TWI369749B - Method and system for dynamically adjusting metrology sampling based upon available metrology capacity - Google Patents

Method and system for dynamically adjusting metrology sampling based upon available metrology capacity

Info

Publication number
TWI369749B
TWI369749B TW094131773A TW94131773A TWI369749B TW I369749 B TWI369749 B TW I369749B TW 094131773 A TW094131773 A TW 094131773A TW 94131773 A TW94131773 A TW 94131773A TW I369749 B TWI369749 B TW I369749B
Authority
TW
Taiwan
Prior art keywords
metrology
dynamically adjusting
capacity
available
sampling based
Prior art date
Application number
TW094131773A
Other languages
English (en)
Chinese (zh)
Other versions
TW200623300A (en
Inventor
Matthew A Purdy
Original Assignee
Globalfoundries Us Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Globalfoundries Us Inc filed Critical Globalfoundries Us Inc
Publication of TW200623300A publication Critical patent/TW200623300A/zh
Application granted granted Critical
Publication of TWI369749B publication Critical patent/TWI369749B/zh

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Program-control systems
    • G05B19/02—Program-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • General Factory Administration (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW094131773A 2004-10-05 2005-09-15 Method and system for dynamically adjusting metrology sampling based upon available metrology capacity TWI369749B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/958,891 US7076321B2 (en) 2004-10-05 2004-10-05 Method and system for dynamically adjusting metrology sampling based upon available metrology capacity

Publications (2)

Publication Number Publication Date
TW200623300A TW200623300A (en) 2006-07-01
TWI369749B true TWI369749B (en) 2012-08-01

Family

ID=34979412

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094131773A TWI369749B (en) 2004-10-05 2005-09-15 Method and system for dynamically adjusting metrology sampling based upon available metrology capacity

Country Status (8)

Country Link
US (1) US7076321B2 (https=)
JP (1) JP2008516447A (https=)
KR (1) KR20070061868A (https=)
CN (1) CN101032013B (https=)
DE (1) DE112005002474B4 (https=)
GB (1) GB2434882B (https=)
TW (1) TWI369749B (https=)
WO (1) WO2006041543A1 (https=)

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US8170704B2 (en) 2008-03-31 2012-05-01 Globalfoundries Inc. Method and system for automatic generation of throughput models for semiconductor tools
US8559001B2 (en) * 2010-01-11 2013-10-15 Kla-Tencor Corporation Inspection guided overlay metrology
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DE102012200066B4 (de) * 2012-01-03 2020-09-03 Endress + Hauser Process Solutions Ag Verfahren und Einrichtung zur Visualisierung von Informationen in einer Prozessanlage
US9816370B2 (en) * 2012-09-19 2017-11-14 Honeywell International Inc. System and method for optimizing an operation of a sensor used with wellbore equipment
CN102945030B (zh) * 2012-11-02 2015-04-01 上海华力微电子有限公司 一种有效控制晶圆生产过程中生产周期失控的方法
US9760020B2 (en) 2012-11-21 2017-09-12 Kla-Tencor Corporation In-situ metrology
US10133263B1 (en) 2014-08-18 2018-11-20 Kla-Tencor Corporation Process condition based dynamic defect inspection
TWI539298B (zh) * 2015-05-27 2016-06-21 國立成功大學 具取樣率決定機制的量測抽樣方法 與其電腦程式產品
US10754260B2 (en) 2015-06-18 2020-08-25 Kla-Tencor Corporation Method and system for process control with flexible sampling
WO2017053150A1 (en) * 2015-09-21 2017-03-30 Kla-Tencor Corporation Method and system for process control with flexible sampling
WO2017080727A1 (en) * 2015-11-11 2017-05-18 Asml Netherlands B.V. Method and apparatus for predicting performance of a metrology system
CN108931336A (zh) * 2017-05-23 2018-12-04 北京航天计量测试技术研究所 一种高稳定性压力控制算法
KR101995112B1 (ko) * 2017-06-14 2019-09-30 에스케이 주식회사 장비신뢰지수에 기초한 Lot 리스크 스코어 기반의 동적 Lot 계측 제어방법 및 시스템
CN115083936B (zh) * 2021-03-10 2025-01-10 长鑫存储技术有限公司 采样量测方法、系统、计算机设备及存储介质
US12000882B2 (en) 2021-03-10 2024-06-04 Changxin Memory Technologies, Inc. Sampling measurement method, system, computer device and storage medium

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Also Published As

Publication number Publication date
CN101032013A (zh) 2007-09-05
GB0705693D0 (en) 2007-05-02
DE112005002474T5 (de) 2007-09-06
US20060074503A1 (en) 2006-04-06
GB2434882B (en) 2009-01-21
JP2008516447A (ja) 2008-05-15
US7076321B2 (en) 2006-07-11
KR20070061868A (ko) 2007-06-14
TW200623300A (en) 2006-07-01
CN101032013B (zh) 2011-07-06
WO2006041543A1 (en) 2006-04-20
DE112005002474B4 (de) 2017-02-09
GB2434882A (en) 2007-08-08

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