1333132 九、發明說明： 【發明所屬之技術領域】 栽 本發明係關於一種塗佈裝置，尤指一種利用設置铃承 平台之擋板結構調整氣流路徑之塗佈褒置。 【先前技術】 液晶顯示器由於具有輕薄短小與省電等優點，已 前顯示器與薄型電視市場上的主流產品。對於液晶顯=， 而言，彩色濾光片是重要的關鍵性零組件之一，藉由辛、11 濾光片的濾光效果，液晶顯示器方可顯示出色彩亮麗的色 面。 4 隨著液晶顯示㈣規格與尺寸不斷提升，對於彩色遽光 片的特性，例如耐熱性的要求也不斷提升，而以現行技術 而言’顏料分散法所製作出之彩色遽光片較能符合現階段 的需求’已成為目前製作彩色遽光片的各種方法中較普遍 的方法。顏贱的作㈣將㈣ 需之彩色雜層，例如紅色 以材質h㈠成所 佈於玻璃基板上，再經由^卩且層’㈣將紅色光阻層塗 璃基板上製作出紅色遽_巧影與硬烤等製程而於玻 層塗佈於玻璃基板上，並重覆、#依序將綠色與藍色光阻 與藍光濾光圖案，而組合成上述製程形成綠色濾光圖案 、之晶顯示器之彩色濾光片。 1333132 :而現行製作$色逯光片的方法卻因為習知塗佈 :的限制而導致光阻層容易產生缺陷的問題。-般而言，插 -除命劑的製程包含先進行一細抽動作，以較緩慢的速度初 v 4除光阻層内之’容劑，待光阻層所含之溶劑到達適卷 程度後再進行-粗抽動作，快速抽除溶劑以減少反應時田 間然而，習知塗佈裝置之結構設計會使得在抽除溶劑時 氣流流動的路徑貼近光阻層的表面，因此在進行粗抽動作 時光阻層的表面谷易由於氣流流動造成膜厚不一的問題。 液晶顯示器由於膜厚不—所造成的顯示缺陷，業界一般稱 此見象為 VCD (vacuum chamber drying ) mura，而針對此問 題習知方法係利用延長細抽動作的時間加以解決，然而如 此一來將嚴重影響生產效率。 【發明内容】 本發明之目的之一在於提供一種具有調整氣流路徑功 籲能的塗佈裝置，以避免產生膜厚不均的問題，並提升生產 效率。 為達上述目的，本發明提供一種具有調整氣流路徑功能 的塗佈裝置。上述塗佈裝置包含有一反應室，一真空系統 與該反應室連通用以抽除該反應室内之氣體，一承載平台 設置於該反應室内，以及一擋板結構。該承載平台包含有 - 一承載面，用以承載一基板。該基板包含有一光阻層位於 ⑴3132 該基板之表面，且該光阻層包含有一溶劑。該擋板結構係 設置於該承載平台之該承載面上並環繞該基板，藉此該真 空系統抽除該反應室内之氣體時，可均勻地抽除該光阻層 内之該溶劑。 以下為有關本發明之詳細說明與附圖。然而所附圖式僅 供參考與輔助說明用，並非用來對本發明加以限制者。 【實施方式】 請參考第1圖，第1圖為本發明一較佳實施例之具有調 整氣流路徑功能的塗佈裝置之示意圖，其中下述實施例係 以一用於製作彩色渡光片之細縫式（slit)塗佈裝置為例說明 本發明之特點，然本發明之應用並不侷限於此，而可應用 於其它如旋轉式塗佈裝置或真空乾燥裝置，亦或是用於製 作非彩色濾光片之光阻層與其它塗佈材料層等。如第1圖 • 所示，本實施例之塗佈裝置50包含有一反應室52、一真 空系統(例如真空泵）54，以及一承載平台56。真空系統54 係連通於反應室52，並可於需要真空狀況下將反應室52 内之氣體藉由设於承载平台56下方之排氣孔58抽除。反 應室52包含有一可啟閉之上蓋6〇，而承載平台56包含有 一承载面56a，用以承載一基板(例如透明基板)62。於進行 塗佈製程之剷’上蓋60會開啟並容許基板62載入反應室 - 52 ’基板62經對位後會被固定於承載平台％之承載面56a 8 1333132 上且此時上蓋60會關閉而位於基板62之上方。於進行 塗佈製程時’塗佈材料會經由塗佈裝置5G之噴嘴（圖未示) 喷出而於基板62的表面形成一光阻層64。於本實施例t， 光阻層64係為―具濾、光作用的彩色光阻層，例如紅色光阻 層、綠色光㈣或藍色光阻層，但不限於此。由於光阻層 64包含有大量溶劑，因此必須先抽除光阻層64内之溶劑 後方可繼續進行後續曝光顯影等製程。 本實施例之塗佈震置50包含有-擋板結構66，設置於 承，平台56之承載面56a上並環繞基板62。撞板結構％ 之间度大於基板62的厚度’ _^擋板結構66面對基板&之 側壁係為—垂直侧壁，垂直於承載平台56之承載面56a。 擋板結構66的作用在於改變於抽除溶劑時所產生之氣流 流動路徑與流速等參數，藉由擋板結構於的設置，真空系 統54在抽除反應室52内之氣體時，氣流流動路徑會被提 升而不致經過光阻層64的表面（如第！圖之箭號所示），故 可避免造成膜厚不均的現象，同時藉此亦可均勻地抽除光 阻層64内之溶劑（如第丨圖之虛線箭號所示）。 請參考第2圖，第2圖為本發明另—餘實施例之具有 調整氣流路徑功能的塗佈裝置之示意圖，其中為利於比較 二實施例之相異處，於第1圖與第2圖中相同之元件使用相 同之符號標注。如第2圖所示’本實施例之塗佈裝置5〇包 9 ⑧ 含有一反應室52、一真空系統54連通於反應室52、一承 載平台56，以及一上蓋60。 不同於前一實施例處在於本實施例之擋板結構66面對 基板62之侧壁係為一傾斜側壁，而非垂直側壁。如前所 述’擋板結構66的功用在於改變於抽除溶劑時所產生之氣 流流動路徑與流速等參數’故本實施例之擋板結構66利用 傾斜側壁的設計改變氣流流動路徑（如第2圖之箭號所 示）’同樣可達到均勻地抽除光阻層64内之溶劑（如第2圖 之虛線箭號所示）’並避免氣流流過光阻層64的表面造成 膜厚不均的現象。 综上所述’本發明利用擋板結構的設計調整氣流路徑， 且由於流場的截面積變小而使氣體流速改變，亦具有提升 氣流路徑的作用。值得說明的是本發明之塗佈裝置並不限 於上述兩實施例’擋板結構的各設計參數，例如高度、形 狀、材質與位置等可依塗佈裝置之機台設計或其它參數之 考量而加以調整。藉由擋板結構的設置’於抽除溶劑時可 減少細抽動作的時間，而利用速度較快的粗抽動作抽除溶 劑’不僅可增加生產效率，同時氣流路徑的提升亦可避免 產生臈厚不均的問題，而可有效提升品質。 以上所述僅為本發明之較佳實施例’凡依本發明申請 1333132 專利範圍所做之均等變化與修飾，皆應屬本發明之涵蓋範圍。 【圖式簡單說明】 第1圖為本發明一較佳實施例之’具有調整氣流路徑功能的 塗佈裝置之示意圖。 第2圖為本發明另一較佳實施例之具有調整氣流路徑功能 的塗佈裝置之示意圖。 【主要元件符號說明】 50 塗佈裝置 52 反應室 54 真空系統 56 承載平台 56a 承載面 58 排氣孔 60 上蓋 62 基板 64 光阻層 66 檔板結構1333132 IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a coating apparatus, and more particularly to a coating apparatus for adjusting an air flow path by using a baffle structure provided with a bellows platform. [Prior Art] Due to its advantages of lightness, thinness, and power saving, liquid crystal displays have been the mainstream products in the front display and thin TV markets. For liquid crystal display, color filters are one of the most important key components. With the filtering effect of the sin and 11 filters, the liquid crystal display can display bright colors. 4 As the specifications and dimensions of liquid crystal displays (4) continue to increase, the requirements for the characteristics of color enamel sheets, such as heat resistance, are also increasing. In the current technology, the color glazing sheets produced by the pigment dispersion method are more compatible. The current stage of demand has become the more common method among the various methods of making color calenders. (4) The color hybrid layer required by (4), for example, the red material is placed on the glass substrate with the material h (1), and the red photoresist layer is coated on the glass substrate by the layer ' (4). And the hard baking process is applied to the glass substrate on the glass substrate, and the green and blue photoresist and the blue light filter pattern are sequentially repeated, and the green color filter pattern and the crystal display are combined into the above process to form a green filter pattern. Filter. 1333132: The current method of making a color enamel film is a problem in which the photoresist layer is prone to defects due to the limitations of conventional coatings. In general, the process of insert-deodorant involves first performing a fine pumping action to remove the 'capacitant' in the photoresist layer at a slower rate, and the solvent contained in the photoresist layer reaches the appropriate volume. After the rough-drawing action, the solvent is quickly removed to reduce the reaction time. However, the conventional coating device is designed such that the flow path of the gas flow is close to the surface of the photoresist layer when the solvent is removed, so that the rough pumping is performed. When the surface of the photoresist layer is in motion, the film thickness is liable due to the flow of the airflow. Due to the display defects caused by the film thickness of the liquid crystal display, the industry generally refers to this as VCD (vacuum chamber drying) mura, and the conventional method for solving this problem is solved by using the time of extending the fine pumping action, but this way Will seriously affect production efficiency. SUMMARY OF THE INVENTION One object of the present invention is to provide a coating apparatus having an ability to adjust an air flow path to avoid the problem of uneven film thickness and to improve production efficiency. To achieve the above object, the present invention provides a coating apparatus having a function of adjusting an air flow path. The coating apparatus comprises a reaction chamber, a vacuum system is connected to the reaction chamber for extracting gas in the reaction chamber, a load bearing platform is disposed in the reaction chamber, and a baffle structure. The carrying platform includes a bearing surface for carrying a substrate. The substrate comprises a photoresist layer on the surface of the substrate (1) 3132, and the photoresist layer comprises a solvent. The baffle structure is disposed on the bearing surface of the carrying platform and surrounds the substrate, whereby the solvent in the reaction chamber is uniformly extracted when the vacuum system removes the gas in the reaction chamber. The following is a detailed description of the invention and the accompanying drawings. The drawings are to be considered in all respects as illustrative and not restrictive. [Embodiment] Please refer to FIG. 1 , which is a schematic view of a coating apparatus having a function of adjusting an air flow path according to a preferred embodiment of the present invention, wherein the following embodiment is used for fabricating a color light-emitting sheet. The slit coating device is taken as an example to illustrate the features of the present invention. However, the application of the present invention is not limited thereto, and can be applied to other applications such as a rotary coating device or a vacuum drying device, or used for making. The photoresist layer of the non-color filter and other coating material layers and the like. As shown in Fig. 1 , the coating apparatus 50 of the present embodiment includes a reaction chamber 52, a vacuum system (e.g., a vacuum pump) 54, and a carrier platform 56. The vacuum system 54 is in communication with the reaction chamber 52 and allows the gas in the reaction chamber 52 to be evacuated by a venting opening 58 provided below the carrier platform 56 under vacuum conditions. The reaction chamber 52 includes an openable upper cover 6〇, and the load bearing platform 56 includes a bearing surface 56a for carrying a substrate (e.g., a transparent substrate) 62. The upper cover 60 will open and allow the substrate 62 to be loaded into the reaction chamber during the coating process. The substrate 62 will be fixed to the load bearing surface 56a 8 1333132 after being aligned and the upper cover 60 will be closed. Located above the substrate 62. When the coating process is performed, the coating material is ejected through a nozzle (not shown) of the coating device 5G to form a photoresist layer 64 on the surface of the substrate 62. In the present embodiment t, the photoresist layer 64 is a color photoresist layer having a filter or a light action, such as a red photoresist layer, a green light (four) or a blue photoresist layer, but is not limited thereto. Since the photoresist layer 64 contains a large amount of solvent, it is necessary to remove the solvent in the photoresist layer 64 before proceeding with the subsequent exposure and development processes. The coating shaker 50 of the present embodiment includes a baffle structure 66 disposed on the bearing surface 56a of the platform 56 and surrounding the substrate 62. The extent of the striker structure is greater than the thickness of the substrate 62. The sidewalls of the baffle structure 66 facing the substrate & are vertical sidewalls that are perpendicular to the load bearing surface 56a of the carrier platform 56. The function of the baffle structure 66 is to change the parameters such as the flow path and the flow rate of the gas flow generated when the solvent is removed, and the flow path of the vacuum system 54 when the gas in the reaction chamber 52 is extracted by the baffle structure. It will be lifted without passing through the surface of the photoresist layer 64 (as indicated by the arrow of the figure!), so that the phenomenon of uneven film thickness can be avoided, and at the same time, the photoresist layer 64 can be uniformly removed. Solvent (as indicated by the dotted arrow in the figure). Please refer to FIG. 2 , which is a schematic diagram of a coating apparatus having the function of adjusting an air flow path according to another embodiment of the present invention, wherein FIG. 1 and FIG. 2 are advantageous for comparing the differences of the second embodiment. The same components are labeled with the same symbols. As shown in Fig. 2, the coating apparatus 5 of the present embodiment comprises a reaction chamber 52, a vacuum system 54 communicating with the reaction chamber 52, a loading platform 56, and an upper cover 60. Unlike the previous embodiment, the side wall of the baffle structure 66 of the present embodiment facing the substrate 62 is an inclined side wall instead of a vertical side wall. As previously described, the function of the baffle structure 66 is to change the parameters such as the flow path and flow rate of the gas flow generated when the solvent is removed. Therefore, the baffle structure 66 of the present embodiment uses the design of the inclined side wall to change the flow path of the air flow (eg, 2) The same figure can be used to uniformly remove the solvent in the photoresist layer 64 (as indicated by the dotted arrow in Fig. 2) and avoid the airflow flowing through the surface of the photoresist layer 64 to cause film thickness. Uneven phenomenon. In summary, the present invention utilizes the design of the baffle structure to adjust the airflow path, and the gas flow rate is changed due to the smaller cross-sectional area of the flow field, which also has the effect of enhancing the airflow path. It should be noted that the coating device of the present invention is not limited to the design parameters of the baffle structure of the above two embodiments, such as height, shape, material and position, etc., depending on the machine design of the coating device or other parameters. Adjust it. By setting the baffle structure, the time for the fine pumping action can be reduced when the solvent is removed, and the solvent can be removed by using the faster pumping action, which not only increases the production efficiency, but also improves the airflow path. The problem of uneven thickness can effectively improve the quality. The above description is only the preferred embodiment of the present invention. The equivalent variations and modifications made by the scope of the present application 1333132 are intended to be within the scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view of a coating apparatus having a function of adjusting an air flow path according to a preferred embodiment of the present invention. Fig. 2 is a schematic view showing a coating apparatus having a function of adjusting an air flow path according to another preferred embodiment of the present invention. [Main component symbol description] 50 Coating device 52 Reaction chamber 54 Vacuum system 56 Carrier platform 56a Bearing surface 58 Vent hole 60 Upper cover 62 Substrate 64 Photoresist layer 66 Baffle structure