TWI271903B - High power high pulse repetition rate gas discharge laser system bandwidth management - Google Patents
High power high pulse repetition rate gas discharge laser system bandwidth management Download PDFInfo
- Publication number
- TWI271903B TWI271903B TW094141502A TW94141502A TWI271903B TW I271903 B TWI271903 B TW I271903B TW 094141502 A TW094141502 A TW 094141502A TW 94141502 A TW94141502 A TW 94141502A TW I271903 B TWI271903 B TW I271903B
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- Taiwan
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Links
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
- H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/08022—Longitudinal modes
- H01S3/08031—Single-mode emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/000,571 US20060114956A1 (en) | 2004-11-30 | 2004-11-30 | High power high pulse repetition rate gas discharge laser system bandwidth management |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200627737A TW200627737A (en) | 2006-08-01 |
| TWI271903B true TWI271903B (en) | 2007-01-21 |
Family
ID=36565612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094141502A TWI271903B (en) | 2004-11-30 | 2005-11-25 | High power high pulse repetition rate gas discharge laser system bandwidth management |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US20060114956A1 (enExample) |
| JP (1) | JP5530067B2 (enExample) |
| TW (1) | TWI271903B (enExample) |
| WO (1) | WO2006060359A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI446987B (zh) * | 2007-05-31 | 2014-08-01 | Electro Scient Ind Inc | 多重雷射波長和脈衝寬度之處理鑽孔 |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7852889B2 (en) | 2006-02-17 | 2010-12-14 | Cymer, Inc. | Active spectral control of DUV light source |
| US7822084B2 (en) * | 2006-02-17 | 2010-10-26 | Cymer, Inc. | Method and apparatus for stabilizing and tuning the bandwidth of laser light |
| US8259764B2 (en) | 2006-06-21 | 2012-09-04 | Cymer, Inc. | Bandwidth control device |
| US7659529B2 (en) * | 2007-04-13 | 2010-02-09 | Cymer, Inc. | Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element |
| US8144739B2 (en) * | 2008-10-24 | 2012-03-27 | Cymer, Inc. | System method and apparatus for selecting and controlling light source bandwidth |
| US8138487B2 (en) * | 2009-04-09 | 2012-03-20 | Cymer, Inc. | System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber |
| US8520186B2 (en) * | 2009-08-25 | 2013-08-27 | Cymer, Llc | Active spectral control of optical source |
| US8837536B2 (en) * | 2010-04-07 | 2014-09-16 | Cymer, Llc | Method and apparatus for controlling light bandwidth |
| EP2564976B1 (en) | 2011-09-05 | 2015-06-10 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with at least one gas laser and heat dissipator |
| ES2530070T3 (es) * | 2011-09-05 | 2015-02-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Aparato de marcado con una pluralidad de láseres y conjuntos ajustables individualmente de medios de desviación |
| EP2565673B1 (en) | 2011-09-05 | 2013-11-13 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Device and method for marking of an object by means of a laser beam |
| EP2565996B1 (en) | 2011-09-05 | 2013-12-11 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Laser device with a laser unit, and a fluid container for a cooling means of said laser unit |
| EP2564972B1 (en) * | 2011-09-05 | 2015-08-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of lasers, deflection means and telescopic means for each laser beam |
| ES2452529T3 (es) | 2011-09-05 | 2014-04-01 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Dispositivo láser y procedimiento para marcar un objeto |
| DK2564973T3 (en) * | 2011-09-05 | 2015-01-12 | Alltec Angewandte Laserlicht Technologie Ges Mit Beschränkter Haftung | Marking apparatus having a plurality of lasers and a kombineringsafbøjningsindretning |
| EP2564974B1 (en) * | 2011-09-05 | 2015-06-17 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of gas lasers with resonator tubes and individually adjustable deflection means |
| US9207119B2 (en) * | 2012-04-27 | 2015-12-08 | Cymer, Llc | Active spectral control during spectrum synthesis |
| US9715180B2 (en) | 2013-06-11 | 2017-07-25 | Cymer, Llc | Wafer-based light source parameter control |
| US9785050B2 (en) | 2015-06-26 | 2017-10-10 | Cymer, Llc | Pulsed light beam spectral feature control |
| US9989866B2 (en) | 2016-10-17 | 2018-06-05 | Cymer, Llc | Wafer-based light source parameter control |
| US9997888B2 (en) | 2016-10-17 | 2018-06-12 | Cymer, Llc | Control of a spectral feature of a pulsed light beam |
| US10416471B2 (en) | 2016-10-17 | 2019-09-17 | Cymer, Llc | Spectral feature control apparatus |
| US9835959B1 (en) | 2016-10-17 | 2017-12-05 | Cymer, Llc | Controlling for wafer stage vibration |
| JP7044894B2 (ja) | 2018-03-30 | 2022-03-30 | サイマー リミテッド ライアビリティ カンパニー | パルス光ビームのスペクトル特性選択及びパルスタイミング制御 |
| US11329722B2 (en) | 2020-03-27 | 2022-05-10 | Relative Dynamics Incorporated | Optical terminals |
| TWI915007B (zh) | 2024-10-09 | 2026-02-11 | 財團法人工業技術研究院 | 檢測系統及其檢測方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4172443A (en) * | 1978-05-31 | 1979-10-30 | Sommer Warren T | Central receiver solar collector using analog coupling mirror control |
| US4848881A (en) * | 1984-12-03 | 1989-07-18 | Hughes Aircraft Company | Variable lens and birefringence compensator |
| US5095492A (en) * | 1990-07-17 | 1992-03-10 | Cymer Laser Technologies | Spectral narrowing technique |
| US5898725A (en) * | 1997-01-21 | 1999-04-27 | Cymer, Inc. | Excimer laser with greater spectral bandwidth and beam stability |
| US5856991A (en) * | 1997-06-04 | 1999-01-05 | Cymer, Inc. | Very narrow band laser |
| US6028879A (en) * | 1997-06-04 | 2000-02-22 | Cymer, Inc. | Narrow band laser with etalon based output coupler |
| US5852627A (en) * | 1997-09-10 | 1998-12-22 | Cymer, Inc. | Laser with line narrowing output coupler |
| US6212217B1 (en) * | 1997-07-01 | 2001-04-03 | Cymer, Inc. | Smart laser with automated beam quality control |
| US6094448A (en) * | 1997-07-01 | 2000-07-25 | Cymer, Inc. | Grating assembly with bi-directional bandwidth control |
| US6192064B1 (en) * | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
| USRE38054E1 (en) * | 1997-07-18 | 2003-04-01 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
| US5978409A (en) * | 1998-09-28 | 1999-11-02 | Cymer, Inc. | Line narrowing apparatus with high transparency prism beam expander |
| US6529531B1 (en) * | 1997-07-22 | 2003-03-04 | Cymer, Inc. | Fast wavelength correction technique for a laser |
| US6671294B2 (en) * | 1997-07-22 | 2003-12-30 | Cymer, Inc. | Laser spectral engineering for lithographic process |
| US6721340B1 (en) * | 1997-07-22 | 2004-04-13 | Cymer, Inc. | Bandwidth control technique for a laser |
| US6853653B2 (en) * | 1997-07-22 | 2005-02-08 | Cymer, Inc. | Laser spectral engineering for lithographic process |
| US6061382A (en) * | 1998-05-04 | 2000-05-09 | Lambda Physik Gmbh | Laser system and method for narrow spectral linewidth through wavefront curvature compensation |
| US6163559A (en) * | 1998-06-22 | 2000-12-19 | Cymer, Inc. | Beam expander for ultraviolet lasers |
| US6493374B1 (en) * | 1999-09-03 | 2002-12-10 | Cymer, Inc. | Smart laser with fast deformable grating |
| US6298080B1 (en) * | 1999-03-12 | 2001-10-02 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser with adjustable bandwidth |
| US6625191B2 (en) * | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6496528B2 (en) * | 1999-09-03 | 2002-12-17 | Cymer, Inc. | Line narrowing unit with flexural grating mount |
| US6532247B2 (en) * | 2000-02-09 | 2003-03-11 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
| WO2001047074A1 (en) * | 1999-12-22 | 2001-06-28 | Cymer, Inc. | Line narrowed laser with bidirection beam expansion |
| US6650666B2 (en) * | 2000-02-09 | 2003-11-18 | Cymer, Inc. | Laser wavelength control unit with piezoelectric driver |
| US6760358B1 (en) * | 2001-06-07 | 2004-07-06 | Lambda Physik Ag | Line-narrowing optics module having improved mechanical performance |
-
2004
- 2004-11-30 US US11/000,571 patent/US20060114956A1/en not_active Abandoned
-
2005
- 2005-11-25 TW TW094141502A patent/TWI271903B/zh not_active IP Right Cessation
- 2005-11-28 JP JP2007544428A patent/JP5530067B2/ja not_active Expired - Fee Related
- 2005-11-28 WO PCT/US2005/043055 patent/WO2006060359A2/en not_active Ceased
-
2011
- 2011-02-03 US US13/020,330 patent/US20110122901A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI446987B (zh) * | 2007-05-31 | 2014-08-01 | Electro Scient Ind Inc | 多重雷射波長和脈衝寬度之處理鑽孔 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006060359A3 (en) | 2009-04-16 |
| US20060114956A1 (en) | 2006-06-01 |
| US20110122901A1 (en) | 2011-05-26 |
| WO2006060359A2 (en) | 2006-06-08 |
| TW200627737A (en) | 2006-08-01 |
| JP2008522438A (ja) | 2008-06-26 |
| JP5530067B2 (ja) | 2014-06-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |