TWI332038B - Matte anionic electrodeposition coating film-forming method - Google Patents

Matte anionic electrodeposition coating film-forming method Download PDF

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TWI332038B
TWI332038B TW92130168A TW92130168A TWI332038B TW I332038 B TWI332038 B TW I332038B TW 92130168 A TW92130168 A TW 92130168A TW 92130168 A TW92130168 A TW 92130168A TW I332038 B TWI332038 B TW I332038B
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Taiwan
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coating film
electrodeposition coating
acid
unsaturated monomer
anion
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TW92130168A
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Chinese (zh)
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Kouji Hirano
Kenji Aoki
Akinari Niimi
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Kansai Paint Co Ltd
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1332038 玖、發明說明: 【發明所屬之技術領域】 本發明係有關一種形成加工處理性、塑 、塗膜性能優異的去光電沉積塗膜之去光陰 膜形成方法。 【先前技術】 以往由於鋁在較鋼鐵等其他金屬高溫之 較爲容易藉由熱間擠壓製得具有各種截面形 該鋁中混合各種金屬,製得鋁合金。 該鋁合金利用輕量且容易加工性或耐蝕 鋁優異性質,特別是大多使用於建材關係之材 該鋁合金之熱間擠壓方法,通常係爲使 加熱熔融,然後使該熔融物加入擠壓機中, 定截面形狀孔的塑模中,以洋菜式通過孔製 狀之模材方法。 而且,鋁合金本身由於在表面上具有不 對海水等而言不易腐蝕,惟由於對泥漿等之 容易腐蝕,故通常使鋁合金陽極氧化處理後 離子電沉積塗料等去光、塗裝淸澈塗膜。 習知發明係有使鹼性陰離子電沉積塗料 ,未硬化下在使在高級烷芳基磺酸中添加有 pH値1〜7的水溶液中通電,然後進行水洗、 光電沉積塗裝方法(參照專利文獻1)。 然而,藉由該電沉積塗裝方法時,pH値 膜痕跡隱蔽性 離子電沉積塗 加工性佳,可 狀之模材。在 性優異的原有 •料。 圓柱形鋁鑄塊 壓附於具有所 得具有所定形 動態化膜,故 鹼性物質而言 ,藉由去光陰 塗裝、水洗後 鹼性化合物之 烘烤硬化的去 1〜7之高級 -6- 1332038 烷芳基磺酸類水溶液會有去光塗膜所得的觸媒效果僅在塗 膜表面進行,由於不均勻硬化、致使塗膜性能降低,低溫 硬化性不充分,就創意性而言去光程度之指標L値爲不易 製得滿足値等問題產生。 於上述發明中pH値大於7時,加工處理性、塗膜性能 、低溫硬化性提高者之去光效果不充分。 陰離子電沉積塗裝管例如有調整樹脂之溶解性參數、 且藉由水分散所成乳液製得去光陰離子型電沉積塗料(參照 專利文獻2 )等之發明。 然而,上述去光陰離子電沉積塗料,由於塗料配合固 定,故有關創意性一定,去光程度變化不易。因此,企求 加工處理性、模具記號隱蔽性、塗膜性能、低溫硬化性優 異、可容易變化創意性之去光陰離子型電沉積塗膜形成方 法。 【專利文獻1】 日本特公昭59-229494號公報 【專利文獻2】特開2001-131494號公報 【發明內容】 本發明係以提供一種加工處理性、模具記號隱蔽性、塗 膜性能、低溫硬化性優異、可容易變化創意性之去光陰離 子型電沉積塗膜形成方法爲目的。 本發明人等爲解決上述問題時再三深入硏究的結果,發 現藉由樹脂溶解性參數差爲0.5〜1.5之陰離子電沉積塗料 的電沉積塗裝所得塗膜在未硬化下浸漬於在高級烷芳基磺 酸中添加有1當量以上比例之鹼性化合物使pH値調整爲7.1 -7- 1332038 〜14的水溶液中,通電後水洗、烘烤乾燥所成塗膜形成方 法,遂而完成本發明。 換言之,本發明係關於 1. 一種去光陰離子電沉積塗膜形成方法,其特徵爲由下 述步驟順序形成, 步驟1:由(A)乙烯系共聚物樹脂與(B)交聯劑混合分散 所成乳液之陰離子電沉積塗料(I)電沉積塗裝於鋁合金材料表面 上,形成未硬化的電沉積塗膜步驟,其中該(A)乙烯系共聚物樹 脂與(B)交聯劑之溶解性參數差爲0.5〜1.5, 步驟2:使以該未硬化電沉積塗膜塗裝的鋁合金材料浸 漬於在高級烷芳基磺酸中添加有1當量以上比例之鹼性化 合物、水溶化所成的pH7 . 1〜1 4水溶液(I I )中,在一定條 件下通電步驟, 步驟3 :水洗步驟,及 步驟4:烘烤硬化、形成去光電沉積塗膜的步驟所成。 2. 如第1項之去光陰離子電沉積塗膜形成方法,其中通 電條件係爲第1段之施加1 0〜1 50V電壓後,第2段之施加 150〜30 0V電壓的2段式通電方法。 3. 如第1或2項之去光陰離子電沉積塗膜形成方法,其 中(A)乙烯系共聚物樹脂爲使(a)含羥基乏不飽和單體、(b) 含羧基之不飽和單體、(c)其他自由基聚合性不飽和單體自 由基共聚合所得者。 4. 如第1〜3項中任一項之去光陰離子電沉積塗膜形成 方法,其中(B )交聯劑爲胺基樹脂硬化劑及/或嵌段聚異氰 1332038 酸酯化合物。 5. 如第1〜4項中任一項之去光陰離子電沉積塗膜形成 方法’其中高級烷芳基磺酸爲二壬基萘磺酸、及/或二壬基 蔡二磺酸。 6. 如第1〜5項中任一項之去光陰離子電沉積塗膜形成 方法,其中去光電沉積塗膜具有10〜25之L値。 7. —種塗裝物,其特徵爲藉由如第1〜6項中任一項 之方法製得。 【發明效果】 藉由於鋁合金材料表面上電沉積塗裝陰離子型電沉積 塗料(I),使所得未硬化電沉積塗膜被覆的鋁合金材料浸漬 於高級烷芳基磺酸中添加有1當量以上比例之鹼性化合物 、水溶化所成p Η 7 . 1〜1 4之水溶液(I I )中、通電、水洗、 烘烤乾燥,製得具有加工處理性、模具記號隱蔽性、塗膜 性能、低溫硬化性優異的去光電沉積塗膜之塗裝物。 可得本發明效果之理由雖無法確定,惟基體樹脂之乙 烯系共聚物樹脂與交聯劑之蜜胺樹脂或嵌段化聚異氰酸酯 化合物樹脂的溶解性參數差爲0.5〜1.5,可推測爲因受到 pH値爲7.1〜14之水溶液(II)影響,製得去光塗膜者。 【實施方式】 於下述中詳細說明有關本發明。 關於陰離子電沉積塗料 陰離子電沉積塗料用樹脂例如有乙烯系共聚物樹脂、聚 酯系樹脂、氟系樹脂、橡膠系樹脂及此等改性樹脂等,惟 _ 9 - 1332038 就耐候性而言以乙烯系共聚物樹脂較佳。本發明之乙烯系 共聚物樹脂(A)係爲使(a)含羥基之不飽和單體、(b)含羧基 之不飽和單體、(c)其他不飽和單體自由基共聚合所得的水 分散性乙烯系共聚物樹脂。 (a)含羥基之不飽和單體例如羥基乙基(甲基)丙烯酸酯 、經基丙基(甲基)丙烯酸酯、羥基丁基(甲基)丙烯酸酯、( 聚)乙二醇單(甲基)丙烯酸酯、(聚)丙二醇單(甲基)丙烯酸 醋、羥基丁基乙烯醚、(甲基)丙烯基醇、及上述含羥基之 不飽和單體類與β_丙內酯、二甲基丙內酯、丁內酯、γ—戊 內酯、γ -己內酯、γ -庚內酯' γ -月桂內酯、ε-己內酯、δ_ 己內酯等之內酯類化合物的反應物等,商品名例如布拉谷 西魯(譯音)FM1(賴西魯(譯音)化學公司製、商品名、己內 醋改性(甲基)丙稀酸經醋類)、布拉谷西魯FM2(同左)、布 拉谷西魯FM3 (同左)、布拉谷西魯FA1 (同左)、布拉谷西魯 FA2(同左)、布拉谷西魯FA3(同左)等。 含羧基之不飽和單體(b)例如(甲基)丙烯酸、馬來酸、 布拉谷西魯(譯音)FM1A(於下述中,賴西魯化學公司製、己 內酯改性含羧基之(甲基)丙烯酸單體、商品名)、布拉谷西 魯FM4A(同上)、布拉谷西魯FM10A(同上)等。 其他自由基聚合性不飽和單體(C)例如(甲基)丙烯酸甲 酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯 酸丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸辛酯、(甲基) 丙烯酸月桂酯、(甲基)丙烯酸環己酯等之(甲基)丙烯酸之C, 〜C18烷基或環烷基酯類、苯乙烯等芳香族乙烯基單體類、 -10- 1332038 (甲基)丙烯酸醯胺、正丁氧基甲基(甲基)丙烯醯胺 '正羥 甲基(甲基)丙烯醯胺等之(甲基)丙烯醯胺及其衍生物類、( 甲基)丙烯腈化合物等。 其他例如聚乙二醇單丙烯酸酯'聚乙二醇單甲基丙烯 酸酯、聚丙二醇單丙烯酸酯、聚丙二醇單甲基丙烯酸酯、 聚乙二醇單甲醚單丙烯酸酯、聚乙二醇單甲醚單甲基丙烯 酸酯等之聚醚改性丙烯酸系不飽和單體。 此等單體之配合比例對(a)含羥基之不飽和單體、(b) 含羧基之不飽和單體、(c)其他自由基聚合性不飽和單體之 固體成分總合計量而言,(a)含羥基之不飽和單體爲3〜50 重量%、較佳者爲5〜40重量%,(b)含羧基之不飽和單體爲 2〜40重量%、較佳者爲4〜30重量%,(〇其他自由基聚合 性不飽和單體爲10〜90重量%、較佳者爲20〜70重量%。 (A)乙烯系共聚物樹脂之製法可使用習知製法,例如可 以溶液聚合法、懸浮聚合法、乳液聚合法等進行,以如下 述溶液聚合法爲宜。 另外’自由基共聚合時使用的有機溶劑例如正丙醇、 異丙醇、正丁醇、第三丁醇、異丁醇等之醇類、溶纖劑、 甲基溶纖劑、丁基溶纖劑、甲基卡必醇、2-甲氧基乙醇、2-乙氧基乙醇、2 -異丙氧基乙醇、2 -丁氧基乙醇、二乙二醇 、二乙二醇單乙醚、二乙二醇單丁醚、三乙二醇單甲醚、b 甲氧基-2-丙醇、1-乙氧基-2-丙醇、二丙二醇單甲醚等之 醚類等。 此外’除此外視其所需例如可併用二甲苯、甲苯等芳 -11- 1332038 香族類、丙酮、甲基乙酮、2-庚酮、2 -己酮、甲基異丁酮 、異佛爾酮 '環己酮等之酮類 '醋酸甲酯、醋酸乙酯、醋 酸丙酯、醋酸丁酯、醋酸異丁酯、醋酸戊酯、3 -甲氧基丁 基乙酸酯、2-乙基己基乙酸酯、醋酸苯甲酯、醋酸環己酯 、丙酸甲酯、丙酸乙酯等之酯類。 另外’自由基共聚合時使用的自由基聚合起始劑例如 過氧化苯甲醯基、二第三丁基氫過氧化物、第三丁基氫過 氧化物、枯基過氧化物、氫過氧異丙苯、二異丙基苯氫過 氧化物、第三丁基過氧化苯甲酸酯、月桂基過氧化物、乙 醢基過氧化物、第三丁基過氧-2-乙基己酸酯等過氧化物、 α,α’-偶氮基雙異丁腈、偶氮基雙二甲基戊腈、偶氮基雙環 己烷羰腈等之偶氮基化合物。 溶液聚合反應可藉由上述在有機溶劑中使(a)含羥基之 不飽和單體、(b)含羧基之不飽和單體、(c)其他自由基聚 合性不飽和單體等之單體類、自由基聚合起始劑之混合物 ,例如在約50〜200°C、較佳者約爲60〜180°C之溫度下反 應約1〜24小時、較佳者約爲2〜1 0小時製得。 此處所得乙烯聚合物樹脂之羥基價爲30〜200mgKOH/g 、較佳者爲 50〜180mgKOH/g 之範圍,酸價爲 15〜 150mgKOH/g、較佳者爲20〜130nigKOH/g之範圍,數量平均 分子量爲1 0,000〜1 00,000、較佳者爲20,000〜60,000之 範圍。 若數量平均分子量小於10, 000時塗膜性能不充分,而 若數量平均分子量大於1 00,000時水性樹脂高黏度化、水 1332038 分散時不易形成均勻的乳液。 作爲交聯劑(B)使用的胺基樹脂可使用習知的胺基樹脂 。胺基樹脂例如蜜胺、尿素、苯并鳥糞胺、乙醢基鳥糞胺 、巢鳥糞胺、螺旋鳥糞胺、二氰基二醯胺等之藉由胺基成 分與醛反應所得的羥甲基化胺基樹脂。醛有甲醛、對甲醛 、乙醛、苯并醛等。 而且,可使用使羥甲基化胺基樹脂藉由適當的醇酯化 者,醚化時所使用的醇例如甲醇、乙醇、正丙醇、異丙醇 、正丁醇、異丁醇、2 -乙基丁醇、2-乙基己醇等。 作爲(B)交聯劑使用的嵌段聚異氰酸酯化合物可使用習 知聚異氰酸酯化合物之異氰酸酯基以嵌段化劑嵌段者。 聚異氰酸酯化合物例如六伸甲基二異氰酸酯或三甲基 六伸甲基二異氰酸酯之脂肪族二異氰酸酯類;加氫二甲苯 基二異氰酸酯或異佛爾酮二異氰酸酯之環狀脂肪族二異氰 酸酯類; 亞甲苯基二異氰酸酯或4,4’-二苯基甲烷二異氰酸酯之 芳香族二異氰酸酯類之有機二異氰酸酯本身、或此等各有 機二異氰酸酯與多元醇、低分子量聚酯樹脂或水等之加成 物、或如上述各有機二異氰酸酯間之環化聚合物、以及異 氰酸酯•縮二脲物等,此等之典型市售品例如「巴羅克(譯 音)D- 750、-800 ' D 正 950、- 970、或 1 5 - 4 5 5」「以上爲大 日本油墨化學工業製品j 、「迪史魔吉魯(譯音)L、N、HL 、IL或N3390」「西德拜耳(譯音)公司製」'「塔肯奈頓( 譯音)D-102、-202、-110或123N」「武田藥品工業製品」 1332038 、「特羅奈頓(譯音)L、HL、EH或203」「日本聚胺甲酸酯 工業製品」或「迪拉奈頓(譯音)24A-90CX」「旭化成工業 製品」等。於此等之中以脂肪族二異氰酸酯類或環狀脂肪 族二異氰酸酯類較佳。 嵌段劑例如苯酚系、內醯胺系、活性伸甲基系、醇系 、硫醇系、酸醯胺系、醯亞胺系、胺系、咪唑系、尿素系 、胺基甲酸酯系、亞胺系、或亞硫酸鹽系等之嵌段劑。 於本發明中(A)乙烯系共聚物樹脂、(B)交聯劑之配合 比例係(A)乙烯系共聚物樹脂爲30〜90重量%、(B)交聯劑 爲70〜10重量%,較佳者(A)乙烯系共聚物樹脂爲35〜80 重量%、( B )交聯劑爲6 5〜2 0重量%。若(B )交聯劑小於1 〇 重量%時耐候性、耐擦傷性、塗膜加工性等之塗膜性能不佳 ’而若大於70重量%時耐候性、塗膜加工性等之塗膜性能 不佳。 而且,可知藉由(A)乙烯系共聚物樹脂與(B)交聯劑之 溶解性參數差爲0.5〜1.5、以及電沉積塗裝後、浸漬於在 高級烷芳基磺酸中添加有鹼性化合物所成的水溶液(I I )中 、通電、水洗後 '烘烤乾燥,可得加工處理性、模具記號 隱蔽性、塗膜性能、低溫硬化性優異的去光塗膜。此外, 溶解性參數(solubility parameter、以下稱爲SP値)係表 示液體分子之分子間相互作用尺度。 樹脂之SP値可藉由濁度滴定予以測定,具體而言,以 下述 K.W.SUH.J.M. CORBETT 之式(l)(Journal ofApplied[Technical Field] The present invention relates to a method for forming a de-photovoltaic film which is excellent in processability, plasticity, and film-coating performance. [Prior Art] In the past, aluminum was more easily formed by hot-pressing than other metals such as steel, and various aluminum alloys were obtained by mixing various metals in the aluminum. The aluminum alloy utilizes the excellent properties of light weight and easy processability or corrosion-resistant aluminum, in particular, the hot-squeeze method of the aluminum alloy, which is mostly used in building materials, usually by heating and melting, and then adding the melt to the extrusion. In the machine, in the mold of the fixed-section shape hole, the method of molding the shape of the hole through the hole in the form of a dish. Further, since the aluminum alloy itself is not easily corroded on the surface, such as seawater or the like, it is usually corroded by an anodizing treatment of the aluminum alloy, and the coating film of the ion-electroplating coating is usually removed after the anodizing treatment of the aluminum alloy. . The conventional invention has a method of applying a basic anion electrodeposition coating material to an aqueous solution in which a pH of 1 to 7 is added to a higher alkylarylsulfonic acid without unceasing, and then performing water washing and photoelectrodeposition coating method (refer to the patent). Document 1). However, by the electrodeposition coating method, the pH 膜 film traces are excellent in ion-electrodeposition coating workability and can be used as a mold material. In the original material with excellent sex. The cylindrical aluminum ingot is pressed against the obtained kinetic film having a shape, so that in the case of an alkaline substance, the high-grade -6- of the alkaline compound is bake-hardened by de-photo-coating and washing with water. 1332038 Alkyl sulfonic acid aqueous solution will have a catalyst effect obtained by removing the film only on the surface of the coating film, due to uneven hardening, resulting in a decrease in coating film performance, insufficient low-temperature hardenability, and creative degree of light removal. The indicator L値 is difficult to produce and satisfy problems such as 値. In the above invention, when the pH 値 is more than 7, the effect of improving the processability, the coating film property, and the low-temperature curability is insufficient. The anion electrodeposition coating tube has, for example, an invention in which a solubility parameter of a resin is adjusted, and a de-photo anionic electrodeposition coating material (see Patent Document 2) obtained by dispersing an emulsion by water dispersion is used. However, in the above-mentioned photo-anion electrodeposition coating, since the coating is fixed and fixed, the related creativeness is certain, and the degree of light removal is not easily changed. Therefore, a method for forming a photo-anionic electrodeposition coating film which is excellent in processability, mold mark concealing property, film coating property, low-temperature hardenability, and creativity can be easily changed. [Patent Document 1] JP-A-59-229494 (Patent Document 2) JP-A-2001-131494 SUMMARY OF THE INVENTION The present invention provides a processability, mold mark concealment, film properties, and low temperature hardening. It is an object of the method for forming an anion-based electrodeposition coating film which is excellent in properties and can be easily changed in creativity. The inventors of the present invention have found that the coating film obtained by electrodeposition coating of an anion electrodeposition paint having a resin solubility parameter difference of 0.5 to 1.5 is immersed in a higher alkane under uncured conditions in order to solve the above problems. The method of forming a coating film by adding an alkali compound having a ratio of 1 equivalent or more to the aryl sulfonic acid to adjust the pH 为 to an aqueous solution of 7.1 -7 to 1332038 to 14 and then washing, baking and drying the mixture, and completing the present invention . In other words, the present invention relates to a method for forming a de-photo anion electrodeposition coating film, which is characterized by the following steps: Step 1: mixing and dispersing (A) an ethylene-based copolymer resin and (B) a crosslinking agent The anion electrodeposition coating (I) of the resulting emulsion is electrodeposited on the surface of the aluminum alloy material to form an uncured electrodeposition coating film step, wherein the (A) ethylene copolymer resin and (B) crosslinking agent The difference in solubility parameter is 0.5 to 1.5. Step 2: The aluminum alloy material coated with the uncured electrodeposition coating film is immersed in a basic compound having a ratio of 1 equivalent or more to the higher alkylarylsulfonic acid, and water is dissolved. The resulting pH 7.1 1 to 14 aqueous solution (II) is subjected to a step of energizing under certain conditions, a step 3: a water washing step, and a step 4: bake hardening to form a photoelectrodeposition coating film. 2. The method for forming a photo-anion electrodeposition coating film according to item 1, wherein the energization condition is a two-stage energization of applying a voltage of 150 to 30 0 V in the second stage after applying a voltage of 1 0 to 150 V in the first stage. method. 3. The method for forming a photo-anion electrodeposition coating film according to Item 1 or 2, wherein (A) the ethylene-based copolymer resin is (a) a hydroxyl group-containing unsaturated monomer, and (b) a carboxyl group-containing unsaturated monomer. And (c) a radical polymerization of other radically polymerizable unsaturated monomers. 4. The method for forming a photo-anion electrodeposition coating film according to any one of items 1 to 3, wherein the (B) crosslinking agent is an amine resin hardener and/or a block polyisocyanate 1332038 acid ester compound. 5. The method for forming a de-photo anion electrodeposition coating film according to any one of items 1 to 4 wherein the higher alkylarylsulfonic acid is dinonylnaphthalenesulfonic acid and/or dimercapto-dioxasulfonic acid. 6. The method of forming a photo-anion electrodeposition coating film according to any one of items 1 to 5, wherein the dephotoelectrodeposition coating film has an L? of 10 to 25. 7. A coated article, which is obtained by the method according to any one of items 1 to 6. [Effect of the Invention] By coating the anionic electrodeposition coating (I) by electrodeposition on the surface of the aluminum alloy material, the obtained uncured electrodeposition coating film-coated aluminum alloy material is immersed in the higher alkyl aryl sulfonic acid to add 1 equivalent. The above-mentioned basic compound and water are dissolved in an aqueous solution (II) of p Η 7.1 to 1 4, energized, washed with water, and baked and dried to obtain processability, mold mark concealability, coating film performance, A coating of a dephotoelectrodeposition coating film excellent in low-temperature hardenability. Although the reason why the effect of the present invention can be obtained cannot be determined, the solubility parameter difference between the vinyl copolymer resin of the matrix resin and the melamine resin or the blocked polyisocyanate compound resin of the crosslinking agent is 0.5 to 1.5, which is presumed to be due to It is affected by the aqueous solution (II) having a pH of 7.1 to 14 to obtain a photo-coated film. [Embodiment] The present invention will be described in detail below. The anion electrodeposition coating resin, for example, an ethylene-based copolymer resin, a polyester resin, a fluorine-based resin, a rubber-based resin, and the like, is a resin such as _ 9 - 1332038 in terms of weather resistance. A vinyl copolymer resin is preferred. The ethylene-based copolymer resin (A) of the present invention is obtained by copolymerizing (a) a hydroxyl group-containing unsaturated monomer, (b) a carboxyl group-containing unsaturated monomer, and (c) another unsaturated monomer. A water-dispersible ethylene-based copolymer resin. (a) a hydroxyl group-containing unsaturated monomer such as hydroxyethyl (meth) acrylate, propyl propyl (meth) acrylate, hydroxybutyl (meth) acrylate, (poly) ethylene glycol mono ( Methyl)acrylate, (poly)propylene glycol mono(meth)acrylic acid vinegar, hydroxybutyl vinyl ether, (meth)propenyl alcohol, and the above hydroxyl group-containing unsaturated monomer and β_propiolactone, two Lactones such as methyl propiolactone, butyrolactone, γ-valerolactone, γ-caprolactone, γ-heptanolactone γ-laurolactone, ε-caprolactone, δ_caprolactone Reactions, etc., such as the name of the valley of the valley, the Swiss version of the FM1 (researched by Lai Xilu (transliteration) chemical company, the trade name, vinegar modified (methyl) acrylic acid vinegar), Bra Guxi Lu FM2 (same left), Bragu Valley Xilu FM3 (same left), Bragu Valley Xilu FA1 (same left), Bragu Valley Xilu FA2 (same left), Bragu Valley Xilu FA3 (same left), etc. The carboxyl group-containing unsaturated monomer (b) is, for example, (meth)acrylic acid, maleic acid, or glabrizil (trans) FM1A (in the following, Lai Silu Chemical Co., Ltd., caprolactone modified carboxyl group) (Meth)acrylic monomer, trade name), Bragu Siro FM4A (ibid.), Bragu Siro FM10A (ibid.), etc. Other radically polymerizable unsaturated monomers (C) such as methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, (meth)acrylic acid C, hexyl or cycloalkyl esters of hexyl ester, octyl (meth) acrylate, lauryl (meth) acrylate, cyclohexyl (meth) acrylate, etc., styrene And other aromatic vinyl monomers, -10- 1332038 (meth)acrylic acid decylamine, n-butoxymethyl (meth) acrylamide decyl-n-hydroxymethyl (meth) acrylamide, etc. Base) acrylamide and its derivatives, (meth)acrylonitrile compounds, and the like. Others such as polyethylene glycol monoacrylate 'polyethylene glycol monomethacrylate, polypropylene glycol monoacrylate, polypropylene glycol monomethacrylate, polyethylene glycol monomethyl ether monoacrylate, polyethylene glycol single A polyether-modified acrylic unsaturated monomer such as methyl ether monomethacrylate. The mixing ratio of these monomers is in terms of the sum total of the solid components of (a) the hydroxyl group-containing unsaturated monomer, (b) the carboxyl group-containing unsaturated monomer, and (c) the other radical polymerizable unsaturated monomer. (a) the hydroxyl group-containing unsaturated monomer is 3 to 50% by weight, preferably 5 to 40% by weight, and (b) the carboxyl group-containing unsaturated monomer is 2 to 40% by weight, preferably 4 ~30% by weight, (the other radically polymerizable unsaturated monomer is 10 to 90% by weight, preferably 20 to 70% by weight. (A) The method for producing the ethylene-based copolymer resin can be a known method, for example, It can be carried out by a solution polymerization method, a suspension polymerization method, an emulsion polymerization method, or the like, and is preferably a solution polymerization method as described below. Further, an organic solvent used in the radical copolymerization such as n-propanol, isopropanol, n-butanol, or the third Alcohols such as butanol and isobutanol, cellosolve, methyl cellosolve, butyl cellosolve, methyl carbitol, 2-methoxyethanol, 2-ethoxyethanol, 2-isopropyloxy Ethanol, 2-butoxyethanol, diethylene glycol, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, b Ethers such as oxy-2-propanol, 1-ethoxy-2-propanol, dipropylene glycol monomethyl ether, etc. Further, 'other than the aryl-11- such as xylene or toluene, which may be used as needed, 1332038 Ketones such as aroma, acetone, methyl ethyl ketone, 2-heptanone, 2-hexanone, methyl isobutyl ketone, isophorone' cyclohexanone, etc. 'methyl acetate, ethyl acetate, acetic acid Propyl ester, butyl acetate, isobutyl acetate, amyl acetate, 3-methoxybutyl acetate, 2-ethylhexyl acetate, benzyl acetate, cyclohexyl acetate, methyl propionate An ester of ethyl propionate, etc. Further, a radical polymerization initiator used in radical copolymerization such as benzammonium peroxide, di-tert-butyl hydroperoxide, and tert-butyl hydroperoxide , cumyl peroxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide, tert-butyl peroxybenzoate, lauryl peroxide, acetyl peroxide, Peroxide such as tributylperoxy-2-ethylhexanoate, α,α'-azobisisobutyronitrile, azobisdimethylvaleronitrile, azobiscyclohexanecarbonitrile, etc. Azoylation The solution polymerization reaction can be carried out by using (a) a hydroxyl group-containing unsaturated monomer, (b) a carboxyl group-containing unsaturated monomer, (c) another radical polymerizable unsaturated monomer, etc. in the organic solvent. The monomer, the mixture of the radical polymerization initiators, for example, is reacted at a temperature of about 50 to 200 ° C, preferably about 60 to 180 ° C for about 1 to 24 hours, preferably about 2 to 1 The ethylene polymer resin obtained herein has a hydroxyl group content of 30 to 200 mgKOH/g, preferably 50 to 180 mgKOH/g, and an acid value of 15 to 150 mgKOH/g, preferably 20 to 130 nmigKOH. The range of /g, the number average molecular weight is from 10,000 to 1,00,000, preferably from 20,000 to 60,000. If the number average molecular weight is less than 10,000, the coating performance is insufficient, and if the number average molecular weight is more than 100,000, the aqueous resin is highly viscous, and when the water 1332038 is dispersed, it is difficult to form a uniform emulsion. As the amine-based resin used as the crosslinking agent (B), a conventional amine-based resin can be used. Amino-based resin such as melamine, urea, benzoguanamine, acetaminophen, guanamine, helixamine, dicyanoguanamine, etc. by reacting an amine component with an aldehyde Hydroxymethylated amine based resin. The aldehyde has formaldehyde, paraformaldehyde, acetaldehyde, benzaldehyde and the like. Further, an alcohol which is used for esterification of a methylolated amine-based resin by a suitable alcohol, such as methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, 2 may be used. -ethylbutanol, 2-ethylhexanol, and the like. As the block polyisocyanate compound used as the (B) crosslinking agent, those of the conventional polyisocyanate compound may be blocked with a blocker. a polyisocyanate compound such as an aliphatic diisocyanate of hexamethylene diisocyanate or trimethyl hexamethylene diisocyanate; a cyclic aliphatic diisocyanate of hydrogenated xylylene diisocyanate or isophorone diisocyanate; The organic diisocyanate of the aromatic diisocyanate of tolylene diisocyanate or 4,4'-diphenylmethane diisocyanate itself, or the addition of these organic diisocyanates and polyols, low molecular weight polyester resins or water, etc. a product, or a cyclized polymer such as each of the above organic diisocyanates, and an isocyanate/biuret product, etc., such typical commercial products such as "Baroque D-750, -800 'D positive 950, - 970, or 1 5 - 4 5 5" "The above is the Japanese ink chemical industry product j, "Di Shi Mo Ji Lu (transliteration) L, N, HL, IL or N3390" "West Bayer (transliteration) Company-made"" "Takken Knightn (transliteration) D-102, -202, -110 or 123N" "Takeda Pharmaceutical Industry Products" 1332038, "Troneton (transliteration) L, HL, EH or 203" "Japan Polyurethane industry Product "or" Di Lanai Dayton (transliteration) 24A-90CX "" Asahi Kasei products "and so on. Among them, aliphatic diisocyanates or cyclic aliphatic diisocyanates are preferred. The block agent is, for example, a phenol type, an internal amide type, an active methyl group, an alcohol type, a thiol type, an acid amide type, a quinone type, an amine type, an imidazole type, a urea type, or an urethane type. A blocker such as an imide or a sulfite. In the present invention, the blending ratio of the (A) ethylene-based copolymer resin and the (B) crosslinking agent is (A) the ethylene-based copolymer resin is 30 to 90% by weight, and the (B) crosslinking agent is 70 to 10% by weight. Preferably, the (A) ethylene-based copolymer resin is 35 to 80% by weight, and the (B) crosslinking agent is 65 to 20% by weight. When the crosslinking agent (B) is less than 1% by weight, the film properties such as weather resistance, scratch resistance, and coating film processability are not good, and when it is more than 70% by weight, coating film such as weather resistance and coating film processability Poor performance. Further, it is understood that the difference in solubility parameter between (A) the ethylene-based copolymer resin and the (B) crosslinking agent is 0.5 to 1.5, and after the electrodeposition coating, the alkalinity is added to the higher alkylarylsulfonic acid. In the aqueous solution (II) prepared by the compound, after being electrified and washed with water, it is baked and dried to obtain a matte coating film excellent in processability, mold mark concealing property, coating film property, and low-temperature curability. Further, a solubility parameter (hereinafter referred to as SP値) indicates a molecular interaction scale of liquid molecules. The SP値 of the resin can be determined by turbidity titration, specifically, the following K.W. SUH.J.M. CORBETT (1) (Journal of Applied

Polymer Science, 12,2359,1968)爲基準求得。 1332038 【數1】 ν' ~ ⑴ (其中,VH係表示正己烷之容積分率、VD係表示去離 子水之容積分率、δΗ係表示正己烷之SP値、5D係表示去離 子水之SP値) 濁點滴定係爲使〇.5g(固體成分)乾燥的乙烯樹脂溶解 於10ml丙酮中,徐徐地加入正己烷,讀取沸點之滴定量H(ml) ,同樣地讀取在丙酮中加入去離子水之濁點的滴定量D(ml) ,使此等使用於下式求取VH、VD、δΗ、δΒ。Polymer Science, 12, 2359, 1968) was obtained on the basis of the benchmark. 1332038 [1] ν' ~ (1) (wherein, VH indicates the volume fraction of n-hexane, VD indicates the volume fraction of deionized water, δΗ indicates SP値 of n-hexane, and 5D indicates SP of deionized water.値) The cloud point titration is to dissolve 乙烯.5g (solid content) of the dried vinyl resin in 10ml of acetone, slowly add n-hexane, read the boiling point of the amount of H (ml), and read the same in acetone. The titer D (ml) of the cloud point of the deionized water is used to obtain VH, VD, δ Η, δ 使用 for the following formula.

Vh = H/ (1 Ο+Η) Vd = D/ (1 O+D)、δΗ=9· 7 5X10/ (10+H) +7. 2 4XH/ (10+Η) , δΌ = 9. 75X10/ (10 + D) + 2 3. 4 3 XD/ (lO^D) 此外,各溶劑之SP値爲丙酮:9.75、正己烷:7.24 、去離子水:23.43。 另外,SP値之調整可藉由單體之組成或比例容易進行 〇 (A)乙烯系共聚物樹脂中和時使用的鹼性化合物有乙 胺、丙胺、丁胺、苯甲胺、單乙醇胺、辛戊醇胺、2 -胺基 丙醇、3-胺基丙醇等一級單胺;二乙胺二乙醇胺、二-正或 二-異丙醇胺、正甲基乙醇胺、正乙基乙醇胺等二級單胺; 二甲基乙醇胺、三甲胺、三乙胺、三異丙胺、甲基二乙醇 胺 '二甲基胺基乙醇等之三級單胺;二伸乙基三胺、羥基 -15- 1332038 乙基胺基乙胺、乙基胺基乙胺、甲基胺基丙胺等之聚胺基 三乙胺等。 陰離子電沉積塗料(I)中上述鹼性化合物之配合比例以 當量爲0.1〜1.0較佳、對(A)乙烯系共聚物樹脂、(B)交聯 劑之固體成分總合計量而言鹼性化合物爲0.01〜10重量% 、較佳者爲0.05〜5重量%。若鹼性化合物小於〇.〇1重量% 時水性乳液之水分散性不佳,而若大於10重量%時由於親 水性增加會導致塗膜性能變差。 上述陰離子電沉積塗料(I )中可加入紫外線吸收劑、光 安定劑。 紫外線吸收劑例如有苯基水楊酸酯、p -辛基苯基水楊 酸酯、4第三丁基苯基水楊酸酯等之水楊酸衍生物;2,4 -二 羥基二苯甲酮' 2 -羥基-4-甲氧基二苯甲酮、2 ,2’-二羥基-4 -甲氧基二苯甲酮、2-羥基-4-甲氧基- 2,-羧基二苯甲酮、 2-羥基-4-甲氧基-5-磺基二苯甲酮、2,2’-二羥基-4,4’-二 甲氧基二苯甲酮、2-羥基-4-辛氧基二苯甲酮、2-羥基- 4-十八烷氧基二苯甲酮、鈉-2,2’-二羥基_4, 4’-二甲氧基- 5-磺基二苯甲酮、2,2’,4,4’-四羥基二苯甲酮、4-十二烷氧 基-2-羥基二苯甲酮、5 -氯-2-羥基二苯甲酮、間苯二酚單 苯甲酸酯、2,4-二苯甲醯基間苯二酚、4,6 -二苯甲醯基間 苯二酚、羥基十二烷基二苯甲酮、2,2’-二羥基- 4(3 -甲基 丙燃薩氧基-2-經基丙氧基)二苯甲_等之二苯甲酮系;2-(2,-羥基- 5’-甲基苯基)苯并三唑等之苯并三唑系及其他( 草酸苯胺、氰基丙烯酸酯等)化合物等, -16- 1332038 混合系使用的光安定劑例如受阻胺衍生物、具體例如 雙(2,2’,6, 6’-四甲基-4-哌啶基)癸酸酯' 4-苯甲醯氧基-2,2’,6, 6’-四甲基哌啶等,此等可以適當選擇單獨一種或2 種以上使用。 陰離子電沉積塗料(I)之乳液可在(A)乙烯系共聚物樹 脂、(B )交聯劑中加入鹼性化合物、去離子水,以分散器等 攪拌作成。 陰離子電丨几積塗料(I)視其所需加入顔料、染料、硬化 觸媒、流動調整劑進行調整pH値,加入去離子水,可製得 固體成分5重量%〜20重量%之陰離子電沉積塗料。陰離子 電沉積塗料(I)之被塗物以著色或無著色陽極氧化鋁合金較 佳。 使用該陰離子電沉積塗料形成塗膜時,以上述所得陰 離子電沉積塗料爲浴,在浴溫10〜30 °C、較佳者爲15〜25 °(:之浴中進行處理的鋁合金材料浸潰後,進行乾燥膜後約5 〜30μηι之陰離子電沉積塗裝。 關於水溶液(I Π 使藉由陰離子電沉積塗裝所得的塗膜水洗後,使以未硬 化電沉積塗膜被覆的鋁合金材料浸漬於在高級烷芳基磺酸 中添加有1當量以上比例之鹼性化合物水溶化所成ρΗ値7 . i 〜1 4的水溶液(I I )中,以電壓50〜350V通電10〜240秒後 水洗’在140〜200°C下烘烤乾燥10〜120分鐘,製得去光 塗膜。 該局級院芳基購酸例如下述通式(2)〜(6)所示化合物。 1332038 此等化合物可以單獨或2種以上組合使用。 【化1】 一般式(2)Vh = H/ (1 Ο+Η) Vd = D/ (1 O+D), δΗ=9· 7 5X10/ (10+H) +7. 2 4XH/ (10+Η) , δΌ = 9. 75X10 / (10 + D) + 2 3. 4 3 XD/ (lO^D) Further, the SP値 of each solvent was acetone: 9.75, n-hexane: 7.24, and deionized water: 23.43. In addition, the adjustment of SP値 can be easily carried out by the composition or ratio of the monomers. The basic compound used in the neutralization of the (A) ethylene-based copolymer resin is ethylamine, propylamine, butylamine, benzylamine, monoethanolamine, a primary monoamine such as octanolamine, 2-aminopropanol or 3-aminopropanol; diethylamine diethanolamine, di- or di-isopropanolamine, n-methylethanolamine, n-ethylethanolamine, etc. a secondary monoamine; a tertiary monoamine such as dimethylethanolamine, trimethylamine, triethylamine, triisopropylamine, methyldiethanolamine 'dimethylaminoethanol; diethyltriamine, hydroxy-15- 1332038 Polyaminotriethylamine such as ethylaminoethylamine, ethylaminoethylamine or methylaminopropylamine. The compounding ratio of the above basic compound in the anion electrodeposition coating material (I) is preferably from 0.1 to 1.0 in terms of equivalents, and is basic in terms of total solid content of (A) ethylene-based copolymer resin and (B) crosslinking agent. The compound is 0.01 to 10% by weight, preferably 0.05 to 5% by weight. If the basic compound is less than 〇.〇1% by weight, the water-dispersibility of the aqueous emulsion is not good, and if it is more than 10% by weight, the coating film performance is deteriorated due to an increase in hydrophilicity. An ultraviolet absorber and a photosensitizer may be added to the above anionic electrodeposition paint (I). The ultraviolet absorber is, for example, a salicylic acid derivative such as phenyl salicylate, p-octylphenyl salicylate or 4th butylphenylsalicylate; 2,4-dihydroxydiphenyl Methyl ketone '2-hydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4-methoxybenzophenone, 2-hydroxy-4-methoxy-2,-carboxyl Benzophenone, 2-hydroxy-4-methoxy-5-sulfobenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone, 2-hydroxy-4 - Octyloxybenzophenone, 2-hydroxy-4-octadecanyloxybenzophenone, sodium-2,2'-dihydroxy-4,4'-dimethoxy-5-sulfoyl Benzene, 2,2',4,4'-tetrahydroxybenzophenone, 4-dodecyloxy-2-hydroxybenzophenone, 5-chloro-2-hydroxybenzophenone, Hydroquinone monobenzoate, 2,4-dibenylhydrazino-resorcinol, 4,6-diphenylmercaptoresorcinol, hydroxydodecylbenzophenone, 2,2 '-Dihydroxy-4(3-methylpropenyloxy-2-transpropoxy)diphenyl- benzophenone; 2-(2,-hydroxy-5'-methyl Benzotriazoles such as phenyl)benzotriazole and others (aniline oxalate, cyanoacrylate Or a compound, etc., -16-1332038 A light stabilizer used in the mixing system, such as a hindered amine derivative, specifically, for example, bis(2,2',6,6'-tetramethyl-4-piperidyl) phthalate 4-benzylideneoxy-2,2',6,6'-tetramethylpiperidine or the like, and these may be appropriately selected alone or in combination of two or more. The emulsion of the anionic electrodeposition coating material (I) may be prepared by adding a basic compound or deionized water to the (A) ethylene-based copolymer resin or the (B) crosslinking agent, and stirring with a disperser or the like. The anion electric enthalpy product (I) can be adjusted according to the required addition of pigments, dyes, hardening catalysts and flow regulators, and deionized water can be added to obtain an anion of 5 to 20% by weight of solid components. Deposition paint. The anion electrodeposited coating (I) is preferably coated with a colored or non-colored anodized aluminum alloy. When the coating film is formed by using the anion electrodeposition paint, the obtained anion electrodeposition paint is used as a bath, and the aluminum alloy material is treated in a bath at a bath temperature of 10 to 30 ° C, preferably 15 to 25 ° (:: bath) After the collapse, the anion electrodeposition coating of about 5 to 30 μm is carried out after drying the film. About the aqueous solution (I Π After washing with the coating film obtained by anionic electrodeposition coating, the aluminum alloy coated with the uncured electrodeposition coating film is applied. The material is immersed in an aqueous solution (II) in which a basic compound having a ratio of 1 equivalent or more or more is added to a higher alkylarylsulfonic acid, and is energized at a voltage of 50 to 350 V for 10 to 240 seconds. After the water washing, it is baked and dried at 140 to 200 ° C for 10 to 120 minutes to obtain a matte coating film. The quaternary acid is obtained by the following formula (2) to (6). 1332038 These compounds may be used alone or in combination of two or more. [Chemical Formula 1] General Formula (2)

(R係表不C3〜C18之院基) 【化2】 一般式(3).(R series is not the base of C3~C18) [Chemical 2] General formula (3).

(Ri、R2係表不C3〜C18之院基) 【化3】(Ri, R2 are not the base of C3~C18) [Chemical 3]

一般式(4)General formula (4)

(R係表不C3〜C12之垸基) 【化4】 -18- 1332038(R series is not the base of C3~C12) [Chemical 4] -18- 1332038

(R1' L係表示C3〜C12之烷基) 【化5】 一般式(6)(R1' L system represents an alkyl group of C3 to C12) [Chemical 5] General formula (6)

(R!、R2係表示c3〜c12之烷基) 高級烷芳基磺酸類之具體例如正丁基苯磺酸、正胺基苯 磺酸、正辛基苯磺酸正十二烷基苯磺酸、正十八烷基苯磺 酸、正二丁基苯磺酸、異丙基萘磺酸、十二烷基萘磺酸、 二壬基萘磺酸、二壬基萘二磺酸等。高級烷芳基磺酸類之 濃度爲0.1〜20重量%、較佳者爲0.3〜10重量%、更佳者 爲0.5〜8重量%。 其中以二壬基萘磺酸、二壬基萘二磺酸較佳。此等高級 烷芳基磺酸中所添加的鹼性化合物例如乙胺 '丙胺'丁胺 、苯甲胺、單乙醇胺、新戊醇胺、2 -胺基丙醇、3 -胺基丙 醇等一級單胺;二乙胺二乙醇胺、二-正或二-異丙醇胺、 正甲基乙醇胺、正乙基乙醇胺等之二級單胺;二甲基乙醇 胺、三甲胺、三乙胺、三異丙胺、甲基二乙醇胺、二甲基 胺基乙醇等三級單胺;二伸乙基三胺、羥基乙基胺基乙胺 -19- 1332038 、乙基胺基乙胺、甲基胺基丙胺等之聚胺三乙胺等。 使用本發明之去光陰離子電沉積塗膜形成方法時’以 塗膜評估項目可容易得到L値爲10〜25範圍之創意性’且 可藉由下述塗裝條件之變動以使去光程度變動。 另外,水溶液(II)之通電條件可在10〜35 °C之水溫、 電壓10〜350V、較佳者100〜250V之範圍下,藉由通電1 〜3 00秒,在未硬化塗膜中析出高級烷芳基磺酸。 此外,通電方法使用施加第一段之10〜15 0V電壓後, 施加第2段之150〜300V電壓的2段式通電方法時,在最 初的低電壓下使高級烷芳基磺酸類浸透至未硬化塗膜之較 深部,再於高電壓下在具有膜電阻之塗膜上容易地析出高 級烷芳基磺酸,可提高移行至塗膜以賦予塗膜性能之提高 效果。 藉由第1圖說明本發明方法時,在電沉積槽1中進行 上述步驟1之電沉積塗裝,在水洗槽(1)中水洗後,在水溶 液(I I )浸漬槽3中進行步驟2之浸漬•通電,然後,在水 洗槽(2)4中進行上述步驟3之水洗。圖中,箭頭9係表示 藉由上述步驟1移行至步驟2者。 【實施方式】 【實施例】 於下述中藉由實施例更具體地說明本發明。惟本發明不 受此等所限制。而且,「份」及「%」係表示「重量份」及 「重量% j 。 製造例1 -20- 1332038 在反應容器中加入280g異丙醇,保持於80 °C中,在3 小時內滴入40g苯乙烯、96g甲基丙烯酸甲酯、40g正丁基 丙烯酸酯、120g乙基丙烯酸酯、48g的2-羥基乙基丙烯酸 酯、28g丙烯酸、及8g偶氮基雙二甲基戊膪之混合物,然 後添加4g偶氮基雙二甲基戊腈,在80*>C下保持1小時以進 行反應,製得乙烯系共聚物樹脂No. 1« 該乙烯系共聚物樹脂No.1係重量平均分子量約爲 25,000、酸價爲 55mgKOH/g、羥基價爲 58mgKOH/g。 製造例2乳液No . 1之製造例 對1 70份(固體成分)製造例1作成的乙烯系共聚物樹脂 No .1之羧基而言配合0.4當量三乙胺後予以混合分散,然 後使30份尼卡拉克(譯音)MX430 (注1 )混合分散後,進行攪 拌且徐徐地滴入去離子水,另添加三乙胺使pH爲7 . 5,製 得固體成分1 0%之乳液No . 1。 乙烯系共聚物樹脂No .1與尼卡拉克MX4 30之溶解性參 數差爲0 . 7。 製造例3乳液No . 2之製造例 對170份(固體成分)製造例1作成的乙烯系共聚物樹脂 No.1之羧基而言配合0.4當量三乙胺後予以混合分散,然 後使20份尼卡拉克(譯音)MX430(注1)、12.5份吉拉奈頓 24八-90€%(注2)(固體成分10份)混合分散後,進行攪拌且 徐徐地滴入去離子水,另添加三乙胺使pH爲7.5,製得固 體成分10%之乳液No . 2。 乙烯系共聚物樹脂No.1與尼卡拉克MX430 /吉拉奈頓 1332038 24A-90CX之溶解性參數差爲〇.6。 製造例4乳液N 〇 · 3之製造例 對170份(固體成分)製造例1作成的乙烯系共聚物樹脂 No.1之羧基而言配合0.4當量三乙胺後予以混合分散,然 後使10份尼卡拉克(譯音)MX430 (注1 )、25份吉拉奈頓 24A-90CX(注2)(固體成分20份)混合分散後,進行攪拌且 徐徐地滴入去離子水,另添加三乙胺使pH爲7.5,製得固 體成分10%之乳液No . 3。 乙烯系共聚物樹脂No.l與尼卡拉克MX430/吉拉奈頓 24A-90CX之溶解性參數差爲〇 . 3。 (注1)尼卡拉克MX430:三和化學股份有限公司製、 商品名、丁氧基化蜜胺樹脂、固體成分1 00% (注2)吉拉奈頓24A-90CX:旭化成工業股份有限公司 製、商品名、嵌段聚異氰酸酯、固體成分80% 製造例5 添加3 000份上述ι〇%之乳液No.l、及使pH値爲8.5之 三乙胺,製得陰離子電沉積塗料No.l。 製造例6 添加3000份上述1 〇%之乳液ν〇·2、及使pH値爲8.5之 三乙胺,製得陰離子電沉積塗料No.2。 製造例7 添加3000份上述1 0%之乳液No . 3、及使pH値爲8 . 5之 三乙胺’製得陰離子電沉積塗料Ν〇·3。 製造例8 -22- 1332038 在90份異丙醇中使i〇份Taycacure AC-901(迪卡(譯 音)公司製、商品名、二壬基萘磺酸),在1〇〇份該溶液中 添加0·28份三乙胺(相當〇.5當量)。 另加入去離子水,製得1 000份固體成分1%之水溶液。 該水溶液Νο·1之pH値爲9.0。 製造例9 在80份異丙醇中使20份Taycacure AC-330(迪卡(譯 音)公司製、商品名、二壬基苯磺酸),在1〇〇份該溶液中 添加0.34份三乙胺(相當〇.5當量)。 ® 另加入去離子水,製得1 000份固體成分1%之水溶液。 該水溶液Νο·2之pH値爲8.5。 製造例1 0 在80份異丙醇中使20份Taycacure AC-430(迪卡(譯 音)公司製、商品名、十二烷苯磺酸),在1〇〇份該溶液中 添加0 . 3 7份三乙胺(相當〇 . 5當量)。 另加入去離子水,製得1000份固體成分1%之水溶液。 該水溶液N。.3之pH値爲10.0。 φ(R!, R2 represents an alkyl group of c3 to c12) Specific examples of higher alkylarylsulfonic acids such as n-butylbenzenesulfonic acid, n-aminobenzenesulfonic acid, n-dodecylbenzenesulfonate n-dodecylbenzenesulfonate Acid, n-octadecylbenzenesulfonic acid, n-dibutylbenzenesulfonic acid, isopropylnaphthalenesulfonic acid, dodecylnaphthalenesulfonic acid, dinonylnaphthalenesulfonic acid, dinonylnaphthalene disulfonic acid and the like. The concentration of the higher alkylarylsulfonic acid is 0.1 to 20% by weight, preferably 0.3 to 10% by weight, more preferably 0.5 to 8% by weight. Among them, dinonylnaphthalenesulfonic acid and dinonylnaphthalene disulfonic acid are preferred. Basic compounds added to such higher alkylaryl sulfonic acids such as ethylamine 'propylamine' butylamine, benzylamine, monoethanolamine, neopentylamine, 2-aminopropanol, 3-aminopropanol, etc. a primary monoamine; a secondary monoamine such as diethylamine diethanolamine, di- or di-isopropanolamine, n-methylethanolamine or n-ethylethanolamine; dimethylethanolamine, trimethylamine, triethylamine, three a tertiary monoamine such as isopropylamine, methyldiethanolamine or dimethylaminoethanol; diethyltriamine, hydroxyethylaminoethylamine-19-1332038, ethylaminoethylamine, methylamino Polyamine triethylamine such as propylamine. When the photo-deposition electrodeposition coating film forming method of the present invention is used, 'the coating film evaluation item can easily obtain the creative value of L値 in the range of 10 to 25' and can be changed by the following coating conditions to make the degree of light removal. change. In addition, the energization condition of the aqueous solution (II) can be in the range of 10 to 35 ° C water temperature, voltage 10 to 350 V, preferably 100 to 250 V, by energization for 1 to 300 seconds, in the unhardened coating film. A higher alkylaryl sulfonic acid is precipitated. Further, in the energization method, when a two-stage energization method of applying a voltage of 10 to 150 V in the first stage and applying a voltage of 150 to 300 V in the second stage is applied, the higher alkylarylsulfonic acid is impregnated to the first at a low voltage. By deepening the deep portion of the coating film, the higher alkyl aryl sulfonic acid is easily precipitated on the coating film having the film resistance at a high voltage, and the effect of improving the performance of the coating film can be improved by moving to the coating film. When the method of the present invention is illustrated in Fig. 1, the electrodeposition coating of the above step 1 is carried out in the electrodeposition tank 1, and after washing in the water washing tank (1), the step 2 is carried out in the aqueous solution (II) immersion tank 3. Immersion and energization, and then the water washing of the above step 3 is carried out in the water washing tank (2) 4. In the figure, an arrow 9 indicates that the process proceeds to step 2 by the above step 1. [Embodiment] [Embodiment] Hereinafter, the present invention will be more specifically described by way of examples. However, the invention is not limited by this. Moreover, "parts" and "%" mean "parts by weight" and "% by weight j. Manufacturing Example 1 -20- 1332038 Add 280 g of isopropyl alcohol to the reaction vessel, keep at 80 ° C, and drip in 3 hours. 40 g of styrene, 96 g of methyl methacrylate, 40 g of n-butyl acrylate, 120 g of ethyl acrylate, 48 g of 2-hydroxyethyl acrylate, 28 g of acrylic acid, and 8 g of azobisdimethylammonium The mixture was then added with 4 g of azobisdimethylvaleronitrile and kept at 80*>C for 1 hour to obtain a vinyl copolymer resin No. 1 « This vinyl copolymer resin No. 1 system was obtained. The weight average molecular weight is about 25,000, the acid value is 55 mgKOH/g, and the hydroxyl value is 58 mgKOH/g. Production Example 2 Emulsion No. 1 Production Example 1 to 70 parts (solid content) Production Example 1 Ethylene-based copolymer resin No The carboxyl group of .1 is mixed with 0.4 equivalent of triethylamine, and then mixed and dispersed. Then, 30 parts of Nicara MX430 (Note 1) are mixed and dispersed, then stirred and slowly dripped into deionized water, and three are added. The ethylamine has a pH of 7.5, and a solid content of 10% of the emulsion No. 1 is obtained. The difference in the solubility parameter between the polymer resin No. 1 and the Nikalaq MX4 30 was 0.7. Production Example 3 Emulsion No. 2 Production Example For the ethylene-based copolymer resin No. 170 (solid content) Production Example 1 The carboxyl group of .1 is mixed with 0.4 equivalent of triethylamine, and then mixed and dispersed, then 20 parts of Nikalaq MX430 (Note 1), 12.5 parts of Girardine 24:80-90% (Note 2) After mixing and dispersing 10 parts of the solid component, the mixture was stirred and slowly dripped with deionized water, and triethylamine was further added thereto to adjust the pH to 7.5 to obtain an emulsion No. 1 of a solid content of 10%. 2. Vinyl copolymer resin No. 1 The difference in solubility parameter of Nicarak MX430 / Gilard Nylon 1332038 24A-90CX was 〇.6. Production Example 4 Emulsion N 〇·3 Production Example For 170 parts (solid content) Production Example 1 ethylene copolymerization The carboxyl group of the resin No. 1 was mixed and dispersed with 0.4 equivalent of triethylamine, and then 10 parts of Nikalaq MX430 (Note 1) and 25 parts of Girardington 24A-90CX (Note 2) ( After mixing and dispersing 20 parts of the solid component, stirring was carried out, and deionized water was slowly added dropwise, and triethylamine was further added to adjust the pH to 7.5 to obtain a solid. 10% of the composition of the emulsion No. 3. The solubility parameter difference between the vinyl copolymer resin No. 1 and the Nikala MX430 / Gilardon 24A-90CX is 〇. 3. (Note 1) Nikala MX430: three And Chemical Co., Ltd., trade name, butoxylated melamine resin, solid content of 00% (Note 2) Girardington 24A-90CX: manufactured by Asahi Kasei Industrial Co., Ltd., trade name, block polyisocyanate, Solid component 80% Production Example 5 An anion electrodeposition paint No. 1 was obtained by adding 3,000 parts of the above-mentioned iodine% emulsion No. 1 and triethylamine having a pH of 8.5. Production Example 6 Anion electrodeposition paint No. 2 was obtained by adding 3000 parts of the above-mentioned 1% by weight emulsion ν〇·2, and triethylamine having a pH of 8.5. Production Example 7 An anion electrodeposition paint Ν〇·3 was prepared by adding 3000 parts of the above 10% emulsion No. 3 and a pH of 8.5 to triethylamine. Production Example 8 -22- 1332038 In a solution of 90 parts of isopropyl alcohol, Taycacure AC-901 (manufactured by Decathlon Corporation, trade name, dinonylnaphthalenesulfonic acid) was placed in 1 part of the solution. 0. 28 parts of triethylamine (equivalent to 5 equivalents) was added. Further, deionized water was added to prepare 1,000 parts of an aqueous solution of 1% solid content. The pH of the aqueous solution Νο·1 was 9.0. Production Example 9 20 parts of Taycacure AC-330 (manufactured by Decathlon Corporation, trade name, dimercaptobenzenesulfonic acid) were added to 80 parts of isopropyl alcohol, and 0.34 parts of triethyl was added to 1 part of the solution. Amine (equivalent to 5 equivalents). ® Add deionized water to make 1 000 parts of a 1% solids solution. The pH of the aqueous solution Νο.2 was 8.5. Production Example 10 20 parts of Taycacure AC-430 (manufactured by Decathlon Corporation, trade name, dodecanebenzenesulfonic acid) were added to 80 parts of isopropyl alcohol, and 0.1 part of this solution was added to 0.3. 7 parts of triethylamine (equivalent to 5 equivalents). Further, deionized water was added to prepare 1000 parts of an aqueous solution of 1% solid content. The aqueous solution N. The pH of .3 is 10.0. Φ

製造例U 在80份異丙醇中使20份Taycacure AC-901(迪卡(譯 音)公司製、商品名、二壬基萘磺酸),在100份該溶液中 添加0.2 5份三乙胺(相當〇 · 2當量)。 另加入去離子水,製得1000份固體成分1%之水溶液。 該水溶液No,4之pH値爲3.5。 製造例1 2 -23- 1332038 在80份異丙醇中使20份丁37〇3(:11“六(:_330(迪卡(譯 音)公司製、商品名、十五烷基磺酸),在100份該溶液中 添加0.14份三乙胺(相當0.2當量)。 另加入去離子水,製得1 000份固體成分1%之水溶液。 該水溶液No . 5之pH値爲3 . 0。 試驗板之製作 在鋁合金材料(#5000 )上實施(脫脂-蝕刻-中和-陽極化 成處理-封孔)所成的2次電解處理,製得被膜厚度約ιομπι 之施有陽極氧化處理的試驗板(西魯巴(譯音):尺寸爲150 X70x〇.5mm) 〇 實施例1 使用2張試驗板,各浸漬於以製造例1所得的陰離子電 沉積塗料Nol,進行乾燥膜厚18μπι之電沉積塗裝。然後’ 以製造例3所得的水溶液No·1以電壓15〇ν通電1分鐘' 水洗後,以在160下30分鐘、及在180下30分鐘之2水 準烘烤。 以表1所示組合與實施例1相同地進行實施例2〜4、 比較例1〜3之實驗。所得結果如表1所示。 1332038 表1 實施例 1 實施例 2 實施例 3 實施例 4 比較例 1 比較例 2 比較例 3 比較例 4 陰離子電沉積塗料(1) N0.1 NO.7 N0.1 NO.2 N0.1 N0.1 NO.2 NO. 3 乙烯系共聚物樹脂與交聯劑 0.7 0.7 0.7 0.8 0.7 0.7 0.6 0.3 之熔解性參數差 水溶 No. N0.1 NO.2 NO.3 N0.1 NO.4 NO.5 NO.4 N0.1 液 PH 9.0 8.5 10.0 9.0 3.5 3.0 3.5 9.0 (II) 電壓(V) 第1電壓(V) 150 200 200 50 150 200 50 200 第2電壓(V) 200 200 塗 塗面平滑性(注3) 〇 〇 〇 〇 Δ Δ Δ 〇 膜 模具記號 目視(注4) 〇 〇 〇 〇 Δ Δ △ X 性 隱蔽性 L値(注5) 21 20 20 20 3 5 6 6 能 低溫硬化 160°C 〇 〇 〇 〇 Δ Δ Δ △ 性(注6) 180。。 〇 〇 〇 〇 〇 〇 〇 〇 耐水性 160°C 〇 〇 〇 ◎ Δ Δ 〇 Δ (注7) 180°C ◎ ◎ ◎ ◎ 〇 〇 〇 〇 (注3)塗膜平滑性:塗膜表面(桔皮表面、凹凸等)以目 視評估。烘烤係使用1 80°C下進行的塗板。 ◎:佳 〇:稍佳 △:稍不佳 X :不佳 (注4 )模具記號隱蔽性(目視評估):烘烤係使用1 8 (TC 下進行的塗板。 -25- 1332038 佳 佳不 性性 蔽蔽 隱隱 號號 記記 具具 模模 • . · *〇 △ X:模具記號隱蔽性顯著不佳 (注5)模具記號隱蔽性(L値評估)··烘烤係使用180°C下 進行的塗板、使用變角分光光度計GCMS-4(村上色彩技術硏 究所公司製、商標名)以入入射角90度測定。藉由本發明之 塗膜形成方法時,可容易製得L値爲10〜25範圍之去光塗 膜。 (注6 )低溫硬化性:使丙酮滲入紗布中,在塗面上來回 進行20次,使塗面狀態蝕刻。 〇:沒有問題 △:塗面溶解且白色混濁 X :塗面顯著溶解 (注7)耐水性:使塗板浸漬於40°C溫水中240小時,加 入十字切割,藉由膠帶進行剝離試驗》 ◎:沒有剝離情形、沒有問題 〇:雖沒有剝離情形、在切割部分附近稍有膨脹情形 △:自切割部分有部分剝離情形 x:自切割部分全部剝離 【圖式簡單說明】 第1圖係爲說明本發明方法之步驟1〜3的簡略圖。 【元件符號說明表】 1 電沉積槽 2 水洗槽(1 ) 1332038 3 水溶液(I I )浸漬槽 4 水洗槽(2 ) 5 電沉積用電極 6 水洗噴嘴(1 ) 7 通電用電極 8 水洗噴嘴(2 ) 9 箭頭Production Example U 20 parts of Taycacure AC-901 (manufactured by Decathlon Corporation, trade name, dinonylnaphthalenesulfonic acid) were added to 80 parts of isopropyl alcohol, and 0.25 parts of triethylamine was added to 100 parts of the solution. (equivalent to 2 equivalents). Further, deionized water was added to prepare 1000 parts of an aqueous solution of 1% solid content. The pH of the aqueous solution No. 4 was 3.5. Production Example 1 2 -23- 1332038 20 parts of butyl 37 〇 3 (: 11 "six (: _330 (made by Deca), trade name, pentadecyl sulfonic acid) in 80 parts of isopropyl alcohol, To 100 parts of this solution, 0.14 parts of triethylamine (equivalent to 0.2 equivalent) was added. Further, deionized water was added to prepare 1 000 parts of an aqueous solution of 1% solid content. The pH of the aqueous solution No. 5 was 3.0. The production of the board was carried out by performing two times of electrolytic treatment on the aluminum alloy material (#5000) (degreasing-etching-neutralizing-anodizing treatment-sealing) to obtain an anodizing test with a film thickness of about ιομπι. Plate (Siruba: size: 150 X70x〇.5mm) 〇Example 1 Two test plates were used, each immersed in the anionic electrodeposition paint Nol obtained in Production Example 1, and subjected to electrodeposition of a dried film thickness of 18 μm. Then, 'the aqueous solution No. 1 obtained in Production Example 3 was energized at a voltage of 15 〇 1 for 1 minute', and then washed with water at a temperature of 160 for 30 minutes and at 180 for 30 minutes. The experiments of Examples 2 to 4 and Comparative Examples 1 to 3 were carried out in the same manner as in Example 1. The results obtained are shown in Table 1. 1332038 Table 1 Example 1 Example 2 Example 3 Example 4 Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Anionic electrodeposition coating (1) N0.1 NO. 7 N0.1 NO. 2 N0. 1 N0.1 NO.2 NO. 3 Ethylene copolymer resin and crosslinker 0.7 0.7 0.7 0.8 0.7 0.7 0.6 0.3 Meltability parameter difference water soluble No. N0.1 NO.2 NO.3 N0.1 NO.4 NO.5 NO.4 N0.1 Liquid pH 9.0 8.5 10.0 9.0 3.5 3.0 3.5 9.0 (II) Voltage (V) 1st voltage (V) 150 200 200 50 150 200 50 200 2nd voltage (V) 200 200 Coating Surface smoothness (Note 3) 〇〇〇〇Δ Δ Δ Diaphragm mold mark visual (Note 4) 〇〇〇〇Δ Δ △ X Concealed L値 (Note 5) 21 20 20 20 3 5 6 6 Low temperature Hardening 160 °C 〇〇〇〇Δ Δ Δ △ (Note 6) 180. 〇〇〇〇〇〇〇〇 Water resistance 160 ° C 〇〇〇 ◎ Δ Δ 〇 Δ (Note 7) 180 ° C ◎ ◎ ◎ ◎ 〇〇〇〇 (Note 3) Smoothness of the coating film: The surface of the coating film (the surface of the orange peel, the unevenness, etc.) was visually evaluated. Baking is carried out using a coating at 180 °C. ◎: Jia Hao: slightly better △: slightly poor X: poor (Note 4) mold mark concealment (visual evaluation): baking is used 1 8 (coated under TC. -25- 1332038 Sexual occult faint note with a mold • . · *〇△ X: The mold mark is significantly poorly concealed (Note 5) Mold mark concealment (L値 evaluation) · · Baking is used at 180 ° C The coated plate was measured using a variable angle spectrophotometer GCMS-4 (manufactured by Murakami Color Research Laboratory Co., Ltd., trade name) at an incident angle of 90. By the method for forming a coating film of the present invention, L値 can be easily produced. The coating film is in the range of 10 to 25. (Note 6) Low-temperature hardening property: Acetone is infiltrated into the gauze and rubbed back and forth 20 times on the coated surface to etch the coated surface. 〇: No problem △: The coated surface is dissolved and White turbidity X: Significantly dissolved on the coated surface (Note 7) Water resistance: The coated plate was immersed in warm water at 40 ° C for 240 hours, and cross-cut was added to perform peeling test by tape. ◎: No peeling, no problem 〇: Although not Peeling situation, slight expansion near the cutting part △: Self-cutting part Partial peeling situation x: peeling off from the cutting part [Simplified illustration of the drawing] Fig. 1 is a schematic diagram showing steps 1 to 3 of the method of the present invention. [Component Symbol Description Table] 1 Electrodeposition tank 2 Washing tank (1) 1332038 3 Aqueous solution (II) Dip tank 4 Washing tank (2) 5 Electrodeposition electrode 6 Wash nozzle (1) 7 Electrode electrode 8 Wash nozzle (2) 9 Arrow

-27--27-

Claims (1)

I322〇aS~ η 行年?月丨t曰修(吏)正本 公告尽 第92 1 30 1 68號「去光陰離子電沈積塗膜形成方法」專利案 (2010年8月16曰修正) 拾、申請專利範圍: 1. 一種去光陰離子電沉積塗膜形成方法,其特徵爲由下述步 驟順序形成, 步驟1:由(a)含羥基之不飽和單體、(b)含羧基之不飽和 單體、(c)其他自由基聚合性不飽和單體自由基共聚合所 得之(A)乙烯系共聚物樹脂、與胺基樹脂硬化劑及/或嵌段 聚異氰酸酯化合物之(B)交聯劑混合分散所成乳液之陰離 子電沉積塗料(I),電沉積塗裝於鋁合金材料表面上,形 成未硬化的電沉積塗膜步驟,其中該(A)乙烯系共聚物樹 脂與(B)交聯劑之溶解性參數差爲〇.5〜1.5, 步驟2:使該未硬化電沉積塗膜塗裝的鋁合金材料,浸漬 於在二壬基萘磺酸、及/或二壬基萘二磺酸之高級烷芳基 磺酸中添加鹼性化合物、水溶化所成的pH7.1〜14水溶液 (II)中,在通電條件爲第1段施加10〜150V電壓後,第2 段施加150〜30 0V電壓的2段式通電方法下通電的步驟, 步驟3 :水洗步驟,及 步驟4:烘烤硬化、形成去光電沉積塗膜的步驟。 2. 如申請專利範圍第1項之去光陰離子電沉積塗膜形成方 法,其中去光電沉積塗膜具有10〜25之L値。I322〇aS~ η Years?丨 丨 曰 曰 吏 吏 正 尽 尽 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 A method for forming a photo-anion electrodeposition coating film, which is characterized by the following steps: Step 1: From (a) a hydroxyl group-containing unsaturated monomer, (b) a carboxyl group-containing unsaturated monomer, (c) other freedom (A) an ethylene-based copolymer resin obtained by radical polymerization of a radically unsaturated monomer, and an anion of the emulsion formed by mixing and dispersing the crosslinking agent with an amine-based resin hardener and/or a block polyisocyanate compound (B) The electrodeposition coating (I) is electrodeposited on the surface of the aluminum alloy material to form an uncured electrodeposition coating film, wherein the solubility parameter of the (A) ethylene copolymer resin and the (B) crosslinking agent is poor. 〇.5~1.5, Step 2: The aluminum alloy material coated with the uncured electrodeposition coating film is immersed in a higher alkylaryl group of dinonylnaphthalenesulfonic acid and/or dinonylnaphthalenedisulfonic acid A pH 7.1~14 aqueous solution (II) is prepared by adding a basic compound to a sulfonic acid and dissolving with water. In the case where the energization condition is a voltage of 10 to 150 V applied in the first stage, the second stage is applied with a voltage of 150 to 30 V, and the step of energizing the two-stage energization method, step 3: water washing step, and step 4: bake hardening, A step of forming a photoelectrodeposition coating film is formed. 2. The method of forming a photo-anion electrodeposition coating film according to claim 1, wherein the de-electrodeposition coating film has an L? of 10 to 25.
TW92130168A 2003-10-30 2003-10-30 Matte anionic electrodeposition coating film-forming method TWI332038B (en)

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