copper.

上述酚化合物並無特別限定。作為該酚化合物,可使用先前公知之酚化合物。上述酚化合物可僅使用一種,亦可併用兩種以上。The phenol compound is not particularly limited. As the phenol compound, a previously known phenol compound can be used. These phenol compounds may be used alone or in combination of two or more.

作為上述酚化合物,可列舉:酚醛清漆型酚、聯苯酚型酚、萘型酚、二環戊二烯型酚、及芳烷基型酚等。Examples of the phenol compound include novolac type phenol, biphenol type phenol, naphthalene type phenol, dicyclopentadiene type phenol, and aralkyl type phenol.

作為上述酚化合物之市售品,可列舉:酚醛清漆型酚(DIC公司製造之「TD-2091」)、聯苯酚醛清漆型酚(明和化成公司製造之「MEH-7851」)及芳烷基型酚化合物(明和化成公司製造之「MEH-7800」)等。The commercially available product of the phenol compound may, for example, be a novolac type phenol ("TD-2091" manufactured by DIC Corporation), a biphenol novolak type phenol ("MEH-7851" manufactured by Mingwa Chemical Co., Ltd.), and an aralkyl group. A phenolic compound ("MEH-7800" manufactured by Minghe Chemical Co., Ltd.).

就進一步降低粗化預硬化物之經粗化處理之表面的表面粗糙度,且進一步提高硬化物與金屬層之接著強度之觀點而言,上述酚化合物較佳為聯苯酚醛清漆型酚或芳烷基型酚化合物。The phenol compound is preferably a biphenol novolak type phenol or aryl, from the viewpoint of further reducing the surface roughness of the roughened surface of the roughened pre-cured material and further improving the adhesion strength between the cured product and the metal layer. Alkyl phenol compound.

上述活性酯化合物並無特別限定。作為上述活性酯化合物之市售品,可列舉DIC公司製造之「EXB-9460S-65T」等。The above active ester compound is not particularly limited. As a commercial item of the above-mentioned active ester compound, "EXB-9460S-65T" manufactured by DIC Corporation, etc. are mentioned.

就進一步降低粗化預硬化物之經粗化處理之表面的表面粗糙度,且進一步提高硬化物與金屬層之接著強度,並且藉由硬化劑賦予良好之絕緣可靠性之觀點而言,上述硬化劑較佳為包含當量為250以下之硬化劑。關於上述硬化劑之當量,例如於硬化劑為氰酸酯樹脂之情形時,表示氰酸酯基當量,於硬化劑為酚化合物之情形時,表示酚性羥基當量,於硬化劑為活性酯化合物之情形時,表示活性酯基當量。Further reducing the surface roughness of the roughened surface of the roughened pre-cured material, and further improving the adhesion strength between the cured product and the metal layer, and the hardening by the hardener imparting good insulation reliability The agent preferably contains a hardener having an equivalent weight of 250 or less. The equivalent of the above-mentioned hardener, for example, when the curing agent is a cyanate resin, represents a cyanate group equivalent, when the curing agent is a phenol compound, it represents a phenolic hydroxyl equivalent, and the hardener is an active ester compound. In the case of the case, it represents the active ester group equivalent.

藉由併用重量平均分子量為1000以下之硬化劑與苯氧基樹脂,可抑制作為環氧樹脂材料之B階段半固化膜之熔融黏度下降。因此,於將B階段半固化膜層壓於基板上之情形時,可使二氧化矽之偏向存在狀態變得良好。By using a curing agent having a weight average molecular weight of 1,000 or less and a phenoxy resin in combination, the decrease in the melt viscosity of the B-stage semi-cured film as the epoxy resin material can be suppressed. Therefore, in the case where the B-stage semi-cured film is laminated on the substrate, the biased state of the cerium oxide can be made good.

於上述環氧樹脂材料中所含之上述二氧化矽除外之總固形物成分(以下有時簡稱為總固形物成分B)100重量%中,上述環氧樹脂與上述硬化劑之合計含量較佳為75重量%以上、更佳為80重量%以上,且為100重量%以下、較佳為99重量%以下、更佳為97重量%以下。The total content of the epoxy resin and the hardener is preferably 100% by weight of the total solid content (hereinafter sometimes abbreviated as total solid content B) excluding the above-mentioned ceria contained in the epoxy resin material. It is 75% by weight or more, more preferably 80% by weight or more, and 100% by weight or less, preferably 99% by weight or less, and more preferably 97% by weight or less.

若上述環氧樹脂與上述硬化劑之合計含量為上述下限以上及上述上限以下,則可獲得更加良好之硬化物,可調整熔融黏度故而能夠使二氧化矽之存在狀態變得良好,且可防止硬化過程中B階段半固化膜向預想之外之區域潤濕擴散。進而,可進一步抑制硬化物之由熱引起之尺寸變化。又,若上述環氧樹脂與上述硬化劑之合計含量未達上述下限,則存在樹脂組合物或B階段半固化膜於電路基板之孔或凹凸中之埋入變得困難,進而二氧化矽之偏向存在狀態變差之傾向。又,若上述環氧樹脂與上述硬化劑之合計含量超過上述上限,則存在熔融黏度變得過低而於硬化過程中B階段半固化膜容易向預想之外之區域潤濕擴散之傾向。所謂「總固形物成分B」,係指環氧樹脂、硬化劑及視需要調配之其他固形物成分之總和。於總固形物成分B中不包括二氧化矽。所謂「固形物成分」,係指不揮發成分,且為於成形或加熱時不揮發之成分。When the total content of the epoxy resin and the curing agent is at least the above lower limit and not more than the above upper limit, a more excellent cured product can be obtained, and the melt viscosity can be adjusted, so that the presence of cerium oxide can be improved and prevented. During the hardening process, the B-stage semi-cured film wets and spreads to an area other than expected. Further, it is possible to further suppress the dimensional change caused by heat of the cured product. In addition, when the total content of the epoxy resin and the curing agent is less than the lower limit, it may be difficult to embed the resin composition or the B-stage semi-cured film in the pores or irregularities of the circuit board, and further, the cerium oxide There is a tendency for the state to deteriorate. In addition, when the total content of the epoxy resin and the curing agent exceeds the above upper limit, the melt viscosity is too low, and the B-stage semi-cured film tends to be wetted and diffused in a region other than the expected area during the curing process. The term "total solids component B" means the sum of epoxy resin, hardener and other solid components to be blended as needed. Ceria is not included in total solids component B. The "solid content component" means a non-volatile component and is a component that does not volatilize when formed or heated.

環氧樹脂與硬化劑之調配比並無特別限定。環氧樹脂與硬化劑之調配比可根據環氧樹脂與硬化劑之種類等而適當決定。The blending ratio of the epoxy resin to the hardener is not particularly limited. The blending ratio of the epoxy resin and the hardener can be appropriately determined depending on the type of the epoxy resin and the hardener.

[填充劑][filler]

上述環氧樹脂材料包含二氧化矽。The above epoxy resin material contains cerium oxide.

上述環氧樹脂材料中所含之所有二氧化矽之平均粒徑較佳為0.1 μm以上、0.8 μm以下。The average particle diameter of all of the cerium oxide contained in the epoxy resin material is preferably 0.1 μm or more and 0.8 μm or less.

上述二氧化矽之平均粒徑可採用成為50%之中值徑(d50)之值。上述平均粒徑可利用雷射繞射型散射方式之粒度分佈測定裝置進行測定。The average particle diameter of the above cerium oxide may be a value which is 50% of the median diameter (d50). The above average particle diameter can be measured by a particle size distribution measuring apparatus using a laser diffraction type scattering method.

上述環氧樹脂材料中所含之二氧化矽含有粒徑為0.01 μm以上且未達0.5 μm之第1之小粒徑二氧化矽、與粒徑為0.5 μm以上、20 μm以下之第2之大粒徑二氧化矽。上述第1之小粒徑二氧化矽為上述環氧樹脂材料所含之所有二氧化矽中粒徑為0.01 μm以上且未達0.5 μm之二氧化矽。上述第2之大粒徑二氧化矽為上述環氧樹脂材料所含之所有二氧化矽中粒徑為0.5 μm以上、20 μm以下之二氧化矽。The cerium oxide contained in the epoxy resin material contains the first small particle size ceria having a particle diameter of 0.01 μm or more and less than 0.5 μm, and the second particle having a particle diameter of 0.5 μm or more and 20 μm or less. Large particle size cerium oxide. The first small particle size ceria is the cerium oxide having a particle diameter of 0.01 μm or more and less than 0.5 μm among all the cerium oxide contained in the epoxy resin material. The second largest particle size ceria is cerium oxide having a particle diameter of 0.5 μm or more and 20 μm or less among all of the cerium oxide contained in the epoxy resin material.

再者,所謂第1之小粒徑二氧化矽與第2之大粒徑二氧化矽中之粒徑,於該二氧化矽為圓球狀之情形時,係指直徑,於該二氧化為圓球狀以外之形狀之情形時,係指最大徑。Further, the particle diameter of the first small particle size ceria and the second large particle size ceria is a diameter in the case where the ceria is spherical, and the oxidation is In the case of a shape other than a sphere, it means the maximum diameter.

將粒徑相對較小的特定之上述第1之小粒徑二氧化矽、與粒徑相對較大的特定之上述第2之大粒徑二氧化矽加以組合,一併使用上述環氧樹脂與上述硬化劑,藉此於使上述環氧樹脂材料預硬化而成之粗化處理前之預硬化物中,二氧化矽以良好之狀態存在。其結果,於對預硬化物之表面進行粗化處理時,可降低粗化預硬化物之經粗化處理之表面的表面粗糙度,進而可提高使粗化預硬化物硬化而成之硬化物與金屬層之接著強度。The above-mentioned first small-sized ceria having a relatively small particle diameter is combined with the specific second-large-sized ceria having a relatively large particle diameter, and the epoxy resin and the epoxy resin are used together. In the pre-cured material before the roughening treatment in which the above-mentioned epoxy resin material is pre-cured, the cerium oxide is present in a good state. As a result, when the surface of the pre-cured material is roughened, the surface roughness of the roughened surface of the roughened pre-cured material can be reduced, and the cured product obtained by hardening the roughened pre-cured material can be improved. The strength of the bond with the metal layer.

上述二氧化矽更佳為熔融二氧化矽。藉由使用熔融二氧化矽,可有效地降低粗化預硬化物之經粗化處理之表面的表面粗糙度。二氧化矽之形狀較佳為近似球狀。The above cerium oxide is more preferably molten cerium oxide. By using molten cerium oxide, the surface roughness of the roughened surface of the roughened pre-cured material can be effectively reduced. The shape of the cerium oxide is preferably approximately spherical.

上述環氧樹脂材料中所含之二氧化矽、上述第1之小粒徑二氧化矽及上述第2之大粒徑二氧化矽較佳為分別進行表面處理,更佳為利用偶合劑進行表面處理。藉此,粗化預硬化物之經粗化處理之表面的表面粗糙度進一步降低,且硬化物與金屬層之接著強度進一步提高,並且可賦予更加良好之配線間絕緣可靠性及層間絕緣可靠性。Preferably, the cerium oxide contained in the epoxy resin material, the first small-sized cerium oxide and the second large-sized cerium oxide are surface-treated, respectively, and more preferably a surface is formed by a coupling agent. deal with. Thereby, the surface roughness of the roughened surface of the roughened pre-cured material is further lowered, and the adhesion strength between the hardened material and the metal layer is further improved, and the wiring insulation reliability and interlayer insulation reliability can be further improved. .

作為上述偶合劑,可列舉矽烷偶合劑、鈦酸酯偶合劑及鋁偶合劑等。上述表面處理中所使用之偶合劑較佳為環氧矽烷、胺基矽烷、乙烯基矽烷、巰基矽烷、硫矽烷、N-苯基-3-胺基丙基矽烷、(甲基)丙烯酸矽烷、異氰酸酯矽烷或脲基矽烷等。Examples of the coupling agent include a decane coupling agent, a titanate coupling agent, and an aluminum coupling agent. The coupling agent used in the above surface treatment is preferably epoxy decane, amino decane, vinyl decane, decyl decane, thiodecane, N-phenyl-3-aminopropyl decane, decyl (meth) acrylate, Isocyanate decane or ureido decane, and the like.

上述環氧樹脂材料較佳為以5:95~50:50之重量比包含上述第1之小粒徑二氧化矽與上述第2之大粒徑二氧化矽,更佳為以10:90~30:70包含上述第1之小粒徑二氧化矽與上述第2之大粒徑二氧化矽。藉由使上述環氧樹脂材料以上述重量比包含上述第1之小粒徑二氧化矽與上述第2之大粒徑二氧化矽,可使粗化預硬化物之經粗化處理之表面的表面粗糙度進一步降低,且硬化物與金屬層之接著強度進一步提高。Preferably, the epoxy resin material comprises the first small particle size ceria and the second large particle size ceria in a weight ratio of 5:95 to 50:50, more preferably 10:90. 30:70 comprises the first small particle size ceria and the second large particle size ceria. By subjecting the epoxy resin material to the first small particle size ceria and the second large particle size ceria in the above weight ratio, the roughened pretreated surface can be roughened. The surface roughness is further lowered, and the bonding strength between the hardened material and the metal layer is further increased.

上述二氧化矽之含量並無特別限定。於上述環氧樹脂材料所含之總固形物成分(以下有時簡稱為總固形物成分A)100重量%中,所有上述二氧化矽(包含第1之小粒徑二氧化矽與第2之大粒徑二氧化矽)之含量較佳為30重量%以上、更佳為40重量%以上、進而更佳為50重量%以上,較佳為85重量%以下、更佳為80重量%以下。若上述二氧化矽之含量為上述下限以上及上述上限以下,則可抑制樹脂之線熱膨脹係數,緩和與銅或矽之膨脹係數之差異,熱衝擊可靠性得到提高,可獲得翹曲抑制效果,加工精度得到提高,並且可利用粗化處理使二氧化矽脫落,藉由形成粗化孔而使與金屬之接著強度提高。所謂「總固形物成分A」,係指環氧樹脂、硬化劑、二氧化矽及視需要調配之固形物成分之總和。所謂「固形物成分」,係指不揮發成分,且為於成形或加熱時不揮發之成分。The content of the above cerium oxide is not particularly limited. All of the above-mentioned ceria (including the first small particle size ceria and the second one) in 100% by weight of the total solid content (hereinafter sometimes abbreviated as total solid content A) contained in the epoxy resin material The content of the large-sized cerium oxide is preferably 30% by weight or more, more preferably 40% by weight or more, still more preferably 50% by weight or more, more preferably 85% by weight or less, still more preferably 80% by weight or less. When the content of the cerium oxide is not less than the above lower limit and not more than the above upper limit, the linear thermal expansion coefficient of the resin can be suppressed, and the difference in expansion coefficient between copper and bismuth can be relaxed, and the thermal shock reliability can be improved, and the warpage suppressing effect can be obtained. The processing precision is improved, and the cerium oxide can be removed by the roughening treatment, and the adhesion strength to the metal is improved by forming the roughened pores. The term "total solids component A" means the sum of epoxy resin, hardener, cerium oxide and solid components as needed. The "solid content component" means a non-volatile component and is a component that does not volatilize when formed or heated.

於所有上述二氧化矽之含量100重量%中,上述第1之小粒徑二氧化矽與上述第2之大粒徑二氧化矽之合計含量較佳為60重量%以上、更佳為80重量%以上、進而更佳為90重量%以上、尤佳為95重量%以上、100重量%以下。亦可所有上述二氧化矽為上述第1之小粒徑二氧化矽與上述第2之大粒徑二氧化矽。The total content of the first small particle diameter ceria and the second large particle size ceria is preferably 60% by weight or more, more preferably 80% by weight based on 100% by weight of the total content of the cerium oxide. More preferably, it is 90% by weight or more, and more preferably 95% by weight or more and 100% by weight or less. Further, all of the above-mentioned ceria may be the first small particle size ceria and the second large particle size ceria.

[其他成分及環氧樹脂材料之細節][Details of other ingredients and epoxy materials]

上述環氧樹脂材料視需要亦可包含硬化促進劑。藉由使用硬化促進劑,可進一步加快硬化速度。藉由使環氧樹脂材料迅速硬化,可使硬化物之交聯結構變得均勻,並且可減少未反應之官能基數,結果可提高交聯密度。該硬化促進劑並無特別限定。作為該硬化促進劑,可使用先前公知之硬化促進劑。上述硬化促進劑可僅使用一種,亦可併用兩種以上。The above epoxy resin material may also contain a hardening accelerator as needed. The hardening speed can be further accelerated by using a hardening accelerator. By rapidly hardening the epoxy resin material, the crosslinked structure of the cured product can be made uniform, and the number of unreacted functional groups can be reduced, with the result that the crosslinking density can be increased. The hardening accelerator is not particularly limited. As the hardening accelerator, a conventionally known hardening accelerator can be used. These hardening accelerators may be used alone or in combination of two or more.

作為上述硬化促進劑,例如可列舉咪唑化合物、磷化合物、胺化合物及有機金屬化合物等。Examples of the curing accelerator include an imidazole compound, a phosphorus compound, an amine compound, and an organometallic compound.

作為上述咪唑化合物,可列舉:2-十一烷基咪唑、2-十七烷基咪唑、2-甲基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-苯基咪唑、1,2-二甲基咪唑、1-氰乙基-2-甲基咪唑、1-氰乙基-2-乙基-4-甲基咪唑、1-氰乙基-2-十一烷基咪唑、1-氰乙基-2-苯基咪唑、1-氰乙基-2-十一烷基咪唑鎓偏苯三甲酸鹽、1-氰乙基-2-苯基咪唑鎓偏苯三甲酸鹽、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-均三、2,4-二胺基-6-[2'-十一烷基咪唑基-(1')]-乙基-均三、2,4-二胺基-6-[2'-乙基-4'-甲基咪唑基-(1')]-乙基-均三、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-均三異三聚氰酸加成物、2-苯基咪唑異三聚氰酸加成物、2-甲基咪唑異三聚氰酸加成物、2-苯基-4,5-二羥基甲基咪唑及2-苯基-4-甲基-5-二羥基甲基咪唑等。Examples of the imidazole compound include 2-undecylimidazole, 2-heptadecylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, and 2-benzene. 4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1,2-dimethylimidazole, 1-cyanoethyl-2-methylimidazole , 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl- 2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6-[2'-methylimidazolyl -(1')]-ethyl-all three 2,4-Diamino-6-[2'-undecylimidazolyl-(1')]-ethyl-all three 2,4-Diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl-all three 2,4-Diamino-6-[2'-methylimidazolyl-(1')]-ethyl-all three Iso-cyanuric acid adduct, 2-phenylimidazolium isocyanurate adduct, 2-methylimidazolium isocyanurate adduct, 2-phenyl-4,5-dihydroxymethyl Imidazole and 2-phenyl-4-methyl-5-dihydroxymethylimidazole.

作為上述磷化合物,可列舉三苯基膦等。Examples of the phosphorus compound include triphenylphosphine and the like.

作為上述胺化合物,可列舉:二乙胺、三乙胺、二伸乙四胺、三伸乙四胺及4,4-二甲基胺基吡啶等。Examples of the amine compound include diethylamine, triethylamine, diethylenetetramine, triethylenetetramine, and 4,4-dimethylaminopyridine.

作為上述有機金屬化合物,可列舉:環烷酸鋅、環烷酸鈷、辛酸錫、辛酸鈷、雙乙醯丙酮鈷(II)及三乙醯丙酮鈷(III)等。Examples of the organometallic compound include zinc naphthenate, cobalt naphthenate, tin octylate, cobalt octoate, cobalt(II) diacetate, and cobalt (III) triacetate.

就提高硬化物之絕緣可靠性之觀點而言,上述硬化促進劑尤佳為咪唑化合物。The hardening accelerator is preferably an imidazole compound from the viewpoint of improving the insulation reliability of the cured product.

上述硬化促進劑之含量並無特別限定。就使環氧樹脂材料有效地硬化之觀點而言,於上述總固形物成分B之100重量%中,上述硬化促進劑之含量較佳為0.01重量%以上,較佳為3重量%以下。再者,上述總固形物成分B包含上述硬化促進劑。The content of the above hardening accelerator is not particularly limited. From the viewpoint of effectively curing the epoxy resin material, the content of the curing accelerator is preferably 0.01% by weight or more, preferably 3% by weight or less, based on 100% by weight of the total solid content component B. Further, the total solid content component B includes the above-described hardening accelerator.

上述環氧樹脂材料較佳為包含熱塑性樹脂。藉由使用熱塑性樹脂,可使環氧樹脂材料對電路之凹凸之追隨性提高,粗化預硬化物之經粗化處理之表面的表面粗糙度進一步降低,進而可使經粗化處理之表面之粗糙度更加均勻。The above epoxy resin material preferably contains a thermoplastic resin. By using a thermoplastic resin, the followability of the epoxy resin material to the unevenness of the circuit can be improved, and the surface roughness of the roughened surface of the roughened pre-cured material can be further reduced, and the roughened surface can be further obtained. The roughness is more uniform.

作為上述熱塑性樹脂,可列舉苯氧基樹脂及聚乙烯縮醛樹脂等。就使二氧化矽良好地偏向存在,進一步降低粗化預硬化物之經粗化處理之表面的表面粗糙度,進一步提高硬化物與金屬層之接著強度之觀點而言,上述熱塑性樹脂較佳為苯氧基樹脂。Examples of the thermoplastic resin include a phenoxy resin and a polyvinyl acetal resin. The thermoplastic resin is preferably used in view of the fact that the cerium oxide is favorably biased to further reduce the surface roughness of the roughened surface of the roughened pre-cured material and further improve the adhesion strength between the cured product and the metal layer. Phenoxy resin.

作為上述苯氧基樹脂,例如可列舉:具有雙酚A型骨架、雙酚F型骨架、雙酚S型骨架、聯苯骨架、酚醛清漆骨架及萘骨架等骨架之苯氧基樹脂等。Examples of the phenoxy resin include a phenoxy resin having a skeleton such as a bisphenol A skeleton, a bisphenol F skeleton, a bisphenol S skeleton, a biphenyl skeleton, a novolac skeleton, and a naphthalene skeleton.

於對預硬化物之表面進行粗化處理後,為形成金屬層而進行鍍敷處理之情形時,可提高硬化物與金屬層之接著強度,因此上述苯氧基樹脂較佳為具有聯苯骨架,更佳為具有聯苯酚骨架。After the surface of the pre-cured material is subjected to a roughening treatment and the plating treatment is performed to form a metal layer, the adhesion strength between the cured product and the metal layer can be improved. Therefore, the phenoxy resin preferably has a biphenyl skeleton. More preferably, it has a biphenol skeleton.

作為上述苯氧基樹脂之具體例,例如可列舉:東都化成公司製造之「YP50」、「YP55」及「YP70」、及三菱化學公司製造之「1256B40」、「4250」、「4256H40」、「4275」、「YX6954BH30」、「YX8100BH30」、「YL7600DMAcH25」及「YL7213BH30」等。Specific examples of the phenoxy resin include "YP50", "YP55" and "YP70" manufactured by Dongdu Chemical Co., Ltd., and "1256B40", "4250" and "4256H40" manufactured by Mitsubishi Chemical Corporation. 4275", "YX6954BH30", "YX8100BH30", "YL7600DMAcH25" and "YL7213BH30".

上述苯氧基樹脂之重量平均分子量較佳為5000以上,較佳為100000以下。The weight average molecular weight of the phenoxy resin is preferably 5,000 or more, preferably 100,000 or less.

上述熱塑性樹脂之含量並無特別限定。於上述總固形物成分B之100重量%中,上述熱塑性樹脂之含量(於上述熱塑性樹脂為苯氧基樹脂之情形時,指苯氧基樹脂之含量)較佳為0.1重量%以上、更佳為0.5重量%以上、進而更佳為1重量%以上,較佳為40重量%以下、更佳為30重量%以下、進而更佳為20重量%以下、尤佳為15重量%以下。若上述熱塑性樹脂之含量為上述下限以上及上述上限以下,則硬化物之由熱引起之尺寸變化進一步減小。又,若上述熱塑性樹脂之含量為上述上限以下,則環氧樹脂材料於電路基板之孔或凹凸中之埋入性變得良好。再者,上述總固形物成分B包含上述熱塑性樹脂。The content of the above thermoplastic resin is not particularly limited. The content of the thermoplastic resin (in the case where the thermoplastic resin is a phenoxy resin, the content of the phenoxy resin) is preferably 0.1% by weight or more, more preferably 100% by weight of the total solid content B. It is 0.5% by weight or more, more preferably 1% by weight or more, preferably 40% by weight or less, more preferably 30% by weight or less, still more preferably 20% by weight or less, and still more preferably 15% by weight or less. When the content of the thermoplastic resin is not less than the above lower limit and not more than the above upper limit, the dimensional change due to heat of the cured product is further reduced. In addition, when the content of the thermoplastic resin is at most the above upper limit, the embedding property of the epoxy resin material in the holes or irregularities of the circuit board becomes good. Further, the total solid content component B contains the above thermoplastic resin.

為改善耐衝擊性、耐熱性、樹脂之相容性及作業性等,亦可於環氧樹脂材料中添加偶合劑、著色劑、抗氧化劑、紫外線劣化防止劑、消泡劑、增黏劑、觸變性賦予劑及上述樹脂以外之其他樹脂等。In order to improve impact resistance, heat resistance, resin compatibility, workability, etc., a coupling agent, a coloring agent, an antioxidant, an ultraviolet deterioration preventing agent, an antifoaming agent, an adhesion promoter, and the like may be added to the epoxy resin material. The thixotropic agent and other resins other than the above resins.

作為上述偶合劑,可列舉矽烷偶合劑、鈦偶合劑及鋁偶合劑等。作為上述矽烷偶合劑,可列舉:胺基矽烷、咪唑矽烷、乙烯基矽烷、苯基胺基矽烷及環氧矽烷等。Examples of the coupling agent include a decane coupling agent, a titanium coupling agent, and an aluminum coupling agent. Examples of the decane coupling agent include amino decane, imidazolium, vinyl decane, phenylamino decane, and epoxy decane.

上述偶合劑之含量並無特別限定。於上述總固形物成分B之100重量%中,上述偶合劑之含量較佳為0.01重量%以上、5重量%以下。The content of the above coupling agent is not particularly limited. The content of the coupling agent is preferably 0.01% by weight or more and 5% by weight or less based on 100% by weight of the total solid content component B.

作為上述其他樹脂,可列舉:聚苯醚樹脂、二乙烯基苄醚樹脂、聚芳酯樹脂、鄰苯二甲酸二烯丙酯樹脂、聚醯亞胺樹脂、苯并樹脂、苯并唑樹脂、雙順丁烯二醯亞胺樹脂及丙烯酸酯樹脂等。再者,上述總固形物成分B包含上述偶合劑。Examples of the other resin include a polyphenylene ether resin, a divinyl benzyl ether resin, a polyarylate resin, a diallyl phthalate resin, a polyimine resin, and a benzo compound. Resin, benzo An azole resin, a bis-xenylenediamine resin, an acrylate resin, or the like. Further, the total solid content component B contains the above coupling agent.

上述環氧樹脂材料亦可包含溶劑。作為上述溶劑,可列舉:丙酮、甲醇、乙醇、丁醇、2-丙醇、2-甲氧基乙醇、2-乙氧基乙醇、1-甲氧基-2-丙醇、2-乙醯氧基-1-甲氧基丙烷、甲苯、二甲苯、甲基乙基酮、N,N-二甲基甲醯胺、甲基異丁基酮、N-甲基-吡咯烷酮、正己烷、環己烷、環己酮及混合物之石腦油等。上述溶劑可僅使用一種,亦可併用兩種以上。The above epoxy resin material may also contain a solvent. Examples of the solvent include acetone, methanol, ethanol, butanol, 2-propanol, 2-methoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, and 2-acetamidine. Oxy-1-methoxypropane, toluene, xylene, methyl ethyl ketone, N,N-dimethylformamide, methyl isobutyl ketone, N-methyl-pyrrolidone, n-hexane, ring Hexane, cyclohexanone, and a mixture of naphtha. These solvents may be used alone or in combination of two or more.

包含溶劑之樹脂組合物可用作清漆。藉由根據用途調整溶劑之含量,可調整清漆之黏度。於上述環氧樹脂材料中,相對於上述總固形物成分A之100重量份,上述溶劑之含量較佳為10重量份以上、1000重量份以下。A resin composition containing a solvent can be used as the varnish. The viscosity of the varnish can be adjusted by adjusting the content of the solvent according to the use. In the epoxy resin material, the content of the solvent is preferably 10 parts by weight or more and 1000 parts by weight or less based on 100 parts by weight of the total solid content component A.

(B階段半固化膜、積層膜、預硬化物、粗化預硬化物及積層體之詳細情況)(Details of B-stage semi-cured film, laminated film, pre-cured material, roughened pre-cured material, and laminated body)

上述環氧樹脂材料亦可為樹脂組合物,該樹脂組合物亦可為成形為膜狀之B階段半固化膜。藉由使上述樹脂組合物成形為膜狀,可獲得B階段半固化膜。The epoxy resin material may be a resin composition, and the resin composition may be a B-stage semi-cured film formed into a film. The B-stage semi-cured film can be obtained by molding the above resin composition into a film shape.

作為使上述樹脂組合物成形為膜狀之方法,例如可列舉:使用擠出機,對樹脂組合物進行熔融混練,擠出後,藉由T型模具或圓形模具等成形為膜狀之擠出成形法;使樹脂組合物溶解或分散於有機溶劑等溶劑中後,進行澆鑄而成形為膜狀之澆鑄成形法;以及先前公知之其他膜成形法等。其中,由於可促進薄型化,因此較佳為擠出成形法或澆鑄成形法。膜包括片材。As a method of forming the resin composition into a film shape, for example, the resin composition is melt-kneaded using an extruder, and after extrusion, a film-like extrusion is formed by a T-die or a circular die. A molding method; a casting molding method in which a resin composition is dissolved or dispersed in a solvent such as an organic solvent, and then cast into a film; and other conventional film forming methods and the like are known. Among them, an extrusion molding method or a casting molding method is preferred because it can promote thinning. The film includes a sheet.

使上述樹脂組合物成形為膜狀,於利用熱之硬化未過度進行之程度下,例如於90~200℃下加熱乾燥10~180分鐘,藉此可獲得B階段半固化膜。The resin composition is molded into a film shape, and is heated and dried at 90 to 200 ° C for 10 to 180 minutes to the extent that heat hardening is not excessively performed, whereby a B-stage semi-cured film can be obtained.

將藉由如上所述之乾燥步驟可獲得之膜狀樹脂組合物稱為B階段半固化膜。The film-like resin composition obtainable by the drying step as described above is referred to as a B-stage semi-cured film.

上述B階段半固化膜為處於半硬化狀態之半硬化物。半硬化物未完全硬化,可進一步進行硬化。The above-mentioned B-stage semi-cured film is a semi-cured material in a semi-hardened state. The semi-hardened material is not completely hardened and can be further hardened.

上述樹脂組合物適合用於形成包含基材、與積層於該基材之一表面之B階段半固化膜的積層膜。積層膜之B階段半固化膜係由上述樹脂組合物所形成。The above resin composition is suitably used for forming a laminated film comprising a substrate and a B-stage semi-cured film laminated on one surface of the substrate. The B-stage semi-cured film of the laminated film is formed of the above resin composition.

作為上述積層膜之上述基材,可列舉:聚對苯二甲酸乙二酯膜及聚對苯二甲酸丁二酯膜等聚酯樹脂膜、聚乙烯膜及聚丙烯膜等烯烴樹脂膜、聚醯亞胺樹脂膜、銅箔及鋁箔等金屬箔等。上述基材之表面視需要亦可進行脫模處理。The base material of the laminated film may be a polyester resin film such as a polyethylene terephthalate film or a polybutylene terephthalate film, an olefin resin film such as a polyethylene film or a polypropylene film, or a poly A metal foil such as a ruthenium imide resin film, a copper foil or an aluminum foil. The surface of the above substrate may also be subjected to a mold release treatment as needed.

於將上述環氧樹脂材料用作電路之絕緣層之情形時,由環氧樹脂材料形成之層之厚度較佳為形成電路之導體層之厚度以上。由上述環氧樹脂材料形成之層之厚度較佳為5 μm以上、更佳為6 μm以上、進而更佳為10 μm以上,較佳為200 μm以下、更佳為65 μm以下、進而更佳為50 μm以下。In the case where the above epoxy resin material is used as an insulating layer of a circuit, the thickness of the layer formed of the epoxy resin material is preferably greater than the thickness of the conductor layer forming the circuit. The thickness of the layer formed of the epoxy resin material is preferably 5 μm or more, more preferably 6 μm or more, still more preferably 10 μm or more, more preferably 200 μm or less, still more preferably 65 μm or less, and still more preferably It is 50 μm or less.

上述環氧樹脂材料為B階段半固化膜,較佳為藉由層壓將上述B階段半固化膜積層於上述積層對象構件上後,使上述B階段半固化膜硬化而獲得預硬化物。層壓溫度較佳為55℃以上、更佳為65℃以上,較佳為130℃以下、更佳為120℃以下。層壓壓力較佳為0.5 MPa以上、更佳為0.8 MPa以上,較佳為1.5 MPa以下、更佳為1.2 MPa以下。藉由在上述適當之條件下積層作為環氧樹脂材料之B階段半固化膜,可使預硬化物中,第1之小粒徑二氧化矽及第2之大粒徑二氧化矽之偏向存在狀態變得更加良好。於由如上所述之環氧樹脂材料所構成之B階段半固化膜中,層壓溫度附近之熔融黏度降低。尤其是,以熔融黏度較低之苯氧基樹脂、液狀環氧樹脂、氰酸酯硬化劑為中心所構成之B階段半固化膜的熔融黏度成為150 Pa‧s以下,樹脂成分之流動性提高。藉由在該狀態下進行層壓處理,於樹脂熔融之時點,第1之小粒徑二氧化矽可選擇性地移動,於B階段半固化膜之最表面,第1之小粒徑二氧化矽與樹脂一起移動以使層壓時變得平坦。藉由該移動可使第1之小粒徑二氧化矽大多偏向存在於經粗化處理之第1之表面側。即,於預硬化物之上層部分大多存在粒徑相對較小之第1之小粒徑二氧化矽,且於下層部分大多存在粒徑相對較大之第2之大粒徑二氧化矽。其結果,於對預硬化物之表面進行粗化處理時,粗化預硬化物之經粗化處理之表面的表面粗糙度降低。進而,硬化物與金屬層之接著強度亦提高。The epoxy resin material is a B-stage semi-cured film, and it is preferred that the B-stage semi-cured film is laminated on the laminated object member by lamination, and then the B-stage semi-cured film is cured to obtain a pre-cured product. The lamination temperature is preferably 55 ° C or higher, more preferably 65 ° C or higher, and is preferably 130 ° C or lower, more preferably 120 ° C or lower. The lamination pressure is preferably 0.5 MPa or more, more preferably 0.8 MPa or more, more preferably 1.5 MPa or less, still more preferably 1.2 MPa or less. By laminating a B-stage semi-cured film as an epoxy resin material under the above-mentioned appropriate conditions, the first small particle size ceria and the second large particle size ceria can be present in the pre-cured material. The status has become even better. In the B-stage semi-cured film composed of the epoxy resin material as described above, the melt viscosity in the vicinity of the lamination temperature is lowered. In particular, the B-stage semi-cured film composed of a phenoxy resin having a low melt viscosity, a liquid epoxy resin, and a cyanate curing agent has a melt viscosity of 150 Pa‧s or less, and the fluidity of the resin component. improve. By performing the lamination treatment in this state, the first small particle size ceria can be selectively moved at the point of melting of the resin, and the first small particle size is oxidized on the outermost surface of the B-stage semi-cured film. The crucible moves with the resin to make it flat during lamination. By this movement, the first small-sized cerium oxide is often biased to exist on the surface side of the first roughening treatment. That is, in the upper layer portion of the pre-cured material, the first small-diameter ceria having a relatively small particle diameter is often present, and in the lower portion, the second-largest-diameter ceria having a relatively large particle diameter is often present. As a result, when the surface of the pre-cured material is roughened, the surface roughness of the roughened surface of the roughened pre-cured material is lowered. Further, the bonding strength between the cured product and the metal layer is also improved.

藉由層壓而積層上述B階段半固化膜之方法可使用公知之方法,並無特別限定。例如於電路基板上積層上述B階段半固化膜,較佳為自B階段半固化膜側積層上述積層膜,利用加壓式貼合機進行加壓。此時,可進行加熱亦可不進行加熱。其次,利用平行平板加壓式加熱加壓機對積層對象構件、與B階段半固化膜或積層膜進行加熱及加壓。亦可藉由加熱及加壓,使B階段半固化膜預硬化,而形成預硬化物。上述加熱之溫度及上述加壓之壓力可適當變更,並無特別限定。A well-known method can be used for the method of laminating the above-mentioned B-stage semi-cured film by lamination, and it is not specifically limited. For example, the B-stage semi-cured film is laminated on a circuit board, and it is preferable to laminate the laminated film from the B-stage semi-cured film side, and pressurize it by a press bonding machine. At this time, heating or heating may not be performed. Next, the laminated object member and the B-stage semi-cured film or the laminated film are heated and pressurized by a parallel plate press type heating and press machine. The B-stage semi-cured film may also be pre-cured by heating and pressurization to form a pre-cured product. The temperature of the heating and the pressure of the pressurization can be appropriately changed, and are not particularly limited.

作為更加具體之積層方法,例如使用輥貼合機,於輥徑為60 mm及輥周速為0.1~10 m/min之速度之條件下,將輥溫度設為20~120℃,以0.5~6 MPa之壓力進行加壓,同時將上述B階段半固化膜積層於電路基板上,或者將上述積層膜自B階段半固化膜側積層於積層對象構件上。As a more specific lamination method, for example, using a roll laminator, the roll temperature is set to 20 to 120 ° C at a roll diameter of 60 mm and a roll peripheral speed of 0.1 to 10 m/min. The pressure of 6 MPa is applied, and the B-stage semi-cured film is laminated on the circuit board, or the laminated film is laminated on the layered object from the B-stage semi-cured film side.

較佳為將上述B階段半固化膜或上述積層膜積層於積層對象構件上後,於160~200℃下加熱處理20分~180分鐘。藉由加熱處理,可使B階段半固化膜預硬化而獲得預硬化物。積層膜之基材可於形成預硬化物前去除,亦可於形成預硬化物後去除。藉由在上述條件下積層後,進行粗化處理,可於粗化預硬化物之表面形成微細之凹凸。預硬化物較佳為於較最終硬化物之玻璃轉移溫度低10~60℃之溫度下硬化。Preferably, the B-stage semi-cured film or the laminated film is laminated on the laminated object member, and then heat-treated at 160 to 200 ° C for 20 minutes to 180 minutes. The B-stage semi-cured film can be pre-cured by heat treatment to obtain a pre-cured product. The substrate of the laminated film may be removed before the pre-cured material is formed, or may be removed after the pre-cured material is formed. By laminating under the above conditions, the roughening treatment is performed to form fine irregularities on the surface of the roughened pre-cured material. The pre-cured material is preferably hardened at a temperature 10 to 60 ° C lower than the glass transition temperature of the final cured product.

視需要亦可於輥層壓後使用平行平板加熱加壓機進行加熱及加壓,而提高預硬化物表面之平滑性。例如亦可利用平行平板加熱加壓機,於厚度1 mm之不鏽鋼板上對電路基板與B階段半固化膜或積層膜之積層物進行加熱及加壓。If necessary, it is also possible to heat and pressurize the roll using a parallel plate heating press to improve the smoothness of the surface of the pre-cured material. For example, a laminate of a circuit board and a B-stage semi-cured film or a laminated film may be heated and pressurized on a stainless steel plate having a thickness of 1 mm by a parallel plate heating press.

再者,加熱加壓式輥貼合機等加壓式貼合機、及平行平板加熱加壓機等加壓機可使用市售之裝置。利用輥貼合機之積層較佳為於真空狀態下進行。輥貼合機之輥之材質可自表面為軟質之橡膠輥、及表面為硬質之金屬輥等中適當選擇。平行平板加熱加壓機之平板之材質為硬質金屬。Further, a commercially available apparatus can be used as a pressurizing machine such as a pressurizing laminating machine such as a heat and pressure type roll laminator or a parallel plate heating press machine. The laminate using the roll laminator is preferably carried out under vacuum. The material of the roll of the roll laminating machine can be appropriately selected from rubber rolls having a soft surface and a metal roll having a hard surface. The flat plate of the parallel plate heating press is made of hard metal.

亦可於輥貼合機之輥與上述積層對象構件、B階段半固化膜或積層膜之間,或者平行平板加熱加壓機之平板與上述積層對象構件、B階段半固化膜或積層膜之間,使用具有脫模功能之膜,例如鋁箔、銅箔、聚酯樹脂膜、氟樹脂系膜等。It is also possible to use a roll of a roll laminator and the above-mentioned laminated object member, a B-stage semi-cured film or a laminated film, or a flat plate heating press plate and the above-mentioned laminated object member, a B-stage semi-cured film or a laminated film. A film having a mold release function such as an aluminum foil, a copper foil, a polyester resin film, a fluororesin film or the like is used.

為提高電路基板與B階段半固化膜或積層膜之密接性,亦可使用橡膠片材等具有柔軟性之材料。In order to improve the adhesion between the circuit board and the B-stage semi-cured film or the laminated film, a material having flexibility such as a rubber sheet may be used.

形成預硬化物之步驟較佳為將上述積層膜自上述B階段半固化膜側積層於電路基板上,利用輥貼合機進行加壓後,利用平行平板加壓式加熱加壓機進行加熱及加壓,而形成預硬化物之步驟。又,形成預硬化物之步驟較佳為將上述積層膜自上述B階段半固化膜側積層於積層對象構件上,利用輥貼合機進行加壓後,利用平行平板加壓式加熱加壓機進行加熱及加壓,而形成預硬化物之步驟,並且於利用輥貼合機進行加壓後且於利用平行平板加壓式加熱加壓機進行加熱及加壓前,或者於利用輥貼合機進行加壓後且於利用平行平板加壓式加熱加壓機進行加熱及加壓後,去除上述基材。Preferably, the pre-cured material is formed by laminating the laminated film from the B-stage semi-cured film side on a circuit board, pressurizing it by a roll laminator, and heating it by a parallel plate press type heating and press machine. Pressurization to form a pre-cured product. Further, in the step of forming the pre-cured material, the laminated film is laminated on the layered pre-cured film side from the B-stage semi-cured film side, and is pressurized by a roll laminator, and then a parallel plate press type heating and press machine is used. Heating and pressurizing to form a pre-cured product, and after being pressurized by a roll laminator and before being heated and pressurized by a parallel plate press type heating and press machine, or by roll bonding After the machine is pressurized and heated and pressurized by a parallel plate press type heating and press machine, the substrate is removed.

本發明之粗化預硬化物係藉由對上述預硬化物之上述第1主面進行粗化處理而獲得。為於上述預硬化物之表面形成微細之凹凸,上述粗化預硬化物較佳為於粗化處理前對上述預硬化物進行膨潤處理。The roughened pre-cured material of the present invention is obtained by subjecting the first main surface of the pre-cured material to a roughening treatment. In order to form fine irregularities on the surface of the pre-cured material, it is preferred that the roughened pre-cured material is subjected to a swelling treatment of the pre-cured material before the roughening treatment.

上述粗化預硬化物較佳為於預硬化之後且於粗化處理之前進行膨潤處理。其中,預硬化物亦可不必進行膨潤處理。The roughened pre-cured material is preferably subjected to a swelling treatment after pre-curing and before the roughening treatment. Among them, the pre-cured material may not be subjected to swelling treatment.

本發明之積層體包含使藉由對上述預硬化物之上述第1主面進行粗化處理而獲得之粗化預硬化物硬化而成的硬化物、以及積層於該硬化物之經粗化處理之表面的金屬層。該硬化物與該金屬層之接著強度較佳為0.39 N/mm以上。上述金屬層較佳為銅層,更佳為鍍銅層。The layered product of the present invention includes a cured product obtained by curing a roughened pre-cured material obtained by subjecting the first main surface of the pre-cured material to a roughening treatment, and a roughened layer laminated on the cured product. The metal layer on the surface. The adhesion strength between the cured product and the metal layer is preferably 0.39 N/mm or more. The metal layer is preferably a copper layer, more preferably a copper plating layer.

(印刷配線板)(printed wiring board)

上述環氧樹脂材料適合用於在印刷配線板中形成絕緣層。The above epoxy resin material is suitable for forming an insulating layer in a printed wiring board.

上述印刷配線板例如可藉由使用由上述樹脂組合物形成之B階段半固化膜,並對該B階段半固化膜進行加熱加壓成形而獲得。The printed wiring board can be obtained, for example, by using a B-stage semi-cured film formed of the above resin composition, and subjecting the B-stage semi-cured film to heat and pressure molding.

對於上述B階段半固化膜,可於單面或雙面積層金屬箔。將上述B階段半固化膜與金屬箔積層之方法並無特別限定,可使用公知之方法。例如可使用平行平板加壓機或輥貼合機等裝置,一面加熱或不加熱而加壓,一面將上述B階段半固化膜積層於金屬箔上。For the above-mentioned B-stage semi-cured film, a single-sided or double-area layer metal foil can be used. The method of laminating the above-described B-stage semi-cured film and metal foil is not particularly limited, and a known method can be used. For example, the B-stage semi-cured film may be laminated on the metal foil by a device such as a parallel plate press or a roll bonding machine while being pressurized with or without heating.

(銅箔積層板及多層基板)(copper foil laminate and multilayer substrate)

上述環氧樹脂材料適合用於獲得銅箔積層板。作為上述銅箔積層板之一例,可列舉包含銅箔、與積層於該銅箔之一表面之B階段半固化膜的銅箔積層板。該銅箔積層板之B階段半固化膜可由上述環氧樹脂材料所形成。藉由使該B階段半固化膜預硬化,可獲得包含預硬化物之銅箔積層板。The above epoxy resin material is suitable for obtaining a copper foil laminate. An example of the copper foil laminate is a copper foil laminate including a copper foil and a B-stage semi-cured film laminated on one surface of the copper foil. The B-stage semi-cured film of the copper foil laminate can be formed of the above epoxy resin material. By pre-curing the B-stage semi-cured film, a copper foil laminate comprising a pre-cured material can be obtained.

上述銅箔積層板之上述銅箔之厚度並無特別限定。上述銅箔之厚度較佳為1~50 μm之範圍內。又,為提高使環氧樹脂材料硬化而成之硬化物與銅箔之接著強度,較佳為上述銅箔於表面具有微細之凹凸。凹凸之形成方法並無特別限定。作為上述凹凸之形成方法,可列舉利用使用公知之藥液之處理的形成方法等。The thickness of the copper foil of the copper foil laminate is not particularly limited. The thickness of the copper foil is preferably in the range of 1 to 50 μm. Further, in order to increase the adhesion strength between the cured product obtained by curing the epoxy resin material and the copper foil, it is preferable that the copper foil has fine irregularities on the surface. The method of forming the unevenness is not particularly limited. Examples of the method for forming the unevenness include a method of forming a treatment using a known chemical solution, and the like.

又,上述預硬化物適合用於獲得多層基板。作為上述多層基板之一例,可列舉包含電路基板與積層於該電路基板之表面上之硬化物層的電路基板。該多層基板之硬化物層係藉由對上述預硬化物進行粗化處理,繼而使粗化預硬化物硬化而形成。上述硬化物層較佳為積層於電路基板之設置有電路之表面上。上述硬化物層之一部分較佳為埋入於上述電路間。Further, the above precured material is suitable for obtaining a multilayer substrate. An example of the multilayer substrate is a circuit board including a circuit board and a cured layer laminated on the surface of the circuit board. The cured layer of the multilayer substrate is formed by subjecting the pre-cured material to a roughening treatment, followed by curing the roughened pre-cured material. Preferably, the cured layer is laminated on a surface of the circuit substrate on which the circuit is provided. A portion of the cured layer is preferably buried between the circuits.

上述多層基板更佳為對上述硬化物層之與積層有上述電路基板之表面為相反側的表面進行粗化處理。粗化處理方法可使用先前公知之粗化處理方法,並無特別限定。上述硬化物層之表面亦可於粗化處理前進行膨潤處理。More preferably, the multilayer substrate is subjected to a roughening treatment on a surface of the cured layer which is opposite to a surface on which the circuit board is laminated. The roughening treatment method can be a conventionally known roughening treatment method, and is not particularly limited. The surface of the cured layer may also be subjected to a swelling treatment before the roughening treatment.

又,上述多層基板較佳為更包含積層於上述硬化物層之經粗化處理之表面的鍍銅層。Moreover, it is preferable that the multilayer substrate further includes a copper plating layer laminated on the roughened surface of the cured layer.

又,作為上述多層基板之其他例,可列舉包含電路基板、積層於該電路基板之表面上之硬化物層、及積層於該硬化物層之與積層有上述電路基板之表面為相反側之表面之銅箔的電路基板。上述硬化物層及上述銅箔較佳為藉由使用包含銅箔與積層於該銅箔之一表面之B階段半固化膜的銅箔積層板,並對上述B階段半固化膜進行預硬化、粗化處理及硬化處理而形成。進而,上述銅箔較佳為進行蝕刻處理,而為銅電路。Further, as another example of the multilayer substrate, a circuit board, a cured layer laminated on the surface of the circuit board, and a surface laminated on the surface of the cured layer adjacent to the surface on which the circuit board is laminated may be mentioned. A circuit board of copper foil. Preferably, the cured layer and the copper foil are pre-cured by using a copper foil laminate comprising a copper foil and a B-stage semi-cured film laminated on one surface of the copper foil, and the B-stage semi-cured film is pre-hardened. It is formed by roughening treatment and hardening treatment. Further, the copper foil is preferably an etching process and is a copper circuit.

作為上述多層基板之其他例,可列舉包含電路基板、與積層於該電路基板之表面上之複數層之硬化物層的電路基板。上述複數層之硬化物層中至少1層係由上述預硬化物形成。上述多層基板較佳為更包含藉由使上述環氧樹脂材料硬化而形成之上述硬化物層之至少一表面上所積層的電路。As another example of the multilayer substrate, a circuit board including a circuit board and a cured layer of a plurality of layers laminated on the surface of the circuit board can be cited. At least one of the cured layers of the plurality of layers is formed of the pre-cured material. Preferably, the multilayer substrate further includes an electric circuit formed by laminating at least one surface of the cured layer formed by curing the epoxy resin material.

於圖2中,以部分缺失前視剖面圖模式性地表示使用本發明之一實施形態之預硬化物的積層體。In Fig. 2, a laminated body using a pre-cured material according to an embodiment of the present invention is schematically shown in a partially missing front cross-sectional view.

於圖2所示之積層體11中,於電路基板12之上表面12a積層有複數層之硬化物層13~16。硬化物層13~16為絕緣層。於電路基板12之上表面12a之一部分區域形成有金屬層17。複數層之硬化物層13~16中,除了位於與電路基板12側相反之外側之表面之硬化物層16以外的硬化物層13~15均於上表面之一部分區域形成有金屬層17。金屬層17為電路。於電路基板12與硬化物層13之間、及經積層之硬化物層13~16之各層間分別配置有金屬層17。下方之金屬層17與上方之金屬層17係藉由未圖示之導孔(Via hole)連接及通孔(Through hole)連接中之至少一者而相互連接。In the laminated body 11 shown in FIG. 2, a plurality of layers of the cured layers 13 to 16 are laminated on the upper surface 12a of the circuit board 12. The cured layer 13 to 16 is an insulating layer. A metal layer 17 is formed in a partial region of the upper surface 12a of the circuit substrate 12. In the cured layers 13 to 16 of the plurality of layers, the cured layers 13 to 15 other than the cured layer 16 on the surface opposite to the side of the circuit substrate 12 are each formed with a metal layer 17 in a partial region of the upper surface. Metal layer 17 is an electrical circuit. A metal layer 17 is disposed between each of the circuit board 12 and the cured material layer 13 and between the layers of the cured layers 13 to 16 which are laminated. The lower metal layer 17 and the upper metal layer 17 are connected to each other by at least one of a via hole connection and a through hole connection (not shown).

於積層體11中,硬化物層13~16係藉由使本發明之環氧樹脂材料硬化而形成。再者,於圖2中,為方便圖示而省略了硬化物層13~16中之二氧化矽及二氧化矽脫離而成之孔的圖示。於本實施形態中,由於對硬化物層13~16之表面進行粗化處理,因此於硬化物層13~16之表面形成有未圖示之微細之孔。又,金屬層17到達微細之孔之內部。又,於積層體11中,可減小金屬層17之寬度方向尺寸(L)與未形成金屬層17之部分之寬度方向尺寸(S)。又,於積層體11中,可於未由未圖示之導孔連接及通孔連接所連接的上方之金屬層與下方之金屬層之間賦予良好的絕緣可靠性。In the laminated body 11, the cured material layers 13 to 16 are formed by curing the epoxy resin material of the present invention. In addition, in FIG. 2, the hole which the cerium oxide and the cerium oxide of the hardened material layers 13-16 are isolate|separated is abbreviate|omitted for convenience of illustration. In the present embodiment, since the surfaces of the cured material layers 13 to 16 are roughened, fine holes (not shown) are formed on the surfaces of the cured material layers 13 to 16. Further, the metal layer 17 reaches the inside of the fine hole. Further, in the laminated body 11, the dimension (L) in the width direction of the metal layer 17 and the dimension (S) in the width direction of the portion where the metal layer 17 is not formed can be made small. Further, in the laminated body 11, good insulation reliability can be imparted between the upper metal layer and the lower metal layer which are not connected by the via hole connection and the via hole connection (not shown).

(膨潤處理及粗化處理)(swelling treatment and roughening treatment)

作為上述膨潤處理之方法,例如可使用藉由以乙二醇等為主成分之化合物之水溶液或有機溶劑分散溶液等,對預硬化物進行處理的方法。膨潤處理中所使用之膨潤液通常包含鹼作為pH值調整劑等。膨潤液較佳為包含氫氧化鈉。具體而言,上述膨潤處理例如可藉由使用40重量%之乙二醇水溶液等,於處理溫度30~85℃下對預硬化物處理1~30分鐘而進行。上述膨潤處理之溫度較佳為50~85℃之範圍內。若上述膨潤處理之溫度過低,則存在膨潤處理需要較長時間,進而硬化物與金屬層之粗化接著強度下降之傾向。As a method of the swelling treatment, for example, a method of treating a pre-cured material by using an aqueous solution of a compound containing a main component such as ethylene glycol or an organic solvent dispersion solution or the like can be used. The swelling liquid used in the swelling treatment usually contains a base as a pH adjuster or the like. The swelling liquid preferably contains sodium hydroxide. Specifically, the swelling treatment can be carried out, for example, by using a 40% by weight aqueous solution of ethylene glycol or the like at a treatment temperature of 30 to 85 ° C for 1 to 30 minutes. The temperature of the above swelling treatment is preferably in the range of 50 to 85 °C. When the temperature of the swelling treatment is too low, the swelling treatment takes a long time, and the roughening of the cured product and the metal layer tends to decrease.

上述粗化處理中例如使用錳化合物、鉻化合物或過硫酸化合物等化學氧化劑等。該等化學氧化劑係於添加水或有機溶劑後,作為水溶液或有機溶劑分散溶液而使用。粗化處理中所使用之粗化液通常包含鹼作為pH值調整劑等。粗化液較佳為包含氫氧化鈉。For the above-described roughening treatment, for example, a chemical oxidizing agent such as a manganese compound, a chromium compound or a persulfate compound is used. These chemical oxidizing agents are used as an aqueous solution or an organic solvent dispersion solution after adding water or an organic solvent. The roughening liquid used in the roughening treatment usually contains a base as a pH adjuster or the like. The roughening liquid preferably contains sodium hydroxide.

作為上述錳化合物,可列舉過錳酸鉀及過錳酸鈉等。作為上述鉻化合物,可列舉重鉻酸鉀及無水鉻酸鉀等。作為上述過硫酸化合物,可列舉過硫酸鈉、過硫酸鉀及過硫酸銨等。Examples of the manganese compound include potassium permanganate and sodium permanganate. Examples of the chromium compound include potassium dichromate and anhydrous potassium chromate. Examples of the persulfuric acid compound include sodium persulfate, potassium persulfate, and ammonium persulfate.

上述粗化處理之方法並無特別限定。作為上述粗化處理之方法,較佳為例如使用30~90 g/L之過錳酸或過錳酸鹽溶液及30~90 g/L之氫氧化鈉溶液,於處理溫度30~85℃及1~30分鐘之條件下,對預硬化物進行1次或2次處理之方法。上述粗化處理之溫度較佳為50~85℃之範圍內。The method of the above roughening treatment is not particularly limited. As a method of the above roughening treatment, for example, a permanganic acid or permanganate solution of 30 to 90 g/L and a sodium hydroxide solution of 30 to 90 g/L are preferably used at a treatment temperature of 30 to 85 ° C and A method of treating the pre-cured material once or twice for 1 to 30 minutes. The temperature of the above roughening treatment is preferably in the range of 50 to 85 °C.

粗化預硬化物之經粗化處理之表面的算術平均粗糙度Ra較佳為50 nm以上,更佳為350 nm以下,進而更佳為300 nm以下。於該情形時,可進一步提高硬化物與金屬層之接著強度,進而可於硬化物層之表面形成更加微細之電路。The arithmetic mean roughness Ra of the roughened surface of the roughened pre-cured material is preferably 50 nm or more, more preferably 350 nm or less, and still more preferably 300 nm or less. In this case, the adhesion strength between the cured product and the metal layer can be further increased, and a finer circuit can be formed on the surface of the cured layer.

(除膠渣處理)(excluding slag treatment)

又,有時會於上述預硬化物或上述硬化物中形成貫通孔。於上述多層基板等中,形成導孔或通孔等作為貫通孔。例如,導孔可藉由CO2 雷射等雷射之照射而形成。導孔之直徑並無特別限定,為60~80 μm左右。由於上述貫通孔之形成,而常常於通道內之底部形成源自硬化物層中所含之樹脂成分的樹脂殘渣即膠渣。Further, a through hole may be formed in the pre-cured material or the cured product. In the multilayer substrate or the like, a via hole, a via hole, or the like is formed as a through hole. For example, the via holes may be formed by irradiation of a laser such as a CO 2 laser. The diameter of the pilot hole is not particularly limited and is about 60 to 80 μm. Due to the formation of the through-holes, a resin residue which is a resin residue derived from a resin component contained in the cured layer is often formed at the bottom of the passage.

為去除上述膠渣,較佳為對上述預硬化物之表面進行除膠渣處理。亦存在除膠渣處理兼作粗化處理之情況。有時亦將除膠渣處理稱為粗化處理。In order to remove the above-mentioned dross, it is preferred to subject the surface of the pre-cured material to desmear treatment. There is also a case where the desmear treatment also serves as a roughening treatment. The desmear treatment is sometimes referred to as roughening treatment.

上述除膠渣處理可與上述粗化處理同樣地使用例如錳化合物、鉻化合物或過硫酸化合物等化學氧化劑等。該等化學氧化劑係於添加水或有機溶劑後,作為水溶液或有機溶劑分散溶液而使用。除膠渣處理中所使用之除膠渣處理液通常包含鹼。除膠渣處理液較佳為包含氫氧化鈉。In the desmear treatment, a chemical oxidizing agent such as a manganese compound, a chromium compound or a persulfate compound can be used in the same manner as the above-described roughening treatment. These chemical oxidizing agents are used as an aqueous solution or an organic solvent dispersion solution after adding water or an organic solvent. The desmear treatment liquid used in the desmear treatment usually contains a base. The desmear treatment liquid preferably contains sodium hydroxide.

上述除膠渣處理之方法並無特別限定。作為上述除膠渣處理之方法,較佳為例如使用30~90 g/L之過錳酸或過錳酸鹽溶液及30~90 g/L之氫氧化鈉溶液,於處理溫度30~85℃及1~30分鐘之條件下對預硬化物或硬化物進行1次或2次處理之方法。上述除膠渣處理之溫度較佳為50~85℃之範圍內。The method of the above-described desmear treatment is not particularly limited. As the method for treating the desmear, it is preferred to use, for example, a permanganic acid or permanganate solution of 30 to 90 g/L and a sodium hydroxide solution of 30 to 90 g/L at a treatment temperature of 30 to 85 ° C. And a method of treating the pre-cured or cured product once or twice in 1 to 30 minutes. The temperature of the above desmear treatment is preferably in the range of 50 to 85 °C.

以下,藉由列舉實施例及比較例,對本發明進行具體說明。本發明並不限定於以下實施例。Hereinafter, the present invention will be specifically described by way of examples and comparative examples. The invention is not limited to the following examples.

於實施例及比較例中使用以下所示之材料。The materials shown below were used in the examples and comparative examples.

(環氧樹脂)(epoxy resin)

環氧樹脂1(雙酚F型環氧樹脂,DIC公司製造之「830-S」,常溫(23℃)下為液狀)Epoxy resin 1 (bisphenol F type epoxy resin, "830-S" manufactured by DIC Corporation, liquid at room temperature (23 ° C))

環氧樹脂2(聯苯酚醛清漆型環氧樹脂,日本化藥公司製造之「NC3000H」,常溫(23℃)下為固形,軟化點為70℃)Epoxy resin 2 (biphenol novolak type epoxy resin, "NC3000H" manufactured by Nippon Kayaku Co., Ltd., solid at room temperature (23 ° C), softening point is 70 ° C)

環氧樹脂3(二環戊二烯型環氧樹脂,DIC製造之「HP-7200」,常溫(23℃)下為固形,軟化點為61℃)Epoxy Resin 3 (dicyclopentadiene type epoxy resin, "HP-7200" manufactured by DIC, solid at room temperature (23 ° C), softening point is 61 ° C)

(硬化劑)(hardener)

活性酯化合物溶液(DIC公司製造之「EXB-9460S-65T」,活性酯當量為223,包含活性酯化合物(固形物成分)65重量%與甲苯35重量%)Active ester compound solution ("EXB-9460S-65T" manufactured by DIC Corporation, active ester equivalent of 223, including active ester compound (solid content) 65% by weight and toluene 35% by weight)

氰酸酯樹脂溶液(氰酸酯硬化劑,使雙酚A二氰酸酯三化而形成為三聚物之預聚物,Lonza Japan公司製造之「BA230S-75」,氰酸酯當量為230,包含氰酸酯樹脂(固形物成分)75重量%與甲基乙基酮25重量%)Cyanate resin solution (cyanate hardener, bisphenol A dicyanate III A prepolymer formed as a terpolymer, "BA230S-75" manufactured by Lonza Japan Co., Ltd., having a cyanate equivalent of 230, containing cyanate resin (solid content) of 75 wt% and methyl ethyl ketone 25 weight%)

酚化合物(酚硬化劑,明和化成公司製造之「MEH7851-4H」,酚性羥基當量為242)Phenolic compound (phenolic hardener, "MEH7851-4H" manufactured by Minghe Chemical Co., Ltd., phenolic hydroxyl equivalent of 242)

酚化合物溶液(具有胺基三骨架之酚硬化劑,DIC公司製造之「LA3018-50P」,酚性羥基當量為151,包含酚化合物(固形物成分)50重量%與丙二醇單甲醚50重量%)Phenol compound solution (having amine group III) The phenolic curing agent of the skeleton, "LA3018-50P" manufactured by DIC Corporation, has a phenolic hydroxyl equivalent of 151, and contains 50% by weight of a phenol compound (solid content) and 50% by weight of propylene glycol monomethyl ether)

(硬化促進劑)(hardening accelerator)

咪唑化合物1(2-乙基-4-甲基咪唑,四國化成公司製造之「2E4MZ」)Imidazole compound 1 (2-ethyl-4-methylimidazole, "2E4MZ" manufactured by Shikoku Chemicals Co., Ltd.)

咪唑化合物2(2-苯基-4-甲基-5-羥基甲基咪唑,四國化成公司製造之「2P4MHZ-PW」)Imidazole compound 2 (2-phenyl-4-methyl-5-hydroxymethylimidazole, "2P4MHZ-PW" manufactured by Shikoku Chemicals Co., Ltd.)

(二氧化矽成分)(cerium oxide component)

含有第1之小粒徑二氧化矽之漿料A:包含第1之小粒徑二氧化矽a(利用苯基矽烷(苯基三甲氧基矽烷,信越化學工業公司製造之「KBM-103」)對二氧化矽(Admatechs公司製造之「YA050C-MMK」,平均粒徑為0.05 μm)進行表面處理而成者)65重量%、與甲基乙基酮35重量%的含有第1之小粒徑二氧化矽之漿料。Slurry A containing the first small particle size ceria: contains the first small particle size ceria a (using phenyl decane (phenyl trimethoxy decane, "KBM-103" manufactured by Shin-Etsu Chemical Co., Ltd.) 1% of the granules containing 65% by weight of cerium oxide ("YA050C-MMK" manufactured by Admatech Co., Ltd., having an average particle diameter of 0.05 μm) and 35% by weight of methyl ethyl ketone) A slurry of cerium oxide.

含有第1之小粒徑二氧化矽之漿料B:包含第1之小粒徑二氧化矽b(利用咪唑矽烷(日礦金屬公司製造之「IM-1000」)對二氧化矽(電氣化學工業公司製造之「UFP-30」,平均粒徑為0.1 μm)進行表面處理而成者)30重量%、與N,N-二甲基甲醯胺70重量%的含有第1之小粒徑二氧化矽之漿料。Slurry B containing the first small particle size ceria: containing the first small particle size c2 (using imidazolium ("IM-1000" manufactured by Nippon Mining Co., Ltd.) for cerium oxide (Electrical Chemistry) "UFP-30" manufactured by Industrial Co., Ltd., having an average particle diameter of 0.1 μm), 30% by weight, and 70% by weight of N,N-dimethylformamide, containing the first small particle diameter A slurry of cerium oxide.

含有第1之小粒徑二氧化矽與第2之大粒徑二氧化矽二者之漿料X:包含第1之小粒徑二氧化矽與第2之大粒徑二氧化矽x(利用環氧矽烷(3-縮水甘油氧基丙基三甲氧基矽烷,信越化學工業公司製造之「KBM-403」)對二氧化矽(Admatechs公司製造之「SO-C2」,平均粒徑為0.5 μm)進行表面處理而成者)70重量%、與甲基乙基酮30重量%的含有第1之小粒徑二氧化矽與第2之大粒徑二氧化矽二者之漿料。Slurry X containing both the first small particle size ceria and the second largest particle size ceria: containing the first small particle size ceria and the second largest particle size x2 (utilizing Epoxy decane (3-glycidoxypropyltrimethoxy decane, "KBM-403" manufactured by Shin-Etsu Chemical Co., Ltd.) p-cerium oxide ("SO-C2" manufactured by Admatechs Co., Ltd., average particle size 0.5 μm A slurry containing 70% by weight and 30% by weight of methyl ethyl ketone containing both the first small particle size ceria and the second large particle size ceria.

漿料X具有較廣之粒度分佈,包括自粒徑0.01 μm至粒徑20 μm為止之二氧化矽。於漿料X中,在第1之小粒徑二氧化矽與第2之大粒徑二氧化矽之合計100體積%中,第1之小粒徑二氧化矽之含量為50體積%,第2之大粒徑二氧化矽x之含量為50體積%。Slurry X has a broad particle size distribution including cerium oxide from a particle size of 0.01 μm to a particle size of 20 μm. In the slurry X, the content of the first small particle diameter ceria is 50% by volume in the total of 100% by volume of the first small particle size ceria and the second largest particle size ceria. The content of the large particle size cerium oxide x of 2 is 50% by volume.

含有第2之大粒徑二氧化矽之漿料Y:包含第2之大粒徑二氧化矽y(利用咪唑矽烷(日礦金屬公司製造之「IM-1000」)對二氧化矽(德山製造之「UF-320」,平均粒徑為3.5 μm,粗粒切點(cut point)為20 μm)進行表面處理而成者)50重量%、與N,N-二甲基甲醯胺50重量%的含有第2之大粒徑二氧化矽之漿料。Slurry Y containing the second largest particle size ceria: contains the second largest particle size yttrium y (using imidazolium ("IM-1000" manufactured by Nippon Mining Co., Ltd.) for cerium oxide (Deshan) Manufactured "UF-320" with an average particle size of 3.5 μm, a coarse cut point of 20 μm), 50% by weight, and 50 parts by weight of N,N-dimethylformamide % of a slurry containing a second largest particle size ceria.

(熱塑性樹脂)(thermoplastic resin)

苯氧基樹脂(三菱化學公司製造之「YX6954BH30」)Phenoxy resin ("YX6954BH30" manufactured by Mitsubishi Chemical Corporation)

(實施例1)(Example 1)

(1)樹脂組合物及積層膜之製作(1) Production of resin composition and laminated film

調配以固形物成分計為5重量份的含有第1之小粒徑二氧化矽之漿料A、以固形物成分計為55重量份的含有第2之大粒徑二氧化矽之漿料Y、10重量份之環氧樹脂1(雙酚F型環氧樹脂,DIC公司製造之「830-S」)、10重量份之環氧樹脂2(聯苯酚醛清漆型環氧樹脂,日本化藥公司製造之「NC3000H」)、以固形物成分計為10重量份之氰酸酯樹脂溶液(氰酸酯硬化劑,Lonza Japan公司製造之「BA230S-75」)、0.5重量份之咪唑化合物1(四國化成公司製造之「2E4MZ」)及9.5重量份之苯氧基樹脂(三菱化學公司製造之「YX6954BH30」),利用攪拌機以1200 rpm攪拌1小時,而獲得樹脂組合物。5 parts by weight of the slurry A containing the first small particle size ceria and 55 parts by weight of the solid content of the slurry Y containing the second largest particle size of cerium oxide in terms of the solid content 10 parts by weight of epoxy resin 1 (bisphenol F type epoxy resin, "830-S" manufactured by DIC Corporation), 10 parts by weight of epoxy resin 2 (biphenol novolac type epoxy resin, Japanese chemical) "NC3000H" manufactured by the company, 10 parts by weight of a cyanate resin solution (cyanate curing agent, "BA230S-75" manufactured by Lonza Japan Co., Ltd.) and 0.5 part by weight of an imidazole compound 1 (solid content) "2E4MZ" manufactured by Shikoku Chemicals Co., Ltd.) and 9.5 parts by weight of phenoxy resin ("YX6954BH30" manufactured by Mitsubishi Chemical Corporation) were stirred at 1200 rpm for 1 hour using a stirrer to obtain a resin composition.

準備經脫模處理之透明聚對苯二甲酸乙二酯(PET,Polyethylene terephthalate)膜(琳得科(Lintec)公司製造之「PET5011 550」,厚度為50 μm)。使用敷料器,以乾燥後之厚度成為50 μm之方式,於該PET膜之脫模處理面上塗佈所得之樹脂組合物。其次,於100℃之吉爾老化恆溫箱(Geer oven)內乾燥2分鐘,製作縱200 mm×橫200 mm×厚50 μm之樹脂片材之未硬化物(B階段半固化膜)與聚對苯二甲酸乙二酯膜的積層膜。繼而,自積層膜剝離聚對苯二甲酸乙二酯膜,將樹脂片材之未硬化物於180℃之吉爾老化恆溫箱內加熱80分鐘,而製作樹脂片材之預硬化物。A release-treated polyethylene terephthalate (PET) film (PET5011 550, manufactured by Lintec) having a thickness of 50 μm was prepared. The obtained resin composition was applied onto the release-treated surface of the PET film by using an applicator so that the thickness after drying became 50 μm. Next, it was dried in a Geer oven at 100 ° C for 2 minutes to prepare an uncured material (B-stage semi-cured film) and polyparaphenylene of a resin sheet having a length of 200 mm × a width of 200 mm × a thickness of 50 μm. A laminate film of a film of ethylene dicarboxylate. Then, the polyethylene terephthalate film was peeled off from the laminated film, and the uncured material of the resin sheet was heated in a Geer aging incubator at 180 ° C for 80 minutes to prepare a pre-cured product of the resin sheet.

(2)包含預硬化物之積層體之製作(2) Production of laminate containing pre-cured material

以B階段半固化膜成為玻璃環氧基板(FR-4,品號「CS-3665」,利昌工業公司製造)側之方式設置所得之積層膜。使用加熱至100℃之平行平板加壓機,於減壓下以0.5 MPa對積層膜與玻璃環氧基板進行60分鐘之加壓加熱,獲得包含樹脂片材之預硬化物之積層體。其後,剝離聚對苯二甲酸乙二酯膜而獲得玻璃環氧基板與預硬化物之積層體A。所得之預硬化物於玻璃環氧基板側具有第2主面,於玻璃環氧基板之相反側具有經粗化處理之面即第1主面。The obtained laminated film was provided so that the B-stage semi-cured film became the side of a glass epoxy substrate (FR-4, product number "CS-3665", manufactured by Lichang Industrial Co., Ltd.). The laminated film and the glass epoxy substrate were heated under pressure for 0.5 minutes at 0.5 MPa under reduced pressure using a parallel plate presser heated to 100 ° C to obtain a laminate including a pre-cured material of the resin sheet. Thereafter, the polyethylene terephthalate film was peeled off to obtain a laminate A of a glass epoxy substrate and a pre-cured product. The obtained pre-cured material has a second main surface on the glass epoxy substrate side, and has a roughened surface, that is, a first main surface on the opposite side of the glass epoxy substrate.

(實施例2~10及比較例1~2)(Examples 2 to 10 and Comparative Examples 1 to 2)

如下述表1所示般變更所使用之材料之種類及調配量,除此以外,以與實施例1相同之方式獲得樹脂組合物、PET膜與B階段半固化膜之積層膜及玻璃環氧基板與預硬化物之積層體。A resin composition, a laminated film of a PET film and a B-stage semi-cured film, and a glass epoxy resin were obtained in the same manner as in Example 1 except that the type and the amount of the material to be used were changed as shown in the following Table 1. a laminate of a substrate and a pre-cured material.

(評價)(Evaluation)

(1)環氧樹脂材料之最低熔融黏度(1) The lowest melt viscosity of epoxy resin materials

利用Rheometer裝置(TA Instrument公司製造之「AR-2000」),於變形21.6%及頻率1 Hz之條件下,測定所得之樹脂片材之未硬化物(B階段半固化膜)於50~150℃之溫度區域的黏度,將黏度最低之值作為最低熔融黏度。The uncured material (B-stage semi-cured film) of the obtained resin sheet was measured at 50 to 150 ° C under the conditions of a deformation of 21.6% and a frequency of 1 Hz using a Rheometer apparatus ("AR-2000" manufactured by TA Instrument Co., Ltd.). The viscosity of the temperature region is the lowest viscosity as the lowest melt viscosity.

(2)二氧化矽之存在狀態1(2) The existence state of cerium oxide 1

對實施例及比較例中獲得之積層體A中之預硬化物進行剖面觀察。依據下述判定基準,判定預硬化物中之二氧化矽之存在狀態1。The pre-cured materials in the layered product A obtained in the examples and the comparative examples were observed in cross section. The presence state 1 of the cerium oxide in the pre-hardened material is determined according to the following criteria.

[二氧化矽之存在狀態1之判定基準][Criteria for the determination of the presence state of cerium oxide]

○:於預硬化物中,上述第1之小粒徑二氧化矽以大多存在於上述第1主面側之方式偏向存在,且上述第2之大粒徑二氧化矽以大多存在於上述第2主面側之方式偏向存在。○: in the pre-cured material, the first small-sized cerium oxide is present in a manner that is mostly present on the first main surface side, and the second large-sized cerium oxide is mostly present in the first 2 The way of the main side is biased.

×:上述第1之小粒徑二氧化矽未以大多存在於上述第1主面側之方式偏向存在,或者上述第2之大粒徑二氧化矽未以大多存在於上述第2主面側之方式偏向存在。X: the first small-sized cerium oxide is not present in a manner that is often present on the first main surface side, or the second large-sized cerium oxide is not present in the second main surface side. The way is biased to exist.

××:上述第1之小粒徑二氧化矽未以大多存在於上述第1主面側之方式偏向存在,且上述第2之大粒徑二氧化矽未以大多存在於上述第2主面側之方式偏向存在。××: the first small-sized cerium oxide is not present in a manner that is often present on the first main surface side, and the second large-sized cerium oxide is not present in the second main surface. The side way is biased to exist.

(3)二氧化矽之存在狀態2(3) The existence state of cerium oxide 2

於上述二氧化矽之存在狀態1之判定結果為「○」之情形時,對經粗化處理之面即上述第1主面側之表面部分的厚度為0.3 μm之第1區域中所含之所有二氧化矽100重量%中,第2之大粒徑二氧化矽之含量的比率(體積%)進行評價。又,亦對第2區域之厚度進行評價。In the case where the determination result of the presence state 1 of the above-mentioned ceria is "○", the roughened surface, that is, the surface of the first main surface side having a thickness of 0.3 μm is included in the first region. The ratio (% by volume) of the content of the second largest particle size ceria in 100% by weight of all cerium oxide was evaluated. Moreover, the thickness of the second region was also evaluated.

(4)接著強度(剝離強度)及算術平均粗糙度Ra(4) Subsequent strength (peel strength) and arithmetic mean roughness Ra

[硬化物B之製作][Production of hardened material B]

對上述積層體A中之預硬化物進行下述(a)膨潤處理後,進行下述(b)過錳酸鹽處理即粗化處理,進而進行下述(c)鍍銅處理。After the (a) swelling treatment of the pre-cured material in the layered product A described above, the following (b) permanganate treatment, that is, the roughening treatment, is carried out, and the following (c) copper plating treatment is further carried out.

(a)膨潤處理:(a) Swelling treatment:

向60℃之膨潤液(Swelling Dip Securiganth P,Atotech Japan公司製造)中添加上述積層體A,搖動20分鐘。其後,利用純水清洗。The layered product A was added to a swelling liquid (Swelling Dip Securiganth P, manufactured by Atotech Japan Co., Ltd.) at 60 ° C, and shaken for 20 minutes. Thereafter, it is washed with pure water.

(b)過錳酸鹽處理:(b) Permanganate treatment:

於75℃之過錳酸鉀(Concentrate Compact CP,Atotech Japan公司製造)粗化水溶液中添加上述積層體,搖動20分鐘,而於玻璃環氧基板上獲得經粗化處理之粗化預硬化物。利用23℃之清洗液(Reduction Securiganth P,Atotech Japan公司製造)將所得之粗化預硬化物清洗2分鐘後,利用純水進一步清洗。The layered product was added to a roughened aqueous solution of potassium permanganate (Concentrate Compact CP, manufactured by Atotech Japan Co., Ltd.) at 75 ° C, and shaken for 20 minutes to obtain a roughened pre-cured product obtained by roughening on a glass epoxy substrate. The obtained roughened pre-cured product was washed with a cleaning solution (Reduction Securiganth P, manufactured by Atotech Japan Co., Ltd.) at 23 ° C for 2 minutes, and then further washed with pure water.

於120℃之吉爾老化恆溫箱中乾燥2小時並冷卻後,依據JIS B0601-1994,對粗化預硬化物之經粗化處理之表面的算術平均粗糙度Ra進行測定。After drying in a Gil aging incubator at 120 ° C for 2 hours and cooling, the arithmetic mean roughness Ra of the roughened surface of the roughened pre-cured material was measured in accordance with JIS B0601-1994.

(c)鍍銅處理:(c) Copper plating:

其次,根據以下步驟,對玻璃環氧基板上之經粗化處理之粗化預硬化物進行非電解鍍銅及電解鍍銅處理。Next, according to the following procedure, the roughened pre-cured material on the glass epoxy substrate is subjected to electroless copper plating and electrolytic copper plating.

利用55℃之鹼清潔液(Cleaner Securiganth 902)對上述粗化預硬化物之表面處理5分鐘,而進行脫脂清洗。清洗後,利用23℃之預浸液(Pre-dip Neoganth B)對上述粗化預硬化物處理2分鐘。其後,利用40℃之活化液(Activator Neoganth 834)對上述粗化預硬化物處理5分鐘,裝上鈀觸媒。其次,利用30℃之還原液(Reducer Neoganth WA)對粗化預硬化物處理5分鐘。The surface of the above roughened pre-cured material was treated with a 55 ° C alkali cleaning solution (Cleaner Securiganth 902) for 5 minutes to perform degreasing cleaning. After washing, the above roughened pre-cured material was treated with a pre-dip solution (Pre-dip Neoganth B) at 23 ° C for 2 minutes. Thereafter, the roughened pre-cured material was treated with an activation solution (Activator Neoganth 834) at 40 ° C for 5 minutes, and a palladium catalyst was charged. Next, the roughened pre-cured material was treated with a reducing solution (Reducer Neoganth WA) at 30 ° C for 5 minutes.

繼而,將上述粗化預硬化物添加至化學銅液(Basic Printganth MSK-DK、Basic Printganth MSK、Stabilizer Printganth MSK)中,實施非電解鍍敷直至鍍敷厚度成為0.5 μm左右為止。於非電解鍍敷後,為去除殘留之氫氣,而於120℃之溫度下退火30分鐘。非電解鍍敷步驟前之所有步驟係以燒杯刻度將處理液設為1 L,一面搖動硬化物一面實施。Then, the roughened pre-cured material was added to a chemical copper solution (Basic Printganth MSK-DK, Basic Printganth MSK, Stabilizer Printganth MSK), and electroless plating was performed until the plating thickness was about 0.5 μm. After electroless plating, in order to remove residual hydrogen, it was annealed at a temperature of 120 ° C for 30 minutes. All the steps before the electroless plating step were carried out by setting the treatment liquid to 1 L on a beaker scale while shaking the cured product.

繼而,對經非電解鍍敷處理之粗化預硬化物實施電解鍍敷直至鍍敷厚度成為25 μm為止。使用硫酸銅(Reducer Cu)作為電解鍍銅,且通入0.6 A/cm2 之電流。於鍍銅處理後,將粗化預硬化物於190℃下加熱1小時,使其硬化,而獲得形成有鍍銅層之硬化物B。Then, the roughened pre-cured material subjected to the electroless plating treatment was subjected to electrolytic plating until the plating thickness became 25 μm. Copper sulfate (Reducer Cu) was used as electrolytic copper plating, and a current of 0.6 A/cm 2 was passed. After the copper plating treatment, the roughened pre-cured material was heated at 190 ° C for 1 hour to be hardened to obtain a cured product B in which a copper plating layer was formed.

[接著強度之測定方法][Method of measuring the strength]

於上述形成有鍍銅層之硬化物B之鍍銅層的表面切出10 mm寬之切口。其後,利用拉力試驗機(商品名「Autograph」,島津製作所公司製造),於十字頭速度(Crosshead speed)為5 mm/min之條件下,測定鍍銅層與硬化物之接著強度(剝離強度)。A slit having a width of 10 mm was cut out from the surface of the copper plating layer on which the hardened material B of the copper plating layer was formed. Then, the tensile strength (peel strength) of the copper plating layer and the cured product was measured under the conditions of a crosshead speed of 5 mm/min using a tensile tester (trade name "Autograph", manufactured by Shimadzu Corporation). ).

將結果示於下述表1中。再者,於下述表1中,「總固形物成分A」表示上述環氧樹脂材料中所含之總固形物成分,「-」表示未進行評價。The results are shown in Table 1 below. In the following Table 1, "total solid content component A" indicates the total solid content contained in the epoxy resin material, and "-" indicates that evaluation was not performed.

1...預硬化物1. . . Pre-hardened

1a...第1主面1a. . . First main face

1b...第2主面1b. . . Second main face

2...二氧化矽2. . . Cerium oxide

2A...第1之小粒徑二氧化矽2A. . . The first small particle size cerium oxide

2B...第2之大粒徑二氧化矽2B. . . The second largest particle size of cerium oxide

6...積層對象構件6. . . Multi-layer object component

6a、12a...上表面6a, 12a. . . Upper surface

11...積層體11. . . Laminated body

12...電路基板12. . . Circuit substrate

13~16...硬化物層13~16. . . Hardened layer

17...金屬層17. . . Metal layer

R1...第1區域R1. . . First area

R2...第2區域R2. . . Second area

圖1係模式性地表示本發明之一實施形態之預硬化物的部分缺失前視剖面圖。Fig. 1 is a partially broken front cross-sectional view schematically showing a pre-cured material according to an embodiment of the present invention.

圖2係模式性地表示使用本發明之一實施形態之預硬化物的積層體之部分缺失前視剖面圖。Fig. 2 is a partially broken front cross-sectional view schematically showing a laminate using a pre-cured material according to an embodiment of the present invention.

1...預硬化物1. . . Pre-hardened

1a...第1主面1a. . . First main face

1b...第2主面1b. . . Second main face

2...二氧化矽2. . . Cerium oxide

2A...第1之小粒徑二氧化矽2A. . . The first small particle size cerium oxide

2B...第2之大粒徑二氧化矽2B. . . The second largest particle size of cerium oxide

6...積層對象構件6. . . Multi-layer object component

6a...上表面6a. . . Upper surface

R1...第1區域R1. . . First area

R2...第2區域R2. . . Second area

Claims (9)

一種預硬化物,其係藉由使環氧樹脂材料硬化而獲得者,且包含第1主面與第2主面,上述第1主面為經粗化處理之面,上述環氧樹脂材料包含環氧樹脂、硬化劑及二氧化矽,上述二氧化矽包含粒徑為0.01 μm以上且未達0.5 μm之第1之小粒徑二氧化矽、與粒徑為0.5 μm以上、20 μm以下之第2之大粒徑二氧化矽,於預硬化物中,上述第1之小粒徑二氧化矽以大多存在於經粗化處理之面即上述第1主面側之方式偏向存在,且上述第2之大粒徑二氧化矽以大多存在於上述第2主面側之方式偏向存在。 A pre-cured material obtained by curing an epoxy resin material, comprising: a first main surface and a second main surface, wherein the first main surface is a roughened surface, and the epoxy resin material comprises An epoxy resin, a curing agent, and cerium oxide, wherein the cerium oxide comprises a first small particle size ceria having a particle diameter of 0.01 μm or more and less than 0.5 μm, and a particle diameter of 0.5 μm or more and 20 μm or less. In the second pre-cured material, the first small-sized cerium oxide is present in the pre-cured material in such a manner that the first small-sized cerium oxide is present on the surface of the roughened surface, that is, the first main surface side. The second largest particle size ceria is present in a manner that is mostly present on the second main surface side. 如請求項1之預硬化物,其中經粗化處理之面的上述第1主面側之表面部分的厚度0.3 μm之第1區域中所含之所有二氧化矽100體積%中,上述第2之大粒徑二氧化矽之含量為5體積%以下。 The pre-cured material of claim 1, wherein the second surface of the surface of the first main surface side of the roughened surface has a thickness of 0.3 μm in all of the cerium oxide contained in the first region of 0.3 μm, the second portion The content of the large particle size cerium oxide is 5% by volume or less. 如請求項1或2之預硬化物,其中於60~120℃之溫度區域的預硬化前之環氧樹脂材料之最低熔融黏度為50 Pa‧s以上、及150 Pa‧s以下。 The pre-cured material of claim 1 or 2, wherein the epoxy resin material before pre-hardening in a temperature region of 60 to 120 ° C has a minimum melt viscosity of 50 Pa‧s or more and 150 Pa‧s or less. 如請求項1或2之預硬化物,其中上述環氧樹脂材料更包含苯氧基樹脂。 The pre-cured material of claim 1 or 2, wherein the epoxy resin material further comprises a phenoxy resin. 如請求項3之預硬化物,其中上述環氧樹脂材料更包含 苯氧基樹脂。 The pre-cured material of claim 3, wherein the epoxy resin material further comprises Phenoxy resin. 一種粗化預硬化物,其係藉由對如請求項1至5中任一項之預硬化物之上述第1主面進行粗化處理而獲得。 A roughened pre-cured product obtained by subjecting the first main surface of the pre-cured material according to any one of claims 1 to 5 to a roughening treatment. 如請求項6之粗化預硬化物,其中於粗化處理前,對上述預硬化物進行膨潤處理。 The roughened pre-cured material of claim 6, wherein the pre-cured material is subjected to a swelling treatment before the roughening treatment. 一種積層體,其包含使藉由對如請求項1至5中任一項之預硬化物之上述第1主面進行粗化處理而獲得的粗化預硬化物硬化而成之硬化物;以及積層於該硬化物之經粗化處理之表面的金屬層。 A layered body comprising a cured product obtained by hardening a roughened pre-cured material obtained by subjecting the first main surface of the pre-cured material according to any one of claims 1 to 5 to a roughening treatment; A metal layer laminated on the roughened surface of the cured product. 如請求項8之積層體,其中上述硬化物與上述金屬層之接著強度為0.39 N/mm以上。 The laminate according to claim 8, wherein the cured product and the metal layer have a bonding strength of 0.39 N/mm or more.
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