1297290 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種基片存放容器的乾式清洗裝置，尤其 係關於使用乾冰粒子對基片存放容器之主體及蓋子分別進 行乾式清洗的基片存放容器的乾式清洗裝置。 【先前技術】 通常，半導體裝置或顯示器裝置藉由使用半導體晶圓或 平板顯示H (FPD : flat panel display)基片經蒸鑛、餘刻、 微影、離子注入等各種製程而製造。 為順利進行上述各種製程半導體晶圓或平板顯示器 不僅在各組之間進行移送，而且亦在同一組中的1297290 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD The present invention relates to a dry cleaning device for a substrate storage container, and more particularly to a substrate for dry cleaning of a main body and a lid of a substrate storage container using dry ice particles. Dry cleaning device for containers. [Prior Art] Generally, a semiconductor device or a display device is manufactured by using a semiconductor wafer or a flat panel display H (FPD: flat panel display) substrate by various processes such as steaming, residual, lithography, ion implantation, and the like. In order to smoothly carry out the above various process semiconductor wafers or flat panel displays, not only transfer between groups, but also in the same group
置之間進行移送。 I :、例^片可藉由自動搬運車（truck)或機器移送臂 來移送。 胃 此種基片在同一扭φ φΑ 4：- ΛΑ σ + 一 、，且中軚紐的距離内可以張為單位進行移 二=距離較長或穩定性要求較高時可以 中進行移送。 ）成日日圓五（咖叫等基片存放容器 作為一例，基片存放交 ^ Μ Λ ^ - σ 中由聚丙烯（P〇1y propylene)材 質構成之容器稱為ρρ·盒。 該包含㈣形成用於存 及安裝在該主體人π處之蓋子。 料工間之主肢 此外即使為微細的雜質戋顆粒，口 面，基月口^負A顆粒，八要破貼附在基片表 面丞月口口貝將顯著降低。 J12971.doc !29729〇 為此，用於存放基片之基片存放容器需要具有高潔淨 度。 因此’基片存放容器在存放基片之前藉由基片存放容器 的清洗裝置進行清洗。 j常’基片存放容諸在該主體及蓋子上處理清洗液之 後精由噴射乾燥空氣使殘留液乾燥的濕式清洗過程進行清 洗。 但是，由於現有的基片存放容器的清洗裝置採用濕式清 洗方式’因此存在需要經由清洗液處理過程及乾燥空氣喷 射過程組成的兩個步驟的不便之處。、 並且，由於現有的基片存放容器的清洗裝置需要分別具 有處理清洗液的裝置及噴射乾燥空氣的裝置，因此存在設 傷體積過大、製作成本上升之缺點。 < 尤其，由於基片存放容器為盒狀，現有的基片存放容器 的清洗裝置很難利用乾燥空氣對其整個内部進行均勻乾 燥，因此存在難以完成精細的清洗過程之問題。 並且，如上所述之聚丙烯材質的基片存放容器，由於在 乾燥過程中被暴露在高溫乾燥空氣中，所以易於變形並因 此細短哥命。 此外，除了該濕式清洗方式以外目前亦存在利用刷子、 超音波或化學藥品等之各種清洗方式。 但疋，上述的清洗方式難以滿足隨著半導體製造技術的 發展而提出之精細的清洗要求。 尤其，最近隨著環保問題日益受重視對清洗方式所提出 1】297】.doc 1297290 之環保要求越來越高，而上述清洗方式難以滿足環保要 求。 最近，曾提出過既能滿足環保要求、又能克服上述清洗 方式中之缺陷的清洗方式。 作為最具代表性的一例，曾提出過將藉由二氧化碳 (c〇2)氣體的相變化產生之乾冰粒子高速撞擊至被清洗物 體的表面，從而清除雜質或顆粒之乾冰清洗方式。 該乾冰清洗方式，由於乾冰粒子在清除被清洗物的污染 物之後被昇華而沒有殘留物，因而比濕式清洗方式更為環 並且’由於該乾冰清洗方式只藉由喷射乾冰粒子的一個 步驟即可完成清洗，因此清洗過程較簡單、設備體積亦可 顯著減小，此有利於提高清潔室之空間利用率，而且由於 J進行微細的清洗過程’因此亦可對難以清除污染粒子的 部分進行清洗。 因^有必要提供使用乾冰粒子清洗基片存放容器的基 片存放容器清洗裝置。 【發明内容】 本务明疋為解決如上所诚門 裎徂“ 1所述之問碭而提出的，其目的在於 徒供一種使用乾冰粒子 的乾式清洗裝置。先基片存放容器之基片存放容器 為貫現上述目的本發明 穿裁美乾式清洗裝置包含用於 滅载基片存放容器之裝# 放容$ >、主邛使用乾冰粒子清洗該基片存 々又谷裔之清洗部以及用 ;P載在该4洗部進行清洗的該基 H2971.doc 1297290 片存放容器之卸載部。 在該結構中’該裝載部 放容器之主體及蓋子裝载至經將該基片存 及蓋子的整個内部分別噴= 4凊洗部向該主體 刀〜T射乾冰粒子， 相同的路徑卸載經清洗 邛按照互不 月凡又邊主體及蓋子。 【實施方式】 以下’參照附隨圖式詳細說 闰1 A ^ ^ &月之最佳貫施例。 圖1為一叙的基片存放一 - „ 貫％例之剖面圖。如®Μ邮 不，該基片存放容器1〇〇包含 Η所 放空間1〇la之主體101、用於開 存放基片的存 l〇la之蓋子102。 -體1〇1的存放空間 圖2為本發明所提供之基片 每/ 仔敌谷态的乾式清洗裝置一 只加例之平面結構示意圖。 如圖2所示’依據本發明所提供 1<暴片存放容器的乾式 月洗裝置之一實施例包含··裝載部 <耿| 2U0，以用於將由主體 101及蓋子102構成之基片存放容器100分離為主體1〇1及蓋 子102而分別按互不相同的路徑進行裝載；清洗部以 用於向由該裝載部200裝載之主體1〇1及蓋子1〇2内部噴射 乾冰粒子進行清洗；卸載部400，以用於將由該清洗部3〇〇 進行清洗之主體101及蓋子〗02按互不相同的路徑進行卸 載0 該裝載部200包含用於裝載基片存放容器ι〇〇的主體ι〇1 之弟裝載部21〇 (211、212)及用於裝載基片存放容器1〇〇 的蓋子102之第二裝載部220。 112971.doc 1297290 此種裝載部200較佳相鄰而設置第一裝載部21〇及第二裝 載部220，以使工作者易於裝載主體1〇1及蓋子Μ〗。 該清洗部300包含用於接收第一裝載部21〇裝載的主體 ιοί，之第一清洗移送部310、用於接收第二裝載部22〇裝載 ^蓋子102之第二清洗移送部32〇及用於分別向主體ι〇ι及 蓋子102内部喷射乾冰粒子之乾式喷射單元33〇。 該卸载部包含用於卸載由清洗部3嶋行清洗的主體 ^之第-卸載部41G及用於#載由清洗部鳩進行清洗的 盍子102之第二卸載部42〇。 該f體101較佳採用-般的搬運狀態，例如以開口朝上 的狀態進行裝載及卸載，如此就不需要 並且，藉由乾式喷射單元330向主體1〇1内 子之後’為使與該乾冰粒子―同清除的雜質依靠重力^ 丁自由降洛’主體101較佳以開口朝 洗部300。 。仅八至，月 气頁射單元330之1 ¥ 間因主體101需要上升至高於最初投入高度之位置。置 因此，為易於投入主體101，裝载 上的狀態裝載之主體1〇1按上下方。=初以開口 悲’並將主體ΠΗ上升至高於最初投 下的 至清洗部300。 门度之位置而裝 進入至開口朝下的主 降落清除雜質。 並且，清洗部300由下至上 部噴射乾冰粒子，以藉由自由 並且’為易於搬出主體 體101内 卸裁部400將自清洗部300 112971.doc -]〇- 1297290 下的狀態搬出之主體I。】按上下方向翻轉為開口 的狀感，並將主體101下降至最初的投 載。 D反進仃卸 “因此’裝載部·及卸載部400上分別設有將在 〜 “述之一對翻轉單元500。 订 圖3為表示本發明所提供之基片存放容器的乾式 置裝載部的本發明-實施例之側面結構示意圖，圖、 示之基片存放容器的乾式清洗裝置裝載二 ^ I月貫轭例之正面結構示意圖。 =子放容器⑽以搬運狀態裝載至該裝載部 主體⑻以開口朝上的狀態投入至第一裝載部21〇(211、 212)，盍子⑽以開口朝下的狀態投人至第二裝載部咖。 並且，如上該，主體101上升至進行清洗作孝所需 :::按，下方向翻轉為開口朝下的狀態，㈣裝載至； 因此’裳载部200上設有翻轉單元5〇〇，以用於提昇並按 上下方向翻轉主體丨〇丨以使主體〗〇丨開口朝下。 机作為—例’在第—裝載部212設置翻轉單元500的區間可 »又置主體監測感測器(未圖示)’以用於監測主體⑻是 入。 因此’當由該主體監測感測器監測到主體ι〇ι時較佳停 止第一裝載部212 ’並由翻轉單元加壓支持而提昇及旋 轉主體101。 4翻轉早兀500包含用於加壓支持主體101兩個側面而進 112971.doc 1297290 行旋轉之加壓旋轉部件5 10及用於升降該加壓旋轉部件5 1 〇 之升降部件520。 該加壓旋轉部件5 10包含在主體1 〇 1的兩個側面相對而設 置之一對加壓襯墊5 11、用於旋轉每一加壓襯墊5 11之一對 驅動部5 12、用於將每一驅動部5 12移送至主體1 〇 1側面並 使加壓襯墊5 11加壓接觸主體1 〇 1側面之一對汽缸5 13。 該加壓襯墊5 11直接連接至驅動部5 12，可以一點支持主 體1 01的一側面，但較佳如圖3所示，以兩點支持主體i 〇! 的一側面，從而穩定地加壓並支持主體丨〇 i。 據此，主體101 —側的各加壓襯墊5丨丨分別結合至設置桿 5 14之兩側’而設置桿514之中央連接驅動部512。 因此，當主體101沿著第一裝載部2丨〇以開口朝上的狀態 到達清洗部300跟前時，加壓襯墊511藉由汽缸513朝主體 1 01之兩個側面突出，從而加壓並支持主體丨〇 i。 如此，由於主體101由加壓襯墊511加壓並支持的狀態下 汽缸513沿著升降部件52〇上升，因而主體1〇1亦一起上 升。同時’驅動部512將設置桿514旋轉18〇度，以使主體 101按上下方向翻轉為開口朝下。 如此，當主體1 〇 1開口差日τ4 Μ θ 1朝下並被棱汁至一定高度時，提 昇笫一裝載部212以支持主，+ 又讨王體1〇1的底面。因此，當由第一 裝載部2 12支持主體1 〇〗昧逢* σ 一 餸Ιϋΐ時翻轉早兀500脫離主體1〇1而下 降。在此狀悲下第一裝截立 衣戰邛212被旋轉驅動，從而將主體 101裝載至清洗部3〇〇之第_清洗移送部31〇。 如上所述，主體1〇1又命 01不而要手動提昇或翻轉，藉由翻轉 112971.doc -12- 1297290 然後被投入至 單元500自動上升或上下翻轉為開口朝下 清洗部300。 裝載部220水平移送至第二清洗 另外，蓋子102沿著第 移送部320。 置提供之基片存放容器的乾式清洗裝 亍：;=Γ明一實施例之側面結構示意圖，圖6為表 以: 基片存放容器的乾式清洗裝置清洗部的 本赉明一貫施例之正面結構示意圖。 在該清洗部主體1〇1及蓋子1〇2以開口朝下的狀態分 至弟一清洗移送部310及第二清洗移送部320。 如此’為向移送至第—清洗移送部31()及第二清洗移送 部320之主體101及蓋子1〇2的整個内部噴射乾冰粒子，清 洗部300在第—清洗移送部31G及第二清洗移送部似的下 側分別設置乾式噴射單元3 3 〇。 _並且，第一清洗移送部310及第二清洗移送部320如圖所 不，在其旋轉軸（shaft)之中央部分被略去的狀態下支持主 體101及蓋子102之邊緣。因此，當各乾式噴射單元33〇向 主體1 01及蓋子102内部喷射乾冰粒子時不會受到干涉。 並且，乾式噴射單元33〇向主體101及蓋子I”内部之互 不相同的多個部位呈輻射狀地喷射乾冰粒子。 尤其，向主體101内部喷射乾冰粒子之乾式喷射單元330 較佳構成為可升降的結構，，從而上升進入至主體1〇1之内 部〇 此種乾式噴射單元3 3 0包含多個乾冰噴嘴3 3 3，該等乾冰 112971.doc -13- 1297290 喷嘴333偏心結合至與驅動軸331相結合的轉板 該4轉板332的旋轉呈輻射狀地噴射乾冰粒子。 根據 主乾二噴嘴_輻射狀地噴射乾冰粒子，因此對 體101及盍子102的整個内部進行乾式清洗。 在^述結構中，乾式喷射單元330亦包含用於向主體ΠΗ 内σ卩贺射乾燥空氣之空氣喷嘴334。 由於主體UU的内部比蓋子102内部深，因此設置空氣喷 嘴334用於防止主體⑻内部存在不能藉由乾冰粒子進行产 洗的部位。 3 即，由各乾冰喷嘴333噴射的&冰粒子藉由由空氣喷嘴 334噴射的乾燥空氣被順利地引導至主體ι〇ι及蓋子Μ〕之 整個内部’從而無遺漏而完整地進行清洗。 在上述結構中，清洗部300亦包含用於向主體1〇1及蓋子 102的外表面加壓喷射乾燥空氣之氣刀34〇。 藉由此種氣刀340對主體101及蓋子1〇2之外表面亦進行 清洗，因而可完全消除因基片存放容器1〇〇引起之基片被 污染的因素。 並且，氣刀340較佳以固定形態設置在第一清洗移送部 310及第二清洗移送部320之入口，以使主體1〇1及蓋子1〇2 在移送的途中被清洗。 在上述結構中，清洗部300設置在外殼3〇1内部，該外毅 3 01亦包含門3 5 0，以用於開閉投入主體1 〇 1之入口或搬出 主體101之出口。 作為一例，門350的上下部可由外殼301引導滑移，並可 112971.doc -14- 1297290 與汽缸（未圖示）等結合進行自動操作。 因^防止在清洗部3⑽進行清洗的過程中產生的顆粒 或雜質流入至裝載部2〇〇或卸載部4〇〇。 並且’亦可在投人主體⑻之人口及搬出主體⑻之出口 處均設置門35〇,從而可對清洗部300進行密封。 在上述結構中’清洗部3〇〇 落的雜質之清除單元360。 ^用於在其内部收集脫 ^此，在清洗㈣〇巾與乾冰粒切行 L:藉由清除單元36°排至外部，…進-步： 元360較佳結合在乾式嘴射單元_下側， ，、乾式喷射早疋一起進行升降。 圖7為表示本發明所提供其 置卸載㈣u 放容11的乾式清洗裝 實施例之侧面結構示意圖，圖8為表 不本發明所提供之基片存放 ^ 本發明一 f# & + 3乾式清洗裝置卸載部的 貫轭例之正面結構示意圖。 在該卸載部400主體1〇1以開口 二卸載部420。 朝下的狀態被搬至第 並且，在將主體101下降至便於搬 高度的同時按上下方向翻轉為開口朝上。體⑻之最初投入 口此，卸載部400上設有翻轉單元5 上下方向翻轉自清洗部3〇〇搬 ’以用於降低並按 上。 土歧101以使其開口朝 112971.doc 15 1297290 此種翻轉單元500與設置在裝載部2〇〇之翻轉單元相同， 因而在此省略其說明。 作為一例’在第一卸載部411設置翻轉單元500的區間可 設置主體監測感測器（未圖示），以用於監測主體i 〇丨是否搬 出。 因此，當由該主體監測感測器監測到主體】0丨時較佳停 止第一卸載部411 ’並由翻轉單元5〇〇加壓支持而降低及旋 轉主體101。 據此，當主體101沿著第一清洗移送部310進行清洗並以 開口朝下的狀態到達第一卸載部411時，加麼襯塾511藉由 汽缸513朝主體101之兩個側面突出’從而加壓並支持主體 101。 如上所述，在由加壓襯墊511加壓並支持主體101的狀能 下降低第—卸载部411。如此，在主體HH由加壓襯塾511 加壓支持而被支擇的狀態下’如果第一却載部4ιι下降至 最初之投人高度’則汽缸513將沿著升降部件⑽下降，因 而主體ΠΗ亦-起下降。同時’驅動部512將設置桿…旋 轉180度’以使主體101按上下方向翻轉為開口朝上。 :二’田主體101在開口朝上的狀態下由第一卸載部4。 支持時’翻轉單元500脫離主體1〇1而上 體ιοί由第一卸載部411進行卸載。 a〜卜 如上所述，主體101不需要 ^ ^ 動降低或翻轉，藉由翻轉 早7L 500自動降低或上下翻轉 初狀態並被搬出。 至最 112971.doc 1297290 另外，蓋子1 02沿著第二卸載部320水平移送而進行卸 載。 此外，裝載部200、清洗部300及卸載部4〇〇上沿著主體 101及蓋子102的移送路徑將設置多個監測感測器（未圖 示）’以用於監測主體101及蓋子102的位置。 雖然，上面藉由附隨圖式描述了本發明特定之優選實施 例，但本發明並非限定於該等實施例，在不脫離本發明技Transfer between settings. I : The film can be transferred by an automatic truck or a machine transfer arm. Stomach This kind of substrate can be transferred in the same twist φ φ Α 4:- ΛΑ σ + one, and the distance between the middle and the new can be moved in units of two. If the distance is long or the stability is high, it can be transferred. As a case of a Japanese yen storage (such as a coffee storage container), a container made of polypropylene (P〇1y propylene) is called a ρρ·box. The inclusion (4) is formed. It is used to store and install the cover at the π of the main body. The main limb of the material room is not only a fine impurity 戋 particles, but also the mouth surface, the base month mouth ^ negative A granules, and the eight pieces are attached to the surface of the substrate. The mouth-mouth can be significantly reduced. J12971.doc !29729〇 For this reason, the substrate storage container for storing the substrate needs to have high cleanliness. Therefore, the substrate storage container is stored in the substrate before the substrate is stored. The cleaning device is cleaned. The j-normal substrate is stored in the wet cleaning process after the cleaning liquid is treated on the main body and the cover, and the residual liquid is dried by spraying dry air. However, due to the existing substrate storage container The cleaning device adopts a wet cleaning method. Therefore, there is an inconvenience that requires two steps consisting of a cleaning liquid treatment process and a dry air injection process. Moreover, due to the existing substrate storage container The washing device needs to have a device for treating the cleaning liquid and a device for spraying the drying air, respectively, and thus has a disadvantage that the wound volume is excessively large and the production cost is increased. In particular, since the substrate storage container is in the shape of a box, the existing substrate storage container is It is difficult for the cleaning device to uniformly dry the entire interior thereof by using dry air, so that there is a problem that it is difficult to complete a fine cleaning process. Moreover, the polypropylene substrate storage container as described above is exposed to high temperature during the drying process. In the dry air, it is easy to deform and therefore has a short life. In addition to the wet cleaning method, there are various cleaning methods using brushes, ultrasonic waves, or chemicals. However, the above cleaning methods are difficult to satisfy. The fine cleaning requirements put forward by the development of semiconductor manufacturing technology. In particular, recently, with the increasing attention to environmental protection issues, the environmental protection requirements of the cleaning method are increasing, and the above cleaning methods are difficult to meet. Environmental requirements. Recently, it has been proposed to meet environmental requirements, A washing method capable of overcoming the defects in the above-described cleaning method. As a most representative example, it has been proposed that high-speed dry ice particles generated by phase change of carbon dioxide (c〇2) gas hit the surface of the object to be cleaned at a high speed. Therefore, the dry ice cleaning method for removing impurities or particles is used. Since the dry ice particles are sublimated after removing the contaminants of the object to be cleaned without residue, they are more ring-shaped than the wet cleaning method and 'because of the dry ice cleaning method Cleaning can be accomplished only by one step of spraying dry ice particles, so the cleaning process is simpler and the equipment volume can be significantly reduced, which is beneficial to improve the space utilization of the clean room, and because of the fine cleaning process of J, It is possible to clean the portion where it is difficult to remove the contaminated particles. It is necessary to provide a substrate storage container cleaning device for cleaning the substrate storage container using dry ice particles. SUMMARY OF THE INVENTION This task is proposed to solve the problem described in the above-mentioned "Shenzhen", the purpose of which is to provide a dry cleaning device using dry ice particles. The substrate storage of the first substrate storage container The container is used for the above purposes. The present invention comprises a device for dismounting a substrate storage container, a container for storing the container, and a cleaning unit for cleaning the substrate with dry ice particles. The unloading portion of the base H2971.doc 1297290 sheet storage container which is carried in the 4 washing portion. In this structure, the main body and the lid of the loading portion are loaded to the substrate and the lid is stored. The entire interior is sprayed separately = 4 凊 wash parts to the main knives ~ T shot dry ice particles, the same path unloaded by cleaning 邛 according to each other and the side of the body and cover. [Embodiment] The following 'refer to the accompanying drawings in detail Say the best example of 闰1 A ^ ^ & month. Figure 1 is a cross-sectional view of a substrate in a sample storage. For example, the substrate storage container 1 includes a main body 101 of the storage space 1〇la, and a cover 102 for opening the storage substrate. - Storage space of the body 1 图 1 Fig. 2 is a plan view showing the structure of a dry cleaning device for each of the substrates of the present invention. As shown in Fig. 2, an embodiment of a dry monthly washing apparatus according to the present invention provides a loading unit <耿| The storage container 100 is separated into the main body 1〇1 and the lid 102 and loaded on different paths. The cleaning unit is configured to spray dry ice particles into the inside of the main body 1〇1 and the cover 1〇2 loaded by the loading unit 200. The unloading unit 400 is configured to unload the main body 101 and the cover 02 cleaned by the cleaning unit 3 according to different paths. The loading unit 200 includes a loading unit for loading the substrate storage container. The body loading unit 21〇 (211, 212) of the main body ι〇1 and the second loading unit 220 of the cover 102 for loading the substrate storage container 1〇〇. 112971.doc 1297290 Such loading portions 200 are preferably adjacent to each other and are provided with a first loading portion 21A and a second loading portion 220 to facilitate loading of the main body 1〇1 and the lid. The cleaning unit 300 includes a main body ιοί for receiving the first loading unit 21〇, a first cleaning transfer unit 310, a second cleaning transfer unit 32 for receiving the second loading unit 22, and a cover 102. The dry spray unit 33 is sprayed with dry ice particles to the inside of the main body ι and the cover 102, respectively. The unloading portion includes a first unloading portion 41G for unloading the main body that is cleaned by the cleaning unit 3, and a second unloading portion 42A for carrying the scorpion 102 cleaned by the cleaning unit 〇. The f body 101 is preferably in a general carrying state, for example, loading and unloading with the opening facing upward, so that it is not required and, after the inner portion of the main body 1 〇1 by the dry spraying unit 330, The particles - the same as the removed impurities rely on gravity ^ Ding free to drop the 'body 101 preferably to open toward the wash 300. . Only eight to, the monthly gas page firing unit 330 of 1 ¥ between the main body 101 needs to rise to a position higher than the initial input height. Therefore, in order to facilitate the input into the main body 101, the main body 1〇1 loaded on the loading state is pressed up and down. = initial opening sorrow' and raising the main body 高于 to the cleaning unit 300 higher than originally dropped. The position of the door is loaded into the main landing with the opening facing down to remove impurities. Further, the cleaning unit 300 ejects the dry ice particles from the lower side to the upper portion, and the main body I is carried out by the state in which the self-cleaning unit 300 112971.doc -] 〇 - 1297290 is freely carried out by the unloading portion 400 in the main body 101. . 】 Flip the shape of the opening in the up and down direction and lower the main body 101 to the initial load. D reverses the loading and unloading. Therefore, the loading unit and the unloading unit 400 are respectively provided with a pair of inverting units 500. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 3 is a side view showing the structure of the dry-mounting portion of the substrate storage container provided by the present invention, and the dry cleaning device of the substrate storage container is loaded with a yoke yoke. The schematic diagram of the front structure. The sub-discharge container (10) is loaded into the loading unit main body (8) in a conveyance state, and is put into the first loading unit 21〇 (211, 212) with the opening facing upward, and the dice (10) is thrown to the second loading with the opening facing downward. Ministry of coffee. Further, as described above, the main body 101 is raised to perform the cleaning and filial need::, the lower direction is reversed to the state in which the opening is downward, and (4) is loaded; therefore, the flipping unit 5 is provided on the skirting unit 200 to It is used to lift and flip the main body 上下 in the up and down direction so that the main body 〇丨 opening is facing down. As an example, the section in which the inverting unit 500 is disposed in the first loading unit 212 can be further provided with a main body monitoring sensor (not shown) for monitoring the main body (8) to enter. Therefore, the first loading portion 212' is preferably stopped when the main body monitoring sensor detects the main body ι〇 and the main body 101 is lifted and rotated by the reversing unit pressurization support. The inverting early 500 includes a pressurizing rotary member 5 10 for pressurizing the two sides of the support main body 101 and rotating the 112971.doc 1297290 row, and a lifting member 520 for elevating and lowering the pressurized rotating member 5 1 . The pressurizing rotary member 510 includes a pair of pressurizing pads 5 11 disposed opposite to both sides of the main body 1 、1, and a pair of driving portions 5 12 for rotating each of the pressurizing pads 5 11 Each of the driving portions 51 is transferred to the side of the main body 1 〇1 and the pressure pad 5 11 is pressurized to contact one of the side faces of the main body 1 〇1 with respect to the cylinder 5 13 . The pressure pad 5 11 is directly connected to the driving portion 5 12 and can support one side of the main body 101 at one point. However, as shown in FIG. 3, one side of the main body i 〇! is supported at two points, thereby stably adding Press and support the main body 丨〇i. Accordingly, the respective pressure pads 5' on the side of the main body 101 are coupled to the both sides of the set rods 514, respectively, and the center of the rods 514 is connected to the driving portion 512. Therefore, when the main body 101 reaches the cleaning portion 300 along the first loading portion 2 with the opening upward, the pressure pad 511 protrudes toward the both sides of the main body 101 by the cylinder 513, thereby pressurizing and Support the main body 丨〇i. Thus, since the main body 101 is pressurized and supported by the pressure pad 511, the cylinder 513 rises along the elevating member 52, and the main body 1〇1 also rises together. At the same time, the driving portion 512 rotates the setting lever 514 by 18 degrees so that the main body 101 is turned upside down so that the opening faces downward. Thus, when the main body 1 〇 1 opening difference τ4 Μ θ 1 faces downward and is ribbed to a certain height, the first loading portion 212 is raised to support the main surface, and the bottom surface of the king body 1 〇 1 is raised. Therefore, when the main body 1 〇 昧 * * σ 餸Ιϋΐ is supported by the first loading portion 2 12, the early 兀 500 is disengaged from the main body 1 〇 1 and descends. In this case, the first loading and unloading placket 212 is rotationally driven to load the main body 101 to the _washing transfer portion 31A of the cleaning unit 3''. As described above, the main body 1〇1 does not have to be manually lifted or flipped, by flipping 112971.doc -12-1297290 and then being thrown into the unit 500 to automatically ascend or flip upside down to the opening-down cleaning unit 300. The loading portion 220 is horizontally transferred to the second cleaning. Further, the cover 102 is along the first transfer portion 320. The dry cleaning device of the substrate storage container provided is:; = the schematic view of the side structure of the embodiment, and the table of Figure 6 is the front view of the consistent embodiment of the cleaning device of the dry cleaning device for the substrate storage container Schematic. The cleaning unit main body 1〇1 and the lid 1〇2 are divided into the cleaning-transfer unit 310 and the second cleaning transfer unit 320 with the opening facing downward. Thus, the dry ice particles are sprayed to the entire interior of the main body 101 and the lid 1〇2 that are transferred to the first cleaning transfer unit 31 () and the second cleaning transfer unit 320, and the cleaning unit 300 is in the first cleaning transfer unit 31G and the second cleaning. The dry spray unit 3 3 〇 is provided on the lower side of the transfer portion. Further, the first cleaning transfer unit 310 and the second cleaning transfer unit 320 support the edges of the main body 101 and the cover 102 in a state where the central portion of the shaft is omitted. Therefore, when the dry spray units 33 are sprayed with dry ice particles toward the inside of the main body 101 and the cover 102, they are not interfered. Further, the dry type ejecting unit 33 radially ejects dry ice particles to a plurality of portions different from each other inside the main body 101 and the lid I. In particular, the dry ejecting unit 330 that ejects dry ice particles into the main body 101 is preferably configured to be The structure of the lifting, and thus rising into the interior of the main body 1〇1, the dry spraying unit 3 3 0 comprises a plurality of dry ice nozzles 3 3 3 , the dry ice 112971.doc -13 - 1297290 nozzle 333 is eccentrically coupled to and driven The rotating plate of the rotating plate 4 of the shaft 331 radially sprays the dry ice particles. The dry ice particles are sprayed radially according to the trunk two nozzles, so that the entire interior of the body 101 and the die 102 is dry cleaned. In the above description, the dry spray unit 330 also includes an air nozzle 334 for blasting dry air into the main body. Since the inside of the main body UU is deeper than the inside of the cover 102, the air nozzle 334 is provided for preventing the main body (8). There is a portion inside which cannot be produced by dry ice particles. 3 That is, the & ice particles sprayed by the respective dry ice nozzles 333 are dried by the dry air sprayed by the air nozzle 334. The entire interior of the main body ι〇ι and the lid Μ is advantageously cleaned. The cleaning unit 300 also includes means for pressurizing the outer surfaces of the main body 1〇1 and the cover 102. The air knife 34 of the dry air is sprayed. The outer surface of the main body 101 and the cover 1〇2 is also cleaned by the air knife 340, so that the substrate caused by the substrate storage container 1〇〇 can be completely eliminated. Further, the air knife 340 is preferably provided in a fixed manner at the entrance of the first cleaning transfer unit 310 and the second cleaning transfer unit 320 so that the main body 1〇1 and the lid 1〇2 are cleaned in the middle of the transfer. In the structure, the cleaning unit 300 is disposed inside the casing 3〇1, and the outer door 301 also includes a door 350 for opening and closing the inlet of the input body 1〇1 or the outlet of the carrying body 101. As an example, the door 350 The upper and lower parts can be guided by the outer casing 301, and can be automatically operated in combination with a cylinder (not shown) or the like. 112. Preventing the inflow of particles or impurities generated during the cleaning of the cleaning unit 3 (10) Loading section 2〇〇 or unloading The carrier portion 4〇〇 can also be provided with a door 35〇 at both the population of the main body (8) and the outlet of the main body (8), so that the cleaning unit 300 can be sealed. In the above configuration, the cleaning unit 3 is collapsed. The impurity removal unit 360. ^ is used to collect the inside of the cleaning, in the cleaning (four) wipes and dry ice particles cut L: by the cleaning unit 36 ° discharged to the outside, ... step-by-step: yuan 360 better combined On the lower side of the dry nozzle unit, the dry jet is lifted and lowered together. Fig. 7 is a side view showing the structure of the dry cleaning device of the unloading (four)u discharge 11 provided by the present invention, and Fig. 8 is a view The substrate storage provided by the present invention is a schematic view of the front structure of the yoke example of the unloading portion of the f# & + 3 dry cleaning device of the present invention. The main body 1〇1 of the unloading unit 400 is opened by the unloading unit 420. The downward state is moved to the second state, and the main body 101 is lowered to the height to facilitate the moving, and the vertical direction is reversed so that the opening faces upward. Initially, the unloading unit 400 is provided with an inverting unit 5 which is turned upside down from the cleaning unit 3 for lowering and pressing. The soil portion 101 has its opening toward 112971.doc 15 1297290. This inverting unit 500 is the same as the inverting unit provided in the loading portion 2, and thus the description thereof is omitted here. As an example, a main body monitoring sensor (not shown) may be provided in a section in which the inverting unit 500 is provided in the first unloading portion 411 for monitoring whether or not the main body i is carried out. Therefore, it is preferable to stop the first unloading portion 411' when the main body monitoring sensor detects the main body "0" and to pressurize and support the reversing unit 101 to lower and rotate the main body 101. According to this, when the main body 101 is washed along the first cleaning transfer portion 310 and reaches the first unloading portion 411 with the opening facing downward, the lining 511 is protruded toward the both sides of the main body 101 by the cylinder 513. The body 101 is pressurized and supported. As described above, the first unloading portion 411 can be lowered while being pressurized by the pressure pad 511 and supporting the main body 101. Thus, in a state where the main body HH is pressurized and supported by the pressurizing lining 511, if the first butt portion 4 is lowered to the initial throwing height, the cylinder 513 will descend along the elevating member (10), and thus the main body ΠΗ also - from the decline. At the same time, the "driving portion 512 rotates the setting lever ... by 180 degrees" so that the main body 101 is turned upside down so that the opening faces upward. The second field main body 101 is separated from the first unloading portion 4 with the opening facing upward. When supported, the flip unit 500 is separated from the main body 1〇1 and the upper unit ιοί is unloaded by the first unloading unit 411. a~ Bu As described above, the main body 101 does not need to be lowered or flipped, and is automatically lowered or flipped up and down by the inversion of 7L 500 early and moved out. Up to 112971.doc 1297290 In addition, the cover 102 is horizontally transferred along the second unloading portion 320 to be unloaded. Further, a plurality of monitoring sensors (not shown) are disposed on the loading unit 200, the cleaning unit 300, and the unloading unit 4 along the transfer path of the main body 101 and the cover 102 for monitoring the main body 101 and the cover 102. position. Although the preferred embodiments of the present invention have been described above with reference to the drawings, the invention is not limited to the embodiments, without departing from the invention.
術思想的範疇内本發明的熟習此項技術者可進行各種變更 及修改。 綜上所述，本發明因為使用乾冰粒子清洗基片存放容 器，所以無被排出之廢棄物。從而具有環保效果。 並且’本發明因為使用乾冰粒子，所以可進行精細的清 洗並使基片存放容器之變形或破損最小，具有延長使用声 命之效果。 並且’本發明與現有的濕式清洗裝置相比清洗製程較簡 單、，因而可使設備大小顯著減小，具有經濟效應。 並且’本發明不需要根據乾冰粒子之噴射方向對基片存 放容器的主體及蓋子進行翻轉，而是按照搬運狀態進行裝 載及卸载，因而具有提高作業效率之效果。 【圖式簡單說明】 圖1為—般的基片存放容器-實施例之剖面圖. =為本發明所提供之基片存放容器的乾式清洗裝置一 貝施例之平面結構示意圖； 圖3為表示本發明所提供之基片存放容器的乾式清洗裝 112971.doc •】7· 1297290 置裝載部的本發明一實施例之側面結構示意圖. 圖4為表示本發明所提供之基片存放容器的· 置裝載部的本發明一實施例之正面結構示意圖；“心、 圖5為表示本發日請提供之基片存放容器的乾 置清洗部的本發明一實施例之側面結構示意圖；’’月/、 圖6為表示本發明所提供之基片存放容器的 置清洗部的本發明—實施例之正面結構示意圖月… 二為表示本發明所提供之基片存放容器的乾式清洗裝 置卸载部的本發明一實施例之側面結構示意圖； 圖8為表示本發明所提供之基片存放容 置卸載部的本發明—實施例之正面結構示意圖；^洗裝 主要符號說明：100為基片存放容器，1〇1為主體，m 為蓋子，200為裝載部，210為第—裝載部，22〇為第二裝 載部’ 300為清洗部’ 310為第一清洗移送部，32〇為第二 清洗移送部，330為乾式噴射單元，333為乾冰噴嘴，说 為空氣噴嘴，340為氣刀（air knife)，35G為門，遍為清除 單元，400為卸載部，410為第一卸载部，42〇為第二却載 部，500為翻轉單元。 【主要元件符號說明】 100 101 101a 102 200 基片存放容器 主體 存放空間 蓋子 裝載部 112971 .doc 18- 1297290 210 211 212 220 300 301 310 320Various changes and modifications can be made by those skilled in the art within the scope of the invention. In summary, the present invention has no waste to be discharged because the dry ice particles are used to clean the substrate storage container. Thereby having an environmentally friendly effect. Further, since the present invention uses dry ice particles, it can perform fine cleaning and minimize deformation or breakage of the substrate storage container, and has an effect of prolonging the use of sound. Moreover, the present invention is simpler in cleaning process than the conventional wet cleaning apparatus, and thus can significantly reduce the size of the apparatus and has an economical effect. Further, the present invention does not require the main body and the lid of the substrate storage container to be reversed in accordance with the ejection direction of the dry ice particles, but is loaded and unloaded in accordance with the conveyance state, thereby having an effect of improving work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view of an embodiment of a substrate storage container. FIG. 1 is a plan view showing a planar structure of a dry cleaning apparatus for a substrate storage container provided by the present invention; A dry cleaning apparatus for a substrate storage container provided by the present invention 112971.doc • 7·1297290 A side view of an embodiment of the present invention in which a loading portion is provided. FIG. 4 is a view showing a substrate storage container provided by the present invention. A schematic diagram of the front structure of an embodiment of the present invention in which the loading portion is placed; "Heart, FIG. 5 is a side view showing an embodiment of the present invention of the dry cleaning portion of the substrate storage container provided on the present day; </ RTI> Fig. 6 is a front view showing the cleaning structure of the substrate storage container of the present invention, which is a front view of the present invention. The second embodiment is a dry cleaning device unloading portion of the substrate storage container provided by the present invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 8 is a front view showing the structure of the present invention according to an embodiment of the present invention for providing a substrate storage and unloading portion according to the present invention; DESCRIPTION OF REFERENCE NUMERALS: 100 is a substrate storage container, 1 is a main body, m is a cover, 200 is a loading portion, 210 is a first loading portion, 22 is a second loading portion '300 is a cleaning portion' 310 is a first cleaning The transfer unit, 32 is the second cleaning transfer unit, 330 is the dry spray unit, 333 is the dry ice nozzle, said to be the air nozzle, 340 is the air knife, 35G is the door, the cleaning unit is used, and 400 is the unloading unit. 410 is the first unloading portion, 42 is the second but the carrying portion, and 500 is the turning unit. [Main component symbol description] 100 101 101a 102 200 substrate storage container main storage space cover loading portion 112971 .doc 18- 1297290 210 211 212 220 300 301 310 320
331 332 333 334 340 350 360 400 410 411 412 420 500 510 511 第一裝載部 第一裝載部 第一裝載部 第二裝載部 清洗部 外殼 第一清洗移送部 第二清洗移送部 乾式喷射單元 驅動軸 轉板 乾冰喷嘴 空氣喷嘴 氣刀 氣刀 清除單元 卸載部 第一卸載部 第一卸載部 第一卸載部 第二卸載部 翻轉單元 加壓旋轉部件 加壓襯墊 112971.doc -19- 1297290 512 驅動部 513 汽缸 514 設置桿 520 升降部件 112971.doc -20331 332 333 334 340 350 360 400 410 411 412 420 500 510 511 First loading part First loading part First loading part Second loading part Cleaning part housing First cleaning transfer part Second cleaning transfer part Dry injection unit Driving shaft rotation Plate dry ice nozzle air nozzle air knife air knife cleaning unit unloading portion first unloading portion first unloading portion first unloading portion second unloading portion inverting unit pressure rotating member pressure pad 112971.doc -19- 1297290 512 drive unit 513 Cylinder 514 setting rod 520 lifting part 112971.doc -20