TWI349959B - A method and apparatus for separating stiffening plate fixed on semiconductor wafer - Google Patents

A method and apparatus for separating stiffening plate fixed on semiconductor wafer

Info

Publication number
TWI349959B
TWI349959B TW094101267A TW94101267A TWI349959B TW I349959 B TWI349959 B TW I349959B TW 094101267 A TW094101267 A TW 094101267A TW 94101267 A TW94101267 A TW 94101267A TW I349959 B TWI349959 B TW I349959B
Authority
TW
Taiwan
Prior art keywords
semiconductor wafer
plate fixed
stiffening plate
separating
separating stiffening
Prior art date
Application number
TW094101267A
Other languages
Chinese (zh)
Other versions
TW200532788A (en
Inventor
Masayuki Yamamoto
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of TW200532788A publication Critical patent/TW200532788A/en
Application granted granted Critical
Publication of TWI349959B publication Critical patent/TWI349959B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
TW094101267A 2004-03-24 2005-01-17 A method and apparatus for separating stiffening plate fixed on semiconductor wafer TWI349959B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004087175A JP4381860B2 (en) 2004-03-24 2004-03-24 Method and apparatus for separating reinforcing plate fixed to reinforced semiconductor wafer

Publications (2)

Publication Number Publication Date
TW200532788A TW200532788A (en) 2005-10-01
TWI349959B true TWI349959B (en) 2011-10-01

Family

ID=34990547

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094101267A TWI349959B (en) 2004-03-24 2005-01-17 A method and apparatus for separating stiffening plate fixed on semiconductor wafer

Country Status (5)

Country Link
US (1) US7504316B2 (en)
JP (1) JP4381860B2 (en)
CN (1) CN100437926C (en)
SG (2) SG134324A1 (en)
TW (1) TWI349959B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4800778B2 (en) * 2005-05-16 2011-10-26 日東電工株式会社 Dicing pressure-sensitive adhesive sheet and processing method of workpiece using the same
JP4970863B2 (en) * 2006-07-13 2012-07-11 日東電工株式会社 Workpiece processing method
FR2917234B1 (en) * 2007-06-07 2009-11-06 Commissariat Energie Atomique MULTI-COMPONENT DEVICE INTEGRATED IN A SEMICONDUCTOR MATRIX
FR2934082B1 (en) * 2008-07-21 2011-05-27 Commissariat Energie Atomique MULTI-COMPONENT DEVICE INTEGRATED IN A MATRIX
FR2947948B1 (en) * 2009-07-09 2012-03-09 Commissariat Energie Atomique HANDLE PLATE HAVING VISUALIZATION WINDOWS
US8963337B2 (en) 2010-09-29 2015-02-24 Varian Semiconductor Equipment Associates Thin wafer support assembly
JP5149977B2 (en) * 2011-04-15 2013-02-20 リンテック株式会社 Semiconductor wafer processing method
JP5958262B2 (en) * 2011-10-28 2016-07-27 信越化学工業株式会社 Wafer processing body, wafer processing member, wafer processing temporary adhesive, and thin wafer manufacturing method
JP2013141651A (en) * 2012-01-11 2013-07-22 Lintec Corp Energy ray irradiation apparatus
JP2014011244A (en) * 2012-06-28 2014-01-20 Nitto Denko Corp Led manufacturing method
JP2014011242A (en) * 2012-06-28 2014-01-20 Nitto Denko Corp Led manufacturing method
US8969177B2 (en) * 2012-06-29 2015-03-03 Applied Materials, Inc. Laser and plasma etch wafer dicing with a double sided UV-curable adhesive film
JP6132502B2 (en) * 2012-09-27 2017-05-24 株式会社ディスコ Wafer processing method
TWI494410B (en) * 2013-04-10 2015-08-01 Hon Hai Prec Ind Co Ltd Adhesive tape
CN106695538B (en) * 2015-11-18 2019-07-05 富鼎电子科技(嘉善)有限公司 Grind fixed device and the grinding method using the fixed device of the grinding
JP7133355B2 (en) * 2018-05-17 2022-09-08 日東電工株式会社 Adhesive sheet

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4977061A (en) * 1988-08-19 1990-12-11 Fuji Photo Film Co., Ltd. Picture card and method of making the same
JP4137310B2 (en) * 1999-09-06 2008-08-20 リンテック株式会社 Method and apparatus for peeling articles fixed to double-sided pressure-sensitive adhesive sheet
JP2002043253A (en) * 2000-07-26 2002-02-08 Nec Corp Method of dicing for semiconductor element
JP2002075937A (en) 2000-08-30 2002-03-15 Nitto Denko Corp Method for processing semiconductor wafer
JP4651799B2 (en) * 2000-10-18 2011-03-16 日東電工株式会社 Energy ray-curable heat-peelable pressure-sensitive adhesive sheet and method for producing a cut piece using the same
US6699770B2 (en) * 2001-03-01 2004-03-02 John Tarje Torvik Method of making a hybride substrate having a thin silicon carbide membrane layer
JP4639520B2 (en) * 2001-04-27 2011-02-23 パナソニック株式会社 Manufacturing method of nitride semiconductor chip
JP2003173989A (en) * 2001-12-04 2003-06-20 Sekisui Chem Co Ltd Method for manufacturing ic chip
JP3987720B2 (en) * 2001-12-19 2007-10-10 日東電工株式会社 Cleaning sheet and method for cleaning substrate processing apparatus using the same
JP3911174B2 (en) * 2002-03-01 2007-05-09 シャープ株式会社 Semiconductor device manufacturing method and semiconductor device
JP4137471B2 (en) * 2002-03-04 2008-08-20 東京エレクトロン株式会社 Dicing method, integrated circuit chip inspection method, and substrate holding apparatus
US7534498B2 (en) * 2002-06-03 2009-05-19 3M Innovative Properties Company Laminate body, method, and apparatus for manufacturing ultrathin substrate using the laminate body
JP2004134672A (en) * 2002-10-11 2004-04-30 Sony Corp Method and apparatus for manufacturing super-thin semiconductor device and super-thin backlighting type solid-state imaging device
JP2006135272A (en) * 2003-12-01 2006-05-25 Tokyo Ohka Kogyo Co Ltd Substrate support plate and peeling method of support plate
JP3765497B2 (en) * 2004-03-17 2006-04-12 日東電工株式会社 Acrylic adhesive composition and adhesive tape
US20060019051A1 (en) * 2004-06-09 2006-01-26 Pufahl Joseph M Method and system for applying a finely registered printed laminated overlay to a substrate

Also Published As

Publication number Publication date
US20050215030A1 (en) 2005-09-29
SG115734A1 (en) 2005-10-28
US7504316B2 (en) 2009-03-17
JP4381860B2 (en) 2009-12-09
CN100437926C (en) 2008-11-26
SG134324A1 (en) 2007-08-29
CN1674235A (en) 2005-09-28
TW200532788A (en) 2005-10-01
JP2005277037A (en) 2005-10-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees