1289887 九、發明說明： 【發明所屬之技術領域】 本發明係有關於一具有一設在自動蝕刻裝置的蝕刻槽 (etching bath)或清洗槽（rinse bath)下端，以從槽盡快排出|虫 5 刻液或清洗液的新結構排水閥（Quick Dump Drain閥：以下 稱爲QDD閥，）的自動餘刻裝置。並且，本發明是有關於 一藉由把多個移動式喷嘴套具備在清洗槽内壁，而有效率 > 的清洗半導體或LCD玻璃基板的清洗槽的自動蝕刻裝置。 1〇 【先前技術】 姓刻#置係在製造半導體或LCD玻璃基板的過程中， 爲了餘刻、清洗、乾燥而廣泛使用的裝置。蝕刻裝置大體 可分爲三種槽，即放入半導體或LCD玻璃基板後利用蝕刻 液進行餘刻的蝕刻槽，用清洗液清洗已蝕刻的半導體或 15 [CD玻璃基板的清洗槽，還有乾燥這些半導體或^LCD玻璃 基板的乾燥槽。 ^ 本發明之發明者先前所開發自動蝕刻裝置已經以中華 民國專利第182202號註冊過。此中華民國專利記述由蝕刻 «()弟快速拋洗槽（苐1 QDR槽：Quick Dump Rinse 20 Bath)(2)、第二快速抛洗槽（第 2qdr 槽：QuickDumpRinse 如比)(3)以及乾燥槽（4)構成蝕刻製程的自動蝕刻裝置。本發 明有關於適用在蝕刻槽（1)以及清洗槽（2，3)的槽排水閥， 並且適用於清洗槽（2，3)上的移動式清洗喷嘴。 5 1289887 51289887 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to an etching bath or a rinse bath provided at an end of an automatic etching apparatus to discharge from a tank as soon as possible. Automatic re-engraving device for the new structure drain valve (Quick Dump Drain valve: hereinafter referred to as QDD valve) for engraving or cleaning fluid. Further, the present invention relates to an automatic etching apparatus for cleaning a cleaning tank of a semiconductor or an LCD glass substrate by providing a plurality of movable nozzle sleeves on the inner wall of the cleaning tank. 1〇 [Prior Art] The surname is a device widely used in the process of manufacturing a semiconductor or LCD glass substrate for the purpose of engraving, cleaning, and drying. The etching device can be roughly divided into three kinds of grooves, that is, an etching groove for etching the etching liquid after inserting a semiconductor or an LCD glass substrate, cleaning the etched semiconductor with a cleaning liquid or 15 [cleaning grooves of the CD glass substrate, and drying these. A drying tank for a semiconductor or LCD glass substrate. The automatic etching apparatus previously developed by the inventors of the present invention has been registered under the Republic of China Patent No. 182202. The Republic of China patent description is made by etching «()QD Quick Dump Rinse 20 Bath) (2), second fast wash tank (2qdr slot: QuickDumpRinse) (3) and The drying tank (4) constitutes an automatic etching device for the etching process. The present invention relates to a tank drain valve suitable for use in the etching tank (1) and the washing tank (2, 3), and is suitable for a mobile washing nozzle on the washing tank (2, 3). 5 1289887 5
10 15 20 ^^槽或清洗槽裏所放人㈣液或清洗液，當触刻製 、王5 “ t程完畢之後，爲了進行下—步製程，把這些藥 液、、^排出。而爲了從槽排出使用過的藥液，至今仍使 :通：的普通閥。gp ’藉由開關通常的閥，以排出在蝕刻 製程或清洗製程中所使用過的藥液。 使用普通閥的傳統蝕刻裝置’因爲排出藥液的時間較 又所以其生產效率降低等。如果能把使用過的藥液快速 並縮短排出所需之時間的話，便能提高生産性或操 作效率。、-並且，由於蝕刻槽排出的蝕刻液或清洗槽排出的清洗 ，含有汗染物（sludge)，目此還需要解決間門的堵住現象或 藥液的漏出問題。 本I月之發明者為了改善如前述的傳統蝕刻裝置槽所 使=的排出閥’開發出能快速排出，且能完全解決藥液的 汙染物造成的閥門堵住現象或藥液的漏出問題 QDD閥。 心 ：/ 爲了利用清洗液清洗完畢餘刻製程的半導體或 IXD玻璃基板’應盡快完善地清洗掉污染物質。爲了實現 此一的清洗目@ ’本發明對清洗槽進行了很多的研究.。 本申請者的前述中華民國專利，記述了餘刻完畢的玻 璃基板係按20個或者25個的方式裝入位於清洗槽内部的卡 匣’再通過固定於清洗槽内部的淋浴裝置所喷灑出之去離 子水（deionized water)，在清洗槽下部設有發散氮氣的多孔 6 1289887 f (心板@ c疋’使用如此的清洗喷並不能有效 清洗。 因此，本發明之發明者開發了-清洗槽，其内部的兩 側面、地板面、以及蓋子内部一共具備四個喷嘴套，各個 5噴嘴往復移動並清洗的移動式清洗喷嘴套以及具備這些的 新型清洗槽。 【發明内容】 .本發明之目的係在提供一具有一種設在蝕刻裝置的蝕 刻槽或清洗槽’以把藥液快速排出之qdd間的自動姓刻裝 10 置。 、 —本發明之另一目的係在提供一具有一種可使蝕刻裝置 的藥液不漏出到閥門外部且安全排出之QDD閥結構的自動 蝕刻裝置。 本發明之另一目的係在提供一具有一種可防止因蝕刻 15裝置所排出之藥液的汙染物而堵住閥門之QDD閥結構的自 動蝕刻裝置。 ί 本發明之另一目的係在提供一種於清洗槽内部設有往 復移動之喷嘴的移動式清洗喷嘴套，以及具備複數個這些 矛夕動式π洗1^嘴套而可提馬清洗效果的新型自動蚀刻裝 20 置。 ^ 本發明之前述目的以及其他目的，可依據下述所説明 之本發明内容據以實現。 本發明之蝕刻槽或清洗槽所使用的QDD閥，其特徵在 於·爲了分別依據凸緣結合，一機體於其上下一體形成一 !289887 • 2部下端部’-位於前述機體内部其周圍依據圓筒型 触、文:ί名封’且依據一軸的往復運動而反復開閉動作的 、次&盍’-依據注人的空氣而往復運動此軸的氣缸，以 及當往復運動此軸時，開閉此皺紋管蓋的一開放空氣注入 口和一關閉空氣注入口。 、、並且，本發明之具備移動式清洗噴嘴之触刻裝置的清 立才曰在决速拋洗槽内部的兩側面、地板面以及蓋子的内 冑-共具備四個噴嘴套，分別附著在各個喷嘴套上的喷嘴 地移動並清洗。前述之噴嘴套包括：一由用三個管構 10成=導官，其兩端並分別固定於清洗槽上的前端固定部和 ,而口疋αΡ， &著韵述導管往復移動的噴嘴器以及一裝 引⑴述之喷^裏’且—起往復移動並喷灑清洗液的 噴嘴。 ，述之噴嘴器包括一位於導管内部且爲了往復移動而 15插入的内部磁鐵套以及一隨著此内部磁鐵套的移動一起移 動，且位於導管外部側及設於喷嘴器内的外部磁鐵套。一 馨喷嘴裝配於其上，通過一氣體注入口之空氣交替注入，使 喷嘴器與裝配於其上之喷嘴一起往復移動。 爲了用喷嘴供應清洗液，喷嘴連接清洗液管。 20 【實施方式】 本發明係有關於設在蝕刻半導體或1^0玻璃基板的蝕 2裝置之蝕刻槽（etchins bath)或清洗槽（rinse bath)的下 端，一可將蝕刻液或清洗液從槽裏盡快排出的QDD閥。 1289887 • 圖2為依據本發明的餘刻裝置之QDD閥的概略剖視 圖，圖3為本發明之設在槽下部之QDD閥的概略性斜視圖。 如圖3所示，本發明之QDD閥可直接連接於槽40下部，其也 可連接在槽下部的排出管（圖中未示）。這些連接方法，任何 5 在本發明所屬的技術領域具備通常知識者均可輕易容易實 施。 本發明之QDD閥爲了依據各個凸緣19結合，在機體131 的上下一體形成頭部12和下端部13，其内部裝配發門部 • 件。在機體11内部放置氣缸18，軸15位於氣缸18的内部並 10 依據注入的壓縮空氣往復地運動。在軸15的端部所形成的 皺紋管蓋14便隨著軸15的往復運動而反復開閉動作。皺紋 管盍14的下部和軸15的上部依據被圓筒型皺紋管3 1密封其 周圍。 把空氣注入到氣缸18内部，而開閉閥門。當經由開放 15 空氣注入口 16而把壓縮空氣注入到氣缸18内時，軸15下降 並打開皺紋管蓋14 ;當經由關閉空氣注入口 π而把壓縮空 φ 氣注入到氣缸内時，軸15上升並關閉皺紋管蓋14。控制將 壓縮空氣經由開放空氣注入口 16或關閉注入口 17而注入到 氣缸18内的控制器系統在此雖然未另外説明或未圖示，但 2〇 是這些控制系統對任何在本發明所屬的技術領域具備通常 知識者，均可輕易實施。 由於提供皺紋管蓋14的下部和軸15上部周圍保護功能 的圓筒型皺紋管3 1對於各種藥液均應具有耐受性，因此， 其係利用如PTFE樹脂的特氟綸樹脂製造。此皺紋管31 —般 1289887 , 炉，丨月沁日修淡)正本 使用風箱（bellows)型的皺紋管。此皺紋管31包住皺紋管蓋 14的下部和軸15上部周圍並密封，可預防蝕刻槽所排出的 蝕刻液或清洗槽所排出的清洗液的漏出，且預防因這些藥 • 液的汙染物流入到閥門内部而造成如閥門故障等的問題。 • 5 QDD閥依據壓縮空氣的注入而瞬間執行其閥門的開閉 動作，把依垂直地位於蝕刻槽或清洗槽底部並待處理的藥 液垂直地排出，因而加快藥液排出的速度。 Γ 亚且，本發明之QDD閥可依據槽的容量加大其大小， 所以本發明之QDD閥可加快藥液的#出速度以縮短所需的 10時間。QDD閥的尺寸大小變化對任何在本發明所屬的技術 - 領域具備通常知識者’均可輕易實施。 、 ，纟發明之QDD閥在槽下部係依垂直方向排％，因此非 常容易排出汙染物，且可預防汗染物堵住閥門或管道的現 象0 15 # 〃設在槽40下部的QDD閥之下端部13利肖凸緣連接於排 出管20 ’使藥液通過並排出到所需的位置。 本發明之QDD閥縮短排出藥液所需的時間並提高操作 二率’且預防因藥液流出到閥門内部或汙染物堵住閥門或 管道的現象。 並且，本發明是有關於當利用清洗槽清洗姓刻製 畢的半導體或者LCD玻璃基板時，可更有效率地清洗。因 此’在清洗槽内部的兩側面、地板面以及蓋子内部妓具 四個移動式清洗喷嘴套，各個喷嘴並往復地移動，ς成— 清洗效果優秀的新結構清洗槽2，3。 20 !289887 圖4為具備本發明之移動式清洗喷嘴的清洗槽之内部 j略斜視圖’圖5為四個移動式噴嘴套設在清洗槽内部的概10 15 20 ^ ^ slot or cleaning tank placed in the (four) liquid or cleaning solution, when the touch system, Wang 5 "t completed, in order to carry out the next step process, these liquids, ^ ^. The used liquid is discharged from the tank, and the conventional valve is still used: gp 'by switching the usual valve to discharge the liquid used in the etching process or the cleaning process. Conventional etching using a common valve The device 'because the time for discharging the chemical solution is lower, so the production efficiency is lowered, etc. If the used chemical solution can be quickly and shortened, the productivity or the operation efficiency can be improved. - And, due to etching The cleaning of the etchant or the cleaning tank discharged from the tank contains a sludge, and it is also necessary to solve the problem of blocking of the door or the leakage of the liquid. The inventors of this month have improved the conventional etching as described above. The discharge valve of the device tank enables the development of a QDD valve that can be quickly discharged and can completely solve the problem of valve blockage or leakage of liquid medicine caused by the contamination of the liquid. Heart: / In order to clean with the cleaning solution Process semiconductors or LCD glass substrates should be thoroughly cleaned of contaminated substances as soon as possible. In order to achieve this cleaning target @ 'The present invention has carried out a lot of research on the cleaning tank. The applicant's aforementioned Republic of China patent, describes the remainder The engraved glass substrate is loaded into the decanized water sprayed in the inside of the cleaning tank by 20 or 25, and then deionized water sprayed by the shower device fixed inside the cleaning tank. Porous 6 1289887 f (heart plate @ c疋' with a dispersing nitrogen gas in the lower portion is not effectively cleaned using such a cleaning spray. Therefore, the inventors of the present invention have developed a cleaning tank having two sides, a floor surface, and A movable cleaning nozzle sleeve having a total of four nozzle sleeves, five nozzles reciprocatingly moving and cleaning, and a novel cleaning tank having the same. SUMMARY OF THE INVENTION The object of the present invention is to provide an etching device. The etching tank or the cleaning tank' is automatically placed in the qdd between the qdds for quickly discharging the liquid medicine. - Another object of the present invention is to provide The invention provides an automatic etching device for a QDD valve structure which can prevent the chemical solution of the etching device from leaking out to the outside of the valve and safely discharged. Another object of the present invention is to provide a chemical liquid having a chemical solution which can be prevented from being discharged by the device. An automatic etching device for blocking a QDD valve structure of a valve. Another object of the present invention is to provide a mobile cleaning nozzle sleeve having a reciprocating nozzle inside a cleaning tank, and having a plurality of these spears The novel automatic etching device 20 can be used to remove the cleaning effect of the horse. The foregoing and other objects of the present invention can be achieved according to the present invention described below. The QDD valve used in the tank or the cleaning tank is characterized in that, in order to respectively be combined with the flange, a body is integrally formed on the upper and lower sides thereof! 289887 • 2 lower end portions - located inside the body body, according to the cylindrical type, Text: ί名封' and the repetitive opening and closing action according to the reciprocating motion of one axis, the second & 盍 '- reciprocating the cylinder of the shaft according to the injection of air, and Reciprocates this axis, this opening and closing of a bellows cover and an open air injection port closing the air inlet. Moreover, the clearing device of the present invention having the movable cleaning nozzle has the four sides of the inside of the speed-reducing washing tank, the floor surface and the inner lid of the lid - a total of four nozzle sleeves are respectively attached to The nozzles on each nozzle sleeve are moved and cleaned. The foregoing nozzle sleeve comprises: a front end fixing portion which is fixed to the cleaning tank by three tube structures 10, and the two ends are respectively fixed to the cleaning tank, and the nozzles are reciprocatingly moved. And a nozzle for squirting (1) and spraying the cleaning liquid. The nozzle assembly includes an inner magnet sleeve that is inserted inside the conduit and that is inserted for reciprocating movement 15 and an outer magnet sleeve that moves along with the movement of the inner magnet sleeve and is located on the outer side of the conduit and in the nozzle. A sleek nozzle is mounted thereon, and air is alternately injected through a gas injection port to reciprocate the nozzle together with the nozzle mounted thereon. In order to supply the cleaning liquid with the nozzle, the nozzle is connected to the cleaning liquid pipe. [Embodiment] The present invention relates to an etching bath or a rinse bath provided in an etching device for etching a semiconductor or a glass substrate, and an etching liquid or a cleaning liquid can be used. The QDD valve is discharged as quickly as possible in the tank. 1289887. Fig. 2 is a schematic cross-sectional view showing a QDD valve of the remnant device according to the present invention, and Fig. 3 is a schematic perspective view of the QDD valve provided in the lower portion of the groove of the present invention. As shown in Fig. 3, the QDD valve of the present invention can be directly connected to the lower portion of the tank 40, which can also be connected to a discharge pipe (not shown) at the lower portion of the tank. These connection methods, any of which can be easily and easily implemented by those having ordinary knowledge in the technical field to which the present invention pertains. In order to combine the respective flanges 19, the QDD valve of the present invention integrally forms the head portion 12 and the lower end portion 13 on the upper and lower sides of the body 131, and the door portion is assembled inside. A cylinder 18 is placed inside the body 11, and the shaft 15 is located inside the cylinder 18 and 10 reciprocally moves in accordance with the injected compressed air. The corrugated tube cover 14 formed at the end of the shaft 15 is repeatedly opened and closed in accordance with the reciprocation of the shaft 15. The lower portion of the corrugated tubular body 14 and the upper portion of the shaft 15 are sealed around the circumference by the cylindrical corrugated tube 3 1 . Air is injected into the interior of the cylinder 18 to open and close the valve. When compressed air is injected into the cylinder 18 via the open 15 air injection port 16, the shaft 15 is lowered and the corrugated pipe cover 14 is opened; when the compressed air φ gas is injected into the cylinder via the closed air injection port π, the shaft 15 Raise and close the corrugated tube cover 14. Controller systems that control the injection of compressed air into the cylinders 18 via the open air injection port 16 or the closed injection port 17 are not otherwise illustrated or illustrated herein, but are any of these control systems to which the present invention pertains. Those with ordinary knowledge in the technical field can easily implement it. Since the cylindrical corrugated tube 31 which provides the protective function of the lower portion of the corrugated tube cover 14 and the upper portion of the shaft 15 is resistant to various chemical liquids, it is made of a Teflon resin such as PTFE resin. This wrinkle tube 31 is generally 1289887, furnace, 丨月沁日修淡) Original Use bellows type corrugated tube. The corrugated tube 31 encloses the lower portion of the corrugated tube cover 14 and the upper portion of the shaft 15 and is sealed, thereby preventing leakage of the etching liquid discharged from the etching tank or the cleaning liquid discharged from the cleaning tank, and preventing contamination due to these medicines and liquids. It flows into the inside of the valve and causes problems such as valve failure. • 5 QDD valve instantaneously performs the opening and closing action of the valve according to the injection of compressed air, and discharges the liquid which is vertically located at the bottom of the etching tank or the cleaning tank and is to be treated, thereby speeding up the discharge of the liquid. Further, the QDD valve of the present invention can be increased in size depending on the capacity of the tank, so that the QDD valve of the present invention can speed up the discharge speed of the liquid medicine to shorten the required time. The dimensional change of the QDD valve can be easily implemented for any person having ordinary knowledge in the art to which the present invention pertains. The QDD valve invented in the lower part of the tank is in the vertical direction, so it is very easy to discharge pollutants and prevent the phenomenon that the sweat stains block the valve or the pipe. 0 15 # 〃 Located at the lower end of the QDD valve at the lower part of the tank 40 The portion 13 is connected to the discharge pipe 20' so that the chemical liquid passes through and is discharged to a desired position. The QDD valve of the present invention shortens the time required to discharge the drug solution and increases the operation rate' and prevents the phenomenon that the drug solution flows out into the valve or the contaminant blocks the valve or the pipe. Further, the present invention relates to a more efficient cleaning when a semiconductor or LCD glass substrate which is surnamed is cleaned by a cleaning tank. Therefore, four movable cleaning nozzle sleeves are provided on both sides of the inside of the cleaning tank, the floor surface, and the inside of the lid, and the respective nozzles are reciprocally moved to form a new structure cleaning tank 2, 3 with excellent cleaning effect. 20!289887 Figure 4 is a perspective view of the inside of the cleaning tank provided with the mobile cleaning nozzle of the present invention. Figure 5 is a schematic view of the four movable nozzles inside the cleaning tank.
、如圖4以及圖5所示，移動式清洗喷嘴套在清洗槽内部 :兩側面、地板面以及蓋子内部一共設置四個移動式噴嘴 套’移動四個噴嘴並清洗LCD玻璃基板。在清洗槽内部的 面之中’未設置喷嘴套的兩側面係與：⑶玻璃基板之側 面平行地排列，所以未設置噴嘴套。 10 15As shown in Fig. 4 and Fig. 5, the movable cleaning nozzle is sleeved inside the cleaning tank: a total of four movable nozzle sleeves are disposed on both sides, the floor surface and the inside of the lid. Four nozzles are moved and the LCD glass substrate is cleaned. Among the faces inside the cleaning tank, the two side faces of the nozzle sleeve are not arranged in parallel with the side surface of the (3) glass substrate, so that no nozzle sleeve is provided. 10 15
20 兄月各個贺嘴套的結構和動作關係。圖ό為除外 依據本發明的噴嘴71的㈣式嘴嘴套5丨的斜視圖，圖7為圖 6的移動式喷嘴套的剖視圖。 其本 '明的移動式喷嘴套51包括一利用三個管構成的導 、,匕一 g 8 1之兩缟分別固定於清洗槽的前端固定部1 〇 J #後而固疋部111，一沿著前述導管往復移動的喷嘴器121 2 A配於刚述喷嘴器121上、且一起往復移動並喷灑清 、/、的噴嘴71。在此僅以移動式喷嘴套51為例說明，因其 餘三個移動式喷嘴套52、Μ、54也都以相同的結構組成f 則逑導管81係由三個管811，812,813構成，此三個管 、，貝通喷嘴器121，而喷嘴器121沿著此三 動。構成導管81的三個管係以如PTFE之具有耐;生： _製造。當然，如喷嘴器、嘴嘴、前端固二= ΓΓΓ有部件也同樣應以具耐藥性的特氣綸樹^ :性此:成導管81的三個請嘴器移動時需保持其 此/、内部較佳插入具sus材質的管。即，爲了保持 11 1289887 導管的剛性，這些導管係為SUS材質的管並於其上面塗佈一 層特氟論樹脂。 在前述之三個管中，管811，813單純具有導引移動喷 嘴器往復移動的功用，但管812不僅具有導引移動喷嘴器往 5 復移動的功用，其亦驅動移動喷嘴器移動。 笞8 12内部插入有内部磁鐵套13 1，且喷嘴器121内亦設 有對應此内部磁鐵套的外部磁鐵套141，隨著前述内部磁鐵 套移動，喷嘴器也一起移動。插入於管812内部的内部磁鐵 鲁套131經由空氣注人口 i 5 ii 6 i交替注人空氣，並帶動喷嘴 10 的移動。 經由空氣注入口 151注入之空氣推動内部磁鐵套131， 再藉由並外部磁鐵套丨4丨的磁力移動喷嘴器。與此相反的 疋，s經由空氣注入口 161注入空氣時，喷嘴器便朝相反方 向移動。即，喷嘴器係以非接觸的方式往復地移動。 15 由於喷嘴71裝配於噴嘴器121，所以當喷嘴器往復移動 夺喷g也起移動並噴灑清洗液。用喷嘴71供應，喷嘴 並連接於清洗液;f61，以提供清洗液。其他的喷嘴套也 分別，接清洗液管，以供應清洗液。清洗液管具有柔軟性 的車人吕並位於槽内部，使其在喷嘴移動時，不會影響清洗 乍業的進行。這些佈置對於在本發明所屬的技術領域具備 通常知識者而言，都可輕易實施。 當清洗完畢時，清洗液經由清洗槽下部的排出孔55排 出至外界。 12 1289887 本發明之清洗槽所使用的清洗液主要為去離子水，但 並不限定於僅可使用去離子水，任何以清洗目而使用的清 洗液都可以使用。 本發明在清洗槽内部的兩側面、地板面，以及蓋子内 5部一共具備四個喷嘴套，纟個喷嘴往復移動並《青洗而最佳 化清洗效果。 本發明的單純變形或者變更係任何在此領域具備通常 知識的人所谷易利用，這些變形或者變更都包括於本發明 ► 的領域裏。 10 前述實施例僅係為了方便說明而舉例而已，本發明所 主張之權利範圍自應以申請專利範圍所述為準，而非僅限 於前述實施例。 【圖式簡單說明】 15 圖1係一自動蝕刻裝置之概略構圖。 圖2係本^ $之自動#刻裝置的急速排水閥的概略剖視圖。 圖3係本U之急速排水閥設在槽下部的概略斜視圖。 圖4係具備本發明之移動式清洗喷嘴的清洗槽内部的概略 斜視圖。 20圖5係四個移動式喷嘴套設在清洗槽内部的概略圖。 圖6係除外本發明之噴嘴的移動式噴嘴套的斜視圖。 圖7係圖6的移動式噴嘴套的剖視圖。 13 1289887 【主要元件符號說明 ] 11 機體 12 頭部 13 下端部 14 皺紋管蓋 15 皺紋管 蓋 16 開放空氣注入口 17 關閉空氣注入口 18 氣缸 19 凸緣 20 排出管 40 槽 81 導管 51， > 52，53，54移動式喷嘴套 101 前端固定部 111 後端固定部 121 喷嘴 器 71 喷嘴 811 ，812 ， 813 管 131 内部磁鐵套 141 外部磁鐵套 151 ，161 空氣注入 π 61 清洗液管 55 排出孔 31 圓筒型 皺紋管20 Brothers and months The structure and action relationship of each mouthpiece. Fig. 7 is a perspective view showing the (four) type mouthpiece cover 5 of the nozzle 71 according to the present invention, and Fig. 7 is a cross-sectional view of the movable nozzle cover of Fig. 6. The movable nozzle sleeve 51 of the present invention comprises a guide tube formed by three tubes, and the two jaws of the first one of the first one are fixed to the front end fixing portion 1 〇J # of the cleaning tank, and the solid portion 111, The nozzles 121 2 A reciprocating along the aforementioned ducts are disposed on the nozzles 71 which are just described on the nozzle 121 and reciprocated together and sprayed. Here, only the movable nozzle sleeve 51 is taken as an example. Since the other three movable nozzle sleeves 52, 52, and 54 are also composed of the same structure, the 逑 duct 81 is composed of three tubes 811, 812, and 813. The tubes, the Beton nozzles 121, and the nozzles 121 move along this three. The three pipings constituting the conduit 81 are made of, for example, PTFE; Of course, if the nozzle, the mouth, the front end, the second part, and the part, the same should be used for the resistance of the special gas tree ^: Sex: the three nozzles of the catheter 81 need to keep this when moving / It is better to insert a tube with a sus material inside. That is, in order to maintain the rigidity of the 11 1289887 catheter, these ducts are made of a SUS material and coated with a layer of special fluorine resin. Among the above three tubes, the tubes 811, 813 simply have the function of guiding the reciprocating movement of the moving nozzle, but the tube 812 not only has the function of guiding the moving nozzle to move, but also drives the moving nozzle to move. An inner magnet sleeve 13 is inserted into the inside of the magazine 8 12, and an outer magnet sleeve 141 corresponding to the inner magnet sleeve is also disposed in the nozzle 121. The nozzle moves together as the inner magnet sleeve moves. The inner magnet sleeve 131 inserted inside the tube 812 alternately injects air through the air injection population i 5 ii 6 i and drives the movement of the nozzle 10. The air injected through the air injection port 151 pushes the inner magnet sleeve 131, and then moves the nozzle by the magnetic force of the outer magnet sleeve 4丨. In contrast to this, when the air is injected through the air injection port 161, the nozzle moves in the opposite direction. That is, the nozzle moves reciprocally in a non-contact manner. Since the nozzle 71 is attached to the nozzle 121, when the nozzle reciprocates, the spray g also moves and sprays the cleaning liquid. It is supplied by a nozzle 71 which is connected to a cleaning liquid; f61 to supply a cleaning liquid. The other nozzle sleeves are also separately connected to the cleaning liquid pipe to supply the cleaning liquid. The cleaning liquid pipe has a softness and is located inside the tank so that it does not affect the cleaning process when the nozzle moves. These arrangements can be easily implemented for those having ordinary knowledge in the technical field to which the present invention pertains. When the cleaning is completed, the cleaning liquid is discharged to the outside through the discharge hole 55 at the lower portion of the cleaning tank. 12 1289887 The cleaning liquid used in the cleaning tank of the present invention is mainly deionized water, but is not limited to the use of only deionized water, and any cleaning liquid used for cleaning purposes can be used. The invention has four nozzle sleeves on both sides of the inside of the cleaning tank, the floor surface, and the five parts in the lid, and one nozzle reciprocates and "washes to optimize the cleaning effect." The simple modifications or variations of the present invention are readily available to anyone skilled in the art, and such variations or modifications are encompassed by the present invention. The foregoing embodiments are merely illustrative for the sake of convenience of description, and the scope of the invention is intended to be limited by the scope of the claims. [Simple description of the drawing] 15 Fig. 1 is a schematic composition of an automatic etching apparatus. Figure 2 is a schematic cross-sectional view of the rapid drain valve of the automatic #刻装置 device of the present invention. Fig. 3 is a schematic perspective view showing the U-speed drain valve of the present invention provided in the lower portion of the groove. Fig. 4 is a schematic perspective view showing the inside of a washing tank provided with the movable cleaning nozzle of the present invention. FIG. 5 is a schematic view showing the arrangement of four movable nozzles inside the cleaning tank. Figure 6 is a perspective view of a movable nozzle sleeve excluding the nozzle of the present invention. Figure 7 is a cross-sectional view of the mobile nozzle sleeve of Figure 6. 13 1289887 [Description of main components] 11 body 12 head 13 lower end 14 corrugated pipe cover 15 corrugated pipe cover 16 open air injection port 17 closed air injection port 18 cylinder 19 flange 20 discharge pipe 40 groove 81 conduit 51, > 52,53,54 mobile nozzle sleeve 101 front end fixing portion 111 rear end fixing portion 121 nozzle nozzle 71 nozzle 811, 812, 813 tube 131 inner magnet sleeve 141 outer magnet sleeve 151, 161 air injection π 61 cleaning liquid tube 55 discharge hole 31 cylindrical corrugated tube
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