TWI324423B - Laser system - Google Patents

Description

1324423 IX. DESCRIPTION OF THE INVENTION: [Technical Fields] [Technical Fields] The subject matter disclosed herein relates to a high power gas discharge 5 electric laser system for a DUV light source, for example, for use in a system Integrated circuit lithography, or for other laser processing applications such as low temperature polysilicon processing ("LTPS") laser annealing, for example, for fine beam sequential lateral curing (rtbSLS). The related application is hereby incorporated by reference in its entirety to U.S. Patent Application Serial No. 11/584,792, filed on Oct. 20, 2006, the priority of the name "Laser System"; this case is a continuation of the following U.S. patent applications, The filing date of each case is September 14th, 2006: Application No. 11/521,904, the name "Laser System", the agent file number 2005-0103-02; and the application No. 11/522,052, the name "Ray" "shooting system", agent file number 2005-0104-01; and application number 11/521,833 15 case 'name "laser system", agent file number 2005-0105-01; and 11/521,860 Application, name "Laser System", agent file number 2006-0007-01; and application No. 11/521,834, name "laser system" 'agent file number 2006-0012-02; and 11th Application No. /521,906 'Application Date September 14, 2006, the name "Laser System", Agent File 2 No. 2006-0013-01; and Application No. 11/521,858, the name "Laser System", Agent file number 2006-0018-01; and application No. 11/521,835, name "laser system" 'agent file number 2 006-0020-01; and application No. 11/521,905 'name 'Laser System', agent file number 2006-0071 -01; these applications and the case request the following US provisional patent application 5 priority : Application No. 60/732,688, application date: November 1, 2005, the name "200 watt gas discharge excimer or molecular fluorine multi-cavity laser", agent file number 2005-0094-01; and 60/814, 293 Application No., application dated June 16, 2006, the name "200 watt DUV gas discharge laser system 5 system", agent file number 2005-0103-01; and application No. 60/814, 424, application 曰 2006 June 16 曰, the name "longevity MO Yu ΜΟΡΟ configuration laser system", agent block number 2006-0012-01, each case is hereby incorporated by reference. The present application is also directed to the application cited in the above-mentioned co-examination and the patent application filed concurrently, the content of each of which is incorporated herein by reference. BACKGROUND OF THE INVENTION 3. A deep ultraviolet (DUV) light source, such as the DUV source used in the integrated circuit lithography manufacturing process, is almost absolutely within the range of excimer gas discharge ray 15, especially for about 248 nm. The KrF excimer laser, which was then in production at the 198 nm ArF laser, entered production in the early 1990s; it was also suggested to have a molecular fluorine F2 laser of about 157 nm, but it has not yet been put into production. In order to achieve a reduction in the resolution of the fixed wavelength and the fixed NA (ie 193 nm XLA 165 at ΧΤ: 1400 has ΝΑ = 0.93), kl must be optimally 2, where kl represents the processing program that affects the resolution. Sex factor. Based on the Rayleigh's equation, for today's Cognac γΙ7 tools, only the resolution enhancement technique (RET’s) is used to achieve the smaller resolution of the high numerical aperture ArF lithography in the art world. RET is a cost-effective way to maintain a positive evolution into a smaller size in the manufacture of buckles, and RET is gradually integrated into the solution of lithography manufacturing. The resolution enhancement efforts associated with such processing (the focus of the reduction is on reticle design using methods such as phase shifting or pattern splitting of dual light | etc. Miscellaneous methods can improve imaging, but also Disadvantages, including the loss of throughput, so when kl is optimized for an application, the only way to further improve resolution is to return wavelength or NA. Immersion lithography is performed on 45 nm, wavelength Constant at 193 nm, the introduction of water allows NA咼 up to 1.35, so it is required to be slurried until it needs to be processed at 32 nm. Since the DUV wavelength manufacturer of this source first asked the market excimer laser source under constant pressure Not only shortened the wavelength, but also increased by the main customers of this kind of light source, namely the stepper/scanner manufacturer (today including Japan's Canon and Nikko (Nic〇n) and the Netherlands' ASML) The average power delivered to the wafer during the manufacturing process performed by the stepper and scanner. This requirement for ever-decreasing wavelengths is a requirement from integrated circuit manufacturer customers. / Scanner manufacturing equipment can print ever-shrinking critical dimensions on integrated circuit wafers. Drive higher power requirements by requiring higher throughput or higher exposure doses on wafers. This kind of progress in the so-called "Moore's Law" (M〇〇re, s iaw) on the monthly b-force of the integrated circuit, along the path of progress, so that the number of transistors per unit area 'substantially The critical dimension is shrinking, causing a number of serious problems to be solved by the light source manufacturer. In particular, the 193 nm wavelength of the light source results in several challenges. The lower wavelength photons from the 193 nm laser system have a ratio The higher energy of the previous Krf;i 24 8 nm source is a problem for both the light source manufacturer and today's scanner manufacturers. The higher energy photonic regions are received at the source and scanner's, especially for high energy per unit area. The density requirement consists of a single window/lens material that is currently subjected to any reasonable economic time period, that is, the material is CaF. The two-material lens in the device requires the scanner manufacturer to, for example, require substantial monochromatic light from the laser source system to avoid chromatic aberration of the lens. The required bandwidth is getting smaller and smaller (more and more monochrome is required). Light), there is a need for increasingly sophisticated line narrowing units, such as etalon or chemistry. Old-fashioned single-cavity lasers have the problem of short life of such materialized single handles. Narrowing single (10) light is narrow in the line: the process is medium loss, and the narrower the output bandwidth is, the larger the required loss is. Therefore, it is necessary to transmit a continuously increasing pulse line narrowing unit to obtain a given pulse. Thus, for example, a previously used single-cavity laser can have a laser output pulse of about 5 millijoules, while a line-narrowing unit has a reasonably cost-effective lifetime. A single source, the manufacturer's Acheng 1 uses ArF light source to solve the problem of narrower (four) (four) and higher (10) average materials, to improve pulse I: mainly for each pulse with equal pulse energy. Thus, by about pulse, the pulse repetition increases the pure Hz by hundreds of pulses per second. Thus, the optical damage per pulse is kept low, but as the pulse repetition rate increases, the total exposure of the line narrowing unit and the laser optical element there is increased. In addition, higher pulse repetition rates cause other problems for the light source manufacturer, and the main electrode degradation rate increases, requiring a faster n% rate, such as f, more fan motor power, resulting in cavity and fan motor and bearing assembly heat. The increase in the result results in a shorter average time for the laser cavity. The higher pulse repetition rate of β is also a problem that light source manufacturers must solve, such as the magnetic switching pulse power supply, whose time and component life are negatively affected by the same heat load, for example, in a pulsed power supply system. The magnetic switching element of the towel is at a higher pulse repetition rate. ', the difficulty that light source manufacturers must address increases the need for integrated circuits to continue to be improved by other laser pulse parameters, such as beam (four) and beam divergence and pulse-to-pulse stability requirements, such as bandwidth requirements and scanners from The energy and time requirements of the trigger signal. The ability to control the laser output and operating parameters of this nature may be adversely affected by either or both of the increased pulse energy requirements and higher pulse repetition rates, as well as changes in factors such as work. Period (percentage of laser emission time during operation), pulse energy selected by the scanner, F2 depletion rate in the laser cavity, and the like. For example, the applicant's product, ELS 6010#, the world's first variable 248 nm krF excimer single-cavity laser system, was introduced in the late (10) years and then broke into semiconductor manufacturers' 13 Advanced optical performance that can be applied to nanometers. It is also provided with a full-width half-maximum (FWHM) of about ^5^ and a height-line narrowing bandwidth of about 1.4 pm (95% energy integral), so that the lithography stepper and scanner can be used with a numerical aperture. > 〇 75 lens to achieve the king of the effect of the moon b ELS-6010 can support higher output rate, for example up to 2 stickers 2 8 mJ pulse can give 2 watts of average power operation, commit and delete the improver in the qualitative The wafer is used to achieve better CD control and higher energy rates. The ELS 6010 also provides precision energy control to reduce the need for attenuation, the use of optimal pulsing pulses, and the longevity of laser consumables. Improvements to signal processing components in the wavelength stabilization module will provide faster gains and more reliable wavelength stability. The ELS 6XXX model is followed by a later model, referred to by the inventor's assignee as the ELS 7000, which addresses the semiconductor industry's more aggressive requirements for the secondary design node 10. It is also a KrF 248 nm wavelength excimer single-cavity laser system, which transmits a tighter and more limited bandwidth to higher power, which reduces the CD geometry of semiconductor lithography, further improves throughput and reduces operating costs. . The ELS 7000 is also available in the ArF 193 nm wavelength version. A larger amount of average power can be transmitted by boosting the pulse repetition rate from 2.5 kHz to 4 kHz'. 7〇 1〇 15 can be used to improve line narrowing performance (select bandwidth) and wavelength stability, such as ensuring better focus control, optimizing exposure, and improving the critical dimension (“CD”) control of semiconductor circuits. Improvements can also be made to the gas injection deduction rule, such as by injecting a small amount of precision gas into the laser chamber during the exposure sequence to provide excellent energy stability. The ELS-7000 is designed to meet the needs of South Volume products such as sub-0.13 micron components on 248 nm exposure tools. Offering 4kHz, 7.5mJ, 30W optical output, plus ultra-low frequency performance and high-speed wavelength control equal to 6〇 1〇, the ELS-7000 also reduces the cost of laser consumables. ELS 7000 followed by the applicant's Els 7010 10 model in about 2001, and then further actively addressed the semiconductor industry's performance and cost requirements for the sub-100 nm design node. ^ ELS-7010 is also 4-kHz cesium fluoride (KrF, 248 nm) excimer light source, addressing the semiconductor industry's need for lithography for the design of the 00 nm design node. The ELS-7010 provides increased power and bandwidth performance parameters for KrF sources, further reducing the cost of consumables (C〇C). The ELS-7010 provides 5〇% to 1〇〇〇/〇 improvement for the life expectancy of various major consumable modules. At the same time, the power is increased to further reduce the bandwidth. The ELS 7010 is a 4 kHz, 10 mJ '40 W (FWHM) 0.35 pm and (E95%) 1.2 pm single cavity laser system. Another system that subsequently asks the market and may expand the range of single-cavity excimer laser technology is the applicant's assignee, Nan〇lith.

The ArF (193 nm) single-cavity laser system was asked about in 2002. Nai 7 is an ArF laser system with approximately the same bandwidth as the ELS 7000 at 193 nm, ie <0.5 pm FWHM and Magic 3.3 pm (E 95% intensity integral) at 5 mJ and 4kHz (20W) operation to provide next-generation lithography tools with excellent spectral power, narrowing bandwidth with highly focused lines, and again reducing the cost of laser consumables. The more difficult work is at 193 nm, the main system Optical damage increases due to the reduction in wavelength of light. The 193 nm Nyro ArF source for volumetric lithography semiconductor manufacturing, with its height-line narrowing, high power and high-accuracy tuning wavelength control, allows for state-of-the-art imaging at the time, for example, with ΝΑ > 〇 · 75 or less The 1 OOnm node still meets the needs of image contrast and wafer throughput at that time, thus allowing the chip design to be further reduced, such as achieving faster processor speeds and greater memory capacity per wafer. At the same time, the yield of each wafer is changed. 1324423 The structural design of the Nishi 7000, such as the new cavity design, combined with new technological advances in power supply design, laser discharge cavity, and wavelength control, allows for closer control of exposure dose energy (<±〇.3%) and Laser wavelength stability (<± 0.03 pm). On-board laser stalking provides pulse-to-pulse data acquisition and feedback control to reduce instability of transition wavelengths, thereby increasing exposure program latitude and CD control. However, as further demands for shrinking bandwidth and increasing power move beyond the technological advancement of the applicant's world-class single-cavity laser system, it is clear that there must be a system replaceable single-cavity system. Further optimization 10 such beam parameters, such as bandwidth, including maintaining the bandwidth over a particular range, such as for OPC reasons rather than just not exceeding specifications, becomes impossible at the desired average power level. At this point, it seems that increasing the repetition rate is not an effective way, and there are several reasons. The solution chosen by the applicant's assignee is a two-cavity laser system, which includes a sub-laser pulse beam to create a laser cavity, such as a main oscillator ("MO"), which is also a gas discharge excimer variant. Seeding another laser cavity with an amplified laser medium also belongs to the same excimer gas discharge change, acting to amplify the seed beam as a power amplifier (ΓρΑ). Other so-called main-vibrator-power amplifier ("ΜΟΡΑ") laser systems are also known, and most of the 20 are found in the solid-state laser industry's main purpose to increase power output. Applicant's assignee has the idea of 'using a seed laser cavity in which a seed laser is made' to optimize the cavity for selecting/controlling desired beam parameters (eg bandwidth, beam profile, beam spatial intensity distribution, pulse time shape) The operation of, etc., and then substantially the amplifier medium, such as ΡΑ amplification, has the desired parameters 12

:S 1324423 pulse. This breakthrough by the applicant's assignee met the current requirements of the ever-decreasing node size associated with the semiconductor lithography D U V source. The first of the two-cavity laser systems, the XLA-100, provides leading edge optical performance and power efficiency in a super-line 5 narrowed, high-power argon-argon (ArF) laser-generated source. The dual-chamber main oscillator power amplifier (ΜΟΡΑ) architecture developed by the applicant's assignee can have an average output power of 4 〇 W, which was the output of Cymer's single-cavity Nylon 7000 ArF model. At twice the power, it also meets the ever-increasing performance and cost requirements for semiconductor wafer production at the <1〇〇nm node. Provides approximately (X25 pmFWHM's super-line narrowed spectral bandwidth and approximately 0.65 pm E95% integral to the most stringent spectral bandwidth performance of any deep ultraviolet (DUV) manufactured light source at the time, in 2003, XLA 100 provides light It allows for high contrast imaging of lithography tools with numerical apertures (NA) up to 〇9. 15 Most of the reason is due to less energy being used in the cavity to create optical parameters with selected wavelengths such as bandwidth. The beam; and the amplifier medium provide sufficient amplification to obtain, for example, a PA output with an average output power of 10 mJ at 40 watts at an operating pulse repetition rate of up to 4 kHz. This allows, for example, fewer pulses per exposure window, thus allowing each exposure to be used. Less pulse. 20 can also achieve the same rigorous exposure control, in other words exposure dose (about 0.3%), wavelength stability (about ± 〇. 〇 25 pm), through the provision of pulse to pulse data acquisition and feedback control Its in-situ metrology system, which involves sampling the output of both p〇 and PA to achieve this project. At the end of the year, the applicant's assignee asked the city 13 1324423 n The system has become the world's first... Repetitive lithography' allows the gas discharge laser source to compare the original XLA·10. The series further reduces the narrow line output of the super-line narrower output. Novel creation

New technology to comply with the law of the law, from the shrinking CD

Dimensions, particularly extreme ultraviolet (EUV) transmission dates have moved beyond the end of the new decade, or even beyond (4). A fluid exposure process with a refractive index different from air, such as water, is referred to as immersion lithography to expand 193 nm wavelength lithography to meet the 10 points of the secret nanometer process, ie ultra-high purity aperture A) Immersion sweep (4) Cost-effective and production-ready technology.

XLA 2GG meets the demanding performance and cost requirements of the most complex semiconductor wafer fabrication technology, providing ultra-pure spectral performance of approximately 12 pm fwhm and 0.25 pm E95% integration, supporting ultra-high-scanning 15 amps for the next 65 nm exposure The system also provides high power (up to 6 〇W) to support the high productivity of the industry. The edge spectrum metric is used in the XLA series, which also allows for monitoring and maintaining extremely high spectral purity, including on-board high accuracy E95% intensity integral frequency width metrics, for example to provide the required immersion lithography Process control. The XLA 200 is a 193nm, 4kHz, 15mJ, 60W two-cavity laser 20 system. Subsequently, the applicant's assignee asked the xla 300 in early 2006, and the XLA 300 was the 6 kHz 90W version of the XLA 200. The i93nm immersion lithography 'guided critical layer processing is lower than the 32nm node, and the XLA300 can meet these needs. Even at the 45nm node, requirements such as critical dimensions, profile, 14-line thickness, and overlap requirements for different layers still affect design boundaries and yield limits. High throughput ultra-NA (&gt; 1.2) exposure tools along with polarized illumination effects and optimized resolution enhancement technology (RET) for process control, available through the applicant's assignee's XLA 3 00 series laser system Ask the market to meet these needs. The kl physical limit of 0.25 (for memory applications &lt; 0.30 is active, the logic is usually higher) requires a 45 nm process high NA exposure tool and high spectral power (high laser power and high spectral purity) laser. This is the laser currently transmitted by the applicant's assignee's XLA 300 series. Unfortunately, Moore's Law has not been completed, and EUV is still a development plan. Therefore, there is a need to address the higher power requirements of 193 nm laser sources. Two major obstacles to the increase in typical pulse repetition rate due to power output progression in the aforementioned single-chamber laser system and later two-cavity laser systems are the difficulty in obtaining excimer gas discharge laser system cavities for operation above 6 kHz; A further increase in pulse repetition rate increases the optical damage to certain optical components exposed to the most severe 193 nm light dose during operation, even with the ΜΟΡΑ architecture. In addition, 'for a number of reasons, including the need for higher pressure operation, such as to extract as much as possible from the narrowing of the line cavity, a larger amount of pulse energy, such as a total gas pressure of about 380 kPa, for example, a maximum of about 38 kPa of fluorine partial pressure is beneficial. The condition that the cavity life is prolonged cannot be achieved, and the CoN increase of the XLA laser system is promoted along with the LNM lifetime problem.

This latest generation of yttrium-based argon-fluoride source provides ultra-line narrowing bandwidth down to 0.12 pm FWHM and 0.30 pm 95% energy-integrated laser source' support for very high numerical aperture refractive lenses and inverse refractive lens immersion Lithography scanner. The XLA 300 is introduced into an expandable 6 kHz platform to transfer 45W to 90W of power. An increase in repetition rate along with pulse stretching&apos; reduces damage to the optical components of the scanner system. The industry's current state of the E95% frequency width measurement and improved bandwidth stability can promote the control of critical dimensions. Extended cavity life, proven by power optics technology, extends the life of critical laser modules, and extends cavity life, such as extended lifespans for critical laser modules, with proven power optics for improved ( Reduce) CoC (consumable cost). In the field of high average power, which only produces high average power, for example about 100 W and above and up to 200 W and above, the laser system used for operation not far greater than 6 kHz is also known as the ΜΟΡΑ system, which eliminates the need for the 〇 〇 architecture 10 The line is narrowed, but new technologies are still needed. One possible solution is to use an amplifying medium that includes a power oscillator. The Applicant's assignee is optimized for both amplification and the preservation of the desired output beam pulse parameters produced by the ,, with optimized line narrowing (for example). The amplifier medium is also the oscillator, ie the power oscillator ("ρ〇") 15 was prompted and used by the applicant's assignee's competitor GigaPhoton, such as the US patent case 6721344, the name "injection lock type" Or a ΜΟΡΑ-type laser device, issued on April 13, 2002, to Nakao et al; 6741627' name "Micro-filming molecular fluorine laser system", issued to Kitatochi et al. on May 25, 2004 And 6893373, the name 2 "ultra-narrow-frequency fluorine laser device", issued to Takehisha et al. on January 4, 2005. Unfortunately, the use of oscillators such as oscillators with front and back mirrors (including partially reflective output couplers and input coupling through one of the apertures of a 95% retroreflective mirror) has several disadvantages. The input coupling from the elbow to the amplifier medium is extremely prone to energy loss. Such an oscillator can be used as an amplifying medium in an amplifier medium having such a selected oscillator cavity optimized beam parameter, such as in a channel. May create unacceptable ASE levels. Applicants have suggested an architecture that preserves the optimized beam parameters developed in the cavity almost as much as the current XLA® system of the Applicant's assignee, while producing a much more efficient amplification from the amplifying medium, for example to obtain The current level of output average power, the output pulse from centistoke (seed laser) can be dramatically reduced, resulting in 1 ^ 0 (: 0 (: far less.), the applicant believes that according to the subject matter of the case Various aspects of the embodiments, such as pulse-to-pulse stability or multiple laser output parameters, can also be greatly improved. Increasing wafer throughput or productivity, maintaining the advanced demand for deep ultraviolet lithography in mass manufacturing, and The importance of laser economics can be partially satisfied by the 6 kHz repetition rate of the Thunder and the increased output power to 9 〇 w. The resolution and critical dimension of the i93 nm in advanced lithography require narrow-band meaning. Width, for example, from a good material, there is a certain process (4) chromatic aberration 'requires narrow bandwidth laser to reduce the wavelength variation of the light source, thereby reducing the effect of chromatic aberration. Very narrow bandwidth can be The final resolution of the improved system, or in addition to the lens designer, can provide a wide range of focal length latitude. Expensive, the word optical piece has less color difference than the fusion money at 193nm. The narrow bandwidth laser can be reduced to the 193nm exposure system. The need for fluorinated two optical components. Spectral engineering such as spectral engineering for critical dimension (CD) control, for example, due to the increased product: using optical proximity correction and higher lens-like spectral spectroscopy to increase sensitivity to 17 1324423 BW, The change of BW includes not only the bandwidth specification that does not exceed the transcendence, but also the bandwidth specification of the relatively high range (previously not exceeding the limit) and the low range. The importance of stable BW to ArF is more important than KrF. Higher. Even with very low BW, if there is a significant change below the upper limit, even a very low BW may produce a bad CD. Thus, BW measurement is a key technique for obtaining good CD control. The 6 kHz repetition rate result also results in a dose. Improved performance, reduced CD variation at the 45nm node, reduces dose quantization errors, such as occurs when the exposure gap does not capture all of the pulses within the dose. The dose error of the laser beam dynamics may cause inaccurate writing on the exposure gap side. The new design of the LLA of the XLA period, such as the use of higher resolution dispersion elements, and improved wavelength control actuation mechanisms, improve LNM, Combining the applicant's assignee's reduced acoustic power (RAP) cavity provides excellent stability of the bandwidth. Other problems that exist in such a configuration, such as the generation of ASE, can be significant, for example, due to the power amplification stage being significant due to The ASE is outside the band, causing downstream problems in the line-narrowed version. Fine may also cause problems in, for example, broadband versions such as the LTPS version, because the beam processing optics, for example, produce slender and very thin, such as ι 微米The beam may be a broadband 2 photosensitive sensation for the amplification stage that is typically produced by excimer lasers. In addition, ASE may also rob the gain medium, thus reducing the available in-band output or other available rounds of the amplifier stage.

Buczek et al. Carbon trioxide regeneration ring power amplifier A||, L App

Phys" ν〇ι. 42, Νο· 8 (July 1971) is a one-way regenerative ring carbon dioxide laser using the aforementioned stable (conditionally stable) operation to discuss the effect of gain saturation 18 on the performance of the two-emulsified carbon laser. The role of Nabors et al. 13-W YAG^-shaped laser injection-locking optical letter, Volume 14, Issue 21 (November 1989) relates to the pumping of solid-state Nd:YAG main vibrators by diodes. The second fruit is sent to the solid laser to lock in. The seed is input into the ring laser via a half-wavelength plate, a Faraday rotator and a thin film polarizer formed in the optical diode between the seed laser and the amplifier. Pacala et al. The wavelength can be scanned as an oscillator-to-loop amplifier laser system App. Phys. Ltrs., Vol. 40'No. 1 (January 1982), a single pass for seeding a narrowed XeC1 oscillator Molecular (XeCl) laser system. US Patent No. 3 53〇388, issued on September 22, 197, issued to Buerra et al., the name "optical amplifier system", related to the kind of oscillator laser seeding two_ single pass A ring laser with a beam splitter input coupled to each single-pass ring laser. U.S. Patent No. 3,566,128, issued February 23, 1971, to Amaud's "Optical Communication Configuration of Multi-Mode Regenerative Amplifiers Using Pilot Frequency Amplification" is an optical communication system having a ring-shaped amplifier. US Patent No. 3,646,468, February 29, 1972 issued to Buczek et al. for laser systems with low power oscillators, high power oscillators, and resonance adjustment devices. US Patent 3,646,469, February 29, 1997 Issued to Buczek et al., entitled "Rising Wave Reproducing Laser Amplifier", for a laser system similar to the '468 Buczek patent, 20 has a means to lock the resonant frequency of the amplifier to the output frequency of the oscillator. US Patent No. 3,969,685, issued on July 13, 1976

Chenausky, entitled "Enhanced Radiation Constraints from Unstable Laser Resonators," is an energy and unstable resonator from the gain medium that provides a larger component of energy to the midfield of the far field. U.S. Patent No. 19 1324423 4,107,628 ' was issued on August 15, 1978 to tot Hill et al., entitled "CW BRILLOUIN Ring Laser", which is a BdUouin scattering ring laser with an acoustic component to modulate the scattering frequency. U.S. Patent No. 4,135,787, issued January 23, 1979, to McLafferty, entitled "Unstable 5 Ring Resonator with Cylindrical Mirror", is an unstable ring resonator with an intermediate space filter. U.S. Patent No. 4,229,106, issued October 21, 1980 to Domschner's name "Electromagnetic Wave Ring Generator", relating to an electron field distribution of a circular laser resonator having a device capable of spatially rotating a laser beam that resonates therein. For example, the wave can be allowed to resonate with opposite polarization. US Patent No. 10, 4, 239, 34, issued to Carson on December 16, 1980, entitled "Unstable Optical Resonator with Tilted Spherical Mirror", is related to the use of a tilted spherical mirror in an unstable resonator to achieve asymmetric amplification to obtain Confocal, and free of the need for a spherical mirror. U.S. Patent No. 4,247,83, issued January 27, 1981, issued to Lindop's name "Circular Laser", which is a resonant cavity with at least one flat 15 line side isotropic refraction device such as 稜鏡, with partial light mirror The beveled parallel edges intersect the equilateral edges, along with a means to apply resonant translation to the refractive device. U.S. Patent No. 4,268,800, issued May 19, 1981, issued to johnst〇n et al., "The ring laser is mounted on the tip of the Brewster board", which is a fine-tuning of a tip-bristled plate. The annular laser of the mirror A is located close to the plane and serves as one of the reflective optical elements of the annular laser cavity. U.S. Patent No. 4,499,582, entitled "Circular Laser", issued to the Kaming et al. on February 5, 1980, relates to a ring-shaped laser system having a folded optical path patted to separate two pairs of electrodes, with a partially reflective input coupler Given wavelength. U.S. Patent No. 5,097,478, issued December 23, 1992 to Verdiel et al., entitled "Circular Cavity Laser Device", is a type of annular cavity that is controlled or locked in place using a beam from the main laser. Binary laser operation in the annular cavity. It uses a non-linear medium in the toroidal cavity to avoid the need for an insulator, such as to stabilize the resonance, as discussed in col. 4, line 9_18. Nabekawa et al., 50-W average power 200 Hz repetition rate with gate-controlled gain amplification, 48 〇 _fs KrF excimer laser, cle〇 (2001) 96 pages, for example, as discussed in Figure 1, Solid-state seed multi-pass amplifier laser, which is multiplied to obtain KrF excimer amplification at approximately 248 nm. U.S. Patent No. 6,373,869, issued April 10, 2002, to 10 Jacob, entitled "System and Method for Producing Coherent Radiation at Ultraviolet Wavelengths", relating to the use of Nd:YAG sources plus optical parametric oscillators and frequency multipliers A mixer to provide seed to the multi-pass KrF amplifier. US Patent Case 6,901,084 ' issued to pask on May 31, 2005, the name "stabilized solid-state Raman laser and its operation method", is a solid-state laser with 15 Raman scattering mechanism in the cavity of the laser system. The system translates the output wavelength. U.S. Patent No. 6,940,880 ' issued September 6, 2005 to Butterworth et al., entitled "Optical Pumped Semiconductor Laser", is an optically pumped semiconductor laser cavity that forms part of a ring resonator, such as a nonlinear crystal. Located within the ring resonator, including, for example, the discussion of Figures 1, 2, 3, 5, and 6, with a 20-neck configuration. U.S. Announced Patent Application 2004/0202220, Announcement, October 14, 2004, 'Inventor Hua et al., titled "Primary Oscillator - Power Amplifier Excimer Laser System", relating to a configuration such as ΜΟΡΑ configuration A molecular laser system having a set of reflective optical elements to deflect at least partially through the oscillating oscillating beam of light in a reverse direction through ΡΑβ US Bulletin 21 2124423 Application 2005/0002425, dated January 1, 2003, invented Human Govorkov et al.'s name "The main component of the long life of the optical component _ power amplifier (ΜΟΡΑ) excimer or molecular fluorine laser system" is related to the 具有 with pulse expander, using a split light in the pulse expander The prism is pulsed into a 5-frame, a housing covers (ΜΟ+ΡΑ) and a reflective optical element on which a pulse expander is mounted' and the reflective optical element forms a delay line around the turns. U.S. Announced Patent Application No. 2006/0007978, dated January 1, 2006, inventor Govokov et al., entitled "Bandwidth Limit and Long Pulse Main Oscillator Power Oscillator Laser System", is related to a limitation A ring oscillator that oscillates the bandwidth inside the 1 〇 device. U.S. Patent No. 6,590,922, issued July 8, 2003, issued to Onkels et al., entitled "Injection of Seeded F2 Laser with Line Selection and Screening", revealing that the F2 laser is unintendedly radiated through a single-pass power amplifier. A wavelength to selectively amplify the desired portion of the F2 spectrum used for the line selection of the desired portion of the F2 15 spectrum in the F2 laser molecular fluorine discharge laser. U.S. Patent No. 6,904,073, issued June 7, 2005 to Yager et al., entitled "High-Power Deep-Energy Laser with Long-Life Optical Components," Revealing the Exposure of Fluorescent Crystal Optical Elements Containing Cavities to Fluoride-Containing Laser Gas Mixtures Protect the optical components. 20 Published International Application No. WO 97/08792, filed on March 6, 1997, discloses an amplifier having an intracavity optical system having an optical path through the same intersection 16 times, where a chestnut is directed The light source is used to amplify the light passing through the intersection. R. Paschotta' Regenerative Amplifier, refer to http://www.i*p-photonics. 22 com/regenerative__amplifiers.html (2006) ' Discuss a regenerative amplifier that can be viewed as an optical amplifier with a laser cavity, where the pulse does engage several times Back and forth, a strong amplification of short optical pulses is achieved. Multiple pass gain media, such as solid state or gaseous laser media, can be achieved by placing the gain medium in the optical cavity with the same optical switch, such as a photo-modulator and/or a polarizer. The gain medium can be pumped for a period of time, thus accumulating some energy, and then the initial pulse can be injected into the cavity via the port opening for a short time (less than one turn), for example using a photoelectric switch (or occasionally using an acousto-optic switch) To open. The 'pulse can then be repeated multiple times (possibly hundreds of times) back and forth, amplified by 10 to a high energy level, commonly known as oscillation. The photoelectric switch is then used again to release the pulse from the resonant cavity. In addition, the number of vibration discs can be determined by using a partially reflective output coupler to reflect portions of the light generated by the optical cavity, for example, about 10%-20%, back into the optical cavity, until through the stimulus emission in the laser medium. The amount of light generated is between the individual initiation and maintenance periods of the excited medium, and there is a useful energy pulse through the output coupler, for example, in an electrically pumped gas discharge pulsed laser system, the gas discharge between the electrodes is expected The voltage is set between the pulse repeating tree electrodes. Uppal et al., Asymmetric Nd: The efficacy of a glass ring laser ‘Applied Optics, Volume 25, Number 1

The small amount of the steering amplifier on both sides of the four-sided mirror [and the setting] additional device... is converted into a closed regenerative multipass ... used to introduce the pulse 23 1324423 from the closed regenerator and to extract the pulse". This reference refers to a fixed number (fixed by an optical device) through the open-end amplifier portion of the amplifier section, for example, how long it takes time for the beam to pass through the lens out of the amplifier portion as a "resonator". As used herein, resonators and other terms such as resonant cavity, oscillation, output coupling, etc. are used specifically to denote a main oscillator or amplifier section, a power oscillator, because the laser is generated by oscillation in the cavity until the laser is generated. There is sufficient pulse strength to be sent out for a useful pulse to output from the partially reflected output coupler into a laser output pulse. This depends on the optical properties of the laser cavity, such as the size of the laser cavity and the reflection coefficient of the output coupler, rather than simply relying on the guide laser input through the gain medium for a fixed number of times, for example, once, twice, etc. The number of reflections (power amplifier) or six times, etc., is presented in the embodiment disclosed by Fork et al. Mitsubishi Japanese Patent Publication No. jP11_025890, application date February 3, 1999, publication date August 11, 2000, public number 2000223408 'Name "Manufacture of semiconductor manufacturing components and semiconductor components 15" ' reveals a solid seed mine The injection and injection locking power amplifier has a phase delay homogenizer such as a grism or grism optical device between the main oscillator and the amplifier. U.S. Announced Patent Application No. 20060171439, published on August 3, 2006, titled "Primary Oscillator - Power Amplifier Excimer Laser System", the previously announced application of the division of 20040202220, revealing 20 as the main oscillator / power The amplifier laser system has an optical delay optical path intermediate the main oscillator and the power amplifier to form an amplified pulse from an input pulse having overlapping sub-pulses.

Partlo et al., Diffuse Speckle Model: applied to multiple moving diffusers to discuss various aspects of speckle reduction. U.S. Patent No. 5,233,460, entitled "Methods and Means for Reducing Speckle in Coherent Laser Pulses", issued to Pani on August 3, 1993. Et al. discuss uncalibrated optical delay optical paths for coherent destruction of gas discharge laser systems such as excimer laser system outputs. The power efficiency 5 of the regenerative amplifier, for example using a switching element regenerative amplifier, is severely reduced by the in-cavity loss effect (especially the photoelectric switch wear effect). In addition, the reflectivity of the 'partial reflection output light coupler may affect the cavity loss and the output pulse duration. The sensitivity of such wear is extremely high with low gain because it increases the number of round trips required to achieve a certain total amplification factor. One possible alternative to a regenerative amplifier is a multi-pass amplifier, such as the XLA model of the aforementioned conveyor, where the multi-pass (the direction of propagation is slightly different each time it passes) can be configured in a set of mirrors. This method does not require a fast modulator, but if the number of gain media increases, this approach becomes complicated (and difficult to calibrate). It is generally understood in the industry that the output coupler means that the partially reflective optics 15 can provide feedback into the laser oscillating chamber while also passing energy out of the laser cavity. Demand for consumable cost improvements, such as for ArF excimer lasers such as those used in lithography sources, has long been dominated by cavity lifetimes, such as optical components that are strong at the higher 248 nm wavelength of KrF. Recent advances in the design and design of the 20-horse ArF optics have resulted in a significant increase in the optical lifetime of the ArF', for example, the development of the ArF grating has been improved for the Xima NL-7000A, and the LNM has a low intensity, such as the two-stage xla system. ArF etalon material improvements have led to extended life for ArF wave meters, stabilizing modules, LAM, SAM and BAM. In addition, KrF cavity lifetimes have been significantly improved using the Xima ELS-7000 and 25 ELS-7010 products, for example, through the use of proprietary electrode technology. However, extended electrode technology life requires special operating parameters such as those for the ELS-7000 and ELS-7010 KrF chambers and the XLA-200 and XLA-300 PA chambers. However, these parameters cannot be used in any of the Hexima ArFXLAMO chambers due to the total output power requirements of the system. Applicants have suggested mitigating damage to the cost of such consumables, for example, in ArF dual cavity main oscillator/amplifier products for integrated circuit fabrication lithography. As used herein, resonators and other terms such as resonant cavity, oscillation, output coupler, etc. are used specifically to denote a main oscillator or amplifier section 10, a power oscillator, because the laser is generated by oscillation in the cavity until the laser is generated. There is sufficient pulse strength to be sent out for a useful pulse to output from the partially reflected output coupler into a laser output pulse. This depends on the optical properties of the laser cavity, such as the size of the laser cavity and the reflection coefficient of the output facet, rather than simply relying on the pilot seed laser input through the gain medium for a fixed number of times, such as through 15 times, through two Inferior number of reflections (power amplifier). As used herein, a closed loop optical path or an oscillating circuit refers to a laser discharge amplification stage that amplifies a gain medium such as an excimer or similar gas discharge. [Ming Na ^ § 13 Summary of Invention 20 skilled in the art to understand that a device and method includes a line narrowing pulsed excimer or molecular fluorine gas discharge laser system, comprising: a sub-laser oscillator that produces an output The invention comprises a laser output pulse beam comprising: a first gas discharge excimer or a molecular fluorine laser cavity; a narrowing module in a first cavity of the first cavity; a laser amplification stage comprising a 26 amplification gain The medium is in a second gas discharge excimer or molecular fluorine laser cavity, which receives the output of the seed laser oscillator and amplifies the output of the seed laser oscillator to form a laser system including a laser output pulse beam The output 'includes: a ring power amplifier stage. The ring power amplifier stage includes an injection mechanism including a portion of the reflective optical element through which the output beam of the seed laser oscillator is injected into the loop power amplification stage. The ring power amplifier stage includes a bow tie loop or a racetrack loop. The pulse output of the seed laser oscillator can be less than or equal to 〇1 mj, or 〇 2mJ or 〇.5mJ ’ or 〇.75mJ. The ring power amplifier stage amplifies the output of the seed laser oscillator 10 cavity to a pulse energy of 21 mJ, or 22 mJ, or 25 mJ, or 21 〇 mJ, or &gt; 15 mJ. The laser system can operate at up to or at an output pulse repetition rate of &lt;8 kHz or to S6 kHz. The apparatus and method can include a broadband pulsed excimer or molecular fluorine gas discharge laser system comprising: a sub-laser oscillator that produces an output comprising a laser output pulse beam, 15 comprising: a first gas discharge An excimer or molecular fluorine laser cavity; a laser amplification stage comprising an amplification gain medium in a second gas discharge excimer or molecular fluorine laser cavity, receiving the output of the seed laser oscillator, and amplifying the seed lightning The output of the oscillator is used to form a laser system that includes a laser beam of the output pulse, comprising: a ring power amplifier stage. According to a practical example of the disclosed main problem, a coherence destruction mechanism is located between the seed laser oscillator and the amplifier gain medium. The coherence disrupting mechanism includes an optical delay optical path having a delay length that is longer than a coherence length of the pulse in the laser output pulse beam of the seed laser oscillator. The optical delay optical path is not substantially delayed by the length of the beam in the output pulse beam of the laser of the seed laser remote. The coherence destruction mechanism includes a first optical delay optical path of a first length and a second optical delayed optical path of a second length, wherein an optical delay of each of the first optical delay optical path and the second optical delayed optical path exceeds the seed The laser output of the laser oscillator outputs a pulse-coherent length of the pulse, but does not substantially increase the pulse length, and the difference between the length of the first delayed optical path and the length of the second delayed optical path exceeds the The coherence length of the pulse. Apparatus and method according to an embodiment may comprise a line narrowing pulsed excimer or molecular fluorine gas discharge laser system comprising: a sub-laser oscillator that produces an output package 10 comprising a laser output The pulse beam comprises: a first gas discharge excimer or a molecular fluorine laser cavity; a narrowing module inside a first oscillator cavity; a laser amplification stage containing an amplification gain medium for discharging a second gas An excimer or molecular fluorine laser cavity that receives the output of the seed laser oscillator and amplifies the output of the seed laser oscillator to form a laser system output comprising a laser output pulse 15 beam comprising: a ring A power amplification stage; a coherent destruction mechanism between the seed laser oscillator and the ring power amplification stage. According to an aspect of the embodiment, the apparatus and method may comprise a broadband pulsed excimer or molecular fluorine gas discharge laser system comprising: a sub-20 laser oscillator that produces an output comprising a laser output pulse beam Included: a first gas discharge excimer or molecular fluorine laser cavity; a laser amplification stage containing an amplification gain medium in a second gas discharge excimer or molecular fluorine laser cavity' receiving the seed laser oscillator Output, and amplifying the output of the seed laser oscillator to form a laser comprising a laser output pulse beam

· · S 28 side wheel out 'contains: - ring power amplifier stage; between the seed laser vibration y, 41⁄4 power amplification stage - coherence destruction mechanism. According to the eight-eighth aspect, the H-and-method may include a pulsed excimer or a vocational lightning (four) system comprising: - a seed laser reducer, which is placed; the wheeled inclusion-laser output pulse beam comprises: a first gas line! a quasi-t or molecular fluorine laser cavity; an L-handle group inside the first reducer chamber, - the laser amplification stage contains an amplification gain medium in a second = discharge excimer or molecule a fluorine laser cavity that receives the wheeling of the seed laser oscillation and amplifies the output of the seed laser oscillator to form a laser system output comprising a pulsed pulse; the laser is excited by the seed The __coherence destruction mechanism between the super-laser amplification stages includes - the optical delay light 2 the coherence length of the seed laser output beam pulse. The amplification level 3 t is radiated to the cavity or an optical path is defined by the amplification gain medium 15 to be fixed - the number of people. The 忒 coherent destruction mechanism contains a coherent destruction optical pulse. The plurality of times / which are generated by the sequential-single-input pulse delay are delayed by more than the subsequent pulse length by the length of the coherence of the pulse light. Those skilled in the art should also understand that a device and method are disclosed that include a

The machine pirate includes: an illuminating mechanism that irradiates a working piece with pulsed uv light*T a bad V light input opening; a working piece fixed platform; and a coherent breaking mechanism that exceeds the coherence length of the uv light pulse Optical Delay Light This optical delay does not substantially increase the UV light bribe length. The coherence=destruction mechanism includes a first-length-first optical delay optical path and a second optical delay optical path of a first length, and an optical delay of each of the first delayed optical path and the 29th optical path is exceeded by the UV light The coherence length of the pulse, but does not increase the pulse length, and the length difference between the first delayed optical path and the first delayed optical path exceeds the coherence length of the pulse. At least one of the first delayed optical path and the second delayed optical path includes a light 5 beam inversion mechanism or a beam translating mechanism. A person skilled in the art will also appreciate that a device and method according to an embodiment includes a laser source system comprising: a solid-state laser seed beam source providing a sub-laser output; a frequency conversion stage Converting the seed laser output into one wavelength suitable for seeding an excimer or molecular fluorine gas discharge 10 laser; an excimer or molecular fluorine gas discharge laser gain medium amplifying the converted seed laser output to generate One of the converted wavelengths is a gas discharge laser outputting a pulsed beam; a coherent destruction mechanism comprising an optical delay element having a delayed optical path that is longer than a coherence length of the output pulse. 15 the excimer or molecular fluorine laser may be selected from the group consisting of XeC Bu XeF,

A group of KrF, ArF and F2 laser systems. The laser gain medium includes a power amplifier 'which includes a single pass amplifier stage or a multi-pass amplifier stage. The gain medium includes a ring power amplifier stage that includes a bow tie configuration or a racetrack configuration and an input/output coupler seed injection mechanism. 20 the coherence disrupting mechanism is between the laser seed beam source and the gas discharge laser gain medium. The solid seed laser beam source comprising a Nd based solid state laser&apos; can include pumping one of the Nd based solid state lasers. The Nd-based solid state laser includes a fiber amplifier laser and includes a Nd-based solid state laser selected from the group consisting of Nd:YAG, Nd:YLF, and 30 1324423

A group of Nd:YV04 solid state lasers. The solid seed laser beam source contains a solid-state laser based on Er and contains a fiber laser. The solid-state laser based on Er contains an Er:YAG laser. The frequency conversion stage comprises a linear frequency converter comprising a Ti: sapphire crystal or a crystal containing amethyst. The frequency conversion stage 5 includes a non-linear frequency converter, such as a second wave generator or a sum mixer. According to an aspect of the embodiment, the apparatus and method comprise a laser light source system comprising: providing a solid laser seed source of a sub-laser output; and a frequency conversion stage converting the seed laser output into Suitable for seeding one of the excimer or molecular fluorine gas discharge laser wavelengths; a quasi-10 molecule or molecular fluorine gas discharge laser gain medium that amplifies the converted seed laser output to produce a discharge laser output in an approximate conversion The wavelength includes a ring power amplification stage. The method includes utilizing a solid-state laser seed beam source to provide a sub-laser output; in a frequency conversion stage, converting the seed laser output frequency into a suitable one for excimer or molecular fluorine gas discharge 15 electric laser Wavelength; utilizing an excimer or molecular fluorine gas to discharge a laser gain medium, amplifying the converted seed laser output to produce a gas discharge laser output that is approximately one of the converted wavelengths. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 shows a known Μ PA configuration multi-cavity laser system; 20 Figure 2 shows various embodiments of the claimed patent subject matter, and Figure 3 shows the claimed patent subject matter disclosed. Various aspects of one embodiment, FIG. 4 shows various aspects of an embodiment of one of the claimed patents, and FIG. 5 shows various aspects of an embodiment of the claimed patent subject; 6 shows various aspects of one embodiment of the claimed subject matter, and FIG. 7 shows a timing and control scheme for each aspect of an embodiment in accordance with one of the disclosed subject matter; FIG. 8 is a schematic representation of Various aspects of one embodiment of the disclosed subject matter, similar to the multiple reflections of Figure 37 or the use of separate beams to fill different spatial portions of a hole 10 gap; Figure 9 schematically illustrates an embodiment in accordance with the disclosed subject matter. Various aspects are useful for input coupling; Figure 10 is a schematic illustration of useful input couplings in accordance with various aspects of an embodiment of the disclosed subject matter; 15 Figure 11 is a schematic illustration of the subject matter disclosed Various aspects of an embodiment are useful for input coupling; FIG. 12 is a schematic illustration of useful input couplings in accordance with various aspects of one embodiment of the disclosed subject matter; FIG. 13 is a schematic illustration of one of the disclosed aspects Each of the 20 aspects is useful for input coupling; Figure 14 is a schematic representation of useful input couplings in accordance with various aspects of one embodiment of the disclosed subject matter; Figure 15 is a schematic illustration of one embodiment in accordance with the disclosed subject matter. Each aspect of the invention is useful in a top view of one embodiment of an input coupling mechanism;

32 1324423 Figure 16 is a side elevational view of the input coupling mechanism of Figure 15 useful in accordance with various aspects of one embodiment of the disclosed subject matter; Figure 17 is a schematic illustration of an embodiment in accordance with one of the disclosed subject matter Various aspects are useful for input coupling; 5 Figure 18 is a cross-sectional view schematically showing various aspects of an embodiment of an orthogonal injection seeding mechanism in accordance with various aspects of one embodiment of the disclosed subject matter, Figure 19 A cross-sectional view schematically illustrates various aspects of an embodiment of an orthogonal injection seeding mechanism in accordance with one aspect of the disclosed subject matter; FIG. 20 is a cross-sectional view schematically showing Various aspects of one embodiment of the subject matter, an aspect of an embodiment of an orthogonal injection seeding mechanism, and FIG. 21 is a cross-sectional view schematically showing various aspects of a 15 example according to one of the disclosed subject matter, Various aspects of an embodiment of an orthogonal injection seeding mechanism; ® Figure 22 is a cross-sectional view schematically showing various aspects of an embodiment of the disclosed subject matter, an orthogonal injection seeding mechanism Various aspects of the embodiment, FIG. 23 is a partial cutaway perspective view schematically showing an extension of one of the laser chambers in the laser cavity according to various aspects of an embodiment of the disclosed subject matter; Figure 24 shows measured values of forward and reverse energy in a ring power amplifier in accordance with various aspects of an embodiment of the disclosed subject matter; 33 Figure 25 shows various aspects in accordance with the disclosed subject matter. The measured values of the forward energy and the reverse energy in the ring-shaped power amplifier; Figure 26 is a schematic and block diagram showing the various aspects of an embodiment according to one of the disclosed g Control System; 5 Figure 27 shows the saturation of a ring-shaped power buffer with varying 输出0 output pulse energy according to the disclosed subject matter; Figure 28 is schematic and shown in block diagram form A laser control system in accordance with various aspects of the disclosed subject matter; FIG. 29 is a schematic and block diagram showing various aspects of an embodiment in accordance with the disclosed subject matter. A laser control system; FIG. 30 is not intended to show a seed injection mechanism and a beam expander according to various aspects of one embodiment of the disclosed subject matter; FIG. 31 is a schematic view showing one of the embodiments according to the disclosed subject matter. Each of the 15 aspects of the coherence destroyer; FIG. 32 is a schematic view showing the coherence destroyer of each aspect of the embodiment according to the disclosed subject matter; the 33rd part is partially unintentionally and partially shown in block diagram form. Examples of one embodiment of the disclosed main s, examples of each of the 20 elements of a coherent destruction system, and examples of the results of the various aspects of the system; Figure 34 shows an embodiment in accordance with the disclosed subject matter. The relative speckle intensity of each Ε-Ο deflector voltage, relative to the relative timing between Ε-0 and pulse generation in the seed laser. Figure 35 shows an embodiment according to one of the disclosed aspects. Various aspects

The directing displacement of 34 is relative to the E-Ο voltage; Figure 36 shows an example of the E-0 biasing voltage timing and the seed 蛩~jecting pulse spectrum according to the various aspects of the disclosed embodiment; Figure 37 of the various embodiments of the embodiment is not intended to show the effect of the dryness of the shirt from the back of the shirt. Figure 38 shows the image according to the disclosed t ^ Effect of beam broom/smear coherence; effect Figure 39 shows a cartoon showing multiple coherence failure systems. Figure 40 shows a schematic representation of the various aspects of the revealed subject matter. Coherence reduction system; Figure 41 shows the result of the analog beam pulse inversion; Figure 42 shows a partial block diagram showing each aspect of an embodiment according to the disclosed subject matter, a beam combination with divergence control Figure 43 shows various aspects of an embodiment according to one of the disclosed subject matter, emulating E-Ο supply voltage versus seed pulse intensity spectrum over time; Figure 44 shows implementation in accordance with one of the disclosed g In various aspects of the example, the E-〇 supply voltage is tested over time with respect to the seed pulse intensity spectrum; FIG. 45 shows an E-0 battery drive circuit in various aspects in accordance with an embodiment of the disclosed subject matter; Figure 46 shows an example side view of various aspects 1324423 in accordance with one embodiment of the disclosed subject matter; Figure 47 is a schematic and block diagram showing various aspects of an embodiment in accordance with the disclosed subject matter, Broadband source and laser surface treatment system using DUV laser light; 5 Figure 48 is a schematic illustration of a coherent disrupter optical delay optical path in accordance with various aspects of one embodiment of the disclosed subject matter; Coherent Destructor Optical Delay Optical Path of Various Aspects of an Embodiment of the Disclosure of the Invention; FIG. 50 is a block diagram showing, in block diagram form, various aspects of lithography according to one embodiment of the disclosed subject matter. Figure 51 is a schematic and block diagram showing various aspects of a lithography tool in accordance with an embodiment of the disclosed subject matter; Figure 52 is schematic and shown in block diagram form Laser lithography tool of various aspects of one embodiment of the disclosed subject matter; 15 Figure 53 is a schematic and block diagram showing laser lithography of various aspects in accordance with an embodiment of the disclosed subject matter Figure 5 shows a very high average power laser source in accordance with an embodiment of one of the disclosed subject matter in a block diagram; Figure 55 is a schematic and block diagram showing The present invention discloses an extremely high average power laser source of various aspects of an embodiment; FIG. 56 is a schematic and block diagram showing the extremely high average power of various aspects in accordance with an embodiment of the disclosed subject matter. An example of a laser source; a portion of the immersion laser lithography system 36 1324423, which is partially and partially shown in block diagram form in accordance with an embodiment of the disclosed subject matter; A solid-state seed laser to a gas discharge amplifier laser system in accordance with an embodiment of one of the disclosed embodiments is shown in block diagram form, and FIG. 59 is shown in block diagram form in accordance with the disclosed subject matter. A solid-state seed laser/amplifier laser system of various aspects of an embodiment, FIG. 60 is a schematic and block diagram showing various aspects of an embodiment of the disclosed subject matter, a sub-laser Output conversion, for example using a frequency converter for the same beam splitter transformation, followed by coherence destruction; 10 Figure 61 is a schematic and block diagram showing a 60th diagram of various aspects of an embodiment in accordance with one of the disclosed subject matter A version of an embodiment; FIG. 62 is a schematic and partial block diagram showing various aspects of an embodiment of the disclosed subject matter, a seeded DUV gas discharge main oscillator/amplifier gain medium laser system solid state Main oscillator; 15 Figure 63 is a schematic and partial block diagram showing various aspects of an embodiment of the disclosed subject matter, a seeded DUV gas discharge main oscillator / amplifier gain medium laser system solid state main oscillation Figure 6 is a schematic and partial block diagram showing various aspects of an embodiment of the disclosed subject matter, an implanted DUV gas discharge Main 20 Oscillator/Amplifier Gain Medium Laser System Solid State Main Oscillator; Figure 65 is a schematic and partial block diagram showing various aspects of an embodiment of the disclosed subject matter, an implanted DUV gas discharge main oscillation /Amplifier gain medium laser system solid state main oscillator; Figure 66 is a schematic and partial block diagram showing various aspects of an embodiment according to the disclosed main::S; 37 1324423, a very high power Solid state seed laser and gain amplifier laser system; FIG. 67 is a schematic, and partial, block diagram showing various aspects of an embodiment of the disclosed subject matter, a regenerative/cycle power gain oscillator 5 power amplification stage; Figure 68 is a schematic and partial block diagram showing various aspects of an embodiment of the disclosed subject matter, a solid seed laser/gain amplifier laser system; Figure 69 is schematically and partially shown in block diagram form A solid-state seed laser/gain amplifier laser system according to various aspects of one embodiment of the disclosed main body 10; FIG. DETAILED DESCRIPTION OF THE INVENTION Various aspects of an embodiment result from a regulated output pulse shape of a laser system. Figure 71 is a schematic representation of an E-0 battery mine of each of the 15 aspects according to one embodiment of the disclosed subject matter. The control of the input voltage is shown in block diagram form 7F. In accordance with the disclosed subject matter, a laser steering system is used in accordance with various aspects of the disclosed embodiments. Figure 73 is a schematic illustration of one of the disclosed aspects. Example of an EO battery laser-operated voltage input signal; 20 Figure 74 shows an example of coherence failure test results for various aspects of an embodiment according to the disclosed subject matter; Figure 75 shows An example of a coherence failure test result of each aspect of an embodiment; FIG. 76 is a schematic and partial block diagram showing various aspects of an embodiment according to the disclosed main 38 1324423, one having about Solid-state seed laser of 193 nm output light; Figure 77 is a schematic and partial block diagram showing various aspects of an embodiment according to the disclosed subject matter, a solid state of about 193 nm output light Sub-laser; Figure 78 shows various frequency up-conversion systems; Figure 79 is a schematic and block diagram showing a laser system in accordance with various aspects of one embodiment of the disclosed subject matter; A laser system in accordance with various aspects of the disclosed subject matter is shown in block diagram form; Section 81A-C shows, in exploded form, various aspects of an embodiment in accordance with the disclosed subject matter, a seed Perspective and partial schematic view of the ray path of the laser amplification gain medium; Sections 82A and 82B show a top view and a side view of the 15th ray path of the 81A_C diagram in a perspective view; Fig. 83A shows the 81A-C diagram And a schematic perspective view of a portion of the relay optical component of FIG. 82A-B; FIG. 83B is a side view detail of the beam expander of the 81st Α (^, 82AB, and 83a; 2〇 84A and Figure 84B is a schematic illustration of a top view and a side view of a beam spatial translation/fanout/hoof (four) mechanism in accordance with one of the disclosed subject matter; Figure 85 is a beam displacement to an offset angle Chart; and Figure 86 is a schematic representation of each of the embodiments in accordance with the disclosed subject matter.

S 39 aspects have a beam inversion mechanism of a beam delay optical path.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In accordance with various aspects of an embodiment of the disclosed subject matter, a gain 5 amplifying medium is suitable, for example, for use in a multi-chamber (multi-part) oscillator/amplifier configuration, for example Excimer or molecular fluorine gas discharge seed oscillator lasers, for example, a main oscillator power gain amplification configuration, using an improved seed laser coupling configuration, basically designed to seed laser light, such as a main oscillator seed output lightning The pulse of the illuminating pulse beam is inserted into the amplification gain medium, typically with very little loss, and protects against amplifier oscillations and/or ASE return to the main oscillator when the main oscillator laser medium is energized. This may interfere with proper operation of the primary oscillator, such as in conjunction with a line narrowing module, to produce a suitably narrowed seed oscillator output laser pulse beam pulse width. In accordance with various aspects of one embodiment of the disclosed subject matter, the preferred configuration 15 includes, for example, an annular cavity, such as a power oscillator or power ring oscillator ("PRO") or a power ring amplifier ("PRA"). This configuration is determined by the Applicant as an extremely effective solution for entering higher power laser operations in a line narrowed multi-part (seed laser amplifier) configuration, particularly for gas discharge seed lasers to the same gas The discharge amplifier is laser multi-part laser system. The operation of such a laser system is similar to the applicant's employer's XLA series of lasers, but with a power toroidal amplification stage. Improvements in CoC can be achieved in accordance with various aspects of one embodiment of the disclosed subject matter. In addition, the power toroidal amplification stage can be used for other purposes including seed lasers of the same type of gas discharge laser, such as solid seed lasers, for example by translation 40 1324423 and/or by frequency multiplication to match the laser wavelength of an excimer or molecular fluorine amplifier. . Such a system can ultimately be used to control laser system output laser beam pulse parameters such as bandwidth, bandwidth stability, output pulse energy, output pulse energy stability, and the like. In such a system, pulse cropping, such as pulse cropping at the output of amplifier stage 5, can also be used to control the output pulse parameters of the laser system. Thus, in accordance with various aspects of one embodiment of the disclosed subject matter, an annular cavity P 0 can be formed, for example, with a 24% output coupler, for example, including an existing u P u s beam splitter assembly' as further detailed herein. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicant mentions that reconfiguration, such as having an existing XLA product based on excimer MO, is reconfigured from mΜΟΡΑPR〇 (power ring oscillator), or Configured as MOPRA, a regenerative amplifier having, for example, a ring configuration (seed laser of a power regenerative amplifier) is occasionally referred to herein as a power amplification stage, in accordance with various aspects of an embodiment of the disclosed subject matter. Such a system (丨) improves the stability of the amount of energy, such as a saturation or effective saturation pulse to pulse operation amplification stage, thereby more accurately ensuring pulse-to-pulse energy stability; (2) achieving an extension of LNM life. In accordance with various aspects of one embodiment of the disclosed subject matter, the advantages of a multi-cavity laser system allow for meeting the various needs discussed above, such as requiring a higher power of 20, better pulse energy stability, better bandwidth control and Reduce achievable bandwidth, higher repetition rates, and lower operating costs. In addition, a rise in the average power output of the currently available laser system can be achieved. This is advantageous for line narrowing systems and/or broadband systems such as XeCl or XeF multi-cavity laser systems, such as for LTPS processing to anneal amorphous germanium on substrates, for the fabrication of, for example, thin film 41 1324423 crystals for crystal production. The substrate. In accordance with various aspects of one embodiment of the disclosed subject matter, certain performance requirements are imposed on very high power amplification stages of, for example, a 120-180 W or higher laser system, such as two parallel amplifier gain media cavities. Example 5 described here is based on a hypothetical requirement of 200 W or higher. It produces a linear polarization (&gt;98%)« each amplification stage must be generated and can survive 24 〇w average output energy at, for example, a 193 nm ArF wavelength, but it is expected to use a 260 W specification, or less harsh at longer wavelengths. For example, 248 of KrF and 351 of XeF or 318 of XeCl, but F2 is even more demanding at 157 nm. In one embodiment, each amplification stage can operate at least 10 4 kHz or more, and in some cases is also expected to be 6 kHz. In accordance with various aspects of one embodiment of the disclosed subject matter, the amplification stage has a complete seeding (saturated or near saturation) of relatively small seed laser energy. Applicants believe that the amplification stage also needs to support large angular distributions such as certain applications, for example to maintain the same angular spread of the seed laser, to prevent inadvertently, for example, by removing coherent 15-cell batteries, for example, at angles of a few milliradians ( The coherence is improved by a coherent battery within the range of m Rad ). Protecting the seed laser from reverse radiation is also an important operational requirement. In accordance with various aspects of one embodiment of the disclosed subject matter, the ASE level produced by the amplification stage must be less than 0.1% or less of the total output when properly seeded. 20 In accordance with various aspects of an embodiment of the disclosed subject matter, Applicants anticipate that (1) the gain profile will be similar to an existing A rF cavity such as the applicant's assignee's XLA ArF laser system power amplifier ("PA"). The cavity is (2) the gain length is similar to the existing ArF cavity; (3) the length of the benefit time is similar to that of the existing ArF cavity. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicant cited 42 examples such as a single MO/gain amplifying medium XLA ticks (tic-toc) with solid seed lasers operating at 12 kHz, having about 1 millijoule of seed ray The output optical pulse energy, and the two amplification stages are each capable of operating at about 17 mJ output pulse, in other words, alternately amplifying the 5 output pulse averaging from the seed laser in an individual amplification gain medium cavity to alternately enter the individual two in series Amplifying the gain medium (which may include more than two amplification gain media as described above), and the pulses are equally divided into more than alternating pulses, for example three gain media and three pulse sequences are equally divided by the seed pulse output of the individual gain media, The time is repeated, so the gain medium is determined by the number of gains 10 used in parallel with the seed laser output, and the gain medium is operated at the pulse repetition rate of the component of the pulse repetition rate of the seed laser. Moreover, in accordance with various aspects of an embodiment of the disclosed subject matter, Applicants have suggested utilizing a regenerative gain medium in which an oscillating laser produces photons through a gain medium, such as a loop power amplifier stage, a ring power oscillator, or a loop power. Compared to the power amplifier amplifier stage of the power amplifier ("pA"), the amplifier has an optically defined fixed number of passes through the gain medium. The first three can more effectively amplify the seeds from the seed laser. Pulse energy. For testing purposes, Applicants used a line-narrowed ArF laser to simulate a solid 193 nm seed laser.

2〇 The applicant studied the ASE relative to the MO-PO timing difference for the different values of the above parameters. The results are shown in Figure 45. A study of the function of the same parameters relative to the MO-PO timing is also shown in Figure 45. In order to comply with the foregoing requirements, such as the limitations of known lithographic laser source technology, Applicants 43 provide a variety of holistic (4) aspects in accordance with various aspects of one of the disclosed subject matter, and it is believed that a workable manner can be provided to address the foregoing requirements. With restrictions. The first (four) provides two multi-cavity laser systems together with the XLA XXX Ray Ray _ of the assignee of the request, for example, two dual-chamber laser oscillating devices/power amplifier configurations, whereby the respective combinations are higher than Operating at 4 kHz and preferably at about 6 kHz produces an output pulse having an interleaved emission time of about 17 mj, according to one embodiment, to produce a single approximately i2 kHz system of about 17 m per pulse. Turning to Fig. 1, a more or less typical laser system 20, such as the applicant's assignee's XLA multi-cavity M〇PA laser system, is shown and partially shown in block diagram form. The laser system may, for example, include an oscillator seed laser cavity 22 and an amplifier gain medium laser cavity 24' such as a multi-pass power amplifier ("ΡΑ"). ΜΟ 22, for example, for semiconductor manufacturing lithography, can be combined with a line narrowing module ("LNM") 26; or can be operated in a wideband mode if desired. For example, for applications such as LTPS, the line narrowing module is not included. A round of outcoupler 28, such as a partial mirror, for example having a selected reflectivity for the available center wavelength, for example, for a XeF laser oscillator of approximately 351 nm, for a KrF laser oscillator of approximately 248 nm, for The ArF laser oscillator is approximately 193 nm' for the molecular fluorine laser oscillator approximately i57 nm; together with the maximum mirror from LNM 26 (or for a given nominal center wavelength (not shown) for wideband operation The back end reflection provided by the LNM 26) can be used to form a laser 20 oscillator cavity. The relay optical component 40 includes, for example, a steering mirror 44 and a steering mirror 46 that can be used to manipulate the seed oscillating laser 20 to output a laser light pulse beam 62 pulse from the line center (center wavelength) analysis module ("LAM") 42 along the optical path (optical axis) 60 is sent to the input of the magnifying chamber 24 of the magnifying group. In addition to the central wavelength monitoring device (not shown), the 'laser cavity can include a M0 energy monitor 48, and a small portion of the laser output light pulse beam from the M0 cavity 22 for metrology purposes can be provided, for example, to borrow The spectroscope 50 inside the LAM 42 performs a nominal center wavelength and energy detection. The turning mirror 44 provides a main oscillator 22 along the optical path to output a laser pulse beam 62 to the steering mirror 46. The steering mirror 46 reflects the beam 62 into the amplifier chamber 24 to become the beam 64. In the case of system 20 of Figure 1, gain amplifier 24 is configured as a power amplifier, i.e., light received from MO, and the MO seed outputs a laser pulse 1 〇 beam pulse through a gain amplifying medium for a fixed number of times, such as by optical components. The number of times determined by the turning mirror 46, as shown in the figure, is set up as an edge coupling optical element TL and a beam returner (inverter) optical element 7 〇, such as a back mirror (described in detail later), which is connected to the same optical path. 72, the laser gain medium is sent through a window 80, and the window 80 can be set at an angle of about 7 degrees with respect to the outgoing optical path 72 to reduce the energy density of the most preferred optical element, thus optimizing the given name. The central wavelength thermal load 'window 80' material such as caF2 is used for shorter wavelengths, such as the nominal center wavelength of the ArF laser system or the angle of the angle about Brewster to optimize the transmittance of the exiting light. The outgoing light 1〇〇 is also passed through a beam splitter 74 inside the bandwidth analysis module ("BAM"). The laser system output beam 1 〇〇 20 can also pass through a first beam splitter 76 and a second beam splitter 78 inside a pulse extender 86 such as an optical pulse extender (r〇PuS), such as including multiple applicants The laser system discussed previously by the assignee as a 4 χ pulse stretcher, for example via the guiding beam 100 into the retarding light path 88, outputs the laser light from the system to the laser system 1 Ti Tis by about 17 nanoseconds. Increased to approximately 40 45 1324423 nanoseconds as described in the above-mentioned U.S. Patent No. 6,928,093, entitled "Long Term Delay and High TIS Pulse Extender", issued on August 9, 2005 to Webb et al. In the optical path of the laser system 20, the output laser beam pulse 1 〇〇 5 pulse can be, for example, the beam expander 84 to reduce the optical density of the downstream optical component'. The beam splitters 76, 78 included in the OPuS 86 and the optical delay The ling mirror 90 and the optical element 'e appear, for example, in a scanner (not shown) that outputs a pulse of a laser beam of 100 pulses using a laser system 20. The laser system 2A also includes a shutter 96' including, for example, a shutter beam splitter 98, and a portion of the laser system 10 that outputs a laser light pulse beam 1 at the shutter 96. The pulse portion is used for the output energy monitor of the shutter 96 (Fig. Not shown). OPuS 86 As shown in Figure 1, the existing XLA ΜΟΡΑ configuration is further shown. The switch between the horizontal and vertical axes at several positions is set at several positions to make the indication simpler and easier to understand. Any of the ideas described above are not affected by the drawing of the horizontal and vertical axes of the light path. Referring to FIG. 2, there is shown a power amplifier amplification stage or a regenerative amplification configuration power amplification stage, for example, including a power ring amplification stage, in accordance with various aspects of an embodiment of the disclosed subject matter. Example 20, having a ring cavity power oscillator (also referred to as a ring cavity regenerative amplifier) formed between the beam reverser 70 and the low turning mirror 44, is implanted in accordance with various aspects of an embodiment of the disclosed subject matter. Seeding mechanism 160 is substituted. The cymbal as shown in Fig. 1 can also be moved or its function can be included in the shutter 96. In accordance with various aspects of an embodiment of the disclosed subject matter, including, for example, 46 1324423, a beam expander 142 including, for example, first and second beam expanders and dispersions 146, 148 is disposed in the entrance window and beam expansion Inside the frame housing 140, the housing 140 can be secured to the gain medium chamber 144 by suitable means, such as by welding or riveting using a suitable sealing mechanism. The optical elements 146, 148 may be disposed inside the annular cavity formed between the input/output coupling portion mirror 162 and the beam reverser 70 of the orthogonal 5 seed injection mechanism 160, for example, to reduce the formation of the beam reverser 70. The energy density of the largest mirror, as shown in Figures 20-22, may be made, for example, of CaF2, such as the OPuS type of spectroscope currently used by the Applicant's assignee and coated with a coating such as 20% of the incident light is reflected to form a portion 162 of the seed injection mechanism 160 of the 10 annular power amplification stage, which will be described in detail later. In the embodiment, the 稜鏡 can be non-dispersive, and the power amplification stage is configured to not self-oscillate, thus eliminating the need to reduce or remove the ASE from the system output. The beam reverser 70 can also be moved into the interior of the cavity gain medium chamber, which has an attachment fitting similar to the housing 15 of the housing 140. 15 Beam expander optics 146, 148 and beam returner/inverter 70' are protected by fluorine in the cavity 144 and housing 14A, 150 exposed to the laser medium due to its composition comprising a fluorine-containing crystal. Avoid light damage. The amplification stage window 168 is also composed of a fluorine-containing crystal such as CaF2, which does not require a protective coating on the surface exposed to the highest energy density, in part due to the expansion of the beam of light 20 in the cavity. Also facing the ring-shaped power oscillator oscillating cavity due to the orientation of about 45 degrees, such as 47 degrees. In accordance with various aspects of one embodiment of the disclosed subject matter, a ring-shaped power oscillator cavity as illustrated in FIG. 2 has a beam expander and an output combiner end of cavity 144 and has beam expander prisms 146, 148. Orientation to produce 47 net dispersion (which can be used for ASE reduction or elimination) has several significant advantages, such as extremely efficient use of seed energy, and protection from high power and very short nominal center wavelengths especially at 193 nm and below. Dispersing in the cavity, for example, to help reduce the ASE ratio, and an acceptable energy density of 5 degrees on the optical component', such as the output mirror coupler portion 162 forming the seed injection mechanism and the maximum mirror of the seed injection mechanism ("Rmax" The portion 164 may or may not be coated as desired, such as the manner in which the applicant's assignee's 〇puS performs on existing laser systems (beam splitters 76, 78 and mirror 90). In addition, the configuration can be used, for example, before the laser system outputs the laser beam of light to enter the OCuS 86, and the desired beam expansion function of 10 is required. The cavity is made, for example, of an XLA model cavity, for example by adding two "nasals" 140, 150 instead of the existing window mounting assembly. Figure 23 shows the details in detail. Further, all of the optical elements inside the cavity, for example including the nose 14〇, 15丨50, can be further removed by the cavity dust source. This configuration can be made, for example, inside an existing XLA optical component bay. As discussed herein, the annular cavity as shown in Figures 12 and 13 can also use a relatively long round trip time, such as about 7 milliseconds to traverse from the input/output facet beam splitter 262 to the beam reverser. 270, and returns to the beam splitter 262. In addition, of course, in particular in the broadband embodiment, and also in the line narrowing embodiment, in accordance with various aspects of an embodiment of the disclosed subject matter, a more typical l-3mJM0 output is used, greatly increasing the amplification stage. The average power output exceeds the average power output of, for example, the current XLA-XXX laser system. Low MO cavity pressure has the advantage of multiple laser cavity life extensions. Not in the present manner, purely for high power, for example in the 200 W range, 'according to various aspects of one of the disclosed embodiments, Applicants anticipate not focusing on the preferred energy stability of the current configuration, pointing to stability. Sex, profile stability and ASE stability, while operating at full repetition rates of, for example, 4 kHz 5 to 6 kHz or even higher. Referring now to FIG. 3, a toroidal power amplifier stage laser system 400 is shown in partial and block diagram form, and in addition to the elements of FIG. 2, system 4A can include, for example, a seeding coupler mechanism 160. The input/output window 94 is calibrated and has a beam expander dispersing optical element 17A, for example comprising 10 beam expander and dispersion prisms 172 and 174 that retract and manipulate and disperse the beam 64 to an optical path 74 into the cavity extension 150 The beam reverser 70 returns to the input/output coupler partial mirror 162. Baffles 190 and 192, respectively, protect the optical elements of rear nose 150 and front nose 140 from, for example, dust circulating within cavity 144. In Fig. 4, a similar system A10 can include, for example, a beam return/reverse 170 on the outside of the cavity 14A in conjunction with the modified nose 140, in accordance with various aspects of one embodiment of the disclosed subject matter. 150, for example, together with the baffles 190, 192, respectively protects the front input/output window 194 and the rear window 196 from circulating dust. This embodiment may include, for example, Brewster wedges 420 and 430 for example 20 to clean the desired polarization by removing undesired polarization out of the optical cavity. Figure 5 illustrates and in partial block diagram form a system 330 in which, for example, a ring power amplifier stage is to be erected, for example, using a polarization beam splitter 336, a half-wavelength plate 338, and an output coupler 340. In operation, the seed laser 1324423 334 feeds a sub-laser output laser light pulse beam 62 to the beam splitter 336'. The %-cavity is established by a single maximum back mirror 243, for example, and a partially reflective output coupler 340. Similarly, as shown in Fig. 6, an annular cavity can be disposed between the output coupler 410 and the rear mirror 412 according to various aspects of an embodiment of the disclosed subject matter. There are a number of possible ways to couple the output laser pulse beam pulses from the coupling to the power amplification stage' as illustrated in Figures 9-11 and 14 and partially illustrated in block diagram format. As shown in FIG. 9, the partially reflective input coupling oscillator 10 or the power regenerative amplifier 200 can have a cavity 202, such as a partially reflective optical component 204 as an input coupler for the oscillator cavity, having a front partial reflective optical component output. Light combiner 2〇6. In operation, the MO output 62 enters the cavity 200 (for clarity of description 'the cavity 200 is shown as a normal oscillator instead of a ring oscillator), and the reflective optics are reflected by the entrance portion of the reflective optical element 2〇4 and the output coupling 15 The cavity formed by element 206 oscillates internally until oscillation causes the laser system to output a significant pulse of light pulse beam 100 away from the output coupler, as will be appreciated by those skilled in the art. In Fig. 10, a schematic diagram is partially illustrated in the form of a block diagram. The polarization input combines the vibrating unit 220 to form a ring power amplification stage, including, for example, a cavity 2丨〇, a 20 polarization beam splitter 212, and a quarter wave plate 214. a rear maximum mirror 218 and an output coupler 210. For ease of operation, the maximum mirror 218 and output coupler 216 after the oscillator cavity are similar to those shown in Figure 2 as a conventional oscillator rather than a ring oscillator. A polarization beam splitter 212 and a quarter wave plate 214 are used to isolate the MO from the amplification stage. The input beam 62 has a polarity that is reflected into the cavity by the segment 50 1324423 light mirror 212 having, for example, a quarter wave plate 214 that transmits the beam 62 into the cavity as circularly polarized light and will return from the wheeled outfit 216 The beam is converted into polarized light transmitted by the polarization beam splitter 212. As shown in FIG. 11, the switching input/output consumulator light-collecting and sustaining device 230 5 is displayed in a schematic and partial block diagram format, wherein the cavity 232 can be contained, for example, in the cavity by the maximum mirror 240 and the window 238. Within the cavity formed, for example, a photoelectric switch such as Q switch 2 3 6 is provided as a switch to allow oscillation to accumulate to a selected point, and then the Q switch is actuated to allow the launch laser system to output a laser pulse beam 1 〇〇 pulse. 1 shows, as shown in a partial block diagram, a multi-pass regenerative ring oscillator laser system 250, for example, including an amplifier cavity 252 and a sub-lei, in accordance with various aspects of one embodiment of the disclosed subject matter. At 254, system 250 can also include an input/output consuming device such as injection seed input/output combiner mechanism 260. The input/output coupler 260 can include, for example, a partial mirror 15 262, which can be, for example, the type of beam splitter currently sold by the applicant's assignee's OPuS along with its laser device. System 250, for example, can also include a maximum reflective optical element 264 to manipulate M0 beam 62 into the electrode region of the cavity as a pass beam 276 that can be returned to output coupler 262 as a second from beam inverter/return 270 The beam inverter / 2 〇 returner 270 includes, for example, a first maximum mirror 272 and a second maximum mirror 274 by a beam 278. Figure 13 is a block diagram showing, in block diagram form, a multi-pass regenerative ring power amplifier stage laser system 280 in accordance with various aspects of an embodiment of the disclosed subject matter, in a bowtie configuration, which may include, for example, a cavity 282, a Seed ray 51 1324423 284, an injection seeding mechanism 260 and a beam inverter/return 270, the latter two, for example, can be assembled (angled) to perform, for example, individual longitudinal center axes of electrodes (not shown) And the intersection of the horizontal and middle axes intersects or approaches the intersection, to generate a gain medium by the gas discharge between the electrodes. Thus, it is usually at the intersection of the vertical axis and the horizontal axis of the 5 gain medium. In such an embodiment, the angle of the two passes can be almost imperceptibly small, so that in practice, the beams 286, 288 are nearly aligned with the longitudinal centerline of the discharge formed between the electrodes, wherein a beam of light, such as beam 288, can form a thunder. The light system of the system is 1 〇〇 optical axis. As shown in the drawings of the present invention and not shown to be proportional, the optical path example 10 shown in FIG. 13 such as 286 and 288 does not extend along the longitudinal center axis of the electrode, or may be displayed by a side view, where the longitudinal axis is not recognized. . In practice, however, a calibration will be slightly uncalibrated with its axis, while others are still substantially calibrated as long as such calibration is optically achievable and within the tolerances allowed by the laser system's light column. 15 Figure 15 is a block diagram format showing a plan view such as the embodiment 280 shown in Figure 13 where the MO output laser beam 26 is from above the power amplification stage 282 (in the direction of the vertical plane). ]^〇. Further, Fig. 16 is a side view schematically showing a side view of the apparatus 280 of Figs. 13 and 15 in a block diagram format. The steering mirror maximum mirror 430 diverts the MO laser output light pulse 2 〇 beam 62 to, for example, the seed injection mechanism 260 and the cross (collar shape) through 276, 278 to the rear mirror beam inverter/returner 270 (not shown in Figure 16) and seed injection mechanism 260 input/output coupler partial mirror 262 formed in oscillating resonant cavity 424' to form a laser system output light pulse beam 100 immersed through the use as an ordinary oscillator cavity output coupler Optical element 52 262' is well known in the art as a gas discharge laser oscillator chamber with an output coupler. As can be seen from FIGS. 15 and 16, the M0 output beam 62 is incident on the ring power amplifier stage oscillating chamber via the partial mirror 262, and also forms a cavity output coupler with respect to the axis direction of the system wheel 100, thereby preventing the system 5 The wheeled beam 100 is coupled back to the reverse coupling of the MO. Figure 17 and block diagram formatted portions show various aspects of an embodiment of an embodiment of the disclosed subject matter, a single back mirror cavity 31, such as an input/output having a multi-pass regenerative ring oscillator laser system A coupling system, which is in a bow tie configuration and has, for example, a single maximum reflected back cavity mirror. In operation 10, the M0 laser input/output coupler, for example, the orthogonal seed injection mechanism 160, can introduce the MO laser output light pulse beam 62 into a cavity formed by a single maximum mirror 310, for example, to form a A "half" bow tie configuration through the optical path 76 and a second pass optical path 78. Reference is now made to Fig. 8 'showing various aspects of an embodiment in accordance with one of the disclosed subject matter', the applicant being referred to as an OPu effect cavity 320, wherein, for example, a polarization beam splitter 322 and a maximum reflection back cavity mirror 324 may be combined with a quarter Wavelength plate 326 and output coupler 228 are used together. In accordance with various aspects of one embodiment of the disclosed subject matter, system 320 has an oscillator formed between rear mirror 324 and output coupling 20 328, for example, due to uncalibration due to the slight uncalibration of optical components 322 and 324. Multiple passes generated inside the cavity. In accordance with various aspects of an embodiment of the disclosed subject matter, the orthogonal seed injection mechanism can include an orthogonal implant seeding optical element, such as optical element 350, such as shown schematically in FIG. 18, which spans optical element 350 in cross-section. Longitudinal size. The optical element 350 can be made, for example, of CaF2, such as uncoated 53 raF2, and according to the various aspects of the fourth embodiment, including, for example, an external input/output interface 352, a total internal reflection surface 10 354' and, μ356. As is known to those skilled in the art of clinker, in operation, the MO laser wheel light pulse beam 62 can be incident and received by the external wheeling/wheeling interface 352, for example at an angle of incidence of about 70 degrees, and at the optical element 350. The internal refraction becomes the beam 62, and to the total internal reflection surface, the beam 62 can be totally internally reflected to the internal input/output interface as a t-beam 62", where the laser gas medium ring entering the cavity is again refracted. W does not appear in Fig. 18) 'for example, following the first-light path % shot; after passing through the gain medium again, for example, after reflection from the beam reverser (not shown in the first off), 're-personal (four) interface 356 and turn It is said that (4) is a light beam 78, which is refracted into the light beam 78 inside the optical element 350, and is sent out of the optical element 35, and becomes a laser system output light pulse 15 through the external input/rounding interface 352. In various aspects of one embodiment of the disclosure, the beams 76, 78 together with the beam inverter (not shown in the first possible crossover as shown in Figure 13 are not shown in Figure 12. The ray beam 78 is also partially reflected) Light on the total internal reflection surface 354 The beam 78" (62,); the partial reflection portion will again become the beam 62" and the beam 76, so the optical element 35 is used as the input (four) combiner until sufficient oscillation occurs, so that the analog emission constitutes the output light of the substantial laser system. Pulsed beam 1 〇〇. According to various aspects of the disclosed subject matter, FIG. 19 schematically shows a version of a seed-injecting optical element 36〇 in a cross-sectional view across a longitudinal axis including, for example, an external input/output. Interface 362, a total internal reflection surface 364 and an internal input/output interface 366. In operation, the beam 62 from M〇54 10 can be incident on the external input/output interface as above - internally refracted into beam 62' to full The inner reflection surface (10) is reversed from the beam 62" to the _transmission boundary (four), where it is frequency (four), and is refracted into the beam % in the gas of the laser medium environment. The beam % is from the beam inverter (not shown) After thinning, the beam is finely refracted into a beam 78 by the wire element, and transmitted through the external input/output interface 362 to become an optical element. The skilled artisan must also understand that the image is also used in FIG. Example", beam 78 It can also be partially reflected onto the total internal reflection surface 364 to become the beam 78 (62), and the partial reflection portion will become the beam 62" and the beam % again, so the optical element 360 acts as an output coupler until sufficient oscillation occurs, allowing the analog emission. Forming a substantial laser system output light pulse beam 1 15 15 20 In accordance with various aspects of one embodiment of the disclosed subject matter, a plurality of beam returners/inverters 370 can be utilized, as shown schematically in Figures 20-22 The optical element 370 of FIG. 2 can be combined, for example, with an input/output surface 372, a first total internal reflection surface 374, a second total internal reflection surface 3V6, and a third total internal reflection surface 378'. The beam % of the transition gain medium in the first direction can be incident on the surface 372, reflected by the faces 374, 376, and 378, leaving the optical element 370 on the input/output face 372 as the beam 78, and passing through the gain medium in the second direction. A similar beam invertor 380 is shown in cross-section in Figures 21 and 22, with only two total internal reflection surfaces 384, 386 and 394, 396 in optical elements 380 and 390, respectively. Those skilled in the art of optical components understand that with three internal reflections, or three mirror configurations, such as the beam invertor of the XLA model laser system currently used by the applicant's assignee, the input beam 76 and the output beam 78 will The active calibration 55 is parallel, and the relationship does not change as the optical component, such as optical component 370, rotates about the axis of the vertical 20th page. For the inverters 380, 390 of Figures 21 and 22, even internal reflections, such as two internal reflections, will allow the beams 76, 78 to have a variable degree relationship on the paper surfaces of Figures 21 and 22. . Those skilled in the art of optical components understand that the combination of the seed injectors described herein in the beam inverter/returner can be used to intersect the beams 76, 78 on the optical path, as shown in Figures 2, 3, 4 and 13. Or no, for example, Figure 12. In addition, manipulation of such optical components will allow for excitation of the gain medium between the energizing electrodes, relative to the amplitude of the laser gain medium, such as along the longitudinal and/or vertical axes of the laser gas gain medium, such as 76, 78. The intersection is a bit. It can be used to change various parameters of the laser pulse pulse output from the final laser system, such as energy and energy stability. Referring now to Figure 23, the various versions of the nose M0' are shown schematically in Figures 2, 3, and 4. The nose M0 can include, for example, a window housing 55 that can include an outer mounting plate 552 and the housing wall 554 can be cut or otherwise secured to the housing mounting plate 552 while also displaying a window. Mounting plate 556. The window housing 550 is schematically illustrated in accordance with various aspects of an embodiment of the disclosed subject matter, the window housing 550 being similar to the window housing of the laser system currently used by the applicant's assignee, having a window housing end The plate (not shown in this view for clarity) is similar to the laser end plate 570 shown at the laser end of the nose 140, for example, in Figure 23. A window mounting laser end plate not shown may be located at the window mounting plate 556. Similarly, the nose portion 140 can have a window end plate similar to the end plate 552 (not shown in this figure for clarity) to secure the window housing 550 to the remaining portion 1324423 of the nose H0. The laser cavity end mounting plate 568 can be attached to the laser cavity of FIG. 2 by mounting bolts 574, such as the laser cavity 144' and has an aperture 572 through which the beam 76 is incident, for example, within the cavity 144. The beam 78 is returned from the cavity 144 through the aperture 572. 5 is partially shown in block diagram form, and the beam expander 142 includes, for example, a beam expander 146 and a beam expander 148, and the beam expander 142 can be inside the nose 140, as shown in FIG. The cut view is shown. At least one of 稜鏡 146, 148 can be mounted on a seat (not shown) for movement relative to each other. Such movement may be controlled, for example, by the controller 600, such as by the actuator 10, such as the laser positioning optical positioning control technique cited in one or more of the above-cited patents or co-examined applications. Controlled by a stepper motor or other suitable actuator known in the art, the actuator 580 is coupled to an individual at least one of, for example, a crucible 148 by an actuator shaft 582, for example, for rotation on the axis of the shaft 582. , 俾 change 稜鏡 148 relative to rib 15 mirror 142, also relative to other optical components such as orthogonal seed injection mechanisms (not shown in Figure 23) and/or beam return/reverse (not shown in Figure 23) Relative position of ). The beam return/reverse 270 and/or the seed input/output coupling optical element 260 20 can control the beam return/reverse device by the controller 600 as shown schematically in block diagrams in Figures 13 and 15. The actuator 594 and the input/output optical elements, such as the operation of the orthogonal seed injection mechanism 260, are controlled, and the actuators 590, 594 are coupled to the controller 600 by control signal lines 592 and 596, respectively. An annular cavity, for example, having an output coupler seed laser coupling, such as a

57 1324423 Sub-injection mechanisms, perhaps with more complex configurations' to make the most efficient use of seed laser energy. In accordance with various aspects of an embodiment of the disclosed subject matter, for seed laser input/output coupling, a range of maximum mirrors may be utilized, such as 5 from a square wave 45 degrees Rmax to about a square wave 30 degrees Rmax' As used by the applicant's assignee, ArF 193 nm LNM. The reflection coefficient of P polarization is only about 85% at 45 degrees. In accordance with various aspects of one embodiment of the disclosed subject matter, such as due to ASE, it may be desirable to screen for s-polarization, through Brewster reflection, and by inserting a 1 〇 partial mirror into the power amplification stage to achieve this. The time between the seed laser energy, the ArF cavity gas mixture, the percentage of the reflection coefficient of the output coupler (cavity Q), and the duration of the seed laser pulse has been tested to verify the timing of the energy relative to the amplification stage. Give instructions. The maximum intensity of the seed pulse occurs during the initial very low level of the amplification stage. Such extremely low level fluorescence (and thus very low level gain), such as the observation of the ΜΟΡΟ output, is believed to be enhanced by the seed light. Adjusting the seed timing earlier or later, e.g., about 20 nanoseconds before the emission stage, for example, will increase the output of the weak line output, for example, indicating that the amplification stage produces a "base" photon. 2) The difference between the reflection coefficient of the seed laser energy, the ArF cavity gas mixture, the output coupler (cavity Q) and the duration of the seed laser pulse is used to verify the timing of the ASE relative to the ΜΟΡΟ, and the result is the seventh. The figure shows. The relationship between positive energy and seed energy has also been examined. Results such as examples

58 6 is shown in Figures 24 and 25. The measured values are measured at the optimum timing of the discharge in the laser medium considered to be MO, and the optimum timing of the discharge in the laser medium in the ring power amplifier stage. In Fig. 24, the curve 6ι〇 represents the positive moonrise value, the curve 612 represents the reverse energy value, and the square data point represents the operation of the 5 P90+P7G filter, and the partial mirror is inserted and then calibrated again. Figure 25 shows. The design of ASE and MOPQ is great (4). Time material # may cause ASE to increase to include only ASE. At this time, the time of M〇 and power amplification stage is staggered. Generally, only the broadband (ASE) laser appears in the power amplification stage, and the electrode in the power amplification stage. The vibrator will emit a laser when a discharge occurs. Unlike the power amplification 11, such as in the applicant's assignee's XLA-ΧΧΧ laser system, in the system according to the various aspects of the disclosed embodiment, depending on the optical configuration, the seed beam By amplifying the fixed number of times, an amplified spontaneous emission (ASE) laser occurs regardless of the presence or absence of a seed laser pulse for amplification. Backscattering from the optical components of the amplifier cavity can form a parasitic laser cavity. A number of amplifier cavity optics can form an unintended laser cavity between the amplifier and M〇. Thus, in accordance with various aspects of one embodiment of the disclosed subject matter, prudent control timing is used to maintain ASE below a limit&apos; reduction or to effectively eliminate undesired lasers. 20 Medium and small seed input can be used for ASE measurements. For example, for medium seed input energy, for example, a seed input energy of about 50, a discharge voltage Vco of about 950 volts, and an amplification stage gas fill of 38/38 〇 fluorine partial pressure/total pressure, showing about -10 nanoseconds to +10. The relative timing of nanoseconds, the ASE ratio is preferably lower than 3χ10·5. Using a low seed energy, such as a seed energy of about 5 W, and a voltage and 59 1324423 fill the same, then at a relative timing of about -10 nanoseconds to +10 nanoseconds, the ase ratio is maintained below about 6 x 1 〇 -4 . Maintaining proper ASE performance requires the selection of appropriate amplifier cavity optics with appropriate selectivity to remove undesired polarization (eg, with a suitable coating 5 or angle of incidence, etc.), which can result in better suppression of undesired polarization, resulting in, for example, from S The polarization of the ASE is reduced. For example, the use of a beam expander and a dispersion prism to form a dispersion in the amplifier cavity, in accordance with various aspects of an embodiment of the disclosed subject matter, has also been determined by the Applicant as an effective method to further reduce the aSE ratio to facilitate selection of the pair. The ASE specification is effective enough for the margin. In accordance with various aspects of one embodiment of the disclosed subject matter, a method is shown to reduce ASE in a loop amplifier, such as to take advantage of other features of such architectures such as low seed energy, high efficiency, energy stability, and the like. The applicant suggests that the introduction of a number of broadband frequencies, at least farther than the back-propagating line of the main light-directed direction, narrows the seed radiation farther to increase the ASE in this direction, reducing the ase in the primary direction by 15 . In other words, the wideband gain will be used to reverse the loop, to reduce the gain available to the main ASE. This item can for example be achieved by a number of scattering of the seed laser beam from the optical element, for example by feeding the fluorescence of the seed laser into the ring power amplification stage. Thereby wideband transmission, e.g., depletion of the gain available to the ASE, and wideband transmission will propagate in the reverse direction of the dominant direction to reduce the mainband wideband transmission. In accordance with various aspects of one embodiment of the disclosed subject matter, it is to be understood that the solid state pulsed power sold by the laser system of one or more of the aforementioned patents or patent applications, or the assignee of the applicant Systems, such as magnetic switching systems, have poles between the individual MO chambers and the electrodes in the amplified gain medium cavity

60 1324423 is a closely controlled discharge emission timing, together with the nature of the ring power amplification stage configured in MOPRO (eg, full saturation or very close to full saturation operation of the loop power amplification stage) 'allows XLA with, for example, the assignee of the applicant The dose stability that can be achieved by the laser system at present is about two times the dose of the stable five-point laser system output light pulse beam pulse transmission to the lithography tool or LTPS tool. Figure 26 is a schematic and block diagram showing an energy/dose control system 62A in accordance with various aspects of an embodiment of the disclosed subject matter. As exemplified in block diagram form, the energy/dose controller 620 includes a solid state pulsed 10 power system (SSPPM) 624' such as the aforementioned magnetically switched pulsed power system, such as the current assignee of the applicant. The firing system, such as the XLA® configuration laser system, is controlled by the timing and energy control module 622 as discussed in one or more of the aforementioned patents or applications. This timing and energy control module combination SSppM 15 624 can achieve extremely precise pulse-to-pulse energy control of the river raft; and achieve the first pair of electrodes (not shown) and the second pair of electrodes in the MO 24, for example The extremely precise control of the relative timing of the discharge emissions between the electrodes 424 in the amplification stage 144 shown in FIG. 16 and FIG. 16 is, for example, controlled within a few nanoseconds. As discussed in one or more of the aforementioned patents and the applications under review, such a 20 allows selection of a portion of the output laser beam pulse from the Μ◦ to induce seeding of the amplification gain medium, such as controlling the bandwidth, while It also affects the pulse parameters of the output laser pulse beam of the total laser system. Combining the ring power oscillator in such a saturation or near saturation operation, for example, about 5 丨〇 % saturation or near saturation operation, allows the system to pass a lithography laser as claimed by the Applicant's assignee 2XLA Ray 61 1324423 system A light source or a laser annealing source such as a laser source for LT PS has about twice the dose stability of the currently available dose stability. Referring to Fig. 31, beam mixer/flipper 1050 is shown to operate on a beam 5 1052 (shown as upper half white and lower half black for illustrative purposes). As will be described in more detail later, beam mixer 1050 can be used to alter the intensity profile of the beam, such as improving the intensity symmetry of a selected axis along one of the beams, and can be used to reduce beam coherence or both. For the illustrated embodiment, beam mixer 1050 includes a beam splitter 1054 and mirrors 16a-c-c. 10 As for the configuration shown in Fig. 31, the light beam 1052 is initially incident on the beam splitter 1054. At this time, part of the light beam is guided by the reflection toward the mirror 1056a, and the remaining light beams (for example, the direction is substantially constant) are transmitted through the beam splitter 1054. Beam mixer 1050 exits output light path 1070. In one configuration, a beam splitter 1054 can be used that reflects about 40% to 60%, such as 50% of incident light, for such a 15 configuration, with about 50% of the initial beam incident on the beam splitter 1054 being directed toward the mirror 1056a. As with beam mixer 1050, mirrors 1056a-c are typically planar maximum mirrors. As shown in Fig. 31, mirror 1056a can be positioned and oriented to receive light from beam splitter 1054 at an angle of incidence of about 30 degrees. As further shown, mirror 1056b can be positioned and oriented to receive light reflected 20 from mirror 1056a at an angle of incidence of about 30 degrees; and mirror 1056c can be positioned and oriented to receive light reflected from mirror 1056b at an angle of incidence of about 30 degrees. Continuing with reference to Fig. 31, the light reflected by the mirror 1056c is incident on the beam splitter 1054 at an angle of about 45 degrees. For a 50% reflectance spectroscope, about half of the light from the mirror 1056c is reflected onto the output beam path, and about half of the light from the 62 1324423 mirror 1056c passes through the beam splitter 1054 on the optical path toward the mirror 1056a, such as. The figure shows. Thus, the output optical path 1070 includes a combined beam of light comprising a portion of the initial beam 1052 passing through the beam splitter 1054 and a portion of the light from the mirror 1056c reflected by the beam splitter 1054. Similarly, the light on the optical path from the beam splitter 1054 to the mirror 104a 5 includes a partial beam 1052 reflected by the beam splitter 1054 and a combined beam of light from the mirror 1056c that is transmitted through the beam splitter 1054. The beam of incident beam mixer 1050 in Fig. 31 is shown with a rectangular cross section defining a major axis 1058. This type of beam is typically a laser beam produced by a quasi-molecular laser having a long axis corresponding to the direction from one discharge electrode to the other. A typical beam size is approximately 3 mm x 12 mm. Moreover, the output of the aligned molecular laser is typically asymmetrical on the intensity side of one axis, such as the major axis 1058, while the intensity of the other axis, such as the minor axis (ie, the orthogonal axis of the long axis 1058), is approximately For Gauss. Although the illustrated light 15 beam mixer 1〇50 is particularly suitable for improving the symmetry of high power excimer discharge lasers, it is understood that it can be used in combination with other types of laser systems for other purposes, such as beam mixers. Can be used to reduce the coherence of a beam produced by a solid state laser. Figure 31 shows a beam extending along the axis 1 〇 58 of the first edge 1060 to the second edge 1 〇 62. Figure 31 also shows that the mirrors 1056a-c establish a spatially inverted optical path with a starting point 1 〇 64 and an ending point 1066. As shown in Fig. 31, the inverting optical path is characterized by a partial beam of the first beam edge 1〇6〇 approaching the start of the inversion optical path 1064 being translated to the second beam edge of the end point 1066 of the inverting beam. Specifically, for the illustrated beam mixer 1050, the photon level 63 1324423 of the beam "tip" of the impact mirror l〇56a is shifted, leaving the beam "bottom end" at the mirror 1056c. Since the anti-phase optical path constitutes a delayed optical path, occasionally there is a time extension of the optical beam, which may be advantageous, particularly embodiments of the coherent destruction mechanism between the main oscillator/seed laser and the amplified gain medium such as the toroidal power amplification stage. The pulse extension between the seed laser and the amplification gain medium can slightly extend the pulse out of the amplification gain medium. As described therein, it is also possible to minimize the light time or the like by minimizing the delay optical path, for example, to a length of about 1 nanosecond, and the beam mixer 1〇5〇 can form a coherence-damaging mini-OPuS, as described. Discussed in Figure 48. The beam mixer 1050 can be placed between the laser beam of the seed beam of the ΜΟΡΑ or ]VIOPRA (for example, with a ring power amplification of 10 stages) and the laser portion of the amplifier, and is equipped with a multi-cavity laser system, such as Figures 1-6 and IX. Figure 16 shows. Other forms of passive coherence destruction, for example, can be used between MO and PA, and are discussed in U.S. Patent Application Serial No. 11/447,380, the entire disclosure of which is incorporated herein by reference. Method, application date June 5, 2006, agent file number 2006-0039-01; and application No. 1 / 881, 533, name "method and device for reducing gas discharge laser output light coherence "Applicant 6 June 29, 2004, the date of the announcement is December 29, 2005, Announcement No. 20050286599; and the application number __, the name "Laser System" 'Attorney Building No. 2005-0103 -02, as explained above, apply on the same day as this case 20. As shown in Fig. 31, the deeper and shallower incident beam portions may be separate beams from spatially separated split sources; the beam mixer 1〇5〇 may additionally or alternatively act as a single beam coherence. Destroyer. Several possible embodiments for understanding the extended 64 f optical path including beam combiner, coherence disruption 5|, and 戍 are exemplified in the present invention, but the available optical delay paths are not listed, for example, with an imaging mirror. The delayed optical path and the delayed optical path without the imaging mirror or the delayed light with a mixture of the two can perform beam delay, inversion and/or mixing functions, but at least the beam pulse (including the sub-pulse) is relative to the main pulse and other Sub-pulse and flip/mix (or both). It will be appreciated by those skilled in the art that, as disclosed in the present application, applicants can satisfy the needs of customers from scanner manufacturers and semiconductor manufacturer end users in accordance with the various aspects of the disclosed embodiments. The demand for a light source supplier such as an ArF light source is even better than the conventionally expected improvement in force rate and bandwidth. For example, further improvements are required because, for example, ArF is used today for high-volume production, such as for the production of cost-sensitive products. 'The industry expects operating costs and the cost of ArF's consumables must be reduced as well' as when KrF technology matures. In the past, the requirements for the KrF laser were the same. In addition, the sensitivity of the subject revealed by this case, such as the critical dimension change, has become larger as the low K1 lithography technique progresses, and the energy stability improvement can be satisfied by the gist of the present disclosure. The double exposure concept also has to be compromised between burden and dose control. Optical unobstructed lithography requires that a single pulse exposure control&apos; be modified by aspects of the embodiments disclosed herein. 20 With regard to the improvement of energy stability, the Xima XLA source can achieve significant improvements in energy stability by exploiting the saturation effects of the PA configured in the ΜΟΡΑ configuration, such as two-pass pA amplification. The slope of Eout of XLA relative to Ein is about 1/3. When passing this PA, the M0 energy instability is reduced by a factor of 3X. But even if the PA is modified by 3X, the energy stability of the helium system is still greatly affected by the energy instability of 65 1324423 to, for example, MO. The MO contribution is approximately equal to the contribution of pa. Other contributions such as voltage regulation, timing jitter, and MO pointing jitter are relatively small contributing factors, but are still not meaningless. The pA energy stability performance falls within a certain bit between the typical wideband oscillator and the fully saturated amplifier.

In accordance with various aspects of one embodiment of the disclosed subject matter, a cyclic loop configuration, such as a power ring amplification stage, operates in a much stronger saturation region. For a seed laser/amplification gain medium system such as a loop power amplifier stage, the slope of Emit relative to Ein is measured by the applicant's employer as 10 0.059. For example, when passing through a circulating ring oscillator, such as a power ring amplification stage, the MO energy instability can be reduced by a factor of 17. With a cyclic ring configuration, the energy stability of the amplifier stage will have the special risk of a fully saturated amplifier. Shen Qingren expects at least an improvement of energy stability of about 1 · 5-2 Χ. +σΡΑ +σ^ + + σ 2 ΜΟ indicator 1!) Skilled artisans should be aware of the various aspects of the embodiment according to the main body of the subject matter. The wire element can be used to form two or more overlapping bow-tie loops or a racetrack-shaped loop. Such an amplifier medium, such as a regenerative or cyclic toroidal power amplifier stage, may be a stationary oscillator, such as a semi-planar or unstable receptacle. The beam return 117 light can be used in the cavity or combination thereof in the evening or on the side of the mirror or the combination of ridges, or a combination thereof, for example, depending on the exposure of one or two optical elements to a certain optical density level. Undesired light, for example, most of the fineness can be multi-faceted, and the case is formed in the reverse direction amplification stage of the regenerative optical path of the laser beam that is vibrated by the 66 20 1324423 sub-beam. The shape of the garment is such that the beam expands, for example, in the direction of the straight end of the Brewster angle window, and can also be used to protect the ring-shaped power vibrator cavity element and to disperse the ASE. The "means" portion of the seed injection mechanism is, for example, for the desired (same frequency band) frequency (or polarization or both of the reflection coefficients of about 20 〇 / 。. The beam expansion can also be performed using multiple prisms - or more The mirror may be located inside and/or outside the cavity surrounding body. When 10 or more are inside the cavity surrounding body and exposed to the gas containing ray embossing, at least one 稜鏡 may also be outside the cavity匕15 Referring now to Figure 7, there is shown a chart of the timing and control deduction rules for various aspects of the embodiment according to the disclosed subject matter. The chart provides the laser system output as a discharge and amplification stage in the seed laser cavity. For example, the function of the timing of the difference of the ring power amplification stage is plotted as a curve _. Here, for convenience, it is called the outline (10). It is understood that a number of configuration towels are not strictly referred to as PO, but instead are called PA, but There is oscillation, this point is opposite to the number of times fixed by the gain medium. The latter appears in the applicant's assignee. Traditionally, it is called a power amplifier, that is, the cracker of the m〇paxlaxxx 20 of the assignee of the applicant. PA in the shooting system For example, due to the relationship between the length of the ring optical path and the integer multiple of the wavelength of the name, a representative curve of the ASE generated by the amplification stage of the laser system as a function of the fine 0P0 is also exemplified as the curve 6〇2. , face lightning (four), recording (four) change is a function of dtM〇p〇. It also shows the selected limit for ASE, which is a curve of 6〇6. It should be understood that the curve 67 (S) can be selected near the minimum or minimum extreme. The operating point 'operating at this point' determines the operating point of the system on curve 606, for example, via the control selection of the dither display dtMOPO. It is known that there is considerable margin to operate near the ASE minimum extreme of curve 602 while maintaining the output pulse energy. At the top of the relative plane of the energy curve, for example, to maintain the output energy of the laser system and the energy α and the associated dose and dose σ constant within acceptable tolerances. In addition, as shown, dtM〇p〇 can be used simultaneously. The bandwidth is selected from a range of bandwidths without interfering with the aforementioned E control. Regardless of the nature of the seed laser used, ie solid-state seed laser systems or gas discharge seeds This system can be achieved with a launch system, but with a solid-state seed laser, a number of techniques can be used to select (control) the bandwidth of the seed laser, for example by controlling the degree of solid-state seed laser delivery. The power supply control, for example, allows the power to be delivered above the laser threshold, and selects the bandwidth. The choice of such bandwidth can shift or change the correlation value of curve 604, but the laser system is still suitable for the aforementioned E type and 0 evaluation type control, use 15 dtMOPO to select bw and select the operating point at the same time, to maintain the pulse output of the laser system can be stable and more or / constant value in the top region of the energy curve 6 〇 0 plane. A non-cw solid-state seed laser is used and the output bandwidth can be adjusted. For example, the output coupler reflectivity of the main oscillator cavity (cavity-Q) can be adjusted to adjust the output bandwidth of the seed laser system. The pulse of the seed laser pulse can also be used to control the total wheel width of the laser system. It can be seen from Fig. 7 that the selected ASE upper limit or energy curve maintains a relative plane with the dtMOPO. The partial width may limit the slope and position of the bandwidth width mv curve that can be used for selection. It also affects the available operating point of the ASE curve to maintain a constant The energy output and minimum ASE are also selected from the available bandwidth range by selecting the 68 1324423 dtMOPO manipulated value. It is also known that the pulse time of the discharge pulse in a gas discharge seed laser, such as the pre-wave control, can be used to select the nominal bandwidth from the seed laser, which also affects the slope and/or position of the BW curve 604, as shown in FIG. . 5 Referring to Figure 28, the laser system controller 620 is shown in schematic and block diagram form in accordance with various aspects of the disclosed embodiments. The controller 620 includes a portion of the laser system that can be formed, for example, including a sub-laser 622' such as a gas discharge laser of the type known as XeCl, XeF, KrF, ArF, or F2, as disclosed in the art, in conjunction with a line narrowing module (eg, It is known in the art) to select a special center wavelength ' while narrowing the bandwidth to the extent discussed above in this case. The seed laser 622 can generate a seed laser output beam 626 that passes through the beam splitter 630' to a small portion of the output beam 626 to the metrology unit metrology module 632' which includes an MO energy detector and a wave meter such as a measurement center wavelength and frequency. width. The output beam 626 is then diverted to a sub-injection mechanism 636 by a maximum mirror 634 (for the nominal center wavelength). The seed injection mechanism can comprise, for example, a portion of reflective optical element 638 and a maximum reflective optical element 640, as discussed herein, as two separate elements or a single optical element. As discussed herein, the seed implantation mechanism can implant the seed laser output pulse beam 626 along the injection 20 optical path 652 into an amplification gain medium such as the toroidal power amplification stage 650. Beam splitter 654 can divert a small portion of output beam 658 into a metrology unit 656 that can measure, for example, output energy and bandwidth. A metrology unit 642 is directly coupled to the amplification gain medium laser 650, such as the ASE of the laser chamber 650. The controller 660 can include a processor 660 that receives inputs from the 69th stalk scale units 632, 642, and 656 and other, if appropriate, and utilizes the inputs as the aforementioned patents and common Patent application under review. Part of the control deductive rule described in one or more of the monthly cases, and also in conjunction with the aforementioned control deductive rule, regarding the minimum value of the ASE curve or its vicinity 5 operations while maintaining constant energy, also selected by the selected ASE limit The bandwidth added to the limits. In addition, as shown in one or more of the patents cited above and the co-pending patent application, the controller 660 also controls the timing of the formation of the seed laser output pulses, and the amplification gain medium (abbreviated as dtM〇p).形成) the formation of an output pulse, which also provides a control signal to the line 10 narrowing module's control method, for example, by one or more of the patent applications discussed in the foregoing and in the patents and co-examination cited above. Previous guided wave manipulation and optical surface manipulation were achieved. Turning now to Figure 29, a laser system 680 similar to the laser system 620 of Figure 28 is shown in block diagram form, but the seed laser 682 is, for example, a solid seed laser having a phase 15 frequency converter 684, for example The output wavelength of the seed laser 682 is modified to amplify the wavelength at which the gain medium level 650 is suitable for amplification. In addition, as discussed above, controller 66 can provide input to seed laser 682 to control the timing and bandwidth of seed laser pulses, for example, by modifying pump power. In accordance with various aspects of an embodiment of the disclosed subject matter, it is desirable to select an edge optical element that is an optical element that must be applied to the edge and possibly applied to the edge, and thus is difficult. Such an optical component may be required to be formed between the output coupler shown in FIG. 2 such as 162 and the maximum reflector shown in FIG. 2, such as 164, for example, depending on the separation of the two, together with the shape 70 1324423 into the second figure. One version of the seed injection mechanism 160 is shown because the space may be too small to avoid the use of an edge optic. If so, the edge optics must be selected to be Rmax because of the ray path of light as it passes through the 〇c portion 162. From the viewpoint of coating, OC is preferred as the edge optical 5 element because the number of layers of OC is small. However, in accordance with various aspects of one embodiment of the disclosed subject matter, another design is selected as selected by the applicant and schematically illustrated in FIG. 30, for example, where edge optics can be avoided, such as in FIG. It is shown that the 'boring beam expander 142, for example, 稜鏡146, 148, is formed to provide a large enough space for the output and input ring power amplifier stage beams to be large enough to avoid the use of edge optics. For example, a determination of two beam spacings of about 5 mm is satisfactory to avoid the use of any edge optics. As illustrated in Figure 30, the laser system, such as the system illustrated in Figure 2, can produce a laser output pulse beam 1 〇〇. For example, a ring power amplifier stage 144 can be used to generate a laser output pulse beam. That is, the cymbal 15 is larger than the output beam 62 of the main oscillator 22 in the ring power amplifier 144. In accordance with various aspects of an embodiment of the disclosed subject matter, the beam expander/disperser 142 showing details thereof can include a first expansion/dispersion 稜鏡i46a and a second expansion/dispersion 146b and A third 稜鏡148. The seed injection mechanism 160 can include a portion of the reflective input/output coupler 2 162 and a maximum reflectance (Rmax) mirror 164, which are illustrated schematically in a plan view in FIG. 3, such as a reference seed injection mechanism and beam expansion/dispersion. 160, and a ring power amplifier stage (not shown), the beams 74 and 72 are respectively incident and outgoing from the cavity, in other words, the main oscillator cavity 22 output beam 64 travel axis perspective 'in the embodiment is illustrated as Above the cavity 144 (as shown

71 1324423 shows that the 'beam 62 has been folded back into a substantially horizontal vertical axis.) As described herein, the beam has also been expanded at its short axis by MOPuS, so that the cross-sectional shape is generally square. The configuration of the beam spread 稜鏡 146a, 5 146b 148 on the inside of the loop power amplifier stage can be set to the power amplifier ("PA") level output in the applicant's XLA_XXX model laser system. A similar configuration of beam expansion, for example with a 4X expansion, is provided, for example, by a 68.6 degree incidence and a 28.1 degree exit, such as two turns disposed on the same turn or having the same angle of incidence and exit angle. This can be used to balance and minimize the total cost of Fresnd 10 losses. Reflective coatings such as anti-reflective coatings can be avoided on these surfaces because they will encounter the highest energy density in the system. In accordance with various aspects of an embodiment of the disclosed subject matter, the beam expander/disperser 16 can be split as a first turn 146 into two turns 146a and 146b, such as a 33 mm beam expander. 'As shown in Fig. 30, the prism can be positioned to be positioned at 15 with a similar angle. The splitter has several advantages, such as lower cost, and it is better to calibrate and/or manipulate the beams 72, 74 ( Combined with the beam inverter (not shown in Figure 30) and the system output beam 1〇〇.

The main oscillator seed beam 62 can enter the seed injection mechanism 160 (as an input/output coupler) via the beam splitter partially reflective optical element 162 to 20 Rmax 164 as a beam 62a where it is reflected as a beam 74a to the first beam. The frame 稜鏡 146a' is used to release the beam about 1/2 x on the horizontal axis (as shown in Fig. 30, maintaining a longitudinal axis of about 10 mm on the paper). The beam 74b is then directed to the second beam expansion 稜鏡 146b, for example, the 40 mm beam expansion 稜鏡' is again de-amplified by up to about 1/2 X, so the total de-amplification is about 1/4 X 72 1324423 to form A beam 74 of the gain medium that enters the manhole (face (four)_graph). The beam is reversed by a beam reverstor, for example, by a beam invertor currently used by the XLA-XXX model laser system of the assignee of the applicant, which is 72_ to 稜鏡148, for example, the gain and the gain. The media is presented in a 5 knot loop configuration, or roughly parallel advancement, perhaps overlapping the racetrack configuration version to some extent. From 稜鏡 148, beam 72 is expanded by &amp; beam 72b is directed to 稜鏡 142b, further expanding &amp; The beam 72a is partially reflected back as part of the transmission of the beam 62a as an output beam 100, and the energy is progressively incremented to obtain a rounded beam pulse of sufficient energy via the laser oscillation of the ring power amplifier stage 1〇. The narrowing of the beam into the amplification gain medium, such as the ring power amplifier stage, results in several excellent results, such as limiting the horizontal width of the beam to the discharge width between the two electrodes in the gain medium, for the bow-tie configuration, the displacement angle between the two beams is too small, roughly The discharge width is maintained at a few millimeters, even if the horizontal width is about 23 mm, respectively; and for the racetrack configuration, the beam 72 or the beam 74 passes through the gain medium only when it is back and forth, or the beam can be further narrowed. The discharge or discharge is broadened such that a beam 72, 74 passes through the discharge gain medium as it travels back and forth between the seed beams 72, 74. The positioning and calibration 20 of 146a, 146b, and 148, particularly 146 and 146b, can be used to ensure proper alignment of output beam 100 from the ring power amplification stage to the laser output optical train towards the shutter. The beam size leaving the input/output coupler 162 can be fixed, e.g., the horizontal dimension is fixed by the horizontal size selection aperture 130 to form a partial system aperture (on the horizontal axis) of about 10.5 mm. Another aperture, such as roughly the location of the PA WEB, for example, the Applicant's position on the XLA-XXX laser system can determine the longitudinal dimension of the beam. In accordance with various aspects of one embodiment of the disclosed subject matter, the Applicant suggests that a system limiting orifice is disposed just behind the main system output 〇PuS, such as 4X OPuS. A ring power amplifier stage aperture can be further positioned about 500 mm inside the laser system. This distance is too large to prevent a change in the position of the pointing change from the specified measurement plane (the system orifice). Instead, the system orifice can be positioned just behind the OPuS with a 193 nm reflective dielectric coating instead of the commonly used stainless steel plate. This design allows for easier optical alignment while reducing orifice heating. 10 In accordance with various aspects of one embodiment of the disclosed subject matter, the Applicant suggests a relatively unstressed chamber window configuration similar or identical to the U.S. patent application in the co-examination discussed above, due to the use of, for example, a PCCF coating window. . In accordance with various aspects of one embodiment of the disclosed subject matter, the Applicant recites an example such as placing an ASE test, such as a backpropagation ASE test, in a LAM or a M0 pre-wave engineering box ("WEB"), for example, including Applicant's assignee's existing M0WEB component of the XLA-XXX model laser system, along with the mini OPUS discussed herein, and, for example, beam expansion, for example using one or more beam expansion prisms to dim the M0 output beam to the short axis The web, for example, forms a cross-section beam that is approximately square in shape. The current MO WEB and its beam steering function are schematically shown in Fig. 2 as a turning mirror, for example 44. However, it is preferable to place the backward propagation detector "inside" MO WEB/MOPuS, in other words, by using a folding mirror (folding #2), for example, FIG. 2 has a reflection coefficient of R=95% instead of R=100%. The shallow leak is monitored through this mirror 44. Some of the transitions that can tolerate this reading 74 f: S ) 1324423 are inaccurate, for example because they are available as travel sensors (for example, when the condition is acceptable, there is substantially no reverse ASE, the measured value is approximately 〇 〇〇lmJ and when there is a reverse ASE when it is unacceptable, the measured value is about 10mJ instead) 'For example, when the ring power amplifier is not timed to amplify the seed pulse, but still forms wide-band laser light. It is also possible to use an existing controller such as a TEM controller, a cable for a novel detector, a cornice, and the like. The detector can be, for example, a detector currently used by the assignee of the applicant for detecting the beam intensity of the beam output, e.g., the output of the shutter of the laser system, using an XLA-XXX model laser system. 10 15 20 In accordance with various aspects of one embodiment of the disclosed subject matter, one or more of the mini-OPuS may be confocal and thus highly tolerant to uncalibrated, such that the possible aberration is low 'eg, such as a short cues indicated PuS, the so-called off-axis rays in the mini 〇pus have a delay time of 4 nanoseconds and 5 nanoseconds, respectively, which can use more than one mini OPuS. These values are chosen so that in addition to the appropriate delayed optical path for coherence destruction, both PuS use spherical optical elements with low leading-end distortion. The low pre-guided wave requirement actually prevents significant reduction of speckle from the mini-OPuS, unless angularly dissipated from the output of the mini-PuS, which is a slightly horizontal plate to replace the planar/planar compensation plate, allowing the mini-OPuS to transmit light and The delayed beams are slightly angularly offset from each other. The f-beam is, for example, the laser beam of the main vibration is partially coherent, resulting in a Z-spot of the beam. Re-injection of the angularly offset reflected beam of your opus, and the transmission of the transmission and the delay of the main pulse together with the delayed path of the main pulse into a main pulse and fewer sub-pulses can be achieved in the crystal_ and the retreat U (4) significant speckle reduction And the reduction of the laser source pulse of the monthly workpiece (wafer or crystallized panel) can be achieved, for example, by deliberately delaying the path mirror uncalibrated 75 to achieve a "possible confocal alignment" but adding a slightly wedge-shaped member The optical path is delayed, and then the beam splitter reflects a portion of the delayed beam into the output of the transmitted beam and its parent and previous sub-pulses, if any. For example, a 1 milliradius wedge in the plate will produce an angular offset of 0.86 milliradians from the reflected sub-pulse beam. The optical delay optical path of the Mini OPUS has other beneficial results in terms of laser performance and efficiency. Various aspects of an embodiment according to the disclosed subject matter, as schematically illustrated in Fig. 48, a laser beam, such as a seed beam from a seed laser source (not shown in Fig. 48), may be used. The mirror (beam splitter) 510 splits into two beams 5 〇 2 and 5 〇 4 . This mirror 51 transmits a certain percentage of the beam into the main beam 5〇2, and the remaining beam 5〇〇 into the optical retardation path 506 into the beam 5〇4. The transmissive portion 5〇2 continues to advance to the rest of the laser system (not shown in Fig. 48). The reflective portion 5〇4 is directed along the optical retarding optical path 506. The optical retarding optical path 506 includes mirrors 512, 514, and 516 that are perpendicular to the plane of the schematic display to allow the primary beam to re-enter the rest of the laser system, For example, a laser output beam is formed, or subsequently amplified, and amplified. The beam 504 can then be re-transmitted with the transmitted portion 502 of the original beam 500, and the delayed beam 504 passes through a wedge (compensation plate (10) disposed substantially perpendicular to the beam path of the beam 504. Thus the sub-pulse beam 504 from the retarded path 5Q6 is far away The main part of the beam of the field towel transmitting portion 5() 2 is slightly displaced. The displacement is, for example, about 50 microradians to 5 〇〇 microradians. The length of the L-light path 5G6 will delay the beam pulse, so the transmitted beam portion and the = beam portion have Slightly time offset, for example, greater than the coherence length, the pulse length is, for example, about 15 nanoseconds. By selecting the appropriate optical path length to determine the delay time, increase the two beams, and let the pulse energy spread to become slightly 1324423 for longer Tis. Combined with the main OPuS pulse extension, it can improve the laser performance and provide other favorable laser performance benefits.

Two mini OPuS are needed to achieve the desired effect. The offset time between the pulses from the two OPuS is, for example, i nanoseconds. Based on the optical and mechanical considerations, the delay selected for the extender, for example, the first mini OPUS is a 3 nm delayed optical path, and the second is a 4 nanosecond delay optical path. If the delay is shorter, the optical system may introduce unacceptable aberrations, for example, using a confocal mirror or a spherical mirror. If the delay is long, it is difficult to embed the system into the available space in the laser cabinet. A distance of 3 nanoseconds between the beams is required to travel a distance of 9 mm and a delay of 1 〇 is 4 1200 mm. The confocal optical system 52A reduces the sensitivity to uncalibration. As shown in Fig. 49, the confocal optical system 520 is composed of two mirrors 522, 524 together with a beam splitter 526, and the focus of the mirrors 522, 524 In the same position of space, the center of curvature is in the opposite mirror. The compensator plate 530 (for example, a wedge member) can be added to the mis-reflected beam and the transmitted beam.

★Quasi as the text is shown in Figure 48. In this case, the compensator plate is positioned at an appropriate functional angle on the optical path of the delayed beam. Referring now to Figure 5G, a line edge/line width coarseness (structural thickness) control (reduction and/or selection) system 1350 in accordance with various aspects of the disclosed embodiments is schematically illustrated in block diagram form. The system 1350 includes a stroboscopic light source 20, 诀t_, as disclosed in the present disclosure and the aforementioned copending disclosure of the present application, providing exposure to illuminate DUV light to the lithography tool 90, ', ', moonlight incident opening 1352. A tool 90 such as a scanner is as in the art. Included in the illuminator 92, the illumination of a mask/line 94 is used to place the tool*900. An integrated circuit wafer on the wafer-fixing platform 94 (not shown in Fig. 5/77 10 15 20). A coherent destruction mechanism 1370 can be inserted between the illuminator 92 and the wafer fixing platform 94. One or more types, such as a mini-OPuS, as disclosed in the present patent application and the patent application filed concurrently with the present application, the illuminator may include a projection lens having the aforementioned properties (not shown in Figure 5). The system also includes a A sensor, such as image contrast sensor 1372, can be arranged to detect the effect of the speckle on the overall or partial or selected axis of the integrated circuit fabrication pattern, the selected axis extending, for example, substantially parallel to one of the axes of the integrated circuit. The main structural dimension, and one axis is on another axis, for example substantially orthogonal to the first axis. The sensor output can be provided to a controller 1374, which can constitute a laser or scanner control system - Partially, or the portion of the laser and scanner system, or may be based on the dependence of the sensor 1372 on the coherence (four) structure - control (4). The control number can be changed by the statistical damage mechanism (4), The pure health signal is modified by, for example, an actuation signal of the beam sweeping mechanism on the any-axis or both, or the position compensation plates 52〇, 532 discussed above for the mini OPUS, for example, refer to the figure 47-48' - The axis or the two axes change the displacement of the main pulse and the sub-pulse', in other words, by changing the difference amount and/or direction of each of the at least two correction plates respectively included in the series-arranged _OPuS. Small reference now to Figure 51 The various aspects of the embodiment according to the gist of the eighth embodiment are shown in block diagram form, similar to the measured edge/line = degree (structural dimension thickness) control (reduction and/or selection) system. However, there is a phase-damage mechanism between the source light entrance opening and the illumination (4).: Figure 52 and Figure 53 are shown in block diagram form. According to the disclosed = 78, the 4423 曰 (4) line edge/line width is shown. Degree (structure dimension coarse control (reduction and / selection) system, where (4) device (10) (not shown in the buckle diagram or Figure 53) is, for example, in the tool 9〇, providing control signals to the individual laser system, Figure 52 1450 and the 53m + Ώ 146 〇 internal coherence break The bad mechanism is shown in Figure 52 and Figure 54 and Figure 1462. In each figure, the coherence destruction mechanism is shown in Figure 52. The pulse extension 〇PuS 1452 and the lithography worker are 92, and the 53® The thunder (4) system 1 is shown between the laser source 20 and the pulse extension 〇puS 1462. The delay 10 optical path time for the mini 〇 PuS for coherence destruction purposes and other purposes may be as short as about the time coherence length, and Optical considerations and space-constrained lengths, such as uncalibrated tolerances and aberration tolerances. If there are two or more mini-OPuS, the lengths of the delayed optical paths of each mini-PuS must be different from each other, for example, the difference exceeds the coherence length. The selection does not result in a significant coherent response 15 (increase) due to sub-pulse interactions from separate OPuS. For example, depending on the optical configuration, the delayed optical path time is separated by at least one coherence length without exceeding a certain amount, such as 4 or 5 coherence lengths. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicants have suggested employing a coherence-damaging optical structure that produces a plurality of sub-pulses that are sequentially delayed from a single-input pulse 20, wherein each sub-pulse is followed by a sub-pulse The pulse delay exceeds the coherence length of the light, and in addition, there is a deliberate chirped amount of each sub-pulse directed less than the divergence of the input pulse. In addition, Applicants have suggested using a pair of coherence to destroy the optical retardation structure where the optical delay time difference between the pair of optically retarded structures exceeds the coherence of the input light by a length of 13 1324423 degrees. Each of the two optical delay structures can also produce a sub-pulse having a controlled Uber direction, as described above with respect to various aspects of the coherent-damaging optical delay structure previously described. According to various aspects of an embodiment of the disclosed subject matter, the two imaging 5 mini 〇 PuS can be confocal, and thus can be highly tolerated uncalibrated, such as for example the short axis required for the so-called mini 〇 PuS of the short OPuS. The rays may have low aberrations' with delay times of 4 nanoseconds and 5 nanoseconds, respectively. Selecting these values' two OPuS have low leading wave distortion using spherical optics. The low leading wave requirement prevents significant speckle reduction from the mini OPUS, unless the planar/planar compensation plate is replaced, for example, by using a slightly wedge-shaped plate, resulting in an angular fan-out effect from the mini OPUS. It will be appreciated by those skilled in the art that sufficient coherence damage can be adequately achieved in accordance with various aspects of one embodiment of the disclosed subject matter to substantially reduce the effects of speckle on the handling of workpieces exposed to illumination from a laser system, such as 15 Used for integrated circuit lithography photoresist exposure (including the effect on the thickness of the line edge and the thickness of the line width), or laser heating, such as the amorphous substrate of the glass substrate when used for low temperature recrystallization treatment. Laser annealing. This project is achieved by a laser beam from a single-chamber Thunder H-beam, or from the output of a lasing laser system, or from a seed-lei 2 in such a multi-chamber laser system. The laser beam, before being amplified in another cavity of the multi-cavity laser system, passes through an optical configuration that splits the output filament into _ and sub-pulses, and recombines the pulses with the sub-pulses into a single beam, pulse and sub-pulse The pulses are displaced relative to each other by, for example, about 5 〇 microradians to lion microradians, and the sub-pulses have been longer than the main pulse delays, for example, at least temporally coherent, 80 超过 better than the temporal coherence length. The light beam can be transmitted on the road with a branch, and the main beam is delayed. The beam is injected into the retarded beam, and then the main beam is delayed by /°. When combined, the two beams, i.e., the main beam and the beam, may be slightly angularly offset from each other in the far field (differential pointing), which is referred to as the assignment finger (four). The delay optical path is chosen to be longer than the pulse coherence length. The angular displacement can be achieved by using an optical member in the optically retarded optical path before the delayed beam is returned to the beam splitter, which provides a slightly unbiased pointing to the delayed beam (pointing to which). The amount of singularity as described above can be, for example, about % microradians to 500 microradians. The optical delay optical path contains two delayed optical paths in series, each having an individual beam splitter. In this case, the lengths of the respective delayed optical paths may be different, so that the coherence 15 effect is not formed between the main pulses and the sub-pulses from the individual delayed optical paths. For example, if the delay of the first delay optical path is i nanoseconds, the delay of the second delayed optical path is about 3 nanoseconds; if the delay of the first delayed optical path is 3 nanoseconds, the delay of the second delayed optical path is about 4 nanoseconds. The wedges of the second delayed optical path are substantially orthogonal to each other with respect to the beam side, so that the wedge of the first delayed optical path can be used to reduce the coherence (speckle) of one and two axes, and the other delayed optical path. The wedge can reduce the coherence (speckle) of the other axis, which is typically orthogonal to the first axis. Thus, along the structural dimensions of the two different axes on the wafer, the effect of speckle can be reduced, for example, the thickness of the line ("LER") and/or the line width is promoted during exposure of the photoresist in the integrated circuit manufacturing process. The effect of the thickness ("LWR"). 81 1324423 According to one aspect of the embodiment of the invention, in the bow-tie loop power amplification stage, for example, a projection of 6 milliradians and an amplification inside the annular cavity may be for the incident beam and the outgoing beam. Slightly different, the crucibles may be arranged such that the beam slightly grows as it travels around the loop or slightly retracts as the beam loop 5 travels around the loop. In addition, and preferably in accordance with various aspects of the disclosed subject matter, for example, the distance between the outgoing beam and the human beam is greater, for example, about 5-6 mm, splitting the larger beam into two. As a result of the separation, as exemplified in Fig. 30, the applicant has suggested adjusting the angles of the two, for example, 146, 148, as shown in Fig. 4, thus obtaining the beam of outgoing light 10 and the incident beams such as beams 100 and 62. The same amplification, as illustrated in Figure 3, is illustrated. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicants have suggested setting Rmax, such as 164 and OC, for example, 162 portions of the seed injection mechanism version containing Rmax 164 and OC 162, for example, along with the system horizontal beam output aperture 15 Located on the same platform. This allows, for example, the entire unit to be previously calibrated to 'eliminate the need for individual component calibration. This allows, for example, the Rmax/OC assembly shown in the second figure, for example 160 (seed injection mechanism) to be fixed in position to a single-chamber oscillator system similar to the applicant's assignee (eg XLS 7〇0〇 model laser system) The OC position is fixed. By the same token, this configuration will allow for tolerances that allow Rmax/OC to be properly positioned relative to the system orifice without significant in-progress adjustments. The beam expander 稜鏡 is movable to calibrate the seed injection mechanism assembly having the amplification gain medium cavity 144 and the output beam 100 optical path having the laser system optical axis. According to various aspects of an embodiment of the disclosed subject matter, the applicant mentions

82 1324423 shows the setting - mechanical shutter, which is suitable for p and breaks the output into the ring, similar to the 〇Pus, such as used for the person of the applicant, to block the M0 rotation during calibration and diagnosis. The exact position may be protected before the ring power amplification stage, e.g., just above the last folding mirror, where the unplayed ring power amplifier stage calibration and 5 operations are performed. It will be appreciated by those skilled in the art that a device and method are disclosed herein for use in a line narrowing pulsed excimer or molecular fluorine gas discharge laser system comprising a sub-laser oscillator having a generator-output comprising a laser The output pulse beam comprises: a first gas discharge excimer or a molecular fluorine laser cavity; 10 a narrowing module inside a first oscillator cavity; a laser amplification stage containing an amplification gain medium in a second a gas discharge excimer or molecular fluorine laser cavity that receives the output of the seed laser oscillator and amplifies the output of the seed laser oscillator to form a laser system output comprising a laser output pulse beam comprising: A ring power amplifier stage. The ring power amplification stage comprises an injection mechanism that may include a portion of a reflective optical element, such as a beam splitter 'which may be a partially reflective optical element and may be polarization sensitive, through which the output beam of the seed laser is outputted Injection into the loop power amplifier stage. The ring power amplifier stage includes a bow tie loop or a racetrack loop. The ring power amplification stage amplifies the output of the seed laser oscillator cavity to a pulse 20 of more than lmJ' or 2mJ, or 5mJ, or 10mJ, or 15mJ. The laser system can operate at an output pulse repetition rate of up to 12 kHz or &gt; 2 to &lt; 8 kHz or 24 to &lt; 6 kHz. The laser system can include a sub-laser oscillator that produces an output comprising a laser output pulse beam comprising a first gas discharge excimer or a molecular fluorine laser cavity; a laser amplification stage is included in a second Gas discharge

83 1324423 An amplification gain medium in an excimer or molecular fluorine laser cavity to receive the output of the seed laser oscillator and to amplify the output of the seed laser oscillator to form one of the laser beams comprising a laser output pulse The system output, which may include a ring power amplification. The laser system can be operated inside the operating value matrix, which can be used to optimize the laser life and produce other excellent effects 'including better pulse energy stability, etc., for example, containing a mixture containing fluorine and other gases. The laser of the laser gas is operated at the following pressures: 5350 kPa total laser gas pressure, or phantom kPa total laser gas pressure, or &lt;250 kPa total laser gas pressure, or s2 kPa total mine The gas pressure, or 10 &gt; 35 kPa fluorine partial pressure 'or 230 kPa fluorine partial pressure' or 225 kPa fluorine partial pressure, or 220 kPa fluorine partial pressure and the foregoing combination. The system further includes a coherence destruction mechanism between the seed laser oscillator and the ring power amplification stage. The coherent destruction mechanism can sufficiently destroy the coherence of the output of the seed laser and reduce the speckle effect of using light from the laser system in the processing tool. The coherence disrupter 15 includes a first axis coherence destruction mechanism and a second axis coherence destruction mechanism. The coherence destruction mechanism can include a beam broom mechanism. The beam broom mechanism can be driven by the first time varying actuation signal on the first axis. The beam broom mechanism can be driven by the second time varying actuation signal on the other axis. The first motion signal includes a ramp s s number and the second actuation signal includes a sinusoidal signal. The frequency of the time-varying signal is such that at least one element period occurs within the length of time of a sub-laser output pulse. The coherence destruction mechanism can include an optically retarded optical path with uncalibrated optical elements to create a Hall effect of the mirror. The coherent destruction mechanism can include an optical delay optical path that is longer than the coherence length of the seed laser output pulse. The coherent destruction mechanism can include an active optical coherence 84 (S) 1324423 sexual destruction mechanism and a passive optical coherence destruction mechanism. The active coherence destruction mechanism includes a beam broom element, and the passive coherence destruction mechanism includes an optical retardation path. The coherence destruction mechanism includes a first optical delay optical path having a longer delay than the coherence length of the seed laser output pulse. A fifth optical delay optical path and the first optical delayed optical path are serially arranged and have a laser than the seed The delay of the coherence length of the output pulse is longer. The delay of the second optical delay optical path may be greater than or equal to about three times the coherence length of the seed laser output pulse. The coherence destruction mechanism includes a pulse extender. The pulse extension can include a negative optical delay optical path. The pulse extender consists of six mirrors ίο 〇puS. The coherence destruction mechanism can be a beam inversion mechanism. The system and method can include the use of a line narrowing pulsed excimer or molecular gas discharge laser system comprising: a sub-laser oscillator, the generator-output comprising a laser output pulse beam comprising: a first a gas discharge excimer or a molecular gas laser cavity; a line narrowing module inside the -first vibrating chamber; a thunder 15 emission amplification stage containing - amplifying the gain medium in a second gas discharge excimer or molecular fluorine laser a cavity that receives the output of the seed laser oscillating device and amplifies the wheel of the seed laser oscillator to form a laser system output comprising a laser pulsed beam comprising: a ring power amplification stage; A coherent destruction mechanism between the seed laser vibrator and the ring power amplification stage. The ring-shaped power amplification stage includes an injection mechanism that includes one of the partially reflective optical elements through which the output beam of the seed laser is injected into the toroidal power amplification stage. The system and method can include the use of a broadband pulsed excimer or molecular fluorine gas discharge laser system comprising: - a seed laser oscillator - its generating - output comprising - a laser output pulse beam comprising: a 85 first Gas discharge quasi-molecular weight +a - amplify W heart / cavity; - laser amplification stage contains, shell - gas discharge excimer or molecular gas laser cover:: = the seed laser oscillator round And amplifying the seed laser to form a laser system comprising a laser-pulsed beam I 3 (four) power amplification stage; the seed laser oscillator and the 10 15 20 2 power amplification _1 coherent destruction mechanism. The ring power amplification red includes a __ injection mechanism including a portion of the illuminating optical element, through which the seed laser beam is injected into the ring power amplification stage. The system and method comprise using a pulse-transferring molecule or a molecular-body-discharge laser comprising generating one of an output comprising a laser output pulse beam, the sub-laser oscillation n 'which may comprise - a gas discharge excimer or molecule a gas laser cavity; a line narrowing module inside the -first vibration chamber; a second gas discharge excimer or a molecular fluorine laser cavity - amplifying the gain medium - the laser amplification stage' Used to receive the output of the seed laser oscillator and amplify the output of the 5 liter seed laser oscillator to form a laser system output including a laser output pulse beam; for example, a 1^〇1&gt;8 or 1 ^〇1&gt;〇Configure a dual-chamber seed laser/amplified laser system, such as the applicant's assignee, the XLA-XXX model laser system; further included between the seed laser oscillator and the amplification gain medium level Such a coherent destruction mechanism as discussed herein. The amplification stage can include a laser oscillating cavity. The amplification stage contains an optical path defined by a fixed number of times the gain medium is amplified.

Laser systems such as laser systems for lithography can operate within a matrix of operating conditions. The ring power amplifier stage amplifies the output of the wide-band seed laser oscillator to more than 1mJ or 2mJ, or 5mJ, or 10mJ, or 15mJ 86 1324423 or 20mJ or more. The laser system can operate at an output pulse repetition rate of up to 12 kHz or &gt; 2 and S8 kHz or 24 and &lt; 6 kHz. The system may include a seed laser oscillator containing a laser gas containing a mixture of fluorine and other gases at a pressure of &lt;500 kPa or S400 kPa, or a total laser pressure of S350 kPa, or a total of OOkPa total laser gas. Pressure, or U50kPa total laser gas pressure, or &lt;200 kPa total laser gas pressure operation. The system may contain &lt;5 kPa or S40 kPa, or &lt;35 kPa fluorine partial pressure, or phantom kPa fluorine partial pressure, or &lt;25 kPa fluorine partial pressure, or 520 kPa fluorine partial pressure. Referring now to Figure 32, there is shown in schematic form a pulse extender 10 160a', such as an optical pulse extender ("OPuS") version sold with the applicant's assignee's laser system, but having, for example, not designed for use with The farther shortened delay path of the pulse extension, i.e., the full extension, is used to significantly extend the pulse in the airspace and time domain, as the applicant's current offer of the OPuS pulse extender, increasing Tis by 4X or more. However, the same 15 folding/reverse imaging effects can be achieved for the beam for coherence destruction purposes, as also illustrated by the beam mixer of Figure 31. The coherence destroyer 160a has an input beam 162a incident on the beam splitter 164a, e.g., a partial mirror 164a for the associated wavelength. The partial beam 162a reflected into the multi-mirror, e.g., the delayed optical path formed by the confocal mirror 166a, is imaged back to the partial mirror 164a, for example one or more times. It should be understood that such an optical coherence destroyer has more than four mirrors, such as a six-sided mirror, but for the sake of convenience and clarity, only a four-sided mirror is illustrated. The delayed optical path can be shorter than 7 meters to 10 meters, such as 4X 〇 PuS, so the second and third passes through the delayed optical path substantially overlap into and out of the coherent disruptor 16 〇 &amp; pulse, but not 87 ( S :) Substantially extends the pulse evenly. As known to those skilled in the art, the delayed light path can include a flat mirror. In addition, multiple curved imaging mirrors can be added, in which case negative 1 imaging or even positive imaging may occur. Figure 33 is a partial block diagram showing, in partial block diagram form, an example of a coherence destruction system 360a and its results, in accordance with one embodiment of one of the disclosed subject matter, such as the result of coherent destruction in terms of beam divergence. The illustrated system can incorporate an oscillator/amplifier laser 37a comprising, for example, a solid or excimer seed laser 372a and an oscillator amplifier laser 394a, or other power amplification stage, such as a ring power amplifier stage. Amplifier Gain Media The 109433 can be an excimer laser that is arranged into a power amplifier configuration, such as a total reflection back cavity mirror 396a and an input/output coupler such as 398a. Other seed laser/amplifier configurations are to be understood, some of which are discussed herein, and can also be used in the coherent destruction system illustrated schematically in Figure 33. The output of the seed laser 372a is shown as a representative of a 15 single point seed laser output laser pulse beam divergence 374a indicating relatively high coherence. The output of the seed laser 372a may be as shown in the example of Figure 32 by one or more coherence disrupters such as 376a, 378a, or as shown in Figure 31 (hereinafter referred to in the co-examination application). The agent's file number 2005/0039 is described in detail) or other optical elements such as those disclosed in the aforementioned US20050286599, 20 or one or more of the mini-PuS coherence destruction mechanisms discussed above or combinations thereof. In accordance with various aspects of an embodiment of the disclosed subject matter, a possible embodiment may use a confocal OPUS, similar to the U.S. Patent Application Serial No. 10/847,799, the disclosure of which is incorporated herein by reference in its entirety, the disclosure of the disclosure of Extender, application date May 18, 2004, agent file number 2003-0121, with 88 • households such as two confocal spherical mirrors, and four times through the delayed optical path, such as from the beam splitter to the 1st mirror to the 2nd The mirror 'returns to the No. 1 mirror and returns to the No. 2 mirror' and then returns to the spectroscope, for example, by offsetting the optical element, for example, in the aforementioned co-pending U.S. Patent Application Serial No. 11/394,512, entitled "Confocal Pulse Extension 5" 'Application date March 31, 2006, agent file number 2004-0144-01. This so-called "mini-OPuS" version consists of a two-pulse extender in series, for example a delay optical path offset selected for the time-pulse intensity curve of the main oscillator output with a slightly shifted high-frequency peak. For example, the first 1 nanosecond can be experienced via a delay offset of about 2 nanoseconds, followed by a 3 nanosecond delay line mini-OPuS pair, or a 3 nanosecond to 4 10 nanosecond delay line serial mini-PuS pair with a 1 nanosecond delay. , or 4 nanoseconds with a 5 nanosecond delay line in series with a mini 〇 PuS with a delay of about 1 nanosecond. It must be understood that the pulse itself cannot be significantly extended, for example, close to overlapping other pulses, but generally does not extend at all, because the delay pulse path is much longer than the 1 延迟 delay optical path in the normal pulse-extended OPUS sold by the applicant's assignee. short. 15 Applicants have discovered that pulse lengths of 5 nanoseconds or more generated by solid seed pulses can challenge the state of the art. However, the use of mini OPUS to increase the pulse time from the seed before injecting the amplification stage suggests that the applicant will increase the pulse length even with shorter pulses from the seed and using one, two or more mini OPuS. A longer pulse 20 from the seed can be generated, and the mini OPUS is slightly uncalibrated, thus forming a broadened divergence before injecting the amplification stage. Using such a variety of sub-mini-OPuS systems, applicants anticipate that there may be no need for any active beam steering inside a single pulse, particularly for non-solid seed laser systems. It may be desirable to use active maneuvers to blur even the divergence of solid-state seed laser systems, even when needed, but in the case of all 89 1324423 it is not expected that 'seed lasers, you 〇 PuS only need to measure the total optical path delay' It is extremely straightforward to build on a seed laser optical platform. The appearance of the Mini OPuS and the conventional 0P_stack as shown in Figure 33 also shows the cartoon picture that diverges when the optical series appears divergent. Assuming that your OPUS 376a, 380a is 2.7 times from each fan 5, a 2.7-fold "pulse" can be generated from the uncalibrated amplifier stage 143. Previously, the measured value of the uncalibrated amplification stage was used to expand the Shenqing person into six independent pulses with a total pulse of up to 317. The E 〇 deflector 392a easily penetrates the pointing space blur which is large enough to form at least four independent pulses, obtaining a large potential of a total of 1271 pulses. Assuming that the initial speckle contrast ratio 10 is 1%, the speckle contrast is 28% after all the pop-ups are obtained. The preferred embodiment uses a first delay slightly greater than i nanoseconds due to an increase in calibration problems, with shorter delays and larger aberrations for pulses extending in shorter delay paths. However, each of the delayed optical paths has a longer coherence length than the pulses, and the second delayed optical path is longer than the first delayed optical path to achieve a coherent 15-disruption effect such as discussed herein. The mini Ο P u S pulse extender can be selected and arranged, for example, to reflex the beam ' or the first mini OPUS 376a to dissipate the beam on the first axis, to obtain a divergence representative map 378a; and then to another orthogonal The associated axis, such as the second mini OBuS 380a, obtains a divergent representative map 390a. A pulse manipulator 392a 2, for example, an optoelectronic ("E-0") component 392a, can sweep (smear) the seed beam into the input/output coupler 400a of the amplifier portion 394a, resulting in a blur of one axis as in the power oscillator 410. The pulse divergence representative is shown (also including the divergence representative of the amplification gain stage 394a, representation 410). "Conventional 〇pus" or "standard OCuS" such as 4XTis OPuS (about 10 meters delayed optical path), for example, includes two delayed optical paths 412a, 420a caused by a 901324423 dichroic mirror 414a and a second dichroic mirror 422a. The beam is configured to self-fold at the first axis; then self-folding on the second axis, resulting in a pulse divergence representative of the figures such as 4143 and 424a. The final divergence representative map 424a schematically shows that the divergence of the seed beam is greatly increased, i.e., the beam is blurred from the path of the seed laser 372a to the amplifier gain medium 394a, amplified by the amplifier gain medium 394a, and then further to the 4X conventional OPuS 412a, 420a. Destroy coherence. This increase in divergence leads to a decrease in coherence. Those skilled in the art will be aware of the initial coherence determination based on the pulse, such as pulse coherence from a seed laser (e.g., almost complete coherence to very little coherence in the case of solid seed lasers), but further reduction is still desired Coherence, such as the use of excimer seed lasers to reduce coherence, the type, number, and arrangement of coherent destruction elements can vary. For example, a solid-state seed laser only has to actively destroy coherence, such as using one form or 15 other forms of pulse manipulation/smear to destroy, and in some cases it is used for certain purposes to verify that only a ramp or only an AC pulse is required. Bias, in other words, only one axis or the other axis needs to be ramped or only AC pulse biased; or confirm that DC and AC pulse smear (mixed smear) is required 'together with ' 〇 〇 with amplifier gain medium such as P0 or PA or other amplification gain medium level For example, 20 〇 PuS effect coherence destruction between ring power amplifier stages must also use the effect of a conventional OPuS pulse extender on the output of the amplifier gain medium. Using an excimer gas discharge laser M〇, the coherence comparison is much lower from the solid-state seed laser, for example, only passive coherence destruction is required between the M〇 and the gain amplifier medium, for example, the mini-PuS 376 can be used for the damage. The 38 or the other or the other passive optics 91 described above are interposed between the MO and the amplifier gain medium. Ren still needs to be engaged in beam manipulation, such as using an active beam steering machine = the mechanism discussed above to make the pulse more _ (more divergent), but it is not necessary to have a smaller broom angle. I believe that this kind of seed laser fan 5, you PuS each about the total optical path delay, as currently used in the applicant's transferee XLA series laser system for relay optical components, the delay light path can also be easily established in the seed On the laser optical platform. Figure 34 shows an example of the relative speckle intensity of the 1 kV Ε·〇 deflector voltage versus time. The relative standard deviation curve 55 is added as i kv, and the equivalent pulse curve is the curve 550a'. The 2kVE-〇 deflector voltage curve 552a and the equivalent pulse curve 552a' are also shown as a 3 kV E-0 deflector voltage curve 554a and a corresponding pulse curve 554a'. The example of the pointing displacement versus the E_〇 voltage curve 56 is shown in Figure 35. The pointing displacement (applicant estimated by the speckle displacement measurement) is plotted against the E-0 battery applied voltage as shown in Figure 35. In accordance with various aspects of one embodiment of the teachings of the disclosure, Applicants have suggested scanning the seed laser pointer internally within a single pulse to reduce speckle contrast therein. For example, optoelectronic components can be used, for example, in Figure 66, which illustrates, in a schematic partial block diagram, elements 1912 and 1914 in accordance with various aspects of an embodiment of the disclosed subject matter. Before the seed laser pulse is input into the excimer power oscillator 20, 'using vertical expansion, the XeF cavity is placed close to the input coupler such as the beam splitter, and the clearance aperture of the E-Ο deflector is about 3.2 mm. The deflector can be positioned upstream of the vertical expansion (not shown in Figure 66). In order to minimize any translation into the vibrator cavity, such as the XeF cavity 1930, in combination with the bevel of the E-0 deflector, it may be desirable to place it as close as possible to the amplifier cavity. 92 1324423

The junction resistor is not in the E-0 battery at the end of the transistor 1130a. The plot of the applied $ shape is shown in Figure 36. Between the string and the voltage supply, it can be used, for example, to control the voltage slope of the battery. The 50 PF capacitor of an E-0 battery in series with a fine ohmic resistor, for example, achieves an initial slope of approximately 1 〇 11 microradians per second. The voltage drop across the 10 E_0 battery is shown in Figure 36, which is reduced to near zero by the DC level for a similar seed pulse time length. By varying the relative time between the E 〇 battery pulsator and the seed laser, for example, the amount of directional sweep during the seed pulse can be varied. In addition, the initial DC voltage value can be varied to perform a larger or smaller pointing broom during the seed pulse. Applicants, for example, use only seed lasers or only 15 to use the reflection from 〇C to test the fast pointing ability, so there is no OPuS effect from the multiple reflections of 〇c and Rmax, and there is no effect due to the operation. The relative time between the Ε-0 cell and the seed pulse is not optimized, and the applicant captures a speckle pattern over a time range between two times. The applicant applies three different DC electrical waste levels to the Ε-0 battery, and the maximum change is 2 〇 pointing slope. The results are shown in the relative time of about 57 nsec, and the minimum speckle intensity normalization standard deviation is obtained, as shown in Fig. 34. There is no angular offset during the seed pulse, and the speckle contrast is lower than or above 57 nanoseconds for small or large relative time values. This point is related to the applicant's found value interaction during the static test. For example, when the relative time makes the E-0 battery voltage slope coincide with the seed 93 1324423 sub-pulse, the speckle pattern of a single pulse is blurred in the vertical direction with an impressive degree of satisfaction. The values of these contrasts can be normalized to a maximum value to estimate the percentage reduction in contrast due to the dynamic pointing offset. At the 5th point of the best relative, the speckle contrast decreased to about 40% of its peak value. Using the 1/# hypothesis with an equal number of independent pulses, the data can be used to derive the number of pulses required to achieve this level of speckle contrast reduction. To optimize the relative time and apply to the E-0 battery at 3 kV, the reduction in contrast is equal to 6 pulses. A higher voltage level (and even greater pointing displacement during a single pulse) can improve this result. Shen 10 invited a similar measurement, the seed laser pulse was incident on the 级 amplification stage cavity 'but the amplifier stage did not discharge between the electrodes, found in the XeF cavity from the reflection of 〇C and Rmax 'by 〇puS effect' beam alone The extension 'points the maximum speckle contrast reduction to the predicted amount of effect (N=156 has 2〇% 〇C, which gives 1/^=0.80. So 70% contrast becomes 56%). The effect of fuzzification is 15 which makes the initial speckle contrast low, and the addition of the secondary reflection from the full XeF cavity remains unchanged. The equal pulse of speckle reduction is still about 6. Applicants performed similar measurements with amplified stage cavity electrode discharges, thus suggesting that the amplification effect in the discharge stage cavity, as indicated by Figure 34, has little effect on speckle reduction via the seed beam broom. Using this configuration, it was found that when operating as a river 0]?0, the effect just exceeds one-half of the number of equal-numbered pulses generated, that is, about 3, and the reduction in peak speckle contrast is also found to be quite large, and Blurring. The previous measurement of the ΜΟΡΟ operation shows a reduction equal to about 6 pulses. This result shows a reduction of about 8 pulses. Applicant perceives that the magnifying cavity can be distinguished from the off-axis ray angle, for example, in a planar, planar cavity, such as 94. The various angles into the cavity may not be equally amplified (eg, a true stabilizing cavity such as curved 0C and curved Rmax may be used) Correction). Another indication is that not all seed pulses are involved in the control of the amplification stage characteristics. It is possible that only the first 5 nanoseconds of the 10-15 nanosecond pulse time of the seed pulse can control the amplification level, such as 5 in the smaller window. The E-〇 broom is not fast enough, for example, by using a smaller plastic resistor and shorter. Broom to correct. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicants have suggested the use of a 6-mirror coherence destruction mechanism (for convenience, the optical pulse delay optical path indicated herein is a four-sided mirror for each delayed optical path), the coherence The Destruction 10 mechanism is developed by the Applicant's assignee for use in either the first or second pulse extender used in the XLA model multi-cavity laser system of the Applicant's assignee or The extra light path delay between the two. Such an optical path delay can, for example, produce a negative 1 image for each sub-pulse. It is shown schematically and cartoonized in Figure 37, illustrating the sum of these "flip" sub-pulses. For example, the flip sub-pulse shown in Figure 8 15 can be used to improve profile uniformity and symmetry. 6 Mirror S history a ten can convert the pointing displacement into divergence increase, which is beneficial to the reduction of ASE in the ring configuration. The standard four-sided mirror design is no. It is to be understood that the delayed optical path for this purpose of coherence destruction does not need to be as long as the actual OPuS used for pulse extension to obtain far more increasing pulses L, for example for lithography. Instead, the so-called "mini OPuS" of the coherent destruction mechanism only has to fold the pulse a certain number of times. Illustrated by pulse 580a, the corner turn (front flip) is labeled 582a, and pulses 584a, 586a, 588a. In addition, due to the unavoidable uncalibrated mirror on the delayed path, the "half mirror" or the so-called 〇PuS effect can also reduce the coherence of the seed laser pulse, as long as the delay path exceeds the spatial coherence length of the 95 1324423 beam, then Further coherence destruction will occur in the delayed light path. In this respect, the 4-mirror mini OPUS, for example, can be used as a satisfactory coherence destroyer for the purpose of calibrating the confocal spherical mirror, even if the beam is not flipped on both axes. 5 In accordance with various aspects of one embodiment of the disclosed subject matter, it may be desirable to combine two separate laser beams at various points in a system in accordance with various aspects of an embodiment of the disclosed subject matter. If only half of the entrance to the 6-mirror pulse extender is illuminated, the sub-pulse flips between the top and bottom, as shown in Figure 8. These "flip" sub-pulses add up to fill the full-size side, as shown in the pulse-flip simulation of Figure 41, curve 562a shows the pulse before the incident delay path, and curve 564a (black) is shown after a delayed path. Pulse, curve 566a (red) shows the pulse after the second delayed optical path. The laser divergence can then be used to fill in the propagated central portion 568a, for example, above about 1 meter. The use of solid-state lasers has been proposed in the past for lithography systems, but there are no two reasons for this. Solid-state lasers have not been considered as high average power required for lithography, and solid-state lasers produce high (good) coherence single mode outputs. In accordance with various aspects of one embodiment of the disclosed subject matter, the Applicant's example uses a solid seed/excimer amplifier hybrid combination to address the problem of low average power. According to various aspects of an embodiment of the disclosed subject matter, the high coherence problem of solid seed lasers can be solved in a variety of ways, for example, the solution is longer than the coherence length by forming sub-pulses over time; Or via a very short time scale, such as within a single laser pulse, changing the seed laser pointing, or a combination of the two. Applicants have found that coherent destruction also facilitates partial lasers for dual chamber gas discharge (e.g., excimer) seed/gas discharge (e.g., 96 1324423 excimer) amplifiers. It is known from the diffuser 670a that the speckle pattern removal phase occurs for a long time /2d, where d is the illumination width of the slotted aperture, or the diameter of the circular aperture, for example (4). The incoherence of the speckle pattern may also occur at 5 sub-pulses generated by the -pulse extender, with the proviso that the pulse extender extends each pulse for greater than the length of time, for example via deliberately placing individual pulse extenders such as pulse extenders The mirror is deliberately not calibrated to a very small amount. In fact, the employer's employer has found that it is extremely difficult to precisely calibrate the polygon mirror, for example, the 4Χτ OPUS type pulse extender. The polygon mirror is almost calibrated and not calibrated, and it is not necessary to deliberately make it uncalibrated. This "normal" uncalibrated amount is found by the applicant's employer to be sufficient to achieve the desired degree of speckle reduction, as shown in Figure 4, which is discussed. The effective number of equal divided laser pulses is also equal to the time product squared ("Tis") amplification of each pulse extender. The aforementioned OPuS pulse stretcher 15 has a magnification of about 2.4 times. Using a three-stage pulse extension, the number of independent sub-pulses will become (2.4) 3 = ι 3 · 8. Since the speckle contrast is scaled by the number of independent sub-pulses Ν by 1/#, the pulse extender provides an output speckle contrast ratio of 1ΤΪ31 26.9/. 'Enter the speckle contrast just %. Since the speckle contrast is still circulated&apos;, in accordance with various aspects of one embodiment of the disclosed subject matter, a seeding mechanism can be provided to reduce the speckle contrast of the ingress and egress pulse extenders. It can be called a mini OPiiS, as discussed in the text. Photoelectric 7L or acoustical elements can be used for beam steering such as a single pulse------------ Thereby, for example, the seed laser output, according to various states 97 1324423 of one embodiment of the disclosed subject matter, it is obtained that the photovoltaic material only has to receive a low average power seed laser beam. For example, by randomly and/or continuously changing the beam steering, for example, the angle acceptance of the internal power amplification stage of a single laser pulse can be "smeared" or filled for each laser pulse. As a result, a main pulse can have a divergent set, such as a divergent set that is optically configured by the M〇/5 power amplifier stage rather than by the seed laser characteristics. The coherence of the laser light output from the laser system can be greatly reduced. In accordance with various aspects of an embodiment of the disclosed subject matter, for example, an injection of a planar cavity and a planar back mirror via a controlled amplifier laser system may have suitable energy stability, for example, for use in 〇.〇〇85mj to 〇.99mj A range of 10 sub-pulse injection energy. This beam can, for example, be incident on the rear mirror of the power amplifier stage to form an input combiner for the seed laser. This mirror, for example, has about 90% reflection and about 8% transmission. Thus the seed energy of the incident amplification stage can itself be less than one seed amplitude less than the seed of the incident mirror. The use of a toroidal cavity, particularly for a portion of the various aspects of an embodiment of the disclosed subject matter, is a 15 minute reflection seed injection mechanism, as discussed herein, the input seed can be much less expensive, such as allowing an input of about 8 Torr. /〇 Seed laser light. Rmax and 〇C can be used in a fluorine-containing environment and are therefore relatively strong. However, if polarization coupling is used, the coupling efficiency is still lower than the optimum coupling efficiency for some applications. For example, a suitable architecture for MOpa configuration can be a 2-channel ("tick") solid-state seed laser, such as a third harmonic 20-wave Nd:YLF system or a Nd:YACJ system (eg, fine-tuned to 351 nm) with a pair Two 3-way XeFPA modules. Such a system, such as a main oscillator/power amplifier stage (such as a ring power oscillator amplification stage) configuration, can also be considered an effective alternative. This two-channel approach is similar to the ΜΟΡΑ configuration, ie there are two seed power oscillators. A variety of coupling techniques can be used, 98 such as MO coupling or seed injection mechanisms using polarization techniques. The efficiency of different PO/PA configurations was found relative to Em. It is better for ΜΟΡΟ or for the three-way ,, but has not tested the four-way ΜΟΡΑ. It was found that the pulse width (FWHM) is about 17.3 nanoseconds for ΜΟΡΟ, about 13.9 nanoseconds for single pass, and about 12.7 nanoseconds for three-way ΜΟΡΑ5. Applicants examined whether the speckle pattern has an uncorrected angular offset, such as an Nd-YLF seed laser and a XeF power oscillator (e.g., a planar-plane polarization coupled configuration) in a single output beam. The relative timing adjustment between the XeF discharge and the seed laser pulse can also achieve angle adjustment and spatial adjustment for the maximum suppression of the weak line (353 10 nm) generated by the XeF gain. Figure 39 is not the result of a coherent destruction system of one of the output laser pulses, such as the scanner angle acceptance window, for example, horizontal and vertical (as shown in the page plane of Figure 39) One of the scanner angle acceptance windows. Point 780a is illustrative of an initial seed laser output pulse 780a. The pattern of the pulse 782a is displayed in the perfect calibration beam delay optical path or through the uncalibrated beam delay optical path or both of the sub-pulse divergence side writing patterns 782a after the beam is folded, or a combination thereof; the circle surrounding each pattern represents the photoelectric blurring The effect of divergent profile. Referring now to Figure 40, there is shown a schematic representation of the coherence disruption effect of various aspects in accordance with the disclosed subject matter. Utilizing an imaging delay optical path such as a pulse extender, such as the so-called optical pulse extender ("Pu puS, for example, the laser system of the assignee of the aforementioned Applicant" - hexagram OPuS and shown in the aforementioned US The patent application and the co-pending application 5, or its previously modified version with a shorter delay optical path, such as ^ 99 1^24423, reversing the beam and/or delaying the coherence length discussed above The so-called mini OPUS can achieve, for example, the degree of coherence damage between M0 and the amplifier gain medium, such as PA or P〇 or ring power amplifier stage. Other forms of coherence destruction, as shown in Figure 31, can be used alone or in combination with this type of "PuS", as shown in Figure 33 and discussed. According to various aspects of an embodiment of the disclosed subject matter, a pulse extender such as a 4-mirror 6-mirror pulse extender such as a conventional 〇PuS such as 4χ Tis 〇Pus or a so-called mini OPUS has a pointing/diverging sensitivity, or on the 3i The diagram illustrates the details of the delayed optical path as shown in Figures 13, 14, and 42 by adding, for example, the feedback from the pointing/diverging sensor to increase the active mirror control. These advantages include the formation of a Hall mirror effect whereby, for example, the laser output light pulse beam is smoothed on the delayed optical path and, in addition, actually becomes a plurality of beams similar to very different directions, such that the mirrors of the pulse extenders There are different angles of incidence on the top. Applicant's assignee observes this at the pulse extender, which is extremely difficult 15 to perfectly calibrate, for example, the face mirrors of the currently used 4X Tis OPuS pulse extenders, thus creating a mirror Hall effect to reduce the presence of the pulse extender. The coherence of the laser output light pulse beam. The beam 86A thus forms a plurality of split beams 862a. Figure 40 also illustrates the results of the planar-plane cavity 85A having a slightly uncalibrated mirror-forming cavity 852a rear and a round-out coupler 854a, but the employer of 20 applicants observed that the 〇PuS has the same effect, as previously described Coherence damage effect. The cavity shown in Fig. 40 also has a polarization input coupler 858a and a quarter-wave plate 856a. Figure 40 shows the reduction in coherence by using the polarization input coupling of the seed laser source from the seed laser source when both the reflection coefficients of 〇c and Rmax are used in the planar/planar cavity. The angle is exaggerated to facilitate clear explanation. The static fan-out produced by 0C and Rmax, that is, the "mirror effect of the mirror", can produce multiple rays. The theoretical energy weighting of these rays, assuming that there is no transmission loss through the cavity and a good reflection coefficient, the theoretical 5 energy weighting of these rays is shown below. 101 U24423 MMM3. Regularized energy component energy 1 0.2 =0.200 0.3125 2 0.8*0.8 =0.640 1.000 3 〇.8*0.2*0.8 =0.128 0.2000 4 0-8*0.2*0.2*0.8 =0.0256 0.0400 5 0.8*0 ·2*0·2*0.2*0.8 =0.00512 0.0080 6 0.8*0.2*0.2*0.2*0.2*0.8 =0.00102 0.0016 The ray of each meal is non-coherent with each other'. For example, the optical path length between OC and Rmax is maintained. The temporal coherence is longer. The ray assumptions are slightly different from each other because it is believed that it is extremely difficult to obtain a good calibration, especially in the vertical direction. Applicants believe that a difference of 37 microradians in the vertical direction can result in uncalibrated speckle. The regularized energy weights are summed to obtain an equal number of independent pulses, and the square root is calculated to obtain a reduction in the standard deviation, which is obtained from the aforementioned sum of 15 L56. The square root is 丨·25, and the standard deviation predicted when using 〇C and Rmax reflection is 0.551/1.25=0.440 ′, which is comparable to the applicant's measured value, ie 〇427. Static fanout, which is called the Hall effect of the mirror in the text, is believed to be largely unavoidable for manual calibration. Static fanout produces a single pulse speckle for 20 degrees, with amplification of the amplification gain medium compared to the single seed laser. 2.5 times smaller. This reduction is equivalent to 6.3 uncalibrated sub-pulses. Some of the contrast reduction is due to the weak line content from the XeF power oscillator used to test the effects of the vibration amplification stage's but most are believed to be due to the static fan-out effect. Similarly, the C-Rmax (OC-back cavity mirror) reflection of the pseudo-puS static fan-out characteristic 102 1324423 formed by the sub-pulse all m to (four) equal intensity, so more than the above table shows Quite independent pulse. The angle of inclination required to produce an uncalibrated speckle pattern is significant. In the first large transition of a comparable pulse, for example 1.0 to 1.55, the Applicant believes that most of this is due to the poor repeatability between the pulses of the speckle pattern during the operation of 55. Even if the '' does not change the mirror tilt angle, the interaction between the two pulses is not better than 30 3 5 _ . . Using only the seed laser, it was found that the interaction of such pulses with the pulse became about 85-9 G%. The lengthy and slow rise of the number of pulses is about 4 〇〇. The micro-radial mirror tilt angle can't even reach the value of 2.0, such as Figure 46. This result indicates that a large angle broom may be required for approximately ±500-1000 microradians to form a number of uncorrected speckle patterns in a single pulse. Through coherence-related experiments, the Applicant's partial master understands that, for example, a plurality of small pulses formed by a pulse extender are incoherent, and if the angle is slightly offset, j will result in a different sideband pattern. When the input angle is A/2d, the pinhole sideband pattern 15 is shifted from the maximum value to the minimum value. The turning offset (applicable to the offset from the speckle offset measurement) is plotted against the applied voltage of the Ε·〇 battery as shown in Figure 35. In light of the various aspects of the embodiments, the Applicant has suggested scanning the seed laser pointer inside a single pulse to reduce the internal speckle contrast. Example 2 can be achieved, for example, using a photovoltaic element such as element 392 shown schematically in Figure 33. Before the seed laser pulse input is placed in the vicinity of an input coupler such as a spectroscopic laser oscillator such as a beam splitter, such as a XeF cavity, the vertical expansion is used, and the clearance of the E-0 deflector is about 32 mm. The deflector must be upstream of the vertical expansion (not shown in Figure 33). In order to minimize any 103 translation of the oscillator cavity, such as the translation associated with the angular offset from the E-Ο deflector, it is desirable to place the E-0 deflector as close as possible to the amplifier cavity. A beam combiner system 5 600a, in accordance with one of the various aspects of the disclosed subject matter, is now partially illustrated in block diagram form in the block diagram. Beam combiner system 600a, for example, includes a first amplifier gain medium portion 602a and a second amplifier gain medium portion 6〇4a, each of which may be, for example, a PA or PO or a ring power amplification stage, as described herein. The respective outputs of the amplifier sections 602a, 604a are passed through a beam expander 608 which includes a stack 610a and a stack 612a to amplify the beam by a factor of four. The steering mirror 620a 10 can control the first laser system output light pulse beam 622a from the amplifier 602a to a second steering mirror 624a, and the second steering mirror 624a can manipulate the pulse beam 622a to form the pulse beam 632a for use on the beam splitter. At the first pulse extender 640a, the beam splitter 646a for the second pulse extender 644a is again reached there. The turning mirror 630a can control the second laser system output light pulse beam 632a from the second amplifier 604a to the second steering 15 mirror 634a, which can manipulate the light beam 632a to form the light beam 634a and be incident on the beam splitter 642a, where it is incident again. In the beam splitter 646a. The output of the first OPuS and the second OPuS (which may be "mini-OPuS" as discussed in this discussion) passes through another beam splitter 650a where a portion of the laser system output laser light pulse beam can be diverted, for example for degree 20 The weighing objective 'is focused, for example, by a focusing lens 652a on a divergence detector 654a that provides a feedback control signal 656a to a portion of the control system (not shown) to the first and/or second pupil PuS 640a, 644a. The mirrors 642a, 646a, or the diverting mirrors of the respective beams 632a, 634a increase or decrease the divergence. Such coherence damage occurs at the input of amplifiers 602a, 604a as shown in Fig. 42, rather than being rotated. The effective number of equal divided laser pulses is also equal to the time product squared ("Tis") amplification of each pulse extender. The above-mentioned 〇PuS pulse stretcher has a magnification of about 2.4 times. Using a three-stage pulse to extend the number of independent sub-pulses 5 will become (2.4) 3 = 13,8. Since the speckle contrast scales with the number of independent sub-pulses N scaled by 1/#, the pulse extender provides output speckle contrast ΐνη^-26·9% ‘input speckle contrast 1〇〇%. Since the speckle contrast is still unresolved, various aspects of the embodiment may be provided to reduce the speckle contrast of the ingress and egress pulse extenders. It can be called 10 as a mini 〇Pus, as discussed in the text. Pulse trimming at 193 nm has been verified, for example, using optoelectronic components. Instead of polarization rotation for several other forms of pulse trimming, the optoelectronic component can be used to manipulate the beam&apos;, e.g., one of the seeds within the single pulse of the laser beam. Thereby, for example, in the seed laser output, it is possible to obtain a photovoltaic material that only receives a low average power seed laser beam in accordance with various aspects of the disclosed embodiment. For example, by randomly and/or continuously changing the beam steering, for example within a single laser pulse, the angle of the power amplification stage can be "smeared" or filled with respect to each laser pulse. The result - the main pulse can have a divergence set, such as a dimming set determined by the M0/power amplification stage optical configuration rather than the seed laser characteristics. The laser system output can be obtained. The coherence of the laser pulse is greatly reduced. In accordance with various aspects of an embodiment of the disclosed subject matter, such as a planar cavity and a planar back mirror injected into a controlled amplifier laser system, suitable energy stability can be used, for example, for 〇.〇〇85Mj to 〇. 1324423 sub-pulse injection energy in the 99mJ range. This beam can, for example, be incident on the back mirror of the power amplifier stage to form an input coupler for the seed laser. This mirror has, for example, about 90% reflection and about 10% transmission. Therefore, the seed energy of the incident amplification stage cavity itself may be about one time smaller than the seed energy of the incident mirror. The use of a toroidal 5 cavity, particularly a partial reflection seed injection mechanism in accordance with various aspects of an embodiment of the disclosed subject matter, as discussed herein, can be much less expensive, such as about 80% of the injection amplification stage. Rmax and OC are strong in a fluorine-containing environment, but if polarization coupling is used, the coupling efficiency is still lower than the optimum coupling efficiency for some applications. For example, the appropriate architecture 10 for the ΜΟΡΑ configuration can be a 2-channel ("tick") solid-state seed laser, such as a third harmonic Nd:YLF MO system or a Nd:YAG system (eg, fine-tuned to 351 nm) with a pair Two 3-way XeF PA modules. Such a system, such as a main oscillator/power amplifier stage (such as a ring power oscillator amplification stage) configuration, can also be considered an effective alternative. This two-channel ΜΟΡΟ method is similar to the ΜΟΡΑ configuration, that is, there are 15 seeding power vibrators. A variety of bonding techniques can be used, such as ΜΟ coupling or seed injection mechanisms using polarization techniques. The efficiency of different ΡΟ/ΡΑ configurations was found relative to Em. It is better for MOP◦ or for three-way, but has not tested four-way. The pulse width (FWHM) is found to be about 17.3 nanoseconds, about 13.9 nanoseconds for a single pass, and about 12.7 nanoseconds for a three pass. Applicants examined whether the speckle pattern has an uncorrected angular offset, such as a Nd-YLF seed laser and a XeF power oscillator (e.g., a planar-plane polarization coupled configuration) in a single output beam. The relative timing adjustment between the XeF discharge and the seed laser pulse can also achieve angle adjustment and spatial adjustment for the maximum suppression of the weak line (353 106 1324423 nm) generated by the XeF gain. At the initial very low level of fluorescence at the amplification stage, the maximum intensity of the seed pulse is observed. This very low level of fluorescence (and therefore very low level gain) can be observed by the 雷 output, which can be boosted by the seed laser. Adjusting the seed light 5 earlier or later than about 20 nanoseconds before the amplification stage is emitted may result in an increase in the output of the weak line. In accordance with various aspects of an embodiment of the disclosed subject matter, manipulation of the beam, for example using a photovoltaic element, via a beam manipulation, for example using a Con〇ptics E_〇 deflector assembly matching the desired center wavelength of the target, can be performed in a single pulse period of 10 Achieve the direction of the seed beam. This E-0 component is similar to a CD reader and DVD reader using a dual argon ion beam of approximately 351 nm with an e 偏 deflector to regulate the beam. A deflection with a pointing coefficient of, for example, about 6 microradians/volts and having a capacitance of 5 〇 pF, or even a full milliradial requires only 17 volts. A drive circuit that can be used for 15 pulse trimming as shown schematically in Figure 40 (discussed in detail herein) can be used, e.g., with resistors in series to produce a controlled broom rate during a single pulse. The seed pulse time is approximately 15 nanoseconds, so the rate of rise is within the capabilities of the driver to achieve a reasonable pointing change such as 1 milliradian. Use pumping diode current about 3 amps and 4 amps to vibrating damper diode diode 'seed laser output laser light pulse beam pulse 20 can be judged as L2mJ, enough seeding gas discharge laser such as XeF gas discharge Laser. The speckle contrast mapping of the Μ Ο Ρ Ο configuration (average speckle interaction versus mirror tilt angle - input angle variation) is illustrated in Figure 75. Similar to the diagram in the oscillator configuration, only the seed laser pulse passes through the amplifier gain medium, but zooms in 107

丄d厶 厶 厶 厶 厶 。 。 。 。 。 。 。 。 。 Illustrated in Figure 590 of Figure 46, a diagram 592 of a relatively independent pulse is also illustrated. A similar plot is shown in Figure 74. The seed laser pulse is only at P0, the curve and line 596 are fairly independent pulses, the curve 594 is the gauge standard deviation, and the curve 598 is the interaction _. Similar to the M〇p〇 case, 5 requires about 150_250 microradians to produce a speckle pattern that is completely or substantially completely free of cross-correlation, and about two fairly independent pulses. However, as explained above, the speckle contrast at the beginning of no displacement may be small, and the reflection coefficient of 〇c is only about 1.25. Thus, in accordance with various aspects of one embodiment of the disclosed subject matter, Applicants have discovered that, for example, single-pulse speckle contrast is significantly lower than in the case of only 10 seed lasers due to multiple OC-Rmax-OC-Rmax reflections. The static fan-out of the ray, e.g., each of the reflections, exits at a slightly different angle as shown, resulting in an uncalibrated speckle pattern, as exemplified in Figure 75. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicant believes that this finding can be used to greatly simplify the desired coherence disruption system, and here it has been found that a lower degree of coherence damage is required. The ability to replace the control and/or more rapid modulation of the optoelectronic component (referred to as "mixed smear" in the case of using both), such as the entire divergent space of one or two axes (eg, requiring high frequency devices) The seed laser and P0 are slightly uncalibrated, for example, one axis or the other 20 axes or slightly uncalibrated on the two axes to explore the effect of this static ray spreading phenomenon, the so-called mirror Hall effect. Then, for example, only a linear broom pointing along one or the other axis or two axes is used. For example, in the case of a spread spectrum with only one axis, the one axis is the other axis, and the demand for the E-0 driving electronic component is greatly reduced. In the simplest case, 'uncalibrated spread spectrum (beam fanout), the so-called mirror Hall effect can be used for (S) 108 /, with the axis, on the other axis "single application", for example, according to the symbol to indicate the tilting mirror, Does not contain AC to form a mixed smear. More complex permutations can be applied and combinations of such coherence destruction techniques can be applied. Figure 43 shows an example of an ideal high-frequency smear E_〇 voltage signal stacked on a ramp type 5 (time change) E_〇 DC voltage signal related to the intensity of the seed pulse being "smeared", such as smearing into a delayed light path or smearing into a magnification Gain media, such as PA or p〇 or other power amplifier stages. As shown in the circuit of Figure 45, the ramp voltage can be formed by the fast R C attenuation of the 电容·〇 battery capacitor. Due to certain limitations of the test circuit established and tested by Shen Shen people so far, such as RF frequency limit, impedance mismatch, E_〇 load battery capacitance mismatch, etc. 'The actual voltage transmitted by the "smear" circuit As shown in Fig. 44, the optimum measurement can be obtained in consideration of the difficulty of the probe load and the like. It is about 25% of the desired RF frequency (for example, about 1 〇〇 MHz instead of 4 〇〇 mHz), and 10% of the peak-to-peak voltage required (for example, about ±2〇〇 kV instead of ±2000 kV). The application voltage can of course be more optimized. 'But the test circuit is used to verify that the seed beam is "smeared" into the amplifier gain medium for reducing the effects of coherence/speckle, such as DC control and AC modulation for mixed application time changes. One is tied to one axis and the other is tied to the second axis, and the two axes are orthogonal to each other. The applicant conducted an experimental measurement to determine that there was no ramp voltage or AC voltage, and the 2D 2〇 speckle contrast was 76.8% overall and changed from the horizontal axis to the vertical axis. The smear was applied with a ramp voltage alone, and the total speckle contrast was 29.4% and changed again in the two axes. The smear was applied with an AC voltage alone, and the total speckle contrast was 59.9% and changed again in the two axes. The ramp voltage and AC voltage were applied, and the total speckle contrast was 28.1% and changed on two axes. Using a circuit that is less optimized than Figure 4, the results of the circuit test are shown in the first row, which cannot be obtained by the test. The Applicant believes that the better optimized circuit shown in Figure 45 can further reduce the speckle contrast. The circuit 11A of FIG. 40 includes, for example, the aforementioned E 〇 5 battery, has an E-0 battery capacitor and an impedance matching inductor turtle, and the step step-up transformer 1120ae also includes, for example, a dc power supply as shown. 1122a charges the capacitor via a large resistor 113A, and the RF frequency generator is connected to the fast action switch via a resistor, a second transistor 1140a (actually a row of such transistors arranged side by side). Further, when the switch 1140a is turned off, the capacitor 11263 is electrically connected via the small resistor ι4. According to various aspects of an embodiment of the disclosed subject matter, "smear" can also be performed upstream of the amplifier gain medium. For example, the smear does not need to be completed within one pulse time, and the mirror is amplified by tilting, for example, piezoelectric adjustable type 15 The mirror, or the pressure applied by this application, is fast enough, otherwise it is achieved using a photoelectric or acousto-optic beam deflector. The results of using only seeds, using only 〇c, and using OC plus Rmax seem to be very similar to those of applicants such as those measured using a tilting mirror such as a diffusing mirror as shown in Fig. 22. As with the previous measurements, it can be seen that the pu-spot puS characteristic of the OC-Rmax reflection can obtain an equal number of sub-pulses generated by the 20 to reduce the single-pulse speckle contrast value. The angle tilt required to reduce the uncorrected speckle pattern is determined to be about 200-250 microradians, again similar to the results obtained using a mirror such as the downstream of the power amplifier stage. Applicants use excimer seed lasers such as large attenuation to simulate the expected pulse energy of, for example, a 193 nm solid state laser, and perform the 1324423 feature of the solid state MO/power amplification stage. However, the resulting pulse time does not match the expected pulse time of a 193 nm solid state laser. Applicants believe that the appropriate simulated seed pulse time should further reduce the total seed laser energy required for M0/power amplification stage operation. Using a pulse trimmer, for example, a pikecks cell to which a stepping voltage is applied, for example, when the sputum is trimmed, the excimer seed pulse shape is later (1/4 volts = 2.5 kV), and due to the excimer seed ray The rise time of the pulse and the fall time of the Parker battery, so the shortest actual pulse shape achieved is about 9 nanoseconds FWHM and about 15 nanoseconds root to root. The subsequent phase of the pruning seed pulse is determined to have no substantial effect on the M0/power amplification stage output pulse characteristics such as intensity, even if about 25% of the seed pulses are removed. However, as described in this case, pulse trimming can further reduce speckle by eliminating the portion of the output pulse that has the greatest coherence (minimum speckle contrast).

In accordance with various aspects of an embodiment of the disclosed subject matter, it is contemplated that a time varying voltage can be applied similar to the time scale of the seed pulse time, for example 15 by applying a DC voltage level until triggered, where high power waste can be shorted Grounding is shown, for example, as shown in Fig. 40 as a fast MOSFET stack of a single transistor 1130 for short circuit grounding. The plot of applied voltage and seed laser pulse shape is shown in FIG. A series resistor is provided between the E-0 battery terminal and the voltage supply to control, for example, the voltage shape applied to the E-0 battery. The 5 〇 pF capacitor of an E-0 battery in series with a 200 ohm resistor results in an initial slope of about 1011 microradians per second. The voltage across the E-0 battery is as shown in Fig. 19, and the pulse timing is reduced from the DC level to near zero at a similar seed pulse time. By varying the relative time between the Ε·0 battery pulser and the seed laser, for example, the amount of index bounce that occurs during the seed pulse can be changed. In addition, the initial DC power can be varied; i 111 value&apos; to perform more or less indicator sweeps during the seed pulse. The applicant has already tested the ability to test such rapid indicators, for example using only seed lasers, only from 〇c reflection measurements, so there is no 〇PuS effect from multiple reflections of 0C and Rmax, and no effect from ΜΟΡΟ operation. . The relative timing between the e-o battery and the 5 seed pulse was not optimized, and the applicant captured the speckle pattern for a period of time between the two. Applicants applied three different DC voltage levels to the helium battery to change the slope of the most feasible indicator. The results are shown in the relative time of about 57 nanoseconds with a minimum speckle intensity gauge standard deviation. If there is no angular displacement during the seed pulse, the relative time value between small and large is higher than that of the hypothyroidism at 57 nm. This is related to the value found by the applicant during the static test. For example, when the relative timing causes the E-0 cell voltage slope to coincide with the seed pulse voltage slope, the speckle pattern of a single pulse is applied in an astonishing and satisfactory manner in the vertical direction. As is currently understood, the limits required for ASE are believed to be achieved by approximately 5 uJ seed ray 15 and below, for example, in the form of long seed pulses. The saturation test results show that the output energy can be achieved. When the seed pulse of short pulse time is used, the equivalent ase upper limit can be achieved by only 3 75uJ seed laser energy. It is possible to obtain a further shortening of the seed pulse time, resulting in a smaller seed energy requirement. However, further shortening of such seed energy may not be necessary because the applicant must use about 10 uJ of solid 193 nm seed laser energy. Shorter pulse times have proven difficult because of the use of two-stage mini OPUs, such as the use of two-stage mini-OPuS between the seed laser stage and the power amplifier stage. The delay length of each mini-PuS is greater than the seed laser. The pulsed time of the resulting pulse is approximately 10 nanoseconds FWHM. 112 1324423 The contrast value can be normalized to a maximum value to estimate the decrease in contrast percentage', for example, by reducing the percentage of contrast by dynamic index displacement. At the optimal relative time point, the speckle contrast was found to fall to about 40% of its peak value. Using the 1/# assumption of an equal number of independent pulses, the data can be used to derive the number of pulses required to achieve this reduction in speckle contrast by up to 50%. At the optimal relative timing, 3kV was applied to the E-0 battery and the contrast reduction was found to be equal to 6 pulses. A higher voltage level (larger index displacement during a single pulse) can improve this result. Applicants used a seed laser pulse to enter the power amplifier stage for similar measurements, but there was no discharge between the amplifier stages. It was found in the Xep cavity that the reflection from OC and Rmax from the OBuS effect was separately spread. It is pointed out that the maximum speckle contrast reduction is up to the predicted amount of effect (N=1.56 has 20% 0C 'obtained 1/7^=0.80. Thus 70% contrast becomes 56%). Even if the initial speckle contrast is low, the blur effect is apparently unchanged when the secondary reflection from all XeF cavities is increased. The speckle reduction is still quite a pulse of about 6. 15 Applicants used amplifying stage cell discharges for similar measurements, suggesting an amplification effect inside the amplification stage, as shown in Figure 17, indicating the effect of speckle reduction via the seed beam broom. With this configuration, when operating as an MO/amplifier stage, it is found that the effect is just over the equivalent number of pulses generated to about half 'in other words, about 3'. It is also found that the peak speckle contrast is large 2 〇 is reduced' without Blurring. Previously measured MO/amplifier stage operation, the display reduction was equivalent to approximately 6 pulses. These results show a reduction of equivalent to 8 pulses. Applicants suspect that the magnifying cavity, for example in a plane-plane cavity, can distinguish the ray angles, so that the angular sprays sent to the cavity cannot all be equally amplified (for example, a true stabilizing cavity can be used, for example, using curved OC and bending Rmax). . Another 113 1324423 - item describes the control that not all seed pulses participate in the amplification stage feature. It is possible that only the first 5 nanoseconds of the HM5 nanosecond pulse time of the seed pulse can control the amplification stage, so that E.W拂 is not enough for the smaller window (4) to occur. For example, it can also be corrected by using a smaller resistor and a shorter broom. :5 Referring now to Figure 47, a laser processing system and, for example, an LTPS^bSLS laser annealing system are used in block diagram form for low temperature and glass reversion and recrystallization of amorphous materials, (4) including, for example, Ray ray 20, and light (4) system 1272 to convert the laser beam of the itj light pulse from about 5 x 12 mm to 1 〇 micron or about 10 micron χ 39 〇 nanometer or longer 10 thin beam for processing the workpiece, for example A work piece that is fixed to the work piece manipulation platform 1274. Those skilled in the art will appreciate that a device and method disclosed herein includes a line narrowing pulsed excimer or molecular fluorine gas discharge laser system comprising: a sub-laser oscillator that produces an output comprising a laser output pulse 15 ray beam The method comprises: a first gas discharge excimer or a molecular fluorine laser cavity; a line narrowing module inside a first oscillator cavity; - a laser amplification stage comprising: an amplification gain medium for discharging a second gas An excimer or molecular fluorine laser: a cavity that receives the output of the seed laser oscillator and amplifies the output of the seed laser-oscillator to form a laser system 20 output comprising a laser output pulse beam comprising: A ring power amplification stage. The toroidal power amplification stage includes an injection mechanism that may include a portion of the reflective optical element through which the output beam of the seed laser oscillator is injected into the toroidal power amplification stage. The ring power amplifier stage includes a bow tie loop or a racetrack loop. The ring power amplifier stage amplifies the output of the seed laser oscillator cavity to a pulse of 114. 5 ), 2 lmJ, or &gt; 2 mJ, or &gt; 5 mJ, or 21 〇 mJ, or 215 mJ. The laser system can operate at output pulse repetition rates of up to 12 kHz or 22 to $8 kHz or 24 to S6 kHz. The apparatus and method can include a broadband pulsed excimer or molecular fluorine gas discharge laser system, comprising: a sub-laser oscillator, 5 which produces a round of a laser beam comprising a laser output, comprising: a first gas discharge An excimer or molecular fluorine laser cavity; a laser amplification stage comprising an amplification gain medium in a second gas discharge excimer or molecular fluorine laser cavity, receiving the output of the seed laser oscillator, and amplifying the seed lightning The output of the oscillator is used to form a laser system output comprising a laser output pulse beam, and a 功率-shaped power amplification stage is included. The toroidal power amplification stage can include an injection mechanism including a partially reflective optical element through which the seed laser oscillator output beam is injected into the toroidal power amplification stage. The ring power amplifier stage can include a bow tie loop or a racetrack loop. The apparatus and method can include a coherent destruction mechanism between the seed laser oscillator and the amplifying medium. The coherence disrupting mechanism includes an optically retarded optical path having a length of delay that is longer than a length of coherence in the laser output pulse beam of the seed laser oscillator. The optical delay optical path is not substantially delayed by the laser output pulse beam of the seed laser oscillating device to make the 20-beam length, but does not form a stacked pulse as in the 4X0PUS sold by the applicant's assignee. 'The delayed optical path with a length of several meters between each pulse' also significantly increases the Tis of the pulse and its length and space length. The phase destruction mechanism includes a first-length optical optical optical path and a second optical optical optical path, and an optical delay of each of the first optical optical path and the optical optical optical path exceeds Seed laser (4) 115 laser output pulse beam - the coherence length of the pulse, but does not substantially increase the pulse length, and the difference between the first delay optical path and the length of the delayed optical path exceeds the The coherence length of the pulse. The apparatus and method can include a line narrowing pulsed excimer or a molecularly charged discharge laser system comprising: a seed laser oscillator, which produces an output-containing laser output pulse beam comprising: - - a gas discharge excimer or a molecular fluorine laser cavity; a line narrowing module inside the - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - - a fluorine f-cavity that receives the output of the shelf laser and amplifies the output of the seed laser oscillator to form a laser (10) output comprising a laser output pulse beam comprising: - a ring power amplification stage; A coherent destruction mechanism between the seed laser oscillator and the ring power amplification stage. The ring power amplification stage includes an injection mechanism including a partially reflective optical element through which the seed laser output beam is injected into the % power amplifier stage. The coherence disruption mechanism can include an optical delay optical path 1 with an optical path having a longer delay length than the seed laser (four) laser output pulse beam. The optical delay optical path does not substantially increase the length of the pulse in the laser output of the seed laser oscillator. The coherence destruction mechanism includes a first optical delay optical path of a first __ length and a second optical delayed optical path of a second length, wherein an optical delay system of each of the first delay optical path and the second delayed optical path exceeds a seed laser oscillator The coherence length of one pulse of the output pulsed beam is emitted, but the pulse length is not substantially increased, and the difference in length between the first delayed optical path and the second delayed optical path exceeds the coherence length of the pulse. The coherence disrupting mechanism may include 1324423 coherence-damaging optical delay structure 'a plurality of sub-pulses may be sequentially generated by a single input pulse' wherein each sub-pulse is delayed by a subsequent sub-pulse beyond the coherence length of the pulsed light. The apparatus and method can include a broadband pulsed excimer or molecular fluorine gas discharge laser system comprising: a sub-laser 5 oscillator that produces an output comprising a laser output pulse beam comprising: a first gas discharge An excimer or molecular fluorine laser cavity; a laser amplification stage comprising an amplification gain medium in a first gas discharge excimer or molecular fluorine laser cavity 'which receives the output of the seed laser oscillator and amplifies the seed The output of the laser oscillator forms a laser system 1 〇 output comprising a laser output pulse beam comprising: a ring power amplification stage; a coherence between the seed laser oscillator and the ring power amplification stage Destroy the institution. The toroidal power amplification stage includes an injection mechanism including a partially reflective optical element through which the output beam of the seeded laser oscillator is injected into the toroidal power amplification stage. The coherence disrupting mechanism can include an optical delay optical path having a delay length that is longer than a coherence length of one of the pulsed laser output laser beam of the seed laser oscillator. The optical delay optical path does not substantially increase the length of the pulse in the laser output pulse beam of the seed laser oscillator. The coherence destruction mechanism includes a first optical delay optical path of a first length and a second optical delay optical path of a second length, wherein the optical delay system of the first delayed optical path and the second delayed optical path 20 exceeds the seed laser oscillator The coherence length of one pulse of the output pulsed beam is emitted, but the pulse length is not substantially increased, and the difference in length between the first delayed optical path and the second delayed optical path exceeds the coherence length of the pulse. The coherence disrupting mechanism can include a coherent-damaging optical delay structure that can sequentially generate a plurality of sub-pulses from a single input pulse. Each of the sub-pulses 117 is delayed by a subsequent sub-pulse beyond the coherence length of the pulsed light. The apparatus and method can include a pulsed excimer or molecular gas gas discharge laser system, comprising: a sub-laser oscillator that produces an output comprising a laser output pulse beam comprising: a first gas discharge The molecule is a sub-fluorine laser cavity, and a narrowing mode is formed inside a first vibrating cavity. The laser amplification stage contains an amplification gain medium for the second gas discharge excimer or molecular fluorine a cavity that receives an output of the seed laser oscillator and amplifies an output of the seed laser oscillator to form a laser system output including a laser output pulse beam; the seed laser oscillator and the mine 10 One of the coherent destruction mechanisms between the amplification stages includes an optically retarded optical path that exceeds the coherence length of the seed laser output beam pulse. The amplification stage can include a laser oscillating cavity. The amplification stage can include an optical path defining the number of fixed passes through the amplification gain medium. The coherence disrupting mechanism can include an optically retarded optical path having a delay length that is longer than a coherence length of one of the pulsed beams of the seed laser oscillator. The optical delay path is not added to the pulse length of the seed laser oscillator laser output pulse beam. The coherence destruction mechanism includes a first optical delay optical path of a first length and a second optical delay optical path of a second length, wherein an optical delay of each of the first delayed optical path and the second delayed optical path exceeds a laser of a seed laser oscillation of 20 The length of the coherence of one of the pulsed beams is output, but the pulse length is not substantially increased, and the difference in length between the first delayed optical path and the second delayed optical path exceeds the coherence length of the pulse. Applicants have calculated that the reduction of simulated speckle is related to the position of the coherence length inside the output pulse of a single gas discharge (eg, ArF excimer or KrF excimer). The pulse has been passed by the assignee of the applicant. The second opus pulse extender of the laser system manufactured by Xima is used for pulse stretching to increase the total integrated spectrum (Tis) and to reduce the output of light from laser illuminators such as lithography tool scanner illuminators. The effect of the peak intensity of the laser output pulse of 5 optics in the tool. Two OPuS are connected in series, the first having a delayed optical path sufficient to extend the output pulse from about 186 nanoseconds to about 47.8 nanoseconds, and the second 〇PuS further extending the pulse to about 83.5 nanoseconds. Starting from the unexpanded pulse, the applicant bisects the pulse into approximately equal parts (7) over the length of the coherence length, assuming a FWHM bandwidth of 〇1〇, and a coherence length function of Gaussian shape. The influence of the pulse extension on the coherence length portion of the pulse passing through the first 〇1&gt;1^ indicates that the first intensity hump of the extended pulse is composed of the coherence length portion of the main pulse, and the second intensity hump is dominated by the main pulse. The coherence length partially overlaps the coherence 15 length portion of the first sub-pulse. The third intensity hump of the extension pulse is the result of the first and second sub-pulse overlays. Note the individual coherence length portions of the two humps. Applicants observed that multiple versions of the coherence length portion (including sub-pulses) remain sufficiently separate and do not interfere with each other. • After passing the second OPuS, the simulated intensity of the extended pulse (again • only pay attention to the contents of the three hump before the extended pulse), in the simulation (the contribution below the second peak is as previously mentioned from the original The delayed pulse, as described above for the first delayed pulse from the first OPuS, and the first delayed pulse from the second opus, Applicant observed that the plurality of coherence length versions in the second pulse are extremely different from each other Close. This is caused by a delay of approximately 18 nanoseconds for the first 〇Pus 119 1324423 and a delay of approximately 22 nanoseconds for the second 〇pus. So only about 4 nanoseconds separate multiple versions of the coherence length portion, still not close enough to not interfere with each other. Under the third hump, the applicant observes a first 5 delay pulse from the first OPuS, a second delay pulse from the first OPuS, a first delay pulse from the second OPuS, and a second delay. The second delay pulse of puS. Shen Shenren observed that the separation of several related coherence parts was greater than the other separation of the third hump in the pulse intensity map extended by the two OPuS. This separate increase is due to two round trips through each of the 〇PuS 10 equal to about 36 nanoseconds = 18 * 2 and about 44 nanoseconds = 22 * 2. The separation between the lengths of such coherence increases with each round trip. The Applicant has concluded that for a mini 0 puS as described in this case, a single mini 0PUS with a delay equal to one coherence length will form a series of pulses that disappear after about 4 coherence length values. Thus, Applicants have determined that in order for a single 15 逑彳 PuS to be effective, the two main OPuS must not cause any sub-coherence lengths to be within 4 coherence lengths of each other. However, the applicant also observed during the simulation that OPuS did cause this, but only marginal conditions. The separation between the coherence lengths of the third hump and the larger hump is large enough. Applicants believe that the impact of a single mini-OpuS between M〇 and amplifying the gain medium is close to the fully expected coherence breakout 20 bad effect. The second mini OPuS between M〇 and PA does not interact with the two primary OPua points. When a single mini OPuS is combined with two conventional 0PuS, the blank space that is not partially filled with the relevant coherence length of the pulse hump is increasingly rare, and the first may be too rare. According to an aspect of an embodiment of the present invention, the applicant suggests that when the mini OPUS is set up, the conventional 〇puS delay length is combined.

120 1324423 Changes include part of a laser system or are located downstream of a conventional mini 〇 PuS, such as inside a lithography tool itself. Applicants believe that such a mini OPuS can slightly fill the valleys of the pulse time, resulting in an increase in Tis, thus allowing for a reduction in the delay length of one of the two main OPuS to achieve a better total coherence length separation. In accordance with various aspects of an embodiment of the disclosed subject matter, certain performance requirements for very high power amplification stages of, for example, a 120-180 W or higher laser system, such as two parallel amplifier gain media cavities. It produces a linear polarization (&gt;98%). Each amplification stage must be generated and can survive an average output of 10 240 W at, for example, a 193 nm ArF wavelength, but it is expected to use a specification of &gt;6〇w, or less severe at longer wavelengths, such as 248 for KrF and 351 for XeF. Or 318 of XeCl, but F2 is even more demanding at 157 nm. In one embodiment, each amplification stage can operate at about 6 kHz or above. The various aspects of an embodiment according to one of the disclosed subject matter have a full seeding of relatively small seed laser energy (saturated or nearly saturated at 15). In accordance with various aspects of one embodiment of the disclosed subject matter, the seed laser energy can have no more than about ,, but in this case the overall output power of the system can be less than 2 〇〇w. Applicant believes that the amplification stage also needs to support medium large angular distributions, for example to maintain the same angular spread spectrum of the seed lasers, to prevent inadvertent coherence, for example, by removing coherent cells, for example, having an angle of 20 to a few milliradians. The battery improves the coherence. Protecting the seed laser from reverse radiation is also an important operational requirement. In accordance with various aspects of one embodiment of the disclosed subject matter, the ASE level produced by the amplification stage must be less than 1% or less of the total output when properly seeded. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicant Pre-121 1324423 (1) gain section will be similar to an existing ArF cavity such as the applicant's assignee's XLA ArF laser system power amplifier ("PA ") cavity; (2) the gain length is similar to the existing ArF cavity; (3) the gain time length is similar to the existing ArF cavity.

In accordance with various aspects of an embodiment of the disclosed subject matter, Applicant mentions 5 examples such as a single M0/gain amplifying medium XLA tick with a solid seed laser operating at 12 kHz 'having about 1 mJ of seed laser output light pulse energy And the two amplification stages are each capable of operating at an output pulse of about 17 mJ. Moreover, in accordance with various aspects of an embodiment of the disclosed subject matter, Applicants have suggested utilizing a regenerative gain medium, such as a ring power amplifier stage, to allow comparison of, for example, a power amplifier ("PA") configured in a configuration. The ring power amplifier stage produces several times larger output pulse welds. For testing purposes, Applicants simulated the use of a line-narrowed ArF laser derived from the input of a solid-state I93 nm seed laser. The Applicant's study of the different values of the aforementioned parameters for the ASE vs. MO-PO timing difference&apos; results is shown in Figure 7. A study of the function of the same parameter with respect to the MO-PO timing is also shown in Figure 7. In order to comply with the foregoing requirements, such as the limitations of known lithography laser source technology, Applicants have provided a variety of overall architectures in accordance with various aspects of one of the disclosed subject matter, and it is believed that a workable manner can be provided to address the foregoing requirements. Restriction ° Firstly, two multi-cavity laser systems are provided, together with the applicant's XLAXXX laser system series, for example, two dual-chamber laser oscillator/power amplifier configurations, which are each configured to Operating at about 6 kHz produces an output pulse having a parent-made emission time of about 17 mJ, according to one embodiment, to produce a single approximately 12 kHz system of about 17 m per pulse. Thus, in accordance with various aspects of an embodiment of the disclosed subject matter, such as 122 1324423, FIG. 4 is a block diagram not showing an extremely high average power laser system such as /and/or lithography laser source 152G. A plurality of oscillators, laser system output optical pulse beam sources, such as i522, 1524, each of which includes, for example, a main vibrator portion of 3 main vibrating chambers 153, such as the applicant's 5 people #玛The company is the main vibration ||| part of the XLA χχχ(4) multi-cavity laser system. A power amplifier portion 1532 is also included in each of the oscillator/amplifier laser systems 1522 1524, for example, including an amplifier gain medium f. The two oscillator/amplifier laser systems 1522, 1524 each provide an output light pulse beam to a beam combiner 154, for example, to provide an output light pulse beam in a 10 interleaved manner. Thus, each of the laser systems 1522, 1524 can operate at 6 kHz and 17 mJ output laser pulse beam pulses, and the combined output from the beam combiner 154 可 can be output at 6 kHz 17 mJ to obtain an approximately 200" average power laser system. It is understood that the embodiment of Figure 54 can be implemented with more of the same oscillator/15 laser systems 1526, U28 to produce a 400W average power laser system. In addition, 'each oscillator/amplifier system 1522, 1524 Each of 1526, 1528 can operate, for example, at less than 6 kHz, for example, each operating at a higher frequency and/or outputting a laser beam pulse signal at a higher total oscillator/amplifier system 1522, 1524, 1526, 1528, for example up to about 331. The limit operation allowed by optical damage 20 and operating costs, among other factors, is used for various combinations of the final output 10 〇 pulse repetition rate and pulse energy for a variety of average output power values from (iv) 丨 5 2 G. Figure 55 is a block diagram showing various aspects of an embodiment of the disclosed subject matter, a very high average power ticking 123 (S) seed laser / The bulk system 1550. The seed laser/amplifier system 155 〇 includes, for example, a seed laser portion 1530, such as a solid seed laser, wNd:YAG or Nd:YLF or Ti: sapphire or fiber laser or other solid state laser or excimer Or a molecular fluorine gas discharge seed laser, for example, at about 12 kHzal_2mj output 5 can be pulsed, as described in detail in the specification, a pair of amplifier portions 1532 are each supplied with an AC output from the seed laser portion 1530, for example, via a beam splitter 1552. Pulses. Depending on the repetition rate of the amplification stage, the pulses can be supplied in a manner other than AC. The individual amplifier sections 1532 are then used for 200W output, for example, at about 6 kHz, to operate only 17 mJ from each amplifier section 1532 10. The shots can be selected to operate in the range of about 4-12 kHz 'obtained in the parallel embodiment where the two amplifier stages have an output of 8 kHz to 24 kHz.

Referring now to Fig. 56, a very high average power tick 15 seed laser/amplifier system 1570 is shown in block diagram form in accordance with various aspects of one embodiment of the disclosed subject matter. System 1570, for example, includes first seed laser and second seed laser 1572 each supplying a seed laser pulse via beam splitter 1552 to a pair of amplifier portions, such as amplifier gain medium 1574, which are each combined output at beam combiner 1578 to the laser. The light source system outputs a laser beam of light 100 to provide an average output power of 2 〇〇 w or more. The 20-pole laser can be, for example, a solid-state laser operating at about 12 k Η z, and the amplifier portion can be, for example, a gas discharge laser operating at about 6 kHz, such as an excimer or molecular fluorine laser. Additionally, for example, the seed laser 1572 can be an excimer laser operating at about 6 kHz such as KrF, ArF, xeC1, XeF, or molecular fluorine lasers, individually paired ticks &gt; amplifier sections each operating at 3 kHz, each time light The engraving or LTPS 1324423 laser source system outputs a total of 12 kHz and 17 mJ of laser light pulses, resulting in an average power of approximately 200 W. As discussed in detail herein, frequency conversion may be required to migrate the wavelength of the seed laser 72, such as a solid state laser, to the wavelength of the gas discharge laser amplifier portion 1574. Beam combiner 1578 can be a single light bundle combiner as shown, or a cascade combiner as shown by combiner 1540, 1542 of Figure 54. Those skilled in the art will be aware of the various combinations and permutations of the configurations shown in Figure 56. For example, there may be multiple A-seed lasers 1572' operating at X kHz' each seeding a plurality of b-amplifier sections 1574, each of which operates at X/BkHz, the combination of which provides an output beam of Figure 56. The AX system in Suizhong outputs the output pulse of the laser source. Then, depending on the desired average system output power, the pulse energy of the respective outputs of the plurality of amplifier sections 74 can be determined, for example, by A=2 and B=2 as shown in Fig. 56 and X=6 kHz, and the total output beam 100 has 12 kHz. Output, output 17mJ pulse in the amplifier part, get 15 about 200W average output pulse. The configuration of Figure 54 is equally feasible. Need to note the LTPS or immersion lithography source, such as the main oscillator operated by twice the repetition frequency of the two amplifier chambers, the LTPS or the light source can be configured as M〇/amplification gain medium The second excimer laser cavity. For example, each of the amplifying media may be a circulating/regenerating ring power amplifier stage, 20 each alternately seeded by a main vibrator operating at twice the repetition rate of the ex-amplifying stage excimer laser cavity. Such a system can operate at any desired wavelength, such as a duv wavelength, MO and PA/P0 are operated at 2) 'i93nm (ArF), pooled, 308 (XeC1), or 351 nm (XeF). In addition, such systems may include solid state laser or excimer seed lasers at a higher pulse repetition rate 125 operation to seed a plurality of, for example, two titration configurations of power amplification stages, such as a ring power amplification stage. The immersed laser lithography system 1580 system 1580, which is partially illustrated in block diagram form, schematically illustrating the various aspects of an embodiment according to the disclosed embodiment, may include, for example, a very high average power output laser light. The pulse-balance beam source 1520 is as shown in Fig. 54, or 155, as shown in Fig. 100 or 157, as shown in Fig. 56, and the line narrowing pulse supplied to the average power of 200 W or more is pre-scanned to Θ 1590' such as 8:5 See the scanner manufactured by the company or Canon or Nikko. The scanner 1590 can carry a radiation exposure from the light source 1520 by combining a illuminator 1592, a reticle 1594, and a wafer platform 1596 carrying a wafer 1598. On the wafer platform 1596 is a liquid source 1602, such as liquid water 'having a refractive index different from the environment around the reticle 1594 and the wafer platform 1596' and having a liquid drain hole 1604 for supplying the liquid 1606 to cover the wafer 1598 Used for immersion lithography. It is also necessary to understand the purpose of coherence destruction for excimer or other gas discharge seed laser supply excimer or other gas discharge laser amplifier sections, or for solid state seed lasers, using a combined beam as shown in this case. A plurality of amplifier sections have the advantageous effect of reducing optical coherence, so that the effect of reducing speckle can be obtained in integrated circuit lithography or LTPS or tbSLS processing. It will also be appreciated that one or more of the various coherence destruction techniques and/or combinations thereof discussed herein can be used on the inside of the scanner 1590, whether or not the scanner 1590 is an immersion scanner. Referring now to Figure 58&apos;, a solid state seed laser to gas discharge 1324423 amplifier laser system 1620 in accordance with various aspects of one embodiment of the disclosed subject matter is schematically illustrated in block diagram form. System 1620 includes, for example, a solid state pulsed seed laser 1622, such as Nd:YAG or ND:YLF, pumping tunable solid state laser 1622. The output of the laser 1622 can be passed through a coherence disrupter/frequency multiplier 1626' which is, for example, a single optical component that can both frequency shift and light 5 beam manipulation of the output of the seed laser 1622, as in this case, coherence A detailed description of the damage; or may be a frequency migrator along with a series coherent disrupter, such as as shown in Figure 59. The system also has, for example, an amplifier gain medium such as PA or PO 1624, or for example, has a ring power amplification stage 1624, such as its output 1 〇〇 supply scanner 1590 (as shown in Figure 57). 10 It should be understood that a variety of tuners can be used, such as operating temperatures known to the art; solid-state lasers such as 1064 wavelength Nd:YAG (Nd:Y3Al5〇l2) or l〇53nm Nd:YLF (Doped yttrium aluminum fluoride) or Ti: sapphire laser (tunable from about 650 nm to llOOnm); and/or selected via wire. The desired frequency/wavelength amplified by amplifier portion 1624 can be achieved, for example, using frequency 15 boost converter 1626 to achieve a nominal center wavelength (xeF of about 351, KrF of about 248' or ArF of about 193 and molecular fluorine of about 157). An acceptable Δ λ can be used to allow the amplifier portion 1624 to exhibit an acceptable amplified laser, as understood by the art. As explained above, this type of coherence disruption discussed herein can be used within scanner 1590 or other application tool, such as other lithography tools or beamlet laser annealing tools. Turning to FIG. 59, a solid-state seed laser/amplifier laser system 1620 in accordance with an embodiment of one of the disclosed subject matter is shown in block diagram form, similar to FIG. 69, in which frequency multiplier 1630 and coherence disruption The device 1632 can be used to provide appropriate seed pulses to the amplifier laser portion 1624 俾 127 1324423 in conjunction with, for example, the high coherence of the seed laser output laser beam pulse, and the frequency also shifts to, for example, the gas discharge amplification gain medium of the amplifier stage 1624. The desired frequency/wavelength. Frequency multiplier 1630 and coherence disruptor 1632, as with other configurations herein, may be combined, for example, a single non-linear 5 crystal may be used for both, as is known to those skilled in the art having appropriate drive signals; or multiple crystals may be used, some Some crystals are best suited for frequency conversion, and other crystals are best suited for coherence failure 'position reversal, such as first coherence destruction followed by frequency migration, and vice versa. Turning to Fig. 60, the conversion of the seed laser wheel 10 is schematically illustrated in block diagram form, for example, with a frequency converter 1630 along with a beam splitter 1640, followed by coherence destruction on one axis 'e.g., the long axis of the laser beam, Or if the beam is not an ellipse or an elongated rectangle, the first axis of the beam, and the short axis of the beam or the beam is not an elongated rectangle, the second orthogonal axis has an individual vertical axis coherence breaker 1642 And horizontal axis coherence destroyer 1644,

15 As detailed in this article. The outputs of the coherence disruptors 1642, 1644 can be combined in the beam combiner 1646, as described elsewhere, and can also play a coherent destruction role, as shown in FIG. 31 and/or 37A and B, provided as The seed laser pulse is applied to the amplifier gain medium portion 1648. Otherwise, if a suitable nonlinear crystal is not found for this embodiment, coherence destruction can be performed on one axis, for example, as the coherence disruptor 1642 performs coherence destruction, and the sequence is followed by the coherence disruptor 1644. The coherence of the two axes is destroyed without the need for a subsequent beam combiner 1646. Referring to Fig. 61, a version of the embodiment of Fig. 60 is schematically illustrated in block diagram form, wherein, for example, the frequency conversion system 128 in the frequency converter 1630 occurs after coherence destruction, in other words, between the beam combiner 1646 and the amplifier. Part between 1648. In accordance with various aspects of an embodiment of the disclosed subject matter, the generation of 35 lnm radiation, e.g., coherent 35 lnm radiation, can be performed in a solid state configuration such as a solid state drive (or laser) that drives a linear or non-linear frequency conversion stage. As shown, the generation of 351 nm laser radiation can be achieved by a third harmonic conversion of the Nd:YLF laser output operating at 1 〇 53 nm. In order to use this method as a seed laser for a XeF excimer amplifier/oscillator, it must be ensured that, for example, the nominal center wavelength of the Nd:YLF seed laser main oscillator matches the gain spectrum of XeF (the second line is at 351.12 nm and 351.26 nm). ). Alternatively, a erbium-doped fiber laser can be used as a base to drive a laser seed pulse source. The Yb3+ fiber laser is essentially adjustable, such as J Nilsson et al., "High Power Wavelength Adjustable Spectral Capacitance - Reversing Rare Earth Miao Shi Fiber Laser", 〇pt. Fiber Technol. 1 〇, pp 5 -30 (2004) to allow operation from l〇5〇nm to l〇65nm. Fiber lasers provide a number of simplifications in design that are particularly useful for applications requiring ultra-high reliability such as LTPS or lithography. Applicants have suggested using a pulsed fiber laser system as a medium peak power (5-50 kW) high repetition rate (multiple kHz, for example up to about 12-15 kHz) 1054 nm narrow frequency pulsed source. This type of laser can be composed of standardized Yb3+ pulsed fiber laser technology, which is a q-switched fiber oscillating 2 〇 device, a fiber-amplified pulsed diode source, or modulated (internal or externally modulated) and amplified by fiber. CW source (fiber oscillator or diode). After the 1054 nm radiation is generated, for example, the frequency can be directly increased to about 351.2 nm using a two-stage nonlinear frequency conversion [second harmonic generation of 1054 nm to 527 nm ("SHGj", and then generated by the sum frequency ("SFG"). ), the residual fundamental frequency of 129 is 351.2 nm (having a bandwidth of about ±0.1 nm)]. CW solid-state lasers, for example, have extremely narrow bandwidths (very high spectral purity) such as diode-matched laser-matched fiber lasers to provide extremely narrow-frequency seed-pulsed solid-state fiber lasers for amplifying and fabricating very narrow-frequency pulses. Solid state seed to power enemy level, for example for KrF laser or ArF laser. Proper LMA (Large Mode Zone) fiber technology can be used to degrade the spectrum due to nonlinear effects in fiber laser amplifying oscillators containing fibers or any subsequent amplification stage. Using this approach 'allows for maintaining spatial beam quality (there is a technique to ensure single mode operation of the fibers in the large mode zone) while reducing the peak power at the fiber core.

XeF's fiber-based laser-based solid-state 351nm M0 can also be implemented in accordance with various aspects of one of the disclosed embodiments. ◎This main oscillator architecture may be a simpler and more powerful solution than volumetric solid-state lasers. . Referring now to Figures 62-65, portions of a plurality of implanted 351 nm 15 gas discharge primary oscillator/amplifier gain medium laser system solid state main oscillators are schematically illustrated in block diagram form in accordance with an embodiment of the disclosed subject matter. The surplus is 1700. The main oscillator 1700 includes a Yb3+ doped fiber oscillator or amplifier 1710' having, for example, a diode pump 1712; and a sub-laser such as a 1054 nm CW seed diode laser 1714. Referring to Fig. 62, the main oscillator oscillating cavity can be formed by a back cavity total reflection mirror 20 1720 and a partial reflection output coupler 1722, which can be reflected at 90% of the center wavelength of the fiber disk 1710. The main oscillator 1700 can employ a Q switch 1724 to allow the output pulses of the main oscillator 1700 to accumulate in the oscillating cavity until the energy is high enough to subsequently turn on the Q switch 1724, as is well known in the art. The output of the main oscillator 1700 can be pulsed by a Q switch operating frequency, e.g., about 130 1324423 12 kHz. The output of the fiber oscillator laser 1710 can be passed through a second harmonic generator 1730, followed by a frequency adder 1732, to add the original frequency to the second harmonic to produce a third harmonic, that is, for example, a XeF gas. A discharge laser power amplifier, or a power oscillator, or a ring-shaped power amplifier (not shown in Figures 62-65) is suitable for amplification at a wavelength of about 351 nm. Referring to Fig. 63, a solid state main oscillator 1700 in various aspects in accordance with an embodiment of the disclosed subject matter is schematically illustrated in block diagram form. Yu Ben

In an embodiment, an external amplitude modulator 1740, such as a photoacoustic switch or photoelectric switch or its appropriate mechanism, can be used to apply a pulse of CW seed 1714 to fiber amplifier 1710&apos; to produce a pulsed output of primary oscillator 1700. In the embodiment of Fig. 64, the i〇54 nm seed laser can utilize, for example, a pulsed seed diode 1750 to generate a pulsed output of the main oscillator 1700, for example, at about 12 kHz. In the embodiment of Fig. 65, the tunable cWYb3+ main oscillator 15760 can be switched to a fiber amplifier 1710 having an external amplitude modulator (as discussed above) to obtain a pulsed seed laser wheel from the main oscillator 1700. The fiber amplifier 1710 can pump the fiber amplifier Π10 using the pump diode 1712. Fiber lasers comprise a single fiber or a plurality of fibers, such as a tandem arrangement, as is known in the art, and each fiber is optimized for use in the insertion of its input signal. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicants determined that seed lasers, such as solid-state seed lasers, are used in extremely high average power laser systems, such as for lithography or LTps, to demonstrate various desirable characteristics. Examples include pulse energy, pulse time, and timing jitterers that drive the selection of seed laser 131 1324423, such as solid seed lasers for Nd:YAG, Nd:YLF, Ti: sapphire, and fiber lasers, as it is Discussion. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicants have investigated certain amplification stage cavity properties. On the one hand, there is a single 5 pure spectroscope input/output coupling for a planar planar cavity, which has a simple construction, but may actually consume more seed laser energy than a manufacturing system. Alternatively, a circulating power oscillator or a regenerative power oscillator, such as a ring power amplifier stage, has a beam splitter/mirror input/output coupler. As explained above, skilled artisans are required to understand that the resonator, resonant cavity, etc., when used in a laser system 10 such as the &amp;M〇p〇 configuration, represents an enlarged portion of the laser system seeded by the seed laser portion. A laser is generated due to the stimuli emission of the seed beam pulse from the resonance in the cavity. This can be referred to as a power amplifier distinction, such as the pA portion of the Applicant's assignee's XLA XXX series laser system. Conversely, in the amplification gain medium of the laser system amplifier section, when the seed ray 15 pulse is optically configured, for example, the two-pass optical system used by the current XLA XXX series laser system of the applicant's assignee is excited. The state guides the amplification of the power amplifier by the stimulus emission during the discharge by amplifying the gain medium a fixed number of times. However, in some documents, an amplifier with a closed cavity around the amplification gain medium, such as a bow-tie or a racetrack-shaped loop, is 20 degrees long. The amplifier can be regarded as a "power amplifier" or a regenerative amplifier instead of a "power oscillator." "Therefore, for the purposes of this case and the accompanying patent application, the use of "loop power amplifier stage" - the term is intended to encompass any structure where the power boost stage incorporates a gain medium that encloses the optical cavity. The planar-planar configuration can be used for conventional polarized input/output coupling, such as 132 1324423 polarizing beamsplitters and quarter-wave plates and partially reflective output couplers, as discussed further with reference to Figures 66 and 69. This makes it possible to use seed laser energy more efficiently, but it can also be more sensitive to thermal effects such as high pulse energy and/or high average turn-off power. Other input/output couplings can also be used, as discussed in this case.

Turning to Figures 14 and 16, a very high power (e.g., about 200 W or more average output power) laser systems 280 and 450 in various aspects in accordance with an embodiment of the disclosed subject matter is schematically illustrated in partial block diagram form. . The laser systems 280 and 450 can be used, for example, for immersion lithography applications or for LTPS 10 applications, etc., which can include, for example, the case of Figure 14, including a ring power amplification configuration laser system 280. System 280 includes a sub-laser 286 that provides a seed laser pulse of about 1.0 millimeters or less, and a seed laser output light pulse beam 288 of, for example, a pulse repetition rate of about 6 kHz to the laser output light pulse. A beam 288 from the seed laser 286 can enter the amplifier gain medium portion 290 of the laser system 280 through the seed injection coupling mechanism 300.

The amplifier gain medium portion 290 can include a ring power amplification stage 292 containing a pair of gas discharge electrodes 294, one of which is shown in Figure 14. The cavity 292 also includes an input cavity section 296 and a beam reverser cavity section 298' each of which may be formed in the cavity 2〇292 or attached to the cavity 292 using, for example, a suitable leak-proof mechanism, such as the input section 296. The optical elements and optical elements of the beam reverser cavity section 298 can advantageously be exposed to the laser gas mixture surrounding the cavity sections 292, 296, 298. The seed injection mechanism can, for example, include a beam splitter/input-output coupler 302 that can be coated with a coating, or selected or adjusted to, for example, a name

133 1324423 The target laser wavelength (193 nm for ArF, 248 nm for KrF, 318 for XeCl or 351 nm for XeF laser system) is partial reflection; and a maximum mirror 304 for individual ArF, KrF, XeC or The wavelength of the selected center of the gas discharge laser system such as XeF is the maximum reflection. The beam inverter 310 5 is similar to a power amplifier beam inverter, such as the XLAMOPA configuration laser system, i.e., the XLAXXX system, of the applicant's assignee. Such a beam invertor of XLA-XXX can form a module that forms part of a secondary system of relay optics that, for example, directs the beam from the MO output 'through PA' to the entrance of the pulse extender, And then sent via a shutter through a 10 laser system. The relay optical subsystem can include a MO pre-wave engineering processing/control box ("WEB"), a PA WEB, and the beam inverter module. The beam reverser module receives the beam that is sent out of the back end of the PA cavity and sends the beam through the cavity to the PAWEB at a specific angle and position. The module contains a beam reversal prism 稜鏡 稜鏡 the steering beam returns through the PA cavity, ensuring that the beam is diverted through the pa 15 WEB steering 稜鏡, which in the first case manipulates the beam into the pa cavity.稜鏡 It can be adjusted along the X axis and can be rotated (tilted) around the X axis. Thus returning to the PA cavity in a slightly different optical path' instead of from the PAWEB to the beam reversal, for example as shown in Figures 20-22, whereby for example, the longitudinal axis passes through the same optical path to amplify the gain medium, and on the horizontal axis The different intersecting optical paths pass through the amplification gain medium 20, the longitudinal and transverse lines and the electrodes and the discharge laser amplifying medium gain, and are not necessarily oriented to correspond to true longitudinal vertical or true lateral levels. Thus, the seed beam from the seed laser is optically determined to tilt the double power through the power amplifier gain medium of the power amplifier (not the sealed cavity) as described above. The beam inverter can introduce some micro-angles (several milliradians) 134 1324423 and some slight deviations (several millimeters) into the beam reflected by the PA cavity, so the _beams overlap inside the PA cavity (for example, intersecting the center of the cavity length, the electrode mediastinum The center of the length), while the PA WEB turns to the space. A beam returner in accordance with various aspects of an embodiment of the disclosed subject matter can utilize an optical 5 coating-free inverter. The beam can enter and exit the beam returner near the Brewster angle, and the total internal reflection can occur on the internal reflector surface so that there is virtually no surface loss.稜鏡 must be made of expensive excimers and Cah. Birefringence, volumetric absorption loss, and scattering loss must be considered, but these phenomena are not expected to be a problem. In the input section 296 which is optically accessible through the input window 312, a beam expander 320 can be provided which includes a 稜鏡 322 and a 稜鏡 324 which are common to narrow the beam 288 into the cavity 292. The beam, in turn, expands the beam 288 on the way to the delivery cavity 292, for example, to expand the optical component such as the input/output coupler 3〇〇 during the output; the beam 288 enters the cavity 292 in a narrow manner. The light beam 340 used to narrow the entrance into the amplification gain medium is about the approximate discharge width between the electrodes 294 that are substantially perpendicular to the direction in which the electrodes 294 are separated. The baffle 330, for example, serves to protect the input section 296 of the cavity 292 and the optical elements of the beam reverser section 298 from damage due to debris circulating in the cavity 292 along with the laser gas mixture. 20 inside the cavity of the ring power amplifier stage 290, the beam 288 is advanced by a first direction circulating optical path 340, and in a second direction, the circulating optical path 342 is returned to the seed injecting mechanism 3, where the partial reflection input / The output coupler acts as a conventional output coupler for the oscillator laser cavity, and the reflected portion oscillates the laser photon to the Rmax mirror 304 and returns along the optical path 340. The oscillation in the cavity formed by the sub-injection mechanism 300 and the beam inverter 3i is thus a multi-pass oscillation optical path. As described herein, such an oscillating system is different from the photons in the power amplifier, and therefore passes through the gain medium a fixed number of times, for example, twice in the XLAXXX laser system of the Applicant's Ai Ren, but not along this power 5 amplifier. The light path oscillates When oscillating in the loop/regeneration optical paths 340, 342, a sufficient amount of pulse energy is accumulated, and the laser system takes the laser light pulse beam 1 产生 generated by the seeded power oscillating laser system 280. The seed laser 286 can be a gas discharge such as an excimer or a fluorine laser or a solid state laser. Figure 16 is a block diagram partially showing various aspects of an embodiment according to the disclosed subject matter, similar to the applicant's assignee's XLAXXX multi-cavity mine (four) system configuration - (four) power dump New Zealand The firing system 450' is replaced by a ring power amplifier stage 49A. The laser system 45A can include a quasi-molecular gas discharge laser seed laser 452 which can include a main oscillator laser cavity 454, and a line narrowing module 456 having a reflective element such as a wave 15 length and a bandwidth selective grating A rear mirror is formed, and a portion of the reflective output combiner 458 forms the other end of the main oscillator 452. The main oscillator loose seed laser output laser light pulse beam leaves the output coupler 458, and can pass through the metrology module (line center analysis touch "LAM"), which can use the beam splitter 472 to sample the output of the MO cavity 454 - in addition, In addition to the wavelength meter (20 is not shown in the figure) used to measure the center wavelength of the main laser disc source laser output laser pulse beam pulse, it can also include a M 〇 laser output optical pulse beam pulse energy monitor 474 and ASE monitor 476, such as fluorescent detection benefits. An ASE detector, such as a broadband photodetector, can be used to detect the presence of broadband power with sufficient intensity, indicating that the amplification time in the amplification gain medium is off, 136 丄: 524423, so there is no significant laser in the same frequency band (during discharge) The seed pulse in the amplification stage does not meet the timing), and only a broad frequency laser appears during the discharge of the amplification stage. The main vibrator seed laser 452 outputs a laser beam of light, which is then sent to a turning mirror 480 where it is passed to a seed injection mechanism 300, which is coupled to an amplifier gain medium portion 490, which may include an annular power amplification stage 492, There is a cavity input section 494 and a cavity beam inverter section 496. Those skilled in the art will appreciate that the schematic of the laser system 450 does not reflect the various aspects of the beam path from the 452 to the PO cavity 442. The drawing is a schematic representation of the 10-ply paper plane, rather than the optical path between the two. And the optical reality of the optical path into the amplification stage cavity 492. The seed injection mechanism 300 can, for example, include a portion of the reflective input/output coupler 302', such as a spectroscope sold by a laser system similar to that of the applicant's assignee, for example sold as part of a light pulse extender ("OPuS"), to 15 And a maximum mirror Rmax 304 for a given central wavelength of the name, the partially reflective output coupler 302 is used as an input/output coupler as described above, in particular as a ring power amplifier stage (four) cavity (also defined as a beam inverter) 310) Output face combiner. The seed laser output laser light from the hall 452 is passed through the input window 500 to the toroidal power amplification stage 492, 20 which also passes through the beam expander 510 as shown in Fig. 14 above. The input section 494 of the ring power amplification stage 492 also covers the beam expander 51, which is comprised of, for example, 稜鏡 512 and 稜鏡 514. Other forms of seed injection may be included in the interim patent in the joint review of the application filed on the same day of the case (the priority of the case is requested) and other co-applications for the priority of the provisional application 137 1324423 Or the person who discussed the provisional application for priority in this case. The output of the ring power amplifier stage oscillator 490 can output the laser beam of the laser beam for the total system, but as shown in Fig. 16, the beam (which is ultimately sent to the output beam 100 using a tool such as a scanner) is also measured and measured. a unit (bandwidth analysis module "BAM") 340, here for example measuring the output laser pulse beam bandwidth 'for each pulse in the beam and passing through a pulse extender, such as 4X OPuS 520, which includes, for example, a first The delay optical path 522, the laser system output beam enters through the beam splitter 526, and includes a second delay 10 optical path 524 through which the laser system output beam enters (the delayed optical path formed by the mirror 530). Leaving the 〇PuS 52 〇, the output beam 100 passes through the shutter 540 and also has a beam splitter 542, for example, removing a portion of the laser system output laser light pulse beam 100 to measure, for example, pulse energy. The beam expander 17A of FIG. 3 and the beam expander 142 of FIG. 2 are disposed 15 in the ring-shaped power amplifier stage oscillating cavity, and the input/output coupler of the annular cavity constituting the amplification stages 180 and 144 can be realized. The reduction in energy density on the largest reflector 164 and the partial reflector 162 of 16 turns. The beam reverser 7〇 is moved inside the chamber and the space is used to cover the BAM (or SAM). The need for a light coating can be eliminated, for example, due to a decrease in luminous flux due to reduced luminous flux on the input/output coupler partial mirror 162 and the maximum mirror 20 164, the beam reverser 70 is angled to reduce light damage, such as input and output. It is attached to the Brewster Point to reduce absorption and also spreads the beam over the input and output surfaces. A protective coating is also not required for the large stage chambers 194, 168. Output windows 194, 168 can be oriented at 47 degrees. 138 1324423 At the same time, because the power amplifier stage can achieve strong saturation with lOOuJ MO energy and below, for example, low to about 5μ or less, the output energy stability is controlled by the characteristics of good loop power amplifier stage, not less than ideal. Energy stability characteristics. The Benma XLA XXX ΜΟΡΑ system is dominated by the energy instability 5 . Other output laser beam parameters such as index stability, profile stability, and ASE stability are also advantageously utilized by one of the various aspects of one of the disclosed embodiments to utilize a lower energy output.

In accordance with various aspects of an embodiment of the disclosed subject matter, the Applicant has suggested the use of a 6-mirror coherence destruction mechanism (here, for convenience, the light pulse is delayed by 10 light paths for four mirrors per delayed light path). The mechanism has been developed by the applicant's assignee in the applicant's assignee's XLA model multi-cavity laser system using the OPuS in either or both of the first pulse extender or the second pulse extender Extra light path delay. Such delayed optical paths can produce negative 1 imaging, for example, with odd imaging mirrors. It is shown in cartoon form in Figure η 15 and Figure 8, which is an example of the sum of the sun and moon "flip" sub-pulses. For example, the flip sub-pulse shown in Fig. 8 can be used to improve the degree of singularity and symmetry of the side, for overlapping the output aperture pulses from different sources, for example, the beam combiner. 20,, ~ ~ Yasaki heat needs to be as long as the actual test ship stretched 8PuS - to get far more T, s and overlapping pulses. Instead of the coherence destruction mechanism, the so-called 9: 〇PuS", among many other features, the number of times the pulse can be overlapped = the pulse 580 is m, and the angle 前 (preposition _) is marked as 582 mine, 584, 586, In addition, due to the delay of the optical path in the mirror 2

The 139 beam uncalibrated fraction of the “mirror of the mirror” effect also reduces the coherence of the seed laser pulse, for example as long as the delay path exceeds the temporal coherence of the beam. In this respect, the four-mirror mini 0PUS, for example, a spherical mirror with a confocal arrangement, can be easily calibrated and can be used as a satisfactory coherence destroyer, even if it is described in the present case, there is no beam flipping on the two axes. The basic requirements are, for example, one-axis or multi-axis, in other words, whether or not _丨 imaging occurs, the beam can be mixed by folding. Not only may it appear in the pseudo-PuSS late light path, or the so-called pseudo-OPuS delay optical path, in other words, it has an imaging mirror, and it also appears in the delayed optical path with the plane mirror, so at least the delay optical path comes back, the sub-pulse is relatively The main pulses are flipped over at least one axis and flipped relative to each other. In accordance with various aspects of one embodiment of the disclosed subject matter, it may be desirable to combine two separate laser beams at various points within each aspect system in accordance with an embodiment of the disclosed subject matter, if only the incident to 6 mirrors is displayed Half of the pulse extender 15, the sub-pulse flip between the top and bottom is as shown in Fig. 8, for example. The summation of such "flip" sub-pulses may result in a full-scale side fill that fills up, such as a pulse extension simulation as shown in Figure 41, curve 562 shows the pulse in front of the incident delay light path, and curve 564 (black) is shown in After entering a delayed optical path, curve 566 (red) is displayed after the second delayed optical path is incident. Then the laser 2 is scattered. After several propagations, for example, more than about 1 meter, the center portion 568 is filled. Now, turn to the 40th picture. 'Shows a schematic representation of the thousands of vandalism effects of various aspects of the embodiments in accordance with the disclosed subject matter. Using an imaging delay optical path, such as a pulse extender, such as the so-called optical pulse extender 140 1324423 ("OPuS"), such as the 4X Tis four-sided mirror OPUS sold with the applicant's assignee's laser system, as described above. Examples of patent applications and co-examination applications, or modified versions thereof, shorter delay optical paths, for example, used to fold the beam back, and/or used to extend the coherence length discussed here beyond 5' so-called mini OPuS For example, a coherent destruction condition between M0 and an amplifier gain medium such as a PA or P〇 or a ring power amplification stage can be achieved. Other forms of coherence destruction, such as shown in Figure 31, can be used alone or in combination with such "mini OPuS" as shown in Figure 33 and discussed as the text or mini OPUS itself. 10 In accordance with various aspects of an embodiment of the disclosed subject matter, a pulse extender such as a 4-mirror or a 6-mirror pulse extender, such as a conventional 〇pus such as a 4 χ Tis 〇 PuS or a so-called mini OPC, or discussed in detail in FIG. The delayed optical path 'also includes the pointing/diverging sensitivity of the delayed optical path with some or all of the mirrors being planar (non-imaging), for example by adding active mirror control, with pointing from, for example, Figures 15 42 and 66 The feedback of the divergent sensor can benefit. These advantages include forming a Hall effect of the mirror or maintaining a Hall effect such as a mirror, whereby, for example, the laser output light pulse beam is smoothed on the delayed optical path, actually becoming like a plurality of beams having slightly different orientations, thus having Incident angles incident on the respective mirrors of the pulse extender and/or downstream of the delayed optical path. Applicant's observation of the pulse extender makes it extremely difficult to perfectly calibrate the polygon mirror of the currently used 4X Tis OPuS pulse extender, thus forming the Hall effect of the mirror to reduce the laser output light of the pulse extender. The coherence of the pulsed beam. Such a beam 860a forms a plurality of split beams 862a. Figure 40 shows the reduction in coherence 'e.g., when using the reflectivity of both : (and 〇 1 141 1324423) in a planar-planar cavity, there is a polarization input from the seed laser source of the seed laser pulse. The angle is exaggerated in order to show clarity. For example, static fanout produces multiple rays, in other words, 「c and Rmax form a "mirror effect of the mirror." The theoretical energy of these rays is weighted, assuming that there is no transmission through the cavity. The perfect reflection coefficient is shown below. The ray number can be divided into 1 0.2 =0.200 / JC 1L* HK 0.3125 2 0.8*0.8 =0.640 1.000 3 〇.8*0.2*0.8 =0.128 0.2000 10 4 0.8*0.2*0.2*0.8 = 0.0256 0.0400 5 〇.8*0.2*0.2*0.2*0.8 =0.00512 0.0080 6 0.8*0.2*0.2*0.2*0.2*0.8=0.00102 0.0016

It can be assumed that the ray lines are not coherent with each other, e.g., the optical path 15 between 0 C and Rmax is longer than the time coherence length, e.g., without overlap extension, i.e., much shorter than the pulse length. The rays can also assume, for example, that the angles are slightly different from each other because it is believed that it is extremely difficult to obtain a good calibration, and it is extremely difficult to perform calibration in particular in the longitudinal direction. Applicants believe that the angular difference in the longitudinal direction is about 37 = degrees required for uncalibrated speckle. The regularized energy weight is added to 20 to obtain an equal number of independent pulses, and the square root is taken to obtain the reduction of the standard deviation. The sum obtained by the month J is ^56. The square root is 1.25, so when the standard deviation of 〇C and Rmax is predicted to be 0.551/1.25=0.440, the value of the applicant for the value plate is 0.427. Static fanout, otherwise known as the Hall effect of the mirror, I believe it is roughly 142. When using manual calibration, it is unavoidable that 'static fanout produces a single pulse speckle contrast, which is smaller than the single seed laser in the amplification gain medium. 2.50 times. This reduction is equal to 63 uncalibrated sub-pulses. Part of the contrast reduction is due to the weak line content of the XeF power oscillator 5 used to test the oscillation amplification stage effect, but most of the contrast reduction is due to the static fanout effect. Similarly, the multiple sub-pulses formed by the static fan-out characteristics of the pseudo-PuS reflected by the 0C-Rmax (0C·rear cavity mirror) can all be amplified to nearly equal intensity, thus forming more equivalents as shown in the above table. Independent pulse. Also shown in Fig. 40, for example, having an input coupler having a rear portion of the slightly uncalibrated mirror forming cavity 852a and a beam spreader having a plane-plane cavity 85〇a of an output coupler 854a However, the same effect was also observed by the applicant's employer in the PuS* with the aforementioned coherence-damaging effect. The cavity shown in Fig. 40 also has a polarization input coupler 858a and a quarter-wave plate 856a. 15 The angle of inclination required to produce an uncalibrated speckle pattern is significant. At the first major transition from 1.0 to 1.55 for a fairly pulse, Applicants believe that most of this is due to poor pulse-to-pulse repeatability of the speckle pattern when operating as a ruthenium. Even if the tilt of the mirror is not changed at all, the interaction between the two pulses is not better than 30-35%. Using only seeds, this pulse-to-pulse interaction is about 20-90%. The number of equivalent pulses is slowly increased over a long period of time to a value of about 400 microradians, as shown in Fig. 37, which is less than 2.0. This result indicates that a large angle broom may be required to be approximately ±500-1000 microradians to form a number of uncorrected speckle patterns in a single pulse. Through correlation experiments of coherence, Applicants' employers learned that sub-pulses, such as those produced by pulse extenders, are incoherent, even though their angles are slightly offset, resulting in different sideband patterns, but the delay of the sub-pulses is more time-dependent. Sex length is longer. When the input angle is; l/2d, the pinhole sideband pattern is shifted from the maximum value to the minimum value. Solid-state laser sources have been proposed for lithography in the past, but have not continued to track for two reasons. Solid-state lasers are not considered to be the high average power required for lithography, and solid-state lasers produce a single (mode) output of high (good) coherence. In accordance with various aspects of one embodiment of the disclosed subject matter, the Applicant suggests solving the problem of low average power with, for example, a hybrid solid seed/excimer amplifier combination. In accordance with various aspects of an embodiment of the disclosed subject matter, the high coherence properties of the solid seed can be resolved in a variety of ways, such as by forming a plurality of sub-pulses, the length of separation of the sub-pulses being longer than the length of coherence, Very short time schedules, such as changing the seed laser pointing within a single laser pulse, or a combination of the two. Applicants have found that coherent destruction also facilitates partial laser exposure of a dual chamber gas discharge (e.g., excimer) seed/gas discharge (e.g., excimer) amplifier. Those skilled in the art will appreciate that a device and method are disclosed that utilize, for example, a power oscilloscope or other amplification gain stage, such as a ring power amplifier stage, for use in the DUV wavelength range (eg, XeF is 35 Bu XeCl is 318, KrF is 248, ArF is 193 and F2 is an excimer or molecular fluorine gas discharge laser system of 157), and the device and method for achieving an average output power of a very south average output power, for example, greater than 100 W or more, with little or no significant ASE interference, the same frequency band of the laser system is expected to be light The ratio of the emission output 'such as ASE to the same band radiation is at or below about 5×10·4, for example, 1 〇〇uJ pulse energy input power amplification stage 144 1324423 per pulse.

Cavity. In accordance with various aspects of an embodiment of the disclosed subject matter, the undesired loop power amplification stage optical reverse propagation is also sampled for diagnostic and ASE feedback control. Adding a small amount of line narrowing (e.g., using a prism) tuning to narrow the line also assists in suppressing the ASE from the power amplification stage. In the meantime, according to various aspects of one embodiment of the disclosed subject matter, a PA can be used, for example, together with a solid state M0. For example, a 4-way amplifier does not have an oscillation, but an acceptable amplification, perhaps even a sufficiently high saturation. . With this design, it may take 4 passes to cross the entire gain section by '4 passes. The cavity has 2 稜鏡 on both sides to reduce the energy density of the optical components in the coated cavity, while also providing dispersion to reduce ASE. Furthermore, the final ASE level in the configuration of the primary oscillator or other power amplifier stage does not need to increase as the energy level decreases, so that in accordance with various aspects of an embodiment of the disclosed subject matter, the output can be Even if it falls below 10 μ, it may not result in an unacceptable ASE, for example even if there is no partial 15 reflective off-axis seed injection mechanism and/or no regenerative loop power amplifier configuration. The cavity with beam expansion and intersecting beams can be constructed to form a cavity length that does not exceed the current XLA, such as beam broadening, sufficiently far away from the cavity, to allow lateral cross-translation of the beam, such as a cavity window, for example, depending on beam width and angle of intersection indication. A few centimeters away. The separation of the 稜鏡 and/or the beam reverser optics allows the direct F2 supply to be used, for example, the F2 concentration differs from the F2 concentration of the laser gas mixture, for example about 1% concentration. Contamination of the optical component holder. For example, the inverse imaging effect in an optical 蛑-light path, for example, in a mini-OPuS with a delayed optical path of only about 1 显示 is shown in Figure 37, for example, showing the imaging effect of the input 145 1324423 beam 580a, where the beam angle 隅 582a is initially The square in the lower right corner of the beam 580a is indicated. For the first sub-pulse 584a, for example, the first sub-pulse 584a between the entrance beam splitter and the first mini-OPuS mirror, the beam angle 隅 582a remains the same. For example, the second sub-pulse 586, 5 light beam reflected from the first mirror has been negatively imaged to the second mini 〇 PuS mirror, the beam angle 隅 has moved to the upper left corner, and then to the fourth mini 01 &gt; In the third sub-pulse 588a, the beam angle 隅 has been negatively imaged back to the lower right corner as shown. Combining all of these sub-pulses into one output pulse, with a relatively short optical pulse delay 'cannot be significantly extended by the Tis point of view, depending on the number of mirrors on the delay path 10', the effect of self-reflexing by the beam is still several times The coherence can be substantially reduced. Figure 8 shows the same effect on the beam, e.g., the beam has been split into two halves before entering the two separate sources, e.g., the delayed optical paths of two solid seed lasers operating at X kHz in a 2X kHz system. As can be seen, the two 15 and a half negative imaging images of each sub-pulse result in a further reduction in the coherence of the total output pulse formed, for example, by combining the two halves into a single output pulse of the shape illustrated in FIG. As previously explained, this can also be used as an effective beam combining is/mixer for combining separate beams from separate sources. 20 Referring now to Figure 42, a portion of a beam combiner system 600 in accordance with various aspects of one of the disclosed subject matter is schematically illustrated in block diagram form. The beam pirate system 600 can include, for example, a first amplifier gain medium portion 〇2 and a second amplifier gain medium portion 604, each of which can be a PA or a 〇 of the ring power amplification stage, as described herein. The output of each of the amplifier sections 6 〇 2, 146 1324423 604 can be passed through a beam expander 608 which includes a 稜鏡 610 and a prism 612 to amplify the beam, for example about 2 times. The turning mirror 620 directs the first laser system output light pulse beam 622 from the amplifier 602 to operate the second turning mirror 624, and the mirror 624 manipulates the pulse beam 622 to form a pulsed beam 632 to the first pulse 5 extender 64's beam splitter 642. From the beam splitter 646 of the second pulse extender 644 there. The turning mirror 630 can control the second laser system output light pulse beam 632 from the second amplifier 6〇4 to the second turning mirror 634, and the mirror 634 can manipulate the light beam 632 to form the light beam 634 incident on the beam splitter 642, where The incident beam splitter 646 is incident. The output of the first OPuS and the second 〇pus (which may be referred to herein as "mini 10 〇 PuS") may pass through another beam splitter 650, such that a small portion of the laser beam output from the laser system may be Steering, for example for metrology purposes, is focused by focusing lens 652 on divergence detector 654, which may be part of a control system (not shown) to provide feedback control signal 656 to first OPuS and/or Or a diverting mirror of the second pupils 640, 644 beamsplitters 15 642, 646 or beams 632 ' 634 to ensure that the pointing from the two amplifiers remains substantially overlapping in the far field, so that the beam is shown as a single beam, for example due to OPuS The confocal nature of the two-pulse extender maintains which position to introduce =d. Figure 38 is a diagram showing the effect of changing the beam direction (sweep beam) in terms of coherence/speckle reduction. The pulse extender 662 can receive the laser output laser light beam 100 onto the beam splitter 664, for example by changing the beam splitter angle, to sweep the beam 100 to the diffuser 67A. The resulting detected speckle pattern 680 indicates that the broom can reduce the coherence contrast and thus the speckle. ' ^ 147 % 1324423 Referring now to Figure 66, a partially high-power solid-state seed immersion lithography laser source 7 示意 is shown in partial block diagram, which for example includes a solid seed laser with a high pulse repetition rate such as 12 kHz. 7〇2. The output of the seed laser 7〇2 can be passed through a formatted optical element 704 that includes a lens 706 and a lens 708 that can be used to reformat the beam from the circular beam into a shape that conforms to the shape of the gain medium of the amplifier portion. The output laser beam from the seed laser 7〇2 is then passed through an X-axis optoelectronic ("E-Ο") steering mechanism 712 and/or a y-axis E-0 steering mechanism 714 or both, such as the aforementioned E_〇 unit Modes, each set on an orthogonal axis to each other, a beam broom to apply a reasonable percentage of the orifice of the tool used (eg, scanner 10 or annealing tool), eg, about 1 milliradian, along with a high frequency AC smear voltage' as it is in this case Said. The laser output light pulse beam from the seed laser 7〇2 is then split at the beam splitter to provide an alternating ("tick") input pulse to the individual amplifier gain medium, such as the first power oscillator 730 and the second power oscillation. 730. Power oscillator 730 includes a loop power oscillator. The beam splitter 720 includes a beam splitter 722 that selectively transmits, for example, 50% of the output beam from the seed laser 702 to the steering mirror 724 and the steering mirror 726' into the second amplifier gain medium 730, reflecting 50% to the turning mirror 728. Advancing to the second amplifier gain medium 730, for example, on each pulse, the beam splitter 20 720 also includes a folding mirror 728 or a folding mirror that, for example, the photobeam detector or the photoacoustic beam detector are alternately actuated to transmit light onto the alternating pulses. 724. Each of the gain amplifier media 730 can include, for example, a power amplification stage 732, an input coupler/rear chamber 734, such as a concave mirror having an aperture on the mirror axis, allowing the seed laser beam to enter the back mirror 734 and the anterior mirror

The interior of the cavity formed by 148 736 is referred to as an unstable oscillating cavity as in the art. It is to be understood that the amplifier gain medium can be in other configurations as described herein, such as a stabilization resonator having a seed injection mechanism, discussed in the co-examination and concurrently filed with the aforementioned application; and, for example, a ring power amplifier stage or a power amplifier , without resonator cavity 'as known in the art, only fixed lateral optical path for amplification, while the gain medium is excited (for example, there is a reverse group), and no laser oscillation occurs. In other words, the laser oscillation cavity is known in the industry. Does not contain an output lighter. In an oscillating cavity environment, for example, a convex mirror may be replaced by an input coupler such as a seed injection mechanism as discussed in detail herein; the convex mirror 736 is replaced with an output coupler. Individual beam expansion, beam combining, and coherence destruction and divergence measurements (eg, considering ASE) from the wheeled beam 766 of the first amplifier gain medium 730 and the output beam 764 from the second amplifier gain medium 730, and back The control can be as discussed in FIG. 21, which is for example a beam expander 740 comprising 稜鏡 742 and 744, a mirror 750, 752 comprising a first gain source 730, and a second amplifier. The beam combiner of the mirrors 760, 762 of the gain medium 730, and the pulse extenders 64A and 644 and the metrology unit 654 are discussed. Figure 39 is a schematic illustration of the results of a coherent 2-destructive system for outputting laser pulses, such as in the horizontal and vertical directions (as shown on page 39). Point 780 illustrates the initial seed laser output pulse side write 780. The pattern of the pulse 782 is such that after the beam is folded over the smooth path of the perfect calibration beam, or by the uncalibrated pulse stretcher or both sub-pulse pattern side 782' or a combination thereof, and the circle 784 around the points represents the pair The effect of photoelectric painting on the side. 1324423

Figure 67 shows, in partial block diagram form, a toroidal power amplifier stage oscillator system 1800 and a seed injection mechanism 1812, as discussed herein. Laser system 1800 includes, for example, a bow-tie shaped ring power amplifier stage 1804 and a seed laser such as a solid state or gas discharge seed laser oscillator 1802. The seed 5 oscillator 丨8〇2 can be separated from the oscillator cavity of the power amplifier stage 1804 by a spacer to prevent undesired lasers from returning photons, such as with a suitable seed injection mechanism 1812. The power amplification stage section 1804 includes, for example, a power amplification stage 1810, a seed injection mechanism 1812 that includes, for example, an input/output consuming device 1814 and a maximum reflection ("Rmax") mirror 10 1816 'beam nebulizer 1820 inverts output beam 1806 from seed oscillator 1802 into amplifier portion cavity 1804, also including beam inverter/returner 1820, which may include, for example, first maximum mirror 1822 and second mirror 1824, for example by Rmax The mirror 1816 is made of a material selected for the maximum reflection center system wavelength (e.g., XeF is 351, XeCl is 318, KrF is 15 248 'ArF is 193 and F2 is 157). As described in detail herein, the seed implantation mechanism and beam returner can be configured to form a vibration chamber of the power amplification stage 184 (which may be referred to as a vibrator or amplifier oscillator stage depending on the length of the cavity). It is to be understood that the deflection angle of the beam 826 '828 is greatly exaggerated for illustrative purposes and may be approximately 1 microradian. 20 Section 68 is a block diagram representation of a solid state seed/power amplifier laser system 1880 in accordance with various aspects of one embodiment of the disclosed subject matter. The system can incorporate a solid 12icHz seed laser 1882 and a pair of amplifier gain media, such as a pair of power amplifier cavities 1888. The optical interface module 1884 receives the output of the seed laser 1882 and tweaks the seed laser into a 150 individual amplifier gain medium 1888, for example, on an alternate pulse. The optical interface module 1884 can include a pair of cylindrical telescopes 1886 that can be used to format a beam of light, for example, because the output can be astigmatic, using a telescope to remove astigmatism. ' Also includes, for example, an input optical module 1890 that each includes a mirror 1902 A mirror 1908 and a mirror 1910, which together with the mirrors 1904 and 19〇6, are formed in an amplifier gain medium assembled as a three-way power amplifier ("PA"), through a fixed number of times between electrodes, for example, between electrodes ( The gain medium is not shown in Figure 68 three times, in other words, the laser gain medium does not exhibit laser vibration. The individual outputs of the individual power amplifiers 1888 can be manipulated on the one hand by the beam steering mirrors 1930, 1932, and on the other hand by the individual energy sensors by the beam steering mirrors 1934, 1936. The output beam from the system 188 can be used in the beam combiner. Combinations, as discussed in this article. The coherent destroyer, for example, the input optical element module 89, the automatic biaxial angle adjustment mechanism 191 that modulates the tilt angle of the individual mirror 910 can be used as an X-axis and γ-axis beam steering optoelectronic component similar to the embodiment of FIG. 66. For similar purposes, 1712, 1714, for example, the beam incident on the amplifier gain medium is bounced by side brooms and/or brooms up and down, thus obtaining coherence damage as discussed herein. Turning now to FIG. 69, a partial block diagram format illustrates various aspects of an embodiment of a disclosed subject matter, a seed laser/amplifier gain medium laser system, such as a solid seed/power amplifier stage laser. System 1950. The system 195G includes, for example, a seed laser such as an @state 丨 2 kHz seed laser 1952, the output of which can be shot by an optical interface module, such as the first ray. Input Handle 1324423 The module I960 includes, for example, a polarization beam splitter 1962, an Rmax 1964, a quarter wave plate 1966, and an input coupler Rmax mirror 1968 that collectively function to couple the output of the seed laser 1952. That is, individual seed beams 1970, 1972, for example, are coupled into an individual gain amplifying device using polarization coupling, such as a power amplifier stage oscillator having an output coupler 1982. The turning mirrors 1984, 1986, 1994, 1996 are used for the same purpose of the individual turning mirrors of the embodiment of Fig. 68.

Figure 70 shows an exemplary gauge strength 1000, a regular single pass strength 1002, and a regular double pass strength 1004. 10 Figure 71 shows an example giant control pulse 1010, which may include a plurality of alternating high DC and low DC voltages 1010, 1012, and 1014, as shown in the figure, which can be repeated in a certain pattern with three different high voltages, and a stack The AC high frequency control voltage 1016, which may occur at the local voltage and low voltage. As shown, for example, high voltages can have different pulse times, and there are 15 intervals between different low voltage times. As shown in Fig. 73, the high voltage 1032 has the same value and has the same low voltage time interval 1〇36 as the stacked AC 1034. Figure 72 is a block diagram showing an optical switching and smearing system in accordance with an embodiment of the disclosed subject matter. The system 1 〇 2 〇 can include, for example, a solid seed 1022, a frequency converter. 1 〇 24, and a light 20 switch and applicator 1026, which may include a photo beam director, which directs the beam into the amplifier gain when the pulse as shown in Fig. 73 is high (Fig. 73, Fig. 1 〇 32) The first of the media 1030; and deflecting the beam into another amplifier gain medium 1〇32 when the pulse is low (1036 in Fig. 73); and also applying the AC beam directing 1034 to each of the amplifiers 1030, 1〇32. The second frequency shift 152 1028 can be interposed between the beam splitter/applicator 1 〇 26 and the individual amplifier gain medium 1032, with the exception of the frequency shift of the elements 1 〇 24 for additional frequency shifting or replacement of the frequency shift of the element 1024. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicant mentions that solid state seed lasers are utilized to generate 193 nm laser light, such as solid state seed driven lasers that can drive linear or nonlinear frequency conversion stages to produce solid state Configure the coherence of 193 nm radiation. One possible seed-driven laser is a pulsed Yb fiber laser that emits a laser of about i〇6〇nm in the area of 1〇5〇1〇8〇mn. Such lasers constitute a mature and powerful fiber laser technique, such as a short time pulse (1-5 nanoseconds) that can be generated at a repetition rate of multiple kilohertz. In order to use 193 nm as the longest wavelength hybrid source to produce 193 nm, Applicants have suggested using a combination of long wavelength and medium short wavelength frequencies ("SFG") to generate deep ultraviolet light in accordance with various aspects of one embodiment of the disclosed subject matter. Light ("DUV"). Due to the current lack of a 236.5 nm light source as the other mixed wave 15 length, the second harmonic ("SHG") cannot be generated to reach 193 nm. However, such a light source can be derived by the fourth harmonic generation ("FHG"), and the fourth harmonic is the 946 NM output of the q_switched diode pumped Nd:YAG laser (946 nm is the lower of Nd:YAG) Efficiency changes).

The Nd:YAG output is primarily a fixed wavelength, and the total fine-tuning capability is provided by the output wavelength of a micro-tuned Yb fiber laser such as a Yb+3 fiber laser. The fine tuning of the Yb fiber laser output can be obtained by a CW diode seed laser such as the New Focus Vortex TLB-6021. Such a diode laser seeder is desirable for lithography source applications, such as through the internal PZT control of the reflector to provide fast wavelength control over a limited wavelength range, and has a 1324423 hyperspectral purity. The Nd:YAG laser can operate at multiple kilohertz repetitions to ensure that the total system repetition rate meets the actual excimer laser injection source recovery rate requirement. In order to achieve narrow bandwidth operation, the two laser sources must be individually narrowband. 5 In the Nd: YAG system, for example, it can be achieved by (^ lower power γ Α〇 laser injection seeding, for example, the non-planar ring oscillator architecture is achieved by single-slim mode output operation. Yb fiber laser In this case, the bandwidth is ensured via the CW diode laser seeder, which is typically operated at very narrow line widths, for example about 100 MHz FWHM. In addition, a suitable large mode area ("LMA") can be used. Fiber technology to reduce the degradation of the spectrum due to nonlinear effects in fibers containing fiber laser oscillators or any subsequent amplification stage. To generate 193.4 nm radiation, as shown in Figure 76 in partial block diagram No, a system 12 〇〇 includes, for example, a 946 nm seed laser such as 946 15 CW Nd:YAG seed laser 1202 seeding one pulse type 946 nm: γΑ(} laser 1204, Nd:YAG laser 1204 output frequency The frequency converter 1206 is multiplied by a frequency converter 1206, for example, including a frequency multiplier 12A such as a nonlinear material such as an LBO or KTP crystal; followed by another frequency multiplier (not shown) or a third harmonic generator 1210. Fourth harmonic Wave generators 1212 20 (eg, each using and frequency generating with residual pumping radiation, for example using a crystal) either can be generated at a fourth harmonic of 236.5 nm. The 236.5 nm radiation is then finalized. The nonlinear crystal mixing stage, the sum frequency generator 1240 such as a CLBO or BBO crystal, for example, is mixed with the Yb fiber laser at a frequency of 和60 nm in the sum frequency generation, that is, for example, 1/ι〇4〇(·〇〇〇943)+ 154 1324423 1/236.5 (.00423) = 1/193.3 (.005173). The fiber laser 1222 can have a rear oscillating mirror 1224 and a front window 1226 with a Q switch 1228. CLBO is lithium bismuth borate, which is Nd:YAG The output of the effective fourth or fifth harmonic generator can be phase matched up to 193 nm operation with a damage critical value of 5 > 26 GW / cm 2 . BBC ^ shed acid (b-BaB2 〇 4), which is available One of the most diverse nonlinear optical crystal materials, most commonly used in Nd:YAG, Ti: sapphire, argon-ion lasers, and second or higher harmonics of alexandrite

Health. CLBO can be used, for example because of its high transparency and high acceptance angle, but requires phase-matched cryogenic cooling, which is a problem with CLBO as a hygroscopic material. Another alternative is BBO, which is phase matched but operates at an absorption band edge that is very close to about 190 nm. The BBO also has a much narrower acceptance angle than the CLBO, but can be processed via optical design, for example using an image focus. In accordance with various aspects of one embodiment of the disclosed subject matter, the two lasers 1024, 1022 can be relatively powerful, such as the actual output power being greater than about 25 kW, and any inefficiencies of the auxiliary compensation I5 for the nonlinear frequency conversion stages 1206, 1204. According to the disclosed subject matter, the production of 193.3 nm by a solid-state laser seeded excimer amplifier gain medium can also be achieved, for example, using a mature-driven laser technique, which can be fine-tuned in a manner similar to the current fine-tuning of excimer lasers. Figure 77 shows a seed laser system schematically shown in partial block diagram. The 1200' includes, for example, an Er fiber laser 1260, such as a laser of about 1550 nm, but can be fine tuned in the range of 1540-1570 nm. Er fiber lasers are available and use a technique similar to Yb fiber lasers. This approach is attractive because fiber laser technology and pumped diode laser technology in this wavelength range can be applied, for example, to fiber-based telecommunications, such as erbium-doped fiber lasers or 155 EDFAs for fiber optics. Communication acts as a signal booster. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicants have suggested using pulsed fiber laser oscillator 1260 as a medium peak power (e.g., 5-50 kW) high repetition rate (multiple kilohertz, e.g., at least 丨 2 kHz H 546 5 nm The source of the 5 乍 pulse-pulse lasing. The laser 1260 can also be composed of standard pulse fiber laser technology. 'Using single-mode CW fine-tunable narrow-frequency diode laser 1262 as the injection of fiber laser oscillator 1260 To ensure narrow-wavelength single-wavelength performance while also allowing for fast wavelength fine-tunability required for lithography source applications. One example of this type of diode laser seeder 1262, such as the new 10-focus vortex TLB-1647' Cavity diode configuration with ρζτ wavelength actuation for high-speed wavelength driving in a limited wavelength range, in parallel with mechanical drive for extended wavelength range operation. In addition, appropriate large mode region (“LMA”) fiber technology can be used to reduce spectral degradation , for example, due to nonlinear effects in fibers containing fiber laser oscillators or any subsequent amplification stage, the spectral drop can be reduced, and Maintaining spatial beam quality with single mode operation to ensure fiber in the large mode region, while reducing the peak power of the fiber core to produce radiation at 1425 nm, then the frequency can be directly upconverted to 193.3 nm, for example using nonlinear frequency conversion The second harmonic generation or the sum of the frequency generation is directly up-converted. It can be up to 2 by the steps listed in Figure 78. One of them is illustrated in Figure 77, where $ω refers to j 546.5 nm. 8 ω becomes 193.3 nm ° in Fig. 77 shows the generation of 1546 5 fine white waves in SHG 12() 8 and the generation of the third proof wave, for example, adding the fundamental frequency to the second spectral wave at SFG 1258 to obtain ^ In the fresh multiplier (2) 8 frequency multiply 3ω to obtain 6ω 'and then in the coffee and (2) 4 just before 1324423 to describe the similar frequency generation technique to obtain 7ω and. In addition, according to the various aspects of the embodiment of the invention 'For example, a relatively low-power pulsed fiber laser inductor output for spectrum/wavelength control by diode lasers' can then be enhanced by a fiber amplification stage (not shown) and 5 in peak power. People also suggest that based on this Approach to the development of all-fiber solid-state drive lasers. Turning to Figure 47, a block diagram shows a laser processing system such as LTPS or tbSLS laser annealing system for low temperature melting and recrystallizing glass substrates. The system 1〇7〇 may include a laser system 20 such as that described herein, and an optical system 1272 to convert the laser output light pulse from about 5 x 12 mm to about 1 〇 micron x 3 9 〇 mm or Longer beamlets are used to process, for example, workpieces that are attached to the workpiece handling platform 1274. Already in seed laser energy, ArF chamber gas mixture, output coupler inverse 15% (cavity Q) and seed laser pulses Different values such as time test the MO/amplifier level relative to the MO/amplifier stage time, and the results are as illustrated in Fig. 7. Different values have been tested for the laser energy of the seed, the ArF cavity gas mixture, the output reflectance reflectance percentage (cavity Q) and the seed laser pulse time relative to the MO/amplifier stage time. The result is also illustrated in Figure 7. . 20 Referring to Figure 7, an illustration of the timing and control deduction rules for various aspects of an embodiment in accordance with the disclosed subject matter. The output of the laser system in the diagram can be expressed as a function of the differential discharge time in the seed laser cavity and the amplification stage, such as the ring power amplifier stage, which is the curve 600a, which is referred to herein as dtMOK) The amplification level in the configuration is not strictly p〇,

157 1324423 is instead a PA, but there is oscillation, as opposed to the number of times fixed by the gain medium. The applicant's assignee has traditionally referred to it as a power amplifier, that is, the applicant's assignee's ΜΟΡΑ XLA-XXX model. The PA in the shot system is due to the relationship between the length of the loop path and the integer multiple of the nominal wavelength. A representative curve of the function of dtMOPO generated by the amplification stage of the laser system is also shown as curve 602a. In addition, a curve 604a is displayed indicating that the output bandwidth of the laser system is a function of dtMOPO. The limit 'selected for ASE' is also shown as curve 606a. It will be appreciated that the operating point of time oil line 10 can be selected at or near the lowest extreme of ASE where control selection by dithering dtMOPO is used, for example, to determine the system operating point on operating curve 602a. It can be seen that there is considerable margin to operate near the lowest limit of the ASE curve 6〇2a while maintaining the output pulse at the top of the equivalent plane of the energy curve, for example to maintain the output pulse energy and energy σ of the laser system, and the associated dose and dose (J The constant is within 15 tolerances. In addition, 'dtMOPO can be used simultaneously to select the bandwidth from the bandwidth range without disturbing the aforementioned E control. Regardless of the nature of the seed laser used, ie solid state Seed or gas discharge laser seed laser systems can achieve this project. However, if solid-state seed lasers are used, there are several techniques to select (control) the frequency of the seed lasers, for example, by controlling the seed mine. The degree of pumping or any other means known in the art. Such pumping power control, such as placing the pumping power at a laser threshold to select the bandwidth. The choice of such bandwidth may migrate or change. The correlation value of curve 604a, but the laser system is still suitable for the aforementioned £ control type and BW control type, using dtMOPO to select BW and simultaneously selecting operation S) 158 1324423 points, which can Holding the laser system output pulse energy curve can be shown in the 6〇〇 stable flat top region of the piece goods and a more or less constant value. Non-cw solid-state seed lasers can also be used, as well as adjusting the output bandwidth. For example, selecting the output oscillator reflectance (cavity-Q) of the main oscillator cavity can adjust the output bandwidth of the seed laser system. Pulse trimming of the seed laser pulse can also be used to control the total output bandwidth of the laser system. As can be seen from Figure 7, the selected ASE upper limit or energy curve that maintains a flattening with dtM〇p〇 may limit the range of available bandwidths selected. The slope and position of the BW curve may also affect the available operating points on the time curve to maintain a constant energy output and a minimum ASE, while also selecting the bandwidth from the available bandwidth range by using the dtMOPO operation value selection. It is also known that the pulse time of a discharge pulse in a gas discharge seed laser, such as the pre-guided wave control, can be used to select the nominal bandwidth from the seed laser, so that the slope and/or position of the 8 \\ curve 604 As shown in Figure 7. In accordance with various aspects of an embodiment of the disclosed subject matter, it is desirable to select edge optics, i.e., optical components that must be used, so that it may be difficult to apply to the edges thereof. Such an optical element is, for example, required between the output coupler 162 shown in Fig. 2 and the maximum reflector shown in Fig. 2, for example, 164, and the seeding shown in Fig. 2 is formed in accordance with the separation between the two. One version of the mechanism 160 is inserted because the spacing between them may be too small to use edge optics. If so, the edge optics must be selected to be Rmax due to the ray path of the beam as it passes through the OC portion 162. From the viewpoint of coating, since OC has fewer layers, it is preferable to make 〇c an edge optical element. However, in accordance with various aspects of one of the disclosed subject matter, 159 (S; 1324423 has chosen another design, shown schematically in Figure 30, for example, where edge optics are avoided, such as if the output and input ring The power amplifier stage provides a large enough spacing between the beams, as formed by the beam expanders 142, such as 稜鏡146, 148, shown in Fig. 2. For example, the spacing between the two beams is about 5 mm. 5 Determination is sufficient to avoid using any edges. Optical element.

As illustrated in FIG. 46, a laser system, such as system 110 of FIG. 2, may use a ring power amplification stage 144 to generate a laser system output pulse beam 100' to amplify the output of main oscillator 22 in ring power amplifier stage 144. Beam 62. The various aspects of an embodiment of the disclosed subject matter show further details. The beam expander/disperser 142 can include a first expanding/dispersing prism 146a and a second expanding/dispersing 146b and a third稜鏡148. The seed injection mechanism 160 can include a portion of the reflective input/output coupler 162 and a maximum reflectance (Rmax) mirror 164, illustrated and partially illustrated in the plan view of FIG. 30. In other words, the top view seed injection mechanism and the beam expander I5/dispersion The device 160 and the annular power amplifier stage (not shown) through which the beams 74 and 72 pass are viewed from the axis of the output beam 62 from the main oscillator cavity 22 as being positioned above the cavity 144 in this embodiment. The beam 62 has been folded over the generally horizontal longitudinal axis (as shown) and the beam is also folded on the short axis at MOPuS (also known as MO WEB, with mini 〇pus and beam 20 expander as discussed herein), as in this paper It is described so that its cross-sectional shape is roughly square. For the configuration of the beam expansion 稜鏡1463, 146b and 148 on the inside of the ring power amplifier stage, a similar configuration can also be provided to the applicant's assignee's power amplifier in the XLA-XXX model laser system (" The beam expansion of the pA") stage output S) 160, for example, has a 4x expansion, for example provided by a 68 6 degree angle of incidence and an i degree angle of exit 'for example on a single turn, or on the second turn, the same Angle of incidence and angle of exit. This can be used to balance and reduce the total Feznier loss. Reflective coatings such as anti-reflective coatings can be avoided on such surfaces, 5 for which the highest energy density in the system will occur. In accordance with various aspects of an embodiment of the disclosed subject matter, the beam expander/disperser 160 can be implemented by splitting the first pupil 146 to the smaller pupils I46a &amp; 146b, as shown in FIG. 146a and 146b are, for example, 33mm beam expanders of the carrier head, which are fitted in a position with a similar angle 稜鏡 fit, and the splitting 10 稜鏡 has several advantages, such as lower cost and better calibration and / or manipulate the beams 72, 74 (combined in a beam inverter (not shown in Figure 3)) and the system output beam 100. The main oscillator seed beam 62 enters the seed injection mechanism 16A, and the optical element 162 is partially reflected by the beam splitter as an input/output coupler, until Rmax 15 I64 is reflected by Rmax 164 into beam 74a to the first beam expander稜鏡 146a' is used to amplify the beam by about 1/2 times on the horizontal axis (mainly about 1 〇 η mm on the longitudinal axis of the paper plane in Fig. 30). The beam is then directed to a second beam expander 148, such as a 4G millimeter beam expander prism, where it is again released about 1/2 times, so the total release magnification is about 1/4 times the magnification. Forming a loop into the loop power amplifier stage (not shown in the % map ice gain medium beam 74. The beam is reversed by the beam reverstor, for example, currently used by the applicant's assignee [Α·ΧΧΧ(4) laser system PA The beam reverser is reversed, and the beam 72 enters the 稜鏡 (4), for example, in a bow-tie configuration in the gain medium, or in a roughly parallel advancement, perhaps with a ride 1324423

The version of the configuration overlaps to some extent. Since 148, beam 72 is expanded by a factor of about two, beam 72b is directed to 稜鏡 142b and further expanded by about 2 times into beam 72a. The beam 72a is partially reflected back to Rmax as part of the beam 62a and partially transmitted as the output beam 100, and the energy is slowly increased to obtain an output beam pulse of sufficient energy via the laser oscillation of the ring power amplifier stage. The narrowing of the beam entering the amplification gain medium, such as the ring power amplification stage, has several excellent results, such as limiting the horizontal width of the beam to the approximate width of the gas discharge between the electrodes in the gain medium. In the bow-tie configuration embodiment, the displacement angle between the beams is too small, each of which is substantially within 10 discharge widths of a few millimeters, even if the respective horizontal width is about 2-3 mm; and the implementation of the racetrack configuration In the example, beam 72 or beam 74 passes through the gain medium only once and again, or the beam can be further narrowed or discharged widened. The positioning and calibration of 稜鏡 146a, 146b, and 148, particularly 146a and 146b, can be used to ensure that the output beam 1 来自 from the loop power amplification stage is properly calibrated to a laser output optical train that faces the shutter. The beam size leaving the input/output coupler 162 can be fixed, for example, by horizontally selecting the aperture 130 in the horizontal direction to form the system aperture portion (in the horizontal axis portion) to about 10.5 mm to fix the size. In the aperture, for example, the rough position of the XLA-XXX laser system product of the PAWEB, such as the Applicant's assignee, may determine the size of the beam at a vertical dimension of 2 degrees. Since the beam has a divergence of about 1 milliradian, the dimensions of each dimension are slightly less than the actual beam size desired for the shutter, such as slightly less than about 1 mm. In accordance with various aspects of one embodiment of the disclosed subject matter, the Applicant suggests that the system limit aperture is just behind the main system output 〇puS, e.g., 4X OPuS. The annular power amplifier stage orifice can be located approximately 500 mm further inside the laser system. This 162 1324423 item is too large to avoid pointing changes, and changes to the position of a particular measurement plane (the system orifice). Instead, the system's limiting aperture is located just behind the OPuS and has a 193 nm reflective dielectric coating that replaces the commonly used stainless steel. This design allows for earlier optical calibration while reducing the 5 孔 of the orifice. In accordance with various aspects of one embodiment of the disclosed subject matter, the Applicant suggests a discussion of a U.S. patent application in the co-examination of the aforementioned co-examination or the same as that of the U.S. patent application. At least on the side of the beam nebulizer for the cavity, because the PCCF coated window is used at this location. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicants have suggested that ASE detection, such as backpropagation ASE detection, be placed in the LAM or placed in the M0 pre-guided engineering box ("WEB") or so-called m〇pus, It includes 15 pieces of m〇weB elements from the applicant's existing XLA-XXX model laser system', together with the mini OPUS discussed in this case, and beam expansion, for example using one or more beam extensions δ稜鏡 is the output beam of the short-axis expansion, for example, forming a beam having a substantially square cross section. The current M〇 WEB and its beam steering function are schematically represented as a turning mirror, such as the turning mirror 44 shown in Fig. 22. Preferably, however, the backpropagation detector can be "placed" by M〇20 WE dirty OPuS, in other words via a folding mirror (referred to as stack #2), for example, the folding mirror 44 of Fig. 2 has a reflection coefficient R = 95% instead of R = 1〇〇%, and monitoring for light leakage through this mirror 44. It can be tolerated that this reading has some drift or inaccuracy, because it can be used as a stroke sensor (that is, when the condition is acceptable, there is almost no reverse ASE (10) G.GG1 milli f, measured near the ear, not when the condition is unreachable 163 c S ) 1324423 Timed, reverse ASE, measured at approximately ι〇mJ). For example, when the ring power amplifier does not time-amplify the seed pulse, the wide-range laser light still forms a drift and inaccuracy of the reading. Existing controllers such as helium controllers, cables and ports can be used for new detectors. The detector can be used by the applicant's assignee for measuring the beam intensity of an existing XLA-XXX model laser system, such as a laser system outputting a shutter to measure the beam intensity. In accordance with various aspects of an embodiment of the disclosed subject matter, one or more of the mini-OPuS may be confocal, and thus highly tolerable uncalibrated, thus having 10 possible low aberrations, such as for the short 0PuS indicated The required off-axis ray The so-called mini OPuS has the potential for low aberrations, and when more than one mini OPuS is used, it can have a delay time of 4 nanoseconds and 5 nanoseconds. Using these values, the two OPuS have low front guided wave distortion using spherical optical elements in addition to the appropriate delayed optical path with coherent destruction. The low leading wave demand, 15 does not actually prevent significant speckle reduction from the mini OPUS unless special equipment is used. 'Using special equipment, for example, to replace the planar/planar compensation board with a slightly shaped plate, resulting from the mini 〇 The angular fan-out of the PuS output 'allows the transmitted beam of the mini-OpuS and the delayed beams are slightly angularly offset from each other. Other means may be employed, such as beam flipping on any-axis or tri-axis, 20 such as top-bottom flip, or left-right flip, imaging, combination of top-bottom flip and left-right flip, and beam translation (shear), for example This is achieved by removing the compensation plate, as described in the above-mentioned co-examination of the patent application entitled "Confocal Pulse Extender", application number ii/394,5 i 2, agent number 2〇〇4 〇i44 〇i, The application is as described in March 31, 2006; or it is achieved by adding a second compensation plate to the second axis, for example, 164 1324423 orthogonal to the first axis.

The laser beam, for example the laser beam from the main oscillator, is partially coherent, resulting in speckle in the beam. The reflected beam that is re-entered into the mini-OPuS output with the transmitted beam angular direction, separated from the delayed optical path of the main pulse, becomes the main pulse and the sub-pulse, and an extremely significant speckle reduction can be achieved on the wafer or on the annealed workpiece. Laser source pulsed illumination work piece (wafer or crystallized panel) reduces coherence. Thus, for example, by delaying the path mirror to be uncalibrated, it may not be possible to have a confocal arrangement, but also adding a slightly wedge in front of the beam splitter on the retarding path, and reflecting a portion of the delayed beam 10 into a transmitted beam and Its parent pulse and the output of the previous sub-pulse (if any). For example, a 1 milliradian wedge in the plate can produce an angular offset at 0.86 milliradians of reflected sub-pulse beams. The optical delay optical path of the Mini OPUS provides other advantageous results in terms of laser performance and efficiency. In accordance with various 15 aspects of one embodiment of the disclosed subject matter, as shown schematically in Fig. 48, a laser beam from a laser source (not shown in Fig. 48), such as seed beam 500, may use a partial mirror ( The beam splitter 510 splits into two beams 502, 504. The beam splitter 510 splits a certain percentage of the beam into the main beam 502 and the remaining beam 500 into the optical retarding path 506 as the beam 504. The transmitted beam portion 502 continues to advance to the remainder of the 20 laser system (not shown in Figure 48). The reflected beam portion 504 is directed along the retarding path 506 to include mirrors 512, 514, and 516, in which the mirror 514 is eccentric to the paper surface to allow the main beam 502 to re-enter the rest of the laser system, e.g., to form a laser output beam. , or zoom in at the subsequent magnification level. The beam 504 is then combined with the transmission portion 5〇2 of the original beam 5〇〇 again by 165 1324423. The delayed beam 504 can pass through a wedge (compensation plate) 520 that is disposed substantially perpendicular to the optical path of the beam 5〇4. Thus, the sub-pulsed light beam 504 from the delayed optical path 5〇6 is slightly angularly displaced by the main portion of the far-field transmitting portion 5〇2. The displacement can be, for example, from about 50 microradians to 5 turns microradians. 5 The length of the delay optical path 506 will delay the beam pulse so that there is a slight time offset between the transmitted portion of the beam and the reflected portion, e.g., greater than the coherence length, but much less than the pulse length, e.g., the time offset is about 丨 5 nanoseconds. The delay time is determined by selecting the appropriate optical path length, the two beams are increased, and the pulse energy is spread to a slightly longer Tis' which is combined with the subsequent pulse extension of the main OPuS, which can improve the laser performance and provide other advantageous advantages. Laser performance results. Two mini OPuS may be needed to achieve the desired effect. The deviation time between the pulses from the two mini Ο P u S is, for example, 丨 2 nanoseconds. Based on the optical test and mechanical considerations, the delay selected for the extender is, for example, a 3 nanosecond delay optical path for the first mini OPuS, and a 4 nanosecond delay 15 optical path for the second mini 〇 1 &gt; 113. If the delay is short, for example, if the optical system uses a confocal mirror or a spherical mirror, unacceptable aberrations may be introduced. If the delay is long, it may be difficult to embed the system into the available space in the laser box. Achieving a 3 nanosecond delay beam must travel a distance of 900 mm, a delay of 4 nanoseconds must travel a distance of 12 mm. Confocal optical system 5 〇〇 reduced sensitivity to uncalibrated, shown in Fig. 49 The confocal optical system 5 is composed of two mirrors 522, 524 whose focus is at the same position of the space, and the center of curvature is located on the opposite side mirror and has a beam splitter 526. A compensating plate 53 (e.g., a wedge) may be added to ensure that the reflected and transmitted beams are slightly uncalibrated, as previously described in Figure 49. In this case, the compensator plate is placed on the optical path of the delayed beam. ...the length of time in the mini OPUS for coherence destruction and for other purposes, the length of the light path can be as short as about coherence as long as the optical test 5 can be used to measure such as uncalibrated and aberration tolerances. It is practical. There are two or more mini 〇puS on the right, and the respective delay optical path lengths 2 must be different, for example, greater than the coherence length, and are selected to be significant because there is no interaction between the sub-pulses from the separate 〇pu S Coherence is inversely "added.) For example, the retarded optical path time may be separated to a coherence length depending on the optical configuration, and does not exceed a certain amount, such as four times to five times the phase 10 length. According to one embodiment of the disclosed subject matter In various aspects, the Applicant proposes not to use coherence to destroy the optical structure, such as generating a plurality of sub-pulses that are sequentially delayed by a single input pulse, wherein each sub-pulse and subsequent sub-pulses are delayed by more than the coherence length of the light, and further, each The direction of the sub-pulse is deliberately 15 is less than the amount of divergence of the input pulse. In addition, the Applicant suggests using the optical delay structure for coherence, where the optical delay between the optical delay structures is greater than the input light. The length of the coherence, the two optical delay structures each also produce a sub-pulse with a controlled caller pointing to the coherence as previously explained The various aspects of the sexually-damped optical delay structure are described. 20 In accordance with various aspects of one embodiment of the disclosed subject matter, the two imaging mini-OPuS can be confocal, so that the unacceptable is highly tolerable, thus allowing the prompting to be short OPuS's so-called mini 〇PuS may have low aberrations in the off-axis rays. The two OPuS each have a delay time of 4 nanoseconds to 5 nanoseconds. Use these values to make the two OPuS have low front guided wave distortion using a spherical mirror. Unless special equipment is used for 167 1324423, low leading wave requirements may prevent significant speckle reduction from mini 〇pus using special equipment such as replacing the plane/planar compensation plate with a slightly (four) plate, or adding another piece of compensation to a different axis The board is used to generate angular fanouts from the mini-OPuS, or position translation/shear ("Location") or beam flip/reverse as explained above. Those skilled in the art will appreciate that various aspects of an embodiment of the disclosed subject matter may be sufficient to achieve coherent damage to significantly reduce the effects of speckle on the exposure of the workpiece to the illumination system from the laser system, such as integrators. Circuit lithography photoresist exposure (including shadowing of line edge thickness and line width), or laser heating, such as amorphous laser annealing on glass wafers in a low temperature recrystallization process. This item can be achieved, for example, by a single cavity laser system, or an output from a multi-cavity laser system, or from another multi-chamber laser system and a multi-cavity laser system. The seed laser before amplification in the cavity is optically configured to split the output beam into pulses and sub-pulses, and recombine the pulses and sub-pulses into a single beam, and the pulses and sub-pulses are angularly displaced from each other by a small amount, for example, about 5 〇. From microradians to 500 microradians, each sub-pulse is delayed by, for example, at least a temporal coherence length, and preferably greater than a temporal coherence length, than the main pulse. This can be done by having a beam splitter on the beam delay light path to transmit the main beam 20 beam' to inject a partial beam into the delayed beam path, and then combining the main beam with the delayed beam. In recombination, the two beams, i.e., the main beam and the delayed beam, are slightly angularly offset from each other in the far field (with different pointing directions), which is referred to herein as the assignment. The delayed optical path can be selected to be longer than the temporal coherence of the pulse. Using a wedge force to optically retard the optical path, the force delays the beam back to the split 168 1324423 Before the mirror uses a wedge, the wedge imparts a slightly different orientation (pointing to the )) to the delayed beam, achieving angular displacement. As explained above, the pointing amount can be from about 50 microradians to 5 microradians. The optical delay optical path may comprise a series of two delayed optical paths, each having its own other beam splitter. In this case, since the lengths of the respective delay optical paths are different, a coherence effect is not formed between the main pulse and the sub-pulses from the individual delayed optical paths. For example, if the delay of the first delayed optical path is 丨 nanoseconds, the delay of the second delayed optical path may be about 3 nanoseconds; if the delay of the first delayed optical path is 3 nanoseconds, then the second delay is about 4 nanometers. second. 10 The wedges in the two separate delayed optical paths are arranged substantially orthogonally to each other with respect to the beam side, so that the wedge of the first delayed optical path can be used to reduce the coherence (speckle) of the first axis, while the other delay The wedge of the optical path can be used to reduce the coherence (speckle) of the other axis, substantially orthogonal to the first axis. Thus, for example, in the integrated circuit manufacturing process, when the wafer is exposed to the photoresist, the image of the speckle is 15, for example, the thickness of the line edge ("LER") and/or the thickness of the line width ("lwr"). The contribution can be reduced along the structural dimension on two different axes on the wafer. Other special means such as beam translation, beam imaging, fan-out flipping, etc., can be employed. In accordance with various aspects of one embodiment of the disclosed subject matter, a 6 milliradial cross section of the bowtie is used in a bowtie shaped 2 〇 ring power amplifier stage, and the magnifying prism inside the annular cavity is slightly different for the input beam and the wheeled beam. It can be configured such that the beam grows slightly as it travels around the ring, or the beam contracts slightly as it travels around the ring. In addition, and preferably in accordance with various aspects of an embodiment of the disclosed subject matter, the larger beam is split into two pieces, for example, the 169 S) 1324423 output beam is spaced more from the input beam, for example. Approximately 5-6 mm (as exemplified in Figure 3), the Applicant has suggested adjusting the angles of two such as 146, 148 as shown schematically in Figure 4, so for the output beam and the input beam such as beam 100 and 62 (shown schematically in Figure 30) obtains the same magnification. 5 In accordance with various aspects of an embodiment of the disclosed subject matter, the Applicant suggests setting a seed injection mechanism containing Rmax 164 and OC 162 for a version of Rmax such as 164 and OC, such as 162, along with a horizontal axis beam output aperture of the positioning system. On the platform. This allows each of the previous units to be individually calibrated, eliminating the need for individual components for field calibration. This allows the position of the 10 Rmax/OC assembly as shown in Figure 2, such as the 160 (seed injection mechanism), to be similar to the OC position in the applicant's single-chamber oscillator system (eg XLS 7000 laser system). Fixed as usual. By the same token, this configuration allows for a tolerance that allows Rmax/OC to be properly positioned relative to the system orifice without significant adjustments. The beam expander 稜鏡 is movable to align the implant seed mechanism assembly with the cavity 144 of the amplification gain medium, and the output beam 1 〇〇 optical path is aligned with the laser system optical axis. In accordance with various aspects of one embodiment of the disclosed subject matter, Applicants propose to employ a coherence-damaging optical structure that produces a plurality of sub-pulses that are sequentially delayed by a single input pulse, wherein at least each sub-pulse is from the subsequent 20 sub-pulses The pulse delay exceeds the coherence length of the light, and in addition, the orientation of each sub-pulse is deliberately less than the divergence of the input pulse, or any other hand described above. In addition, the applicant proposes to use a pair of coherence to destroy the optical delay structure, Here, the optical delay time difference between the pair of optical delay structures is greater than the coherence length of the input light. Each of the two optical delay structures also produces a sub-pulse having a controlled sinister orientation as previously described for the aforementioned coherence-damaging optical delay structure or any other particular means previously described. In accordance with various aspects of one embodiment of the disclosed subject matter, the Applicant proposes not to provide a mechanical shutter, similar to the use of the 〇PuSK as the Applicant's assignee, 5 blocking 1^0 rounding into the ring, for example for calibration and diagnosis. Block the entry of the M0 output during the period. The exact position can be, for example, just above the last folding mirror just before the ring power amplification stage, where the mini 〇puS is protected during uncalibrated ring power amplification calibration and operation. Turning to Fig. 79, a laser DUV source in accordance with various aspects of one embodiment of the disclosed subject matter is schematically illustrated in block diagram form. System 1300, for example, includes a plurality of seed laser systems, which may be, for example, solid state lasers 1302, 1304, 1306 as described herein, and seed lasers 13〇6 being the nth seed laser in the system. For each seed laser, there may be corresponding amplified laser systems such as 1310, 1320 and 1330 to amplify the laser system 133 to the nth amplification 15 laser system. Each of the amplifying laser systems 1310, 1320, 1330 may have a plurality of A, in the illustrated example, A=2, the amplification gain media 1312, 1314 and 1322, 1324 and 1332, 1334, and the amplification gain media 1332, 1334 constitute the example nth The gain medium system 1330 is amplified. Each of the amplification gain media 1312, 1314, 1322, 1324, 1332, 1334 comprises a gas discharge laser, such as an excimer 20 or a molecular fluorine laser, and more particularly may include an application as herein and in the aforementioned co-examination (application) The ring power amplification stage described in the same day). Each of the chirped gain vectors 1312, 1314 and 1322, 1324 and 1332, 1334 can be supplied with output pulses from individual seed lasers 1302, 1304 and 1306 by means of beam splitter 1308. The individual amplification gain vectors 1312, 1314, 1322, 1324423 1324 and 1332, 1334 can operate as a component of the pulse repetition rate X of the individual laser beams, such as A/X. The beam combiner 1340 can combine the outputs of the amplification gain media 1312, 1314, 1322, 1324, 1332, 1334 to form an output of the laser system 1300 of the laser source beam pulse 1 of the pulse repetition rate nX. 5 Turning to FIG. 80, a laser system 1350 in various aspects in accordance with an embodiment of the disclosed subject matter is schematically illustrated in block diagram form. The laser system 1350 can include a plurality of seed lasers 1352a, 1352b, and 1352c, which can be solid state lasers 1352a, 1352b, 1352c, for example, as described elsewhere herein, the seed laser 1352c is the nth seed in the laser system 1350. Laser. Each seed laser 10 can feed a pair of amplifier gain media 1356, 1358 and 1360, 1362 and 1364, 1366, with the amplifier gain medium 1364 ' 1366 as the nth pair of system 1350 corresponding to the nth seed laser 1352c. There are also individual beamsplitters 1354. Each of the amplifying gain media may be a gas discharge laser such as an excimer or a molecule ll laser, and more particularly includes a ring power amplification stage as described in the present application and in the co-pending application of the same application as the same. Each pair of amplification gain media 1356, 1358 and 1360, 1362 and 1364, 1366 can operate at 1/2 pulse repetition rate X of individual seed lasers 1352a, 1352b and 1352c. 'Seed lasers 1352a, 1352b and 1352c are all in the same pulse. The repetition rate X operation is generated by the laser source of the nX output pulse beam 20 100 ′ or each can operate at an individual pulse repetition rate X, X, X, χ η ', and the portions are equal to each other 'but not all, so the output pulse The output pulse rate in the beam 1 〇 is ΣΧ, Χ, ..., χη via the beam combiner 137. Those skilled in the art will appreciate that the present disclosure discloses a method and apparatus that includes a laser source system that can include a solid-state laser seed beam source to provide 172 ¢. S ) 1324423

10 15

2 sub-laser rotation; a frequency conversion stage, the seed laser output is converted into a wavelength of the seeded or molecular fluorine gas discharge laser, for example, near the center wavelength of the output of the output of the individual gas discharge laser In the wavelength band, 'skilled artisans understand that the excimer or molecular I gas discharge laser gain medium can be amplified in the selected gas discharge laser medium', and the converted seed f-shot is amplified to produce a roughly converted wavelength. The gas discharge laser output is fully solved by the skilled person in the wavelength band near the wavelength of the star of the gas discharge laser medium, and the seed laser with the appropriate wavelength will be amplified by the excitation of the excited thunder (four) . The excimer or molecular fluorine laser may be selected from the group consisting of illusion, xeF, KrF,

ArFW2 laser secret group. The laser gain medium f contains a power amplifier. The power amplifier includes a single pass amplifier stage and a multi-pass amplifier stage. The gain medium can include a ring power amplifier stage or a power oscillator. The ring power amplifier stage consists of a bowtie configuration or a racetrack configuration. The method and apparatus further include an input/output coupler seed injection mechanism. The method and apparatus further include a coherent destruction mechanism. Solid-state seed laser sources are included in Nd-based solid-state lasers, such as solid-state lasers that have a frequency-multiplied pump to pump the base sNd. Nd-based solid state lasers include a fiber amplifier laser. based on

The solid state laser of Nd may be selected from solid state lasers including Nd:YAG, Nd:YLF, and Nd:YV04 20. The solid seed laser beam source may comprise an Er-based solid state laser&apos; for example comprising a fiber laser. Er-based solid state lasers may include Er:YAG lasers or, for example, Er: glass lasers. The frequency conversion stage may comprise a linear frequency converter&apos; for example comprising a Ti: sapphire crystal or comprising a crystal containing amethyst. The frequency conversion stage includes a nonlinear frequency converter, for example, containing a second harmonic generation 173 1324423 or a sum mixer. Applicants have calculated that the reduction of speckle is related to the position of the coherence length inside the output pulse of a single-gas discharge (eg, ArF or KrF excimer) laser system, and the output pulse of such a laser system has passed. Two OPuS pulse extenders sold together with a laser system manufactured by the applicant's assignee, Xima, for pulse stretching to increase the total integrated spectrum (τ) and reduce the peak intensity of the laser output pulse The effect on optical components in tools that use output light from a laser system, such as a lithography tool scanner illuminator. There are two 0PuS strings, the first of which has a delayed optical path sufficient to extend the Tis pulsed from wheel 10 from about 18.6 nanoseconds to about 47.8 nanoseconds, while the second OPuS can extend the pulse further to about 83 5 nanoseconds. For example, where (where the spectral width is contained within 95% of the pulse energy). Starting from a pulse that is not extended, the applicant divides the pulse into a plurality of sections about the length of the coherence, assuming that the FWHM bandwidth is 〇.i〇pm, and the coherence 15 length function is Gaussian. The effect of pulse extension on the length of the coherence length after the pulse passes through the _〇PuS shows that the first intensity hump in the extended pulse spectrum consists of the coherence length of the main pulse, and the second strong peak is overlapped. The coherence length portion of the main pulse of the coherent length portion of the first sub-pulse is composed. The third hump in the intensity spectrum is the result of the overlap of the first sub- 20 pulses with the second sub-pulse. Note that the individual coherence length portions of the two peaks, the Applicant observed that multiple versions of the coherence length portion (including the sub-pulses) remain sufficiently separated from each other without interfering with each other. After passing the second OPuS, the analog spectrum again pays attention only to the coherence of the three previous ones before the extension pulse. In the simulation (the second lower peak is the contribution from the original &lt; 3 174 1324423 first lower pulse, as mentioned above, From the first -PuS first-delay pulse as described above, and from the second 01&gt; the first delayed pulse, the Applicant observed that in the second pulse, multiple versions of the coherence length portion are in close proximity to each other. . Since the delay of the first 〇puS is actually about 8 nanoseconds, the delay of the 5th 〇puS is about 22 nanoseconds. Thus, the interval between the versions of the coherence length portion is only about 4 nanoseconds, which is still not close enough to cause interference with each other. 0 Below the third hump, the applicant observes the first from the first OPuS - the delay pulse, the first OPuS The contribution of the second delay pulse, the second 01&gt; the first delay delay pulse, and the second delay pulse of the second 〇PuS. Applicants observed that the interval between the two related coherence portions is greater than the interval between the third hump in the intensity spectrum of the pulse extending from the two 〇Pu s. The increase in this interval is due to a round trip through each 〇PuS equal to about 36 nanoseconds = 18*2 and about 44 nanoseconds = 22*2. Thus, the separation between the lengths of coherence increases with each turn. The Applicant has determined that for each single mini 〇 PuS to be effective, the two main OPuS chocho causes any sub-pulse coherence lengths to be within about 4 coherence lengths of each other. In order to ensure that the relevant temporal coherence elements do not overlap, the specification of the separate delay optical path must be considered so that the 20 temporal coherence elements from the main beam do not later coincide with the delayed versions of the elements of the different delayed optical paths. Re-combination again. The overall delay in time caused by the effects of each combination of the delayed optical paths is undesirable from the viewpoint of speckle reduction. Care must be taken to select the delay lengths of the mini 〇 PuS and the main 〇 PuS to avoid time conflicts of temporal coherence elements. In accordance with an embodiment of the present invention, 175 &lt;S) 1324423, the Applicant suggests a synergistic change in the length of the conventional 〇PuS delay when installing the mini-OpuS, including whether it is part of the laser system or is mounted on the lithography tool itself. In the downstream of the regular main 0PUS. Applicant believes that such a mini OPUS can be slightly filled in the trough of the pulse time, resulting in an increase in Tis, for example, a delay length of one of the 5th principal 〇PuS is shortened to obtain a better total coherence length separation. In accordance with various aspects of one embodiment of the disclosed subject matter, coherence destruction can be accomplished via a combination of the aforementioned retarding optical path and special means, such as beam flipping, -1 imaging, beam shifting/shearing, as discussed above. The beam 10 or the beam is fanned out. Turning to FIGS. 81A-C, a ray trace of an embodiment of the disclosed main body is partially shown in perspective, including, for example, a VIO cavity 22 and an amplifier gain medium cavity 144, and FIG. 81A shows the tracking ray. The left side is partially on the seed laser cavity 22 (top) and the amplifier gain medium cavity 144 (bottom). The beam pass 15 exits the line narrowing module LN (not shown in Fig. 81A) through the LNM aperture 29 and enters the seed laser cavity 22 via the M0 cavity rear window 28'. On the left side of the bow tie, the beam exits the amplifier gain medium cavity M4 through the rear window 167, passes through the beam inverter aperture 71, reverses in the beam reverser 7〇 described above, and passes through the beam reverser/return The optical path in the device 70 is slightly different from the apertures 20 71 and 167 on the optical path, returning to the amplifier gain medium cavity 144, which in the exemplary case is in the form of a bow tie. Turning to Fig. 81B, a portion of the retarding optical element and the coherence-destructive delay optical path are shown in perspective view between the seed laser cavity 22 and the amplifier gain medium cavity 144. In the seed laser output light pulse beam, the seed pulse output from the 176 1324423 seed laser cavity 22 passes through the seed laser right window 27, the output combiner 28, and the LAM beam splitter, and part of the beam is diverted for metrology purposes. The beam is then horizontally and vertically deflected in a pair of turning mirrors 44a and 44b and directed to a beam splitter 520 in a first mini OPuS delay beam path 376, such as a 3 nanosecond delay beam path, a partial beam, such as a 4% beam, is Reflected into the delayed optical path, the remaining beams enter the second delayed optical path 380. Compensator wedge 53

The calibration is superimposed on the sub-pulses emitted by the delayed optical path 376; or slightly uncalibrated to cause the individual sub-pulses to exit from the delayed optical path 376 (beam shear) with slightly different spatial optical paths. Delayed optical path 376 may be formed by a pair of confocal mirrors 522, 524 or other 1 mirror configuration, such as two or more confocal mirrors or non-confocal mirrors included at each end of delay optical path 376 to transmit delayed beams back to splitting Mirror like. The beam is then sent to the first delayed optical path 38, for example, with a beam splitter 526, a 4 nanosecond delay.

20 The retardation path Here, part of the beam, for example 4()5, is reflected by the person to delay the optical path, and the remaining beam is sent out by the delayed optical path, and the beam is spread (4). The delayed optical path can be completely different from the composition of the delayed optical path m, except for different delays such as 4 nanoseconds, for example, with different mirror configurations, such as for beam flipping or (10) (d). Instead of being uncalibrated (4) compensator plate - a delay optical path 376 or a - a delay optical path 380 may have one calibration or the other calibration for output beam weight most, + s or one or the other with beam reversal optics 70 The article replaces 'as discussed in detail herein. The same as the first delayed optical path, such as a double beam expander 3〇, a second expanded frame 30. The beam can be passed through a beam expander, for example including a first expanded 稜鏡 32 and a steering reference 81C showing the input/output optical coupling elements and with 177 丄 W44: Z: 3

The seed laser beam exits the beam expander 3 〇, enters the amplification gain medium level 144 (e.g., in a bow-tie ring power amplification stage configuration), and the seed laser beam input from the stage 144 enters the associated laser system output beam path. The beam exiting the beam expander 30 is diverted by the turning mirror 45 to the partial mirror 162, which is a beam splitter/input/output coupler optical element for amplifying the gain medium level 144. The partial mirror 162 may have an anti-reflective coating on the input incident side, for example 2 〇 〇 〇 % reflection on the cavity side of the opposite amplification gain medium chamber to perform the output consuming function. The partial mirror delivers the beam to the largest mirror (the largest mirror of a given wavelength)&apos; which reflects the beam into the amplification gain medium cavity 144 via the beam expander optical assembly and the cavity right side window 10 168. The beam expander optical configuration can include a first (input) beam expander crotch portion 146a that continues along the first optical path to the second beam expander 稜鏡 148 to enter the amplification gain medium cavity 144; The return beam of the loop can pass through the second beam expander prism 148 and through a first beam expander 稜鏡 second portion 146b, through the output 15 input/output coupler 162 or via the output coupler 162 and The maximum mirror 164 reflects the deflection in the bow-tie oscillation circuit and returns to the amplification beam of the cavity. The beam output from the amplification gain medium cavity 144 via the output coupler 162 passes through the BAM beam splitter, where a portion of the beam is redirected for metrology purposes, an OPuS beam splitter where the beam is split into a main portion and the delay portion 2 One of the plurality of main OPuS performs beam extension to extend the output system of the laser system to a Tis'-system aperture 92 and a shutter beam splitter' where the partial beams are separately used for metrology purposes. Turning to Figures 82A and 82B, a partial top view of the optical series of Figures 81A-C is shown in perspective and partial schematic view 178 1324423, including the delay optics and the seed laser cavity and the amplification gain medium laser cavity . Figure 83A shows a further detailed view of the perspective and partial representation of the delayed optical paths 376 and 380 and the beam expander 30. Figure 83B shows a side view of further details of beam expander 30. The design of the delayed optical path, e.g., a 3 nanosecond delay optical path, includes a 3.18 mm thick beam splitter 526, two concave mirrors 522, 524, such as a radius of curvature of 225 mm and a compensator plate 530, so that the reflected beam will overlap the transmitted beam. Anticipation

The shot/delay beam does not overlap the transmitted beam, and a plurality of embodiments may be employed, such as including the tilt of the 10 compensator plate 530. Thus, for example, the beam passing through the beam splitter 526 has a deviation of 1.048 mm. The compensator plate 530 can be placed at a relative angle to the side of the beam splitter 526. The reflected beam then overlaps the transmitted beam. The deviation between the transmitted beam and the first reflected beam can be controlled by changing the angle of rotation ' of the compensator plate 530'. If the dichroic mirror 526 is in the normal direction of the beam, the deviation between the two beams is 1 〇 48 15 mm. The Δ deviation between the two beams as a function of angle is shown in Fig. 85. In order to produce a 0.5 mm deviation, a 27 degree angle of incidence is required. Another way to create a bias is, for example, to make the compensator plate 53 thinner or thicker. A plate thickness of 166 mm or 4.70 mm will result in a 〇 5 mm deviation. The advantage of using a 45 degree angle thicker plate is that the anti-reflective coating remains the same. However, using a 27 degree angle plate, the substrate must be fed to the same thickness as the minute glass 526. The beam A that is shot by the person on the compensator plate is over 8, so the component with a 27-degree angle is better as the anti-reflective coating than the angle of the shirt. Any one or more of the special means discussed herein may be set to any of the delayed optical paths, wherein the aforementioned beam shearing technique belongs to a delayed light 179 (S) path, and the other delayed optical path, such as a 4 nanosecond delay optical path, has the same Or substantially the same beam manipulation (along with a specific length of delay), or a different coherence destruction system. For example, in Fig. 83, a second longer delay optical path, such as a 4 nanosecond delay optical path 380, is also incorporated in conjunction with a beam inversion mechanism such as an isosceles 5 mirror 525, similar to the aforementioned co-examination application "Gas Discharge". Method and device for reducing the coherence of laser output light", application date: December 29, 2005, application number 10/881533 'agent file number 2003_〇12〇_〇1 (described as before) Coherence destroys the optical component and allows the beam to flip itself on one or more axes. The example beam flipping optical element 525 allows the individual sub-pulses to flip themselves as they pass through the prism and are reflected within the interior of the crucible, e.g., the long axis itself flips, as shown schematically in Figure 86. As described elsewhere herein, such a coherence disrupting mechanism has a delayed optical path and other similar or associated special means for beam flipping, translation, imaging, etc., as discussed herein, for amplifying the gain medium output, for seeding Between the laser and the amplified gain medium, after 15 steps of the laser system, inside the beam transfer unit, for example between the laser shutter and the tool using the laser or the inside of the tool itself, such as the scanner or the input inside the tbSLS machine. The light-absorbing species surrounded by free light paths. A skilled artisan will appreciate that a device and method includes a line narrowing pulsed excimer or molecular fluorine gas discharge laser system comprising: a 20 seed laser oscillator that produces an output comprising a laser output pulse beam, The method comprises: a first gas discharge excimer or a molecular fluorine laser cavity; a narrowing module inside a first oscillator cavity; a laser amplification stage containing an amplification gain medium in a second gas discharge excimer or a molecular fluorine laser cavity that receives the output of the seed laser oscillator and amplifies the output of the seed laser oscillation 1324423 to form a laser system output comprising a laser output pulse beam comprising: a ring power amplification stage . The toroidal power amplifier stage includes an injection mechanism including a portion of the reflective optical element through which the output beam of the seed laser oscillator is injected into the toroidal power amplification stage. 5 The ring power amplifier stage includes a bow tie circuit or a racetrack circuit. The loop power amplification stage amplifies the output of the seed laser oscillator cavity to a pulse energy klmJ ' or 22 mJ, or dmJ, or y 〇 mJ, or mJ. The laser system can operate at an output pulse repetition rate of up to 12 kHz or 3 to % kHz. The apparatus and method can include a broadband pulsed excimer or a 10-knife fluorine gas discharge laser system, comprising: a sub-laser oscillation chirp that produces an output comprising a laser output pulse beam comprising: a first gas discharge An excimer or molecular fluorine laser cavity; a laser amplification stage comprising: an amplification gain medium in a second gas discharge excimer or a molecular fluorine laser cavity, which receives the output of the «Hi seed laser oscillator and amplifies the The output of the seed laser oscillator 15 forms a laser system output comprising a laser output pulse beam comprising: a ring power amplifier stage. In accordance with an aspect of an embodiment of the disclosed subject matter, a coherence disruption mechanism is located between the seed laser oscillator and the amplifier gain medium. The coherence disrupting mechanism includes an optical delay optical path having a delay length that is longer than a coherence length of one of the laser output pulses of the seed laser oscillator. The optical delay optical path is not delayed on the scalar by the length of the beam in the laser output pulse beam of the seed laser oscillating device. The coherence destruction mechanism includes a first optical retardation optical path of a first length and a second optical retardation optical path of a second length, and an optical delay system of each of the optical retardation optical path and the second optical retardation optical path is super 181 + the seed The laser of the laser oscillator emits a pulse-length of the pulsed beam, but does not substantially increase the pulse length and the length of the first delayed optical path can be second (four). The difference between the lengths exceeds the purpose of the pulse: The length ' does not substantially increase the pulse length. Apparatus and methods according to an embodiment may include a line narrowing pulsed excimer or a fractional-volume discharge laser system comprising: a sub-throat recorder that produces a wheel-injection-laser output Pulsed beam, comprising: "first gas discharge = excimer or molecular (four) cavity; in the - - vibration (four) (four) part of the line 10 narrowing module; - laser amplification stage contains - amplification + quality - second gas Discharge quasi-77 or molecular fluorine laser cavity, which receives the output of the seed laser vibrator. 'The output of the seed laser laser slitter is formed to form a laser output pulse beam m system output n-qing power amplification Level; a coherent destruction mechanism between the seed laser vibration μ and the ring power amplification stage. According to an aspect of the embodiment, the apparatus and method may comprise a Breguet pulsed excimer or molecular gas discharge laser system comprising: a sub-laser oscillator, the generation-output comprising a laser output pulse a beam comprising: a first gas discharge excimer or a molecular fluorine laser cavity; the laser amplification stage comprising an amplification gain medium in a second gas discharge excimer or a molecular fluorine 2 〇 laser cavity, which receives the seed ray Shooting the output of the vibrator and amplifying the output of the seed laser vibrator to form a laser system output comprising a laser output pulse beam comprising: - a ring power amplifier stage; between the seed laser vibrators A coherent destruction mechanism with the ring power amplification stage. According to an aspect of the embodiment, the apparatus and method may comprise a pulsed excimer or a 182 1324423 molecular fluorine gas discharge laser system comprising: a sub-laser oscillator that produces an output comprising a laser output pulse beam The method includes: a first gas discharge excimer or a molecular I laser cavity; a narrowing module inside the __ first cavity; a laser amplification stage containing an amplification gain medium to a second gas discharge excimer Or a molecular fluorine laser cavity that receives the output of the seed laser vibrator and amplifies the output of the seed laser oscillator to form a lightning ray output comprising a laser output beam; the seed laser oscillator The coherence destruction mechanism with the laser amplification stage includes a wire delay optical path that exceeds the coherence of the seed laser beam pulse. The amplification stage 10 can include a -laser vibration cavity or a light path defined by a fixed number of times the service medium gain medium. The coherence destruction mechanism includes - coherence destruction optical I is delayed, which can generate a plurality of sub-pulses that are sequentially delayed by a single input pulse, and each of the wipes is followed by: the under-delay is greater than the pulsed light The length of the coherence. It is also known to those skilled in the art that the device and the method of the method 15 include a hard-to-light source system according to the aspect of the real-time, including: a solid-state laser seed source that provides a seed laser output; - the frequency conversion stage is to convert the recording laser to the core - excimer or molecular fluorine gas discharge laser - wavelength; _ excimer or molecular fluorine gas discharge laser amplification medium after amplification conversion _ sub The laser output is generated to generate a wavelength of about 20 rpm. The gas discharge laser 镰 镰 η dry dry destruction mechanism package 3 - optical delay turn 'has a delayed optical path longer than the coherence length of the output pulse. The excimer or molecular fluorine laser may be selected from the group consisting of XeCl, XeF, KrF Arf^F2 field systems. The laser gain medium comprises a 183 &lt; S) power amplifier 'which includes a single pass amplifier stage Or - multi-pass amplifier stage The gain medium includes a loop power amplification stage including a bow tie configuration or a racetrack configuration, and also includes an input/output age seed injection mechanism. The coherence destruction mechanism can be used with the laser seed beam source The gas discharge beam is between the gain mediums. The g] seed laser beam source comprises a __Nd-based solid state laser, which may include pumping the Nd-based solid state laser as a frequency doubling pump. The solid state laser comprises a fiber amplifier laser and comprises a solid-state laser based on Nd selected from the group consisting of Nd:YAG, Nd:YLF and Nd:YV〇4 solid state lasers. The laser beam source package 10 comprises a price-based solid-state laser comprising a fiber laser. The Er-based solid-state laser comprises an Er:YAG laser. The frequency conversion stage comprises a linear frequency converter comprising a Ti: sapphire crystal or A crystal comprising amethyst. The frequency conversion stage comprises a nonlinear frequency converter, such as a second harmonic generator or a frequency mixer. According to an embodiment, the apparatus and method comprise a 15 ray. Light source system, including: A solid-state laser seed beam source of a sub-laser output; a frequency conversion stage that converts the seed laser output into one wavelength suitable for seeding an excimer or molecular fluorine gas discharge laser; an excimer or molecular fluorine The gas discharge laser gain medium amplifies the converted seed laser output to produce a discharge laser output at a wavelength that is approximately converted, and includes a ring power amplification stage. The method includes utilizing a solid state laser seed beam source Providing a sub-laser output; in a frequency conversion stage, converting the seed laser output frequency into a wavelength suitable for seeding an excimer or molecular fluorine gas discharge laser; using an excimer or molecular fluorine gas discharge laser The medium is amplified by amplifying the converted seed laser output to produce a gas discharge laser output that is approximately one of the 1324423 conversion wavelengths. 10 15 skilled artisans are also aware of a device and method that includes a processing apparatus that includes an illumination mechanism for illuminating a workpiece, such as a semiconductor wafer or thin film transistor panel that is illuminated, for example, as a lithography in the foregoing case. Part of the processing procedure, and in the case described below, as a laser annealing for crystallization of amorphous germanium, using pulsed ultraviolet light such as DUV light of 248 nm or 193 nm, or EUV of about 13 nm. Light; ultraviolet light output opening; workpiece fixed platform, such as a crystal transfer platform or a transfer platform of a thin film transistor; the coherence destruction mechanism includes an optical retardation optical path that exceeds the coherence length of the ultraviolet light pulse. The optical retardation path may not substantially increase the length of the ultraviolet pulse. The coherence destruction mechanism may include a first optical delay optical path of a first length and a second optical delay optical path of a second length; and an optical delay of each of the first delay optical path and the second delayed optical path exceeds a good length of the ultraviolet light pulse The difference between the length of the first-delayed light path and the second delay is the length of the coherence of the pulse. The first delay optical path and the second delayed optical path include a beam inversion or a beam flat configuration, such as an uncalibrated compensation rotation, a -1 imaging optical element, and the like. 20 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。熟 谙 # 人士 人士 人士 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明

And other variations and modifications of the various embodiments of the disclosed subject matter disclosed herein. 15 20 This document details and exemplifies the specific aspects of the embodiment of the "laser system" that meet the requirements of 35 USC § 112. The above objectives may be more fully achieved for the various aspects of the foregoing embodiments or for any other reason. To the extent that the subject matter of the present invention is to be understood by those skilled in the art, the embodiments of the present invention are intended to be illustrative and representative. The scope of the embodiments described herein and claimed herein is inclusive of other embodiments that may be apparent to those skilled in the art, which are not readily apparent to those skilled in the art. The scope of this "laser system" is pure and completely limited only by the scope of the patents attached to the patent, and does not exceed the description of the requested patent application. In the singular, the singular elements are not intended to be interpreted or interpreted as such a claimed element and only j (unless so clearly stated), but instead means "one or more." All of the structural equivalents or functional equivalents of the various elements of the foregoing embodiments, which are known to those skilled in the art, are intended to be incorporated by reference. STATEMENT – All terms used in the scope of the patent and in the present specification and application 2 Scope: A clear statement and definition will have this definition, regardless of such a second = any dictionary or any common definition. In the intention or requirement of the specification, the device or method serves as a solution to the problem of the various aspects of the embodiments disclosed in the present disclosure, and the problem of the transfer of the problem is to be * the scope of the patent. No element, component or step is disclosed in the present disclosure, and is not related to whether the element, component or method step is stated in the scope of the patent application. In the scope of the accompanying patent application, and any 70 pieces are translated as follows in accordance with the sixth paragraph of 35 USC § U2, unless the element understands the use of the word "device" or the method patent "Steps" instead of "-actions". Those skilled in the art will be aware that in accordance with the U.S. Patent, the Applicant also discloses embodiments of any of the inventions set forth in the scope of any patent application attached to the present specification. In some cases, only one implementation may be disclosed. example. In order to shorten the length of the patent application and the time of writing, and make the case easier for the inventor and others to read, the applicant can use the qualifiers at any time or in the whole case (such as "Yes", "Yes", "Include", etc. And/or its qualifiers (such as "manufacturing", "causing j", "sampling", "reading", "sending sfl", etc.) and/or gerunds (eg "manufacturing j, "using", "obtaining") , "hold", "produce", "decision", "measure", "calculation", etc.) to define an action or function of an embodiment of the disclosed subject matter, a feature/component, and/or description Other definitions of one aspect/feature/element of one embodiment. When such qualifiers or qualifiers are used to describe the aspects/features/elements of any one or more of the embodiments disclosed herein, any feature, component, system, subsystem, component, sub-component , method steps or deductive rules, 20 steps, special materials, etc., shall be interpreted as one, more or all of the following restrictions in the scope of the subject matter of the invention and the claimed patent: "Example" , "for example", "example", "for illustrative purposes only", "by way of illustration", etc. and/or include any or more of the words "may" or "may". </ RTI> </ RTI> </ RTI> </ RTI> <RTIgt; </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; /Features/components are required to be implemented, even if they are intended to satisfy the patent implementation #H θ f, the embodiment of the present invention, or any of the such aspects/features/components. Unless otherwise stated in the case or in this case; 1 y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y y Subject or 彳 10 10 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 For the purpose of this and the only implementation of the subject matter 2 / the characteristics / components of the party -, the main 曰 or any of its states Γ patent _ items, what other possibilities may be implemented two::::=, The Applicant's specific or disclosed embodiments. Applicants' special, express and beneficial two-parts have attached subordinates and any independent features: any of the features/features/elements, steps, etc. of: Li: The description of the scope of the patent application directly or indirectly attached to the application has fully covered the other three of the sub-items. The details of the implementation are not the only ones. Take m to take this equality __ _ step into the _ step details used to limit two: ^ is the generalized green; 》 / &amp; column It Duli more entries, defined Μ Sin / features / elements' including further details of the dependent claims

S 188 1324423 in separate items.

It should be understood by those skilled in the art that the various embodiments of the present invention are intended to be a preferred embodiment, and are not intended to limit the scope of the disclosed subject matter. It will be apparent to those skilled in the art that many changes and modifications can be made in the aspects disclosed in the embodiments disclosed herein. The scope and definitions of the appended claims are intended to cover the invention and the embodiments of the invention Other changes and modifications can be made in addition to the variations and modifications of the embodiments disclosed herein. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 shows a known multi-cavity laser system in a configuration; FIG. 2 shows various aspects of an embodiment of the claimed patent subject, and FIG. 3 shows the claimed patent disclosed. The various aspects of one of the embodiments,

Figure 4 shows various aspects of one embodiment of the claimed subject matter, and Figure 5 shows various aspects of one embodiment of the claimed patent subject matter; Figure 6 shows the claimed subject matter of the disclosure. Various aspects of an embodiment; FIG. 7 shows a timing and control scheme for each aspect of an embodiment in accordance with one of the disclosed subject matter; 189 1324423 FIG. 8 is a schematic illustration of an embodiment in accordance with one of the disclosed subject matter Various aspects, like multiple reflections of Fig. 37 or using separate beams to fill different spatial portions of a void; Figure 9 is a schematic representation of useful input coupling for each of the five aspects of an embodiment according to the disclosed subject matter; 10 is a schematic illustration of useful input couplings in accordance with various aspects of an embodiment of the disclosed subject matter;

Figure 11 is a schematic illustration of useful input couplings in accordance with various aspects of an embodiment of the disclosed subject matter; 10 Figure 12 is a schematic illustration of useful input couplings in accordance with various aspects of an embodiment of the disclosed subject matter; Figure 13 is a schematic illustration of useful input couplings in accordance with various aspects of one embodiment of the disclosed subject matter; Figure 14 is a schematic illustration of useful input couplings for each of the 15 aspects in accordance with one embodiment of the disclosed subject matter; The figure shows a top view of one embodiment of an input coupling mechanism useful in accordance with various aspects of an embodiment of the disclosed subject matter; Figure 16 is a schematic illustration of each of the embodiments in accordance with one of the disclosed subject matter. A side view of the input coupling mechanism of Fig. 15; 20 Fig. 17 is a view schematically showing useful input coupling according to various aspects of an embodiment of the disclosed subject matter; Fig. 18 is a schematic sectional view showing Various aspects of one embodiment of the disclosed subject matter, an aspect of an embodiment of an orthogonal injection seeding mechanism,

190 FIG. 19 is a cross-sectional view schematically showing various aspects of an embodiment of an orthogonal injection seeding mechanism in accordance with an embodiment of one of the disclosed subject matter; FIG. 20 is a schematic cross-sectional view showing The disclosed subject matter - various aspects of the embodiments - various aspects of one embodiment of an orthogonal injection seeding mechanism; Figure 21 is a cross-sectional view schematically showing various aspects of the embodiment in accordance with the disclosed subject matter An embodiment of an orthogonal injection seeding mechanism - an embodiment of the embodiment; 1 〇 22 is a cross-sectional view schematically showing each of the states #, one of the orthogonal injection _ mechanisms according to one embodiment of the disclosed subject matter Various aspects of the embodiment; FIG. 23 is a partial cutaway perspective view schematically showing the extension of one of the laser chambers containing the optical element in the laser cavity according to the disclosed subject matter; FIG. Measured values of forward and reverse energy in a toroidal power amplifier in accordance with various aspects of one embodiment of the disclosed subject matter; FIG. 25 shows various aspects of an embodiment in accordance with the disclosed subject matter. Yu Yi Measured values of forward and reverse energy in a toroidal power amplifier; 20 Figure 26 is a schematic and block diagram showing various aspects of an embodiment in accordance with the disclosed subject matter, one of ^0?0 Sequence and control system; Figure 27 shows the saturation of a ring power oscillator having a change in MO output pulse energy in accordance with various aspects of an embodiment of the disclosed subject matter; 1324423 Figure 28 is a schematic and block diagram Forms display a laser control system in accordance with various aspects of an embodiment of the disclosed subject matter; FIG. 29 is a schematic, block diagrammatic view of a laser in accordance with various aspects of an embodiment of the disclosed subject matter Control System; 5 Figure 30 is a schematic illustration of a seed injection mechanism and beam expander in accordance with various aspects of an embodiment of the disclosed subject matter; Figure 31 is a schematic illustration of an embodiment in accordance with one or more embodiments of the disclosed subject matter Coherence breakers of various aspects; Figure 32 is a schematic diagram showing the coherence destroyers of the respective ten aspects according to the disclosed subject matter; Figure 33 is partially schematic and partially shown in block diagram form In accordance with various aspects of the disclosed subject matter, examples of various elements of a coherence disruption system and examples of results of various aspects of the system; FIG. 34 shows an embodiment in accordance with the disclosed subject matter. 15 states, the relative speckle intensity of each E-0 deflector voltage, relative to the relative timing between E-〇 and pulse generation in the seed laser; Figure 35 shows the various embodiments according to the disclosed subject matter. The directional displacement of the aspect is relative to the E-0 voltage; 2 〇 36 shows an example of the 'E, 0 bias voltage timing and the seed laser pulse spectrum' of each state according to an embodiment of the disclosed subject matter; Figure 37 is a schematic representation of the effects of beam refraction on the coherence of the beam in accordance with one embodiment of the disclosed subject matter; the second diagram shows the beam sweeping of the various states in accordance with the disclosed subject matter. / smear the effect of coherence; 192 1324423 Figure 39 shows the effect of displaying multiple coherence failure systems in a cartoon manner; Figure 40 is a schematic representation of the various states according to one embodiment of the disclosed subject matter a coherence reduction system; FIG. 41 shows the result of the analog beam pulse inversion; FIG. 42 is a schematic and partial block diagram showing various aspects of an embodiment according to the disclosed subject matter, one having divergence control Beam combiner

Figure 43 shows various states in accordance with an embodiment of the disclosed subject matter, simulating an E-0 supply voltage versus seed pulse intensity spectrum over time; Figure 44 shows an embodiment in accordance with the disclosed subject matter. In each of the aspects, the E-0 supply voltage is tested over time with respect to the seed pulse intensity spectrum; 15 Figure 45 shows an E-0 battery drive circuit in accordance with various aspects of an embodiment of the disclosed subject matter;

Figure 46 shows an exemplary side view of various aspects of an embodiment in accordance with one of the disclosed subject matter; Figure 47 is a schematic and block diagram showing various aspects of an embodiment in accordance with the disclosed subject matter, a A broadband light source and a laser surface treatment system using DUV laser light, and Fig. 48 is a view schematically showing an optical retardation optical path of a coherence destroyer according to various aspects of an embodiment of the disclosed subject matter; A coherent disrupter optical delay optical path in accordance with an embodiment of one of the disclosed subject matter, 193 1324423; FIG. 50 is a schematic and block diagram showing various aspects of an embodiment in accordance with one of the disclosed subject matter Fig. 51 is a block diagram showing, in block diagram form, a lithography tool according to various aspects of the disclosed subject matter; Fig. 52 is a schematic and block diagram showing a laser lithography tool of various aspects of one of the embodiments;

Figure 53 is a schematic and block diagram showing a laser lithography tool in accordance with an embodiment of one of the disclosed subject matter; 10 Figure 54 is a schematic and block diagram showing the subject matter disclosed An extremely high average power laser source of various aspects of an embodiment; FIG. 55 is a block diagram showing, in block diagram form, a very high average power laser source in accordance with various aspects of an embodiment of the disclosed subject matter; Figure 56 is a schematic and block diagram showing an example of a very high average power laser source in accordance with various aspects of the disclosed subject matter; Figure 57 is partially schematic and partially shown in block diagram form. A submerged laser lithography system in accordance with various aspects of an embodiment of the present invention, FIG. 58 is a schematic and block diagram showing one of the various aspects of a solid seed according to one embodiment of the disclosed subject matter. Laser-to-gas discharge amplifier laser system; Figure 59 is a block diagram showing a solid-state seed laser/amplifier laser system in accordance with various aspects of an embodiment of the disclosed subject matter, Figure 60 shows schematically and in block diagram form according to the disclosed subject matter.

194 1324423 In various aspects of an embodiment, an output conversion of a sub-laser, for example using a frequency converter coupled to the same beam splitter, followed by coherence destruction; Figure 61 is schematically illustrated and shown in block diagram form according to the disclosure One version of the embodiment of Fig. 60 of various aspects of an embodiment; 5 Fig. 62 is a schematic and partial block diagram showing various aspects of an embodiment according to the disclosed subject matter, an injection Seeding DUV gas discharge main oscillator/amplifier gain medium laser system solid state main oscillator; Fig. 63 is a schematic and partial block diagram showing various aspects of an embodiment according to one of the disclosed subject matter, an implanted DUV gas Discharge main 10 oscillator/amplifier gain medium laser system solid state main oscillator; Fig. 64 is a schematic and partial block diagram showing various aspects of an embodiment of the disclosed subject matter, an implanted DUV gas discharge main Oscillator/Amplifier Gain Medium Laser System Solid State Main Oscillator; Figure 65 is a schematic and partial block diagram showing the main 15 according to the disclosure Various aspects of an embodiment, an implanted seeded DUV gas discharge main oscillator/amplifier gain medium laser system solid state main oscillator; Figure 66 is a schematic and partial block diagram showing implementation in accordance with one of the disclosed g Various aspects of an example, a very high power solid state seed beam and gain amplifier laser system; 20 Figure 67 is a schematic and partial block diagram showing various aspects of an embodiment in accordance with the disclosed subject matter, a regeneration /cycle power gain oscillator power amplification stage; Figure 68 is a schematic and partial block diagram showing various aspects of an embodiment of the disclosed subject matter, a solid seed laser/gain amplifier 195 laser system; Figure 69 is a schematic and partial block diagram showing various aspects of an embodiment of the disclosed subject matter, a solid seed laser/gain amplifier laser system; 5 Figure 70 shows one of the disclosed Various aspects of the embodiment result from the regularized output pulse shape of the laser system; Figure 71 is a schematic representation of each of the embodiments in accordance with the disclosed subject matter Aspect E-0 battery laser steered input voltage; Figure 72 is a block diagram showing a laser steering system in accordance with various aspects of the disclosed subject matter; Figure 73 is a schematic representation of E-0 battery laser-operated voltage input signal of various aspects of one embodiment of the disclosed subject matter; Figure 74 shows an example of coherence-damage test results for various aspects of an embodiment in accordance with one of the disclosed subject matter; 15 Figure 75 shows an example of coherence failure test results in accordance with various aspects of one embodiment of the disclosed subject matter; Figure 76 is a schematic and partial block diagram showing each of the embodiments in accordance with one of the disclosed subject matter. In the aspect, a solid-state seed laser having an output light of about 193 nm; FIG. 77 is a schematic and partial block diagram showing various aspects of an embodiment according to the disclosed subject matter, one having an output of about 193 nm Solid-state seed laser of light; Figure 78 shows various frequency up-conversion systems; Figure 79 shows schematically and in block diagram form each of the embodiments according to the disclosed subject matter 196 1324423 A laser system of the aspect; FIG. 80 is a schematic and block diagram showing a laser system in accordance with various aspects of an embodiment of the disclosed subject matter; and FIGS. 81A-C are shown in exploded form. The main purpose of the five embodiments is a perspective and partial schematic diagram of a ray path of a seed laser amplifying gain medium; the 82A and 82B diagrams partially show a partial ray path of the $1 a_c diagram in a perspective view. Top view and side view; Fig. 83A shows a perspective view of a portion of the relay optical 10 element of Figs. 81A-C and 82A-B; Fig. 83B shows Fig. 81A-C, Fig. 82A-B and Side view details of the beam expander of Figure 83A; Figures 84A and 84B show various aspects of an embodiment of the disclosed subject matter, a beam spatial translation/fanout/chi Top view and side view of machine 15; Fig. 85 is a diagram of beam displacement to offset angle; and Fig. 86 is a schematic diagram showing one of the embodiments of the embodiment according to the disclosed subject matter having a beam delay optical path Beam flipping mechanism. [Main component symbol description] 20... main oscillator power amplifier (ΜΟΡΑ) laser system 22... main oscillator (MO), cavity, oscillator seed laser cavity, seed laser cavity 24... amplifier gain medium laser cavity Amplifier module laser cavity 26...line narrowing module (LNM) 27...seed laser window 28...output coupler, cavity rear window 197 1324423 29.. .LNM orifice 30.. ·beam expansion 32. First expansion 稜鏡 40... Relay optical element 42... Line center (center wavelength) analysis module (LAM) 44.. Turning mirror 44a-b... Turning mirror 45.··· turning mirror 46 .. . Turning mirror 48...MO energy monitor 62, 62', 62''·..ΜΟ output, input beam, output beam 62a··. output beam 70...beam return|§/reverse optical element, beam Inverter 71...beam inverter aperture 72...light path, beam 74...beam, beam splitter 74a-b...light beam 76...first beam splitter 78...second beam splitter 82a,860A...pulse 84...beam spread Amplifier 86.. .Pulse extender, 〇puS 88...delay optical path 90&quot;.light delay ling mirror, lithography tool 92...illuminator, system aperture 9 4...cavity input/output window, mask/line car, wafer fixed platform 96...shutter 98...shutter beam splitter 100.. laser system output beam, wheeled laser beam 110...system 130... horizontal size Select aperture 140.··incident window and beam expansion housing, nose 142...beam expander/disperser 142b...prism 144...gain medium cavity,amplifier stage 'ring power amplifier stage 146, 146a-b ···The first beam expansion and dispersion 稜鏡146a...the first expansion/dispersion 稜鏡146b···the first expansion/dispersion prism 148...the second beam expansion and dispersion reversal, the third 稜鏡

198 1324423 150... Incident window and beam expansion housing, nose, cavity extension 160. &quot;Injection seeding mechanism, seed injection mechanism, input/output coupler 160a.··Coherence destruction mechanism 162.. Partial reflection Mirror, 〇c, output combiner, partially reflected input 162a... input beam 164...Rmax, Rmax mirror, maximum mirror 164a...partial mirror 166a...confocal mirror 168...amplified stage window, cavity right window 170 ··· Beam expanding and dispersing optical element 172.·· Beam expanding and dispersing prism 174··· Beam expanding and dispersing prism 180.. Amplifying stage 190..Baffle 192...Baffle 194·.. Then the input/rounding window, the amplification stage window 196...the rear input/output window 200...the partial reflection wheel-in coupling oscillator amplification stage, the power regeneration amplifier 202.. cavity 204...partial reflection optical element,into D part reflection optics Element 206...partially reflective optical element, output compliant 1 § partially reflective optical element 210...cavity 212...polarizing beam splitter 214...quarter wave plate 216...output coupler 218...after maximum mirror 230···switching input /Output Consumulator Lightweight Oscillator 23 2...cavity 236.. .Q exchanger 238...window 240··.maximum mirror 243.. maximal reflection rear mirror 250.. multi-pass regenerative shape sensor laser system 252.. amplifier cavity 254...seed laser 260...input/output coupler, inject seeding mechanism 262...input/output coupler splitting

199 1324423 Mirror, partial mirror 264...maximum reflective optical element 270...beam return/reverse optical element 272··.first largest mirror 274...second largest mirror 276...beam 278...beam 280...multiple Regeneration ring power amplifier stage laser system 282... cavity, power amplifier stage 284...seed laser 286··. input through beam, seed laser 288... output through beam, seed laser output pulse beam 290... amplifier gain medium 292...ring power amplifier stage 294.. gas discharge electrode 296.. input chamber section 298···beam inverter chamber section 300.. multi-pass regenerative ring oscillator laser system, seed injection coupling Mechanism 302···beam splitter/input-output combiner 304.. maximal mirror 310...maximum back cavity mirror, beam inverter 312...input window 320.. .0.uS effect cavity, beam expansion 322·..polarizing beam splitter, 稜鏡324··.back cavity mirror, 稜鏡326&quot;·quarter wave plate 328··.output coupler 330···system, baffle 334...seed mine Shoot 336...polarizing beam splitter 338.. .half wave plate

340.. Output combiner, beam, first direction cyclic oscillation optical path, metrology unit, bandwidth analysis module, BAM 342... second direction cyclic oscillation optical path 350... optical element 352·. external input/output interface 354 ··· Total internal reflection surface 356...Input/output interface 360...Seed injection optical element 360a_.·Coherence destruction system 362...External input/output interface 364··. Total internal reflection surface 200 (S ) 1324423 366.. Internal input/output interface 370...beam return/reverse optical element 370a...oscillator/amplifier laser 372...input/output interface 372a·..excimer seed laser, seed laser 374.. first Total internal reflection surface 374a... Laser system output light pulse beam divergence 376... Second total internal reflection surface 376a, 378a···Coherence destroyer, mini OPUS, first mini 0PUS 376·. Mini OPUS, delayed optical path 378 ...the third total internal reflection surface 378a...diffusion representative diagram 380···beam return/reverse optical element, mini OPUS, second delayed optical path

380a...second mini OPUS 384... first total internal reflection surface 386.. second total internal reflection surface 390...beam return/reverse optical element 390a...divided representation 392a...EO bias , pulse manipulator 394... first total internal reflection surface 394a... amplifier section, amplification gain stage, oscillator amplifier laser, amplifier gain medium 396... second total internal reflection surface 396a... total reflection back cavity mirror 398a...input/output coupler 400...toroidal power amplifier stage laser system 410...output coupler, divergence representative diagram 410a...power oscillator 412...back cavity mirror 412a...delay light path 414a...first beam splitter 420...Brewster The mold member 420a...the retardation light path 422a...the second beam splitter 424...the oscillation cavity, the electrode 424a···the divergence representative diagram 430...the steering mirror maximum mirror 442...P0 cavity 450...very high power laser system, ring Power amplifier stage laser system 201 &lt; S ) 1324423

452...excimer gas discharge laser seed laser, main oscillator 454... main vibrator laser cavity 456.·.line narrowing module 458.. rear cavity mirror and partial reflection output coupler 470··· Weights and Measures Module, Line Center Analysis Module, LAM 470a...Diffuser 472.. Beamsplitter 474...MO Laser Output Light Pulse Beam Pulse Energy Monitor 476.. .ASE Monitor 480.. . 490...Amplifier Gain Medium Section 492.. Annular Power Amplifier Stage 494... Cavity Input Section 496... Cavity Beam Reflector Section 500.. Seed Beam, Input Window 502, 504... Beam 506... Optical Delay Optical Path 510...partial mirror, beam splitter, beam expander, main beam 512, 514, 516... mirror, 稜鏡520... wedge, compensator, confocal optical system, 4XOPuS, position compensator 522.. First delay optical path, mirror, confocal mirror 524...mirror, confocal mirror, second delayed optical path 525...beam reversal optical element, 稜鏡526, 526', 528...beam splitter 530...wedge, compensation plate, Confocal optical system, compensator wedge 532... wedge, compensator, confocal optical system 540... fast 542...beam splitter 550.. window housing 550a...relative standard deviation curve 550a'... equivalent pulse curve 552...outer mounting plate, housing plate 552a... E-0 deflector voltage curve 552a'...equivalent pulse Curve 554...shell wall 554a... E-0 deflector voltage curve 554a'... equivalent pulse curve 202 (S; 1324423

556.. Window mounting plate 560a &quot; pointing offset relative to E-0 voltage curve 562, 564, 566.·· curve 562a-566a... pulse 568... laser cavity end mounting plate, middle 568a. 570.. .Laser end plate 572.. .Aperture 574...mounting bolt 580.. actuator, pulse 580a...input beam 580a-588a···pulse 582...pulse angle 隅, actuator shaft 582a...beam angle 隅, corner 584, 586, 588...pulse 584a...first sub-pulse 586a...second sub-pulse 588a...third sub-pulse 590.. actuator, drawing 592...graphing, control signal Line 594...orthogonal seed injection mechanism, curve 596...curve, control signal line 598...curve 600...controller, curve, beam combination benefit system 600a...beam combiner system 602...first amplifier gain medium portion 602,604 606...curves 602a-606a...curve 602a...first amplifier gain medium portion 604...second amplifier gain medium portion 604a...second amplifier gain medium portion 608..beam expander 610...curve, 稜鏡610a , 612a···稜鏡612...curve, 稜鏡620... energy/dose control system, laser system control Steering mirror 620a... steering mirror 622.. timing and energy control module, seed laser, first laser system output light pulse beam 622a... first laser system output light pulse beam 624... solid state pulsed power system (SSPPM), line narrowing module, second turning mirror '· S ) 203 624a... second turning mirror 626... seed laser output beam 630 ·. beam splitter, turning mirror 630a... turning mirror 632... weight measuring unit, Weight measurement module, pulse beam 632a...second laser system output light pulse beam

634...maximum mirror, second turning mirror 634a...second turning mirror, beam 636...seed injection mechanism 638...partial reflective optical element 640...maximum reflective optical element, first pulse extender, 〇PuS 640a&quot;.first pulse Extender, first OPUS 642...metric unit, beam splitter 642a...beam splitter

644.··Second pulse extender, 〇puS 644a·.. second pulse extender, second OPUS 646...beam splitter 646a...splitter mirror cavity, beam splitter 650a...beam splitter 652...injected into the optical path, Focusing lens 652a··.focusing lens 654·.. returning reverse optical path, divergence detector, metrology unit 654a... divergence detector 656.. metrology unit, feedback control signal 656a.·· feedback control signal 658... Shooting system output light pulse beam 660.. controller 662. &quot; processor, pulse extender 664.. splitter 670.. diffuser 670a... diffuser 680.. laser system, Speckle pattern 682...seed laser 684...frequency converter 700...very high power solid state seed immersion lithography laser beam source 702···solid seed laser 704.·formatted optical element 650...ring Power amplifier stage, laser 706... lens 1324423 708.. lens 712.. X-axis photoelectric (EO) steering mechanism 714.. y-axis photoelectric (E-Ο) steering mechanism 720.. . .. . Beam splitter 724, 726, 728··· turning mirror, folding mirror 730... first power oscillator, second amplifier gain medium 732... Power oscillator, power amplifier stage 734... input combiner / rear mirror 736.. front lens 740.. . beam expander 742, 744.. · 稜鏡 750, 752, 760, 762. · Mirror 764.. The first amplifier gain medium 766.. Output beam 780... Seed laser output pulse side write 780a... Initial seed laser wheel pulse divergence side write 782... Pulse pattern 782a... Sub-pulse divergence Profile 784...Impact on the side of photo-electric coating 784a...Diverging side 850a...plane-plane cavity 852a...cavity 854a...output occupant 856a...quarter-wave plate 858a...polarization input coupler 860a, 862a...beam 890.. input optical component module 910&quot;.mirror 1000... gauge strength 1001002... singular monotonic strength 1004. .Regularity of the two-way ΡΑ1010.. . Giant control pulse 1012, 1014... DC voltage 1016... AC high frequency control voltage 1020... Optical switching and smearing system 1022... Solid seed laser, laser 1024...Ray Shot, frequency converter, component 1026... optical switching and applicator, beam splitter/applicator 1030...amplifier gain medium 1032...high power , Amplifier Gain Media 1034...AC 'AC Beam Manipulation 1036...Low Voltage Time Interval 205 1324423 1050.. Beam Mixer/Fliper 1052.. Beam 1054.. . Beam Splitter 1056a-c...Mirror 1058.. Vertical axis 1060.. . First edge 1062.. . Second edge 1064.. Start point 1066.. End point 1070.. Output optical path, system 1100a... Circuit 1104a....E-0 Battery capacitance 1110a... impedance matching inductor 1120a...N: 1 step-up transformer 1122a... DC power supply yeah 1126a...capacitor 1130.. single transistor 1130a...single transistor, large resistor 1140a...transistor, switch 1142a...small resistor 1200..system 1200'...seed laser system 1202.. .Nd:YAG laser system 1204.. .Nd:YAG laser system 1206...frequency converter

1208.. Frequency multiplier, SFG 1210.. Third harmonic generator 1212... Fourth harmonic generator 1222.. Fiber laser 1224.. Rear oscillation mirror 1226.. Front window

1228.. .Q switch 1252 ' 1254...SFG

1258.. .5.G 1260.. Pulsed fiber laser oscillator 1262... Single mode CW adjustable narrowband diode laser 1272.. Optical system 1274.. Workpiece processing level 1300.. . System 1302-1306... solid state laser 1308.. beamsplitters 1310, 1320, 1330...amplified laser systems 1312-4, 1322-4, 1332-4...amplifier gain medium 1350.. Edge / line width control system 206 1324423 system, laser system 1352... illumination light inlet 1352a-c... seed laser 1356-1366... amplifier gain medium 1370 · coherence destruction mechanism 'beam combiner 1372... Image contrast sensor 1374... controller 1400.. rim/line width control system 1454... coherence destruction mechanism 1460... rim/line width control system 1462... coherence destruction mechanism 1520... system, pole South power output laser light pulse beam source 1522, 1524, 1526, 1528... oscillator / amplifier system 1530.. main oscillator cavity, seed laser part 1532.. power amplifier part 1540, 1542... Beam combiner 1550...seed laser/oscillator system, seed laser amplifier system 1552...beam splitter 1570...seed laser/oscillation System 1572...seed laser 1574...amplifier gain medium 1580·.. immersion laser lithography system 1590.. scanner 1592...illuminator 1594.. . reticle 1596.··wafer platform 1598.. Wafer 1602.. Liquid source 1604.. Liquid drain 1606.. Liquid 1620... Solid seed laser to gas discharge amplifier laser system, solid seed laser/amplifier laser system 1622.. Solid state pulse Seed laser 1624... ring power amplifier stage, p〇,

PA 1626...Coherence Destructor/Frequency Multiplier 1630...Frequency Multiplier, Frequency Converter 1632..Coherence Destructor 1640...Spectrum Mirror 1642...Longitudinal Coherence Destructor 1644·.·Horizontal Coherence Destructor 1646...beam combiner

207 1324423 1648...Amplifier gain medium part 1700...main oscillator 1710...fiber oscillator or amplifier Π12...diode pump, X-axis beam steering optoelectronic component 1714...seed diode laser, y-axis beam steering optoelectronic component 1720 ...back cavity total reflection mirror 1722..partial reflection output coupler 1724...Q switch 1730...second harmonic generator 1732...frequency adder 1740...external amplitude modulator 1750..pulse seed laser 1760...main oscillation 1800·.. Ring Power Amplifier Stage Oscillator Laser System 1802... Solid State or Gas Discharge Seed Oscillator 1804... Power Amplifier Stage, Oscillating Cavity 1806... Output Beam 1810... Power Amplifier Stage 1812.. Seed Injection Mechanism 1814· Input/Output Coupler 1816... Table Mirror, Mirror 1820... Beam Inverter/Returner 1822... First Maximum Mirror 1824.. Second Mirror 1826, 1828... Revitalizing Light Path 1880... Solid Seed/ Power Amplifier Laser System 1882.. Seed Laser 1884... Optical Interface Module 1886... Tubular Telescope 1888... Power Amplifier Cavity 1890···Input Optical Module 1902-1910.&quot;Mirror 1912, 1914... Photoelectric components 1930.. .XeF cavity 1930-1936...steering mirror 1950...solid seed/power amplifier stage laser system output light pulse beam 1952...solid seed laser I960.··input coupling module 1962...polarizing beam splitter 1964.. .Rmax Mirror 1966... Quarter Wave Plate 1968... Input Consumulator Rmax 208 1324423 1970, 1972... Seed Beam 1982... Output Coupler 1984, 1986, 1994, 1996... Turning Mirror 209 (S)

Claims (1)

1324423 10 15 July / / 曰 repair (more) original No. 95140194 application ^ _ not ¥ ¥ 冤 围 围 98 98 98.09.11. Ten, the scope of application for patent: 1. A line narrowing pulse excimer or molecule A fluorine gas discharge laser system comprising: a sub-laser oscillator for generating an output comprising a laser output pulse beam, comprising: a first gas discharge excimer or a molecular fluorine laser cavity; a line narrowing module inside the cavity; a laser amplification stage comprising an amplification gain medium in a second gas discharge excimer or molecular fluorine laser cavity, receiving the output of the seed laser oscillator, and amplifying the seed mine The output of the oscillator is formed to form a laser system output comprising a laser output pulse beam, the laser amplification stage comprising: a ring power amplification stage defined between a portion of the reflective optical element and a beam returner, wherein The ring power amplifier stage includes a beam expander disposed between the partially reflective optical element and the beam returner. 2. The system of claim 1, wherein: the ring power amplification stage comprises an injection mechanism of the partially reflective optical element, through which the output beam of the seed laser oscillator is injected into the loop power amplification stage by 20 . 3. The system of claim 1, further comprising: the ring power amplifier stage comprising a bow-tie circuit. 4. The system of claim 1, further comprising: the ring power amplifier stage comprising a racetrack loop. 210 1324423 5. The system of claim 1, further comprising: the loop power amplification stage amplifying the output of the seed laser oscillator cavity to a pulse energy of 21 millijoules. 6. The system of claim 2, further comprising: 5 the ring power amplification stage amplifying the output of the seed laser oscillator cavity to &gt; 1 millijoule of pulse energy. 7. The system of claim 1, further comprising: the loop power amplification stage amplifying the output of the seed laser oscillator to a pulse energy of 22 millijoules. 10. The system of claim 2, further comprising: the ring power amplification stage amplifying the output of the seed laser oscillator to a pulse energy of 22 millijoules. 9. The system of claim 1, further comprising: the loop power amplification stage amplifying the output of the seed laser oscillator to a pulse energy of 15 25 millijoules. 10. The system of claim 2, further comprising: the ring power amplification stage amplifying the output of the seed laser oscillator to a pulse energy of 25 millijoules. 11. The system of claim 1, further comprising: 20 the loop power amplification stage amplifying the output of the seed laser oscillator to a pulse energy of 210 millijoules. 12. The system of claim 2, further comprising: the ring power amplification stage amplifying the output of the seed laser oscillator to a pulse energy of 210 millijoules. 211 1324423 13. The system of claim 1, further comprising: the loop power amplification stage amplifying the output of the seed laser oscillator to a pulse energy of 15 millijoules. 14. The system of claim 2, further comprising: 5 the ring power amplification stage amplifying the output of the seed laser oscillator to a pulse energy of 215 millijoules. 15. The system of claim 1, further comprising: the laser system operating at an output pulse repetition rate of at most 12 k Η z. 10 16. The system of claim 2, further comprising: the laser system operating at an output pulse repetition rate of at most 12 kH. 17. The system of claim 1, further comprising: the laser system operating at an output pulse repetition rate of 22 to S8 kHz. 18. The system of claim 2, further comprising: the laser system operating at an output pulse repetition rate of 22 to &lt; 8 kHz. 19. The system of claim 1, further comprising: 20 the laser system operating at an output pulse repetition rate of 24 to S6 kHz. 20. The system of claim 2, further comprising: the laser system operating at an output pulse repetition rate of 24 to &lt;6 kHz. 212 1324423 21. A broadband pulsed excimer or molecular fluorine gas discharge laser system comprising: a sub-laser vibrator for generating an output comprising a laser output pulse beam comprising: 5 a first gas discharge An excimer or molecular fluorine laser cavity; a laser amplification stage comprising an amplification gain medium in a second gas discharge excimer or molecular fluorine laser cavity, receiving the output of the seed laser oscillator, and amplifying the seed lightning The output of the oscillator is formed to form a laser system output comprising a laser output pulse beam comprising: 10 a ring power amplification stage defined between a portion of the reflective optical element and a beam returner, wherein the ring power amplification The stage includes a beam expander disposed between the partially reflective optical element and the beam returner. 22. The system of claim 21, wherein: the loop power amplifier stage comprises an injection mechanism of the partially reflective optical element, through which the output beam of the seed laser oscillator is injected into the loop power amplification stage. . 23. The system of claim 21, further comprising: the ring power amplification stage comprising a bow-tie circuit. 20 24. The system of claim 22, further comprising: the ring power amplification stage comprising a bow-tie circuit. 25. The system of claim 21, further comprising: the ring power amplifier stage comprising a racetrack loop. 26. The system of claim 22, further comprising: 213 1324423 The ring power amplifier stage includes a racetrack loop. 27. The system of claim 1, further comprising: a coherent destruction mechanism between the seed laser oscillator and the amplifier gain medium. 5 28. The system of claim 2, further comprising: a coherent destruction mechanism between the seed laser oscillator and the amplifier gain medium. 29. The system of claim 27, further comprising: the coherence disrupting mechanism comprising an optical delay optical path having a delay length of one of a laser output pulse beam of the seed laser oscillator The coherence is longer. 30. The system of claim 28, further comprising: the coherence disrupting mechanism comprising an optical delay optical path having a delay length that is greater than one of 15 of the laser output pulse beams of the seed laser oscillator The coherence length is longer. 31. The system of claim 29, further comprising: the optical delay optical path is not substantially delayed by the length of the beam in the laser output pulse beam of the seed laser oscillator. 32. The system of claim 30, further comprising: 20 the optical delay optical path is not substantially delayed by the length of the beam in the laser output pulse beam of the seed laser oscillator. 33. The system of claim 27, further comprising: the coherence destruction mechanism comprising a first optical delay optical path of a first length and a second optical delay optical path of a second length, wherein the first optical 214 is The optical retardation of each of the delayed optical path and the second optically delayed optical path exceeds one of the laser output pulse beams of the seed laser oscillator, -4 dry lengths, but does not substantially increase the pulse length, and The difference between the length of the first retarded optical path and the length of the second delayed optical path is more than 5 the coherence length of the pulse. 34. The system of claim 1, further comprising: the coherence disrupting mechanism comprising a first optical length of the first length and an optical path of the second length, the second optically retarded optical path, the photon The optical delay of each of the delayed optical path and the second optical delayed optical path is one pulse of the coherent length of the laser output pulse beam of the seed laser oscillator, but substantially 1 increases the pulse length, and the The difference between the λ^ late optical path length and the second delayed optical path length exceeds the coherence length of the pulse. A narrow line pulsed excimer or molecular fluorine gas discharge laser system comprising: 215 1 seed laser recorder, the production-output containing-laser output pulse beam comprising: a first gas discharge excimer Or a molecular fluorine laser cavity; a narrowing module inside the first oscillator cavity; ": the amplification stage contains an amplification gain medium in a second gas quasi-knife or molecular fluorine laser cavity, which receives the seed The output of the laser oscillating device and amplifying the wheel of the seed laser oscillating device to form a laser system output comprising a laser output pulse beam comprising: - a ring power amplifier stage; 1324423 between the seed laser oscillator And a coherent destruction mechanism between the ring power amplification stage. 36. The system of claim 35, further comprising: the ring power amplification stage comprising: 5 an injection mechanism including a portion of the reflective optical element, through which the injection The mechanism, the seed laser oscillator output beam is injected into the loop power amplification stage. 37. The system of claim 36, further comprising: The dry destruction mechanism includes an optical delay optical path having a delay length that is longer than a coherence length of one of the laser output pulse beams of the seed laser oscillator. 38. The system further comprising: the optical delay optical path is not substantially delayed by the length of the beam in the laser output pulse beam of the seed laser oscillator. 15 39. The system of claim 36, further comprising: The coherence destruction mechanism includes a first optical delay optical path of a first length and a second optical delayed optical path of a second length, wherein an optical delay of each of the first optical delay optical path and the second optical delayed optical path exceeds the seed The laser output of the laser oscillator outputs a pulse length of 20 pulses, but does not substantially increase the pulse length, and the difference between the length of the first delayed optical path and the length of the second delayed optical path exceeds the The length of the coherence of the pulse. 40. The system of claim 36, further comprising: the coherence destruction mechanism comprises a coherent break The bad optical delay junction 216 is configured to generate a plurality of sub-pulses that are sequentially delayed by a single input pulse, and each of the sub-pulses is delayed by more than the coherence length of the pulsed light. Or a molecular fluorine gas discharge laser system comprising: a seed laser oscillator that produces an output comprising a laser output pulse beam comprising: - a first gas discharge excimer or a molecular fluorine laser cavity; - a laser amplification stage An amplification gain medium is included in a second gas electro-molecular or molecular fluorine laser cavity, which receives the seed laser oscillator +~ and amplifies the output of the seed laser oscillator to form a pulse comprising a field shot The laser system output of the beam comprises: - a ring power amplification stage; a coherence destruction mechanism between the seed laser oscillator and the ring power amplification stage. The system of claim 41, further comprising: the ring power amplification stage comprising: an injection mechanism including a portion of the reflective optical element, through which the output beam of the seed laser oscillator is injected into the ring power amplification stage . The system of claim 40, further comprising: the coherence destruction mechanism comprising an optical delay optical path having a delay length compared to a pulse of the laser output pulse beam of the seed laser oscillator Sex length is longer. 217. The system of claim 43, further comprising: the optical retarding optical path is not substantially delayed by the length of the beam in the laser-pulsed beam of the seed laser invigilator. 45. The system of claim 4, further comprising: the coherence disrupting mechanism comprising a first optical delay optical path of a first length and a second optical extended path of the second length, the first optical The optical retardation of each of the delayed optical path and the second optical delayed optical path exceeds the coherence length of one of the laser output pulse beams of the seed laser oscillator, but does not substantially increase the pulse length and the first delay The difference between the length of the optical path and the length of the second delayed optical path is beyond the length of the coherence of the pulse. 46. The system of claim 40, further comprising: the coherence disrupting mechanism comprising a coherent destruction optical delay structure that produces a plurality of sub-pulses sequentially delayed by a single input pulse, wherein each of the sub-pulses The pulse delay is greater than the coherence length of the pulse light. 47_ - A pulsed excimer or molecular gas gas discharge lightning (four) system comprising: a sub-laser vibrator for generating an output comprising a laser output pulse beam comprising: a first gas discharge excimer or molecular fluorine a laser cavity; a laser narrowing module inside a first oscillator cavity; a laser amplification stage comprising an amplification gain medium in a second gas discharge excimer or molecular gas laser cavity, receiving the seed laser The output of the oscillator 'and amplifies the seed laser (4) to form a laser system output comprising a 218 1324423 laser output pulse beam; a coherent destruction mechanism between the seed laser oscillator and the laser amplification stage, Wherein the coherence disrupting mechanism comprises an optical delay optical path that exceeds a coherence length of the seed laser output beam pulse. 5 48. The system of claim 47, further comprising: the amplification stage package - a laser vibrating cavity. 49. The system of claim 47, further comprising: the amplification stage comprising an optical path defining a fixed number of passes through the amplification gain medium. 10 50. The system of claim 47, further comprising: the coherence disrupting mechanism comprising an optical delay optical path having a delay length that is greater than one of a laser output pulse beam of the seed laser oscillator The coherence length is longer. 51. The system of claim 48, further comprising: 15 the coherence disrupting mechanism comprising an optical delay optical path having a delay length that is greater than one of a laser output pulse beam of the seed laser oscillator The coherence length is longer. 52. The system of claim 49, further comprising: the coherence disrupting mechanism comprising an optical delay optical path having a delay length of one of a laser output pulse beam of the seed laser oscillator The coherence is longer. 53. The system of claim 50, further comprising: the optical delay optical path is not substantially delayed by the length of the beam in the laser output pulse beam of the seed laser oscillator. 219 1324423 54. The system of claim 51, further comprising: the optical delay optical path is not substantially delayed by the length of the beam in the laser output pulse beam of the seed laser oscillator. 55. The system of claim 52, further comprising: 5 the optical delay optical path is not substantially delayed by the length of the beam in the laser output pulse beam of the seed laser oscillator. 56. The system of claim 47, further comprising: the coherence destruction mechanism comprising a first optical delay optical path of a first length and a second optical delay optical path of a second length, wherein the first optical 10 The optical retardation of each of the delayed optical path and the second optical delayed optical path exceeds the coherence length of one of the laser output pulse beams of the seed laser oscillator, but does not substantially increase the pulse length, and the first delay The difference between the length of the optical path and the length of the second delayed optical path is beyond the length of the coherence of the pulse. The system of claim 48, further comprising: the coherence disrupting mechanism comprising a first optical delay optical path of a first length and a second optical delay optical path of a second length, wherein the first optical delay The optical delay of each of the optical path and the second optical delay optical path exceeds the coherence length of one of the laser output pulse beams of the seed laser oscillator, but does not substantially increase the pulse length, and the first The difference between the length of the delayed optical path and the length of the second delayed optical path is beyond the length of the coherence of the pulse. 58. The system of claim 49, further comprising: the coherence disrupting mechanism comprising a first optical extension 220 1324423 late optical path and a second optical delay optical path of the first length The optical delay of each of the optical delay optical path and the second optical delayed optical path exceeds the coherence length of one of the laser output pulse beams of the seed laser oscillator, but does not substantially increase the pulse length, and the 5th The difference between the length of the delayed optical path and the length of the second delayed optical path is beyond the length of the coherence of the pulse. 59. The system of claim 47, further comprising: the coherence disrupting mechanism comprising a coherent-damaging optical delay structure that produces a plurality of secondary pulses 10 pulses sequentially delayed by a single input pulse, wherein each The pulse train is delayed by more than the subsequent pulse length by the coherence length of the pulse light. 60. The system of claim 48, further comprising: the coherence disrupting mechanism comprising a coherent-damaging optical delay structure that produces a plurality of secondary pulses 15 sequentially delayed by a single input pulse, wherein each The pulse train is delayed by more than the subsequent pulse length by the coherence length of the pulse light. 61. The system of claim 49, further comprising: the coherence disrupting mechanism comprising a coherent-damaging optical delay structure that produces a plurality of secondary pulses 20 pulses sequentially delayed by a single input pulse, wherein each The pulse train is delayed by more than the subsequent pulse length by the coherence length of the pulse light. 62. A laser source system comprising: a solid-state laser seed source providing a sub-laser optical output; 221 1324423 a frequency conversion stage that converts the seed laser optical output into a suitable excimer or One wavelength of a molecular fluorine gas discharge laser; an excimer or molecular fluorine gas discharge laser gain medium that amplifies the converted seed laser optical output to produce a gas discharge laser output pulse beam of about 5 of the converted wavelength; A coherent destruction mechanism includes an optical delay element having a delayed optical path that is longer than a coherence length of the output pulse. 63. The system of claim 62, further comprising: the excimer or molecular fluorine laser is selected from the group consisting of XeCl, XeF, 10 KrF, ArF, and F2 laser systems. 64. The system of claim 63, further comprising: the laser gain medium comprising a power amplifier. 65. The system of claim 64, further comprising: the power amplifier comprising a single pass amplifier stage. 15 66. The system of claim 64, further comprising: the power amplifier comprising a multi-pass amplifier stage. 67. The system of claim 63, further comprising: the gain medium comprising a ring power amplification stage. 68. The system of claim 67, further comprising ... 20 The ring power amplifier stage comprises a bow tie configuration. 69. The system of claim 62, further comprising: an input/output coupler seed injection mechanism. 70. The system of claim 63, further comprising: an input/output consumable seed injection mechanism. 222 1324423 71. The system of claim 69, further comprising: the coherence destruction mechanism being between the laser seed beam source and the gas discharge laser gain medium. 72. The system of claim 70, further comprising: 5 the coherent destruction mechanism being between the laser seed beam source and the gas discharge laser gain medium. 73. The system of claim 62, further comprising: the solid seed laser beam source comprising a solid-state laser based on Nd. 74. The system of claim 73, further comprising: 10 a frequency multiplying pump pumping the Nd-based solid state laser. 75. The system of claim 73, further comprising: the Nd-based solid state laser comprising a fiber amplifier laser. 76. The system of claim 73, further comprising: the Nd-based solid laser is selected from the group consisting of: 15 Nd:YAG, Nd:YLF, and Nd:YV04 solid state lasers. 77. The system of claim 62, further comprising: the solid seed laser beam source comprising an Er-based solid state laser. 78. The system of claim 77, further comprising: the Er-based solid state laser comprising a fiber laser. 20 79. The system of claim 77, further comprising: the Er-based solid state laser comprising an Er:YAG laser. 80. The system of claim 62, further comprising: the frequency conversion stage comprising a linear frequency converter. 81. The system of claim 80, further comprising: 223 1324423 The linear frequency converter comprises a Ti: sapphire crystal. 82. The system of claim 81, further comprising: the linear frequency converter comprising a crystal containing amethyst. 83. The system of claim 62, further comprising: 5 the frequency conversion stage comprising a nonlinear frequency converter. 84. The system of claim 83, further comprising: the nonlinear frequency converter comprising a second harmonic generator. 85. The system of claim 83, further comprising: the nonlinear frequency converter comprising a sum frequency mixer. 10 86. A laser source system comprising: a solid-state laser seed beam source providing a sub-laser optical output; a frequency conversion stage converting the seed laser optical output into a seed or molecule suitable for seeding One wavelength of a fluorine gas discharge laser; 15 - an excimer or molecular fluorine gas discharge laser gain medium that amplifies the converted seed laser optical output to produce a gas discharge laser output at a wavelength approximately converted, comprising: A ring power amplifier stage. 87. A method of operating a laser source system, comprising: 20 providing a sub-laser optical output using a solid-state laser seed beam source; converting the seed laser optical output frequency to a suitable frequency conversion stage Seeding a wavelength of a quasi-molecular or molecular fluorine gas discharge laser; using a quasi-molecular or molecular fluorine gas discharge laser gain medium, placing 224 1324423 large converted seed laser optical output to generate one of __ Gas discharge laser output. 88. The system of claim 64, wherein the laser gain medium comprises a power oscillating device. 5 89. If the system of claim 66 is included, the step-by-step includes. The ring power amplifier stage includes a - racetrack configuration. 90. A processing machine comprising: a pulsed ultraviolet light-emission-illumination mechanism; an ultraviolet light input opening; 10 a workpiece fixed platform; a coherent destruction mechanism comprising - an optical delay optical path exceeding the ultraviolet The coherence length of the light pulse. 91. The machine of claim 90, further comprising: the optical retarding optical path does not substantially increase the length of the ultraviolet light pulse by 15 degrees. 92. The machine of claim 9, further comprising: the coherence disrupting mechanism comprising a first optical delay optical path having a first length and a second length H optical optical path, the first delayed optical path and The optical delay of each of the second delayed optical paths exceeds the coherence length of the ultraviolet light pulse, but does not substantially increase the length of the pulse 'and the difference between the length of the first delayed optical path and the second delayed optical path exceeds the pulse The length of the coherence. 93. The machine of claim 91, further comprising: the coherence disrupting mechanism comprising a first aperture - a first aperture, a C.1 225 pre-delay optical path, and a second optical delay optical path having a second length The optical delay of each of the first delayed optical path and the second delayed optical path exceeds the coherence length of the ultraviolet light pulse, but does not substantially increase the length of the pulse, and the difference between the length of the first delayed optical path and the second delayed optical path The 5 series exceeds the coherence length of the pulse. 94. The machine of claim 90, further comprising: the one of the first optical delay optical path and the second optical delay optical path further comprising a beam inversion or beam translating mechanism. 95. The machine of claim 91, further comprising: 1 至 at least one of the first optical delay optical path and the second optical delay optical path further comprising a beam inversion or beam translating mechanism. 96. The system of claim 2, wherein the portion of the reflective optical element is assembled by passing at least a portion of the beam from the toroidal power amplification stage. 15 97. The system of claim 96, wherein the beam expander is configured to produce a light beam that exits the ring power amplification stage through the partially reflective optical element, relative to the reflective optical element passing through the portion A net scatter of one of the beams entering the ring power amplifier stage. 98. The system of claim 1, wherein the beam returner is a 20 prism that is configured to move along a first path to pass a beam of the amplification gain medium and along a second The path moves to stagger the beam through one of the amplification gain media. 99. A laser system comprising: a sub-laser oscillator that produces an output comprising a beam of laser output pulses 226; and a laser amplification stage that includes an amplification gain medium for a gas discharge excimer or a molecular fluorine laser cavity that receives the output of the seed laser oscillator and amplifies the output of the seed laser oscillator to form a laser system comprising a thunder (four) pulse beam, a system output, the laser amplification stage A regenerative power amplifier stage is defined that is defined between a portion of the reflective optical element and the beam returner, the beam returner 稜鏡 being configured to move along the first path to pass the amplification gain One of the medium beams and the second path of the edge are moved to be interlaced by one of the amplification gain media. 100. A laser system comprising: a seed-laser oscillator that produces a pulsed seed beam; a laser amplification stage that includes an amplification gain medium-gas discharge quasi-knife or a molecular fluorine laser cavity, Receiving the pulsed seed beam and amplifying the ship's seed beam to form a pulsed laser output beam, the laser amplification stage comprising - a regenerative ring secret, defined as - partially reflected light = element and a beam return 稜鏡And a beam correction system inside the regenerative annular stage, and comprising: a compressor that compresses the pulse seed beam before entering the amplification gain medium; and a frame that expands the pulse beam exiting the amplification gain medium. A laser system comprising: a seed laser oscillator that produces a pulsed seed beam; 1324423 a laser amplification stage that includes an amplification gain medium in a gas discharge excimer or molecular fluorine laser cavity Receiving the pulsed seed beam and amplifying the pulsed seed beam to form a pulsed laser output beam, the laser amplification stage comprising a regenerative annular stage defined by a portion of the reflective optical element 5 and a beam returner edge And a beam correction system between the seed laser oscillator and the laser amplification stage, the beam correction system including a beam expander that expands the pulse seed beam exiting the seed laser oscillator. 102. The laser system of claim 101, wherein the beam expander comprises one or more beam expanders. 228