TWI289582B - Release film for printed wiring board production - Google Patents

Release film for printed wiring board production Download PDF

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TWI289582B
TWI289582B TW93110773A TW93110773A TWI289582B TW I289582 B TWI289582 B TW I289582B TW 93110773 A TW93110773 A TW 93110773A TW 93110773 A TW93110773 A TW 93110773A TW I289582 B TWI289582 B TW I289582B
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Taiwan
Prior art keywords
film
release film
weight
circuit board
printed circuit
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TW93110773A
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Chinese (zh)
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TW200422349A (en
Inventor
Hiroshi Kamo
Yuuji Kusumi
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Asahi Kasei Chemicals Corp
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Abstract

A release film for the production of printed wiring boards comprises a resin layer (P) comprising at least 50 wt.% polyphenylene ether resin (A). The release film has excellent releasability, is reduced in heat shrinkage, and is less apt to wrinkle printed wiring board products. The release film itself also is less apt to wrinkle. The film has excellent nonfouling properties because it suffers no bleeding. It has low hygroscopicity and excellent conformability. The film is reduced in adhesive overflowing and is excellent in adhesion between film layers and slippage between the films. It is suitable for use in producing printed wiring boards, in particular, flexible printed wiring boards.

Description

1289582 ⑴ 玖、發明說明 【發明所屬之技術領域】 本發明係有關,含有聚亞苯基醚系樹脂組成,脫模性 優越、熱收縮小,難以使印刷基板製品發生皺紋,而且脫 模薄膜本身亦難以產生皺紋,又,由於不發生析出現象之 故,耐污染性優良,且耐吸濕性優異,極適合使用爲製造 印刷基板,尤其是製造可撓性印刷基板之脫模薄膜者。 【先前技術】 在印刷配線基板,可撓性印刷配線基板、多層印刷配 線基板等之製造步驟中,於以預浸料胚或耐熱薄膜介入其 間的鍍銅層壓板或銅箔熱壓縮之際,使用脫模薄膜;又, 在可撓性印刷基板之製造步驟中,於形成電路之可撓性印 刷基板上,以熱硬化型黏著劑熱壓縮黏著覆蓋層薄膜之 際,爲防止覆蓋層薄膜與壓縮熱板黏著,及將單層或多層 的印刷基板同時複數製造之際,爲防止印刷基板相互的間 的黏著,保護印刷基板製品之目的,插入脫模薄膜的方 法,廣爲使用。 近年來,對環境問題及安全性的社會要求高漲,對此 等脫模薄膜之熱壓縮成型的耐熱性,對印刷配線基板(包 含PI、環氧樹脂、環氧黏著劑、銅箔等)及熱壓縮板之 脫模功能,更加上耐吸濕性、剛性、耐污染性,提出強烈 要求;吸濕時,則於熱壓縮之際,產生水蒸氣,成爲起泡 之原因:剛性降低時,較易起皺紋,有操作性不佳之問 -4- (2) 1289582 題;就耐污染性而言,由脫模薄膜析出之有機物或無機物 的成份,做爲附著物複製於印刷基板表面,於其後之電鍍 步驟不能良好進行,必須具備洗淨步驟;依情況而有不 同,對硬碟驅動等高度嫌惡雜質之製品來說,有製品安全 上的大問題。 然而,以往做爲脫模薄膜使用之聚甲基戊烯薄膜,矽 塗佈聚酯薄膜、氟系薄膜等,不能充分滿足對上述之脫模 薄膜所要求的性能;即,聚甲基戊烯薄膜,經熱壓縮、冷 卻時,有由於熱收縮導致在印刷基板上發生皺紋之情況; 或,爲避免發生皺紋,不得不在印刷基板的形狀等下功 夫,而限制形狀及設計之自由度的情況;甚至,在印刷基 板上有少量複製物時,限制印刷基板之用途的情況,不能 稱爲充分滿足;矽塗佈聚酯薄膜,耐熱性不足,而且因矽 之平移恐有損印刷配線基板等製品的品質;氟系薄膜,雖 耐熱性、脫模性優越,但高價,再加上剛性低,有操作性 不佳之問題;雖有交聯樹脂型的脫模薄膜之提案,但剛性 及耐吸濕性並不足夠,且必要有交聯步驟之複雜製程的問 題;(參照專利文獻1〜4 )。 專利文獻1 :美國專利第477720 1號公報 專利文獻2 :專利第27903 3 0號公報 專利文獻3 :特開2003 - 5 3 8 96號公報 專利文獻4 :特開2003 - 1 2829號公報 又,有使用含有以間規聚苯乙烯爲主之薄膜,做爲脫 模薄脫的提案,但皺紋之問題還是不能充分滿足;(參照 -5- 1289582 (3) 專利文獻5〜7 )。 專利文獻5 :特開平1 1 — 3 49703號公報 專利文獻6 :特開2000 — 3 846 1號公報 專利文獻7 :特開200 1 — 24663 5號公報 又,有以脂環式聚烯烴薄膜做爲脫模薄膜之提案,但 從操作性(剛性)及成本之觀點而言,不能稱爲充分滿足 (參照專利文獻8 )。 專利文獻8 :特開200 1 — 23 3 968號公報 又,有以聚醯胺樹脂所成薄膜做爲脫模薄膜之提案, 但從與黏著劑之脫模性而言,不能稱爲充分滿足(參照專 利文獻9 )。 專利文獻9 :特開平6 — 3 1 6032號公報 又,有以聚醚芳香族酮樹脂薄膜做爲脫模薄膜之提 案,但仍然爲結晶性樹脂之故,爲補償熱收縮之問題必要 進行熱處理之步驟,從成本之觀點而言,不能稱爲充分滿 足(參照專利文獻1 〇 )。 專利文獻1〇:特開2003 — 23 6870號公報 在以上之已往的技術中,製造單層系之印刷基板用脫 模薄膜,實際上並無以PPE爲主成份的脫模薄膜;目前 幾乎全部之脫模薄膜,均以結晶性樹脂構成之故,黏著劑 之硬化溫度(以130〜180°C爲主流)大多在其融點與玻璃 轉移溫度之間的範圍,於熱壓縮之加熱與冷卻步驟中,難 以避免因脫模薄膜之熱收縮而起的脫模薄膜本身及印刷基 板製品之皺紋問題。 -6 - (4) 1289582 另一方面,對以聚醯亞胺爲代表之可撓性印刷配線基 板的基底薄膜、熱壓縮板,除要求脫模功能外,更加上追 隨性、黏著劑之溢出的少量度,多層薄膜間之密著力、薄 膜間之滑動性的透明塗料(淸漆);追隨性爲,追隨醯亞 胺薄膜與銅箔之高低差而密著,能緩和熱壓縮之加壓時的 衝擊力之緩衝性者;黏著劑之溢出性爲,在以聚醯醯亞胺 等基底薄膜、覆蓋層薄膜挾住之電路中,於稱爲溢料面之 銅箔露出的孔穴之電極部份,黏著劑因壓縮時之壓力而溢 出的程度之意;此量愈少愈佳;因爲,此溢出性大時,電 極以焊條等將電路連接時,有發生連接不良之情況;又, 要求多層薄膜間之密著力是,由於製品中發生皺紋的問 題,甚至爲黏著表層樹脂與中間層樹脂,必要將第3樹脂 層層壓所導致之薄膜整體的厚度增加,使層壓薄膜之結 構、薄膜製造步驟複雜化的緣故;製品發生皴紋之原因, 料想必是因爲表層樹脂與中間層樹脂之密著力薄弱,以致 於在層間產生空氣層;要求薄膜間之滑動性,是由於滑動 性不佳時,薄膜相互間黏著,而成爲操作效率降低的原因 之故。 可是,雖然有使耐熱性低之樹脂溢入中間層的多層薄 膜,能獲得更高之追隨性的脫模薄膜之提案,但是以下述 之先前技術使追隨性之水平、黏著劑溢出的少量度、多層 薄膜間之層間密著力、及薄膜滑動性,同時達到高標準’ 並不能稱爲充分足夠;(參照專利文獻1 1〜1 6 )。 專利文獻11:特開2000— 263724號公報 1289582 (5) 專利文獻12 :特開2000 — 27205 5號公報 專利文獻13 :特開2003 — 1 772號公報 專利文獻14 :特開2003 - 2460 1 9號公報 專利文獻15 :特開2003 — 276 1 3 9號公報 專利文獻16 :特開200 1 — 3 1 0422號公報 在以上之先前技術中,製造多層系之印刷基板用脫模 薄膜,實際上並無使用以PPE爲主成份之樹脂做爲最外 層,而構成脫模薄膜;薄膜之滑性性、即操作性、或印刷 基板製品之附著物的少量度,並不足夠。 【發明內容】 [發明之揭示] 本發明係能提供,含有聚亞苯基醚系樹脂組成,脫模 性優越,熱收縮小,難以使印刷基板製品發生皺紋,而且 脫模薄膜本身亦難產生皺紋;又,由於不發生析出現象之 故,耐污染性優良,且耐吸濕性優異;然後,追隨性、黏 著劑之溢出少量度、多層薄膜間之密著力、薄膜間之滑性 性優異,極適合使用爲印刷基板,尤其是製造可撓性印刷 基板之脫模薄膜者。 本發明之工作同仁,深入探討達成上述課題之技術, 經不斷硏究的結果發現,含有以聚亞苯基醚系樹脂爲主成 份之樹脂組成物的薄膜,可獲得脫模性、熱收縮性、耐皺 紋性、耐污染性、耐吸濕性、耐熱性、剛性、操作性均極 優越,而且,追隨性、黏著劑之溢出少量度、多層薄膜間 -8- (6) 1289582 之密著力、薄膜間之滑動性優異,極適合使用爲製造可撓 性基板之脫模薄膜,至此充分本發明° 即,本發明之上述目的,藉由提供下述(1)〜(16) 之製造印刷基板用脫模薄膜而達成。 (1 ) 一種合成50重量%以上之(A)聚亞苯基醚系 樹脂的樹脂層(P )所成之製造印刷基板用脫模薄膜。 (2 ) 如上述(1 )記載之製造印刷基板用脫模薄 膜,其中樹脂層(P)更含有,對(A)成份與(B)成份 的合計量1 〇 〇重量份爲〇 · 5〜5 0重量份之(B )液晶聚酯。 (3 ) 如上述(2 )記載之製造印刷基板用脫模薄 膜,其中樹脂層(P)更含有,對(A)成份與(B)成份 的合計量100重量%爲0.1〜10重量份之(C)含有一價、 二價、三價、或四價的金屬元素之化合物。 (4 ) 如上述(3 )記載之製造印刷基板用脫模薄 膜,其中一價、二價、三價、或四價的金屬元素爲,由 Zn元素及Mg元素之至少一種所成者。 (5 ) 如上述(2 )記載之製造印刷基板用脫模薄 膜,其中樹脂層(P )更含有,對(A )成份與(B )成份 的合計量100重量份爲0.1〜5重量份之(D)矽烷化合物 者。 (6 ) 如上述(5 )記載之製造印刷基板用脫膜薄 膜,其中(D)矽烷化合物爲具有胺基者。 (7 ) 如上述(6 )記載之製造印刷基板用脫模薄 膜,其中樹脂層(P)更含有,對(A)成份與(B)成份 -9- 1289582 (7) 的合計量1 〇 〇重量份爲0 ·1〜4重量份之(E )烴系鱲者。 (8 ) 如上述(1 )記載之製造印刷基板用脫模薄 膜,其中具有本質上僅由上述樹脂層(P)所成的單層結 構者。 (9 ) 如上述(1 )記載之製造印刷基板用脫模薄 膜,其中具有由上述樹脂層(P )與含(F )彈性體之層 (Q)所成的多層結構者。 (10) 如上述(9 )記載之製造印刷基板用脫模薄 膜,其中(F )彈性體爲,(G )芳香族乙烯系化合物與 共軛二烯系化合物之嵌段共聚物的部份氫化聚合物者。 (11) 如上述(1 0 )記載之製造印刷基板用脫模薄 膜,其中於(G )成份中,芳香族乙烯系化合物之結合量 爲5〜65重量%者。 (1 2 )如上述(9 )記載之製造印刷基板用脫模薄 膜,其中(F )彈性體爲,(Η )乙烯與乙烯酯系化合物 之共聚物者。 (1 3 )如上述(1 )〜(;[2 )項中任一項記載之製造印 刷基板用脫模薄膜,其係以擠壓管式法成型而得者。 (14) 如上述(1 )〜(1 2 )項中任一項記載之製造 印刷基板用脫模薄膜,其係以Τ型模頭擠壓法成型而得 者。 (1 5 ) 如上述(1 )〜(1 2 )項中任一項記載之製造 印刷基板用脫模薄膜’其中最外層的薄膜表面與水滴之接 觸角爲80度以上者。 -10- 1289582 (8) (16 ) 如上述(1 )〜(1 2 )項中任一項記載之製造 印刷基板用脫模薄膜,其中印刷基板爲可撓性印刷基板 者0 [用以實施發明之最佳型態] · 就本發明具體的說明如下。 本發明之(A)聚亞苯基醚系樹脂,爲由下述(式 1 )之重覆單位結構所成,係對比粘度(0.5g/d < ,氯仿 馨 溶液,於30°C測定)爲〇·15〜l.Od < /g之範圍的均聚物及 /或共聚物者;對比粘度以 〇·20〜0.70d </g之範圍更適 合;以0.40〜0.60之範圍最理想。1289582 (1) Technical Field of the Invention The present invention relates to a polyphenylene ether-based resin composition, which has excellent mold release property, small heat shrinkage, difficulty in wrinkles of a printed substrate product, and a release film itself. It is also difficult to produce wrinkles, and since it does not cause precipitation, it has excellent stain resistance and is excellent in moisture absorption resistance, and is extremely suitable for use as a release film for producing a printed substrate, particularly a flexible printed substrate. [Prior Art] In the manufacturing steps of a printed wiring board, a flexible printed wiring board, and a multilayer printed wiring board, when a copper-clad laminate or a copper foil interposed between a prepreg or a heat-resistant film is thermally compressed, A release film is used; and in the manufacturing step of the flexible printed circuit board, the cover film is prevented from being thermally compressed by a thermosetting adhesive on the flexible printed circuit board forming the circuit. When a compression hot plate is adhered and a single or multi-layer printed substrate is simultaneously manufactured in plural, a method of inserting a release film for the purpose of preventing adhesion between printed substrates and protecting printed circuit boards is widely used. In recent years, the social requirements for environmental problems and safety have increased, and the heat resistance of the thermal compression molding of the release film to the printed wiring board (including PI, epoxy resin, epoxy adhesive, copper foil, etc.) The mold release function of the hot compression plate is more resistant to moisture absorption, rigidity and pollution resistance. When moisture absorption occurs, water vapor is generated during hot compression, which causes foaming: when the rigidity is lowered, Wrinkle-prone, operability is poor -4- (2) 1289582; in terms of pollution resistance, the organic or inorganic component precipitated from the release film is attached as a deposit on the surface of the printed substrate. The subsequent electroplating step cannot be carried out well, and it is necessary to have a washing step; depending on the situation, there is a big problem in product safety for products such as hard disk drives which are highly suspected of impurities. However, conventionally, a polymethylpentene film used as a release film, a ruthenium-coated polyester film, a fluorine-based film, or the like cannot sufficiently satisfy the properties required for the above-mentioned release film; that is, polymethylpentene When the film is thermally compressed and cooled, wrinkles may occur on the printed substrate due to heat shrinkage; or, in order to avoid wrinkles, it is necessary to work on the shape of the printed substrate, and the degree of freedom in shape and design is limited. Even when there is a small amount of copy on the printed substrate, the use of the printed circuit board is limited, and it cannot be said that it is sufficiently satisfied; the polyester film is coated, the heat resistance is insufficient, and the printed wiring board is damaged due to the translation of the film. The quality of the product; the fluorine-based film, although superior in heat resistance and mold release, but high in price, coupled with low rigidity, has poor handleability; although there is a proposal for cross-linking resin-type release film, rigidity and resistance The wetness is not sufficient, and it is necessary to have a problem of a complicated process of the crosslinking step; (refer to Patent Documents 1 to 4). Patent Document 1: U.S. Patent No. 4,770, 720, Patent Document 2: Patent No. 27,903,300, Patent Document 3: JP-A-2003-53, No. There is a proposal to use a film containing syndiotactic polystyrene as a release mold, but the problem of wrinkles cannot be sufficiently satisfied (see -5-1289582 (3) Patent Documents 5 to 7). Patent Document 5: Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. It is a proposal of a release film, but it cannot be said to fully satisfy from the viewpoint of operability (rigidity) and cost (refer patent document 8). Patent Document 8: JP-A No. 200 1 - 23 3 968. Further, there is a proposal that a film made of a polyamide resin is used as a release film, but it cannot be said to be sufficiently satisfied from the release property with an adhesive. (Refer to Patent Document 9). Further, a polyether aromatic ketone resin film is proposed as a release film, but it is still a crystalline resin, and heat treatment is required to compensate for heat shrinkage. The step is not sufficiently satisfied from the viewpoint of cost (refer to Patent Document 1). In the above-mentioned prior art, a single-layer release film for a printed circuit board is produced, and practically, there is no release film containing PPE as a main component; The release film is composed of a crystalline resin, and the curing temperature of the adhesive (mainly 130 to 180 ° C is mostly in the range between the melting point and the glass transition temperature), heating and cooling in the thermal compression. In the step, it is difficult to avoid the problem of wrinkles of the release film itself and the printed substrate product due to heat shrinkage of the release film. -6 - (4) 1289582 On the other hand, in addition to the demolding function, the base film and the hot-compressed plate of the flexible printed wiring board represented by polyimine are more likely to follow-up and the overflow of the adhesive. A small amount of transparency, the adhesion between the layers of the film, the slidability of the film between the transparent coating (lacquer); follow-up, following the height difference between the yttrium imide film and the copper foil, can ease the compression of hot compression The cushioning force of the impact force; the overflow property of the adhesive is an electrode of a hole exposed by a copper foil called a flash surface in a circuit in which a base film such as polyimide or a cover film is caught In part, the extent to which the adhesive overflows due to the pressure during compression; the smaller the amount, the better; because, when the overflow is large, when the electrodes are connected by electrodes such as electrodes, connection failure occurs; It is required that the adhesion between the multilayer films is due to the problem of wrinkles in the product, even the adhesion of the surface resin and the intermediate layer resin, and it is necessary to increase the thickness of the entire film caused by laminating the third resin layer, so that the structure of the laminated film ,thin The reason why the film manufacturing step is complicated; the reason why the product is creped is presumably because the adhesion between the surface resin and the intermediate layer resin is weak, so that an air layer is generated between the layers; the slidability between the films is required because the slidability is not At a good time, the films adhere to each other and cause a decrease in operational efficiency. However, although there is a proposal to release a multilayer film having a low heat resistance resin into the intermediate layer, a release film having a higher followability can be obtained, but the level of the followability and the small amount of the adhesive overflow by the prior art described below. The interlayer adhesion between the multilayer films and the film slidability while achieving a high standard 'is not sufficiently sufficient; (refer to Patent Documents 1 1 to 16). Patent Document 11: JP-A-2000-263724, No. 1,128,582 (5) Patent Document 12: JP-A-2000- 27205 No. 5, Patent Document 13: JP-A-2003-172, Patent Document 14: JP-A-2003 - 2460 1 9 In the above prior art, a multilayer release film for a printed circuit board is actually produced, in particular, in the above prior art. A resin having a PPE-based component is not used as the outermost layer to constitute a release film; the slipperiness of the film, that is, the workability, or the small amount of the attached matter of the printed substrate product, is not sufficient. [Disclosure of the Invention] The present invention provides a composition containing a polyphenylene ether-based resin, which has excellent mold release property, small heat shrinkage, difficulty in wrinkles of a printed substrate product, and difficulty in producing a release film itself. Wrinkles; also, because it does not cause precipitation, it has excellent stain resistance and excellent moisture absorption resistance; and then, followability, a small amount of adhesion of the adhesive, adhesion between the multilayer films, and excellent slip properties between the films, It is very suitable for use as a printed substrate, especially a release film for manufacturing a flexible printed substrate. In the work of the present invention, the technique for achieving the above-mentioned problems is intensively examined. As a result of continuous investigation, it has been found that a film containing a resin composition containing a polyphenylene ether-based resin as a main component can obtain mold release property and heat shrinkage property. , wrinkle resistance, stain resistance, moisture absorption resistance, heat resistance, rigidity, and operability are excellent, and followability, a small amount of adhesion of the adhesive, and the adhesion of the multilayer film -8-(6) 1289582, The slidability between the films is excellent, and it is very suitable to use a release film for producing a flexible substrate. Thus, the present invention is at least the object of the present invention, and the printed substrate is manufactured by providing the following (1) to (16). This is achieved with a release film. (1) A release film for producing a printed circuit board comprising a resin layer (P) of 50% by weight or more of (A) a polyphenylene ether-based resin. (2) The release film for a printed circuit board according to the above (1), wherein the resin layer (P) is further contained, and the total amount of the component (A) and the component (B) is 1 〇〇 by weight. 50 parts by weight of (B) liquid crystal polyester. (3) The release film for a printed circuit board according to the above (2), wherein the resin layer (P) further contains 100% by weight of the total amount of the component (A) and the component (B) in an amount of 0.1 to 10 parts by weight. (C) A compound containing a monovalent, divalent, trivalent, or tetravalent metal element. (4) The release film for a printed circuit board according to the above (3), wherein the monovalent, divalent, trivalent or tetravalent metal element is composed of at least one of a Zn element and a Mg element. (5) The release film for a printed circuit board according to the above (2), wherein the resin layer (P) is further contained, and the total amount of the component (A) and the component (B) is 0.1 to 5 parts by weight. (D) decane compounds. (6) The release film for a printed circuit board according to the above (5), wherein the (D) decane compound is an amine group. (7) The release film for a printed circuit board according to the above (6), wherein the resin layer (P) further contains a total amount of the component (A) and the component (B)-9-9589582 (7). The (E) hydrocarbon system is in an amount of from 0. 1 to 4 parts by weight. (8) The release film for producing a printed circuit board according to the above (1), which has a single layer structure which is substantially only composed of the above resin layer (P). (9) The release film for a printed circuit board according to the above (1), which has a multilayer structure composed of the resin layer (P) and the layer (Q) containing the (F) elastomer. (10) The release film for a printed circuit board according to the above (9), wherein the (F) elastomer is a partially hydrogenated block copolymer of (G) an aromatic vinyl compound and a conjugated diene compound; Polymer. (11) The release film for a printed circuit board according to the above (10), wherein the amount of the aromatic vinyl compound in the component (G) is 5 to 65% by weight. (1) The release film for a printed circuit board according to the above (9), wherein the (F) elastomer is a copolymer of (?) ethylene and a vinyl ester compound. (1) The release film for producing a printed circuit board according to any one of the items (1) to (2), which is obtained by a squeeze tube method. (14) The release film for producing a printed circuit board according to any one of the items (1) to (1), which is obtained by a die-die extrusion method. (1) The release film for a printed circuit board according to any one of the above-mentioned items (1) to (1), wherein the contact angle between the surface of the outermost film and the water droplets is 80 degrees or more. The release film for a printed circuit board according to any one of the above-mentioned items (1) to (1), wherein the printed circuit board is a flexible printed circuit board. BEST MODE FOR CARRYING OUT THE INVENTION] The present invention is specifically described below. The (A) polyphenylene ether-based resin of the present invention is a repeating unit structure of the following (Formula 1), and is a comparative viscosity (0.5 g/d < chloroform solution, measured at 30 ° C). Is a homopolymer and/or a copolymer of 〇·15~l.Od </g; the comparative viscosity is more suitable in the range of 〇·20~0.70d </g; in the range of 0.40~0.60 The most ideal.

(式中,R!,R4爲分別獨立之氫原子,伯類或仲類 之低級烷基、苯基、胺基烷基、烴氧基;R2、R3爲分別 獨立之氫原子、伯類或仲類之低級烷基、苯基。) 此聚亞苯基醚系樹脂之具體例有、聚(2,6 一 一甲基 一 1,4一亞苯基醚)、聚(2—甲基一6-乙基一 1,4一亞 苯基醚)、聚(2 —甲基一 6 —苯基一 1,4一亞苯基醚) 聚(2,6—二氯一 1,4一亞苯基醚)等等;進而’有2 ό一二甲基苯酚與其他之苯酚類(例如,2,3,6一二甲基 -11 - (9) 1289582 苯、2—甲基一 6—丁基苯酚)的共聚物等之聚亞苯基醚共 聚物;其中以聚(2,6—二甲基一 1,4一亞苯基醚)、 2’ 6—二甲基苯酚與2,3,6-三甲基苯酚之共聚物較爲 適合,以聚(2,6—二甲基—1,4一亞苯基醚)最理想。 本發明所使用(A)聚亞苯基醚的製造方法之例,有 使用美國專利第3 3 06 8 74號說明書上記載之亞酮鹽與胺的 配位化合物做爲催化劑,使2,6 -二甲苯酚氧化聚合之 方法者。 美國專利第 3 3 06875 號、第 3 2 5 73 7號、及第 3 25 73 5 8號之說明書、特公昭52 — 1 7 8 8 0號及特開昭50 — 5 1 197號、以及特開昭63 — 1 5262 8號之各公報上記載的 方法,亦適合做爲(A)聚亞苯基醚的製造方法。 本發明之(A)聚亞苯基醚系樹脂,可直接使用聚合 步驟後之粉末者;亦可使用以擠壓機等,在氮氣大氣下或 非氮氣大氣下,去揮發物或非去揮發物下,熔融混煉而顆 粒化者。 本發明之(A)聚亞苯基醚系樹脂,亦包含以各種二 烯新和物功能化之聚亞苯基醚;各種之二烯新和物有,例 如馬來酸酐、馬來酸、富馬酸、苯基馬來酸酐縮亞胺、衣 康酸、丙烯酸、(甲基)丙烯酸、甲基丙烯酸酯、環氧丙 基(甲基)丙烯酸酯、環氧丙基丙烯酸酯、環氧丙基(甲 基)丙烯酸酯、十八(烷)基丙烯酸酯、苯乙烯等之化合 物;而且,此等二烯新和物功能化之方法,於游離基產生 劑的存在下或非存在下,使用擠壓機等,在去揮發物或非 -12- 1289582 (10) 去揮發物下之熔融狀態功能化亦可;或游離基產生劑之存 在下或非存在下,非熔融狀態,即在室溫以上而且融點以 下之溫度範圍功能化亦可;此時,聚亞苯基醚久融點爲, 以在差示熱掃描型熱量計之測定中,使用2 〇 C /分鐘升溫 日寸’觀測所得溫度一^熱流重圖表之尖峰的尖峰頂溫度爲定 義,尖峰頂之溫度爲複數時’以其中之最高溫度爲定義。 本發明之(A)聚亞苯基醚樹脂,係聚亞苯基醚樹脂 單獨、或聚亞苯基醚樹脂與芳香族乙烯系聚合之混合物, 且亦包含混合其他之樹脂者;芳香族乙嫌系聚合物有,例 如無規聚苯乙儲、局衝擊聚苯乙儲、間規聚苯乙儲、丙_ 臆一本乙嫌共聚物等寺,使用聚亞苯基酸與芳香族乙嫌系 聚合物時,對聚亞苯基醚樹脂與芳香族乙烯系聚合物之合 計量,聚亞苯基醚樹脂之含量爲60重量%以上,以7〇重 纛%以更適合,以80重量%以上最理想。 本發明之(B )液晶聚酯,係稱爲熱互變液晶聚合之 聚酯,可使用眾所周知者;例如以對-羥基安息香酸及聚 對苯二甲酸乙二醇酯爲主構成單位之熱互變液晶聚酯,以 對-羥基安息香酸與2 -羥基- 6-萘甲酸爲主構成單位 之熱互變液晶聚酯,以對-羥基安息酸與4,4, 一二羥基 聯苯與對苯二甲酸爲主構成單位之熱互變液晶聚酯等等, 沒有特別的限制;本發明中使用之(B )液晶聚酯,以使 用下述結構單位(a) 、 (b)及因應需求之(c)及/或 (d)所成者,較爲適合。 •13- (11) 1289582 ^(~〇~~CO-)~ …⑻(wherein R, R4 are each independently a hydrogen atom, a lower alkyl group of a primary or secondary type, a phenyl group, an aminoalkyl group, a hydrocarbyloxy group; and R2 and R3 are each independently a hydrogen atom, a primary or A secondary alkyl group or a phenyl group.) Specific examples of the polyphenylene ether resin include poly(2,6-monomethyl-1,4-phenylene ether) and poly(2-methyl group). a 6-ethyl-1,4-1,4-phenylene ether), poly(2-methyl-6-phenyl-1,4-phenylene ether) poly(2,6-dichloro- 1,4- Phenylene ether) and the like; further 'with 2 dimethyl dimethyl phenol and other phenols (for example, 2,3,6-dimethyl-11 - (9) 1289582 benzene, 2-methyl- 6 a polyphenylene ether copolymer such as a copolymer of butyl phenol; wherein poly(2,6-dimethyl-1,4-phenylene ether), 2'6-dimethylphenol and 2 The copolymer of 3,6-trimethylphenol is more suitable, and poly(2,6-dimethyl-1,4-phenylene ether) is most preferable. As an example of the method for producing (A) polyphenylene ether used in the present invention, a coordination compound of a ketone salt and an amine described in the specification of U.S. Patent No. 3 3 06 8 74 is used as a catalyst to make 2,6 - Method for oxidative polymerization of xylenol. US Patent Nos. 3 3 06875, 3 2 5 73 7 , and 3 25 73 5 8 , special public Zhao 52 — 1 7 8 8 0 and special opening 50 — 5 1 197, and special The method described in each of the publications of Kai-Zhi 63- 1 5262 No. 8 is also suitable as a method for producing (A) polyphenylene ether. The (A) polyphenylene ether resin of the present invention may be directly used as a powder after the polymerization step; or may be used as an extruder, etc., under a nitrogen atmosphere or a non-nitrogen atmosphere, to be volatile or non-volatile. Under the material, melt and knead and granulate. The (A) polyphenylene ether-based resin of the present invention also contains a polyphenylene ether functionalized with various diene novels; various diene novels such as maleic anhydride, maleic acid, Fumaric acid, phenyl maleic anhydride, itaconic acid, itaconic acid, acrylic acid, (meth)acrylic acid, methacrylic acid ester, epoxypropyl (meth) acrylate, epoxy acrylate, epoxy a compound of propyl (meth) acrylate, octadecyl acrylate, styrene or the like; and, in addition, a method of functionalizing such diene novels in the presence or absence of a radical generator , using an extruder or the like, functionalizing in a molten state under de-volatiles or non--12-1289582 (10) de-volatiles; or in the presence or absence of a free-radical generating agent, in a non-melting state, ie The temperature range above room temperature and below the melting point can be functionalized; at this time, the long-term melting point of the polyphenylene ether is, in the measurement of the differential thermal scanning calorimeter, the temperature is increased by 2 〇C / min. Inch 'observed temperature—the peak temperature of the peak of the heat flow weight chart is fixed Meaning, when the temperature of the peak is plural, the definition is based on the highest temperature. The (A) polyphenylene ether resin of the present invention is a polyphenylene ether resin alone or a mixture of a polyphenylene ether resin and an aromatic vinyl polymer, and also includes a mixture of other resins; The suspected polymer has, for example, a random polystyrene storage, a local impact polyphenylene storage, a syndiotactic polystyrene storage, a propylene, a bismuth copolymer, and the like, using polyphenylene acid and aromatic B. In the case of a polymer, the total amount of the polyphenylene ether resin and the aromatic vinyl polymer is 60% by weight or more, more preferably 7% by weight, more preferably 80%. More than weight% is most desirable. The (B) liquid crystal polyester of the present invention is a polyester which is referred to as a thermoremutation liquid crystal polymerization, and can be used as known; for example, heat of a main unit of p-hydroxybenzoic acid and polyethylene terephthalate Interconverting liquid crystal polyester, which is composed of p-hydroxybenzoic acid and 2-hydroxy-6-naphthoic acid as the main unit of thermal interconverting liquid crystal polyester, with p-hydroxybenzoic acid and 4,4, dihydroxybiphenyl The thermal interconversion liquid crystal polyester or the like which is a main constituent unit of terephthalic acid is not particularly limited; the (B) liquid crystal polyester used in the present invention is used in the following structural units (a), (b) and Those who are required by (c) and/or (d) are more suitable. •13- (11) 1289582 ^(~〇~~CO-)~ ...(8)

-(~0 X 〇—^- …⑸ c—x——co^ …⑹ 結構單位(a ) 、( b )分別爲由對一羥基安息香酸生 成之聚酯的結構單位,與由2 -羥基- 6 -萘甲酸生成之 結構單位;使用結構單位(a ) 、 ( b )可獲得優越的耐熱 性、流動性、剛性等機械特性之平衡的優異之本發明熱塑 性樹脂組成物;上述結構單位(c ) 、( d )中之X,可分 別由下述(式2 )中任意選擇一種或兩種以上。 -14- (12) 1289582-(~0 X 〇—^- ...(5) c—x—co^ (6) The structural units (a) and (b) are the structural units of the polyester formed by p-hydroxybenzoic acid, respectively, and the 2-hydroxyl group. a structural unit derived from 6-naphthoic acid; using the structural unit (a), (b) an excellent thermoplastic resin composition of the present invention which is excellent in balance of mechanical properties such as heat resistance, fluidity, rigidity, etc.; X) and X in (d) may be arbitrarily selected from one or more of the following (Formula 2). -14- (12) 1289582

X : -H〇)--0^〇>- [n爲1〜6之整數) 〔Y爲鹵原子、院基、芳基〕X : -H〇)--0^〇>- [n is an integer of 1 to 6) [Y is a halogen atom, a hospital group, an aryl group]

—^〇>-CH2h^)——^〇>-CH2h^)—

(式2) 結構式(C )中之適合者爲,由乙二醇、對苯二酣、 4,4’一二羥基聯苯、2,6-二羥基萘、雙酚A分別生成 之結構單位;更適合的爲乙二醇、4,4’ 一二羥基聯苯、 對苯二酚;以乙二醇、4,4’ —二羥基聯苯最理想;結構 鲁 式(d)中之適合者爲,對苯二甲酸、異苯二甲酸、2,6 -二羧基萘分別生成之結構單位;以對苯二甲酸、異苯二 甲酸更佳。 _ 結構式(c )及結構式(d ),可使用上述結構單位之 . 至少一種或兩種以上倂用;具體的說,兩種以上倂用時, 結構式(c )中可爲①由乙二醇生成之結構單位/由對苯 二酚生成之結構單位,②由乙二醇生成之結構單位/由 4,4’ —二羥基聯苯生成之結構單位,③由對苯二酚生 -15- 1289582 (13) 成之結構單位/由4,4 ’ -二羥基聯苯生成之結構單位等 等。 又,結構式(d )中可①由對苯二甲酸生成之結構單 位/由異苯二甲酸生成之結構單位,②由對苯二甲酸生成 之結構單位/由2,6 —二竣基萘生成之結構單位等等; 對苯二甲酸之量爲二成份中的40重量%以上較爲適合, 以6 0重量%以上更佳,以8 0重量%以上特別理想;對苯 二甲酸之量爲二成份中的4 0重量%以上’可成爲流動 性、耐熱性較爲良好之樹脂組成物;液晶聚酯(B )成份 中,結構單位(a ) 、 ( b ) 、 ( c ) 、( d )之使用比例, 沒有特別的限制;但是,結構單位(c )與(d )基本上爲 等莫耳量。 又,由結構單位(c ) 、 ( d )所成之結構單位 (e ),亦可做爲(B )成份中之結構單位使用;具體的可 爲①由乙二醇與對苯二甲酸生成之結構單位’②由對苯二 酚與對苯二甲酸生成之結構單位,③由4 ’ 4 ’ 一二羥基聯 苯與對苯二甲酸生成之結構單位,④由4,4’ —二經基聯 苯與異苯二甲酸生成之結構單位,⑤由雙酚A與對苯二 甲酸生成之結構單位等等。 -f—Ο ——X —-0 CO —X —c ο 十.·⑹ 本發明之(Β )液晶聚酯成份中,因應需求,在不損 -16- 1289582 (14) 及本發明之特徵與效果’且少量的範圍內,可以引進由其 他之芳香族羧類、芳香族二醇、芳香族羥基羧酸生成之結 構單位;本發明之(B )成份,在熔融時顯示液晶狀態的 開始溫度(以下稱爲液晶開始溫度),以1 5 0〜3 5 0 °C較爲 適合,以180〜3 20 °C更佳;液晶開始溫度在此範圍時,所 得樹脂製薄片中,黑色雜質甚少,極爲理想。 本發明之(C)含有一價、二、三價或四價之金屬元 素的化合物,爲含有金屬之無機化合物或有機化合物者; 本發明之(C)成份係,本質上以金屬元素爲主要構成成 份的化合物;(C )成份中’ 一價〜四價之金屬元素的具 體例有,Li、Na、K、Zn、Ca、Sn、Cu、Ni、Pd、Co、 Fe、Ru、Mn、Pb、Mg、Ca、Sr、Ba、A1、Ti、Ge、Sb 等 等,其中以 Z η、M g、T i、P b、C d、S n、S b、N i、A1、G e 等元素較爲適合,以Zn、Mg、Ti等元素更佳;從樹脂層 (P)中之(A)成份與(B)成份不剝離、大幅度提高薄 膜之靭性的觀點而言,一價〜四價之金屬元素以Zn元素及 /或Mg元素最爲程想。(Formula 2) Suitable structures in the structural formula (C) are those formed from ethylene glycol, p-benzoquinone, 4,4'-dihydroxybiphenyl, 2,6-dihydroxynaphthalene, and bisphenol A, respectively. Unit; more suitable are ethylene glycol, 4,4'-dihydroxybiphenyl, hydroquinone; ideal for ethylene glycol, 4,4'-dihydroxybiphenyl; structure in formula (d) Suitable for structural units of terephthalic acid, isophthalic acid and 2,6-dicarboxynaphthalene, respectively; and terephthalic acid and isophthalic acid are more preferred. _ Structural formula (c) and structural formula (d), which may be used in at least one or two or more of the above structural units; specifically, when two or more kinds are used, the structural formula (c) may be 1 Structural unit derived from ethylene glycol / structural unit derived from hydroquinone, 2 structural unit derived from ethylene glycol / structural unit derived from 4,4'-dihydroxybiphenyl, 3 derived from hydroquinone -15- 1289582 (13) Structure unit / structural unit formed by 4,4 '-dihydroxybiphenyl, etc. Further, in the structural formula (d), a structural unit derived from terephthalic acid/structural unit derived from isophthalic acid, 2 a structural unit derived from terephthalic acid, and 2,6-didecylnaphthalene The structural unit to be produced, etc.; the amount of terephthalic acid is preferably 40% by weight or more of the two components, more preferably 60% by weight or more, and particularly preferably 80% by weight or more; It is a resin composition which is 40% by weight or more of the two components and which is excellent in fluidity and heat resistance; in the liquid crystal polyester (B) component, structural units (a), (b), (c), The proportion of use of d) is not particularly limited; however, the structural units (c) and (d) are substantially equal to the molar amount. Further, the structural unit (e) formed by the structural units (c) and (d) may also be used as a structural unit in the component (B); specifically, it may be formed from ethylene glycol and terephthalic acid. The structural unit '2 is a structural unit derived from hydroquinone and terephthalic acid, 3 is a structural unit formed from 4 ' 4 ' dihydroxybiphenyl and terephthalic acid, and 4 is 4, 4' - two The structural unit of phenyl and isophthalic acid, 5 the structural unit formed by bisphenol A and terephthalic acid, and the like. -f - Ο - X - - 0 CO - X - c ο 十. (6) In the (Β) liquid crystal polyester composition of the present invention, it is not damaged in the sense of the requirements of the invention - 16 - 1289582 (14) and the characteristics of the present invention In the range of a small amount and effect, a structural unit derived from another aromatic carboxylic acid, an aromatic diol, or an aromatic hydroxycarboxylic acid can be introduced; and the component (B) of the present invention exhibits a liquid crystal state at the time of melting. The temperature (hereinafter referred to as the liquid crystal onset temperature) is preferably 1 500 to 350 ° C, more preferably 180 to 3 20 ° C; when the liquid crystal onset temperature is within this range, black impurities are obtained in the obtained resin sheet. Very few, extremely ideal. (C) A compound containing a monovalent, divalent, trivalent or tetravalent metal element, which is a metal-containing inorganic compound or an organic compound; (C) component of the present invention, which is essentially a metal element a compound constituting a component; (C) a specific example of a monovalent to tetravalent metal element, Li, Na, K, Zn, Ca, Sn, Cu, Ni, Pd, Co, Fe, Ru, Mn, Pb, Mg, Ca, Sr, Ba, A1, Ti, Ge, Sb, etc., wherein Z η, M g, T i, P b, C d, S n , S b, N i, A1, G e The elements are more suitable, and elements such as Zn, Mg, and Ti are more preferable; from the viewpoint that the (A) component and the (B) component in the resin layer (P) are not peeled off, and the toughness of the film is greatly improved, one price ~ The tetravalent metal element is most desirable for Zn and/or Mg.

(C)含有〜價〜四價之金屬元素的化合物之具體 例,期望爲上述屬元素之氧化物、氫氧化物、烷氧基鹽、 脂肪族殘酸鹽、醋酸鹽等;進而,適合之氧化物有, ZnO、MgO、Ti〇4、Ti〇2、PbO、CdO、SnO、SbO、 Sb203、NiO、Al2〇3、GeO等等;又,適合之氫氧化物 有,Zn(OH) 2、Mg(0H) 2、Ti(OH) 4、Ti(OH) 2、 Pb(OH) 2、Ca(〇H) 2、Sn(OH) 2、Sb(OH) 2、SB 1289582 (15) (OH) 3、Ni(OH) 2、Al(OH) 3、Ge(OH) 2 等等; 又,適合的烷氧基鹽有,Ti (異丙氧基)4、Ti(正丁氧 基)4等等;又,適合的脂肪族羧酸鹽有,硬脂酸鋅、硬 脂酸鎂、硬脂酸鈦、硬脂酸鉛、硬脂酸鎘、硬脂酸錫、硬 脂酸銻、硬脂酸鎳、硬脂酸鋁、硬脂酸鍺等等;其中特別 適合之具體例有,ZnO、Mg ( OH ) 2、Ti (異丙氧基)4、 Ti (正丁氧基)4、醋酸鋅、硬脂酸鋅、硬脂酸鋁等等; 從(A )成份與(B )成份間之層不剝離的觀點而言,以 ZnO、Mg(OH) 2最爲適合;又,此等(C)成份,在不 損及本發明之效果的範圍,含雜質亦可。 本發明之(D )矽烷化合物,爲含功能基之矽烷化合 物;係含有至少一種選自胺基、脲基、環氧基、異氰酸酯 基、及毓基所成群之功能基的矽烷化合物者;含有功能基 之矽烷化合物,通常分子中含有此等功能基之任一種均 可,依情況而有所不同,分子中含有兩個以上之功能基者 亦佳;又,本發明中所使用之矽烷化合物,通常爲分子中 含有上述之功能基的烷氧基矽烷者;含功能基之矽烷化合 物的具體例有,r -胺基丙基三甲氧基矽烷、r -胺基丙 基三乙氧基矽烷、7 -胺基丙基甲基二甲氧基矽烷、N — (冷一胺基乙基)一 7 -胺基丙基三甲氧基矽烷、N -(/3 —胺基乙基)—7 —胺基丙基甲基二甲氧基矽烷、7 -苯基- r -胺基丙基三甲氧基矽烷等之含胺基矽烷化合 物;r 一脲基丙基三甲氧基矽烷、r 一脲基丙基甲基三甲 氧基矽烷、r -脲基丙基三乙氧基矽烷、r -脲基丙基甲 -18- 1289582 (16) 基三乙氧基矽烷、r 一(2-脲基乙基)胺基丙基二甲氧 基矽烷等之含脲基矽烷化合物;r-環氧丙氧基丙基三甲 氧基矽烷、r 一環氧丙氧基丙基二甲基甲氧基矽烷、7 一 環氧丙氧基丙基三乙氧基矽烷、r 一環氧丙氧基丙基甲基 二乙氧基矽烷、石一(3,4 —環氧環己基)乙基三甲氧基 矽烷、石一(3,4一環氧基己基)乙基三乙氧基矽烷等之 含環氧基矽烷化合物;r -異氰酸酯丙基三甲氧基砂院、 7 -異氰酸酯丙基甲基二甲氧基矽烷、r 一異氰酸酯丙基 三乙氧基矽烷、r 一異氰酸酯丙基甲基二乙氧基矽烷、r -異氰酸酯丙基乙基二甲氧基矽烷、r 一異氰酸酯丙基乙 基二乙氧基矽烷、r -異氰酸酯丙基三氯矽烷等之含異氰 酸酯基矽烷化合物;r -酼基丙基甲基二甲氧基矽烷、r -疏基丙基三乙氧基砂院、7 -疏基丙基乙基一乙氧基石夕 烷、r -锍基丙基甲基二乙氧基矽烷、Θ —锍基乙基三甲 氧基矽烷、yS —锍基乙基三乙氧基矽烷、/5 -锍基乙基二 甲氧基矽烷等之含锍基矽烷化合物,等等;從薄膜之靭性 的觀,及從(A )成份與(B )成份間之層不剝離的觀點 而言,以含胺基之矽烷化合物較爲適合;即,以7 -胺基 丙基三甲氧基矽烷、r -胺基丙基三乙氧基矽烷、7 -胺 基丙基甲基二甲氧基矽烷、n-(/3 —胺基乙基)一 r — 胺基丙基三甲氧基矽烷、n-—胺基乙基)一 7 一胺 基丙基甲基二甲氧基矽烷,較爲適合。 本發明之(E)烴系臘,實質爲由碳原子與氫原子而 成,實際上係飽和之低聚物、或聚合物、或其混合物者; •19- 1289582 (17) 依情況,爲氧化者亦可,具有羧基或羥基或碳醯基者亦 可;然後,(E )烴系臘分爲(大)流動石臘與聚乙烯 臘;流動石臘在常溫下爲液體,係以石臘烴系與烷基環烷 烴系爲主之混合物者;亦稱爲礦物油;在1 5 t之比重爲 0.8494以下者,亦包含15t比重爲0.8494以上者;例 如,具代表性者有,耶庫松莫比魯有限公司製之庫利斯多 魯N3 5 2 (註冊商標)、昔來伊莫魯N542 (註冊商標)等 適合使用;聚乙烯臘,粘度平均分子量爲900〜3 0000,常 溫下爲固體;可以使用下述之四種型式者;即,①以乙烯 爲主成份的單體,藉由游離基聚合催化劑,在高溫高壓下 聚合之方法,或藉由齊格勒催化劑在低壓下聚合的方法而 得者,②將一般成型用聚乙烯熱解,使低分子量化而得 者,③在製造一般成型用聚乙烯之際,將副產之低分子量 聚乙烯分離精製而得者,④以將一般成型用聚乙烯氧化之 方法而得者(亦稱乳膠臘)等等;其中以密度0.92〜0.98 (g/cm3 )者較爲適合;又,從脫模性之觀點而言,以粘 度平均分子量爲900〜1 0000者較適合,以1 000〜4000者更 佳;又,氧化之型式者,從與本發明之樹脂組成物的親和 性之觀點而言,亦可使用;其情況,從脫模性之觀點來 說’以依JIS — K5902之測定而得的酸價(KOH mg/g)爲 2 0以下較爲適合,爲5以下更佳;例如具代表性之三井 化學股份有限公司製的三井依臘(註冊商標)適合使用。 本發明中薄膜之樹脂組成物爲,含有5 0重量%以上 之聚亞苯基醚系樹脂者;由薄膜之耐熱性、脫模性、熱收 -20- (18) 1289582 縮率、耐吸濕性之觀點而言,此含量以60重量%以上較 爲適合,以70重量%以上更佳,以80重量%以上最爲理 想。 本發明中,(B )成份之液晶聚酯的配合量,對 (A)成份與(B)成份之合計100重量份,爲0.5〜50重 量份,以1〜40重量份較適合,以2〜30重量份更佳;由液 晶聚合物之各向異性、薄膜之厚度參差的觀點而言,此配 合量之上限以5 0重量份爲佳;從脫模性與流動性之觀點 而言,此配合量之下限,以〇 · 5重量份爲宜;又,從與可 撓性印刷基板的基底薄膜之聚醯亞胺薄膜的脫模性、剛性 (薄膜處理之相關操作性)之觀點而言,(B )液晶聚酯 以上述之配合量較爲適合。 本發明中,(C)成份之配合量,由薄膜中之(A) 成份與(B )成份的層剝離與比重及耐熱性之觀點而言, 對(A)與(B)之合計100重量份,以含有〇·ΐ〜1〇重量 份爲宜,以〇·2〜5重量份更佳,以0.4〜3重量份特別理 想;此(C )成份之含量,低於〇 · i重量份時,薄膜本身 之層剝離較爲顯著,超過10重量份時,比重增大,耐熱 生降低。 本發明中,(D)成份之配合量,從薄膜中之(A) 成份與(B )成份之層剝離及安定生產的觀點而言,對 (A)與(B )之合計1〇〇重量份,以含有o.id重量份爲 宜,以0.15〜3重量份更佳,以0.2m重量份特別理想; 此(D )成份之含旺’低於0 · 1重量份時,薄膜本身之層 -21 - (19) 1289582 剝離較爲顯著,超過5重量份時,會倂發分解、交聯等不 適合之副反應,不能安定的獲得本發明之組成物。 本發明中’ (E )烴系臘之配合量,由脫模性與析出 的觀點而言,對(A )成份與(B )成份之合計1 0 0重量 份,以〇·1〜4重量份爲宜,以 0.3〜3重量份更佳,以 0.5〜2重量份特別理想;此(E )成份之配合量,低於0 · 1 重量份時’不能獲得與黏著劑之充分的脫模性,超過4重 量份時,熱壓縮後,(E )成份析出而複製於印刷基板。 本發明中,除上述之成份以外,在不損及本發明之特 徵及效果的範圍,因應需求可添加附加之成份有,例如抗 氧化劑、阻燃劑、彈性體[乙烯/丙烯共聚物、乙烯/1 -丁 烯共聚物、乙烯/丙烯/非共軛二烯共聚物、乙烯/丙烯酸乙 酯共聚物、乙烯/ (甲基)丙烯酸環氧丙基酯共聚物、乙 烯/醋酸乙烯酯/(甲基)丙烯酸環氧丙基酯共聚物及乙烯/ 丙烯一 g〇馬來酸酐共聚物、ABS等之烯烴系共聚物、聚 酯聚醚彈性體、聚酯聚酯彈性體、乙烯系芳香族化合物-共軛二烯化合物嵌段共聚物、乙烯系芳香族化合物一共二 烯化合物嵌段共聚物之氫化物]、增塑劑(環氧化大豆 油、聚乙二醇、肪脂酸酯類等)、阻燃助劑、耐候(光) 性改良劑、各種著色劑等等。 本發明之製造印刷基板用脫模製薄膜係,含有具上述 之樹脂組成物的熱塑性樹脂層(P )之薄膜者;因此,本 發明之製造印刷基板用脫模薄膜,在印刷配線基板、可撓 性印刷配線基板、多層印刷配線基板等之製造步驟中,可 -22- 1289582 (20) 使用於保護以預浸料胚或耐熱薄膜介入其間,熱壓縮鍍銅 層壓板或銅箔之際的印刷基板;可使用於防止黏著劑因熱 壓縮機或緩衝材料而起之污染。 就本發明之第2發明的具多層結構之製造印刷基板用 脫模薄膜,說明如下;本發明之樹脂層(D )、與含 (F )彈性體之層(Q )所成具多層結構的製造印刷基板 用脫模薄膜,係以上述之樹脂層(P )爲最外層,中間挾 住含(F )彈性體之層(Q )的結構而成;基本上爲(p ) / (Q ) / ( P )之三層結構者,·依情況,可在(P )層與 (Q )層之間插入黏著層,而成五層結構;但,從薄膜厚 度與簡樸化之觀點而言,以三層結構最爲適合。 本發明之(F )成份的彈性體有,芳香族乙烯系化合 物一共軛二烯化合物嵌段共聚物、(G )芳香族乙烯系化 合物與共軛二烯化合物之嵌段共聚物的部份氫化聚合物、 (H)乙烯與乙烯基酯化合物之共聚物、乙烯/丙烯共聚 物、乙烯/1 - 丁烯共聚物、乙烯/丙烯/非共軛二烯共聚 物、乙烯/丙烯一 g—馬來酸酐共聚物、ABS等之烯烴系共 聚物、聚酯聚醚彈性體、聚酯聚酯彈性體等等;在(Η ) 乙烯與乙烯基酯化合物之共聚物中,乙烯基酯化合物係指 含有酯基或羧基之乙烯基單體而言;例如醋酸乙烯酯、丙 酸乙烯酯、丙烯酸甲酯、丙烯酸乙酯、(甲基)丙烯酸甲 酯、(甲基)丙烯酸乙酯、丙烯酸、(甲基)丙烯酸等 等;尤其在(F )成份中,從追隨性與多層薄膜間之密著 力的觀而言,以(G )芳香族乙烯基化合物與共軛二烯化 -23- 1289582 (21) 合物之嵌段共聚物的部份氫化聚合物,及(Η )乙烯與乙 烯基酯化合物之共聚物較爲適合;將(G)芳香族乙烯系 化合物與共軛二烯化合物之嵌段共聚物的部份氫化聚合物 說明如下;首先’芳香族乙條系化合物與共轭二嫌化合物 之嵌段共聚物,係由以芳香族乙烯系化合物爲主體之聚合 物嵌段節段、與以共軛二烯化合物爲主體之聚合物嵌段節 段所成之嵌段共聚物者;芳香族乙烯系化合物之具體例, 爲至少一種選自苯乙烯、α —甲基苯乙烯、乙烯基甲苯、 對一叔丁基苯乙烯、二乙烯基苯、對一甲基苯乙烯、1,1 -二苯基苯乙烯等,其中以苯乙烯最適合;共軛二烯化合 物之具體例,爲至少一種選自丁二烯、異戊二嫌、1,3 — 戊二烯、2,3 —二甲基一1,3 — 丁二烯、間戊二烯、3 — 丁基—1,3—辛二烯、苯基一 1,3 — 丁二烯等,其中以丁 一嫌、異戊一嫌、及此寺之組合最適合;(G)成份之聚 合物’由耐熱性、耐熱劣代特性之觀點而言,以部份氫化 者爲佳;而且其氫化率以5〜100 %者爲宜;進而,從熱安 定性之觀點而言,氫化率以5 0 %以上者更爲適合;此部份 氫化嵌段共聚物中結構上之特徵,爲滿足特開昭6〗_ 34049號公報上之特徵,爲滿足特開昭61一 34〇49號公報 上6羊細sS載之要件者時’可以一種或兩種以上倂用;其代 表例有’旭化成化學品股份有限公司製之T U F τ E X (註冊 商標)、庫雷東聚合物一日本股份有限公司製之庫拉東 (註冊商標)、J S R股份有限公司製之戴納龍、庫拉雷股 份有限公司製之謝普東(註冊商標)、海布拉魯(註冊商 Ϊ289582 (22) 標)等等。 尤其做爲脫模薄膜之特性,由耐熱性、追隨性及 (P)層與(Q)層之密著力的觀點而言,(G)成份中芳 香族乙烯系化合物之結合量,以5〜65重量%較適合,以 10〜60重量%更佳,以30〜50重量%特別理想;此量低於5 S量%時’很難顯現充分之耐熱性,於製造印刖基板之熱 _縮中’有由(P )層溢出、附著於壓縮機、緩衝材料等 之情況;又,超過6 5重量%時,很難顯現充分之追隨性 及充分的(P )與(Q )之層間密著力。 含有(A)聚亞苯基醚系樹脂50重量%以上之樹脂層 C P ),雖單層薄膜的剛性極高之板,操作性優越,但在 胃求追隨性、黏著劑之溢出少量度、多層薄膜間之密著 力、薄膜間之滑動性的製造印刷基板之用途上,以多層結 構之薄膜更爲適合。 本發明之脫模薄膜的厚度,在使用單層薄膜時,爲 3〜ΙΟΟμιη ;從成本、操作處理性之觀點而言,以 10〜ΙΟΟμηι更適合,以 30〜60μηι最理想;使用多層薄膜 時,總厚度爲50〜3 00 μιη,從追隨性、操作性之觀而言, 以70〜2 5 0 μηι較佳,以100〜2 00 μιη更適合;多層結構時, 對總厚度,中間層(Q )之厚度所佔的比率以50%以上爲 佳,以60%以上較佳,以70%以上更佳;此比率低於50% 時,不能充分顯現追隨性。 本發明之樹脂組成物,可用各種方法製造;例如以單 軸擠壓機、隹軸擠壓機、滾筒機、揑合機、布拉本德塑料 -25- 1289582 (23) 變化機、班伯里混煉機等之熔融混煉的方法等等,其中以 使用雙軸擠壓機之熔融混煉的方法最爲理想;此時之熔融 _ 混煉溫度沒有特別的限制,通常可由1 5 0〜3 5 0 °c中任意選 - 擇。 _ 本發明之製造印刷基板用脫模薄膜,可用上述所得樹 . 脂組成物爲原料,經擠壓薄膜成型而得;亦可將本發明樹 脂藥組成物之由來原料成份,直接加入擠壓薄膜成型機, 同時施行摻合與薄膜成型而得。 φ 本發明之製造印刷基板用脫模薄膜,可使用擠壓管式 法,依情況之不同亦稱爲吹塑法,而製造;使離開圓筒之 帕利遜不立即冷卻,適當選擇50〜29(TC範圍中之溫度, 控制帕利遜之溫度,可使薄片厚度均勻,在製作樹脂組成 物各成份之不剝離的薄片上,極爲重要;可將(P)層之 由來樹脂、與(Q)層之由來樹脂,多層層壓化而得多層 結構之薄膜。 另一方面,本發明之製造印刷基板用脫模薄膜,可用 · T型模頭擠壓成型法製造;此時,直接使用無拉伸者亦 可,使用單軸拉伸或雙軸拉伸者均可;期望薄膜之強度、 剛性較高時、拉伸有其效果;將(P )層之由來樹脂、與 (Q)層之由來樹脂成份多層層壓的方法有、乾式層壓 · 法、共擠壓層壓法等;爲乾式層壓時,在製造(P)層之 , 單層薄膜中,由T型模頭附近之上下,將此單層薄膜送 料,同時將(Q )層之由來樹脂的(F )彈性體從T型模 頭擠壓,可用滾筒層壓;此方法,特別適合(P )層與 -26- 1289582 (24) (Q)層之樹脂粘度有大不同者;另一方面,爲共擠壓層 壓時,採用多層塑模擠壓模,可以擠壓機將(P )層之由 來樹脂成份、與(Q )層之由來樹脂成份層壓;以一般即 可多層化,甚爲經濟。 本發明之製造印刷基板用脫模薄膜,最外層之薄膜表 面與冰滴之接觸角,以8 0度以上爲宜;由脫模性與耐吸 濕性之觀點而言,爲80度以上,以85度以上較佳,以 90度以上更佳;此値小於80度時,有不能充分發揮脫模 性之情況,有不能充分顯示耐吸濕性之情況;薄薄表面與 水滴之接觸角的測定,可在常溫(23 °C )之大氣下,例如 使用協和界面科學股份有限公司製之固液界面解析裝置 Drop Master (註皿商標)施行。 本發明之製造印刷基板用脫模薄膜中之印刷基板,包 含以環氧樹脂爲代表之剛性型的印刷基板、及以聚醯亞胺 爲代表之可撓性印刷基板;最近,尤其是對可撓性印刷基 板、行動電話、硬碟驅動(HDD )等之排放氣體、污染的 要求規格相當嚴;從本發明之脫模薄膜的耐污染性優異之 觀點而言,極適合使用於可撓性印刷基板。 如此而得之本發明的製造印刷基板用脫模薄膜,脫模 性優越、熱收縮小,難以使印刷基板製品發生皺紋,而且 脫模薄膜本身亦難以產生皺紋;又,由於不發生析出現象 之故,耐污染性優良,且耐吸濕性越,然後其追隨性、黏 著劑溢出性、多層薄膜間之密著力、薄膜間之滑動性優 異,極適合使用爲製造印刷基板,尤其是製造可撓性印刷 -27- (25) 1289582 基板之脫模薄膜。 【實施方式】 [實施例] 以實施例說明本發明如下;在不超越本發明之主旨的 範圍,對此實施例沒有任何限制。 [製造例1]聚亞苯基醚(PPE- 1)之製造例 將2 ’ 6 —二甲基苯酚氧化聚合,而得對比粘度爲 0.42之粉末狀的聚(2,6 一二甲基一 1,4一亞苯基醚)。 [製造例2]液晶聚酯(LCP — 1 )之製造例 在氮氣大氣下,加入對一經基安息香酸、2 -經基一 6 -蔡甲酸、醋酸酐,加熱熔融進行聚縮合,即得具有下述 理論結構式之液晶聚酯(LCP — 1 );還有,組成之成份 比以莫耳比表示。(C) A specific example of a compound containing a metal element of a valence to a tetravalent value, and is preferably an oxide, a hydroxide, an alkoxide salt, an aliphatic residual acid salt, an acetate salt or the like of the above-mentioned genus element; Oxides are, ZnO, MgO, Ti〇4, Ti〇2, PbO, CdO, SnO, SbO, Sb203, NiO, Al2〇3, GeO, etc.; and, suitable hydroxides, Zn(OH) 2 , Mg(0H) 2, Ti(OH) 4, Ti(OH) 2, Pb(OH) 2, Ca(〇H) 2, Sn(OH) 2, Sb(OH) 2, SB 1289582 (15) ( OH) 3, Ni(OH) 2, Al(OH) 3, Ge(OH) 2 and the like; further, suitable alkoxy salts are Ti (isopropoxy) 4, Ti (n-butoxy) 4 and the like; in addition, suitable aliphatic carboxylates are zinc stearate, magnesium stearate, titanium stearate, lead stearate, cadmium stearate, tin stearate, barium stearate, Nickel stearate, aluminum stearate, barium stearate, etc.; particularly suitable examples thereof are ZnO, Mg(OH)2, Ti(isopropoxy)4, Ti(n-butoxy)4 , zinc acetate, zinc stearate, aluminum stearate, etc.; from the viewpoint that the layer between the (A) component and the (B) component is not peeled off, ZnO, Mg(OH) 2 is most suitable; further, these (C) components may contain impurities insofar as they do not impair the effects of the present invention. The (D) decane compound of the present invention is a functional group-containing decane compound; and is a decane compound containing at least one functional group selected from the group consisting of an amine group, a urea group, an epoxy group, an isocyanate group, and a fluorenyl group; The decane compound having a functional group may generally contain any of these functional groups in the molecule, and may be different depending on the case, and it is also preferable that the molecule contains two or more functional groups; further, the decane used in the present invention a compound, usually an alkoxydecane having a functional group as described above in the molecule; and a specific example of a functional group-containing decane compound, r-aminopropyltrimethoxydecane, r-aminopropyltriethoxy Decane, 7-aminopropylmethyldimethoxydecane, N-(cold-aminoethyl)-7-aminopropyltrimethoxydecane, N-(/3-aminoethyl)- 7 - an amino group-containing decane compound such as aminopropylmethyldimethoxydecane or 7-phenyl-r-aminopropyltrimethoxydecane; r-ureidopropyltrimethoxydecane, r Ureidopropylmethyltrimethoxydecane, r-ureidopropyltriethoxydecane, r-urea Propionyl-18- 1289582 (16) ureido-based decane compound such as triethoxy decane, r-(2-ureidoethyl)aminopropyldimethoxydecane; r-glycidoxy Propyltrimethoxydecane, r-glycidoxypropyldimethylmethoxydecane, 7-glycidoxypropyltriethoxydecane, r-glycidoxypropyl Epoxy containing ethoxylated decane, sulphide (3,4-epoxycyclohexyl)ethyltrimethoxydecane, saponin (3,4-epoxyhexyl)ethyltriethoxydecane, etc. Base decane compound; r-isocyanate propyl trimethoxy sand, 7-isocyanate propyl methyl dimethoxy decane, r-isocyanate propyl triethoxy decane, r-isocyanate propyl methyl diethoxy Isocyanate-containing decane compound such as decane, r-isocyanate propyl ethyldimethoxy decane, r-isocyanate propylethyldiethoxy decane, r-isocyanate propyl trichloromethane or the like; r-mercaptopropyl group Methyldimethoxydecane, r-sulfopropyltriethoxylate, 7-sulfopropylethyl-ethoxy-oxetane, r-mercaptopropyl Mercapto-based decane, such as methyl-diethoxy decane, decyl-decylethyltrimethoxydecane, yS-mercaptoethyltriethoxydecane, /5-mercaptoethyldimethoxydecane a compound, etc.; from the viewpoint of the toughness of the film, and from the viewpoint of not peeling off the layer between the component (A) and the component (B), it is preferable to use an amine group-containing decane compound; that is, a 7-amine Propyltrimethoxydecane, r-aminopropyltriethoxydecane, 7-aminopropylmethyldimethoxydecane, n-(/3-aminoethyl)-r-amino Propyltrimethoxydecane, n--aminoethyl)-7-aminopropylmethyldimethoxydecane is preferred. The (E) hydrocarbon wax of the present invention is substantially composed of a carbon atom and a hydrogen atom, and is actually a saturated oligomer, or a polymer, or a mixture thereof; 19- 1289582 (17) Depending on the case, The oxidizer may also have a carboxyl group or a hydroxyl group or a carbon sulfhydryl group; then, the (E) hydrocarbon wax is divided into (large) mobile paraffin and polyethylene wax; the mobile paraffin is liquid at normal temperature, and is stone. a mixture of a wax-based hydrocarbon and an alkylcycloalkane; mainly known as mineral oil; those having a specific gravity of 0.8494 or less at 15 t and containing a specific gravity of 0.8494 or more; for example, representative Coulomb Dorothy N3 5 2 (registered trademark), Iloru N542 (registered trademark), etc. are suitable for use; polyethylene wax, viscosity average molecular weight is 900~3 0000, room temperature The following are solid; the following four types can be used; that is, a monomer containing ethylene as a main component, a polymerization method at a high temperature and a high pressure by a radical polymerization catalyst, or a low pressure by a Ziegler catalyst. The method of the next polymerization, 2 will be polyethylene for general molding The solution is to obtain a low molecular weight, and 3 is obtained by separating and purifying by-product low molecular weight polyethylene in the production of general molding polyethylene, and 4 by oxidizing a general molding polyethylene ( Also known as latex wax) and the like; among them, a density of 0.92 to 0.98 (g/cm3) is suitable; and, from the viewpoint of mold release property, a viscosity average molecular weight of 900 to 1 0000 is more suitable, 1 More preferably, the amount of 000 to 4,000 is more preferable; and the type of oxidation may be used from the viewpoint of affinity with the resin composition of the present invention; in the case of the release property, 'by JIS- The acid value (KOH mg/g) obtained by the measurement of K5902 is preferably 20 or less, and more preferably 5 or less. For example, Mitsui Yila (registered trademark) manufactured by Mitsui Chemicals Co., Ltd. is suitable for use. The resin composition of the film of the present invention is a polyphenylene ether-based resin containing 50% by weight or more; heat resistance, mold release property, heat shrinkage of the film -20-(18) 1289582 shrinkage rate, moisture absorption resistance From the viewpoint of the properties, the content is preferably 60% by weight or more, more preferably 70% by weight or more, and most preferably 80% by weight or more. In the present invention, the compounding amount of the liquid crystal polyester of the component (B) is 0.5 to 50 parts by weight based on 100 parts by weight of the total of the components (A) and (B), and is preferably 1 to 40 parts by weight, and is preferably 2 More preferably, it is preferably 30 parts by weight, and from the viewpoints of mold release property and fluidity, from the viewpoint of the anisotropy of the liquid crystal polymer and the thickness difference of the film, the upper limit of the compounding amount is preferably 50 parts by weight; The lower limit of the blending amount is preferably 5% by weight, and further, from the viewpoints of mold release property and rigidity (operational property relating to film processing) of the polyimide film of the base film of the flexible printed circuit board. In other words, (B) the liquid crystal polyester is more suitable in the above-mentioned amount. In the present invention, the compounding amount of the component (C) is 100 parts by weight of the total of (A) and (B) from the viewpoint of layer peeling of the component (A) and the component (B) in the film, and specific gravity and heat resistance. It is preferred to contain 〇·ΐ~1 〇 by weight, more preferably 〇 2 to 5 parts by weight, and particularly preferably 0.4 to 3 parts by weight; the content of the component (C) is less than 〇·i by weight. When the film itself is peeled off, the specific gravity is increased, and when it exceeds 10 parts by weight, the specific gravity is increased and the heat resistance is lowered. In the present invention, the blending amount of the component (D) is from the viewpoint of peeling and stable production of the layer (A) component and the component (B) in the film, and the total weight of (A) and (B) is 1 〇〇. The portion is preferably contained in an amount of o. id, more preferably 0.15 to 3 parts by weight, particularly preferably 0.2 parts by weight; and when the content of the component (D) is less than 0.1 part by weight, the film itself The layer 21 - (19) 1289582 is more remarkably peeled, and when it exceeds 5 parts by weight, an unsuitable side reaction such as decomposition, crosslinking, or the like may occur, and the composition of the present invention may not be obtained stably. In the present invention, the blending amount of the '(E) hydrocarbon wax is from the viewpoint of mold release property and precipitation, and the total amount of the components (A) and (B) is 100 parts by weight, and the weight is 〇1 to 4 Preferably, it is preferably 0.3 to 3 parts by weight, more preferably 0.5 to 2 parts by weight; and the amount of the component (E) is less than 0.1 part by weight, and a sufficient release from the adhesive cannot be obtained. When the amount is more than 4 parts by weight, the component (E) is precipitated on the printed substrate after thermal compression. In the present invention, in addition to the above-mentioned components, additional components such as an antioxidant, a flame retardant, an elastomer [ethylene/propylene copolymer, ethylene) may be added as needed insofar as the characteristics and effects of the present invention are not impaired. /1 - Butene copolymer, ethylene/propylene/nonconjugated diene copolymer, ethylene/ethyl acrylate copolymer, ethylene/ethylene methacrylate copolymer, ethylene/vinyl acetate/( Methyl)acrylic acid propylene propyl ester copolymer and ethylene/propylene-g-maleic anhydride copolymer, olefin-based copolymer such as ABS, polyester polyether elastomer, polyester polyester elastomer, and vinyl aromatic Compound-conjugated diene compound block copolymer, hydride of ethylene-based aromatic compound-co-diene compound block copolymer], plasticizer (epoxidized soybean oil, polyethylene glycol, fatty acid ester, etc.) ), flame retardant additives, weathering (light) improvers, various colorants, and the like. The release film for printing a printed circuit board of the present invention contains a film of a thermoplastic resin layer (P) having the above resin composition; therefore, the release film for a printed circuit board of the present invention can be printed on a wiring board. In the manufacturing steps of a flexible printed wiring board, a multilayer printed wiring board, etc., -22- 1289582 (20) is used for protecting a prepreg or a heat-resistant film interposed therebetween, and thermally compressing a copper-clad laminate or a copper foil. The printed substrate can be used to prevent contamination of the adhesive due to the thermal compressor or cushioning material. The release film for a printed circuit board having a multilayer structure according to the second aspect of the present invention will be described below. The resin layer (D) of the present invention and the layer (Q) containing the (F) elastomer have a multilayer structure. A release film for a printed circuit board is obtained by using the above-mentioned resin layer (P) as an outermost layer and sandwiching a layer containing (F) an elastomer layer (Q); basically (p) / (Q) / (P) three-layer structure, depending on the situation, an adhesive layer can be inserted between the (P) layer and the (Q) layer to form a five-layer structure; however, from the viewpoint of film thickness and simplicity, The three-layer structure is most suitable. The elastomer of the component (F) of the present invention is a partially hydrogenated block copolymer of an aromatic vinyl compound-conjugated diene compound block copolymer and (G) an aromatic vinyl compound and a conjugated diene compound. Polymer, (H) copolymer of ethylene and vinyl ester compound, ethylene/propylene copolymer, ethylene/1-butene copolymer, ethylene/propylene/non-conjugated diene copolymer, ethylene/propylene-g-horse An anhydride copolymer, an olefin copolymer such as ABS, a polyester polyether elastomer, a polyester polyester elastomer, etc.; in a copolymer of (Η) ethylene and a vinyl ester compound, a vinyl ester compound means For vinyl monomers containing an ester group or a carboxyl group; for example, vinyl acetate, vinyl propionate, methyl acrylate, ethyl acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, acrylic acid, ( Methyl)acrylic acid and the like; especially in the (F) component, from the viewpoint of the adhesion between the followability and the multilayer film, the (G) aromatic vinyl compound and the conjugated diene -23- 1289582 ( 21) part of the block copolymer of the compound a hydrogenated polymer, and a copolymer of (Η) ethylene and a vinyl ester compound; and a partially hydrogenated polymer of a block copolymer of the (G) aromatic vinyl compound and the conjugated diene compound; First, a block copolymer of an aromatic ethylenic compound and a conjugated dimeric compound is a polymer block segment mainly composed of an aromatic vinyl compound and a polymer mainly composed of a conjugated diene compound. a block copolymer formed by a block segment; a specific example of the aromatic vinyl compound, at least one selected from the group consisting of styrene, α-methylstyrene, vinyltoluene, p-tert-butylstyrene, and Vinylbenzene, p-methylstyrene, 1,1-diphenylstyrene, etc., wherein styrene is most suitable; and specific examples of the conjugated diene compound are at least one selected from the group consisting of butadiene and isoprene Iso, 1,3 - pentadiene, 2,3-dimethyl-1,3-butadiene, piperylene, 3-butyl-1,3-octadiene, phenyl-1,3 — Butadiene, etc., which is best suited to the combination of Ding Yi, Yi Wu, and the combination of this temple. (G) component of the polymer 'from the viewpoint of heat resistance, heat resistance and lower generation characteristics, preferably partial hydrogenation; and its hydrogenation rate is preferably 5 to 100%; and further, from the viewpoint of thermal stability In other words, the hydrogenation rate is more preferably 50% or more; the structural characteristics of the partially hydrogenated block copolymer are in accordance with the features of JP-A-6-34049, which is to satisfy the special opening 61. In the case of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations of the stipulations, the TUF τ EX (registered trademark), Kuleidong Kuradong (registered trademark) manufactured by Polymer Japan Co., Ltd., Danalong manufactured by JSR Co., Ltd., Xiepudong (registered trademark) manufactured by Kuraray Co., Ltd., and Haibralu (registered trademark 289582 ( 22) Mark) and so on. In particular, as a property of a release film, the binding amount of the aromatic vinyl compound in the component (G) is 5 to 5 from the viewpoints of heat resistance, followability, and adhesion between the (P) layer and the (Q) layer. 65 wt% is more suitable, more preferably 10 to 60 wt%, and particularly preferably 30 to 50 wt%; when the amount is less than 5 S wt%, it is difficult to express sufficient heat resistance, and heat for producing a neem substrate is _ In the case of shrinkage, there is a case where the layer (P) overflows, adheres to a compressor, a buffer material, or the like; and when it exceeds 65 wt%, it is difficult to exhibit sufficient followability and sufficient interlayers of (P) and (Q) Confidence. The resin layer CP) containing 50% by weight or more of the (A) polyphenylene ether-based resin is excellent in handleability in a single-layer film having extremely high rigidity, but it has a small amount of adhesion to the stomach and a small amount of adhesion of the adhesive. A film having a multilayer structure is more suitable for use in the production of a printed circuit board in which the adhesion between the multilayer films and the slidability between the films is used. The thickness of the release film of the present invention is 3 to ΙΟΟμηη when a single-layer film is used, and more preferably 10 to ΙΟΟμηι from the viewpoint of cost and handling property, and 30 to 60 μm is most preferable; when a multilayer film is used; , the total thickness is 50~3 00 μιη, from the viewpoint of followability and operability, 70~2 50 μm is preferred, and 100~200 μιη is more suitable; for multilayer structure, for total thickness, middle layer The ratio of the thickness of (Q) is preferably 50% or more, more preferably 60% or more, more preferably 70% or more; and when the ratio is less than 50%, followability cannot be sufficiently exhibited. The resin composition of the present invention can be produced by various methods; for example, a uniaxial extruder, a boring extruder, a roller machine, a kneader, a Brabender plastic-25- 1289582 (23) change machine, Banbury A method of melt-kneading or the like of a kneader or the like, wherein a method of melt-kneading using a twin-screw extruder is most preferable; at this time, the melting_mixing temperature is not particularly limited, and usually may be 1 to 5 0~ Any choice of 3 5 0 °c - choose. _ The release film for producing a printed circuit board of the present invention can be obtained by extruding a film using the obtained resin composition as a raw material; and the raw material component of the resin composition of the present invention can be directly added to the extruded film. The molding machine is obtained by blending and film forming at the same time. φ The release film for producing a printed circuit board of the present invention can be produced by using a squeeze tube method, which is also called a blow molding method depending on the case, and the Parson which leaves the cylinder is not cooled immediately, and is appropriately selected 50~ 29 (The temperature in the TC range, controlling the temperature of the Parson, can make the thickness of the sheet uniform, and it is extremely important in the production of the sheet of the resin composition which is not peeled off; the resin of the (P) layer can be used, and Q) The resin of the layer is a multi-layer laminated film having a multi-layer structure. On the other hand, the release film for producing a printed circuit board of the present invention can be produced by a T-die extrusion molding method; It can be used without stretching, and it can be used for uniaxial stretching or biaxial stretching. It is expected that when the strength and rigidity of the film are high, stretching has its effect; the resin of (P) layer is derived from resin, and (Q) The method for laminating a resin component by a layer is a dry lamination method, a co-extrusion lamination method, or the like; in the case of dry lamination, in a (P) layer, a single layer film, a T-die Feeding the single layer film near the top, while the (Q) layer is The resin (F) elastomer is extruded from a T-die and can be laminated by a roller; this method is particularly suitable for the resin viscosity of the (P) layer and the -26-1289582 (24) (Q) layer being greatly different; On the one hand, in the case of co-extrusion lamination, a multi-layer molding die is used, and the resin component of the (P) layer and the resin component of the (Q) layer can be laminated by an extruder; The release film for a printed circuit board of the present invention has a contact angle of the outermost film surface with ice droplets of 80° or more; from the viewpoints of mold release property and moisture absorption resistance, It is preferably 80 degrees or more, preferably 85 degrees or more, more preferably 90 degrees or more; when the enthalpy is less than 80 degrees, the mold release property may not be sufficiently exhibited, and the moisture absorption resistance may not be sufficiently exhibited; the thin surface and The contact angle of the water droplets can be measured at room temperature (23 ° C), for example, using a solid-liquid interface analysis device, Drop Master (trademark) manufactured by Kyowa Interface Science Co., Ltd. a printed substrate in a release film comprising epoxy A rigid printed circuit board represented by a fat, and a flexible printed circuit board represented by a polyimide, and more recently, an exhaust gas such as a flexible printed circuit board, a mobile phone, or a hard disk drive (HDD). The specification of the contamination is very strict, and it is very suitable for use in a flexible printed circuit board from the viewpoint of excellent stain resistance of the release film of the present invention. Thus, the release film for a printed circuit board of the present invention is obtained. Excellent moldability, small heat shrinkage, difficulty in wrinkles of printed substrate products, and the release film itself is difficult to produce wrinkles; and, because no precipitation occurs, the stain resistance is excellent, and the hygroscopicity is more, and then it follows. The adhesiveness of the adhesive, the adhesion of the adhesive, the adhesion between the multilayer films, and the slidability between the films are extremely suitable for the production of a printed substrate, in particular, a release film of a flexible printed -27-(25) 1289582 substrate. [Embodiment] [Embodiment] The present invention is described by way of Examples, and the present invention is not limited thereto without departing from the gist of the present invention. [Production Example 1] Production Example of Polyphenylene Ether (PPE-1) 2'6-Dimethylphenol was oxidatively polymerized to obtain a powdery poly(2,6-dimethyl group) having a comparative viscosity of 0.42. 1,4-phenylene ether). [Production Example 2] Production Example of Liquid Crystalline Polyester (LCP-1) Under a nitrogen atmosphere, by adding a hydrazinic acid, a 2-pyridyl-6-carotic acid, an acetic anhydride, and heating and melting to carry out polycondensation, The liquid crystal polyester (LCP-1) of the following theoretical formula; further, the composition of the composition is expressed in terms of molar ratio.

k/丨=〇·73/〇·27 -28- (26) 1289582 2 —羥基—6 [製造例3]液晶聚酯(LCP— 2)之製造例 在氮氣大氣下,加入對一羥基安息香酸、 -萘甲酸、對苯二酣、異苯二甲_、醋酸酐,加熱熔融進 行聚縮合’即得具有下述理論結橇式之液聚醋(LCp 一 2 ) •,還有,組成之成份比以莫耳比表示。k/丨=〇·73/〇·27 -28- (26) 1289582 2—Hydroxy—6 [Production Example 3] Production example of liquid crystal polyester (LCP-2) Under a nitrogen atmosphere, p-hydroxybenzoic acid was added. - naphthoic acid, p-benzoquinone, isophthalonitrile, acetic anhydride, heat-melting and polycondensation', which has the following theoretical slaughter type liquid polyacetate (LCp-2). The composition is expressed in terms of molar ratio.

0· 〇·Η〇^·0· 〇·Η〇^·

•CO•CO

COCO

k/|/m/n = 0.7/0.2/0.1/0.1k/|/m/n = 0.7/0.2/0.1/0.1

各樹脂組成物之薄膜成型與物性評估,依下述之方法進 行。 (1 ) 吹塑成型 將所得顆粒,以料筒溫度290 °C、圓筒狀塑模擠壓模 頭溫度2 9 0 C、螺旋軸徑5 0 m m之擠壓機,依管式法施行 擠擠薄片成型;吹送之空氣壓力設定於厚度可達5以111的 程度。 爲多層薄膜時,調整吹送之空氣壓力,以夾緊輥熔融 -29- 1289582 (27) 粘著,同時製成厚度爲(p)層(Q)層 (p )層3 Ο μ m之三層薄膜結構。 (2) T型模頭擠壓成型 將所得顆粒,以料筒溫度3 0 0 °C、T型模頭溫度3 0 0 °C、螺旋軸徑65mm之附置排氣孔的單軸擠壓機、排料量 6 0kg/hr、T型模頭縫隙之厚度0. 1 5mm、模頭縫隙之寬度 6 5 〇mm、壓延滾筒表面溫度130°C,控制拉出速度使厚度 可達50μπι,進行擠壓薄膜成型。 製取多層結構之薄膜時,使用三層式之擠壓機,採用 加料段塊型之三層Τ模頭、總排料量60kg/hr、模頭縫隙 之寬度65 0mm,壓延滾筒表面溫度130 °C,控制拉出速 度’使薄fl旲厚度可達(P)層30μπι、 (Q)層150μιη、 (Ρ)層30μιη之三層薄膜結構,進行擠壓薄膜成型。 (3 ) 薄膜厚度 將薄fe切成寬500mm、長200mm之大小;在寬度方 向的5個點’上下邊合計1 〇個點測定,更進行另一片相 同之測定,以合計20個點之測定値,求出平均値。 (4 ) 接觸角 使用協和界面科學股份有限公司製之固液界面解析裝 置Drop Master 5〇〇 (註冊商標),將上述(1) 、(2) 所得之薄膜固定於載物台,在薄膜上滴下1滴蒸餾水 (2 μί )’測定其接觸角,測定丨〇點求出其平均値;於 大氣常溫(23°C )下進行。 (5 )脫模性 -30- 1289582 (28) 使用厚度25μιη之聚醯亞胺薄膜[杜邦公司製,卡普東 100Η (註冊商標)]做爲基底薄膜,以厚度2〇ym之環氧 系黏著劑介入其間,粘著厚度35ym、寬50μηι之銅箱, 即得鍍銅層壓板(i );其次在厚度2 5 μ m之聚醯亞胺薄膜 [杜邦公司製’卡普東1 Ο 〇 Η (註冊商標)]上,以流動開始 溫度80 °C之環氧系黏著劑塗佈20μιη厚,即得覆蓋層薄膜 (ii );將上述(1 ) 、( 2 )所得之厚度50ym的單層薄膜 做爲脫模薄膜(iii) ; (ii)之環氧系黏著層連接於(i)之 銅箔測,依(i ) 、( ii ) 、( iii )之順序將薄膜重疊,於 190°C、50kgf/cm2下施行1分鐘之熱壓縮,即得可撓性印刷 基板;此熱壓縮後,將脫模薄膜(iii )與聚醯亞胺薄膜 (i ) 、( Π)拉開之際,依下述之判定基準,判定脫模性。 以與基板表面之脫模性爲「對FPC脫模性」;以由 (i )與(ii )之溢料面(電極用孔)露出的黏著劑及銅箔的 脫模性性爲「對黏著劑」、銅箔脫模性」。 〇:全無阻力,可剝離。 △:剝離之際,稍有阻力 X :完全黏著,不易剝離。 剝離後(X之情況,強拉剝離),確認脫模薄膜有無破 裂之情況。 (6) 熱收縮率 將上述(1 )與(2 )所得之脫模薄膜,在MD與TD 上使各片平彳了,切成150mm X 150mm之大小,於設定 1 90 °C的烘爐中進行5分鐘之熱固定,取出放冷;測定 -31 - 1289582 (29) MD、TD各別加熱前後的尺寸,依下式求出熱收縮率。 熱收縮率(% )=(加熱前之邊長一加熱後之邊長)/ (加熱前之邊長)X 1〇〇 MD爲由吹塑擠壓成型機,或由T型模頭擠壓成型機 之塑模擠模頭的樹脂流動方向,TD爲對MD成直角之方 向。 (7 ) FPC (可撓性印刷基板)之皺紋 除使用厚度 12.5ym X 150mm X 250mm之聚醯亞胺 薄膜[杜邦公司製,卡普東50H (註冊商標)]x以外,進 行與上述(3 )同樣的壓縮試驗,取出所得之FPC,確認 FPC之皺紋的有無。 (8 ) 析出1 將厚度125μπι之聚醯亞胺薄膜[杜邦公司製,卡普東 5 0 0H (註冊商標)]以上述(1 )或(2 )所得之脫模薄膜 挾住’在190°C、30kgf/cm2之條件下,進行5分鐘之熱 壓縮;然後,剝去脫模薄膜後,在與脫模薄膜接觸之聚醯 亞胺薄膜表面上,用水性奇異墨水(筆尖之粗細約 1 · 5 mm )劃線,放置5分鐘後,以目視觀察其水性奇異墨 水之排拒狀況,依下述之判定基準,判定析出性。 〇:不排拒水性奇異墨水之狀態 X =排拒水性奇異墨水之狀態 (9) 析出2 -32- 1289582 (30) 在厚度125nm之聚醯亞胺薄膜[杜邦公司製,卡普東 5 0 0H (註冊商標)]上,以棒桿塗佈厚度20μηι之環氧系 黏著劑,於5 0 °C進行2小時之固化,製成黏著劑被覆之 聚醯亞胺薄膜;在此薄膜之黏著劑被覆面上,將上述 (1 )或(2 )所得之脫模薄膜重疊,在19(TC、30kgf/cm2 之條件下熱壓縮5分鐘;其後,將脫模薄膜剝離,依上述 (4 )之方法,測定聚醯亞胺之黏著劑被覆表面側的接觸 角;另一方面,空白試驗是,在上述之黏著劑被覆的聚醯 亞胺薄膜上不施加壓,於190 °C固化5分鐘後,冷卻,測 定其表面上之接觸角爲58度;因此與空白試驗之接觸角 (5 8度)比較,其差較大者,判定在聚醯亞胺側有某物 質析出。 (10) 耐吸濕性 將上述(1 )或(2 )所得之薄膜,切取尺寸爲100 X 1 9 Onm之長方形,使用恆溫恆濕槽(塔拜耶斯具庫股份有 限公司製,?1^—3??),於85它,95%相對濕度之加溫加 濕環境下,曝露48小時後,依下式求出重量增加率(△ W),計算各兩片薄膜之平均値;重量增加率(Aw)之値 愈小,表示耐吸濕性愈優越。 重量增加率(Aw) (%) =(wi— w〇) /w〇x 100 [式中w!爲加溫加濕後之薄膜重量(g) ; w〇爲在加溫 加濕前,於100°C熱風乾燥機中乾燥2小時,在乾燥器中放 «33- 1289582 (31) 置冷卻至室溫後之薄膜重量(g )]。 (11) 耐熱性 將所得顆粒,使用料筒溫度320/330/320/3 1 0 °C、射速 85%、金屬模具度溫度90°C之射出成型機(IS — 80EPN ’東 芝機械股份有限公司製),進行射出成型;但,比較例1與 比較例2之料筒溫度均設定在280。(:下進行;成型爲厚 3.2mm x長127mm x寬12.7mm之ASTM唐札庫試驗片; 使用所得成型片,依ASTM— D648之標準,測定在1.82MPa 載重下之載重撓曲溫度。 (12) 剛性 使用與上述(1 1 )相同之試片,以自動曲線圖表機 (島津製作所股份有限公司製,AG — 5000 ),依ASTM — D790之標準,於23 °C之大氣下,測定變曲彈性率、彎曲強 度。 [實施例1] φ 將聚亞苯基醚(PPE— 1 )與液晶聚酯(LCP— 1 )及氧 化鋅(Ζηο,東邦鋅股份有限公司製,銀嶺一 1 )以表1所示 之比例(重量份),採用僅頂料側的機筒溫度爲250°C,其 他以外之機筒溫度與模頭溫度均設定爲310°C的附置排氣口 - 之雙軸擠壓機(WERNER & PFLEIDERER公司製,ZSK — 、 25 )熔融混煉,即得顆粒狀物;將此顆粒狀物,以上述 (2)所示之T型模頭擠壓成型,即得平均厚度51nm之薄 膜;依上述之方法進行薄膜的評估;其結果如表1所示; •34- 1289582 (32) 載重撓曲溫度爲184°C,變曲彈性率爲2670MPa。 [實施例2] 除使用聚苯乙烯(GP、PS日本股份有限公司製, G 9 3 0 5 )做爲(A )成份、各成份以表1所示之比例(重 量份)配合以外,其他都和實施例1同樣的施行,即得顆 粒;以上述(2 )所示T型模頭擠壓成型,即得平均厚度 5 Ο μ m之薄膜;依上述之方法進行薄膜的評估,其結果如表 1所示;載重撓曲溫度爲167°C,彎曲彈性率爲2740MPa。 [實施例3] 除使用LCP - 2做爲(B )成份、液體石臘(臘!,耶 庫松莫比魯有限公司製,庫利斯多魯N - 3 5 2,常溫下爲無 色液體)做爲(E )成份,各成份以表1所示之比例(重量 份)配合以外’其他都和實施例2同樣的施行,即得顆粒; 以上述(2)所不之T型模頭濟壓成型,即得平均厚度49ym 之薄膜;依上述之方法進行薄膜的評估,其結果如表1所 示;載重撓曲溫度爲168t,彎曲彈性率爲275〇MPa。 [實施例4] 除使用高衝擊聚苯乙烯(HIPS,PS日本股份有限公 司製,H9405 )做爲(A )成份,以聚乙烯臘[蠟2,三井 化學股份有限公司製’二井哈依蠛(註冊商標),405MP, 常溫下爲白色固體]替代臘1,各成份以表1所示之比例 -35- 1289582 (33) (請分)配合以外’其他都和實議同樣的施行,即得 顆粒,使用上述(2 )所示之τ型模頭擠壓成型,即得平均 厚度50ym之薄膜;依上述之方法進行薄膜的評估,其結果 如表1所示;載重撓曲溫度爲16 3 °C ,彎曲彈性率爲 2820MPa °The film formation and physical property evaluation of each resin composition was carried out in the following manner. (1) Blow molding to obtain the obtained pellets by a tube extruder at a temperature of 290 ° C, a cylindrical die extrusion die temperature of 290 C, and a screw shaft diameter of 50 mm. Extrusion sheet molding; the air pressure of blowing is set to a thickness of up to 5 to 111 degrees. In the case of a multilayer film, the air pressure of the blowing is adjusted to be adhered by the pinch roll melting -29- 1289582 (27), and the thickness is (p) layer (Q) layer (p) layer 3 Ο μ m of three layers Film structure. (2) The T-die is extruded to form the uniaxial extruder with the venting holes of the granules at a cylinder temperature of 300 ° C, a T-die temperature of 300 ° C, and a screw shaft diameter of 65 mm. The discharge amount is 60 kg/hr, the thickness of the T-die gap is 0.15 mm, the width of the die gap is 6 5 〇mm, the surface temperature of the calender roll is 130 ° C, and the pull-out speed is controlled to make the thickness up to 50 μπι. Extrusion film molding. When preparing a film of a multi-layer structure, a three-layer type extruder is used, a three-layer die head of a feeding block type, a total discharge amount of 60 kg/hr, a width of a die slit of 65 0 mm, and a calender roll surface temperature of 130 are used. °C, control the pull-out speed' so that the thin fl旲 thickness can reach the (P) layer 30μπι, (Q) layer 150μιη, (Ρ) layer 30μιη three-layer film structure, and extrusion film forming. (3) The film thickness is cut into a width of 500 mm and a length of 200 mm; a total of 1 point in the upper and lower sides of the five points in the width direction is measured, and the same measurement is performed on the other piece to determine the total of 20 points. Hey, find the average 値. (4) The contact angle is fixed on the stage by using the solid-liquid interface analysis device Drop Master 5〇〇 (registered trademark) manufactured by Kyowa Interface Science Co., Ltd., on the film. One drop of distilled water (2 μί ) was dropped to measure the contact angle, and the average enthalpy was determined by measuring the enthalpy point; it was carried out at room temperature (23 ° C). (5) Mold release -30- 1289582 (28) A polyimide film having a thickness of 25 μm (Popong 100 Η (registered trademark) manufactured by DuPont Co., Ltd.) was used as a base film, and an epoxy resin having a thickness of 2 μm was used. The adhesive is interposed between them, and a copper box with a thickness of 35 μm and a width of 50 μm is adhered to obtain a copper-clad laminate (i); secondly, a polyimide film having a thickness of 25 μm [Capriton 1 Ο 制 manufactured by DuPont) Η (registered trademark)], coated with a 20 μm thick epoxy-based adhesive having a flow start temperature of 80 ° C to obtain a cover film (ii); and a thickness of 50 μm obtained by the above (1) and (2) The film is used as a release film (iii); (ii) the epoxy-based adhesive layer is connected to the copper foil of (i), and the film is overlapped in the order of (i), (ii), (iii), at 190 After 1 minute of hot compression at °C and 50kgf/cm2, a flexible printed substrate is obtained; after the thermal compression, the release film (iii) and the polyimide film (i) and (Π) are pulled apart. Then, the mold release property was judged based on the following criteria. The release property from the surface of the substrate is "release property against FPC"; the release property of the adhesive and copper foil exposed by the overflow surface (electrode hole) of (i) and (ii) is "pair" Adhesive", copper foil release." 〇: No resistance, no peeling. △: When peeling off, there is a slight resistance X: It is completely adhered and is not easily peeled off. After peeling (in the case of X, strong peeling), it was confirmed whether or not the release film was broken. (6) Heat shrinkage ratio The release film obtained in the above (1) and (2) was flattened on MD and TD, and cut into 150 mm X 150 mm in an oven set at 1 90 °C. The heat was fixed for 5 minutes, and taken out and allowed to cool. Measurement -31 - 1289582 (29) The dimensions of the MD and TD before and after heating were determined, and the heat shrinkage rate was determined according to the following formula. Heat shrinkage rate (%) = (side length before heating - length of side after heating) / (length of side before heating) X 1〇〇MD is extruded by a blow molding machine or by a T-die The direction of resin flow of the molding die of the molding machine, TD is the direction perpendicular to the MD. (7) Wrinkles of FPC (Flexible Printed Substrate) are carried out in addition to the above (3, except for the use of a polyimine film having a thickness of 12.5 μm X 150 mm X 250 mm [Capital 50H (registered trademark)] manufactured by DuPont Co., Ltd. In the same compression test, the obtained FPC was taken out to confirm the presence or absence of wrinkles of the FPC. (8) Precipitating 1 A polyimide film having a thickness of 125 μm (available from DuPont, Kapudong 500H (registered trademark)) is smashed at 190° with the release film obtained in the above (1) or (2). C, 30kgf / cm2, for 5 minutes of hot compression; then, after peeling off the release film, on the surface of the polyimide film in contact with the release film, water-based singular ink (the thickness of the nib is about 1 · 5 mm ) After scribing for 5 minutes, the discharge state of the water-based singular ink was visually observed, and the precipitation property was determined according to the following criteria. 〇: The state of the water-repellent singular ink is not discharged. X = The state of the water-repellent singular ink (9) Precipitating 2 - 32 - 1289582 (30) Polyimide film at a thickness of 125 nm [made by DuPont, Capo 5 0 0H (registered trademark)], an epoxy adhesive having a thickness of 20 μm was applied by a rod, and cured at 50 ° C for 2 hours to prepare an adhesive-coated polyimide film; On the coated surface, the release film obtained in the above (1) or (2) was superposed and thermally compressed at 19 (TC, 30 kgf/cm 2 for 5 minutes; thereafter, the release film was peeled off, as described above (4) The method of measuring the contact angle of the surface of the adhesive coated surface of the polyimide. On the other hand, the blank test is performed by applying pressure at 190 ° C without applying pressure on the above-mentioned adhesive-coated polyimide film. After a minute, it was cooled, and the contact angle on the surface was measured to be 58 degrees; therefore, compared with the contact angle of the blank test (58 degrees), the difference was large, and it was judged that a substance was precipitated on the polyimine side. Moisture absorption resistance The film obtained in the above (1) or (2) is cut into a rectangular shape having a size of 100 X 1 9 Onm. , using a constant temperature and humidity tank (Taibayes Co., Ltd., ?1^3??), under 85, 95% relative humidity in a humidified environment, after exposure for 48 hours, Calculate the weight increase rate (Δ W) and calculate the average enthalpy of each of the two films; the smaller the weight increase rate (Aw), the better the moisture absorption resistance. Weight increase rate (Aw) (%) = (wi — w〇) /w〇x 100 [where w! is the weight of the film after warming and humidification (g); w〇 is dried in a hot air dryer at 100 °C for 2 hours before heating and humidification, In the dryer, put the film weight (g) after cooling to room temperature «33- 1289582 (31). (11) Heat resistance The obtained pellets are used at a cylinder temperature of 320/330/320/3 1 0 °C. Injection molding machine (IS-80EPN 'Toshiba Machinery Co., Ltd.) having a firing rate of 85% and a mold temperature of 90 ° C was injection-molded; however, the cylinder temperatures of Comparative Example 1 and Comparative Example 2 were both set at 280. (: proceeding; forming into ASTM Donzacu test piece with a thickness of 3.2 mm x 127 mm x 12.7 mm; using the obtained molded piece, measured according to ASTM-D648, under a load of 1.82 MPa (12) Rigidity The same test piece as (1 1 ) above is used for the automatic curve charting machine (made by Shimadzu Corporation, AG - 5000), according to the ASTM-D790 standard, at 23 ° The flexural modulus and flexural strength were measured under the atmosphere of C. [Example 1] φ Polyphenylene ether (PPE-1) and liquid crystal polyester (LCP-1) and zinc oxide (Ζηο, Dongbang Zinc Co., Ltd.) Company system, Yinling-1) According to the ratio (parts by weight) shown in Table 1, the barrel temperature of only the top material side is 250 °C, and the cylinder temperature and die temperature are set to 310 °C. A double-shaft extruder (made by WERNER & PFLEIDERER, ZSK-, 25) with a venting port is melt-kneaded to obtain a granule; the granule is T-shaped as shown in the above (2) The die is extruded to obtain a film having an average thickness of 51 nm; the film is evaluated according to the above method; the results are shown in Table 1; • 34-1289582 (32) The deflection temperature of the load is 184 ° C, and the flexibility is changed. The rate is 2670 MPa. [Example 2] Except that polystyrene (GP, PS Japan Co., Ltd., G 9 3 0 5 ) was used as the component (A), and each component was blended in the ratio (parts by weight) shown in Table 1, The same procedure as in Example 1 was carried out to obtain particles; the T-die shown in the above (2) was extrusion-molded to obtain a film having an average thickness of 5 μm; the film was evaluated by the above method, and the result was as follows. As shown in Table 1, the load deflection temperature was 167 ° C, and the flexural modulus was 2740 MPa. [Example 3] Except that LCP-2 was used as the component (B), liquid paraffin (wax!, manufactured by Yakusson Mobiru Co., Ltd., Cullysdorj N - 3 5 2, a colorless liquid at normal temperature) As the component (E), each component is blended in the same ratio (parts by weight) as shown in Table 1 except that it is the same as in Example 2, that is, the pellet is obtained; the T-die of the above (2) is not obtained. The pressure molding was carried out to obtain a film having an average thickness of 49 μm; the film was evaluated by the above method, and the results are shown in Table 1; the deflection temperature of the load was 168 t, and the bending elastic modulus was 275 MPa. [Example 4] In addition to using high-impact polystyrene (HIPS, manufactured by PS Japan Co., Ltd., H9405) as the component (A), polyethylene wax [wax 2, manufactured by Mitsui Chemicals Co., Ltd.] (registered trademark), 405MP, white solid at room temperature] In place of wax 1, each component is in the same ratio as shown in Table-1 -35 - 1289582 (33) (please divide). The obtained pellets were extrusion-molded using the τ-type die shown in the above (2) to obtain a film having an average thickness of 50 μm; the film was evaluated by the above method, and the results are shown in Table 1; the deflection temperature of the load was 16 3 °C, bending elastic modulus is 2820MPa °

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一撇 累 辑2 H 1 '"< 〇〇 〇· OO m csi τ*Ή Ο 〇 〇 壊 〇\ csi 〇 CNl CD 壊 X 1 0.021 比較例 3 Csl un oo 沄 v〇 卜 .〇 X wn Ο o 壊 〇 1 0.041 比較例 2 O i—H o <] X OO CO r" H 〇 1 〇 1 ίΤ) C5 比較例 1 o t—H t—H un g ί "Η 〇 〇 壊 -0.95 OO m 〇 X 0.019 實施例 9 δ ON OO 〇 〇 壊 s 〇 s o 壊 〇 1 0.016 實施例 8 〇 i—H O S 〇 〇 壊 o 00 m o 壊 〇 1 0.043 實施例 7 wn ON CN c<i o o m oo 〇 〇 壊 r-H 〇 g o 壊 〇 1 0.032 實施例 6 VO VO 寸 C<l s oo 〇 〇 壊 s o s o 壊 〇 1 0.046 實施例 5 o ο csi 04 ν/Ί t—i <1 ·ι 〇 〇 壊 2 O o 壊 〇 0.021 實施例 4 5S \〇 v〇 〇〇· r—H O in 〇 〇 壊 o csi CS o 壤 〇 S 0.024 實施例 3 oo σ\ oo o wn On S 〇 〇 壊 o o 壊 〇 0.019 實施例 2 m oo cn 寸 oo oo 〇 〇 壤 o 艺 o 瑪 〇 1 0.018 實施例 1 ir^ ON vn oo 〇 〇 壊 o … csi 〇 〇 0.024 ώ Oh PU Ο HIPS LCP-l LCP-2 o Mg(OH)2 矽烷1 ......< m CNJ m SEBSl SEBS2 改變 PPE X9102 s CU s 薄膜厚度〇im) 接觸角(°c) Ph _ 薄膜之玻璃 P 2 Q H FPC之皺紋 析出1 1 析出2(°) 耐吸濕性Aw(%) 褂 承 N_^ £ ^3" w 其他 ig -37- 1289582 (35) [實施例5] 除使用氫氧化鎂(和光純藥股份有限公司製,特級) 替代氧化鋅,做爲(C )成份,其他成份亦以表1所示之 比例配合以外,其他都和實施例3同樣的施行,即得顆 粒;以上述(2 )所示之T型模頭擠壓成型,即得平均厚 度5 2um之薄膜;依上述之方法進行薄膜的評估,其結果 如表1所示;載重撓曲溫度爲1 5 8 t ;彎曲彈性率爲 2600MPa。 [實施例6] 除使用芳香族乙烯系化合物與共軛二烯化合物之嵌段 共聚物的部份氫化聚合物[SEBS1,旭化成化學品股份有 限公司製,塔夫特車H1272(註冊商標);SEBS2,旭化 成化學品股份有限公司製,塔夫特庫 H1 041 (註冊商 標)],做爲(A )〜(E )以外之其他的成份,其他成份亦 以表1所示之比例配合以外,其他都和實施例5同樣的施 鲁 行,即得顆粒;以上述(1 )所示之吹塑成型即得平均厚 度6 0μ m之薄膜;依上述之方法進行薄膜的評估,其結果 如表1所示;載重撓曲溫度爲1 5 0 °C ;彎曲彈性率爲 23 00MPa ° .A 撇 辑 2 H 1 '"< 〇〇〇· OO m csi τ*Ή Ο 〇〇壊〇\ csi 〇CNl CD 壊X 1 0.021 Comparative Example 3 Csl un oo 沄v〇卜.〇X wn Ο o 壊〇1 0.041 Comparative Example 2 O i—H o <] X OO CO r" H 〇1 〇1 ίΤ) C5 Comparative Example 1 ot—H t—H un g ί "Η 〇〇壊-0.95 OO m 〇X 0.019 Example 9 δ ON OO 〇〇壊s 〇so 壊〇1 0.016 Example 8 〇i-HOS 〇〇壊o 00 mo 壊〇1 0.043 Example 7 wn ON CN c<ioom oo 〇〇壊rH 〇go 壊〇1 0.032 Example 6 VO VO 寸 C<ls oo 〇〇壊soso 壊〇1 0.046 Example 5 o ο csi 04 ν/Ί t—i <1 ·ι 〇〇壊2 O o壊〇0.021 Example 4 5S \〇v〇〇〇· r—HO in 〇〇壊o csi CS o 〇S 0.024 Example 3 oo σ\ oo o wn On S 〇〇壊oo 壊〇0.019 Example 2 m oo cn inch oo Oo 〇〇 o o o o o 〇 1 0.018 Example 1 ir^ ON vn oo 〇〇壊o ... csi 〇〇0.024 ώ Oh PU Ο HIPS LCP-l LCP-2 o Mg(OH)2 decane 1 ... ...< m CNJ m SEBSl SEBS2 Change PPE X9102 s CU s Film thickness 〇im) Contact angle (°c) Ph _ Film glass P 2 QH FPC wrinkle precipitation 1 1 Precipitation 2 (°) Hygroscopicity Aw (%) 褂承 N_^ £ ^3" w Other ig -37- 1289582 (35) [Example 5] In addition to using magnesium hydroxide (manufactured by Wako Pure Chemical Co., Ltd., special grade) instead of zinc oxide, as (C The components and other components are also blended in the proportions shown in Table 1, and the other ones are obtained in the same manner as in Example 3, that is, the particles are obtained; and the T-die shown in the above (2) is extruded to obtain an average thickness. 5 2 um film; film evaluation was carried out according to the above method, and the results are shown in Table 1; the load deflection temperature was 158 tons; and the bending modulus was 2600 MPa. [Example 6] A partially hydrogenated polymer using a block copolymer of an aromatic vinyl compound and a conjugated diene compound [SEBS1, manufactured by Asahi Kasei Chemicals Co., Ltd., Taft Vehicle H1272 (registered trademark); SEBS2, manufactured by Asahi Kasei Chemicals Co., Ltd., Taftku H1 041 (registered trademark)], as other components other than (A) to (E), and other components are also blended in the proportions shown in Table 1. Others were the same as in Example 5, that is, the particles were obtained; and the film having the average thickness of 60 μm was obtained by the blow molding shown in the above (1); the film was evaluated by the above method, and the results are shown in the table. 1 shows; the load deflection temperature is 150 ° C; the bending elastic modulus is 23 00 MPa ° .

[實施例7] 除使用含有胺基之矽烷化合物[矽烷1,信越化學工業 股份有限公司製之N -(yS —胺基乙基)一 r 一胺基丙基 -38- 1289582 (36) 甲基二甲氧基矽烷,商品名KBM — 602],替代(C)成份 做爲(D )成份,其他成份亦以表1所示之比例配合以 外,其他都和實施例6同樣的施行,即得顆粒;以上述 (1 )所示之吹塑成型,即得平均厚度40ym之薄膜;依上 述之方法進行薄膜的評估,其結果如表1所示;載重撓曲 溫度爲176t:,彎曲彈性率爲2740MPa。 [實施例8] φ 使用聚亞苯基醚與聚苯乙烯系樹脂之摻合物的高耐熱 改性PPE樹脂[改性PPE,旭化成化學品股份有限公司 製,札依龍X9102 (註冊商標)做爲含PPE之樹脂組成 物,依上述(1 )所示之吹塑成型,即得平均厚度4〇um 之薄膜;依上述之方法進行薄膜的評估,其結果如表1所 示;載重撓曲溫度爲159°C,彎曲彈性率爲23 60MPa。 [實施例9] φ 除(A)成份,其他之成份以表1所示之比例配合以 外,其他都和實施例1同樣的施行,即得顆粒;以上述 (1)所示之吹塑成型,即得平均厚度之薄膜;依上 述之方法進行薄膜的評估’其結果如表1所示;載重撓曲 - 溫度爲143°C,彎曲彈性率爲2100MPa ° · [比較例Π 使用聚4 一甲基- 1 -戊烯系樹脂[三井化學股份有限 -39- 1289582 (37) 公司製,PMP、RT18、TPX (註冊商標)]做爲顆粒,以 (1)所示之吹塑成型,即得平均厚度51 um之薄膜;依上 述之方法進行薄膜的評估,其結果如表1所示;載重撓曲 溫度爲l〇〇°C,彎曲彈性率爲1 2 8 0MPa。 [比較例2] 使用聚對苯二甲酸乙二醇酯樹脂(優尼季卡股份有限 公司製,PET、NEH205 0 )做爲顆粒,以(2 )所示之τ型 模頭擠壓成型,即得平均厚度50ym之薄;依上述之方法 進行薄膜的評估,其結果如表1所示;載重撓曲溫度爲 75°C,彎曲彈性率爲2420MPa。 [比較例3] 除(A )〜(C )成份以表1所示之比例配合以外,其 他都和實施例1同樣的施行,即得顆粒;以上述(2 )所 示之T型模頭擠壓成型,即得平均厚度50ym之薄膜;依 上述之方法進行薄膜的評估,其結果如表1所示;載重撓 曲溫度爲172°C,彎曲彈性率爲5100MPa。 [實施例1〇] 除(A) 、 (B) 、( C ) 、(E)成份以表1所示之 比例配合以外,其他都和實施例1同樣的施行,即得顆 粒;以上述(2 )所示之T型模頭擠壓成型,即得平均厚 度5 2 μ m之薄膜;依上述之方法進行薄膜的評估,其結果 -40- 1289582 (38) 如表1所示;載重撓曲溫度爲151 °C ’彎曲彈性率爲 24〇〇MPa ° 由上述可知,本發明之含50重量%以上的聚苯基醚系 樹脂之樹脂層(P )所成薄膜,脫模性優越、熱收縮小、 難以使印刷基板製品發生皺紋,而且脫模薄膜本身亦難以 產生皺紋,又由於不發生析出現象,耐污染性優良,且耐 吸濕性優越,極適合使用爲製造可撓性印刷基板之脫模薄 膜。 其次,就第2發明之具有多層結構的製造印刷基板用 脫模薄膜說明如下。 (13) 追隨性 將薄膜覆載於刻控有深3〇um溝槽之黃銅板上,使用 熱壓縮,於180°C、3kg/cm2、3分鐘之條件下加壓,以目 視觀察陷進溝槽之情況,用下述之基準判定其追隨性。 〇:溝槽之複製性極爲良好。 X :溝槽之複製性不佳,或溝槽四周產生皺紋。 (14) 黏著劑之溢出 在上述(5)脫模性評估之際,對直徑1.5mm之溢料面 (電極用孔),將壓縮後黏著劑在內側溢出之量,用光學顯 微鏡觀察,以下述之基準評估黏著劑之溢出性。 〇:黏著劑之溢出量在0.08mm以下之情況 △:黏著劑之溢出量爲0.08〜0.15mm時 X :黏著劑之溢出量在0.1 5nm以上之情況 (15) P — Q層間之接著力 -41 - (39) 1289582 〇:P層與Q層之薄膜不剝離 X :P層與Q層之薄膜容易剝離、或完全不密著。 (16) 滑動性 將多層薄膜兩片重疊,以壓縮機,於室溫,5kg/cm2、 1 5秒鐘之條件下加壓後,僅使上層之薄膜滑動,依下述之 基準判定與下層薄膜之滑動性;施行3次。 〇:三次均不會黏在下層薄膜上,上層薄膜可單獨滑 動。 X :至少一次以上黏在下層薄膜上,上層薄膜不能單獨 滑動。 [製造例4]樹脂層(P)之製造例(P- i) 原封不動的使用實施例1所得之顆粒。 [製造例5]樹脂層(P)之製造例(P- ii) 原封不動的使用實施例2所得之顆粒。 [製造例6]樹脂層(P)之製造例(P-iii) 、(P-i v ) 、 ( P — v ) 除以表2所示之比例配合以外,其他都和實施例1同 樣的施行,即得顆粒。 [製造7]樹脂層(P)之製造例(P - vU 使用旭化成化學品股份有限公司製之札依龍X9 1 02 (註 1289582 (40) 冊商標)’做爲貫施例8中所使用之高耐熱改性ppE樹 脂。 表2 P-i P-ii P-iii P-iv P-v P-vi (A) PPE-1 95 83 95 83 65 GP 13 13 20 組 (B)LCP-1 5 4 5 4 15 成 (C)ZnO 0.8 0.8 0.8 0.8 (D)矽烷-1 0.2 (E) 臘-1 1 臘-2 2 改性 P P E X 9 1 0 2 100[Example 7] Except for the use of an amine group-containing decane compound [decane 1, N-(yS-aminoethyl)-r-aminopropyl-38- 1289582 (36) manufactured by Shin-Etsu Chemical Co., Ltd. Dimethoxy decane, trade name KBM — 602], the substitution component (C) is used as the component (D), and the other components are also blended in the ratios shown in Table 1, and the others are the same as in the embodiment 6, that is, A pellet obtained by the above (1), that is, a film having an average thickness of 40 μm; the film was evaluated by the above method, and the results are shown in Table 1; the deflection temperature of the load was 176 t: bending elasticity The rate is 2740 MPa. [Example 8] φ High heat-resistant modified PPE resin using a blend of polyphenylene ether and polystyrene resin [Modified PPE, manufactured by Asahi Kasei Chemicals Co., Ltd., Zhayilong X9102 (registered trademark) As a resin composition containing PPE, according to the blow molding shown in the above (1), a film having an average thickness of 4 um is obtained; the film is evaluated by the above method, and the results are shown in Table 1; The flexural temperature was 159 ° C and the flexural modulus was 23 60 MPa. [Example 9] φ In addition to the component (A), the other components were blended in the same ratio as shown in Table 1, and the same procedure as in Example 1 was carried out to obtain pellets; the blow molding shown in the above (1) , that is, a film having an average thickness; the film was evaluated according to the above method. The results are shown in Table 1; the load deflection - temperature was 143 ° C, and the bending modulus was 2100 MPa °. [Comparative Example Π Poly 4 Methyl-1-pentene-based resin [manufactured by Mitsui Chemicals Co., Ltd. -39- 1289582 (37), PMP, RT18, TPX (registered trademark)] as pellets, blow molding as shown in (1), ie A film having an average thickness of 51 μm was obtained; the film was evaluated by the above method, and the results are shown in Table 1; the deflection temperature of the load was 10 ° C, and the bending modulus was 1 28 0 MPa. [Comparative Example 2] Polyethylene terephthalate resin (PET, NEH205 0, manufactured by Unica Card Co., Ltd.) was used as a pellet, and was extruded by a τ-type die shown in (2). That is, an average thickness of 50 μm was obtained; the evaluation of the film was carried out by the above method, and the results are shown in Table 1; the deflection temperature of the load was 75 ° C, and the flexural modulus was 2420 MPa. [Comparative Example 3] The pellets were obtained in the same manner as in Example 1 except that the components (A) to (C) were blended in the ratio shown in Table 1, and the T-die shown in the above (2) was obtained. Extrusion, that is, a film having an average thickness of 50 μm; the film was evaluated by the above method, and the results are shown in Table 1; the deflection temperature of the load was 172 ° C, and the flexural modulus was 5100 MPa. [Example 1] Except that the components (A), (B), (C), and (E) were blended in the ratios shown in Table 1, the same procedures as in Example 1 were carried out to obtain granules; 2) The T-die shown is extruded to obtain a film with an average thickness of 5 2 μm; the film is evaluated according to the above method, and the result is -40-9589582 (38) as shown in Table 1; The bending temperature is 151 ° C. The bending elastic modulus is 24 MPa. From the above, the film of the resin layer (P) containing 50% by weight or more of the polyphenylene ether resin of the present invention has a good mold release property. The heat shrinkage is small, it is difficult to cause wrinkles on the printed substrate product, and the release film itself is hard to wrinkle, and since no precipitation occurs, the stain resistance is excellent, and the moisture absorption resistance is excellent, and it is extremely suitable for use in manufacturing a flexible printed circuit board. Release film. Next, the release film for producing a printed circuit board having a multilayer structure according to the second aspect of the invention will be described below. (13) Follow-up film is placed on a brass plate with a deep 3〇um groove, and pressed at 180°C, 3kg/cm2, 3 minutes using thermal compression to visually observe the trap. In the case of the groove, the followability is judged by the following criteria. 〇: The replication of the groove is extremely good. X: The groove is not reproducible, or wrinkles are generated around the groove. (14) Overflow of the adhesive When the above-mentioned (5) release property evaluation is performed, the amount of the overflow surface (electrode hole) having a diameter of 1.5 mm is overflowed by the adhesive after the compression, and is observed by an optical microscope. The benchmark is used to assess the spillage of the adhesive. 〇: The amount of the adhesive overflow is less than 0.08 mm △: When the amount of the adhesive overflow is 0.08 to 0.15 mm X: The amount of the adhesive overflow is 0.1 5 nm or more (15) P - The adhesion between the Q layers - 41 - (39) 1289582 〇: The film of the P layer and the Q layer is not peeled off. X: The film of the P layer and the Q layer is easily peeled off or not completely adhered. (16) Slidability: The two layers of the multilayer film are overlapped, and the film is pressed at room temperature, 5 kg/cm2, and 15 seconds, and only the film of the upper layer is slid, and the lower layer is judged according to the following criteria. Slidability of the film; performed 3 times. 〇: It will not stick to the lower film three times, and the upper film can slide separately. X: At least one time is stuck to the underlying film, and the upper film cannot be slid separately. [Production Example 4] Production Example (P-i) of Resin Layer (P) The pellet obtained in Example 1 was used as it was. [Production Example 5] Production Example (P-ii) of Resin Layer (P) The pellet obtained in Example 2 was used as it was. [Manufacturing Example 6] Production examples (P-iii), (Pi v ), and (P-v) of the resin layer (P) were carried out in the same manner as in Example 1 except that the ratios shown in Table 2 were blended. That is, the particles are obtained. [Manufacturing Example 7] Production Example of Resin Layer (P) (P - vU using Zhayilong X9 1 02 by Asahi Kasei Chemicals Co., Ltd. (Note 1288582 (40) Trademark)' is used as Example 8 High heat-resistant modified ppE resin. Table 2 Pi P-ii P-iii P-iv Pv P-vi (A) PPE-1 95 83 95 83 65 GP 13 13 20 Group (B) LCP-1 5 4 5 4 15% (C)ZnO 0.8 0.8 0.8 0.8 (D) decane-1 0.2 (E) La-1-1 La-2-2 Modified PPEX 9 1 0 2 100

[製造例8]樹脂層(P)之製造例(p一 vii) 將馬來酸酐(和光純藥股份有限公司製,特級)2重量 φ 份、(PPE— 1 ) 80重量份、高衝擊聚苯乙烯(Ps日本股份 有限公司製,H9405) 15重量份、聚苯乙烯(ps日本股份 有限公司製,685 ) 5重量份配合,與製造例4同樣的施 行’即得以馬來酸酐功能化之聚亞苯基醚系樹脂組成物。 · [製造例9 ]芳香族乙烯葯化合物與共軛二烯化合物之 嵌段共聚物的部份氫化聚合物(S E B S - i )之製造例 合成具有聚苯乙烯氫化之聚丁二烯一聚苯乙烯結構, -43- 1289582 (41) 結合苯乙烯量3 5 %、數平均分子量6 2,Ο Ο Ο、分子量分佈 1.05、氫化前之聚丁二烯的1,2 —乙烯基結合量爲38%、 聚丁二烯部之氫化率爲99.9%的嵌段共聚物之部份氫化聚 合物。 [製造例1 〇 ]芳香族乙烯系化合物與共軛二烯化合物 之嵌段共聚物的部份氫化聚合物(s E B S — i i )之製造例 合成具有聚苯乙烯氫化之聚丁二烯一聚苯乙烯結構、 結合苯乙烯量60%、數平均分子量89,000、分子量分佈 1 . 0 8、氫化前之聚丁二烯的1,2 —乙烯基結合量爲3 8 %、 聚丁二烯部之氫化率爲99.8 %的嵌段共聚物之部份氫化聚 合物。 [製造例11 ]芳香族乙烯系化合物與共軛二烯化合物 之嵌段共聚物的部份氫化聚合物(s E B S - i i i )之製造例 以特開昭63 — 9925 7號公報上記載之方法,使用1,3 一二甲基—2-咪唑烷酮;即得具有聚苯乙烯一氫化聚丁二 烯一聚苯乙烯結構、結合苯乙烯量8%、數平均分子量 51,000、分子量分佈i·04、聚丁二烯之1,2 -乙烯基結合量 爲3 8 %之末端具有胺基的嵌段共聚物;更藉由氫化,合成 而得聚丁二烯部之氫化率爲99.8%之嵌段共聚物的部份氫化 聚合物。 [製造例1 2]芳香族乙烯系化合物與共軛二烯化合物之 1289582 (42) 嵌段共聚物的部份氫化聚合物(SEBS- 1V)之製造例 合成具有聚苯乙烯-氫化聚丁一烯一聚苯乙烯結構、 結合苯乙烯量3%、數平均分子量52,000、分子量分佈 1.05、氫化前之聚丁二烯的1,2 一乙烯基結合量爲3 8 %、聚 丁二儲部之氫化率爲9 9.9 %的嵌段共聚物之部份氫化聚合 物。 [製造13]芳香族乙烯系化合物與共軛二烯化合物之嵌 φ 段共聚物的部份氫化聚合物(SEBS— v)之製造例 合成具有聚苯乙嫌-氫化聚丁二稀-聚苯乙嫌結構、 結合苯乙烯量70%、數平均分子量82,000、分子量分佈 1.05、氫化前聚丁二烯之1,2-乙烯基結合量爲38%、聚丁 二烯部之氫化率爲9 9.9 %的嵌段共聚物之部份氫化聚合物。 [實施例11] 使用(P— i)做爲(P)層’使用芳香族乙烯系化合物 鲁 與共軛二烯化合物之嵌段共聚物的部份氫化聚合物(S EB S 一 i)做爲(Q)層,藉由上述(2)所示之τ型模頭擠壓 成型方法’即得多層薄膜,使用此脫検薄膜’依上述之方 法進行薄膜的評估,其結果如表3所示。 · [實施例12] 除(P — i )以(P - i i )替代做爲(p )層以外,其他 都和實施例1 1同樣的製得多層薄膜;依上述之方法進行 •45- 1289582 (43) 薄膜的評估,其結果如表3所示。 [實施例13] 除(P— 1)以(P — U1)替代做爲層,藉由上述 (1)所不之吹塑擠壓成型方法,製得多層薄膜以外,其 他都和實施例1 1同樣的進行薄膜之評估,其結果如表3 所示。 [實施例14] 除(P — i )以(P — iv )替代做爲(p )層以外,其他 都和實施例1 1同樣的製得多層薄膜;依上述之方法進行 薄膜的評估,其結果如表3所示。 [實施例15] 除(P — i )以(P - v )替代做爲(P )層以外,其他 和實施例11同樣的製得多層薄膜;依上述之方法進行薄 春 膜的評估,其結果如表3所示。 [實施例16] 除(SEBS — i )以(SEBS — Π )替代做爲(Q )層之 / 芳香族乙烯系化合物與共軛二烯化合物的嵌段共聚物之部 * 份氫化聚合物以外,其他都和實施例1 1同樣的製得多層 薄膜;依上述之方法進行薄膜的評估,其結果如表3所 示。 -46 - (44) 1289582 [實施例17] 除(P — i )以(P — vi )替代做爲(P )層,(SEBS — i)以(SEBS— ii)替代做爲(Q)層之芳香族乙烯系化合 物與共軛二烯化合物的嵌段共聚物之部份氫化聚合物以 外,其他都和實施例1 1同樣的製得多層薄膜;依上述之方 法進行薄膜的評估,其結果如表3所示。 [實施例18] 除(P — 1)以(P — vii)替代做爲(P)層,(SEBS — i)以(SEBS - m)替代做爲(Q)層之芳香族乙烯系化合 物與共軛二烯化合物的嵌段共聚物之部份氫化聚合物以 外,其他卻和實施例1 1同樣的製得多層薄膜;依上述之方 法進行薄膜的評估,其結果如表3所示。 [實施例19] 以乙烯-醋酸乙烯共聚物[EVA— 1,旭化成化學品股份 有限公司製,桑特庫EF0925 (註冊商標)、VA含量9重量 %、MFR = 2.5g/10 分鐘)替代(SEBS — i)做爲(Q)層,將 上述(2 )的T型模頭法所得(P —)之單層薄膜,分別送 料至T型模頭的上下兩邊,使EVA - 1樹脂於熔融狀態自丁 型模頭流出,以設定在165 °C之第1滾筒乾式層壓,即得多 層結構的薄膜;P/Q/P層之厚度爲30/1 50/30μηι。 (45) 1289582 [實施例20] 除(P — 1 )以(P — iv )替代做爲(p )層以外,其他都 和貫施例1 9同樣的以乾式層壓法製得多層構造之薄膜, P/Q/P 層之厚度爲 25/1 50/25urn。 [實施例21] 除(SEBS — i )以(SEBS — iv )替代做爲(Q )層以 外’其他都和實施例1 1同樣的施行;p 一 q之層間密著力爲 X ’谷易剝離。 [實施例22] 除(SEBS — Π以(SEBS — v)替代做爲(Q)層以外, 其他都和實施例11同樣的施行;追隨性爲χ,黏著劑之溢 出性爲△。 [比較例4 ] 除使用聚4 —甲基一1—戊烯系樹脂[PMP、RT18、ΤΡΧ (註冊商標),三并化學股份有限公司製]做爲(Ρ )層,施 行以(1 )所示之吹塑成型以外,其他都和實施例1 1同樣的 製得多層薄膜;依上述之方法進行薄膜的評估,其結果如 表3所示。 Ρ — Q層間密著不佳之故,不能詳估追隨性及滑動性。 [比較例5 ] -48- (46) 1289582 除使用聚對苯二甲酸乙二醇酯(PET、NEH2050,優尼 季卡股份有限公司製)做爲(P )層以外,其他都和實施例 11同樣的製得多層薄膜;依上述之方法進行薄膜的評估, 其結果如表3所示;P - Q層間密著不佳之故,不能評估追 隨性及滑動性。[Production Example 8] Production Example (P-vii) of Resin Layer (P): Maleic Anhydride (Special Grade, manufactured by Wako Pure Chemical Industries, Ltd.) 2 parts by weight φ, (PPE-1) 80 parts by weight, high impact polymerization Styrene (manufactured by Ps Japan Co., Ltd., H9405) 15 parts by weight, and polystyrene (made by ps Japan Co., Ltd., 685), 5 parts by weight, and the same as in Production Example 4, which was functionalized with maleic anhydride. Polyphenylene ether-based resin composition. [Production Example 9] Production example of partially hydrogenated polymer (SEBS - i ) of block copolymer of aromatic vinyl compound and conjugated diene compound. Synthesis of polybutadiene-polyphenylene having polystyrene hydrogenation Ethylene structure, -43- 1289582 (41) The combined styrene content is 35 %, the number average molecular weight is 6, 2, Ο Ο, molecular weight distribution is 1.05, and the 1,2-vinyl bond of polybutadiene before hydrogenation is 38. %, the partial hydrogenated polymer of the block copolymer having a hydrogenation ratio of the polybutadiene portion of 99.9%. [Production Example 1] Production Example of Partially Hydrogenated Polymer (s EBS - ii ) of Block Copolymer of Aromatic Vinyl Compound and Conjugated Diene Compound Synthesis of Polybutadiene Polymerized by Polystyrene Hydrogenation The styrene structure, the amount of bound styrene is 60%, the number average molecular weight is 89,000, the molecular weight distribution is 1.0, and the 1,2-vinyl binding amount of the polybutadiene before hydrogenation is 38%, and the polybutadiene portion is A partially hydrogenated polymer of a block copolymer having a hydrogenation rate of 99.8%. [Production Example 11] A method of producing a partially hydrogenated polymer (s EBS - iii ) of a block copolymer of an aromatic vinyl compound and a conjugated diene compound is disclosed in JP-A-63-9925 Using 1,3 dimethyl- 2-imidazolidinone; that is, having a polystyrene-hydrogenated polybutadiene-polystyrene structure, a combined styrene amount of 8%, a number average molecular weight of 51,000, and a molecular weight distribution I.04, a polybutadiene having a 1,2-vinyl grouping amount of 38% of a block copolymer having an amine group at the terminal; and a hydrogenation ratio of a polybutadiene portion obtained by hydrogenation and synthesis is 99.8 Partially hydrogenated polymer of % block copolymer. [Production Example 1 2] Production of a partially hydrogenated polymer (SEBS-1V) of an aromatic vinyl compound and a conjugated diene compound of 1,298,582 (42) block copolymer having a polystyrene-hydrogenated polybutene The polystyrene structure, the bound styrene amount 3%, the number average molecular weight 52,000, the molecular weight distribution 1.05, the 1,2-vinyl bond content of the polybutadiene before hydrogenation is 38%, and the polybutadiene storage portion A partially hydrogenated polymer of a block copolymer having a hydrogenation rate of 99.9%. [Production 13] A production example of a partially hydrogenated polymer (SEBS-v) of an aromatic vinyl compound and a conjugated diene compound embedded in a φ segment copolymer having a polystyrene-hydride-hydrogenated polybutylene-polyphenylene The structure of B is 70%, the number of styrene is 85%, the number average molecular weight is 82,000, the molecular weight distribution is 1.05, the 1,2-vinyl bond of polybutadiene before hydrogenation is 38%, and the hydrogenation rate of polybutadiene is 9 9.9. Part of the hydrogenated polymer of the block copolymer. [Example 11] Using (P-i) as a (P) layer 'partial hydrogenated polymer (S EB S i) using a block copolymer of an aromatic vinyl compound and a conjugated diene compound For the (Q) layer, the film was evaluated by the above-described method using the τ-type die extrusion molding method shown in (2) above, that is, a multi-layer film, and the results are as shown in Table 3. Show. [Example 12] A multi-layer film of the same manner as in Example 1 except that (P - i ) was replaced by (P - ii ) as the (p) layer; the above method was carried out. • 45- 1289582 (43) Evaluation of the film, the results of which are shown in Table 3. [Example 13] Except that (P-1) was replaced by (P - U1) as a layer, by the blow molding extrusion method of the above (1), a multi-layer film was produced, and the same as in Example 1 1 The same evaluation of the film was carried out, and the results are shown in Table 3. [Example 14] A multi-layer film which was the same as that of Example 11 except that (P - i ) was replaced by (P - iv ) as the layer (p); the evaluation of the film was carried out by the above method. The results are shown in Table 3. [Example 15] A multi-layer film was produced in the same manner as in Example 11 except that (P - i ) was replaced by (P - v ) as the (P) layer; the evaluation of the thin film was carried out according to the above method. The results are shown in Table 3. [Example 16] Except that (SEBS — i ) was replaced by (SEBS — Π ) as a part of the (Q ) layer/block copolymer of the aromatic vinyl compound and the conjugated diene compound. A multi-layer film was prepared in the same manner as in Example 1; the film was evaluated by the above method, and the results are shown in Table 3. -46 - (44) 1289582 [Embodiment 17] Except that (P - i ) is replaced by (P - vi ) as (P) layer, (SEBS - i) is replaced by (SEBS - ii) as (Q) layer A multi-layer film prepared in the same manner as in Example 11 except for the partial hydrogenated polymer of the block copolymer of the aromatic vinyl compound and the conjugated diene compound; the film was evaluated by the above method, and the result was as follows. as shown in Table 3. [Example 18] Except that (P-1) was replaced by (P-vii) as the (P) layer, (SEBS-i) was replaced by (SEBS-m) as the (Q) layer of the aromatic vinyl compound and A multilayer film of the same composition as that of Example 11 except for the partial hydrogenated polymer of the block copolymer of the conjugated diene compound was used; the evaluation of the film was carried out by the above method, and the results are shown in Table 3. [Example 19] The ethylene-vinyl acetate copolymer [EVA-1, manufactured by Asahi Kasei Chemicals Co., Ltd., Sant Ku EF0925 (registered trademark), VA content 9 wt%, MFR = 2.5 g/10 min) was replaced ( SEBS — i) As the (Q) layer, the single layer film obtained by the T-die method of the above (2) is fed to the upper and lower sides of the T-die, and the EVA-1 resin is melted. The state flows out of the dicing die to dry lamination of the first roller set at 165 ° C, that is, a film of a multi-layer structure; the thickness of the P/Q/P layer is 30/1 50/30 μm. (45) 1289582 [Example 20] A film of a multi-layer structure which was produced by a dry lamination method in the same manner as in Example 19 except that (P-1) was replaced by (P-iv) as the (p) layer. The thickness of the P/Q/P layer is 25/1 50/25 urn. [Example 21] Except that (SEBS - i ) was replaced by (SEBS - iv ) as the (Q) layer, the others were all carried out in the same manner as in Example 1; the interlaminar adhesion of p-q was X' . [Example 22] Except that (SEBS - Π was replaced by (SEBS - v) as the (Q) layer, the same operation as in Example 11 was carried out; the followability was χ, and the overflow property of the adhesive was Δ. Example 4] In addition to the use of poly-4-methyl-1-pentene resin [PMP, RT18, ΤΡΧ (registered trademark), manufactured by Sanwa Chemical Co., Ltd.] as the (Ρ) layer, the implementation is as shown in (1) In addition to the blow molding, the same multilayer film as in Example 1 was used; the evaluation of the film was carried out according to the above method, and the results are shown in Table 3. Ρ - The adhesion between the Q layers was poor, and it was not possible to estimate [Comparative Example 5] -48- (46) 1289582 In addition to polyethylene terephthalate (PET, NEH2050, manufactured by Unica Card Co., Ltd.) as the (P) layer The other multilayer film was prepared in the same manner as in Example 11; the evaluation of the film was carried out by the above method, and the results are shown in Table 3; the adhesion between the P-Q layers was poor, and the followability and slidability could not be evaluated.

•49- 1289582(47) 實施例 6 Ph S 1 T型 模頭 r—Η 〇 〇 X <] 1 X 比較例 5 Oh SEBS-i P/Q/P T型 模頭 VsD 卜 < X 1 〇 X 1 比較例 4 Oh s SEBS-i P/Q/P 吹塑 f1 H 〇 〇 1 〇 X 1 累 Κ > pL EVA-i P/Q/P τ型 模頭 σ\ oo 〇 〇 〇 〇 〇 〇 孽 辑2 鹣 ώ EVA-i P/Q/P Τ型 模頭 on oo 〇 〇 〇 〇 〇 〇 碱 Oh SEBS-iii P/Q/P Τ型 模頭 〇 〇 〇 〇 〇 〇 辑ί * PU SEBS-ii P/Q/P Τ型 模頭 CS| oo 〇 〇 〇 〇 〇 〇 實施例 16 £ SEBS-ii P/Q/P Τ型 模頭 to oo 〇 〇 〇 〇 〇 〇 孽 辑2 * > cu SEBS-i P/Q/P Τ型 丨模頭 〇 〇 〇 〇 〇 〇 ㈣艺 Κ > z SEBS-i P/Q/P Τ型 模頭 〇\ oo 〇 〇 〇 〇 〇 〇 m 辑2 U :l SEBS-i P/Q/P 吹塑 oo 〇 〇 〇 〇 〇 〇 實施例 12 Oh SEBS-i P/Q/P Τ型 模頭 oo 〇 〇 〇 〇 〇 〇 辑二 * CU SEBS-i P/Q/P Τ型 1模頭 oo 〇 〇 〇 〇 〇 〇 幽 o 層構成 成形法 c 對FPC 對黏著劑、銅 I箔 追隨性 黏著劑之溢出 P-Q層間密著力 滑動性 骚 ts 幽 脫模性 激謹• 49- 1289582 (47) Example 6 Ph S 1 T-type die r—Η 〇〇X <] 1 X Comparative Example 5 Oh SEBS-i P/Q/PT type die VsD 卜<X 1 〇 X 1 Comparative Example 4 Oh s SEBS-i P/Q/P blow molding f1 H 〇〇1 〇X 1 Κ Κ > pL EVA-i P/Q/P τ-type die σ\ oo 〇〇〇〇〇 〇孽 2 2 鹣ώ EVA-i P/Q/P Τ-type die on oo 〇〇〇〇〇〇 base Oh SEBS-iii P/Q/P Τ-type die ί ί * PU SEBS-ii P/Q/P Τ-type die CS| oo 〇〇〇〇〇〇Example 16 £ SEBS-ii P/Q/P Τ-type die to oo 〇〇〇〇〇〇孽 2 2 &gt ; cu SEBS-i P/Q/P Τ 丨 〇〇〇〇〇〇 四 (4) geisha > z SEBS-i P/Q/P Τ 模 〇 oo 〇〇〇〇〇〇 2 U :l SEBS-i P/Q/P Blow molding oo 〇〇〇〇〇〇Example 12 Oh SEBS-i P/Q/P Τ-type die oo 〇〇〇〇〇〇 二 2* CU SEBS- i P/Q/P Τ type 1 die oo 〇〇〇〇〇〇 o o layer forming method c for FPC adhesion agent, copper I foil follow-up adhesive overflow PQ interlayer Closeness, slidability, ts, ts, detachment, temperament

-50- 1289582 (48) [比較例6 ] 使用聚4 —甲基一 1-戊烯系樹脂[PMP、RT18、TPX (註冊商標)、三井化學股份有限公司製]做爲(P )層,爲 無(Q)層之單層脫模薄膜;依上述之方法進行薄膜的評 估,其結果如表3所示。 由上述可知,依本發明,含有(A)聚亞苯基醚系樹脂 之(P )層、與含有(F )彈性體之(Q )層所成的多層結構 之薄膜、脫模性優越、追隨性、黏著劑之溢出性、多層薄膜 間之密著力、薄膜間之滑動性均甚優異,極適合使用於製造 印刷基板,尤其是製造可撓性印刷基板。 [產業上利用性] 藉由本發明能提供,含有聚亞苯基醚系樹脂組成物、 脫模性優越、熱收縮小、難以使印刷基板製品發生皺紋、而 且脫模薄膜本身亦難產生皺紋;又,因不發生析出現象之 故,耐污染性優良,且耐吸濕性優越;然後,追隨性、黏著 劑之溢出性、多層薄膜間之密著力、薄膜間之滑動性均甚優 異,極適合使用爲製造印刷基板,尤其是製造可撓性印刷基 板之脫模薄膜。 本發明業已詳細說明如上,在不超越本發明之精神與 範圍內,可加以各種各樣之改變及修正。 本申請係以2003年4月18日申請之日本專利申請 (特願2003 — 1 1 3843 ),及2003年4月23日申請之日本專 利申請(特願2003 - 1 1 8842 )爲基準者,並摘取其內容做 爲參考。 -51 --50- 1289582 (48) [Comparative Example 6] Poly(4-methyl-1-pentene-based resin [PMP, RT18, TPX (registered trademark), manufactured by Mitsui Chemicals, Inc.] was used as the (P) layer. A single layer release film having no (Q) layer; the evaluation of the film was carried out in the same manner as above, and the results are shown in Table 3. According to the present invention, the film of the multilayer structure comprising the (P) layer of the (A) polyphenylene ether resin and the (Q) layer containing the (F) elastomer is excellent in mold release property. The followability, the adhesion of the adhesive, the adhesion between the multilayer films, and the slidability between the films are excellent, and are extremely suitable for use in the production of printed substrates, particularly in the manufacture of flexible printed substrates. [Industrial Applicability] According to the present invention, it is possible to provide a polyphenylene ether-based resin composition, which has excellent mold release property, small heat shrinkage, difficulty in wrinkles of a printed circuit board product, and difficulty in wrinkles in the release film itself; Moreover, since the appearance of the precipitate does not occur, the stain resistance is excellent, and the moisture absorption resistance is excellent. Then, the followability, the overflow property of the adhesive, the adhesion between the multilayer films, and the slidability between the films are excellent, and are extremely suitable. A release film for producing a printed substrate, in particular, a flexible printed substrate is used. The present invention has been described in detail above, and various changes and modifications can be made without departing from the spirit and scope of the invention. The present application is based on a Japanese patent application filed on Apr. 18, 2003 (Japanese Patent Application No. 2003- 1 1 3843), and Japanese Patent Application No. 2003-119849, filed on Apr. 23, 2003. And extract its contents as a reference. -51 -

Claims (1)

1289582 ————— I年ί月分9修(更}正本 拾、申請專利範圍 第93 1 1 0773號專利申請案 中文申請專利範圍修正本 民國95年9月27 日修正 1. 一種製造印刷基板用脫模薄膜,其特徵爲樹脂層 (P)係含有,(A)聚亞苯基醚系樹脂50重量%以上,與 (B )液晶聚酯,(B )成份對(A )成份與(B )成份的合 g十重量100重量份,爲0.5〜50重量份者。 2 ·如申請專利範圍第1項之製造印刷基板用脫模薄 膜’其中樹脂層(P)更含有,對(A)成份與(B)成份的 合計重量100重量份,爲0.1〜10重量份之(C)含有一價、 二價、三價或四價的金屬元素的化合物者。 3·如申請專利範圍第2項之製造印刷基板用脫模薄 膜,其中一價、二價、三價或四價的金屬元素爲由Zn元素 及Mg元素之至少一種所成者。 4·如申請專利範圍第1項之製造印刷基板用脫模薄 膜,其中樹脂層(P)更含有,對(A)成份與(B)成份的 合計重量100重量份,爲0.1〜5重量份之(D)矽烷化合物 者。 5 ·如申請專利範圍第4項之製造印刷基板用脫模薄 膜,其中(D)矽烷化合物爲具有胺基者。 6·如申請專利範圍第5項之製造印刷基板用脫模薄 膜,其中樹脂層(P)更含有,對(A)成份與(B)成份的 合計重量100重量份,爲0.1〜4重量份之(E)烴系鱲者。 1289582 7. 如申請專利範圍第1項之製造印刷基板用脫模薄 膜,其具有本質上僅由上述樹脂層(P )所成之單層結構 者。 8. 如申請專利範圍第1項之製造印刷基板用脫模薄 膜,其具有由上述樹脂層(P)、與含有(F)彈性體之層 (Q )所成的多層結構者。 9. 如申請專利範圍第8項之製造印刷基板用脫模薄 膜,其中(F )彈性體係,(G )芳香族乙烯系化合物與共 軛二烯化合物之嵌段共聚物的部份氫化聚合物者。 I 〇·如申請專利範圍第9項之製造印刷基板用脫模薄 膜,其中於(G )成份中,芳香族乙烯系化合物之結合量爲 5〜65重量%者。 II ·如申請專利範圍第8項之製造印刷基板用脫模薄 膜’其中(F )彈性體係(Η )乙烯與乙烯酯化合物之共聚 物者。 12.如申請專利範圍第1〜11項中任一項之製造印刷基 板用脫模薄膜,其係以擠壓管式法成型而得者。 1 3 .如申請專利範圍第1〜11項中任一項之製造印刷基 板用脫模薄膜,其係以Τ型模頭擠壓法成型而得者。 14.如申請專利範圍第丨〜丨丨項中任一項之製造印刷基 板用脫模薄膜,其中最外層的薄膜表面與水滴之接觸角爲 80度以上者。 1 5 ·如申請專利範圍第1〜11項中任一項之製造印刷基 板用脫模薄膜,其中印刷基板爲可撓性印刷基板者。1289582 ————— I Year ί月分分9修 (more} 正本拾, patent application scope 93 1 1 0773 Patent application Chinese application patent scope amendments. Amendment of September 27, 1995. 1. A manufacturing printing A release film for a substrate, characterized in that the resin layer (P) contains (A) a polyphenylene ether resin of 50% by weight or more, and (B) a liquid crystal polyester, and (B) a component (A) and (B) The total weight of the component is 100 parts by weight, and is 0.5 to 50 parts by weight. 2 · The release film for producing a printed circuit board according to the first aspect of the patent application' wherein the resin layer (P) is further contained, A) The total weight of the component and the component (B) is 100 parts by weight, and is 0.1 to 10 parts by weight of (C) a compound containing a monovalent, divalent, trivalent or tetravalent metal element. The release film for producing a printed circuit board according to Item 2, wherein the monovalent, divalent, trivalent or tetravalent metal element is formed by at least one of a Zn element and a Mg element. A release film for producing a printed circuit board, wherein the resin layer (P) is further contained, and the (A) component is B) The total weight of the component is 100 parts by weight, and is 0.1 to 5 parts by weight of the (D) decane compound. 5 . The release film for producing a printed circuit board according to claim 4, wherein the (D) decane compound has 6. A release film for producing a printed circuit board according to the fifth aspect of the invention, wherein the resin layer (P) further contains 100 parts by weight of the total weight of the component (A) and the component (B), and is 0.1. ~4 parts by weight of the (E) hydrocarbon system. 1289582 7. The release film for producing a printed circuit board according to the first aspect of the invention, which has a single layer structure consisting essentially only of the above resin layer (P) 8. The release film for producing a printed circuit board according to the first aspect of the invention, which has a multilayer structure comprising the resin layer (P) and the layer (Q) containing the (F) elastomer. A release film for producing a printed circuit board according to claim 8 wherein (F) an elastic system, (G) a partially hydrogenated polymer of a block copolymer of an aromatic vinyl compound and a conjugated diene compound I 〇 · Manufacturing printing as claimed in item 9 of the patent application The release film for a substrate, wherein the amount of the aromatic vinyl compound in the component (G) is 5 to 65 wt%. II. The release film for printing a printed circuit board according to the scope of claim 8 ' F) an elastic system (Η) a copolymer of ethylene and a vinyl ester compound. The release film for a printed circuit board according to any one of claims 1 to 11, which is formed by a squeeze tube method. The release film for a printed circuit board according to any one of claims 1 to 11, which is obtained by a die-die extrusion method. The release film for producing a printing substrate according to any one of the preceding claims, wherein the surface of the outermost film is at a contact angle with water droplets of 80 or more. The release film for a printed substrate according to any one of claims 1 to 11, wherein the printed substrate is a flexible printed substrate.
TW93110773A 2003-04-18 2004-04-16 Release film for printed wiring board production TWI289582B (en)

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DE602005026303D1 (en) * 2004-10-14 2011-03-24 Asahi Kasei Chemicals Corp Resin composition
JP4845233B2 (en) * 2004-12-21 2011-12-28 三菱樹脂株式会社 Release film for printed circuit board manufacturing
JP2007145016A (en) * 2005-11-02 2007-06-14 Asahi Kasei Chemicals Corp Film made of polyphenylene ether resin and its production method
JP5121550B2 (en) * 2007-04-23 2013-01-16 旭化成ケミカルズ株式会社 Resin composition
JP2010245380A (en) * 2009-04-08 2010-10-28 Asahi Kasei Chemicals Corp Film for solar cell back sheet, and solar cell back sheet and solar cell module using the same
JP6467800B2 (en) * 2014-07-30 2019-02-13 住友ベークライト株式会社 Release film
JP7306228B2 (en) * 2019-11-08 2023-07-11 三菱ケミカル株式会社 Laminated film, Laminated film for flexible printed circuit board process
WO2022186044A1 (en) 2021-03-02 2022-09-09 三井化学株式会社 4-methyl-1-pentene polymer

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