TWI393493B - Printed circuit substrate with adjustable characteristic impendance - Google Patents
Printed circuit substrate with adjustable characteristic impendance Download PDFInfo
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- TWI393493B TWI393493B TW98146405A TW98146405A TWI393493B TW I393493 B TWI393493 B TW I393493B TW 98146405 A TW98146405 A TW 98146405A TW 98146405 A TW98146405 A TW 98146405A TW I393493 B TWI393493 B TW I393493B
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本發明係關於一種印刷電路板結構,特別是關於一種利用訊號導線之厚度或寬度而調整特性阻抗之印刷電路基板。BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a printed circuit board structure, and more particularly to a printed circuit board that utilizes the thickness or width of a signal conductor to adjust the characteristic impedance.
於大型印刷電路基板以及封裝基板上,係採用訊號導線以電性連接兩個不同之元件或端點,其線寬均需保持一致以使電子訊號在訊號導線之間傳遞時訊號導線之特性阻抗(characteristic impedance)能保持不變。特別是在高速與高頻的訊號傳遞上,兩元件或端點之間更需要藉由良好的阻抗匹配設計,以降低阻抗不匹配所造成之反射。如此之反射將形成雜音而降低了於其之間所傳遞的電子訊號的品質。On a large printed circuit board and a package substrate, a signal wire is used to electrically connect two different components or end points, and the line widths thereof are required to be uniform so that the characteristic impedance of the signal wire when the electronic signal is transmitted between the signal wires (Characteristic impedance) can remain unchanged. Especially in high-speed and high-frequency signal transmission, the two components or the end point need to be designed with good impedance matching to reduce the reflection caused by impedance mismatch. Such reflections will create noise and reduce the quality of the electronic signals transmitted between them.
然而,於大型印刷電路基板以及封裝基板的製作中,因應不同區域內元件所需設置情形的差異,因而需要針對不同區域內之大型印刷電路基板以及封裝基板進行如鑽孔或平面切割等常見印刷電路板製程的實施,因此於大型印刷電路基板以及封裝基板上不同區域內之介電層的層數、厚度以及使用材料之介電常數上便產生了差異。However, in the production of large-sized printed circuit boards and package substrates, it is necessary to perform common printing such as drilling or planar cutting for large printed circuit boards and package substrates in different areas in response to the difference in the arrangement of components in different areas. The implementation of the board process results in a difference in the number of layers of the dielectric layer, the thickness of the dielectric layer in different areas on the large printed circuit board and the package substrate, and the dielectric constant of the material used.
如此,當大型印刷電路基板以及封裝基板上之不同區域內之介電層的層數、厚度與使用材料之介電材料上有所差異時,於不同區域內具有線寬一致之訊號導線將受到麒其鄰近的介電層的介電材料特性的影響,因而於大型印刷電路基板以及封裝基板上之不同區域內之訊號導線段部中產生了不期望之訊號導線阻抗不匹配的問題。In this way, when the number and thickness of the dielectric layers in different regions on the large printed circuit board and the package substrate are different from those of the materials used, the signal wires having the same line width in different regions will be subjected to The effect of the dielectric material properties of the adjacent dielectric layers results in undesirable signal line impedance mismatches in the signal conductor segments in different regions of the large printed circuit substrate and package substrate.
有鑑於此,本發明提供了一種利用訊號導線之厚度或寬度而調整不同區域內之訊號導線的特性阻抗之印刷電路基板,藉以克服印刷電路基板內之多個區域內之介電層特性差異問題。In view of the above, the present invention provides a printed circuit board that utilizes the thickness or width of a signal conductor to adjust the characteristic impedance of signal conductors in different regions, thereby overcoming the difference in dielectric layer characteristics in a plurality of regions within the printed circuit substrate. .
依據一實施例,本發明提供了一種可調整特性阻抗之印刷電路基板,包括:一第一介電層,其上定義有相鄰之一第一區與一第二區,其中該第一介電層具有相對之第一表面與第二表面;一第一導電層,設置於該第一介電層之該第一區與該第二區內之該第一表面的一部上;一第二導電層,設置於該第一介電層之該第一區內之該第一導電層之上,其中該第二導電層與該第一導電層具有相同線寬並構成了一訊號導線;以及一第二介電層,設置於該第一介電層之該第一區內之該第二導電層之上或該第一介電層之該第一區內之該第二表面之上。According to an embodiment, the present invention provides a printed circuit board with adjustable characteristic impedance, comprising: a first dielectric layer having an adjacent one of the first area and a second area defined thereon, wherein the first medium The electrical layer has a first surface and a second surface; a first conductive layer is disposed on the first portion of the first dielectric layer and a portion of the first surface of the second region; a second conductive layer disposed on the first conductive layer in the first region of the first dielectric layer, wherein the second conductive layer and the first conductive layer have the same line width and constitute a signal wire; And a second dielectric layer disposed on the second conductive layer in the first region of the first dielectric layer or on the second surface of the first region of the first dielectric layer .
依據另一實施例,本發明提供了一種可調整特性阻抗之印刷電路基板,包括:一第一介電層,其上定義有相鄰之一第一區、一第二區與一第三區,其中該第一介電層具有相對之第一表面與第二表面;一第一導電層,設置於該第一介電層之該第一區、該第二區與該第三區內之該第一表面的一部上;一第二導電層,設置於該第一介電層之該第一區與該第三區內之該第一導電層之上,其中該第二導電層與該第一導電層具有相同線寬;一第三導電層與一第二介電層,依序設置於該第一介電層之該第一區內之該第二導電層之上,其中該第三導電層與該第二導電層以及該第一導電層具有相同線寬,且該第三導電層、該第二導電層以及該第一導電層構成了一訊號導線;以及一第三介電層與一第四介電層,分別設置於該第一介電層之該第一區與該第三區內之該第二表面之上。According to another embodiment, the present invention provides a printed circuit substrate with adjustable characteristic impedance, comprising: a first dielectric layer having adjacent one of the first region, a second region and a third region The first dielectric layer has opposite first and second surfaces; a first conductive layer is disposed in the first region, the second region and the third region of the first dielectric layer a portion of the first surface; a second conductive layer disposed over the first region of the first dielectric layer and the first conductive layer of the third region, wherein the second conductive layer The first conductive layer has the same line width; a third conductive layer and a second dielectric layer are sequentially disposed on the second conductive layer of the first region of the first dielectric layer, wherein the The third conductive layer has the same line width as the second conductive layer and the first conductive layer, and the third conductive layer, the second conductive layer and the first conductive layer constitute a signal wire; and a third medium An electrical layer and a fourth dielectric layer are respectively disposed in the first region of the first dielectric layer and the second region in the third region Above the surface.
依據又一實施例,本發明提供了一種可調整特性阻抗之印刷電路基板,包括:一第一介電層,其上定義有相鄰之一第一區與一第二區,其中該第一介電層具有相對之第一表面與第二表面;一第一導電層,設置於該第一介電層之該第一區與該第二區內之該第一表面的一部上,其中該第一導電層包括:一第一段部,設置於該第一介電層之該第一區內之該第一表面之上,具有固定之一第一線寬;一第二段部,設置於該第一介電層之該第二區內之該第一表面之上,具有固定之一第二線寬,其中該第二線寬大於該第一線寬;以及一第三段部,設置於該第一介電層之該第一區與該第二區內之該第一表面之上且實體接觸該第一段部與該第二段部,其中該第三段部具有非固定之一第三線寬,且該第三線寬不小於該第一線寬及不大於該第二線寬;以及一第二介電層,設置於該第一介電層之該第一區內之該第一導電層之上以部份覆蓋該第一導電層之該第三段部以及完全覆蓋第一導電層之該第一段部,或設置於該第一介電層之該第一區之該第二表面之上。According to still another embodiment, the present invention provides a printed circuit substrate with adjustable characteristic impedance, comprising: a first dielectric layer having an adjacent one of the first region and a second region defined thereon, wherein the first The dielectric layer has a first surface and a second surface opposite to each other; a first conductive layer is disposed on a portion of the first surface of the first dielectric layer and the first surface of the second region, wherein The first conductive layer includes: a first segment disposed on the first surface of the first region of the first dielectric layer, having a fixed first line width; a second segment portion, And disposed on the first surface of the second region of the first dielectric layer, having a fixed second line width, wherein the second line width is greater than the first line width; and a third portion And disposed on the first surface of the first dielectric layer and the first surface of the second region and physically contacting the first segment and the second segment, wherein the third segment has a non- Fixing one of the third line widths, and the third line width is not less than the first line width and not greater than the second line width; and a second dielectric layer, And disposed on the first conductive layer in the first region of the first dielectric layer to partially cover the third segment of the first conductive layer and completely cover the first segment of the first conductive layer Or disposed on the second surface of the first region of the first dielectric layer.
依據另一實施例,本發明提供了一種可調整特性阻抗之印刷電路基板,包括:一第一介電層,其上定義有相鄰之一第一區、一第二區與一第三區,其中該第一介電層具有相對之第一表面與第二表面;一第一導電層,設置於該第一介電層之該第一區、該第二區與該第三區內之該第一表面的一部上,其中該第一導電層包括:一第一段部,設置於該第一介電層之該第一區內之該第一表面之上,具有固定之一第一線寬;一第二段部,設置於該第一介電層之該第二區內之該第一表面之上,具有固定之一第二線寬,其中該第二線寬大於該第一線寬;以及一第三段部,設置於該第一介電層之該第三區內之該第一表面之上,具有固定之一第三線寬,其中該第三線寬小於該第二線寬且相等或不相等於該第一線寬;一第四段部,設置於該第一介電層之該第一區與該第二區內之該第一表面之上且實體接觸該第一段部與該第二段部,具有非固定之一第四線寬,其中該第四線寬不小於該第一線寬且不大於該第二線寬;以及一第五段部,設置於該第一介電層之該第二區與該第三區之該第一表面之上且實體接觸該第二段部與該第三段部,具有非固定之一第五線寬,其中該第五線寬不小於該第三線寬且不大於該第二線寬;一第二導電層與一第二介電層,依序設置於該第一介電層之該第一區內之該第一導電層之上,以部份覆蓋該第一導電層之該第四段部以及完全覆蓋該第一段部;以及一第三介電層,設置於該第一介電層之該第三區之該第二表面之上。According to another embodiment, the present invention provides a printed circuit substrate with adjustable characteristic impedance, comprising: a first dielectric layer having adjacent one of the first region, a second region and a third region The first dielectric layer has opposite first and second surfaces; a first conductive layer is disposed in the first region, the second region and the third region of the first dielectric layer a portion of the first surface, wherein the first conductive layer comprises: a first segment disposed on the first surface of the first region of the first dielectric layer, having a fixed one a second line portion disposed on the first surface of the second region of the first dielectric layer and having a fixed second line width, wherein the second line width is greater than the first a line width; and a third portion disposed on the first surface of the third region of the first dielectric layer, having a fixed third line width, wherein the third line width is smaller than the second The line width is equal or unequal to the first line width; a fourth segment is disposed in the first area and the second portion of the first dielectric layer Above the first surface and physically contacting the first segment and the second segment, having a non-fixed one of the fourth line widths, wherein the fourth line width is not less than the first line width and not greater than the a second line width; and a fifth segment disposed over the first surface of the first dielectric layer and the first surface of the third region and physically contacting the second segment and the third segment a portion having a fifth line width that is not fixed, wherein the fifth line width is not less than the third line width and not greater than the second line width; a second conductive layer and a second dielectric layer are sequentially disposed on The first conductive layer of the first dielectric layer of the first dielectric layer partially covers the fourth segment of the first conductive layer and completely covers the first segment; and a third dielectric layer An electrical layer disposed over the second surface of the third region of the first dielectric layer.
雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此項技藝者,在不脫離本發明之精神和範圍內,當可作更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the invention may be modified and retouched without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application attached.
以下將配合第1-11圖詳細說明本發明一實施例之可調整特性阻抗之印刷電路基板的製作。此處須注意的是,該些圖式均為簡化之示意圖,以強調本發明之特徵,因此圖中之元件尺寸並非完全依實際比例繪製。且本發明之實施例也可能包含圖中未顯示之元件。Hereinafter, the fabrication of a printed circuit board with adjustable characteristic impedance according to an embodiment of the present invention will be described in detail with reference to Figs. It is to be noted that the drawings are a simplified schematic diagram to emphasize the features of the present invention, and thus the component dimensions in the drawings are not drawn to the actual scale. Embodiments of the invention may also include elements not shown in the figures.
首先,提供適用於印刷電路基板製作之一介電層100,其具有相對之兩個表面102、104,而介電層100之上則大體定義有三個相鄰之區域A、B與C。於區域A、B與C內之介電層100的表面102之上則坦覆地形成有一導電層106,而於區域A內之表面104之上則形成有一導電層108。在此,導電層106與108例如為一超薄之金屬層或非金屬導體層,導電層106之厚度顯示為T1 ,而導電層108之厚度顯示為T2 ,而介電層100之材質如紙質酚醛樹脂(paper phenolic resin)、複合環氧樹脂(composite epoxy)、聚亞醯胺樹脂(polyimide resin)或玻璃纖維(glass fiber)等絕緣材料。於介電層100之上形成導電層106與108之方法例如為濺鍍(sputtering)、壓合(laminate)或塗佈(coating)等製程。First, a dielectric layer 100 suitable for use in a printed circuit substrate is provided having opposite surfaces 102, 104, and three adjacent regions A, B and C are generally defined above the dielectric layer 100. A conductive layer 106 is formed over the surface 102 of the dielectric layer 100 in the regions A, B and C, and a conductive layer 108 is formed over the surface 104 in the region A. Here, the conductive layers 106 and 108 are, for example, an ultra-thin metal layer or a non-metal conductor layer, the thickness of the conductive layer 106 is shown as T 1 , and the thickness of the conductive layer 108 is shown as T 2 , and the material of the dielectric layer 100 Insulating materials such as paper phenolic resin, composite epoxy, polyimide resin or glass fiber. The method of forming the conductive layers 106 and 108 over the dielectric layer 100 is, for example, a process such as sputtering, laminating, or coating.
請參見第2圖,於導電層106之上形成一光阻層110,光阻層110例如為一乾膜光阻,其可於一適當之溫度與壓力之下密合貼附於導電層106之上。Referring to FIG. 2, a photoresist layer 110 is formed on the conductive layer 106. The photoresist layer 110 is, for example, a dry film photoresist, which can be closely attached to the conductive layer 106 under a proper temperature and pressure. on.
請參照第3圖,接著施行一微影程序114以曝光光阻層110。在此,微影程序114中使用了具有複數個遮光區112a以及至少一透光區112b之一光罩112,其中透光區112b大體對準於區域B,而遮光區112a則大體對準了區域A與C。於微影程序114施行過後,區域B內之光阻層110經過曝光後成為經曝光之光阻層110b,並於區域A與C內留下為未經曝光之光阻層110a。Referring to FIG. 3, a lithography process 114 is then performed to expose the photoresist layer 110. Here, the lithography program 114 uses a mask 112 having a plurality of light-shielding regions 112a and at least one light-transmitting region 112b, wherein the light-transmitting regions 112b are substantially aligned with the regions B, and the light-shielding regions 112a are substantially aligned. Areas A and C. After the lithography process 114 is performed, the photoresist layer 110 in the region B is exposed to become the exposed photoresist layer 110b, and leaves the unexposed photoresist layer 110a in the regions A and C.
請參照第4圖,施行一顯影程序(未顯示),移除未經曝光之光阻層110a並露出區域A與C內之導電層106。接著,進行一沈積製程(未顯示),例如為一電鍍製程或一化學鍍製程,以於區域A與C內形成另一導電層116,其材質可為銅、鋁、鎳、金之金屬或其他非金屬導電材料,其中又以銅為較常使用之材料。在此,導電層116之厚度T3 較佳地與區域B內之導電層106上之經曝光之光阻層110b相同,以提供後續製程施行之一平整表面。Referring to FIG. 4, a developing process (not shown) is performed to remove the unexposed photoresist layer 110a and expose the conductive layers 106 in the regions A and C. Next, a deposition process (not shown) is performed, such as an electroplating process or an electroless plating process, to form another conductive layer 116 in the regions A and C, which may be made of copper, aluminum, nickel, gold metal or Other non-metallic conductive materials, in which copper is the more commonly used material. Here, the thickness T 3 of the conductive layer 116 is preferably the same as the exposed photoresist layer 110b on the conductive layer 106 in the region B to provide a planar surface for subsequent processing.
請參照第5圖,於導電層116與經曝光之光阻層110b之上形成一光阻層118,光阻層118例如為一乾膜光阻,其可於一適當之溫度與壓力之下密合貼附於導電層116與經曝光之光阻層110b之上。Referring to FIG. 5, a photoresist layer 118 is formed on the conductive layer 116 and the exposed photoresist layer 110b. The photoresist layer 118 is, for example, a dry film photoresist, which can be dense under a suitable temperature and pressure. Attached to the conductive layer 116 and the exposed photoresist layer 110b.
請參照第6圖,接著施行一微影程序122以曝光光阻層118。在此,微影程序122中使用了具有一遮光區120a以及一透光區120b之一光罩120,其中透光區120b大體對準於區域B與C,而遮光區120a則大體對準了區域A。於微影程序122施行過後,區域B與C內之光阻層118經過曝光後成為經曝光之光阻層118b,並於區域A內留下為未經曝光之光阻層118a。Referring to FIG. 6, a lithography process 122 is then performed to expose the photoresist layer 118. Here, the lithography program 122 uses a reticle 120 having a light-shielding region 120a and a light-transmitting region 120b, wherein the light-transmitting region 120b is substantially aligned with the regions B and C, and the light-shielding region 120a is substantially aligned. Area A. After the lithography process 122 is performed, the photoresist layer 118 in the regions B and C is exposed to become the exposed photoresist layer 118b, and leaves the unexposed photoresist layer 118a in the region A.
請參照第7圖,施行一顯影程序(未顯示),移除未經曝光之光阻層118a並露出區域A內之導電層116。接著,進行一沈積製程(未顯示),例如為一電鍍製程或一化學鍍製程,以於區域A內形成一導電層120,其材質可為銅、鋁、鎳、金之金屬或其他非金屬導電材料,其中又以銅為較常使用之材料。在此,導電層120之厚度T4 較佳地與區域B與C內之導電層116上之經曝光之光阻層118b相同,以提供後續製程施行之一平整表面。Referring to FIG. 7, a developing process (not shown) is performed to remove the unexposed photoresist layer 118a and expose the conductive layer 116 in the region A. Next, a deposition process (not shown) is performed, such as an electroplating process or an electroless plating process, to form a conductive layer 120 in the region A, which may be made of copper, aluminum, nickel, gold metal or other non-metal. Conductive materials, in which copper is the more commonly used material. Here, the thickness T 4 of the conductive layer 120 is preferably the same as the exposed photoresist layer 118b on the conductive layer 116 in the regions B and C to provide a planar surface for subsequent processing.
請參照第8圖,施行一脫膜程序(未顯示)以將區域B與C內之經曝光之光阻層110b與118b剝除,並露出區域B內之導電層106(見於第7圖)與區域C內之導電層116(見於第7圖)。接著針對此些導電層120、116與106等膜層進行圖案化,可採用相似於前述第3-4圖與第6-7圖之微影與蝕刻程序而部份移除了區域A、B與C內之介電層100上之導電層120、116與106,進而於介電層100上形成了經圖案化之導電層120’、116’與106’等圖案化膜層。Referring to FIG. 8, a stripping process (not shown) is performed to strip the exposed photoresist layers 110b and 118b in regions B and C, and expose the conductive layer 106 in region B (see Figure 7). And conductive layer 116 in region C (see Figure 7). Then, the film layers such as the conductive layers 120, 116, and 106 are patterned, and the regions A and B are partially removed by using a lithography and etching process similar to the above-mentioned FIGS. 3-4 and 6-7. Patterned film layers such as patterned conductive layers 120', 116' and 106' are formed on dielectric layer 100 with conductive layers 120, 116 and 106 on dielectric layer 100 in C.
請參照第9圖,顯示了如第8圖所示結構之上視情形,而此些圖案化之導電層120’、116’與106’便構成了設置且延伸區域A、B與C內介電層100之一部上的訊號導線。在此,訊號導線於區域A、B、C內具有不同之膜層結構與厚度,其中於區域A內部份160係由圖案化之導電層120’、116’與106’所構成,於區域B內之部份則由圖案化之導電層106’所構成,以及於區域C內之部份150則由圖案化之導電層116’與106’所構成。然而,參照第9圖所示之情形可得知,設置與延伸於區域A、B與C之介電層100上之訊號導線之各部份則具有相同之線寬W1 。Referring to FIG. 9, the top view of the structure shown in FIG. 8 is shown, and the patterned conductive layers 120', 116' and 106' constitute the arrangement and the extension areas A, B and C are interposed. A signal conductor on one of the electrical layers 100. Here, the signal wires have different film structures and thicknesses in the regions A, B, and C, wherein the inner portion 160 of the region A is composed of the patterned conductive layers 120', 116' and 106'. Portions of B are formed of patterned conductive layer 106', and portions 150 of region C are formed of patterned conductive layers 116' and 106'. However, referring to the case shown in Fig. 9, it is known that portions of the signal wires disposed on the dielectric layer 100 extending over the regions A, B and C have the same line width W 1 .
請參照第10圖,接著於區域B與C內之介電層100與導電層116’與106’之上形成一介電層170,以及於區域C內之介電層之另一表面104之上(請見第1圖)形成介電層180。介電層170係為如綠漆之一種防焊材料所組成,其係作為抗焊絕緣層之用,以避免區域B與C內之構成訊號導線之導電層106’與116’遭受線路氧化與焊接短路等問題。而介電層180則可藉由黏著層172的設置而附著於區域C內之介電層100的表面104上以作為一補強板之用。黏著層172與介電層180係為如紙質酚醛樹脂(paper phenolic resin)、複合環氧樹脂(composite epoxy)、聚亞醯胺樹脂(polyimide resin)或含浸玻纖布(prepreg)等具黏著性之介電材料所組成,而介電層180係為如玻璃纖維、紙質酚醛樹脂(paper phenolic resin)、複合環氧樹脂(composite epoxy)、聚亞醯胺樹脂(polyimide resin)或含浸玻纖布(prepreg)等絕緣材料所組成,其厚度可適當調整以補強區域C內板件的機械強度。Referring to FIG. 10, a dielectric layer 170 is formed over the dielectric layer 100 and the conductive layers 116' and 106' in the regions B and C, and the other surface 104 of the dielectric layer in the region C. The dielectric layer 180 is formed on top (see Fig. 1). The dielectric layer 170 is composed of a solder resist material such as green lacquer, which is used as a solder resist layer to prevent the conductive layers 106' and 116' constituting the signal wires in the regions B and C from being subjected to line oxidation and Welding short circuit and other issues. The dielectric layer 180 can be attached to the surface 104 of the dielectric layer 100 in the region C by the adhesive layer 172 to serve as a reinforcing plate. The adhesive layer 172 and the dielectric layer 180 are adhesive such as paper phenolic resin, composite epoxy, polyimide resin or impregnated glass cloth (prepreg). The dielectric layer 180 is composed of, for example, glass fiber, paper phenolic resin, composite epoxy, polyimide resin or impregnated fiberglass cloth. (prepreg) and other insulating materials, the thickness of which can be appropriately adjusted to reinforce the mechanical strength of the panel in the region C.
請參照第11圖,接著於區域A內之介電層100之表面102(見於第1圖)與導電層120’之上形成一介電層185以及於區域A內之導電層108之上形成一介電層195,以及分別於介電層185與195的表面選擇性地形成之一導電層187/197以及一介電層189/199。在此,介電層185/195係作為一增層板之用,其可包括如紙質酚醛樹脂(paper phenolic resin)、複合環氧樹脂(composite epoxy)、聚亞醯胺樹脂(polyimide resin)或玻璃纖維(glass fiber)等絕緣材料,而其厚度可適當調整以補強區域A內板件的機械強度並提供額外導電層187/197的設置。導電層187/197則為如一超薄之金屬層或或非金屬導體層,具有厚度T5 與T6 ,而介電層100之材質如紙質酚醛樹脂(paper phenolic resin)、複合環氧樹脂(composite epoxy)、聚亞醯胺樹脂(polyimide resin)或玻璃纖維(glass fiber)等絕緣材料。於介電層185/195之上形成導電層187與197之方法例如為濺鍍(sputtering)、壓合(laminate)或塗佈(coating)等製程。介電層189/199係為如綠漆之一種防焊材料所組成,其係作為抗焊絕緣層之用,以避免區域A內之構成訊號導線之導電層106’、116’與120’以及導電層187/197等膜層遭受線路氧化與焊接短路等問題。Referring to FIG. 11, a dielectric layer 185 is formed over the surface 102 of the dielectric layer 100 in the region A (see FIG. 1) and over the conductive layer 120', and over the conductive layer 108 in the region A. A dielectric layer 195, and a conductive layer 187/197 and a dielectric layer 189/199 are selectively formed on the surfaces of the dielectric layers 185 and 195, respectively. Here, the dielectric layer 185/195 is used as a build-up board, which may include, for example, a paper phenolic resin, a composite epoxy, a polyimide resin, or An insulating material such as glass fiber, and the thickness thereof can be appropriately adjusted to reinforce the mechanical strength of the panel in the region A and provide an additional conductive layer 187/197. The conductive layer 187/197 is such as an ultra-thin metal layer or a non-metal conductor layer having a thickness T 5 and T 6 , and the dielectric layer 100 is made of a paper phenolic resin or a composite epoxy resin ( Insulation material such as composite epoxy), polyimide resin or glass fiber. The method of forming the conductive layers 187 and 197 over the dielectric layer 185/195 is, for example, a process such as sputtering, laminating, or coating. The dielectric layer 189/199 is composed of a solder resist material such as green lacquer, which is used as a solder resist layer to avoid the conductive layers 106', 116' and 120' constituting the signal wires in the region A and The conductive layer 187/197 and the like are subject to problems such as line oxidation and solder short circuit.
如第11圖所示,顯示了依據本發明一實施例之可調整特性阻抗之印刷電路基板,包括:一第一介電層(介電層100),其上定義有相鄰之一第一區(區域A或C)與一第二區(區域B),其中該第一介電層具有相對之第一表面(表面102)與第二表面(表面104);一第一導電層(導電層106’),設置於該第一介電層之該第一區與該第二區內之該第一表面的一部上;一第二導電層(導電層116’),設置於該第一介電層之該第一區內之該第一導電層之上,其中該第二導電層與該第一導電層具有相同線寬並構成了一訊號導線;以及一第二介電層(185或180),設置於該第一介電層之該第一區(區域A)內之該第二導電層之上或該第一介電層之該第一區(區域C)內之該第二表面之上。於其他實施例中,可更於該第二導電層(導電層116’)之上依序設置一第三導電層(導電層120’)與一第三介電層(介電層185),而該第三導電層、該第二導電層與該第一導電層具有相同線寬並構成了該訊號導線,而該第二介電層係設置於該第一介電層之該第一部(區域A)內之該第二表面之上。於其他實施例中,該第一介電層之該第一區(區域A或C)例如為一硬板元件區(區域A)或一軟板元件區(區域C),而該第一介電層之該第二區(區域B)例如為一轉板彎折區。As shown in FIG. 11, a printed circuit board having an adjustable characteristic impedance according to an embodiment of the present invention includes a first dielectric layer (dielectric layer 100) on which a first one is defined. a region (region A or C) and a second region (region B), wherein the first dielectric layer has an opposite first surface (surface 102) and a second surface (surface 104); a first conductive layer (conductive a layer 106') disposed on a portion of the first surface of the first dielectric layer and the first surface of the second region; a second conductive layer (conductive layer 116') disposed on the first a first conductive layer in the first region of a dielectric layer, wherein the second conductive layer and the first conductive layer have the same line width and constitute a signal wire; and a second dielectric layer ( 185 or 180) disposed on the second conductive layer in the first region (region A) of the first dielectric layer or in the first region (region C) of the first dielectric layer Above the second surface. In other embodiments, a third conductive layer (conductive layer 120') and a third dielectric layer (dielectric layer 185) may be sequentially disposed on the second conductive layer (the conductive layer 116'). The third conductive layer, the second conductive layer and the first conductive layer have the same line width and constitute the signal wire, and the second dielectric layer is disposed on the first portion of the first dielectric layer Above the second surface in (Area A). In other embodiments, the first region (region A or C) of the first dielectric layer is, for example, a hard board component region (region A) or a soft board component region (region C), and the first interface The second zone (region B) of the electrical layer is, for example, a turn plate bending zone.
於如第11圖所示之本發明的印刷電路基板的實施情形中,主要利用固定訊號導線之線寬條件下藉由改變位於不同區域內之訊號導線(至少由導電層106’與116’所組成)的厚度而調整於區域A/C與區域B內等不同區域內之訊號導線部分之間特性阻抗,藉以使得設置於上述印刷電路基板內之區域A、B及C等多個區域內之訊號導線之各部份的特性阻抗表現相近,使之不受到各區域內之介電層膜層數量不同或各區域內使用之介電層材料的介電常數的不同而影響。In the implementation of the printed circuit board of the present invention as shown in FIG. 11, the signal conductors located in different regions are mainly changed by using the line width of the fixed signal wires (at least by the conductive layers 106' and 116'). The thickness of the composition is adjusted to the characteristic impedance between the signal conductor portions in different regions such as the region A/C and the region B, so that the regions A, B, and C disposed in the printed circuit board are in a plurality of regions. The characteristic impedances of the various portions of the signal conductor are similar, so that they are not affected by the difference in the number of dielectric layers in each region or the dielectric constant of the dielectric layer material used in each region.
於上述實施例中,位於各區域A、B與C內訊號導線之各部分的厚度則可視各區域A、B與C內之介電層之數量及/或介電層使用材料之介電常數並參照下述公式(1)進行調整而並不以上述實施例內之實施情形而加以限定本發明。In the above embodiments, the thickness of each portion of the signal wires located in each of the regions A, B, and C can be determined by the number of dielectric layers in each of the regions A, B, and C and/or the dielectric constant of the material used for the dielectric layer. The present invention is also limited by the following formula (1) and is not limited by the implementation of the above embodiments.
其中Z0 為訊號導線之各部份之特性阻抗值、εr 為介電層(例如為介電層185、195、170、172與180及其組合)之介電常數、h1 為導電層(例如為導電層120’、116’與106’及其組合)之厚度、w為導電層之線徑、h為導電層到參考層(例如為介電層185、195、170、172與180等膜層)之介電層厚度。Where Z 0 is the characteristic impedance value of each part of the signal wire, ε r is the dielectric constant of the dielectric layer (for example, dielectric layers 185, 195, 170, 172 and 180, and combinations thereof), and h 1 is a conductive layer (eg, the thickness of conductive layers 120', 116' and 106', and combinations thereof), w is the wire diameter of the conductive layer, and h is the conductive layer to the reference layer (eg, dielectric layers 185, 195, 170, 172, and 180) The thickness of the dielectric layer of the film layer.
除了前述之於固定訊號導線之線寬條件下藉由改變位於不同區域內之訊號導線的厚度而調整於不同區域內之訊號導線部分之間特性阻抗差異,使得設置於印刷電路基板內之不同區域A、B及C內之訊號導線之各部份的特性阻抗表現相近的本發明之方法之外,本發明亦提供了採用固定訊號導線之厚度條件下藉由改變不同區域內之訊號導線之線寬而調整於不同區域內之訊號導線部分之間特性阻抗差異之方法,使得設置於印刷電路基板內之不同區域A、B及C內之訊號導線之各部份的特性阻抗表現相近。In addition to the above-described line width of the fixed signal conductor, the characteristic impedance difference between the signal conductor portions in different regions is adjusted by changing the thickness of the signal conductors located in different regions, so that different regions are disposed in the printed circuit board. In addition to the method of the present invention in which the characteristic impedances of the portions of the signal conductors in A, B and C are similar, the present invention also provides for changing the line of signal conductors in different regions by using the thickness of the fixed signal conductor. The method of widening the difference in characteristic impedance between the signal conductor portions in different regions enables the characteristic impedances of the portions of the signal wires disposed in different regions A, B, and C in the printed circuit board to be similar.
請參照第12-16圖以詳細說明本發明另一實施例之可調整特性阻抗之印刷電路基板的製作。此處須注意的是,該些圖式均為簡化之示意圖,以強調本發明之特徵,因此圖中之元件尺寸並非完全依實際比例繪製。且本發明之實施例也可能包含圖中未顯示之元件Referring to Figures 12-16, the fabrication of a printed circuit board having an adjustable characteristic impedance according to another embodiment of the present invention will be described in detail. It is to be noted that the drawings are a simplified schematic diagram to emphasize the features of the present invention, and thus the component dimensions in the drawings are not drawn to the actual scale. And embodiments of the invention may also include components not shown in the figures.
請參照第12圖,首先提供適用於印刷電路基板製作之一介電層200,其具有相對之兩個表面202、204,而介電層200之上則大體定義有三個相鄰之區域A、B與C。於區域A、B與C內之介電層200的表面202之上則坦覆地形成有一導電層206,而於區域A內之表面204之上則形成有一導電層208。請參照第13圖,顯示了如第12圖所示結構之上視情形。在此,導電層206與208例如為一超薄之金屬層或非金屬導體層,導電層206之厚度顯示為T7 ,而導電層208之厚度則顯示為T8 ,而介電層200之材質如紙質酚醛樹脂(paper phenolic resin)、複合環氧樹脂(composite epoxy)、聚亞醯胺樹脂(polyimide resin)或玻璃纖維(glass fiber)等絕緣材料。於介電層100之上形成導電層106與108之方法例如為濺鍍(sputtering)、壓合(laminate)或塗佈(coating)等製程。Referring to FIG. 12, a dielectric layer 200 suitable for a printed circuit substrate is first provided, which has two opposite surfaces 202, 204, and three adjacent regions A are generally defined above the dielectric layer 200. B and C. A conductive layer 206 is formed over the surface 202 of the dielectric layer 200 in the regions A, B and C, and a conductive layer 208 is formed over the surface 204 in the region A. Please refer to Fig. 13, which shows the top view of the structure as shown in Fig. 12. Here, the conductive layers 206 and 208 are, for example, an ultra-thin metal layer or a non-metal conductor layer, the thickness of the conductive layer 206 is shown as T 7 , and the thickness of the conductive layer 208 is shown as T 8 , and the dielectric layer 200 The material is an insulating material such as a paper phenolic resin, a composite epoxy, a polyimide resin or a glass fiber. The method of forming the conductive layers 106 and 108 over the dielectric layer 100 is, for example, a process such as sputtering, laminating, or coating.
請參照第14圖,接著施行一圖案化程序250以圖案化位於介電層200上之導電層206(見於第12圖),所使用之圖案化程序250可包括相似於前述第3-4圖與第6-7圖之微影與蝕刻程序,因而部份移除了區域A、B與C內之介電層200上之導電層206,進而於介電層200上形成了由五個經圖案化之導電段部206a~206e所構成之一訊號導線。第15圖則顯示了如第14所示結構之上視情形。Referring to FIG. 14, a patterning process 250 is then performed to pattern the conductive layer 206 on the dielectric layer 200 (see FIG. 12). The patterning process 250 used may include similar to the aforementioned 3-4. And the lithography and etching process of FIGS. 6-7, thus partially removing the conductive layer 206 on the dielectric layer 200 in the regions A, B, and C, and forming five vias on the dielectric layer 200. The patterned conductive segments 206a-206e form one of the signal wires. Figure 15 shows the top view of the structure shown in Figure 14.
如第14與15圖所示,在此訊號導線包括了設置於介電層200之區域A內之表面202之上的導電段部206a、設置於介電層200之區域B內之表面202之上之導電段部206b、設置於介電層200之區域C內之表面202之上之導電段部206c、設置並延伸於介電層200之區域A與B內之表面202之上之導電段部206c以及設置並延伸於介電層200之區域B與C內之表面202之上之導電段部206e。在此,導電段部206a具有固定之一線寬W2 ,而導電段部206b具有固定之一第二線寬W3 ,且此第二線寬W3 大於第一段部206a之第一線寬W2 ,以及導電段部206c具有固定之一第三線寬W4 ,且該第三線寬W4 小於該第二線寬W3 並相等或不相等於第一線寬W2 。另外,設置於區域A與B內表面202上之導電段部206d則實體接觸第一段部206a與第二段部206b,具有非固定之一第四線寬,其不小於第一線寬W2 且不大於該第二線寬W3 ,以及設置於區域B與C內表面202上之導電段部206e則實體接觸第二段部206b與第三段部206c,具有非固定之一第五線寬,其不大於第二線寬W3 且不小於該第三線寬W4 。於其他實施例中,介電層200之區域A或C例如為一硬板元件區或一軟板元件區,而介電層200之區域B例如為一轉板彎折區。As shown in FIGS. 14 and 15, the signal conductor includes a conductive segment portion 206a disposed on the surface 202 in the region A of the dielectric layer 200, and a surface 202 disposed in the region B of the dielectric layer 200. Conductive segment portion 206b, conductive segment portion 206c disposed over surface 202 in region C of dielectric layer 200, conductive segment disposed over surface 202 in regions A and B of dielectric layer 200 Portion 206c and conductive segment portion 206e disposed over and extending over surface 202 in regions B and C of dielectric layer 200. Here, the conductive segment portion 206a has a fixed line width W 2 , and the conductive segment portion 206b has a fixed second line width W 3 , and the second line width W 3 is greater than the first line width of the first segment portion 206a. W 2 , and the conductive segment portion 206c has a fixed third line width W 4 , and the third line width W 4 is smaller than the second line width W 3 and is equal or not equal to the first line width W 2 . In addition, the conductive segment portion 206d disposed on the inner surface 202 of the regions A and B physically contacts the first segment portion 206a and the second segment portion 206b, and has a non-fixed one of the fourth line widths, which is not less than the first line width W. 2 and not greater than the second line width W 3 , and the conductive segment portion 206e disposed on the inner surface 202 of the regions B and C physically contacts the second segment portion 206b and the third segment portion 206c, and has a non-fixed fifth The line width is not greater than the second line width W 3 and not less than the third line width W 4 . In other embodiments, the region A or C of the dielectric layer 200 is, for example, a hard plate component region or a soft board component region, and the region B of the dielectric layer 200 is, for example, a turn plate bending region.
請參照第16圖,接著可採用相同或相似於第10-11圖所示製造流程的實施,於區域A、B、C等各區域內形成如介電層170、180、185、189、195與199,以及導電層187、197,以及黏著層172等相同膜層。於本實施例中,上述膜層亦扮演了與如第10-11圖所示結構中之相同功能,故於此不在詳細描述其各別功能。Referring to FIG. 16, the dielectric layers 170, 180, 185, 189, 195 may be formed in regions A, B, and C, respectively, using the same or similar implementations as the manufacturing processes shown in FIGS. The same film layer as 199, and the conductive layers 187, 197, and the adhesive layer 172 are used. In the present embodiment, the above-mentioned film layer also functions as the same function as in the structure shown in Figs. 10-11, and thus its respective functions will not be described in detail herein.
如第16圖所示,顯示了依據本發明另一實施例之可調整特性阻抗之印刷電路基板,包括:一第一介電層(介電層200),其上定義有相鄰之一第一區(區域A/C)與一第二區(區域B),其中該第一介電層具有相對之第一表面(表面202)與第二表面(表面204);一第一導電層(導電層206a~e所組成),設置於該第一介電層之該第一區與該第二區內之該第一表面的一部上,其中該第一導電層包括:一第一段部(導電段部206a/206c),設置於該第一介電層之該第一區內之該第一表面之上,具有固定之一第一線寬(線寬W2 );一第二段部(導電段部206b),設置於該第一介電層之該第二區內之該第一表面之上,具有固定之一第二線寬(線寬W3 ),其中該第二線寬大於該第一線寬;一第三段部(導電段部206c)設置於該第一介電層之該第一區內之該第一表面之上,具有一固定之一第三線寬(W4 ),其中第三線寬小於第二線寬且相等或不相等於第一線寬;以及一第四段部(導電段部206d/206e),設置於該第一介電層之該第一區與該第二區內之該第一表面之上且實體接觸該第一段部與該第二段部以及第二段部與第三段部,其中該第四段部具有非固定之一第四線寬及第五線寬,且該第四線寬不小於該第一線寬(線寬W2 )及不大於該第二線寬(線寬W3 ),而該第五線寬不大於該第二線寬(線寬W3 )及相等或不相等於該第一線寬(線寬W1 );以及一第二介電層(介電層185/180),設置於該第一介電層之該第一區內之該第一導電層之上以部份覆蓋該第一導電層之該第四段部以及完全覆蓋第一導電層之該第一段部,或設置於該第一介電層之該第一區之該第二表面之上。As shown in FIG. 16, a printed circuit board having an adjustable characteristic impedance according to another embodiment of the present invention includes a first dielectric layer (dielectric layer 200) on which a adjacent one is defined. a region (region A/C) and a second region (region B), wherein the first dielectric layer has an opposite first surface (surface 202) and a second surface (surface 204); a first conductive layer ( The conductive layer 206a~e is disposed on a portion of the first surface of the first dielectric layer and the first surface of the second region, wherein the first conductive layer comprises: a first segment a portion (the conductive portion 206a/206c) disposed on the first surface of the first region of the first dielectric layer, having a fixed first line width (line width W 2 ); a second a segment portion (the conductive segment portion 206b) disposed on the first surface of the second region of the first dielectric layer and having a fixed second line width (line width W 3 ), wherein the second portion The line width is greater than the first line width; a third portion (the conductive portion 206c) is disposed on the first surface of the first region of the first dielectric layer, and has a fixed third line width (W 4), where The third line width is smaller than the second line width and equal or not equal to the first line width; and a fourth segment portion (the conductive segment portion 206d/206e) is disposed in the first region and the second portion of the first dielectric layer Above the first surface in the region and physically contacting the first segment and the second segment, and the second segment and the third segment, wherein the fourth segment has a non-fixed one of the fourth line width and a fifth line width, and the fourth line width is not less than the first line width (line width W 2 ) and not greater than the second line width (line width W 3 ), and the fifth line width is not greater than the second a line width (line width W 3 ) and equal or unequal to the first line width (line width W 1 ); and a second dielectric layer (dielectric layer 185/180) disposed on the first dielectric layer The first conductive portion of the first conductive layer partially covers the first conductive portion of the first conductive layer and completely covers the first conductive portion of the first conductive layer, or is disposed on the first conductive layer Above the second surface of the first region of the electrical layer.
於其他實施例中,更包括依序設置於該第一介電層之該第一區(區域A)內之該第二表面上之一第三導電層(導電層208)與一第三介電層(介電層195)。In other embodiments, the method further includes a third conductive layer (conductive layer 208) and a third dielectric disposed on the second surface in the first region (region A) of the first dielectric layer. Electrical layer (dielectric layer 195).
於其他實施例中,該第一介電層之該第一區(區域A或C)例如為一硬板元件區(區域A)或一軟板元件區(區域C),而該第一介電層之該第二區(區域B)例如為一轉板彎折區。In other embodiments, the first region (region A or C) of the first dielectric layer is, for example, a hard board component region (region A) or a soft board component region (region C), and the first interface The second zone (region B) of the electrical layer is, for example, a turn plate bending zone.
於如第16圖所示之本發明的印刷電路基板的實施情形中,主要利用固定訊號導線之厚度條件下藉由改變位於不同區域內之訊號導線(至少由導電段部206a/c與206b以及206d/e等導電段部所組成)的線寬而調整於區域A/C與區域B內等不同區域內之訊號導線部分之間特性阻抗,藉以使得設置於上述印刷電路基板內之區域A、B及C等多個區域內之訊號導線之各部份的特性阻抗表現相近,使之不受到各區域內之介電層膜層數量不同或各區域內使用之介電層材料的介電常數的不同而影響。In the implementation of the printed circuit board of the present invention as shown in FIG. 16, the signal wires located in different regions are changed by using the thickness of the fixed signal wires (at least by the conductive segments 206a/c and 206b and The line width of the conductive segment portion such as 206d/e is adjusted to the characteristic impedance between the signal conductor portions in different regions such as the region A/C and the region B, so that the region A disposed in the printed circuit board is The characteristic impedances of the signal conductors in the B and C regions are similar, so that they are not affected by the difference in the number of dielectric layers in each region or the dielectric constant of the dielectric layer materials used in each region. The difference is different.
於上述實施例中,位於各區域A、B與C內構成訊號導線之各導電段部的線寬則可視各區域A、B與C內之介電層之數量及/或介電層使用材料之介電常數並參照前述公式(1)進行調整而並不以上述實施例內之實施情形而加以限定本發明。In the above embodiment, the line widths of the conductive segments forming the signal wires in the respective regions A, B and C can be regarded as the number of dielectric layers in the regions A, B and C and/or the materials used for the dielectric layer. The dielectric constant is adjusted with reference to the above formula (1), and the present invention is not limited by the embodiments in the above embodiments.
雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此項技藝者,在不脫離本發明之精神和範圍內,當可作更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the invention may be modified and retouched without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application attached.
100、200...介電層100, 200. . . Dielectric layer
102、104、202、204...介電層之表面102, 104, 202, 204. . . Surface of the dielectric layer
106、116、120...導電層106, 116, 120. . . Conductive layer
106’、116’、120’...經圖案化之導電層106', 116', 120'. . . Patterned conductive layer
108...導電層108. . . Conductive layer
110、118...光阻層110, 118. . . Photoresist layer
110a、118a...未經曝光之光阻層110a, 118a. . . Unexposed photoresist layer
110b、118b...經曝光之光阻層110b, 118b. . . Exposured photoresist layer
112、120...光罩112, 120. . . Mask
112a、120a...遮光區112a, 120a. . . Shading area
112b、120b...透光區112b, 120b. . . Light transmission area
114、122...微影程序114, 122. . . Microfilm program
150...訊號導線之一部份150. . . One part of the signal wire
160...訊號導線之一部份160. . . One part of the signal wire
170...介電層170. . . Dielectric layer
172...黏著層172. . . Adhesive layer
180、185、189、195、199...介電層180, 185, 189, 195, 199. . . Dielectric layer
187、197...導電層187, 197. . . Conductive layer
200...介電層200. . . Dielectric layer
202、204...介電層之表面202, 204. . . Surface of the dielectric layer
206、208...導電層206, 208. . . Conductive layer
206a、206b、206c、206d、206e...訊號導線之導電段部206a, 206b, 206c, 206d, 206e. . . Conductive section of the signal conductor
A、B、C...區域A, B, C. . . region
T1 ...導電層106之厚度T 1 . . . Thickness of conductive layer 106
T2 ...導電層108之厚度T 2 . . . Thickness of conductive layer 108
T3 ...導電層116之厚度T 3 . . . Thickness of conductive layer 116
T4 ...導電層120之厚度T 4 . . . Thickness of conductive layer 120
T5 ...導電層187之厚度T 5 . . . Thickness of conductive layer 187
T6 ...導電層197之厚度T 6 . . . Thickness of conductive layer 197
T7 ...導電層202之厚度T 7 . . . Thickness of conductive layer 202
T8 ...導電層208之厚度T 8 . . . Thickness of conductive layer 208
W1 ...訊號導線之線寬W 1 . . . Line width of signal wire
W2 、W3 、W4 ...訊號導線之導電段部之線寬W 2 , W 3 , W 4 . . . Line width of the conductive segment of the signal wire
第1-8、10-11圖為一系列剖面圖,顯示了依據本發明一實施例之可調整特性阻抗之印刷電路基板的製作;1-8, 10-11 are a series of cross-sectional views showing the fabrication of a printed circuit board with adjustable characteristic impedance in accordance with an embodiment of the present invention;
第9圖為一示意圖,顯示了如第8圖所示結構之上視情形;Figure 9 is a schematic view showing the top view of the structure as shown in Figure 8;
第12-14、16圖為一系列剖面圖,顯示了依據本發明另一實施例之可調整特性阻抗之印刷電路基板的製作;以及12-14, 16 are a series of cross-sectional views showing the fabrication of a printed circuit board with adjustable characteristic impedance in accordance with another embodiment of the present invention;
第15圖為一示意圖,顯示了如第14圖所示結構之上視情形。Fig. 15 is a schematic view showing the top view of the structure as shown in Fig. 14.
100...介電層100. . . Dielectric layer
106’、116’、120’...經圖案化之導電層106', 116', 120'. . . Patterned conductive layer
108...導電層108. . . Conductive layer
150...訊號導線之一部份150. . . One part of the signal wire
160...訊號導線之一部份160. . . One part of the signal wire
170...介電層170. . . Dielectric layer
172...黏著層172. . . Adhesive layer
180、185、189、195、199...介電層180, 185, 189, 195, 199. . . Dielectric layer
187、197...導電層187, 197. . . Conductive layer
A、B、C...區域A, B, C. . . region
T5 ...導電層187之厚度T 5 . . . Thickness of conductive layer 187
T6 ...導電層197之厚度T 6 . . . Thickness of conductive layer 197
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CN1574026A (en) * | 2003-06-03 | 2005-02-02 | 日东电工株式会社 | Wired circuit board |
JP2008064780A (en) * | 2006-09-04 | 2008-03-21 | Funai Electric Co Ltd | Flat panel display and printed wiring board |
JP2008166357A (en) * | 2006-12-27 | 2008-07-17 | Toshiba Corp | Printed circuit board |
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CN1574026A (en) * | 2003-06-03 | 2005-02-02 | 日东电工株式会社 | Wired circuit board |
JP2008064780A (en) * | 2006-09-04 | 2008-03-21 | Funai Electric Co Ltd | Flat panel display and printed wiring board |
JP2008166357A (en) * | 2006-12-27 | 2008-07-17 | Toshiba Corp | Printed circuit board |
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