TWI377866B - Mask frame for thin film deposition of flat panel display and deposition apparatus using the same - Google Patents

Mask frame for thin film deposition of flat panel display and deposition apparatus using the same Download PDF

Info

Publication number
TWI377866B
TWI377866B TW097109737A TW97109737A TWI377866B TW I377866 B TWI377866 B TW I377866B TW 097109737 A TW097109737 A TW 097109737A TW 97109737 A TW97109737 A TW 97109737A TW I377866 B TWI377866 B TW I377866B
Authority
TW
Taiwan
Prior art keywords
frame
mask
pattern
deposition
coupled
Prior art date
Application number
TW097109737A
Other languages
Chinese (zh)
Other versions
TW200841765A (en
Inventor
Kim Sun-Hoe
Noh Sok-Won
Original Assignee
Samsung Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Co Ltd filed Critical Samsung Display Co Ltd
Publication of TW200841765A publication Critical patent/TW200841765A/en
Application granted granted Critical
Publication of TWI377866B publication Critical patent/TWI377866B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Description

1377866 101年07月20日修正替換頁 六、發明說明: 【發明所屬之技術領域】 [0001] 【相關應用相互參照】 本申請案申請2007年4月5日提出申請,韓國專利申請案 第2007-33733號的權益範圍,其揭示在此併入其整體作 參考。 [0002] 本發明係有關平板顯示器薄膜沉積罩幕框架及用此之沉 積裝置,及更特別有關可使用一雙重輕型框架結構輕易 處理及傳送該框架的一平板顯示器薄膜沉積罩幕框架及 用此之沉積裝置。 【先前技術】 [0003] 最近,已廣泛地研究適應如液晶顯示器(Lcd)及有機發光 顯不器(OLED)等的輕型及小型平板顯示器(FpD)優點, 及增加大尺寸顯示器解析度。平板顯示器之間,因為有 機發光顯示器不錢立光源及色㈣波器而具有快速反 應時間及色彩表達能力,所以其係為可解決傳統液晶顯 示器問題的下一代平板顯示器。 國通常’有機發光顯示器包含一陽極及一自極之間的一有 機發光層。一電洞及—電子係從該陽極及該陰極被移除 ’於激發狀態中產生-數子,而該激子被再組合來發光 〇 闺在此,組成有Μ細Μ之㈣精細圖⑽成方法, 係包含使用案罩幕的微影技術紐或沉積方法。因 為有機發光層對、/!氣敏感,所以很難使用傳統微影技術 形成該有機發光層。 1013278196-0 0971097#單滅删1 帛4頁/共24頁 1377866 .101年.07月20日修正替換頁 [0006] 因此,抗脫層處理及蝕刻處理期間暴露至濕氣的微影技 術,並不適用於有機發光層的沉積處理。 [0007] 為了解決該問題,使用具有一特定圖案之一圖案罩幕真 空沉積一有機發光物質的方法,係廣泛用來形成該有機 發光層。 [0008] 第1圖為傳統薄膜沉積罩幕框架平面圖。 [0009] 第2圖為採用第一圖線A — A’之薄膜沉積罩幕框架橫斷面 圖。 [0010] 參考苐1及2圖,傳統平板顯示器薄膜沉積罩幕框架40, 係包含被提供具有複數開口之圖案部分21的一圖案罩幕 20,及可支援該圖案罩幕20的一框架10。框架10與圖案. 罩幕20下緣部分耦合以支撐.圖案罩幕20。 [0011] 通常,當薄膜沉積罩幕框架40在有機發光顯示器製程期 間用於沉積有機發光層處理時,圖案罩幕20具有一過小 厚度,而圖案罩幕20的圖案部分狹縫具有一過小厚度。 因此,圖案罩幕20可能因下垂而分解或彎曲,而很難精 確沉積一薄膜。 [0012] 特別是,此問題在大量製造大區域圖案罩幕20中特別嚴 重,藉此很難精確沉積一薄膜。為了解決該問題,框架 10可被用來支撐圖案罩幕20及維持圖案罩幕20的形狀。 [0013] 同時,框架10可由如SUS鋼鐵或不脹鋼合金的強物質形成 ,以提供具均勻品質的圖案罩幕20。 [0014] 然而,當使用SUS鋼鐵或不脹鋼合金時,會增加薄膜沉積 09710973f 單編號 A〇101 第5頁/共24頁 1013278196-0 1377866 101年.07月20日梭正替換頁 罩幕框架重量,因此很難處理罩幕框架及增加裝置重量 負載,用以傳送沉積裝置室中沉積的薄膜沉積罩幕框架 40來降低生產力。 【發明内容】 [0015] 本發明提供使用一雙框架結構降低其重量的薄膜沉積罩 幕框架及用此之沉積裝置。 [0016] 依據本發明一特微,平板顯示器薄膜沉積罩幕框架包含 :被供應具有複數開口的一圖案部分;與該圖案罩幕下 緣部分耦合以支撐該圖案罩幕的一第一框架;及以水平 或垂直方向與該第一框架耦合的一第二框架。 [0017] 依據本發明另一特徵,一沉積裝置包含:一沉積室;安 置於該沉積室中的一薄膜沉積罩幕框架,其包含被供應 具有複數開口的一圖案部分,與該圖案罩幕下緣部分耦 合以支撐該圖案罩幕的一第一框架,及以水平或垂直方 向與該第一框架耦合的一第二框架;及安置於該圖案罩 幕底下的一沉積源。 [0018] 平板顯示器薄膜沉積罩幕框架組合可包含具有複數圖案 部件的一圖案罩幕,及可支撐該圖案罩幕的一第一框架 。該第一框架可與該圖案罩幕的下緣部分耦合以支撐該 圖案罩幕。此外,該第二框架可以水平或垂直方向與該 第一框架耦合。 [0019] 同時,框架10可由如不脹鋼或SUS物質的強物質形成。以 水平或垂直方向對應該第一框架的該第二框架,可由具 有小於不脹鋼或SUS物質之一質量的一金屬及一合金形成 0971闕^舰删1 第6頁/共24頁 1013278196-0 1377866 101年.07月20日修正替换頁 ,藉此實施薄膜沉積輕量罩幕框架。 【實施方式】 [0020] 現在將參考顯示本發明實施例的附圖做更完整說明。 [0021] 第3圖為依據本發明第一實施例之薄膜沉積罩幕框架橫斷 面圖。 [0022] 參考第3圖,平板顯示器薄膜沉積罩幕框架400包含一圖 案罩幕200,其被供應具有複數開口之一圖案部分210, 及可支撐圖案罩幕200的一第一框架100,及以水平方向 配置於第一框架100下,與第一框架100下緣部分耦合的 一第二框架110。 [0023] 更明確說,第一框架100係配置於圖案罩幕200下緣部分 處以支撐圖案罩幕200。圖案罩幕200及第一框架100可 由如SUS或不脹鋼物質的強物質形成,以避免如因圖案罩 幕200下垂而彎曲的變形。 [0024] 較佳是,圖案罩幕200及第一框架100係由相同物質形成 。此時,圖案罩幕200可藉由焊接250被固定至第一框架 100 ° [0025] 接著,第二框架110以水平方向安置於第一框架100底下 ,且與第一框架1〇〇下緣部分耦合。第二框架110可以具 有較形成第一框架100之SUS或不脹鋼物質為小之一質量 的一金屬及一合金其中之一形成,藉此降低薄膜沉積罩 幕框架400的重量。 [0026] 第二框架110可由鋁,鎂,鈦及其合金選出之一形成。 09710973#單編號 A〇101 第7頁/共24頁 1013278196-0 1377866 日按正餘 [0027] &時’可藉由類似圖帛罩幕〇及第一框架ι〇〇之間搞合 的焊接’來麵合第一框架100及圖案罩幕200。然而’由 不同物質形成的第一框架10 0及第二框架110之間焊接效 此’大致低於由相同物質形成的第二框架110及第一框架 100之間者。 [0028] 因此’第一柜架100可藉由使用一獨立連接部件之機械耦 合方法與第二樞架110耦合。 [0029] 第4八至4〇圖係為顯示第3圖區域8之耦合圖案橫斷面圖。 [0030] 參考第4A圖’ 連接部件26〇被插入第一框架1〇〇之一第 一孔270及第二樞架110之一第二孔280,以機械性耦合 第一框架100至第二框架11〇。 [0031] [0032] 此外’參考第4B圖,連接部件26〇可於第一框架1〇〇中形 成’被插入第二柜架11〇之一第二孔咖,以機械性耗合 第一框架100至第二框架110。 參考第4C圖’連接部件26〇可於第二框架ιι〇中形成,被 插入第-框架100之一第一孔27〇,以機械性耦合第一框 架1 00至第二柜架11 〇。 [_ I明確說’連接部件260可為一螺絲釘。此時,第—孔 270或第二孔28G可具有該螺絲釘被拾緊的—母穿線部件 [_]帛5圖綠據本發明第二實施例之薄㈣積罩幕框架橫斷 面圖。 考第5圖,平板顯示器薄膜沉積罩幕框架綱包含—圖 09710973户·單編號 A0101 « S -S , ^ rrr 1013278196-0 1377866 案罩幕200,其被供應具有複數開口之一圖案部分210, 及可支撐圖案罩幕200的一第一框架100,及以垂直方向 配置於一外圍下,且與第一框架100下缘部分耦合的一第 二框架110。 [0036] 更明確說,第一框架100係配置於圖案罩幕200下緣部分 處以支撐圖案罩幕200。圖案罩幕200及第一框架1〇〇可 由如SUS或不脹鋼物質的強物質形成,以避免如因圖案罩 幕200下垂而彎曲的變形。 [0037] 較佳是,圖案罩幕200及第一框架100係由相同物質形成 。此時,圖案罩幕200可藉由焊接250被固定至第一框架 100 ° [0038] 接著,第二框架110以垂直方向安置於第一框架100外圍 底下,且與第一框架100耦合。第二框架110可以具有較 形成第一框架100之SUS或不脹鋼物質為小之一質量的— 金屬及一合金其中之一形成,藉此降低薄膜沉積罩幕框 架400的重量。 [0039] 第二框架110可由鋁,鎂,鈦及其合金選出之一形成。 [0040] 此時,可藉由類似圖案罩幕200及第一框架1〇〇之間輕合 的焊接,來耦合第一框架100及圖案罩幕200。然而,由 不同物質形成的第一框架100及第二框架110之間焊接效 能’大致低於由相同物質形成的第二框架110及第—框架 100之間者。 [0041] 因此,第一框架100可藉由使用一獨立連接部件之機械耦 1013278196-0 合方法與第二框架110耦合。 09710973户單編號A〇1〇l 第9頁/共24頁 1377866 101年07月20日核正替換頁 [0042] 第6A至6C圖係為顯示第五圖區域B’之耦合圖案橫斷面圖 〇 [0043] 參考第6A圖,一連接部件260被插入第一框架100之一第 一孔270及第二框架110之一第二孔280,以機械性耦合 第一框架100至第二框架110。 [0044] 此外,參考第6B圖,連接部件260可於第一框架100中形 成,被插入第二框架110之一第二孔280,以機械性耦合 第一框架100至第二框架110。 [0045] 參考第6C圖,連接部件260可於第二框架110中形成,被 插入第一框架100之一第一孔270,以機械性耦合第一框 架100至第二框架110。 _ Η [0046] 更明確說,連接部件260可為一螺絲釘。此時,第一孔 270或第二孔280可具有該螺絲釘被拴緊的一母穿線部件 〇 [0047] 如上述,薄膜沉積罩幕框架可於有機發光顯示器製程期 間,被裝設於用於沉積有機發光層處理的一沉積裝置中 ,以執行沉積一薄膜特定圖案處理。 [0048] 第7圖為依據本發明第一實施例的沉積裝置簡圖。 [0049] 參考第7圖,該沉積裝置包含一沉積室300 ;安置於該室 中以沉積一薄膜特定圖案的一基板290,具有可形成該薄 膜特定圖案於基板290上之一特定罩幕圖案的一薄膜沉積 罩幕框架400,及安置於薄膜沉積罩幕框架400底下且可 供應一薄膜沉積物質的一沉積源31 0。 隱·#單编號Α0101 第10頁/共24頁 1013278196-0 1377866 _ 101年.07月20日按正替換頁 [0050] 此時,室300可防止外來物質從外部引進,及調整在此的 内部壓力,藉此形成一特定罩幕圖案於基板290上。 [0051] 薄膜沉積罩幕框架400包含具有複數圖案部件210的一圖 案罩幕200,可沉積一薄膜特定圖案於安置在室300中之 薄膜沉積罩幕框架400上的基板290上,可支撐圖案罩幕 200的一第一框架100,及以水平方向配置於第一框架 1〇〇下,與第一框架1〇〇耦合的一第二框架110。 [0052] 因此,從沉積源310蒸發的一物質係沉積於基板290上, 其係藉由具有複數圖案罩幕200開口之圖案部件210安置 於薄膜沉積罩幕框架400上,藉此形成一特定罩幕圖案於 基板290上。 [0053] 薄膜沉積罩幕框架400的說明係類似實施例1,因此為了 簡化不再重複說明。 [0054] 依據本發明第一實施例的沉積裝置,可被施加至包含依 據本發明第二實施例之沉積裝置的一沉積裝置一以執行 沉積一薄膜特定圖案處理。 [0055] 如上述,已參考有機發光顯示器說明平板顯示器薄膜沉 積罩幕框架及用此之沉積裝置。然而一本發明並不限有 機發光顯示器,且可應用至如液晶顯示器的一平板顯示 器薄膜處理。 [0056] 如上述,依據本發明的平板顯示器薄膜沉積罩幕框架及 用此之沉積裝置,係運用一雙輕量框架結構,輕易地處 理罩幕框架及降低安置於該沉積裝置室中之一運輸裝置 重量負載,藉此增加該罩幕框架生產力。 0漏97#單編號A〇101 第11頁/共24頁 1013278196-0 1377866 101年07月20日核正替換頁 [0057] 雖然已參考特定實施例說明本發明,但熟練技術人士將 了解,只要不背離附帶申請專利範圍中所界定的本發明 精神或範疇,均可對本發明及其同等物作各種修改及變 異。 【圖式簡單說明】 [0058] 將參考附圖及特定實施例說明本發明的以上及其他特徵 ,其中:第1圖為傳統薄膜沉積罩幕框架平面圖。 第2圖為採用第一圖線A — A’之薄膜沉積罩幕框架橫斷面 圖。 第3圖為依據本發明第一實施例之薄膜沉積罩幕框架橫斷 面圖。 第4A至4C圖係為顯示第3圖區域B之耦合圖案橫斷面圖。 第5圖為依據本發明第二實施例之薄膜沉積罩幕框架橫斷 面圖。 第6A至6C圖係為顯示第五圖區域B’之耦合圖案橫斷面圖 〇 第7圖為依據本發明第一實施例的沉積裝置簡圖。 【主要元件符號說明】 [0059] 10 框架 20、 200圖案罩幕圖案罩幕 40、400薄膜沉積罩幕框架 21、 210圖案部分圖案部分 100第一框架 110第二框架 250焊接 隱額^單编號A0101 1013278196-0 第12頁/共24頁 1377866 101年.07月20日梭正替換頁 260連接部件 270第一孔 280第二孔 290基板 30 0沉積室 310沉積源 09710973^A〇101 第13頁/共24頁 1013278196-01377866 Correction and replacement page on July 20, 2011. Description of the invention: [Technical field to which the invention pertains] [0001] [Related application cross-reference] Application of the present application filed on April 5, 2007, Korean Patent Application No. 2007 The scope of interest of the '33733 is hereby incorporated by reference in its entirety. [0002] The present invention relates to a flat panel display film deposition mask frame and deposition apparatus therewith, and more particularly to a flat panel display film deposition mask frame that can be easily handled and transported using a dual lightweight frame structure and used Deposition device. [Prior Art] [0003] Recently, advantages such as a light-weight and small flat panel display (FpD) such as a liquid crystal display (Lcd) and an organic light-emitting display (OLED) have been extensively studied, and the resolution of a large-sized display has been increased. Between flat panel displays, because of the fast response time and color expression capability of organic light-emitting displays, such as light source and color (four) wave, it is a next-generation flat panel display that can solve the problems of traditional liquid crystal displays. In the country, an organic light-emitting display comprises an organic light-emitting layer between an anode and an anode. A hole and an electron system are removed from the anode and the cathode to generate a -number in the excited state, and the excitons are recombined to emit light, and the fine electrode is composed of (4) fine patterns (10) The method is a lithography technique or a deposition method including a mask for use. Since the organic light-emitting layer is sensitive to /, gas, it is difficult to form the organic light-emitting layer using conventional lithography. 1013278196-0 0971097#单灭除1 帛4 pages/total 24 pages 1377866 .101.07月20日修正 replacement page [0006] Therefore, anti-delamination treatment and lithography technology exposed to moisture during etching process, It is not suitable for the deposition treatment of the organic light-emitting layer. In order to solve this problem, a method of vacuum-depositing an organic light-emitting substance using a pattern mask having a specific pattern is widely used to form the organic light-emitting layer. 1 is a plan view of a conventional thin film deposition mask frame. Figure 2 is a cross-sectional view of a film deposition mask frame using the first line A - A'. [0010] Referring to FIGS. 1 and 2, a conventional flat panel display film deposition mask frame 40 includes a pattern mask 20 provided with a pattern portion 21 having a plurality of openings, and a frame 10 supporting the pattern mask 20. . The frame 10 is coupled to the pattern. The lower edge portion of the mask 20 is coupled to support the pattern mask 20. [0011] Generally, when the thin film deposition mask frame 40 is used to deposit an organic light emitting layer process during the organic light emitting display process, the pattern mask 20 has an excessively small thickness, and the pattern portion slit of the pattern mask 20 has an excessively small thickness. . Therefore, the pattern mask 20 may be decomposed or bent due to sagging, and it is difficult to accurately deposit a film. [0012] In particular, this problem is particularly severe in the mass production of the large-area pattern mask 20, whereby it is difficult to accurately deposit a film. To solve this problem, the frame 10 can be used to support the pattern mask 20 and maintain the shape of the pattern mask 20. [0013] Meanwhile, the frame 10 may be formed of a strong substance such as SUS steel or an invar alloy to provide a pattern cover 20 of uniform quality. [0014] However, when using SUS steel or invar alloy, it will increase the film deposition 09910973f single number A 〇 101 page 5 / total 24 pages 1013278196-0 1377866 101. July 20 shuttle is replacing the page cover The weight of the frame makes it difficult to handle the mask frame and increase the weight of the device to transport the thin film deposition mask frame 40 deposited in the deposition chamber to reduce productivity. SUMMARY OF THE INVENTION [0015] The present invention provides a thin film deposition mask frame and a deposition apparatus therewith that use a double frame structure to reduce its weight. [0016] In accordance with the present invention, a flat panel display film deposition mask frame includes: a pattern portion provided with a plurality of openings; and a first frame coupled to the lower edge portion of the pattern mask to support the pattern mask; a second frame coupled to the first frame in a horizontal or vertical direction. [0017] According to another feature of the present invention, a deposition apparatus includes: a deposition chamber; a thin film deposition mask frame disposed in the deposition chamber, the image containing a pattern portion having a plurality of openings, and the pattern mask a first frame coupled to support the patterned mask, and a second frame coupled to the first frame in a horizontal or vertical direction; and a deposition source disposed under the patterned mask. [0018] The flat panel display film deposition mask frame assembly can include a pattern mask having a plurality of pattern features, and a first frame that can support the pattern mask. The first frame can be coupled to a lower edge portion of the pattern mask to support the pattern mask. Additionally, the second frame can be coupled to the first frame in a horizontal or vertical direction. [0019] Meanwhile, the frame 10 may be formed of a strong substance such as an invar or SUS substance. The second frame corresponding to the first frame in a horizontal or vertical direction may be formed of a metal and an alloy having a mass smaller than that of the invar or SUS material. The number of the metal frame and the alloy may be changed. Page 6 of 24 Page 1013278196- 0 1377866 101. July 20th revised the replacement page to implement a thin film deposition lightweight mask frame. [Embodiment] [0020] A more complete description will now be made with reference to the drawings showing embodiments of the invention. 3 is a cross-sectional view of a thin film deposition mask frame in accordance with a first embodiment of the present invention. [0022] Referring to FIG. 3, the flat panel display film deposition mask frame 400 includes a pattern mask 200 that is supplied with a pattern portion 210 having a plurality of openings, and a first frame 100 that can support the pattern mask 200, and A second frame 110 is disposed in the horizontal direction under the first frame 100 and coupled to the lower edge portion of the first frame 100. More specifically, the first frame 100 is disposed at a lower edge portion of the pattern mask 200 to support the pattern mask 200. The pattern mask 200 and the first frame 100 may be formed of a strong substance such as SUS or an intumescent material to avoid deformation such as bending due to sagging of the pattern cover 200. [0024] Preferably, the pattern mask 200 and the first frame 100 are formed of the same substance. At this time, the pattern mask 200 may be fixed to the first frame 100 by welding 250. [0025] Next, the second frame 110 is disposed under the first frame 100 in a horizontal direction, and is lower than the first frame 1 Partially coupled. The second frame 110 may be formed of one of a metal and an alloy which is one of a small mass of the SUS or the intumescent material forming the first frame 100, thereby reducing the weight of the film deposition mask frame 400. The second frame 110 may be formed of one selected from the group consisting of aluminum, magnesium, titanium, and alloys thereof. 09710973#单号A〇101 Page 7 of 24 Page 1013278196-0 1377866 Days by the right [0027] & time can be achieved by a similar figure and the first frame The first frame 100 and the pattern mask 200 are welded to each other. However, the welding effect between the first frame 100 and the second frame 110 formed of different substances is substantially lower than that between the second frame 110 and the first frame 100 formed of the same substance. Thus, the first frame 100 can be coupled to the second pivot 110 by a mechanical coupling method using a separate connecting member. [0029] The fourth to fourth figures are cross-sectional views showing the coupling pattern of the area 8 of the third drawing. [0030] Referring to FIG. 4A', the connecting member 26'' is inserted into one of the first hole 270 of the first frame 1 and the second hole 280 of the second frame 110 to mechanically couple the first frame 100 to the second Frame 11〇. [0032] Furthermore, with reference to FIG. 4B, the connecting member 26 can be formed in the first frame 1A to be inserted into one of the second cabinets 11 to mechanically dissipate the first The frame 100 to the second frame 110. Referring to Fig. 4C, the connecting member 26 can be formed in the second frame ι, inserted into one of the first holes 27 of the first frame 100 to mechanically couple the first frame 100 to the second frame 11 〇. [I I clarify that the connecting member 260 can be a screw. At this time, the first hole 270 or the second hole 28G may have a cross-sectional view of the thin (four) cover frame of the second embodiment of the present invention. Figure 5, the flat panel display film deposition mask frame contains - Figure 09910973 household single number A0101 « S -S , ^ rrr 1013278196-0 1377866 case mask 200, which is supplied with a pattern portion 210 of a plurality of openings, And a first frame 100 capable of supporting the pattern mask 200, and a second frame 110 disposed in a vertical direction under a periphery and coupled to a lower edge portion of the first frame 100. More specifically, the first frame 100 is disposed at a lower edge portion of the pattern mask 200 to support the pattern mask 200. The pattern mask 200 and the first frame 1 can be formed of a strong substance such as SUS or an intumescent material to avoid deformation such as bending due to sagging of the pattern cover 200. [0037] Preferably, the pattern mask 200 and the first frame 100 are formed of the same substance. At this time, the pattern mask 200 may be fixed to the first frame by welding 250. [0038] Next, the second frame 110 is disposed in the vertical direction under the periphery of the first frame 100 and coupled to the first frame 100. The second frame 110 may have one of a metal and an alloy which is one of a smaller mass than the SUS or the intumescent material forming the first frame 100, thereby reducing the weight of the film deposition mask frame 400. [0039] The second frame 110 may be formed of one selected from the group consisting of aluminum, magnesium, titanium, and alloys thereof. [0040] At this time, the first frame 100 and the pattern mask 200 may be coupled by a solder joint between the pattern mask 200 and the first frame 1〇〇. However, the welding effect between the first frame 100 and the second frame 110 formed of different substances is substantially lower than that between the second frame 110 and the first frame 100 formed of the same substance. Thus, the first frame 100 can be coupled to the second frame 110 by a mechanical coupling 1013278196-0 combination method using a separate connecting member. 09710973 Household Order No. A〇1〇l Page 9 of 24 Page 1377866 July 20, 2010 Nuclear Replacement Page [0042] Figures 6A to 6C show the cross section of the coupling pattern of the fifth map area B' Referring to FIG. 6A, a connecting member 260 is inserted into one of the first hole 270 of the first frame 100 and the second hole 280 of the second frame 110 to mechanically couple the first frame 100 to the second frame. 110. Further, referring to FIG. 6B, the connecting member 260 may be formed in the first frame 100 and inserted into one of the second holes 280 of the second frame 110 to mechanically couple the first frame 100 to the second frame 110. Referring to FIG. 6C, the connecting member 260 may be formed in the second frame 110 and inserted into one of the first holes 270 of the first frame 100 to mechanically couple the first frame 100 to the second frame 110. _ Η [0046] More specifically, the connecting member 260 can be a screw. At this time, the first hole 270 or the second hole 280 may have a female threading member that the screw is tightened. [0047] As described above, the thin film deposition mask frame may be installed for the organic light emitting display process. A deposition apparatus for depositing an organic light-emitting layer is processed to perform deposition of a film-specific pattern treatment. 7 is a schematic view of a deposition apparatus in accordance with a first embodiment of the present invention. Referring to FIG. 7, the deposition apparatus includes a deposition chamber 300; a substrate 290 disposed in the chamber to deposit a film-specific pattern having a specific mask pattern on the substrate 290 that can form the film-specific pattern A thin film deposition mask frame 400, and a deposition source 301 disposed under the thin film deposition mask frame 400 and capable of supplying a thin film deposition material. Hid·#单号Α0101 Page 10/24 pages 1013278196-0 1377866 _ 101 years. July 20th Press the replacement page [0050] At this time, the chamber 300 can prevent foreign substances from being introduced from the outside, and adjust here. The internal pressure thereby forms a specific mask pattern on the substrate 290. [0051] The thin film deposition mask frame 400 includes a pattern mask 200 having a plurality of pattern members 210, and a film specific pattern can be deposited on the substrate 290 disposed on the film deposition mask frame 400 in the chamber 300 to support the pattern. A first frame 100 of the mask 200 and a second frame 110 disposed in the horizontal direction in the first frame 1 and coupled to the first frame 1A. Accordingly, a substance evaporated from the deposition source 310 is deposited on the substrate 290, which is disposed on the thin film deposition mask frame 400 by the pattern member 210 having the opening of the plurality of pattern masks 200, thereby forming a specific The mask pattern is on the substrate 290. [0053] The description of the thin film deposition mask frame 400 is similar to that of Embodiment 1, and therefore the description will not be repeated for the sake of simplicity. The deposition apparatus according to the first embodiment of the present invention can be applied to a deposition apparatus 1 including the deposition apparatus according to the second embodiment of the present invention to perform deposition of a film-specific pattern treatment. [0055] As described above, the flat panel display film deposition mask frame and the deposition apparatus therewith have been explained with reference to the organic light emitting display. However, an invention is not limited to an organic light emitting display, and can be applied to a flat panel display film processing such as a liquid crystal display. [0056] As described above, the flat panel display film deposition mask frame and the deposition apparatus therewith according to the present invention utilize a pair of lightweight frame structures to easily process the mask frame and reduce one of the deposition apparatus chambers. The transport device is heavily loaded, thereby increasing the effectiveness of the mask frame. 0 漏97#单单A〇101 Page 11/24 pages 1013278196-0 1377866 July 20, 2010 Nuclear replacement page [0057] While the invention has been described with reference to specific embodiments, those skilled in the art will understand Various modifications and variations of the present invention and its equivalents are possible without departing from the spirit and scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS [0058] The above and other features of the present invention will be described with reference to the drawings and specific embodiments in which: FIG. 1 is a plan view of a conventional thin film deposition mask frame. Figure 2 is a cross-sectional view of the film deposition mask frame using the first line A - A'. Fig. 3 is a cross-sectional view showing the film deposition mask frame in accordance with the first embodiment of the present invention. 4A to 4C are cross-sectional views showing the coupling pattern of the region B of Fig. 3. Fig. 5 is a cross-sectional view showing a film deposition mask frame in accordance with a second embodiment of the present invention. 6A to 6C are cross-sectional views showing a coupling pattern of the fifth drawing area B'. Fig. 7 is a schematic view of a deposition apparatus according to the first embodiment of the present invention. [Main component symbol description] [0059] 10 frame 20, 200 pattern mask pattern mask 40, 400 film deposition mask frame 21, 210 pattern portion pattern portion 100 first frame 110 second frame 250 welding hidden ^ single No. A0101 1013278196-0 Page 12 of 24 Page 1377866 101.07.20 20 Shuttle replacement page 260 Connection member 270 First hole 280 Second hole 290 Substrate 30 0 Deposition chamber 310 Deposition source 09910973^A〇101 13 pages / total 24 pages 1013278196-0

Claims (1)

1377866 101年07月20 s修正替换頁 七、申請專利範圍: 1 . 一種平板顯示器的薄膜沉積的罩幕框架,包含:一圖案罩 幕,被供應具有複數開口的一圖案部分;一第一框架,與 該圖案罩幕的一下緣部分耦合以支撐該圖案罩幕;及一第 二框架,其以一水平或垂直方向與ά第一框架耦合;其中 該第二框架係由具有小於一不脹鋼或sus物質之一質量的 一金屬及一合金其中之一形成。 2. 如申請專利範圍第1項的罩幕框架,其中該圖案罩幕係由 該不脹鋼或SUS物質形成。 3. 如申請專利範圍第1項的罩幕框架,其中該第一框架係由 該不脹鋼或SUS物質形成。 4 .如申請專利範圍第1項的罩幕框架,其中具有一小質量的 該金屬或該合金係包含由铭,鎂,欽及其合金選出者。 5.如申請專利範圍第1項的罩幕框架,其中該圖案罩幕係由 與該第一框架相同物質形成,且藉由焊接與該第一框架耦 合0 6 .如申請專利範圍第1項的罩幕框架,其中該第一框架係由 與該第二框架不同物質形成,且藉由一連接部件與該第二 框架耦合。 7 .如申請專利範圍第6項的罩幕框架,其中該連接部件係形 成於該第一框架中且與該第二框架耦合。 8 .如申請專利範圍第6項的罩幕框架,其中該連接部件係形 成於該第二框架中且與該第一框架耦合。 9 . 一種沉積裝置,包含:一沉積室;一薄膜沉積的罩幕框架 ,其安置於該沉積室中,並包含被供應具有複數開口的一 09710973严编號 Α0101 第14頁/共24頁 1013278196-0 1101年07月20日孩正替換頁I 圖案罩幕’與該圖案罩幕的一下緣部分耗合以支撐該圖案 罩幕的帛框架,及以水平或垂直方向與該第一框架輕 合一第二框架:及一沉積源’安置於該圖案罩幕底下;其 中°亥第一框架係由具有小於一不脹銅或SUS物質之-質量 的一金屬及一合金其中之一形成。 如申明專利範圍第9項的沉積裝置,其中該圖案罩幕係由 該不脹鋼或SUS物質形成。 11 ·如申請專利範圍第9項的沉積裝置,其中該第一框架係由 5亥不脹鋼或SUS物質形成。 12 .如申請事利範圍第9項的沉積裝置,其中具有一小質量的 該金屬或該合金係、包♦由銘,鎂,鈦及其合金選出者。 13.如中請專利範’9項的沉積裝置,其中該圖案罩幕係& 與該第-框架相同物質形成,且藉“接與該第一框架搞 合。 14 .如申請專利範圍第9項的沉積裝置,其中該第一框架係由 與該第二框架不同物質形成,且藉由—連接部件與該第二 框架耦合。 15 .如申請專利範圍第14項的沉積裝置,其中該連接部件係形 成於該第一框架中且與該第二框架耦合。 16 .如申請專利範圍第14項的沉積裝置,其中該連接邻件係多 成於該第二框架中且與該第一框架耦合。 , 第15頁/共24頁 097丽單編號A〇101 1013278196-01377866 July 20, 2011 Correction Replacement Page VII. Patent Application Range: 1. A film deposition mask frame for a flat panel display comprising: a pattern mask provided with a pattern portion having a plurality of openings; a first frame Coupling with the lower edge portion of the patterned mask to support the patterned mask; and a second frame coupled to the first frame in a horizontal or vertical direction; wherein the second frame is less than one inflated One of a metal or an alloy of one of the quality of steel or sus material is formed. 2. The mask frame of claim 1, wherein the pattern mask is formed of the invar or SUS material. 3. The mask frame of claim 1, wherein the first frame is formed from the invar or SUS material. 4. A mask frame as claimed in claim 1 wherein the metal having a small mass or the alloy is selected from the group consisting of Ming, Magnesium, Qin and its alloys. 5. The mask frame of claim 1, wherein the pattern mask is formed of the same material as the first frame, and coupled to the first frame by welding. 6 is as claimed in claim 1 The mask frame, wherein the first frame is formed of a different substance from the second frame and coupled to the second frame by a connecting member. 7. The mask frame of claim 6, wherein the connecting member is formed in the first frame and coupled to the second frame. 8. The mask frame of claim 6, wherein the connecting member is formed in the second frame and coupled to the first frame. 9. A deposition apparatus comprising: a deposition chamber; a film deposition mask frame disposed in the deposition chamber and comprising a 09910973 series number Α0101, 14th page, total 24 pages 1013278196, supplied with a plurality of openings -0 July 20, 1101, Child Replacement Page I Patterned Mask' is fitted with the lower edge of the patterned mask to support the frame of the patterned mask and is lightly or horizontally or horizontally to the first frame The second frame: and a deposition source are disposed under the patterned mask; wherein the first frame is formed by one of a metal and an alloy having a mass less than a non-expanded copper or SUS material. A deposition apparatus according to claim 9, wherein the pattern mask is formed of the invar or SUS material. 11. The deposition apparatus of claim 9, wherein the first frame is formed of 5 Å invar or SUS material. 12. A deposition apparatus according to item 9 of the scope of the application, wherein the metal or the alloy system having a small mass is selected from the group consisting of magnesium, titanium and alloys thereof. 13. The deposition apparatus of claim 9, wherein the pattern mask system & is formed of the same material as the first frame, and is coupled to the first frame. 14 . The deposition apparatus of claim 9, wherein the first frame is formed of a different material from the second frame, and is coupled to the second frame by a connecting member. 15. The deposition device of claim 14, wherein The connecting member is formed in the first frame and coupled to the second frame. The deposition device of claim 14, wherein the connecting member is multi-shaped in the second frame and the first Frame Coupling. , Page 15 of 24 097 丽丽单号 A〇101 1013278196-0
TW097109737A 2007-04-05 2008-03-19 Mask frame for thin film deposition of flat panel display and deposition apparatus using the same TWI377866B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070033733A KR100853544B1 (en) 2007-04-05 2007-04-05 Mask frame assembly for thin film deposition of flat panel display and depositing equipment of the same

Publications (2)

Publication Number Publication Date
TW200841765A TW200841765A (en) 2008-10-16
TWI377866B true TWI377866B (en) 2012-11-21

Family

ID=39878394

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097109737A TWI377866B (en) 2007-04-05 2008-03-19 Mask frame for thin film deposition of flat panel display and deposition apparatus using the same

Country Status (3)

Country Link
KR (1) KR100853544B1 (en)
CN (1) CN101280411B (en)
TW (1) TWI377866B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101117645B1 (en) * 2009-02-05 2012-03-05 삼성모바일디스플레이주식회사 Mask Assembly and Deposition Apparatus using the same for Flat Panel Display
KR101857992B1 (en) * 2011-05-25 2018-05-16 삼성디스플레이 주식회사 Patterning slit sheet assembly, apparatus for organic layer deposition, method for manufacturing organic light emitting display apparatus and organic light emitting display apparatus
KR102097706B1 (en) 2013-06-19 2020-04-07 삼성디스플레이 주식회사 Mask structure for deposition
CN105734488A (en) * 2014-12-08 2016-07-06 上海和辉光电有限公司 Metal mask plate and composite metal shielding frame thereof
CN104498871B (en) * 2015-01-14 2017-04-12 京东方科技集团股份有限公司 Mask device and assembling method thereof
KR102444178B1 (en) * 2015-04-27 2022-09-19 삼성디스플레이 주식회사 Mask assembly, manufacturing method for the mask assembly and manufacturing method for a display apparatus
KR101918457B1 (en) * 2016-12-23 2018-11-14 주식회사 테스 Mask assembly
JP6988131B2 (en) * 2017-03-30 2022-01-05 大日本印刷株式会社 A vapor deposition mask with a frame, a method for manufacturing an organic semiconductor device, a method for manufacturing an organic EL display, and a frame.
CN108220876A (en) * 2017-12-28 2018-06-29 深圳市华星光电技术有限公司 A kind of mask plate
KR20220113588A (en) 2021-02-05 2022-08-16 삼성디스플레이 주식회사 Mask and method of manufacturing the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001201846A (en) 2000-01-21 2001-07-27 Nikon Corp Frame member, mask, and aligner
KR100382491B1 (en) * 2000-11-28 2003-05-09 엘지전자 주식회사 shadow mask in organic electroluminescence
JP4072422B2 (en) * 2002-11-22 2008-04-09 三星エスディアイ株式会社 Deposition mask structure, method for producing the same, and method for producing organic EL element using the same
KR100981967B1 (en) * 2003-10-13 2010-09-13 삼성모바일디스플레이주식회사 Mask frame assembly, and forming apparatus of thin layer

Also Published As

Publication number Publication date
TW200841765A (en) 2008-10-16
CN101280411B (en) 2011-06-29
CN101280411A (en) 2008-10-08
KR100853544B1 (en) 2008-08-21

Similar Documents

Publication Publication Date Title
TWI377866B (en) Mask frame for thin film deposition of flat panel display and deposition apparatus using the same
US7915073B2 (en) Method of manufacturing the organic electroluminescent display and organic electroluminescent display manufactured by the method
TWI301904B (en) Method of manufacturing a display by mask alignment
JP4505473B2 (en) Mask, vapor deposition device, organic electroluminescence display device
US11718904B2 (en) Mask arrangement for masking a substrate in a processing chamber, apparatus for depositing a layer on a substrate, and method for aligning a mask arrangement for masking a substrate in a processing chamber
TWI618804B (en) Mask strips and method for manufacturing organic light emitting diode display using the same
JP5202428B2 (en) Mask contact means for vapor deposition apparatus and vapor deposition apparatus using the same
US8402917B2 (en) Mask frame assembly for thin film deposition and associated methods
US20190019994A1 (en) Multi-layer mask
EP1426461A1 (en) Mask for coating by vacuum evaporation
US9238276B2 (en) Method of manufacturing mask assembly for thin film deposition
JP2006190655A (en) Forming method of shadow mask pattern
JP2009009777A (en) Film forming mask
WO2021046807A1 (en) Mask device and manufacturing method therefor, evaporation method and display device
KR101319320B1 (en) shadow mask
JP2005339861A (en) Mask structure and its manufacturing method
JP5084112B2 (en) Formation method of vapor deposition film
JP2019206761A (en) Mask constitution for masking substrate in treatment chamber
JP2006274301A (en) Vapor deposition method
KR100741052B1 (en) Vacuum evaporation mask of EL display device, and vacuum evaporation method and apparatus utilizing the same
US7652421B2 (en) Organic EL display
KR20230014356A (en) Manufacturing method for shadow mask
JP2011153330A (en) Mask for vacuum film deposition and apparatus for film deposition
KR20110064716A (en) Transcripting device in using thermal transfer process
WO2013140599A1 (en) Film forming mask and film forming apparatus