TWI369619B - Method of verifying a layout pattern - Google Patents

Method of verifying a layout pattern

Info

Publication number
TWI369619B
TWI369619B TW096118367A TW96118367A TWI369619B TW I369619 B TWI369619 B TW I369619B TW 096118367 A TW096118367 A TW 096118367A TW 96118367 A TW96118367 A TW 96118367A TW I369619 B TWI369619 B TW I369619B
Authority
TW
Taiwan
Prior art keywords
verifying
layout pattern
layout
pattern
Prior art date
Application number
TW096118367A
Other languages
Chinese (zh)
Other versions
TW200846958A (en
Inventor
Te Hung Wu
Chia Wei Huang
Chuen Huei Yang
Sheng Yuan Huang
Pei Ru Tsai
Chih Hao Wu
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW096118367A priority Critical patent/TWI369619B/en
Publication of TW200846958A publication Critical patent/TW200846958A/en
Application granted granted Critical
Publication of TWI369619B publication Critical patent/TWI369619B/en

Links

TW096118367A 2007-05-23 2007-05-23 Method of verifying a layout pattern TWI369619B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW096118367A TWI369619B (en) 2007-05-23 2007-05-23 Method of verifying a layout pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW096118367A TWI369619B (en) 2007-05-23 2007-05-23 Method of verifying a layout pattern

Publications (2)

Publication Number Publication Date
TW200846958A TW200846958A (en) 2008-12-01
TWI369619B true TWI369619B (en) 2012-08-01

Family

ID=44823378

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096118367A TWI369619B (en) 2007-05-23 2007-05-23 Method of verifying a layout pattern

Country Status (1)

Country Link
TW (1) TWI369619B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI488245B (en) * 2009-05-19 2015-06-11 United Microelectronics Corp Method for inspecting photoresist pattern
US8831333B2 (en) * 2012-06-13 2014-09-09 Nanya Technology Corporation Mask pattern analysis apparatus and method for analyzing mask pattern

Also Published As

Publication number Publication date
TW200846958A (en) 2008-12-01

Similar Documents

Publication Publication Date Title
TWI365483B (en) Method for forming a via in a substrate
EP2176407A4 (en) Method of patterning a substrate
TWI341553B (en) Method of forming resist pattern
EP2353172A4 (en) Methods of forming a masking pattern for integrated circuits
IL196648A0 (en) Method and apparatus for flexible pilot pattern
EP2162237A4 (en) Method of patterning a substrate
EP2269116A4 (en) Phototools having a protective layer
EP2121811A4 (en) Method for making a dispersion
EP1987110A4 (en) Method for treating a substrate
PL1961770T3 (en) Method of making a complex
PL2226747T3 (en) Method and device for creating a wiring pattern on a substrate
GB0610434D0 (en) Pattern matching apparatus
EP1999319A4 (en) Method of making a floorboard
EP2040125A4 (en) Method of forming microfined resist pattern
EP2475517A4 (en) Method for manufacturing a board
GB0724491D0 (en) A method
SI2007946T1 (en) Method for producing a non-slip coating
TWI346249B (en) Photomask layout pattern
FI20070955A (en) A method for producing a superhydrophobic surface
GB0620712D0 (en) Method of embssing a substrate
GB0600284D0 (en) Apparatus for simulating a flame
EP2373342A4 (en) Method for inducing a trif-bias
TWI369619B (en) Method of verifying a layout pattern
TWI372984B (en) Method for modifying mask layout
GB2457018B (en) Pattern for identifying a location on a surface