TWI360614B - Valve door with ball coupling - Google Patents

Description

1360614 IX. INSTRUCTIONS OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION Embodiments of the present invention generally relate to vacuum isolation valves for sealing substrate passages in vacuum processing systems. [Prior Art]

Thin film transistors (TFTs) are commonly used in active matrix displays such as computer and television monitors, mobile phone displays, personal digital assistants (PDAs), and a growing number of other devices. Typically, a flat panel display includes two glass panels with a layer of liquid crystal material interposed therebetween. At least one of the glass sheets includes a conductive film disposed thereon, the conductive film being connected to a power source. The power supplied from the power source to the conductive film changes the alignment of the crystal material to form a pattern display.

As the market embraces flat panel display technology, the need for larger displays, higher throughput and lower manufacturing costs has prompted device manufacturers to develop new systems for flat panel display manufacturers that accommodate larger sized glass substrates. Existing glass substrate processing equipment is typically configured to accommodate substrates up to about 5 square meters. In the near future, it is expected to configure a processing device that accommodates a substrate size of more than 5 square meters. Glass substrate processing is typically performed in a cluster tool by subjecting the substrate to a plurality of sequential processes to form components, conductors, and insulators on the substrate. Each of these processes is typically implemented in a process chamber configured to perform a single step production process. In order to efficiently complete the processing steps of the entire sequence, the cluster device includes a plurality of processes 5 1360614 cavities connected to the central transfer chamber. The robotic arm mounted in the transfer chamber assists in substrate transfer between the process chamber and the load lock chamber. The load lock cavity allows the substrate to be transferred between the vacuum environment of the cluster device and the environment of the factory interface. This clustering device for glass substrate processing is available from AKT, a wholly owned subsidiary of Applied Materials, Inc. of Santa Clara, California. Since the size of substrates for manufacturing flat panel displays has become large, manufacturing equipment for these substrates has also become larger in size. Correspondingly, the door or gate that isolates the vacuum chambers (or load lock chambers) from each other becomes nine or more, because the slot openings between the two chambers must be wider to accommodate large widths. The substrate passes through the slotted opening. The ever-increasing size of the valve presents a technical challenge to the good isolation seal between the two chambers maintained by a synthetic rubber seal disposed around the slot opening between the valve and the chamber wall. Fig. 1A shows a partial cross-sectional view of a substrate passage formed through the chamber body 1〇6 and selectively sealed by a conventional vacuum isolation valve U0. Conventional vacuum isolation valves typically consist of a flat member of aluminum having a longer lateral span. As shown in Fig. 1A-B, the closing force is applied to the center of the valve 1 1 through the gate 102 connected to the rigid rotating shaft 104. The valve 1 1 is rotated by an actuator 118 coupled to the shaft 104 between the position of the seal passage 108 (shown in Figure 1A) and the open position of the passage 1 〇 8 . A seal 11 6 is disposed between the valve 11 〇 and the chamber body 106. The force required to load the seal 116 is large in order to achieve good cavity isolation. As indicated by arrow 113, the high load applied near the center of the valve 1 1 导致 results in a higher load force near the center of the valve 1 10 0 and a substantially smaller sealing force near the valve end. As indicated by the dashed axis 120, due to the valve 6 1360614

The 110 has a long span between the bearing bracket 114 disposed in the wall of the chamber body 106 and the gate 1 0 2 connecting the center of the valve 110. The shaft 1 〇 4 may bend under load. When the valve 110 is in the closed position, the curvature of the shaft 104 further deteriorates the low load condition of the seal at the end of the valve. The lower sealing force at the edge of the valve can result in undesirable exposure through the passage 108. To provide a more rigid valve for a more uniform sealed load, the valve and/or shaft can be made of a thicker material or a material with a higher modulus. However, since high strength materials are generally expensive and large load lock chambers between operations may need to have sufficient clearance to accommodate larger, high strength doors, this approach increases the load lock cavity due to the cavity. The increased material and manufacturing costs themselves, as well as the large vacuum build-up, require increased pump power, so larger load lock chambers are not desirable. Additionally, the increased vacuum volume typically requires an increase in vacuum time that does not affect system throughput. A curved vacuum isolation valve has been proposed to solve these problems, and is commonly assigned and previously incorporated by reference to U.S. Patent Application Serial No. 10/867,100, filed on Jun. 14, 2004, entitled "CURVED SLIT VALVE DOOR" It is described. The implementation of a curved vacuum barrier presents new engineering challenges. For example, since the valve sealing surface becomes flat when the planar cavity wall is pressed to seal the vacuum isolation valve passage, the change in the projected length of the curved vacuum isolation valve should be accommodated to prevent excessive wear of the valve actuation mechanism. In addition, since the vacuum isolation valve rotates on the valve sealing surface, the vacuum isolation valve and the valve sealing table have a k 0 tolerance and a separation prevention surface during the bending process of the curved door.

Claims (1)

1360614 _ . 丨φί ι V月v/0 Revision for I Beads, Patent Application Range: 1. A cavity comprising: a cavity body having a first substrate inlet and outlet; a valve member having a positionable Selectively sealing a sealing surface of the first inlet and outlet; a first lever arm having a first end coupled to a portion disposed through the cavity body: and a first ball joint, the lever arm The first ball joint in the valve member allows the valve member to rotate at least on at least two of the first rod arms about the center of the first ball joint; a second ball joint; An arm having a first end coupled to a portion disposed through the body of the cavity, and a second end coupled to a second end of the body member by the second ball joint And wherein the second head allows the valve member to rotate about the at least two axes and to rotate in at least two planes relative to the center of the first ball joint in at least two planes, the first and second ball joints further comprising: a ball; the carrier 'captures the ball and allows The ball is rotated therein by a connecting member that extends through the ball and the carrier, the member coupling the valve member to the respective lever arm, wherein the ball is located at a recess in the valve member. - the first axis of the substrate is connected, the two of which are rotated and the two of the second axis are isolated from the ball-shaped two-armed arm, and: and the connection is formed in the form of 27 Γ 360614 2. The cavity according to claim 1 of the patent application, wherein The cavity body includes: a plurality of stacked single substrate transfer chambers. 3. The cavity of claim 1, wherein the sealing mask has a curvature. 4. The cavity according to claim 1, wherein the cavity is a phase deposition cavity, a load lock cavity, a metering cavity, a heat treatment cavity, a physical vapor deposition cavity, a load lock cavity, and a One of the substrate transfer chambers or a cavity. 5. A processing system comprising: a transfer chamber; and a load lock chamber coupled to the transfer chamber, the load lock chamber, a chamber body having at least one substrate transfer chamber, the one substrate transfer chamber having a a first substrate inlet and outlet and at least one first plate inlet and outlet, wherein a substantially flat seal on the substrate transfer chamber surrounds at least the first substrate inlet and outlet; a valve member having a curved sealing surface for positioning against the substrate Transmitting the flat sealing surface of the chamber to selectively seal the step with a convex or a vacuum Further comprising: at least two base surfaces abutting the first 28 Γ 360614 substrate inlet and outlet; a lever arm; and a ball joint, when the flat sealing surface of the sealing substrate transfer cavity of the valve member is flattened, the member surrounds at least The two shafts rotate and are coupled to the lever arm in a manner that rotates in at least two planes about the detent, wherein the ball joint further comprises: a ball; a carrier that captures the ball and allows the The ball is in the name of a connecting member that extends through the ball and the carrier member to couple the valve member to the lever arm, wherein the ball is a recess in the valve member. 6. The system of claim 5, wherein the lever arm further comprises: a recess having the ball and the load disposed therein. 7. The system of claim 6 The negative valve member further includes: a recess having an elastic bushing disposed therein, the connecting member extending through a portion formed through the elastic bushing to permit lateral movement of the connecting member relative to the valve member And the valve member that allows the valve ball joint; and the connection is formed in the load lock chamber to lock the lock cavity, and wherein the clearance hole is 29 1360614 8. As claimed in the fifth item The system wherein the valve member of the load lock chamber further comprises: a recess having the ball and the carrier disposed therein. 9. The system of claim 8 wherein the recess of the valve member is formed in the outward sealing surface of the sealing gland. The system of claim 9, wherein the lever arm of the load lock chamber further comprises: a recess having an elastic bushing disposed therein, and wherein the connecting member extends through The elastic bushing defines a clearance hole to allow the connecting member to move laterally relative to the lever arm. 1 1. The system of claim 5, wherein the ball and the carrier are made of stainless steel. 12. A method for sealing an inlet and outlet of a substrate, comprising the steps of: actuating a first arm and a second arm to rotate a curved sealing surface of a valve member to contact a flat sealing surface, wherein The flat sealing surface surrounds a substrate inlet and outlet defined between a load lock chamber and a transfer chamber, the rod arms are connected to the valve member by respective ball joints; and the curved sealing surface of the valve member is abutted Flattening by the flat sealing surface to seal the substrate inlet and outlet, wherein the flattening step causes the plurality of ends of the valve 30 *·*« to be rotated at least in at least two flat two axes and The method of claim 12, further comprising: the method of claim 12, wherein the flattening step 限定 defines a door member extending through the joint through the material to rotate substantially in a first axis The valve and aligning the curved sealing surface with the flat sealing surface: when the pedal member is flattened, ^^^^ surrounds the first axis defined through the respective ball joint The third axis rotates the ends of the π member. The method of claim </ RTI> wherein the flattening step 14 further comprises: moving the ends of the door member laterally outwardly. 15. The method of claim M, wherein at least one of the ball joints includes a connecting member extending through a ball, and wherein the valve members are laterally outwardly moved, and the ends are The step of the portion further includes: moving a direction of the connecting member outwardly, wherein the outward movement of the connecting member rotates the ball. The flattening step 16. The method of claim 12, wherein the method of claim 12, wherein Further comprising: 31 1360614 rotating a ball disposed in a recess of the valve member. The method of claim 12, wherein the change further comprises: 'rotating at least one of the lever arms The method of claim 12, wherein the step of rotating the curved sealing surface of the member to contact the flat sealing surface comprises the step of contacting the flat sealing surface : a central portion of the valve member contacts the ball joints in the flat seal table to couple the ends of the valve member to the arms prior to contacting the end portions of the valve member with the flat seal. Flat step a ball. The valve, into the surface of a surface, the rods 32