TWI372653B - System for eliminating waste gases by making use of plasmas at low and atmospheric pressure - Google Patents
System for eliminating waste gases by making use of plasmas at low and atmospheric pressureInfo
- Publication number
- TWI372653B TWI372653B TW098129434A TW98129434A TWI372653B TW I372653 B TWI372653 B TW I372653B TW 098129434 A TW098129434 A TW 098129434A TW 98129434 A TW98129434 A TW 98129434A TW I372653 B TWI372653 B TW I372653B
- Authority
- TW
- Taiwan
- Prior art keywords
- plasmas
- low
- atmospheric pressure
- making use
- waste gases
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/204—Inorganic halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/204—Inorganic halogen compounds
- B01D2257/2047—Hydrofluoric acid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/206—Organic halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/206—Organic halogen compounds
- B01D2257/2066—Fluorine
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2240/00—Testing
- H05H2240/10—Testing at atmospheric pressure
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080086283A KR101026457B1 (en) | 2008-09-02 | 2008-09-02 | System for eliminating waste gases by making us of plasmas at low and high pressure |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201021902A TW201021902A (en) | 2010-06-16 |
TWI372653B true TWI372653B (en) | 2012-09-21 |
Family
ID=41797641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW098129434A TWI372653B (en) | 2008-09-02 | 2009-09-01 | System for eliminating waste gases by making use of plasmas at low and atmospheric pressure |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR101026457B1 (en) |
TW (1) | TWI372653B (en) |
WO (1) | WO2010027184A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI628358B (en) * | 2013-04-04 | 2018-07-01 | 愛德華有限公司 | Vacuum pumping and abatement system, and method of pumping a vacuum pumping arrangement of a vacuum pumping and abatement system |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20120032204A (en) * | 2010-09-28 | 2012-04-05 | (주)트리플코어스코리아 | Microwave generator and driving method thereof, and system for eliminating waste gases |
KR101230513B1 (en) * | 2010-12-27 | 2013-02-06 | (주)엘오티베큠 | Treatment apparatus for discharging fluid |
CN106165062A (en) * | 2014-04-16 | 2016-11-23 | 清洁要素技术有限公司 | Process the plasma reactor of the waste gas that process apparatus occurs |
CN106170845A (en) * | 2014-04-16 | 2016-11-30 | 清洁要素技术有限公司 | Process the plasma reactor of the waste gas betiding process apparatus |
KR101609474B1 (en) | 2014-10-14 | 2016-04-05 | (주)트리플코어스코리아 | System and method for treating gas from chemical vapor deposition apparatus |
JPWO2018221067A1 (en) * | 2017-05-29 | 2020-02-06 | カンケンテクノ株式会社 | Exhaust gas decompression method and apparatus |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001149741A (en) * | 1999-11-30 | 2001-06-05 | Japan Organo Co Ltd | Device and method for treating waste gas containing volatile organic substance |
KR20030043404A (en) * | 2001-11-28 | 2003-06-02 | 주식회사 성광엔비텍 | Method for removal of volatile organic compounds and odor using non-thermal plasma and apparatus thereof |
KR20070035565A (en) * | 2004-07-13 | 2007-03-30 | 레르 리뀌드, 소시에떼 아노님 아 디렉또와르 에 꽁세예 드 쉬르베양스 뿌르 레뛰드 에 렉스쁠로아따시옹 데 프로세데 죠르쥬 끌로드 | Atmospheric-pressure plasma treatment of gaseous effluents |
KR100658374B1 (en) * | 2005-02-28 | 2006-12-15 | 엄환섭 | Plasma scrubber for elimination of waste cleaning gases emitted from semiconductor industries |
EP1904664A2 (en) * | 2005-07-12 | 2008-04-02 | Air Liquide Electronics Systems | Method for plasma treatment of gas effluents |
WO2008093442A1 (en) * | 2007-01-30 | 2008-08-07 | Kanken Techno Co., Ltd. | Gas processing apparatus |
-
2008
- 2008-09-02 KR KR1020080086283A patent/KR101026457B1/en active IP Right Grant
-
2009
- 2009-09-01 TW TW098129434A patent/TWI372653B/en active
- 2009-09-02 WO PCT/KR2009/004928 patent/WO2010027184A2/en active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI628358B (en) * | 2013-04-04 | 2018-07-01 | 愛德華有限公司 | Vacuum pumping and abatement system, and method of pumping a vacuum pumping arrangement of a vacuum pumping and abatement system |
Also Published As
Publication number | Publication date |
---|---|
KR20100027383A (en) | 2010-03-11 |
WO2010027184A2 (en) | 2010-03-11 |
KR101026457B1 (en) | 2011-03-31 |
TW201021902A (en) | 2010-06-16 |
WO2010027184A3 (en) | 2010-07-08 |
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