T277781 九、發明說明： 【發明所屬之技術領域】 本發明涉及一種彩色濾光片及彩色濾光片的製造方法。 【先前技術】 液晶顯示器(LCD)以出色的畫面品質、外形尺寸以及低功耗等優 勢，廣泛應用於個人電腦、電視等領域，近幾年LCD產業發展迅速， 並繼續朝著南精細化和大畫面方向發展。在彩色LCD產品中，彩色濾、 光片為必不可少之元件。 LCD為非主動發光元件，其色彩顯示必須由本身的光源裝置或外 部之環境光提供光源，通過驅動器與控制器形成灰階顯示，再利用彩 色濾光片產生紅(Red)、綠(Green)、藍(Blue)三基色，依據混色原理形成 彩色顯示晝面。 彩色濾光片一般由玻璃基板、黑色矩陣、著色層及透明或者半透 明導電層組成。 —T277781 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a method of manufacturing a color filter and a color filter. [Prior Art] Liquid crystal display (LCD) is widely used in personal computers, televisions, etc. due to its excellent picture quality, external dimensions and low power consumption. In recent years, the LCD industry has developed rapidly and continues to be refined towards the South. The direction of the big picture is developing. In color LCD products, color filters and light films are indispensable components. The LCD is a non-active light-emitting element, and its color display must be provided by its own light source device or external ambient light, forming a gray scale display through the driver and the controller, and then using the color filter to generate red (Red) and green (Green). , blue (Blue) three primary colors, according to the principle of color mixing to form a color display face. Color filters typically consist of a glass substrate, a black matrix, a colored layer, and a transparent or semi-transparent conductive layer. -
傳、、充以喷墨方法製作彩色濾、光片時，會先在玻璃基板上形成黑色 矩陣後選擇性地在黑色矩陣表面形成撞牆，再以喷墨方式將尺、G、 B三基色墨水喷於上述擋牆所圍成之區域内以形成所需的r、g、b像 素矩陣。惟’該難較親墨水為高，而墨水鶴後兩者差別更大， 故’需要以研磨或者侧等方式將婦突出之部分料，㈣祕當 【發明内容】When the color filter and the light film are produced by the inkjet method, a black matrix is formed on the glass substrate, and then a collision wall is selectively formed on the surface of the black matrix, and then the ink of the ruler, G, and B is colored by the inkjet method. Sprayed in the area enclosed by the above retaining wall to form a desired matrix of r, g, b pixels. However, the difficulty is higher than that of the pro-ink, and the difference between the two is greater. Therefore, it is necessary to grind or side-by-side the part of the woman, (4) secret [invention]
丨卞、间莰罝有高於該黑色矩陣之高台 ，該著色層位於高台上。丨卞, 莰罝 莰罝 has a higher level than the black matrix, the colored layer is located on the high platform.
一種彩色濾光片的製造方法， 基板之一面上形成複數黑色矩陣； 矩陣之高台；於該高会匕涂佑赵A ’包括下列步驟：提供一基板；於該 ，於該黑色轉之間形成高於該黑色 於該高台上塗佈彩色墨水並形成著色層。 4 1277781 相較於先前技術，所述彩色濾光片的製造方法無須製作擋牆而是 將墨水直接喷塗於黑色矩陣之間之高台上，該等高台與周圍之里色矩 陣之高度差雜小’無須研磨或者_之過程即可實現彩㈣光片平 ’ 坦度之要求。所述彩色舰片高台之高度略高黑色矩陣之高度，故， - 彩色濾光片亦容易達到平坦度之要求。 【實施方式】 如第-騎示，其為本發明第一實施例提供之彩色渡光片2〇，該 彩色濾光片20包括一基板1〇、黑色矩陣12、高台14及著色層15。 其中該高台Μ設置於黑色矩陣12之間，該著色層15設置於該高 ^ 台14上。 該基板10常見為透明玻璃基板。 — S 了加強彩色遽光片2G的防濕性、防污染性、抗氧化性以及改盖 著色層/5表面之平坦度，該彩色濾光片20進-步包括覆蓋黑色矩； 12及著色層15之保護層18。該彩色渡光片2〇還包括設置於保護層18 上的導電層19 〇 _ =外，該高台14亦可與該基板1〇 —體成型，即在基板1〇成型時 ，時完成於基板表面冑、低區域H比如預定臟著色層1S處為 高區域，低區域則為形成黑色矩陣12處。 • 如第二®所示，其縣發明第二實細之彩㈣光片的製造方法 之流程圖，該彩色渡光片的製造方法主要包括下列步驟： 提供一基板； 於該基板之一面上形成複數黑色矩陣； 於該黑色矩陣之間形成高於黑色矩陣之高台； 於該高台上塗佈墨水並形成著色層； 形成覆蓋黑色矩陣及著色層之保護層； 形成覆蓋該保護層之導電層以製造彩色濾光片。 下面結合第三圖至第十圖對該彩色濾光片的製造方法進行詳細說 明〇 如第二圖所示’提供一基板10，常見為透明基板，例如玻璃基板， 5 '1277781 ^板10可為低驗性、無驗性或者含鈉或含领之玻璃，該等玻璃需具 有較低的熱膨脹係數，以防止基板1G受熱發生形變影轉色濾光片ς 生月匕該基板10之厚度一般在0 54 i毫米(mm)之間，基板1〇之 大小根據產品不同而有所不同。 、 其次是在基板10上形成複數黑色矩陣12，根據所採用材料而 下兩種方法。A method for manufacturing a color filter, wherein a plurality of black matrices are formed on one side of the substrate; a high platform of the matrix; and the high-level 匕 佑 赵 Zhao A ' includes the following steps: providing a substrate; thereby forming between the black turns Above the black, the color ink is applied to the high stage and a colored layer is formed. 4 1277781 Compared with the prior art, the method for manufacturing the color filter does not need to make a retaining wall, but directly sprays the ink on a high platform between the black matrices, which is different from the height of the surrounding color matrix. Small 'no need to grind or _ process can achieve the color (four) light film flat' requirements. The height of the color ship sheet height is slightly higher than the height of the black matrix, so that - the color filter is also easy to achieve the flatness requirement. [Embodiment] The first embodiment of the present invention is a color light-passing sheet 2, which includes a substrate 1A, a black matrix 12, a high stage 14, and a coloring layer 15. The upper stage is disposed between the black matrixes 12, and the colored layer 15 is disposed on the high stage 14. The substrate 10 is typically a transparent glass substrate. - S to enhance the moisture resistance, anti-pollution, oxidation resistance of the color filter 2G and the flatness of the surface of the colored layer / 5, the color filter 20 further includes a black moment; 12 and color Protective layer 18 of layer 15. The color light-passing sheet 2 〇 further includes a conductive layer 19 〇 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The surface 胄, the low region H is, for example, a high region at the predetermined dirty colored layer 1S, and the low region is at the black matrix 12. • As shown in the second®, a flow chart of the method for manufacturing the second fine color (four) light sheet of the county, the method for manufacturing the color light passing sheet mainly comprises the following steps: providing a substrate; on one side of the substrate Forming a plurality of black matrices; forming a higher stage than the black matrix between the black matrices; coating the ink on the high stage and forming a colored layer; forming a protective layer covering the black matrix and the colored layer; forming a conductive layer covering the protective layer To make a color filter. The method for manufacturing the color filter will be described in detail below with reference to the third to tenth drawings. As shown in the second figure, a substrate 10 is provided, which is usually a transparent substrate, such as a glass substrate, 5 '1277781 ^ board 10 For low-inspection, non-testing or glass containing or containing glass, the glass needs to have a lower coefficient of thermal expansion to prevent the substrate 1G from being heated and deformed. The thickness of the substrate 10 is reduced. Generally between 0 54 i millimeters (mm), the size of the substrate 1 根据 varies depending on the product. Next, a plurality of black matrixes 12 are formed on the substrate 10, and the following two methods are employed depending on the materials used.
5種係個感光性的黑色樹脂材料，如第四圖及第五圖所示， 其通常由錢或織之黑顏色材料、單體絲雜，及光起劑構成， =於本身會感光，故可直接藉由裂縫塗佈卿㈤械者旋轉(恤c '、佈方式將黑色樹脂材料塗佈於基板1〇的表面上，從而形成黑色樹脂 層11，錢_預定形狀之光罩進行曝光並顯影，除去不必要的黑^ 树月曰層11幵/成複數圖案化之黑色矩陣U。通過此步驟，可將光罩上的 圖案完全轉移到該黑色矩陣12上。 、第^種是採用金屬鉻、氧化鉻或者金屬鉻、氮化絡、氧化絡等絡 ，者鉻氧化態之複合材料，由於上述獅並*是感光材料，故需要塗 佈另-層光阻材料，請參閱第六圖，其具體方法如下：將金屬鉻、氮 化鉻、/氧化鉻等鉻或者鉻氧化態之複合㈣藉由真空濺鍍或者蒸鍍技 術、形成-黑色薄膜16於基板1G上，而後於該黑色薄膜16上塗佈一 層光阻層17。織，湘光罩對光阻層17進行曝光並歸，去除不必 ^的，阻層17，再利驗刻方式將未覆蓋光阻層17的黑色薄膜16除 去，取後，利用去除劑將光阻層17材料完全除去，以形成複數圖案化 的黑色矩陣12。 、如第七圖所示，於形成黑色_12之基板10上形成一塗佈層13 並且使該塗佈層13完全覆蓋黑色輯12及黑色矩扣之間的區域 該塗佈層13之厚度稍高於黑色矩陣12之高度。該塗佈層13由透明木 料製成，如透明樹脂材料。 如第八圖所示，預定形狀之光罩對該塗佈層13進行曝光並顯 影’去除黑色矩陣上之塗佈層13以將黑色矩陣12顯露出，以形成 位於黑色鱗12之間之高台14，根據光罩之形狀該高台^可有不同 6 1277781 的排列方式。亦可直接以黑色矩陣12作光罩，從基板iG的另一面對 塗佈層*13曝光，去除黑色矩陣12上的塗佈層13形成高台14。 如第九圖所7F ’利时墨裝置，例如熱泡式喷墨裝践者壓電式 噴墨裝置，將所需顏色的墨水喷塗於所選定之高台14上，由於高台Μ 之表面張力及《力之作用墨水會_其上，然後_固化裝置將該 墨水固化以形成-義色的著色層15，比如採用—加熱裝置或者一發 光^置（常見為紫外線發光裝置）或者兩者兼採用之，而使墨水固化 於同〇 14上。使喷墨裝置與基板1〇之間發生相對運動，以使不同r、 G、B三基色之墨水塗佈在所選定之高纟14上，最終形成彩色之著色 層 15。 或者，採用具有複數個喷頭之噴墨裝置，每一個噴賴應一個高 。14 ’按feR、G、B二基色像素之排列方式，將墨水分觀入相應喷 嘴中，從而-次同_三種墨水倾於城之高台14上，然後將墨水 固化形成彩色之著色層15。 如第十圖所示，為了加強彩色濾光片的防濕性、防污染性、抗氧 化性以及改善著色層15表面之平坦度，可形成_覆蓋黑色矩陣12及 著色層15之保護層18。該保護層18 一般採用高可靠性之透明材料製 成，如聚亞醯胺樹脂系、環氧樹脂系、壓克力樹脂系、聚乙烯醇樹脂 系等。 少請再次參閱第一圖，於保護層18上形成導電層19製得本發明之 彩色濾光片，該導電層19可為透明或者半透明薄膜，透明薄膜常用銦 錫氧化物(Indium Tim Oxide)，另可選用銦辞氧化物（Indium zinc5 kinds of photosensitive black resin materials, as shown in the fourth and fifth figures, which are usually composed of black or white materials of money or weaving, monofilaments, and light-emitting agents, which are sensitive to themselves. Therefore, the black resin material can be directly applied to the surface of the substrate 1 by the crack coating (five), and the black resin layer 11 is formed on the surface of the substrate. And developing, removing the unnecessary black ^ tree moon layer 11 幵 / into a complex patterned black matrix U. Through this step, the pattern on the reticle can be completely transferred to the black matrix 12. The use of metal chromium, chromium oxide or metal chromium, nitride, oxide and other complexes, chromium oxide composite materials, because the above lion * is a photosensitive material, it is necessary to apply another layer of photoresist material, please refer to In the sixth figure, the specific method is as follows: a combination of chromium, chromium oxide, chromium oxide, or the like, or a chromium oxidation state (four) is formed by vacuum sputtering or evaporation to form a black film 16 on the substrate 1G, and then The black film 16 is coated with a photoresist layer 17. The mask exposes and returns the photoresist layer 17, removes the resist layer 17, and removes the black film 16 that does not cover the photoresist layer 17 in a lithographic manner. After the removal, the photoresist layer 17 is removed by a remover. The material is completely removed to form a plurality of patterned black matrixes 12. As shown in the seventh figure, a coating layer 13 is formed on the substrate 10 on which the black layer 12 is formed and the coating layer 13 is completely covered with the black layer 12 and The area between the black moment buckles is slightly higher than the height of the black matrix 12. The coating layer 13 is made of transparent wood, such as a transparent resin material. As shown in the eighth figure, the predetermined shape of light The coating layer 13 is exposed and developed to remove the coating layer 13 on the black matrix to expose the black matrix 12 to form a high stage 14 between the black scales 12, according to the shape of the mask. There is a different arrangement of 6 1277781. It is also possible to directly use the black matrix 12 as a photomask to expose from the other facing coating layer *13 of the substrate iG, and remove the coating layer 13 on the black matrix 12 to form the high stage 14. Nine diagrams of the 7F 'Lee time ink device, such as thermal bubble inkjet Piezoelectric ink-jet device sprays ink of a desired color onto the selected high stage 14 due to the surface tension of the high stage and the effect of the force on the ink, and then the curing device cures the ink. Forming a coloring layer 15 of a color, for example, using a heating device or a light emitting device (commonly an ultraviolet light emitting device) or both, to cure the ink on the same layer 14. The ink jet device and the substrate 1 are used. The relative movement between the crucibles is such that inks of different primary colors of r, G, and B are applied to the selected sorghum 14 to form a colored chromatic layer 15. Alternatively, an ink jet apparatus having a plurality of nozzles is used. Each squirt should be a high. 14 'According to the arrangement of the two primary color pixels of feR, G, B, the ink is divided into the corresponding nozzles, so that the same three inks are poured onto the high platform 14 of the city, and then The ink solidifies to form a colored color layer 15. As shown in the tenth figure, in order to enhance the moisture resistance, the antifouling property, the oxidation resistance of the color filter, and the flatness of the surface of the colored layer 15, the protective layer 18 covering the black matrix 12 and the coloring layer 15 may be formed. . The protective layer 18 is generally made of a highly reliable transparent material such as a polyimide resin, an epoxy resin, an acrylic resin, or a polyvinyl alcohol resin. Referring again to the first figure, a conductive layer 19 is formed on the protective layer 18. The conductive layer 19 can be a transparent or translucent film, and the transparent film is usually indium tin oxide (Indium Tim Oxide). ), you can also choose Indium zinc
Oxide )、編銦乳化物（Cadmium Tim Oxide )、氧化鋅（zinc Oxide )等， 半透明薄膜則為鋁，該薄膜可採用真空濺鍍或者蒸鍍技術形成。採用 本方法製造彩色濾光片將墨水直接噴塗於黑色矩陣之間之高台上，該 等高台與周圍之黑色矩陣之高度差別較小，無須研磨或者蝕刻之過程 即可實現彩色濾光片平坦度之要求。 本發明第二貫施例彩色濾光片的製造方法，包括下列步驟：提供 基板，於該基板上形成複數南台；於該南台上塗佈彩色黑水形成著 7 1277781 色層；於該高台之間形成黑色矩陣。Oxide), Cadmium Tim Oxide, zinc oxide (zinc Oxide), etc., the translucent film is aluminum, and the film can be formed by vacuum sputtering or evaporation. The color filter is manufactured by the method to directly spray the ink on the high stage between the black matrices, and the difference between the height of the platform and the surrounding black matrix is small, and the color filter flatness can be realized without grinding or etching. Requirements. A method for manufacturing a color filter according to a second embodiment of the present invention comprises the steps of: providing a substrate on which a plurality of south stations are formed; and coating the colored black water on the south stage to form a color layer of 7 1277781; A black matrix is formed between them.
间台，於該弟二局台 上塗佈彩色墨水形成著色層。 黑色矩陣及著色層之製造方法 或者以噴墨方式塗佈黑色墨水 本實施例之第一高台、第二高台、 同第一實施例之方法，其材料亦相同， 形成黑色矩陣。 本發明第五實施娜色濾光片的製造方法，包财列步驟：提供 一表面具有複數咼台之基板；於該高台之間之區域上形矩 於該高台上塗佈彩色墨水形成著色層。 本實施例之基板一般為塑膠基板，採用射出成型方法一體成型。 該黑色矩陣及著色層與第-實施例之黑色矩陣12及著色層15採用相 同製程及材料，或者以喷墨方式塗佈黑色墨水形成黑色矩陣。 本發明第六實施例之一種彩色濾光片的製造方法，包括下列步 ，：提供一表面具有複數高台之基板;於該高台上塗佈彩色墨水形成 著色層；於該高台之間之區域上形成黑色矩陣。 本實施例之基板一般為塑膠基板，採用射出成型方法一體成型。 該黑色矩陣及著色層與第一實施例之黑色矩陣12及著色層15之製程 及材料相同，或者以喷墨方式塗佈黑色墨水形成黑色矩陣。 綜上所述，本發明確已符合發明專利之要件，爰依法提出專利申 請。惟，以上所述者僅為本發明之較佳實施方式，本發明之範圍並不 以上述貫施方式為限，舉凡熟習本案技藝之人士援依本發明之精神所 作之等效修飾或變化，皆應涵蓋於以下申請專利範圍内。 【圖式簡單說明】 第一圖係本發明實施例彩色濾光片之示意圖。 8 1277781 第二圖係本發明實施例彩色濾光片的製造方法之流程圖。 第三圖係提供基板之示意圖。 第四圖係形成黑色矩陣之第一種方法於基板上形成黑色樹脂層之 示意圖。 第五圖係形成黑色矩陣之示意圖。 第六圖係第二種形成黑色矩陣方法之示意圖。 第七圖係於黑色矩陣上形成一塗佈層之示意圖.。 第八圖係於黑色矩陣之間形成高台之示意圖。 第九圖係於高台上塗佈墨水並形成著色層之示意圖。 第十圖係形成覆蓋黑色矩陣及著色層之森護層之示意圖。 【主要元件符號說明】 基板 10 黑色樹脂層 11 黑色矩陣 12 塗佈層 13 高台 14 著色層 15 黑色薄膜 16 光阻層 17 保護層 18 導電層 19 彩色濾光片 20The table is coated with colored ink on the second stage of the brother to form a colored layer. Method for Producing Black Matrix and Colored Layer Or Applying Black Ink by Ink Jet Method The first high stage, the second high stage, and the method of the first embodiment of the present embodiment have the same material, forming a black matrix. A method for manufacturing a nano color filter according to a fifth embodiment of the present invention comprises the steps of: providing a substrate having a plurality of surfaces on a surface thereof; and coating a color ink on the high surface to form a color layer on a region between the high stages; . The substrate of this embodiment is generally a plastic substrate and is integrally formed by an injection molding method. The black matrix and the coloring layer are formed in the same process and material as the black matrix 12 and the coloring layer 15 of the first embodiment, or the black ink is applied by an ink jet method to form a black matrix. A method of manufacturing a color filter according to a sixth embodiment of the present invention includes the steps of: providing a substrate having a plurality of surfaces on a surface; coating the color ink on the high stage to form a color layer; and on a region between the high stages A black matrix is formed. The substrate of this embodiment is generally a plastic substrate and is integrally formed by an injection molding method. The black matrix and the coloring layer are the same as the processes and materials of the black matrix 12 and the coloring layer 15 of the first embodiment, or the black ink is applied by an inkjet method to form a black matrix. In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only the preferred embodiment of the present invention, and the scope of the present invention is not limited to the above-described embodiments, and those skilled in the art will be able to make equivalent modifications or variations in accordance with the spirit of the present invention. All should be covered by the following patent application. BRIEF DESCRIPTION OF THE DRAWINGS The first figure is a schematic view of a color filter of an embodiment of the present invention. 8 1277781 The second figure is a flow chart of a method for manufacturing a color filter according to an embodiment of the present invention. The third figure provides a schematic representation of the substrate. The fourth figure is a schematic view of the first method of forming a black matrix to form a black resin layer on a substrate. The fifth figure is a schematic diagram of forming a black matrix. The sixth figure is a schematic diagram of the second method of forming a black matrix. The seventh figure is a schematic diagram of forming a coating layer on a black matrix. The eighth figure is a schematic diagram of forming a high platform between black matrices. The ninth figure is a schematic view of coating the ink on a high stage and forming a colored layer. The tenth figure is a schematic diagram of forming a protective layer covering the black matrix and the colored layer. [Main component symbol description] Substrate 10 Black resin layer 11 Black matrix 12 Coating layer 13 High stage 14 Colored layer 15 Black film 16 Photoresist layer 17 Protective layer 18 Conductive layer 19 Color filter 20