TWI347212B - Air filtration system and method thereof, and method for purifying air for a nano-technology process environment - Google Patents

Air filtration system and method thereof, and method for purifying air for a nano-technology process environment

Info

Publication number
TWI347212B
TWI347212B TW097139390A TW97139390A TWI347212B TW I347212 B TWI347212 B TW I347212B TW 097139390 A TW097139390 A TW 097139390A TW 97139390 A TW97139390 A TW 97139390A TW I347212 B TWI347212 B TW I347212B
Authority
TW
Taiwan
Prior art keywords
air
nano
filtration system
process environment
technology process
Prior art date
Application number
TW097139390A
Other languages
English (en)
Other versions
TW200944283A (en
Inventor
T S Chuang
Jeng Jyi Hwang
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Publication of TW200944283A publication Critical patent/TW200944283A/zh
Application granted granted Critical
Publication of TWI347212B publication Critical patent/TWI347212B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ventilation (AREA)
TW097139390A 2008-04-30 2008-10-14 Air filtration system and method thereof, and method for purifying air for a nano-technology process environment TWI347212B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/112,385 US8394156B2 (en) 2008-04-30 2008-04-30 Ultra-pure air system for nano wafer environment

Publications (2)

Publication Number Publication Date
TW200944283A TW200944283A (en) 2009-11-01
TWI347212B true TWI347212B (en) 2011-08-21

Family

ID=41230729

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097139390A TWI347212B (en) 2008-04-30 2008-10-14 Air filtration system and method thereof, and method for purifying air for a nano-technology process environment

Country Status (3)

Country Link
US (1) US8394156B2 (zh)
CN (1) CN101571307B (zh)
TW (1) TWI347212B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102136681B (zh) * 2010-01-26 2013-01-02 罗莎国际有限公司 自冷式离子化空气产生装置
CN102059160B (zh) * 2010-10-20 2013-04-03 中国人民解放军军事医学科学院微生物流行病研究所 一种生物安全防护舱
JP6005588B2 (ja) * 2013-05-31 2016-10-12 東京エレクトロン株式会社 液処理装置
US9352263B2 (en) 2013-12-27 2016-05-31 Taiwan Semiconductor Manufacturing Co., Ltd. Mechanisms for air treatment system and air treatment method
CN104801118A (zh) * 2015-04-03 2015-07-29 上海过滤器有限公司 一种用于空气的处理系统
CN113606724B (zh) * 2021-08-09 2022-08-16 兰州大学 一种防感染护理装置及其使用方法
CN116105251B (zh) * 2023-03-14 2024-01-05 通威微电子有限公司 半导体厂房净化设备

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4164901A (en) * 1978-01-16 1979-08-21 American Air Filter Company, Inc. Indoor gun firing range enclosure having a ventilation system
US4726824A (en) * 1986-10-06 1988-02-23 Staten Michael D Air purification system
US5004483A (en) * 1990-04-25 1991-04-02 Enviro-Air Control Corporation Particulate abatement and environmental control system
KR100197900B1 (ko) * 1996-07-24 1999-06-15 윤종용 반도체 청정실용의 공기조화시스템
JPH10106908A (ja) 1996-10-01 1998-04-24 Mitsubishi Electric Corp ケミカルフリー乾燥空気の発生装置
US6102977A (en) * 1998-06-18 2000-08-15 Seh America, Inc. Make-up air handler and method for supplying boron-free outside air to clean rooms
US6123617A (en) * 1998-11-02 2000-09-26 Seh-America, Inc. Clean room air filtering system
EP1139390A1 (en) * 2000-03-28 2001-10-04 Infineon Technologies AG Semiconductor wafer pod
KR100474577B1 (ko) * 2002-07-06 2005-03-08 삼성전자주식회사 청정 공기 덕트 및 청정실용 공기 제공 장치
US7105037B2 (en) * 2002-10-31 2006-09-12 Advanced Technology Materials, Inc. Semiconductor manufacturing facility utilizing exhaust recirculation
EP1544553B1 (de) * 2003-12-18 2009-10-07 M+W Zander Products GmbH Einrichtung zur Konditionierung von Umluft, vorzugsweise von Reinluft
KR100577214B1 (ko) * 2004-01-28 2006-05-10 엘지전자 주식회사 환기겸용 공기청정기
KR100617079B1 (ko) * 2005-02-07 2006-08-30 엘지전자 주식회사 공기청정겸용 환기시스템
JP2008181968A (ja) * 2007-01-23 2008-08-07 Toshiba Corp 半導体製造システムおよび半導体装置の製造方法
JP2009002634A (ja) * 2007-06-25 2009-01-08 Unitec Inc ユニット型クリーンルーム
US8460441B2 (en) * 2009-11-19 2013-06-11 Fipak Research And Development Company Method and apparatus for operating ducted fumehoods with increased energy efficiency

Also Published As

Publication number Publication date
US20090275278A1 (en) 2009-11-05
CN101571307B (zh) 2011-11-23
US8394156B2 (en) 2013-03-12
CN101571307A (zh) 2009-11-04
TW200944283A (en) 2009-11-01

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