TWI354099B - Unevenness inspecting apparatus and unevenness ins - Google Patents

Unevenness inspecting apparatus and unevenness ins Download PDF

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TWI354099B
TWI354099B TW096118935A TW96118935A TWI354099B TW I354099 B TWI354099 B TW I354099B TW 096118935 A TW096118935 A TW 096118935A TW 96118935 A TW96118935 A TW 96118935A TW I354099 B TWI354099 B TW I354099B
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substrate
image
thickness unevenness
main surface
directions
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TW096118935A
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TW200806975A (en
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Azai Kichiji
Sueki Hiroshi
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Dainippon Screen Mfg
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/70Determining position or orientation of objects or cameras
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • G01N2021/95638Inspecting patterns on the surface of objects for PCB's
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30141Printed circuit board [PCB]

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  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Textile Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Image Analysis (AREA)

Description

1354099 九、發明說明: 【發明所屬之技術領域】 本發明有關於用來檢查形成在基板之膜上的條紋不均 之技術。 【先前技術】 在先前技術,當在顯示裝置用玻璃基板等(以下簡稱為 「基板」)之主面上形成既定圖案時,旋轉塗佈機將抗蝕 劑液塗佈在基板之主面上,並以垂直於主面之旋轉軸作為 中心使基板旋轉,用來形成抗蝕劑膜,在日本專利特開 2006-49630號公報所提案之技術是取得利用旋轉塗佈機 塗佈抗蝕劑液後之基板的影像,藉以檢查基板之主面上的 塗佈不均。 另外,在曰本專利特開平9_685〇2號公報(文獻丨)中, 在表示陰影遮罩之影像中,於互相正交之圖素的排列方向 中,其一個方向之各個位置,對排列在另外-個方向的圖 =值進仃累計絲取得累計數據,利用使累計數據平滑 ^匕後之平滑化數據所對應之值,除累計數據之各 據所獲得之聽㈣據,料_料之條料均是^ ::,在曰本專利案特開平&quot;關4號公報中,; =手法是在對角膜内皮所攝得之影像中,以利用既定 ㈣作=;:,求得在各個徑向方向 變數所表以料料㈣方向作為 化之徑向方向,用來取==微分絲之符號變 月腸内皮細胞之外形線。 312XP/發明說明書(補件)/96-08/96丨18935 6 在:上=成抗峨時,例如,在塗佈抗㈣液之前 以^要之^有微小的不要之物時’會在抗韻劑膜上產生 、向延柚 料起點並以旋轉軸作為令心而沿著離心方 • i圖辛2紋不均。在此種情況,如文獻]之手法,即使 向對圖素之值累計以求得累計數據,要以 確度確認條紋不均之存在亦會有困難。因此,需 可以以良好之精確度確認基板之膜上,以 ^軸作為中μ在離以心伸之條 【發明内容】 ㈣仔在 針對膜厚不均(mura)檢查裝置,將塗佈液 =到基板之主面上’並以垂直於主面之旋轉軸作為中心 使基板旋轉’用來檢查形成在主面之臈上的條紋不均可 =以良好之精確度而且容易地確認在基板之膜上,以旋轉 轴作為中心而在離心方向延伸之條紋不均的存在。 本發明之膜厚不均檢查襄置具備有:攝影部,利用攝影 裝置對基板之膜攝影’用來取得多色調之對象影像·,和評 估值取得部,在主面上以旋轉軸作為起點朝向外側設定 多個離心方向’在對象影像中,對分別對應於多個離心方 向之方向上排列的圖素之值累計’用來取得與多個離心方 向相對應之多個評估值。 ,照本發明時,經由參照評估值可以以良好之精確度而 且容易地確認在基板之膜上,以旋轉軸作為中心而在離心 方向延伸之條紋不均的存在。 在本發明之一較佳態樣中’在主面設定以旋轉軸作為中 312XP/發明說明書(補件)/96-08/9611893 5 7 ^34099 心之多個環狀區域,·評估值取 著分別對應於多個離心方向之方心在女對象f像中’於沿 度全體的對庫範圍° 、各個核狀區域之寬 求得評估值 /㈣之圖素的值’用來 評估值y 可以抑制條紋不均之長度對 \ 於被辨識為不均之條紋的存在。 亦即,易 狀::夕更好是使各個環狀區域之-部份,與其他任-環 部份,在徑方向成為重疊,設μ跨越在互相 ㈣狀區域交境處的其他環狀區域。利用此種方 可以以良妤之精確度確認高不均強度之條紋不均的存 在0 在本發明之另一較佳形態中,使對象影像中互相正交之 圖素的排列方向,&amp;別對應到基板之主面上互相正交的2 個方向;並且ff估值取得部,在對象影像巾,將以旋轉輛 /斤^應之位置作為中心的極座標系變換成為直角座標 系,產生變換影像,從變換影像求得多個評估值,可以容 易地求得評估值。 另外更佳者疋使多個離心方向以一定之間距角而設 定’當在對象影像之長邊排列的圖素數之一半為α時,上 述間距角成為arc tan( 1 / α )以下。利用此種方式,可以 以良好之精確度產生變換影像。 本發明亦針對用以檢查形成在基板之膜上的條紋不均 之膜厚不均檢查方法。 本發明之上述目的和其他目的、特徵、態樣和優點經由 312ΧΡ/發明說明書(補件)/96~08/96118935 8 1354099 以下參照附圖所進行之本發明詳細說明可以明白。 、【實施方式】 ‘圖1表示本發明一實施形態之膜厚不均(MURA)檢查裝 •置1的構造。膜厚不均檢查裝置}是在液晶顯示裝置等平 ‘面顯示裝置所使用之矩形玻璃基板9,取得形成於一方之 ' j面91作為圖案形成用之抗蝕劑的膜92之影像,根據該 心像而檢查基板9之膜92上的條紋不均。在此處基板9 鲁上之膜92是利用旋轉塗佈法形成者,具體而言,在對靜 止之基板供給抗蝕劑液之後,使基板以垂直於主面之旋轉 軸作為中心而旋轉(稍為靜態法),或在對旋轉之基板上供 給抗蝕劑液之後,使基板之轉速上升(稱為動態法)藉以形 •成亦即基板9上之膜9 2的形成是經由在外部之旋轉 塗佈機對主面91上供給抗蝕劑液,並使基板9以垂直於 主面91之旋轉軸作為中心而旋轉。另外,在靜態法和動 態法是將抗蝕劑液供給到基板之主面中央的中央滴下方 •式,另外,在靜態法,除了中央滴下方式外,亦可以使用 所謂縫隙旋轉(Slit and Spin)方式,使縫隙喷嘴沿著基 板之主面對基板相對移動,並吐出層狀之抗蝕劑液,主面 上對除外緣部外之矩形區域供給抗蝕劑液之後,使基板旋 轉。 如圖1所示,膜厚不均檢查裝置丨具備有··載物台2, 用來保持基板9使形成有膜92之主面91(以下稱為「上 面91」)面向上侧(圖1中之侧);光照射部3,以既 定之射入角將光照射在被載物台2保持的基板9上之膜 312XP/發明說明書(補件)/96-08/96118935 9 1354099 92,受光單元4,用來接受從光照射部3照射而被基板$ =上面91的膜92反射之光;移動機構2卜使載物台2 •對光照射部3和受光單元4進行相對移動;和電腦5,兑 •任務作為膜厚不均檢查裝置丨之控制部。 /、 ••載物台2⑹側之表面最好為黑色消光。移動機構2ι ,成為以螺栓(圖中未顯示)連接到馬達211之構造,利用馬 達211之旋轉,使載物台2沿著導引器212,沿著基板9 之上面91在圖1中之X方向移動。 光照射部3具備有:鹵素燈31,成為射出白色光(亦即, 包含可視區域之全體波長之光)之光源;圓柱狀之石英棒 32,在載物台2之移動方向的垂直方向即圖i中之γ方向 延伸,和圓柱透鏡33,在丫方向延伸。在光照射部3,齒 素燈31被安裝在石英棒32之(+γ)侧的端部,從齒素燈 31射入到石英棒32之光被變換成為在γ方向延伸之線狀 光(亦即,光束剖面在γ方向較長之線狀光),從石英棒 籲32之側面射出,經由圓柱透鏡33被導引到基板g之丄面 91。換吕之,石英棒32和圓柱透鏡33成為光學系,將來 自鹵素燈31之光變換成為垂直於載物台2之移動方向的 線狀光,將其導引到基板9之上面91。 在圖1中,從光照射部3至基板9之光路以一點鏈線表 不(從基板9至受光單元4之光路亦同)。從光照射部3射 出之光的一部份被基板9之上面91上的膜92在(+Ζ)側之 上面反射。膜92對來自光照射部3之光具有光透射性, 來自光照射部3之光甲未被膜92的上面反射之光,透射 312ΧΡ/發明說明書(補件)/96.08/96丨丨8935 1〇 1354099 膜92而在基板9之上面91(亦即,膜92之下面)使其一 部份被反射。在膜厚不均檢查裝置1,被基板9之膜92 •的上面反射之光’和被基板9的上面91反射之光的干涉 •光射入到受光單元4,經由過濾器43和透鏡42將既定波 • 長之干涉光導引到攝影部41。 . 圖2表示攝影部41之受光面。如圖2所示,在攝影部 41設有線感測器410 ’其具有多個受光元件(例如, 籲CCD(Charge Coupled Device)411排列在Y方向成為直線 狀。在攝影部41,利用線感測器410接受來自基板9之 干涉光,用來取得干涉光之強度分布(亦即,來自各個受 光π件411之輸出值在γ方向之分布實際上,隨著基 板9朝向X方向之移動,利用攝影部41之線感測器41 〇 重複取得干涉光之強度分佈,用來取得基板9上之膜92 的2次元影像。 電腦5如圖3所示,其構成包含有:CPU51,用來進行 φ各種演算處理;r〇M52,用來記憶基板程式;和RAM53, 用來記憶各種資訊;構建成為連接到匯流排線之一般電腦 系統構造。匯流線更適當地經由介面(I/F)59a、59b、59c 等連接有:顯示器55,成為顯示部,用來顯示各種資訊; 鍵盤56a和滑鼠56b(以下總稱為「輸入部56」),用來受 理來自操作者之輸入;讀取裝置57,用來讀取來自光碟、 ,碟、光磁碟等電腦可讀取之記錄媒體8的資訊;和通信 部58 ’連接到膜厚不均檢查裝置1之其他構成元件。 在電腦5事前經由讀取裝置57從記.錄媒體8讀出程式 312XP/發明說明書(補件)/96·08/96118935 11 1^354099 卜將其記憶在固定磁碟54'然n' 54ι被複製到 广53’且cPU51依照_53内之程式執行演算處理(亦 ί3 ’電腦執行程式),用來使電腦5進行檢查基板9上 條紋不均的演算部之動作。 圖4是方塊圖,用來表示cpu51依照程式μ進行動 =,用來實現簡卜_52、_53,固定磁碟54等功 此構造。在圖4中表示利用CPU51等實現演算部6内之$1354099 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a technique for inspecting unevenness of streaks formed on a film of a substrate. [Prior Art] In the prior art, when a predetermined pattern is formed on the main surface of a glass substrate for a display device (hereinafter simply referred to as "substrate"), the spin coater applies a resist liquid on the main surface of the substrate. The substrate is rotated around a rotation axis perpendicular to the main surface to form a resist film. The technique proposed in Japanese Laid-Open Patent Publication No. 2006-49630 is to obtain a resist by a spin coater. The image of the substrate after the liquid is used to check the uneven coating on the main surface of the substrate. In the image indicating the shadow mask, in the arrangement direction of the mutually orthogonal pixels, each position in one direction is arranged in the image of the shadow mask. In addition, the graph in the one direction is the cumulative data obtained by the cumulative yarn, and the value corresponding to the smoothed data after smoothing the accumulated data is obtained by the data obtained by the data of the accumulated data. The strips are ^:, in the patent case of Kaiping Ping, "Official No. 4,"; = the technique is taken in the image taken by the corneal endothelium, using the established (four) ==: Each radial direction variable is represented by the direction of the material (4) as the radial direction of the material, and is used to take the == differential filament symbol to change the shape of the intestinal endothelial cells. 312XP/Invention Manual (supplement)/96-08/96丨18935 6 When:================================================================================== The anti-prosthetic film is produced on the film, and the starting point of the grapefruit material is rotated along the axis of rotation. In this case, as in the literature, even if the accumulated values of the pixels are accumulated to obtain the accumulated data, it is difficult to confirm the existence of the unevenness of the stripes by the degree of accuracy. Therefore, it is necessary to confirm the film on the substrate with good precision, and to use the ^ axis as the middle μ in the strip of the heart [invention] (4) In the inspection device for the film thickness unevenness (mura), the coating liquid = To the main surface of the substrate 'and to rotate the substrate centering on the rotation axis perpendicular to the main surface' to check the stripes formed on the top surface of the main surface are not all = with good precision and easily confirmed on the substrate On the film, unevenness of streaks extending in the centrifugal direction with the rotation axis as the center exists. The film thickness unevenness inspection device of the present invention includes: a photographing unit that photographs a film of the substrate by the photographing device to obtain a multi-tone target image, and an evaluation value acquisition unit that uses a rotation axis as a starting point on the main surface A plurality of centrifugal directions are set to the outside. In the target image, the value of the pixels arranged in the direction corresponding to the plurality of centrifugal directions is integrated to obtain a plurality of evaluation values corresponding to the plurality of centrifugal directions. According to the present invention, the unevenness of the streaks extending in the centrifugal direction with the rotation axis as the center can be easily confirmed with good precision by referring to the evaluation value. In a preferred aspect of the present invention, 'the main surface is set with a rotating shaft as a plurality of annular regions of the center 312XP/invention specification (supplement)/96-08/9611893 5 7 ^34099, and the evaluation value is taken In the female object f image, the square value corresponding to the plurality of centrifugation directions is used to evaluate the value of the value of the pixel of the entire nucleus region and the value of the pixel of the nucleus region. y can suppress the length of the unevenness of stripes to the presence of stripes that are recognized as uneven. That is, the easiness: it is better to make the part of each annular region overlap with the other any-ring portion in the radial direction, and to set the μ to cross the other ring at the intersection of the mutually (four) regions. region. By using such a square, the presence of unevenness of the unevenness of the high unevenness can be confirmed with the accuracy of the goodness. In another preferred embodiment of the present invention, the arrangement direction of the pixels orthogonal to each other in the target image is &amp; In the two directions in which the main faces of the substrate are orthogonal to each other, and the ff-estimation acquisition unit converts the polar coordinate system centered on the position of the rotating vehicle/jins into a rectangular coordinate system, and generates By converting the image and obtaining a plurality of evaluation values from the transformed image, the evaluation value can be easily obtained. Further, it is preferable that the plurality of centrifugal directions are set at a certain angular distance. When one half of the number of pixels arranged on the long side of the target image is α, the pitch angle is equal to or less than arc tan (1 / α). In this way, the transformed image can be produced with good precision. The present invention also relates to a film thickness unevenness inspection method for inspecting unevenness of streaks formed on a film of a substrate. The above and other objects, features, aspects and advantages of the present invention will become apparent from the Detailed Description of the <RTIgt; </RTI> <RTIgt; </RTI> <RTIgt; </RTI> <RTIgt; [Embodiment] FIG. 1 shows a structure of a film thickness unevenness (MURA) inspection device 1 according to an embodiment of the present invention. The film thickness unevenness inspection device} is a rectangular glass substrate 9 used in a flat display device such as a liquid crystal display device, and obtains an image of a film 92 formed on one of the 'j faces 91 as a resist for pattern formation, according to This image is examined for unevenness of the stripes on the film 92 of the substrate 9. Here, the film 92 on the substrate 9 is formed by a spin coating method. Specifically, after the resist liquid is supplied to the stationary substrate, the substrate is rotated about the rotation axis perpendicular to the main surface ( Slightly static method), or after the resist liquid is supplied to the rotating substrate, the rotation speed of the substrate is increased (referred to as a dynamic method), whereby the formation of the film 9 2 on the substrate 9 is via external The spin coater applies a resist liquid to the main surface 91, and rotates the substrate 9 around a rotation axis perpendicular to the main surface 91. In addition, in the static method and the dynamic method, the resist liquid is supplied to the center of the main surface of the substrate, and in the static method, in addition to the central dropping method, so-called slit rotation (Slit and Spin) can also be used. In the method, the slit nozzle is relatively moved toward the substrate along the main surface of the substrate, and the layered resist liquid is discharged, and the resist liquid is supplied to the rectangular region outside the edge portion on the main surface, and then the substrate is rotated. As shown in FIG. 1, the film thickness unevenness inspection apparatus 丨 is provided with a carrier 2 for holding the substrate 9 so that the main surface 91 on which the film 92 is formed (hereinafter referred to as "upper surface 91") faces upward (Fig. The light irradiation unit 3 irradiates light onto the substrate 9 held by the stage 2 at a predetermined incident angle 312XP/Invention Manual (supplement)/96-08/96118935 9 1354099 92 The light receiving unit 4 receives light reflected from the film 92 of the substrate $=up 91 from the light irradiation unit 3; the moving mechanism 2 causes the stage 2 to relatively move the light irradiation unit 3 and the light receiving unit 4 And the computer 5, the redemption and the task as the control unit of the film thickness unevenness inspection device. /, •• The surface on the side of the stage 2 (6) is preferably black matte. The moving mechanism 2i is configured to be connected to the motor 211 by bolts (not shown), and the rotation of the motor 211 causes the stage 2 to follow the guide 212 along the upper surface 91 of the substrate 9 in FIG. Move in the X direction. The light-irradiating portion 3 includes a halogen lamp 31, and is a light source that emits white light (that is, light including the entire wavelength of the visible region); the cylindrical quartz rod 32 is perpendicular to the moving direction of the stage 2, that is, The y direction in Fig. i extends, and the cylindrical lens 33 extends in the 丫 direction. In the light-irradiating portion 3, the tooth lamp 31 is attached to the end portion of the quartz rod 32 on the (+γ) side, and the light incident from the tooth lamp 31 to the quartz rod 32 is converted into linear light extending in the γ direction. (that is, the linear light having a long beam cross section in the γ direction) is emitted from the side surface of the quartz rod 32, and is guided to the top surface 91 of the substrate g via the cylindrical lens 33. In other words, the quartz rod 32 and the cylindrical lens 33 are optical systems, and the light from the halogen lamp 31 is converted into linear light perpendicular to the moving direction of the stage 2, and guided to the upper surface 91 of the substrate 9. In Fig. 1, the optical path from the light-irradiating portion 3 to the substrate 9 is indicated by a one-dot chain line (the same applies to the optical path from the substrate 9 to the light-receiving unit 4). A portion of the light emitted from the light-irradiating portion 3 is reflected on the (+Ζ) side by the film 92 on the upper surface 91 of the substrate 9. The film 92 is light-transmitting to the light from the light-irradiating portion 3, and the light from the light-irradiating portion 3 is not reflected by the upper surface of the film 92, and is transmitted 312 ΧΡ / invention specification (supplement) / 96.08/96 丨丨 8935 1 〇 The film 92 is partially reflected on the upper surface 91 of the substrate 9 (i.e., below the film 92). In the film thickness unevenness inspection device 1, the light reflected by the upper surface of the film 92 of the substrate 9 and the light reflected by the upper surface 91 of the substrate 9 are incident on the light receiving unit 4 via the filter 43 and the lens 42. The predetermined wave length of the interference light is guided to the photographing unit 41. FIG. 2 shows the light receiving surface of the photographing unit 41. As shown in FIG. 2, the imaging unit 41 is provided with a line sensor 410' having a plurality of light receiving elements (for example, a CCD (Charge Coupled Device) 411 is arranged linearly in the Y direction. In the imaging unit 41, a line sense is utilized. The detector 410 receives the interference light from the substrate 9 for obtaining the intensity distribution of the interference light (that is, the distribution of the output values from the respective light-receiving elements 411 in the γ direction is actually, as the substrate 9 moves toward the X direction, The line sensor 41 of the photographing unit 41 repeatedly obtains the intensity distribution of the interference light for acquiring the binary image of the film 92 on the substrate 9. As shown in FIG. 3, the computer 5 includes a CPU 51 for Perform various calculations of φ; r〇M52 for memorizing the substrate program; and RAM53 for memorizing various information; constructing a general computer system structure connected to the busbar line. The bus line is more appropriately interfaced (I/F) 59a, 59b, 59c, etc. are connected: display 55 is used as a display portion for displaying various information; keyboard 56a and mouse 56b (hereinafter collectively referred to as "input portion 56") for accepting input from an operator; reading Device 57, The information of the recording medium 8 readable by a computer such as a disc, a disc, or a magneto-optical disc is read; and the communication unit 58' is connected to other constituent elements of the film thickness unevenness inspection device 1. The computer 5 is read beforehand. The device 57 reads the program 312XP/invention manual (supplement)/96·08/96118935 11 1^354099 from the recording medium 8 and memorizes it on the fixed disk 54', but n' 54ι is copied to the wide 53' and The cPU 51 performs calculation processing according to the program in _53 (also referred to as 'computer execution program), and is used to cause the computer 5 to perform an operation of checking the unevenness of the stripe on the substrate 9. Fig. 4 is a block diagram showing the cpu 51 according to the program. The μ is performed to realize the construction of the simple _52, _53, the fixed disk 54, etc. In Fig. 4, the calculation of the $ in the calculation unit 6 by the CPU 51 or the like is shown.

像處理部6卜評估值取得部62和狀部63之功能。^ 外’該等功能亦可以利用專用之電路而實現,亦可 地使用專用之電路。 其次說明膜厚不均檢查裝置i檢查條紋不均之流程。圖 5表示膜厚不均檢查裝置1檢查基板9之膜92上的條紋 不均之處理流程。在臈厚不均檢查裝置〗,首先,利用抗 蝕劑液之施加和基板9之旋轉,將在上面91上形成有膜 92之基板9,保持在位於圖丨中實線所示檢查開始位置之 載物σ 2上之後,載物台2開始朝向()方向移動。然後, 從光照射部3射出而以既定射入角射入到基板9之上面 91的線狀光,照射在上面91上之直線狀照射區域(以下 稱為「線狀照射區域」),使線狀照射區域對基板9相對 移動。來自光照射部3之光被基板9之上面91反射,干 涉光被導引到攝影部41,以線感測器41〇受光,取得基 板9上線狀照射區域之干涉光的強度分布。來自線感測器 =10之各個文光元件4ι丨的輸出,根據既定之變換式,被 變換成為例如8 bit(亦可以為8 bit以外)之值(圖素 312XP/^ra*(ffim/96.〇8/96118935 12 1354099 值),然後發送到電腦5。 在膜厚不均檢查裝置〗,當载 期間,同步地重複由攝影部41取;=+X)方向移動之 對電腦5輪出圖素值,以及移動^干//之強度分布, 台2移動到檢查結束位置時 ^ ° Μ ’當裁物 物台2移動,亦停止㈣ _移_構U使载 備’在攝影部㈣基板上之方式準 色調之2次元影像(如後面所述之全:二:取得多 處理對象的影像,以下稱為「對之^’成)為演舁部6之 -電腦5之演算部6(㈣sn)/〜像」),將其輸入到The image processing unit 6 evaluates the functions of the value acquisition unit 62 and the shape 63. ^External functions can also be implemented using dedicated circuits, or dedicated circuits can be used. Next, the flow rate unevenness inspection device i will be described to check the unevenness of the stripes. Fig. 5 shows a flow of processing in which the film thickness unevenness inspection device 1 inspects the unevenness of the stripes on the film 92 of the substrate 9. In the thickness unevenness inspection device, first, the substrate 9 on which the film 92 is formed on the upper surface 91 is held at the inspection start position shown by the solid line in the figure by the application of the resist liquid and the rotation of the substrate 9. After the load σ 2 is reached, the stage 2 starts moving in the direction of (). Then, the linear light that is emitted from the light irradiation unit 3 and incident on the upper surface 91 of the substrate 9 at a predetermined incident angle is irradiated onto the linear irradiation region on the upper surface 91 (hereinafter referred to as "linear irradiation region"). The linear irradiation region relatively moves the substrate 9. The light from the light-irradiating portion 3 is reflected by the upper surface 91 of the substrate 9, and the interference light is guided to the imaging unit 41, and is received by the line sensor 41, and the intensity distribution of the interference light in the linear irradiation region on the substrate 9 is obtained. The output of each illuminating element 4 ι 来自 from the line sensor = 10 is converted into a value of, for example, 8 bits (may be other than 8 bits) according to a predetermined conversion formula (pixel 312XP/^ra*(ffim/ 96. 〇 8/96118935 12 1354099 value), and then sent to the computer 5. In the film thickness unevenness inspection device, during the load period, synchronously repeated by the photographing unit 41; = + X) direction of the computer 5 rounds The pixel value, and the intensity distribution of the movement/dry//, when the table 2 moves to the inspection end position ^ ° Μ 'When the cutting object 2 moves, it also stops (4) _ Moves _ _ _ U to make the 'in the photography department (4) The second-order image of the quasi-tone on the substrate (as described later: two: obtaining the image of the multi-processing object, hereinafter referred to as "the right ^" into) the interpretation unit 6 - computer 5 calculation department 6 ((4) sn) / ~ like "), enter it into

然後’在演算部6之影傻虛理A 在此處當對象影像中位於座桿(/ ’對象影像被壓縮。Then, in the calculation section 6, the shadow is awkward. Here, the object image is located in the seatpost (/' the object image is compressed.

表示時,斜金炎你、 知U,Y)之圖素的圖素值以FXY 縮t 〜以Sa圖素xSa圖素之範圍為單位被壓 縮,在所產生之影像(壓縮後之 心)之注目圖询素值f式位於座標 1 S.(y+1)-, Σ Σ Fxy/i χ== S.X Υ== s.yWhen expressed, the pixel values of the elements of the slanting gold stimuli, U, Y) are compressed by FXY and t are reduced by the range of the Sa pixel xSa pixels, in the resulting image (the compressed heart) The attention graph value f is located at coordinates 1 S.(y+1)-, Σ Σ Fxy/i χ== SX Υ== sy

Ax\Ax\

Cl) 在本實施形態中,Sa A 4 Γ m I、 π 0a馬4(圖素)’所以利用式() 壓縮後之對象影像的S/N比搓古&amp; 之次算 /1Ν比挺间成為原來對象影像之4 倍。然後,對壓縮後之斟务#你&amp; &gt; 于象影像進仃低通過濾處理,從壓 縮後之對象影像中抑制高頻雜 门两雜Λ之衫響,藉以產生平滑化 之影像(低通滤波處理後之科金旦彡你、β 俊之對象影像)。用以決定低通濾波 處理之演算範圍的窗是(邊 疋、違之長度為(2S丨+ 1)圖素之正方 形,在低通過濾處理後之斟务旦t 说之對象影像,位於座標(x y)之注 312XP/發明說明書(補件)/96*08/9611的35 13 1354099 目圖素的圖素值Lxy,使用注目圖素附近之各個圖素在壓 縮後之對象影像中的圖素值A (參照式(1 )),利用式(2)求 得 x+si y+siCl) In the present embodiment, Sa A 4 Γ m I, π 0a horse 4 (pixel)', the S/N ratio of the target image compressed by the equation () is equal to the ratio of the sum of the ancient &amp; It is 4 times the original image. Then, after the compression of the # # 你 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ After the low-pass filtering process, you can see the image of you and β Jun. The window used to determine the calculation range of the low-pass filtering process is (the edge of the square, the length of the square (2S丨+ 1) is the square of the pixel, and after the low-pass filtering process, the object image is located at the coordinates. (xy) Note 312XP / Invention Manual (supplement) / 96*08/9611 35 13 1354099 The pixel value Lxy of the eye element, using the picture of each pixel near the pixel of interest in the compressed object image Prime value A (see equation (1)), using equation (2) to find x+si y+si

Lxy== Σ Σ Axy/(2S1 + 1)2 · . . h、Lxy== Σ Σ Axy/(2S1 + 1)2 · . . h,

然後,對低通過濾處理後之對象影像進行高通過濾處 理,產生從低通過濾處理後之對象影像中,去除會妨礙後 述對襯強調處理之低頻濃度變動的影像(高通過濾處理後 之對象影像)。在此處位於座標(X,y)之注目圖素的圖素值 H、,使用注目圖素附近的各個圖素在低通過濾處理後之 對象影像的圖素值L(參照式(2)),利用式(3)求得。 (3)Then, the target image after the low-pass filter processing is subjected to high-pass filter processing, and the image of the target image after the low-pass filter processing is removed, and the image of the low-frequency density that hinders the subsequent emphasis on the contrast enhancement is removed (the target image after the high-pass filter processing) ). Here, the pixel value H of the target pixel located at the coordinate (X, y), and the pixel value L of the target image after the low pass filter processing using each pixel near the pixel of interest (refer to equation (2) ), obtained by using equation (3). (3)

Hacy==Lxy/ ( Σ Σ Lxy/(2s2+l)2) X=x—82 Y=y—S2 ’ 式(3)表示使用以注目圖素作為中心而各邊長度為 圖素之正方形的窗,作為決定高通過濾處理之=算 籲範圍的窗之情況。依照以上之方式,在影像處理部 對於原來之對象影像被壓縮所成壓縮後之對象影像在施 加低通過濾處理之後,經由施加高通過濾處理,用來, 既定空間頻帶之帶通過濾處理(步驟S12 )。 行 在影像處理部61,更對高通過濾處理後之對象影 行對襯強調處理’產生強調處理後之對旦/ 進 SI3)。位於強調處理後之對象影像中座標(χ,幻之主鄉 素的圖素值Exy,使用高通過濾處理後之對象麥像 圖 圖素之圖素值H1”,對襯係數rc,和背景值衫中注目 u,利用式(4 ) 312XP/發明說明書(補件)/96·08/961! 8935 14 1354099 求得。在本實施形態中 b 為 127 r。為 0. 01,〇 〇2 〇. 05 或 〇. • · · (4)Hacy==Lxy/ ( Σ Σ Lxy/(2s2+l)2) X=x—82 Y=y—S2 ' Equation (3) represents the use of a square with the pixel of interest as the center and the length of each side as the pixel The window is used as a window for determining the range of the calculation of the high pass filtering process. According to the above aspect, after the low-pass filtering process is applied to the target image compressed by the image processing unit after the original target image is compressed, the high-pass filtering process is applied to pass the filtering of the predetermined spatial frequency band (step S12). In the image processing unit 61, the contrast-improving process is performed on the object after the high-pass filter processing, and the emphasis/input SI3 after the emphasis processing is generated. It is located in the coordinate of the object image after the emphasis processing (χ, the pixel value Exy of the main source of the illusion, the pixel value H1 of the object image using the high pass filter, the contrast coefficient rc, and the background value) In the present invention, it is obtained by using the formula (4) 312XP/invention specification (supplement)/96·08/961! 8935 14 1354099. In the present embodiment, b is 127 r. It is 0. 01, 〇〇 2 〇 . 05 or 〇. • · · (4)

Exy-baHiy-D/rc+l) 圖6表示強調處理後之對象影 後之對象影像7U以下簡稱為「^在此處強調處理 色調之影像,對象影像71之平像71」)成為挪 均峨為大約心另外圖素值之平 在有以鉍轉軸作為起點而延伸之 11存 理所檢測到之條紋不均),在圖6二不象 =之條紋狀區域,和低濃度(白)之條:紋像二^ 置)斤述之方式’成為與基板9之旋轉轴所對應之位 ,)放射狀地延伸,但是實際上亦有的情況是在基板之膜 :::轉Γ外之位置作為起點,產生在離心力作用方向 上延伸之條紋不均。 然後’在評估值取得部62之變換影像產生部62 對象影像η中在形成膜92時以基板9之旋㈣(以^ 稱為「基板9之旋轉軸」)的對應位置作為中心之極座標 成為直角座標系’用來產生變換後之變換影像(步 在產生變換影像時,首先在圖素被排列在X方向和y方 向之圖6的對象影像71令,特定圖7所示基板9之旋轉 軸J1的對應位置(以下稱為「中心位置」)之座標 (cx,cy)。在此因為以基板9之旋轉軸作為中心取得對 312XP/發明說明書(補件)/96·〇8/9611S935 15 象衫像71 ’所以如圖6 心位置。卜秋德,1象影像71之+央成為中 矣,求得對象影像71中 位 之位置和中心位罟 Τ取通離f〜位置C1 如上述之方々 間之距離(以下稱為「最大長度」)。 所因為中心位置Π在對象影像…央, 長度荨於對象影像71之對 對象影像71在x㈣長度的—+ ’使 在X方向和y方向之長 XI和卜利用式⑸求得最大長度^。ΰ素數)刀職為 Klnax== i^^y^/2 · . · (5) 另外’在變換影像產 心位置C1竹炎如 生邛621,以對象影像71中之中 此處多個-t 求得朝向外側之多個徑向方向。在 此處夕個徑向方向以一 隹 在沿著對象影像71長邊之y 妓,間距角P[度] 為…成為利 方向之個數々是以間距角p[度夕 影像產生部62卜例如,以差一 ^、b〇L度]之值。在變換 中附加有符號DO之箭頭所二:方向之徑向方向(圖6 之徑向方向(以下稱為「基為基準,規定作為第〇號 為正,在以間距角P依序方向」)’以反時針方向 m號(正禮者是,為〇以上Γ且向方向令,求得第 向方向的角度位置二::二箭頭表示)相對於基準徑 另外,如上述之方式,對象影像 應_7所示基板9之旋轉軸;1,在對:置 '對 312XP/發明說明書(補件)/96·〇8/96118935 正父之圖素的排列方向,因為分別對應到基板9之:面目 16 上354099 91 f互相正父的2個方向’所以在基板9之上面91上, 以方疋轉軸J1作為起點朝向外側之多個離心方 於對象影像71之多個徑向方向,多個二 半;η’在排列於對象影像71長邊之圖素數的-+為心’成為利用arctan(l/a)獲得之值。在圖7中, 2輯心方向以附加有與圖6中相制徑 之箭頭DO,Dm表示。 门相Π付號 方式,當設定圖6所示對象影像^中之多個 二向方向時,將在對象影像71中以中心位置 之多個徑向方向的角度位置 ”、、“ :中™之距離n(其中,二 2 :下之整數)所規定的極座標系,為: 向方向之距離n,和與角度位置 :口者仅 碼m所規定之直角座#,用步^于應之U方向的號 變換影像切變㈣像。在此處位於 支換〜像中座私(n,m)之圖素的值( U之值代入式⑻中,成為 ’之“疋將 之圖素的值H 4 、對象衫像71中座標〇^) 心位二V、: 7分別為對象影像71中之t 的X座標和y座標,p是 另外’對於變換影像中苹工° B之間距角。 ^ /mr之系座標(η,ιη),在利用彳 求仵之座標(x,y)表示在對象 隹矛彳用式(6) 標(n,m)之變㈣像# = ’在位於該座 (背景值)m。 ㈣附加對象影像71之中間值 312χίν發明說明書(補件)/96-〇8/961丨8935 (6)1354099 =η · COS0m + cy =η · sin0m + 其中,Θ m = (mxp) 圖8表示從圖6之對象影傻71太 豕如像71產生的變換影像72。在 圖8之變換影像72中,縱方向知捵士 ^、 +二 勹和杈方向分別對應到徑向 方向之號碼爪和沿著徑向方向之距離n。當產生有變換, 像7 2時,在評估值取得部6 2 , &amp; _ Q &amp; 、如 72中所示,在變換影像 中,在涵盍縱方向全體,而且橫方向寬度固定為 多個矩形區域73(但是,在圖9卜在橫方向排列之多個 矩形區域73以實線之矩形和纽之矩形交替表^),以寛 度W之-半的間距(w/2)排列並設定在橫方向。因此,跨 互相鄰狀2個矩形區域73(圖9中之附加符號恤之虛線 之矩形)的交界處,設定有其他矩形區域(圖9中以附加平行 斜線表示),各個矩形區域73與其他矩形區域?3互相重疊 之區域的橫方向寬度,成為矩形區域73寬度之一半(w/2)。 當在變換影像72中設定多個矩形區域73時,在各個矩 形區域73中,對排列在橫方向之圖素的值累計,以該圖 素的個數除該累計後之值(亦即,求得平均值),如圖Μ 所不,用來取得各個矩形區域73中在多個徑向方向之多 =評估值(步驟S15)。另外,在圖10中縱軸表示評估值, 橫軸表示徑向方向之號碼。 在此處變換影像72之橫方向因為對應到基板9之上面 91中,以旋轉軸J1作為中心之徑方向(亦即,離開旋轉 312ΧΡ/發明說明書(補件)/96.08/96118935 18 丄JJ外uyy 位之/向)的距離,所以在變換影像72中於橫方向互 應到佔用寬度w範圍之多個環狀區域 盥變換旦79 、顯示一部份之環狀區域74)。亦即, 狀區域二在矩Γ區域73同樣地,存在有其他之環 互相桩人 附加有平行斜線之區域),跨越在 而相鄰接之2個環狀區域74(圖?中被虛線 域父各個環狀區域74之一部份’和其他任 像72中°排^丨之部份在徑方向重4。因此,在變換影 ^十藉Μ㈣純之上料理,等肢㈣象影像71 74之\^1著多㈣向方向,對存在於與各個環狀區域 評估值之Γ理體相對應之範圍的圖素之值累計’藉以求得 田取付各個矩形區域73之多個評估值時,在判定 使比對象影像71之背景值高的上臨限值和比幻 下臨限值分別與各個評估值相比較,在任-個評估值成: 上臨限值以上,或成為下臨限值以下時,判斷 板9 之膜92上存在有沿著離心方向延伸,而且成為缺板9 紋不均_。例如,在目1〇所示圖形中,評估值 成為上臨限值τι以上或下臨限值72以下之號竭的徑向方 向對應到成為缺陷之條紋不均。依照此種方式,在判定 6 3,從基板9之膜9 2上的條紋不均之中,檢測出對“ 像71中所對應之圖素群的濃度和對象影像7ι之 ^ (平均濃度)的差之絕對值(以下亦稱為「不均強度」^大 312XP/發明說明書(補件)/96-08/96118935 19 之條紋不均作為條紋不均 9之膜92上存在有條紋不==;7 55顯示在基板 報告。另外,在基板9、之猎以向操作者 陷贈子在之確認亦二 多個離心方向相對應之多,電腦5將表示與 示在顯示器等。 彳估值的圖形(參照圖10)顯 二以:照需要,特定取得有成為上臨限值以上,或下 =”評估值的矩形區域73,並從徑 域73對應之基板9上的環狀區域74,並且特 疋與該徑向方向相對廣之其 ‘似土板9上的離心方向,用來取得 =在有:故不均缺陷(之至少一部份)之基板9上的: 置。然後’表示該位置之咨# 之發生原因(例如,特定在在特定條紋不均缺陷 基板9上的圖案形狀引起:之佈:)劑=;形成在 紋不均缺陷對後製品之影響的管理。 中 如::上,說明之方式,在圖1之膜厚*均檢查裝置1 :’用抗蝕劑液之施加和基板之旋轉,形成基板9上之 膜92,在得自膜92之對象影像71中,對被設定在基板9 上面91上而排列在與多個離心方向分別相對應之方向 、圖素之值進行累計處理,用來取得與多個離心方向相對 f之户個#估值。其結果是在判定部⑹(或操作者),經 參照評估值可以以良好之精確度而且容易地確認基板9 之膜92上’以旋轉軸J1作為中心沿著離心方向延伸之條 紋不均的存在。 條 312XP/發明說明書(補件)/96-08/96118935 20 丄 f 石者各個徑向方向排列的全部圖素之 均之;估t取Γ評估值之時:不均強度較低而且長條紋不 &quot; σ不均強度較高而且短條紋不均之評估 2致相同之值’要只檢測不均強度較高之條紋不均變為 與此相對地,在評估值取得部⑽’對對象影像71 著徑向方向之各個環狀區域74的寬度全體, ==範圍之圖素的值,求得評估值,用來抑制條紋 二、又對5乎估值的影響,可以容易地只確認不均強度 較高之條紋不均的存在。另外,經由設定跨越在互 之2個環狀區域74的交界處之其他環狀區域74,當存在 有跨越互㈣接之2個環狀區域74㈣寬纽環狀區域 74之寬度短的條紋不均時,亦可以以良好之精確度確認 此種條紋不均之存在。另外,在上述說明中是不均強度只 根$影像中之濃度’但是一般之不均強度是以辨識為不均 之容易程度而表示’所以條紋不均之長度亦可以加入作 不均強度之因素。 ’ 在臈厚不均檢查裝置丨中,如圖所示,在基板9之 上面91的上方,配置具有線感測器41〇之攝影部ο,以 基板9之旋轉軸ji作為中心,使線感測器41〇對基板9 做360度旋轉而攝影,亦可以取得對象影像。在此種情 況對象衫像令各列之多個圖素分別表示取得該列之圖素 時與線感測器410之旋轉角度相對應之基板9上排列於離 312ΧΡ/發明說明書(補件)/96-08/96118935 21 1354099 心方向之多個位置’在評估值取得部對排列在該對象影像 行方向之各個位置的列方向圖素之值累計,可以容易地取 得與多個離心方向相對應之多個評估值。 另外’亦可以在利用旋轉塗佈機對基板9上形成臈92 之後’將線感測器配置在被裝載於旋轉塗佈機之載物台上 的基板9之上方,經由使載物台旋轉,利用線感測器取得 對象影像。依照此種方式,在取得對象影像之時,可以使 線感測器對基板9上之膜92相對旋轉,另外膜厚不均檢 查裝置1之功能亦可以組合在電腦中。 以上已說明本發明之實施形態,但是本發明並不只限於 上述實施形態,而是可以有各種變化。 例如,多個離心方向之間距角,若排列在對象影像71 之長邊的圖素數之一半為α,只要成為arc tan(1/a)以 下,亦可以採用其他之間距角。利用此種方式,可以以良 好之精確度產生變換影像。 &lt; 另外,在上述實施形態中是設定有其他環狀區域跨越在 基板9之上面91上,互相鄰接之2個環狀區域74的交界 處,但是亦可以設定其他環狀區域74跨越在設有間隙而 且被配置成互相鄰接之2個環狀區域的交界處,在此種情 況’亦可以以良好之精確度仙只位於該2個環狀區域^ 界附近之條紋不均的存在。另外,多個環狀區域亦可以成 為以旋轉軸J1作為中心在徑方向互異之寬度,例如,亦 可以以被配置成越外側寬度越寬之方式而設定多個環狀 312XP/發明說明書(補件)/96-08/96118935 22 1354099 在評估值取得部62是沿著對象影像71中多個徑方向 各個而抽出圖素之值,產生變換影像72,藉以容易地= -變換影像72中求得與多個離心方向相對應之多個評估 值,但是亦可以不產生變換影像72,而從對象影像71直 - 接求得與多個離心方向相對應之多個評估值。 . 另外,在對象影像Π或變換影像7 2中,若累計排列在 與各個離心方向相對應之方向的圖素之值時,亦可以以累 籲計圖素之值後的值,或附加與各個圖素之位置相對應之權 重所求得的加權平均值等作為評估值。 在圓1之膜厚不均檢查裝置中是使基板9對丨次元攝影 裝置之線感測器410直線移動,用來取得對象影像,但$ 亦可以使線感測器41 〇對基板9直線移動,用來取得對象 影像。亦即’亦可以使線感測器41〇對基板9相對地直線 移動。另外,亦可以利用受光元件為2次元排列之2次元 攝影裝置對基板9之膜92攝影,用來取得對象影像。 • 基板9上之膜若利用旋轉塗佈法形成時,亦可以在旋轉 基板9之時,或開始旋轉基板9之前,將抗蝕劑液以外之 塗佈液供給到基板9之主面上藉以形成。另外,膜厚不均 檢查裝置,特別適合於檢查形成在平面顯示裝置用玻璃基 板之膜上的條紋不均,但是亦可以利用在半導體基板等其 他基板的塗佈液之施加和利用旋轉基板而形成之膜上的 條紋不均之檢查。 上面已詳細說明本發明,但是上述之說明只作舉例用, 不用來限制本發明。因此,在不脫離本發明之範圍内可以 312XP/發明說明書(補件)/96-08/96118935 23 1354099 有多種變化或態樣宜被理解。 【圖式簡單說明】 圖1表示膜厚不均檢查裝置之構造。 圖2表示攝影部之受光面。 圖3表示電腦之構造。 圖4是方塊圖,用來表示電腦所實現之功能構造。 圖5表示膜厚不均檢查裝置檢查基板之膜上的條紋不 均之處理流程。 圖6表示對象影像。 圖7用來說明被設定在基板上之多個離心方向。 圖8表示變換影像。 圖9表示對象影像中之矩形區域。 圖10表示對多個徑向方向之多個評估值。 圖11用來說明攝影部取得對象影像之另一動作例。 【主要元件符號說明】Exy-baHiy-D/rc+l) Fig. 6 shows an object image 7U that emphasizes the object after the processing, and is simply referred to as "^ where the image of the color tone is emphasized here, and the flat image 71 of the target image 71" becomes峨 is about the other figure of the heart, and the unevenness detected by the 11th extension of the 铋 rotation axis as the starting point), in Fig. 6 is not like the striped area, and the low concentration (white) Article: The pattern of the pattern is set to "the position corresponding to the rotation axis of the substrate 9," which extends radially, but in fact, the film is on the substrate::: The position is used as a starting point to generate unevenness of the stripes extending in the direction in which the centrifugal force acts. Then, in the target image η of the converted image generation unit 62 of the evaluation value acquisition unit 62, when the film 92 is formed, the corresponding position of the rotation of the substrate 9 (four) (referred to as the "rotation axis of the substrate 9") is used as the center coordinates. The Cartesian coordinate system 'is used to generate the transformed image (in the case of generating the transformed image, the object image 71 of FIG. 6 is first arranged in the X direction and the y direction in the pixel, and the rotation of the substrate 9 shown in FIG. 7 is specified. The coordinates (cx, cy) of the corresponding position of the axis J1 (hereinafter referred to as "center position"). Here, the 312XP/invention specification (supplement)/96·〇8/9611S935 is obtained by taking the rotation axis of the substrate 9 as the center. 15 The blouse is like 71', so the heart position is shown in Fig. 6. Bu Qiuide, 1 image 71 is the middle of the image, and the position and center position of the target image 71 are taken from the distance f to the position C1. The distance between the squares (hereinafter referred to as the "maximum length"). Because the center position is at the target image, the length of the target image 71 is at the length of x (four) - + ' in the X direction and the y direction. The longest XI and the use of the formula (5) to get the maximum Degree ^. ΰ prime number) Knax == i^^y^/2 · . · (5) In addition, 'in the position of the image of the transformation C1, Zhu Yanrusheng 621, in the object image 71 A plurality of -t are obtained in a plurality of radial directions toward the outside. In this case, the radial direction is y 沿着 along the long side of the target image 71, and the pitch angle P [degrees] is ... the number of the profit direction is the pitch angle p [the image generation unit 62 For example, the value of the difference is ^, b〇L degree]. In the transformation, the arrow of the symbol DO is added: the radial direction of the direction (the radial direction of Fig. 6 (hereinafter referred to as "the base is the reference, and the predetermined 〇 is positive, and the direction is the pitch P". "In the counterclockwise direction m (the ritual is, the 〇 〇 Γ Γ 向 向 向 向 向 向 , , , , , , , 角度 角度 角度 : : : : : : : : : : 角度 角度 角度 : 角度 : : : 角度 角度 角度 角度The image should be _7 as shown in the rotation axis of the substrate 9; 1. In the pair: set the direction of the pair of 312XP/invention manual (supplement)/96·〇8/96118935 the parent, because they correspond to the substrate 9 respectively. In the face 16 above, 354099 91 f is in the two directions of the parent, so on the upper surface 91 of the substrate 9, a plurality of centrifugal directions toward the outer side with the square rotation axis J1 as a starting point are in a plurality of radial directions of the target image 71, A plurality of two halves; η' is a value obtained by using arctan (l/a) in the case where the number of the prime numbers of the pixels arranged on the long side of the target image 71 becomes a value obtained by using arctan (l/a). In Fig. 7, the direction of the core is added with In Fig. 6, the arrows DO and Dm of the phase diameter are shown. The door is opposite to the payout mode, and when the target image ^ shown in Fig. 6 is set In the two-direction direction, the polar coordinate position defined by the angular position in the plurality of radial directions of the center position in the target image 71 and the distance n of the TM (the integer of 2: the integer below) is : The distance to the direction n, and the angular position: the right angle seat specified by the mouth only code m, use the step of the U direction of the image to change the image shear (four) image. Here in the support ~ image The value of the private (n, m) pixel (the value of U is substituted into the equation (8), which becomes the value of the element of the figure H 4 , the coordinate of the target shirt image 〇 ^), the heart position two V,: 7 is the X coordinate and the y coordinate of t in the target image 71, respectively, p is another 'for the angle between the flat and the B in the transformed image. ^ /mr is the coordinate (η, ιη), in the use of the request The coordinates (x, y) indicate that the object (6) is changed by the formula (6) (n, m) (4) like # = ' is located at the seat (background value) m. (4) The intermediate value of the additional object image 71 is 312 χίν invention Instruction manual (supplement)/96-〇8/961丨8935 (6) 1354099 =η · COS0m + cy =η · sin0m + where Θ m = (mxp) Figure 8 shows the object from Figure 6 Such as 71 The resulting transformed image 72. In the transformed image 72 of Fig. 8, the longitudinal direction knows that the gentleman's ^, + two turns, and the 杈 direction correspond to the numbered claws in the radial direction and the distance n in the radial direction, respectively. In the case of the conversion, the evaluation value acquisition unit 6 2 , &amp; _ Q &amp; , as shown in 72, in the converted image, the entire width direction of the culvert is fixed, and the width in the lateral direction is fixed to a plurality of rectangular regions. 73 (However, a plurality of rectangular regions 73 arranged in the horizontal direction in FIG. 9 are alternately arranged by a rectangle of a solid line and a rectangle of a new line), and are arranged at a pitch of half-w (w/2) of the twist W and set at Horizontal direction. Therefore, other rectangular regions (indicated by additional parallel oblique lines in FIG. 9) are set at the boundary between the two rectangular regions 73 (the rectangles of the dotted lines of the additional symbol shirts in FIG. 9) which are adjacent to each other, and each of the rectangular regions 73 and the other Rectangular area? The width in the lateral direction of the regions overlapping each other is one-half (w/2) of the width of the rectangular region 73. When a plurality of rectangular regions 73 are set in the converted image 72, the values of the pixels arranged in the horizontal direction are integrated in the respective rectangular regions 73, and the accumulated values are divided by the number of the pixels (ie, The average value is obtained, as shown in Fig. 用来, for obtaining the plurality of radial directions in the respective rectangular regions 73 = the evaluation value (step S15). In addition, in Fig. 10, the vertical axis represents the evaluation value, and the horizontal axis represents the number in the radial direction. Here, the horizontal direction of the converted image 72 corresponds to the upper surface 91 of the substrate 9, with the rotation axis J1 as the center of the radial direction (that is, leaving the rotation 312 ΧΡ / invention specification (supplement) / 96.08/96118935 18 丄 JJ Since the distance of the uyy bit is in the direction of the uyy position, a plurality of annular regions in the horizontal direction corresponding to the range of the occupied width w are alternately transformed in the transformed image 72, and a portion of the annular region 74 is displayed. That is, in the case of the rectangular region 73, there are other regions in which the other rings are connected to each other with parallel oblique lines, and the two annular regions 74 which are adjacent to each other are crossed (the dotted line in the figure) The part of each of the parent's annular regions 74 and the other part of the image 72 are in the radial direction by 4. In this case, the cooking is performed on the transformation of the shadows, and the isometric (four) image 71 In the direction of the (4) direction, the value of the pixel existing in the range corresponding to the texture of the evaluation value of each annular region is accumulated to obtain a plurality of evaluation values of the rectangular regions 73. When it is determined that the upper limit value and the lower threshold value which are higher than the background value of the target image 71 are compared with the respective evaluation values, the evaluation value is equal to or greater than the upper limit value, or becomes lower. When the value is less than or equal to the limit value, the film 92 of the determination plate 9 is extended in the centrifugal direction, and the unevenness of the plate 9 is obtained. For example, in the pattern shown in Fig. 1, the evaluation value becomes the upper limit value τι or more. Or the radial direction of the number below the threshold value of 72 or less corresponds to the unevenness of the stripe that becomes the defect. In this manner, in the determination of 6 3, the density of the pixel group corresponding to the image 71 and the target image 7 (average concentration) are detected from the unevenness of the stripe on the film 9 2 of the substrate 9. The absolute value of the difference (hereinafter also referred to as "uneven intensity" ^ large 312XP / invention manual (supplement) / 96-08/96118935 19 stripe unevenness as stripe unevenness 9 film 92 is present on the stripe = = 7 55 is displayed on the substrate report. In addition, on the substrate 9, hunting to the operator traps in it to confirm that there are more than two centrifugal directions, and the computer 5 will be displayed and displayed on the display, etc. The graph of the value (refer to FIG. 10) is exemplified by: a rectangular region 73 having an upper limit value or lower = "evaluation value" and an annular region on the substrate 9 corresponding to the radial field 73 are specifically obtained as needed. 74, and the direction of the centrifugal direction on the soil plate 9 which is relatively wide in the radial direction is used to obtain: on the substrate 9 having: (at least a part of) the uneven defect. Then 'representing the cause of the location of the consultation # (for example, a diagram specific to the defect on the specific stripe unevenness substrate 9) Shape caused by: cloth:) agent =; formed in the management of the influence of the unevenness of the unevenness on the product. In the middle::, the way of description, in the film thickness of Figure 1 * inspection device 1: 'with resist The application of the agent liquid and the rotation of the substrate form a film 92 on the substrate 9, and in the object image 71 obtained from the film 92, the pair is set on the upper surface 91 of the substrate 9 and arranged in a direction corresponding to the plurality of centrifugal directions, respectively. And the value of the pixel is cumulatively processed to obtain the estimate of the household relative to the plurality of centrifugal directions. The result is that the determination unit (6) (or the operator) can obtain the accuracy with reference to the evaluation value and It is easy to confirm that the film 92 on the substrate 9 has a streak unevenness extending in the centrifugal direction with the rotation axis J1 as a center. Article 312XP / Invention Manual (supplement) /96-08/96118935 20 丄f The average of all the pixels arranged in each radial direction of the stone; estimated when the value of Γ is taken: the uneven intensity is low and the long stripes Not &quot; σ unevenness intensity is high and the evaluation of the short streak unevenness is the same value. 'To detect only the unevenness of the unevenness of the unevenness is higher, in the evaluation value acquisition unit (10)' The image 71 has the entire width of each annular region 74 in the radial direction, and the value of the pixel in the == range, and the evaluation value is obtained, which is used to suppress the influence of the stripe 2 and the value of 5, and can be easily confirmed only. The presence of uneven streaks with higher unevenness. Further, by setting the other annular regions 74 crossing the boundary between the two annular regions 74, there are two strips that are short across the four (4) annular regions 74. At the same time, the presence of such streak unevenness can also be confirmed with good precision. In addition, in the above description, the intensity of the unevenness is only the concentration in the image of the image, but the general unevenness is expressed by the ease of identification as unevenness. Therefore, the length of the unevenness of the stripes may be added as the unevenness. factor. In the thickness unevenness inspection device ,, as shown in the figure, a photographing unit ο having a line sensor 41 is disposed above the upper surface 91 of the substrate 9, and the line is made with the rotation axis ji of the substrate 9 as a center. The sensor 41 摄影 takes a 360-degree rotation of the substrate 9 to take a picture, and can also acquire a target image. In this case, the target shirt is arranged such that the plurality of pixels in each column respectively represent the pixels of the column, and the substrate 9 corresponding to the rotation angle of the line sensor 410 is arranged on the substrate 312 ΧΡ / invention manual (supplement) /96-08/96118935 21 1354099 A plurality of positions in the direction of the heart' is integrated with the values of the column direction pixels arranged at the respective positions in the direction of the target image in the evaluation value acquisition unit, and can be easily obtained in a plurality of centrifugal directions. Corresponding multiple evaluation values. In addition, after the crucible 92 is formed on the substrate 9 by the spin coater, the line sensor is disposed above the substrate 9 mounted on the stage of the spin coater, and the stage is rotated. , using the line sensor to obtain the object image. In this manner, when the target image is obtained, the line sensor can be relatively rotated with respect to the film 92 on the substrate 9, and the function of the film thickness unevenness detecting device 1 can be combined in the computer. Although the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments, and various modifications are possible. For example, a plurality of angles between the plurality of centrifuging directions may be α or more, and if the number of pixels in the long side of the target image 71 is α, it may be other than arc tan (1/a). In this way, the transformed image can be produced with good precision. &lt; In the above embodiment, the other annular regions are disposed across the upper surface 91 of the substrate 9 at the boundary between the two annular regions 74 adjacent to each other. However, other annular regions 74 may be provided across the circumference. In the case where there are gaps and are arranged at the boundary of two annular regions adjacent to each other, in this case, the unevenness of the stripes near the boundary of the two annular regions can be present with good precision. Further, the plurality of annular regions may have different widths in the radial direction around the rotation axis J1. For example, a plurality of annular 312XP/invention specifications may be set so as to be wider as the outer width is wider. In the evaluation value acquisition unit 62, the value of the pixel is extracted along each of the plurality of radial directions in the target image 71, and the converted image 72 is generated, thereby easily converting the image 72 into the image 72. A plurality of evaluation values corresponding to a plurality of centrifugal directions are obtained, but a plurality of evaluation values corresponding to the plurality of centrifugal directions may be directly obtained from the target image 71 without generating the converted image 72. Further, in the target image 变换 or the transformed image 72, if the values of the pixels in the direction corresponding to the respective centrifugal directions are cumulatively accumulated, the value after the value of the pixel may be accumulated, or may be added A weighted average value obtained by the weight corresponding to the position of each pixel is used as an evaluation value. In the film thickness unevenness inspection device of the circle 1, the substrate sensor 19 is linearly moved to the line sensor 410 of the 丨-element imaging device for acquiring the target image, but the line sensor 41 can also be made straight to the substrate 9 Move to get the object image. That is, the line sensor 41 can also be relatively linearly moved to the substrate 9. Alternatively, the film 92 of the substrate 9 may be imaged by a two-dimensional imaging device in which the light receiving elements are arranged in a two-dimensional order to acquire a target image. When the film on the substrate 9 is formed by a spin coating method, the coating liquid other than the resist liquid may be supplied to the main surface of the substrate 9 at the time of rotating the substrate 9 or before starting to rotate the substrate 9. form. Further, the film thickness unevenness inspection device is particularly suitable for inspecting unevenness of stripes formed on a film of a glass substrate for a flat display device, but may be applied by application of a coating liquid on another substrate such as a semiconductor substrate or by using a rotating substrate. Inspection of uneven streaks on the formed film. The invention has been described in detail above, but the foregoing description is by way of example only, and is not intended to limit the invention. Thus, various changes or aspects are apparent to the 312XP/invention specification (supplement)/96-08/96118935 23 1354099 without departing from the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 shows the structure of a film thickness unevenness inspection device. Fig. 2 shows the light receiving surface of the photographing unit. Figure 3 shows the construction of a computer. Figure 4 is a block diagram showing the functional configuration implemented by the computer. Fig. 5 is a view showing a flow of processing for detecting unevenness of streaks on the film of the substrate by the film thickness unevenness inspection device. Fig. 6 shows an object image. Figure 7 is used to illustrate a plurality of centrifugal directions set on a substrate. Fig. 8 shows a transformed image. Fig. 9 shows a rectangular area in the object image. Figure 10 shows a plurality of evaluation values for a plurality of radial directions. FIG. 11 is a view for explaining another example of the operation of the image capturing unit by the photographing unit. [Main component symbol description]

1 膜厚不均檢查裝置 2 載物台 3 光照射部 4 受光單元 5 電腦 6 演算部 8 記錄媒體 9 基板 21 移動機構 312XP/發明說明書(補件)/96-08/96118935 24 13540991 Film thickness unevenness inspection device 2 Stage 3 Light irradiation unit 4 Light receiving unit 5 Computer 6 Calculation unit 8 Recording medium 9 Substrate 21 Moving mechanism 312XP/Invention manual (supplement)/96-08/96118935 24 1354099

31 鹵素燈 32 石英棒 33 圓柱透鏡 41 攝影部 42 透鏡 43 過濾器 51 CPU 52 ROM 53 RAM 54 固定磁碟 55 顯示器 56 輸入部 56a 鍵盤 56b 滑鼠 57 讀取裝置 58 通信部 59a、 59b、59c 介面 61 影像處理部 62 評估值取得部 63 判定部 71 對象影像 72 變換影像 73 矩形區域 74 環狀區域 312XP/發明說明書(補件)/96-08/96118935 1354099 91 主面 92 膜 211 馬達 212 導引器 410 線感測器 411 受光元件 541 程式 621 變換影像產生部 C1 中心位置 Dm 離心方向 DO 離心方向 Θ m 角度位置 312XP/發明說明書(補件)/96-08/96118935 2631 Halogen lamp 32 Quartz rod 33 Cylindrical lens 41 Photographic unit 42 Lens 43 Filter 51 CPU 52 ROM 53 RAM 54 Fixed disk 55 Display 56 Input 56a Keyboard 56b Mouse 57 Reading device 58 Communication unit 59a, 59b, 59c Interface 61 image processing unit 62 evaluation value acquisition unit 63 determination unit 71 target image 72 conversion image 73 rectangular area 74 annular area 312XP / invention manual (supplement) / 96-08/96118935 1354099 91 main surface 92 film 211 motor 212 guidance 410 line sensor 411 light receiving element 541 program 621 conversion image generating unit C1 center position Dm centrifugal direction DO centrifugal direction Θ m angular position 312XP / invention manual (supplement) / 96-08/96118935 26

Claims (1)

U54099 十、申請專利範圍: 1. 一種膜厚不均(mura)檢查裝置,將塗佈液供給到基板 之主面上,並使上述基板以垂直於上述主面之旋轉軸作為 _心而旋#,用來檢查形成在上述主面之膜上的條紋不均 (stripe unevenness);其特徵在於具備有: 攝〜。I5,利用攝影裝置對上述基板之上述膜攝影,用來 取得多色調之對象影像;和 汗估值取得部,在上述主面上以上述旋轉轴作為起點, 朝向外側設定多個離心方向,在上述對象影像卜累計排 列在分別對應於上述多個離心方向之方向上的圖素之 值,用來取得與上述多個離以向相對應之多個評估值。 2·如申凊專利範圍第丨項之膜厚不均檢查裝置,其中 域在上述主面設定以上述旋轉軸作為中心之多個環狀區 於估值取得部,在上述對象影像中,沿著分別對應 、述夕個離心方向之方向,於各個 所對應的範圍,累計在名协姑妒人心見度王體 評估值。 、 ;〇範圍的圖素之值,用來求得 3,如申請專㈣圍第2項之膜厚不均檢查裝置,其中 c個環狀區域之-部份,與其他任-環狀區域之一 部份,在徑方向成為重疊。 ttr專利範圍第3項之膜厚不均檢查裝置,其中 環狀區域。 個被狀區域的交界處之其他 312XP/發明說明書(補件)/96^08/96118935 27 1354099 5. 如申請專利範圍第1瑁 乐1項之膜厚不均檢查裝置,其中 上述基板是平面顯示裝置用之破璃基板。 6. 如申請專利範圍第1 ? ^ b 至5财任H厚不均檢查 裝置,其中 上述對象影像中互相正交之圖素的排列方向,分別對應 J上述基板之上述主面上互相正交的2個方向;且 上述》平估值取得部,在上述對象景彡像巾將以與上述旋轉 轴相對應之位置作為中心的極座標系變換成為直角座標 系’產生變換影像,從上述變換影像求得上述多個評估值。 7. 如申請專利範圍第6項之膜厚不均檢查裝置其中 上述多個離心方向以一定之間距角而設定,當在上述對 象影像之長邊排列的圖素數之一半成為“時,上述間距角 成為arc tan(l/a )以下。 8. —種膜厚不均(mura)檢查方法,將塗佈液供給到基板 之主面上,並使上述基板以垂直於上述主面之旋轉軸作為 中心而旋轉,用來檢查形成在上述主面之膜上的條紋不 均;其特徵在於包含有: (a) 準備從上述基板之上述膜獲得的多色調對象影像之 步驟;和 (b) 在上述主面上設定以上述旋轉軸作為起點而朝向外 侧的多個離心方向,在上述對象影像中分別對應於上述多 個離心方向之方向,累計在該方向排列的圖素之值,用來 取得與上述多個離心方向相對應之多個評估值的步驟。 9·如申請專利範圍第8項之膜厚不均檢查方法,其中 312XP/發明說明書(補件)/96-08/96118935 28 在上述主 域;且 面設定以上述旋轉軸作為中 心之多個環狀區 在上述(b)步驟,在上述對象 卜、十-夕加她▲ T泵衫像中,沿著分別對應於 ^ Λ ^ Α 系冲存在於與各個環狀區域之 見度王體相對應之範圍的圖辛 〆 1Λ , ^ ;圆京之值,用來求得評估值。 10·如申請專利範圍第9項之脬 ^ 腰与不均檢查方法,豆中 上述各個環狀區域之一部份 八 抓心ί ,一 ^ 忉興其他任一環狀區域之一U54099 X. Patent application scope: 1. A film thickness unevenness (mura) inspection device, which supplies a coating liquid to a main surface of a substrate, and rotates the substrate as a rotation axis perpendicular to the main surface. #, used to check the stripe unevenness formed on the film of the main surface; it is characterized by: I5, the film imaging of the substrate by the imaging device is used to obtain a multi-tone target image; and the sweat evaluation acquisition unit sets a plurality of centrifugal directions toward the outside on the main surface with the rotation axis as a starting point. The target image is cumulatively arranged in values corresponding to the plurality of directions of the plurality of centrifugal directions for obtaining a plurality of evaluation values corresponding to the plurality of deviation directions. [2] The film thickness unevenness inspection device of the third aspect of the invention, wherein the domain is provided with a plurality of annular regions having the rotation axis as a center in the main surface, and the evaluation acquisition unit is in the target image The corresponding directions and the direction of the centrifugal direction are respectively indicated, and the evaluation values of the Wang Xie people's minds are accumulated in the respective corresponding ranges. The value of the pixel of the range of 〇 is used to obtain 3, such as the film thickness unevenness inspection device of the second item of the application (4), in which the part of the c-ring area is part-and other-ring-shaped area One part is overlapped in the radial direction. The film thickness unevenness inspection device of the third item of the ttr patent range, wherein the annular region. Other 312XP/Invention Manual (supplement)/96^08/96118935 27 1354099 at the junction of the singular regions 5. The film thickness unevenness inspection device according to the patent application No. 1 瑁1, wherein the substrate is a flat surface A glass substrate for display devices. 6. For the H-thickness unevenness inspection device of the patent application range 1 to ^ b to 5, wherein the alignment directions of the mutually orthogonal pixels in the target image correspond to each other, the main faces of the substrate are orthogonal to each other. And the above-mentioned "flat evaluation" acquisition unit converts the polar coordinate system having the position corresponding to the rotation axis as a center to form a converted image, and converts the image from the above-mentioned target image The above multiple evaluation values are obtained. 7. In the film thickness unevenness inspection device of claim 6, wherein the plurality of centrifugal directions are set at a certain angular distance, and when one or a half of the number of pixels arranged on the long side of the target image becomes "the above, The pitch angle is equal to or less than arc tan (l/a). 8. A method for inspecting the film thickness unevenness (mura), supplying the coating liquid to the main surface of the substrate, and rotating the substrate perpendicular to the main surface The shaft is rotated as a center for inspecting unevenness of the stripes formed on the film of the main surface; and characterized in that: (a) a step of preparing a multi-tone object image obtained from the film of the substrate; and (b) a plurality of centrifugal directions that are outwardly directed by the rotation axis as a starting point are set on the main surface, and the values of the pixels arranged in the direction are integrated in the target image corresponding to the directions of the plurality of centrifugal directions. The step of obtaining a plurality of evaluation values corresponding to the plurality of centrifugal directions described above. 9. The film thickness unevenness inspection method according to item 8 of the patent application scope, wherein 312XP/invention specification (supplement)/96-08/96118935 28 In the above-mentioned main domain; and a plurality of annular regions having the above-mentioned rotation axis as the center are set in the above step (b), in the above-mentioned object, the ten-plus-plus ▲T pumping shirt image, respectively, along the corresponding ^ Λ ^ Α 冲 存在 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图^ Waist and uneven inspection method, one of the above-mentioned various ring-shaped areas of the bean, eight grasping the heart, one of the other ring areas of the other 部伤在徑方向成為重疊。 11.如申請專利範圍第i 〇項 κ犋厚不均檢查方法,苴中 環IS跨越互相鄰接之2個環狀區域的交界處之其他 a如申請專利範圍第8項之膜厚不均檢查方法,盆中 上述基板是平面顯示裝置用之玻璃基板。 13•如申料·圍第8幻2财任—歡膜厚 查方法,其中 #在上述對象影像中互相正交之圖素的排列方向,分別對 應到在上述基板之上述主面上互相正交的2個方向;且 在上述(b)步驟’將在上述對象影像中以與上述旋轉轴 相對應之位置作為中心的極座標系變換成為直角座標系 用來產生變換影像,從上述變換影像求得上述多個評估 值。 14·、如申請專利範圍第13項之膜厚不均檢查方法其中 上述多個離心方向被設定為一定之間距角,當排列在上 述對象影像之長邊的圖素數之—半為α時,上述間距角成 312ΧΡ/發明說明書(補件)/96.〇8/96118935 29 1354099 為 arc tan(l/a )以下。The wounds overlap in the radial direction. 11. If the method of inspecting the gamma thickness unevenness of the i-th item of the patent application scope, the method of the film thickness unevenness inspection of the middle of the boundary of the two ring-shaped regions adjacent to each other The above substrate in the basin is a glass substrate for a flat display device. 13• For example, the application of the material, the 8th illusion 2, the method of checking the thickness of the film, wherein #the direction of the pixels orthogonal to each other in the object image corresponds to the positive relationship on the main surface of the substrate In the above-mentioned step (b), the polar coordinate system having the position corresponding to the rotation axis in the target image is converted into a rectangular coordinate system for generating a transformed image, and the converted image is obtained from the converted image. The above multiple evaluation values are obtained. 14. The film thickness unevenness inspection method according to claim 13 wherein the plurality of centrifugal directions are set to a certain intermediate angle, and when the half of the number of pixels arranged on the long side of the object image is α The pitch angle is 312 ΧΡ / invention specification (supplement) / 96. 〇 8 / 96118935 29 1354099 is below arc tan (l / a). 312XP/發明說明書(補件)/96-08/96118935 30312XP/Invention Manual (supplement)/96-08/96118935 30
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