1376718 loi年:05月08日修正脊^頁 、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種真空鍍膜輔助設備，尤其涉及一種用於 離子輔助鐘膜之離子源。 【先前技術】 [0002] 傳統真空鍍膜設備係在真空條件下用電子束將膜料加熱 至蒸發溫度，使其蒸發並沉積於基材上形成薄膜以達到 鍍膜之目的。惟，被蒸發之膜料原子之能量低，所鍍膜 層之附著力差、密度低，薄膜性質受環境影響大、易脫 落、不穩定。此外，電子蒸發時，電子搶之柵極電壓為 6000-1 0000V，容易引起高壓放電起火，影響薄膜品質 [0003] 為增加真空鍍膜之附著力、密度，在電子束蒸發過程中 需使用離子源對基材進行轟擊，實現離子輔助鍍膜之目 的。離子輔助鍍膜對膜料原子的撞擊可使形成之薄膜之 光譜特性特別穩定、吸水性減少、折射率升高及粗糙度 降低，這係因為離子助鍍後膜堆積密度升高，膜變得更 緻密，因此吸水量變少，光譜特性也因此不會飄移，折 射率變大而且穩定。 [0004] 請參考圖1，一種先前技術提供之離子源100由陰極120、 陽極140、磁路150與供氣系統（未標示）組成，該陰極 120包括一陰極燈絲121與兩陶瓷絕緣墊122，123。磁路 150於放電室130内形成磁場，磁力線由陰極120下部之 磁極發出經放電室進入頂部磁極160。離子源100在真空 狀態作業時，由供氣系統提供之工作氣體（氬氣）與反應 0腿469#單編號删1 第3頁/共17頁 1013173464-0 1376718 101年05月08日修正替sirs 氣體（如氧氣）*供氣管道UQ進人到放電室13{)内。愈此 同時，陰極燈絲121被加熱至熱電子發射溫度，陽極140 被施以正電位。在電場作用下，陰極燈絲ΐ2ι發射的部分 電子沿磁力線以螺旋運動的方式向陽極14〇遷移於放電 室内與氣體原子或分子發生碰撞，並將其電離電 —過程中產生的電子_向陽極i㈣移，產 電離 放電室130電場作用下被加速並與陰極燈絲12^子料 分電子中和後形成等離子體射出離子源 w ’具右—金热 量之等離子㈣基材進行直接轟擊錢行心 疋月匕 轟擊薄膜表面以與薄獏表面原子進行能量 月'或 X換進而营規 離子輔助鍍膜。 [0005] 在鍍膜過程中，上述陰極燈絲121會發射熱電子而彳。耗 使得該陰極燈絲121變得越來越細而斷開。兮险極=耗 121斷開會造成離子源斷路，在更換陰極燈絲I。之^通 常要打破真空狀態使得鍍膜過程中斷。 冲 【發明内容】 必 [0006] 有鑑於此’提供一種防止鍍膜過程中斷之離 卞源實為 要。 [0007] 以下將以實施例說明一種防止鍍膜過程中辦之離子原 [〇〇〇8] 該離子源包括一個本體，該本體包括一故番~ 至；一陽極 ’設置於該放電室内，該本體的頂部設置 開口，於該 本體的頂部與該開口相鄰處設置有陰極電杻 _ 蚀，該陰極電 極與該陽極相對設置，該離子源還包括複數失持臂卜 個夾持臂包括夾持部及與夾持部相連之絕緣部，今夹持 部之另一端夾持有陰極燈絲，該絕緣部之另〜^ ^ 0951446#單編號A〇1()1 第4頁/共Π頁 端與該本 1013173464-0 1376718 體姉連接，藉由轉__臂可使其 電極形成電連接並使其陰極燈絲位於所述開口位置以與 該陽極形成電氣回路。 ]相較於先讀術，所物子源藉纟設置㈣連接於本體 上之複數夹持有陰極燈絲之夹持臂，且該複數夹持臂均 設置有峡部及由該夹持部夾持之陰極燈^藉由轉動 該複數失持臂之-可使其失持部與該陰極電.極形成電連 接並使其陰極燈絲位於上述開σ位置，使與陰極電極導1376718 loi year: May 08 correction ridge page, invention description: [Technical field of invention] [0001] The present invention relates to a vacuum coating auxiliary device, and more particularly to an ion source for an ion-assisted clock film. [Prior Art] [0002] A conventional vacuum coating apparatus heats a film material to an evaporation temperature by an electron beam under vacuum, and evaporates and deposits it on a substrate to form a film to achieve the purpose of coating. However, the energy of the vaporized film atoms is low, the adhesion of the coated layer is poor, the density is low, and the properties of the film are greatly affected by the environment, and are easily detached and unstable. In addition, when the electron evaporates, the gate voltage of the electron grab is 6000-1 0000V, which is easy to cause high-voltage discharge and fire, which affects the film quality. [0003] In order to increase the adhesion and density of the vacuum coating, an ion source is needed in the electron beam evaporation process. The substrate is bombarded to achieve the purpose of ion assisted coating. The impact of the ion-assisted coating on the atom of the film can make the formed film have particularly stable spectral characteristics, reduced water absorption, increased refractive index and reduced roughness. This is because the film packing density increases after ion assist plating, and the film becomes more It is dense, so the amount of water absorption is reduced, the spectral characteristics are not drifted, and the refractive index becomes large and stable. Referring to FIG. 1, an ion source 100 provided by a prior art is composed of a cathode 120, an anode 140, a magnetic circuit 150, and a gas supply system (not shown). The cathode 120 includes a cathode filament 121 and two ceramic insulating pads 122. , 123. The magnetic circuit 150 forms a magnetic field in the discharge chamber 130, and the magnetic lines of force are emitted from the lower portion of the cathode 120 through the discharge chamber into the top magnetic pole 160. When the ion source 100 is operating in a vacuum state, the working gas (argon gas) supplied by the gas supply system and the reaction 0 leg 469# single number deletion 1 page 3 / 17 pages 1013173464-0 1376718 revised on May 08, 101 The sirs gas (such as oxygen) * the gas supply pipe UQ enters the discharge chamber 13{). At the same time, the cathode filament 121 is heated to the hot electron emission temperature, and the anode 140 is applied with a positive potential. Under the action of the electric field, part of the electrons emitted by the cathode filament ΐ2 ι migrated along the magnetic field lines to the anode 14 〇 in the discharge chamber to collide with the gas atoms or molecules, and ionize the electrons generated in the process—to the anode i (4) Move, the ionization discharge chamber 130 is accelerated by the electric field and is neutralized with the cathode filament 12^ to form a plasma emission ion source w' with right-gold heat plasma (4) substrate for direct bombardment The moon smashes the surface of the film to perform an energy-month or X-change with the atomic surface of the thin crucible. [0005] In the coating process, the cathode filament 121 emits hot electrons and entangles. The consumption causes the cathode filament 121 to become thinner and more broken.兮 极 = = consumption 121 disconnection will cause the ion source to open, replace the cathode filament I. It is often necessary to break the vacuum to interrupt the coating process.冲 【发明发明】必 [0006] In view of this, it provides a means to prevent the interruption of the coating process. [0007] Hereinafter, an ion source for preventing a plating process will be described by way of an embodiment [〇〇〇8]. The ion source includes a body, and the body includes an anode and a cathode; and the anode is disposed in the discharge chamber. An opening is disposed at a top of the body, and a cathode electrode is disposed adjacent to the opening at the top of the body, the cathode electrode is disposed opposite to the anode, and the ion source further includes a plurality of holding arms, and the clamping arm includes a clip The holding portion and the insulating portion connected to the clamping portion, the other end of the clamping portion is clamped with a cathode filament, and the insulating portion is another ~ ^ ^ 0951446# single number A 〇 1 () 1 page 4 / total page The end is connected to the body 1013173464-0 1376718 body, and the electrode of the __ arm can be electrically connected and its cathode filament is located at the opening position to form an electrical circuit with the anode. Compared with the prior reading, the object source is provided with (4) a clamping arm that is connected to the body and sandwiches the cathode filament, and the plurality of clamping arms are provided with an isthmus and is clamped by the clamping portion. The cathode lamp ^ can be electrically connected to the cathode electrode by rotating the plurality of arms, and the cathode filament is placed at the above-mentioned opening σ position to guide the cathode electrode
通之陰極料激發射出電子。當陰極燈絲因變細而斷 開後，可藉由轉動切換該夾持臂以使另__陰極燈絲與陽 極形成電氣回路，從而確保該離子源正常運作以避免錢 膜過程中斷。 【實施方式】 [0010] 下面結合附圖對本發明作進一步的詳細說明。 [0011] 請參考圖2，本發明第一實施例之離子源200包括一個本 體210，夾持臂220及230。該夾持臂22〇，23〇與該本體 210樞軸連接。 [0012]該本體210的頂部設置一開口 260，於該本體21〇的頂部 與該開口 260相鄰處設置有陰極電極250。為使該夾持臂 220，230與該本體210樞軸連接，可在與該本體21〇的頂 部相鄰之側壁上設置有一對轉軸240。優選的，該轉轴 240之轴線與該陰極電極250之中心軸線位於同一平面。 該陰極電極250為兩個金屬塊，該兩個金屬塊相對設置於 該開口 2 6 0兩側’其形狀可為任意形狀，如圓柱狀。該陰 09514469#單編號 極電極250之材料可為導電材料如鋼，金。 Α0101 第5頁/共17頁 1013173464-0 1376718 [0013] 1101年.05月08日按正_百 該夾持臂22G包括失持部221及與該夾持部221相連接之 、、巴緣部222。該夾持臂230包括支持部231及與該炎持部 231相連之絕緣部232。該夹持部“I，231之另一端分別 夾持有陰極燈絲223，233。該絕緣部222 , 232之另一端 刀別與該本體21〇樞軸連接，即該絕緣部222，232之另 一端依次套設於該轉軸24〇上並與該轉軸24〇固定連接。 轉動該轉轴240可帶動該夹持臂220，230以轉軸240為支 點轉動從而將該央持臂22〇，23晴夾持之陰極燈絲m ，233切換式地位於所述開口 26〇位置。該陰極燈絲223 ，233其中之一位於所述開口 26〇位置時，藉由夾持該陰 讀 極燈絲之夾持部與該陰極電極25〇形成電連接，可使該陰 極燈絲與陰極電極250形成電連接。為了使該陰極燈絲 223，233其中之一位於所述開口 260位置時，夾持該陰 極燈絲之夾持部能與該陰極電極25〇形成電連接，於該夹 持臂220 ’ 230之夾持部221，231上可分別設置凸塊224 ，234。當該陰極燈絲223，233其中之一位於所述開口 260位置時’該凸塊224，2 34其中之一將與該陰極電極 250緊密接觸，從而陰極燈絲223，233與該陰極電極250 ^ 形成電連接。通常，當該陰極電極250為圓柱狀時，該& 塊224，234與該金屬塊250相接觸之表面優選為曲面， 以使該凸塊224，234能與該金屬塊250形成更為緊密的 接觸’並且可以減小切換該凸塊224，234與該金屬塊 250完全接觸及完全分離兩種狀態所受阻力的大小。 [0014] 該夾持部221，231均可由導電材料製成，如銅，金等。 該絕緣部222，232均可由非導電材料製成，優選陶兗等 095U46#單编號麵1 第6頁/共17頁 1013173464-0 1376718 年.05月 08 日 ’以防止該離子源200發生短路。優選的，於該陰極燈絲 223 ’ 233上分別纏繞一個燈絲彈簧2231，2331，以增大 该陰極燈絲223，233之工作面積，進而於該陰極燈絲 223，233受到激發時能夠產生更多電子。該陰極燈絲 223，233及該燈絲彈簧2231，2331之材質可為鶴絲或硼 化鑭。 [0015] s青一供參考圖3 ’該本體210包括一放電室228 ; —磁路 226 ’該磁路226環繞該放電室228 ; —供氣系統（未標示 )’用於向該放電室228提供工作氣體與反應氣體；一陽 極225，設置於該放電室228内，該陽極225與所述陰極 電極250相對設置。 [0016] 該夾持臂220 ’ 230其中之一以該轉軸240為支點轉動使 陰極燈絲223 ’ 233其中之一位於所述開口 26〇位置時， 相對應之陰極燈絲會與該陽極225形成電氣回路。 [0017] 上述磁路226為環繞該本體210内部而設，其一般由背磁 極（未標示）、磁體（未標示）、外磁體（未標示）及頂部磁 體229組成。该磁路226之背磁極（未標示）、趟體（未標 示）、外磁體（未標示）及頂部磁體229於放電室228内形 成磁場’該磁場可於放電室228產生如圖3虛線所示之磁 力線》 [0018] 該陽極225可為圓枉體結構，於沿其中心軸方向上開設有 一錐形凹槽，該錐形凹槽之直徑沿鄰近於陰極電極25〇的 方向逐漸增大。該陽極225之錐形凹槽底部設置有可裝載 膜料之圓形坩堝2251。於該陽極225之底部設置有布氣板 09514469#單編號 Α〇101 第7頁/共17頁 1013173464-0 丄： 1101年05月08日修正替換 227該陽極225通過螺栓（未標示）與該布氣板227相連 接。該布氣板227上設有供氣管道2271，組成供氣系統。 ]上述離子源200於真空環境下工作時，轉動該轉軸240帶 動該失持臂220以該轉軸240為支點轉動，將陰極燈絲 223置於上述開口26〇位置以使其與陽極225形成電氣回 路。分別將工作氣體與反應氣體藉由該供氣管道2271導 入到放電室228内，工作氣體可選用氬氣，反應氣體可選 用氧氣。磁力線由上述陰極燈絲223下方之磁路226發出 進入頂部磁極229。同時，與該陰極電極25〇相接之電源 · 提供給該陰極電極250—負電位元，提供陽極225一正電 位元，陰極燈絲223受激發射出電子，在放電室228電場 作用下，從陰極燈絲223發出之部分電子沿磁力線方向向 陽極225遷移’於故電室228内與氣體原子或分子發生碰 撞，並將其電離。在電離過程中產生的電子繼續向陽極 225遷移，產生的離子將於放電室228電場作用下被加速 ，與陰極燈絲223產生的部分電子中和之後，形成等離子 體從該離子源20。射出。具有一定能量之等離子體束可冑 鲁 基材（未標示）進行直接轟擊以進行鍍前清洗，或轟擊基 材薄膜表面以與薄膜表面原子進行能量交換進而實現離 子輔助鍍膜。 _]當該陰極燈絲223因被損耗而斷_，轉動該轉轴24_ 動該夾持臂220以該轉軸240為支點轉動，使該凸塊似 與該陰極電極25〇完全分離，進而將該陰極燈絲m從上 述開口 260位置移出。當夹持臂22〇，⑽與轉轴24〇固定 連接時，轉動該轉軸240的同時會帶動該夹持臂23〇以該 09514469#單賊删1 帛8頁/共17頁 ' 1013173464-0 1101年.05月08日修正替^頁 轉軸240為支點轉動，從而將該夹持臂23〇之夹持部如 夹持之陰極燈絲233置於上述開口 26〇位置，該凸塊224 與該陰極電極250完全分離後，使該凸塊似與該陰極電 極250完全接觸以使陰極燈絲233與陽極奶形成另一電 氣回路。處於上述開口 260位置之陰極燈絲233受激發射 出电子。在放電室228電場作用下，從降極燈絲233發出 的部分電子沿磁力線方向向陽極m遷移於放電室228 内與氣體原子或分子發生碰撞，並將其電離。在電離過 _ 程:產生的電子繼續向陽極225遷移，產生的離子將在放 電至228電場作用下被加速’與陰極燈絲撕產生的部分 電子中和之後’形成等離子體從該離子源測射出。 ]在此過程中，该失持臂22〇上之陰極燈絲⑵斷開後，轉 動轉轴240會帶動該炎持臂23〇以該轉轴240為支點轉動 ’使該凸塊234與該陰極電極25()完全接觸從而使陰極 燈絲233受激發射出電子’確保離子源正常運作，而不用 解除該離子源200之真空環境。鍵膜結束後可以更換該 • 陰極燈絲如，如，以備下次使用。 [_可以理解，上述離子源2〇〇可以包括兩個以上的上述失持 臂’每個夾持臂所包括的絕緣部之—端與離子源之本體 栖軸連接，例如將該複數夾持臂所包括的絕緣部之一端 依次套設於該轉軸240上並與該轉轴24〇固定連接。轉動 該轉軸240可同時帶動該複數夹持臂以該轉軸240為支·點 轉動’將其中—個夾持臂所包括的夹持部與陰極電極形 成電連接，使陰極燈絲受激發射出電子。 [0023] 请參考圖4，本發明第-音说乂， β 發月第-實施例之離子源3GG與上述本發 09514469#早職删1 第9頁/共17頁 1013173464-0 1^/6718 1101年.05月08日 明第一實施例之離子源2〇〇之結構基本相同’不同之處在 於·該離子源300之本體310之側壁上設置有兩對轉軸； 該離子源300具有失持臂320，330，該夾持臂32 0，330 之夹持部321 ’ 331上可分別設置凸塊324，334，該夾持 臂320 ’ 330分別將其絕緣部322，332套設並固定連接於 相應的轉軸390，340上，轉動轉軸390，340分別帶動與 其福轴連接之夾持臂以其相應轉軸390，340為支點轉動 ’使具有不同的延伸長度之凸塊324，334與陰極電極 350緊密接觸，從而陰極燈絲323，333與陰極電極35〇形 成電連接。當該夹持臂320之夾持部321所夾持的陰極燈 絲323斷開後，轉動該轉軸34〇使該陰極燈絲333與陰極 電極350形成電連接，從而陰極燈絲333能夠受激發射出 電子’確保離子源2〇〇正常運作。 [0024] 综上所述，本發明符合發明專利要件，爰依法提出專利 申請。惟，以上所述者僅為本發明之較佳實施例，舉凡 熟習本案技藝之人士，在援依本案發明之精神所作之等 效修飾或變化，皆應包含於以下之申請專利範圍内。 【圖式簡單說明】 [0025] [0026] [0027] [0028] [0029] 圖1係一種先前技術中之離子源之剖面示意圖。 圖2係本發明第一實施例離子源之立體結構示意圖。 圖3係圖2中沿111 -111之剖面示意圖。 圖4係本發明第二實施例離子源之立體結構示意圖。 【主要元件符號說明】 離子源：1 00, 200, 300 〇9514469产單编號 A0101 第10頁/共17頁 1013173464-0 1376718 101年.05月08日核正替換百 [0030] 陰極：120 .[0031] 陽極：140, 225 [0032] 磁路：1 50, 226 [0033] 陰極燈絲：121，223, 233, 323, 333 [0034] 絕緣墊：122, 123 [0035] 放電室：130, 228 [0036] • [0037] 頂部磁極：1 60, 229 供氣管道：1 10, 2271 [0038] 本體：210, 310 [0039] 夾持臂：220, 230, 320, 330 [0040] 開口 ： 260 [0041] 陰極電極：250, 350 [0042] • [0043] 轉軸：240, 390, 340 夾持部：221, 231，321，331 [0044] 絕緣部：222, 232, 322, 332 [0045] Λ塊：224, 234, 324, 334 [0046] 燈絲彈_ : 2231，2331 [0047] 坩堝：2251 [0048] 布氣板：227 0951446#單編號 A〇101 1013173464-0 第11頁/共17頁The cathode material is excited to emit electrons. When the cathode filament is broken due to the thinning, the clamping arm can be switched by rotation to form an electrical circuit between the cathode and the anode, thereby ensuring that the ion source operates normally to avoid interruption of the film process. [Embodiment] The present invention will be further described in detail below with reference to the accompanying drawings. Referring to FIG. 2, the ion source 200 of the first embodiment of the present invention includes a body 210, clamping arms 220 and 230. The clamp arms 22, 23 are pivotally coupled to the body 210. The top of the body 210 is provided with an opening 260, and a cathode electrode 250 is disposed adjacent to the opening 260 at the top of the body 21''. In order to pivotally connect the clamping arms 220, 230 to the body 210, a pair of rotating shafts 240 may be disposed on a side wall adjacent to the top of the body 21'''''''''' Preferably, the axis of the rotating shaft 240 is in the same plane as the central axis of the cathode electrode 250. The cathode electrode 250 is two metal blocks, and the two metal blocks are oppositely disposed on both sides of the opening 206. The shape thereof may be any shape, such as a cylindrical shape. The yin 09514469# single number electrode electrode 250 material can be a conductive material such as steel, gold. Α0101 Page 5 of 17 1013173464-0 1376718 [0013] 1101.05.08. The clamping arm 22G includes a missing portion 221 and a connection with the clamping portion 221 Part 222. The clamp arm 230 includes a support portion 231 and an insulating portion 232 connected to the heat holding portion 231. The other ends of the clamping portions "I, 231 are respectively clamped with cathode filaments 223, 233. The other end of the insulating portions 222, 232 is pivotally connected to the body 21, that is, the other portions of the insulating portions 222, 232 One end is sleeved on the rotating shaft 24〇 and fixedly connected with the rotating shaft 24〇. Rotating the rotating shaft 240 can drive the clamping arms 220, 230 to rotate with the rotating shaft 240 as a fulcrum to thereby align the central holding arms 22, 23 The clamped cathode filaments m, 233 are switchably located at the opening 26 。. When one of the cathode filaments 223, 233 is located at the opening 26 ,, the clamping portion of the negative reading filament is clamped The cathode filament 25 is electrically connected to the cathode electrode 25, and the cathode filament is electrically connected to the cathode electrode 250. In order to position one of the cathode filaments 223, 233 at the position of the opening 260, the cathode filament is clamped. The portion can be electrically connected to the cathode electrode 25A, and the bumps 224, 234 can be respectively disposed on the clamping portions 221, 231 of the clamping arm 220' 230. When one of the cathode filaments 223, 233 is located in the One of the bumps 224, 2 34 when the opening 260 is in position In close contact with the cathode electrode 250, the cathode filaments 223, 233 are electrically connected to the cathode electrode 250. Typically, when the cathode electrode 250 is cylindrical, the & blocks 224, 234 are in contact with the metal block 250. The surface is preferably curved so that the bumps 224, 234 can form a tighter contact with the metal block 250 and can reduce the switching between the bumps 224, 234 and the metal block 250. The clamping portion 221, 231 can be made of a conductive material, such as copper, gold, etc. The insulating portions 222, 232 can be made of a non-conductive material, preferably Tao Yu et al 095U46# Single number face 1 Page 6 / Total 17 page 1013173464-0 1376718 year. May 08 'to prevent short circuit of the ion source 200. Preferably, a filament spring 2231 is wound around the cathode filament 223 ' 233, 2331, in order to increase the working area of the cathode filaments 223, 233, and further generate more electrons when the cathode filaments 223, 233 are excited. The cathode filaments 223, 233 and the filament springs 2231, 2331 can be made of crane Silk or boride [0015] s Qingyi for reference to FIG. 3 'the body 210 includes a discharge chamber 228; - a magnetic circuit 226 'the magnetic circuit 226 surrounds the discharge chamber 228; - a gas supply system (not labeled) 'for discharging The chamber 228 provides a working gas and a reactive gas; an anode 225 is disposed in the discharge chamber 228, and the anode 225 is disposed opposite the cathode electrode 250. [0016] When one of the clamping arms 220' 230 rotates with the rotating shaft 240 as a fulcrum such that one of the cathode filaments 223' 233 is located at the opening 26, the corresponding cathode filament forms an electrical connection with the anode 225. Loop. The magnetic circuit 226 is disposed around the inside of the body 210, and is generally composed of a back magnetic pole (not shown), a magnet (not shown), an outer magnet (not labeled), and a top magnet 229. The magnetic poles (not labeled), the body (not shown), the outer magnets (not shown), and the top magnet 229 of the magnetic circuit 226 form a magnetic field in the discharge chamber 228. The magnetic field can be generated in the discharge chamber 228 as shown by the dotted line in FIG. The magnetic field line [0018] The anode 225 may have a circular body structure, and a tapered groove is formed along a central axis thereof, and the diameter of the tapered groove gradually increases in a direction adjacent to the cathode electrode 25A. . The bottom of the tapered groove of the anode 225 is provided with a circular crucible 2251 which can hold a film. At the bottom of the anode 225 is set a gas plate 09514469# single number Α〇 101 page 7 / a total of 17 pages 1013173464-0 丄: May 08, 1101 correction replacement 227 the anode 225 through the bolt (not labeled) and the The air distribution plates 227 are connected. The air distribution plate 227 is provided with an air supply duct 2271 to constitute a gas supply system. When the ion source 200 is operated in a vacuum environment, the rotating shaft 240 is rotated to rotate the detent arm 220 with the rotating shaft 240 as a fulcrum, and the cathode filament 223 is placed at the opening 26〇 to form an electrical circuit with the anode 225. . The working gas and the reaction gas are respectively introduced into the discharge chamber 228 through the gas supply pipe 2271, and the working gas may be argon gas, and the reaction gas may be oxygen. The magnetic lines of force are emitted from the magnetic circuit 226 below the cathode filament 223 into the top magnetic pole 229. At the same time, a power source connected to the cathode electrode 25 is supplied to the cathode electrode 250, a negative potential element, and a cathode 225 is provided with a positive potential element. The cathode filament 223 is excited to emit electrons. Under the electric field of the discharge chamber 228, the cathode is A portion of the electrons emitted by the filament 223 migrate toward the anode 225 in the direction of the magnetic field line to collide with the gas atoms or molecules in the electric chamber 228 and ionize it. The electrons generated during the ionization process continue to migrate toward the anode 225, and the generated ions are accelerated by the electric field of the discharge cell 228, and after the partial electrons generated by the cathode filament 223 are neutralized, a plasma is formed from the ion source 20. Shoot out. A plasma beam with a certain energy can be directly bombarded by a substrate (not labeled) for pre-plating cleaning, or bombarded the surface of the substrate film to exchange energy with the surface atoms of the film to realize ion-assisted coating. _] when the cathode filament 223 is broken due to loss, the rotating shaft 24_ is rotated, and the clamping arm 220 is rotated with the rotating shaft 240 as a fulcrum, so that the bump is completely separated from the cathode electrode 25? The cathode filament m is removed from the position of the opening 260 described above. When the clamping arm 22〇, (10) is fixedly connected with the rotating shaft 24〇, rotating the rotating shaft 240 will drive the clamping arm 23〇 to the 0,914,469# single thief to delete 1 帛 8 pages / total 17 pages ' 1013173464-0 On 1st, 10th, and 10th, the correction of the rotation of the shaft 240 is performed as a pivot point, so that the clamping portion of the clamping arm 23, such as the clamped cathode filament 233, is placed at the position of the opening 26, the bump 224 and the After the cathode electrode 250 is completely separated, the bump appears to be in full contact with the cathode electrode 250 to cause the cathode filament 233 to form another electrical circuit with the anode milk. The cathode filament 233 at the position of the opening 260 is excited to emit electrons. Under the electric field of the discharge chamber 228, part of the electrons emitted from the step-down filament 233 migrate toward the anode m in the direction of the magnetic field line to collide with the gas atoms or molecules and ionize them. Upon ionization, the generated electrons continue to migrate toward the anode 225, and the generated ions will be accelerated under the action of the electric field of 228 to 'after neutralization with a portion of the electrons generated by the cathodic filament tearing'. The plasma is formed from the ion source. . In this process, after the cathode filament (2) on the lost arm 22 is disconnected, the rotating shaft 240 drives the illuminating arm 23 to rotate with the rotating shaft 240 as a fulcrum 'to make the bump 234 and the cathode The electrode 25() is in full contact so that the cathode filament 233 is excited to emit electrons' to ensure that the ion source operates normally without relieving the vacuum environment of the ion source 200. The cathode filament can be replaced after the key film is finished, for example, for the next use. [_ It can be understood that the above-mentioned ion source 2〇〇 may include two or more of the above-mentioned missing arms. The end of the insulating portion included in each of the clamping arms is connected to the body axis of the ion source, for example, the plural is clamped. One end of the insulating portion included in the arm is sleeved on the rotating shaft 240 and fixedly connected to the rotating shaft 24 . Rotating the rotating shaft 240 can simultaneously drive the plurality of clamping arms to rotate with the rotating shaft 240. The clamping portion included in one of the clamping arms is electrically connected with the cathode electrode, so that the cathode filament is excited to emit electrons. [0023] Please refer to FIG. 4, the first sound of the present invention, the ion source 3GG of the first embodiment of the present invention, and the above-mentioned present invention 09514469#, the first post, the first page, the first page, the first page, the first page, the first page, the first page, the first page 6718 1101. On May 08, the structure of the ion source 2A of the first embodiment is substantially the same 'the difference is that the two sides of the body 310 of the ion source 300 are provided with two pairs of rotating shafts; the ion source 300 has The holding arms 320, 330, the clamping portions 321 ' 331 of the clamping arms 32 0, 330 can be respectively provided with bumps 324, 334, and the clamping arms 320 330 respectively sleeve the insulating portions 322, 332 thereof Fixedly connected to the corresponding rotating shafts 390, 340, the rotating rotating shafts 390, 340 respectively drive the clamping arms connected to the shaft to rotate with their respective rotating shafts 390, 340 as fulcrums to make the bumps 324, 334 with different extension lengths The cathode electrode 350 is in close contact so that the cathode filaments 323, 333 are electrically connected to the cathode electrode 35A. When the cathode filament 323 clamped by the clamping portion 321 of the clamping arm 320 is disconnected, the rotating shaft 34 is rotated to electrically connect the cathode filament 333 with the cathode electrode 350, so that the cathode filament 333 can be excited to emit electrons. Make sure the ion source 2 is functioning properly. [0024] In summary, the present invention complies with the requirements of the invention patent, and submits a patent application according to law. However, the above-mentioned embodiments are merely preferred embodiments of the present invention, and equivalent modifications or variations made by those skilled in the art of the present invention should be included in the following claims. BRIEF DESCRIPTION OF THE DRAWINGS [0029] FIG. 1 is a schematic cross-sectional view of an ion source of the prior art. 2 is a schematic perspective view showing the structure of an ion source according to a first embodiment of the present invention. Figure 3 is a schematic cross-sectional view taken along line 111-111 of Figure 2. 4 is a schematic perspective view showing the structure of an ion source according to a second embodiment of the present invention. [Explanation of main component symbols] Ion source: 1 00, 200, 300 〇 9514469 Production order number A0101 Page 10 / Total 17 pages 1013173464-0 1376718 101. May 08 nuclear replacement 100 [0030] Cathode: 120 [0031] Anode: 140, 225 [0032] Magnetic circuit: 1 50, 226 [0033] Cathode filament: 121, 223, 233, 323, 333 [0034] Insulation pad: 122, 123 [0035] Discharge chamber: 130 , 228 [0036] • [0037] Top magnetic pole: 1 60, 229 Air supply duct: 1 10, 2271 [0038] Body: 210, 310 [0039] Clamping arm: 220, 230, 320, 330 [0040] Opening : 260 [0041] Cathode electrode: 250, 350 [0042] • [0043] Shaft: 240, 390, 340 Grip: 221, 231, 321, 331 [0044] Insulation: 222, 232, 322, 332 [ 0045] Λ block: 224, 234, 324, 334 [0046] Filament _ _ 2231, 2331 [0047] 坩埚: 2251 [0048] Air plate: 227 0951446 #单号A〇101 1013173464-0 Page 11 / Total 17 pages