TW201029848A - Substrate with hydrophobic surface and manufacturing method thereof - Google Patents

Substrate with hydrophobic surface and manufacturing method thereof Download PDF

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TW201029848A
TW201029848A TW98103421A TW98103421A TW201029848A TW 201029848 A TW201029848 A TW 201029848A TW 98103421 A TW98103421 A TW 98103421A TW 98103421 A TW98103421 A TW 98103421A TW 201029848 A TW201029848 A TW 201029848A
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substrate
hydrophobic
organic solution
manufacturing
reaction
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TW98103421A
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TWI374092B (en
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Shu-Hui Chen
Huang-Han Chen
Ya-Yu Hsieh
Meng-Jen Wang
Kuo-Pin Yang
Wei-Chung Wang
Yu-Ting Li
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Advanced Semiconductor Eng
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Abstract

A substrate with hydrophobic surface and a manufacturing method thereof are provided. The substrate includes a base and a hydrophobic group. The surface of the base has many oxygen groups. The hydrophobic group formed by an organo silicone compound reacted with oxygen groups and a hydrophobic compound is combined with the oxygen groups.

Description

201029848 六、發明說明: 【發明所屬之技術領域】 本發明是有關於1具有疏水性表面之基板及其製 造方法’且特別是有關於一種其疏水性表面上附著有機矽 基團的基板及其製造方法。 【先前技術】 為了避免微機電裝置之基材表面上之微結構發生附 φ著現象,基材表面常會進行疏水性處理。 一般疏水性處理過程中,會以雙氧水(H2〇2)先將基材 氧化,使基材表面形成有氫氧基。然後,再將疏水性分子, 例如是 1H,1H,2H,2H~perfiuorodecyl1:rich〇i〇rsiiane (FDTS),其化學式為(CF3(CF2MCH2)2SiCl3)與氫氧基進 行脫水縮合反應,使FDTS自組裝層膜形成在基材上。 然而’在上述的處理過程中,通常會衍生鹽酸(HC1) 等副產物。因為FDTS為含氯的有機矽化合物,FDTS的氯 ❹離子會脫去而氫氧基的氫離子亦會脫去,脫去的氣離子與 脫去的氫離子結合形成氯化氫’即鹽酸。此類副產物會腐 蝕基材及基材上的金屬,例如是基材上的接墊(Pad)等。 此外,在以雙氧水氧化基材的過程中會產生泡沫,此 泡沫也會傷害基材。另外’與習知的疏水性分子,例如是 FDTS搭配的溶劑為異辛烧(is〇_〇ctane)。異辛烧是一種 易燃的物質,易被熱、火花、火焰所點燃。並且,異辛烷 有毒’若吸入或經由皮膚吸收可能會造成人體中毒,若處 理不當而流入環境中,則必然對環境造成危害。 201029848 夏 w 【發明内容】 本發明係有關於一種具有疏水性表面之基板及其製 造方法,係透過一包含碳、氫離去基,例如是乙氧基 (-OCHWH3)的有機>5夕化合物與基材之氫氧基反應結合, 其副產物為醇類,例如是乙酵(C2H5〇H )。此類副產物不管 是對基材、環境或人體的傷害都甚低。然後,再以一疏水 性化合物與結合至基材的有機化合物反應,以形成一疏水 性基團。 根據本發明之第一方面’提出一種具有疏水性表面之 基板。基板包括一基材及一疏水性基團。基材之基材表面 具有數個氧基。氧基係與一疏水性基團結合,而疏水性基 團為一有機矽化合物與一疏水性化合物反應所形成。 根據本發明之第二方面,提出一種具有疏水性表面之 基板。基板包括一基材及一疏水性基團。基材之基材表面 具有數個氧基。氧基係與一疏水性基困結合,而疏水性基 困為一有機矽化合物與一疏水性化合物反應所形成。其 中’有機妙化合物為 3-(aminopropyl triethoxysilane) (APTES),其化學式如下:201029848 6. Technical Field of the Invention The present invention relates to a substrate having a hydrophobic surface and a method of manufacturing the same, and more particularly to a substrate having an organic ruthenium group attached to its hydrophobic surface and Production method. [Prior Art] In order to avoid the phenomenon of the microstructure on the surface of the substrate of the microelectromechanical device, the surface of the substrate is often subjected to hydrophobic treatment. In the general hydrophobic treatment, the substrate is first oxidized with hydrogen peroxide (H2〇2) to form a hydroxyl group on the surface of the substrate. Then, a hydrophobic molecule such as 1H, 1H, 2H, 2H~perfiuorodecyl1:rich〇i〇rsiiane (FDTS), which has a chemical formula of (CF3(CF2MCH2)2SiCl3) and a hydroxyl group, is subjected to dehydration condensation reaction to make FDTS A self-assembled layer film is formed on the substrate. However, by-products such as hydrochloric acid (HC1) are usually derived during the above treatment. Since the FDTS is a chlorine-containing organic ruthenium compound, the chloroquinone ion of the FDTS is removed and the hydrogen ion of the hydroxyl group is also removed, and the removed gas ion combines with the removed hydrogen ion to form hydrogen chloride, i.e., hydrochloric acid. Such by-products can etch the substrate and the metal on the substrate, such as pads on the substrate. In addition, foam is generated during the oxidation of the substrate with hydrogen peroxide, which also damages the substrate. Further, the solvent associated with a conventional hydrophobic molecule such as FDTS is isoindole (is〇_〇ctane). Isoxin is a flammable substance that is easily ignited by heat, sparks and flames. Also, isooctane is toxic. If inhaled or absorbed through the skin, it may cause poisoning to the human body. If it is handled improperly, it will inevitably harm the environment. The present invention relates to a substrate having a hydrophobic surface and a method for producing the same, which is through an organic group containing carbon and hydrogen leaving groups such as ethoxy (-OCHWH3) The compound is combined with the hydroxyl group of the substrate, and its by-product is an alcohol such as ethyl lactate (C2H5〇H). Such by-products have very little damage to the substrate, the environment or the human body. Then, a hydrophobic compound is reacted with an organic compound bonded to the substrate to form a hydrophobic group. According to a first aspect of the invention, a substrate having a hydrophobic surface is proposed. The substrate includes a substrate and a hydrophobic group. The surface of the substrate of the substrate has a plurality of oxy groups. The oxy group is bonded to a hydrophobic group, and the hydrophobic group is formed by reacting an organic hydrazine compound with a hydrophobic compound. According to a second aspect of the invention, a substrate having a hydrophobic surface is provided. The substrate includes a substrate and a hydrophobic group. The surface of the substrate of the substrate has a plurality of oxy groups. The oxy group is bonded to a hydrophobic group, and the hydrophobic group is formed by reacting an organic hydrazine compound with a hydrophobic compound. Among them, the 'organic compound is 3-(aminopropyl triethoxysilane) (APTES), and its chemical formula is as follows:

ch3Ch3

4 2 201029848 X VT l^VX ΓΛ. ,而疏水性化合物為 Monoglycidyl ether-terminated PDMS ( MGE-PDMS ),其化學式如下··4 2 201029848 X VT l^VX ΓΛ. , and the hydrophobic compound is Monoglycidyl ether-terminated PDMS ( MGE-PDMS ), the chemical formula is as follows ·

H3CH3C

ch3Ch3

n CH3n CH3

,而疏水性基團之其化學式如下:And the chemical formula of the hydrophobic group is as follows:

根據本發明之第三方面,提出一種具有疏水性表面之 基板。基板包括一基材及一疏水性基團。基材之基材表面 ⑩具有數個氧基。氧基係與一疏水性基困結合’而疏水性基 團為一有機矽化合物與一疏水性化合物反應所形成。其 中,有機矽化合物為r -Methacryloxypropyltrimethoxysilane (MPTMS),其化 學式如下: 5 201029848 1 w j mum CH,According to a third aspect of the invention, a substrate having a hydrophobic surface is provided. The substrate includes a substrate and a hydrophobic group. The substrate surface 10 of the substrate has a plurality of oxy groups. The oxy group is bonded to a hydrophobic group and the hydrophobic group is formed by reacting an organic hydrazine compound with a hydrophobic compound. Among them, the organic ruthenium compound is r -Methacryloxypropyltrimethoxysilane (MPTMS), and its chemical formula is as follows: 5 201029848 1 w j mum CH,

尸ch2 ch3 ,而疏水性化合物為 lH,lH,2H-hep1:adecafluor〇-l-decene (HDFD),其化學式 如下: ^^CH2 (CF2)7CF3 ,而疏水性基團之其化學式如下: _α o ( cf2)7cf3 / ch3The body is ch2 ch3, and the hydrophobic compound is lH, lH, 2H-hep1: adecafluor〇-l-decene (HDFD), and its chemical formula is as follows: ^^CH2 (CF2)7CF3, and the chemical formula of the hydrophobic group is as follows: _α o ( cf2)7cf3 / ch3

(CF2)7CF3 根據本發明之第四方面,提出一種具有疏水性表面之 基板之製造方法。製造方法包括以下步驟。提供一基材; 氧化基材之一基材表面,以使基材表面形成有數個氩氧 201029848 X VT *τν»χ Λ. 基;配製一第一有機溶液,其溶質為數個有機矽化合物; 配製一第二有機溶液,其溶質為數個疏水性化合物;於氧 化步驟之後,將基材浸入第一有機溶液中,基材與有機矽 化合物進行一珍烧基化反應(Silanization reaction); 以及於矽垸基化反應之後,將基材浸入第二有機溶液中, 疏水性化合物與進行完矽烷基化反應後之有機矽化合物 進行一化學反應’使疏水性化合物結合至進行完矽烷基化 反應後之有機破化合物上,以形成一疏水性基團。 φ 根據本發明之第五方面,提出一種具有疏水性表面之(CF2) 7CF3 According to a fourth aspect of the present invention, a method of manufacturing a substrate having a hydrophobic surface is proposed. The manufacturing method includes the following steps. Providing a substrate; oxidizing one surface of the substrate to form a plurality of argon oxygen 201029848 X VT *τν»χ 基. base; preparing a first organic solution, the solute of which is a plurality of organic bismuth compounds; Forming a second organic solution having a solute of a plurality of hydrophobic compounds; after the oxidizing step, immersing the substrate in the first organic solution, and performing a Silanization reaction on the substrate and the organic ruthenium compound; After the thiolation reaction, the substrate is immersed in the second organic solution, and the hydrophobic compound is chemically reacted with the organic hydrazine compound after the hydrazine alkylation reaction to bind the hydrophobic compound to the hydrazine alkylation reaction. The organic compound is broken to form a hydrophobic group. According to the fifth aspect of the invention, a hydrophobic surface is proposed

基板之製造方法。製造方法包括以下步驟。提供一基材; 氧化基材之一基材表面’以使基材表面形成有數個氫氧 基;配製一第一有機溶液’其溶質為數個APTES ;配製一 第二有機溶液,其溶質為數個MGE-PDMS ;於氧化步驟之 後,將基材浸入第一有機溶液中,氫氧基與APTES進行梦 烧基化反應;以及於碎烧基化反應之後,將基材浸入第二 有機溶液中,MGE-PDMS與進行完矽烷基化反應後之APTES ❿進行一環氧胺化反應(Epoxy-amine reaction),使 MGE-PDMS結合至進行完矽烷基化反應後之ApTES上,以形 成一疏水性基團。 根據本發明之第六方面,提出一種具有疏水性表面之 基板之製造方法。製造方法包括以下步驟。提供一基材; 氧化基材之一基材表面,以使基材表面形成有數個氫氧 基;配製一第一有機溶液,其溶質為數個MpTMS;配製一 第二有機溶液,其溶質為數個HDFD ;於氧化步驟之後將 7 201029848 A V¥ 1TV1 1-%. 基材浸入第一有機溶液中,氫氧基與MPTMS進行一梦烷基 化反應;於發燒基化反應之後’將基材浸入第二有機溶液 中;提供一光起始劑至第二有機溶液;以及以一紫外光照A method of manufacturing a substrate. The manufacturing method includes the following steps. Providing a substrate; oxidizing one of the substrate surfaces to form a plurality of hydroxyl groups on the surface of the substrate; preparing a first organic solution having a solute of several APTES; preparing a second organic solution having a plurality of solute MGE-PDMS; after the oxidation step, the substrate is immersed in the first organic solution, the hydroxyl group is subjected to a dream alkylation reaction with the APTES; and after the calcination reaction, the substrate is immersed in the second organic solution, MGE-PDMS is subjected to an Epoxy-amine reaction with APTES(R) after completion of the oximation reaction, and MGE-PDMS is bonded to ApTES after completion of the oximation reaction to form a hydrophobicity. Group. According to a sixth aspect of the invention, a method of manufacturing a substrate having a hydrophobic surface is provided. The manufacturing method includes the following steps. Providing a substrate; oxidizing one surface of the substrate to form a plurality of hydroxyl groups on the surface of the substrate; preparing a first organic solution having a solute of several MpTMS; preparing a second organic solution having a plurality of solute HDFD; after the oxidation step, 7 201029848 AV ¥ 1TV1 1-%. The substrate is immersed in the first organic solution, and the hydroxyl group is subjected to a dream alkylation reaction with MPTMS; after the calcination reaction, the substrate is immersed in the first step. In a second organic solution; providing a photoinitiator to the second organic solution; and using an ultraviolet light

射第一有機溶液’使HDFD彼此進行一光聚合反應以使JJDFD 結合至進行完矽烷基化反應後之MPTMS上,以形成一疏水 性基團。 根據本發明之第七方面,提出一種具有疏水性表面之 基板之製造方法。製造方法包括以下步驟,提供一基材; 氧化基材之一基材表面,以使基材表面形成有數個氫氧 基,配製一第一有機溶液,其溶質為數個MpTMS ;配製一 第二有機溶液,其溶質為數個HDFD;於氧化步驟之後,將 基材浸入第一有機溶液中,氫氧基與MPTMS進行一石夕烷基 化反應;提供一熱起始劑至第二有機溶液;以及加熱第二 有機溶液,使疏水性化合物彼此進行一熱聚合反應以使疏 水陡化α物結合至進行完碎烷基化反應後之有機石夕化合 物上,以形成一疏水性基團。 根據本發明之第八方面,提出一種具有疏水性表面之 基板之製造方法。製造方法包括以下步驟。提供一基材; 以一f漿,氧化基材之一基材表面,以使基材表面形成有 數個氫氧基;以及於氧化步驟之後,將基材浸入一第三有 機溶液,其溶質為數個疏水性化合物,使疏水性化合物與 氫氧基反應而形成一疏水性基團。 為讓本發明之上述内容能更明顯易懂,下文特舉較佳 實施例’並配合所附圖式,作詳細說明如下: 201029848 【實施方式】 在本發明之具有疏水性表面之基板及其製造方法 中’係透過-包含碳、氫之離去基,例如是乙氧基的有機 矽化合物與基材之氫氧基結合,其產生的副產物為醇類, 例如是乙醇《此類副產物不管是對基材、環境或人體的傷 害都甚低。底下以四個應用實例來作說明。然此些實施例 僅為本發明之發明精神下的幾種實施方式,其說明之文字 與圖示並不會對本發明之欲保護範圍進行限縮。 第一實施例 請參照第1圖,其繪示依照本發明第一實施例之具有 疏水性表面之基板示意圖。基板100包括一基材1〇2及一 疏水性基團104,其中基材1〇2例如是一微機電系統 (microelectric machanic system,MEMS)之微結構的 基材。基材102之基材表面1〇6具有數個氧基1〇8,其中 基材表面106可為一平面。疏水性基團1〇4與氧基1〇8結 ❹合在一起,疏水性基團104為一有機矽化合物,例如是 3-(aminopropyl triethoxysilane) (APTES)與一疏水性 化合物,例如是 Monoglycidyl ether-terminated PMS (MGE-PDMS)反應而形成》以下將介紹本實施例之基板100 的製造方法。請參照第2圖,其繪示依照本發明第一實施 例之具有疏水性表面之基板的製造方法流程圖。請同時參 照第3A圖,其繪示第一實施例之基材之示意圖。於步驟 S202中,提供基材1〇2。 9 201029848 λ w χ-τνι η. 接著’請同時參照第3B圖,其繪示第3A圖之基材形 成有數個氫氧基之示意圖。於步驟S204中’氧化基材102 之基材表面106 ’以使基材表面106形成有數個氫氧基 U0。其中’氧化步驟可以一電漿氧化技術完成在電漿 氧化過程中’並不會產生如習知技術般會傷害基材的泡 洙。此外’電漿處理的技術簡單,成本低廉,處理過程不需 大量/谷劑’對環境不會造成污染,且又快速而有效率。 第3B圖雖然只繪示三個氫氧基,然熟知此技術領域 者應當明暸’第3A圖之基材的氫氧基也可以是三個以上, 為了不使圖示過於紊亂’故第3B圖僅繪示三個氫氧基11〇。 再來,於步驟S206中,配製一第一有機溶液(未繪 示)’其溶劑為異丙醇(2-pr〇pan〇i )或乙醇,而其溶質 為數個 3-(aminopropyl triethoxysilane) (APTES)。 然後,於步驟S208中,配製一第二有機溶液(未繪 示),其溶劑較佳地為高沸點的有機溶劑,而其溶質為數 個 Monoglycidyl ether-terminated PDMS (MGE-PDMS)。 然後’請同時參照第3C圖,其繪示第一實施例之 APTES結合至第3B圖之基材之示意圖。於步驟S210中, 將基材102浸入第一有機溶液中,氫氧基11〇與aptes進 行一矽烷基化反應。在本步驟中,APTES在脫去乙氧基, 而基材102之氫氧基no在脫去氫後,兩者即結合在— 起,如第3C圖所示。而氫氧基110在脫去氫後成為氧基 108。另外,本步驟所產生的副產物為醇類,例如是乙醇。 此類副產物不管是對基材、環境或人體的傷害都甚低。 然後,於步驟S212中,於矽烷基化反應之後,將基 材102浸入第二有機溶液中並對第二有機溶液與基材1〇2 加熱。此時’ MGE-PDMS與進行完矽烷基化反應後之APTES 進行一環氧胺化反應,使MGE-PDMS結合至進行完發烧基 化反應後之APTES上,如此’便形成了如第1圖所示之疏 水性基團104。在本步驟中’ MGE-PDMS之環氧基在開環後 與第3C圖之胺基(-NH2)結合。至此,完成如第1圖所示 之基板100。此外,第1圖中突出於基材1〇2之部分為一 0 碳氫鍵。由於碳氫鏈具有疏水性’故本實施例之基板100 為一具有疏水特性之基板。 本實施例之疏水性基團為兩種化合物,即APTES與 MGE-PDMS兩種反應而形成的雙層結構。並且,本實施例並 未產生如鹽酸等有害環境、人體及基材的副產物,所以本 實施例之基板100的製造方法,為可輕易符合環保、安衛 要求的製程方法。 ❿第二實施例 本發明之疏水性基團之結構還可為其它不同之結 構,非限於第一實施例之疏水性基團104之結構。請參照 第4圖,其繪示依照本發明第二實施例之具有疏水性表面 之基板示意圖。第二實施例與第一實施例不同之處在於, 疏水性基團204之結構由另一種有機矽化合物,例如是r -Methacryloxypropyl trimethoxysi lane(MPTMS)及另一 種疏水性化合物,例如是 11 201029848The first organic solution was injected to cause the HDFD to undergo a photopolymerization reaction with each other to bind the JJDFD to the MPTMS after the completion of the oximation reaction to form a hydrophobic group. According to a seventh aspect of the present invention, a method of manufacturing a substrate having a hydrophobic surface is proposed. The manufacturing method comprises the steps of: providing a substrate; oxidizing one surface of the substrate to form a plurality of hydroxyl groups on the surface of the substrate, preparing a first organic solution, the solute is a plurality of MpTMS; preparing a second organic a solution whose solute is several HDFDs; after the oxidation step, the substrate is immersed in the first organic solution, the hydroxyl group is subjected to a rock alkylation reaction with MPTMS; a hot initiator is supplied to the second organic solution; The second organic solution is subjected to a thermal polymerization reaction of the hydrophobic compounds to each other to bind the hydrophobic steeping α to the organolithium compound after the completion of the fragmentation reaction to form a hydrophobic group. According to an eighth aspect of the invention, a method of manufacturing a substrate having a hydrophobic surface is provided. The manufacturing method includes the following steps. Providing a substrate; oxidizing one surface of the substrate to a surface of the substrate to form a plurality of hydroxyl groups; and after the oxidizing step, immersing the substrate in a third organic solution, the solute is Hydrophobic compounds react a hydrophobic compound with a hydroxyl group to form a hydrophobic group. In order to make the above description of the present invention more comprehensible, the following detailed description of the preferred embodiment of the present invention will be described in detail as follows: 201029848 [Embodiment] The substrate having a hydrophobic surface of the present invention and In the manufacturing method, 'the permeation-containing leaving group of carbon and hydrogen, for example, an organic hydrazine compound of an ethoxy group is bonded to a hydroxyl group of a substrate, and the by-product produced is an alcohol, such as ethanol. The product is very low in damage to the substrate, the environment or the human body. The following is an example of four application examples. However, the embodiments are merely illustrative of several embodiments of the invention, and the description and illustration are not intended to limit the scope of the invention. First Embodiment Referring to Figure 1, there is shown a schematic view of a substrate having a hydrophobic surface in accordance with a first embodiment of the present invention. The substrate 100 includes a substrate 1〇2 and a hydrophobic group 104, wherein the substrate 1〇2 is, for example, a micro-matrix system (MEMS) microstructure substrate. The substrate surface 1〇6 of the substrate 102 has a plurality of oxy groups 1〇8, wherein the substrate surface 106 can be a flat surface. The hydrophobic group 1〇4 is bonded to the oxy group 1-8, and the hydrophobic group 104 is an organic hydrazine compound such as 3-(aminopropyl triethoxysilane) (APTES) and a hydrophobic compound such as Monoglycidyl. Ether-terminated PMS (MGE-PDMS) Reaction Formation The following describes a method of manufacturing the substrate 100 of the present embodiment. Referring to Figure 2, there is shown a flow chart of a method of fabricating a substrate having a hydrophobic surface in accordance with a first embodiment of the present invention. Please also refer to Fig. 3A, which shows a schematic view of the substrate of the first embodiment. In step S202, a substrate 1〇2 is provided. 9 201029848 λ w χ-τνι η. Next, please refer to Fig. 3B, which shows a schematic diagram of the formation of a plurality of hydroxyl groups on the substrate of Fig. 3A. The substrate surface 106' of the substrate 102 is oxidized in step S204 such that the substrate surface 106 is formed with a plurality of hydroxyl groups U0. Where the 'oxidation step can be accomplished by a plasma oxidation technique during the plasma oxidation process' does not result in a bubble that would damage the substrate as is conventional. In addition, the technology of plasma treatment is simple, the cost is low, and the treatment process does not require a large amount of/grain to cause pollution to the environment, and is fast and efficient. Although only three hydroxyl groups are shown in FIG. 3B, it should be understood by those skilled in the art that the base material of the 3A drawing may have three or more hydroxyl groups, and in order not to make the illustration too turbulent, the third The figure only shows three hydroxyl groups 11 〇. Then, in step S206, a first organic solution (not shown) is prepared, wherein the solvent is isopropanol (2-pr〇pan〇i) or ethanol, and the solute thereof is a plurality of 3-(aminopropyl triethoxysilane) ( APTES). Then, in step S208, a second organic solution (not shown) is prepared, the solvent of which is preferably a high boiling organic solvent, and the solute thereof is a plurality of Monoglycidyl ether-terminated PDMS (MGE-PDMS). Then, please refer to FIG. 3C, which shows a schematic diagram of the APTES of the first embodiment bonded to the substrate of FIG. 3B. In step S210, the substrate 102 is immersed in the first organic solution, and the hydroxyl group 11〇 is subjected to a monoalkylation reaction with aptes. In this step, the APTES is de- ethoxylated, and the hydroxyl no of the substrate 102 is dehydrogenated, and the two are combined, as shown in Figure 3C. The hydroxyl group 110 becomes an oxy group 108 after dehydrogenation. Further, the by-product produced in this step is an alcohol such as ethanol. Such by-products have very little damage to the substrate, the environment or the human body. Then, in step S212, after the oximation reaction, the substrate 102 is immersed in the second organic solution and the second organic solution is heated with the substrate 1〇2. At this time, 'MGE-PDMS is subjected to an epoxy amination reaction with APTES after the completion of the oximation reaction, so that MGE-PDMS is bonded to the APTES after the completion of the calcination reaction, thus forming the first The hydrophobic group 104 is shown. In this step, the epoxy group of MGE-PDMS is bonded to the amine group (-NH2) of Figure 3C after ring opening. Thus, the substrate 100 as shown in Fig. 1 is completed. Further, the portion protruding from the substrate 1〇2 in Fig. 1 is a 10-carbon hydrogen bond. Since the hydrocarbon chain is hydrophobic, the substrate 100 of the present embodiment is a substrate having hydrophobic properties. The hydrophobic group of this embodiment is a two-layer structure formed by two kinds of compounds, APTES and MGE-PDMS. Further, in this embodiment, a harmful environment such as hydrochloric acid, a by-product of the human body and the substrate is not produced. Therefore, the manufacturing method of the substrate 100 of the present embodiment is a manufacturing method which can easily meet environmental protection and safety requirements. ❿Second Embodiment The structure of the hydrophobic group of the present invention may also be other different structures, and is not limited to the structure of the hydrophobic group 104 of the first embodiment. Referring to Figure 4, there is shown a schematic view of a substrate having a hydrophobic surface in accordance with a second embodiment of the present invention. The second embodiment differs from the first embodiment in that the structure of the hydrophobic group 204 is composed of another organic hydrazine compound, such as r-Methacryloxypropyl trimethoxysi lane (MPTMS) and another hydrophobic compound, for example, 11 201029848

1 VY 1TWX I~V lH,lH,2H-heptadecafluoro-l-decene (HDFD)所形成。在 此第二實施例中,與第一實施例相同之元件均沿用相同編 號。基板200包括基材102及一疏水性基團204。疏水性 基團204為一有機矽化合物,例如是MPTMS與一疏水性化 合物,例如是HDFD反應而形成。以下將介紹本實施例之 基板200的製造方法。 請參照第5圖,其繪示依照本發明第二實施例之具有 疏水性表面之基板的製造方法流程圖。其中步驟S2〇2至 S204已於第一實施例說明,再此便不再贅述。以下從步驟 S502開始說明。 ® 於步驟S502中,配製一第一有機溶液(未緣示),其 溶質為數個有機矽化合物,例如是MPTMS。 然後,於步驟S504中,配製一第二有機溶液(未繪 不),其溶劑可為乙醇或水,而其溶質為數個疏水性化合 物,例如是HDFD。 本實施例之第二有機溶液所使用的是對環境、人體傷 害甚小的溶液,即乙醇或水溶液。因此,本實施例之基板 ❹ 200的製造方法,為可輕易符合環保、安衛要求的製程方 法。 然後,琦同時參照第6圖,其繪示第二實施例之MPTMS 結合至第3A圖之基材之示意圖。於步驟S5〇6中,將基材 102次入第一有機溶液中,氫氧基110與MPTMS進行一矽 烷基化反應。在本步驟中,MPTMS在脫去乙氧基,而美材 102之氫氧基110 (氫氧基110繪示於第犯圖)在脫ς氩 12 201029848 λ. fj i^vrx rk 後,兩者結合在一起’如第6圖所示。本步驟所產生的副 產物為醇類,例如是乙醇。此類副產物不管是對基材、環 境或人體的傷害都甚低。 然後’於步驟S508中,於矽烷基化反應之後,將基 材102浸入第二有機溶液中。 然後,於步驟S510中,提供一光起始劑,例如是 α,α-Dimethoxy-α-phenylacetophenone 至第二有機溶 液。 φ 然後’於步驟S512中’以一紫外光照射第二有機溶 液’使HDFD彼此進行一光聚合反應,以使HDFD結合至進 行完石夕烧基化反應後之MPTMS上,以形成疏水性基團2〇4。 至此,如第4圖所示,完成本實施例之基板200。而第4 圖中突出於基材102之部分為一碳氫鏈。由於碳氫鍵具有 疏水性,故本實施例之基板200為一具有疏水特性之基板。 此外’本實施例之疏水性基團為雙層結構,即由MPTMS 與HDFD反應結合而成。並且’本實施例並未產生如鹽酸 ❿等有害環境、人體、基材的副產物,所以本實施例之基板 200的製造方法’為可輕易符合環保、安衛要求的製程方 法0 第三實施例 第三實施例與第二實施例不同之處在於,第三實施例 可透過熱聚合方式完成第4圖之基板200。以下將介紹使 用熱聚合方式製作出基板2〇〇的步驟。 13 201029848 χτν* rx 請參照第7圖,其繪示依照本發明第三實施例之具有 疏水性表面之基板的製造方法流程圖。由於步驟S202至 S204及步驟S502至S508已於第二實施例說明,再此便不 再贅述。以下從步驟S702開始說明。 於步驟S702中,提供一熱起始劑,例如是過氧化十二 烧統(Lauroyl peroxide)至第二有機溶液。 然後,於步驟S704中,加熱第二有機溶液’使HDFD 彼此進行一熱聚合反應以使HDFD結合至進行完矽烷基化 反應後之MPTMS上,以形成疏水性基團204。至此’如第 4圖所示,完成第4圖之基板2〇〇。 第四實施例 此外’上述第一實施例至第三實施例之疏水性基團為 雙層結構’即疏水性基團係由兩種物質組合而成,然此非 用以限制本發明。以下將說明第四實施例之疏水性基團為 單一種疏水性化合物,且此單一種疏水性化合物結合至基 材上的過程中’所產生的副產物亦為對基材、環境或人體 造成傷害甚低的物質。請參照第8圖,其繪示依照本發明 第四實施例之具有疏水性表面之基板的製造方法流程圖。 首先’請同時參照第9A圖,其繪示第四實施例之基 材之示意圖。於步驟S802中,提供一基材402。 接著’於步驟S804中,將基材402浸入一異丙醇溶 液約5秒鐘,以清除基材402上的雜質。 再來’於步驟S806中,以一空氣,吹乾基材402。 201029848 然後’請同時參照第9B圖,其繪示第9A圖之基材形 成有數個氫氧基之示意圖。於步驟S8〇8中,以一電漿, 氧化基材402之一基材表面406,以使基材表面406形成 有數個氫氧基410。 然後’於步驟S810中,將基材402浸入一異丙醇溶 液。 然後’於步驟S812中,將基材402浸入一異辛烷 (Iso-octane)溶液。 • 然後’請同時參照第9C圖,其繪示第9B圖之基材形 成有疏水性分子之示意圖。於步驟S814中,將基材402 浸入一濃度為5mM (莫耳濃度)的第三有機溶液,作業環 境的溫度約為70。(:或室溫。其中,第三有機溶液的溶劑為 異辛院’而其溶質為數個疏水性化合物,例如是FDTES。 其中 ’ FDTES 的化學式為 CF3(CF2)7(CH2)2Si(0CH2CH3)3。 於本步驟中’ FDTES在脫去乙氧基,而氫氧基410在脫去 氫基後’兩者反應成為疏水性基團404而形成於基材表面 ⑩406上。至此,完成本實施例之基板400。在製作過程中, 所產生的副產物為醇類,例如是乙醇。此類副產物不管是 對基材、環境或人體的傷害都甚低。其中,氫氧基41〇在 脫去氫基後成為氧基408。 然後’於步驟S816中,將基材402浸入一異辛烷溶 液’以清洗未參與反應的FDTES。 然後,於步驟S818中,將基材402浸入一異丙醇溶 液此外’於步驟S818之後,可對基板400進行烘乾動作。 15 201029848 1 w 本發明上述實施例所揭露之具有疏水性表面之基板 及其製造方法,係透過一包含碳、氫之離去基,例如是乙 氧基的有機矽化合物與基材之氫氧基反應結合,其產生的 副產物為醇類’例如是乙醇。此類副產物不管是對基材、 環境或人體的傷害都甚低。此外,本發明於製造過程中不 會產生具有腐蝕性的物質’例如是鹽酸’對於具有金屬接 墊的基材來講’並不會發生金屬接墊被腐蝕的問題。此 外,氧化步驟以一電漿氧化技術完成,在電漿氧化過程 中,並不會產生如習知技術般會傷害基材的泡沫。此外, 電漿處理的技術簡單,成本低廉,處理過程不需大量溶劑, 對環境不會造成污染,且又快速而有效率。 綜上所述’雖然本發明已以較佳實施例揭露如上,然 其並非用以限定本發明。本發明所屬技術領域中具有通常 知識者,在不脫離本發明之精神和範圍内,當可作各種之 更動與潤飾。因此’本發明之保護範圍當視後附之申請專 利範圍所界定耆為準° 【圖式簡單說明】 第1圖繪系依照本發明第一實施例之具有疏水性表 面之基板示意圈° 第2圖續·系依照本發明第一實施例之具有疏水性表 面之基板的製造方法流程圖。 第3A圖嫁系第一實施例之基材之示意圖。 第3B圖緣系第3A圖之基材形成有數個氫氧基之示意1 VY 1TWX I~V lH, lH, 2H-heptadecafluoro-l-decene (HDFD). In this second embodiment, the same elements as those of the first embodiment are all given the same reference numerals. The substrate 200 includes a substrate 102 and a hydrophobic group 204. The hydrophobic group 204 is an organic hydrazine compound, for example, MPTMS is formed by reacting with a hydrophobic compound such as HDFD. A method of manufacturing the substrate 200 of the present embodiment will be described below. Referring to Figure 5, there is shown a flow chart of a method of fabricating a substrate having a hydrophobic surface in accordance with a second embodiment of the present invention. Steps S2〇2 to S204 have been described in the first embodiment, and will not be described again. The following is explained from step S502. ® In step S502, a first organic solution (not shown) is prepared, the solute of which is a plurality of organic hydrazine compounds, such as MPTMS. Then, in step S504, a second organic solution (not shown) may be prepared, the solvent of which may be ethanol or water, and the solute thereof is a plurality of hydrophobic compounds such as HDFD. The second organic solution of this embodiment uses a solution which is less harmful to the environment and human body, i.e., ethanol or an aqueous solution. Therefore, the method of manufacturing the substrate ❹ 200 of the present embodiment is a process method that can easily meet environmental protection and safety requirements. Then, Qi refers to FIG. 6 at the same time, which shows a schematic diagram of the MPTMS of the second embodiment bonded to the substrate of FIG. 3A. In step S5〇6, the substrate 102 is sub-into the first organic solution, and the hydroxyl group 110 is subjected to a monoalkylation reaction with MPTMS. In this step, the MPTMS is removed from the ethoxy group, and the hydroxyl group 110 of the US material 102 (the hydroxyl group 110 is shown in the first figure) after deamination of argon 12 201029848 λ. fj i^vrx rk, two Combine together as shown in Figure 6. The by-product produced in this step is an alcohol such as ethanol. Such by-products have very little damage to the substrate, the environment or the human body. Then, in step S508, after the alkylation reaction, the substrate 102 is immersed in the second organic solution. Then, in step S510, a photoinitiator such as α,α-Dimethoxy-α-phenylacetophenone is supplied to the second organic solution. φ Then 'in the step S512, 'irradiating the second organic solution with an ultraviolet light', the HDFD is photopolymerized with each other to bind the HDFD to the MPTMS after the completion of the calcination reaction to form a hydrophobic group. Mission 2〇4. So far, as shown in Fig. 4, the substrate 200 of this embodiment is completed. The portion of the substrate 102 that protrudes from the substrate 102 is a hydrocarbon chain. Since the carbon-hydrogen bond is hydrophobic, the substrate 200 of the present embodiment is a substrate having hydrophobic properties. Further, the hydrophobic group of the present embodiment has a two-layer structure, that is, a combination of MPTMS and HDFD. Moreover, the present embodiment does not produce a harmful environment such as guanidine hydrochloride, a by-product of a human body or a substrate, so the method for manufacturing the substrate 200 of the present embodiment is a process method that can easily meet environmental protection and safety requirements. The third embodiment is different from the second embodiment in that the third embodiment can complete the substrate 200 of FIG. 4 by thermal polymerization. The procedure for fabricating the substrate 2 by thermal polymerization will be described below. 13 201029848 χτν* rx Referring to Fig. 7, there is shown a flow chart of a method of manufacturing a substrate having a hydrophobic surface in accordance with a third embodiment of the present invention. Since steps S202 to S204 and steps S502 to S508 have been explained in the second embodiment, they will not be described again. The description will be started from step S702 below. In step S702, a thermal initiator such as Lauroyl peroxide is supplied to the second organic solution. Then, in step S704, the second organic solution is heated to cause the HDFDs to undergo a thermal polymerization reaction with each other to bind the HDFD to the MPTMS after the completion of the oximation reaction to form the hydrophobic group 204. So far as shown in Fig. 4, the substrate 2 of Fig. 4 is completed. Fourth Embodiment Further, the hydrophobic group of the above first to third embodiments is a two-layer structure, i.e., the hydrophobic group is a combination of two substances, which is not intended to limit the present invention. Hereinafter, the hydrophobic group of the fourth embodiment will be described as a single hydrophobic compound, and the by-product produced during the process of bonding the single hydrophobic compound to the substrate is also caused to the substrate, the environment or the human body. A substance that has very low damage. Referring to Figure 8, there is shown a flow chart of a method of fabricating a substrate having a hydrophobic surface in accordance with a fourth embodiment of the present invention. First, please refer to Fig. 9A at the same time, which shows a schematic view of the substrate of the fourth embodiment. In step S802, a substrate 402 is provided. Next, in step S804, the substrate 402 is immersed in an isopropanol solution for about 5 seconds to remove impurities on the substrate 402. Further, in step S806, the substrate 402 is blown dry with an air. 201029848 Then, please refer to Figure 9B, which shows a schematic diagram of the formation of a number of hydroxyl groups on the substrate of Figure 9A. In step S8〇8, one of the substrate surfaces 406 of the substrate 402 is oxidized by a plasma such that the substrate surface 406 is formed with a plurality of hydroxyl groups 410. Then, in step S810, the substrate 402 is immersed in an isopropanol solution. Then, in step S812, the substrate 402 is immersed in an iso-octane solution. • Then, please refer to Figure 9C, which shows a schematic diagram of the substrate formed in Figure 9B with hydrophobic molecules. In step S814, the substrate 402 is immersed in a third organic solution having a concentration of 5 mM (mole concentration), and the operating environment has a temperature of about 70. (: or room temperature. Among them, the solvent of the third organic solution is Yixinyuan' and its solute is several hydrophobic compounds, such as FDTES. The chemical formula of 'FDTES is CF3(CF2)7(CH2)2Si(0CH2CH3) 3. In this step, 'FDTES is removed from the ethoxy group, and after the hydroxyl group 410 is dehydrogenated, the two react to form a hydrophobic group 404 and are formed on the substrate surface 10406. Thus, the present embodiment is completed. The substrate 400 of the example. During the production process, the by-product produced is an alcohol, such as ethanol. Such by-products have little damage to the substrate, the environment or the human body. After the hydrogen group is removed, it becomes oxy 408. Then, in step S816, the substrate 402 is immersed in an isooctane solution to clean the unreacted FDTES. Then, in step S818, the substrate 402 is immersed in a different state. After the step S818, the substrate 400 can be subjected to a drying operation. 15 201029848 1 w The substrate having a hydrophobic surface disclosed in the above embodiments of the present invention and a method for manufacturing the same are provided by a method comprising carbon and hydrogen. Deion group, for example, ethoxylate The organic hydrazine compound is combined with the hydroxyl group reaction of the substrate, and the by-product produced is an alcohol such as ethanol. Such by-products have little damage to the substrate, the environment or the human body. Moreover, the present invention No corrosive substances are produced during the manufacturing process, such as hydrochloric acid, which does not cause corrosion of the metal pads for substrates with metal pads. In addition, the oxidation step is completed by a plasma oxidation technique. In the plasma oxidation process, there is no foam which will damage the substrate as in the prior art. In addition, the plasma treatment technology is simple, the cost is low, the treatment process does not require a large amount of solvent, and the environment is not polluted. And the present invention has been described above by way of a preferred embodiment, and is not intended to limit the invention. Those skilled in the art to which the invention pertains, without departing from the invention. Within the spirit and scope, various changes and refinements can be made. Therefore, the scope of protection of the present invention is subject to the definition of the patent application scope attached to the following. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic diagram of a substrate having a hydrophobic surface according to a first embodiment of the present invention. FIG. 2 is a flow chart showing a method of manufacturing a substrate having a hydrophobic surface according to a first embodiment of the present invention. Fig. 3A is a schematic view showing the substrate of the first embodiment of the first embodiment. Fig. 3B is a schematic view showing the formation of a plurality of hydroxyl groups on the substrate of Fig. 3A.

〇 16 201029848 i TT J ·Π· 第3C圖繪示第一實施例之APTES結合至第3Β圖之基 材之示意圖。 第4圖繪示依照本發明第二實施例之具有疏水性表 面之基板示意圖。 第5圖繪示依照本發明第二實施例之具有疏水性表 面之基板的製造方法流程圖。 第6圖繪示第二實施例之MPTMS結合至第3A圖之基 材之示意圖。 φ 第7圖繪示依照本發明第三實施例之具有疏水性表 面之基板的製造方法流程圖。 第8圖繪示依照本發明第四實施例之具有疏水性表 面之基板的製造方法流程圖。 第9A圖繪示第四實施例之基材之示意圖。 第9B圖繪示第9A圖之基材形成有數個氫氧基之示意 圖。 第9C圖繪示第9B圖之基材形成有疏水性分子之示意 參圖。 【主要元件符號說明】 100、200、400 :基板 102、402 :基材 104、204、404 :疏水性基團 106、406 :基材表面 108、408 :氧基 110、410 :氫氧基 17〇 16 201029848 i TT J · Π · Fig. 3C is a schematic view showing the bonding of the APTES of the first embodiment to the substrate of the third drawing. Fig. 4 is a schematic view showing a substrate having a hydrophobic surface according to a second embodiment of the present invention. Fig. 5 is a flow chart showing a method of manufacturing a substrate having a hydrophobic surface according to a second embodiment of the present invention. Fig. 6 is a schematic view showing the bonding of the MPTMS of the second embodiment to the substrate of Fig. 3A. Fig. 7 is a flow chart showing a method of manufacturing a substrate having a hydrophobic surface according to a third embodiment of the present invention. Figure 8 is a flow chart showing a method of manufacturing a substrate having a hydrophobic surface in accordance with a fourth embodiment of the present invention. FIG. 9A is a schematic view showing the substrate of the fourth embodiment. Fig. 9B is a schematic view showing the formation of a plurality of hydroxyl groups on the substrate of Fig. 9A. Fig. 9C is a schematic view showing the formation of a hydrophobic molecule on the substrate of Fig. 9B. [Description of main component symbols] 100, 200, 400: substrate 102, 402: substrate 104, 204, 404: hydrophobic group 106, 406: substrate surface 108, 408: oxy group 110, 410: hydroxyl group 17

Claims (1)

201029848 1 w j i*turr\ 七、申請專利範圍: 1. 一種具有疏水性表面之基板’包括: 一基材,其一基材表面具有複數個氧基;以及 一疏水性基團,與該些氧基結合,而該疏水性基團為 一有機碎化合物與一疏水性化合物反應所形成。 2. 如申請專利範圍第1項所述之基板,其中該基材 表面為一平面。 3·如申請專利範圍第1項所述之基板,其中該基材 為一微機電系統(microe 1 ectr ic machanic system, MEMS ) 之微結構的基材。 4· 一種具有疏水性表面之基板,包括: 一基材’其一基材表面具有複數個氧基;以及 一疏水性基團’與該些氧基結合,而該疏水性基團為 一有機發化合物與一疏水性化合物反應所形成; 其中’該有機妙化合物為3-(aminopropyl triethoxysilane) (APTES),其化學式如下:201029848 1 wji*turr\ VII. Patent application scope: 1. A substrate having a hydrophobic surface includes: a substrate having a plurality of oxy groups on a surface thereof; and a hydrophobic group, and the oxygen The group is bonded, and the hydrophobic group is formed by reacting an organic compound with a hydrophobic compound. 2. The substrate of claim 1, wherein the substrate surface is a flat surface. 3. The substrate of claim 1, wherein the substrate is a microstructured substrate of a microelectromechanical system (MEMS). 4. A substrate having a hydrophobic surface, comprising: a substrate having a plurality of oxy groups on a surface thereof; and a hydrophobic group bound to the oxy groups, wherein the hydrophobic group is an organic The compound is formed by reacting with a hydrophobic compound; wherein the compound is 3-(aminopropyl triethoxysilane) (APTES), and its chemical formula is as follows: 18 201029848 Λ ψψ 1~Γ\/Χ Λ~». ,而該疏水性化合物為 Monoglycidyl ether-tenninated PDMS (MGE-PDMS),其化學式如下:18 201029848 Λ ψψ 1~Γ\/Χ Λ~». The hydrophobic compound is Monoglycidyl ether-tenninated PDMS (MGE-PDMS) with the following chemical formula: ,而該疏水性基團之其化學式如下:And the chemical formula of the hydrophobic group is as follows: 19 201029848 1 W J ΙΗΙλΓΛ ΑΗ3 C \/0丨19 201029848 1 W J ΙΗΙλΓΛ ΑΗ3 C \/0丨 ch2 ch3 ο ,而該疏水性化合物為Ch2 ch3 ο , and the hydrophobic compound is lH,lH,2H-heptadecafluor〇-l-decene (HDFD),其化學式 如下·· 'CH2 (CF2)7CF3 而該疏水性基團之其化學式如下: a ο \ /Si c (CF2)7CF3 ch3 olH, lH, 2H-heptadecafluor〇-l-decene (HDFD), the chemical formula of which is as follows · · 'CH2 (CF2)7CF3 and the chemical formula of the hydrophobic group is as follows: a ο \ /Si c (CF2)7CF3 ch3 o sr Q /-C ~~ C-( CF2)7CF3 ch3 I c V_) 8.如申請專利範圍第7項所述之基板,其中該基材 20 201029848 χ ντ i-rva. ί ». 表面為一平面。 9.如申請專利範圍第7項所述之基板,其中該基材 為一微機電系統之微結構的基材。 —種具有疏水性表面之基板之製造方法’包括: 提供一基材; 氧化該基材之一基材表面,以使該基材表面形成有複 數個氫氧基; 配製一第一有機溶液,其溶質為複數個有機矽化合 Φ 物; 配製一第二有機溶液,其溶質為複數個疏水性化合 物; 於該氧化步驟之後,將該基材浸入該第一有機溶液 中’該基材與該些有機碎化合物進行一梦燒基化反應 (Si lanization reaction);以及 於該矽烷基化反應之後’將該基材浸入該第二有機溶 液中,該些疏水性化合物與進行完該矽烷基化反應後之該 鲁些有機發化合物進行一化學反應,使該些疏水性化合物結 0至進行完該石夕烧基化反應後之該些有機梦化合物上’以 形成一疏水性基團。 11.如申請專利範圍第項所述之製造方法,其中 讀氣化步驟係以一電漿完成。 =12.如申请專利範圍第丨〇項所述之製造方法,其中 讀第一有機溶液之溶劑為異丙醇(2_pr〇pan〇1)、乙醇或 21 201029848 1 yv^mwrrv 13. —種具有疏水性表面之基板之製造方法,包括: 提供一基材; 氧化該基材之一基材表面,以使該基材表面形成有複 數個氫氧基; 配製一第一有機溶液,其溶質為複數個APTES ; 配製一第二有機溶液,其溶質為複數個MGE-PDMS ; 於該氧化步驟之後,將該基材浸入該第一有機溶液 中’該些氫氧基與該些APTES進行一矽烷基化反應 (Silanization reaction);以及 於該矽烷基化反應之後,將該基材浸入該第二有機溶 液中’該些MGE-PDMS與進行完該矽烷基化反應後之該些 APTES進行一環氧胺化反應(Ep〇Xy -amine reaction),使 該些MGE-PDMS結合至進行完該矽烷基化反應後之該些 APTES上,以形成一疏水性基團。 14. 如申請專利範圍第13項所述之製造方法,其中 該氧化步驟係以一電漿完成。 15·如申請專利範圍第13項所述之製造方法,其中 該第一有機溶液之溶劑為異丙醇或乙醇。 16.如申請專利範圍第13項所述之製造方法’其中 該基材表面為一平面。 Π.如申請專利範圍第13項所述之製造方法,其中 該基材為一微機電系統之微結構的基材。 18. —種具有疏水性表面之基板之製造方法,包括: 提供一基材; 22 201029848 & *τ x~rvx t. x 氧化該基材之一基材表面,以使該基材表面形成有複 數個氫氧基; 配製一第一有機溶液,其溶質為複數個MPTMS ; 配製一第二有機溶液,其溶質為複數個Hdfd ; 於該氧化步驟之後’將該基材浸入該第一有機溶液 中’該些氳氧基與該些MPTMS進行一矽烷基化反應; 於該矽烷基化反應之後,將該基材浸入該第二有機溶 液中; • 提供一光起始劑至該第二有機溶液;以及 紫外光照射該第二有機溶液’使該些HDFD彼此 進行一光聚合反應以使該些肋叩結合至進行完該矽烷基 化反應後之該些仙7骷上,以形成一疏水性基團。 19. 如申請專利範圍第18項所述之製造方法,其中 該光起始劑為 a y a ~Dlmethoxy-a -phenylacetophenone 〇 20. 如申請專利範圍第18項所述之製造方法,其中 ❹該氧化步驟係以一電漿完成。 21. 如申請專利範圍第18項所述之製造方法,其中 該第一有機溶液之溶劑為乙醇或水。 22. 如申請專利範圍第18項所述之製造方法,其中 該基材表面為一平面。 =23·如申請專利範圍第18項所述之製造方法,其中 該基材為一微機電系統之微結構的基材。 24· —種具有疏水性表面之基板之製造方法,包括: 23 201029848 1 w j 提供一基材; 氧化該基材之一基材表面,以使該基材表面形成有複 數個氫氧基; 配製一第一有機溶液,其溶質為複數個MpTMS ; 配製一第二有機溶液,其溶質為複數個HDFD ; 於該氧化步驟之後,將該基材浸入該第一有機溶液 中,該些氫氧基與該些MPTMS進行一矽烷基化反應; 提供一熱起始劑至該第二有機溶液;以及 加熱該第二有機溶液,使該些HDFD彼此進行一熱聚 ❹ 合反應以使該些HDFD結合至進行完該矽烷基化反應後之 該些MPTMS上,以形成一疏水性基團。 25_如申請專利範圍第24項所述之製造方法,其中 該熱起始劑為過氧化十二烷酰(Laur〇yl per〇xide)。 一 26.如申請專利範圍第24項所述之製造方法,其中 該氧化步驟係以一電漿完成。 27.如申請專利範圍第24項所述之製造方法,其中 該第一有機溶液之溶劑為乙醇或水。 ❹ 28·如申請專利範圍第24項所述之製造方法,其中 該基材表面為一平面。 29. 如申請專利範圍第24項所述之製造方法,其中 該基材為一微機電系統之微結構的基材。 30. —種具有疏水性表面之基板之製造方法,包括: 提供一基材; 以一電漿,氧化該基材之一基材表面,以使該基材表 24 201029848 面形成有複數個氫氧基;以及 於該氧化步驟之後,將該基材浸入一第三有機溶液, 其;谷質為複數個疏水性化合物,使疏水性化合物與該些氮 氧基反應而形成一疏水性基團。 31·如申請專利範圍第30項所述之製造方法,其中 於該些疏水性化合物為1Η,1Η,2Η,2H-perfluorodecyl triethoxysilane (CF3(CF2)7(CH2)2Si(OCH2CH3)3) (FDTES)。 φ 32·如申請專利範圍第30項所述之製造方法,其中 於提供該基材之該步驟與該氧化步驟之間,該製造方法更 包括: 將該基材浸入一異丙醇溶液;以及 以一空氣,吹乾該基材。 33·如申請專利範圍第30項所述之製造方法,其中 於該氧化步驟與將該基材浸入該第三有機溶液之該步驟 之間,該製造方法更包括: ❿ 將該基材浸入一異丙醇溶液;以及 將該基材浸入一異辛燒(Iso-octane)溶液。 34. 如申請專利範圍第30項所述之製造方法,其中 於將該基材浸入該第三有機溶液之該步驟之後’該製造方 法更包括: 將該基材浸入一異辛烷溶液;以及 將該基材浸入一異丙醇溶液。 35. 如申請專利範圍第30項所述之製造方法,其中 25 201029848 1 vy ^ i*tur r\ 該基材表面為一平面。 36.如申請專利範圍第30項所述之製造方法,其中 該基材為一微機電系統之微結構的基材。Sr Q /-C ~~ C-( CF2)7CF3 ch3 I c V_) 8. The substrate according to claim 7, wherein the substrate 20 201029848 χ ντ i-rva. ί ». flat. 9. The substrate of claim 7, wherein the substrate is a microstructured substrate of a microelectromechanical system. A method for producing a substrate having a hydrophobic surface comprises: providing a substrate; oxidizing a surface of the substrate to form a plurality of hydroxyl groups on the surface of the substrate; preparing a first organic solution, The solute is a plurality of organic bismuth compound Φ; a second organic solution is prepared, the solute is a plurality of hydrophobic compounds; after the oxidizing step, the substrate is immersed in the first organic solution 'the substrate and the The organic ash compound is subjected to a Si lanization reaction; and after the oximation reaction, the substrate is immersed in the second organic solution, and the hydrophobic compound is subjected to the oximation of the ruthenium After the reaction, the organic compound is subjected to a chemical reaction to cause the hydrophobic compounds to be bonded to the organic compound after the completion of the reaction to form a hydrophobic group. 11. The method of manufacture of claim 2, wherein the read gasification step is performed in a plasma. The manufacturing method according to the invention of claim 2, wherein the solvent for reading the first organic solution is isopropanol (2_pr〇pan〇1), ethanol or 21 201029848 1 yv^mwrrv 13. A method for manufacturing a substrate having a hydrophobic surface, comprising: providing a substrate; oxidizing a surface of the substrate of the substrate such that a plurality of hydroxyl groups are formed on the surface of the substrate; and preparing a first organic solution having a solute of a plurality of APTES; preparing a second organic solution having a solute of a plurality of MGE-PDMS; after the oxidizing step, immersing the substrate in the first organic solution, the hydroxyl groups and the APTES are subjected to a decane a silanization reaction; and after immersing the substrate in the second organic solution, the MGE-PDMS is subjected to a ring of the APTES after the alkylation reaction The Ep〇Xy-amine reaction binds the MGE-PDMS to the APTES after the oximation reaction to form a hydrophobic group. 14. The method of manufacture of claim 13, wherein the oxidizing step is performed in a plasma. The manufacturing method according to claim 13, wherein the solvent of the first organic solution is isopropanol or ethanol. 16. The method of manufacture of claim 13, wherein the substrate surface is a flat surface. The manufacturing method of claim 13, wherein the substrate is a microstructured substrate of a microelectromechanical system. 18. A method of fabricating a substrate having a hydrophobic surface, comprising: providing a substrate; 22 201029848 & *τ x~rvx t. x oxidizing a substrate surface of the substrate to form a surface of the substrate a plurality of hydroxyl groups; a first organic solution having a solute of plural MPTMS; a second organic solution having a solute of plural Hdfd; The oxime in the solution is subjected to a monoalkylation reaction with the MPTMS; after the oximation reaction, the substrate is immersed in the second organic solution; • a photoinitiator is provided to the second An organic solution; and ultraviolet light illuminating the second organic solution to cause the HDFDs to undergo a photopolymerization reaction with each other to bind the ribs to the stalks after the oximation reaction to form a Hydrophobic group. 19. The method of claim 18, wherein the photoinitiator is aya ~ Dlmethoxy-a - phenylacetophenone 〇 20. The method of claim 18, wherein the oxidizing step It is completed with a plasma. 21. The manufacturing method according to claim 18, wherein the solvent of the first organic solution is ethanol or water. 22. The method of manufacture of claim 18, wherein the substrate surface is a flat surface. The manufacturing method of claim 18, wherein the substrate is a microstructured substrate of a microelectromechanical system. 24. A method of manufacturing a substrate having a hydrophobic surface, comprising: 23 201029848 1 wj providing a substrate; oxidizing a substrate surface of the substrate such that a plurality of hydroxyl groups are formed on the surface of the substrate; a first organic solution having a solute of a plurality of MpTMS; a second organic solution having a solute of a plurality of HDFDs; after the oxidizing step, immersing the substrate in the first organic solution, the hydroxyl groups Performing a monoalkylation reaction with the MPTMS; providing a hot initiator to the second organic solution; and heating the second organic solution to cause the HDFDs to undergo a thermopolymerization reaction with each other to combine the HDFDs The MPTMS after the oximation reaction is completed to form a hydrophobic group. The manufacturing method according to claim 24, wherein the thermal initiator is Laur〇yl per〇xide. A method of manufacturing according to claim 24, wherein the oxidizing step is performed in a plasma. 27. The manufacturing method according to claim 24, wherein the solvent of the first organic solution is ethanol or water. The manufacturing method according to claim 24, wherein the surface of the substrate is a flat surface. 29. The method of manufacture of claim 24, wherein the substrate is a microstructured substrate of a microelectromechanical system. 30. A method of fabricating a substrate having a hydrophobic surface, comprising: providing a substrate; oxidizing a substrate surface of the substrate with a plasma such that a plurality of hydrogens are formed on the surface of the substrate 24 201029848 An oxy group; and after the oxidizing step, immersing the substrate in a third organic solution; the gluten is a plurality of hydrophobic compounds, and reacting the hydrophobic compound with the oxynitrides to form a hydrophobic group . The manufacturing method according to claim 30, wherein the hydrophobic compound is 1 Η, 1 Η, 2 Η, 2H-perfluorodecyl triethoxysilane (CF3(CF2)7(CH2)2Si(OCH2CH3)3) (FDTES) ). The manufacturing method of claim 30, wherein between the step of providing the substrate and the oxidizing step, the manufacturing method further comprises: immersing the substrate in an isopropanol solution; The substrate is blown dry with an air. 33. The method of claim 30, wherein the oxidizing step and the step of immersing the substrate in the third organic solution further comprises: immersing the substrate in a An isopropanol solution; and immersing the substrate in an Iso-octane solution. 34. The manufacturing method of claim 30, wherein after the step of immersing the substrate in the third organic solution, the manufacturing method further comprises: immersing the substrate in an isooctane solution; The substrate was immersed in a solution of isopropanol. 35. The manufacturing method according to claim 30, wherein 25 201029848 1 vy ^ i*tur r\ the surface of the substrate is a plane. 36. The method of manufacture of claim 30, wherein the substrate is a microstructured substrate of a microelectromechanical system. 2626
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