TWI319840B - Lithographic apparatus, illumination system and filter system - Google Patents

Lithographic apparatus, illumination system and filter system

Info

Publication number
TWI319840B
TWI319840B TW094146717A TW94146717A TWI319840B TW I319840 B TWI319840 B TW I319840B TW 094146717 A TW094146717 A TW 094146717A TW 94146717 A TW94146717 A TW 94146717A TW I319840 B TWI319840 B TW I319840B
Authority
TW
Taiwan
Prior art keywords
lithographic apparatus
filter
illumination
illumination system
filter system
Prior art date
Application number
TW094146717A
Other languages
English (en)
Other versions
TW200629004A (en
Inventor
Arnoud Cornelis Wassink
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of TW200629004A publication Critical patent/TW200629004A/zh
Application granted granted Critical
Publication of TWI319840B publication Critical patent/TWI319840B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094146717A 2004-12-28 2005-12-27 Lithographic apparatus, illumination system and filter system TWI319840B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US63931604P 2004-12-28 2004-12-28

Publications (2)

Publication Number Publication Date
TW200629004A TW200629004A (en) 2006-08-16
TWI319840B true TWI319840B (en) 2010-01-21

Family

ID=35727368

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094146717A TWI319840B (en) 2004-12-28 2005-12-27 Lithographic apparatus, illumination system and filter system

Country Status (8)

Country Link
US (2) US7426018B2 (zh)
EP (1) EP1677150B1 (zh)
JP (1) JP4563930B2 (zh)
KR (1) KR100731896B1 (zh)
CN (1) CN100573333C (zh)
DE (1) DE602005017567D1 (zh)
SG (1) SG123767A1 (zh)
TW (1) TWI319840B (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
SG123770A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, radiation system and filt er system
JP4366358B2 (ja) * 2004-12-29 2009-11-18 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、照明システム、フィルタ・システム、およびそのようなフィルタ・システムのサポートを冷却するための方法
US7397056B2 (en) * 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
US7453077B2 (en) * 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US7332731B2 (en) * 2005-12-06 2008-02-19 Asml Netherlands, B.V. Radiation system and lithographic apparatus
US7468521B2 (en) * 2005-12-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7442948B2 (en) * 2006-05-15 2008-10-28 Asml Netherlands B.V. Contamination barrier and lithographic apparatus
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7940878B2 (en) * 2007-02-23 2011-05-10 International Business Machines Corporation Unlock mode in source synchronous receivers
US7700930B2 (en) * 2007-09-14 2010-04-20 Asml Netherlands B.V. Lithographic apparatus with rotation filter device
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
JP6135410B2 (ja) * 2013-09-06 2017-05-31 ウシオ電機株式会社 ホイルトラップ及びこのホイルトラップを用いた光源装置
JP6435338B2 (ja) * 2013-10-16 2018-12-05 エーエスエムエル ネザーランズ ビー．ブイ． 放射源、リソグラフィ装置、デバイス製造方法、センサシステム及びセンシング方法

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US4408338A (en) 1981-12-31 1983-10-04 International Business Machines Corporation Pulsed electromagnetic radiation source having a barrier for discharged debris
US4837794A (en) 1984-10-12 1989-06-06 Maxwell Laboratories Inc. Filter apparatus for use with an x-ray source
US4872189A (en) 1987-08-25 1989-10-03 Hampshire Instruments, Inc. Target structure for x-ray lithography system
DE3927089C1 (zh) 1989-08-17 1991-04-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5459771A (en) 1994-04-01 1995-10-17 University Of Central Florida Water laser plasma x-ray point source and apparatus
US5577092A (en) 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
US5504795A (en) 1995-02-06 1996-04-02 Plex Corporation Plasma X-ray source
JPH09320792A (ja) 1996-05-27 1997-12-12 Nikon Corp Ｘ線発生装置
US6566667B1 (en) 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP2000098098A (ja) 1998-09-21 2000-04-07 Nikon Corp Ｘ線発生装置
JP4329177B2 (ja) 1999-08-18 2009-09-09 株式会社ニコン Ｘ線発生装置及びこれを備えた投影露光装置及び露光方法
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2003022950A (ja) * 2001-07-05 2003-01-24 Canon Inc Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置
WO2003034153A2 (en) 2001-10-12 2003-04-24 Koninklijke Philips Electronics N.V. Lithographic apparatus and device manufacturing method
KR100748447B1 (ko) * 2002-08-23 2007-08-10 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치 및 상기 장치에 사용하기 위한파티클 배리어
EP1434098B1 (en) 2002-12-23 2006-03-08 ASML Netherlands B.V. Contamination barrier with expandable lamellas
TWI230847B (en) * 2002-12-23 2005-04-11 Asml Netherlands Bv Contamination barrier with expandable lamellas
JP4340851B2 (ja) * 2003-04-09 2009-10-07 株式会社ニコン 光源ユニット、照明光学装置、露光装置および露光方法
EP1491963A3 (en) * 2003-06-27 2005-08-17 ASML Netherlands B.V. Laser produced plasma radiation system with contamination barrier
SG118268A1 (en) * 2003-06-27 2006-01-27 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
US7145132B2 (en) 2004-12-27 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, illumination system and debris trapping system
SG123770A1 (en) 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, radiation system and filt er system
JP4366358B2 (ja) 2004-12-29 2009-11-18 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、照明システム、フィルタ・システム、およびそのようなフィルタ・システムのサポートを冷却するための方法
US7106832B2 (en) 2005-01-10 2006-09-12 Asml Netherlands B.V. Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source
US7233010B2 (en) 2005-05-20 2007-06-19 Asml Netherlands B.V. Radiation system and lithographic apparatus
US7397056B2 (en) 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
US7332731B2 (en) 2005-12-06 2008-02-19 Asml Netherlands, B.V. Radiation system and lithographic apparatus
US7468521B2 (en) 2005-12-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7453071B2 (en) 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7442948B2 (en) 2006-05-15 2008-10-28 Asml Netherlands B.V. Contamination barrier and lithographic apparatus

Also Published As

Publication number Publication date
KR100731896B1 (ko) 2007-06-25
US20080304028A1 (en) 2008-12-11
US8018572B2 (en) 2011-09-13
SG123767A1 (en) 2006-07-26
TW200629004A (en) 2006-08-16
CN1804727A (zh) 2006-07-19
KR20060076688A (ko) 2006-07-04
EP1677150B1 (en) 2009-11-11
JP4563930B2 (ja) 2010-10-20
EP1677150A1 (en) 2006-07-05
US20060169929A1 (en) 2006-08-03
JP2006191048A (ja) 2006-07-20
DE602005017567D1 (de) 2009-12-24
US7426018B2 (en) 2008-09-16
CN100573333C (zh) 2009-12-23

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees