TWI293404B - - Google Patents
Download PDFInfo
- Publication number
- TWI293404B TWI293404B TW90103922A TW90103922A TWI293404B TW I293404 B TWI293404 B TW I293404B TW 90103922 A TW90103922 A TW 90103922A TW 90103922 A TW90103922 A TW 90103922A TW I293404 B TWI293404 B TW I293404B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- substrate holder
- vacuum
- type
- holder
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims description 217
- 230000005855 radiation Effects 0.000 claims description 28
- 230000004888 barrier function Effects 0.000 claims description 21
- 230000007246 mechanism Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000011159 matrix material Substances 0.000 claims description 5
- 239000012634 fragment Substances 0.000 claims description 3
- 239000011540 sensing material Substances 0.000 claims 1
- 239000002689 soil Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 8
- 238000000059 patterning Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 238000001459 lithography Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 206010028980 Neoplasm Diseases 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW90103922A TWI293404B (enExample) | 2001-02-21 | 2001-02-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW90103922A TWI293404B (enExample) | 2001-02-21 | 2001-02-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI293404B true TWI293404B (enExample) | 2008-02-11 |
Family
ID=45067835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW90103922A TWI293404B (enExample) | 2001-02-21 | 2001-02-21 |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI293404B (enExample) |
-
2001
- 2001-02-21 TW TW90103922A patent/TWI293404B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI446482B (zh) | 靜電鉗微影裝置及製造靜電鉗之方法 | |
| KR100548711B1 (ko) | 리소그래피 장치용 기판 홀더 | |
| TWI326015B (en) | Optical position assessment apparatus and method | |
| US7092231B2 (en) | Chuck, lithographic apparatus and device manufacturing method | |
| US6822730B2 (en) | Substrate holder and device manufacturing method | |
| JP4058405B2 (ja) | デバイス製造方法およびこの方法により製造したデバイス | |
| US7110085B2 (en) | Lithographic apparatus, substrate holder and method of manufacturing | |
| TWI254841B (en) | Lithographic apparatus | |
| CN100510966C (zh) | 光刻投影装置和基底保持器 | |
| EP1431825A1 (en) | Lithographic apparatus, device manufacturing method, and substrate holder | |
| US7019816B2 (en) | Lithographic apparatus, device manufacturing method, and device manufactured thereby | |
| JP4151934B2 (ja) | リソグラフィ投影装置 | |
| JP2005045259A (ja) | リソグラフィ装置、デバイス製造法、及びそれによって製造されるデバイス | |
| JP4754616B2 (ja) | リソグラフィ方法およびキャリア基板 | |
| TWI293404B (enExample) | ||
| TW594445B (en) | Lithographic apparatus and device manufacturing method | |
| TW200307188A (en) | Lithographic apparatus, alignment method and device manufacturing method | |
| JP3940113B2 (ja) | 基板位置合せ方法、コンピュータ・プログラム、デバイス製造方法、およびそれにより製造されたデバイス | |
| EP1136887A2 (en) | Substrate holder for lithographic apparatus | |
| EP1380898A1 (en) | Substrate holder and device manufacturing method | |
| EP1431831B1 (en) | Lithographic apparatus, device manufacturing method and substrate holder | |
| TW200400545A (en) | Scanning projection aligner and aligning method | |
| JPH07201725A (ja) | X線マスク作製装置、該x線マスク作製装置によるx線マスク、および該x線マスクを用いた半導体デバイス作製方法 |