TWI286661B - Transfer process and apparatus for inkjet pattern - Google Patents

Transfer process and apparatus for inkjet pattern Download PDF

Info

Publication number
TWI286661B
TWI286661B TW095126650A TW95126650A TWI286661B TW I286661 B TWI286661 B TW I286661B TW 095126650 A TW095126650 A TW 095126650A TW 95126650 A TW95126650 A TW 95126650A TW I286661 B TWI286661 B TW I286661B
Authority
TW
Taiwan
Prior art keywords
pattern
film
inkjet
substrate
carrier
Prior art date
Application number
TW095126650A
Other languages
Chinese (zh)
Other versions
TW200807145A (en
Inventor
Cheng-Hung Yu
Cheng-Po Yu
Original Assignee
Unimicron Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unimicron Technology Corp filed Critical Unimicron Technology Corp
Priority to TW095126650A priority Critical patent/TWI286661B/en
Application granted granted Critical
Publication of TWI286661B publication Critical patent/TWI286661B/en
Publication of TW200807145A publication Critical patent/TW200807145A/en

Links

Landscapes

  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

A transfer process for inkjet pattern is provided as follows. First, a carrier is provided to be formed a film pattern by printing inkjet thereon. The film pattern contacts with a surface of a substrate face to face and is cured by curing process. Finally, the carrier is removed so that the film pattern is transferred to print on the surface of the substrate. The transfer process for inkjet pattern is adopted instead of forming pattern on the surface of the substrate directly, so that the film pattern on the carrier can be transferred to print on the above and surrounding area of a through hole or a blind hole on the substrate, rather than dipping into therein. Accordingly, the problem that a film pattern can not be printed on the above and surrounding area of the hole of the substrate is overcome.

Description

且特別是有關於一種And especially about one kind

I286661 2l 162twf.doc/g 九、發明說明: 【發明所屬之技術領域】 本發明是有關於一種噴墨製程 噴墨圖案轉移製程。 【先前技術】 傳統以喷墨印刷(inkjet printing)製程來形成預定圖 案具有下列優點,例如不需使用光罩或網版,僅需進行單 〜^ “即可將光阻油墨任意印刷成所需之圖案(包括文 予、規則或不規則等複雜圖案),使得圖案化線路的製作更 為方便,一而且能縮短製程時間。另外,由於喷墨印刷製程 僅需進行圖案處理、喷墨、印刷以及固化等簡單步驟,而 不需進行曝光、顯影等步驟,因此無須 %保問題的產生。此外,喷墨印㈣賴使用之設備 ^材料使^率南以及製程週期短,因此可降低製程成本。 ^圖+1 %不一種具有通孔的基板的示意圖,而圖2繪示 ^的,墨印刷製程直接在基板表面上形成預定圖案的示 思圖。請參考目!,習知基板簡械鑽孔方式形成通 孔102 ’並以電鑛製程形成導電層104於通孔1〇2的内壁 及孔緣之後,再㈣2之喷頭直接在基板的上方 f出光阻油墨202,以形成預錢案。然而,因為油墨2〇2 具有流動性,、遇到較大孔徑的通孔1G2時,會陷入於通孔 _中除非通孔102的孔徑报小加上特殊配方的油墨(如 南黏度);亦或是通孔1〇2内已被填孔材料或油墨填滿,才 1286661 21162twf.doc/g 可阻擋油墨202陷入’否則就不能有效地遮蔽通孔1〇2上 方和周圍表面。 特別是在光阻喷墨製程中,若光阻油墨2〇2不能有效 地遮蔽通孔102上方和周圍表面,將使通孔1〇2内及孔緣 上的導電層104暴露於光阻油墨2〇2之外而被後續的蝕刻 ‘私知钮,因而造成斷路或可靠度不佳等問題。 【發明内容】I286661 2l 162 twf.doc/g IX. Description of the Invention: [Technical Field] The present invention relates to an ink jet process ink jet pattern transfer process. [Prior Art] Conventionally, an inkjet printing process for forming a predetermined pattern has the following advantages, for example, without using a photomask or a screen, it is only necessary to perform a single image to print the photoresist ink as desired. The pattern (including complex patterns such as text, rules or irregularities) makes the production of patterned lines more convenient, and can shorten the processing time. In addition, since the inkjet printing process only requires pattern processing, inkjet, and printing. And simple steps such as curing, without the need for exposure, development and other steps, so there is no need to maintain the problem of the %. In addition, the inkjet printing (four) depends on the equipment used to make the rate and the process cycle is short, thus reducing the process cost ^ Figure +1% is not a schematic view of a substrate with a through hole, and Figure 2 shows a schematic diagram of the ink printing process directly forming a predetermined pattern on the surface of the substrate. Please refer to the item! The through hole 102' is formed by the drilling method, and the conductive layer 104 is formed in the inner wall and the edge of the through hole 1〇2 by the electric ore process, and the nozzle of the (4) 2 directly emits the light resistance directly above the substrate. The ink 202 is formed to form a pre-money case. However, since the ink 2〇2 has fluidity, when a through-hole 1G2 having a large aperture is encountered, it will fall into the through-hole _ unless the aperture of the through-hole 102 is small and special The ink of the formula (such as the south viscosity); or the through hole 1 〇 2 has been filled with the hole filling material or ink, only 1286661 21162twf.doc / g can block the ink 202 into 'otherwise it can not effectively block the through hole 1 Above and around the surface of 〇2. Especially in the photoresist inkjet process, if the photoresist ink 2〇2 cannot effectively block the upper and surrounding surfaces of the via 102, it will conduct electricity in the via 1b and on the edge of the hole. The layer 104 is exposed to the photoresist ink 2〇2 and is subsequently etched by the 'private button, thus causing problems such as open circuit or poor reliability.

本發明的目的就是在提供一種喷墨圖案轉移製程,可 ,印一預定的成顧案於基板上,以改善習知噴墨印刷製 程 首先,::3:種案轉移製程’包括下列步驟: 案;將成膜圖案與一基板的二:::二以形成-成膜圖 ::圖案;最後’移除载具以使成膜圖案板=SUMMARY OF THE INVENTION The object of the present invention is to provide an ink jet pattern transfer process which can be printed on a substrate to improve the conventional ink jet printing process. First, the ::3: seed transfer process includes the following steps: Case; forming a film pattern with a substrate of two::: two to form a film-forming pattern:: pattern; finally 'removing the carrier to make a film-forming pattern plate=

驟:首本=:=^ 膜圖案;半固化成膜圖案;將成 具上以形成-成 行面對面接觸;最後,移除==:-基板的表面進 的表面上。 /、使成勝圖案轉印到基板 一固贿,故-載具以及 ,的表面:對 1286661 21162twf.doc/g 依照本發明的實施例所述,上述之基板具有至少一通 孔或盲孔,通孔或盲孔中具有一導電層,而成膜圖案對應 覆蓋於通孔或盲孔上方及周圍表面。 依照本發明的實施例所述,上述之載具包括一硬板、 一軟板或一離型紙,其具有可承載成膜圖案之一平坦表 面。在另一實施例中,載具之平坦表面與成膜圖案之間還 具有一脫膜層。 _ 地,上现之固化器例如是光| 化器,其產生的光能照射於成膜圖案,使其固化。 依照本發_所述,上述之削以例如是熱[ 匕卯其產生的熱能加熱於成膜圖案,使i固化。 •載时墨_轉移製程,可形翻定圖案方 载/、上,而非直接形成於基板的表面 表面上存在有财或盲孔時,本發ϋ基板白、' 案轉印到通孔或盲孔上方及周圍表面了=的預定圖 或盲孔中,進而提高製程可靠度。4入於通孔 易懂為==_他目的、特徵和優點能物 明如下特舉較佳賞施例,並配合所附圓式,作^ 【實施方式】 製程的流程圖。請先::圖之噴墨圖案轉移 =載上:=:任其:,:是^^ 了以疋任何適當可做為裁具的圖索轉 1 ’包括 I28662^Ldoc/g 硬板、軟板或離型紙等材質,通常具有平坦且均勻的表面。 此外,載具310可依據油墨的性質做表面處理,例如親水 性、疏水性或易脫膜處理專,以形成一脫膜層308,I可 以依據不同的油墨配方做搭配,例如需要照光的uv光阻 油墨,可以搭配可透光的載具/離型紙;熱固型的抗蝕刻阻 劑油墨,可以搭配耐熱型的載具/離型紙。Step: First ===^ film pattern; semi-cured film forming pattern; the mold is formed to form a face-to-face contact; finally, the surface of the substrate is removed ==:-. /, transferring the winning pattern to the substrate, fixing the bribe, so the surface of the carrier and: 1286661 21162twf.doc / g According to an embodiment of the invention, the substrate has at least one through hole or blind hole, The through hole or the blind hole has a conductive layer, and the film forming pattern covers the upper surface and the surrounding surface of the through hole or the blind hole. According to an embodiment of the invention, the carrier comprises a hard board, a soft board or a release paper having a flat surface that can carry a film forming pattern. In another embodiment, the release surface of the carrier has a release layer between the flat surface and the film formation pattern. _ Ground, the emerging curing device is, for example, a photo-chemical device, and the generated light energy is irradiated onto the film forming pattern to cure it. According to the present invention, the above-described cutting is performed, for example, by heat [heat generated by the heat generated in the film forming pattern to cure i. • When the ink-on-transfer process is carried out, the pattern can be folded on the surface, and the surface of the substrate is not directly formed on the surface of the substrate. When there is a wealth or a blind hole, the substrate of the bun is white, and the film is transferred to the through hole. Or in the predetermined pattern or blind hole above the blind hole and the surrounding surface, thereby improving the process reliability. 4 into the through hole Easy to understand == _ his purpose, characteristics and advantages can be described as a special preferred embodiment, and with the accompanying round, ^ [Embodiment] process flow chart. Please first:: The inkjet pattern transfer of the figure = loaded: =: Ren::: Yes ^^ 疋 Any suitable can be used as a cutting tool to turn 1 'including I28662^Ldoc/g hard board, soft Materials such as plates or release papers usually have a flat and uniform surface. In addition, the carrier 310 can be surface-treated according to the properties of the ink, such as hydrophilic, hydrophobic or easy to release film, to form a release layer 308, I can be matched according to different ink formulations, such as uv requiring illumination The photoresist ink can be used with a light-transmissive carrier/release paper; the thermosetting anti-etching resist ink can be matched with a heat-resistant carrier/release paper.

在本實施例中,油墨經由喷頭300的控制噴印於載具 310上,先形成一負圖案,待負圖案於載具31〇上成膜^ 後,再將負圖案與待移轉的元件表面進行面對面接觸,經 過油墨固化程序,將載具310移除之後,即可將負圖案^ 印到元件的表面,而在元件表面形成正圖案。In this embodiment, the ink is printed on the carrier 310 via the control of the head 300, and a negative pattern is formed first. After the negative pattern is formed on the carrier 31, the negative pattern and the image to be transferred are removed. The surface of the component is in face-to-face contact, and after the carrier 310 is removed by the ink curing process, the negative pattern is printed onto the surface of the component to form a positive pattern on the surface of the component.

在圖4中,由於先以喷印方式在載具31〇上形成成膜 圖案312,故不受基板320上通孔322或盲孔324的影響、, 因此可以在基板32〇上很均勻的成膜,尤其是針對具有通 孔322及/或盲孔324的基板320,本發明可將成膜圖案312 完整地覆蓋於通孔322或盲孔324的上方及周圍表面,不 會有習知油墨陷入於通孔322或盲孔324中而流失的問題。 以下針對圖4、圖5的喷顯案轉移製程進—步說明。 請參考圖4 ’將製作完成的成膜圖案312與—基板32〇的 表面進行面對面接觸時,丨光固化器、33〇所產生的光能 光或雷射光)照射成膜圖案312,或以熱固化器二 所產生的熱能加熱成膜圖案312,以使抗 單體產生聚合反應而固化。當然,以喷印方式絲且^ 上形成-成膜圖案312時,亦可先進行半固化程序,、使喷 1286661 21162twf.doc/g 印的成膜圖案312半固化後,再以接觸轉印、熱轉印或壓 合的方式,將成膜圖案312轉移到基板320的表面,最後 再以光或熱固化器,將成膜圖案312完全固化,然後脫模。 如此,載具310不限定放置在待移轉基板32〇的下方,而 可以放置在基板320的上方或任意角度。尤其是可以在基 板320的雙面同時進行,且半固化的成膜圖案312較不易 改變。 最後,請參考圖5,完成油墨固化程序之後,載具31〇 與成膜圖案312之間的附著力將小於成膜圖案312與基板 320之間的固持力,因而當载具31〇被施加外力時,成膜 圖案312很容易自載具31〇上脫離,並使成膜圖案阳 印到基板32〇表面上,尤其是成膜圖案祀可對 通孔322或盲孔324上方和周圍表面 ς、 製議通細或盲細内壁及孔緣上 ==6刻 預定==明而因案轉移製程,可形成 Α、戟^上而非直接形成於基板的表面上,故 文土板的通孔或盲孔的影響,當户 盲孔上方及周C面月了 1 字载具上的預定圖案轉印到通孔或 克服直接嘴印陷人於通孔或盲孔中,進而 題。 、基私,綠於上枝卵成膜的問 巧定太二、,明已以較佳實施例揭露如上n廿非田 限疋本备日片,任何所屬技術領 :〜、亚非用以 離本發明之精神 ^ 一有、〶知4者,在不脫 乾圍内’當可作些許之更動與_,因 1286661 21162twf.doc/g 此本發明之保護範圍當視後附之申請專利範 【圖式簡單說明】 圖1繪示一種具有通孔的基板的示意圖。 圖2繪示習知的喷墨印刷製程直接 預定圖案的示意圖。 土表面上形成In FIG. 4, since the film formation pattern 312 is formed on the carrier 31 by the printing method, it is not affected by the through hole 322 or the blind hole 324 on the substrate 320, so that it can be uniformly on the substrate 32. Film formation, especially for the substrate 320 having the through holes 322 and/or the blind holes 324, the present invention can completely cover the film formation pattern 312 over the upper and surrounding surfaces of the through holes 322 or the blind holes 324 without conventional knowledge. The problem that the ink is trapped in the through hole 322 or the blind hole 324 is lost. The following is a description of the injection molding process of FIG. 4 and FIG. Referring to FIG. 4 'when the formed film formation pattern 312 is in face-to-face contact with the surface of the substrate 32 丨, the photo-curable light or laser light generated by the phosphor curing device, 33 照射 is irradiated to the film formation pattern 312, or The heat generated by the thermosetting device 2 heats the film forming pattern 312 to cause the anti-monomer to undergo polymerization to be solidified. Of course, when the film-forming pattern 312 is formed by the printing method, the semi-curing process may be performed first, and the film forming pattern 312 of the printing 1268661 21162 twf.doc/g is semi-cured, and then contact transfer is performed. The film formation pattern 312 is transferred to the surface of the substrate 320 by thermal transfer or press bonding, and finally, the film formation pattern 312 is completely cured by a light or a heat curing device, and then demolded. As such, the carrier 310 is not limited to be placed below the substrate to be transferred 32, but may be placed above the substrate 320 or at any angle. In particular, it can be simultaneously performed on both sides of the substrate 320, and the semi-cured film formation pattern 312 is less likely to be changed. Finally, referring to FIG. 5, after the ink curing process is completed, the adhesion between the carrier 31〇 and the film formation pattern 312 will be less than the holding force between the film formation pattern 312 and the substrate 320, and thus when the carrier 31 is applied When the external force is applied, the film formation pattern 312 is easily detached from the carrier 31, and the film formation pattern is positively printed on the surface of the substrate 32, especially the film formation pattern 对 can be on the upper and surrounding surfaces of the through hole 322 or the blind hole 324. ς, the regulation of the fine or blind inner wall and the edge of the hole ==6 engraved == Ming and due to the transfer process, can be formed on the surface of the substrate, not directly formed on the surface of the substrate, so the soil plate Through the influence of through holes or blind holes, the predetermined pattern on the 1st character carrier is transferred to the through hole above the blind hole and the surface of the C face, or the direct mouth mark is trapped in the through hole or the blind hole. , the basis of private, green in the upper branch of the egg formation of the problem is too two, Ming has been exposed in the preferred embodiment of the above n 廿 田 疋 疋 疋 备 备 , , , , , , , , , , , , , , , The spirit of the present invention is as follows: if there is any, knowing 4, in the absence of drying, 'when there can be some changes and _, because 1286661 21162twf.doc / g, the scope of protection of the present invention is attached to the patent application BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a substrate having a through hole. Figure 2 is a schematic illustration of a conventional inkjet printing process direct predetermined pattern. Formed on the soil surface

圍所界定者為 實施例之嘴墨圖案轉移 圖3〜圖5緣示本發明一較佳 製程的流程圖。 【主要元件符號說明】 100 ·_基板The definition of the mouth ink pattern of the embodiment is shown in Fig. 3 to Fig. 5 as a flow chart of a preferred process of the present invention. [Main component symbol description] 100 ·_ substrate

102 :通孔 104 :導電層 200 :喷頭 202 :油墨 300 :喷頭 308 :脫膜層 310 :載具 312 :成膜圖案 320 :基板 322 :通孔 324 :盲孔 326 :導電層 330 :光固化器、熱固化器 10102: through hole 104: conductive layer 200: shower head 202: ink 300: shower head 308: stripping layer 310: carrier 312: film forming pattern 320: substrate 322: through hole 324: blind hole 326: conductive layer 330: Photocuring device, heat curing device 10

Claims (1)

1286661 21162twf.doc/g 十、申請專利範圍: 1·一種喷墨圖案轉移製程,包括下列步驟: 提供一載具,並喷印油墨於該載具上,以形成一 圖案; 取膜 將5玄成膜圖案與一基板的表面進行面對面接觸·, 固化該成膜圖案;以及 移除該載具,以使該成膜圖案轉印到該基板的表面。 2·如申請專利範圍第1項所述之噴墨圖案轉移製程, 其中该基板具有一通孔及一導電層,該導電層位於該通孔 中,而該成膜圖案對應覆蓋於該通孔上方及周圍表面。 3·如申請專利範圍第1項所述之喷墨圖案轉移製程, 其中該基板具有一盲孔及一導電層,該導電層位於該盲孔 中’而該成膜圖案對應覆蓋於該盲孔上方及周圍表面。 >4·如申請專利職第1項所述之喷墨圖案轉移製程, 其中該載具選自m嫌或—麵紙,其 載該成膜圖案之一平坦表面。 、,」& 5 士申明專利範圍第1項所述之喷墨圖案轉移製程, 其成膜圖案之前,更包括對該載具進行親水性、 疏水性或易脫臈處理。 立中二ΐΐ:專利範圍第1項所述之噴墨圖案轉移製程, 中,包括將談恭且1、 土板的表面進仃面對面接觸之步驟 。 、^載/、上的成膜圖案轉印或壓合至該基板的表 面0 7士申明專利1巳圍第1項所述之喷墨圖案轉移製程, 1286661 21162twf.doc/g 其中固化該成膜圖案的步驟包括以光固化器所產生的光能 照射該成膜圖案而成。 8·如申請專利範圍第丨項所述之喷墨圖案轉移製程, 其中固化該成膜圖案的步驟包括以熱固化器所產生的熱能 加熱該成膜圖案而成。 9胃一種喷墨圖案轉移製程,包括下列步驟: 提供一載具,並嘴印油墨於該載具上,以形成-成膜 圖案; # 半固化該成膜圖案; 將该成膜圖案與-基板的表面進行面對面接觸;以及 移除该載具,以使該成膜圖案轉印到該基板的表面 上。 10·如申請專利範圍第9項所述之喷墨圖案轉移製 輕,其中该基板具有_通孔及一導電層,該導電層位於該 通孔中’而該f膜圖案對應覆蓋於該通孔上方及周圍表面。 11·如申凊專利範圍第9項所述之喷墨圖案轉移製 參#’其中该基板具有一盲孔及一導電層,該導電層位於該 盲孔中’而4成膜圖案對應覆蓋於該盲孔上方及周圍表面。 12·如申睛專利範圍第9項所述之喷墨圖案轉移製 輕,其>中忒載具選自一硬板、一軟板或一離型紙,其具有 町承載该成膜圖案之一平坦表面。 13^°申請專利範圍第9項所述之喷墨圖案轉移製 稃’其形成该成臈圖案之前,更包括對該載具進行親水 性、疏水性或易脫膜處理。 12 1162twf.doc/g 1286661 211621 14.如申請專利範圍第9項所述之 程,其中將該成膜圖案與一基板的表面^墨面製 包括將該載具上的成膜圖案轉印或壓合= 的光能照射該成膜圖案而成。 +固化㈣產生 =如中請專利範圍第9項所述之嘴墨圖案轉 私,J半固傾成_案的步驟包括以_化^所產^ 的熱能加熱該成膜圖案而成。 % Π·"料利範㈣9項職 更包括固化轉印到該基板的表面上的該半 I8.一種喷墨圖案轉移裝置,包括: 圖亲、帛以放置噴墨所形成的—成膜圖案,該成膜 圖案適於與一基板的表面面對面接觸;以及 固化态,用以固化該成膜圖案。 詈,^9·ϋ月專利乾圍帛18項所述之噴墨圖案轉移裝 、雨:/由,二土板具有—通孔及—導電層,該導電層位於該 、而錢膜圖案對應覆蓋於該通孔上方及周圍表面。 =如^請專利範圍第18項所述之喷墨圖案轉移装 亡;1 1縣板具有—盲孔及—導電層,該導電層位於該 目 而巧膜_對應覆蓋於該f孔上方及周圍表面。 21·如申清專利範圍第18項所述之喷墨圖案轉移裝 13 1286661 21162twf.doc/g 置,其中該載具包括一硬板、一軟板或一離型紙,其具有 可承載該成膜圖案之一平坦表面。 22.如申請專利範圍第18項所述之喷墨圖案轉移裝 置,更包括一脫膜層,其配置於該載具與該成膜圖案之間。 23j〇申請專利範圍第18項所述之喷墨圖案轉移裝 置,其中該固化器包括光固化器或熱固化器。1286661 21162twf.doc/g X. Application Patent Range: 1. An inkjet pattern transfer process comprising the following steps: providing a carrier and printing ink on the carrier to form a pattern; taking a film will be 5 The film forming pattern is in face-to-face contact with the surface of a substrate, and the film forming pattern is cured; and the carrier is removed to transfer the film forming pattern to the surface of the substrate. The inkjet pattern transfer process of claim 1, wherein the substrate has a through hole and a conductive layer, the conductive layer is located in the through hole, and the film forming pattern corresponds to the through hole And the surrounding surface. 3. The inkjet pattern transfer process of claim 1, wherein the substrate has a blind via and a conductive layer, the conductive layer is located in the blind via and the film-forming pattern corresponds to the blind via Upper and surrounding surfaces. >4. The inkjet pattern transfer process of claim 1, wherein the carrier is selected from the group consisting of m- or smear paper, which carries a flat surface of the film formation pattern. The inkjet pattern transfer process described in the first paragraph of the patent application, before the film formation pattern, further comprises hydrophilic, hydrophobic or easy release treatment of the carrier. Lizhong Erqi: The inkjet pattern transfer process described in item 1 of the patent scope, including the step of face-to-face contact with the surface of the earth plate. Transferring or pressing onto the surface of the substrate. The inkjet pattern transfer process described in the first item of Patent No. 1, 1286661 21162 twf.doc/g The step of patterning includes irradiating the film forming pattern with light energy generated by the photocurer. 8. The ink jet pattern transfer process of claim 2, wherein the step of curing the film forming pattern comprises heating the film forming pattern with heat generated by a heat curing device. 9 gastric inkjet pattern transfer process, comprising the steps of: providing a carrier and printing ink on the carrier to form a film-forming pattern; #semi-curing the film-forming pattern; The surface of the substrate is in face-to-face contact; and the carrier is removed to transfer the film-forming pattern onto the surface of the substrate. 10. The inkjet pattern transfer system of claim 9, wherein the substrate has a via hole and a conductive layer, the conductive layer is located in the via hole and the f film pattern corresponds to the pass Above and around the hole. 11. The inkjet pattern transfer method as described in claim 9, wherein the substrate has a blind hole and a conductive layer, the conductive layer is located in the blind hole, and the 4 film-forming patterns are correspondingly covered. Above and around the blind hole. 12. The inkjet pattern transfer system according to claim 9 of the scope of the patent application, wherein the medium-sized carrier is selected from a hard board, a soft board or a release paper, and has a film-forming pattern. a flat surface. The ink jet pattern transfer process described in claim 9 of the invention is further characterized in that it comprises hydrophilicity, hydrophobicity or easy release treatment of the carrier before forming the pattern. The method of claim 9, wherein the film forming pattern and the surface of the substrate comprise transfer of the film forming pattern on the carrier or The light energy of the press = is irradiated to the film formation pattern. + Curing (4) Generation = The ink pattern of the ink according to item 9 of the patent scope is reversed, and the step of J semi-solid pouring is to heat the film forming pattern by the heat energy generated by the chemical film. % Π·" 料范范(4) 9 jobs further include curing the half-I8 transferred onto the surface of the substrate. An inkjet pattern transfer device comprising: a pattern formed by the inkjet to form a film-forming pattern The film forming pattern is adapted to face-to-face contact with a surface of a substrate; and a cured state for curing the film forming pattern.詈, ^9·ϋ月专利干干帛帛18 of the inkjet pattern transfer device, rain: /, the two soil plates have - through holes and - conductive layer, the conductive layer is located in the, and the money film pattern corresponds Covering the upper and surrounding surfaces of the through hole. = such as ^ please call the inkjet pattern transfer as described in item 18 of the patent scope; 1 1 county plate has a blind hole and a conductive layer, the conductive layer is located above the f hole and correspondingly over the f hole The surrounding surface. 21. The inkjet pattern transfer device 131286661 21162 twf.doc/g according to claim 18, wherein the carrier comprises a hard board, a soft board or a release paper, which has a load capable of carrying the One of the film patterns is a flat surface. 22. The inkjet pattern transfer device of claim 18, further comprising a release layer disposed between the carrier and the film formation pattern. The inkjet pattern transfer device of claim 18, wherein the curing device comprises a photocurer or a heat curing device. 1414
TW095126650A 2006-07-21 2006-07-21 Transfer process and apparatus for inkjet pattern TWI286661B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW095126650A TWI286661B (en) 2006-07-21 2006-07-21 Transfer process and apparatus for inkjet pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095126650A TWI286661B (en) 2006-07-21 2006-07-21 Transfer process and apparatus for inkjet pattern

Publications (2)

Publication Number Publication Date
TWI286661B true TWI286661B (en) 2007-09-11
TW200807145A TW200807145A (en) 2008-02-01

Family

ID=39459364

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095126650A TWI286661B (en) 2006-07-21 2006-07-21 Transfer process and apparatus for inkjet pattern

Country Status (1)

Country Link
TW (1) TWI286661B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI682529B (en) * 2018-06-28 2020-01-11 李崇維 Micro-element transfer equipment and its transfer and bonding method

Also Published As

Publication number Publication date
TW200807145A (en) 2008-02-01

Similar Documents

Publication Publication Date Title
JP4336343B2 (en) Soft mold manufacturing method
TWI335490B (en) Nano-imprinting process
JP5761320B2 (en) Manufacturing method of stamp for micro contact printing
KR101770809B1 (en) Method for forming fine pattern of polyimide by imprinting
TW200826770A (en) Method for forming transcriptional circuit and method for manufacturing circuit board
JP2006140493A (en) Stamp for soft lithography comprising micro contact print and method of manufacturing the same
KR101032278B1 (en) Method for producing plastic lens
JP2010158805A (en) Method of manufacturing mold for photo imprinting
JP5282510B2 (en) Manufacturing method of stamp for micro contact printing (μCP)
TWI286661B (en) Transfer process and apparatus for inkjet pattern
JP5531463B2 (en) Master plate used for manufacturing micro contact print stamps and manufacturing method thereof, micro contact printing stamp and manufacturing method thereof, and pattern forming method using micro contact printing stamp
WO2020024346A1 (en) Method for manufacturing patterned metal film
JP5428449B2 (en) Method for producing master plate for producing stamp for micro contact printing, and master plate for producing stamp for micro contact printing
KR20170141681A (en) Method for producing soldered electrode and use thereof
TWI628062B (en) Method for manufacturing circuit board and piezochromic stamp
CN101121348A (en) Ink-jetting pattern transfer producing process and its device
KR20090065896A (en) Film substrate formed with fine circuit thereon and manufacturing method thereof
KR20180058125A (en) Method of forming patterns by using imprint process
KR20180057888A (en) Squeegee blade for conductive paste printing and manufacturing method thereof
TWI758185B (en) Imprint method for improving demolding stability and the related imprint system
JP5929396B2 (en) Wiring board manufacturing method
TWI338189B (en) Substrate structure and method of manufacturing thin film pattern layer using the same
JP2018094871A (en) Printing intaglio plate and method for manufacturing the same
KR20090076380A (en) Film substrate formed with fine circuit thereon and manufacturing method thereof
KR20070094149A (en) Method for forming pattern on substrate by using mold of trapezoid

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees