TWI385277B - Preparation method of black yttrium oxide sputtering film and black yttrium oxide sputtering film coating material - Google Patents

Preparation method of black yttrium oxide sputtering film and black yttrium oxide sputtering film coating material Download PDF

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TWI385277B
TWI385277B TW097125606A TW97125606A TWI385277B TW I385277 B TWI385277 B TW I385277B TW 097125606 A TW097125606 A TW 097125606A TW 97125606 A TW97125606 A TW 97125606A TW I385277 B TWI385277 B TW I385277B
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black
film
alloys
plasma
cerium oxide
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TW200925323A (en
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Yoshio Harada
Junichi Takeuchi
Ryo Yamasaki
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Tocalo Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Description

黑色氧化釔熔射皮膜的形成方法及黑色氧化釔熔射皮膜被覆材料Method for forming black yttria spray film and black yttrium oxide spray film coating material

本發明是關於熱輻射性及耐損傷性等特性佳的黑色氧化釔熔射皮膜的形成方法及彩色式樣性佳的黑色氧化釔熔射皮膜被覆材料。The present invention relates to a method for forming a black cerium oxide spray film having excellent properties such as heat radiation resistance and damage resistance, and a black yttria spray coating material having excellent color pattern properties.

熔射法係藉由電漿噴射或燃燒焰熔融金屬或陶瓷、金屬陶瓷等粉末,經飛行吹附於被熔射體(基材)表面,以於該基材表面形成皮膜的技術,此係為在大多數產業領域中所廣泛採用表面處理技術之一。適用前述熔射法所得之熔射皮膜,已知會因構成此皮膜粒子間結合力強弱、未結合粒子量及未熔融粒子(以下稱為「未熔融粒子」量等,在皮膜機械強度或耐蝕性上產生極大的差異。The spraying method is a technique in which a powder such as a metal or a ceramic or a cermet is melted by a plasma jet or a combustion flame, and is blown onto the surface of the object to be irradiated (substrate) to form a film on the surface of the substrate. One of the surface treatment technologies is widely used in most industrial fields. The spray film obtained by the above-described spray method is known to have mechanical strength or corrosion resistance in the film due to the strong bonding force between the particles of the film, the amount of unbound particles, and the amount of unmelted particles (hereinafter referred to as "unmelted particles"). There is a huge difference in it.

為此,習知熔射技術開發目標例如是藉由使用電漿中高溫的熱源,在被熔射體表面發生強的衝擊能量,以提高粒子間結合力並同時減小氣孔率,甚至提升皮膜與基材間的接著力。For this reason, the development goal of the conventional melting technology is, for example, by using a high-temperature heat source in the plasma to generate strong impact energy on the surface of the fused body, thereby improving the bonding force between the particles while reducing the porosity and even raising the film. The adhesion between the substrate and the substrate.

另一方面,金屬熔射皮膜係於大氣中形成,全部熔射粒子係與空氣接觸,粒子表面生成氧化膜,鑑於此粒子間結合力降低,也使此粒子與基材的密著性惡化。習知解決此問題的方法,例如是日本專利特開平6-196421號公報中所提出之在低壓惰性氣體氣氛氣中進行熔射的方法(一般稱為減壓電漿熔射法)。具體而言,在排出空氣的真空容器 中,以50百帕(hPa)至200百帕導入氬氣,以於此氣氛氣中進行電漿熔射的方法。On the other hand, the molten metal film is formed in the atmosphere, and all of the molten particles are in contact with air, and an oxide film is formed on the surface of the particles, and the adhesion between the particles and the substrate is deteriorated in view of the decrease in the bonding force between the particles. A method for solving this problem is, for example, a method of performing melting in a low-pressure inert gas atmosphere (generally referred to as a reduced-pressure plasma spraying method) as proposed in Japanese Laid-Open Patent Publication No. Hei No. Hei. Specifically, in a vacuum container that discharges air In the case, argon gas is introduced at 50 hectopascals (hPa) to 200 hectopascals to perform plasma spraying in the atmosphere.

關於此點,氧化物系陶瓷的熔射皮膜,由於是氧化熔射材料粉末本身,故在大氣中熔射也不會再被氧化,另一方面還有在減壓下氬氣氣氛氣中熔射也不會在熔射粒子上發生化學變化的特性。自此,氧化物系陶瓷減壓電漿熔射法之現狀是在大氣電漿熔射上比較少研究開發的案例。In this regard, the molten film of the oxide-based ceramics is oxidized by the powder itself, so that it is not oxidized in the atmosphere, and on the other hand, it is melted in an argon atmosphere under reduced pressure. The shot also does not undergo chemical changes on the molten particles. Since then, the current state of the oxide ceramic decompression plasma spray method is a case of less research and development on atmospheric plasma spray.

還有,習知熔射皮膜的研究,由於在此皮膜所具有之硬度、耐磨耗性、耐熱性、耐蝕性或密著性等的提升,故以金屬(合金)、陶瓷、金屬陶瓷等熔射材料種類及化學成分的選定,並於熔射法選擇與熔射條件決定等上置於重點位置。因此,對習知熔射皮膜而言,幾乎沒有的研究工學上利用皮膜色彩,以提升熔射皮膜製品彩色式樣之商品價值。Further, studies on conventional spray coatings have been made of metals (alloys), ceramics, cermets, etc. due to the improvement in hardness, wear resistance, heat resistance, corrosion resistance, or adhesion of the film. The type of molten material and the chemical composition are selected, and placed in a key position in the selection of the spray method and the determination of the spray conditions. Therefore, for the conventional spray film, there is almost no research work to utilize the color of the film to enhance the commercial value of the color pattern of the spray film product.

然而,觀察陶瓷熔射皮膜外觀色發現,作為熔射材料的氧化鉻(Cr2 O3 )粉末係為接近黑色的墨綠色,以之電漿熔射時會成為黑色的皮膜。另一方面,氧化鋁(Al2 O3 )粉末為白色,以之電漿熔射所得皮膜也是白色。但氧化鈦(TiO2 )粉末雖為白色系,以之電漿熔射所得則是黑色系皮膜。前述中,熔射皮膜色彩變化的原因應該是熔射熱源中例如是構成氧化鈦的氧一部份消失而成為(Tin O2n-1 )的氧化物所致。(日本專利特開平9-069554號公報)However, observing the appearance color of the ceramic molten film, it was found that the chromium oxide (Cr 2 O 3 ) powder as a molten material is a dark green ink, and when it is sprayed, it becomes a black film. On the other hand, the alumina (Al 2 O 3 ) powder is white, and the film obtained by plasma spraying is also white. However, although the titanium oxide (TiO 2 ) powder is white, it is a black film obtained by plasma spraying. In the foregoing, the reason for the color change of the molten film is that the molten heat source is, for example, a part of oxygen which constitutes titanium oxide disappears and becomes an oxide of (Ti n O 2n-1 ). (Japanese Patent Laid-Open No. Hei 9-069554)

以上說明中,氧化物系陶瓷熔射皮膜除去一部份氧化物後,熔射用粉末材料本身的色彩原本普通是僅再現作為 皮膜色彩。例如氧化釔(Y2 O3 )通常與氧化鋁(Al2 O3 )相同,為粉末材料狀態時是白色系,以此粉末材料熔射所得熔射皮膜也為白色系。氧化釔例如是於電漿熱源中熔射,構成氧化釔粒子的釔及氧結合狀態可能不會變化。作為金屬元素的鋁或釔與氧的化學親和力同時也是極強的,在高溫電漿環境中氧也不會消失,故可以在成為熔射皮膜後,持續維持粉末材料時氧化鋁、氧化釔的物理化學特性。In the above description, after the oxide-based ceramic spray film is removed from a part of the oxide, the color of the powder material for the spray itself is originally reproduced only as the color of the film. For example, yttrium oxide (Y 2 O 3 ) is usually the same as alumina (Al 2 O 3 ), and is white in the state of a powder material, and the molten film obtained by spraying the powder material is also white. The cerium oxide is, for example, sprayed in a plasma heat source, and the enthalpy and oxygen-bonding state constituting the cerium oxide particles may not change. The chemical affinity of aluminum or bismuth as a metal element is also extremely strong, and oxygen does not disappear in a high-temperature plasma environment. Therefore, after the molten film is formed, the alumina and yttrium oxide can be maintained while maintaining the powder material. Physical and chemical properties.

上述氧化釔熔射皮膜不僅耐熱性或耐高溫氧化性、耐蝕性優異,而且藉由使用鹵化物之低溫電漿時,已知可以在電漿蝕刻氣氛氣中發揮優異的抵抗性(耐電漿侵蝕性)(日本專利特開平10-004083號公報、日本專利特開平10-163180號公報、日本專利特開平10-547744號公報、日本專利特開2001-164354號公報、日本專利特開2003-321760號公報)。The above-mentioned cerium oxide sprayed film is excellent not only in heat resistance, high temperature oxidation resistance, and corrosion resistance, but also is excellent in resistance to plasma etching in the plasma etching atmosphere by using a low temperature plasma of a halide. (Japanese Patent Laid-Open No. Hei 10-004083, Japanese Patent Publication No. Hei 10-163180, Japanese Patent Laid-Open No. Hei 10-547744, Japanese Patent Laid-Open No. Hei No. 2001-164354, Japanese Patent Laid-Open No. 2003-321760 Bulletin).

前述文獻所揭露之氧化釔熔射皮膜係為全部白色系。還有,前述文獻中由於白色系氧化釔熔射皮膜特性不會變化,故並非變化此皮膜色彩,以利用於工學的及彩色式樣的商品價值提升者。The cerium oxide spray film disclosed in the above documents is all white. Further, in the above document, since the characteristics of the white yttrium oxide film do not change, the color of the film is not changed, and it is used for the improvement of the product value of engineering and color patterns.

作為改質基材表面的技術,除被覆形成上述熔射皮膜外,也有利用電子束照射或雷射光束照射的技術。例如是在關於電子束照射的日本專利特開昭61-104062號公報中,具有在金屬皮膜上照射電子束熔融此皮膜以消除氣孔的技術。還有,日本專利特開平9-316624號公報中,揭示對碳化物金屬陶瓷皮膜或金屬皮膜照射電子束,以提升皮 膜性能的技術。還有,在日本專利特開平10-202782號公報中,揭示對氧化鋯(ZrO2 )系陶瓷熔射皮膜照射雷射光束的技術。甚至,在日本專利特開2004-100039號公報中,揭示在形成稀土類氧化物熔射皮膜的情形下,將碳、鈦、鉬添加至熔射材料中,使皮膜變化至灰色~黑色的技術。As a technique for modifying the surface of the substrate, in addition to coating the above-mentioned molten film, there is also a technique of irradiating with an electron beam or a laser beam. For example, in Japanese Laid-Open Patent Publication No. SHO 61-104062, the entire disclosure of the present invention is directed to a technique of illuminating a metal film on a metal film to melt the film to eliminate pores. Further, Japanese Laid-Open Patent Publication No. Hei 9-316624 discloses a technique of irradiating an electron beam to a carbide cermet film or a metal film to improve the film performance. Further, Japanese Laid-Open Patent Publication No. Hei 10-202782 discloses a technique of irradiating a zirconia (ZrO 2 )-based ceramic spray film with a laser beam. In the case of forming a rare earth oxide sprayed film, a technique of adding carbon, titanium, and molybdenum to a molten material to change the film to gray to black is disclosed in Japanese Laid-Open Patent Publication No. 2004-100039. .

然而,前述所揭示之技術中,由於是以添加異種成分至熔射粉末材料為必要條件,如此則會使添加作業增大、因皮膜成分純度降低而招致物理化學性質降低。However, in the technique disclosed above, since it is necessary to add a heterogeneous component to the molten powder material, the addition work is increased, and the physicochemical property is lowered due to a decrease in the purity of the film component.

總之,前述先前技術係為以熔射皮膜中氣孔消滅、密著性提升或在利用於再熔融後冷卻製程的皮膜上發生縱向切割等為目的之技術,而沒有針對不添加其他種成分即可變化熔射皮膜外觀色彩的方法提出。In short, the foregoing prior art is a technique for the purpose of eliminating the pores in the molten film, improving the adhesion, or performing longitudinal cutting on the film for the cooling process after remelting, without being added to the other components. A method of changing the appearance color of the spray film is proposed.

相對於目前的現狀,發明者曾於日本專利特開2006-118053號公報中揭示對白色的氧化釔熔射皮膜,藉由照射雷射光束或電子束以使之成功變化成黑色,而成功藉由熔射皮膜黑色化提升熱輻射性及彩色式樣的商品價值。In contrast to the current state of the art, the inventors have disclosed in Japanese Patent Laid-Open Publication No. 2006-118053 that a white yttrium oxide sprayed film is successfully borrowed by irradiating a laser beam or an electron beam to successfully change it into black. The blackening of the spray film enhances the commercial value of heat radiation and color patterns.

本發明目的是提供一種使用由白色氧化釔粉末所構成之熔射材料,不依賴雷射光束或電子束,藉由熔射直接形成氧化釔黑色熔射皮膜的方法。藉由此方法可以解決習知技術所擁有之下述問題。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for directly forming a yttria black molten film by spraying, without using a laser beam or an electron beam, using a molten material composed of white cerium oxide powder. By this method, the following problems possessed by the prior art can be solved.

(1)習知技術中,著色稀土類氧化物熔射皮膜時,由於需於熔射粉末中添加碳、鈦、鉬等著色成分,故不僅會使生產製程增加,還會增加成本上揚、因其他種成分混入而致之皮膜純度降低、耐蝕性及耐熱性等物理化學性質劣化。(1) In the conventional technique, when a rare earth oxide film is colored, since a coloring component such as carbon, titanium, or molybdenum is added to the powder, the production process is not only increased, but also the cost is increased. The physicochemical properties such as reduction in film purity, corrosion resistance, and heat resistance are deteriorated by mixing other components.

(2)習知技術中,氧化釔熔射皮膜黑色化處理,由於是在形成白色氧化釔熔射皮膜後,對前述皮膜表面照射雷射光束或電子束而得,故必須要針對此之專用設備,而招致生產性降低及生產成本上昇。(2) In the prior art, the blackening treatment of the yttria-sprayed film is performed by irradiating a laser beam or an electron beam to the surface of the film after forming a white yttrium oxide film, so it is necessary to use it for this purpose. Equipment, resulting in reduced productivity and increased production costs.

為了解決習知技術所擁有之上述問題,本發明係採用下述解決方法。In order to solve the above problems possessed by the prior art, the present invention employs the following solutions.

本發明提出一種黑色氧化釔熔射皮膜的形成方法,係以惰性氣體與氫氣的混合氣體作為電漿.噴射產生用操作氣體,並以之電漿熔射白色氧化釔粉末,以形成氧化釔黑色熔射皮膜。The invention provides a method for forming a black cerium oxide molten film, which is a mixed gas of inert gas and hydrogen as a plasma. The operating gas for jet generation is used, and the white cerium oxide powder is sprayed with the plasma to form a yttria black molten film.

還有,本發明中較佳是給予下述解決方法。Further, in the present invention, it is preferred to give the following solution.

(1)供熔射材料飛行之熔射氣氛氣藉由惰性氣體維持於50百帕至600百帕的減壓環境中。(1) The molten atmosphere for the flight of the molten material is maintained in a reduced pressure environment of 50 to 600 hectopascals by an inert gas.

(2)前述氧化釔黑色熔射皮膜係藉由前述電漿.噴射中所含之原子狀氫所擁有之還元作用,由氧化釔(Y2 O3 )粉末的部分氧消失狀態下之Y2 O3-x 所示黑色粒子堆積而成。(2) The foregoing yttria black molten film is formed by the aforementioned plasma. The reductive action of the atomic hydrogen contained in the jet is formed by stacking black particles of Y 2 O 3-x in a state in which part of the oxygen of the yttria (Y 2 O 3 ) powder disappears.

(3)熔射氣氛,係將非氧化性氣體流動於電漿熔射槍的周圍,使空氣無法侵入朝被覆表面射出電漿.噴射的環境。(3) The spray atmosphere is to flow non-oxidizing gas around the plasma spray gun so that the air cannot invade the plasma toward the coated surface. The environment of the jet.

(4)由前述白色氧化釔粉末所構成的熔射材料粒徑為5 微米至80微米。(4) The particle size of the molten material composed of the aforementioned white cerium oxide powder is 5 Micron to 80 microns.

(5)用以發生電漿.噴射的前述操作氣體中,係為惰性氣體與氫氣的容積比在10/1~3/1範圍內的氣體。(5) used to generate plasma. Among the above-mentioned operating gases to be injected, a gas having a volume ratio of inert gas to hydrogen of 10/1 to 3/1 is used.

(6)前述氧化釔黑色熔射皮膜係直接或經底漆形成於基材表面。(6) The foregoing cerium oxide black molten film is formed directly or by a primer on the surface of the substrate.

(7)前述基材係選自含不銹鋼的各種鋼、鋁及其合金、鈦及其合金、鎢及其合金、鉬及其合金、燒結碳、石英、玻璃、塑膠類、氧化物及非氧化物系陶瓷燒結體所組成族群中一種以上的金屬系或非金屬系基材。(7) The foregoing substrate is selected from various steels containing stainless steel, aluminum and alloys thereof, titanium and alloys thereof, tungsten and its alloys, molybdenum and its alloys, sintered carbon, quartz, glass, plastics, oxides and non-oxidation. One or more metal-based or non-metal-based substrates in the group of the ceramic sintered body.

(8)前述底漆係選自鎳及其合金、鉻及其合金、鎢及其合金、鉬及其合金、鈦及其合金、鋁及其合金所組成族群中一種以上的金屬及其合金。(8) The primer is one or more metals selected from the group consisting of nickel and its alloys, chromium and alloys thereof, tungsten and alloys thereof, molybdenum and alloys thereof, titanium and alloys thereof, aluminum and alloys thereof, and alloys thereof.

還有,本發明提出一種黑色氧化釔熔射皮膜被覆材料,係為使藉由上述方法所形成之Y2 O3-x 組成的氧化釔黑色熔射皮膜膜厚形成為50微米到2000微米厚。Further, the present invention provides a black cerium oxide spray coating material which is formed by a thickness of 50 μm to 2000 μm of a yttria black melt film composed of Y 2 O 3-x formed by the above method. .

本發明中較佳是給予下述解決方法。In the present invention, it is preferred to give the following solution.

(1)前述氧化釔黑色熔射皮膜和基材之間設有膜厚為50微米到500微米的底漆。(1) A primer having a film thickness of 50 μm to 500 μm is provided between the foregoing cerium oxide black spray film and the substrate.

(2)前述基材係選自含不銹鋼的各種鋼、鋁及其合金、鈦及其合金、鎢及其合金、鉬及其合金、燒結碳、石英、玻璃、塑膠類、氧化物及非氧化物系陶瓷燒結體所組成族群中一種以上的金屬系或非金屬系基材。(2) The foregoing substrate is selected from various steels containing stainless steel, aluminum and alloys thereof, titanium and alloys thereof, tungsten and its alloys, molybdenum and its alloys, sintered carbon, quartz, glass, plastics, oxides and non-oxidation. One or more metal-based or non-metal-based substrates in the group of the ceramic sintered body.

(3)前述底漆係選自鎳及其合金、鉻及其合金、鎢及其合金、鉬及其合金、鈦及其合金、鋁及其合金所組成族群 中一種以上的金屬及其合金。(3) The aforementioned primer is selected from the group consisting of nickel and its alloys, chromium and its alloys, tungsten and its alloys, molybdenum and its alloys, titanium and its alloys, aluminum and its alloys. More than one metal and its alloys.

(4)熔射氣氛氣係流動於電漿熔射槍周圍的非氧化性氣體,使被覆表面處於防止朝電漿.噴射之空氣侵入的環境。(4) The spray atmosphere flows through the non-oxidizing gas around the plasma spray gun, so that the coated surface is prevented from facing the plasma. The environment in which the injected air invades.

(5)由前述白色氧化釔粉末所構成的熔射材料粒徑為5微米至80微米。(5) The particle size of the molten material composed of the aforementioned white cerium oxide powder is from 5 μm to 80 μm.

(6)用以發生電漿.噴射的前述操作氣體中,係為惰性氣體與氫氣的容積比在10/1~3/1範圍內的氣體。(6) used to generate plasma. Among the above-mentioned operating gases to be injected, a gas having a volume ratio of inert gas to hydrogen of 10/1 to 3/1 is used.

依據本發明可期待有以下所示之效果。According to the present invention, the effects shown below can be expected.

(1)本發明在作為熔射熱源之電漿.噴射產生用惰性氣體中,藉由添加還元性強的氫氣,即可在不使用碳或鈦、鉬等著色成分,即可使用市售熔射用白色氧化釔熔射粉末,直接形成黑色氧化釔熔射皮膜。因此可以僅使用包含減壓電漿熔射裝置的既存熔射相關裝置。(1) The present invention is used as a plasma of a heat source for spraying. In the inert gas for jet generation, by adding hydrogen which is highly reductive, it is possible to directly form black yttrium oxide by using a commercially available white yttrium oxide powder for spraying without using a coloring component such as carbon or titanium or molybdenum. Spray film. It is therefore possible to use only existing spray-related devices comprising a reduced-pressure plasma spray device.

(2)依據本發明,由於可以省略雷射光束或電子束照射等用以二次黑色化的處理,故不需要高能量照射設備等。因此,加上作業性提高、不需新設備等經濟效果會增大。(2) According to the present invention, since the processing for secondary blackening such as laser beam or electron beam irradiation can be omitted, a high-energy irradiation device or the like is not required. Therefore, economic effects such as improved workability and no need for new equipment will increase.

(3)在藉由減壓下無氧電漿熔射法之黑色氧化釔皮膜形成方法(日本專利特開2006-118053號公報)中,會出現從灰色至黑色濃淡摻雜的黑色,而有品質不穩定之情況。依據本發明則可以得到恆常穩定黑色氧化釔皮膜,而可以獲得品質提升及生產性提升。(3) In the method of forming a black cerium oxide film by an oxygen-free plasma spraying method under reduced pressure (Japanese Patent Laid-Open Publication No. Hei. No. 2006-118053), black which is doped from gray to black is present, and Unstable quality. According to the present invention, a constant and stable black cerium oxide film can be obtained, and quality improvement and productivity improvement can be obtained.

(4)適用本發明方法之黑色氧化釔熔射皮膜,因具有與白色氧化釔熔射皮膜同等耐蝕性及耐電漿.侵蝕性,故可 以使用於同一用途。(4) The black cerium oxide spray film to which the method of the invention is applied has the same corrosion resistance and plasma resistance as the white yttria sprayed film. Aggressive, so Used for the same purpose.

(5)依據本發明由於熔射皮膜本身是黑色,故形成有此黑色熔射皮膜的材料,可將此作為傳熱面或受熱面,除了可以有熱吸收能力及遠紅外線輻射能力的提升外,亦可以提升熱輻射特性及受熱效率。尤其是在編入半導體加工裝置與提升電漿蝕刻加工速度之同時,可以發揮品質均一化的效果。(5) According to the present invention, since the molten film itself is black, the material of the black molten film is formed, which can be used as a heat transfer surface or a heat receiving surface, in addition to the heat absorption capability and the far infrared radiation capability. It can also improve heat radiation characteristics and heat efficiency. In particular, it is possible to achieve a uniform quality effect while being programmed into a semiconductor processing apparatus and increasing the speed of plasma etching.

(6)具有依據本發明所形成黑色氧化釔熔射皮膜的產品,為了厚度方向全體維持黑色光澤,例如是可以進行表面切削機械加工以使皮膜常黑,而提升商品品質。(6) A product having a black yttrium oxide sprayed film formed according to the present invention, in order to maintain a black gloss in the entire thickness direction, for example, surface cutting machining can be performed to make the film black, thereby improving the quality of the product.

(7)本發明黑色氧化釔熔射皮膜被覆材料使用於半導體加工裝置時,由於顆粒或蝕刻作用所導致之反應生成物附著不明顯,故不需額外洗淨裝置,以提升操作效率。(7) When the black cerium oxide spray coating material of the present invention is used in a semiconductor processing apparatus, since the reaction product due to particles or etching does not adhere significantly, an additional cleaning device is not required to improve the operation efficiency.

(8)使用於半導體製造.加工裝置的熔射皮膜中,氧化鋁陶瓷係以白色系代表,還有習知技術所形成之氧化釔熔射皮膜也是白色。為此保守檢查時會難以進行皮膜材質的區別,在受到損傷時,費事的工作是要準備很多對策。此點以黑色氧化釔熔射皮膜被覆材料時,皮膜材質區別變容易,亦可提升保守檢查精確度及生產性。(8) Used in semiconductor manufacturing. Among the molten film of the processing apparatus, the alumina ceramic is represented by a white color, and the cerium oxide molten film formed by a conventional technique is also white. For this reason, it is difficult to distinguish the material of the film during the conservative inspection. When it is damaged, the troublesome work is to prepare a lot of countermeasures. When the black cerium oxide is sprayed on the coating material, the difference in the material of the coating becomes easy, and the accuracy and productivity of the conservative inspection can be improved.

(9)依據本發明材料可以得到彩色式樣優異、商品價值高的半導體加工裝置等工業產品。(9) According to the material of the present invention, an industrial product such as a semiconductor processing apparatus excellent in color pattern and high in commercial value can be obtained.

對使用由白色氧化釔(Y2 O3 )粉末所構成之熔射材料形 成黑色氧化釔熔射皮膜的方法進行說明。A method of forming a black cerium oxide sprayed film using a molten material composed of white yttria (Y 2 O 3 ) powder will be described.

本發明中,為了使用市售由白色氧化釔(Y2 O3 )粉末所構成之熔射材料以形成黑色氧化釔熔射皮膜,在熔射槍中所導入作為熱源之操作氣體者,不僅是氬或氦等惰性氣體,更一併於操作氣體中添加氫氣等還元性氣體,從熔射槍向基材之熔射粒子飛行路徑必需降低成膜(熔射)氣氛氣中氧位能。In the present invention, in order to use a commercially available molten material composed of white yttrium oxide (Y 2 O 3 ) powder to form a black yttrium oxide sprayed film, the operation gas introduced as a heat source in the spray gun is not only An inert gas such as argon or helium is added to the operating gas to add a regenerative gas such as hydrogen. The flight path of the molten particles from the spray gun to the substrate must reduce the oxygen potential in the film forming (spraying) atmosphere.

以下,根據熔射生成黑色氧化釔皮膜的理由進行說明。一般而言,電漿熔射法操作氣體是使用氬或氦等惰性氣體。此在負擔直流電壓而得之熔射槍中之弧中,藉由惰性氣體流動,產生高溫電漿.噴射,以作為熱源。此電漿.噴射熱源之環境中,因是由從氬或氦等電離的電子、離子、原子及分子結合體所構成,故環境中只要無來自外部之空氣混入,會是還元性或非氧化性。Hereinafter, the reason why the black cerium oxide film is formed by the melt will be described. In general, the plasma spray operating gas uses an inert gas such as argon or helium. In the arc in the spray gun that is subjected to the DC voltage, the inert gas flows to produce a high temperature plasma. Spray as a heat source. This plasma. In the environment where the heat source is sprayed, it is composed of electrons, ions, atoms, and molecular combinations that are ionized from argon or helium. Therefore, as long as there is no air from the outside, it is reductive or non-oxidizing.

但是,此狀態下之熔射槍中的電漿熱源,供給白色氧化釔(Y2 O3 )粉末進行熔射所得熔射皮膜係為白色,外觀顏色沒有產生變化。理由是,通常電漿熔射法中電漿.噴射還元力弱,由於熔射粒子飛行所處之熔射氣氛氣係為大氣,故藉熱源熔融後噴射飛行之氧化釔(Y2 O3 )粉末粒子與空氣接觸,而僅為白色結構。However, the plasma heat source in the spray gun in this state was supplied with white yttria (Y 2 O 3 ) powder and sprayed, and the obtained spray film was white, and the appearance color did not change. The reason is that plasma is usually used in plasma spraying. The jet is weaker, and since the molten atmosphere in which the molten particles fly is atmospheric, the yttria (Y 2 O 3 ) powder particles which are sprayed by the heat source and are in contact with the air are only in a white structure.

但,減壓電漿熔射法中,熔射氣氛氣亦即自熔射槍噴出之熔滴朝被覆面飛行並將熔射環境中氧分壓大幅降低。實質上無氧氬氣在50百帕至200百帕的減壓下成膜,在弱氧化性下有時會變化成灰色,但不會變化至黑色。However, in the vacuum plasma spray method, the molten atmosphere gas, that is, the droplets ejected from the spray gun, flies toward the coated surface and the oxygen partial pressure in the spray environment is greatly reduced. Substantially oxygen-free argon forms a film under a reduced pressure of 50 hectopascals to 200 hectopascals, and sometimes changes to gray under weak oxidizing properties, but does not change to black.

為此,本發明中,a.作為導入設置於減壓容器1內之熔射槍2內的操作氣體4,除了添加習知的氬或氦外,還導入混合還元性強的氫氣。For this reason, in the present invention, a. As the operation gas 4 introduced into the spray gun 2 provided in the decompression vessel 1, in addition to the conventional argon or helium, a hydrogen gas having a strong mixing property is introduced.

b.上述熔射槍2及被處理基材3係被配置於減壓容器1內,亦即熔射氣氛氣係維持於氬或氦等惰性氣體中。b. The spray gun 2 and the substrate to be treated 3 are disposed in the decompression vessel 1, that is, the spray atmosphere is maintained in an inert gas such as argon or helium.

尤其是本發明中供給至熔射槍2的電漿產生用操作氣體係使用添加作為還元性氣體之氫氣而成的混合氣體。使用此操作氣體時,產生電漿過程中,因有顯示強還元性之原子狀氫存在,故可同步將導入熔射槍2中的熔射材料(白色氧化釔(Y2 O3 )粉末)5還元。而且,此已被還原的熔射材料乘著電漿.噴射6被覆至基材表面。其中所形成之氧化釔熔射皮膜7因堆積熔射中被還原的黑色氧化釔(Y2 O3-x )熔射粒子,而成為黑色熔射皮膜。In particular, in the operating gas system for plasma generation supplied to the spray gun 2 in the present invention, a mixed gas obtained by adding hydrogen as a regenerative gas is used. When this operating gas is used, the molten material (white yttrium oxide (Y 2 O 3 ) powder) which is introduced into the spray gun 2 can be simultaneously synchronized due to the presence of atomic hydrogen which exhibits strong reductivity during the plasma generation. 5 yuan. Moreover, the molten material that has been reduced is multiplied by the plasma. The spray 6 is applied to the surface of the substrate. The yttrium oxide sprayed film 7 formed therein is a black fused film formed by depositing reduced black yttrium oxide (Y 2 O 3-x ) spray particles in the spray.

對此而言,發明者發現黑色氧化釔熔射皮膜係為由白色氧化釔(Y2 O3 )粒子消失一部份氧原子而成之氧化釔(Y2 O3-x )組成粒子所構成的皮膜。在此,發明者白色氧化釔以「Y2 O3 」表示,依據本發明適用所得之前述「Y2 O3-x 」組成則為黑色氧化釔,也稱為「氧化釔」。還有氧化鋁(Al2 O3 )使用前述含有氫氣之電漿.噴射熱源成膜時,也是呈現白色,故氧化釔(Y2 O3 )黑色化現象係為本發明特有現象。In this regard, the inventors found that the black yttrium oxide spray film is composed of particles of yttrium oxide (Y 2 O 3-x ) which are formed by white yttria (Y 2 O 3 ) particles disappearing from a part of oxygen atoms. The film. Here, the inventor's white cerium oxide is represented by "Y 2 O 3 ", and the "Y 2 O 3-x " composition obtained according to the present invention is black cerium oxide, which is also called "cerium oxide". Also alumina (Al 2 O 3 ) uses the aforementioned plasma containing hydrogen. When the jet heat source is formed into a film, it also appears white, so the phenomenon of blackening of yttrium oxide (Y 2 O 3 ) is a peculiar phenomenon of the present invention.

依據本發明者研究,使用熔射槍2中惰性氣體中添加有氫氣之混合操作氣體4作為電漿熱源時,從熔射槍朝被處理表面(基材表面)之熔射粒子飛行路徑為大氣中時(氧 化氣氛氣),熔融粒子與空氣接觸再返回白色或灰色。因此,本發明中,熔射氣氛氣(粒子飛行路徑)的控制也很重要。亦即,不使用減壓容器1,進行大氣電漿熔射(飛行路徑在大氣下)之情形下,前述電漿.噴射6需安裝有不讓空氣混入環境遮斷裝置,或電漿.噴射周圍僅流過氬、氦、氮等惰性氣體或反應性低的氣體,必須避免熔融狀態下飛行之熔射粒子與空氣直接接觸。基於此點,使用可在減壓惰性氣體氣氛氣下成膜的減壓電漿熔射裝置,較佳是熔射飛行途中粒子與空氣(正確說是氧)間的接觸不發生。According to the study by the inventors, when the mixed operating gas 4 to which the hydrogen gas is added as the plasma heat source in the inert gas of the spray gun 2, the flow path of the molten particles from the spray gun toward the surface to be treated (the surface of the substrate) is atmospheric. Medium time The atmosphere is contacted with air and returned to white or gray. Therefore, in the present invention, control of the spray atmosphere gas (particle flight path) is also important. That is, without using the decompression container 1, the atmospheric plasma is sprayed (the flight path is under the atmosphere), the aforementioned plasma. Spray 6 needs to be installed with air to prevent air from entering the environment, or plasma. Only an inert gas such as argon, helium or nitrogen or a gas having low reactivity is allowed to flow around the jet, and it is necessary to prevent the molten particles flying in a molten state from coming into direct contact with the air. Based on this, a vacuum plasma spray device which can form a film under a reduced pressure inert gas atmosphere is preferably used, and it is preferable that contact between particles and air (correctly, oxygen) does not occur during the flight.

還有,氬或氦等電漿產生氣體中添加氫氣量較佳是容積比如下的混合比率。亦即,氬氣/氫氣=10/1至3/1Further, the amount of hydrogen added to the plasma generating gas such as argon or helium is preferably a mixing ratio of a volume such as the lower one. That is, argon/hydrogen = 10/1 to 3/1

氫氣混合比為10/1,較佳是5/1,比5/1更少時氧化釔黑色化會不完全,彩色品質不固定。另一方面,氬氣比3/1還多進行混合時,黑色化效果會飽和。The hydrogen mixing ratio is 10/1, preferably 5/1. When the ratio is less than 5/1, the blackening of the cerium oxide is incomplete and the color quality is not fixed. On the other hand, when argon is mixed more than 3/1, the blackening effect is saturated.

作為電漿產生氣體,也可以使用氬與氦的混合氣體,只要維持前述氫氣對氬氣單獨量的比率即可達成發明目的。上述比率較佳是5/1至3/1左右。As the plasma generating gas, a mixed gas of argon and helium may be used, and the object of the invention can be attained by maintaining the ratio of the hydrogen gas to the argon gas alone. The above ratio is preferably from about 5/1 to about 3/1.

第2圖(a)至(d),係繪示依據本發明技術所形成之黑色氧化釔熔射皮膜與依據習知技術所得Y2 O3 皮膜外觀的圖形。從此圖可明顯得知,使用適合本發明之氬/氫混合氣體作為電漿.噴射產生用操作氣體,甚至熔射環境也控制於非氧化性氣氛氣中,並於氧分壓較少之氣氛氣下進行熔射,以讓黑色氧化釔熔射皮膜的形成變可能。2(a) to (d) are graphs showing the appearance of a black yttrium oxide sprayed film formed in accordance with the teachings of the present invention and a Y 2 O 3 film obtained according to the prior art. It is apparent from this figure that an argon/hydrogen mixed gas suitable for the present invention is used as the plasma. The operating gas for jet generation is controlled even in a non-oxidizing atmosphere, and is sprayed under an atmosphere having a small partial pressure of oxygen to make formation of a black cerium oxide film.

(a)使用氬/氫容積比=4/1作為電漿.噴射產生氣體,於氬氣200百帕氣氛氣中熔射白色Y2 O3 (蒙瑟爾記號:N3、黑色或暗灰色)。(a) Use argon/hydrogen volume ratio = 4/1 as the plasma. The gas was generated by spraying, and white Y 2 O 3 (Monsell: N3, black or dark gray) was sprayed in an atmosphere of 200 kPa of argon gas.

(b)僅使用氬作為電漿.噴射產生氣體,於氬氣200百帕氣氛氣中熔射白色Y2 O3 (N5、亮灰色)。(b) Use only argon as the plasma. A gas was generated by spraying, and white Y 2 O 3 (N5, bright gray) was sprayed in an atmosphere of 200 kPa of argon gas.

(c)使用(a)的條件氣體,於大氣中熔射槍氣氛氣中氬氣體流動之同時熔射Y2 O3 (N4、中度灰色)。(c) Using the condition gas of (a), Y 2 O 3 (N4, medium gray) is sprayed while the argon gas in the atmosphere of the spray gun is in the atmosphere.

(d)使用(b)的條件氣體,於大氣中熔射白色Y2 O3 (N9、白色)。(d) Using a conditional gas of (b), white Y 2 O 3 (N9, white) is sprayed in the atmosphere.

接著,關於本發明作為用以形成黑色氧化釔熔射皮膜材料的Y2 O3 粉末,對此粉末粒度與純度進行說明。Next, the powder size and purity of this powder will be described with respect to the present invention as a Y 2 O 3 powder for forming a black cerium oxide molten film material.

Y2 O3 粉末粒度較佳是5微米至80微米的粒徑範圍,更佳是5微米至50微米的結構。理由是粒徑比80微米還大的粉末包括多個未完全熔融於熔射熱源中的未熔融粒子。未熔融粒子內部由於未受到包含氫氣之電漿熱源影響,故可以認定其維持著白色狀態,而成為降低皮膜品質的主要原因。另一方面,5微米以下的粒子,至內部為止是完全熔融黑色化,由於自粉末供給機至熔射槍的運送供給速度不穩定、在電漿熱源中熔融昇崋狀態、無法成為用以構成皮膜的強度因子,故熔射皮膜的剖面組織可能會不均等、不齊全,而有可能使皮膜強度劣化。The Y 2 O 3 powder particle size is preferably in the range of 5 to 80 μm, more preferably 5 to 50 μm. The reason is that the powder having a particle diameter larger than 80 μm includes a plurality of unmelted particles that are not completely melted in the heat source for melting. Since the inside of the unmelted particles is not affected by the plasma heat source containing hydrogen, it is considered to be maintained in a white state, which is a factor that lowers the film quality. On the other hand, particles of 5 μm or less are completely melted and blackened to the inside, and the supply and supply speed from the powder supply machine to the spray gun is unstable, and the state is melted and raised in the plasma heat source, and cannot be used to constitute The strength factor of the film, so the profile of the sprayed film may be uneven, incomplete, and may deteriorate the film strength.

本發明所使用的氧化釔粉末純度較佳是不純物(例如鐵、鎂、鉻、鋁、鎳、矽等)較少者。最近發明者調查市售品,全部成分在98重量百分率以上,即使使用此市售品形 成黑色氧化釔熔射皮膜較佳,然本發明不以此為限。The purity of the cerium oxide powder used in the present invention is preferably such that impurities (e.g., iron, magnesium, chromium, aluminum, nickel, ruthenium, etc.) are less. Recently, the inventors investigated commercial products, all of which are above 98% by weight, even if this commercial form is used. It is preferred that the black cerium oxide film is formed, but the invention is not limited thereto.

接著,對用以形成黑色氧化釔熔射皮膜的基材進行說明。本發明中形成上述氧化釔黑色熔射皮膜的對象,亦即基材,開始是鋁及其合金、不銹鋼、鈦及其合金、陶瓷燒結體(例如氧化物、氮化物、硼化物、矽化物及前述化合物的混合物),也可以使用石英、玻璃、塑膠等所構成的材料。還有,在此種材料上也可以使用施加有各種蒸著膜或鍍膜,也可以在此材料表面直接或介由底漆或中間層而成膜。Next, a substrate for forming a black cerium oxide sprayed film will be described. The object of forming the above-mentioned yttria black molten film in the present invention, that is, the substrate, is initially aluminum and its alloys, stainless steel, titanium and alloys thereof, and ceramic sintered bodies (for example, oxides, nitrides, borides, tellurides, and As the mixture of the above compounds, a material composed of quartz, glass, plastic or the like can also be used. Further, various vapor deposition films or coating films may be applied to such materials, or may be formed directly or via a primer or an intermediate layer on the surface of the material.

接著,對黑色氧化釔熔射皮膜被覆材料的皮膜結構進行說明。Next, the film structure of the black cerium oxide spray coating material will be described.

本發明材料中除了可以在基材表面直接被覆上述氧化釔黑色熔射皮膜外,還可以在形成此熔射皮膜之前,先在該基材表面形成底漆,之後形成前述黑色氧化釔熔射皮膜作為表面塗層,以提升皮膜的密著性。此時,底漆材料可以使用選自鎳及其合金、鉻及其合金、鎢及其合金、鉬及其合金、鈦及其合金、鋁及其合金、鎂合金所組成族群中一種以上的金屬、合金。此外,較佳是將底漆施工至厚度50微米至500微米左右。In the material of the present invention, in addition to directly coating the above-mentioned cerium oxide black molten film on the surface of the substrate, a primer may be formed on the surface of the substrate before forming the molten film, and then the black cerium oxide spray film is formed. As a surface coating to enhance the adhesion of the film. At this time, the primer material may use one or more metals selected from the group consisting of nickel and its alloys, chromium and its alloys, tungsten and its alloys, molybdenum and its alloys, titanium and its alloys, aluminum and its alloys, and magnesium alloys. ,alloy. Further, it is preferred to apply the primer to a thickness of about 50 μm to 500 μm.

在此情形下,底漆熔射皮膜比50微米還薄時,底漆的作用效果較弱。另一方面,底漆熔射皮膜厚度超過500微米時,被覆效果飽和,且可能引起依據成膜作業製作費用的提高。In this case, when the primer spray film is thinner than 50 μm, the primer has a weak effect. On the other hand, when the thickness of the primer spray film exceeds 500 μm, the coating effect is saturated, and the production cost depending on the film forming operation may be increased.

還有,底漆較佳是使用電弧熔射法、火焰熔射法、高速火焰熔射法、大氣電漿熔射法、減壓電漿熔射法、爆炸 熔射法等。Further, the primer is preferably an arc spray method, a flame spray method, a high-speed flame spray method, an atmospheric plasma spray method, a vacuum plasma spray method, or an explosion. Spraying method, etc.

另一方面,成為表面塗層的本發明黑色氧化釔熔射皮膜,不論是在基材表面直接成膜,還是在前述底漆上熔射積層成膜,本發明黑色氧化釔熔射皮膜較佳是施工至50微米至2000微米。比50微米還薄的皮膜,耐蝕性及耐電漿.侵蝕性不足。另一方面比2000微米還厚的皮膜,因效果已飽和而不經濟。On the other hand, the black cerium oxide molten film of the present invention which becomes a surface coating layer is preferably formed by directly forming a film on the surface of the substrate or by depositing a film on the primer. It is applied to 50 microns to 2000 microns. Thinner than 50 microns, corrosion resistance and plasma resistance. Insufficient erosion. On the other hand, a film thicker than 2000 microns is uneconomical because the effect is saturated.

前述底漆係形成作為黑色氧化釔熔射皮膜與基材間的中間層,較佳是選擇任務一邊是發揮與基材間的密著強度,另一邊也與作為表面塗層之黑色氧化釔維持良好的密著性。材質較佳是使用金屬材質的物質,選自鎳及其合金、鉻及其合金、鎢及其合金、鉬及其合金、鈦及其合金、鋁及其合金、鎂合金所組成族群中一種以上的金屬、合金。此外,較佳是將底漆施工至厚度50微米至500微米左右。The primer is formed as an intermediate layer between the black cerium oxide spray film and the substrate, and preferably the bonding strength between the substrate and the substrate is selected, and the other side is maintained with the black cerium oxide as the surface coating. Good adhesion. The material is preferably a metal material selected from the group consisting of nickel and its alloys, chromium and its alloys, tungsten and its alloys, molybdenum and its alloys, titanium and its alloys, aluminum and its alloys, and magnesium alloys. Metal, alloy. Further, it is preferred to apply the primer to a thickness of about 50 μm to 500 μm.

在此場合下,底漆熔射皮膜比50微米還薄時,底漆的作用效果較弱。另一方面,底漆熔射皮膜厚度超過500微米時,被覆效果飽和,且可能引起依據成膜作業製作費用的提高。In this case, when the primer spray film is thinner than 50 μm, the primer has a weak effect. On the other hand, when the thickness of the primer spray film exceeds 500 μm, the coating effect is saturated, and the production cost depending on the film forming operation may be increased.

(實施例1)(Example 1)

在此實施例中,於內藏電熱線之石英玻璃製保護管表面上形成依據習知技術的Y2 O3 白色熔射皮膜、習知技術(日本專利特開2006-118053號公報)所示之利用電子束照射白色Y2 O3 熔射皮膜形成黑色化皮膜、以及本發明氧化釔黑色熔射皮膜(50微米厚)後,於電熱線中通入電流,調查從 各皮膜放出之波長。In this embodiment, a Y 2 O 3 white spray film according to a conventional technique is formed on the surface of a quartz glass protective tube having a built-in heating wire, and a conventional technique (Japanese Patent Laid-Open Publication No. Hei. No. 2006-118053) After the white Y 2 O 3 molten film was irradiated with an electron beam to form a blackened film and the yttria black molten film (50 μm thick) of the present invention, a current was passed through the heating wire, and the wavelength emitted from each film was examined.

結果顯示,Y2 O3 白色熔射皮膜為0.2微米至1微米左右,氧化釔黑色熔射皮膜中,分別藉由電子束照射處理及本發明而得之黑色皮膜也為0.3微米至5微米,認定是出紅外線放射,且加熱器的效率有所差異。The results show that the Y 2 O 3 white spray film is about 0.2 μm to 1 μm, and the black film obtained by electron beam irradiation treatment and the present invention in the yttria black spray film is also 0.3 μm to 5 μm. It is determined that infrared radiation is emitted and the efficiency of the heater is different.

還有,為替換石英玻璃製加熱器,在鹵素燈(高亮度燈)表面施工前述2種氧化釔黑色熔射皮膜(50微米厚),相對於沒有皮膜狀態的燈波長為0.2至0.4微米範圍內,施加黑色熔射皮膜者則為0.3微米至10微米,處於可以利用的遠紅外線區域,可明顯地提升加熱器的效率。還有依據習知技術而得之Y2 O3 白色熔射皮膜,與熔射皮膜未施工狀態下相同,或在其以下的波長範圍內。Further, in order to replace the quartz glass heater, the above two kinds of yttria black molten film (50 μm thick) are applied on the surface of a halogen lamp (high-brightness lamp), and the wavelength of the lamp is 0.2 to 0.4 μm with respect to the state without the film. Inside, the black spray film is applied from 0.3 μm to 10 μm in the far-infrared region that can be utilized, which can significantly improve the efficiency of the heater. There is also a Y 2 O 3 white spray film obtained according to the conventional technique, which is the same as or in the wavelength range below which the spray film is not applied.

從以上結果可知,適用本發明方法所形成之黑色氧化釔熔射皮膜,作為半導體加工裝置用材料,不僅耐電漿.侵蝕性提升,也可以作為用以促進蝕刻加工速度的熱源相當有用。From the above results, it can be seen that the black yttrium oxide spray film formed by the method of the present invention is not only resistant to plasma as a material for a semiconductor processing device. Erosive enhancement can also be useful as a heat source to promote the speed of etching processing.

(實施例2)(Example 2)

在此實施例中,對SUS410鋼(50毫米×50毫米×5毫米)測試片表面進行轟擊粗面化處理後,藉由將氬氣控制在氣氛氣壓力為50百帕至200百帕的減壓電漿熔射法,形成150微米厚的Y2 O3 。此時,在形成Y2 O3 膜之前,對測試片上有無藉由大氣電漿熔射法施工得到100微米厚鎳-鋁合金的底漆,調查其效果。In this embodiment, after the surface of the test piece of SUS410 steel (50 mm × 50 mm × 5 mm) is subjected to bombardment roughening treatment, the argon gas is controlled to have an atmospheric gas pressure of 50 to 200 hPa. The piezoelectric slurry was sprayed to form 150 μm thick Y 2 O 3 . At this time, before the formation of the Y 2 O 3 film, whether or not a primer of 100 μm thick nickel-aluminum alloy was obtained by the atmospheric plasma spraying method on the test piece was examined to investigate the effect.

還有,減壓電漿熔射之際,形成本發明黑色皮膜時, 使用氬/氫容積比為5/1的混合氣體作為操作氣體。還有在比較例之情形下則使用氬/氦比為5/1的混合氣體。Further, when the vacuum film is sprayed, when the black film of the present invention is formed, A mixed gas having an argon/hydrogen volume ratio of 5/1 was used as the operating gas. Also in the case of the comparative example, a mixed gas having an argon/rhenium ratio of 5/1 was used.

形成有熔射皮膜的測試片,在調查熔射氧化釔(Y2 O3 )所形成之表面塗層外觀色後,進行下述熱衝擊測試,以調查該熔射皮膜的耐剝離性。The test piece on which the sprayed film was formed was subjected to the following thermal shock test after investigating the appearance color of the surface coating formed by the molten yttrium oxide (Y 2 O 3 ) to investigate the peeling resistance of the sprayed film.

表1係為上述結果的簡要內容。由此結果可知本發明以氬/氫容積比為5/1的混合氣體作為電漿熱源操作氣體的條件下,所成膜之測試片(No.1至4)係呈黑色。而在不含氫之氬/氦比為5/1的混合氣體條件下,所得之測試片(No.5至8)僅顯示灰色而非黑色。Table 1 is a summary of the above results. From the results, it was found that the test piece (No. 1 to 4) formed in the film was black under the condition that the mixed gas having an argon/hydrogen volume ratio of 5/1 was used as the plasma heat source operating gas. The test pieces (No. 5 to 8) showed only gray but not black under a mixed gas condition of hydrogen/hydrogen-free argon/rhodium ratio of 5/1.

前述測試片先加熱至攝氏500度並維持於電爐中15分鐘左右後,將之投入攝氏25度的水中並重覆5次操作,在全供測試皮膜亦即基材上,直接形成氧化釔(Y2 O3 )熔射皮膜,以及施工有鎳-鋁合金的底漆等2種情況跟Y2 O3 熔射皮膜外觀色無關。在本實施例條件下確認可以發揮全部優異的耐熱衝擊性,且可以使因黑色化而來之耐剝離性降低。The test piece is first heated to 500 degrees Celsius and maintained in an electric furnace for about 15 minutes, then put into water of 25 degrees Celsius and repeated for 5 times, and directly forms yttrium oxide on the whole test film, that is, the substrate. 2 O 3 ) The spray film and the primer with nickel-aluminum alloy are not related to the appearance of the Y 2 O 3 spray film. Under the conditions of the examples, it was confirmed that all of the excellent thermal shock resistance can be exhibited, and the peeling resistance due to blackening can be lowered.

(實施例3)(Example 3)

在此實施例中,一切藉由大氣電漿熔射法形成皮膜於實施例2所示熔射測試片,藉由以與實施例2相同條件者的熱衝擊測試,調查皮膜的耐剝離性。還有,在大氣電漿熔射法中,使用氬/氫容積比4/1的同時,熔射槍周緣,特別是熔射槍出口附近流經大量氬氣,以防止朝電漿.噴射的空氣侵入。In this embodiment, all of the spray test sheets shown in Example 2 were formed by an atmospheric plasma spray method, and the peeling resistance of the film was investigated by a thermal shock test under the same conditions as in Example 2. Also, in the atmospheric plasma spray method, while using an argon/hydrogen volume ratio of 4/1, the periphery of the spray gun, especially near the exit of the spray gun, flows a large amount of argon gas to prevent plasma. The injected air invades.

表2係顯示此結果。不論是依據大氣熔射法形成黑色氧化釔熔射皮膜,還是藉由實施例2的減壓電漿熔射法,均可與藉由習知技術而得之白色Y2 O3 熔射皮膜相同,並保持優異的耐剝離性。Table 2 shows this result. Whether the black yttrium oxide spray film is formed by the atmospheric spray method or the vacuum plasma spray method of the second embodiment, it can be the same as the white Y 2 O 3 spray film obtained by the conventional technique. And maintain excellent peel resistance.

(實施例4)(Example 4)

在此實施例中,使用50毫米×50毫米×5毫米厚的鋁基材,其表面上藉由大氣電漿熔射法,並使用組成相異之電 漿.噴射產生用操作氣體作為熔射熱源,以形成150微米厚的Y2 O3 熔射皮膜與氧化鋁熔射皮膜。此時,將作為底漆之鎳-鋁合金膜(100微米)的有無,加入測試條件中。之後,露出測試片中央部表面積10毫米×10毫米的範圍,並罩幕其他部分,在下述條件中,實施20小時電漿侵蝕測試。還有作為其他表面處理法,係以鋁基材被陽極氧化(防腐蝕鋁)為比較試樣。In this embodiment, an aluminum substrate of 50 mm × 50 mm × 5 mm thickness is used, which is sprayed by atmospheric plasma on the surface and uses a plasma composed of different compositions. The jet-generating operating gas was used as a source of the spray heat to form a 150 μm thick Y 2 O 3 spray film and an alumina spray film. At this time, the presence or absence of a nickel-aluminum alloy film (100 μm) as a primer was added to the test conditions. Thereafter, the surface area of the central portion of the test piece was exposed to a range of 10 mm × 10 mm, and the other portions of the mask were exposed, and a 20-hour plasma erosion test was carried out under the following conditions. Further, as another surface treatment method, an aluminum substrate was anodized (corrosion-resistant aluminum) as a comparative sample.

<電漿蝕刻條件><plasma etching conditions>

蝕刻氣體:四氟化碳(CF4 )、氬、氧(容積比在10:100:1時) 電漿輸出:1300瓦。Etching gas: carbon tetrafluoride (CF 4 ), argon, oxygen (volume ratio of 10:100:1) Plasma output: 1300 watts.

測試結果如表3所示。此結果可明顯發現依據比較例現行技術所得之陽極氧化皮膜(No.10)、氧化鋁熔射皮膜(No.7、8)及碳化硼熔射皮膜(No.9),無論哪一個係隨著電漿.侵蝕量而變大,且此種在電漿環境中缺乏耐久性。The test results are shown in Table 3. As a result, it was apparent that the anodic oxide film (No. 10), the alumina spray film (No. 7, 8), and the boron carbide spray film (No. 9) obtained according to the prior art of the comparative example were used. Holding a plasma. The amount of erosion becomes large, and this lacks durability in the plasma environment.

相對於此,本發明黑色氧化釔熔射皮膜(No.1至4),跟底漆之有無沒關,且可以發揮優異的耐電漿侵蝕性。還有,在同一條件下,以熔射皮膜(No.5至8)跟被測試之白色氧化釔(Y2 O3 )進行比較,而且也確認本發明之熔射皮膜可以發揮全不遜色的耐久性。On the other hand, the black cerium oxide molten film (No. 1 to 4) of the present invention can exhibit excellent plasma corrosion resistance regardless of the presence or absence of the primer. Further, under the same conditions, the molten film (No. 5 to 8) was compared with the white yttrium oxide (Y 2 O 3 ) to be tested, and it was confirmed that the sprayed film of the present invention can be used as the whole. Durability.

[產業上利用可能性][Industry use possibility]

本發明技術,不僅將氧化釔黑色化,也可利用於其他陶瓷例如是二氧化鈦及二氧化鈦-三氧化二鋁等黑色化技術,故可以應用至半導體、液晶、其他、高分子工業或機械工業等領域所使用之材料而形成。The technology of the present invention can be applied not only to black semiconductors, but also to other ceramics such as titanium dioxide and titanium dioxide-aluminum oxide, so that it can be applied to semiconductors, liquid crystals, other, polymer industries or machinery industries. Formed from the materials used.

1‧‧‧減壓容器(熔射環境)1‧‧‧Decompression container (spraying environment)

2‧‧‧熔射槍2‧‧‧Solving gun

3‧‧‧被處理基材3‧‧‧Processed substrate

4‧‧‧操作氣體4‧‧‧Operating gas

5‧‧‧熔射材料5‧‧‧Solid material

6‧‧‧電漿.噴射6‧‧‧ Plasma. injection

7‧‧‧氧化釔熔射皮膜7‧‧‧Oxide spray film

第1圖係繪示電漿熔射槍的概略線路圖。Figure 1 is a schematic circuit diagram showing a plasma spray gun.

第2圖係繪示氧化釔熔射皮膜外觀色電子顯微鏡照片。Fig. 2 is a photomicrograph showing the appearance of a yttrium oxide spray film.

1‧‧‧減壓容器1‧‧‧Relief container

2‧‧‧熔射槍2‧‧‧Solving gun

3‧‧‧被處理基材3‧‧‧Processed substrate

4‧‧‧操作氣體4‧‧‧Operating gas

5‧‧‧熔射材料5‧‧‧Solid material

6‧‧‧電漿.噴射6‧‧‧ Plasma. injection

7‧‧‧氧化釔熔射皮膜7‧‧‧Oxide spray film

Claims (9)

一種黑色氧化釔熔射皮膜的形成方法,其特徵在於:在以惰性氣體與氫氣的混合氣體作為電漿.噴射產生用操作氣體之熔射槍中,供給白色Y2 O3 粉末而生成黑色Y2 O3 熔射粉末,同時使該黑色Y2 O3 熔射粉末在惰性氣體之減壓熔射氣氛氣中噴射而飛行,藉由電漿熔射以在基材表面形成氧化釔黑色熔射皮膜。A method for forming a black cerium oxide molten film, characterized in that a mixed gas of an inert gas and hydrogen is used as a plasma. In a spray gun for generating an operating gas for injection, white Y 2 O 3 powder is supplied to generate a black Y 2 O 3 molten powder, and the black Y 2 O 3 molten powder is sprayed in an inert gas under reduced pressure atmosphere. The medium is jetted and sprayed by plasma to form a yttria black molten film on the surface of the substrate. 如申請專利範圍第1項所述的黑色氧化釔熔射皮膜的形成方法,其中供熔射材料飛行之惰性氣體之減壓熔射氣氛氣維持於50百帕至600百帕的減壓環境中。 The method for forming a black cerium oxide spray film according to claim 1, wherein the vacuum gas atmosphere for the inert gas of the molten material is maintained in a reduced pressure environment of 50 to 600 hectopascals. . 如申請專利範圍第1或2項所述的黑色氧化釔熔射皮膜的形成方法,其中前述氧化釔黑色熔射皮膜係藉由前述電漿.噴射中所含之原子狀氫所擁有之還元作用,由Y2 O3 粉末的部分氧消失狀態下之Y2 O3-x 所示黑色粒子堆積而成。The method for forming a black cerium oxide molten film according to claim 1 or 2, wherein the cerium oxide black molten film is formed by the foregoing plasma. The reductive action of the atomic hydrogen contained in the jet is formed by stacking black particles of Y 2 O 3-x in a state where the partial oxygen of the Y 2 O 3 powder disappears. 如申請專利範圍第1或2項所述的黑色氧化釔熔射皮膜的形成方法,其中熔射氣氛,係將非氧化性氣體流動於電漿熔射槍的周圍,使空氣無法侵入朝被覆表面射出電漿.噴射的環境。 The method for forming a black cerium oxide sprayed film according to claim 1 or 2, wherein the spray atmosphere flows a non-oxidizing gas around the plasma spray gun so that the air cannot invade the coated surface. Injection of plasma. The environment of the jet. 如申請專利範圍第1或2項所述的黑色氧化釔熔射皮膜的形成方法,其中由前述白色Y2 O3 粉末所構成的熔射材料粒徑為5微米至80微米。The method for forming a black cerium oxide sprayed film according to claim 1 or 2, wherein the powder of the above-mentioned white Y 2 O 3 powder has a particle diameter of 5 μm to 80 μm. 如申請專利範圍第1或2項所述的黑色氧化釔熔射皮膜的形成方法,其中用以發生電漿.噴射的前述操作氣體中,係為惰性氣體與氫氣的容積比在10/1~3/1範圍內 的氣體。 The method for forming a black cerium oxide molten film according to claim 1 or 2, wherein the plasma is generated. In the above-mentioned operating gas sprayed, the volume ratio of the inert gas to the hydrogen gas is in the range of 10/1 to 3/1. gas. 如申請專利範圍第1或2項所述的黑色氧化釔熔射皮膜的形成方法,其中前述氧化釔黑色熔射皮膜係直接或經底漆形成於基材表面。 The method for forming a black cerium oxide spray film according to claim 1 or 2, wherein the cerium oxide black spray film is formed directly or via a primer on the surface of the substrate. 如申請專利範圍第1或2項所述的黑色氧化釔熔射皮膜的形成方法,其中前述基材係選自含不銹鋼的各種鋼、鋁與其合金、鈦與其合金、鎢與其合金、鉬與其合金、燒結碳、石英、玻璃、塑膠類、氧化物及非氧化物系陶瓷燒結體所組成族群中一種以上的金屬系或非金屬系基材。 The method for forming a black cerium oxide sprayed film according to claim 1 or 2, wherein the substrate is selected from the group consisting of various steels containing stainless steel, aluminum and alloys thereof, titanium and its alloys, tungsten and its alloys, molybdenum and alloys thereof. And one or more metal-based or non-metal-based substrates in the group consisting of sintered carbon, quartz, glass, plastic, oxide, and non-oxide ceramic sintered body. 如申請專利範圍第7項所述的黑色氧化釔熔射皮膜的形成方法,其中前述底漆係選自鎳與其合金、鉻與其合金、鎢與其合金、鉬與其合金、鈦與其合金、及鋁與其合金所組成族群中一種以上的金屬與其合金。 The method for forming a black cerium oxide sprayed film according to claim 7, wherein the primer is selected from the group consisting of nickel and its alloys, chromium and its alloys, tungsten and its alloys, molybdenum and its alloys, titanium and its alloys, and aluminum One or more metals and alloys thereof in the group of alloys.
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