TWI363586B - Method for fabricating fine line on printing circuit board - Google Patents
Method for fabricating fine line on printing circuit board Download PDFInfo
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- TWI363586B TWI363586B TW97135310A TW97135310A TWI363586B TW I363586 B TWI363586 B TW I363586B TW 97135310 A TW97135310 A TW 97135310A TW 97135310 A TW97135310 A TW 97135310A TW I363586 B TWI363586 B TW I363586B
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- conductive layer
- copper
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- 238000000034 method Methods 0.000 title claims description 22
- 239000000758 substrate Substances 0.000 claims description 42
- 239000010949 copper Substances 0.000 claims description 35
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 34
- 229910052802 copper Inorganic materials 0.000 claims description 34
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 229920002120 photoresistant polymer Polymers 0.000 claims description 15
- 238000011161 development Methods 0.000 claims description 9
- 238000000059 patterning Methods 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000000654 additive Substances 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000011651 chromium Substances 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- 238000005234 chemical deposition Methods 0.000 claims description 5
- 238000009713 electroplating Methods 0.000 claims description 5
- 229910052718 tin Inorganic materials 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 238000005553 drilling Methods 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 3
- 239000011135 tin Substances 0.000 claims 2
- 241000361919 Metaphire sieboldi Species 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000005242 forging Methods 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 235000021438 curry Nutrition 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Description
!363586 九、發明說明: 【發明所屬之技術領域】 本發明是有關於一種電路板之製造方法,且特別是 有關一種電路板細線路之製造方法。 【先前技術】 按’資訊電子科技隨著通訊產業的快速發展,在9〇 年代以後不斷的朝向消費性電子產品(Computer、BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a circuit board, and more particularly to a method of manufacturing a circuit board fine line. [Prior Art] According to the rapid development of the information industry, the information technology has been moving towards consumer electronics products after the 9th century (Computer,
Communication、Consumer Electronics,3C)之整合目標 前進,個人化的電子產品不斷的推陳出新,強調可攜性 及便利性的多媒體南品質的資訊通訊工具,因此帶動了 半導體產業,尤其是半導體封裝型式的改變,這些市場 需求直接促成了資訊電子的數位化,使半導體封裝自然 走向多腳化(Multipiii)發展與研發。上述演進對於印刷電 路板(Printing Circuit Board ’ PCB)本身來說,所代表的 思義就是線路逸、度的快速提昇與板面空間的条速壓 縮,因此,高密度化設計的印刷電路板(High Density Interconnection,HDI)製程技術因應而生’其中高密度 化的需求有下列四點:1.壓縮電路板線路尺寸;2縮 小孔徑與製作盲孔(Bland Via)、或埋孔(BudedVia); 3 縮小線路公差;4 ·減少介電層的厚度。 如,凊參照第一 A至一 F圖所繪示習知電路板細線 路之製造方法之製程剖面示意圖’首先提供一某板1〇 〇 ’該基板1 0 0之頂面形成一第一導電層110,該 基板1 0 0之底面形成一第二導電層1 2 〇,接著以曝 光顯影(Lithography)於該第一導電層1 1 〇而形成一圖 形化之第一導電層1 1 0 a ’該圖形化之第一導電層工 5 1363586 1 〇 a具有一第一導電層開口 1 1 2,在該第一導電層 開口 1 1 2處以雷射鑽孔(Laser Drill)於該基板丄〇 ◦ 而形成一盲孔1 〇 2 ’接著在該盲孔1 〇 2内去除膠漬 (Desmear) ’然後形成一化銅層1 3 0,該化鋼層1 3 〇 覆蓋於該盲孔1 〇 2、該圖形化之第一導電層1 1 〇 "^ ° …一·八丄υ υ,接著在m 化銅層1 3 0表面上曝光顯影以形成複數個# 霞辦The integration goal of Communication, Consumer Electronics, 3C), personalized electronic products continue to evolve, and the multimedia information quality communication tools that emphasize portability and convenience have driven the semiconductor industry, especially the semiconductor package type. These market demands have directly contributed to the digitalization of information electronics, which has led to the development of semiconductor packages and the development and development of Multipiii. The above evolution for the printed circuit board (PCB) itself represents the rapid improvement of the line and the speed of the board space, so the printed circuit board of high density design ( High Density Interconnection (HDI) process technology is produced in response to the demand for high density: the following four points: 1. Compressed circuit board line size; 2 reduced aperture and blind hole (Bland Via), or buried hole (BudedVia); 3 Reduce the line tolerance; 4 · Reduce the thickness of the dielectric layer. For example, the process profile of the conventional circuit board manufacturing method of the conventional circuit board is described with reference to the first A to F diagrams. First, a certain board is provided. The top surface of the substrate 100 forms a first conductive. a layer 110, a bottom surface of the substrate 100 is formed with a second conductive layer 1 2 〇, and then a first conductive layer 1 1 a is formed by exposure and development (Lithography) to form a patterned first conductive layer 1 1 0 a The patterned first conductive layer 5 1363586 1 〇a has a first conductive layer opening 112, and a laser hole is drilled at the first conductive layer opening 112. ◦ forming a blind hole 1 〇 2 ' and then removing the glue (Desmear) in the blind hole 1 〇 2 and then forming a copper layer 130, the chemical layer 13 3 〇 covering the blind hole 1 〇 2. The patterned first conductive layer 1 1 〇 "^ ° ... · 丄υ υ υ, then exposed and developed on the surface of the m copper layer 130 to form a plurality of #霞
以 1 40 ’該些光阻單體14 0用以限制電鍍區接著 半加成方法(Semi Additive Process,SAp) , 導電盲孔1 5 2,及複數個細線路工5 4。电㈣ 另,上it習知電路板細線路之製造方 法(Sustractive Process,SP),用㈣ α、 和用減成方 製作複數個細線路。 一階的盲孔,得以 准,上述習知電路板細線路 法、或減成方法形成二階的盲孔 ^ &方法使用半加成方 達到電路板細線路的要求。目,製作該些細線路,無法The photoresist unit 14 0 is used to limit the electroplating zone to a semi-additive process (Sep Additive Process, SAp), a conductive blind via 1 52, and a plurality of fine line workers 54. Electric (4) In addition, the conventional method of manufacturing the circuit board (Sustractive Process, SP), using (4) α, and using the subtraction square to make a plurality of fine lines. The first-order blind holes are accurate. The above-mentioned conventional circuit board thin line method or subtractive method forms a second-order blind hole. The method uses a semi-additive to achieve the requirements of the thin circuit of the circuit board. The purpose of making these fine lines is impossible.
八β执上述缺奏 年來從事此方面之相關經驗,采、、,可改善,且依據多 合學理之運用,而提出一種設=二觀察且研究之,並配 失之本發明。 δ理且有效改善上述缺 [發明内容】 因此本發明之目的,在於 製造方法,達到製作細線路的目的。一種電路板細線路之 根據本發明之上述目的,'。 細線路之f造方法,包括下^重電路板 板之頂面具有~第一導電層,=其"·提供一基板,該基 唸基板之底面具有一第二 6 1363586 層第圖第一導電層使具有至少-開口;於該 二Γ二电層開口處進行雷射鑽孔並穿透該基 >成至少一盲孔;去除該圖形化之第一導電 層,並圖形化該第二導電層以形成至少—導電墊於該盲 且Γ化銅製程形成一化銅層,該化銅層覆蓋於該 口=板之表面、及該盲孔;於該化銅層之表面形成 ^形化光阻層;進行電鍍以形成一圖形化之第三導電 曰’用以形成複數個細線路;以及絲該該基板上之光The above-mentioned lack of experience in this aspect, the acquisition, and improvement can be improved, and based on the application of multi-disciplinary theory, the present invention is proposed and studied. The present invention is directed to a manufacturing method for the purpose of producing a fine line. A circuit board fine line according to the above object of the present invention, '. The method for manufacturing a fine circuit includes a first conductive layer on the top surface of the lower circuit board, and a substrate provided thereon. The bottom surface of the base substrate has a second 6 1363586 layer. The conductive layer is provided with at least an opening; laser drilling is performed at the opening of the second electrical layer and penetrates the substrate to form at least one blind via; removing the patterned first conductive layer, and patterning the first And forming a copper layer on the surface of the port and the blind hole; forming a surface on the surface of the copper layer Forming a photoresist layer; performing electroplating to form a patterned third conductive 曰' for forming a plurality of fine lines; and filamentting the light on the substrate
阻居。Block.
本發明提出另一種電路板細線路之製造方法,包括 :列步驟.提供-基板,該基板之頂面具有—第一導電 二,該基板之底面具有一第二導電層;圖形化該第一導 =層使具有至少-開口;於該至少—第—導電層開口處 嗅订雷射鑽孔並穿透該基板,進而形成至少一盲孔;去 =該圖形化之第-導電層,並圖形化該第二導電層以形 至導電塾於該盲孔下方;以化銅製程形成一化銅 二、’,該化銅層覆蓋於該圖形化之基板、及該盲孔;形成 光阻層於該基板表面,其中將該基板頂面之光阻層圖 ^化,進行電鍍以形成一圖形化之第三導電層於該基板 、面’以及去除該基板上之光阻層。 本發明係具有以下有益效果: 一)利用圖形化該第三導電層係用以形成該圖形 之第二導電層’該圖形化之第三導電層可製作導電盲 孔、細線路'及導電墊。 (二)以曝光顯影製程於該化銅層,形成該光阻層 少保護該圖形化之基板底面之化銅層,可製作細線 1363586 路、及盲孔。 為了使本發明之敘述更加詳盡與完備 内容中,提供許多不同的實施例或範例, 描述並配合圖式,用來瞭解在不同實施例 徵之應用。 【實施方式】 【第一實施例】The present invention provides another method for manufacturing a thin circuit of a circuit board, comprising: a step of providing a substrate, the top surface of the substrate has a first conductive second, and a bottom surface of the substrate has a second conductive layer; The conductive layer has at least an opening; the laser is drilled at the opening of the at least first conductive layer and penetrates the substrate to form at least one blind via; to = the patterned first conductive layer, and Graphically patterning the second conductive layer to form a conductive layer under the blind hole; forming a copper layer, ', the copper layer covers the patterned substrate and the blind hole; forming a photoresist Layered on the surface of the substrate, wherein the photoresist layer on the top surface of the substrate is patterned to form a patterned third conductive layer on the substrate, the surface, and the photoresist layer on the substrate. The invention has the following beneficial effects: a) utilizing the patterned third conductive layer to form a second conductive layer of the pattern 'The patterned third conductive layer can make a conductive blind hole, a thin line' and a conductive pad . (2) Forming the copper layer by an exposure and development process to form the photoresist layer to protect the copper layer on the bottom surface of the patterned substrate, thereby forming a thin line 1363586 and a blind hole. To make the description of the present invention more detailed and complete, many different embodiments or examples are provided, and the drawings are described and used to understand the application in various embodiments. [Embodiment] [First Embodiment]
括下=實施例提供一種電路板細線路之製造方法包 睛參照第二ASI,提供—基板3 Q Q,基板3 二'面具有一第一導電層3 1 〇,基板3 0 0之底面且 有一弟二導電層3 2 〇。 、Included = Embodiment provides a method for manufacturing a circuit board fine line. Referring to the second ASI, the substrate 3 is provided, and the substrate 3 has a first conductive layer 3 1 〇, and the substrate 300 has a bottom surface and a The second conductive layer 3 2 〇. ,
,以下發明 可參照下列 中的不同特 形成第-導電層3 1 〇、第二導電層3 2 〇之步驟係 以濺鍍(sputtering)、蒸鍍(Evaporati〇n)、電鍍(£]咖叩ia 及化學沈積(CVD)之-者所執行。其中,第—導電層3工 〇、第二導電層3 2 0係包括錫(sn)、銅(〇!)、鉻(Cr)、 = (Pd)、鎳(Ni)與其合金之一者。在本實施例中,形成第一 二310 H電層320之步驟係以電錢所執 仃’第-導電層310、第二導電層32〇為銅。 y明參照第二B圖,圖形化第一導電層3 1 〇係用以 形成一圖形化之第一導電層3丄〇 a,圖形化之第一導 電層3 1 〇a具有一第一導電層開口3 1 2。 在本實施例中,圖形化第一導電層3 1 0之步驟依 a係用以曝光顯影(Lith〇graphy)、及蝕刻(Etching)、去 乾膜所執行,進而形成第一導電層開孔3 1 2。 8 1363586 凊參照第二C圖’於第一導電層開口 3 1 2處進行 雷射鑽孔並穿透基板3 0 〇,進而形成一盲孔3 〇 2、 及一圖形化之基板3 0 〇 a。 在本實施例中’雷射係用以二氧化碳雷射(C02 Laser)於第一導電層開口 3丄2處鑽孔並穿透基板3 〇 0,根據第一導電層開口 3 1 2、及基板3 〇 〇厚度 的大小,可調整二氧化碳雷射的參數,得到適當大小之 盲孔3 0 2。In the following invention, the steps of forming the first conductive layer 3 1 〇 and the second conductive layer 3 2 参照 with reference to the following may be performed by sputtering, evaporation, plating (£) curry. Executed by ia and chemical deposition (CVD), wherein the first conductive layer 3 and the second conductive layer 3 2 0 include tin (sn), copper (〇!), chromium (Cr), = ( One of Pd), nickel (Ni) and its alloy. In this embodiment, the step of forming the first two 310 H electric layer 320 is performed by the electric money, the first conductive layer 310 and the second conductive layer 32〇. Referring to FIG. 2B, the patterned first conductive layer 3 1 is used to form a patterned first conductive layer 3 丄〇 a, and the patterned first conductive layer 3 1 〇 a has a The first conductive layer opening 3 1 2 . In the embodiment, the step of patterning the first conductive layer 310 is performed according to a system for exposure and development, etching, and drying. And forming a first conductive layer opening 3 1 2 . 8 1363586 凊 Referring to the second C diagram 'laser drilling at the first conductive layer opening 3 1 2 and penetrating the substrate 30 〇, thereby forming a blind hole 3 〇 2, and a patterned substrate 30 〇 a. In the present embodiment, the 'laser system is used for carbon dioxide laser (C02 Laser) to drill holes in the first conductive layer opening 3 丄 2 and penetrate the substrate 3 〇0, according to the thickness of the first conductive layer opening 3 1 2 and the thickness of the substrate 3 ,, the parameters of the carbon dioxide laser can be adjusted to obtain a blind hole 3 0 2 of an appropriate size.
請參照第二D圖,去除圖形化之第一導電層3工◦ a,並圖形化第二導電層32〇係用以形成一導電墊 2 2° 在本實施例中,於去除圖形化之第一導電層3工〇 a之步驟以前,進行除膠渣(Smear Rem〇val,曰又稱為Referring to FIG. 2D, the patterned first conductive layer 3 is removed, and the second conductive layer 32 is patterned to form a conductive pad 2 2°. In this embodiment, the pattern is removed. Before the step of the first conductive layer 3, a desmear (Smear Rem〇val, 曰 is also called
Desmear)之操作,利用化學蝕刻方式將上述步驟中所使 用雷射鑽孔後殘餘的膠渣(如環氧樹脂)清除乾淨,接 著,去除圖形化之第-導電層3 i Q a之步驟係以姓刻Desmear), using chemical etching to remove the residual residue (such as epoxy resin) after laser drilling used in the above steps, and then removing the patterned first conductive layer 3 i Q a Surname
所執仃,之後,圖形化第二導電層3 2 〇之步驟係以曝 光顯影技術來執行,而形成導電墊3 2 2於盲孔3 〇 2 下方。 請參照第二E圖,以化銅製程用以形成—化銅層 3 0,該化銅層3 3 0覆蓋圖形化之基板3 〇 〇 a : 電墊3 2 2的表面及盲孔3 〇 2。請參照第二?圖:; 化銅層3 3 Q之表面形成圖形化光阻層,圖形化 單體3 4 0,於光阻單體3 4 0設置於: 清參照第二G、及二Η圖,圖形化第三導電層係) 9 1363586 以形成一圖形化之第三導電層3 5 0 a,部份之阖形化 之第三導電層3 5 0 a覆蓋於化銅層3 3 0係用以形 成複數個細線路3 5 4,另一部份之圖形化之第三導電 層3 5 0 a同時覆蓋於導電塾3 2 2、及化銅層3 3 〇 ’形成一另一導電墊3 5 6,其餘之圖形化之第三導 電層3 5 0 a覆蓋於盲孔3 0 2係用以形成一導電盲 孔3 5 2。其中,細線路3 5 4係藉由半加成方法(SemiAfter that, the step of patterning the second conductive layer 3 2 执行 is performed by an exposure development technique to form a conductive pad 32 2 below the blind via 3 〇 2 . Referring to FIG. 2E, a copper process is used to form a copper layer 30, which covers the patterned substrate 3 〇〇a : the surface of the pad 3 2 2 and the blind via 3 〇 2. Please refer to the second? Fig.:; The surface of the copper layer 3 3 Q forms a patterned photoresist layer, and the patterned monomer 340 is disposed on the photoresist unit 340 in clear reference to the second G and the second graph. The third conductive layer is 9 1363586 to form a patterned third conductive layer 3 50 a, and the partially patterned third conductive layer 3 5 0 a is overlaid on the copper layer 3 3 0 for forming a plurality of thin lines 3 5 4 are formed, and another portion of the patterned third conductive layer 3 5 a covers both the conductive germanium 3 2 2 and the copper layer 3 3 〇 ′ to form a further conductive pad 3 5 6 The remaining patterned third conductive layer 3 5 0 a covers the blind via 3 0 2 to form a conductive blind via 3 5 2 . Among them, the thin line 3 5 4 is by a semi-additive method (Semi
Additive Process,SAP)而設置於化銅層3 3 〇上,細線Additive Process, SAP) is placed on the copper layer 3 3 〇, thin line
路3 5 4藉由該圖形化之光阻單體3 4 〇而彼此隔 絕,導電塾3 2 2電性連接於導電盲孔3 5 2。 更進一步說,另一導電墊3 5 6藉由覆蓋於導電墊 3 2 2,產生步階(STEP)現象,可改善習知導電墊因設 置於導電盲孔3 5 2底部開口處所造成的塌陷。 【弟一貫施例】 種電路板細線路之製造方 本發明實施例提供另 法,包括下列步驟:The circuit 3 5 4 is separated from each other by the patterned photoresist unit 3 4 ,, and the conductive 塾 32 2 is electrically connected to the conductive blind hole 3 5 2 . Furthermore, another conductive pad 356 generates a step phenomenon by covering the conductive pad 32 2 , which can improve the collapse of the conventional conductive pad due to the opening at the bottom of the conductive blind hole 3 5 2 . . </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt;
請參照第三A圖,提供一基板^〇 夕了首而目士 咕 ^^ 汉基板500 之頂面具有一第一導電層5 i J υ υ 有一第二導電層520。 土 0之底面具 在本實施例中,形成第一導雷 化學沉積所執行,該第一導電屏θ 之步驟係以 導電層5 2 0之步驟係以化“上:為鋼,形成第二 層5 2 0為銅。 償所執仃’該第二導電 導電層5 1 Q係用以 a ’圖形化之第一導 1:7 5 1 2。 請參照第三Β圖,圖形化第一 形成一圖形化之第一導電層5工 電層5 1 〇a具有一第—導電層開Referring to FIG. 3A, a substrate is provided, and the top surface of the Han substrate 500 has a first conductive layer 5 i J υ 有一 and a second conductive layer 520. In the present embodiment, the bottom mask of the earth 0 is formed by forming a first conductive chemical deposition, and the step of the first conductive screen θ is performed by the step of the conductive layer 520. Layer 5 2 0 is copper. The second conductive conductive layer 5 1 Q is used for a 'patterning first guide 1: 7 5 1 2. Please refer to the third map, graphical first Forming a patterned first conductive layer 5, the power layer 5 1 〇a has a first conductive layer
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TW97135310A TWI363586B (en) | 2008-09-15 | 2008-09-15 | Method for fabricating fine line on printing circuit board |
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CN114980567B (en) * | 2021-02-20 | 2024-03-19 | 嘉联益电子(昆山)有限公司 | Manufacturing method of circuit board line structure with through holes and manufactured circuit board line structure with through holes |
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