TWI290430B - Scanning electron beam device - Google Patents

Abstract

The invention provides a scanning electron beam device. The scanning electron beam device can adjust the field shifts of scanning signal objectively, correct the corresponding relative positions of a plurality of light sources, and amend at least one of the position shifts among the rotational direction, the X axis direction, and the Y axis direction of the light sources. The scanning electron beam device scans the charged particles two-dimensionally and forms a scanning pattern on the specimen. A mark is disposed on a stage which supports the specimen, and the scanning electron beam device calculates the positional shifts of the coordinates of the stage or that of the scanning light in according to the mark. Hence according to the scanning pattern with marked label on the stage, the scanning electron beam device calculates the rotational direction shifts, and the Y axis direction shifts and the X axis direction shifts among a plurality of light sources. A symbol for scanning electron beam is disposed in each scanning domain of the scanning electron beam of each light source. In according to the positional shifts of the scanning pattern of the symbol, at least one positional shift amount of the rotational direction shifts, the Y axis direction shifts, and the X axis direction shifts of the light sources is obtained in the coordinates of the scanning electron beam.

Description

I29〇435〇ipif IX. DESCRIPTION OF THE INVENTION: 1. Field of the Invention The present invention relates to a scanning electron beam 1 in which a charged particle beam such as an electron beam or an ion beam is subjected to secondary element scanning on a sample and a scanned image is formed. In particular, it relates to a scanning electron beam apparatus having a function of correcting the linearity of a scanned image. [Prior Art] # When the charged particle beam is subjected to the binary scanning on the sample, the sample beam is moved relative to the sample platform in the X-axis direction and the γ-axis direction, and 'normally, one column is moved in the X-axis direction. After obtaining the detection signal, the operation of moving the queue in the direction of the x-axis is reversed, thereby obtaining the i-frame (1) plus the scanning signal. When the coordinate system of the platform and the coordinate system of the scanning electron beam are inconsistent, ▲, the scanning image position and the position of the scanning signal can be obtained. <The positional offset between the material positions (the correction of the field of view of the scanning signal is offset by two vertical offsets, by means of the mark on the sample, the platform (4) is confirmed and set in the sample [": platform The coordinates of the coordinate system and the scanning electron beam are in the second dimension. ^ [The problem to be solved by the invention] Therefore, there is an operation time for the operation tree. 74 In addition, because there is no objective reference, 7 lpif Ι29043β also exists due to the operator. The difference is caused by the correction of the same forest. One: "Two on the side of the sample to obtain the correction value of the self-family test materials will be displaced, so, and therefore each issue with the scanning electron beam. & When it is difficult to find the relative position between the platform sources, it must be 2 positive. The beam spacing or the amount of movement of each control value, etc. When pulling the beam between the beam sources, the following problems exist. , that is, the artificial error of the operation of the operation. The error of the external or partial direction, etc. [invention] The purpose of objectively correcting the above-mentioned problem is to solve the above-mentioned previous problem, so that the offset of the field of view Correction In ==::r The relative position of the beam source is at least the position of the off direction - the position of the electric 3 causes the charged particle beam to be in the coordinate system of the diverticulum of the door 'According to the marking on the platform #円德免屮 position 'And the mark position as the index position, in the coordinate system of the scanned electron beam, according to the sweep of the mark on the platform

Ipif

129〇43Q = Source = offset of the rotation direction of the sub-beam source coordinate system, and multiple γ-axis direction offset or X-axis direction offset. In the scanning electron beam device, the scanning is set in the platform; the scanning electron beam (4) ^ the silly from the east using the paying number, according to the scanning electron beam with the symbol of the symbol of the beam source: Scanning the coordinate system of the electron beam to 鸠ΐ; The correction coefficient is controlled to obtain the correction coefficient 'Using the rotation direction offset to correct the: ^, * 'This can be used to scan the electron beam = between the electron beam sources The source of the beam, by this, the slaves are positive. And/or the offset of the x-axis direction. The symbol for the scanning electron beam includes the inclusion and the level containing the line inclined to the @-up. The inclination of the line in the direction of the ten-turn t The symbol portion of the offset portion of the t-offset and the sign portion of the offset of the shift in the Y-axis direction. , ^ 疋 used to find the X-axis direction deviation f-direction offset can be obtained by using the horizontal symbol 置. Γ-sleeve: The position of the γ-axis of the two ends of the tiger. The two waters of the broom image are obtained from the two electron beam sources. The position of the Y-axis direction of the same part of the tiger Symbol Symbol

Find the Pif offset. Further, the X-sleeve direction shift can be obtained by sweeping two levels of X-ray images from two electron beam sources. The X-axis direction offset of the same part of the platform coordinates of the platform is used in addition to the symbol for the field electron beam, and may have a position symbol for obtaining the position, and the symbol for the second flat s includes the position symbol on the platform. The direction symbol in the direction of the evaluation number. The information of the direction of the coordinate symbol of the platform can be obtained by using the position of the position of the position of the position vector in the scanned image, and the position of the coordinate position of the system can be used as an index, and the position of the position is explored in the scanned image. . The direction symbol of the soil coat can obtain the position symbol. [Effect of the Invention] According to the present invention, multiple corrections can be made. u The relative positional relationship of the % beam source is as small as t, and the direction of rotation of the son beam source, the direction of the X axis, and the number of γ cylinders are small. Directions [Only in the form of a court] The embodiment of the present invention is 闉1 for explaining too ^B0 t, , and Tian Yuming. Scanning electron beam device ", a schematic diagram of the sub-beam arrangement. The electron beam is irradiated onto the sample; the sub-equivalent sub-beam (4) stage 3; by the detector 4, the (4) of the first beam is generated from the sample. Secondary electrons are detected. • The electric wheel scans the <shoot position of the beam on the sample by l29〇4^pif day t = scanning of the beam beam or the movement of the platform. The scanning electron beam device has: a scanning image forming mechanism 5, and the obtained detection signal forms a scanning image; the number of scanned images is 6 'the scanning image of the memory; the positional offset correction: the different mechanism j It calculates the bit based on the obtained gestation image:, "::; Γ: ΐ 机构 8 8, its memory is determined by the positional offset correction system; two: Γ / 尔 out position offset correction coefficient and other parameters ; and the number, = beamlet = obtained position offset correction coefficient or other reference source 2 or flat 3 for drive control. Position offset correction coefficient computer 7 offset correction coefficient calculation mechanism 7a, :, rational: rotation The reference coordinate of the square source 2 (the optical is obtained from the offset with respect to the electron beam offset, and the coefficient of rotation direction is calculated. The Y-axis direction offset correction coefficient is corrected in the correction of the leaves. In the composition of source 2: the calculation of the long time, its offset from the directional offset, and the Y-axis between the exported electron beam sources

Positive coefficient · rig For the obtained offset, which is 耔妗X, and find the power 2: source side =: 7 positive coefficient calculation mechanism 1 Calculate the offset of the offset of the output, - Partial two: Description: Qiao: Set 1 in the flat ~ - seatpost; ί:; In Fig. 2, the mark package: is formed on the second and/or lower end of the platform by using the payout number U and the offset for calculating the position of the platform for obtaining the platform I29〇43fllpif. The mark _2 indicates that the mark is set at the lower end and is the same as the Chinese side; the upper end and the lower end of the symbol 11 are set for each electron beam source 2, and the field: beamlet The symbol 12 is provided between the electron beam sources. The road is scanned in the dry circumference by the sweeping of the illumination beam and the movement of the platform to obtain a scanned image. ® 3_= ~ Fig. 3(b) is an example for explaining the shape of the mark, and the shape of the symbol η. The platform uses the symbol 11 to use the position symbol u ί: :: in the direction of the scan direction, the direction symbol "b:: can not find the position symbol... in the case of .... In the direction of the sign of the direction of the sea, the position symbol can be confirmed. Furthermore, the direction of the bit #轳轳n in Fig. 3(a) exists. The shape is only an example, and the shape and the symbol lib I are taken as an example. 12 of each of the scanning electrons beam 2 of each Xuan face 2 'Sha Na 1 child weight scales, towel Xiao Zuo to find the emperor in the beam source suspected direction shift, γ axis direction shift ^ out of position shift index. The X-axis direction shift or the like The scanning electron beam symbol 12 includes a tilt symbol 12b including a scan and a line containing, for example, a centripetal direction tilt ^1_water. 1"Thousands of I2a The following is a description of the offset of the rotation side I29043Qipif 2, the offset of the axis of the axis, and the offset of the x-axis direction by using the symbol for the scanning electron beam. It is only processed and shifted in the direction of rotation according to the γ-axis direction of both ends of the horizontal symbol 12a. Fig. 4 (a) is a view for explaining the amount of rotation and shifting the direction of rotation. In Figure 4 (a), the rotation of the two + 唬 detection I: the γ axis of the two ends of the wide 12 a "position:: 2 angle: π according to the positional offset of the y-axis direction to calculate the rotation, and The scan obtained in the two electron beam sources is shown in Fig. 2a, which is offset according to the position of the same part in the γ-axis direction. Figure 4(b) is used to illustrate the horizontal axis = In Fig. 4(b), the axial direction of the two electron beam sources corresponds to the offset of the position in the γ-axis direction of the offset number obtained by scanning from each electron beam source. And the γ (four) direction between the electron beam sources is calculated again, and is obtained by the two electron beam sources. The symbol (3) towel is shifted according to the X-axis direction of the two images of the same portion. c) is to use the position offset of σ to find the X-fortunate direction offset. In Figure 4(e), the explicit = oblique sign detects the offset, corresponding to t 〃 4 sub-beams from each electron beam source. The position of the y-axis direction of the tilt symbol 12b of the X-axis of the source is the angle of the two 12b of the scanned image, which is set to be inclined at 45 degrees with respect to the water. When the offset amount of the tilt symbol axis direction is offset from the γ axis/flat symbol 12a, the X-degree is obtained, so that the Y-axis direction offset can be obtained. The offset to the offset is the same angular offset. Offset. The offset is used as the X-axis square uy〇4^lpif. The angle of the tilt symbol 12b can be set to be less than 45 degrees. The x-direction is specific to the corresponding angle=the offset is not the same. The angle is obtained by calculating the offset amount of the offset amount shift based on the offset from the ¥ axis direction, and the offset in the direction of the x-axis direction can be obtained, and the yield in FIG. 4(c) can be obtained. In the master-reference, the thin line shows the mark indicated by the thick line as the right = display, and the axis direction offset of the line (3) (indicated by the solid line) can be used according to the tilt symbol using Figure 5 (8) ~ Figure 5 ( b) : Determined from the offset. The offset and the x-axis direction offset are added 6 (= the offset between the x-axis direction source m and the electron beam source 再; this means that the electron beam is compared and compared with the 'root _ 40 image') The offset a in the Y-axis direction (the map shifted by x==r::=r in the solid line table. The difference between the electron beam source marks and the Y-axis direction according to (4)) And find it. (Using the Μ line table, Fig. 6(8) to Fig. 6(d) are diagrams for explaining the x-direction shift. The electron beam source is shown as a deviation of 4::(γ:: lpif Ι2904δβ, obtained by each electron beam source) The marks of the scanned image are compared, and according to the deviation of the horizontal symbol 12a of the mark in the γ-axis direction: the ratio is determined, and the X-axis direction offset between the electron beam sources is as shown in FIG. 6(d). The respective marks of the scanned image obtained by the respective electron beam sources are compared, and the sub-roots are shifted by the rotation direction according to the offset amount of the oblique sign 12b of the mark in the γ-axis direction. The γ-axis direction shift and the X-cylinder offset are corrected for each positional shift, and the scan map can be corrected. FIG. 7(8)=7(d) is a diagram for explaining the position shift correction and the image shift. Here, the three electron beam paths are used to obtain the state of the scanned image. The four examples show the scanning images with the rotation direction offset. The setting angle of the electron beam source 2 or the irradiation state of the light beam: right cause The original offset' is the scan image of the straight line that is struck in the direction of the scanned image obtained by the rotation: yes, direction shift The horizontal direction of the line is indicated. The evening D is inclined at an angle to the obtained scanned image. The direct ===' is offset by the cutoff of the electron beam source from Fig. 7(c). The axial direction offset is corrected upward =: At this time, there is a case where the γ of the sub-beam source is offset between the electron beam sources, and the long-belt is offset by the wheel direction. The scan circle image obtained by the offset/subbeam green in the μ direction is 15 I29〇430ipif. Fig.: (? indicates the use of the tilt symbol to the sinus of the χ axis. Hunting is offset by the X-axis direction. The offset of the axis direction is determined by the order of the Y-axis direction offset and the X-axis: shift parameter in Fig. 8. The offset and correction are set to the offset (four) parameter. 7' (S2) Scanned image of the mark on the platform. Scanned image of the symbol for the acquired electron beam (S2) #夕进仃才父正, and thus obtained the square 6 S 3 scanning electron beam The symbol is obtained by setting the electronic vertical correction coefficient setting control parameter to make the rotation: the scanned image of the beam (two to beam, thus taking, image:: tracing)行校-~" 枚-系'数(校二=水仪,求=determination of the sub-beam constraint: the μ direction is obtained, the direction of the east control parameter (S8; '., χ axis direction offset correction The system 敖2 pif 12904 chaotic ^ axis direction bias correction is explained, _6 (4) θ ~ ® 18 (c) to explain the yaw axis offset correction. Figure 9 is the Μ 电子 电子 电子 电子 === flowchart. In this case, the original image (the number of electron beam sources is set to Ν) is scanned to scan the image of η, and for the vehicle, the offset is calculated by the rotation direction offset correction. Υ weight n = n+1(S3e) 'for η||Ν ratio) 钹(S3b)~(S3e)Now 1 乂(S3f) 'and reverse the calculation of all electron beam sources by the above ( In the step S3b), the number is positive. 2 points in the horizontal symbol. Figure 1 〇 (a) ', ', / (4) The direction of the specified direction offset, the specified point, specify two levels ^f - no, the 2 end of the horizontal symbol (check No. I), and Specify him == on the upper side of the flat symbol (check No. 2). Again, the picture! ^The figure of the other specified example at the end of the lower side of the paying number specifies the water;:: Checks the two points in the horizontal symbol N〇.2), and finds the number of points in the scanned image. Offset. In addition, the point of the 9疋 point of the axis check No" minus the check Ν〇 2" = the amount of shift is determined by the figure in the figure "(8)~目11(e) The number of points obtained after '.f is not related to the direction of rotation. Figure Ι29048βΐρίί L1,), (b) indicates the range of the pivot and the number of points in a frame. The length of the frame in the X direction is u. Number of examples.

Ly (for example, 3_) x=fm), and the length in the y direction is the number of points. ', there are Px points, y direction has i) y - Therefore, for the horizontal box: the shape should be calculated in the frame direction and the axis direction offset, by making the point privately & Offset factor. The correction coefficient = the length of the frame Y direction / the frame γ direction by the lower ^ rotation direction. For example, when the range of the frame is (47mmx3 square, the length of the length χ is (3520 Χ 68 points) Japanese, mm), the point of the frame is offset, the offset is 2 points under the axis direction情情··1855347-3 (mm) /68 (p〇im) f Figure Η (c) indicates the direction of rotation ^^(Point). The shift direction of the table money is the case of the right rotation ^^ rotation, and the rotation of the U: direction offset is shown in the figure ^. Item 11 (e) is the rotation _ ~ direction offset is the right rotation, and the "right" in the diagram in the figure indicates the rotation left rotation. Furthermore, the above-mentioned number I indicates that the _ direction shift is followed by the shift in the Y-axis direction and the right rotation direction. Fig. 12 is a view for explaining the calculation of the number of electron beams. The calculation (in the flow chart of FIG. 8 , the y-axis direction offset correction coefficient solid-electron beam source (the electron beam source; here, it is determined that the electron beam source m is N as a reference) The order of the correction coefficients corrected by the offset is the axis direction of the electron beam source. 18 pif Ι 2904δΘΐρί The reference electron beam source m is set. Any two of the plurality of electron beam sources can be set as the reference electron beam. For example, when the number of electron beam sources is "7", m = 4 can be set and the fourth rain beam source located at the center can be used as a reference (S6a). i Hereinafter, it is determined adjacent to the reference electron beam source. The Y-axis side of the electron beam source:: and obtain the corrected number of corrections for correcting the shift in the γ-axis direction, and then find the adjacent Thunder hit, the original eve v γ 1 Ί Ί to the reference electron beam source Side sanding/offset and correction factor. Correction for correcting the reference electron beam η to all electron beam source coefficients and γ-axis direction offset. First, source the reference electron beam source m. m — 2, . . . , an electron beam (S6b to S6f) on the side of the garment, which is The electron beam source of the correction coefficient of the Y-axis direction offset obtained by the second time (m+1, m + f quasi-electron beam source is present in the positive side coefficient (S6g to S6k) of the other side. N) is shifted in the Y-axis direction When the school obtains the Y-axis direction offset source m and the electron beam source m~丨夕父 positive coefficient, according to the electron beam horizontal symbol 23⁄4 (S6b) = image designation / use beam symbol offset (S6c) The γ-axis direction offset correction coefficient of the two points specified in the γ-axis direction is specified by the root point (s) (S6e) is calculated as the γ-axis direction offset amount. “ ” Repeats (S6b) to (S6) , m is compared with 0 (S6f), the reference electron beam source step is calculated until m is "〇,,, by this positive coefficient. The Y-axis direction offset of the pen beam source is corrected 19 pif I290434, and then, according to the electron beam source „1 with the electron beam source m, 2 points of the horizontal symbol of the beam symbol for the paste (S6^t曰 offset in the Y-axis direction (S6h). Calculate the γ-axis according to the obtained vehicle=offset amount Direction offset correction coefficient (S6i). Inverse ': 7r+1(S6j), compare (7) with "N" (S6k), calculate the electron beam (4) of the reference electron beam source m+1~N The correction coefficient 偏移 is offset from the γ-axis direction of the beam source, thereby obtaining a correction coefficient for correcting the deviation of all the electron axis directions in the reference electron beam source m. 6. Θ 3(8)® l3(c) A diagram illustrating the shift correction between the electron beam sources. Fig. 13 (a) shows the scanning image of the electron beam source = positional relationship between the symbols used for scanning electron beams, the electron beam sources m and S3, and the scanning electron scanning The image of the symbol for the electron beam is offset in the direction of the x-axis due to the observation of the electron beam source. Here, as shown in Fig. 13 (c): the private symbol of the electron beam, the horizontal symbol of the symbol for the scanning electron beam (indicated by the solid line) ^', 定 = Ν ° · 2, according to the specified point in the "(4) points two again, here, the offset is obtained by checking the point Νο.2 in the figure Expressed in points. ^minus check 14 (bS) HT)V-(c)r'I# ° ® 4 (b) (C) The range of the box and the frame of the renter and indicate the offset of py in the Y direction State a. For example, the two scanned images of the I29O4308iPif electron beam symbol (only one side are shown) are observed and the py is shifted in the Y direction. The length of the frame in the X direction is Lx (for example, 47 mm), the length in the y direction is Ly (for example, 3 mm), the number of points in the X direction is Px, and the number of points in the y direction is Py. In the correspondence with the above-described frame, the offset amount in the Y-axis direction of the horizontal symbol is calculated by the number of points corresponding to the frame, and the offset coefficient in the Y-axis direction is calculated. It can be calculated by the following formula: Y-axis direction offset correction coefficient = offset X frame Y direction length / frame Y direction point / minimum decomposition energy. For example, when the range of a frame is (47 mm >< 3 mm), the number of sampling points in the Y direction of the straight frame is 68, and the offset is -4 points in the Y-axis direction, -44 = -4 (point) x3000 (um) /68 (point) /4 (um). Next, the calculation of the X-axis direction offset correction coefficient will be described. Fig. 15 is a flowchart for explaining calculation of the X-axis direction offset correction coefficient of the electron beam source (S7 in the flowchart of Fig. 8). In addition, when a plurality of electron beam sources (the number of electron beam sources are N) are sequentially obtained, the Y-axis direction shift of the other electron beam sources is determined by using the electron beam source m as a reference. The order of the corrected correction factors. The reference electron beam source m is set. Any of the plurality of electron beam sources can be set as the reference electron beam source. For example, in the case where the number of electron beam sources is "7", m = 4 can be set and the fourth electron beam source located at the center can be used as a reference. (S7a). 129043 gamma pif or less, the offset to the reference electron beam source is obtained, and the X-axis of the source is shifted in the X-axis direction to obtain the X-axis of the adjacent electron beam source = positive The positive coefficient is used to perform the leaf and the correction coefficient on both sides of the reference electron beam source. r 基准 axis of the reference electron beam source ^ First, find the X-axis squared earth of the source (m-b m_2, . . . . . . , 1) in the reference electron beam source m; - the electron side of the square side ~ S7f Then, the reference electron beam source 2 = correction coefficient (the electric quantity (S7g to S7k) in which the γ of the S7b sub-beam source (nrH, m+2, . . . , N) exists on the other side is obtained. The correction of the direction offset is to obtain a scan image of the source m of the correction coefficient of the X-axis direction offset and the electron beam source πΜ: Field: According to the two points of the sub-beam tilt symbol (S7b), find the 曰^^ The offset amount of the field beam symbol (4). The correction coefficient (S7d) is offset from the X-axis direction in the axial direction according to the obtained two points. The 1-direction offset is calculated, m-1 (S7e), The yang fish repeatedly performs (10))~(S7e) step two 饤, (8) η, and the reference electron beam source (5) rA m- is 〇, thereby correcting the coefficient. The Hongzi beam source juice is shifted in the X-axis direction, and it is quite flat. According to the electron beam source m and the electric power, the scanning symbol of the scanning beam is used; the scanned image of the beam source m+1 is broken. At 2 o'clock (S7g), the offset of the 2 points in the y-axis direction is Y-direction (S7h). The x-axis direction offset correction coefficient (S7i) is calculated based on the obtained partial private leaves. 22 I29043sftipii Let m=m+l (S71), compare m with “N” (S7k), and repeat the steps of (S7g)~(S7j) until m is “N”, thereby calculating the reference electron beam source m +Ι~N electron beam source X-axis direction offset correction factor. Thereby, the correction coefficient for correcting the X-axis direction offset of all the electron beam sources in the reference electron beam source m can be calculated. 16(a) to 16(c) are diagrams for explaining the X-axis direction offset correction between electron beam sources. Fig. 14 (a) shows the positional relationship between the electron beam sources m and m-1 and the symbols for scanning electron beams, and Fig. 14 (b) shows the scanned image of the symbols for scanning electron beams. The scanning electron beam of the electron beam source m and the electron beam source m-1 is offset by the X-axis direction of the image of the symbol, and can be regarded as the Y-axis when the oblique symbol is observed at an angle of 45 degrees with respect to the horizontal symbol. Direction offset. Here, as shown in FIG. 16(c), the inspection No. 1 and the inspection No. 2 are designated for the oblique sign of the scanning electron beam symbol (indicated by a solid line), and the number of points in the Y-axis direction according to the designated point is set. Find the offset. Here, the offset is expressed by the number of points obtained by subtracting the point of the inspection No. 2 from the point of the inspection No. 1 in the figure. 17(a) to 17(c) show the relationship between the frame and the X-axis direction offset. 17(b) and 17(c) show an example of the range of a frame and the number of dots in a frame, and shows a state in which px is shifted in the X direction. Figure 17 (a) shows the scanned images of the two scanning electron beam symbols (only one side is shown). When observing, the state of only shifting px in the X direction can be used as the only py (= px) in the Y direction. . The length of the frame in the X direction is Lx (for example, 47 mm), the length in the y direction is 23 129043^81^, and the length is Ly (for example, 3 mm). In the χ direction and the 丄... direction has a dot of ~. In the relationship corresponding to the above-mentioned frame, the offset coefficient of the x-axis direction offset is calculated by the number of points corresponding to the frame. It can be calculated by the following formula: · Flat X-axis direction offset correction coefficient = Offset X frame γ direction length / frame γ square

can. For example, when the range of the - frame is (47 - 3_), and the number of sampling points in the frame = direction is 68, in the Y shape of Y | L, the offset is shifted by 2 points in the axial direction.情 2 2 (): = axis direction offset correction, and χ axis; = offset correction, Y map. Only the correct correction operation sequence Fig. 18 ") indicates the case where the operation processing is performed from left to right according to the offset correction - the rotation direction of the beam source is independent of each electron beam source, and a rotation example is corrected. The rotation direction offset correction of the electron beam source is corrected by the direction offset correction. The sub-beam source can be corrected in any order. (3) The influence is generated, so the electrogram 18 (b) is the center of the Y-axis direction offset electron beam source. For example, the electron beam source is shifted in seven directions. First, the electron beam source of No. 3 on the γ-axis side is sequentially performed on the basis of the reference, and 0.4 is adjacent to the left Ν. .3 offset correction with the axis direction of the Μ electron beam source, and then, the 仃 axis direction offset correction, 24 I29043#iPif rear, Ν〇·2 and ν〇·〗 electron beam 湄 to complete the left electron beam source γ, =仃 axis direction offset correction, and then, at the first time, between the electron beam sources of the reference electric No. 5, the correction is made between the right side of the electron beam source adjacent to the core and the plate 6. Then, after that, the correction of the Y-axis direction of the No. 6 and N〇.7 is corrected, and thus The right electron beam ^ source ^ is offset in the direction of the x-axis, which can correct the offset of the financial direction. The figure shift is corrected. The direction offset correction is the same, 7 cases are 7 cases, and the Y axis is 〇·4 is sequentially performed as the reference = 'X-finance of the electron beam source of the central source _1 to the offset correction 'money line all the electronic 旬上ΐΐ' in the direction, the direction of the axis correction, dream by Rt mark =====求= Μ 'On the position of the present invention, the sub-beam device is in the middle of the brother: Figure 19 is a display example, the display is used for:: using the scanning electron beam with a symbol or the like Correction i The scanned image is displayed on the left screen of Figure 19. You can specify the specific position of the scanned electron beam 4 marker displayed in the image. ^ The coordinate value of the point on the image is displayed on the left side of Figure N. Below the face: After the “Plotl” button, the coordinate value of the i-th correction point will be displayed in the right part of the basin. 'Samely' press the T “P1〇t2” button, the second calibration point seat 25 I29043 〇8iPif value will be displayed in the right part. - The picture on the right side of Figure 19 shows no scanning electron beam symbol 疋^ correction point, below it Considerations for selecting a correction means or the ^ button, and a list indicating the correction matters - * matters at first by selecting a correction content has to Kawasaki [tau], i.e. the correction == μ U () tate adjust, rotation adjustment)

Axis direction offset correction button (Yax k selects Y to select X-axis direction offset correction. Glaze 扪 I), and 'as the selection operation, press 2 (with, "pi〇t2" φ1δ_ α step button, which will And return to the original "up =,, = positive point added record in the list, (10) offset correction, positive coefficient (parameter). Two: == root, the number has been obtained can m = different $ view and display correction System, etc. Again, the state of the graph, ι9, and the state before the acquisition [industry's list of profitable two - part.

^ TFT, etc. Analyzer, scanning electron microscope, and X-ray analysis apparatus [Simplified description of the drawings] 3 2 ί = A schematic diagram of the scanning electron beam apparatus of the present invention. Fig. 3 is a diagram showing the mark of the present invention. (8) is a diagram for explaining an example 26 of the mark shape of the present invention. The figure "4 axis, _this hair and 丫" is used to explain this In the invention, the direction of the yaw axis is offset by the direction shift == 儿明. The rotation of the electron beam source of the present invention is calculated by calculating the rotation of the #W number of the invention. The direction of the deviation, which is a diagram for determining the rotation ij of the present invention. Figure il(e) shows the electron beam source of the diagram in which the frame of the present invention is not offset by the direction of rotation. 14(a) to M(c) are diagrams showing the frame of the present invention. The 7-axis offset correction is the Y-axis direction of the good side of the present invention. Diagram of the relationship between the invention and the electronic

27 I29043#8iPif Figure b is a flow chart for explaining the calculation of the electron beam source offset correction coefficient of the present invention. X-wheel direction Figs. 16(a) to 16(c) are views for explaining the X-axis direction offset correction of the present invention. Fig. 8 (8) to ® M7 (C) between the ten sources are diagrams showing the relationship between the present invention. An X-axis direction shifting FIG. 18(8) to FIG. 18(C) are for explaining the present invention: scanning electron beam apparatus electron beam source platform detector scanning image forming mechanism scanning image memory mechanism 7a offset correction her calculation mechanism 7b · $ directional offset correction wire calculation mechanism ^ shift correction calculation mechanism 8 W-direction offset correction calculation parameter memory mechanism 9 · control mechanism 11 : platform symbol 2 4 6

28 I29043fisipif 1 la : position symbol lib : direction symbol 12 : scanning electron beam symbol 12a : horizontal symbol 12b : oblique symbol 13 : path

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Claims (1)

I29043#pif X. Patent application scope: 1. A scanning electron beam device, which performs a two-dimensional scanning on a 3^ scan to form a scanning image. The electron beam is characterized by: a scanning electron beam device, which supports the sample. The platform is provided with a standard, and the coordinate position of the coordinate system of the flat + scanning electron beam is determined according to the scanned image of the above-mentioned mark and/or the coordinate system of the room is as described in claim 1. The scanning electron beam is provided with a plurality of electron beam sources, and the mark is a scanning electron beam symbol which is disposed in each of the electric scanning ranges, and each of the scanning electron beam symbols is used according to the scanning electron beam: At least in the coordinate system, in the private, γ-axis direction, w-direction offset, any one of the m-directions is offset by the middle of the scanning electron beam amount as described in the second item of the patent range. The symbol has: n 'the - the oblique sign containing the straight line in the above-mentioned scanning direction, the horizontal symbol m, the straight line in the direction of the horizontal symbol, and the scanning current as described in item 3 of the claimed patent scope. The beam device obtains a rotation direction offset based on the Y-axis direction 1 of both ends of the horizontal symbol, and the upper position is offset by two horizontal symbols 30 Ι 2904 δ Θΐ ρ Γ of the scanned image obtained by the two electron beam sources. In the middle, according to the positional offset of the same part of the x-axis direction, the x-axis direction offset is obtained, and in the two oblique symbols of the scanned image obtained by the two electron beam sources, according to the x-axis of the same part The positional shift amount of the direction is obtained by shifting the X-axis direction. The scanning electron beam apparatus of claim 1, wherein the mark is a platform symbol for obtaining a platform coordinate, φ the platform has a symbol , the position symbol that determines the position on the platform, and the direction symbol that determines the direction of the position symbol.