TWI344202B - Multi-chip stacked package enabling to electrically isolate an encapsulated fail chip and a substrate utilized for the package - Google Patents

Multi-chip stacked package enabling to electrically isolate an encapsulated fail chip and a substrate utilized for the package Download PDF

Info

Publication number
TWI344202B
TWI344202B TW096130069A TW96130069A TWI344202B TW I344202 B TWI344202 B TW I344202B TW 096130069 A TW096130069 A TW 096130069A TW 96130069 A TW96130069 A TW 96130069A TW I344202 B TWI344202 B TW I344202B
Authority
TW
Taiwan
Prior art keywords
wafer
substrate
package structure
electrically
region
Prior art date
Application number
TW096130069A
Other languages
Chinese (zh)
Other versions
TW200908281A (en
Inventor
Hung Hsin Hsu
meng lin Li
Original Assignee
Powertech Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Powertech Technology Inc filed Critical Powertech Technology Inc
Priority to TW096130069A priority Critical patent/TWI344202B/en
Publication of TW200908281A publication Critical patent/TW200908281A/en
Application granted granted Critical
Publication of TWI344202B publication Critical patent/TWI344202B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/4824Connecting between the body and an opposite side of the item with respect to the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73215Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

1344202, 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種多晶片堆疊封裝,特別係有關 於一種可電性隔離已封裝不良晶片之多晶片堆疊封裝 構造及其使用之基板。 【先前技術】 半導體產品在晶圓、晶片、封裝與模組接合等不同 階段中必須經過多道的測試步驟,以避免不良品被誤 用。例如在晶圓等級測試良好的晶片便稱之為已知良好 晶片(Known Good Die, KGD)。然而測試的次數越多, 代表製造成本越高。因此,習知進行多晶片封裝製程, 有可能全部或部分是選用未測試晶片。之後再對封裝構 造進行電性測試。由於進行多晶片封裝(Multi-Chip Package, MCP)所使用之晶片品質及狀況並不相同。當 測試得知封裝成品無法正常運作時,即使知道是那一顆 晶片發生故障,由於不良晶片已被封膠密封,所以無法 進行重工修補,其餘功能正常之晶片只能隨著含有不良 晶片之多晶片封裝構造報廢丟棄,導致浪費。 請參閱第1圖所示,繪示一種習知多晶片堆疊封裝構 造之載面示意圖。該多晶片堆疊封裝構造1 00主要包含一 基板110、一第一晶片120、一第二晶片130以及一封膠體 140。該基板110係具有一上表面111、一下表面112、 複數個内接墊1 1 3、1 1 4以及複數個外接墊11 5,該些外 接墊1 1 5係形成於該基板1 1 0之下表面1 1 2,以接合銲 5 球150。_種習知多晶片堆叠封裝構造⑽係為窗口型球 車列封裝並具有背對背堆叠型態’故該基板! i 〇係更具 窗孔1 1 6,以供打線連接之通道。該第一晶片t 2 〇 之主動面係可利用黏晶材料黏貼在該基板n〇之上表 面1 1 1 ’複數個第-銲線1 61通過該窗& i i 6將該第一晶 20之第一鲜替1 2 1電性連接至該基板u 〇之該些内接墊 114。泫第二晶片13〇係設置於該第_晶片12〇上並以複數 第銲線1 62電性連接該第二晶#】3〇之第二銲墊1 3 i :該些内接墊丨13。該封膠體丨4〇形成於該基板"〇之上 二面⑴之上與該窗孔"6内,以密封該些晶片120、 0以及該些銲線i 6 ij 62。在 ^ 在封裝後進行測試時,若 务現該第二晶片丨3 〇為不良品 ^ 由於已被該封膠體1 40 技封’只能將整個多晶片堆疊封 行修整。 丘封裝構造_報廢並無法進 我國專利公告第4 0 9 3 3 0號「开技… 梦,e $ 了修整式多晶片模組封 、」揭不一種可修整的多 上,* , 广対裝製程,晶片固定基板 波以打線電性連接之銲線電 試击跑/ 4 11連接晶片與基板,測 時,膠7诹之則’當測得有不良晶片 則拉斷連接不良晶片的銲線, 電性绍 使不良B日片與基板 电眭絕緣,並在不良晶片之上 (KGn、 * 堆设一已知良好晶片 ),再第二次打線連接。最 片與P 4 年良好晶片、不良晶 /、 α良好晶片以封膠體密封。^ 前,a κ命力 封。由於測試在封膠之 移搬ϋ« 勿在測试過程以及機台轉 搬運過程發生塵粒污染。此外, 在進行修整(Repair) 1344202. 封 過程,連接不良晶片的銲線被拉斷,會有懸空殘線 膠時會有接觸其它正常銲線導致短路問題。 【發明内容]1344202, IX. Description of the Invention: The present invention relates to a multi-wafer stacked package, and more particularly to a multi-wafer stacked package structure and a substrate for electrically isolating a packaged defective wafer. [Prior Art] Semiconductor products must undergo multiple test steps at different stages of wafer, wafer, package, and module bonding to avoid misuse of defective products. For example, a wafer that is well tested at the wafer level is called a Known Good Die (KGD). However, the more times the test is performed, the higher the manufacturing cost. Therefore, it is conventional to carry out a multi-wafer packaging process, and it is possible to select all or part of the untested wafer. The package structure is then electrically tested. The quality and condition of the chips used in the Multi-Chip Package (MCP) are not the same. When the test knows that the packaged product is not working properly, even if it is known that the wafer is faulty, since the defective wafer has been sealed by the sealant, it cannot be repaired by rework. The remaining normal functions of the wafer can only be accompanied by the number of defective wafers. The chip package structure is discarded and discarded, resulting in waste. Referring to Figure 1, a schematic diagram of a conventional multi-wafer stacked package structure is shown. The multi-wafer stack package structure 100 mainly includes a substrate 110, a first wafer 120, a second wafer 130, and a gel 140. The substrate 110 has an upper surface 111, a lower surface 112, a plurality of internal pads 1 1 3, 1 1 4 and a plurality of external pads 11 5 formed on the substrate 1 1 0 The lower surface 1 1 2 is joined to weld 5 balls 150. The conventional multi-wafer stacked package structure (10) is a window type ball column package and has a back-to-back stacked type. i The 〇 system has a window 1 1 6 for the connection of the wire connection. The active surface of the first wafer t 2 可 can be adhered to the upper surface of the substrate by using a die bonding material. 1 1 1 'a plurality of first bonding wires 1 61 pass through the window & ii 6 to the first crystal 20 The first fresh electrode 1 2 1 is electrically connected to the inner pads 114 of the substrate u. The second wafer 13 is disposed on the first wafer 12 and electrically connected to the second wafer 1 62 by a plurality of solder wires 1 62. The second pads 1 3 i : the inner pads 13. The encapsulant 丨4〇 is formed on the substrate (1) above the two sides (1) and the window hole 6 to seal the wafers 120, 0 and the bonding wires i 6 ij 62. When the test is performed after encapsulation, if the second wafer 丨3 is defective, the entire multi-wafer stack can only be trimmed because it has been sealed by the sealant. Qiu package structure _ scrap and can not enter China's patent announcement No. 4 0 9 3 3 0 "opening technology ... dream, e $ trimmed multi-chip module seal," not a kind of repairable more, *, Guang The manufacturing process, the wafer fixed substrate wave is electrically connected by wire bonding, and the test is run. 4 11 The wafer and the substrate are connected. When measuring, the glue is 7 ' 'When the defective wafer is measured, the solder of the badly connected wafer is broken. The wire, the electrical property, causes the bad B-day film to be insulated from the substrate, and is placed on the defective wafer (KGn, * is stacked with a known good wafer), and the second wire is connected. The most good wafers with P 4 years, bad crystals, and α good wafers were sealed with a sealant. ^ Before, a κ life force seal. Due to the transfer of the test in the sealer 勿« Do not carry out dust pollution during the test process and the transfer of the machine. In addition, during the repair process (Repair) 1344202. The bonding wire of the poorly connected wafer is broken, and there is a problem that the other normal bonding wires may cause a short circuit when the residual wire is suspended. [Content of the Invention]

本發明之主要目的係在於提供一帛可電性隔離已封 裝不良晶片之多晶片堆叠封裝構造及其使用之基板,基 板之上表面預留有-第二封膠區,其内形成—雷射㈣ 區,以使被封膠之不良晶片與外接端為電性斷路,以修 整該多晶片堆疊封裝構造’避免因為一個或少數已封膠 晶片發生故障導致整個多晶片㈣封裝構造的報廢。 本發明之次-目的係在於提供一種可電性隔離已封 裝不良晶片之多晶片堆疊封裝構造及其使用之基板能 解決習知在修整過程中因拉斷輝線產生懸空殘線接觸而短 路的問題,並避免測試污染。 本發明的目的及解決其技術問題是採用以下技術方 案來實現的。依據本發明,一種可電性隔離已封裝不良 晶片之多晶片堆曼封裝構造主要包含_基板、—第一: 片、-第二晶片、-第-封膠體以及-第二封膠體。該基: 糸具有-上表面與一下表面,其中該上表面係包含—晶片設 =區、—第-封膠區及-第二封耀區,該基板並具有複數個 導通孔、複數個位於該上表面之内接塾、複數個連接該些導 通孔與該些内接墊之線路以及複數個位於該下表面之外接 塾’該些内接塾係經由該些線路與該些導通孔電性連接至該 些外接塾’其令該第二封朦區係形成有一雷射修整區,用; 顯露該些線路之-區段。該第—晶片係設置料基板之該晶 7 1344202 片設置區。該第-曰 些内接赛。”一曰曰片係設置於該第一晶片上並電性連接該 以密封該' 封膠體係形成於該基板之該第一封膠區, 社> °Λ —晶片與該第二晶片。該第二封膠體係形成於該 基板之該第二封 τ膠& ’以密封該雷射修整區。另揭示上述 夕a曰片堆疊封裝構造所使用之基板。 本發8月g 巧曰的及解決其技術問題還可採用以下技術 措施進一步實現。The main object of the present invention is to provide a multi-wafer stack package structure capable of electrically isolating a packaged defective wafer and a substrate therefor, and a second sealant region is formed on the upper surface of the substrate, and a laser is formed therein. (4) Zones to electrically disconnect the poorly bonded wafers and the external terminals to trim the multi-wafer stack package structure 'avoiding the end of the entire multi-wafer (4) package structure due to failure of one or a few of the packaged wafers. The second objective of the present invention is to provide a multi-wafer stack package structure capable of electrically isolating a packaged defective wafer and a substrate for use thereof, which can solve the problem of short-circuiting due to the contact of the suspended wire by the pull-off residual line during the trimming process. And avoid testing for contamination. The object of the present invention and solving the technical problems thereof are achieved by the following technical solutions. According to the present invention, a multi-wafer stack package structure capable of electrically isolating a packaged defective wafer mainly comprises a substrate, a first sheet, a second wafer, a - a sealant, and a second seal. The base has: an upper surface and a lower surface, wherein the upper surface comprises a wafer setting region, a first sealing layer region, and a second sealing region, the substrate having a plurality of via holes and a plurality of The inner surface of the upper surface, the plurality of wires connecting the via holes and the inner pads, and the plurality of wires located outside the lower surface are electrically connected to the via holes via the wires and the via holes Sexually connected to the external rafts', which causes the second sealed area to form a laser trimming area for revealing the sections of the lines. The first wafer is disposed on the substrate 7 1344202 sheet setting region. The first - some innings. A sheet is disposed on the first wafer and electrically connected to seal the 'sealanting system' formed on the first sealing region of the substrate, and the wafer and the second wafer. The second encapsulation system is formed on the second sealing glue & ' of the substrate to seal the laser trimming area. The substrate used in the stacking and packaging structure of the above-mentioned 曰 a 曰 sheet is further disclosed. And to solve its technical problems can be further realized by the following technical measures.

,十、 月1J 34之多晶片堆疊封裝構造中,該雷射修整區係 可由忒基板之-防銲層開孔所界定。 在前述之多晶片堆疊封裝構造中,該雷射修整區係 可為長條槽孔。 在前述之多晶片堆疊封裝構造中,該些線路於該雷 射修整區内之顯露區段係能以雷射選擇性切斷,以使該 第二晶片與該些外接墊為電性絕緣。In the ten-month-old 1J-34 wafer stack package structure, the laser trimming region can be defined by the solder mask opening of the germanium substrate. In the aforementioned multi-wafer stack package configuration, the laser trimming area may be a long slot. In the multi-wafer stack package configuration described above, the exposed segments of the lines in the laser trim region are laser-selectively cut to electrically insulate the second wafer from the external pads.

在前述之多晶片堆疊封裝構造中,該基板係可具有 —窗孔,以供打線通過。 在前述之多晶片堆疊封裝構造中,可另包含有複數 個銲球,其係設置於該些外接墊。 在前述之多晶片堆疊封裝構造中,可另包含有複數 個第一銲線與第二銲線,該些第,銲線係通過該窗孔電 性連接該第一晶片與該基板,該呰第二銲線係電性連接 該第二晶片至該基板之該些内接垫。 在前述之多晶片堆疊封裝構造中,可另包含有一第 三封膠體,其係填入於該窗孔,以密封該些第一銲線。In the aforementioned multi-wafer stacked package configuration, the substrate may have a window for passing the wire. In the foregoing multi-wafer stack package configuration, a plurality of solder balls may be further included, which are disposed on the external pads. In the foregoing multi-wafer stack package structure, a plurality of first bonding wires and a second bonding wire may be further included, and the bonding wires are electrically connected to the first wafer and the substrate through the window holes. The second bonding wire electrically connects the second wafer to the inner pads of the substrate. In the foregoing multi-wafer stack package structure, a third sealant may be further included in the window to seal the first bonding wires.

S 1344202· 在前述之多晶片堆疊封裴構造中,其中該第一晶片 與該第二晶片係可為背對背堆疊。 在前述之多晶片堆疊封裝構造中,該些導通孔係可 排列在該基板之周邊。 在别述之多晶片堆瑩封裝構造中’該些内接墊係可 位於該第一封膠區内並鄰近該晶片設置區。 在前述之多晶片堆疊封裝構造中,該第一封膠區係 φ 可圍繞該晶片設置區,並且該第二封膠區係圍繞該第一 封膠區。 【實施方式】 依據本發明之第一具體實施例,揭示一種可電性隔 離已封裝不良晶片之多晶片堆疊封裝構造,其係為窗口 型球格陣列封裝型態。如第2圖所示’該多晶片堆疊封 裝構造200主要包含一基板210、一第一晶片220、一第 二晶片230、一第一封膠體241以及一第二封膠體242。其 鲁 中’ s亥第一晶只220與該第二晶片230係堆叠在該基板210 上並以該第一封膠體24 1封膠保護。 請參閱第2及3圖所示’該基板210係具有一上表面 211與一下表面212。其中配合參閱第4圖,該上表面211 係包含一晶片設置區211A、一第一封膠區211B及一第二封 膠區2 1 1 C。如第4圖所示,該晶片設置區2丨丨a係位於該基 板2 1 0之上表面2 Π中央,以晶片之堆疊設置。該第一封膠 區2 11 B係圍繞該晶片設置區211 A,作為該第一封膠體24 1 於該基板210之覆蓋區(如第2圖所示)。又,該第二封膠區 9 1344202 該晶片設置區2 11 A,該第二晶片23〇係堆疊設置在該第— μ片220之上方,以構成多晶片堆叠切態。此外,不受局限 地,更多晶片可堆疊在該第二晶片23〇的上方(圖未繪出)。 該第一晶片220之一主動面222係設有複數個第一銲墊 221 ;而該第二晶片230之一主動面232係設有複數個第二 銲墊23卜在本實施例中,該第一晶片22〇與該第二晶片 係為實質相同之晶片,例如可為具有相同尺寸、相同功能、 相同容量之記憶體晶片。 該第一晶片220並電性連接至該基板2丨〇。在本實 施例中’如帛2圖所示,可以利用一黏晶層27〇將該第一 晶片220之主動面222貼設於該基板2〗〇之該上表面 2Η,再以複數個打線形成之第一銲線261將該第一晶 • — · ~'·-—S 1344202. In the foregoing multi-wafer stacked package construction, wherein the first wafer and the second wafer system can be stacked back to back. In the aforementioned multi-wafer stacked package structure, the via holes may be arranged around the periphery of the substrate. In the multi-wafer stack package construction described above, the inner pads may be located adjacent to the first seal region and adjacent to the wafer set region. In the multi-wafer stacked package configuration described above, the first encapsulation zone φ can surround the wafer placement zone and the second encapsulation zone surrounds the first encapsulation zone. [Embodiment] According to a first embodiment of the present invention, a multi-wafer stack package structure capable of electrically isolating a packaged defective wafer is disclosed, which is a window type ball grid array package type. As shown in FIG. 2, the multi-wafer stack package structure 200 mainly includes a substrate 210, a first wafer 220, a second wafer 230, a first encapsulant 241, and a second encapsulant 242. The first crystal 220 and the second wafer 230 are stacked on the substrate 210 and protected by the first encapsulant 24 1 . Referring to Figures 2 and 3, the substrate 210 has an upper surface 211 and a lower surface 212. Referring to FIG. 4, the upper surface 211 includes a wafer setting area 211A, a first sealing area 211B and a second sealing area 2 1 1 C. As shown in Fig. 4, the wafer setting area 2a is located at the center of the upper surface 2 of the substrate 210, and is arranged in a stack of wafers. The first encapsulation region 2 11 B surrounds the wafer placement region 211 A as a coverage area of the first encapsulant 24 1 (shown in FIG. 2 ). Moreover, the second encapsulation area 9 1344202 is disposed on the wafer setting area 2 11 A, and the second wafer 23 is stacked on top of the first μ sheet 220 to form a multi-wafer stack tangential state. Moreover, without limitation, more wafers may be stacked above the second wafer 23' (not shown). The active surface 222 of the first wafer 220 is provided with a plurality of first pads 221; and the active surface 232 of the second wafer 230 is provided with a plurality of second pads 23, in this embodiment, The first wafer 22 is substantially the same wafer as the second wafer, and may be, for example, a memory wafer having the same size, the same function, and the same capacity. The first wafer 220 is electrically connected to the substrate 2 . In the present embodiment, as shown in FIG. 2, the active surface 222 of the first wafer 220 may be pasted on the upper surface 2 of the substrate 2 by a bonding layer 27, and then a plurality of wires may be used. Forming the first bonding wire 261 to the first crystal. — — — — — — —

2 1 0之内接墊 孔2 1 8,以電 一晶片2 3 0係電性連 些内接墊214。其中該第一晶片22〇與 為背對背堆疊。該第二晶片23〇之第二 數個第二銲線262電性連接至該些内接 片230與該基板21〇電性互連。 …乂棋封、點膠或印刷方式可以形成該第 241與該第二軿现μThe inner pad 2 1 8 is electrically connected to the inner pad 214. Wherein the first wafer 22 is stacked back to back. The second plurality of second bonding wires 262 of the second wafer 23 are electrically connected to the inner connecting pieces 230 and electrically connected to the substrate 21 . ...the chess piece, the dispensing or the printing method can form the second 241 and the second one

—封膠體 「'I小,該第一封膠 ‘封夥區2 11Β,以密封 避免外界水氣或污染 i 11 1344202* 物侵入。在本實施例中,該第一封膠體241係更密封該些 第二銲線262,但不覆蓋該雷射修整區211D。因此,在該笫 一封膠體241形成之後,該第一晶片220、該第二晶片230 與該些第二銲線262能得到足夠的保護,便可進行各種測 試,以偵測該第一晶片220與該第二晶片230是否良好或堪 用。如第2及4圖所示’如確定該第二晶片230為不良品該- The sealant "'I is small, the first sealant' seal area 2 11Β, to seal to avoid external moisture or pollution i 11 1344202*. In this embodiment, the first sealant 241 is more sealed. The second bonding wires 262, but not covering the laser trimming regions 211D. Therefore, after the first bonding body 241 is formed, the first wafer 220, the second wafer 230, and the second bonding wires 262 can With sufficient protection, various tests can be performed to detect whether the first wafer 220 and the second wafer 230 are good or usable. As shown in Figures 2 and 4, if the second wafer 230 is determined to be defective The

些線路215於該雷射修整區21 1D内之線路顯露區段21 5A 係崞以雷射選擇性切斷’以使該第二晶片230與該基板2 j 〇 之β亥些外接塾2 1 6為電性絕緣,同時不會有習知拉斷銲線的 修補方式產生懸空殘線接觸而短路與測試污染的問題。該些 外接墊2 1 6仍可順利傳輸至該第一晶片22〇,整個多晶片堆 疊封裝構造200仍可使用,不需要報廢’能節省至少一 次的晶圓測試或/及晶圓預燒,以符合低成本的多晶片 封裝測試趨勢。 叩战弟二封膠 區2UC,以密封該雷射修整區2UD,以保護該些線路川 之線路顯露區段215A。此外,如第2圖所示,該多曰片堆 叠封裝構造2〇0可另包含有-第三封膠體⑷,其係填入於 :窗孔218,以密封該些第一鲜線26卜其中,該第三封膠 243與該第一封膠體241可同時开;忐b B u _ J丨J矸形成且在多晶片測試之 則,該第二封膠體242則形成在多晶片測試之後。 如第2圖所示’在本發一 片烚蟲私壯《 之具體架構中’該多晶 片堆疊封裝構造2〇〇可另句. 置於該些外接塾216。,二 個銲球250’其係設 ㈣216 4多晶片堆疊封袈構造2〇〇係可藉 j 12 1344202 由該些銲球2 5 0接合至一外部印刷電路板。 本發明之多晶片堆疊封裝構造可以有不同的封裝型態與 應用。如第5圖所示’另一種可電性隔離已封裝不良晶片 之多晶片堆疊封裝構造3 00係為記憶卡封裝型態,主要 包含一基板310、一第一晶片320、一第二晶片330、一第 一封膠體34 1以及一第二封膠體342。該基板3 1 〇係具有一 上表面311與一下表面312。其中配合參閱第6圖,該上表 面3 11係包含一晶片設置區3 1 1 a以設置該些晶片3 2 〇與 330、一第一封膠區3ι1Β及一第二封膠區3丨1(:。該第一封 膠區3 1 1 B係圍繞該晶片設置區3 1丨a,該第二封膠區3 n c 係圍繞該第一封膠區3 1 1 B並且該第二封膠區3 1 1 C之外邊緣 係對齊於該基板3 1 0之上表面3 11之四周側邊緣。該第二封 膠區3 11C係形成有複數個雷射修整區3 11 D。 如第5及6圖所示’該基板3丨〇並具有複數個導通孔 313、複數個位於該上表面311之第一内接墊314與第二内 接塾318、複數個連接該些導通孔313與該些内接墊314、 3 1 8之線路3 1 5以及複數個位於該下表面3 1 2之外接墊3 1 6。 如第ό圖所示’該些第一内接墊314與該些第二内接墊318 係經由該些線路3 1 5與該些導通孔3 1 3電性連接至該些外接 塾316。該些線路315會通過該些雷射修整區311D,故位於 該第二封膠區3 11 C之該些雷射修整區3 1 1 D係顯露該些線路 315之一區段315Α。如第ό圖所示,在本實施例中,至少一 導通孔3 13係以多條線路3丨5連接,而使該導通孔3丨3被具 相同功能之該第一内接墊314與第二内接墊318所共用。 13 4 1344202 該第一晶片320係設置於該基板3丨〇之該晶片設置區 3 11Α °在本實施例中’該第一晶片320之主動面係朝上而遠 離該基板310並具有複數個在主動面邊緣之第一銲墊32】。 利用複數個第一銲線351電性連接該些第一銲墊321與該些 第一内接墊314。 該第二晶片330係設置於該第一晶片320之上方並電性 連接邊些第二内接墊3丨8。在本實施例中,該第二晶片3 3 〇 之主動面係朝上而遠離該基板310並具有複數個在主動面邊 緣之第二銲墊331。利用複數個第二銲線352電性連接該些 第二銲墊33 1與該些第二内接墊3丨8。此外’在該第一晶片 320與該第二晶片33〇之間可設有一間隔層36〇,如膠帶' a間隔球之液態膠、覆線膠層、虛晶片(d u m m y c卜丨ρ)、金屬 片等等,以避免該第二晶片33〇之背面碰觸該些第一銲線 35卜 該第一封膠體341係形成於該基板31〇之該第一封膠區 3 11 B,以密封該第一晶片320與該第二晶片330,更可密封 該些第一銲線351與第二銲線352,但顯露該些雷射修整區 311D。在該第一封膠體341形成之後,進行電性測試、預燒 測試或其它可靠度測試,當測得第一晶片320為不良,可利 用雷射光選擇性照射部分之雷射修整區311D,以打斷連接 至第一内接墊3 14之線路3丨5之顯露區段3丨5A,使得該第 一晶片320與該些外接墊3 16為電性絕緣,故該第二晶片33〇 仍可正f運作。反之,t測得第U33G為不良,則利用 雷射光打斷連接至第二内㈣318之線路3丨5之顯露區段The line 215 is in the laser trimming area 21 1D, and the line exposure section 21 5A is laser-selectively cut off to make the second wafer 230 and the substrate 2 j 外 些 外 外 2 1 6 is electrical insulation, and there is no problem that the repair method of the conventional broken wire can cause the contact of the suspended residual wire and short circuit and test pollution. The external pads 216 can still be smoothly transferred to the first wafer 22, and the entire multi-wafer stack package structure 200 can still be used, and does not need to be scrapped, which can save at least one wafer test or/and wafer burn-in. To meet the trend of low-cost multi-chip package testing. The second brother of the second brother, 2UC, is sealed to seal the laser finishing area 2UD to protect the line 215A of the line. In addition, as shown in FIG. 2, the multi-slice stack package structure 2〇0 may further include a third sealant (4) which is filled in the window hole 218 to seal the first fresh lines 26 Wherein, the third sealant 243 and the first sealant 241 can be opened simultaneously; 忐b B u _ J丨J矸 is formed and after the multi-wafer test, the second sealant 242 is formed after the multi-wafer test . As shown in Fig. 2, in the specific structure of the present invention, the polycrystalline wafer stacked package structure can be placed in the external 塾 216. Two solder balls 250' are provided (four) 216 4 multi-chip stacked package structure 2 can be joined by j 12 1344202 from the solder balls 250 to an external printed circuit board. The multi-wafer stack package construction of the present invention can have different package types and applications. As shown in FIG. 5, another multi-wafer stack package structure 300 that electrically isolates a packaged defective chip is a memory card package type, and mainly includes a substrate 310, a first wafer 320, and a second wafer 330. a first sealant 34 1 and a second sealant 342. The substrate 3 1 has an upper surface 311 and a lower surface 312. Referring to FIG. 6 , the upper surface 3 11 includes a wafer setting area 3 1 1 a for disposing the wafers 3 2 〇 and 330, a first sealing area 3 ι 1 Β and a second sealing area 3 丨 1 (: The first sealant zone 3 1 1 B surrounds the wafer set area 3 1丨a, the second sealant zone 3 nc surrounds the first sealant zone 3 1 1 B and the second sealant The outer edge of the region 3 1 1 C is aligned with the peripheral side edge of the upper surface 3 11 of the substrate 310. The second sealing region 3 11C is formed with a plurality of laser trimming regions 3 11 D. And the substrate 3 has a plurality of vias 313, a plurality of first inner pads 314 and second inner pads 318 on the upper surface 311, and a plurality of the vias 313 are connected The lines 3 1 5 of the inner pads 314, 318 and the plurality of pads 3 16 outside the lower surface 3 1 2 . As shown in the figure, the first inner pads 314 and the The second inner pad 318 is electrically connected to the external vias 316 via the wires 315 and the vias 316. The wires 315 pass through the laser trimming regions 311D. Second seal area 3 11 The laser trimming zone 3 1 1 D of C exposes one of the sections 315 of the lines 315. As shown in the figure, in the embodiment, at least one of the vias 3 13 is connected by a plurality of lines 3 5 is connected, and the via hole 3丨3 is shared by the first inner pad 314 and the second inner pad 318 having the same function. 13 4 1344202 The first chip 320 is disposed on the substrate 3 In the present embodiment, the active surface of the first wafer 320 faces upward and away from the substrate 310 and has a plurality of first pads 32 at the edges of the active surface. The bonding wire 351 is electrically connected to the first bonding pads 321 and the first internal pads 314. The second wafer 330 is disposed above the first wafer 320 and electrically connected to the second inner pads 3 In the present embodiment, the active surface of the second wafer 33 is facing upwards away from the substrate 310 and has a plurality of second pads 331 at the edge of the active surface. A plurality of second bonding wires 352 are utilized. The second solder pads 33 1 and the second inner pads 3 丨 8 are electrically connected. Further, 'the first wafer 320 and the second wafer 33 are connected to each other. There may be a spacer layer 36〇, such as a tape 'a liquid ball glue, a glue layer, a dummy wafer, a metal sheet, etc., to avoid touching the back surface of the second wafer 33. The first bonding wire 35 is formed on the first sealing region 3 11 B of the substrate 31 to seal the first wafer 320 and the second wafer 330, and the sealing portion is sealed. The first bonding wire 351 and the second bonding wire 352, but the laser finishing regions 311D are exposed. After the first encapsulant 341 is formed, an electrical test, a burn-in test or other reliability test is performed. When the first wafer 320 is measured to be defective, a portion of the laser trimming region 311D may be selectively irradiated with laser light to The exposed portion 3丨5A of the line 3丨5 connected to the first inner pad 3 14 is interrupted, so that the first wafer 320 is electrically insulated from the external pads 3 16 , so the second wafer 33 remains Can work positively. On the other hand, if the U33G is bad, the laser is used to break the exposed section of the line 3丨5 connected to the second inner (four) 318.

A 14 1344202 3 1 5 A,使得該第二晶片330與該些外接墊3 1 6為電性絕緣, 故該第一晶片3 2 0仍可正常運作。藉此可以電性隔離已封裝 不良晶片’不需要報廢整個多晶片堆疊封装構造3 〇〇。 此外,該第二封膠體342係形成於該基板3 1 0之該第二 封膠區311C ’以密封該些雷射修整區311D,進而密封該些 線路3 1 5之顯露區段3丨5 a。在本實施例中,該第二封膠體 342係僅包覆該第一封膠體341之側邊,而顯露該第一封膠 體341之頂面。 因此’利用本發明之多晶片堆疊封裝構造3〇〇在修整過 知中不會有拉斷銲線的懸空殘線接觸短路與測試污染的問 題。 以上所述’僅是本發明的較佳實施例而已,並非對 本發明作任何形式上的限制,本發明技術方案範圍當依 所附申請專利範圍為準❶任何熟悉本專業的技術人員可 / 利用上述揭示的技術内容作出些許更動或修飾為等同 變化的尊效實施例’但凡是未脫離本發明技術方案的内 容’依據本發明的技術實質對以上實施例所作的任何簡 單修改、等同變化與修飾’均仍屬於本發明技術方案的 範圍内。 【圖式簡單說明] 第1圖:一種習知多晶片堆疊封裝構造之戴面示意圖。 第2圖:依據本發明之第一具體實施例,一種可電性隔 離已封裝不良晶片之多晶片堆疊封裝構造之截面 示意圖。A 14 1344202 3 1 5 A, the second wafer 330 is electrically insulated from the external pads 3 16 , so that the first wafer 320 can still operate normally. Thereby, it is possible to electrically isolate the packaged defective wafers' without having to scrap the entire multi-wafer stack package structure. In addition, the second encapsulant 342 is formed on the second encapsulation area 311C′ of the substrate 310 to seal the laser trimming regions 311D, thereby sealing the exposed sections 3丨5 of the lines 3 1 5 . a. In this embodiment, the second encapsulant 342 covers only the side of the first encapsulant 341 to expose the top surface of the first encapsulant 341. Therefore, the multi-wafer stacked package structure 3 of the present invention does not have the problem of contact short-circuiting and test contamination of the suspended wire of the broken wire in the trimming process. The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. The scope of the present invention is intended to be The above-disclosed technical content makes a slight modification or modification to the equivalent variation of the embodiment of the present invention, but does not depart from the technical solution of the present invention. Any simple modification, equivalent change and modification of the above embodiment according to the technical essence of the present invention. 'All still fall within the scope of the technical solution of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view showing a conventional multi-wafer stacked package structure. Figure 2 is a cross-sectional view showing a multi-wafer stacked package structure for electrically isolating a packaged defective wafer in accordance with a first embodiment of the present invention.

A 15 1344202 第3圖:依據本發明之第一具體實施例,該多晶片堆疊 封裝構造之基板之截面示意圖。 第4圖:依據本發明之第一具體實施例,該多晶片堆疊 封裝構造之基板之頂面示意圖。 第5圖:依據本發明之第二具體實施例,另一種可電性 隔離已封裝不良晶片之多晶片堆疊封裝構造之戴 面示意圖。 第6圖:依據本發明之第二具體實施例,該多晶片堆疊 封裝構造之基板之頂面示意圖。 【主要元件符號說明】 100 多晶片堆疊封裝構造 110 基板 111上表面 112 下表面 113 内接墊 114内接墊 115 外接墊 116 窗孔 120 第一晶片 1 21第一鲜塾 130 苐二晶片 1 3 1第二銲墊 140 第一封膠體 1 5 0鲜球 161 第一銲線 162第二銲線 200 多晶片堆疊封裝構造 210 基板 2 11上表面 21 1A晶片設置區 2 11 B第一封膠區 2 11 C第二封膠區 2 11 D雷射修整區 212 下表面 213導通孔 214 内接墊 215 線路 215A線路顯露區段 216 外接墊 217 防銲層 217A防銲層開孔 16 1344202A 15 1344202 Fig. 3 is a schematic cross-sectional view of a substrate of the multi-wafer stacked package structure in accordance with a first embodiment of the present invention. Figure 4 is a top plan view of a substrate of the multi-wafer stacked package structure in accordance with a first embodiment of the present invention. Fig. 5 is a perspective view showing another embodiment of a multi-wafer stacked package structure for electrically isolating a packaged defective wafer in accordance with a second embodiment of the present invention. Figure 6 is a top plan view of a substrate of the multi-wafer stacked package structure in accordance with a second embodiment of the present invention. [Main component symbol description] 100 multi-chip stacked package structure 110 substrate 111 upper surface 112 lower surface 113 inner pad 114 inner pad 115 external pad 116 window 120 first wafer 1 21 first fresh 塾 130 苐 two wafer 1 3 1 second bonding pad 140 first colloid 1 50 fresh ball 161 first bonding wire 162 second bonding wire 200 multi wafer stacking package structure 210 substrate 2 11 upper surface 21 1A wafer setting area 2 11 B first sealing area 2 11 C second encapsulation zone 2 11 D laser trimming zone 212 lower surface 213 via 214 inner pad 215 line 215A line exposed section 216 external pad 217 solder mask 217A solder mask opening 16 1344202

300多晶片堆疊封裝構造 310基板 311上表面 3 11 B第一封膠區 3 11 C第二封膠區 315A線路顯露區段 316外接墊 2 1 8窗孔 220第一晶片 230第二晶片 241第一封膠體 250銲球 270黏晶層 312下表面 315線路 3 1 7防銲層 320第一晶片 330第二晶片 341第一封膠體 3 5 1第一銲線 360間隔層 2 1 9内接墊 221第一銲墊 23 1第二銲墊 242第二封膠體 261第一銲線 3 13導通孔 318第二内接墊 321第一銲墊 331第二銲墊 342第二封膠體 352第二銲線 222主動面 232主動面 243第三封膠體 262第二銲線 311A晶片设置區 3 11 D雷射修整區 314第一内接墊300 multi-chip stacked package structure 310 substrate 311 upper surface 3 11 B first encapsulation area 3 11 C second encapsulation area 315A line exposure section 316 external pad 2 1 8 aperture 220 first wafer 230 second wafer 241 A colloidal 250 solder ball 270 adhesive layer 312 lower surface 315 line 3 1 7 solder mask 320 first wafer 330 second wafer 341 first encapsulant 3 5 1 first bonding wire 360 spacer layer 2 1 9 inner pad 221 first pad 23 1 second pad 242 second encapsulant 261 first bonding wire 3 13 via 318 second inner pad 321 first pad 331 second pad 342 second encapsulant 352 second welding Line 222 active surface 232 active surface 243 third sealing body 262 second bonding wire 311A wafer setting area 3 11 D laser trimming area 314 first inner pad

A 17A 17

Claims (1)

、申請專利範圍: 1、一種可電性隔離已封裝不良晶片之多晶片堆疊封裝構 造,包含: —基板,其係具有一上表面與一上表面,其中該上表面 係包含一晶片設置區、一第一封膠區及一第二封膠 區’該基板並具有複數個導通孔、複數個位於該上表 面之内接墊、複數個連接該些導通孔與該些内接墊之 線路以及複數個位於該下表面之外接墊,該些内接塾 係經由該些線路與該些導通孔電性連接至該些外接 塾’其中該第二封膠區係形成有一雷射修整區,用以 顯露該些線路之一區段: —第一晶片,其係設置於該基板之該晶片設置區; 一第二晶片,其係設置於該第一晶片上並電性連接該些 内接墊; ~~ 一第—封膠體,其係形成於該基板之該第一封膠區以 密封該第一晶片與該第二晶片;以及 -第二封膠體’其係形成於該基板之該第二封膠區,以 密封該雷射修整區。 2如申吻專利範圍第1項所述之可電性隔離已封裝不产 晶片之多晶片堆疊封裝構造,其中該雷射修整區係由; 基板之一防銲層開孔所界定。 ^ 3、如申請專利筋圍笛 ^ ^ χ J靶圍第1項所述之可電性隔離已封穿不产 多晶片堆叠封裝構造,其中該雷射修整區係為: 1344202 4、 如申請專利範圍第1項所述之可電性隔離已封裝不良 晶片之多晶片堆疊封裝構造,其中該些線路於該雷射修 整區内之顯露區段係以雷射選擇性切斷,以使該第二晶 片與該些外接墊為電性絕緣。 5、 如申請專利範圍第1項所述之可電性隔離已封裝不良 晶片之多晶片堆疊封裝構造,其中該基板係具有一窗 孔,以供打線通過。 6、 如申請專利範圍第1或5項所述之可電性隔離已封裝 不良晶片之多晶片堆疊封裝構造,另包含有複數個銲 球’其係设置於該些外接塾β 7、 如申請專利範圍第5項所述之可電性隔離已封襄不良 晶片之多晶片堆疊封裝構造’另包含有複數個第—銲線 與第二銲線,該些第一銲線係通過該窗孔電性連接該第 一晶片與該基板,該些第二銲線係電性連接該第二晶片 至該基板之該些内接塾。 8 '如申請專利範圍第7項所述之可電性隔離已封裝不良 晶片之多晶片堆疊封裝構造,另包含有一第三封膠體, 其係填入於該窗孔,以密封該些第一銲線。 9、 如申請專利範圍第8項所述之可電性隔離已封裝不良 晶片之多晶片堆疊封裝構造,其中該第—晶片與該第二 晶片係為背對背堆叠。 10、 如申請專利範圍第1項所述之可電性隔離已封裝不良 晶片之多晶片堆疊封裝構造,其中該些導通孔係排列在 該基板之周邊。 19 工344202 u、如申請專利範圍第1項所述之可電性隔離已封裝不良 晶片之多晶片堆疊封裝構造,其中該些内接墊係位於該 第一封膠區内並鄰近該晶片設置區。 1 2、如申请專利範圍第1項所述之可電性隔離已封裝不良 晶片之多晶片堆疊封裝構造,其中該第一封膠區係圍繞 該晶片設置區,並且該第二封膠區係圍繞該第一封膠 區。 13、 一種可電性隔離已封裝不良晶片之多晶片堆疊封裝構 ® 造之基板’其係具有一上表面與一下表面,其中該上表 面係包含一晶片設置區、一第一封膠區及一第二封膠 區’該基板並具有複數個導通孔、複數個位於該上表面 之内接塾、複數個連接該些導通孔與該些内接墊之線路 以及複數個位於該下表面之外接墊,該些内接墊係經由 該些線路與該些導通孔電性連接至該些外接塾,其中該 第二封膠區係形成有一雷射修整區,用以顯露該些線路 • 之一區段。 14、 如申請專利範圍第13項所述之可電性隔離已封裝不 良晶片之多晶片堆疊封裝構造之基板,其中該雷射修整 區係由該基板之一防銲層開孔所界定。 1 5、如申請專利範圍第1 3項所述之可電性隔離已封裝不 良晶片之多晶片堆疊封裝構造之基板,其中該雷射修整 區係為長條槽孔。 10、如申請專利範圍第u項所述之可電性隔離已封裝不 良晶片之多晶片堆疊封裝構造之基板,其中該基板係具 20 有—窗孔,以供打線通過。 申月專利範圍s 1 3項所述之可電性隔離已封裝不 良晶片_ 0曰片隹叠封裝構造之基板,其中該些導通孔 係排列在該基板之周邊。 18如申叫專利粑圍第13項所述之可電性隔離已封裝不 良曰曰片之多晶片堆疊封裝構造之基板其中該些内接墊 係位於該第一封膠區内並鄰近該晶片設置區。 19如申。月專利範圍第13項所述之可電性隔離已封裝不 良晶片之多晶片堆疊封裝構造之基板其中該第一封膠 區係圍繞該的片设置區,並且該第二封膠區係圍繞該第 一封膠區。Patent application scope: 1. A multi-wafer stack package structure capable of electrically isolating a packaged defective wafer, comprising: a substrate having an upper surface and an upper surface, wherein the upper surface includes a wafer setting area, a first encapsulation zone and a second encapsulation zone, the substrate has a plurality of via holes, a plurality of inner pads on the upper surface, a plurality of wires connecting the via holes and the inner pads, and a plurality of outer pads on the lower surface, the inner connecting wires are electrically connected to the outer connecting holes via the wires and the outer connecting holes, wherein the second sealing region is formed with a laser trimming area, The first wafer is disposed in the wafer setting area of the substrate; a second wafer is disposed on the first wafer and electrically connected to the inner pads a first sealant formed on the first sealant region of the substrate to seal the first wafer and the second wafer; and a second sealant formed on the substrate Second sealing area to seal the mine Shoot the entire area. [2] The multi-wafer stacked package structure of the electrically-insulable packaged non-produced wafer, as described in claim 1, wherein the laser trimming zone is defined by a solder mask opening of the substrate. ^ 3, such as applying for a patented ribs ^ ^ χ J target enclosure 1 described in the electrical isolation has been sealed non-product multi-chip stacked package structure, wherein the laser trimming system is: 1344202 4, such as application The multi-wafer stack package structure of the electrically insulating isolated packaged defective wafer according to the first aspect of the invention, wherein the exposed sections of the lines in the laser trimming area are laser-selectively cut so that the The second wafer is electrically insulated from the external pads. 5. The multi-wafer stacked package structure of the electrically quarantinable packaged defective wafer according to claim 1, wherein the substrate has a window for passing the wire. 6. The multi-wafer stack package structure for electrically isolating a packaged defective wafer according to claim 1 or 5, further comprising a plurality of solder balls disposed on the external 塾β7, as in the application The multi-wafer stacked package structure of the electrically-insulable sealed defective wafer described in the fifth aspect of the patent scope further includes a plurality of first bonding wires and a second bonding wire, and the first bonding wires pass through the window holes The first wafer is electrically connected to the substrate, and the second bonding wires are electrically connected to the second wafer to the inner vias of the substrate. 8 'A multi-wafer stack package structure for electrically isolating a packaged defective wafer as described in claim 7 of the patent application, further comprising a third sealant filled in the window to seal the first Welding wire. 9. The multi-wafer stacked package structure of the electrically quarantinable packaged defective wafer of claim 8, wherein the first wafer and the second wafer are stacked back to back. 10. The multi-wafer stack package structure of the electrically-insulable packaged defective wafer according to claim 1, wherein the via holes are arranged around the substrate. The 344202 u, the multi-wafer stack package structure of the electrically-insulable packaged defective wafer according to claim 1, wherein the inner pads are located in the first seal region and adjacent to the wafer Area. 1 . The multi-wafer stack package structure of electrically insulating the packaged defective wafer according to claim 1, wherein the first sealant region surrounds the wafer setup region, and the second seal region is Around the first seal area. 13. A multi-wafer stacked package structure for electrically isolating a packaged defective wafer. The substrate has an upper surface and a lower surface, wherein the upper surface includes a wafer setting region, a first sealing region, and a second encapsulating area 'the substrate has a plurality of via holes, a plurality of interconnects located on the upper surface, a plurality of lines connecting the via holes and the inner pads, and a plurality of the lower surfaces The external pads are electrically connected to the external contacts via the wires and the via holes, wherein the second sealing region is formed with a laser trimming region for revealing the wires One section. 14. The substrate of the multi-wafer stacked package structure of electrically insulating the packaged defective wafer as described in claim 13 wherein the laser trimming zone is defined by a solder mask opening of the substrate. A substrate for electrically isolating a multi-wafer stacked package structure of a packaged defective wafer, wherein the laser trimming region is a long slot, as described in claim 13 of the patent application. 10. A substrate for electrically isolating a multi-wafer stacked package structure of a packaged defective wafer as described in claim 5, wherein the substrate holder 20 has a window opening for passing the wire. The substrate of the solar cell of the patent scope s 1 3 can be electrically isolated from the substrate of the defective package, wherein the via holes are arranged around the substrate. The substrate of the multi-wafer stack package structure for electrically isolating the packaged defective cymbal according to claim 13, wherein the inner pads are located in the first seal region and adjacent to the wafer Set the area. 19 such as Shen. The substrate of the multi-wafer stack package structure of the electrically-insulated packaged defective wafer according to Item 13 of the patent scope of the present invention, wherein the first sealant region surrounds the sheet set region, and the second sealant region surrounds the substrate The first rubber area. A 21A 21
TW096130069A 2007-08-14 2007-08-14 Multi-chip stacked package enabling to electrically isolate an encapsulated fail chip and a substrate utilized for the package TWI344202B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW096130069A TWI344202B (en) 2007-08-14 2007-08-14 Multi-chip stacked package enabling to electrically isolate an encapsulated fail chip and a substrate utilized for the package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW096130069A TWI344202B (en) 2007-08-14 2007-08-14 Multi-chip stacked package enabling to electrically isolate an encapsulated fail chip and a substrate utilized for the package

Publications (2)

Publication Number Publication Date
TW200908281A TW200908281A (en) 2009-02-16
TWI344202B true TWI344202B (en) 2011-06-21

Family

ID=44723631

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096130069A TWI344202B (en) 2007-08-14 2007-08-14 Multi-chip stacked package enabling to electrically isolate an encapsulated fail chip and a substrate utilized for the package

Country Status (1)

Country Link
TW (1) TWI344202B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI608564B (en) * 2013-12-10 2017-12-11 艾馬克科技公司 Semiconductor device

Also Published As

Publication number Publication date
TW200908281A (en) 2009-02-16

Similar Documents

Publication Publication Date Title
TWI309469B (en) Microelectronic device packages, stacked microelectronic device packages, and methods for manufacturing microelectronic devices
CN101097905B (en) Semiconductor and manufacturing method thereof
JP3888267B2 (en) Semiconductor device and manufacturing method thereof
TWI548051B (en) Semiconductor device
TW200812052A (en) Semiconductor stack package for optimal packaging of components having interconnections
KR20140058268A (en) Semiconductor device and manufacturing method thereof
KR20100109241A (en) Chip stack package and fabrication method thereof
WO2007026392A1 (en) Semiconductor device and method for manufacturing same
US20220216184A1 (en) Semiconductor device and method for manufacturing the same
US9070672B2 (en) Semiconductor device packaging structure and packaging method
CN112526315B (en) Test method of packaged chip
CN106057763B (en) The packaging method and encapsulating structure of semiconductor chip
CN112133692A (en) Chip-stacked semiconductor package and method of manufacturing the same
US20070262467A1 (en) Semiconductor Device Having a Chip Stack on a Rewiring Plate
CN206116374U (en) Semiconductor chip encapsulation structure
CN108269745B (en) Packaging structure and manufacturing method thereof
TWI344202B (en) Multi-chip stacked package enabling to electrically isolate an encapsulated fail chip and a substrate utilized for the package
TW200913092A (en) Semiconductor packaging process enabling completely performing non-stick test of wire-bonding on a substrate strip
TW495893B (en) Substrate for semiconductor device and semiconductor device fabrication using the same
US8871532B2 (en) Method of manufacturing semiconductor device
JP2003229533A (en) Semiconductor device and method for manufacturing same
JP2008235434A (en) Semiconductor package
TWI437687B (en) Mehtod for testing multi-chip stacked packages
US8198738B1 (en) Structure of bond pad for semiconductor die and method therefor
TWI473189B (en) Method for wafer-level testing diced multi-dice stacked packages

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees