1322196 九、發明說明： 【發明所屬之技術領域】 本發明係關於蝕刻TFT LCD玻璃的蝕刻設備，尤其 是，本發明係關於包含一蝕刻浴、沖洗浴、—乾燥浴以及 一用於導入其中配置複數個玻璃的玻璃匣之钱刻設備。 【先前技術】 蝕刻用於TFT LCD的玻璃之蝕刻設備授與本申請案申 ® 請人所提出之專利（韓國專利號碼10-218724，1996年1〇 月30曰提出）。 本發明揭示一種蝕刻設備，其包含使用一 HF溶液來 钮刻一玻璃的HF钱刻浴、一沖洗（QDR :快速浸泡沖洗) 浴以及一乾燥浴’其中在該蝕刻浴下半部固定一規律形成 氮氣泡的多孔氣泡板。此外，在其中插入並支撐複數個玻 璃的每一浴内配置一玻璃匣。也就是，之間具有預定距離 φ 的該複數個玻璃會以垂直方向插入該匣内，並且該匣在其 中插入玻璃的情況下插入每一浴内，來進行預定的姓刻處 理0 不過，隨著用於該TFT LCD的玻璃技術演進，該玻璃 的尺寸持續增加。也就是，該玻璃的尺寸已經從第1代增加 到第5.5代。 使用傳統姓刻設備就可輕易處理在第四代玻璃範例 内，尺寸為600mm乘720mm的玻璃，不過，使用傳統餘刻 設備處理第五代玻璃範例内，尺寸為l，100mm乘l，250mm的 1322196 玻璃尺寸時，會產生許多問題。蝕刻設備的尺寸會依照坡 璃尺寸成比例增加，尤其是’用於支撐玻璃的匣尺寸也隨 著蝕刻設備尺寸增加而增加。不過，當使用傳統匣蝕刻大 尺寸玻璃時會產生許多問題。 重點為在#刻玻璃的處理當中玻璃要均勻餘刻並且钱 刻後無任何損傷。也就是’由於尺寸增加造成均勻蝕刻困 難、處理期間玻璃彎曲、相鄰玻璃之間碰撞造成受損以及 由於玻璃重量造成損傷，這些都成為蝕刻處癦中的問題。 本發明申請人發展出本發明飯刻設備，籍由改善玻璃 匣的結構以及浴的結構’該浴中包含氣泡產生設備’藉由 均勻循環蝕刻溶液或沖洗溶液而均勻蝕刻具有大面積的玻 璃，來解決由於玻璃尺寸增加所發生的問題。 【發明内容】 本發明的目的在於提供一種用於蝕刻第彡代或更新世 φ 代具有大面積玻璃之蝕刻設備。 本發明的其他目的在於提供一種避免因為處理期間玻 璃彎曲導致玻璃蝕刻不均勻之蝕刻設備。 仍舊是本發明的其他目的在於提供一種避免因為相鄰 玻璃碰撞導致玻璃受損之蝕刻設備。 仍舊是本發明的其他目的在於提供一種避免因為玻璃 重量增加導致玻璃受損之蝕刻設備。 仍舊是本發明的其他目的在於提供一種#刻設備’其 包含氣泡產生設備，利用根據本發明的玻璃均勻屬環處 1322196 理液，來均勻蝕刻玻璃。 仍舊是本發明的其他目的在於提供一種安全並均勻蝕 刻具有大面積玻璃之钱刻設備。 為了達成本發明目的，依照本發明用於蝕刻TFT LCD 玻璃的蝕刻設備内之玻璃匣具有四個封閉型側壁240 (而 非開放型），一或多對固定在該匣内側壁的側邊部分支撐構 件210，其上具有相隔預定距離的複數個‘C’形凹槽211， 如此可插入並固定複數個玻璃300,複數個防碰撞構件 230，其固定在該侧邊部分支撐構件210上方的該‘C’形凹 槽之間，並且彼此相隔預定距離，如此可避免插入該匣的 相鄰玻璃300之間發生碰撞，以及一下部分支撐構件220， 在其下半部固定一防震構件222。 此外，根據本發明的一蝕刻設備使用該玻璃匣，並且 包含一配置在一蝕刻浴或沖洗浴下半部的氣泡產生設備 400，以及一配置在該氣泡產生設備400的多孔板500。 該氣泡產生設備並非固定在一浴900的底部，而是維 持在距離該浴900底部5 cm或以上，如此在該匣内外的一 化學流體與一氣泡可自由流動。 【實施方式】 底下將參考附圖來說明本發明的具體實施例。附圖内 一樣的編號代表一樣的元件，因此將省略額外說明。 本發明提供一種用於蝕刻大型LCD玻璃的蝕刻設 備，包含一用於插入該LCD玻璃的匣、一用於餘刻以插入 1322196 該匣的玻璃之蝕刻浴、一用於清潔該以蝕刻玻璃的沖洗浴 以及一用於將已清潔玻璃乾燥的乾燥浴，其中該匣包含： 一玻璃固定裝置，用於插入並固定該玻璃；一防撞裝置， 用於保持該插入的玻璃間之空間；以及一氣泡提供裝置， 用於在配置於該蝕刻浴與該沖洗浴内的該匣下半部產生並 提供一氣泡。 該玻璃固定裝置包含一側邊部分支撐構件，用於將該 玻璃的側邊部分插入並固定在一'c'形凹槽内。該防撞裝置 固定於該玻璃固定裝置。一玻璃防震裝置，用於吸收震動 並將該玻璃下半部支撐於該匣下半部。較佳是，該玻璃防 震裝置由矽或橡膠材料構成。 本發明的玻璃匣包含一氣泡穩定裝置，用於維持由該 氣泡產生裝置所產生的氣泡從該匣的下半部自由流入該匣 内。較佳是，該氣泡穩定裝置的頂端與底部為開放式，並 且該氣泡穩定裝置的四側壁為封閉式。 該蝕刻浴包含一無接觸自動厚度測量裝置（未顯示）， 用於即時測量經過蝕刻的玻璃厚度。較佳是，該無接觸自 動厚度測量裝置為一超音波測量儀器。該匣包含一匣分隔 裝置，用於維持配置在該蝕刻浴與該沖洗浴内的該匣底部 與該氣泡提供裝置間之預定距離，如此氣泡可自由流動。 較佳是，該氣泡提供裝置包含一多孔板或一具有複數 個孔的氣泡管。較佳是，該等孔的尺寸從該多孔板的中央 往外緣部份遞減，並且該等孔的尺寸從該氣泡穩定裝置的 一多孔板中央部份往外緣部份遞減。該多孔板或該氣泡管 9 丄322196 的孔在一對角方向内交錯配置，如此行與列並不會對齊。 該氣/包穩疋裝置的該多孔板或該氣泡管之孔也在對角方内 父錯配置，如此行與列並不會對齊。較佳是，該多孔板戈 該氣泡管的孔均勻配置，如此該等孔彼此相隔二或多不同 預定距離。該氣泡穩定裝置的該多孔板或該氣泡管之孔岣 勻配置，如此該專孔彼此相隔二或多不同預定距離。=1322196 IX. Description of the Invention: [Technical Field] The present invention relates to an etching apparatus for etching TFT LCD glass, and more particularly, the present invention relates to an etching bath, a shower bath, a drying bath, and a configuration for importing therein. A number of glass glass enamel money engraving equipment. [Prior Art] An etching apparatus for etching a glass for a TFT LCD is given by a patent filed by the applicant of the present application (Korean Patent No. 10-218724, filed on January 30, 1996). The present invention discloses an etching apparatus comprising an HF money bath using a HF solution to engrave a glass, a rinse (QDR: fast soak rinse) bath, and a drying bath in which a lower portion is fixed in the lower half of the etching bath A porous bubble plate forming nitrogen bubbles. Further, a glass crucible is disposed in each bath in which a plurality of glasses are inserted and supported. That is, the plurality of glasses having a predetermined distance φ are inserted into the crucible in a vertical direction, and the crucible is inserted into each bath with the glass inserted therein to perform a predetermined surname processing. With the evolution of glass technology for this TFT LCD, the size of the glass continues to increase. That is, the size of the glass has increased from the first generation to the fifth generation. The glass with a size of 600mm by 720mm can be easily handled in the fourth generation glass case using traditional surname engraving equipment. However, the size of the fifth generation glass is processed using conventional engraving equipment. The dimensions are l, 100mm by l, 250mm. 1322196 Glass size can cause many problems. The size of the etching apparatus will increase proportionally to the size of the glass, and in particular, the size of the crucible used to support the glass also increases as the size of the etching apparatus increases. However, many problems arise when using conventional enamel to etch large size glass. The focus is on the glass to be evenly engraved during the processing of the engraved glass and without any damage after the money. That is, the difficulty of uniform etching due to the increase in size, the bending of the glass during the treatment, the damage caused by the collision between adjacent glass, and the damage due to the weight of the glass become a problem in the etching. The applicant of the present invention has developed the rice carving apparatus of the present invention by improving the structure of the glass crucible and the structure of the bath, which includes a bubble generating device, which uniformly etches a glass having a large area by uniformly circulating an etching solution or a rinsing solution. To solve the problems caused by the increase in the size of the glass. SUMMARY OF THE INVENTION It is an object of the present invention to provide an etching apparatus for etching a third-generation or Pleistocene φ-generation glass having a large area. Another object of the present invention is to provide an etching apparatus which avoids uneven etching of glass due to glass bending during processing. It is still another object of the present invention to provide an etching apparatus that avoids damage to the glass due to collision of adjacent glass. It is still another object of the present invention to provide an etching apparatus that avoids damage to the glass due to an increase in the weight of the glass. Still another object of the present invention is to provide a #刻装置 device comprising a bubble generating device for uniformly etching glass using the glass uniformity 1322196 chemistry according to the present invention. It is still another object of the present invention to provide a device for safely and uniformly etching a large area glass. In order to attain the object of the present invention, a glass crucible in an etching apparatus for etching a TFT LCD glass according to the present invention has four closed side walls 240 (rather than an open type), and one or more pairs of side portions fixed to the inner side walls of the crucible The support member 210 has a plurality of 'C' shaped grooves 211 spaced apart by a predetermined distance, so that a plurality of glass 300 can be inserted and fixed, and a plurality of anti-collision members 230 are fixed above the side portion supporting members 210. The 'C'-shaped grooves are spaced apart from each other by a predetermined distance, so that collision between adjacent glass 300 inserted into the crucible can be avoided, and a portion of the support member 220 is lowered, and a shock-proof member 222 is fixed to the lower half thereof. Further, an etching apparatus according to the present invention uses the glass crucible, and includes a bubble generating device 400 disposed in an etching bath or a lower half of the bath, and a perforated plate 500 disposed in the bubble generating device 400. The bubble generating device is not fixed to the bottom of a bath 900, but is maintained at a distance of 5 cm or more from the bottom of the bath 900, so that a chemical fluid and a bubble inside and outside the crucible can flow freely. [Embodiment] A specific embodiment of the present invention will be described below with reference to the drawings. The same reference numerals in the drawings denote the same elements, and thus the additional description will be omitted. The present invention provides an etching apparatus for etching a large LCD glass, comprising: a crucible for inserting the LCD glass, an etching bath for engraving the glass to be inserted into the 1322196, and a cleaning bath for etching the glass. a flush bath and a drying bath for drying the cleaned glass, wherein the crucible comprises: a glass fixture for inserting and fixing the glass; and an anti-collision device for maintaining a space between the inserted glass; A bubble providing means for generating and providing a bubble in the lower half of the crotch disposed in the etching bath and the punch. The glass fixture includes a side portion support member for inserting and securing a side portion of the glass into a 'c' shaped recess. The anti-collision device is fixed to the glass fixture. A glass anti-shock device for absorbing shock and supporting the lower half of the glass in the lower half of the underarm. Preferably, the glass anti-vibration device is constructed of a crucible or a rubber material. The glass crucible of the present invention comprises a bubble stabilizing means for maintaining the free flow of bubbles generated by the bubble generating means from the lower half of the crucible into the crucible. Preferably, the top and bottom of the bubble stabilizing device are open, and the four side walls of the bubble stabilizing device are closed. The etch bath includes a contactless automatic thickness measuring device (not shown) for instantly measuring the thickness of the etched glass. Preferably, the contactless automatic thickness measuring device is an ultrasonic measuring instrument. The crucible includes a partitioning means for maintaining a predetermined distance between the bottom of the crucible disposed in the etching bath and the flush bath and the bubble providing means such that the bubbles are free to flow. Preferably, the bubble providing means comprises a perforated plate or a bubble tube having a plurality of holes. Preferably, the size of the holes decreases from the center to the outer edge of the perforated plate, and the size of the holes decreases from the central portion of the perforated plate of the bubble stabilizing device to the outer edge portion. The perforated plate or the holes of the bubble tube 9 丄 322196 are staggered in a pair of angular directions so that the rows and columns are not aligned. The perforated plate of the gas/envelope stabilization device or the orifice of the bubble tube is also disposed in a diagonally opposite parent so that the rows and columns are not aligned. Preferably, the perforated plate has a uniform arrangement of the cells of the bubble tube such that the holes are spaced apart from each other by two or more different predetermined distances. The perforated plate of the bubble stabilizing device or the pores of the bubble tube are evenly arranged such that the specific holes are separated from each other by two or more different predetermined distances. =
本發明的沖洗浴包含-溫度控肺，用於沖洗溶液的 溫度高於該蝕刻浴的蝕刻溶液溫度。 本發明提供—種_—大型LCD玻璃的方法，該 溶液的濃度；藉由在呈亡产 术&理该蝕系j ，、有-氣泡提供裝置的一蝕刻浴内旅 動該亂泡與軸刻溶液，來侧該玻璃 來測量該玻填的厚度;使用溫度高於該二 璃。^超純水讀定溫度清潔該破璃；以及乾燥該戒 、:::玻:的步驟包含利用維持該氣泡在該匣内自* …以二：上::定::利用避免氣泡溢_ 透』Τ圖S解說明一蝕刻裝置内使用的傳統玻璃π 兩邊；：τ: φ弟一圖為圖解說明當成傳統玻璃匣内用來從 兩邊支撐玻璃的組件之—側邊部分支撐構件ug之透祝 1322196 圖。 如第一圖内所示，一玻璃匣100包含至少一對側邊部 分支撐構件110,如此複數個玻璃可從頂端部分往底端部 分插入。雖然第一圖說明其中固定一對該側邊部分支撐構 件的該匣，其下半部内可進一步固定一或多對該側邊部分 支撐構件。插入該匣内的玻璃由複數個配置在下半部的下 部分支撐構件120所支撐。 該傳統玻璃匣包含彼此相隔預定距離的複數個‘V’形 * 凹槽，如此該側邊部分支撐構件110可支撐複數個玻璃。 也就是，一玻璃以垂直方向插入一個‘V’形凹槽。不過，當 該玻璃的一末端部分插入該‘V’形凹槽内，則在該玻璃末端 部分會發生蝕刻不均勻的現象。為了解決此問題，本發明 提供一改良的該側邊部分支撐構件凹槽，讓該玻璃的兩末 端部分插入。 此外，具有開放式四個側壁的該傳統玻璃匣具有複數 φ 個貫穿區域150。該開放式側壁在處理第四代或前幾代的 小玻璃方面並無任何問題。不過，當處理第五代或後幾代 的大型玻璃時，像是蝕刻溶液的流體就無法自由流動。因 此，會發生蝕刻不均勻的情況。根據本發明，相較於傳統 技術的開放式，該四個側壁為封閉式，如此該流體往上流 入該匣内，並往下流出該匣，因此讓該流體自由流動。 因為該玻璃匣不大，所以玻璃的彎曲不嚴重。不過， 隨著玻璃的尺寸增加，該彎曲現象會導致嚴重的問題。也 就是，相鄰的玻璃會因為彎曲而彼此碰撞，因此玻璃受損 \ 11 1322196 或導致㈣不均勻。本發明可避免麵破璃碰撞。 傳統玻璃E包含複數個位於下半部的該下部分支 件12〇，來支撑下半部的玻璃。該下部分支撐構件使用牙類 似於龍主體的強化塑膠所製成，不過，#該玻璃放於該 下部分支撐構件時’隨著該玻璃的尺寸增加，該玻璃的^ 緣會因為重量而受損。本發明可避免此問題。The flush bath of the present invention comprises a temperature controlled lung, the temperature of the rinse solution being higher than the temperature of the etching solution of the etching bath. The present invention provides a method for arranging a large LCD glass, the concentration of the solution; by pulsing the bubble in an etching bath of the eclipse system and the bubble providing device The solution is engraved to measure the thickness of the glass fill on the side of the glass; the use temperature is higher than the glass. ^Ultra-pure water reads the temperature to clean the broken glass; and the step of drying the ring, :::glass: contains the use of maintaining the bubble in the crucible from ... ... to two: on:::: use to avoid bubble overflow _ Τ S S 解 说明 解 解 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 一 φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ φ Through the picture of 1322196. As shown in the first figure, a glass crucible 100 includes at least one pair of side portion support members 110 such that a plurality of glass can be inserted from the top end portion to the bottom end portion. Although the first figure illustrates the cymbal in which a pair of the side portion support members are fixed, one or more of the side portion support members may be further fixed in the lower half. The glass inserted into the crucible is supported by a plurality of lower support members 120 disposed in the lower half. The conventional glass crucible includes a plurality of 'V' shaped * grooves spaced apart from each other by a predetermined distance such that the side portion support members 110 can support a plurality of glasses. That is, a glass is inserted into a 'V' shaped groove in the vertical direction. However, when one end portion of the glass is inserted into the 'V' shaped groove, uneven etching may occur at the end portion of the glass. In order to solve this problem, the present invention provides an improved groove of the side portion supporting member for inserting both end portions of the glass. In addition, the conventional glass crucible having four open sidewalls has a plurality of φ through regions 150. The open side wall does not have any problems in handling the small glass of the fourth or previous generations. However, when dealing with large glass of the fifth or subsequent generations, fluids such as etching solutions cannot flow freely. Therefore, uneven etching may occur. According to the present invention, the four side walls are closed compared to the conventional open type, so that the fluid flows upward into the crucible and flows downwardly, thereby allowing the fluid to flow freely. Since the glass crucible is not large, the bending of the glass is not serious. However, as the size of the glass increases, this bending phenomenon causes serious problems. That is, adjacent glass may collide with each other due to bending, so the glass is damaged \ 11 1322196 or causes (four) unevenness. The invention can avoid surface collision of glass. The conventional glass E includes a plurality of the lower branch members 12 of the lower half to support the glass of the lower half. The lower portion of the support member is made of a reinforced plastic whose teeth are similar to the dragon body. However, when the glass is placed on the lower portion of the support member, the size of the glass is affected by the weight as the size of the glass increases. damage. The present invention can avoid this problem.
、第—11為圖解說明用於㈣設如本發明的玻璃匠之 透視圖。第四圖為圖解說明用於本發明該玻輕内用來從 兩邊支撐玻璃的組件之—側邊部分切構件21G透視圖。 該側邊部分支樓構件21〇的凹槽從‘V，形凹槽改變為‘c，形 、槽211豸c形凹槽設計成具有—讓玻璃插入的小入口 以及一大内側部分，如此可將對於該蝕刻溶液的阻力降至 最低利用將阻礙該餘刻溶液流動的阻力降至最低，可避 在該玻璃的邊緣部份發生钱刻不均勻的問題。 如第二圖所示，根據本發明，相較於傳統技術的開放 式該四個側壁製作為封閉式，如此該流體往上流入該匣 内θ並往下流出該匣，因此讓該流體自由流動。利用允許 2疋該蝕刻溶液這種流體自由流動，可解決由於流體流動 導致的蝕刻不均勻問題。 該考曲現象會隨著該玻璃尺寸增加而增加，並且相鄰 的破璃會因為彎曲現象而彼此碰撞，因此玻璃受損或導致 钱刻不均勻。本發明’其間具有預定距離的該防撞構件230 置在該匣的上半部，避免發生碰撞。第五圖為圖解說明 本發明的破璃匣之平面圖，該玻璃匣中固定該側邊部分支 12 及該防撞構件l 如第五圖所示， — 且固定其間具有預…★播入母—該‘C’形凹槽211内，並 相鄰破璃發生碰揸疋距離的该防撞構件230，如此可避免 的塑膠所製成，每該防撞構件使用類似於或不同於該匣 侧邊部分支撐構:彳里構件都透過螺絲（未顯示）固定至 傳統下部分支p 膠所製成，導勤a牙#件12〇使用類似於匣主體的強化塑 璃尺寸W麵放置於下部分支撐構㈣，隨著玻 此問題，太蘇^的重量會導致玻璃下緣受損。為了解決 圖為說明下^二的下部分支稽構件製造成吸收震動。第六 二:°卩77支擇構件22〇固^於本發明玻璃匣下半部 的兩乾例之透視圖。 ，第/、a圖5兒明下部分支撐構件，其中具有彈性的 吸震^冓件222 _合至使用強化塑膠製成的合成樹脂桿221 上半邛即疋該玻璃邊緣接觸的部分。該吸震構件可包含 籲具有彈性的橡膠構件’可由精通此技術的人士所執行。第 六b圖说明下部分支撐構件22〇，其中具有彈性的吸震構 件222塗抹在使用強化塑膠製成的傳統合成樹脂桿221整 個表面。 第七圖為說明一浴900的剖面圖，其中本發明的玻璃 匣200配置在浴900内，並且在這其間配置一用於產生小 氣泡的一氣泡產生設備400和一多孔板500。氣泡由在浴 900内的氣泡產生設備400所產生，並且安裝多孔板500 用於將氣泡轉換成小氣泡，讓玻璃均勻蝕刻。 13 第八圖為說明本發明的氣泡產生設備400的 三個範例 之平面圖。如第人圖所示，該氣泡產技備包含一結構， 其中具有複數個排出氣泡的孔402之複數個氣泡管401配 置成其間具有預定距離。—獨立氣泡阻擋歧管帶可運用於 該氣泡產技備，錢在整個似彳㈣均自產生氣泡，或 該虱泡官的孔402之間具有不同距離，以便均勻產生氣 泡，如第八圖所示。 第九圖為三個說明本發明用於產生小氣泡的該多孔板 500範例之平面圖。如第九圖内所示，該多孔板5〇〇的孔5〇1 之配置或該孔的尺寸可以改變來產生小氣泡。也就是，該 多孔板配置成該孔的尺寸從中央往外緣遞減，或該多孔板 的孔往對角方向交錯配置，這樣行與列都不會對準。此外， 該氣泡管的孔都平均分配，如此該等孔彼此相隔兩或多不 同預疋距離，或該氣泡管的孔往對角方向交錯配置，這樣 行與列都不會對準。 第十圖為說明本發明的該蝕刻設備内該氣泡與該蝕刻 溶液流動之圖解視圖，其中相較於傳統技術的開放式，該 四個側壁製作為封閉式，如此該流體往上流入該匣内，並 往下流出該匣，因此讓該流體自由流動。此外，該氣泡產 生設備並不是安裝在該浴900的底部，而是安裝維持在距離 該浴900底部5 cm或以上之處，如此該流體往上流入該匣内 並且在下流出該匣，藉此讓該流體自由流動，並且可均勻 蝕刻該玻璃。 根據本發明，提供用於蝕刻第五代或更新一代具有大 1322196 面積玻璃的蝕刻設備，用於避免因為該玻璃彎曲造成該玻 璃蝕刻不均勻、由於該相鄰玻璃碰撞造成該玻璃受損，以 及該玻璃重量增加造成受損之該玻璃匣。此外，該餘刻設 備包含該氣泡產生設備以及該玻璃匣，可利用均勻循環該 處理流體來均勻蝕刻該大型玻璃。 雖然參考較佳具體實施例來特別顯示和說明本發明， 精通此技術的人士應知道各種變更的形式及細節，而不會 _ 脫離申請專利範圍内所定義之本發明範疇。 【圖式簡單說明】 利用詳細說明本發明具體實施例並且參照附圖，將可 更清楚瞭解本發明的特色以及優點，其中： 第一圖為圖解說明用於蝕刻設備内傳統玻璃匣的透視 圖。 第二圖為圖解說明當成傳統玻璃匣内用來從兩邊支撐 φ 玻璃的組件之一側邊部分支樓構件110透視圖。 第三圖為圖解說明用於本發明蝕刻設備内一玻璃匣的 透視圖。 第四圖為圖解說明本發明當成傳統玻璃匣内用來從兩 邊支撐玻璃的組件之一側邊部分支撐構件210透視圖。 第五圖為圖解說明本發明玻璃匣之平面圖，該玻璃匣 中固定一側邊部分支撐構件210以及一防撞構件230。 第六圖為說明一下部分支撐構件220固定在本發明玻 璃匣下半部的兩範例之透視圖。 15 1322196 第七圖為說明一浴900的剖面圖，其中本發明之一玻 璃匣200配置在該浴900内，並且在這其間配置一用於產 生小氣泡的一氣泡產生設備400和一多孔板500。 第八圖為說明本發明之一氣泡產生設備400的三個範 例之平面圖。 第九圖為說明本發明用於產生小氣泡的一多孔板500 範例之平面圖。 第十圖為說明本發明之蝕刻裝置内氣泡與蝕刻溶液流 動之圖解視圖。 【主要元件符號說明】 100玻璃匣 110側邊部分支撐構件 120下部分支撐構件 150貫穿區域 200玻璃匣 210側邊部分支撐構件 211 ‘C’形凹槽 220下部分支撐構件 221合成樹脂桿 222防震構件 230防撞構件 240封閉型側壁 300玻璃 16 1322196 400氣泡產生設備 401氣泡管 402孔 500多孔板 501孔 900浴And -11 is a perspective view for explaining (4) a glasssmith as set forth in the present invention. The fourth figure is a perspective view illustrating a side edge-cut member 21G for use in the glass bulb for supporting the glass from both sides of the present invention. The groove of the side portion of the branch member 21 is changed from a 'V, a groove to a 'c, and the groove 211 豸 c-shaped groove is designed to have a small inlet for inserting the glass and a large inner portion, Minimizing the resistance to the etching solution minimizes the resistance that hinders the flow of the remaining solution, and avoids the problem of unevenness in the edge portion of the glass. As shown in the second figure, according to the present invention, the four side walls of the open type are made closed compared to the conventional art, so that the fluid flows upward into the crucible θ and flows out of the crucible downward, thereby freeing the fluid. flow. The problem of etching unevenness due to fluid flow can be solved by allowing the fluid to flow freely. The test phenomenon increases as the size of the glass increases, and the adjacent glass may collide with each other due to the bending phenomenon, so that the glass is damaged or the money is uneven. The present invention has the anti-collision member 230 having a predetermined distance therebetween disposed in the upper half of the crucible to avoid collision. The fifth figure is a plan view illustrating the broken glass of the present invention, in which the side portion 12 and the collision preventing member 1 are fixed as shown in the fifth figure, and the fixing has a pre-... - the collision preventing member 230 in the 'C' shaped groove 211 and adjacent to the broken glass, which is made of plastic which can be avoided, each of which is similar to or different from the 匣Side part support structure: the inner members are fixed by screws (not shown) to the traditional lower branch p glue, and the guides are made of a reinforced plastic size W surface similar to the main body. Part of the support structure (four), with this problem, the weight of the Taisu ^ will cause damage to the lower edge of the glass. In order to solve the problem, the lower branch member of the lower part is manufactured to absorb vibration. Sixth: a perspective view of two dry examples of the lower half of the glass crucible of the present invention. And the lower part of the supporting member, wherein the elastic shock absorbing member 222 is combined with the upper half of the synthetic resin rod 221 made of reinforced plastic, that is, the portion where the glass edge contacts. The shock absorbing member may comprise a resilient rubber member' that may be performed by those skilled in the art. Fig. 6b illustrates the lower portion of the support member 22', wherein the elastic shock absorbing member 222 is applied to the entire surface of the conventional synthetic resin rod 221 made of reinforced plastic. The seventh drawing is a cross-sectional view illustrating a bath 900 in which the glass crucible 200 of the present invention is disposed in a bath 900, and a bubble generating device 400 for generating small bubbles and a perforated plate 500 are disposed therebetween. The air bubbles are generated by the bubble generating device 400 in the bath 900, and the perforated plate 500 is mounted for converting the bubbles into small bubbles to uniformly etch the glass. 13 is a plan view showing three examples of the bubble generating device 400 of the present invention. As shown in the figure, the bubble production technique comprises a structure in which a plurality of bubble tubes 401 having a plurality of holes 402 for discharging bubbles are disposed with a predetermined distance therebetween. - The independent bubble blocking manifold belt can be applied to the bubble production technology, and the money has self-generating bubbles throughout the 彳 (4), or the distance between the holes 402 of the 虱 官 officer, so as to uniformly generate bubbles, as shown in the eighth figure. Shown. The ninth drawing is a plan view showing three examples of the perforated plate 500 for producing small bubbles of the present invention. As shown in the ninth figure, the arrangement of the holes 5〇1 of the perforated plate 5 or the size of the holes can be changed to generate small bubbles. That is, the perforated plate is arranged such that the size of the hole decreases from the center to the outer edge, or the holes of the perforated plate are staggered in a diagonal direction so that the rows and columns are not aligned. Further, the cells of the bubble tube are evenly distributed such that the holes are spaced apart from each other by two or more different pre-twisting distances, or the cells of the bubble tube are staggered in a diagonal direction so that the rows and columns are not aligned. Figure 11 is a diagrammatic view showing the flow of the bubble and the etching solution in the etching apparatus of the present invention, wherein the four side walls are made closed compared to the open type of the conventional art, so that the fluid flows upward into the crucible The raft is flowed out and down, thus allowing the fluid to flow freely. Further, the bubble generating device is not installed at the bottom of the bath 900, but is installed to be maintained at a distance of 5 cm or more from the bottom of the bath 900, so that the fluid flows upward into the crucible and flows out of the crucible. The fluid is allowed to flow freely and the glass can be etched uniformly. According to the present invention, there is provided an etching apparatus for etching a fifth generation or a new generation of glass having a large area of 1322196 for avoiding uneven etching of the glass due to bending of the glass, damage of the glass due to collision of the adjacent glass, and The increase in weight of the glass causes damage to the glass crucible. Further, the residual device includes the bubble generating device and the glass crucible, and the large processing glass can be uniformly etched by uniformly circulating the processing fluid. Although the present invention has been particularly shown and described with reference to the preferred embodiments thereof, those skilled in the art will be able to understand the form and details of the various modifications without departing from the scope of the invention as defined in the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS The features and advantages of the present invention will become more apparent from the detailed description of the embodiments of the invention and the <RTIgt . The second figure is a perspective view illustrating a side portion of the branch member 110 as one of the components used to support the φ glass from both sides in a conventional glass crucible. The third figure is a perspective view illustrating a glass crucible used in the etching apparatus of the present invention. The fourth figure is a perspective view illustrating the side portion of the support member 210 of the present invention as a component for supporting glass from both sides in a conventional glass crucible. The fifth drawing is a plan view illustrating a glass crucible of the present invention in which a side portion supporting member 210 and a collision preventing member 230 are fixed. The sixth drawing is a perspective view illustrating two examples in which a portion of the support member 220 is fixed to the lower half of the glass crucible of the present invention. 15 1322196 is a cross-sectional view illustrating a bath 900 in which a glass crucible 200 of the present invention is disposed in the bath 900, and a bubble generating device 400 for generating small bubbles and a porous portion are disposed therebetween. Board 500. Fig. 8 is a plan view showing three examples of a bubble generating device 400 of the present invention. The ninth drawing is a plan view showing an example of a perforated plate 500 for producing small bubbles of the present invention. Fig. 10 is a schematic view showing the flow of bubbles and etching solution in the etching apparatus of the present invention. [Main component symbol description] 100 glass crucible 110 side portion supporting member 120 lower portion supporting member 150 penetrating region 200 glass crucible 210 side portion supporting member 211 'C' shaped groove 220 lower portion supporting member 221 synthetic resin rod 222 shockproof Member 230 anti-collision member 240 closed type side wall 300 glass 16 1322196 400 bubble generating device 401 bubble tube 402 hole 500 perforated plate 501 hole 900 bath