TWI318420B - Lower temperature thermal chemical vapor deposition reactor - Google Patents

Lower temperature thermal chemical vapor deposition reactor

Info

Publication number
TWI318420B
TWI318420B TW95140623A TW95140623A TWI318420B TW I318420 B TWI318420 B TW I318420B TW 95140623 A TW95140623 A TW 95140623A TW 95140623 A TW95140623 A TW 95140623A TW I318420 B TWI318420 B TW I318420B
Authority
TW
Taiwan
Prior art keywords
vapor deposition
chemical vapor
lower temperature
temperature thermal
deposition reactor
Prior art date
Application number
TW95140623A
Other languages
Chinese (zh)
Other versions
TW200822187A (en
Inventor
Chien-Liang Hwang
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW95140623A priority Critical patent/TWI318420B/en
Publication of TW200822187A publication Critical patent/TW200822187A/en
Application granted granted Critical
Publication of TWI318420B publication Critical patent/TWI318420B/en

Links

TW95140623A 2006-11-02 2006-11-02 Lower temperature thermal chemical vapor deposition reactor TWI318420B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95140623A TWI318420B (en) 2006-11-02 2006-11-02 Lower temperature thermal chemical vapor deposition reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95140623A TWI318420B (en) 2006-11-02 2006-11-02 Lower temperature thermal chemical vapor deposition reactor

Publications (2)

Publication Number Publication Date
TW200822187A TW200822187A (en) 2008-05-16
TWI318420B true TWI318420B (en) 2009-12-11

Family

ID=44770712

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95140623A TWI318420B (en) 2006-11-02 2006-11-02 Lower temperature thermal chemical vapor deposition reactor

Country Status (1)

Country Link
TW (1) TWI318420B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101559470B1 (en) * 2009-06-04 2015-10-12 주성엔지니어링(주) Chemical Vapor Deposition Apparatus
CN105757363A (en) * 2014-12-13 2016-07-13 天津威康医疗用品有限公司 High-temperature resistant quartz container
CN113981416B (en) * 2021-12-29 2022-03-22 上海陛通半导体能源科技股份有限公司 Multifunctional wafer pretreatment cavity and chemical vapor deposition equipment

Also Published As

Publication number Publication date
TW200822187A (en) 2008-05-16

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