TWI374092B - Substrate with hydrophobic surface and manufacturing method thereof - Google Patents

Description

1374092

* ' TW5146PA VI. EMBODIMENT OF THE INVENTION: TECHNICAL FIELD The present invention relates to a substrate having a hydrophobic surface and a method of manufacturing the same, and in particular to a method of attaching an organic broken group to a hydrophobic surface thereof. Substrate and method of manufacturing the same. [Prior Art] In order to avoid the occurrence of φ in the microstructure on the surface of the substrate of the MEMS device, the surface of the substrate is often subjected to hydrophobic treatment. In the general hydrophobic treatment, the substrate is first oxidized with hydrogen peroxide (H2〇2) to form a hydroxyl group on the surface of the substrate. Then, the hydrophobic molecule, for example, 1H, 1H, 2H, 2H-perfluorodecyl tricholorsilane (FDTS), whose chemical formula is (CF3(CF2)7(CH2)2SiCh), is dehydrated and condensed with hydroxyl groups. The assembled layer film is formed on the substrate. However, by-products such as hydrochloric acid (HC1) are usually derived during the above-mentioned treatment. Since the FDTS is a gas-containing organic ruthenium compound, the chlorophene ion of the FDTS is removed and the hydrogen ion of the hydroxy group is also removed, and the removed gas ion combines with the removed hydrogen ion to form hydrogen chloride, that is, hydrochloric acid. Such by-products can etch the substrate and the metal on the substrate, such as pads on the substrate. The smear of oxidizing the substrate with Wei water produces foam which also damages the substrate. Further, a solvent which is compatible with a conventional hydrophobic molecule such as Cong is a Issin_〇ctane. Isooctane is a flammable substance that is easily heated, sparked, and coated with isooctane.

Claims (1)

1374092 Announcement 101, August 24, φ positive replacement page 2012/8/24_lsl Shen Fu & Amendment VII, patent application scope: 1. A substrate having a hydrophobic surface, comprising: a substrate, a substrate surface a substrate having a plurality of oxy groups, wherein the substrate is a microstructure of a microelectromechanical system, and a hydrophobic group bonded to the oxy group, and the hydrophobic group is an organic ruthenium compound and a The hydrophobic compound is formed by a reaction. 2. The substrate of claim 1, wherein the substrate surface is a flat surface. 3. A substrate having a hydrophobic surface, comprising: a substrate having a plurality of oxy groups on a surface thereof, wherein the substrate is a microstructure of a microelectromechanical system; and a hydrophobic group And the hydrophobic group is formed by reacting an organic hydrazine compound with a hydrophobic compound; wherein the organic hydrazine compound is 3-aminopropyltriethoxy decane (3-(aminopropyl) Triethoxysilane), APTES)' has the following chemical formula: 098103421 A ch3 Nh2 1013323642-0 19 Ι374Ό92 _ . . 110 Ϊ 08 08 08 08 08 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 Monoglycidyl ether-terminated PDMS (MGE-PDMS), the chemical formula of which is H3C, Si-〇/ch3 ch3 ch3 Si o ch3 Si n CH3 A, and the chemical formula of the hydrophobic group is as follows: The substrate of the third aspect of the invention, wherein the surface of the substrate is a flat surface. 5. A substrate having a hydrophobic surface, comprising: a substrate having a plurality of oxy groups on a surface thereof, wherein the substrate is a micro-electromechanical micro-structured substrate, and a hydrophobic group The group 'is combined with the oxy group, and the hydrophobic group is formed by reacting an organic hydrazine compound with a hydrophobic compound; wherein the organic cerium compound is 7-methylpropionate oxypropyltrimethoxy R_Methacryloxypropyltrimethoxysilane (MPTMS), its chemical formula is as follows: 09S103421 1013323642-0 • - ·. · · ·. 20 1374092 101.08. Z4 day f replacement page 2012/8/24_lsl Shen Fu & Amendment And the hydrophobic compound is 1 Η, 1 Η, 2H-perfluoro-1 - 癸 (lH, 1H, 2H-heptadecafluoro-l-decene, HDFD), its chemistry (CF2) 7CF3 is as follows, and the chemical formula of the hydrophobic group is as follows: (CF2)vCF3 (CF2) 7CF3 V. c. The substrate of claim 5, wherein the substrate 098103421 1013323642-0 21 1374092 has a flat surface. 2012/8/24_ 丨》申胃&_1£ 7. A method of manufacturing a substrate having a hydrophobic surface, comprising: providing a substrate, wherein the substrate is a microstructured substrate of a microelectromechanical system; Oxidizing a surface of the substrate of the substrate such that a plurality of hydroxyl groups are formed on the surface of the substrate; preparing a first organic solution whose solute is a plurality of organic cerium compounds; preparing a second organic solution having a solute of a plurality of hydrophobic compounds; after the oxidizing step, immersing the substrate in the first organic solution, the substrate is subjected to a silanization reaction with the organic cerium compounds; and the cerium alkylation After the reaction, the substrate is immersed in the second organic solution. The hydrophobic compounds are chemically reacted with the organic ruthenium compounds after the oximation reaction, so that the hydrophobic compounds are combined. The ruthenium is alkylated to the organic ruthenium compound to form a hydrophobic group. 8. The method of manufacture of claim 7, wherein the oxidizing step is performed in a plasma. 9. The manufacturing method according to claim 7, wherein the solvent of the first organic solution is isopropanol (2-propano 1), ethanol or water. 10. A method of manufacturing a substrate having a hydrophobic surface, comprising: providing a substrate, wherein the substrate is a micro-electromechanical system microstructure 098103421 1013323642-0 22 1374092 -, August 24, 2011 Replacement page 2012/8/24_lsl Application & Correcting substrate; oxidizing one surface of the substrate to form a plurality of hydroxyl groups on the surface of the substrate; preparing a first organic solution having a solute of plural a second organic solution, the solute is a plurality of MGE-PDMS; after the oxidation step, the substrate is immersed in the first organic solution, and the hydroxyl groups are alkylated with the APTES. a silanization reaction; and after immersing the oxime alkylation reaction, the substrate is immersed in the second organic solution, and the MGE-PDMS is subjected to a ring of the APTES after the oximation reaction is completed. The Epoxy-amine reaction' binds the MGE-PDMS to the APTES after the oximation reaction to form a hydrophobic group. 11. The method of manufacture of claim 1, wherein the step of oxidizing is completed by electropolymerization. 12. The method of manufacture of claim 1, wherein the first organic night solvent is isopropanol or ethanol. 13. The method of manufacture of claim 1, wherein the substrate surface is a flat surface. 14. A method of fabricating a substrate having a hydrophobic surface, comprising: providing a substrate, wherein the substrate is a microstructure of a microelectromechanical system; oxidizing a substrate surface of the substrate to cause the substrate The surface of the material is formed with a plurality of hydroxyl groups; 098103421 1013323642-0 23 August 24, 2011 Shuttle replacement page < 1 ' _ - — .. I 2012/8/24_lsl Application & a solution whose solute is a plurality of MPTMS; a second organic solution having a solute of a plurality of HDFDs; after the oxidizing step, immersing the substrate in the first organic solution, the hydroquinones and the MPTMS Performing a monoalkylation reaction; after the oximation reaction, the substrate is immersed in the second organic solution; providing a photoinitiator to the second organic solution; and irradiating the second organic with an ultraviolet light The solution is subjected to photopolymerization of the HDFDs to each other to bind the HDFDs to the MPTMS after the oximation reaction to form a hydrophobic group. The production method according to claim 14, wherein the photoinitiator is α,α-Dimethoxy-α-phenylacetophenone. 16. The method of manufacture of claim 14, wherein the oxidizing step is performed in a plasma. 17. The manufacturing method according to claim 14, wherein the solvent of the first organic solution is ethanol or water. 18. The method of manufacturing of claim 14, wherein the surface of the substrate is a flat surface. 19. A method of fabricating a substrate having a hydrophobic surface, comprising: providing a substrate, wherein the substrate is a microstructured substrate of a microelectromechanical system; oxidizing a substrate surface of the substrate to cause the substrate The surface of the material is formed with a plurality of hydroxyl groups; 24 098103421 · 1013323 wearing 42-0 1374092 -... August 24, 2014 f replacement page 2012/8/24_P Shen Fu & revised preparation of a first organic solution, its solute a plurality of MPTMS; a second organic solution having a solute of a plurality of HDFDs; after the oxidizing step, immersing the substrate in the first organic solution, the hydroxyl groups and the MPTMS are monoalkyl a reaction; providing a hot starter to the second organic solution; and heating the second organic solution to cause the HDFDs to undergo a thermal polymerization reaction with each other to bind the HDFDs to the completion of the oxime alkylation reaction These MPTMS are 'onto form a hydrophobic group. 20. The method of manufacture of claim 19, wherein the hot starter is Lauroyl peroxide. The manufacturing method according to claim 19, wherein the oxidizing step is performed by an electric pulsation. 22. The manufacturing method according to claim 19, wherein the solvent of the first organic solution is ethanol or water. 23. The method of manufacture of claim 5, wherein the substrate surface is a flat surface. 24. A method of fabricating a substrate having a hydrophobic surface, comprising: providing a substrate, wherein the substrate is a microstructured substrate of a microelectromechanical system; and oxidizing a substrate of the substrate by a plasma a surface such that a plurality of hydroxyl groups are formed on the surface of the substrate; and after the oxidizing step, the substrate is immersed in a third organic solution, the solute of which is a plurality of hydrophobic compounds, and the hydrophobic compound is The hydroxyl group reacts to form a hydrophobic group. 098103421 1013323642-0 25 08 替换 替换 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 25 1H, 2H, 2H-perfluoroheptadecane trimethyl oxysulfide (ΙΗ, ΙΗ, 2H, 2H-perfluorodecyltriethoxysilane (CF3(CF2)7(CH2)2Si(0CH2CH3)3), FDTES). 26. The manufacturing method of claim 24, wherein between the step of providing the substrate and the oxidizing step, the manufacturing method further comprises: immersing the substrate in an isopropanol solution; The substrate is dried by air. 27. The method of claim 24, wherein the oxidizing step is between the step of immersing the substrate in the third organic solution, the method further comprising: immersing the substrate in a different a propanol solution; and immersing the substrate in an Iso-octane solution. 28. The method of claim 24, wherein after the step of immersing the substrate in the third organic solution, the manufacturing method further comprises: immersing the substrate in an isooctane solution; The substrate was immersed in a solution of isopropanol. 29. The method of manufacturing of claim 24, wherein the surface of the substrate is a flat surface. 098103421 1013323642-0 26