TWI389963B - A hardened resin composition, a hardened film and a laminate - Google Patents

A hardened resin composition, a hardened film and a laminate Download PDF

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TWI389963B
TWI389963B TW094140132A TW94140132A TWI389963B TW I389963 B TWI389963 B TW I389963B TW 094140132 A TW094140132 A TW 094140132A TW 94140132 A TW94140132 A TW 94140132A TW I389963 B TWI389963 B TW I389963B
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refractive index
layer
metal oxide
index layer
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TW200628537A (en
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Hiroomi Shimomura
Mitsunobu Doimoto
Ryosuke Iinuma
Hideaki Takase
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Jsr Corp
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/34Applying different liquids or other fluent materials simultaneously
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/10Esters; Ether-esters
    • C08K5/101Esters; Ether-esters of monocarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2227Oxides; Hydroxides of metals of aluminium
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2237Oxides; Hydroxides of metals of titanium
    • C08K2003/2241Titanium dioxide
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2244Oxides; Hydroxides of metals of zirconium
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/002Physical properties
    • C08K2201/005Additives being defined by their particle size in general

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
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  • Surface Treatment Of Optical Elements (AREA)

Description

硬化性樹脂組成物、由其所成硬化膜及層合體Curable resin composition, cured film and laminate thereof

本發明係有關硬化性樹脂組成物及由其所構成之硬化膜、層合體的製造方法及由其所得之層合體,特別是由一之塗膜可形成具有低折射率層與高折射率層等任意之連續二層以上之層所構成之硬化膜的硬化性樹脂組成物及由1之塗膜形成2以上之層之層合體的製造方法。The present invention relates to a curable resin composition, a cured film comprising the same, a method for producing the laminate, and a laminate obtained therefrom, and in particular, a coating film can be formed to have a low refractive index layer and a high refractive index layer. A method for producing a laminate of two or more layers of a curable resin composition of a cured film composed of a layer of two or more layers and a coating film of two or more layers.

目前隨著多媒體發達,而開發各種顯示裝置(display裝置)。各種顯示裝置中,特別是主要以攜帶用之室外使用的裝置,並且逐漸重視其辨視性之提升,即使大型顯示裝置,消費者也要求進一步的清晰度,此事項已成為技術課題。At present, various display devices (display devices) have been developed as multimedia has developed. Among various display devices, in particular, devices that are mainly used for outdoor use, and gradually pay attention to the improvement of their visibility, even for large display devices, consumers are demanding further sharpness, and this has become a technical issue.

液晶顯示面板、冷陰極線管面板、電漿顯示器等各種顯示面板,為了防止外光之反射,提高畫質,而需要含有由低折射率性、耐擦傷性、塗佈性及耐久性優異之硬化物所構成之低折射率層的抗反射膜。這些顯示面板為了除去附著之指紋、塵埃等,其表面常以含浸酒精等之紗布擦拭,而要求耐擦傷性。特別是液晶顯示面板,其抗反射膜係與偏光板貼合的狀態設置於液晶單元上。基材可使用三乙醯基纖維素等,使用這種基材之抗反射膜為了增加貼合時之密著性,通常需要使用鹼水溶液皂化。因此,在液晶顯示面板之用途,需要耐久性,特別是耐鹼性優之抗反射膜。Various display panels, such as a liquid crystal display panel, a cold cathode tube panel, and a plasma display, need to contain hardening which is excellent in low refractive index, scratch resistance, coating property, and durability in order to prevent reflection of external light and improve image quality. An antireflection film of a low refractive index layer composed of a substance. In order to remove the attached fingerprints, dust, and the like, these display panels are often wiped with a gauze impregnated with alcohol or the like, and are required to have scratch resistance. In particular, in the liquid crystal display panel, the antireflection film is placed on the liquid crystal cell in a state in which it is bonded to the polarizing plate. As the substrate, triacetyl cellulose or the like can be used, and in order to increase the adhesion at the time of bonding, the antireflection film using such a substrate usually needs to be saponified with an aqueous alkali solution. Therefore, in the use of a liquid crystal display panel, durability, particularly an alkali-resistant antireflection film, is required.

以往提升顯示裝置辨視性的方法之一係將由低折射率材料所構成之抗反射膜被覆於顯示裝置之基板上,形成抗反射膜之方法,例如以蒸鍍法形成氟化合物薄膜之方法已為人知。但是近年來,以液晶顯示裝置為中心,要求低成本,即使對大型顯示裝置也要求可形成抗反射膜的技術。但是使用蒸鍍法時,對大面積基板係很難以高效率形成均勻抗反射膜,且需要真空裝置,因此不易降低成本。In the past, one of the methods for improving the visibility of a display device is a method in which an antireflection film composed of a low refractive index material is coated on a substrate of a display device to form an antireflection film, for example, a method of forming a fluorine compound film by vapor deposition has been used. Known. However, in recent years, a liquid crystal display device is mainly required to have a low cost, and even a large-sized display device is required to form an anti-reflection film. However, when the vapor deposition method is used, it is difficult to form a uniform anti-reflection film with high efficiency for a large-area substrate, and a vacuum device is required, so that it is difficult to reduce the cost.

有鑑於此問題,因而檢討將折射率較低之氟系聚合物溶解於有機溶劑調製液狀組成物,將此組成物塗佈於基板表面形成抗反射膜的方法。例如提案將氟化烷基矽烷塗佈於基板表面(例如參照專利文獻1及專利文獻2)。另外提案塗佈具有特定構造之氟系聚合物的方法(例如參考專利文獻3)。In view of this problem, a method in which a fluorine-based polymer having a relatively low refractive index is dissolved in an organic solvent to prepare a liquid composition, and the composition is applied onto a surface of a substrate to form an antireflection film is reviewed. For example, it is proposed to apply a fluorinated alkyl decane to the surface of a substrate (see, for example, Patent Document 1 and Patent Document 2). Further, a method of applying a fluorine-based polymer having a specific structure is proposed (for example, refer to Patent Document 3).

抗反射膜之低折射率層用材料例如有含有含羥基之含氟聚合物之氟樹脂系塗料,已揭示於專利文獻4、專利文獻5及專利文獻6等。但是此種氟樹脂系塗料為了使塗膜硬化,必須將含羥基之含氟聚合物與三聚氰胺樹脂等硬化劑在酸觸媒下,加熱、交聯,因加熱條件而有硬化時間會變得過長,可使用之基材種類被限定的問題。又,關於所得之塗膜,即使耐候性優異,但會有缺乏耐擦傷性或耐久性的問題。The material for the low refractive index layer of the antireflection film is, for example, a fluororesin-based coating material containing a fluoropolymer containing a hydroxyl group, and is disclosed in Patent Document 4, Patent Document 5, and Patent Document 6. However, in order to cure the coating film, the fluororesin-based coating material must be heated and crosslinked by a curing agent such as a hydroxyl group-containing fluoropolymer and a melamine resin under an acid catalyst, and the curing time may become excessive due to heating conditions. Long, the type of substrate that can be used is limited. Further, the obtained coating film is excellent in weather resistance, but has a problem of lack of scratch resistance or durability.

因此,為了解決上述問題點,專利文獻7提案將具有至少1個異氰酸酯基與至少1個之加成聚合性不飽和基之含異氰酸酯基之不飽和化合物與含羥基之含氟聚合物,以異氰酸酯基之數/羥基之數之比為0.01~1.0之比率反應所得之含有含不飽和基之含氟乙烯聚合物的塗料用組成物。Therefore, in order to solve the above problems, Patent Document 7 proposes an isocyanate group-containing unsaturated compound having at least one isocyanate group and at least one addition polymerizable unsaturated group, and a hydroxyl group-containing fluoropolymer, and isocyanate. The coating composition containing the unsaturated group-containing fluorine-containing ethylene polymer obtained by reacting the ratio of the number of bases to the number of hydroxyl groups is from 0.01 to 1.0.

專利文獻1:日本特開昭61-40845號公報專利文獻2:日本特公平6-98703號公報專利文獻3:日本特開平6-115023號公報專利文獻4:日本特開昭57-34107號公報專利文獻5:日本特開昭59-189108號公報專利文獻6:日本特開昭60-67518號公報專利文獻7:日本特公平6-35559號公報Japanese Unexamined Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei.

這些以往之抗反射膜係通常在基材上形成不同折射率之層、防靜電層、硬塗層等之層合體。以往之製造方法係重覆分別將各層塗佈於基材上的步驟。換言之,以往之氟系材料所成之抗反射膜係在基材上所設置之高折射率層上必須形成由氟系材料所成之低折射率層,必須分別設置形成這些層之塗佈步驟。These conventional antireflection films generally form a laminate of a layer having a different refractive index, an antistatic layer, a hard coat layer or the like on a substrate. The conventional manufacturing method is a step of repeatedly applying each layer to a substrate. In other words, in the antireflection film formed by the conventional fluorine-based material, a low refractive index layer made of a fluorine-based material must be formed on the high refractive index layer provided on the substrate, and the coating step of forming these layers must be separately provided. .

又,表層之低折射率層的耐擦傷性不足。Further, the low refractive index layer of the surface layer is insufficient in scratch resistance.

本發明係以上述狀況為背景,其目的係提供可以高效率製造低折射率層與高折射率層,且可以紫外線硬化之硬化性樹脂組成物。又,本發明之其他目的係提供透明性高,對基材之密著性高,具有優異之耐擦傷性及耐藥品性,且耐環境性優的硬化膜。The present invention has been made in view of the above circumstances, and an object thereof is to provide a curable resin composition which can produce a low refractive index layer and a high refractive index layer with high efficiency and which can be cured by ultraviolet rays. Further, another object of the present invention is to provide a cured film which has high transparency, high adhesion to a substrate, excellent scratch resistance and chemical resistance, and excellent environmental resistance.

本發明係提供由塗佈組成物所得之1之塗膜可形成2以上之層之層合體之製造方法。本發明之另一目的係提抗反射效果良好之層合體之製造方法及藉由該方法所得之層合體。本發明之另一目的係提供對基材之密著性優異,耐擦傷性高之層合體的製造方法及藉由該方法所得之層合體。The present invention provides a method for producing a laminate in which a coating film obtained by coating a composition can form a layer of 2 or more. Another object of the present invention is to provide a method for producing a laminate having excellent antireflection effect and a laminate obtained by the method. Another object of the present invention is to provide a method for producing a laminate excellent in adhesion to a substrate and having high scratch resistance, and a laminate obtained by the method.

〔發明之揭示〕[disclosure of invention]

為了達成上述目的,本發明人等精心檢討後發現將含有兩種不同粒徑之金屬氧化物粒子的組成物塗佈於以紫外線照射產生硬化之含有乙烯性不飽和基之含氟聚合物上,經乾燥時,分離成該金屬氧化物粒子高密度存在之層及金屬氧化物粒子幾乎不存在或低密度存在之層之二層。再以紫外線照射硬化所得之硬化膜係耐擦傷性、耐藥品性、透明性優,且耐候性佳,遂完成本發明。In order to achieve the above object, the present inventors have carefully examined and found that a composition containing metal oxide particles having two different particle diameters is applied to a fluorine-containing polymer containing an ethylenically unsaturated group which is cured by ultraviolet irradiation. When dried, the layer in which the metal oxide particles are present at a high density and the second layer in which the metal oxide particles are hardly present or present in a low density are separated. Further, the cured film obtained by curing by ultraviolet irradiation is excellent in scratch resistance, chemical resistance, transparency, and weather resistance, and the present invention has been completed.

依據本發明時,可提供以下之硬化性樹脂組成物、該組成物經硬化所得之硬化膜、層合體之製造方法及藉由該方法所得之層合體。According to the present invention, the following curable resin composition, a cured film obtained by curing the composition, a method for producing the laminate, and a laminate obtained by the method can be provided.

1.一種硬化性樹脂組成物,其特徵係含有下述成份:(A1)鍵結具有聚合性不飽和基之有機化合物(Ab)所成之數平均粒徑1nm以上,未達40nm的金屬氧化物粒子(以下稱為「(A1)之金屬氧化物粒子」)(A2)數平均粒徑40nm以上,200nm以下的金屬氧化物粒子(以下稱為「(A2)之金屬氧化物粒子」)(B)含有乙烯性不飽和基之含氟聚合物(C)(B)含有乙烯性不飽和基之含氟聚合物之溶解性高之一種或兩種以上的溶劑(以下稱為「(C)快速揮發溶劑」)(D)(A1)及(A2)之金屬氧化物粒子之分散安定性高,且與(C)快速揮發溶劑具有相溶特性之一種或兩種以上的溶劑(以下稱為「(D)緩慢揮發溶劑」),且(C)快速揮發溶劑之相對蒸發速度大於(D)緩慢揮發溶劑之相對蒸發速度。A curable resin composition characterized by comprising (A1) a metal oxide having a number average particle diameter of 1 nm or more and an underlying organic compound (Ab) bonded to a polymerizable unsaturated group of less than 40 nm (A2) metal oxide particles having a number average particle diameter of 40 nm or more and 200 nm or less (hereinafter referred to as "metal oxide particles of (A2)") (hereinafter referred to as "metal oxide particles of (A1)") B) Fluorinated polymer containing an ethylenically unsaturated group (C) (B) One or two or more solvents having a high solubility of a fluorine-containing polymer containing an ethylenically unsaturated group (hereinafter referred to as "(C) (1) a solvent which has high dispersion stability of metal oxide particles of (D) (A1) and (A2) and which has compatibility characteristics with (C) a rapidly volatile solvent (hereinafter referred to as "(D) Slowly evaporating solvent"), and (C) the relative evaporation rate of the rapidly evaporating solvent is greater than (D) the relative evaporation rate of the slowly evaporating solvent.

2.如上述第1項之硬化性樹脂組成物,其中(C)快速揮發溶劑係(A1)及(A2)之金屬氧化物粒子之分散安定性低之一種或兩種以上的溶劑,(D)緩慢揮發溶劑係(B)含有乙烯性不飽和基之含氟聚合物之溶解性低之一種或兩種以上的溶劑。2. The curable resin composition according to the above item 1, wherein (C) one or two or more solvents having low dispersion stability of the metal oxide particles of the fast-releasing solvent systems (A1) and (A2), (D) The slow-releasing solvent system (B) one or two or more solvents having low solubility of the fluorine-containing polymer containing an ethylenically unsaturated group.

3.如上述第1或2項之硬化性樹脂組成物,其中該(A1)之金屬氧化物粒子為選自鋁、鋯、鈦、鋅、鍺、銦、錫、銻及鈰所成群之至少一種元素的氧化物粒子。3. The curable resin composition according to Item 1 or 2 above, wherein the metal oxide particles of (A1) are selected from the group consisting of aluminum, zirconium, titanium, zinc, bismuth, indium, tin, antimony and bismuth. An oxide particle of at least one element.

4.如上述第1~3項中任一項之硬化性樹脂組成物,其中該(A2)之金屬氧化物粒子為以二氧化矽為主成分的粒子。4. The curable resin composition according to any one of the items 1 to 3, wherein the metal oxide particles of (A2) are particles containing cerium oxide as a main component.

5.如上述第1~4項中任一項之硬化性樹脂組成物,其中該(A2)之金屬氧化物粒子與該具有聚合性不飽和基的有機化合物(Ab)鍵結。5. The curable resin composition according to any one of the above items 1 to 4, wherein the metal oxide particles of (A2) are bonded to the organic compound (Ab) having a polymerizable unsaturated group.

6.如上述第1~5項中任一項之硬化性樹脂組成物,其中該有機化合物(Ab)除了聚合性不飽和基,尚具有下述式(A-1)表示之基, 〔式中,U係NH、O(氧原子)或S(硫原子),V為O或S〕。6. The curable resin composition according to any one of the above items 1 to 5, wherein the organic compound (Ab) has a group represented by the following formula (A-1) in addition to the polymerizable unsaturated group. [In the formula, U is NH, O (oxygen atom) or S (sulfur atom), and V is O or S].

7.如上述第1~6項中任一項之硬化性樹脂組成物,其中該有機化合物(Ab)為分子內具有矽烷醇基之化合物或藉由水解生成矽烷醇基之化合物。7. The curable resin composition according to any one of items 1 to 6, wherein the organic compound (Ab) is a compound having a stanol group in the molecule or a compound which forms a stanol group by hydrolysis.

8.如上述第1~7項中任一項之硬化性樹脂組成物,其中該(B)含有乙烯性不飽和基之含氟聚合物為具有1個異氰酸酯基與至少1個乙烯性不飽和基之化合物(B-1)與含羥基之含氟聚合物(B-2)反應所得者。The curable resin composition according to any one of the above items 1 to 7, wherein the (B) fluoropolymer containing an ethylenically unsaturated group has one isocyanate group and at least one ethylenic unsaturated group. The compound (B-1) is reacted with a hydroxyl group-containing fluoropolymer (B-2).

9.如上述第8項之硬化性樹脂組成物,其中該含羥基之含氟聚合物(B-2)為含有下述構造單位(a)20~70莫耳%、(b)10~70莫耳%及(c)5~70莫耳%所成,且凝膠滲透色譜測定之聚苯乙烯換算數平均分子量為5,000~500,000,(a)下述一般式(1)表示之構造單位(b)下述一般式(2)表示之構造單位(c)下述一般式(3)表示之構造單位 〔式中,R1 係氟原子、氟烷基、或-OR2 表示之基(R2 為烷基或氟烷基)〕 〔式中,R3 係氫原子或甲基,R4 係烷基、-(CH2 )X -OR5 或-OCOR5 表示之基(R5 為烷基、或環氧丙基,x為0或1之數)、羧基或烷氧基羰基〕 〔式中,R6 係氫原子或甲基,R7 係氫原子或羥烷基,v為0或1之數〕。9. The curable resin composition according to item 8, wherein the hydroxyl group-containing fluoropolymer (B-2) contains the following structural unit (a) 20 to 70 mol%, and (b) 10 to 70 Mohr% and (c) 5 to 70 mol%, and the polystyrene-equivalent number average molecular weight measured by gel permeation chromatography is 5,000 to 500,000, (a) the structural unit represented by the following general formula (1) ( b) the structural unit represented by the following general formula (2) (c) the structural unit represented by the following general formula (3) Wherein R 1 is a fluorine atom, a fluoroalkyl group or a group represented by -OR 2 (R 2 is an alkyl group or a fluoroalkyl group)] Wherein R 3 is a hydrogen atom or a methyl group, R 4 is an alkyl group, a group represented by —(CH 2 ) X —OR 5 or —OCOR 5 (R 5 is an alkyl group or an epoxypropyl group, and x is 0 or 1), carboxyl or alkoxycarbonyl] Wherein R 6 is a hydrogen atom or a methyl group, R 7 is a hydrogen atom or a hydroxyalkyl group, and v is a number of 0 or 1.

10.如上述第8或9項之硬化性樹脂組成物,其中該含羥基之含氟聚合物(B-2)尚含有來自含偶氮基之聚矽氧烷化合物之下述構造單位(d)0.1~10莫耳%,(d)下述一般式(4)表示之構造單位 〔式中,R8 及R9 可相同或不相同之氫原子、烷基、鹵化烷基或芳基〕。10. The curable resin composition according to item 8 or 9, wherein the hydroxyl group-containing fluoropolymer (B-2) further contains the following structural unit derived from the azo group-containing polyoxosiloxane compound (d) ) 0.1 to 10 mol %, (d) the structural unit represented by the following general formula (4) [wherein R 8 and R 9 may be the same or different hydrogen atom, alkyl group, halogenated alkyl group or aryl group].

11.如上述第10項之硬化性樹脂組成物,其中該含羥基之含氟聚合物(B-2)含有該構造單位(d)作為下述構造單位(e)之一部份,(e)下述一般式(5)表示之構造單位 〔式中,R1 0 ~R1 3 為氫原子、烷基或氰基,R1 4 ~R1 7 為氫原子或烷基,p、q係1~6之數,s、t係0~6之數,y為1~200之數〕。11. The curable resin composition according to item 10 above, wherein the hydroxyl group-containing fluoropolymer (B-2) contains the structural unit (d) as a part of the following structural unit (e), (e) The structural unit represented by the following general formula (5) Wherein R 1 0 to R 1 3 are a hydrogen atom, an alkyl group or a cyano group, R 1 4 to R 1 7 are a hydrogen atom or an alkyl group, p, q are a number from 1 to 6, and s, t are 0. The number of ~6, y is the number of 1~200].

12.如上述第8~11項中任一項之硬化性樹脂組成物,其中該含羥基之含氟聚合物(B-2)尚含有下述構造單位(f)0.1~5莫耳%,(f)下述一般式(6)表示之構造單位 〔式中,R1 8 具有乳化作用之基〕。The curable resin composition according to any one of the items 8 to 11, wherein the hydroxyl group-containing fluoropolymer (B-2) further contains the following structural unit (f) of 0.1 to 5 mol%, (f) The structural unit represented by the following general formula (6) [wherein R 1 8 has an emulsification group].

13.如上述第8~12項中任一項之硬化性樹脂組成物,其中該化合物(B-1)為2-(甲基)丙烯醯氧基乙基異氰酸酯。The curable resin composition according to any one of the items 8 to 12, wherein the compound (B-1) is 2-(meth)acryloxyethyl isocyanate.

14.如上述第1~13項中任一項之硬化性樹脂組成物,其中尚含有成分(E)含有至少2個以上之(甲基)丙烯醯基之多官能(甲基)丙烯酸酯化合物及/或含有至少1個以上之(甲基)丙烯醯基之含氟(甲基)丙烯酸酯化合物。The curable resin composition according to any one of the above items 1 to 13, which further comprises a polyfunctional (meth) acrylate compound containing at least two (meth) acrylonitrile groups of component (E). And/or a fluorine-containing (meth) acrylate compound containing at least one or more (meth) acrylonitrile groups.

15.如上述第1~14項中任一項之硬化性樹脂組成物,其中尚含有成分(F)自由基聚合起始劑。The curable resin composition according to any one of the above items 1 to 14, which further comprises a component (F) radical polymerization initiator.

16.如上述第1~15項中任一項之硬化性樹脂組成物,其係紫外線硬化性。The curable resin composition according to any one of items 1 to 15, which is an ultraviolet curable property.

17.一種硬化膜,其特徵係使上述第1~16項中任一項之硬化性樹脂組成物硬化所得,具有2層以上之多層構造。A cured film obtained by curing the curable resin composition according to any one of the above items 1 to 16 and having a multilayer structure of two or more layers.

18.如上述第17項之硬化膜,其係含有由(A1)及(A2)之金屬氧化物粒子高密度存在之1以上的層及(A1)及(A2)之金屬氧化物粒子實質上不存在之1以下的層所構成之二層以上的層構造。18. The cured film according to item 17, wherein the layer containing one or more of the metal oxide particles of (A1) and (A2) and the metal oxide particles of (A1) and (A2) are substantially A layer structure of two or more layers composed of a layer having no or less than one layer.

19.一種層合體的製造方法,其係具有基材與在其上之多層構造之層合體的製造方法,其特徵係將上述第1~16項中任一項之硬化性樹脂組成物塗佈於該基材或基材上所形成之層上形成塗膜,使溶媒由此1之塗膜蒸發形成2以上的層。A method for producing a laminate comprising a substrate and a laminate having a multilayer structure thereon, characterized in that the curable resin composition according to any one of items 1 to 16 is coated. A coating film is formed on the layer formed on the substrate or the substrate, and the coating film of the solvent is evaporated to form a layer of 2 or more.

20.如上述第19項之層合體的製造方法,其中該2以上之層的各層為(A1)及/或(A2)之金屬氧化物粒子高密度存在的層或(A1)及(A2)之金屬氧化物粒子實質上不存在的層,至少一層為(A1)及/或(A2)之金屬氧化物粒子高密度存在的層。20. The method for producing a laminate according to the above item 19, wherein each of the two or more layers is a layer having a high density of metal oxide particles of (A1) and/or (A2) or (A1) and (A2) At least one of the layers in which the metal oxide particles are substantially absent is a layer in which the metal oxide particles of (A1) and/or (A2) are present at a high density.

21.如上述第20項之層合體的製造方法,其中該2以上的層為2層。The method for producing a laminate according to the above item 20, wherein the two or more layers are two layers.

22.如上述第19~21項中任一項之層合體的製造方法,其中進一步使該2以上的層照射輻射線產生硬化。The method for producing a laminate according to any one of the items 19 to 21, wherein the layer of the two or more layers is further irradiated with radiation to be cured.

23.如上述第19~22項中任一項之層合體的製造方法,其中層合體為光學用零件。The method for producing a laminate according to any one of the items 19 to 22, wherein the laminate is an optical component.

24.如上述第19~22項中任一項之層合體的製造方法,其中層合體為抗反射膜。The method for producing a laminate according to any one of the items 19 to 22, wherein the laminate is an antireflection film.

25.如上述第21項之層合體的製造方法,其中該層合體為在基材上,至少高折射率層及低折射率層自靠近基材側起依此順序層合的抗反射膜,上述第21項之2層為由高折射率層及低折射率層所成。[Claim 25] The method for producing a laminate according to the above item 21, wherein the laminate is an antireflection film which is laminated on the substrate at least the high refractive index layer and the low refractive index layer from the substrate side in this order, The two layers of the above item 21 are formed of a high refractive index layer and a low refractive index layer.

26.如上述第25項之層合體的製造方法,其中低折射率層之589nm之折射率為1.20~1.55,高折射率層之589nm之折射率為1.50~2.20,且比低折射率層之折射率高。26. The method for producing a laminate according to the above item 25, wherein the low refractive index layer has a refractive index of 1.20 to 1.55 at 589 nm, and the high refractive index layer has a refractive index of 1.50 to 2.20 at 589 nm, and is lower than the low refractive index layer. The refractive index is high.

27.如上述第21項之層合體的製造方法,其中該層合體為在基材上,至少中折射率層、高折射率層及低折射率層自靠近基材側起依此順序層合之抗反射膜,上述第21項之2層係由高折射率層及低折射率層所成。[27] The method for producing a laminate according to the above item 21, wherein the laminate is on the substrate, and at least the medium refractive index layer, the high refractive index layer, and the low refractive index layer are laminated in this order from the side closer to the substrate. In the antireflection film, the two layers of the above item 21 are formed of a high refractive index layer and a low refractive index layer.

28.如上述第27項之層合體的製造方法,其中低折射率層之589nm之折射率為1.20~1.55,中折射率層之589nm之折射率為1.50~1.90,且比低折射率層之折射率高,高折射率層之589nm之折射率為1.51~2.20,且比中折射率層之折射率高。28. The method for producing a laminate according to the above item 27, wherein the low refractive index layer has a refractive index of 1.20 to 1.55 at 589 nm, and the medium refractive index layer has a refractive index of 1.50 to 1.90 at 589 nm, and is lower than the low refractive index layer. The refractive index is high, and the refractive index of the high refractive index layer at 589 nm is 1.51 to 2.20, and is higher than the refractive index of the medium refractive index layer.

29.如上述第25~28項中任一項之層合層的製造方法,其係更進一步於基材上形成硬塗層及/或防靜電層。The method for producing a laminate layer according to any one of the items 25 to 28, further comprising forming a hard coat layer and/or an antistatic layer on the substrate.

30.一種層合體,其特徵係以上述第19~29項中任一項之層合體的製造方法所製造。A laminate produced by the method for producing a laminate according to any one of the items 19 to 29 above.

本發明之硬化性樹脂組成物經硬化所得之硬化膜係,例如塗佈本組成物所得之1之塗膜形成低折射率層及高折射率層等具有任意二層以上,因此能簡化具有多層構造之硬化膜的製造步驟。The cured film obtained by curing the curable resin composition of the present invention, for example, the coating film obtained by applying the composition, has a low refractive index layer and a high refractive index layer, and has two or more layers. The manufacturing steps of the structured cured film.

本發明之硬化性樹脂組成物不必須藉由水解熱之硬化反應,因此可提供耐環境性(耐濕熱性等)優之硬化膜。Since the curable resin composition of the present invention does not have to undergo a hardening reaction by hydrolysis heat, it can provide a cured film excellent in environmental resistance (such as moist heat resistance).

本發明之硬化性樹脂組成物經硬化所成之硬化膜係耐擦傷性、耐藥品性、透明性優,本發明之硬化性樹脂組成物特別適用於形成抗反射膜、選擇透射膜濾光片等光學材料,又利用含氟量較高之特徵也可適用於對需要耐氣候性之基材的塗料用材料、耐氣候性薄膜用材料、塗層用材料及其他材料。而且,該硬化膜係對基材之密著性優異,耐擦傷性高,能賦予良好的抗反射效果,因此,極適合作為抗反射膜使用,用於各種顯示裝置時,可提升其辨視性。The cured film of the curable resin composition of the present invention is excellent in scratch resistance, chemical resistance, and transparency. The curable resin composition of the present invention is particularly suitable for forming an antireflection film and a selective transmission film filter. The optical material and the high fluorine content can also be applied to coating materials, weather resistant film materials, coating materials, and other materials for substrates requiring weather resistance. Further, the cured film is excellent in adhesion to a substrate, has high scratch resistance, and can provide a good antireflection effect. Therefore, it is suitably used as an antireflection film, and can be used for various display devices to enhance its visibility. Sex.

本發明之層合體之製造方法係可由塗佈組成物所得之1之塗膜形成2以上之層,因此能簡化具有多層構造之層合體的製造步驟。因此,本發明之層合體的製造方法特別適用於形成抗反射膜、光學薄膜等光學材料。又本發明之層合體係利用含氟量較高之特徵,可適用於對需要耐氣候性之基材的塗料、耐氣候性薄膜、塗層及其他。而且該層合體係藉由在最外層(距離基材最遠之層)設置低折射率層,賦予良好之抗反射效果。依據本發明時,可得到對基材之密著性優異、耐擦傷性高的層合體。因此,本發明之層合體極適合作為抗反射膜用,而使用於各種顯示裝置可提升其辨識性。In the method for producing a laminate of the present invention, a coating film of 1 obtained from the coating composition can be formed into a layer of 2 or more, so that the production steps of the laminate having a multilayer structure can be simplified. Therefore, the method for producing a laminate of the present invention is particularly suitable for forming an optical material such as an antireflection film or an optical film. Further, the laminate system of the present invention is characterized by a high fluorine content, and is applicable to coatings, weather resistant films, coatings, and the like which are required for weather resistant substrates. Moreover, the laminate system imparts a good antireflection effect by providing a low refractive index layer on the outermost layer (the layer farthest from the substrate). According to the present invention, a laminate excellent in adhesion to a substrate and high in scratch resistance can be obtained. Therefore, the laminate of the present invention is extremely suitable as an antireflection film, and can be used for various display devices to improve its visibility.

[實施發明之最佳型態][Best form of implementing the invention]

I.層合體及其製造方法本發明係關於具有基材,與其上之2層以上之多層構造的層合體之製造方法及藉由該方法所得之層合體。具體而言,本發明之製造方法係在基材或基材上所形成之層之上塗佈下述所定之硬化性樹脂組成物,使溶劑由所得之1之塗膜蒸發(以下使溶劑蒸發有時也稱「乾燥」)形成2以上之層。乾燥後,並非完全無溶劑之狀態亦可,在可得到硬化膜之特性的範圍內,溶劑殘餘也可。又,本發明中,可實施兩次以上由1之塗膜形成2以上之層。I. Laminate and method for producing the same The present invention relates to a method for producing a laminate having a substrate and a multilayer structure of two or more layers thereon, and a laminate obtained by the method. Specifically, in the production method of the present invention, the following curable resin composition is applied onto a layer formed on a substrate or a substrate, and the solvent is evaporated from the obtained coating film (the solvent is evaporated below). Sometimes referred to as "dry") to form a layer of 2 or more. After drying, the solvent may not be completely solvent-free, and the solvent may remain in the range in which the properties of the cured film can be obtained. Further, in the present invention, two or more layers formed of two or more coating films may be formed.

以一般方法塗佈特定之硬化性樹脂組成物,經乾燥後,分離成2以上之層。所謂2以上之層係指同時含有「(A1)及/或(A2)之金屬氧化物粒子高密度存在的層」及「(A1)及(A2)之金屬氧化物粒子實質上不存在的層」之2以上之層的情形,或僅由「(A1)及/或(A2)之金屬氧化物粒子高密度存在的層」所構成之2以上之層的情形。A specific curable resin composition is applied by a general method, and after drying, it is separated into two or more layers. The layer of 2 or more refers to a layer in which "the layer of the metal oxide particles of (A1) and/or (A2) is present at a high density" and the layer of the metal oxide particles of (A1) and (A2) does not substantially exist. In the case of a layer of 2 or more, or a layer of 2 or more layers composed of only "a layer in which metal oxide particles of (A1) and/or (A2) are present in a high density".

以下使用圖面說明「2以上之層之各層為(A1)及/或(A2)之金屬氧化物粒子高密度存在的層或(A1)及(A2)之金屬氧化物粒子實質上不存在的層,至少一層為(A1)及/或(A2)之金屬氧化物粒子高密度存在的層」。圖1A係2以上之層為「(A1)或(A2)之金屬氧化物粒子高密度存在之層1、1a」之2層的情形。圖1B係2以上之層為「(A1)或(A2)之金屬氧化物粒子高密度存在之層1、1a」的2層之情形及,「(A1)及(A2)之金屬氧化物粒子實質上不存在的層3」之3層的情形。圖1C係2以上之層為「(A1)或(A2)之金屬氧化物粒子高密度存在之層1、1a」與「(A1)及(A2)之金屬氧化物粒子實質上不存在之層3」之3層之情形。圖1D係2以上之層為「(A1)及(A2)之金屬氧化物粒子高密度存在之層1b」與「(A1)及(A2)之金屬氧化物粒子實質上不存之層3」之2層之情形。Hereinafter, the layer in which the metal oxide particles of (A1) and/or (A2) are present in a high density in each of the layers of 2 or more layers or the metal oxide particles of (A1) and (A2) are substantially absent. At least one layer of the layer is a layer in which the metal oxide particles of (A1) and/or (A2) are present at a high density. Fig. 1A shows a case where two or more layers are two layers of layers 1 and 1a in which metal oxide particles of (A1) or (A2) are present at a high density. Fig. 1B shows a case where two or more layers of the layer 2, 1a" in which the metal oxide particles of (A1) or (A2) are present at a high density, and "metal oxide particles of (A1) and (A2)" The case of three layers of the layer 3" which does not substantially exist. Fig. 1C is a layer in which two or more layers are "layers 1a and 1a" in which metal oxide particles of (A1) or (A2) are present at a high density, and metal oxide particles of "(A1) and (A2) are substantially absent. The 3rd floor of 3". In Fig. 1D, the layer of 2 or more is "layer 1b" in which the metal oxide particles of (A1) and (A2) are present at a high density and layer 3" of the metal oxide particles of (A1) and (A2) substantially not present. The situation of the 2nd floor.

紫外線硬化性樹脂組成物係含有兩種以上之金屬氧化物粒子,因此如圖1A、圖1B、圖1C所示,「金屬氧化物粒子高密度存在之層」可形成2種類以上。Since the ultraviolet curable resin composition contains two or more kinds of metal oxide particles, as shown in FIG. 1A, FIG. 1B, and FIG. 1C, "the layer in which the metal oxide particles are present at a high density" can be formed into two or more types.

「金屬氧化物粒子高密度存在之層」之「金屬氧化物粒子」係至少一種,即一種或兩種以上之「金屬氧化物粒子」。因此,「金屬氧化物粒子高密度存在之層」為可為2種以上之金屬氧化物粒子所構成(例如圖1D)。圖1D係「金屬氧化物粒子高密度存在之層1b」係由粒子X與粒子Y所構成。因粒子Y大於「金屬氧化物粒子高密度存在之層1b」之厚度,因此突出於「金屬氧化物粒子實質上不存在之層3」,此突出部份也包含於「金屬氧化物粒子高密度存在之層1b」中。The "metal oxide particles" of the "layer in which the metal oxide particles are present in a high density" are at least one type, that is, one or two or more kinds of "metal oxide particles". Therefore, the "layer in which the metal oxide particles are present at a high density" is composed of two or more kinds of metal oxide particles (for example, FIG. 1D). Fig. 1D is a layer 1b in which a high density of metal oxide particles is present, and is composed of particles X and Y. Since the particle Y is larger than the thickness of the layer 1b in which the metal oxide particles are present at a high density, it protrudes from the layer 3 in which the metal oxide particles are substantially absent, and the protruding portion is also included in the "high density of the metal oxide particles." In the layer 1b" that exists.

圖1A~1D中,「金屬氧化物粒子實質上不存在之層3」中通常不含金屬氧化物粒子,但是在不影響本發明效果之範圍內可含有少許。又,「金屬氧化物粒子高密度存在之層1、1a、1b」也同樣可含有金屬氧化物粒子以外之其他物質。In FIGS. 1A to 1D, the "layer 3 in which metal oxide particles are not substantially present" usually does not contain metal oxide particles, but may contain a small amount within a range that does not impair the effects of the present invention. Further, the "layers 1, 1a, and 1b in which the metal oxide particles are present at a high density" may contain other substances than the metal oxide particles.

硬化性樹脂組成物之塗佈法可使用公知的塗佈方法,特別是使用浸漬法、塗佈法、印刷法等各種方法。A known coating method can be used for the coating method of the curable resin composition, and various methods such as a dipping method, a coating method, and a printing method are used.

乾燥通常係以室溫~100℃左右加熱1~60分鐘。Drying is usually carried out at room temperature ~ 100 ° C for about 1 to 60 minutes.

具體的硬化條件如後述。The specific hardening conditions are as follows.

本發明係將硬化性樹脂組成物以溶液狀塗佈於各種基材上,所得之塗膜經乾燥/硬化,可得到層合體。例如基材為透明基材時,藉由在最外層設置低折射率層,可形成優異之抗反射膜。In the present invention, the curable resin composition is applied to various substrates in a solution form, and the resulting coating film is dried/hardened to obtain a laminate. For example, when the substrate is a transparent substrate, an excellent antireflection film can be formed by providing a low refractive index layer on the outermost layer.

抗反射膜之具體的構造通常係依基材及低折射率膜,或基材、高折射率膜及低折射率膜之順序層合者。其他,在基材、高折射率膜及低折射率膜之間可夾雜其他之層,例如可設置硬塗層、防靜電層、中折射率層、低折射率層、高折射率層之組合等的層。The specific structure of the antireflection film is usually laminated in the order of the substrate and the low refractive index film, or the substrate, the high refractive index film, and the low refractive index film. In addition, other layers may be interposed between the substrate, the high refractive index film, and the low refractive index film, for example, a combination of a hard coat layer, an antistatic layer, a medium refractive index layer, a low refractive index layer, and a high refractive index layer may be provided. The layer of the same.

圖2係在基材10上依高折射率層40及低折射率層50之順序層合的抗反射膜。2 is an antireflection film laminated on the substrate 10 in the order of the high refractive index layer 40 and the low refractive index layer 50.

此抗反射膜中,高折射率層40相當於金屬氧化物粒子高密度存在之層,低折射率層50相當於金屬氧化物粒子實質上不存在之層。In the antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present at a high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.

依本發明時,可由1之塗膜可形成高折射率層40及低折射率層50。According to the present invention, the high refractive index layer 40 and the low refractive index layer 50 can be formed by the coating film of 1.

圖3係在基材10上依硬塗層20、防靜電層30、高折射率層40及低折射率層50之順序所層合之抗反射膜。3 is an antireflection film laminated on the substrate 10 in the order of the hard coat layer 20, the antistatic layer 30, the high refractive index layer 40, and the low refractive index layer 50.

此抗反射膜中,高折射率層40相當於金屬氧化物粒子高密度存在之層、低折射率層50相當於金屬氧化物粒子實質上不存在之層。In the antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present at a high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are substantially absent.

依本發明時,可由1之塗膜形成高折射率層40及低折射率層50。According to the invention, the high refractive index layer 40 and the low refractive index layer 50 can be formed by a coating film of 1.

圖4係在基材10上依防靜電層30、硬塗層20、高折射率層40及低折射率層50之順序所層合之抗反射膜。4 is an antireflection film laminated on the substrate 10 in the order of the antistatic layer 30, the hard coat layer 20, the high refractive index layer 40, and the low refractive index layer 50.

此抗反射膜中,高折射率層40相當於金屬氧化物粒子高密度存在之層,低折射率層50相當於金屬氧化物粒子實質上不存在之層。In the antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present at a high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.

依本發明時,由1之塗膜可形成高折射率層40及低折射率層50。According to the present invention, the high refractive index layer 40 and the low refractive index layer 50 can be formed from the coating film of 1.

圖5係在基材10上依硬塗層20、防靜電層30、中折射率層60、高折射率層40及低折射率層50之順序所層合之抗反射膜。5 is an antireflection film laminated on the substrate 10 in the order of the hard coat layer 20, the antistatic layer 30, the medium refractive index layer 60, the high refractive index layer 40, and the low refractive index layer 50.

此抗反射膜中,高折射率層40相當於金屬氧化物粒子高密度存在之層,低折射率層50相當於金屬氧化物粒子實質上不存在之層。或中折射率層60及高折射率層40均相當於金屬氧化物粒子高密度存在之層,或中折射率層60相當於金屬氧化物粒子高密度存在之層,而高折射率層40相當於金屬氧化物粒子實質上不存在之層。In the antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present at a high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. Or the medium refractive index layer 60 and the high refractive index layer 40 correspond to a layer in which the metal oxide particles have a high density, or the medium refractive index layer 60 corresponds to a layer in which the metal oxide particles have a high density, and the high refractive index layer 40 corresponds to A layer that is substantially absent from metal oxide particles.

依本發明時,由1之塗膜可形成中折射率層60與高折射率層40,或高折射率層40與低折射率層50。較佳為由1之塗膜形成高折射率層40與低折射率層50。According to the present invention, the medium refractive index layer 60 and the high refractive index layer 40, or the high refractive index layer 40 and the low refractive index layer 50 can be formed by the coating film of 1. It is preferable that the high refractive index layer 40 and the low refractive index layer 50 are formed of a coating film of 1.

圖6係在基材10上依防靜電層30、硬塗層20、中折射率層60、高折射率層40及低折射率層50之順序所層合之抗反射膜。6 is an antireflection film laminated on the substrate 10 in the order of the antistatic layer 30, the hard coat layer 20, the medium refractive index layer 60, the high refractive index layer 40, and the low refractive index layer 50.

此抗反射膜中,高折射率層40相當於金屬氧化物粒子高密度存在之層,低折射率層50相當於金屬氧化物粒子實質上不存在之層。或中折射率層60及高折射率層40均相當於金屬氧化物粒子高密度存在之層,或中折射率層60相當於金屬氧化物粒子高密度存在之層,高折射率層40相當於金屬氧化物粒子實質上不存在之層。In the antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present at a high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. Or the medium refractive index layer 60 and the high refractive index layer 40 correspond to a layer in which the metal oxide particles have a high density, or the medium refractive index layer 60 corresponds to a layer in which the metal oxide particles have a high density, and the high refractive index layer 40 corresponds to A layer in which metal oxide particles are substantially absent.

依本發明時,由1之塗膜可形成中折射率層60與高折射率層40,或高折射率層40與低折射率層50。較佳為由1之塗膜形成高折射率層40與低折射率層50。According to the present invention, the medium refractive index layer 60 and the high refractive index layer 40, or the high refractive index layer 40 and the low refractive index layer 50 can be formed by the coating film of 1. It is preferable that the high refractive index layer 40 and the low refractive index layer 50 are formed of a coating film of 1.

圖7係在基材10上依硬塗層20、高折射率層40及低折射率層50之順序所層合之抗反射膜。FIG. 7 is an antireflection film laminated on the substrate 10 in the order of the hard coat layer 20, the high refractive index layer 40, and the low refractive index layer 50.

此抗反射膜中,高折射率層40相當於金屬氧化物粒子高密度存在之層,低折射率層50相當於金屬氧化物粒子實質上不存在之層。In the antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present at a high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.

依本發明時,由1之塗膜可形成高折射率層60與低折射率層50。According to the present invention, the high refractive index layer 60 and the low refractive index layer 50 can be formed by the coating film of 1.

圖8係在基材10上依硬塗層20、中折射率層60、高折射率層40及低折射率層50之順序所層合之抗反射膜。8 is an antireflection film laminated on the substrate 10 in the order of the hard coat layer 20, the medium refractive index layer 60, the high refractive index layer 40, and the low refractive index layer 50.

此抗反射膜中,高折射率層40相當於金屬氧化物粒子高密度存在之層,低折射率層50相當於金屬氧化物粒子實質上不存在之層。或中折射率層60及高折射率層40均相當於金屬氧化物粒子高密度存在之層,或中折射率層60相當於金屬氧化物粒子高密度存在之層,高折射率層40相當於金屬氧化物粒子實質上不存在之層。In the antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present at a high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. Or the medium refractive index layer 60 and the high refractive index layer 40 correspond to a layer in which the metal oxide particles have a high density, or the medium refractive index layer 60 corresponds to a layer in which the metal oxide particles have a high density, and the high refractive index layer 40 corresponds to A layer in which metal oxide particles are substantially absent.

依本發明時,由1之塗膜可形成中折射率層60與高折射率層40,或高折射率層40與低折射率層50。較佳為由1之塗膜形成高折射率層40與低折射率層50。According to the present invention, the medium refractive index layer 60 and the high refractive index layer 40, or the high refractive index layer 40 and the low refractive index layer 50 can be formed by the coating film of 1. It is preferable that the high refractive index layer 40 and the low refractive index layer 50 are formed of a coating film of 1.

圖9係在基材10上依防靜電層30、高折射率層40及低折射率層50之順序所層合之抗反射膜。FIG. 9 is an antireflection film laminated on the substrate 10 in the order of the antistatic layer 30, the high refractive index layer 40, and the low refractive index layer 50.

此抗反射膜中,高折射率層40相當於金屬氧化物粒子高密度存在之層,低折射率層50相當於金屬氧化物粒子實質上不存在之層。In the antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present at a high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present.

依本發明時,由1之塗膜可形成高折射率層40及低折射率層50。According to the present invention, the high refractive index layer 40 and the low refractive index layer 50 can be formed from the coating film of 1.

圖10係在基材10上依防靜電層30、中折射率層60、高折射率層40及低折射率層50之順序所層合之抗反射膜。FIG. 10 is an antireflection film laminated on the substrate 10 in the order of the antistatic layer 30, the medium refractive index layer 60, the high refractive index layer 40, and the low refractive index layer 50.

此抗反射膜中,高折射率層40相當於金屬氧化物粒子高密度存在之層,低折射率層50相當於金屬氧化物粒子實質上不存在之層。或中折射率層60及高折射率層40均相當於金屬氧化物粒子高密度存在之層,或中折射率層60相當於金屬氧化物粒子高密度存在之層,高折射率層40相當於金屬氧化物粒子實質上不存在之層。In the antireflection film, the high refractive index layer 40 corresponds to a layer in which metal oxide particles are present at a high density, and the low refractive index layer 50 corresponds to a layer in which metal oxide particles are not substantially present. Or the medium refractive index layer 60 and the high refractive index layer 40 correspond to a layer in which the metal oxide particles have a high density, or the medium refractive index layer 60 corresponds to a layer in which the metal oxide particles have a high density, and the high refractive index layer 40 corresponds to A layer in which metal oxide particles are substantially absent.

依本發明時,由1之塗膜可形成中折射率層60與高折射率層40,或高折射率層40與低折射率層50。較佳為由1之塗膜形成高折射率層40與低折射率層50。According to the present invention, the medium refractive index layer 60 and the high refractive index layer 40, or the high refractive index layer 40 and the low refractive index layer 50 can be formed by the coating film of 1. It is preferable that the high refractive index layer 40 and the low refractive index layer 50 are formed of a coating film of 1.

上述之抗反射膜中,添加使用之硬化性樹脂組成物所含有之金屬氧化物之摻雜銻之氧化錫(ATO)粒子、摻雜磷之氧化錫(PTO)粒子等之導電性粒子時,所得之以高密度含有金屬氧化物之層成為防靜電層的膜。因此,例如高折射率層或中折射率層係以具有這種防靜電之金屬氧化物高密度存在的層所形成時,高折射率層或中折射率層可形成兼具防靜電性的膜。此時,可省略防靜電膜之形成。When the conductive particles such as tin oxide doped tin oxide (ATO) particles or phosphorus-doped tin oxide (PTO) particles of a metal oxide contained in the curable resin composition to be used are added to the antireflection film, The obtained layer containing a metal oxide at a high density becomes a film of an antistatic layer. Therefore, for example, when the high refractive index layer or the medium refractive index layer is formed of a layer having such a high density of the antistatic metal oxide, the high refractive index layer or the medium refractive index layer can form a film having both antistatic properties. . At this time, the formation of the antistatic film can be omitted.

接著說明上述之抗反射膜之各層。Next, each layer of the above antireflection film will be described.

(1)基材本發明之抗反射膜用之基材的種類無特別限定,基材之具體例,例如三乙醯基纖維素、聚對苯二甲酸乙二酯樹脂(東麗(股)製,Lumirror等)、玻璃、聚碳酸酯樹脂、丙烯酸樹脂、苯乙烯基樹脂、烯丙酸酯樹脂、原冰片烯系樹脂(JSR(股)製之Arton,日本Zeon(股)製Zeonex等)、甲基丙烯酸甲酯/苯乙烯共聚物樹脂、聚烯烴樹脂等各種透明塑膠板、薄膜等。較佳為三乙醯基纖維素、聚對苯二甲酸乙二酯樹脂(東麗(股)製之Lumirror等)、原冰片烯系樹脂(JSR(股)製之Arton等)。(1) Substrate The type of the substrate for the antireflection film of the present invention is not particularly limited, and specific examples of the substrate include, for example, triethylenesulfonyl cellulose and polyethylene terephthalate resin (Toray) , Lumirror, etc., glass, polycarbonate resin, acrylic resin, styrene-based resin, acryl resin, and borneol-based resin (Arton manufactured by JSR Co., Ltd., Zeonex, manufactured by Zeon, Japan) , various transparent plastic sheets, films, etc., such as methyl methacrylate/styrene copolymer resin and polyolefin resin. Preferred is triethylenesulfonyl cellulose, polyethylene terephthalate resin (Lumirror manufactured by Toray Industries, etc.), and norbornene-based resin (Arton, manufactured by JSR Co., Ltd.).

(2)低折射率層低折射率層係指波長589nm之光的折射率為1.20~1.55的層。(2) Low refractive index layer The low refractive index layer means a layer having a refractive index of 1.20 to 1.55 in light having a wavelength of 589 nm.

低折射率層用之材料只要是可得到目的之特性者即無特別限制,例如含有含氟聚合物之硬化性組成物、丙烯酸單體、含氟丙烯酸單體、含環氧基化合物、含有含氟環氧基化合物等之硬化物。為了提升低折射率層之強度,可添加二氧化矽微粒等。The material for the low refractive index layer is not particularly limited as long as it has a desired property, and for example, a curable composition containing a fluorine-containing polymer, an acrylic monomer, a fluorine-containing acrylic monomer, an epoxy group-containing compound, or the like A cured product of a fluoroepoxy compound or the like. In order to increase the strength of the low refractive index layer, cerium oxide fine particles or the like may be added.

(3)高折射率層高折射率層係指波長589nm之光之折射率為1.50~2.20之層。(3) High refractive index layer The high refractive index layer refers to a layer having a refractive index of light of 589 nm of 1.50 to 2.20.

為了形成高折射率層時,可添加高折射率之無機粒子,例如金屬氧化物粒子。In order to form a high refractive index layer, inorganic particles having a high refractive index such as metal oxide particles may be added.

金屬氧化物粒子之具體例,例如有摻雜銻之氧化錫(ATO)粒子、摻雜錫之氧化銦(ITO)粒子、摻雜磷之氧化錫(PTO)粒子、氧化鋅(ZnO)粒子、摻雜銻之氧化鋅(ZnO)粒子、摻雜鋁之氧化鋅粒子、氧化鋯(ZrO2 )粒子、氧化鈦(TiO2 )粒子、被覆二氧化矽之TiO2 粒子、被覆Al2 O3 /ZrO2 之TiO2 粒子、二氧化鈰(CeO2 )粒子等。較佳為摻雜銻之氧化錫(ATO)粒子、摻雜錫之氧化銦(ITO)粒子、摻雜磷之氧化錫(PTO)粒子、摻雜鋁之氧化鋅粒子、被覆Al2 O3 /ZrO2 之TiO2 粒子。這些金屬氧化物粒子可使用一種單獨或兩種以上之組合。Specific examples of the metal oxide particles include antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, and zinc oxide (ZnO) particles. Antimony-doped zinc oxide (ZnO) particles, aluminum-doped zinc oxide particles, zirconium oxide (ZrO 2 ) particles, titanium oxide (TiO 2 ) particles, cerium oxide-coated TiO 2 particles, and coated Al 2 O 3 / ZrO 2 TiO 2 particles, cerium oxide (CeO 2 ) particles, and the like. Preferably, antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, aluminum-doped zinc oxide particles, and coated Al 2 O 3 / TiO 2 particles of ZrO 2 . These metal oxide particles may be used alone or in combination of two or more.

又,也可使高折射率層具有硬塗層或防靜電層之功能。Further, the high refractive index layer can also function as a hard coat layer or an antistatic layer.

(4)中折射率層組合具有3種以上之折射率的層時,通常波長589nm之光之折射率為1.50~1.90,具有比低折射率層高、比高折射率層低之折射率之層以中折射率層表示。中折射率層之折射率較佳為1.50~1.80,較佳為1.50~1.75。(4) When a medium refractive index layer is combined with a layer having three or more kinds of refractive indices, a refractive index of light having a wavelength of 589 nm is usually 1.50 to 1.90, and has a refractive index higher than that of the low refractive index layer and lower than that of the high refractive index layer. The layers are represented by a medium refractive index layer. The refractive index of the medium refractive index layer is preferably from 1.50 to 1.80, preferably from 1.50 to 1.75.

為了形成中折射率層時,可添加高折射率之無機粒子,例如金屬氧化物粒子。In order to form the medium refractive index layer, inorganic particles having a high refractive index such as metal oxide particles may be added.

金屬氧化物粒子之具體例,例如有摻雜銻之氧化錫(ATO)粒子、摻雜錫之氧化銦(ITO)粒子、摻雜磷之氧化錫(PTO)粒子、氧化鋅(ZnO)粒子、摻雜銻之氧化鋅粒子、摻雜鋁之氧化鋅粒子、氧化鋯(ZrO2 )粒子、氧化鈦(TiO2 )粒子、被覆二氧化矽之TiO2 粒子、被覆Al2 O3 /ZrO2 之TiO2 粒子、二氧化鈰(CeO2 )粒子等。較佳為摻雜銻之氧化錫(ATO)粒子、摻雜錫之氧化銦(ITO)粒子、摻雜磷之氧化錫(PTO)粒子、摻雜鋁之氧化鋅粒子、氧化鋯(ZrO2 )粒子。這些金屬氧化物粒子可使用一種單獨或兩種以上之組合。Specific examples of the metal oxide particles include antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, and zinc oxide (ZnO) particles. Antimony-doped zinc oxide particles, aluminum-doped zinc oxide particles, zirconium oxide (ZrO 2 ) particles, titanium oxide (TiO 2 ) particles, cerium oxide-coated TiO 2 particles, and coated Al 2 O 3 /ZrO 2 TiO 2 particles, cerium oxide (CeO 2 ) particles, and the like. Preferably, antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, aluminum-doped zinc oxide particles, zirconium oxide (ZrO 2 ) particle. These metal oxide particles may be used alone or in combination of two or more.

又,也可使中折射率層具有硬塗層或防靜電層之功能。Further, the medium refractive index layer can also function as a hard coat layer or an antistatic layer.

藉由組合低折射率層與高折射率層可降低反射率,藉由組合低折射率層、高折射率層、中折射率層可降低反射率,同時可降低色調。By combining the low refractive index layer and the high refractive index layer, the reflectance can be lowered, and by combining the low refractive index layer, the high refractive index layer, and the medium refractive index layer, the reflectance can be lowered while the color tone can be lowered.

(5)硬塗層硬塗層之具體例,例如由SiO2 、環氧系樹脂、丙烯酸系樹脂、三聚氰胺系樹脂等材料所構成者較佳。又,這些樹脂中也可添加二氧化矽粒子。(5) A specific example of the hard coat layer is preferably composed of a material such as SiO 2 , an epoxy resin, an acrylic resin or a melamine resin. Further, cerium oxide particles may be added to these resins.

硬塗層具有可提高層合體之機械強度的效果。The hard coat layer has an effect of improving the mechanical strength of the laminate.

(6)防靜電層防靜電層之具體例如添加摻雜銻之氧化錫(ATO)粒子、摻雜錫之氧化銦(ITO)粒子、摻雜磷之氧化錫(PTO)粒子、摻雜鋁之氧化鋅(ZnO)粒子等具有導電性之金屬氧化物粒子,或以有機或無機之導電性化合物之硬化性膜、將金屬氧化物進行蒸鍍或濺鍍所得之金屬氧化物膜、導電性有機高分子所構成之膜。導電性有機高分子例如有聚乙炔系導電性高分子、聚苯胺系導電性高分子、聚噻吩系導電性高分子、聚吡咯系導電性高分子、聚苯基乙烯基系導電性高分子等。如上述,添加本發明用之硬化性樹脂組成物所含有之金屬氧化物粒子,例如ATO粒子、ITO粒子、摻雜磷之氧化錫(PTO)粒子、摻雜銻之氧化鋅ZnO、摻雜鋁之ZnO粒子等之導電性高分子時,以高密度含有所得之金屬氧化物的層成為具有防靜電性的膜。此時,可省略以另外方式形成防靜電膜。(6) Antistatic layer Specific examples of antistatic layer include addition of antimony-doped tin oxide (ATO) particles, tin-doped indium oxide (ITO) particles, phosphorus-doped tin oxide (PTO) particles, and doped aluminum Conductive metal oxide particles such as zinc oxide (ZnO) particles, or a hardenable film of an organic or inorganic conductive compound, a metal oxide film obtained by vapor deposition or sputtering of a metal oxide, or a conductive organic A film composed of a polymer. Examples of the conductive organic polymer include a polyacetylene-based conductive polymer, a polyaniline-based conductive polymer, a polythiophene-based conductive polymer, a polypyrrole-based conductive polymer, and a polyphenylvinyl-based conductive polymer. . As described above, the metal oxide particles contained in the curable resin composition for use in the present invention, such as ATO particles, ITO particles, phosphorus-doped tin oxide (PTO) particles, antimony-doped zinc oxide ZnO, doped aluminum, are added. In the case of a conductive polymer such as ZnO particles, a layer containing the obtained metal oxide at a high density is a film having antistatic properties. At this time, the formation of the antistatic film in another manner may be omitted.

防靜電層係將導電性賦予層合體,可防止產生靜電附著塵埃等。The antistatic layer imparts conductivity to the laminate, and it is possible to prevent electrostatic adhesion of dust and the like.

這些層可僅形成一層,或形成兩層以上之不同的層。These layers may form only one layer or form two or more different layers.

又,低、中、高折射率層之膜厚通常分別為60~150nm,防靜電層之膜厚通常為0.05~3μm,硬塗層之膜厚通常為1~20μm。Further, the film thicknesses of the low, medium and high refractive index layers are usually 60 to 150 nm, the film thickness of the antistatic layer is usually 0.05 to 3 μm, and the film thickness of the hard coat layer is usually 1 to 20 μm.

本發明中,可採用本發明之製造方法形成層合體之任意連續之2以上的層,但是不用本發明製法之層的製造方法可使用公知之塗佈與硬化、蒸鍍、濺鍍等方法製造。In the present invention, any continuous layer of two or more layers of the laminate may be formed by the production method of the present invention, but the method for producing the layer without the method of the present invention may be produced by a known method such as coating, hardening, vapor deposition, sputtering or the like. .

又,由本發明之硬化性樹脂組成物所構成之層係經硬化後,為了形成具有優異光學特性與耐久性之硬化膜時,特別是以加熱賦予熱經歷為佳。當然,在常溫放置時,隨著時間經過,同時進行硬化反應也可形成目的之硬化膜,但實際上加熱硬化可縮短所需時間。又,添加熱酸產生劑作為硬化觸媒,更能促進硬化反應。此硬化觸媒無特別限制,可利用一般尿素樹脂、三聚氰胺樹脂等作為硬化劑使用的各種酸類或其鹽類,特別是使用銨鹽較佳。硬化反應之加熱條件可適當選擇,但是加熱溫度必須為塗佈對象之基材的耐熱臨界溫度以下。Further, when the layer composed of the curable resin composition of the present invention is cured, in order to form a cured film having excellent optical properties and durability, it is preferable to impart heat history by heating. Of course, when placed at room temperature, the hardening reaction can be formed at the same time as the curing reaction proceeds, but in practice, heat hardening can shorten the required time. Further, the addition of a thermal acid generator as a curing catalyst further promotes the hardening reaction. The curing catalyst is not particularly limited, and various acids or salts thereof which are generally used as a curing agent such as a urea resin or a melamine resin can be used, and in particular, an ammonium salt is preferably used. The heating condition of the hardening reaction can be appropriately selected, but the heating temperature must be below the heat-resistant critical temperature of the substrate to be coated.

依本發明時,可由1之塗膜形成2以上之層,因此可簡化層合體之製造步驟。According to the present invention, a layer of 2 or more can be formed from the coating film of 1, so that the manufacturing steps of the laminate can be simplified.

另外,使金屬氧化物粒子不均勻分布,可提升層合體之耐擦傷性。Further, the metal oxide particles are unevenly distributed, and the scratch resistance of the laminate can be improved.

本發明之層合體除了抗反射膜外,也可用於例如透鏡、選擇穿透膜濾光片等光學用零件。The laminate of the present invention can be used for an optical component such as a lens or a selective penetrating film filter in addition to the antireflection film.

II.硬化性樹脂組成物其次,說明本發明之硬化性樹脂組成物及硬化物。II. Curable Resin Composition Next, the curable resin composition and cured product of the present invention will be described.

本發明之硬化性樹脂組成物係含有(A1)鍵結具有聚合性不飽和基之有機化合物(Ab)所成之數平均粒徑1nm以上,未達40nm的金屬氧化物粒子(以下稱為「(A1)之金屬氧化物粒子」)(A2)數平均粒徑40nm以上,200nm以下的金屬氧化物粒子(以下稱為「(A2)之金屬氧化物粒子」)(B)含有乙烯性不飽和基之含氟聚合物(C)(B)含有乙烯性不飽和基之含氟聚合物之溶解性高之一種或兩種以上的溶劑(以下稱為「(C)快速揮發溶劑」)(D)(A1)及(A2)之金屬氧化物粒子之分散安定性高,且與(C)快速揮發溶劑具有相溶特性之一種或兩種以上的溶劑(以下稱為「(D)緩慢揮發溶劑」),且(C)快速揮發溶劑之相對蒸發速度大於(D)緩慢揮發溶劑之相對蒸發速度。The curable resin composition of the present invention contains (A1) a metal oxide particle having a number average particle diameter of 1 nm or more and an underlying organic compound (Ab) bonded to a polymerizable unsaturated group of less than 40 nm (hereinafter referred to as " (A1) metal oxide particles (A2) having a number average particle diameter of 40 nm or more and 200 nm or less (hereinafter referred to as "metal oxide particles of (A2)") (B) containing ethylenic unsaturation The fluoropolymer (C) (B) contains one or two or more solvents having high solubility in the fluoropolymer containing an ethylenically unsaturated group (hereinafter referred to as "(C) rapid volatile solvent") (D) (A1) and (A2) a metal oxide particle having high dispersion stability and having one or two or more solvents having compatibility characteristics with (C) a fast-volatile solvent (hereinafter referred to as "(D) slow-volatile solvent) And (C) the relative evaporation rate of the rapidly evaporating solvent is greater than (D) the relative evaporation rate of the slowly evaporating solvent.

1.具體說明硬化性樹脂組成物之各構成成分。1. Each constituent component of the curable resin composition will be specifically described.

金屬氧化物粒子(A1)及(A2)本發明係使用粒徑不同之兩種金屬氧化物粒子(A1)及(A2)。其中金屬氧化物粒子(A1)必須鍵結下述具有聚合性不飽和基的有機化合物(Ab)。金屬氧化物粒子(A2)鍵結具有聚合性不飽和基的有機化合物(Ab)較佳,但不是必須。Metal Oxide Particles (A1) and (A2) In the present invention, two kinds of metal oxide particles (A1) and (A2) having different particle diameters are used. Among them, the metal oxide particles (A1) must be bonded to the following organic compound (Ab) having a polymerizable unsaturated group. It is preferable that the metal oxide particles (A2) are bonded to the organic compound (Ab) having a polymerizable unsaturated group, but it is not essential.

本說明書中,有時金屬氧化物粒子(A1)及(A2)統稱為「金屬氧化物粒子(A)」。金屬氧化物粒子(A1)、(A2)中未鍵結有機化合物(Ab)之金屬氧化物粒子有時分別稱為「金屬氧化物粒子(Aa1)」、「金屬氧化物粒子(Aa2)」,兩者有時統稱為「金屬氧化物粒子(Aa)」。又與有機化合物(Ab)鍵結之金屬氧化物粒子(A1)、(A2)有時分別稱為「反應性粒子(Aab1)」、「反應性粒子(Aab2)」,有時兩者統稱為「反應性粒子(Aab)」。In the present specification, the metal oxide particles (A1) and (A2) may be collectively referred to as "metal oxide particles (A)". The metal oxide particles of the metal oxide particles (A1) and (A2) which are not bonded to the organic compound (Ab) may be referred to as "metal oxide particles (Aa1)" or "metal oxide particles (Aa2)", respectively. Both are sometimes collectively referred to as "metal oxide particles (Aa)". Further, the metal oxide particles (A1) and (A2) bonded to the organic compound (Ab) may be referred to as "reactive particles (Aab1)" or "reactive particles (Aab2)", respectively. "Reactive particles (Aab)".

金屬氧化物粒子(A1)及(A2)之數平均粒徑係以電子顯微鏡測定,分別為1nm以上,未達40nm之範圍內及40nm以上,200nm以下之範圍內。如此使用粒徑不同之兩種粒子相較於僅由使用一種金屬氧化物粒子之硬化性樹脂組成物所得之硬化膜,可提高耐擦傷性。The number average particle diameter of the metal oxide particles (A1) and (A2) was measured by an electron microscope, and was 1 nm or more, not more than 40 nm, and 40 nm or more and 200 nm or less. The use of the two types of particles having different particle diameters in this manner can improve the scratch resistance as compared with the cured film obtained only from the curable resin composition using one type of metal oxide particles.

兩種金屬氧化物粒子只要使用各粒徑在上述範圍之多種粒子即可,也可組合3種以上之金屬氧化物粒子。構成多種之金屬氧化物粒子的物質可相同或不同。As the metal oxide particles, a plurality of kinds of particles each having a particle diameter within the above range may be used, and three or more kinds of metal oxide particles may be combined. The substances constituting the plurality of metal oxide particles may be the same or different.

本發明用之金屬氧化物粒子(A1)及(A2)從製得之硬化性樹脂組成物所構成之硬化物的觀點,較佳為選自矽、鋁、鋯、鈦、鋅、鍺、銦、錫、銻及鈰所成群之至少一種元素的氧化物粒子。The metal oxide particles (A1) and (A2) used in the present invention are preferably selected from the group consisting of ruthenium, aluminum, zirconium, titanium, zinc, bismuth, and indium from the viewpoint of a cured product composed of the obtained curable resin composition. An oxide particle of at least one element of a group of tin, antimony and bismuth.

特別理想之金屬氧化物粒子(A1)為選自鋁、鋯、鈦、鋅、鍺、銦、錫、銻及鈰所成群之至少一種元素的氧化物粒子,其中較佳為鋯之氧化物粒子。為了提高構成硬化物之金屬氧化物粒子(A)高密度存在之層的折射率時,金屬氧化物粒子(A1)之波長589nm之折射率為1.5以上較佳。因此,二氧化矽(折射率為1.45)粒子不理想。Particularly preferred metal oxide particles (A1) are oxide particles of at least one element selected from the group consisting of aluminum, zirconium, titanium, zinc, lanthanum, indium, tin, antimony and cerium, of which zirconium oxide is preferred. particle. In order to increase the refractive index of the layer in which the metal oxide particles (A) constituting the cured product are present at a high density, the refractive index of the metal oxide particles (A1) having a wavelength of 589 nm is preferably 1.5 or more. Therefore, particles of cerium oxide (refractive index of 1.45) are not preferable.

金屬氧化物粒子(A1)之數平均粒徑為1nm以上,未達40nm之範圍內,較佳為1nm以上,30nm以下之範圍內。The number average particle diameter of the metal oxide particles (A1) is 1 nm or more, and is less than 40 nm, preferably 1 nm or more and 30 nm or less.

金屬氧化物粒子(A2)從改善硬化膜之耐擦傷性的觀點,以二氧化矽為主成分的粒子較佳。The metal oxide particles (A2) are preferably particles having cerium oxide as a main component from the viewpoint of improving the scratch resistance of the cured film.

金屬氧化物粒子(A2)之數平均粒徑為40nm以上,200nm以下之範圍內,較佳為40nm以上,100nm以下之範圍內。金屬氧化物粒子(A1)及(A2)之粒徑係以電子顯微鏡測定之數平均粒徑。棒狀粒子之粒徑稱為短徑。The number average particle diameter of the metal oxide particles (A2) is 40 nm or more and 200 nm or less, preferably 40 nm or more and 100 nm or less. The particle diameters of the metal oxide particles (A1) and (A2) are the number average particle diameter measured by an electron microscope. The particle size of the rod-shaped particles is called a short diameter.

為了改良金屬氧化物粒子(A1)及(A2)之分散性,可添加界面活性劑或胺類。In order to improve the dispersibility of the metal oxide particles (A1) and (A2), a surfactant or an amine may be added.

其中,從高硬度的觀點,較佳為氧化矽、氧化鋁、氧化鋯及氧化銻之粒子較佳,特別理想為氧化鋯粒子。使用鋯或鈦等氧化物粒子可得到高折射率之硬化被膜,使用ATO粒子、摻雜磷之氧化錫(PTO)粒子等可將導電性賦予硬化被膜。這些可單獨一種或組合2種以上使用。金屬氧化物粒子(Aa)為粉體狀或分散液較佳。分散液若從與其他成分之相溶性、分散性的觀點,分散媒較佳為有機溶劑。這種有機溶劑例如有甲醇、乙醇、異丙醇、丁醇、辛醇等醇類;丙酮、甲基乙基甲酮、甲基異丁基甲酮、環己酮等酮類;乙酸乙酯、乙酸丁酯、乳酸乙酯、γ-丁內酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯等酯類;乙二醇單甲醚、二乙二醇單丁醚等醚類;苯、甲苯、二甲苯等芳香族烴類;二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯烷酮等醯胺類。其中較佳為甲醇、異丙醇、丁醇、甲基乙基甲酮、甲基異丁基甲酮、乙酸乙酯、乙酸丁酯、甲苯、二甲苯。Among them, from the viewpoint of high hardness, particles of cerium oxide, aluminum oxide, zirconium oxide and cerium oxide are preferred, and zirconia particles are particularly preferred. A hardened film having a high refractive index can be obtained by using oxide particles such as zirconium or titanium, and conductivity can be imparted to the cured film by using ATO particles, phosphorus-doped tin oxide (PTO) particles, or the like. These may be used alone or in combination of two or more. The metal oxide particles (Aa) are preferably in the form of a powder or a dispersion. The dispersion medium is preferably an organic solvent from the viewpoint of compatibility with other components and dispersibility. Such organic solvents include, for example, alcohols such as methanol, ethanol, isopropanol, butanol, and octanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; ethyl acetate and acetic acid; Esters such as butyl ester, ethyl lactate, γ-butyrolactone, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate; ethers such as ethylene glycol monomethyl ether and diethylene glycol monobutyl ether; benzene An aromatic hydrocarbon such as toluene or xylene; or a guanamine such as dimethylformamide, dimethylacetamide or N-methylpyrrolidone. Among them, preferred are methanol, isopropanol, butanol, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetate, butyl acetate, toluene, and xylene.

二氧化矽粒子之市售品例如,膠態二氧化矽有日產化學工業(股)製商品名:甲醇二氧化矽溶膠、IPA-ST、MEK-ST、NBA-ST、XBA-ST、DMAC-ST、ST-UP、ST-OUP、ST-20、ST-40、ST-C、ST-N、ST-0、ST-50、ST-0L等。又,粉體二氧化矽例如,日本Aerosil(股)製商品名:Aerosil 130、Aerosil 300、Aerosil 380、Aerosil TT600、Aerosil OX50、旭硝子(股)製商品名:Sildex H31、H32、H51、H52、H121、H122、日本二氧化矽工業(股)製商品名:E220A、E220、富士SYLYSIA(股)製商品名:SYLYSIA 470、日本板硝子(股)製商品名:SG Flake等。Commercial products of cerium oxide particles, for example, colloidal cerium oxide is manufactured by Nissan Chemical Industries Co., Ltd. Trade name: methanol cerium oxide sol, IPA-ST, MEK-ST, NBA-ST, XBA-ST, DMAC- ST, ST-UP, ST-OUP, ST-20, ST-40, ST-C, ST-N, ST-0, ST-50, ST-0L, etc. Further, the powdered cerium oxide is, for example, manufactured by Japan Aerosil Co., Ltd., trade name: Aerosil 130, Aerosil 300, Aerosil 380, Aerosil TT600, Aerosil OX50, Asahi Glass Co., Ltd., trade name: Sildex H31, H32, H51, H52, Product name: E220A, E220, Fuji SYLYSIA (stock), trade name: SYLYSIA 470, Japanese plate glass (stock), trade name: SG Flake, etc.

又,氧化鋁之水分散品例如有日產化學工業(股)製商品名:氧化鋁溶膠-100、-200、-520;氧化鋁之異丙醇分散品例如有住友大阪水泥(股)製商品名:AS-150I;氧化鋁之甲苯分散品例如有住友大阪水泥(股)製商品名:AS-150T;鋯之甲苯分散品例如有住友大阪水泥(股)製商品名:HXU-110JC;銻酸鋅粉末之水分散品例如有日產化學工業(股)製商品名;Celnax;氧化鋁、氧化鈦、氧化錫、氧化銦、氧化鋅等之粉末及溶劑分散品例如有CI化成(股)製商品名;Nanotek;摻雜銻之氧化錫之水分散溶膠例如有石原產業(股)製商品名;SN-100D;ITO粉末例如有三菱Materia(股)製之製品;氧化鈰水分散液例如有多木化學(股)製商品名:needral等。In addition, the alumina dispersion product is, for example, a product name of Nissan Chemical Industries Co., Ltd.: alumina sol-100, -200, -520; and an isopropyl alcohol dispersion of alumina such as Sumitomo Osaka Cement Co., Ltd. Name: AS-150I; a toluene dispersion of alumina, for example, Sumitomo Osaka Cement Co., Ltd., trade name: AS-150T; zirconium toluene dispersion product, for example, Sumitomo Osaka Cement Co., Ltd., trade name: HXU-110JC; The water-dispersible product of the zinc-zinc powder is, for example, a product of Nissan Chemical Industries Co., Ltd.; Celnax; a powder of alumina, titania, tin oxide, indium oxide, zinc oxide, or the like, and a solvent dispersion product, for example, a CI-formed product. Commercial name; Nanotek; water-dispersed sol of antimony-doped tin oxide, for example, trade name of Ishihara Sangyo Co., Ltd.; SN-100D; ITO powder, for example, a product made by Mitsubishi Materia; Domu Chemical (share) system name: needral and so on.

金屬氧化物粒子(A1)及(A2)之形狀為球狀、中空狀、多孔質狀、棒狀(長寬比為1以上,10以下之形狀)、板狀、纖維狀、或不定形狀,(A1)較佳為棒狀,(A2)較佳為球狀。The metal oxide particles (A1) and (A2) have a spherical shape, a hollow shape, a porous shape, a rod shape (a shape having an aspect ratio of 1 or more and 10 or less), a plate shape, a fiber shape, or an indefinite shape. (A1) is preferably a rod shape, and (A2) is preferably a spherical shape.

這些金屬氧化物粒子(A1)及(A2)之使用形態可使用乾燥狀態之粉末或用水或有機溶劑分散的狀態。例如分散液可直接使用業界所知之微粒子狀之金屬氧化物粒子之分散液。特別是要求硬化物具有優異透明性之用途時,使用金屬氧化物粒子之分散液較佳。The use form of these metal oxide particles (A1) and (A2) can be a state in which a powder in a dry state or a water or an organic solvent is used. For example, a dispersion of fine particle-shaped metal oxide particles known in the art can be used as it is. In particular, when a cured product is required to have excellent transparency, it is preferred to use a dispersion of metal oxide particles.

本發明使用之金屬氧化物粒子(A2)可直接為具有所定數平均粒徑之金屬氧化物粒子(Aa2),但是較佳為鍵結金屬氧化物粒子(Aa2)與具有聚合性不飽和基之有機化合物(Ab)所成之粒子(以下有時稱為「反應性粒子(Aab2)」)。金屬氧化物粒子(A)使用鍵結金屬氧化物粒子(Aa2)與具有聚合性不飽和基之有機化合物(Ab)之反應性粒子(Aab2),可提高由所得之硬化性樹脂組成物所構成之硬化膜的耐擦傷性。此處鍵結係指共價鍵或物理吸附等之非共價鍵。The metal oxide particles (A2) used in the present invention may be directly metal oxide particles (Aa2) having a predetermined number average particle diameter, but are preferably bonded metal oxide particles (Aa2) and having a polymerizable unsaturated group. Particles formed by the organic compound (Ab) (hereinafter sometimes referred to as "reactive particles (Aab2)"). The metal oxide particles (A) are formed by using the reactive particles (Aab2) of the bonded metal oxide particles (Aa2) and the organic compound (Ab) having a polymerizable unsaturated group, thereby improving the composition of the obtained curable resin composition. The scratch resistance of the cured film. Here, the bond refers to a non-covalent bond such as a covalent bond or a physical adsorption.

具有聚合性不飽和基之有機化合物(Ab)本發明用之有機化合物(Ab)係具有聚合性不飽和基之化合物,較佳為含有下述一般式(A-1)所示之基的有機化合物。又,以含有[-O-C(=O)-NH-]基、[-O-C(=S)-NH-]基及[-S-C(=O)-NH-]基中至少一種者較佳。此有機化合物(Ab)較佳為分子內具有矽烷醇基之化合物或經水解生成矽烷醇基之化合物。Organic compound (Ab) having a polymerizable unsaturated group The organic compound (Ab) used in the present invention is a compound having a polymerizable unsaturated group, and preferably an organic group having a group represented by the following general formula (A-1) Compound. Further, at least a group containing [-O-C(=O)-NH-], [-O-C(=S)-NH-], and [-S-C(=O)-NH-] One is preferred. The organic compound (Ab) is preferably a compound having a stanol group in the molecule or a compound which is hydrolyzed to form a stanol group.

[式中,U為NH、O(氧原子)或S(硫原子),V為O或S] [wherein, U is NH, O (oxygen atom) or S (sulfur atom), and V is O or S]

(i)聚合性不飽和基有機化合物(Ab)所含之聚合性不飽和基無特別限制,較佳例有丙烯醯基、甲基丙烯醯基、乙烯基、丙烯基、丁二烯基、苯乙烯基、乙炔基、肉桂醯基、馬來酸酯基、丙烯醯胺基。(i) The polymerizable unsaturated group contained in the polymerizable unsaturated organic compound (Ab) is not particularly limited, and preferred examples thereof include an acryl fluorenyl group, a methacryl fluorenyl group, a vinyl group, a propenyl group, a butadienyl group, and the like. Styryl, ethynyl, cinnamyl, maleate, acrylamide.

此聚合性不飽和基係藉由活性自由基種加成聚合之構成單位。The polymerizable unsaturated group is a constituent unit of addition polymerization of an active radical species.

(ii)前述式(A-1)所示之基有機化合物所含之前述式(A-1)所示之基[-U-C(=V)-NH-]之具體例有[-O-C(=O)-NH-]、[-O-C(=S)-NH-]、[-S-C(=O)-NH-]、[-NH-C(=O)-NH-]、[-NH-C(=S)-NH-]及[-S-C(=S)-NH-]之6種。這些基可單獨一種或組合兩種以上使用。其中從熱安定性之觀點,較佳為[-O-C(=O)-NH-]基與[-O-C(=S)-NH-]基及[-S-C(=O)-NH-]基之至少一種併用。(ii) A specific example of the group [-U-C(=V)-NH-] represented by the above formula (A-1) contained in the base organic compound represented by the above formula (A-1) is [-O] -C(=O)-NH-], [-O-C(=S)-NH-], [-S-C(=O)-NH-], [-NH-C(=O)-NH -], 6 kinds of [-NH-C(=S)-NH-] and [-S-C(=S)-NH-]. These groups may be used alone or in combination of two or more. Among them, from the viewpoint of thermal stability, it is preferably [-O-C(=O)-NH-] group and [-O-C(=S)-NH-] group and [-S-C(=O) At least one of -NH-] groups is used in combination.

前述式(A-1)所示之基[-U-C(=V)-NH-]係使分子間產生利用氫鍵之適度的凝集力,形成硬化物時,賦予優越之機械強度、與基材或高折射率層之鄰接層之密著性及耐熱性等特性者。The group [-U-C(=V)-NH-] represented by the above formula (A-1) imparts a moderate cohesive force by hydrogen bonding between molecules, and when a cured product is formed, excellent mechanical strength is imparted, and The adhesion of the adjacent layer of the substrate or the high refractive index layer and the heat resistance.

(iii)矽烷醇基或經水解生成矽烷醇基之基有機化合物(Ab)係分子內具有矽烷醇基之化合物或經水解生成矽烷醇基之基的化合物較佳。這種生成矽烷醇基的化合物例如有矽原子上鍵結烷氧基、芳氧基、乙醯氧基、胺基、鹵原子等之化合物,較佳為矽原子上鍵結烷氧基或芳氧基之化合物,即,含有烷氧基甲矽烷基之化合物或含芳氧基甲矽烷基的化合物。(iii) A stanol group or a base organic compound (Ab) which is hydrolyzed to form a stanol group is preferably a compound having a stanol group in the molecule or a compound which is hydrolyzed to form a stanol group. The stanol group-forming compound is, for example, a compound having a ruthenium atom bonded to an alkoxy group, an aryloxy group, an ethoxylated group, an amine group, a halogen atom or the like, preferably an alkoxy group or an aromatic group bonded to a ruthenium atom. A compound of an oxy group, that is, a compound containing an alkoxycarbenyl group or a compound containing an aryloxycarboxyalkyl group.

矽烷醇基或生成矽烷醇基之化合物的矽烷醇基生成部位係因縮合反應或水解後所產生之縮合反應,與氧化物粒子(Aa)鍵結之構成單位。The stanol group-forming site of the stanol group or the thiol group-forming compound is a constituent unit bonded to the oxide particle (Aa) by a condensation reaction or a condensation reaction after hydrolysis.

(iv)較佳之形態有機化合物(Ab)之較佳具體例,例如下述式(A-2)表示之化合物等。(iv) Preferred specific examples of the preferred morphological organic compound (Ab), for example, a compound represented by the following formula (A-2).

式中,R2 4 、R2 5 可相同或不相同之氫原子或碳數1~8之烷基或芳基,例如甲基、乙基、丙基、丁基、辛基、苯基、二甲苯基等。j為1~3之整數。Wherein R 2 4 and R 2 5 may be the same or different hydrogen atoms or alkyl or aryl groups having 1 to 8 carbon atoms, such as methyl, ethyl, propyl, butyl, octyl, phenyl, Xylyl group and the like. j is an integer from 1 to 3.

[(R2 4 O)j R2 5 3 j Si-]所示之基例如有三甲氧基甲矽烷基、三乙氧基甲矽烷基、三苯氧基甲矽烷基、甲基二甲氧基甲矽烷基、二甲基甲氧基矽烷基等。這種基中,較佳為三甲氧基甲矽烷基或三乙氧基甲矽烷基。The group represented by [(R 2 4 O) j R 2 5 3 - j Si-] is, for example, trimethoxymethyl decyl, triethoxy methoxyalkyl, triphenyloxycarbyl, methyl dimethyl Oxymethane alkyl, dimethyl methoxyalkyl, and the like. Of such a group, a trimethoxycarbenyl group or a triethoxycarbenyl group is preferred.

R2 6 為碳數1~12之具有脂肪族或芳香族構造之二價有機基,可含有直鏈、支鏈狀或環狀之構造。具體例有伸甲基、伸乙基、伸丙基、伸丁基、伸己基、伸環己基、伸苯基、伸二甲苯基、伸十二烷基等。R 2 6 is a divalent organic group having an aliphatic or aromatic structure having 1 to 12 carbon atoms and may have a linear, branched or cyclic structure. Specific examples include methyl group, ethyl group, propyl group, butyl group, hexyl group, hexylene group, phenyl group, xylylene group, and dodecyl group.

R2 7 為二價有機基,通常選自分子量14~1萬,較佳為分子量76~500之二價有機基。具體例有伸己基、伸辛基、伸十二烷基等直鏈狀聚伸烷基;伸環己基、伸冰片烷基等脂環或多環之二價有機基;伸苯基、伸萘基、伸聯苯基、聚伸苯基等二價芳香族基;及這些烷基取代物、芳基取代物。這些二價有機基可含有含碳原子及氫原子以外之元素的原子團,也可含聚醚鍵、聚酯鍵、聚醯胺鍵、聚碳酸酯鍵。R 2 7 is a divalent organic group, and is usually selected from a divalent organic group having a molecular weight of 14 to 10,000, preferably a molecular weight of 76 to 500. Specific examples include a linear polyalkylene group such as a hexyl group, an exo-octyl group, and a dodecyl group; an alicyclic or polycyclic divalent organic group such as a cyclohexyl group or a borneol alkyl group; a divalent aromatic group such as a phenyl group or a polyphenylene group; and these alkyl substituents and aryl substituents. These divalent organic groups may contain an atomic group containing an element other than a carbon atom and a hydrogen atom, and may also contain a polyether bond, a polyester bond, a polyamid bond, or a polycarbonate bond.

R2 8 為(k+1)價之有機基,較佳為選自直鏈狀、支鏈狀或環狀之飽和烴基、不飽和烴基。R 2 8 is an organic group of (k+1) valence, preferably a linear, branched or cyclic saturated hydrocarbon group or an unsaturated hydrocarbon group.

Z為在活性自由基種之存在下,分子中具有進行分子間交聯反應之聚合性不飽和基之一價有機基。又,k較佳為1~20之整數,較佳為1~10之整數,特佳為1~5之整數。Z is a monovalent organic group having a polymerizable unsaturated group which undergoes an intermolecular crosslinking reaction in the presence of a living radical species. Further, k is preferably an integer of 1 to 20, preferably an integer of 1 to 10, and particularly preferably an integer of 1 to 5.

式(A-2)所示之化合物之具體例有下述式(A-4)及(A-5)表示之化合物。Specific examples of the compound represented by the formula (A-2) include compounds represented by the following formulas (A-4) and (A-5).

(式中「Acryl」係丙烯醯基,「Me」為甲基) (wherein "Acryl" is a acrylonitrile group and "Me" is a methyl group)

本發明所用之有機化合物(Ab)之合成,可採用例如日本特開平9-100111號公報記載之方法。較佳為將巰基丙基三甲氧基矽烷與異佛爾酮二異氰酸酯在二丁基錫二月桂酸酯之存在下混合,於60~70℃經數小時反應後,添加季戊四醇三丙烯酸酯,再於60~70℃反應數小時來製造。For the synthesis of the organic compound (Ab) used in the present invention, for example, a method described in JP-A-9-100111 can be employed. Preferably, the mercaptopropyltrimethoxydecane and isophorone diisocyanate are mixed in the presence of dibutyltin dilaurate, and after reacting at 60 to 70 ° C for several hours, pentaerythritol triacrylate is added, and then 60 It is produced by reacting at ~70 ° C for several hours.

反應性粒子(Aab1)及(Aab2)使具有矽烷醇基或經水解生成矽烷醇基之基的有機化合物(Ab)與金屬氧化物粒子(Aa)混合,水解後使兩者鍵結。所得之反應粒子(Aab)中之有機聚合物成份,即,水解性矽烷之水解物及縮合物的比例,通常係將乾燥粉體於空氣中完全燃燒時之質量減少%的恆量值,例如可藉由在空氣中,由室溫至通常為800℃之熱質量分析求得。The reactive particles (Aab1) and (Aab2) are mixed with an organic compound (Ab) having a stanol group or a group which is hydrolyzed to form a stanol group, and are hydrolyzed to bond the two. The ratio of the organic polymer component in the obtained reaction particles (Aab), that is, the hydrolyzate and the condensate of the hydrolyzable decane, is usually a constant value of % reduction in mass when the dry powder is completely burned in the air, for example, It can be determined by thermal mass analysis in air from room temperature to usually 800 °C.

金屬氧化物粒子(Aa)之有機化合物(Ab)的鍵結量係當反應性粒子(Aab)(金屬氧化物粒子(Aa)及有機化合物(Ab)之合計)為100質量%時,較佳為0.01質量%以上,更佳為0.1質量%以上,特佳為1質量%以上。與金屬氧化物粒子(Aa)鍵結之有機化合物(Ab)之鍵結量未達0.01質量%時,組成物中之反應性粒子(Aab)之分散性不足,有時所得之硬化物之透明性及耐擦傷性不足。又,製造反應性粒子(Aab)時之原料中之金屬氧化物粒子(Aa)的配合比例,較佳為5~99質量%,更佳為10~98質量%。The amount of bonding of the organic compound (Ab) of the metal oxide particles (Aa) is preferably 100% by mass of the reactive particles (Aab) (the total of the metal oxide particles (Aa) and the organic compound (Ab)). It is 0.01% by mass or more, more preferably 0.1% by mass or more, and particularly preferably 1% by mass or more. When the amount of bonding of the organic compound (Ab) bonded to the metal oxide particles (Aa) is less than 0.01% by mass, the dispersibility of the reactive particles (Aab) in the composition is insufficient, and the obtained cured product may be transparent. Insufficient sex and scratch resistance. Moreover, the mixing ratio of the metal oxide particles (Aa) in the raw material in the case of producing the reactive particles (Aab) is preferably from 5 to 99% by mass, more preferably from 10 to 98% by mass.

金屬氧化物粒子(A1)(即反應性粒子(Aab1))之硬化性樹脂組成物中之配合量(含量)係不包括有機溶劑之組成物全量為100質量%時,較佳為10~90質量%,更佳為20~80質量%,特佳為40~80質量%。未達10質量%時,硬化膜之硬度不足,或有時無法得到高折射率。超過90質量%時,成膜性不足。此時構成反應性粒子(Aab1)之金屬氧化物粒子(Aa1)之含量係反應性粒子(Aab1)之65~95質量%較佳。The compounding amount (content) in the curable resin composition of the metal oxide particles (A1) (that is, the reactive particles (Aab1)) is preferably 10 to 90 when the total amount of the composition excluding the organic solvent is 100% by mass. The mass% is more preferably 20 to 80% by mass, and particularly preferably 40 to 80% by mass. When it is less than 10% by mass, the hardness of the cured film is insufficient, or a high refractive index may not be obtained. When it exceeds 90% by mass, the film formability is insufficient. The content of the metal oxide particles (Aa1) constituting the reactive particles (Aab1) at this time is preferably 65 to 95% by mass of the reactive particles (Aab1).

金屬氧化物粒子(A2)(金屬氧化物粒子(Aa2)、反應性粒子(Aab2)其中之一)之硬化性樹脂組成物中之配合量(含量)係不包括有機溶劑之組成物全量為100質量%時,較佳為1~30質量%,更佳為1~20質量%。The compounding amount (content) in the curable resin composition of the metal oxide particles (A2) (one of the metal oxide particles (Aa2) and the reactive particles (Aab2)) is 100% of the composition excluding the organic solvent. In the case of % by mass, it is preferably from 1 to 30% by mass, more preferably from 1 to 20% by mass.

(B)含有乙烯性不飽和基之含氟聚合物本發明用之含有乙烯性不飽和基之含氟聚合物係具有1個異氰酸酯基與至少1個乙烯性不飽和基之化合物(B-1)與含羥基之含氟聚合物(B-2)反應所得,以異氰酸酯基/羥基之莫耳比為1.1~1.9反應所得者較佳。(B) Fluorine-containing polymer containing ethylenically unsaturated group The fluorine-containing polymer containing ethylenically unsaturated group used in the invention is a compound having one isocyanate group and at least one ethylenically unsaturated group (B-1) The reaction with the hydroxyl group-containing fluoropolymer (B-2) is preferably carried out by reacting an isocyanate group/hydroxyl molar ratio of 1.1 to 1.9.

(B-1)具有1個異氰酸酯基與至少1個乙烯性不飽和基之化合物化合物(B-1)只要在分子內具有1個異氰酸酯基與至少1個乙烯性不飽和基之化合物時,即無特別限定。具有2個以上之異氰酸酯基時,與含羥基之含氟聚合物反應,可能會產生凝膠化。上述乙烯性不飽和基可使硬化性樹脂組成物更容易硬化,因此,較佳為(甲基)丙烯醯基。這種化合物例如有2-(甲基)丙烯醯氧基乙基異氰酸酯、2-(甲基)丙烯醯氧基丙基異氰酸酯、1,1-雙((甲基)丙烯醯氧基甲基〕乙基異氰酸酯之單獨一種或2種以上之組合。(B-1) The compound (B-1) having one isocyanate group and at least one ethylenically unsaturated group is a compound having one isocyanate group and at least one ethylenically unsaturated group in the molecule, that is, There is no special limit. When there are two or more isocyanate groups, it may react with the hydroxyl group-containing fluoropolymer to cause gelation. The ethylenically unsaturated group can make the curable resin composition more easily hardened, and therefore, it is preferably a (meth) acrylonitrile group. Such a compound is, for example, 2-(meth)acryloxyethyl isocyanate, 2-(meth)acryloxypropyl isocyanate, 1,1-bis((meth)acryloxymethyl) Ethyl isocyanate may be used alone or in combination of two or more.

這種化合物係使二異氰酸酯基與含羥基之(甲基)丙烯酸酯反應來合成。此時,二異氰酸酯例如2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、1,3-二甲苯二異氰酸酯、1,4-二甲苯二異氰酸酯、1,5-萘二異氰酸酯、間苯二異氰酸酯、對苯二異氰酸酯、3,3’-二甲基-4,4’-二苯基甲烷二異氰酸酯、4,4’-二苯基甲烷二異氰酸酯、3,3’-二甲基苯二異氰酸酯、4,4’-聯苯二異氰酸酯、1,6-己烷二異氰酸酯、異氟爾酮二異氰酸酯、甲撐雙(4-環己基異氰酸酯)、2,2,4-三甲基六甲撐二異氰酸酯、雙(2-異氰酸酯乙基)富馬酸酯、6-異丙基-1,3-苯基二異氰酸酯、4-二苯基丙烷二異氰酸酯、賴胺酸二異氰酸酯、氫化二苯基甲烷二異氰酸酯、1,3-雙(異氰酸酯甲基)環己烷、四甲基二甲苯二異氰酸酯、2,5(或6)-雙(異氰酸酯甲基)-雙環〔2.2.1〕庚烷等單獨一種或2種以上之組合。其中較佳者為2,4-甲苯二異氰酸酯、異氟爾酮二異氰酸酯、二甲苯二異氰酸酯、甲撐雙(4-環己基異氰酸酯)、1,3-雙(異氰酸酯甲基)環己烷。This compound is synthesized by reacting a diisocyanate group with a hydroxyl group-containing (meth) acrylate. At this time, a diisocyanate such as 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 1,3-xylene diisocyanate, 1,4-dimethylbenzene diisocyanate, 1,5-naphthalene diisocyanate, m-benzene Diisocyanate, p-phenylene diisocyanate, 3,3'-dimethyl-4,4'-diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate, 3,3'-dimethylbenzene Diisocyanate, 4,4'-biphenyldiisocyanate, 1,6-hexane diisocyanate, isophorone diisocyanate, methylene bis(4-cyclohexyl isocyanate), 2,2,4-trimethylhexa Diisocyanate, bis(2-isocyanateethyl)fumarate, 6-isopropyl-1,3-phenyldiisocyanate, 4-diphenylpropane diisocyanate, lysine diisocyanate, hydrogenated diphenyl Methane diisocyanate, 1,3-bis(isocyanatemethyl)cyclohexane, tetramethylxylene diisocyanate, 2,5(or 6)-bis(isocyanatemethyl)-bicyclo[2.2.1]heptane A single type or a combination of two or more types. Preferred among them are 2,4-toluene diisocyanate, isophorone diisocyanate, xylene diisocyanate, methylene bis(4-cyclohexyl isocyanate), and 1,3-bis(isocyanate methyl)cyclohexane.

含羥基之(甲基)丙烯酸酯例如有2-羥乙基(甲基)丙烯酸酯、2-羥丁基(甲基)丙烯酸酯、2-羥丙基(甲基)丙烯酸酯、己內酯(甲基)丙烯酸酯、聚丙二醇(甲基)丙烯酸酯、季戊四醇五(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯單硬酯酸酯、三聚氰酸EO改質二(甲基)丙烯酸酯等之單獨一種或2種以上之組合。其中較佳者為2-羥乙基(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯。其中含羥基之多官能(甲基)丙烯酸酯之市售品,例如有大阪有機化學(股)製商品名HEA、日本化藥(股)製商品名KAYARAD DPHA、PET-30、東亞合成(股)製商品名Aronix M-215、M-233、M-305、M-400等。The hydroxyl group-containing (meth) acrylate is, for example, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, caprolactone. (Meth) acrylate, polypropylene glycol (meth) acrylate, pentaerythritol penta (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol di (meth) acrylate monostearate, trimerization The cyanic acid EO-modified di(meth)acrylate or the like may be used alone or in combination of two or more. Preferred among them are 2-hydroxyethyl (meth) acrylate and pentaerythritol tri (meth) acrylate. Commercial products in which a hydroxyl group-containing polyfunctional (meth) acrylate is commercially available, for example, under the trade name HEA of Osaka Organic Chemical Co., Ltd., under the trade name KAYARAD DPHA, PET-30, East Asia Synthetic Co., Ltd. The product names are Aronix M-215, M-233, M-305, M-400, etc.

由二異氰酸酯及含羥基之多官能(甲基)丙烯酸酯合成時,對於二異氰酸酯1莫耳,含羥基之多官能(甲基)丙烯酸酯之添加量較佳為1~1.2莫耳。When it is synthesized from a diisocyanate and a hydroxyl group-containing polyfunctional (meth) acrylate, the amount of the hydroxyl group-containing polyfunctional (meth) acrylate added to the diisocyanate 1 mol is preferably from 1 to 1.2 mol.

這種化合物之合成方法例如有將二異氰酸酯及含羥基之(甲基)丙烯酸酯一次投入,進行反應的方法、將二異氰酸酯滴入含羥基之(甲基)丙烯酸酯中進行反應的方法等。The method for synthesizing such a compound is, for example, a method in which a diisocyanate and a hydroxyl group-containing (meth) acrylate are introduced in one step, and a method in which a diisocyanate is dropped into a hydroxyl group-containing (meth) acrylate to carry out a reaction.

(B-2)含羥基之含氟聚合物含羥基之含氟聚合物(B-2)較佳為由下述構造單位(a)、(b)、(c)所構成,更佳為含有構造單位(d)、(e)、(f)。(B-2) Hydroxyl group-containing fluoropolymer The hydroxyl group-containing fluoropolymer (B-2) is preferably composed of the following structural units (a), (b), and (c), and more preferably contains Construction units (d), (e), (f).

構造單位(a)構造單位(a)係以下述一般式(1)表示。Structural unit (a) The structural unit (a) is represented by the following general formula (1).

〔式中,R1 係氟原子、氟烷基、或-OR2 表示之基(R2 為烷基或氟烷基)〕 Wherein R 1 is a fluorine atom, a fluoroalkyl group or a group represented by -OR 2 (R 2 is an alkyl group or a fluoroalkyl group)]

上述一般式(1)中,R1 及R2 之氟烷基例如有三氟甲基、全氟乙基、全氟丙基、全氟丁基、全氟己基、全氟環己基等碳數1~6之氟烷基。又,R2 之烷基例如有甲基、乙基、丙基、丁基、己基、環己基等碳數1~6之烷基。In the above general formula (1), the fluoroalkyl group of R 1 and R 2 is, for example, a carbon number such as a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluorobutyl group, a perfluorohexyl group or a perfluorocyclohexyl group. ~6 fluoroalkyl. Further, the alkyl group of R 2 may have an alkyl group having 1 to 6 carbon atoms such as a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group or a cyclohexyl group.

以含氟乙烯系單體作為聚合成分使用,藉此導入構造單位(a)。這種含氟乙烯系單體只要是具有至少1個聚合性不飽和雙鍵與至少1個氟原子之化合物時,即無特別限制。這種例有四氟乙烯、六氟丙烯、3,3,3-三氟丙烯等之氟烯烴類;烷基全氟乙烯醚或烷氧烷基全氟乙烯醚類;全氟(甲基乙烯醚)、全氟(乙基乙烯醚)、(丙基乙烯醚)、全氟(丁基乙烯醚)、全氟(異丁基乙烯醚)等之全氟(烷基乙烯醚)類;全氟(丙氧基丙基乙烯醚)等之全氟(烷氧基烷基乙烯醚)類之單獨一種或二種以上之組合。其中較佳者為六氟丙烯與全氟(烷基乙烯醚)或全氟(烷氧基烷基乙烯醚),更佳為組合使用這些化合物。The structural unit (a) is introduced by using a fluorine-containing vinyl monomer as a polymerization component. The fluorine-containing vinyl monomer is not particularly limited as long as it has at least one polymerizable unsaturated double bond and at least one fluorine atom. Examples of such are fluorine olefins such as tetrafluoroethylene, hexafluoropropylene, 3,3,3-trifluoropropene; alkyl perfluorovinyl ether or alkoxyalkyl perfluorovinyl ether; perfluoro(methylethylene) Perfluoro(alkyl vinyl ether)s such as ether), perfluoro(ethyl vinyl ether), (propyl vinyl ether), perfluoro(butyl vinyl ether), perfluoro(isobutyl vinyl ether); A single or a combination of two or more of perfluoro(alkoxyalkylvinyl ether)s such as fluorine (propoxypropyl vinyl ether). Among them, preferred is hexafluoropropylene and perfluoro(alkyl vinyl ether) or perfluoro(alkoxyalkyl vinyl ether), and it is more preferred to use these compounds in combination.

構造單位(a)之含有率係當含羥基之含氟聚合物(B-2)之全量為100莫耳%時,含有20~70莫耳%。此理由係當含有率未達20莫耳%時,有時較不易具有本發明所想要之含氟材料之光學特徵之低折射率的緣故,另外,含有率超過70莫耳%時,含羥基之含氟聚合物(B-2)對有機溶劑之溶解性、透明性或對基材之密著性,有時會降低。又,基於這種理由,對於含羥基之含氟聚合物(B-2)之全量時,構造單位(a)之含有率較佳為25~65莫耳%,更佳為30~60莫耳%。The content of the structural unit (a) is 20 to 70 mol% when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is 100 mol%. The reason for this is that when the content rate is less than 20 mol%, the low refractive index of the optical characteristics of the fluorine-containing material desired in the present invention may be less likely to occur, and when the content exceeds 70 mol%, The solubility of the hydroxyl group-containing fluoropolymer (B-2) in an organic solvent, transparency, or adhesion to a substrate may be lowered. Further, for this reason, when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is used, the content of the structural unit (a) is preferably 25 to 65 mol%, more preferably 30 to 60 mol%. %.

構造單位(b)構造單位(b)係以下述一般式(2)表示。Structural unit (b) The structural unit (b) is represented by the following general formula (2).

〔式中,R3 係氫原子或甲基,R4 係烷基、-(CH2 )X -OR5 或-OCOR5 表示之基(R5 為烷基、或環氧丙基,x為0或1的數)、羧基或烷氧基羰基〕 Wherein R 3 is a hydrogen atom or a methyl group, R 4 is an alkyl group, a group represented by —(CH 2 ) X —OR 5 or —OCOR 5 (R 5 is an alkyl group or an epoxypropyl group, and x is a number of 0 or 1), a carboxyl group or an alkoxycarbonyl group]

一般式(2)中,R4 或R5 之烷基例如有甲基、乙基、丙基、己基、環己基、月桂基等碳數1~12之烷基,而烷氧羰基例如有甲氧羰基、乙氧羰基等。In the general formula (2), the alkyl group of R 4 or R 5 is , for example, an alkyl group having 1 to 12 carbon atoms such as a methyl group, an ethyl group, a propyl group, a hexyl group, a cyclohexyl group or a lauryl group, and an alkoxycarbonyl group such as a group Oxycarbonyl, ethoxycarbonyl and the like.

以具有上述取代基之乙烯系單體作為聚合成分使用,藉此可導入構造單位(b)。此種乙烯系單體例如有甲基乙烯醚、乙基乙烯醚、正丙基乙烯醚、異丙基乙烯醚、正丁基乙烯醚、異丁基乙烯醚、第三丁基乙烯醚、正戊基乙烯醚、正己基乙烯醚、正辛基乙烯醚、正十二烷基乙烯醚、2-乙基己基乙烯醚、環己基乙烯醚等之烷基乙烯醚或環烷基乙烯醚類;乙基烯丙基醚、丁基烯丙基醚等之烯丙基醚類;乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、三甲基乙酸乙烯酯、己酸乙烯酯、叔碳酸(Versatic acid)乙烯酯、硬脂酸乙烯酯等之羧酸乙烯酯類;甲基(甲基)丙烯酸酯、乙基(甲基)丙烯酸酯、正丁基(甲基)丙烯酸酯、異丁基(甲基)丙烯酸酯、2-甲氧基乙基(甲基)丙烯酸酯、2-乙氧基乙基(甲基)丙烯酸酯、2-(正丙氧基)乙基(甲基)丙烯酸酯等之(甲基)丙烯酸酯類;(甲基)丙烯酸、巴豆酸、順丁烯二酸、反丁烯二酸、衣康酸等之不飽和羧酸類等之單獨一種或二種以上之組合。The vinyl monomer having the above substituent is used as a polymerization component, whereby the structural unit (b) can be introduced. Examples of such a vinyl monomer include methyl vinyl ether, ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, t-butyl vinyl ether, and positive An alkyl vinyl ether or a cycloalkyl vinyl ether of pentyl vinyl ether, n-hexyl vinyl ether, n-octyl vinyl ether, n-dodecyl vinyl ether, 2-ethylhexyl vinyl ether, cyclohexyl vinyl ether or the like; Allyl ethers such as ethyl allyl ether and butyl allyl ether; vinyl acetate, vinyl propionate, vinyl butyrate, trimethyl vinyl acetate, vinyl hexanoate, tertiary carbonic acid ( Versatic acid) vinyl carboxylate such as vinyl ester or vinyl stearate; methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (Meth) acrylate, 2-methoxyethyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate, 2-(n-propoxy)ethyl (meth) acrylate a (meth) acrylate such as an ester; a single carboxylic acid such as (meth)acrylic acid, crotonic acid, maleic acid, fumaric acid or itaconic acid Or a combination of two or more kinds.

構造單位(b)之含有率係當含羥基之含氟聚合物(B-2)之全體量為100莫耳%時,含有10~70莫耳%。此理由係當含有率未達10莫耳%時,含羥基之含氟聚合物(B-2)對有機溶劑之溶解性有時會降低,另外,含有率超過70莫耳%時,含羥基之含氟聚合物(B-2)之透明性及低反射率性等光學特性有時會降低的緣故。又,基於此理由,對於含羥基之含氟聚合物(B-2)之全體量時,構造單位(b)之含有率較佳為20~60莫耳%,更佳為30~60莫耳%。The content of the structural unit (b) is 10 to 70 mol% when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is 100 mol%. For this reason, when the content rate is less than 10 mol%, the solubility of the hydroxyl group-containing fluoropolymer (B-2) in an organic solvent may be lowered, and when the content exceeds 70 mol%, the hydroxyl group is contained. The optical properties such as transparency and low reflectance of the fluoropolymer (B-2) may be lowered. Further, for this reason, when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is used, the content of the structural unit (b) is preferably 20 to 60 mol%, more preferably 30 to 60 mol%. %.

構造單位(c)構造單位(c)係以下述一般式(3)表示。Structural unit (c) The structural unit (c) is represented by the following general formula (3).

〔式中,R6 係氫原子或甲基,R7 係氫原子或羥烷基,v為0或1之數〕 Wherein R 6 is a hydrogen atom or a methyl group, R 7 is a hydrogen atom or a hydroxyalkyl group, and v is 0 or 1

一般式(3)中,R7 之羥烷基例如有2-羥乙基、2-羥丙基、3-羥丙基、4-羥丁基、3-羥丁基、5-羥戊基、6-羥己基。In the general formula (3), the hydroxyalkyl group of R 7 is , for example, 2-hydroxyethyl, 2-hydroxypropyl, 3-hydroxypropyl, 4-hydroxybutyl, 3-hydroxybutyl, 5-hydroxypentyl. , 6-hydroxyhexyl.

以含羥基之乙烯系單體作為聚合成分使用,藉此導入構造單位(c)。這種含羥基之乙烯系單體例如有2-羥乙基乙烯醚、3-羥丙基乙烯醚、2-羥丙基乙烯醚、4-羥丁基乙烯醚、3-羥丁基乙烯醚、5-羥戊基乙烯醚、6-羥己基乙烯醚等之含羥基之乙烯醚類;2-羥乙基烯丙基醚、4-羥丁基烯丙基醚、甘油單烯丙基醚等含羥基之烯丙基醚類;烯丙基醇等。又,含羥基之乙烯系單體除上述外,可使用例如2-羥乙基(甲基)丙烯酸酯、2-羥丁基(甲基)丙烯酸酯、2-羥丙基(甲基)丙烯酸酯、己內酯(甲基)丙烯酸酯、聚丙二醇(甲基)丙烯酸酯等。The structural unit (c) is introduced by using a hydroxyl group-containing vinyl monomer as a polymerization component. The hydroxyl group-containing vinyl monomer is, for example, 2-hydroxyethyl vinyl ether, 3-hydroxypropyl vinyl ether, 2-hydroxypropyl vinyl ether, 4-hydroxybutyl vinyl ether, 3-hydroxybutyl vinyl ether. a hydroxyl group-containing vinyl ether such as 5-hydroxypentyl vinyl ether or 6-hydroxyhexyl vinyl ether; 2-hydroxyethyl allyl ether, 4-hydroxybutyl allyl ether, glycerol monoallyl ether And other hydroxyl-containing allyl ethers; allyl alcohol and the like. Further, in addition to the above, a hydroxyl group-containing vinyl monomer may be, for example, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate or 2-hydroxypropyl (meth) acrylate. Ester, caprolactone (meth) acrylate, polypropylene glycol (meth) acrylate, and the like.

構造單位(c)之含有率係當含羥基之含氟聚合物(B-2)之全體量為100莫耳%時,較佳為含有5~70莫耳%。此理由係當未達5莫耳%時,含羥基之含氟聚合物(B-2)對有機溶劑之溶解性有時會降低,而含有率超過70莫耳%時,含羥基之含氟聚合物(B-2)之透明性及低反射率性等光學特性有時會降低。基於這種理由,對於含羥基之含氟聚合物(B-2)之全體量,構造單位(c)之含有率較佳為5~40莫耳%,更佳為5~30莫耳%。The content of the structural unit (c) is preferably from 5 to 70 mol% when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is 100 mol%. For this reason, when the amount is less than 5 mol%, the solubility of the hydroxyl group-containing fluoropolymer (B-2) in an organic solvent may be lowered, and when the content exceeds 70 mol%, the hydroxyl group-containing fluorine is contained. The optical properties such as transparency and low reflectance of the polymer (B-2) may be lowered. For this reason, the content of the structural unit (c) is preferably from 5 to 40 mol%, more preferably from 5 to 30 mol%, based on the total amount of the hydroxyl group-containing fluoropolymer (B-2).

構造單位(d)及構造單位(e)含羥基之含氟聚合物(B-2)可進一步含有下述構造單位(d)來構成較佳。以下說明構造單位(d)。Structural unit (d) and structural unit (e) The hydroxyl group-containing fluoropolymer (B-2) may further preferably comprise the following structural unit (d). The construction unit (d) is explained below.

構造單位(d)係以下述一般式(4)表示。The structural unit (d) is represented by the following general formula (4).

[式中,R8 及R9 可為相同或不相同之氫原子、烷基、鹵化烷基或芳基] Wherein R 8 and R 9 may be the same or different hydrogen atom, alkyl group, halogenated alkyl group or aryl group]

一般式(4)中,R8 或R9 之烷基例如有甲基、乙基、丙基等之碳數1~3之烷基;鹵化烷基例如有三氟甲基、全氟乙基、全氟丙基、全氟丁基等碳數1~4之氟烷基等,而芳基例如有苯基、苄基、萘基等。In the general formula (4), the alkyl group of R 8 or R 9 is , for example, an alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group or a propyl group; and the halogenated alkyl group is, for example, a trifluoromethyl group or a perfluoroethyl group. A fluoroalkyl group having 1 to 4 carbon atoms such as a perfluoropropyl group or a perfluorobutyl group, and the aryl group is, for example, a phenyl group, a benzyl group or a naphthyl group.

可使用以上述一般式(4)所示之具有聚矽氧烷鏈段之含偶氮基之聚矽氧烷化合物,藉此導入構造單位(d)。此種含有偶氮基聚矽氧烷化合物例如有下述一般式(7)表示之化合物。The azo group-containing polyoxyalkylene compound having a polyoxyalkylene segment represented by the above general formula (4) can be used, whereby the structural unit (d) can be introduced. Such an azo-containing polyoxyalkylene compound is, for example, a compound represented by the following general formula (7).

〔式中,R1 0 ~R1 3 、R1 4 ~R1 7 、p、q、s、t及y係與上述一般式(5)相同,z為1~20之數。〕 [wherein, R 1 0 to R 1 3 , R 1 4 to R 1 7 , p, q, s, t, and y are the same as the above general formula (5), and z is a number from 1 to 20. 〕

使用一般式(7)所示之化合物時,構造單位(d)係作為構造單位(e)之一部份,包含於含羥基之含氟聚合物中。When the compound of the general formula (7) is used, the structural unit (d) is a part of the structural unit (e) and is contained in the hydroxyl group-containing fluoropolymer.

構造單位(e)係以下述一般式(5)所示。The structural unit (e) is represented by the following general formula (5).

[式中,R1 0 ~R1 3 係表示氫原子、烷基或氰基,R1 4 ~R1 7 係表示氫原子或烷基,p、q為1~6之數,s、t為0~6之數,y為1~200之數] [wherein, R 1 0 to R 1 3 represents a hydrogen atom, an alkyl group or a cyano group, and R 1 4 to R 1 7 represents a hydrogen atom or an alkyl group, and p and q are numbers of 1 to 6, s, t For the number 0~6, y is the number from 1~200]

一般式(5)中,R1 0 ~R1 3 之烷基例如有甲基、乙基、丙基、己基、環己基等之碳數1~12之烷基,R1 4 ~R1 7 之烷基例如有甲基、乙基、丙基等碳數1~3之烷基。In the general formula (5), the alkyl group of R 1 0 to R 1 3 is , for example, an alkyl group having 1 to 12 carbon atoms such as a methyl group, an ethyl group, a propyl group, a hexyl group or a cyclohexyl group, and R 1 4 to R 1 7 . The alkyl group is, for example, an alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group or a propyl group.

本發明中,上述一般式(7)所示之含偶氮基聚矽氧烷化合物例如有下述一般式(8)所示之化合物特佳。In the present invention, the azo-containing polyoxosiloxane compound represented by the above general formula (7) is particularly preferably a compound represented by the following general formula (8).

[式中,y及z係與上述一般式(7)相同。] [wherein, y and z are the same as the above general formula (7). ]

另外,構造單位(d)之含有率係當含羥基之含氟聚合物(B-2)之全體量為100莫耳%時,較佳為0.1~10莫耳%。此理由係含有率未達0.1莫耳%時,有時硬化後之塗膜之表面平滑性會降低,塗膜之耐擦傷性會降低,而含有率超過10莫耳%時,含羥基之含氟聚合物(B-2)之透明性較差,作為塗佈材使用時,在塗佈時容易產生小凹孔等緣故。基於此理由,對於含羥基之含氟聚合物(B-2)之全體量時,構造單位(d)之含有率為0.1~5莫耳%較佳,更佳為0.1~3莫耳%。基於相同理由,使其中所含有之構造單位(d)之含有率在上述範圍內,然後決定構造單位(e)之含有率。Further, the content ratio of the structural unit (d) is preferably 0.1 to 10 mol% when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is 100 mol%. For this reason, when the content rate is less than 0.1 mol%, the surface smoothness of the coating film after curing may be lowered, and the scratch resistance of the coating film may be lowered, and when the content ratio exceeds 10 mol%, the hydroxyl group-containing content may be contained. The fluoropolymer (B-2) is inferior in transparency, and when used as a coating material, small pits are likely to be formed during coating. For this reason, in the case of the total amount of the hydroxyl group-containing fluoropolymer (B-2), the content of the structural unit (d) is preferably from 0.1 to 5 mol%, more preferably from 0.1 to 3 mol%. For the same reason, the content ratio of the structural unit (d) contained therein is within the above range, and then the content ratio of the structural unit (e) is determined.

構造單位(f)含羥基之含氟聚合物(B-2)為進一步含有下述構造單位(f)之構成較佳。Structural unit (f) The hydroxyl group-containing fluoropolymer (B-2) is preferably a structure further containing the following structural unit (f).

說明下述構造單位(f)。The following structural unit (f) will be described.

構造單位(f)係以下述一般式(6)所示。The structural unit (f) is represented by the following general formula (6).

[式中,R1 8 係具有乳化作用之基] [wherein, R 1 8 is a group having an emulsification effect]

一般式(6)中,R1 8 之具有乳化作用之基例如,具有疏水性基及親水性基,且親水性基為聚環氧乙烷、聚環氧丙烷等之聚醚構造之基較佳。In the general formula (6), the emulsification group of R 1 8 has, for example, a hydrophobic group and a hydrophilic group, and the hydrophilic group is a polyether structure of polyethylene oxide or polypropylene oxide. good.

具有此種乳化作用之基例如有下述一般式(9)所示之基。The group having such an emulsification action is, for example, a group represented by the following general formula (9).

[式中,n為1~20之數,m為0~4之數,u為3~50之數] [where n is the number from 1 to 20, m is the number from 0 to 4, and u is the number from 3 to 50]

以反應性乳化劑作為聚合成分使用,藉此可導入構造單位(f)。此種反應性乳化劑例如有下述一般式(10)所示之化合物。The reactive emulsifier is used as a polymerization component, whereby the structural unit (f) can be introduced. Such a reactive emulsifier is, for example, a compound represented by the following general formula (10).

[式中,n、m及u係與上述一般式(9)相同] [wherein, n, m, and u are the same as the above general formula (9)]

另外,構造單位(f)之含有率係當含羥基之含氟聚合物(B-2)之全體量為100莫耳%時,較佳為0.1~5莫耳%。此理由係含有率為0.1莫耳%以上時,可提高含羥基之含氟聚合物(B-2)對溶劑之溶解性,而含有率為5莫耳%以內時,硬化性樹脂組成物之黏著性並無過度增加,處理容易,即使用於塗怖材等時,其耐濕性也不會降低。基於此種理由,對於含羥基之含氟聚合物(B-2)之全體量時,構造單位(f)之含有率較佳為以0.1~3莫耳%,更佳為0.2~3莫耳%。Further, the content ratio of the structural unit (f) is preferably 0.1 to 5 mol% when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is 100 mol%. When the content is 0.1 mol% or more, the solubility of the hydroxyl group-containing fluoropolymer (B-2) in a solvent can be improved, and when the content is 5 mol% or less, the curable resin composition is Adhesiveness is not excessively increased, and handling is easy. Even when used for coating materials, the moisture resistance is not lowered. For this reason, when the total amount of the hydroxyl group-containing fluoropolymer (B-2) is used, the content of the structural unit (f) is preferably 0.1 to 3 mol%, more preferably 0.2 to 3 mol%. %.

含羥基之含氟聚合物(B-2)之分子量含羥基之含氟聚合物(B-2)係使用凝膠滲透層析(以下稱為「GPC」),以四氫呋喃為溶劑所測定之聚苯乙烯換算數平均分子量為5,000~500,000較佳。此理由係數平均分子量未達5,000時,含羥基之含氟聚合物(B-2)之機械強度有時會降低,而數平均分子量超過500,000時,硬化性樹脂組成物之黏度增加,有時不易進行薄膜塗佈。基於此理由,含羥基之含氟聚合物(B-2)之聚苯乙烯換算之數平均分子量較佳為10,000~300,000,更佳為10,000~100,000。The hydroxyl group-containing fluoropolymer (B-2) having a hydroxyl group-containing fluoropolymer (B-2) is obtained by gel permeation chromatography (hereinafter referred to as "GPC") and measured by using tetrahydrofuran as a solvent. The number average molecular weight in terms of styrene conversion is preferably 5,000 to 500,000. When the coefficient average molecular weight is less than 5,000, the mechanical strength of the hydroxyl group-containing fluoropolymer (B-2) may be lowered, and when the number average molecular weight exceeds 500,000, the viscosity of the curable resin composition may increase, which may be difficult. Film coating was carried out. For this reason, the polystyrene-equivalent number average molecular weight of the hydroxyl group-containing fluoropolymer (B-2) is preferably from 10,000 to 300,000, more preferably from 10,000 to 100,000.

化合物(B-1)與含羥基之含氟聚合物(B-2)之反應莫耳比本發明用之含乙烯性不飽和基之含氟聚合物(B)係如上述,將含有1個異氰酸酯基及至少1個乙烯基性不飽和基之化合物(B-1)與含羥基之含氟聚合物(B-2),以異氰酸酯基/羥基之莫耳比為1.1~1.9之比率產生反應所得較佳。此理由係因莫耳比未達1.1時,有時耐擦傷性及耐久性會降低,另外,莫耳比超過1.9時,硬化性樹脂組成物之塗膜之鹼水溶液浸漬後,耐擦傷性有時會降低。又,基於此理由,異氰酸酯基/羥基之莫耳比較佳為1.1~1.5,更佳為1.2~1.5。The reaction of the compound (B-1) with the hydroxyl group-containing fluoropolymer (B-2) is more than the ethylenically unsaturated group-containing fluoropolymer (B) used in the present invention as described above, and will contain one The isocyanate group and the at least one ethylenically unsaturated group compound (B-1) and the hydroxyl group-containing fluoropolymer (B-2) are reacted at a ratio of isocyanate group/hydroxyl molar ratio of from 1.1 to 1.9. The result is better. For this reason, when the molar ratio is less than 1.1, the scratch resistance and durability may be lowered. When the molar ratio exceeds 1.9, the alkali aqueous solution of the coating film of the curable resin composition is immersed, and the scratch resistance is improved. It will decrease. Further, for this reason, the isocyanate group/hydroxyl group is preferably from 1.1 to 1.5, more preferably from 1.2 to 1.5.

硬化性樹脂組成物中之(B)含乙烯性不飽和基含氟聚合物之含量係對於有機溶劑以外之組成物全量100質量%,通常為3~70質量%。此理由係因添加量未達3質量%時,硬化性樹脂組成物之硬化塗膜之折射率增加,有時無法得到充分抗反射效果,另外,添加量超過70質量%時,硬化性樹脂組成物之硬化塗膜有時無法得到耐擦傷性。基於此理由,(B)成分之添加量較佳為10~50質量%,更佳為25~50質量%。The content of the (B) ethylenically unsaturated group-containing fluoropolymer in the curable resin composition is 100% by mass based on the total amount of the composition other than the organic solvent, and is usually from 3 to 70% by mass. When the amount of addition is less than 3% by mass, the refractive index of the cured coating film of the curable resin composition increases, and a sufficient antireflection effect may not be obtained. When the amount exceeds 70% by mass, the curable resin composition The hardened coating film of the material sometimes does not have scratch resistance. For this reason, the amount of the component (B) to be added is preferably from 10 to 50% by mass, more preferably from 25 to 50% by mass.

(C)快速揮發溶劑硬化性樹脂組成物所含之(C)快速揮發溶劑係上述(B)含乙烯性不飽和基之含氟聚合物之溶解性較高之一種或兩種以上的溶劑。含乙烯性不飽和基之含氟聚合物之溶解性較高係指(B)含乙烯性不飽和基之含氟聚合物添加於各溶劑中可達50質量%,於室溫攪拌8小時後,以目視觀察成為均勻溶液的狀態。(C)快速揮發溶劑之相對蒸發速度必須大於後述之(D)緩慢揮發溶劑之相對蒸發速度。所謂「相對蒸發速度」係指乙酸丁酯90重量%蒸發所需時間為基準之蒸發速度的相對值,詳細如「化學技術」第2卷「有機溶劑之物性與純化方法」第4版,1986年62頁(TECHNIQUES OF CHEMISTRY VOL.2 ORGANIC SOLVENTS Physical Properties and methods of purification 4th ed.(Interscience Publishers,Inc.1986 page 62)所記載。又,(C)快速揮發溶劑係上述(A1)及(A2)之金屬氧化物粒子(金屬氧化物粒子成分(A))之分散安定性低者較佳。(C)快速揮發溶劑之相對蒸發速度大於(D)緩慢揮發溶劑,(B)含有乙烯性不飽和基之含氟聚合物之溶解性高,因此將硬化性樹脂組成物塗佈於基材,使溶劑(C)及(D)蒸發之過程,可使(A1)及(A2)之金屬氧化物粒子局部多量存在化。又,因(A1)及(A2)之金屬氧化物粒子之分散安定性低,因此,可使(A1)及(A2)之金屬氧化物粒子更確實產生局部多量存在化。(C) (C) The fast-evaporating solvent contained in the composition of the rapid-evaporation solvent-curable resin is one or two or more solvents having higher solubility of the (B) ethylenically unsaturated group-containing fluoropolymer. The higher solubility of the fluoropolymer containing an ethylenically unsaturated group means that (B) the fluoropolymer containing an ethylenically unsaturated group is added to each solvent up to 50% by mass, and stirred at room temperature for 8 hours. The state of becoming a homogeneous solution was visually observed. (C) The relative evaporation rate of the rapidly evaporating solvent must be greater than the relative evaporation rate of the (D) slowly evaporating solvent described later. The "relative evaporation rate" refers to the relative value of the evaporation rate based on the time required for evaporation of 90% by weight of butyl acetate. For details, see "Chemical Technology", Volume 2, "Physical Properties and Purification Methods of Organic Solvents", 4th Edition, 1986 62 pages (TECHNIQUES OF CHEMISTRY VOL.2 ORGANIC SOLVENTS Physical Properties and methods of purification 4th ed. (Interscience Publishers, Inc. 1986 page 62). Further, (C) rapid volatile solvents are the above (A1) and (A2) The metal oxide particles (metal oxide particle component (A)) preferably have a low dispersion stability. (C) The relative evaporation rate of the rapidly evaporating solvent is greater than (D) the slow volatile solvent, and (B) the ethylenicity is not Since the saturated fluoropolymer has high solubility, the curable resin composition is applied to the substrate, and the solvents (C) and (D) are evaporated to oxidize the metals of (A1) and (A2). The localized particles are present in a large amount, and since the metal oxide particles of (A1) and (A2) have low dispersion stability, the metal oxide particles of (A1) and (A2) can be more reliably produced locally. Chemical.

本發明中可作為(C)快速揮發溶劑使用之溶劑係相對蒸發速度大約1.7以上的溶劑,具體例為甲乙酮(MEK;相對蒸發速度3.8)、異丙醇(IPA;1.7)、甲基異丁酮(MIBK;1.6)、甲基戊酮(MAK;0.3)、丙酮、甲基丙酮等。The solvent which can be used as the (C) rapid volatile solvent in the present invention is a solvent having a relative evaporation rate of about 1.7 or more, and specific examples thereof include methyl ethyl ketone (MEK; relative evaporation rate 3.8), isopropyl alcohol (IPA; 1.7), and methyl isobutylene. Ketone (MIBK; 1.6), methyl pentanone (MAK; 0.3), acetone, methyl acetone, and the like.

(D)緩慢揮發溶劑硬化性樹脂組成物中所含之(D)緩慢揮發溶劑係上述(A1)及(A2)之金屬氧化物粒子之分散安定性高之一種或兩種以上之溶劑。(A1)及(A2)之金屬氧化物粒子之分散安定性高係指將玻璃板浸漬於(A1)及(A2)之金屬氧化物粒子之異丙醇分散液中,使(A1)及(A2)之金屬氧化物粒子附黏於玻璃壁,將黏附該(A1)及(A2)之金屬氧化物粒子之玻璃板浸漬於各溶劑時,以目視檢測(A1)及(A2)之金屬氧化物粒子於該溶劑中均勻分散。又,(D)緩慢揮發溶劑係上述(B)含有乙烯性不飽和基之含氟聚合物之溶解性低者較佳。(D) The (D) slow-releasing solvent contained in the slow-vulcanization solvent-curable resin composition is one or two or more solvents having high dispersion stability of the metal oxide particles of the above (A1) and (A2). The high dispersion stability of the metal oxide particles of (A1) and (A2) means that the glass plate is immersed in the isopropyl alcohol dispersion of the metal oxide particles of (A1) and (A2) to make (A1) and The metal oxide particles of A2) are adhered to the glass wall, and the glass plates of the metal oxide particles (A1) and (A2) are immersed in each solvent to visually detect the metal oxidation of (A1) and (A2). The particles are uniformly dispersed in the solvent. Further, (D) the slow-vulsing solvent is preferably one in which the solubility of the (B) ethylenically unsaturated group-containing fluoropolymer is low.

本發明中,可作為(D)緩慢揮發溶劑使用之溶劑,例如有甲醇(相對蒸發速度2.1)、異丙醇(IPA:1.7)、正丁醇(n-BuOH:0.5)、第三丁醇、丙二醇單甲醚、丙二醇單乙醚、丙二醇單丙醚、乙基溶纖劑、丙基溶纖劑、丁基溶纖劑等。In the present invention, it can be used as a solvent for (D) a slow-volatile solvent, such as methanol (relative evaporation rate 2.1), isopropanol (IPA: 1.7), n-butanol (n-BuOH: 0.5), and third butanol. , propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, ethyl cellosolve, propyl cellosolve, butyl cellosolve, and the like.

本發明用之(C)快速揮發溶劑及/或(D)緩慢揮發溶劑,通常可直接使用上述(B)含有乙烯性不飽和基之含氟聚合物製造用的溶劑。In the present invention, (C) a solvent for rapid volatilization and/or a solvent for slowly evaporating (D), a solvent for the production of the above (B) fluoropolymer containing an ethylenically unsaturated group can be usually used as it is.

本發明用之(C)快速揮發溶劑與(D)緩慢揮發溶劑必須具有相溶性。相溶性係在組成物之具體的構成中,只要(C)快速揮發溶劑與(D)緩慢揮發溶劑不會分離之程度的相溶性即可。The (C) fast-evaporating solvent used in the present invention and (D) the slow-evaporating solvent must have compatibility. The compatibility is in a specific configuration of the composition, and it is only required that (C) a solvent which is rapidly volatilized and (D) a solvent which is slowly volatilized does not separate.

被選擇之溶劑相當於本發明所使用之(C)快速揮發溶劑或(D)緩慢揮發溶劑係由被選擇之多種溶劑種類間,相對特性來決定,因此相對蒸發速度為1.7之異丙醇可作為(C)快速揮發溶劑使用,也可作為(D)緩慢揮發溶劑使用。The solvent to be selected corresponds to (C) the fast-evaporating solvent used in the present invention or (D) the slow-evaporating solvent is determined by the relative characteristics among the selected solvent types, so that the relative evaporation rate is 1.7. It can also be used as (D) a slow volatile solvent as (C) a rapid volatile solvent.

對於硬化性樹脂組成物中之溶劑(包含(C)成分及(D)成份)以外之成份總量100質量份,該溶劑(C)及溶劑(D)之合計量通常為300~5000質量份,較佳為300~4000質量份,更佳為300~3000質量份。溶劑(C)與溶劑(D)之配合比例可任意選擇1:99~99:1之範圍。The total amount of the solvent (C) and the solvent (D) is usually 300 to 5000 parts by mass based on 100 parts by mass of the total amount of the solvent (including the components (C) and (D)) in the curable resin composition. Preferably, it is 300 to 4000 parts by mass, more preferably 300 to 3,000 parts by mass. The mixing ratio of the solvent (C) and the solvent (D) can be arbitrarily selected in the range of 1:99 to 99:1.

(E)含有至少2個以上之(甲基)丙烯醯基之多官能(甲基)丙烯酸酯化合物及/或含有至少1個以上之(甲基)丙烯醯基之含氟(甲基)丙烯酸酯化合物含有至少2個以上之(甲基)丙烯醯基之多官能(甲基)丙烯酸酯化合物(E-1)可用以提高硬化性樹脂組成物經硬化所得之硬化物及使用該硬化物之抗反射膜的耐擦傷性。(E) a polyfunctional (meth) acrylate compound containing at least two (meth) acrylonitrile groups and/or a fluorine-containing (meth) acrylate containing at least one (meth) acrylonitrile group The polyfunctional (meth) acrylate compound (E-1) having at least two or more (meth) acrylonitrile groups as an ester compound can be used to improve the cured product obtained by hardening the curable resin composition and using the cured product. The scratch resistance of the antireflection film.

含有至少1個以上之(甲基)丙烯醯基之含氟(甲基)丙烯酸酯化合物(E-2)係用於使硬化性樹脂組成物之折射率降低。The fluorine-containing (meth) acrylate compound (E-2) containing at least one or more (meth) acrylonitrile groups is used to lower the refractive index of the curable resin composition.

化合物(E-1)只要是分子內含有至少2個以上之(甲基)丙烯醯基之化合物即無特別限定。例如有新戊二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯、烷基改質二季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、烷基改質二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、己內酯改質二季戊四醇六(甲基)丙烯酸酯、二三羥甲基丙烷四(甲基)丙烯酸酯、「U-15HA」(商品名、新中村化學公司製)、下述一般式(11)表示之化合物等之單獨一種或2種以上之組合。其中較佳者為新戊二醇二(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯及己內酯改質二季戊四醇六(甲基)丙烯酸酯、下述一般式(11)表示之化合物。The compound (E-1) is not particularly limited as long as it is a compound containing at least two (meth)acryl fluorenyl groups in the molecule. For example, neopentyl glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, trimethylol ethane tri (meth) acrylate, Pentaerythritol tetra(meth) acrylate, dipentaerythritol tetra(meth) acrylate, alkyl modified dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, alkyl modified dipentaerythritol (Meth) acrylate, dipentaerythritol hexa (meth) acrylate, caprolactone modified dipentaerythritol hexa (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, "U-15HA (product name, manufactured by Shin-Nakamura Chemical Co., Ltd.), a compound represented by the following general formula (11), or a combination of two or more thereof. Preferred among them are neopentyl glycol di(meth)acrylate, dipentaerythritol hexa(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate and caprolactone. A dipentaerythritol hexa(meth) acrylate, a compound represented by the following general formula (11).

〔式中,「Acryl」為丙烯醯基〕。 [In the formula, "Acryl" is an acrylonitrile group].

化合物(E-2)只要是含有至少1個以上之(甲基)丙烯醯基之含氟(甲基)丙烯酸酯化合物即無特別限定。例如有全氟辛基(甲基)丙烯酸酯、八氟戊基(甲基)丙烯酸酯、三氟乙基(甲基)丙烯酸酯等之單獨一種或2種以上之組合。The compound (E-2) is not particularly limited as long as it is a fluorine-containing (meth) acrylate compound containing at least one (meth) acrylonitrile group. For example, a single one or a combination of two or more of perfluorooctyl (meth) acrylate, octafluoropentyl (meth) acrylate, and trifluoroethyl (meth) acrylate may be used.

硬化性樹脂組成物中之成分(E)之含量無特別限定,但是對於有機溶劑以外之組成物全量100質量%,通常為3~80質量%。此理由係因添加量未達3質量%時,硬化性樹脂組成物之硬化塗膜有時無法得到耐擦傷性,而添加量超過80質量%時,硬化性樹脂組成物之硬化塗膜之折射率升高,有時無法得到充分抗反射效果。基於此理由,成分(E)之添加量較佳為5~70質量%,更佳為5~50質量%。The content of the component (E) in the curable resin composition is not particularly limited, but is usually from 3 to 80% by mass based on 100% by mass of the total amount of the composition other than the organic solvent. When the amount of addition is less than 3% by mass, the cured coating film of the curable resin composition may not have scratch resistance, and when the amount is more than 80% by mass, the cured coating of the curable resin composition is refracted. The rate is increased and sometimes the anti-reflection effect is not obtained. For this reason, the amount of the component (E) to be added is preferably from 5 to 70% by mass, more preferably from 5 to 50% by mass.

(F)光自由基聚合起始劑硬化性樹脂組成物中,必要時可添加藉由輻射線(光)照射產生活性自由基種之(F)光自由基聚合起始劑(輻射線(光)聚合起始劑)。(F) Photoradical polymerization initiator The curable resin composition may be added with (F) photoradical polymerization initiator (radiation (light) by irradiation with radiation (light) to generate active radical species. ) polymerization initiator).

輻射線(光)聚合起始劑只要是藉由光照射分解產生自由基,開始聚合者即無特別限定,例如有乙醯苯、乙醯苯苄基縮酮、1-羥基環己基苯基酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、呫噸酮、芴酮、苯甲醛、芴、蒽醌、三苯基胺、咔唑、3-甲基乙醯苯、4-氯二苯甲酮、4,4’-二甲氧基二苯甲酮、4,4’-二胺基二苯甲酮、苯偶姻丙醚、苯偶姻乙醚、苯甲基二甲基縮酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、噻噸酮、二乙基噻噸酮、二異丙基噻噸酮、2-氯噻噸酮、2-甲基1-[4-(甲硫基)苯基]-2-嗎啉基-丙烷-1-酮、2-苯甲基-二甲基胺基-1-4-(嗎啉基苯基)-丁酮-1,4-(2-羥基乙氧基)苯基-(2-羥基-2-丙基)酮、2,4,6-三甲基苯醯基二苯基氧化膦、雙-(2,6-二甲氧基苯醯基)-2,4,4-三甲基戊基氧化膦、低聚物(2-羥基-甲基-1-(4-(1-甲基乙烯基)苯基)丙酮)等。The radiation (light) polymerization initiator is not particularly limited as long as it is decomposed by light irradiation to generate a radical, and examples thereof include acetophenone, acetophenone ketal, and 1-hydroxycyclohexyl phenyl ketone. , 2,2-dimethoxy-1,2-diphenylethane-1-one, xanthone, anthrone, benzaldehyde, anthraquinone, anthracene, triphenylamine, carbazole, 3-methyl Ethyl benzene, 4-chlorobenzophenone, 4,4'-dimethoxybenzophenone, 4,4'-diaminobenzophenone, benzoin propyl ether, benzoin ethyl ether Benzyl dimethyl ketal, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, 2-hydroxy-2-methyl-1-phenylpropane 1-ketone, thioxanthone, diethylthioxanthone, diisopropylthioxanthone, 2-chlorothioxanthone, 2-methyl 1-[4-(methylthio)phenyl]-2 -morpholinyl-propan-1-one, 2-benzyl-dimethylamino-1-4-(morpholinylphenyl)-butanone-1,4-(2-hydroxyethoxy) Phenyl-(2-hydroxy-2-propyl)ketone, 2,4,6-trimethylphenylnonyldiphenylphosphine oxide, bis-(2,6-dimethoxybenzoinyl)-2 ,4,4- Methyl-pentyl phosphine oxide, oligomeric (2-hydroxy - methyl-1- (4- (1-methylvinyl) phenyl) propanone) and the like.

輻射線(光)聚合起始劑之市售品,例如有CIBA speciality chemicals(股)製商品名:IRGACURE 184、369、651、500、819、907、784、2959、CGI1700、CGI1750、CGI1850、CG24-61、Darocur 1116、1173、BASF公司製商品名:Lucirin TPO、UCB公司製商品名:Ubecuryl P36、Flutetury ranberuty公司製商品名:EZacure KIP150、KIP65LT、KIP100F、KT37、KT55、KTO46、KIP75/B等。Commercial products of radiation (light) polymerization initiators, for example, those manufactured by CIBA speciality chemicals: IRGACURE 184, 369, 651, 500, 819, 907, 784, 2959, CGI1700, CGI1750, CGI1850, CG24 -61, Darocur 1116, 1173, and BASF company name: Lucirin TPO, UCB company name: Ubecuryl P36, Flutetury ranberuty company name: EZacure KIP150, KIP65LT, KIP100F, KT37, KT55, KTO46, KIP75/B, etc. .

本發明中,必要時所用之光自由基聚合起始劑(F)之含量係對於有機溶劑以外之組成物全量100質量%,含有0.01~10質量%,較佳為0.1~10質量%。含量未達0.01質量%時,有時硬化物之硬度不足,而超過10質量%時,形成硬化物時,有時無法硬化至內部(底層)。In the present invention, the content of the photoradical polymerization initiator (F) to be used is 0.01% by mass or more, preferably 0.1% by mass to 10% by mass based on 100% by mass of the total amount of the composition other than the organic solvent. When the content is less than 0.01% by mass, the hardness of the cured product may be insufficient, and when it exceeds 10% by mass, the cured product may not be cured to the inside (underlayer).

(G)其他成分硬化性樹脂組成物中,在不影響本發明之目的或效果的範圍內,必要時可適度添加光增感劑、聚合抑制劑、聚合開始助劑、平坦劑、潤濕性改良劑、界面活性劑、可塑劑、紫外線吸收劑、抗氧化劑、防靜電劑、無機填充劑、顏料、染料、溶劑(C)及(D)以外之溶劑等。(G) In the other component curable resin composition, a photo-sensitizer, a polymerization inhibitor, a polymerization start aid, a flat agent, and wettability may be appropriately added as needed within a range that does not affect the object or effect of the present invention. A modifier, a surfactant, a plasticizer, an ultraviolet absorber, an antioxidant, an antistatic agent, an inorganic filler, a pigment, a dye, a solvent other than the solvent (C) and (D), and the like.

2.硬化性樹脂組成物之製造方法本發明之硬化性樹脂組成物係以下述方法製造。2. Method for Producing Curable Resin Composition The curable resin composition of the present invention is produced by the following method.

將兩種金屬氧化物粒子(A1)及(A2)之分散液、含有乙烯性不飽和基含氟聚合物((B)成分)、必要時之多官能(甲基)丙烯酸酯(E成分)、輻射線(光)聚合起始劑((F)成分)等置入附攪拌機之反應容器內,以35~45℃攪拌2小時形成硬化性樹脂組成物。a dispersion of two metal oxide particles (A1) and (A2), an ethylenically unsaturated fluoropolymer (component (B)), and, if necessary, a polyfunctional (meth) acrylate (component E) The radiation (light) polymerization initiator (component (F)) is placed in a reaction vessel equipped with a stirrer, and stirred at 35 to 45 ° C for 2 hours to form a curable resin composition.

將溶劑置換成與用於最初之反應性粒子分散液之溶劑(α)不同之溶劑(β)時,對於反應性粒子分散液之溶劑(α)之質量時,添加1.0倍之溶劑(β),以相同條件進行攪拌。接著,將此組成液使用旋轉蒸發器減壓濃縮至固形份濃度50%之質量,形成組成物。When the solvent is replaced with a solvent (β) different from the solvent (α) used in the first reactive particle dispersion, the solvent (β) is added 1.0 times to the mass of the solvent (α) of the reactive particle dispersion. , stirring under the same conditions. Next, this composition liquid was concentrated under reduced pressure using a rotary evaporator to a mass of 50% of a solid content to form a composition.

3.硬化性樹脂組成物之塗佈(coating)方法本發明之硬化性樹脂組成物適用於抗反射膜或被覆材之用途,成為抗反射或被覆對象之基材,例如有塑膠(聚碳酸酯、聚甲基丙烯酸酯、聚苯乙烯、聚酯、聚烯烴、環氧、三聚氰胺、三乙醯基纖維素、ABS、AS、原冰片烯系樹脂等)、金屬、木材、紙、玻璃、石板等。這些基材的形狀可為板狀、薄膜狀或三次元成形體,塗佈方法為一般之塗佈方法,例如有浸漬塗佈法、噴霧塗佈法、流塗佈法、噴灑塗佈法、輥塗佈法、旋轉塗佈法、刷毛塗佈法等。這些塗佈之塗膜厚度係經乾燥、硬化後。通常為0.1~400μm,較佳為1~200μm。3. Coating method of curable resin composition The curable resin composition of the present invention is suitable for use as an antireflection film or a covering material, and is a substrate for antireflection or coating, for example, a plastic (polycarbonate). , polymethacrylate, polystyrene, polyester, polyolefin, epoxy, melamine, triacetyl cellulose, ABS, AS, raw borneol resin, etc.), metal, wood, paper, glass, slate Wait. The shape of the substrate may be a plate shape, a film shape or a ternary shape, and the coating method is a general coating method, for example, a dip coating method, a spray coating method, a flow coating method, a spray coating method, Roll coating method, spin coating method, brush coating method, and the like. The thickness of these applied coating films is dried and hardened. It is usually 0.1 to 400 μm, preferably 1 to 200 μm.

4.硬化性樹脂組成物之硬化方法硬化性樹脂組成物係可藉由輻射線(光)硬化。該線源係只要是可在塗佈組成物後,以短時間硬化者,即無特別限定,例如紅外線之線源:燈、電阻加熱板、雷射等,可見光之線源:日光、燈、螢光燈、雷射等,紫外線之線源:水銀燈、鹵素燈、雷射等,電子線之線源:市售之利用鎢絲產生熱電子之方式、對金屬施予高電壓脈衝產生之冷陰極方式及利用離子化之氣體狀分子與金屬電極之衝擊所產生之二次電子之二次電子方式。α線、β線及γ線之線源,例如有6 0 Co等核分裂物質,而γ線可利用加速電子對陽極產生衝擊的真空管等。這些輻射線可在同時或間隔一定期間照射單獨一種或2種以上。4. Hardening method of curable resin composition The curable resin composition can be hardened by radiation (light). The source of the wire is not particularly limited as long as it can be cured in a short time after coating the composition, for example, a source of infrared rays: a lamp, a resistance heating plate, a laser, etc., a source of visible light: daylight, a lamp, Fluorescent lamps, lasers, etc., ultraviolet light sources: mercury lamps, halogen lamps, lasers, etc., the source of electronic wires: commercially available methods of generating hot electrons using tungsten wires, and applying high voltage pulses to metals. A cathodic method and a secondary electron method of secondary electrons generated by the impact of ionized gas molecules and metal electrodes. line α, γ beta] line and the source line of the line, for example, other nuclear fission substance 6 0 Co, γ and vacuum lines may be utilized to accelerate the electrons to the anode an impact and the like. These radiations may be irradiated with one type or two or more types at the same time or at intervals.

使用活性能量線時,曝光量較佳為0.01至10J/cm2 之範圍之值。理由是曝光量末達0.01J/cm2 時,有時硬化不良,而曝光量超過10J/cm2 時,硬化時間太長。基於此理由,曝光量理想為0.1至5J/cm2 之範圍內之值,更佳為0.3至3J/cm2 之範圍內之值。When the active energy ray is used, the exposure amount is preferably a value in the range of 0.01 to 10 J/cm 2 . The reason is that when the exposure amount reaches 0.01 J/cm 2 at the end, the curing may be poor, and when the exposure amount exceeds 10 J/cm 2 , the curing time is too long. For this reason, the exposure amount is desirably a value in the range of 0.1 to 5 J/cm 2 , more preferably a value in the range of 0.3 to 3 J/cm 2 .

硬化性樹脂組成物之硬化反應必須在氮等厭氧性條件下進行。理由是氧存在時,會阻礙自由基聚合,因此硬化反應不充分。The hardening reaction of the curable resin composition must be carried out under anaerobic conditions such as nitrogen. The reason is that when oxygen is present, radical polymerization is inhibited, and thus the hardening reaction is insufficient.

III.硬化膜本發明之硬化膜係將上述硬化性樹脂組成物塗佈於各種基材,例如塑膠基材上,經硬化所得。具體而言,塗佈組成物後,較佳係以0~200℃使揮發成分乾燥後,以上述之輻射線硬化處理得到被覆成形體。輻射線硬化處理使用紫外線或電子線較佳。此時較佳之紫外線照射量為0.01至10J/cm2 ,更佳為0.1至2J/cm2 。較佳之電子線照射條件為加壓電壓為10~300KV,電子密度為0.02~0.30mA/cm2 ,電子線照射量為1~10Mrad。III. Cured Film The cured film of the present invention is obtained by applying the above curable resin composition to various substrates, for example, a plastic substrate, and curing. Specifically, after the composition is applied, it is preferred to dry the volatile component at 0 to 200 ° C and then to cure the coating by the above-described radiation curing treatment. It is preferred to use ultraviolet rays or electron wires for the radiation hardening treatment. The ultraviolet irradiation amount at this time is preferably from 0.01 to 10 J/cm 2 , more preferably from 0.1 to 2 J/cm 2 . The preferred electron beam irradiation conditions are a pressing voltage of 10 to 300 kV, an electron density of 0.02 to 0.30 mA/cm 2 , and an electron beam irradiation amount of 1 to 10 Mrad.

塗佈硬化性樹脂組成物後,組成物中之溶劑(C)及溶劑(D)蒸發的過程中,(A1)及(A2)之金屬氧化物粒子(金屬氧化物粒子成分(A))局部多量存在於塗佈底層側(與鄰接層之界面附近)或其相反側。因此,在硬化膜之一方的界面附近,金屬氧化物粒子成分(A)以高密度存在著,而硬化膜之另一方的界面附近,金屬氧化物粒子成分(A)實質上不存在,故形成低折射率之樹脂層。因此,使硬化性樹脂組成物所構成之一層塗膜硬化,可得到實質上具有二層以上之層構造的硬化膜。這些經分離後所形成的各層,例如以電子顯微鏡觀察所得之膜的剖面來確認。金屬氧化物粒子成分(A)高密度存在的層係指金屬氧化物粒子成分(A)聚集之部分的概念,實質上以金屬氧化物粒子成分(A)為主成分所構成的層,但是有時層內部同時含有(B)成分等的情形。另外,金屬氧化物粒子成分(A)實質上不存在的層係指金屬氧化物粒子成分(A)不存在之部分的概念,但是在不影響本發明效果之範圍內,也可含有若干金屬氧化物粒子成分(A)。此層實質上係由(B)成分與(E)成分之硬化物等之金屬氧化物粒子成分(A)以外之成分所構成的層。硬化膜大部分的情形係具有形成金屬氧化物粒子成分(A)高密度存在的層與金屬氧化物粒子成分(A)實質上不存在的層連續之層的二層構造。基材使用聚對苯二甲酸乙二酯(PET)樹脂(包括具有易黏著層的PET樹脂)等時,通常係依基材之層、金屬氧化物粒子成分(A)高密度存在的層、金屬氧化物粒子成分(A)實質上不存在之層之順序相鄰接所形成的。After the curable resin composition is applied, the metal oxide particles (metal oxide particle component (A)) of (A1) and (A2) are partially evaporated during the evaporation of the solvent (C) and the solvent (D) in the composition. A large amount is present on the coated underlayer side (near the interface with the adjacent layer) or on the opposite side thereof. Therefore, in the vicinity of the interface of one of the cured films, the metal oxide particle component (A) exists at a high density, and in the vicinity of the other interface of the cured film, the metal oxide particle component (A) does not substantially exist, so that it is formed. A low refractive index resin layer. Therefore, a layer coating film composed of a curable resin composition is cured, whereby a cured film having a layer structure of substantially two or more layers can be obtained. Each of these layers formed after separation is confirmed, for example, by a cross section of the film obtained by electron microscopic observation. The layer in which the metal oxide particle component (A) is present at a high density means a concept in which the metal oxide particle component (A) is concentrated, and the metal oxide particle component (A) is a layer mainly composed of a metal oxide particle component (A). The case where the inside of the time layer contains the component (B) at the same time. Further, the layer in which the metal oxide particle component (A) does not substantially exist means a concept in which the metal oxide particle component (A) does not exist, but may contain some metal oxidation insofar as the effect of the present invention is not impaired. Particle component (A). This layer is substantially a layer composed of components other than the metal oxide particle component (A) such as the cured product of the component (B) and the component (E). Most of the cured film has a two-layer structure in which a layer in which the metal oxide particle component (A) is present in a high density and a layer in which the metal oxide particle component (A) does not substantially exist is formed. When a polyethylene terephthalate (PET) resin (including a PET resin having an easy-adhesion layer) is used as the substrate, it is usually a layer having a high density in the layer of the substrate or the metal oxide particle component (A). The metal oxide particle component (A) is formed by abutting the layers in which the layers are substantially absent.

二層以上之層構造係指同時含有「(A1)及(A2)之金屬氧化物粒子高密度存在的層」與「(A1)及(A2)之金屬氧化物粒子實質上不存在的層」兩者之2以上之層所構成的情形,或僅由2以上之「(A1)或(A2)金屬氧化物粒子高密度存在的層」所構成的情形。The layer structure of two or more layers refers to a layer containing "a layer of metal oxide particles of (A1) and (A2) at a high density" and a layer of "metal oxide particles of (A1) and (A2) substantially absent" In the case where two or more layers are formed, or only two or more layers of "(A1) or (A2) metal oxide particles are present in a high density".

組合含有硬化性樹脂組成物之2種以上之金屬氧化物粒子可形成2層以上之「金屬氧化物粒子高密度存在的層」。「金屬氧化物粒子高密度存在的層」之「金屬氧化物粒子」係指至少一種,換言之,1種或2種以上之「金屬氧化物粒子」。一層之「金屬氧化物粒子高密度存在的層」可由2種以上之金屬氧化物粒子所構成。When two or more kinds of metal oxide particles containing a curable resin composition are combined, two or more layers of "a metal oxide particle having a high density" may be formed. The "metal oxide particles" of the "layer in which the metal oxide particles are present in a high density" means at least one type, in other words, one or two or more types of "metal oxide particles". The "layer in which the metal oxide particles are present at a high density" in one layer may be composed of two or more kinds of metal oxide particles.

硬化性樹脂組成物中之(B)含有乙烯性不飽和基之含氟聚合物係折射率比熱硬化性樹脂(例如三聚氰胺化合物)低,具有抗反射膜之低折射率層之理想的光學材料。金屬氧化物粒子成分(A)之構成材料使用折射率高之金屬氧化物粒子(Aa)可形成更佳之抗反射膜。In the curable resin composition, (B) a fluorine-containing polymer containing an ethylenically unsaturated group has a refractive index lower than that of a thermosetting resin (for example, a melamine compound), and is an ideal optical material having a low refractive index layer of an antireflection film. The constituent material of the metal oxide particle component (A) can form a more excellent antireflection film by using the metal oxide particles (Aa) having a high refractive index.

將上述本發明之硬化性樹脂組成物塗佈於基材上,經UV硬化之本發明之硬化膜係透明性優,高硬度,同時具有可形成耐擦傷性及基材及與基材或低折射率層等之鄰接層之密著性優異之塗膜(被膜)的特徵。硬化反應不使用熱,因此不會伴隨熱硬化反應所產生的水解反應,所得之硬化膜之耐濕熱性優異。因此,硬化膜適用於薄膜型液晶元件、觸控面板、塑膠光學零件等。The curable resin composition of the present invention is applied onto a substrate, and the cured film of the present invention which is UV-cured is excellent in transparency, high in hardness, and has scratch resistance and substrate and substrate or low. A coating film (film) having excellent adhesion to an adjacent layer such as a refractive index layer. Since the hardening reaction does not use heat, it does not accompany the hydrolysis reaction by the thermosetting reaction, and the obtained cured film is excellent in moist heat resistance. Therefore, the cured film is suitable for a film type liquid crystal element, a touch panel, a plastic optical part, or the like.

〔實施例〕[Examples]

以下藉由實施例更詳細說明本發明,但是本發明之範圍不限於這些實施例。實施例中,各成分之使用量無特別說明外,「部」表示質量份,或「%」表示質量%。The invention is illustrated in more detail below by means of examples, but the scope of the invention is not limited to the examples. In the examples, the amount of each component used is not particularly indicated, and "part" means mass parts, or "%" means mass%.

製造例1Manufacturing example 1

(1)具有聚合性不飽和基之有機化合物(Ab)之合成在附置攪拌器的容器內之巰基丙基三甲氧基矽烷221質量份及二丁基錫二月桂酸酯1質量份的混合溶液中,於乾燥空氣中50℃下以1小時滴加異佛爾酮二異氰酸酯222質量份後,再於70℃下攪拌3小時。(1) Synthesis of Organic Compound (Ab) Having Polymerizable Unsaturated Group In a mixed solution of 221 parts by mass of mercaptopropyltrimethoxydecane and 1 part by mass of dibutyltin dilaurate in a container to which a stirrer is attached, After 222 parts by mass of isophorone diisocyanate was added dropwise at 50 ° C for 1 hour in dry air, the mixture was further stirred at 70 ° C for 3 hours.

接著,在此反應溶液中,於30℃下以1小時滴加新中村化學製之NK ester A-TMM-3LM-N(由季戊四醇三丙烯酸酯60質量%與季戊四醇四丙烯酸酯40質量%所構成。其中僅具有羥基之季戊四醇三丙烯酸酯參與反應)549質量份後,再於60℃下攪拌10小時,得到反應液。Next, in the reaction solution, NK ester A-TMM-3LM-N (manufactured by Xinzhongcun Chemical Co., Ltd. 60% by mass and pentaerythritol tetraacrylate 40% by mass) was added dropwise at 30 ° C for 1 hour. After only 549 parts by mass of the pentaerythritol triacrylate having a hydroxyl group was involved in the reaction, the mixture was stirred at 60 ° C for 10 hours to obtain a reaction liquid.

以FT-IR測定此反應液中之生成物,即具有聚合性不飽基之有機化合物中所殘留之異氰酸酯量,結果為0.1質量%以下,可確認各反應大致以定量方式進行。生成物之紅外線吸收光譜係原料中之巰基特徵之2550卡鎖的吸收尖峰及原料異氰酸酯化合物特徵之2260卡鎖的吸收尖峰消失,而新觀察到胺基甲酸酯鍵及-S(C=O)NH-基特徵之1660卡鎖的尖峰及丙烯氧基特徵之1720卡鎖的尖峰,表示生成同時具有聚合性不飽基之丙烯氧基與-S(C=O)NH-基、胺基甲酸酯鍵之丙烯氧基改質烷氧基矽烷。藉由上述,得到具有硫代胺基甲酸酯鍵、胺基甲酸酯鍵、烷氧基甲矽烷基、聚合性不飽和基之化合物(上述式(A-4)及(A-5)所示之化合物(Ab))773質量份與未參與反應之季戊四醇四丙烯酸酯220質量份的組成物(以下此組成物有時也稱為「烷氧基矽烷(1)」)(A#1)。When the amount of the isocyanate remaining in the organic compound having a polymerizable unsaturated group was measured by the FT-IR, the amount of the isocyanate remaining in the polymerizable unsaturated group was 0.1% by mass or less, and it was confirmed that each reaction was carried out substantially quantitatively. The absorption spectrum of the 2550-locked thiol characteristic of the fluorenyl group in the raw material of the product and the absorption peak of the 2260-locked characteristic of the raw isocyanate compound disappeared, and the urethane bond and -S (C=O) were newly observed. The peak of the 1660 latch of the NH-based feature and the peak of the 1720 latch of the propyleneoxy characteristic indicate that a propyleneoxy group having a polymerizable unsaturated group and a -S(C=O)NH- group, an amine group are formed. The propyleneoxy group of the formate linkage modifies the alkoxy decane. By the above, a compound having a thiocarbamate bond, a urethane bond, an alkoxycarbenyl group, or a polymerizable unsaturated group is obtained (the above formulas (A-4) and (A-5) 773 parts by mass of the compound (Ab) shown and 220 parts by mass of pentaerythritol tetraacrylate which is not involved in the reaction (hereinafter, this composition is sometimes referred to as "alkoxydecane (1)") (A#1) ).

製造例2Manufacturing Example 2

(2)胺基甲酸酯丙烯酸酯(式(11)所示之化合物)之合成在附置攪拌器之容器內由異佛爾酮二異氰酸酯18.8質量份與二丁基錫二月桂酸酯0.2質量份所構成之溶液中,於10℃下以1小時滴加新中村化學公司製之NK ester A-TMM-3LM-N(參與反應者僅具有羥基之季戊四醇三丙烯酸酯)93質量份後,60℃下攪拌6小時,得到反應液。(2) Synthesis of urethane acrylate (compound represented by formula (11)): 18.8 parts by mass of isophorone diisocyanate and 0.2 parts by mass of dibutyltin dilaurate in a container to which a stirrer is attached In the solution, 93 parts by mass of NK ester A-TMM-3LM-N (participating only the hydroxyl group pentaerythritol triacrylate) manufactured by Shin-Nakamura Chemical Co., Ltd. was added dropwise at 10 ° C for 1 hour, at 60 ° C. After stirring for 6 hours, a reaction liquid was obtained.

以FT-IR測定此反應液中之生成物,即與製造例1同樣殘留之異氰酸酯量,結果為0.1質量%以下,可確認反應大致以定量方式進行。另外,確認分子內含有胺基甲酸酯鍵及丙烯醯基(聚合性不飽和基)。The amount of the isocyanate remaining in the same manner as in Production Example 1 was measured by FT-IR. The amount of the isocyanate remaining in the same manner as in Production Example 1 was 0.1% by mass or less, and it was confirmed that the reaction was carried out substantially quantitatively. Further, it was confirmed that a urethane bond and an acrylonitrile group (polymerizable unsaturated group) were contained in the molecule.

藉由上述,得到胺基甲酸酯六丙烯酸酯(上述式(11)所示之化合物)75質量份及未參與反應之季戊四醇四丙烯酸酯37質量份混合的組成物(A#2)。By the above, 75 parts by mass of the urethane hexaacrylate (the compound represented by the above formula (11)) and 37 parts by mass of the pentaerythritol tetraacrylate which is not involved in the reaction are obtained (A#2).

製造例3Manufacturing Example 3 〔含有二氧化矽粒子之硬塗層用組成物之調製〕[Preparation of a composition for a hard coat layer containing cerium oxide particles]

將製造例1製得之具有聚合性不飽基之組成物(A#1)2.32質量份、二氧化矽粒子溶膠(甲乙酮二氧化矽溶膠,日產化學工業(股)製MEK-ST,數平均粒徑0.022μm,二氧化矽濃度30%)91.3質量份(二氧化矽粒子為27質量份)、離子交換水0.12質量份及對-羥苯基單甲醚0.01質量份之混合液,於60℃下攪拌4小時後,添加原甲酸甲酯1.36質量份,再於同溫度下加熱攪拌1小時,得到反應性粒子(分散液A # 3))。在鋁盤中秤取此分散液(分散液A # 3)2g後,在175℃之加熱板上乾燥1小時,秤量求得固形份含量為30.7%。又,以磁性坩堝秤取2g之分散液(A # 3)後,在80℃之加熱板上預備乾燥30分鐘,在750℃之馬弗爐中燒成1小時後之無機殘渣,求得固形份中之無機含量為90%。2.32 parts by mass of the polymerizable unsaturated composition (A#1) obtained in Production Example 1, cerium oxide particle sol (methyl ethyl ketone cerium oxide sol, MEK-ST manufactured by Nissan Chemical Industries Co., Ltd., number average a particle size of 0.022 μm, a cerium oxide concentration of 30%), 91.3 parts by mass (27 parts by mass of cerium oxide particles), 0.12 parts by mass of ion-exchanged water, and 0.01 parts by mass of p-hydroxyphenyl monomethyl ether, at 60 After stirring at ° C for 4 hours, 1.36 parts by mass of methyl orthoformate was added, and the mixture was heated and stirred at the same temperature for 1 hour to obtain reactive particles (dispersion A #3)). After 2 g of this dispersion (dispersion A #3) was weighed in an aluminum pan, it was dried on a hot plate at 175 ° C for 1 hour, and the solid content was determined to be 30.7%. Further, 2 g of the dispersion (A #3) was weighed by a magnetic crucible, and then preliminarily dried on a hot plate at 80 ° C for 30 minutes, and fired in an 750 ° C muffle furnace for 1 hour to obtain an inorganic residue. The inorganic content of the fraction is 90%.

將此分散液(A # 3)98.6g、組成物(A # 2)3.4g、1-羥基環己基苯基酮2.1g、IRGACURE907(2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉代丙烷-1-酮、Ciba.Speciality.Chemicals製)1.2g、二季戊四醇六丙烯酸酯(DPHA)33.2g、環己酮7g混合攪拌,得到含有二氧化矽粒子之硬塗層用組成物(固形份濃度50%)145g。98.6 g of this dispersion (A #3), 3.4 g of composition (A #2), 2.1 g of 1-hydroxycyclohexyl phenyl ketone, and IRGACURE 907 (2-methyl-1-[4-(methylthio)) 1.2 g of phenyl]-2-morpholinopropan-1-one (manufactured by Ciba. Specialty. Chemicals), 33.2 g of dipentaerythritol hexaacrylate (DPHA), and 7 g of cyclohexanone were mixed and stirred to obtain cerium oxide-containing particles. The composition for a hard coat layer (solid content concentration: 50%) was 145 g.

製造例4Manufacturing Example 4 〔含有氧化鋯粒子之組成物之調製〕[Preparation of composition containing zirconia particles]

將第一稀元素化學工業(股)製、UEP-100(一次粒徑10~30nm)300質量份添加於甲乙酮(MEK)700質量份中,以玻璃珠分散168小時,去除玻璃珠得到氧化鋯分散溶膠950質量份。在鋁盤上秤取氧化鋯分散溶膠2g後,於120℃之加熱板上乾燥1小時,秤量求得固形份含量為30%。此氧化鋯分散溶膠100g、製造例1合成之組成物(A # 1)0.86g、二季戊四醇六丙烯酸酯(DPHA)13.4g、對-甲氧基苯酚0.016g、離子交換水0.033g之混合液,以60℃攪拌3小時後,添加原甲酸甲酯0.332g,再於同溫度下加熱攪拌1小時,得到表面改質氧化鋯粒子之分散液116g。將此分散液116g、組成物(A # 2)1.34g、1-羥基環己基苯基酮1.26g、IRGACURE907(2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉代丙烷-1-酮、Ciba.Speciality.Chemicals製)0.76g、MEK 2846g攪拌混合,得到含有氧化鋯粒子之組成物(固形份濃度4%)2964g。300 parts by mass of UEP-100 (primary particle size 10 to 30 nm) manufactured by the first rare element chemical industry (stock) was added to 700 parts by mass of methyl ethyl ketone (MEK), dispersed with glass beads for 168 hours, and glass beads were removed to obtain zirconia. 950 parts by mass of the dispersed sol. After 2 g of the zirconia dispersion sol was weighed on an aluminum pan, it was dried on a hot plate at 120 ° C for 1 hour, and the solid content was determined to be 30%. 100 g of the zirconia dispersion sol, 0.86 g of the composition (A #1) synthesized in Production Example 1, 13.4 g of dipentaerythritol hexaacrylate (DPHA), 0.016 g of p-methoxyphenol, and 0.033 g of ion-exchanged water. After stirring at 60 ° C for 3 hours, 0.332 g of methyl orthoformate was added, and the mixture was heated and stirred at the same temperature for 1 hour to obtain 116 g of a dispersion of surface-modified zirconia particles. 116 g of this dispersion, 1.34 g of composition (A # 2), 1.26 g of 1-hydroxycyclohexyl phenyl ketone, and IRGACURE 907 (2-methyl-1-[4-(methylthio)phenyl]-2- 0.76 g of morpholinopropan-1-one, manufactured by Ciba. Specialty. Chemicals, and 2846 g of MEK were stirred and mixed to obtain 2964 g of a composition containing zirconium oxide particles (solid content: 4%).

製造例5Manufacturing Example 5 [含有摻雜錫之氧化銦(ITO)粒子之組成物之調製][Preparation of composition containing tin-doped indium oxide (ITO) particles]

將富士化學(股)製ITO溶膠(10wt% IPA溶膠)700g、DPHA 29.5g、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉代丙烷-1-酮1g、異丙醇(IPA)1769.5g混合,得到固形份濃度4%之含ITO粒子的組成物。ITO sol (10 wt% IPA sol) made of Fuji Chemical Co., Ltd. 700 g, DPHA 29.5 g, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one 1 g and 1769.5 g of isopropyl alcohol (IPA) were mixed to obtain a composition containing ITO particles having a solid content of 4%.

製造例6Manufacturing Example 6 [含有摻雜銻之氧化錫(ATO)粒子之組成物之調製][Preparation of composition containing antimony-doped tin oxide (ATO) particles]

將ATO粒子(石原Techno(股)製、SN-100P,一次粒徑10~30nm)、分散劑(旭電化工業(股)製、AdecapurunixTR-701)及甲醇以90/2.78/211(重量比)之配合量混合(全固形份含量為31%,全無機含量29.6%)。在塗料搖勻器之50ml塑膠瓶中加入玻璃珠40g(TOSHINRIKO製,BZ-01)(珠粒徑0.1mm)(體積約16ml)與上述混合液30g,分散3小時,得到中值粒徑80nm之分散溶膠。此分散溶膠304g、組成物(A # 1)5.7g、對-甲氧基苯酚0.01g、離子交換水0.12g之混合液,以60℃攪拌3小時後,添加原甲酸甲酯1.3g,再於同一溫度加熱攪拌1小時,得到表面改質ATO粒子之分散液311g。將此分散液278.3g、組成物(A # 2)1.7g、季戊四醇三丙烯酸酯8.59g、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉代丙烷-1-酮0.88g、甲醇33g、丙二醇單甲醚1675g混合攪拌,得到含有ATO粒子之組成物(固形份濃度5%)2000g。ATO particles (made by Ishihara Techno Co., Ltd., SN-100P, primary particle size 10 to 30 nm), dispersant (made by Asahi Kasei Co., Ltd., Adecapurunix TR-701), and methanol at 90/2.78/211 (weight ratio) The amount of the mixture was mixed (the total solid content was 31%, and the total inorganic content was 29.6%). Into a 50 ml plastic bottle of a paint shaker, 40 g of glass beads (manufactured by TOSHINRIKO, BZ-01) (bead diameter: 0.1 mm) (volume: about 16 ml) and 30 g of the above mixed solution were added and dispersed for 3 hours to obtain a median diameter of 80 nm. Dispersing the sol. 304 g of the dispersion sol, a mixture of 5.7 g of a composition (A #1), 0.01 g of p-methoxyphenol, and 0.12 g of ion-exchanged water were stirred at 60 ° C for 3 hours, and then 1.3 g of methyl orthoformate was added thereto. The mixture was heated and stirred at the same temperature for 1 hour to obtain 311 g of a dispersion of surface-modified ATO particles. 278.3 g of this dispersion, 1.7 g of composition (A #2), 8.59 g of pentaerythritol triacrylate, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane- 0.88 g of 1-ketone, 33 g of methanol, and 1675 g of propylene glycol monomethyl ether were mixed and stirred to obtain 2000 g of a composition containing ATO particles (solid content: 5%).

製造例7Manufacturing Example 7 [含有摻雜鋁之ZnO粒子之組成物之調製][Modulation of composition containing ZnO particles doped with aluminum]

將氧化鋅粒子(堺化學製摻雜A1之ZnO粒子,一次粒徑10~20nm)、分散劑(楠本化成(股)製、HybuladED151)及丙二醇單甲醚以27.6/4.8/67.6(重量比)之配合量混合(全固形份含量30%、全無機含量27.6%)。在塗料搖勻器之50ml塑膠瓶中加入氧化鋯珠粒40g(珠粒徑0.1mm)與上述混合液30g,分散8小時得到中值粒徑40nm之分散溶膠。此溶膠290g中添加季戊四醇三丙烯酸酯10g、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉代丙烷-1-酮0.5g、丙二醇單甲醚2138g混合攪拌,得到含有氧化鋅粒子之組成物(固形份濃度4%)2438g。Zinc oxide particles (ZnO particles doped with A1, primary particle size 10-20 nm), dispersant (manufactured by Nanben Chemical Co., Ltd., Hybulad 151) and propylene glycol monomethyl ether at 27.6/4.8/67.6 (weight ratio) The amount of the mixture is mixed (the total solid content is 30%, and the total inorganic content is 27.6%). Into a 50 ml plastic bottle of a paint shaker, 40 g of zirconia beads (bead diameter: 0.1 mm) and 30 g of the above mixture were placed, and dispersed for 8 hours to obtain a dispersion sol having a median diameter of 40 nm. 10 g of pentaerythritol triacrylate, 0.5 g of 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, and 2138 g of propylene glycol monomethyl ether were added to 290 g of the sol. 2,438 g of a composition containing zinc oxide particles (solid content concentration: 4%) was obtained.

製造例8Manufacturing Example 8 [鍵結具有聚合性不飽基之有機化合物(Ab)之被覆反應性氧化鋁、氧化鋯之TiO2 粒子溶膠(A1-1)之製造][Manufacture of coated reactive alumina with a polymerizable unsaturated organic compound (Ab) and TiO 2 particle sol (A1-1) of zirconia]

混合被覆氧化鋁、氧化鋯之TiO2 粒子分散液(Tika股份公司製全固形份濃度28%、粒子濃度24%)333.7質量份、製造例1製得之烷氧基矽烷(1)的溶液5.4質量份、蒸餾水0.20質量份、對苯二酚單甲醚0.03質量份,以65℃加熱攪拌。4小時後,添加原甲酸甲酯2.2質量份,再加熱1小時,得到固形份31.6%之被覆反應性氧化鋁、氧化鋯之TiO2 粒子溶膠(A1-1)。333.7 parts by mass of a dispersion of TiO 2 particles coated with alumina and zirconia (a total solid concentration of 28% by Tika Co., Ltd., particle concentration: 24%), and a solution of alkoxy decane (1) obtained in Production Example 1. The mass fraction, 0.20 parts by mass of distilled water, and 0.03 parts by mass of hydroquinone monomethyl ether were heated and stirred at 65 °C. After 4 hours, 2.2 parts by mass of methyl orthoformate was added, and the mixture was further heated for 1 hour to obtain a solid fraction of 31.6% of the coated reactive alumina and zirconia TiO 2 particle sol (A1-1).

此TiO2 粒子之數平均粒徑為20 nm。平均粒徑係以透過型電子顯微鏡測定。The number average particle diameter of this TiO 2 particle was 20 nm. The average particle size was measured by a transmission electron microscope.

製造例9Manufacturing Example 9 〔含羥基之含氟聚合物(B-2)之製造〕[Manufacture of hydroxyl group-containing fluoropolymer (B-2)]

以氮氣充分取代內容積1.5L之附有電磁攪拌器之不銹鋼製高壓鍋後,添加乙酸乙酯500g、全氟(丙基乙烯醚)43.2g、乙基乙烯醚41.2g、羥乙基乙烯醚21.5g、非離子性反應性乳化劑之「AdekariasopeNE-30」(旭電化工業股份公司製)40.5g、含偶氮基之聚二甲基矽氧烷之「VPS-1001」(和光純藥工業股份公司製)6.0g及過氧化月桂醯1.25g,以乾冰-甲醇冷卻至-50℃後,再度以氮氣除去體系內之氧氣。After replacing 1.5 L of the inner pressure stainless steel pressure cooker with a magnetic stirrer with nitrogen, 500 g of ethyl acetate, 43.2 g of perfluoro(propyl vinyl ether), 41.2 g of ethyl vinyl ether, and 21.5 of hydroxyethyl vinyl ether were added. g, "Adekariasope NE-30" (made by Asahi Kasei Kogyo Co., Ltd.), 40.5 g of non-ionic reactive emulsifier, "VPS-1001" of azo-containing polydimethyloxane (Wako Pure Chemical Industries Co., Ltd.) The company made 6.0 g and 1.25 g of lauryl peroxide, and after cooling to -50 ° C with dry ice-methanol, the oxygen in the system was again removed by nitrogen.

接著,添加六氟丙烯97.4g,開始升溫。高壓鍋內之溫度達60℃時之壓力為5.3×105 pa。其後,以70℃攪拌20小時繼續反應,當壓力降為1.7×105 pa的時點,將高壓鍋進行水冷,停止反應。到達室溫後,釋出未反應單體,打開高壓鍋,得到固形份濃度26.4%之聚合物溶液。將所得聚合物溶液投入甲醇中,使聚合物析出後,以甲醇洗淨,於50℃下真空乾燥得到220g之含氟聚合物(B-2)。Next, 97.4 g of hexafluoropropylene was added, and the temperature was raised. The pressure in the autoclave at a temperature of 60 ° C was 5.3 × 10 5 pa. Thereafter, the reaction was continued by stirring at 70 ° C for 20 hours, and when the pressure was lowered to 1.7 × 10 5 Pa, the autoclave was water-cooled to stop the reaction. After reaching room temperature, unreacted monomers were released, and the autoclave was opened to obtain a polymer solution having a solid concentration of 26.4%. The obtained polymer solution was poured into methanol to precipitate a polymer, and then washed with methanol, and vacuum-dried at 50 ° C to obtain 220 g of a fluoropolymer (B-2).

製造例10Manufacturing Example 10 〔含乙烯性不飽和基之含氟聚合物(B1)之製造〕[Manufacture of fluoropolymer (B1) containing ethylenically unsaturated group]

將製造例9製得之含羥基之含氟聚合物(B-2)50.0g、聚合抑制劑之2,6-二-第三丁基甲基苯酚0.01g及甲基異丁基酮(MIBK)374g投入具備電磁攪拌機、玻璃製冷卻管及溫度計之容量1公升之可分離燒瓶中,在20℃下,使含羥基之含氟聚合物(B-2)溶解於MIBK,攪拌直到溶液成為透明、均勻為止。接著,此體系中添加2-丙烯醯氧基乙基異氰酸酯16.0g,攪拌直到溶液呈均勻為止,然後添加二丁基錫二月桂酸酯0.1g,開始反應,體系之溫度保持55~65℃,繼續攪拌5小時得到含乙烯性不飽和基之含氟聚合物(B1)之MIBK溶液。以鋁盤秤取此溶液2g後,在150℃之加熱板上乾燥5分鐘,秤量得到固形份含量15.0%。50.0 g of a hydroxyl group-containing fluoropolymer (B-2) obtained in Production Example 9 and a polymerization inhibitor of 2,6-di-t-butylmethylphenol 0.01 g and methyl isobutyl ketone (MIBK) 374 g The separable flask containing a magnetic stirrer, a glass cooling tube, and a thermometer in a volume of 1 liter was placed, and the hydroxyl group-containing fluoropolymer (B-2) was dissolved in MIBK at 20 ° C, and stirred until the solution became transparent and uniform. until. Next, 16.0 g of 2-propenylmethoxyethyl isocyanate was added to the system, and the mixture was stirred until the solution became homogeneous. Then, 0.1 g of dibutyltin dilaurate was added to start the reaction, and the temperature of the system was maintained at 55 to 65 ° C, and stirring was continued. A MIBK solution of the ethylenically unsaturated group-containing fluoropolymer (B1) was obtained in 5 hours. After taking 2 g of this solution on an aluminum pan, it was dried on a hot plate at 150 ° C for 5 minutes, and the solid content was 15.0%.

製造例11Manufacturing Example 11 [鍵結具有聚合性不飽基之二氧化矽為主成分之粒子(A2-1)之製造][Manufacture of particles (A2-1) having a polymerized unsaturated ruthenium oxide as a main component]

與製造例8相同使用烷氧基矽烷(1)1.1質量份、甲乙酮二氧化矽溶膠(日產化學工業(股)製、商品名:MEK-ST-L(數平均粒徑0.050μm、二氧化矽濃度30%)91.3質量份(固形份27.4質量份)、離子交換水0.1質量份、原甲酸甲酯1.4質量份,得到粒子分散液(A2-1)。此TiO2 粒子之數平均粒徑為20 μm。粒子分散液(A2-1)之固形份含量為36質量%。In the same manner as in Production Example 8, 1.1 parts by mass of alkoxydecane (1) and methyl ethyl ketone cerium oxide sol (manufactured by Nissan Chemical Industries, Ltd., trade name: MEK-ST-L (number average particle diameter: 0.050 μm, cerium oxide) concentration of 30%) 91.3 parts by mass (27.4 parts by mass of the solid parts), ion-exchanged water, 0.1 parts by mass, 1.4 parts by mass of methyl orthoformate to give a particle dispersion (A2-1). this TiO 2 particles of average particle diameter 20 μm. The solid content of the particle dispersion (A2-1) was 36% by mass.

此二氧化矽粒子之平均粒徑為50nm。平均粒徑係以透過型電子顯微鏡測定。The cerium oxide particles had an average particle diameter of 50 nm. The average particle size was measured by a transmission electron microscope.

製造例12Manufacturing Example 12 [鍵結具有聚合性不飽基之二氧化矽為主成分之粒子(A1-2)之製造][Manufacture of particles (A1-2) having a polymerized unsaturated ruthenium oxide as a main component]

與製造例11相同使用烷氧基矽烷(1)1.1質量份、甲乙酮二氧化矽溶膠(日產化學工業(股)製、商品名:MEK-ST(數平均粒徑0.020μm、二氧化矽濃度30%)91.3質量份(固形份27.4質量份)、離子交換水0.1質量份、原甲酸甲酯1.4質量份,得到粒子分散液(A1-2)。此TiO2 粒子之數平均粒徑為20 μm。粒子分散液(A1-2)之固形份含量為36質量%。In the same manner as in Production Example 11, 1.1 parts by mass of alkoxydecane (1) and methyl ethyl ketone cerium oxide sol (manufactured by Nissan Chemical Industries, Ltd., trade name: MEK-ST (number average particle diameter: 0.020 μm, cerium oxide concentration 30) were used. %) 91.3 parts by mass (solid content: 27.4 parts by mass), 0.1 parts by mass of ion-exchanged water, and 1.4 parts by mass of methyl orthoformate to obtain a particle dispersion liquid (A1-2). The number average particle diameter of the TiO 2 particles is 20 μm. The solid content of the particle dispersion (A1-2) was 36% by mass.

此二氧化矽粒子之平均粒徑為20nm。平均粒徑係以透過型電子顯微鏡測定。The cerium oxide particles had an average particle diameter of 20 nm. The average particle size was measured by a transmission electron microscope.

實施例1Example 1 〔硬化性樹脂組成物1之調製〕[Preparation of Curable Resin Composition 1]

添加製造例8製得之被覆二氧化矽、氧化鋯之TiO2 粒子溶膠(A)110g(反應性粒子34.8g)、製造例10製得之含乙烯性不飽和基之含氟聚合物(B1)285g(含乙烯性不飽和基之含氟聚合物42.7g)、二季戊四醇五丙烯酸酯(DPPA)15.4g、2-苯甲基-2-二甲胺基-1-(4-嗎啉苯基)-1-丁酮(IRGACURE 369、CIBA.speciality.chemicals(股)製、光自由基聚合起始劑)3.9g、製造例2製得之式(11)表示之化合物3.2g、甲乙酮530g、甲基異丁酮150g、正丁醇100g進行攪拌。所得之硬化性樹脂組成物之固形份濃度為8.4%。110 g of the TiO 2 particle sol (A) coated with the cerium oxide and the zirconia obtained in Production Example 8 (reactive particles 34.8 g), and the fluoropolymer containing the ethylenically unsaturated group obtained in Production Example 10 (B1) 285g (42.7g of fluoropolymer containing ethylenically unsaturated group), 15.4g of dipentaerythritol pentaacrylate (DPPA), 2-benzyl-2-dimethylamino-1-(4-morpholinium) 3.9 g of 1-butanone (IRGACURE 369, CIBA. speciality. chemicals, photoradical polymerization initiator), 3.2 g of the compound represented by the formula (11) obtained in Production Example 2, and 530 g of methyl ethyl ketone 150 g of methyl isobutyl ketone and 100 g of n-butanol were stirred. The solid content of the obtained curable resin composition was 8.4%.

實施例2,3及比較例1、2〔硬化性樹脂組成物2、3之調製〕Examples 2 and 3 and Comparative Examples 1 and 2 [Preparation of Curable Resin Compositions 2 and 3]

除了將使用之金屬氧化物粒子之組合改為表1所示,各成份的配合比例改為如表1所示外,與實施例1同樣操作,得到硬化性樹脂組成物2~5。The curable resin compositions 2 to 5 were obtained in the same manner as in Example 1 except that the combination of the metal oxide particles to be used was changed to that shown in Table 1, and the mixing ratio of each component was changed as shown in Table 1.

使用上述實施例1~3及比較例1、2製造之硬化性樹脂組成物1~5製作硬化膜,評估硬化膜之特性。硬化膜之製造方法如下述。A cured film was produced using the curable resin compositions 1 to 5 produced in the above Examples 1 to 3 and Comparative Examples 1 and 2, and the properties of the cured film were evaluated. The method for producing the cured film is as follows.

將二氧化矽粒子溶膠(甲乙酮二氧化矽溶膠,日產化學工業(股)製MEK-ST,數平均粒徑0.022μm,二氧化矽濃度30%)98.6g、1-羥基環己基苯基酮2.1g、IRGACURE907(2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉代丙烷-1-酮、Ciba.Speciality.Chemicals製)1.2g、二季戊四醇六丙烯酸酯(DPHA)33.2g、環己酮7g混合攪拌得到含有二氧化矽粒子之硬塗層用組成物。使用金屬線棒塗佈器(#12)將此含有二氧化矽粒子之硬塗層用組成物塗佈於三乙醯基纖維素薄膜(LOFO製,膜厚80μm)後,在烘箱中以80℃乾燥1分鐘。接著,在空氣下,使用高壓水銀燈以0.6J/cm2 之光照射條件照射紫外線,形成硬塗層。以觸針式膜厚計測定硬塗層之膜厚為5μm。A cerium oxide particle sol (methyl ethyl ketone cerium oxide sol, MEK-ST manufactured by Nissan Chemical Industries Co., Ltd., number average particle diameter 0.022 μm, cerium oxide concentration 30%) 98.6 g, 1-hydroxycyclohexyl phenyl ketone 2.1 g, IRGACURE 907 (2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, manufactured by Ciba. Specialty. Chemicals) 1.2 g, dipentaerythritol hexaacrylate ( 33.2 g of DPHA) and 7 g of cyclohexanone were mixed and stirred to obtain a composition for a hard coat layer containing cerium oxide particles. The composition of the hard coat layer containing the cerium oxide particles was applied to a triethylenesulfonated cellulose film (manufactured by LOFO, film thickness: 80 μm) using a wire bar coater (#12), and then 80 in an oven. Dry at °C for 1 minute. Next, ultraviolet rays were irradiated under high light with a high-pressure mercury lamp under a light irradiation condition of 0.6 J/cm 2 to form a hard coat layer. The film thickness of the hard coat layer was measured by a stylus type film thickness meter to be 5 μm.

使用金屬線棒塗佈器(#3)將實施例1~3及比較例1、2製得之硬化性樹脂組成物塗佈於製得之硬塗層上,然後於烘箱中以80℃加熱1分鐘。接著在氮氣氛下,使用高壓水銀燈以0.9J/cm2 之光照射條件照射紫外線,形成膜厚為0.2μm之硬化膜層。The curable resin compositions obtained in Examples 1 to 3 and Comparative Examples 1 and 2 were applied onto the obtained hard coat layer using a wire bar coater (#3), and then heated at 80 ° C in an oven. 1 minute. Subsequently, ultraviolet rays were irradiated under a nitrogen atmosphere using a high-pressure mercury lamp under a light irradiation condition of 0.9 J/cm 2 to form a cured film layer having a film thickness of 0.2 μm.

<硬化膜之評估><Evaluation of hardened film>

(1)耐鋼絲棉性以下列方法進行硬化膜之耐鋼絲棉性試驗。換言之,將鋼絲棉(Bonster No.0000,日本鋼絲棉(股)製)安裝於學振型摩擦堅牢度試驗機(AB-301,Tester產業(股)製),以荷重1kg之條件重覆擦拭硬膜表面10次後,目視觀察硬化膜表面有無刮傷,並以下列基準確認。(1) Resistance to steel wool The steel wool resistance test of the cured film was carried out in the following manner. In other words, steel wool (Bonster No. 0000, manufactured by Japan Steel Wire Co., Ltd.) was attached to a vibration-type friction fastness tester (AB-301, manufactured by Tester Industries Co., Ltd.), and was repeatedly wiped under the condition of a load of 1 kg. After 10 times on the surface of the dura mater, the surface of the cured film was visually observed for scratching and confirmed on the following basis.

○:硬化膜幾乎無剝離及刮傷。○: The cured film was almost free from peeling and scratching.

△:硬化膜帶有細小刮傷。△: The cured film has a small scratch.

×:硬化膜有部分剝離,或硬化膜表面有條狀刮傷。×: The cured film was partially peeled off, or the surface of the cured film was scratched.

(2)濁度(%)利用Haze計測定所得層合體之濁度(Haze值),並以下列基準評估。(2) Turbidity (%) The haze (Haze value) of the obtained laminate was measured by a Haze meter and evaluated on the following basis.

○:Haze值為1%以下。○: The Haze value is 1% or less.

△:Haze值為3%以下。△: The Haze value is 3% or less.

×:Haze值超過3%。×: The Haze value exceeds 3%.

(3)耐乙醇性以下列方法進行硬化膜之耐乙醇性。換言之,將浸染乙醇之不織布(BEMCOT S-2,旭化成工業公司製)安裝於學振型摩擦堅牢度試驗機(AB-301,Tester產業(股)製),以荷重500g之條件重覆擦拭硬膜表面20次後,目視觀察硬化膜表面有無刮傷,並以下列基準確認。(3) Ethanol resistance The ethanol resistance of the cured film was carried out by the following method. In other words, a non-woven fabric (BEMCOT S-2, manufactured by Asahi Kasei Kogyo Co., Ltd.) impregnated with ethanol was attached to a vibration-type friction fastness tester (AB-301, manufactured by Tester Industries Co., Ltd.), and was repeatedly rubbed with a load of 500 g. After 20 times on the surface of the film, the surface of the cured film was visually observed for scratching and confirmed on the following basis.

○:硬化膜幾乎無剝離及刮傷。○: The cured film was almost free from peeling and scratching.

△:硬化膜帶有細小刮傷。△: The cured film has a small scratch.

×:硬化膜有部分剝離,或硬化膜表面有條狀刮傷。×: The cured film was partially peeled off, or the surface of the cured film was scratched.

(4)層分離性以顯微鏡觀察所得硬化膜之剖面,評估是否二層分離。評估基準如下述。各狀態之典型例的電子顯微鏡相片如圖2所示。(4) Layer separation The cross section of the obtained cured film was observed under a microscope to evaluate whether or not the two layers were separated. The evaluation criteria are as follows. An electron micrograph of a typical example of each state is shown in FIG.

○:二層分離。○: Separation of the second layer.

△:未分離(一部份凝聚)×:均勻構造△: not separated (partially agglomerated) ×: uniform structure

<評估基準><Evaluation Benchmark>

○:二層分離。○: Separation of the second layer.

△:未分離(一部份凝聚)×:均勻構造△: not separated (partially agglomerated) ×: uniform structure

表中之簡稱等係如下述。The abbreviations in the table are as follows.

DPPA:二季戊四醇五丙烯酸酯;UV硬化性交聯劑(5官能)IRGACURE 369:2-苯甲基-2-二甲胺基-1-(4-嗎啉苯基)-1-丁酮;CIBA speciality chemicals(股)製、光聚合起始劑DPPA: dipentaerythritol pentaacrylate; UV curable crosslinker (5-functional) IRGACURE 369: 2-benzyl-2-dimethylamino-1-(4-morpholinyl)-1-butanone; CIBA Specialty chemicals, photopolymerization initiator

由表1的結果得知含有金屬氧化物粒子(A1)及(A2)兩者之實施例1~3之層分離性良好,且耐擦傷性、濁度及耐藥品性優異。From the results of Table 1, it was found that Examples 1 to 3 containing both of the metal oxide particles (A1) and (A2) have good layer separation properties and are excellent in scratch resistance, haze and chemical resistance.

而僅含有金屬氧化物粒子(A1)之比較例1,其耐擦傷性及耐藥品性降低。另外,含有2種相當於金屬氧化物粒子(A1)之粒子的比較例2,其層分離性降低,耐擦傷性、透明性差。On the other hand, in Comparative Example 1 containing only the metal oxide particles (A1), the scratch resistance and chemical resistance were lowered. Further, in Comparative Example 2 containing two kinds of particles corresponding to the metal oxide particles (A1), the layer separation property was lowered, and the scratch resistance and the transparency were inferior.

實施例4Example 4 〔層合體之製作〕[Production of laminate]

(1)硬塗層之製作使用金屬線棒塗佈器(# 12)將製造例3調製之含二氧化矽粒子之硬塗層用組成物(固形份濃度50%)塗佈於三乙醯基織維素薄膜(LOFO製,膜厚80μm)後,在烘箱中以80℃乾燥1分鐘。接著,空氣下,使用高壓水銀燈以0.6J/cm2 之光照射條件照射紫外線,形成硬化膜層。使用觸針式膜厚計測定硬化膜層之膜厚為5μm。(1) Preparation of hard coat layer The composition of the hard coat layer containing the cerium oxide particles prepared in Production Example 3 (solid content concentration: 50%) was applied to triethylene oxime using a metal bar coater (#12). The venetian film (manufactured by LOFO, film thickness: 80 μm) was dried in an oven at 80 ° C for 1 minute. Next, ultraviolet rays were irradiated under high light with a high-pressure mercury lamp under a light irradiation condition of 0.6 J/cm 2 to form a cured film layer. The film thickness of the cured film layer was measured by a stylus type film thickness meter to be 5 μm.

(2)中折射率層之製作使用金屬線棒塗佈器(#3)將製造例4調製之含有氧化鋯粒子之組成物(固形份濃度4%)塗佈於(1)製作之硬塗層上,然後,於烘箱中以80℃乾燥1分鐘。接著,在氮氣氛下,使用高壓水銀燈以0.6J/cm2 之光照射條件照射紫外線,形成硬化膜層。以反射分光計算出硬化膜層之膜厚為65nm。(2) Preparation of Medium Refractive Index Layer The composition containing zirconia particles prepared in Production Example 4 (solid content concentration: 4%) was applied to (1) hard coat produced by using a metal bar coater (#3). The layers were then dried in an oven at 80 ° C for 1 minute. Next, ultraviolet rays were irradiated under a nitrogen atmosphere using a high-pressure mercury lamp under a light irradiation condition of 0.6 J/cm 2 to form a cured film layer. The film thickness of the cured film layer was calculated by reflection spectrometry to be 65 nm.

(3)高折射率層與低折射率層之製作分別使用金屬線棒塗佈器(#3)將實施例1~3製得之硬化性樹脂組成物1~3塗佈於(2)製作之中折射率層上,然後於烘箱中以140℃乾燥2分鐘。接著,在大氣下,使用OAK製作所製輸送式水銀燈以0.6J/cm2 照射紫外線,形成膜厚為0.2μm之硬化膜層。(3) Preparation of High Refractive Index Layer and Low Refractive Index Layer The curable resin compositions 1 to 3 obtained in Examples 1 to 3 were applied to (2) by using a metal bar coater (#3), respectively. The middle refractive index layer was then dried in an oven at 140 ° C for 2 minutes. Next, under a vacuum, a transfer type mercury lamp manufactured by OAK Co., Ltd. was irradiated with ultraviolet rays at 0.6 J/cm 2 to form a cured film layer having a film thickness of 0.2 μm.

實施例5Example 5 〔層合體之製作〕[Production of laminate]

(1)硬塗層之製作與實施例4(1)同樣製作。(1) The production of the hard coat layer was produced in the same manner as in Example 4 (1).

(2)防靜電層之製作使用金屬線棒塗佈器(# 3)將製造例5調製之含有ITO粒子之組成物(固形份濃度4%)塗佈於(1)製作之硬塗層上,然後,於烘箱中以80℃乾燥1分鐘。接著,在氮氣氛下,使用高壓水銀燈以0.6J/cm2 之光照射條件照射紫外線,形成硬化膜層。以反射分光計算出硬化膜層之膜厚為65nm。(2) Preparation of an antistatic layer The composition containing the ITO particles prepared in Production Example 5 (solid content concentration: 4%) was applied onto the hard coat layer prepared in (1) using a metal bar coater (#3). Then, it was dried at 80 ° C for 1 minute in an oven. Next, ultraviolet rays were irradiated under a nitrogen atmosphere using a high-pressure mercury lamp under a light irradiation condition of 0.6 J/cm 2 to form a cured film layer. The film thickness of the cured film layer was calculated by reflection spectrometry to be 65 nm.

(3)中折射率層之製作與實施例4(2)同樣製作。(3) The middle refractive index layer was produced in the same manner as in Example 4 (2).

(4)高折射率層與低折射率層之製作分別使用金屬線棒塗佈器(#3)將實施例1~3製得之硬化性樹脂組成物1~3塗佈於(3)製作之中折射率層上,然後於烘箱中以140℃乾燥2分鐘。接著,在大氣下,使用OAK製作所製輸送式水銀燈照射0.6J/cm2 之紫外線,形成膜厚為0.2μm之硬化膜層。(4) Preparation of High Refractive Index Layer and Low Refractive Index Layer The curable resin compositions 1 to 3 obtained in Examples 1 to 3 were applied to (3) by using a metal bar coater (#3), respectively. The middle refractive index layer was then dried in an oven at 140 ° C for 2 minutes. Next, ultraviolet rays of 0.6 J/cm 2 were irradiated with a transport type mercury lamp manufactured by OAK Co., Ltd. under the atmosphere to form a cured film layer having a film thickness of 0.2 μm.

實施例6、7Example 6, 7 〔層合體之製作〕[Production of laminate]

(1)防靜電層之製作以製造例6或7調製之含有ATO粒子之組成物(固形份濃度5%)或含有摻雜Al之ZnO粒子之組成物(固形份濃度4%)取代製造例5調製之ITO粒子,使用金屬線棒塗佈器(#3)塗佈於三乙醯基纖維素薄膜(LOFO製,膜厚80μm)後,在烘箱中以80℃乾燥1分鐘。接著,在氮氣氛下,使用高壓水銀燈以0.6J/cm2 之光照射條件照射紫外線形成硬化膜層。以反射分光計算出硬化膜層之膜厚為65nm。(1) Preparation of Antistatic Layer A composition containing ATO particles prepared in Production Example 6 or 7 (solid content concentration: 5%) or a composition containing ZnO particles doped with Al (solid content concentration: 4%) was used instead of the production example. The ITO particles prepared in 5 were applied to a triethylenesulfonated cellulose film (manufactured by LOFO, film thickness: 80 μm) using a wire bar coater (#3), and then dried in an oven at 80 ° C for 1 minute. Next, the cured film layer was formed by irradiating ultraviolet rays with a high-pressure mercury lamp under a nitrogen atmosphere at a light irradiation condition of 0.6 J/cm 2 . The film thickness of the cured film layer was calculated by reflection spectrometry to be 65 nm.

(2)硬塗層之製作使用金屬線棒塗佈器(# 12)塗佈製造例3調製之含二氧化矽粒子之硬塗層用組成物(固形份濃度50%)後,在烘箱中以80℃乾燥1分鐘。接著,空氣下,使用高壓水銀燈以0.6J/cm2 之光照射條件照射紫外線,形成硬化膜層。(2) Preparation of hard coat layer A composition for a hard coat layer containing cerium oxide particles prepared in Production Example 3 (solid content concentration: 50%) was applied using a metal bar coater (#12) in an oven. Dry at 80 ° C for 1 minute. Next, ultraviolet rays were irradiated under high light with a high-pressure mercury lamp under a light irradiation condition of 0.6 J/cm 2 to form a cured film layer.

(3)中折射率層之製作與實施例4(2)同樣製作。(3) The middle refractive index layer was produced in the same manner as in Example 4 (2).

(4)高折射率層與低折射率層之製作分別使用金屬線棒塗佈器(#3)將實施例1~3製得之硬化性樹脂組成物1~3塗佈於(3)製作之中折射率層上,然後於烘箱中以140℃乾燥2分鐘,在大氣下,使用OAK製作所製輸送式水銀燈照射0.6J/cm2 之紫外線,形成膜厚為0.2μm之硬化膜層。(4) Preparation of High Refractive Index Layer and Low Refractive Index Layer The curable resin compositions 1 to 3 obtained in Examples 1 to 3 were applied to (3) by using a metal bar coater (#3), respectively. The middle refractive index layer was dried in an oven at 140 ° C for 2 minutes, and irradiated with ultraviolet rays of 0.6 J/cm 2 under a vacuum using a transport-type mercury lamp manufactured by OAK Co., Ltd. to form a cured film layer having a film thickness of 0.2 μm.

實施例8Example 8 〔層合體之製作〕[Production of laminate]

(1)硬塗層之製作與實施例4(1)同樣製作。(1) The production of the hard coat layer was produced in the same manner as in Example 4 (1).

(2)高折射率層與低折射率層之製作分別使用金屬線棒塗佈器(#3)將實施例1~3製得之硬化性樹脂組成物1~3塗佈於(1)製作之硬塗層上,然後於烘箱中以140℃乾燥2分鐘,在大氣下,使用OAK製作所製輸送式水銀燈照射0.6J/cm2 之紫外線,形成膜厚為0.2μm之硬化膜層。(2) Preparation of High Refractive Index Layer and Low Refractive Index Layer The curable resin compositions 1 to 3 obtained in Examples 1 to 3 were applied to (1) by using a metal bar coater (#3), respectively. The hard coat layer was then dried at 140 ° C for 2 minutes in an oven, and irradiated with ultraviolet rays of 0.6 J/cm 2 by a transfer type mercury lamp manufactured by OAK Co., Ltd. under the atmosphere to form a cured film layer having a film thickness of 0.2 μm.

評估例1Evaluation Example 1 〔層合體之評估〕[Evaluation of laminates]

以透過型電子顯微鏡觀察實施例4~8所製得之層合體的剖面,確認任一層合體中之低折射率層與高折射率層皆分離成兩層。此時,低折射率為金屬氧化物粒子實質上不存在之層,高折射率層為金屬氧化物粒子高密度存在之層。The cross sections of the laminates obtained in Examples 4 to 8 were observed by a transmission electron microscope, and it was confirmed that the low refractive index layer and the high refractive index layer in either of the laminates were separated into two layers. In this case, the low refractive index is a layer in which the metal oxide particles are substantially absent, and the high refractive index layer is a layer in which the metal oxide particles are present in a high density.

圖11係表示兩層分離、未分離(一部份凝聚)及均勻構造之各狀態的概念圖。Figure 11 is a conceptual diagram showing states of two layers separated, unseparated (partially agglomerated), and uniformly structured.

藉由分光反射率測定裝置(組合大型試料室積分球附屬裝置150-09090之自行記錄分光光度計U-3410、日立製作所(股)製)測定波長550nm之反射率,以評估製得之抗反射用層合體的抗反射性。具體而言,以鋁之蒸鍍膜之反射率為基準(100%),測定抗反射用層合體(抗反射膜)之反射率。結果任一層合體之波長550nm之反射率均為1%以下。The reflectance at a wavelength of 550 nm was measured by a spectroscopic reflectance measuring device (combined with a large-scale sample integrating sphere attachment 150-09090 self-recording spectrophotometer U-3410, manufactured by Hitachi, Ltd.) to evaluate the obtained anti-reflection. The antireflection properties of the laminate are used. Specifically, the reflectance of the antireflection laminate (antireflection film) was measured based on the reflectance of the aluminum vapor deposited film (100%). As a result, the reflectance at a wavelength of 550 nm of any of the laminates was 1% or less.

〔產業上利用性〕[industrial use]

本發明之硬化性樹脂組成物可由1之塗膜形成2以上之層所構成之硬化膜,可簡化製造步驟。The curable resin composition of the present invention can form a cured film composed of two or more layers from the coating film of one, and the manufacturing steps can be simplified.

本發明之硬化性樹脂組成物及硬化物可用於例如塑膠光學零件、觸控面板、薄膜型液晶元件、塑膠容器、建築內裝材之地板材、壁材、人工大理石等防止刮傷(擦傷)或防污染之保護塗佈材;薄膜型液晶元件、觸控面板、塑膠光學零件等之抗反射膜;各種基材之接著劑、密封劑:印刷油墨之黏結劑等,特別適用於抗反射膜。The curable resin composition and cured product of the present invention can be used for, for example, plastic optical parts, touch panels, film type liquid crystal elements, plastic containers, floor boards for building interior materials, wall materials, artificial marble, etc. to prevent scratches (scratches). Or anti-pollution protective coating material; anti-reflection film for film type liquid crystal element, touch panel, plastic optical parts, etc.; adhesive for various substrates, sealant: bonding agent for printing ink, etc., especially suitable for anti-reflection film .

本發明之層合體的製造方法可由1之塗膜形成2以上之層,可簡化具有兩層以上之多層構造的層合體之製造步驟。因此,本發明之層合體的製造方法,特別適用於形成抗反射膜、透鏡、選擇透過膜濾光片等光學材料。又,製得之層合體係利用可含有氟含量較高之層,可適用於對要求耐候性之基材的塗料、耐候薄膜、塗覆及其他用途。而且,該層合體對於基材之密著性優異,耐擦傷性高,可賦予良好的抗反射效果,極適用於抗反射膜,可適用於各種顯示裝置可提升其辨識性。The method for producing a laminate of the present invention can form a layer of 2 or more from the coating film of 1, and can simplify the production steps of the laminate having a multilayer structure of two or more layers. Therefore, the method for producing a laminate of the present invention is particularly suitable for forming an optical material such as an antireflection film, a lens, or a selective transmission film filter. Further, the obtained laminate system can be applied to a coating material, a weather-resistant film, a coating, and the like for a substrate requiring weather resistance by using a layer having a high fluorine content. Further, the laminate is excellent in adhesion to a substrate, has high scratch resistance, imparts a good antireflection effect, and is extremely suitable for an antireflection film, and can be applied to various display devices to improve the visibility.

10...基材10. . . Substrate

20...硬塗層20. . . Hard coating

30...防靜層30. . . Antistatic layer

40...高折射率層40. . . High refractive index layer

50...低折射率層50. . . Low refractive index layer

60...中折射率層60. . . Medium refractive index layer

1、1a、1b...層1, 1a, 1b. . . Floor

3...層3. . . Floor

〔圖1A〕係「由1之塗膜所形成之2以上之層」的說明圖。Fig. 1A is an explanatory view of "a layer of 2 or more formed of a coating film of 1".

〔圖1B〕係「由1之塗膜所形成之2以上之層」的說明圖。Fig. 1B is an explanatory view of "a layer of 2 or more formed of a coating film of 1".

〔圖1C〕係「由1之塗膜所形成之2以上之層」的說明圖。Fig. 1C is an explanatory view of "a layer of 2 or more formed of a coating film of 1".

〔圖1D〕係「由1之塗膜所形成之2以上之層」的說明圖。Fig. 1D is an explanatory view of "a layer of 2 or more formed of a coating film of 1".

〔圖2〕係本發明之一實施形態之抗反射膜的剖面圖。Fig. 2 is a cross-sectional view showing an antireflection film according to an embodiment of the present invention.

〔圖3〕係本發明之其他實施形態之抗反射膜的剖面圖。Fig. 3 is a cross-sectional view showing an antireflection film according to another embodiment of the present invention.

〔圖4〕係本發明之其他實施形態之抗反射膜的剖面圖。Fig. 4 is a cross-sectional view showing an antireflection film according to another embodiment of the present invention.

〔圖5〕係本發明之其他實施形態之抗反射膜的剖面圖。Fig. 5 is a cross-sectional view showing an antireflection film according to another embodiment of the present invention.

〔圖6〕係本發明之其他實施形態之抗反射膜的剖面圖。Fig. 6 is a cross-sectional view showing an antireflection film according to another embodiment of the present invention.

〔圖7〕係本發明之其他實施形態之抗反射膜的剖面圖。Fig. 7 is a cross-sectional view showing an antireflection film according to another embodiment of the present invention.

〔圖8〕係本發明之其他實施形態之抗反射膜的剖面圖。Fig. 8 is a cross-sectional view showing an antireflection film according to another embodiment of the present invention.

〔圖9〕係本發明之其他實施形態之抗反射膜的剖面圖。Fig. 9 is a cross-sectional view showing an antireflection film according to another embodiment of the present invention.

〔圖10〕係本發明之其他實施形態之抗反射膜的剖面圖。Fig. 10 is a cross-sectional view showing an antireflection film according to another embodiment of the present invention.

〔圖11〕係表示二層分離、未分離(一部份凝集)及均勻構造之各狀態概念之電子顯微鏡相片。[Fig. 11] is an electron micrograph showing the concept of each state of two-layer separation, non-separation (partial aggregation), and uniform structure.

10...基材10. . . Substrate

40...高折射率層40. . . High refractive index layer

50...低折射率層50. . . Low refractive index layer

Claims (29)

一種硬化性樹脂組成物,其特徵係含有下述成份:(A1)鍵結具有聚合性不飽和基之有機化合物(Ab)所成之數平均粒徑1nm以上,未達40nm的金屬氧化物粒子(以下稱為「(A1)之金屬氧化物粒子」)(A2)數平均粒徑40nm以上,200nm以下的金屬氧化物粒子(以下稱為「(A2)之金屬氧化物粒子」)(B)含有乙烯性不飽和基之含氟聚合物(C)(B)含有乙烯性不飽和基之含氟聚合物之溶解性高之一種或兩種以上的溶劑(以下稱為「(C)快速揮發溶劑」)(D)(A1)及(A2)之金屬氧化物粒子之分散安定性高,且與(C)快速揮發溶劑具有相溶特性之一種或兩種以上的溶劑(以下稱為「(D)緩慢揮發溶劑」),且(C)快速揮發溶劑之相對蒸發速度大於(D)緩慢揮發溶劑之相對蒸發速度。 A curable resin composition characterized by comprising: (A1) a metal oxide particle having an average number of particles of 1 nm or more and less than 40 nm formed by an organic compound (Ab) having a polymerizable unsaturated group; (hereinafter referred to as "metal oxide particles of (A1)") (A2) metal oxide particles having a number average particle diameter of 40 nm or more and 200 nm or less (hereinafter referred to as "metal oxide particles of (A2)") (B) Fluorine-containing polymer (C) containing an ethylenically unsaturated group (B) One or two or more solvents having high solubility in a fluorine-containing polymer containing an ethylenically unsaturated group (hereinafter referred to as "(C) rapid volatilization Solvent") (D) (A1) and (A2) A metal oxide particle having high dispersion stability and having one or two or more solvents having compatibility characteristics with (C) a fast-volatile solvent (hereinafter referred to as "( D) Slowly evaporating the solvent"), and (C) the relative evaporation rate of the rapidly evaporating solvent is greater than (D) the relative evaporation rate of the slowly evaporating solvent. 如申請專利範圍第1項之硬化性樹脂組成物,其中(C)快速揮發溶劑係(A1)及(A2)之金屬氧化物粒子之分散安定性低之一種或兩種以上的溶劑,(D)緩慢揮發溶劑係(B)含有乙烯性不飽和基之含氟聚合物之溶解性低之一種或兩種以上的溶劑。 The curable resin composition of the first aspect of the invention, wherein (C) one or two or more solvents having low dispersion stability of the metal oxide particles of the rapid volatile solvent systems (A1) and (A2), (D) The slow-releasing solvent system (B) one or two or more solvents having low solubility of the fluorine-containing polymer containing an ethylenically unsaturated group. 如申請專利範圍第1項之硬化性樹脂組成物,其 中該(A1)之金屬氧化物粒子為選自鋁、鋯、鈦、鋅、鍺、銦、錫、銻及鈰所成群之至少一種元素的氧化物粒子。 Such as the curable resin composition of claim 1 of the patent scope, The metal oxide particles of (A1) are oxide particles of at least one element selected from the group consisting of aluminum, zirconium, titanium, zinc, antimony, indium, tin, antimony and antimony. 如申請專利範圍第1項之硬化性樹脂組成物,其中該(A2)之金屬氧化物粒子為以二氧化矽為主成分的粒子。 The curable resin composition according to claim 1, wherein the metal oxide particles of (A2) are particles containing cerium oxide as a main component. 如申請專利範圍第1項之硬化性樹脂組成物,其中該(A2)之金屬氧化物粒子與該具有聚合性不飽和基的有機化合物(Ab)鍵結。 The curable resin composition of claim 1, wherein the metal oxide particles of (A2) are bonded to the organic compound (Ab) having a polymerizable unsaturated group. 如申請專利範圍第1項之硬化性樹脂組成物,其中該有機化合物(Ab)除了聚合性不飽和基,尚具有下述式(A-1)表示之基, 〔式中,U係NH、O(氧原子)或S(硫原子),V為O或S〕。The curable resin composition of claim 1, wherein the organic compound (Ab) has a group represented by the following formula (A-1) in addition to the polymerizable unsaturated group. [In the formula, U is NH, O (oxygen atom) or S (sulfur atom), and V is O or S]. 如申請專利範圍第1項之硬化性樹脂組成物,其中該有機化合物(Ab)為分子內具有矽烷醇基之化合物或藉由水解生成矽烷醇基之化合物。 The curable resin composition of claim 1, wherein the organic compound (Ab) is a compound having a stanol group in the molecule or a compound which is hydrolyzed to form a stanol group. 如申請專利範圍第1項之硬化性樹脂組成物,其中該(B)含有乙烯性不飽和基之含氟聚合物為具有1個異氰酸酯基與至少1個乙烯性不飽和基之化合物(B-1) 與含羥基之含氟聚合物(B-2)反應所得者。 The sclerosing resin composition of claim 1, wherein the (B) fluoropolymer containing an ethylenically unsaturated group is a compound having one isocyanate group and at least one ethylenically unsaturated group (B- 1) The reaction with a hydroxyl group-containing fluoropolymer (B-2). 如申請專利範圍第8項之硬化性樹脂組成物,其中該含羥基之含氟聚合物(B-2)為含有下述構造單位(a)20~70莫耳%、(b)10~70莫耳%及(c)5~70莫耳%所成,且凝膠滲透色譜測定之聚苯乙烯換算數平均分子量為5,000~500,000,(a)下述一般式(1)表示之構造單位(b)下述一般式(2)表示之構造單位(c)下述一般式(3)表示之構造單位 〔式中,R1 係氟原子、氟烷基、或-OR2 表示之基(R2 為烷基或氟烷基)〕 〔式中,R3 係氫原子或甲基,R4 係烷基、-(CH2 )x-OR5 或-OCOR5 表示之基(R5 為烷基、或環氧丙基,x為0或1之數)、羧基或烷氧基羰基〕 〔式中,R6 係氫原子或甲基,R7 係氫原子或羥烷基,v為0或1之數〕。The curable resin composition of claim 8, wherein the hydroxyl group-containing fluoropolymer (B-2) contains the following structural unit (a) 20 to 70 mol%, and (b) 10 to 70 Mohr% and (c) 5 to 70 mol%, and the polystyrene-equivalent number average molecular weight measured by gel permeation chromatography is 5,000 to 500,000, (a) the structural unit represented by the following general formula (1) ( b) the structural unit represented by the following general formula (2) (c) the structural unit represented by the following general formula (3) Wherein R 1 is a fluorine atom, a fluoroalkyl group or a group represented by -OR 2 (R 2 is an alkyl group or a fluoroalkyl group)] Wherein R 3 is a hydrogen atom or a methyl group, R 4 is an alkyl group, a group represented by —(CH 2 )x-OR 5 or —OCOR 5 (R 5 is an alkyl group or an epoxypropyl group, and x is 0 or 1), carboxyl or alkoxycarbonyl] Wherein R 6 is a hydrogen atom or a methyl group, R 7 is a hydrogen atom or a hydroxyalkyl group, and v is a number of 0 or 1. 如申請專利範圍第8項之硬化性樹脂組成物,其中該含羥基之含氟聚合物(B-2)尚含有來自含偶氮基之聚矽氧烷化合物之下述構造單位(d)0.1~10莫耳%,(d)下述一般式(4)表示之構造單位 〔式中,R8 及R9 可相同或不相同之氫原子、烷基、鹵化烷基或芳基〕。The sclerosing resin composition of claim 8, wherein the hydroxyl group-containing fluoropolymer (B-2) further contains the following structural unit (d) 0.1 from the azo group-containing polyoxy siloxane compound; ~10 mol%, (d) the structural unit represented by the following general formula (4) [wherein R 8 and R 9 may be the same or different hydrogen atom, alkyl group, halogenated alkyl group or aryl group]. 如申請專利範圍第10項之硬化性樹脂組成物,其中該含羥基之含氟聚合物(B-2)含有該構造單位(d)作為下述構造單位(e)之一部份,(e)下述一般式(5)表示之構造單位 〔式中,R10 ~R13 為氫原子、烷基或氰基,R14 ~R17 為氫原子或烷基,p、q係1~6之數,s、t係0~6之數,y為1~200之數〕。The sclerosing resin composition of claim 10, wherein the hydroxyl group-containing fluoropolymer (B-2) contains the structural unit (d) as a part of the following structural unit (e), (e) The structural unit represented by the following general formula (5) Wherein R 10 to R 13 are a hydrogen atom, an alkyl group or a cyano group, R 14 to R 17 are a hydrogen atom or an alkyl group, p and q are numbers 1 to 6, and s and t are 0 to 6 , y is the number from 1 to 200]. 如申請專利範圍第8項之硬化性樹脂組成物,其中該含羥基之含氟聚合物(B-2)尚含有下述構造單位(f)0.1~5莫耳%,(f)下述一般式(6)表示之構造單位 〔式中,R18 具有乳化作用之基〕。The curable resin composition of claim 8, wherein the hydroxyl group-containing fluoropolymer (B-2) further contains the following structural unit (f) of 0.1 to 5 mol%, (f) the following general Structural unit represented by formula (6) [wherein R 18 has an emulsification group]. 如申請專利範圍第8項之硬化性樹脂組成物,其中該化合物(B-1)為2-(甲基)丙烯醯氧基乙基異氰酸酯。 The curable resin composition of claim 8, wherein the compound (B-1) is 2-(meth)acryloxyethyl isocyanate. 如申請專利範圍第1項之硬化性樹脂組成物,其中尚含有成分(E)含有至少2個以上之(甲基)丙烯醯基之多官能(甲基)丙烯酸酯化合物及/或含有至少1個以上之(甲基)丙烯醯基之含氟(甲基)丙烯酸酯化合 物。 The curable resin composition of claim 1, which further comprises a polyfunctional (meth) acrylate compound containing at least two (meth) acryl fluorenyl groups of component (E) and/or at least 1 Fluorine (meth) acrylate combination of more than one (meth) acrylonitrile group Things. 如申請專利範圍第1項之硬化性樹脂組成物,其中尚含有成分(F)自由基聚合起始劑。 The curable resin composition of claim 1, wherein the component (F) radical polymerization initiator is further contained. 如申請專利範圍第1項之硬化性樹脂組成物,其係紫外線硬化性。 The curable resin composition of the first aspect of the patent application is ultraviolet curable. 一種硬化膜,其特徵係使申請專利範圍第1~16項中任一項之硬化性樹脂組成物硬化所得,具有2層以上之多層構造。 A cured film obtained by curing the curable resin composition according to any one of claims 1 to 16 and having a multilayer structure of two or more layers. 如申請專利範圍第17項之硬化膜,其係含有由(A1)及(A2)之金屬氧化物粒子高密度存在之1以上的層及(A1)及(A2)之金屬氧化物粒子實質上不存在之1以下的層所構成之二層以上的層構造。 The cured film of claim 17, which comprises a layer having a high density of metal oxide particles of (A1) and (A2) and a metal oxide particle of (A1) and (A2) substantially A layer structure of two or more layers composed of a layer having no or less than one layer. 一種層合體的製造方法,其係具有基材與在其上之多層構造之層合體的製造方法,其特徵係將申請專利範圍第1~16項中任一項之硬化性樹脂組成物塗佈於該基材或基材上所形成之層上形成塗膜,使溶媒由此1之塗膜蒸發形成2以上的層。 A method for producing a laminate comprising a substrate and a laminate having a multilayer structure thereon, characterized in that the curable resin composition according to any one of claims 1 to 16 is coated. A coating film is formed on the layer formed on the substrate or the substrate, and the coating film of the solvent is evaporated to form a layer of 2 or more. 如申請專利範圍第19項之層合體的製造方法,其中該2以上之層的各層為(A1)及/或(A2)之金屬氧化物粒子高密度存在的層或(A1)及(A2)之金屬氧化物粒子實質上不存在的層,至少一層為(A1)及/或(A2)之金屬氧化物粒子高密度存在的層。 The method for producing a laminate according to claim 19, wherein each of the two or more layers is a layer having a high density of metal oxide particles of (A1) and/or (A2) or (A1) and (A2) At least one of the layers in which the metal oxide particles are substantially absent is a layer in which the metal oxide particles of (A1) and/or (A2) are present at a high density. 如申請專利範圍第20項之層合體的製造方法,其中該2以上的層為2層。 The method for producing a laminate according to claim 20, wherein the two or more layers are two layers. 如申請專利範圍第19項之層合體的製造方法,其中進一步使該2以上的層照射輻射線產生硬化。 The method for producing a laminate according to claim 19, wherein the two or more layers are further irradiated with radiation to cause hardening. 如申請專利範圍第19項之層合體的製造方法,其中層合體為光學用零件。 The method for producing a laminate according to claim 19, wherein the laminate is an optical component. 如申請專利範圍第19項之層合體的製造方法,其中層合體為抗反射膜。 The method for producing a laminate according to claim 19, wherein the laminate is an antireflection film. 如申請專利範圍第21項之層合體的製造方法,其中該層合體為在基材上,至少高折射率層及低折射率層自靠近基材側起依此順序層合的抗反射膜,申請專利範圍第21項之2層為由高折射率層及低折射率層所成。 The method for producing a laminate according to claim 21, wherein the laminate is an antireflection film which is laminated on the substrate at least the high refractive index layer and the low refractive index layer from the substrate side in this order, The two layers of claim 21 of the patent application are formed of a high refractive index layer and a low refractive index layer. 如申請專利範圍第25項之層合體的製造方法,其中低折射率層之589nm之折射率為1.20~1.55,高折射率層之589nm之折射率為1.50~2.20,且比低折射率層之折射率高。 The method for manufacturing a laminate according to claim 25, wherein the low refractive index layer has a refractive index of 1.20 to 1.55 at 589 nm, and the high refractive index layer has a refractive index of 1.50 to 2.20 at 589 nm, and is lower than the low refractive index layer. The refractive index is high. 如申請專利範圍第21項之層合體的製造方法,其中該層合體為在基材上,至少中折射率層、高折射率層及低折射率層自靠近基材側起依此順序層合之抗反射膜,申請專利範圍第21項之2層係由高折射率層及低折射率層所成。 The method for producing a laminate according to claim 21, wherein the laminate is on the substrate, and at least the medium refractive index layer, the high refractive index layer and the low refractive index layer are laminated in this order from the side closer to the substrate. The antireflection film is formed of a high refractive index layer and a low refractive index layer in the second layer of claim 21 of the patent application. 如申請專利範圍第27項之層合體的製造方法,其中低折射率層之589nm之折射率為1.20~1.55,中折射率層之589nm之折射率為1.50~1.90,且比低折射率層之折射率高, 高折射率層之589nm之折射率為1.51~2.20,且比中折射率層之折射率高。 The method for manufacturing a laminate according to claim 27, wherein the low refractive index layer has a refractive index of 1.20 to 1.55 at 589 nm, and the medium refractive index layer has a refractive index of 1.50 to 1.90 at 589 nm, and is lower than the low refractive index layer. High refractive index, The high refractive index layer has a refractive index of 591 nm of 1.51 to 2.20 and a higher refractive index than the medium refractive index layer. 如申請專利範圍第25項之層合層的製造方法,其係更進一步於基材上形成硬塗層及/或防靜電層。 The method for producing a laminate layer according to claim 25, further comprising forming a hard coat layer and/or an antistatic layer on the substrate.
TW094140132A 2004-11-15 2005-11-15 A hardened resin composition, a hardened film and a laminate TWI389963B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004331285 2004-11-15
JP2004331284 2004-11-15
JP2005197113A JP2006231316A (en) 2004-11-15 2005-07-06 Manufacturing method of laminate
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