TWI297508B - Pellicle for photolithography and method of manufacturing the same - Google Patents

Pellicle for photolithography and method of manufacturing the same Download PDF

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TWI297508B
TWI297508B TW095115045A TW95115045A TWI297508B TW I297508 B TWI297508 B TW I297508B TW 095115045 A TW095115045 A TW 095115045A TW 95115045 A TW95115045 A TW 95115045A TW I297508 B TWI297508 B TW I297508B
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Taiwan
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frame
protective film
film
protective
representative
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TW095115045A
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Chinese (zh)
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TW200709274A (en
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Yoshihiko Nagata
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Shinetsu Chemical Co
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983Optical system protection, e.g. pellicles or removable covers for protection of mask

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Description

1297508 九、發明說明: 【發明所屬之技術領域】 =明係有種微影用防護膠膜組件及其製造方法,使 、夜曰\自里f ^巧⑽)、超大型積體電路(VLSI)等半導體裝置及 液曰曰顯不板製造時,用以避免微塵貼附於微影用光罩。 【先前技術】 板照射以進行圖形之势:丄公:^曰曰圓或液晶用玻璃原 1 f此%如微塵附著於所使用之曝光光罩 變形%界不平整!蔽、曲折,而使轉印圖形 損之問題。成賴讀黑,尺寸、品f、外觀等受 光罩it ΐ然此等_之製作健—般係在無塵室中進行, 組件之方、本认先先罩表面貼附光源能容易通過之防護膠膜 二方法。於此炀形下,因異物不會直接附著於眼弁伞署夕主 :曝啊 圖1係表示防護膠膜組件整體之立體圖 …、 防護膠臈峨本上係依下述構成體^ 4«; JISA7075 ^ A6〇;^ ^ ^ 錄鋼、或聚乙烯等材質之防護膠膜框竿上端面1 ί 抹防^臈之良好溶劑將其風乾.黏接(請參考專再塗 或者,以丙烯酸樹脂、環氧樹脂、或含氟#+_笪#」。 腊、丙烯酸樹脂以及矽酮樹脂等形成之:烯S旨樹 汉㈢的在於保護 1297508 黏接層之鮮減雜_概塾層。 f利文獻1曰本特開昭58-2刚23號公報 f利文獻2美國專利第4,861,4。2號說明書 f利文獻3日本特公昭63-277。7號公報句 專利文獻4日本特開平9-54424號公報 f利文獻5日本綱細-425。7號公報 專利文獻6日本實用新案登錄2528924號 【發明内容】 防護膠膜組件係包圍著光罩基板表面 :,防護膠膜組件外部之微塵不會附著於圖形面, 護膠膜組件外部隔離。 項域與防 料财祕对频祕⑽)、超大 ^貝體電路斜^體鄕用光罩之_用保護 =化之液晶顯示器製程、薄膜電晶體 及: 光片之形成製程中光罩之防塵用。 喊衣&及%色滤 昌知半導體微影用防護勝膜組件之尺寸, &左右^於液晶顯示器微影製程使用之防護膠膜組件尺寸:貝1 330刪x4j〇mm,大至 850mmxl2〇〇mm 左右。 、 如尺寸係該大小左右,則如圖3所 亦不變形強度之臨時框架撐開防護膠膜後力 =向内側變形’而有無法滿足防護膠 為因應此問題,已有人提案一種分割 ^ 防護膠膜框架’防止防護膠膜組件變:方法1請ί u 4尸/r不,預先加工防護膠膜 1297508 框架之長邊使其向外側突出, 膜框架變形,則防護膠膜框架之長邊張力使防護膠 利文獻5)。 我遠、、々略交成直線狀(請參考專 鏡像投影式之方法’無法運用於追求較大曝光範圍的 法廣看似合理’自以往已有類似方 大型框體時。然而此方法,得;轉開於具有長對邊之 有精確度及成本增加的^也、其千细成之框體並非易事,而 組件ίί 一種微影用防護膠膜 本發明之微影用防護膠膜組件,传 形成3 ^成之非晶質含氣聚合物所 JIS Λ5000 , . A6〇〇〇 , . A?〇〇〇 * 丁 j明^微影用賴膠馳件方法,其特徵為將由全 基乙細醚聚合物構成之非晶質含㈣合物稀釋於溶劑,塗 =於基板上,以高於18(rc之溫度加熱去除溶雛,將得到之 =膜黏接固定於臨時框架,自基板獅後,貼_防護膠膜框架, =去臨時框架。此時,於賤臨時框練張該防護膠膜之狀態, 根據臨時框架s該防護賴之張力,產生彈性變狀變形量,以 使貼,於該防護膠膜框架後之膜張力,大於0 N/mm,小於 2x10 N/腦地,調整該臨時框架之斷面二次矩。 、 並且,該臨時框架係選自JIS A5000系、A6000系、A7000系 Ϊ297508 、,銘s 1所構成’该斷面二次矩之值係介於5mm4以上3500mm4 Μ下。 明’按照前述構成,能實現-(a)耐光性高;(b) 沖1荆2錢形少;(e)破損時對光罩造成損害小等;而適用 的又型防件及液晶顯示11製造時之微影製程 【實施方式】 由將ρίίΐίίΐ決上述問題,努力反覆檢討之結果,觀察到藉 變妒二二3值維持在—定之範_,防護膠膜框架便不會 找出再siitt财會丨峨摺及獅,並且更進-步檢討, 膠峨醜力嫩,暨完成本發 依此,貝現一品質穩定之防護膠膜組件。 由全氣丁稀基乙_聚合物構成之非晶質含 t Λ膜,使崎麵組件之縣力大於《 N/刪, 自成膜基板剝離防護膠膜時,需使 j〜 摺及鬆弛之防護膠膜組件。 4防雜膜不會出現皺 以下,有關本發明,配合圖 本發明之防護膠膜組件如圖J 3二木1明之。 附用黏接劑將防護膠臈撐開於防護^框竿斤:上t防護膠膜貼 下端面設置有為黏接解之黏_ ' ’於 下端面貼附有能剝離之觀墊層。㈤層並且於黏接劑層之 ♦防護膠膜組件構成部件i大小,於一π防罐颇g 當於大型液晶顯示H製造時使用之微影^組件中,相 又〜衣#壬用防護膠膜組件,防 1297508 之材i,係使:公2t:°:::;mm〜1500xl5°0馳。防護膠膜框架 的銘合金JIS A7G75、JIS 代f之鋼製品亦可,但以重量輕 防護膠膜框架之表面,通當以1S A5052等較為適宜。 發明對有陳化之方法砂及化學研練化處理,本 則以不銹鋼粉、金剛砂、玻璃呂材質, Μ等實施化學研磨對表面粗化面進仃_里,再以 可作為酸性電解液一般地使用。I夂7岭液、乙-酸水溶液等 其尺^防;$膜:二至:;:面’設置至少-個以上的通氣孔, 物尺寸、過遽面積或依該等條置之網狀 ^構綱鮮 相同適當過數、位置等,亦與通氣口 解環境中解嫩能吸收或分 為防全合物構成之非晶質含氟聚合物作 ί=,獻溶劑(例如 有關防護膠膜黏接用黏接劑,能使用自1往即使用之邦接 =:如;使用丙_樹,接劑、環氧樹脂黏接劑、賴樹, ;Γ ί具有高耐光性特點為適當。有關含氟聚合物, "、口列如·氟系聚合物CT69(旭硝子(股)公司製、商品名)。 1297508 有關貼附光罩用黏接劑則可推用. 樹脂黏接劑、丙烯酸樹絲接㈣。17…面黏郷帶、石夕酮 _框架下端面設置有貼附光軍用黏接劑 ϋ二γ 貼附有能娜之襯歸。 H並且於黏接劑層上 德认f者’防麟酿附祕接騎,係依必要以溶_釋,冷 上端面,加減錄燥硬絲構成Hi 土布^式,能採用例如毛刷塗抹、喷霧、自動塗膠等方法。 各種intrr使光罩轉舰削之她層,公知之 «^^^(PFA) ^ ^^(ΡΕ) , Ι«;Ξ(Ρ〇) ΓΓ^ 烯(ρρ)等,該些材質之表面,構成適用黏接劑之分隔哭。水 ㈣ir 月係將約略相同尺寸之臨時框架黏接於大型基板上形成 膜面,以幢架將防護膠膜自基板剝離。並且,ΐ 膠膜框架後,將以臨時框架獅之防護膠膜,貼 臨時框架僅要能將防護麵無礙地自基板剝離,其材質並未 及升f狀得到之斷面二次矩設計之。依 ^ "蔓I膑之張力,臨日守框架向内侧彎曲,而持續維持固 加張力二因於此狀態下將防護膠膜由臨時框架轉貼至防護膠 、框木,能實現具有期望膜張力之防護膠膜組件。 ,^係表示有關本發明之一實施例的圖。 ,時框架i斷面二次矩之值係介於5麵4〜3500匪4之範圍内, 框架1將自基板剝離之防護膠膜撐開著。臨時框架1因防 謹之張力,其長邊向内侧彎曲變形。由於此彎曲,貼附於防 膜後之膜張力介於Q〜2xlQ_2N/mm之間。將此防護膠膜黏 ;預塗佈防護膠膜黏接劑之防護膠膜框架,切斷去除防護膠 11 ^/308 膜框木四周不要的防 少 防護膠膜,因能保持自‘ '趣力,巧防護膠膜組件。據此撐開之 期望的贿力之防護膠職^獅時之膜張力,而得到具有 能依據以下方法適當 變形量,則臨時框架之變形 地^得到期望膜張力而必要之叫框架, 量轉邊長+央_側方向之 里則根據以下公式求得:1297508 IX. Description of the invention: [Technical field to which the invention belongs] = a protective film module for lithography of the Ming system and a method for manufacturing the same, such as a nighting machine, a self-integrated circuit, and a super large integrated circuit (VLSI) When semiconductor devices and liquid helium panels are manufactured, they are used to prevent fine dust from sticking to the lithography mask. [Prior Art] Plate irradiation to carry out the trend of the figure: 丄 public: ^ 曰曰 round or liquid crystal glass original 1 f%% such as fine dust attached to the exposure reticle used deformation % unevenness! Covering, twisting, and the loss of the transfer pattern. Read the black, size, product f, appearance, etc. by the reticle it ΐ _ _ _ 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 般 组件 组件 组件 组件 组件 组件 组件Protective film two methods. In this shape, because the foreign matter does not directly adhere to the eyelid umbrella, the main body: exposure, Figure 1 shows the overall three-dimensional diagram of the protective film module..., the protective plastic file is based on the following structure ^ 4« ; JISA7075 ^ A6〇;^ ^ ^ Protective rubber film frame made of steel or polyethylene, etc. Upper end face 1 ί Wipe the good solvent to seal it. Adhesive (please refer to special recoating or acrylic Resin, epoxy resin, or fluorine-containing #+_笪#. Wax, acrylic resin, and fluorenone resin are formed: the olefin S is intended to protect the freshly-reduced layer of the 1297508 adhesive layer.利 文献 文献 58 58 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 -2 58 58 58 58 58 58 58 58 58 58 58 58 58 58 58 58 58 58 58 2 2 2 2 2 2 2 2 Kaiping No. 9-54424, Japanese Patent Publication No. 425. No. 7, Japanese Patent Application Publication No. No. 2528924, the disclosure of which is incorporated herein by reference. The dust will not adhere to the graphic surface, and the outer cover of the rubber film assembly will be isolated. Frequency secret (10)), super large ^Bell circuit oblique body 鄕 光 _ protection = liquid crystal display process, thin film transistor and: light film formation process in the dust mask. Shouting & and % color filter Changzhi semiconductor lithography protective film module size, & left and right liquid crystal display lithography process using protective film module size: shell 1 330 deleted x4j〇mm, up to 850mmxl2 〇〇mm or so. If the size is about the size, as shown in Figure 3, the temporary frame without deformation strength is stretched after the protective film is pressed = the inner side is deformed, and the protective rubber is unable to meet the problem. A splitting protection has been proposed. Film frame 'prevents the protective film component change: method 1 please ί u 4 corps / r no, pre-process protective film 1297508 the long side of the frame makes it protrude to the outside, the film frame is deformed, the long side of the protective film frame Tension makes protective gelatin literature 5). I am far and straight, and I have a straight line (please refer to the method of the special mirror projection method), which cannot be applied to the method of pursuing a large exposure range. It seems reasonable when it has been similar to the large square frame. However, this method, It is not easy to turn the frame with precision and cost increase with long sides, and the frame is not easy, and the component ίί is a protective film for lithography. The protective film for lithography of the present invention The component, which is formed into a 3^ amorphous amorphous gas-containing polymer, JIS Λ5000, . A6〇〇〇, . A?〇〇〇* Ding j Ming ^ lithography using the Laijiao method, which is characterized by The amorphous (tetra) compound composed of the ethyl ether ether polymer is diluted in a solvent, coated on the substrate, and heated at a temperature higher than 18 (rc to remove the mash, and the obtained film is adhered and fixed to the temporary frame, After the lion, the _ protective film frame, = to the temporary frame. At this time, the state of the protective film is stretched in the temporary frame, and the elastic deformation is generated according to the tension of the temporary frame. The film tension after the protective film frame is greater than 0 N/mm, less than 2x1 0 N/brain, adjust the second moment of the section of the temporary frame. Moreover, the temporary frame is selected from the JIS A5000 series, the A6000 series, the A7000 system Ϊ 297508, and the s 1 constitutes the second moment of the section The value is between 5mm4 and 3500mm4. Under the above structure, it can achieve - (a) high light resistance; (b) less rushing 1 Jing 2 money; (e) damage to the mask when damaged; And the applicable defensive parts and the lithography process during the manufacture of the liquid crystal display 11 [Embodiment] By ρίίΐίί ΐ 上述 上述 上述 , , 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力 努力The protective film frame will not find out the rest of the Siitt accounting and the lion, and further step-by-step review, the plastic ugly and tender, and complete the hair, according to this, a quality stable protective film module The amorphous t-containing film consisting of all-air dilute-based B-polymer makes the county force of the surface component larger than N/Cut. When the self-forming substrate peels off the protective film, it needs to be folded. Relaxed protective film module. 4 anti-alias film will not wrinkle below, related to the present invention, with the drawing The protective film module is shown in Fig. J 3 Ermu 1 Ming. Attached with adhesive to spread the protective plastic plaque in the protective ^ frame 竿 :: on the t protective film attached to the end surface is set to adhere to the sticky _ ' 'The lower end surface is attached with a peelable mat layer. (5) The layer and the protective film module of the adhesive layer constitute the size of the component i, which is used in the manufacture of a large liquid crystal display H. In the lithography ^ component, the phase is again ~ clothing # 壬 with protective film module, anti-1297508 material i, system: 2t: °:::; mm ~ 1500xl5 ° 0 Chi. Protective film frame of the alloy JIS Steel products of A7G75 and JIS can also be used, but the surface of the protective plastic film frame is suitable for 1S A5052. The invention has the method of sanding and chemical grinding treatment of the aging method, and the chemical grinding is carried out on the rough surface of the surface by using stainless steel powder, silicon carbide, glass ruthenium, etc., and then it can be used as an acidic electrolyte. use. I夂7 ling solution, ethyl-acid aqueous solution, etc.; (film: two to: ;: face 'set at least one or more vents, the size of the material, the area of the sputum or the mesh according to the strips The structure is the same as the appropriate number, position, etc., and is also used in the venting solution to dissolve or divide the amorphous fluoropolymer composed of anti-all-in-one composition. Adhesive for bonding, can be used from the first use =: such as; use C-tree, adhesive, epoxy resin adhesive, Lai tree, Γ ί with high light resistance characteristics is appropriate. For the fluoropolymer, ", the mouth of the fluorine polymer CT69 (made by Asahi Glass Co., Ltd., trade name). 1297508 Adhesive for attaching a photomask can be used. Resin adhesive, Acrylic tree wire joint (four). 17... face adhesive tape, linalone _ frame lower end face is provided with attached light military adhesive ϋ γ affixed with ena lining. H and on the adhesive layer Recognize the f's anti-Linning and attach the secret to the ride, according to the need to dissolve the _ release, cold upper end face, add and subtract dry hard wire to form Hi soil cloth type, can be applied, for example, with a brush Spray, automatic gluing, etc. Various intrr turns the reticle into her layer, known as «^^^(PFA) ^ ^^(ΡΕ) , Ι«;Ξ(Ρ〇) ΓΓ^ene (ρρ ), etc., the surface of these materials constitutes the separation of the applicable adhesives. Water (4) ir month attaches a temporary frame of approximately the same size to a large substrate to form a film surface, and peels the protective film from the substrate with a frame. Moreover, after the 胶 film frame, the protective frame of the temporary frame lion will be attached to the temporary frame, and the protective surface must be peeled off from the substrate without any hindrance. According to the tension of ^ " vine, the frame of the Guardian is bent to the inside, and the tension is continuously maintained. Because of this, the protective film is transferred from the temporary frame to the protective glue and the frame wood. The protective film module of the film tension is desired. The system shows a diagram relating to an embodiment of the present invention. The value of the second moment of the frame i is in the range of 5 to 4500 匪 4, frame 1 The protective film peeled off from the substrate is opened. The temporary frame 1 has a long side to the inside due to the tension of the guard Bending deformation. Due to this bending, the film tension attached to the film is between Q~2xlQ_2N/mm. The protective film is adhered; the protective film frame of the protective film adhesive is pre-coated, and the film is cut. Remove the protective rubber 11 ^ / 308 film frame wood around the anti-leak protective film, because it can maintain the 'fun, clever protective film components. According to this, the expected bribe protection rubber lion The film tension is obtained by having the appropriate deformation amount according to the following method, and the desired film tension is obtained by deforming the temporary frame, and the frame is required. The length of the rotating side and the side of the central side are obtained according to the following formula:

δ ^Ρ LV384EI I -hWVl2 長。此外,斷面二次矩以以下公式表示: I度,w為臨時框架之寬度。δ ^ Ρ LV384EI I - hWVl2 long. In addition, the second moment of the section is expressed by the following formula: I degree, w is the width of the temporary frame.

於此,I Ο 〇— 為响「力0fL4/384EI) =σ°- (kPL4/32Ebh3) 惟 而不會塑性變形之範圍, 夠具有任意之膜張力。 因此 w,如科之縣力,k城之雜係數。 二"有_材料^彈性變形,加上__因膜張力 is〇〜a1=(jG之間,防護膠膜組件能 架材質得到緩和之膜張力,係根據臨_ 面二次:=二長:框架之形狀及尺寸,則根據斷 預設值雖能依必要之臨時框架大小,任意決定,惟 如图β危主-士畊面—人矩之值以5_4〜3500刪4為佳。 面二次長為9_、1000刪、14_時,斷 以上,力t,之關係圖。如*斷面二次矩於3_腿4 口口 τ王木之形量則太+,無法調整於防護膠膜框架撐開 1297508 ,之巧張力至既定之值。另―方面,如取臨 小,臨時框架之變形量則太 木辦面一-人矩過 時,會產生鬆弛及鈹摺 祕貼附於防護朦膜框架 有關本發明防護膠膜組件之製造方法,具體說明之。 板上^將溶解於溶劑之聚合物,以旋轉塗佈法塗佈於大型基 Ξ在與基板約略同樣大小之臨時==於i 膠膜ί 基板_,防護 ^臨HJ框架’則產生對應移取之防護勝膜張力之彎曲量。此 二斷面二次,定為於防護膠膜框架撐開防護膠 膜守』張力介於〇〜2xl(T2N/mm之間,因此於臨時框 將此撐開於臨時框架之防護賴,轉接_接於防 器切斷去除防護膠膜框架四周不要的防護膠^而 侍到膜張力為既定範圍内之防護膠膜組件。 以下,列舉有關本發明之實施例及比較例具體說明之。 (實施例1) 曰準備外部尺寸474mmx782mmx長邊寬7· 〇mm,短邊寬6· 〇 厚度5· 5mm ’材質為A5052之鋁合金製框架作為防護膠膜框牟。 ?護膠膜框架之-侧面巾央設置有餘Q· 5mm之通氣孔、丨◦個、 淨防護膠膜框架表面後,使用玻璃細珠,以喷壓丨· 5kg/cm2之'1、 汉備,貫施約1分鐘之表面處理以粗化表面。 、’ 黏接,於NaOH處理浴中1〇秒處理洗淨後,以人 l〇V(l· 3A)、14%硫酸水溶液、於液溫i8°C中,進行陽極氧化:上 接,於防護膠膜框架内侧,以喷霧塗布設備,塗布厚之站 黏接劑。 並且於預先裝設之通氣口設置材質係為聚四氟乙烯(ptfe), 13 1297508 月匕過濾、99.9999%尺寸為〇.1#111〜3.〇/^111之微塵,寬9 5111111、言 2· 5mm、厚度300//m之過渡器。 、· 回 另一方面,準備外部尺寸800mmx920mmx6醜,厚, 為A7075-T651之鋁合金製框架作為防護膠膜框架。 、Here, I Ο 〇 - for "force 0fL4 / 384EI" = σ ° - (kPL4 / 32Ebh3), but not plastic deformation range, enough to have any membrane tension. Therefore w, such as the county power, k The coefficient of the city. Second " _ material ^ elastic deformation, plus __ due to film tension is 〇 ~ a1 = (between jG, the protective film module can be used to reduce the film tension, according to the surface Second: = two lengths: the shape and size of the frame, according to the default value of the frame can be arbitrarily determined according to the size of the temporary frame necessary, but as shown in Figure β, the value of the main-study face - the value of the human moment is 5_4~3500 It is better to delete 4. When the secondary length is 9_, 1000 delete, 14_, break above, force t, the relationship diagram. For example, the second moment of the section is 3_ leg 4 mouth mouth τ Wang wood shape is too +, Can not be adjusted to the protective film frame to open 1297508, the tension to the established value. In other aspects, if the small frame, the temporary frame deformation amount is too wood to face one - when the person is too late, there will be slack and abortion The secret film is attached to the protective enamel frame. The manufacturing method of the protective film module of the present invention is specifically described. It is applied by spin coating on a large base in a temporary size of approximately the same size as the substrate == on the i-film ί substrate _, and the protective surface is adjacent to the HJ frame, which produces a bending amount corresponding to the protective film tension. This two-section two times, is set to the protective film frame to open the protective film to maintain the tension between 〇 ~ 2xl (T2N / mm, so in the temporary frame to open this to the temporary frame of protection, turn The protective film is removed from the outer surface of the protective film frame to prevent the film tension from being within a predetermined range. The following is a detailed description of the embodiments and comparative examples of the present invention. (Example 1) 曰 Preparation of external dimensions 474 mm x 782 mm x long side width 7 · 〇 mm, short side width 6 · 〇 thickness 5 · 5 mm 'A5052 made of aluminum alloy frame as a protective film frame 牟. - After the side of the towel is provided with a vent hole of Q·5mm, one piece, and the surface of the net protective film frame, use the glass beads to spray the 丨·5kg/cm2 of '1, Hanbei, and apply for about 1 minute. Surface treatment to roughen the surface., 'Adhesive, 1 〇 second in the NaOH treatment bath After washing, it is anodized with human l〇V (l·3A), 14% sulfuric acid aqueous solution at liquid temperature i8 °C: topped, inside the protective film frame, spray coating equipment, coating Thick station adhesive. And the pre-installed vents are made of PTFE (PTFE), 13 1297508 匕 filtered, 99.9999% size is 〇.1#111~3.〇/^111 Dust, wide 9 5111111, speak 2 · 5mm, thickness 300 / / m transition. On the other hand, prepare the outer dimensions of 800mmx920mmx6 ugly, thick, A7075-T651 aluminum alloy frame as a protective film frame. ,

黏=,將^普CTX809 (旭硝子社製、商品名)溶解於氣 岭劑.Fluonnert(氟之非活性液體)FC_75(美國3M 品調製成濃度8%之溶液。使用旋轉塗抹機,將此溶液於^鏡面 =之850ΐΜΐχ1·ιηηι石英玻璃基板表面上,形成厚度4卵之透 》 使用環氧樹脂黏接劑Araldite rapid (昭和高分 架’轉縣板上之防護軸,然後自基板 ::c::r" 墊層貼附4備,以黏接劑貼合 Ο ' :、、 膜主it防護_框架,貼緊自臨時框架剝離之賽脫普 之黏接面虹,絲彡======匡架 對防ίί膜固定於防護i膜^在 竿縫隙測置裔測定完成後防護膠膜組件之防替膜框 100« ίτ Ξ; 例2)護膠膜並未產生鬆他及皺摺。 14 1297508 使用外部尺寸474刪x782mmx6· 5mm,厚度7mm,材質為 A7075-T651之齡金製框架作為防護雜框架,使用外部尺寸 800刪x920mmx5mm,厚度5画1,材質為A6061—T651之鋁合金赞 作為防護膠膜框架以外,與實施例i同樣地製作防護膠膜組件:、 於平台以縫隙測量器測定完成後防護膠膜組件之防護膠膜 架向内侧方向之彎曲。兩長邊中央附近為1G〇"m以下,短邊為 25//m以下。同時,防護膠膜並未產生鬆弛及皺摺。 . (比較例1) 使用外邛尺寸474^mx782mmx長邊寬7· 0腿,短邊寬β 〇麵, =5. 5麵’材質為湖52之紹合金製框架作為防護膠膜框竿,使 用外部尺寸800麵x920mmxl2mm,厚度1〇麵,材質為Α6〇61_Τ651 ίίίΐίϊΪ架作為防護膠膜框架以外,與實施例1同樣地製作 架向量之防護膠膜框 央附近^1000_,短邊為/〇_。々_,兩長邊中 包ί以其它條件之實施例以及比較例,彙總於表1。表中變 ΐ無·f曲(變形)。並且,斷面二次矩之單位 膜張力之早位為1G~2N/mm。其餘數值之單位為mm。 15 1297508 表1 --—--- '——~~ 臨時框架之尺寸 斷面二次矩 臨時框 架之變 形量 防護膠膜框架 高度 框架寬 ——. 邊長 ——— 920 -—一 920 膜張力 變形 膜外觀 實施例1 6.0 6 108.0 7.00 0.2 〇 〇 2 5.0 5 52.1 14.50 0.1 〇 〇 3 ---—— 5.5 9 782 —*~~— U36 334.1 —-——-- 698.8 1.20 ---- 2.50 1.1 〇 〇 4 6.3 11 0.5 〇 〇 5 3.0 6 905 108.0 6. 50 0.2 〇 〇 比較例1 10.0 12 920 1,440.0 0.54 2.5 X 〇 2 ------ 4.0 4 920 21.3 35.00 0.0 〇 x(鬆弛) 3 12.0 12 920 1,728.0 0.45 3.0 X 〇 、本發明之防護膠膜組件,係用於半導體微影用,特別適用於 ,晶顯示ϋ製造用之薄膜電晶體電路形成製程及彩色濾光片形成 製程。 【圖式簡單說明】 圖1係表示有關防護膠膜組件整體之立體圖。 圖2係圖1所示防護膠膜組件之侧剖視圖。 圖3係有關習知防護膠膜的問題點之說明圖。 圖4係有關習知樓開防護膠膜之說明圖。 圖5係依據本發明之防護膠膜的撐開方法之說明圖。 圖6係表示有關斷面二次矩與臨時框架變形量之關係的圖 表0 【主要元件符號說明】 16Viscosity =, will be dissolved in CTX809 (Asahi Glass Co., Ltd., the name of the product) dissolved in the sulphur agent. Flunonrt (fluorine inactive liquid) FC_75 (US 3M product is prepared into a concentration of 8% solution. Using a rotary applicator, this solution On the surface of the mirror glass = 850 ΐΜΐχ 1 · ιηηι quartz glass substrate, the thickness of the egg is formed by the use of the epoxy resin adhesive Araldite rapid (Showa high-divided frame on the plate on the plate, then from the substrate:: c ::r" The cushion is attached with 4 preparations, and the adhesive is applied Ο ' :,, the main protection of the membrane is _ frame, and the bonding surface of the Saipu, which is peeled off from the temporary frame, is tied, and the silk is 彡 === ===The truss is fixed to the protective i film. After the measurement of the gap is measured, the protective film module is protected by the film frame 100« ίτ Ξ; Wrinkle. 14 1297508 Use external size 474 to delete x782mmx6·5mm, thickness 7mm, material is A7075-T651 age gold frame as protective miscellaneous frame, use external size 800 delete x920mmx5mm, thickness 5 draw 1, material is A6061-T651 Aluminum alloy is used as a protective film frame, and is produced in the same manner as in the example i. Adhesive film assembly: After the measurement of the platform by the gap measuring device, the protective film frame of the protective film module is bent inward. The vicinity of the center of the two long sides is 1G〇"m or less, and the short side is 25//m. At the same time, the protective film did not produce slack and wrinkles. (Comparative Example 1) The outer 邛 size 474^mx782mmx long side width 7·0 leg, short side width β 〇 face, =5. 5 face 'material The frame made of the alloy of the lake 52 is used as a protective film frame, and the frame vector is produced in the same manner as in the first embodiment except that the outer dimension is 800 faces x920 mm x 12 mm, the thickness is 1 turn, and the material is Α6〇61_Τ651 ί ΐ frame as the protective film frame. The protective film is near the center of the frame ^1000_, the short side is /〇_.々_, the two long sides of the package are based on other conditions of the examples and comparative examples, summarized in Table 1. The table changes ΐ · f ( And the unit position of the second moment of the section is 1G~2N/mm. The remaining values are in mm. 15 1297508 Table 1 ------ '——~~ Temporary frame size Section 2 second moment temporary frame deformation amount protective film frame height frame width -. side length —— 920 - 920 film tension deformation film appearance Example 1 6.0 6 108.0 7.00 0.2 〇〇 2 5.0 5 52.1 14.50 0.1 〇〇 3 --- -- 5.5 9 782 —*~~— U36 334.1 ————— -- 698.8 1.20 ---- 2.50 1.1 〇〇4 6.3 11 0.5 〇〇5 3.0 6 905 108.0 6. 50 0.2 〇〇Comparative example 1 10.0 12 920 1,440.0 0.54 2.5 X 〇2 ------ 4.0 4 920 21.3 35.00 0.0 〇x (relaxation) 3 12.0 12 920 1,728.0 0.45 3.0 X 〇, the protective film module of the invention is used for semiconductor lithography, and is particularly suitable for forming a thin film transistor circuit for crystal display ϋ manufacturing And color filter forming process. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing the entire protective film module. Figure 2 is a side cross-sectional view of the protective film module of Figure 1. Fig. 3 is an explanatory view of a problem concerning a conventional protective film. Fig. 4 is an explanatory view of the protective film of the conventional building. Fig. 5 is an explanatory view showing a distracting method of a protective film according to the present invention. Fig. 6 is a diagram showing the relationship between the second moment of the section and the amount of deformation of the temporary frame. Table 0 [Explanation of main component symbols] 16

Claims (1)

1297508 益 …、 十、申請專利範圍: 1· 一種微影用防護膠臈組件,苴夂 之防護膠膜框架支撐著防,㈣二在π邊長度為咖麵以上 徵為:該防護膠膜係由錢 == 方護膠臈組件,其特 之聚合物構成之 之張力敍於G N/mm,小於物卿成,姻蔓 =種,影用防護膠膜組件之製造方法,其特徵為:將由全 丹=师於基板± M 18()(::以上之溫度加熱絲溶舰 又膠膜雜目辦臨雜帛並域㈣離 膜框架,再移去鱗框架。 讎㈣防雜 、4·如㈣專利範圍第3項之微影肋護膠膜組件之製 ,’其中將該_框架之斷面二次矩調整成使得:在以該^時框 术拉張該防鄉膜之狀態,由於因該防護雜之張力而產生 k形之臨時框架的變形量,致使貼附於該防護膠膜框架後之 力大於0 N/mm,而小於2xl(T2N/mm 〇 、又 5·如申請專利範圍第3或第4項之微影用防護膠膜組件之掣 造方法,其中該臨時框架係選自JIS A5000系、A6〇〇〇系、A7〇G 系中之任一鋁合金所構成,其斷面二次矩之值為5mm4以 3500mm4 以下。 十一、圖式·· 17 1297508 七、 指定代表圖: (一) 本案指定代表圖為:第(5 )圖。 (二) 本代表圖之元件符號簡單說明: 無 八、 本案若有化學式時,請揭示最能顯示發明特徵的化學式: 無1297508 Benefits..., Ten, the scope of application for patents: 1. A protective film assembly for lithography, which is supported by a protective film frame. (4) The length of the π side is more than the coffee surface: the protective film system The structure of the special polymer consisting of the money == square rubber 臈 component is described in GN/mm, which is smaller than the qing cheng, vine vine = species, the manufacturing method of the protective protective film module, which is characterized by: Quandan = division on the substrate ± M 18 () (:: above the temperature to heat the wire-dissolving ship and the film film miscellaneous to do the miscellaneous field (four) from the film frame, and then remove the scale frame. 雠 (four) anti-hetero, 4 · For example, in the fourth section of the patent scope, the lithographic ribbed rubber film assembly is manufactured, wherein the second moment of the section of the frame is adjusted such that the state of the film is stretched by the frame. Due to the deformation amount of the k-shaped temporary frame due to the tension of the protective mismatch, the force attached to the protective film frame is greater than 0 N/mm, and less than 2 x 1 (T2N/mm 〇, 5) The method for manufacturing a protective film assembly for lithography according to the third or fourth aspect of the patent, wherein the temporary frame is selected from the group consisting of JIS It is composed of any of the A5000 series, the A6 tantalum system, and the A7〇G system. The value of the second moment of the section is 5mm4 or less and 3500mm4 or less. XI. Schema·· 17 1297508 VII. Designated representative diagram : (1) The representative representative of the case is: (5). (2) The symbol of the symbol of the representative figure is simple: No. 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
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