TWI372943B - - Google Patents

Info

Publication number
TWI372943B
TWI372943B TW095121898A TW95121898A TWI372943B TW I372943 B TWI372943 B TW I372943B TW 095121898 A TW095121898 A TW 095121898A TW 95121898 A TW95121898 A TW 95121898A TW I372943 B TWI372943 B TW I372943B
Authority
TW
Taiwan
Application number
TW095121898A
Other languages
Chinese (zh)
Other versions
TW200712768A (en
Inventor
Yoshie Makabe
Naomi Sato
Naoki Maeda
Kazuyuki Fuchigami
Original Assignee
Adeka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adeka Corp filed Critical Adeka Corp
Publication of TW200712768A publication Critical patent/TW200712768A/en
Application granted granted Critical
Publication of TWI372943B publication Critical patent/TWI372943B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW095121898A 2005-06-20 2006-06-19 Alkali developable photosensitive resin composition TW200712768A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005178857 2005-06-20
JP2006155876A JP4916224B2 (en) 2005-06-20 2006-06-05 Alkali-developable photosensitive resin composition

Publications (2)

Publication Number Publication Date
TW200712768A TW200712768A (en) 2007-04-01
TWI372943B true TWI372943B (en) 2012-09-21

Family

ID=37793551

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095121898A TW200712768A (en) 2005-06-20 2006-06-19 Alkali developable photosensitive resin composition

Country Status (4)

Country Link
JP (1) JP4916224B2 (en)
KR (1) KR101308954B1 (en)
CN (1) CN1885162B (en)
TW (1) TW200712768A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4738190B2 (en) * 2006-02-01 2011-08-03 株式会社Ａｄｅｋａ Epoxy resin, alkali-developable resin composition, and alkali-developable photosensitive resin composition
JP4667261B2 (en) * 2006-02-01 2011-04-06 株式会社Ａｄｅｋａ Alkali-developable photosensitive resin composition
JP4878876B2 (en) * 2006-03-15 2012-02-15 株式会社Ａｄｅｋａ Epoxy resin, alkali-developable resin composition, and alkali-developable photosensitive resin composition
JP5311750B2 (en) * 2007-02-28 2013-10-09 株式会社Ａｄｅｋａ Phenol resin, epoxy resin, alkali-developable resin composition, and alkali-developable photosensitive resin composition
JP2009275148A (en) * 2008-05-15 2009-11-26 Adeka Corp New compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition
JP5844267B2 (en) * 2010-09-22 2016-01-13 株式会社Adeka Dye and colored photosensitive composition

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3148429B2 (en) * 1992-02-04 2001-03-19 新日本製鐵株式会社 Photopolymerizable unsaturated compound and alkali-developable photosensitive resin composition
JP2000053746A (en) * 1998-08-06 2000-02-22 Nippon Shokubai Co Ltd Production of photosensitive resin and photosensitive resin composition containing resin produced by the method
JP3416129B2 (en) * 2000-01-17 2003-06-16 昭和高分子株式会社 Photosensitive resin composition
WO2002025378A1 (en) * 2000-09-16 2002-03-28 Goo Chemical Co., Ltd. Ultraviolet-curable resin composition and photosolder resist ink containing the composition
JP3593066B2 (en) * 2001-06-28 2004-11-24 株式会社日本触媒 Photosensitive resin for liquid crystal spacer and photosensitive resin composition
JP2003177528A (en) * 2001-09-21 2003-06-27 Tamura Kaken Co Ltd Photosensitive resin composition and printed wiring board
JP4554170B2 (en) * 2003-06-03 2010-09-29 株式会社タムラ製作所 UV curable alkali-soluble resin, UV curable resin for solder resist film and printed wiring board
WO2005092826A1 (en) * 2004-03-25 2005-10-06 Asahi Denka Co., Ltd. Novel phenol compound and novel epoxy resin derivable from such phenol compound
JP4198101B2 (en) * 2004-09-17 2008-12-17 株式会社Ａｄｅｋａ Alkali developable resin composition

Also Published As

Publication number Publication date
KR20060133482A (en) 2006-12-26
JP4916224B2 (en) 2012-04-11
CN1885162A (en) 2006-12-27
CN1885162B (en) 2011-06-22
TW200712768A (en) 2007-04-01
KR101308954B1 (en) 2013-09-24
JP2007034279A (en) 2007-02-08

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